From asu at bu.edu Mon Jan 11 19:50:07 2016 From: asu at bu.edu (Sushkov, Alex) Date: Tue, 12 Jan 2016 00:50:07 +0000 Subject: [labnetwork] free electromagnet with power supply, optical bench, and air drier Message-ID: <46DF854BB81DD944B7B5DABCC110967B156F18A9@IST-EX10MBX-3.ad.bu.edu> Hi, We have the following available for free pickup at the BU physics department: 1) an electromagnet with power supply: LDJ electronics, model 6109 2) optical breadboard: 4' x 6' x 2.25", with base 3) air drier, Donaldson model AHLD-50 Please let me know if you are interested in picking any of these up by 1/13, or they will be disposed of. I have photographs I can email to anyone who may be interested. Thanks, Alex -------------- next part -------------- An HTML attachment was scrubbed... URL: From lewin at illinois.edu Wed Jan 13 14:58:54 2016 From: lewin at illinois.edu (Reinhart, Leslie Lewin) Date: Wed, 13 Jan 2016 19:58:54 +0000 Subject: [labnetwork] University of Illinois - Principal Research Engineer - Micro and Nanotechnology Lab Message-ID: <0B48381248D4954CBEE4C4CC8FD100BDA1599CA7@chimbx3.ad.uillinois.edu> The Micro and Nanotechnology Laboratory at the University of Illinois at Urbana-Champaign seeks applicants for a Principal Research Engineer to provide leadership within multiple laboratory environments within MNTL for operation/maintenance of research equipment, development/implementation of safety policies, and student/staff training. For more information regarding this position, or to apply, please visit MNTL Principal Research Engineer. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: University of Illinois - Principal Research Engineer - Micro and Nanotechnology Lab.pdf Type: application/pdf Size: 285447 bytes Desc: University of Illinois - Principal Research Engineer - Micro and Nanotechnology Lab.pdf URL: From sbhas at uchicago.edu Wed Jan 13 17:22:57 2016 From: sbhas at uchicago.edu (Shivakumar Bhaskaran) Date: Wed, 13 Jan 2016 22:22:57 +0000 Subject: [labnetwork] EVG 620 Mask Aligner issue Message-ID: The lamp in the mask aligner is not reaching 500W its stays at 150W. I did send the power supply to EVG to test it in their unit and it works fine. I changed the bulbs and still the same issue. Does anyone had faced similar issue in your Mask Aligner. -Thanks -Shiva Shivakumar Bhaskaran, Ph.D. Searle CleanRoom Manager The University of Chicago 5735 S.Ellis, Room 032 Chicago-60637 Ph:773-795-2297 https://searle-cleanroom.uchicago.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From hbtusainc at yahoo.com Thu Jan 14 07:10:22 2016 From: hbtusainc at yahoo.com (Mario Portillo) Date: Thu, 14 Jan 2016 12:10:22 +0000 (UTC) Subject: [labnetwork] EVG 620 Mask Aligner issue In-Reply-To: References: Message-ID: <121804398.4791026.1452773422824.JavaMail.yahoo@mail.yahoo.com> blockquote, div.yahoo_quoted { margin-left: 0 !important; border-left:1px #715FFA solid !important; padding-left:1ex !important; background-color:white !important; } Shiva, a few suggestions ; make sure lamp is installed correctly, anode side down, anode/ cathode connections nice n tight at the light source n power supply, over cooling ??? Turn cooling off n turn lamp on, for a 500W lamp the normal operating voltage should be around average of 60vdc and 8.5 amps, last but not least .. A bad batch of lamps ??? I have seen this a few times thru the years... I hope this helps..... Regards? Sent from Yahoo Mail for iPhone On Wednesday, January 13, 2016, 4:52 PM, Shivakumar Bhaskaran wrote: The lamp in the mask aligner is not reaching 500W its stays at 150W. I did send the power supply to EVG to test it in their unit and it works fine. I changed the bulbs and still the same issue. Does anyone had faced similar issue in your Mask Aligner. ? -Thanks -Shiva ? Shivakumar Bhaskaran, Ph.D. Searle CleanRoom Manager The University of Chicago 5735 S.Ellis, Room 032 Chicago-60637 Ph:773-795-2297 https://searle-cleanroom.uchicago.edu/ ? _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From sbhas at uchicago.edu Thu Jan 14 10:20:30 2016 From: sbhas at uchicago.edu (Shivakumar Bhaskaran) Date: Thu, 14 Jan 2016 15:20:30 +0000 Subject: [labnetwork] EVG 620 Mask Aligner issue In-Reply-To: <121804398.4791026.1452773422824.JavaMail.yahoo@mail.yahoo.com> References: <121804398.4791026.1452773422824.JavaMail.yahoo@mail.yahoo.com> Message-ID: The controller has interlock, the lamp will turn ON only if the cooling and air is ON, may be I can bypass the interlock will check with EVG regarding this. Thanks -Shiva Shivakumar Bhaskaran, Ph.D. Searle CleanRoom Manager The University of Chicago 5735 S.Ellis, Room 032 Chicago-60637 Ph:773-795-2297 https://searle-cleanroom.uchicago.edu/ From: Mario Portillo [mailto:hbtusainc at yahoo.com] Sent: Thursday, January 14, 2016 6:10 AM To: Shivakumar Bhaskaran ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] EVG 620 Mask Aligner issue Shiva, a few suggestions ; make sure lamp is installed correctly, anode side down, anode/ cathode connections nice n tight at the light source n power supply, over cooling ??? Turn cooling off n turn lamp on, for a 500W lamp the normal operating voltage should be around average of 60vdc and 8.5 amps, last but not least .. A bad batch of lamps ??? I have seen this a few times thru the years... I hope this helps..... Regards Sent from Yahoo Mail for iPhone On Wednesday, January 13, 2016, 4:52 PM, Shivakumar Bhaskaran > wrote: The lamp in the mask aligner is not reaching 500W its stays at 150W. I did send the power supply to EVG to test it in their unit and it works fine. I changed the bulbs and still the same issue. Does anyone had faced similar issue in your Mask Aligner. -Thanks -Shiva Shivakumar Bhaskaran, Ph.D. Searle CleanRoom Manager The University of Chicago 5735 S.Ellis, Room 032 Chicago-60637 Ph:773-795-2297 https://searle-cleanroom.uchicago.edu/ _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From rvanduse at doe.carleton.ca Thu Jan 14 12:31:21 2016 From: rvanduse at doe.carleton.ca (Rob Vandusen) Date: Thu, 14 Jan 2016 12:31:21 -0500 Subject: [labnetwork] EVG 620 Mask Aligner issue In-Reply-To: References: <121804398.4791026.1452773422824.JavaMail.yahoo@mail.yahoo.com> Message-ID: <01b101d14ef1$626228a0$272679e0$@doe.carleton.ca> Not sure if you are running your system in constant power or constant intensity mode, but if it is in constant intensity it may be limiting the power. Rob. Robert Vandusen Technical Officer, Microfabrication Lab Electronics Department Carleton University room: 4184 Mackenzie Building 613-520-2600 ext 5761 rvanduse at doe.carleton.ca From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Shivakumar Bhaskaran Sent: January-14-16 10:21 AM To: Mario Portillo ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] EVG 620 Mask Aligner issue The controller has interlock, the lamp will turn ON only if the cooling and air is ON, may be I can bypass the interlock will check with EVG regarding this. Thanks -Shiva Shivakumar Bhaskaran, Ph.D. Searle CleanRoom Manager The University of Chicago 5735 S.Ellis, Room 032 Chicago-60637 Ph:773-795-2297 https://searle-cleanroom.uchicago.edu/ From: Mario Portillo [mailto:hbtusainc at yahoo.com] Sent: Thursday, January 14, 2016 6:10 AM To: Shivakumar Bhaskaran >; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] EVG 620 Mask Aligner issue Shiva, a few suggestions ; make sure lamp is installed correctly, anode side down, anode/ cathode connections nice n tight at the light source n power supply, over cooling ??? Turn cooling off n turn lamp on, for a 500W lamp the normal operating voltage should be around average of 60vdc and 8.5 amps, last but not least .. A bad batch of lamps ??? I have seen this a few times thru the years... I hope this helps..... Regards Sent from Yahoo Mail for iPhone On Wednesday, January 13, 2016, 4:52 PM, Shivakumar Bhaskaran > wrote: The lamp in the mask aligner is not reaching 500W its stays at 150W. I did send the power supply to EVG to test it in their unit and it works fine. I changed the bulbs and still the same issue. Does anyone had faced similar issue in your Mask Aligner. -Thanks -Shiva Shivakumar Bhaskaran, Ph.D. Searle CleanRoom Manager The University of Chicago 5735 S.Ellis, Room 032 Chicago-60637 Ph:773-795-2297 https://searle-cleanroom.uchicago.edu/ _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From sbhas at uchicago.edu Thu Jan 14 12:43:24 2016 From: sbhas at uchicago.edu (Shivakumar Bhaskaran) Date: Thu, 14 Jan 2016 17:43:24 +0000 Subject: [labnetwork] EVG 620 Mask Aligner issue In-Reply-To: <01b101d14ef1$626228a0$272679e0$@doe.carleton.ca> References: <121804398.4791026.1452773422824.JavaMail.yahoo@mail.yahoo.com> <01b101d14ef1$626228a0$272679e0$@doe.carleton.ca> Message-ID: We run at constant power mode. -Thanks -Shiva Shivakumar Bhaskaran, Ph.D. Searle CleanRoom Manager The University of Chicago 5735 S.Ellis, Room 032 Chicago-60637 Ph:773-795-2297 https://searle-cleanroom.uchicago.edu/ From: Rob Vandusen [mailto:rvanduse at doe.carleton.ca] Sent: Thursday, January 14, 2016 11:31 AM To: Shivakumar Bhaskaran ; 'Mario Portillo' ; labnetwork at mtl.mit.edu Subject: RE: [labnetwork] EVG 620 Mask Aligner issue Not sure if you are running your system in constant power or constant intensity mode, but if it is in constant intensity it may be limiting the power. Rob. Robert Vandusen Technical Officer, Microfabrication Lab Electronics Department Carleton University room: 4184 Mackenzie Building 613-520-2600 ext 5761 rvanduse at doe.carleton.ca From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Shivakumar Bhaskaran Sent: January-14-16 10:21 AM To: Mario Portillo >; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] EVG 620 Mask Aligner issue The controller has interlock, the lamp will turn ON only if the cooling and air is ON, may be I can bypass the interlock will check with EVG regarding this. Thanks -Shiva Shivakumar Bhaskaran, Ph.D. Searle CleanRoom Manager The University of Chicago 5735 S.Ellis, Room 032 Chicago-60637 Ph:773-795-2297 https://searle-cleanroom.uchicago.edu/ From: Mario Portillo [mailto:hbtusainc at yahoo.com] Sent: Thursday, January 14, 2016 6:10 AM To: Shivakumar Bhaskaran >; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] EVG 620 Mask Aligner issue Shiva, a few suggestions ; make sure lamp is installed correctly, anode side down, anode/ cathode connections nice n tight at the light source n power supply, over cooling ??? Turn cooling off n turn lamp on, for a 500W lamp the normal operating voltage should be around average of 60vdc and 8.5 amps, last but not least .. A bad batch of lamps ??? I have seen this a few times thru the years... I hope this helps..... Regards Sent from Yahoo Mail for iPhone On Wednesday, January 13, 2016, 4:52 PM, Shivakumar Bhaskaran > wrote: The lamp in the mask aligner is not reaching 500W its stays at 150W. I did send the power supply to EVG to test it in their unit and it works fine. I changed the bulbs and still the same issue. Does anyone had faced similar issue in your Mask Aligner. -Thanks -Shiva Shivakumar Bhaskaran, Ph.D. Searle CleanRoom Manager The University of Chicago 5735 S.Ellis, Room 032 Chicago-60637 Ph:773-795-2297 https://searle-cleanroom.uchicago.edu/ _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Thu Jan 14 16:27:08 2016 From: julia.aebersold at louisville.edu (julia.aebersold at louisville.edu) Date: Thu, 14 Jan 2016 21:27:08 +0000 Subject: [labnetwork] EVG 620 Mask Aligner issue In-Reply-To: References: <121804398.4791026.1452773422824.JavaMail.yahoo@mail.yahoo.com> <01b101d14ef1$626228a0$272679e0$@doe.carleton.ca> Message-ID: Just a side comment on this thread for we have a Suss MA6/BA6. We used to run in constant power mode, but our clients always had to adjust their exposure durations as the bulb degraded. We changed to constant intensity mode and results are much more consistent all the time. When our controller starts to howl when it can?t deliver the intensity needed or we reach our time limit then we change the lamp. Just my $0.02. Cheers! Julia Aebersold, Ph.D. Cleanroom Manager Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 502-852-1572 http://louisville.edu/micronano/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Shivakumar Bhaskaran Sent: Thursday, January 14, 2016 12:43 PM To: Rob Vandusen ; 'Mario Portillo' ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] EVG 620 Mask Aligner issue We run at constant power mode. -Thanks -Shiva Shivakumar Bhaskaran, Ph.D. Searle CleanRoom Manager The University of Chicago 5735 S.Ellis, Room 032 Chicago-60637 Ph:773-795-2297 https://searle-cleanroom.uchicago.edu/ From: Rob Vandusen [mailto:rvanduse at doe.carleton.ca] Sent: Thursday, January 14, 2016 11:31 AM To: Shivakumar Bhaskaran >; 'Mario Portillo' >; labnetwork at mtl.mit.edu Subject: RE: [labnetwork] EVG 620 Mask Aligner issue Not sure if you are running your system in constant power or constant