From chenyl at mail.sustc.edu.cn Mon Dec 4 03:37:50 2017 From: chenyl at mail.sustc.edu.cn (Chen Yulong (Frank)) Date: Mon, 4 Dec 2017 16:37:50 +0800 Subject: [labnetwork] Deposit SiNx on ALD Al2O3 Message-ID: <2017120416374935495218@mail.sustc.edu.cn>+845628C7AFF2732A Dear All, I would like to use LPCVD to deposit low stress silicon nitride on Al2O3 (deposit by ALD). It is safe for Al2O3 to against the by product "HCl" from the Precursor DCS and NH3. Thanks. I have found a document on the snf website of standford, it seems that ALD Al2O3 is safe in the LPCVD silicon nitride process. ???(CHEN Yulong) PhD Student Department of Materials Science and Engineering SUSTech http://www.sustc.edu.cn/en/ Tel: +86-18589050065 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 20160321 F. Liu- Deposit LPCVD nitride on 10 nm ALD Al2O3.pdf Type: application/octet-stream Size: 182587 bytes Desc: not available URL: From codreanu at udel.edu Wed Dec 6 15:54:42 2017 From: codreanu at udel.edu (Iulian Codreanu) Date: Wed, 6 Dec 2017 15:54:42 -0500 Subject: [labnetwork] Thermco Minibrute MB-80 manual Message-ID: <3881c9d9-ae7e-7604-b98e-cc737a9afc9d@udel.edu> Good Afternoon, I have a two-stack MB-80 used for oxidation and doping and I wonder if anyone can share any installation and/or operation manuals. Thank you in advance for your help, Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD NanoFab 163 ISE Lab 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu From michael.hume at ualberta.ca Thu Dec 7 13:05:14 2017 From: michael.hume at ualberta.ca (Michael Hume) Date: Thu, 7 Dec 2017 11:05:14 -0700 Subject: [labnetwork] Silane Installation below grade Message-ID: Hello Colleagues, We are in the process if installing a new PECVD system which will use 100% SiH4. In reviewing CGA-G13, it states: > > > *7.2 Indoor storage and use*Buildings, rooms, or areas used for silane > storage shall be constructed in accordance with the requirements of the > local AHJ. *Silane shall not be stored in locations below grade* and > silane bulk sources shall not be located indoors. For transfilling > exceptions, see Section 18. In our case, an installation below grade may be preferred. I am wondering if anyone can provide any insight into the reasoning behind this. Does anybody store/use Silane below grade? Thank-you, -Mike. -- *PLEASE NOTE MY PHONE NUMBER HAS CHANGED: 780-953-5081* Michael Hume Operations Manager University of Alberta - nanoFAB W1-060 ECERF Building 9107 - 116 Street Edmonton, Alberta Canada T6G 2V4 www.nanofab.ualberta.ca Ph: *780-953-5081* (New)* -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at stanford.edu Thu Dec 7 16:19:47 2017 From: shott at stanford.edu (John D Shott) Date: Thu, 7 Dec 2017 21:19:47 +0000 Subject: [labnetwork] Silane Installation below grade In-Reply-To: References: Message-ID: <5F31EB4C-72CC-40A6-8852-C49FA799DFE2@stanford.edu> Mike: The institution for whom I used to work had a below-grade gas bunker in 1985 ? when that was still legal. In 1995, we constructed two at-grade bunkers: one for toxics, flammable, and pyrophorics and one for corrosives. The one in which the silane lives has very heavily reverted walls, blast resistant doors, and a flimsy louvered ceiling ? with no occupied spaces above or adjacent. Our AHJ would NEVER, EVER want us to have silane below grade. Despite my status as a leather-helmeted old fart, neither would I. There are likely online photos of silane "releases" that are quite persuasive. Good luck, John Sent from my iPhone On Dec 7, 2017, at 1:03 PM, Michael Hume > wrote: Hello Colleagues, We are in the process if installing a new PECVD system which will use 100% SiH4. In reviewing CGA-G13, it states: 7.2 Indoor storage and use Buildings, rooms, or areas used for silane storage shall be constructed in accordance