[labnetwork] DC sputtering Zr

[Morrison, Richard H., Jr.]

Hi,

At Draper we have 2 sputter tools for metals, KDF954 (Dc Mag with RF Sputter Clean) and a Lesker Research tool (co-sputter up to 3 targets, DF, RF and Reactive with RF sputter etch).  We allow Zirconium in both tools and we used DC mag to sputter the material. Your operation would consider our sputter tool to be 'Dirty" as we deposit most of the materials you listed.

When we develop a new material we use the Lesker before investing in a KDF target.

We did not see any adverse effects from the sputter of Zirconium. If you are going to use a sputter clean then it is advisable to coat the chamber  and platens with the Zirconium so that you do not cross contaminate your film on the wafer. We do that as a standard procedure.

Rick


Draper
Principal  Member of the Technical Staff
555 Technology Square
Cambridge Ma, 02139-3563

www.draper.com
rmorrison at draper.com
W 617-258-3420
C 508-930-3461



From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Vlahakis, James
Sent: Monday, September 26, 2016 10:09 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] DC sputtering Zr

Hi everyone, one of our users here at the Tufts Micro/Nano Fab would like to DC sputter Zirconium. We have two capable instruments -


1.       Our "dirty" sputter tool - allowed materials are Cr, Au, Cu, Ti, Ag, Zn, Al, ITO, Ge and various (fully cured) polymers that are popular with our biomedical users

2.       Our "clean" sputter tool which has a more restrictive material list and is typically used for reactive and RF sputtering.

I'm inclined to allow Zr sputtering in our dirty tool but hope to hear others' experience before making a decision. Are there special considerations? Contamination concerns?

Thanks for your help

jim
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