intensity mode, but if it is in constant intensity it may be limiting the power. Rob. Robert Vandusen Technical Officer, Microfabrication Lab Electronics Department Carleton University room: 4184 Mackenzie Building 613-520-2600 ext 5761 rvanduse at doe.carleton.ca From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Shivakumar Bhaskaran Sent: January-14-16 10:21 AM To: Mario Portillo >; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] EVG 620 Mask Aligner issue The controller has interlock, the lamp will turn ON only if the cooling and air is ON, may be I can bypass the interlock will check with EVG regarding this. Thanks -Shiva Shivakumar Bhaskaran, Ph.D. Searle CleanRoom Manager The University of Chicago 5735 S.Ellis, Room 032 Chicago-60637 Ph:773-795-2297 https://searle-cleanroom.uchicago.edu/ From: Mario Portillo [mailto:hbtusainc at yahoo.com] Sent: Thursday, January 14, 2016 6:10 AM To: Shivakumar Bhaskaran >; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] EVG 620 Mask Aligner issue Shiva, a few suggestions ; make sure lamp is installed correctly, anode side down, anode/ cathode connections nice n tight at the light source n power supply, over cooling ??? Turn cooling off n turn lamp on, for a 500W lamp the normal operating voltage should be around average of 60vdc and 8.5 amps, last but not least .. A bad batch of lamps ??? I have seen this a few times thru the years... I hope this helps..... Regards Sent from Yahoo Mail for iPhone On Wednesday, January 13, 2016, 4:52 PM, Shivakumar Bhaskaran > wrote: The lamp in the mask aligner is not reaching 500W its stays at 150W. I did send the power supply to EVG to test it in their unit and it works fine. I changed the bulbs and still the same issue. Does anyone had faced similar issue in your Mask Aligner. -Thanks -Shiva Shivakumar Bhaskaran, Ph.D. Searle CleanRoom Manager The University of Chicago 5735 S.Ellis, Room 032 Chicago-60637 Ph:773-795-2297 https://searle-cleanroom.uchicago.edu/ _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From betemc at rit.edu Wed Jan 20 17:02:37 2016 From: betemc at rit.edu (Bruce Tolleson) Date: Wed, 20 Jan 2016 22:02:37 +0000 Subject: [labnetwork] STS ASE Electrostatic Chuck Message-ID: <5abaecf4241548aab0aaee06ea5a91ac@ex04mail01d.ad.rit.edu> Dear Labnetwork, Does anyone know the electrostatic chuck or have prints for the clamping circuit for an STS ASE deep RIE system? We can manually tell the clamp to come on but it won't come on running a recipe. We suspect it may be a programming issue but we lack the info to correct it. Can anyone help? Bruce E. Tolleson Rochester Institute of Technology 82 Lomb Memorial Drive, Bldg 17-2627 Rochester, NY 14623-5604 (585) 478-3836 [http://www.rit.edu/~962www/logos/tiger_walking_rit_color.jpg] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 2550 bytes Desc: image001.jpg URL: From adam.neal.2.ctr at us.af.mil Wed Jan 20 18:04:21 2016 From: adam.neal.2.ctr at us.af.mil (NEAL, ADAM T CTR USAF AFMC AFRL/RXAN) Date: Wed, 20 Jan 2016 23:04:21 +0000 Subject: [labnetwork] RTP Purchace question Message-ID: <05E24DC0BCA9634C9F87A9584711A2AF268F4E5D@52ZHTX-D01-05E.area52.afnoapps.usaf.mil> Labnetwork list members, The research group of which I am a part at the Air Force Research Lab is considering the purchase of an RTP system. So far, we are considering the Jipelec Jetfirst RTP and the Allwin21 AW610 which have been recommended to us by some colleagues. I've received very helpful information from Dan Hosler at Purdue, particularly on the Jipelec, but thought I'd solicit input from this mailing list as well. I'd sincerely appreciate information from list members on their experience using/maintaining these RTP. If you own a system from either of these companies, are you satisfied and would you recommend it? How does the Allwin21 RTP compare to the Heatpulse RTP on which it is based? Thanks very much for the assistance. I've followed this list after attending UGIM as a student several years ago. There's clearly a lot of expertise here so I'm very happy to have been introduced to this list. Adam T. Neal, PhD Postdoctoral Research Engineer Air Force Research Lab Materials and Manufacturing Directorate Universal Technology Corporation Wright-Patterson AFB, OH, 45433 adam.neal.2.ctr at us.af.mil -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at stanford.edu Wed Jan 20 21:25:00 2016 From: shott at stanford.edu (John Shott) Date: Wed, 20 Jan 2016 18:25:00 -0800 Subject: [labnetwork] UGIM 2016 Call For Abstracts Message-ID: <56A0417C.9030309@stanford.edu> Colleagues: As you may recall, the University of Utah has graciously volunteered to host the 2016 installment of the UGIM Symposium in June of this year. Ian Harvey (irharvey at eng.utah.edu) is serving as the General Chair and Amy VanRoosendaal (amy.van at utah.edu) is serving as the Conference Coordinator. Ian has asked me to serve as Program Chair. You can reach me at jdshott at earthlink.net. Following this preamble is the UGIM 2016 Call for Abstracts. However, I wanted to highlight a few elements of this year's conference: The afternoon prior to the start of the "real" conference (Sunday afternoon, June 12, 2015) , we will be holding another Bootie Camp. In addition to presentations and discussion that we hope will be of interest to those new to running laboratories of this type, we are going to allow time for those from new labs attending UGIM for the first time to introduce themselves and tell us a bit about their operational strengths and concerns. There is a place on the Bootie Camp registration form where you can indicate a desire to be included in this. While we don't know how many new labs we will attract this year, we hope to allow an hour for those introductions so that we can more formally introduce, welcome, and get to know new members of this community. The two main days of the Symposium (Monday, June 13 and Tuesday, June 14) will have keynote and invited talks, submitted talks, panel sessions, and topic-specific working lunches. There will also be exhibit space for vendors and contractors running during both days. Finally, on Wednesday, June 15 we hope to have an interesting lineup of technical workshops given by a number of the vendors and contractors that have supported our laboratories over the years. This day if optional, but free! Following is the official Call for Abstracts and more details can b e found at the University of Utah UGIM site: http://ugim.nanofab.utah.edu. Finally, Ian has prepared an Excel file that is attached that includes the questions that Tom Ferraguto is asking as a part of his Survey Monkey poll. The link to that poll is also included below. The deadline for online abstract submissions will be February 29, 2016. We look forward to seeing you all at UGIM 2016 in Salt Lake City. Thanks, John *UGIM2016 Call for Abstracts* * * The UGIM 2016 Symposium will be held at the University of Utah in Salt Lake City, UT on June 12-15, 2016. June 12: Introduction of new labs, Bootie camp, NNCI coordinating meeting, dinner reception and tours at the Utah Nanofab June 13-14: Conference and symposium June 15: Educational workshops (2 tracks repeated so you can hit the topics of interest) The goal of this symposium is to bring together educators and researchers involved in micro/nanotechnology management around the world and to provide a forum for exchanging information and presenting new lab operations and educational concepts. Representatives of micro/nano fabrication facilities, ranging from new labs to nationally recognized facilities, have found this symposium an excellent forum for exchanging information. Industry/university interactions, including technology transfer, collaborative research, and training efforts are included. New this year: 50-min detailed, non-commercial, educational workshops by topical experts and vendors. */Abstract Submission Deadline: Leap Day! Feb 29, 2016/* */Upload Abstracts here (including proposals for vendor workshops): /**/http://ugim.nanofab.utah.edu/call-for-participation//* */Registration information at:/**http://ugim.nanofab.utah.edu/registration/* /*In order to access the reserved block of rooms at the recommended University Guest House, please *_*CALL*_* them and refer to Nanofab/UGIM*/ /*(the reserved rooms are not accessible through the University Guest House web portal?? it will just show "sold out"): */ */University Guest House, 1-888-416-4075 Reference Nanofab / UGIM/* */Please fill out the survey sent previously from Tom Ferraguto, by JANUARY 29: /*https://www.surveymonkey.com/r/96BFZZP */ /* */(survey questions attached in .xls format if