with the requirements of the local AHJ. Silane shall not be stored in locations below grade and silane bulk sources shall not be located indoors. For transfilling exceptions, see Section 18. In our case, an installation below grade may be preferred. I am wondering if anyone can provide any insight into the reasoning behind this. Does anybody store/use Silane below grade? Thank-you, -Mike. -- PLEASE NOTE MY PHONE NUMBER HAS CHANGED: 780-953-5081 Michael Hume Operations Manager University of Alberta - nanoFAB W1-060 ECERF Building 9107 - 116 Street Edmonton, Alberta Canada T6G 2V4 www.nanofab.ualberta.ca Ph: 780-953-5081* (New) _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From shott at stanford.edu Thu Dec 7 16:22:05 2017 From: shott at stanford.edu (John D Shott) Date: Thu, 7 Dec 2017 21:22:05 +0000 Subject: [labnetwork] Silane Installation below grade In-Reply-To: <5F31EB4C-72CC-40A6-8852-C49FA799DFE2@stanford.edu> References: , <5F31EB4C-72CC-40A6-8852-C49FA799DFE2@stanford.edu> Message-ID: Mike: Oops, that's "rebarred" not "reverted" walls. And I used to work at Stanford ? Good luck, John Sent from my iPhone On Dec 7, 2017, at 1:19 PM, John D Shott > wrote: Mike: The institution for whom I used to work had a below-grade gas bunker in 1985 ? when that was still legal. In 1995, we constructed two at-grade bunkers: one for toxics, flammable, and pyrophorics and one for corrosives. The one in which the silane lives has very heavily reverted walls, blast resistant doors, and a flimsy louvered ceiling ? with no occupied spaces above or adjacent. Our AHJ would NEVER, EVER want us to have silane below grade. Despite my status as a leather-helmeted old fart, neither would I. There are likely online photos of silane "releases" that are quite persuasive. Good luck, John Sent from my iPhone On Dec 7, 2017, at 1:03 PM, Michael Hume > wrote: Hello Colleagues, We are in the process if installing a new PECVD system which will use 100% SiH4. In reviewing CGA-G13, it states: 7.2 Indoor storage and use Buildings, rooms, or areas used for silane storage shall be constructed in accordance with the requirements of the local AHJ. Silane shall not be stored in locations below grade and silane bulk sources shall not be located indoors. For transfilling exceptions, see Section 18. In our case, an installation below grade may be preferred. I am wondering if anyone can provide any insight into the reasoning behind this. Does anybody store/use Silane below grade? Thank-you, -Mike. -- PLEASE NOTE MY PHONE NUMBER HAS CHANGED: 780-953-5081 Michael Hume Operations Manager University of Alberta - nanoFAB W1-060 ECERF Building 9107 - 116 Street Edmonton, Alberta Canada T6G 2V4 www.nanofab.ualberta.ca Ph: 780-953-5081* (New) _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From Vincent.Luciani at nist.gov Thu Dec 7 17:24:10 2017 From: Vincent.Luciani at nist.gov (Luciani, Vincent (Fed)) Date: Thu, 7 Dec 2017 22:24:10 +0000 Subject: [labnetwork] Silane Installation below grade In-Reply-To: References: Message-ID: Hello Mike, My best guess is that the rule is intended to avoid having a silane explosion made worse by compression. We have a blow-out wall in our bunker for that reason. Vince Vincent K. Luciani NanoFab Manager Center for Nanoscale Science and Technology National Institute of Standards and Technology 100 Bureau Drive, MS 6201 Gaithersburg, MD 20899-6200 USA +1-301-975-2886 From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Michael Hume Sent: Thursday, December 07, 2017 1:05 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Silane Installation below grade Hello Colleagues, We are in the process if installing a new PECVD system which will use 100% SiH4. In reviewing CGA-G13, it states: 7.2 Indoor storage and use Buildings, rooms, or areas used for silane storage