[labnetwork] EBeam Lithography on Glass substrates

[Mike Young]

If you *e-beam* evaporate Au, you will get soft X-rays which can expose 
most any resist. Thermal evaporation should be safer - you'll only have 
to worry about thermal degradation in that case.

--Mike


On 8/23/2017 8:28 AM, Marc Zuiddam - TNW wrote:
> Dear people,
>
> I always have the idea that sputting/evaporating a thin Au layer on my sample is exposing the e-beam resist on my sample.. Do you also experience that?
>
>   Regards, Marc Zuiddam
>
>

-- 
Michael P. Young                        (574) 631-3268 (office)
Nanofabrication Specialist              (574) 631-4393 (fax)
Department of Electrical Engineering    (765) 637-3784 (cell)
University of Notre Dame                 mike.young at nd.edu
B-38 Stinson-Remick Hall
Notre Dame, IN 46556-5637

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