you wish to preview the questions prior to opening the surveymonkey)/* ugim-banner.png Short (~12 minutes) presentations including but not limited to the following topics: Equipment advances and tool selection (Looking for best practices here from facilities managers, not for a commercial solution from vendors) * Acquiring and managing mission-critical tools * How to fill the gap: nanolith technologies between EBL and UV contact litho * How to bring in tools when they are not sexy anymore, but badly needed for capacity * Case studies in evaluating and acquiring tools * How to extend the life of aging tools and operating systems * How to handle tools with a small user base (one PI for example) * Tools with small user base but very expensive infrastructure (WF6 CVD for example): acquire/install or give PI money to have the work somewhere else? * Renting space inside the cleanroom to individual groups? How do you collect rent and who maintains the tools? Some call it marketing, we call it Outreach, education and shared training media session * How to use lab facilities to support educational programs? * Student MEMS design competitions * Teaching scaling engineering * Filling the experiential gaps left by formal coursework * Teaching DOE/SPC * Media: marketing and outreach materials available for others to use ??? Media: safety training materials available for others to use Managing exotic materials: safely enabling new devices beyond simple scaling and design tricks * Handling PDMS for microfluidics without contaminating the fab with oils * Managing VO2, PZT and other materials whose properties of interest also raise risk for cross-contamination or toxic exposure * Full-flow management schemes for segregating difficult materials and mitigating cost Fab efficiency and continuous improvement * Communication: pass downs, staff meetings: how often, how to track projects and firefighting, best practices for interacting with faculty and researchers * Telepresence robotics for 24/7 operations: non-hazardous safety buddy roles and facilitating remote communication between staff and researchers * Navigating the transition to paperless billing: best practices * Managing 24/7 operations * Managing integrated cleanroom + analytical microscopy facilities * Management peculiarities associated with international and remote facilities * Managing multiple processes on a couple of etch tools: user responsibility for monitoring and conditioning or scheduled, staff-driven configuration changes? http://ugim.nanofab.utah.edu John Shott, Program Chair: jdshott at earthlink.net Amy VanRoosendaal: amy.van at utah.edu or 801-587-0676 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/png Size: 47892 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: UGIM Survey Phase 1 Final 17Nov2015 TF.xlsx Type: application/vnd.openxmlformats-officedocument.spreadsheetml.sheet Size: 29146 bytes Desc: not available URL: From rc at danchip.dtu.dk Thu Jan 21 02:47:35 2016 From: rc at danchip.dtu.dk (Roy Cork) Date: Thu, 21 Jan 2016 07:47:35 +0000 Subject: [labnetwork] STS ASE Electrostatic Chuck In-Reply-To: <5abaecf4241548aab0aaee06ea5a91ac@ex04mail01d.ad.rit.edu> References: <5abaecf4241548aab0aaee06ea5a91ac@ex04mail01d.ad.rit.edu> Message-ID: <7809901EBDB48748B6E15D4C18DD879577D30B@ait-pex02mbx05.win.dtu.dk> Hi Bruce, I need a bit more information in order to help? Is the ESC the "older" (Blue) SEMCO type which is driven by the DR4 Electrogrip PSU? IF so then I guess you have connected an RS232 cable with some terminal software and are sending the grip command (CTRL + G) to clamp the wafer. Under normal operation (wafer load / unload) the DR4 will grip when the grip remote voltage input signal changes. On older systems this signal is output from the STS VAC module, is your system an older STS module type? If your ESC is the "new" TDESC (Beige) type then It will use a different power supply (FUG maybe) and probably be driven by the PLC.. If you let me know the type of ESC is fitted (SEMCO or TDESC), power supply connected (FUG or DR4) and the control system type (PLC or STS modules) then we can definitely help you with the drawings and advice. Best regards, Roy Cork DTU Danchip Denmark From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Bruce Tolleson Sent: 20. januar 2016 23:03 