shall be constructed in accordance with the requirements of the local AHJ. Silane shall not be stored in locations below grade and silane bulk sources shall not be located indoors. For transfilling exceptions, see Section 18. In our case, an installation below grade may be preferred. I am wondering if anyone can provide any insight into the reasoning behind this. Does anybody store/use Silane below grade? Thank-you, -Mike. -- PLEASE NOTE MY PHONE NUMBER HAS CHANGED: 780-953-5081 Michael Hume Operations Manager University of Alberta - nanoFAB W1-060 ECERF Building 9107 - 116 Street Edmonton, Alberta Canada T6G 2V4 www.nanofab.ualberta.ca Ph: 780-953-5081* (New) -------------- next part -------------- An HTML attachment was scrubbed... URL: From nclay at seas.upenn.edu Thu Dec 7 20:04:42 2017 From: nclay at seas.upenn.edu (Noah Clay) Date: Fri, 8 Dec 2017 01:04:42 +0000 Subject: [labnetwork] Silane Installation below grade In-Reply-To: <5F31EB4C-72CC-40A6-8852-C49FA799DFE2@stanford.edu> References: <5F31EB4C-72CC-40A6-8852-C49FA799DFE2@stanford.edu> Message-ID: <971E72E9-3F2A-4DCD-ACC2-4763C71D454A@seas.upenn.edu> The silane bunker at Harvard is below grade, adjacent to a loading dock (building commissioned in 2007). It?s on a level of the building that?s adjacent to the loading dock (which itself is underground, accessed via ramp directly from the street). I recall that it?s on a mezzanine level of the nano complex and there was clever massing of the building that enabled siting of the bunker one level below grade. I was not privy to details before construction, involved in permitting or working with the AHJ. > On Dec 7, 2017, at 9:19 PM, John D Shott wrote: > > Mike: > > The institution for whom I used to work had a below-grade gas bunker in 1985 ? when that was still legal. > > In 1995, we constructed two at-grade bunkers: one for toxics, flammable, and pyrophorics and one for corrosives. > > The one in which the silane lives has very heavily reverted walls, blast resistant doors, and a flimsy louvered ceiling ? with no occupied spaces above or adjacent. > > Our AHJ would NEVER, EVER want us to have silane below grade. Despite my status as a leather-helmeted old fart, neither would I. > > There are likely online photos of silane "releases" that are quite persuasive. > > Good luck, > > John > > Sent from my iPhone > > On Dec 7, 2017, at 1:03 PM, Michael Hume > wrote: > >> Hello Colleagues, >> >> We are in the process if installing a new PECVD system which will use 100% SiH4. In reviewing CGA-G13, it states: >> >> 7.2 Indoor storage and use >> Buildings, rooms, or areas used for silane storage shall be constructed in accordance with the requirements of the local AHJ. Silane shall not be stored in locations below grade and silane bulk sources shall not be located indoors. For transfilling exceptions, see Section 18. >> >> In our case, an installation below grade may be preferred. I am wondering if anyone can provide any insight into the reasoning behind this. Does anybody store/use Silane below grade? >> >> Thank-you, >> -Mike. >> >> -- >> PLEASE NOTE MY PHONE NUMBER HAS CHANGED: >> 780-953-5081 >> >> >> Michael Hume >> Operations Manager >> University of Alberta - nanoFAB >> W1-060 ECERF Building >> 9107 - 116 Street >> Edmonton, Alberta >> Canada T6G 2V4 >> www.nanofab.ualberta.ca >> Ph: >> 780-953-5081* (New) >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From Jack.Paul at hdrinc.com Thu Dec 7 20:37:07 2017 From: Jack.Paul at hdrinc.com (Paul, Jack) Date: Fri, 8 Dec 2017 01:37:07 +0000 Subject: [labnetwork] Silane Installation below grade In-Reply-To: References: Message-ID: <35fd1573851f4ed18f17c48c9c5061e7@hdrinc.com> Michael, The building and fire codes in your jurisdiction (Edmonton) are probably different than the International Building and Fire