[labnetwork] Foggy residue after oxygen plasma etch of polyimide

[Vivian Yu]

Good afternoon,

I am etching 7 microns of spin-coated polyimide using a chrome mask and a
direct oxygen plasma in a PlasmaTherm790 at 100 mTorr of pressure, and I am
observing a foggy pale yellow residue after and during the etch that can be
rubbed off easily with a clean room swab.

Has anyone on Labnetwork observed this same thing, or know what this might
be?

Thanks,
Vivian Yu
Princeton University
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