To: labnetwork at mtl.mit.edu Subject: [labnetwork] STS ASE Electrostatic Chuck Dear Labnetwork, Does anyone know the electrostatic chuck or have prints for the clamping circuit for an STS ASE deep RIE system? We can manually tell the clamp to come on but it won't come on running a recipe. We suspect it may be a programming issue but we lack the info to correct it. Can anyone help? Bruce E. Tolleson Rochester Institute of Technology 82 Lomb Memorial Drive, Bldg 17-2627 Rochester, NY 14623-5604 (585) 478-3836 [http://www.rit.edu/~962www/logos/tiger_walking_rit_color.jpg] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 2550 bytes Desc: image001.jpg URL: From bob at eecs.berkeley.edu Thu Jan 21 10:49:42 2016 From: bob at eecs.berkeley.edu (Robert M. HAMILTON) Date: Thu, 21 Jan 2016 07:49:42 -0800 Subject: [labnetwork] RTP Purchace question In-Reply-To: <05E24DC0BCA9634C9F87A9584711A2AF268F4E5D@52ZHTX-D01-05E.area52.afnoapps.usaf.mil> References: <05E24DC0BCA9634C9F87A9584711A2AF268F4E5D@52ZHTX-D01-05E.area52.afnoapps.usaf.mil> Message-ID: Adam Neal, The University of California Marvell NanoFabrication operates five RTP systems all manufactured by AllWin21. Specifically four AccuThermo AW610 RTP and one AccuThermo AW810 RTP. Previously the lab ran two Heatpulse 210's. The Allwin21 tools have performed virtually trouble free. We receive excellent support for our questions. Sourcing replacement parts such as quartzware and lamps is reliable. We operate the 610's in two modes, with thermocouple (TC) and with IR pyrometry depending on the process temperature requirements. The 810 is a MOS tool and run only in the IR pyrometer mode. Our tools are shared by multiple users. We keep dedicated chambers for non-MOS processes such as III-V annealing and other unusual materials. For those users with a harsh processing and who require a thermocouple ("instrumented wafers") we have them purchase their own TC. Changing between IR pyrometry and an instrumented wafer (TC) is relatively simple. Low temperature process are better controlled via a TC. Our experience in maintaining accurate IR pyrometery for an RTP requires payng attention to the condition of the IR window of the isolation tube (chamber). IR wavelengths pass through a thin fused silica window fabricated into the underside of the chamber. The IR sensor, held at a constant temperature, gets its input via this window. The window is made of OH-free fused silica, a specific grade of silica that reduces the IR absorption peak found in common, flame-fusion silica. Even the the window attenuates the IR signal; its thicknes is therefore important. Each cleaning of a chambers, even in mild HF, erodes the window reducing its thickness. Also thin film coatings will attenuate the IR signal. Following a chamber clean it is good practice to run a calibration. We use mild 49% HF, 1 part to 10 parts DI to clean the IR window. A cotton swap speeds up the process. I have no experience with the Jipelec and cannot offer any guidance on comparing vendors or tool performance. Regards, Bob Hamilton Robert Hamilton University of CA, Berkeley Marvell NanoLab Equipment Manager Rm 520 Sutardja Dai Hall, MC 1754 Berkeley, CA 94720 Phone 510-809-8618 (desk - preferred) Mobile 510-325-7557 (my personal mobile) E-mail preferred: bob at eecs.berkeley.edu http://nanolab.berkeley.edu/ On Wed, Jan 20, 2016 at 3:04 PM, NEAL, ADAM T CTR USAF AFMC AFRL/RXAN < adam.neal.2.ctr at us.af.mil> wrote: > Labnetwork list members, > > > > The research group of which I am a part at the Air Force Research Lab is > considering the purchase of an RTP system. So far, we are considering the > Jipelec Jetfirst RTP and the Allwin21 AW610 which have been recommended to > us by some colleagues. I've received very helpful information from Dan > Hosler at Purdue, particularly on the Jipelec, but thought I'd solicit > input from this mailing list as well. > > > > I'd sincerely appreciate information from list members on their experience > using/maintaining these RTP. If you own a system from either of these > companies, are you satisfied and would you recommend it? How does the > Allwin21 RTP compare to the Heatpulse RTP on which it is based? > > > > Thanks very much for the assistance. I've followed this list after > attending UGIM as a student several years ago. There's clearly a lot of > expertise here so I'm very happy to have been introduced to this list. > > > > Adam T. Neal, PhD > Postdoctoral Research Engineer > Air Force Research Lab > > Materials and Manufacturing Directorate > > Universal Technology Corporation > Wright-Patterson AFB, OH, 45433 > > adam.neal.2.ctr at us.af.mil > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Wed Jan 27 08:39:07 2016 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Wed, 27 Jan 2016 13:39:07 +0000 Subject: [labnetwork] need help with photolithography Message-ID: HI, I am working on a project that requires photolith at 100nm, I have access to an E-Beam but I was wondering if anybody has DUV stepper for 150mm wafers working at 100nm line space that Draper could use. Thanks in advance. Rick Draper Principal Member of the Technical Staff 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From lej at danchip.dtu.dk Thu Jan 28 02:54:31 2016 From: lej at danchip.dtu.dk (Leif Johansen) Date: Thu, 28 Jan 2016 07:54:31 +0000 Subject: [labnetwork] need help with photolithography In-Reply-To: References: Message-ID: <879AEF5002D70747B136D02BC86A9C985F934E@ait-pex02mbx05.win.dtu.dk> Hello Rick, At DTU Danchip we have a Canon FPA-3000 EX4 DUV stepper with a KrF excimer laser at 248 nm wavelength which is set up to handle 150 mm wafers. The nominal resolution limit specified by Canon is 250 nm, but we have obtained 160 nm for straight lines and spaces. The exact resolution limit is very dependent on the actual pattern and, of course, also on the resist thickness. Best regards, Leif Leif S. Johansen Head of Operations DTU Danchip Technical University of Denmark [http://www.dtu.dk/images/DTU_email_logo_01.gif] Danchip ?rsteds Plads, Byg. 347 2800 Lyngby Direct +45 45255713 Mobile +45 25348992 lesjo at danchip.dtu.dk www.danchip.dtu.dk/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Morrison, Richard H., Jr. Sent: 27. januar 2016 14:39 To: labnetwork at mtl.mit.edu Subject: [labnetwork] need help with photolithography HI, I am working on a project that requires photolith at 100nm, I have access to an E-Beam but I was wondering if anybody has DUV stepper for 150mm wafers working at 100nm line space that Draper could use. Thanks in advance. Rick Draper Principal Member of the Technical Staff 555 Technology Square Cambridge Ma, 02139-3563 www.draper.com rmorrison at draper.com W 617-258-3420 C 508-930-3461 ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.gif Type: image/gif Size: 1055 bytes Desc: image001.gif URL: From michael.call at maine.edu Fri Jan 29 15:12:25 2016 From: michael.call at maine.edu (Michael Call) Date: Fri, 29 Jan 2016 15:12:25 -0500 Subject: [labnetwork] Lithium Niobate photolithography Message-ID: I'm having an issue with lithium niobate substrates sticking to the mask during alignment/exposure. I'm using a Karl Suss MA6 contact aligner. I am being very careful not to thermally shock the substrate during cleaning and PR coating. The wafer was at room temperature when the substrate bonded to the mask. I think now that it may be contact pressure that causes the static bonding to the mask. I'm just wondering if anyone else has run into this issue and may have found a solution. Thanks, -- Mike Call Research Engineer UMaine LASST 207-581-3382 -------------- next part -------------- An HTML attachment was scrubbed... URL: From khbeis at uw.edu Fri Jan 29 19:58:46 2016 From: khbeis at uw.edu (Michael Khbeis) Date: Fri, 29 Jan 2016 16:58:46 -0800 Subject: [labnetwork] Toxic Gas Detection Systems Message-ID: <81FD1B10-19E2-43C2-B4CF-EC248C5EA529@uw.edu> Colleagues and Friends, We are transitioning from our Zellweger/Honeywell MDA systems to point-of-use gas detectors as we renovate our cleanroom. Our specs suggest a vendor I have never heard of. I was wondering if you can tell me what systems you use, how/if it integrates into building controls, and any pros/cons of the system you have. I would like to make an educated recommendation if the specification needs modification. Gratefully, Dr. Michael Khbeis Associate Director, Washington Nanofabrication Facility (WNF) National Nanotechnology Infrastructure Network (NNIN) University of Washington Fluke Hall, Box 352143 (O) 206.543.5101 (F) 206.221.1681 (C) 443.254.5192 khbeis at uw.edu www.wnf.washington.edu/