Codes, but the general approach of those codes (IBC and IFC) is to restrict hazardous materials in basements because a) it is extremely difficult to fight fires at basement level, and b) basements are harder to exit, and c) typically basements cannot have explosion venting (as John Schott noted they had at Stanford). As a pyrophoric gas, silane deflagrates extremely fast ? almost fast enough to be officially labeled an ?explosion? and thus when it is stored indoors it is often required to have an explosion vent (this is the lightly fastened roof structure that John mentioned in his email). The IBC and IFC restrict the quantity of any pyrophoric material allowable in a single control area (i.e. one floor, or one fire-wall isolated area of a floor) to maximum of 4 lbs or 50 cu ft in storage, and 10 cu ft in ?use-closed system?. As I noted, your jurisdiction in Canada probably has not adopted the IBC and IFC, but my guess is that whatever code applies in your municipality, it will have similar restrictions. Additionally, it may also refer to CGA G13 (as does the IFC) for design requirements for silane systems, thus adopting CGA-13 by reference. In short ? you may be violating building and fire code restrictions by placing the silane in the basement level. Your campus architect or fire marshal should be able to provide guidance, or alternatively a friendly architect or lab planner. Jack Paul, RA, LEED AP BD+C D 602.474.3940 M 602.369.2086 hdrinc.com/follow-us From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Michael Hume Sent: Thursday, December 7, 2017 11:05 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Silane Installation below grade Hello Colleagues, We are in the process if installing a new PECVD system which will use 100% SiH4. In reviewing CGA-G13, it states: 7.2 Indoor storage and use Buildings, rooms, or areas used for silane storage shall be constructed in accordance with the requirements of the local AHJ. Silane shall not be stored in locations below grade and silane bulk sources shall not be located indoors. For transfilling exceptions, see Section 18. In our case, an installation below grade may be preferred. I am wondering if anyone can provide any insight into the reasoning behind this. Does anybody store/use Silane below grade? Thank-you, -Mike. -- PLEASE NOTE MY PHONE NUMBER HAS CHANGED: 780-953-5081 Michael Hume Operations Manager University of Alberta - nanoFAB W1-060 ECERF Building 9107 - 116 Street Edmonton, Alberta Canada T6G 2V4 www.nanofab.ualberta.ca Ph: 780-953-5081* (New) -------------- next part -------------- An HTML attachment was scrubbed... URL: From sturm at Princeton.EDU Fri Dec 8 08:39:14 2017 From: sturm at Princeton.EDU (James C. Sturm) Date: Fri, 8 Dec 2017 13:39:14 +0000 Subject: [labnetwork] Silane Installation below grade In-Reply-To: <35fd1573851f4ed18f17c48c9c5061e7@hdrinc.com> References: <35fd1573851f4ed18f17c48c9c5061e7@hdrinc.com> Message-ID: <9C4552F2D4B19C44970F1CB90360C991A7C6D98C@CSGMBX211W.pu.win.princeton.edu> One other note we ran up against in Princeton about 10-15 years ago: The Harvard lab (built perhaps 15-20 years ago) is below grade, but on one side the ground was somewhat excavated to let some minimal daylight in, so you might claim it is not below grade. As a result, they were able to either store (maybe) or use (that I?m fairly sure about) silane in the lab. We were designing a new building in a tight space, with some highly-paid consultants and architects who were supposedly experts on lab design and fire codes. They came up for us with something similar following the Harvard approach. After the design was done (and we had paid them), it turned out we found out that the national code (IBC, IFC??) that had allowed the Harvard approach had changed (which our ?experts? were not at all aware of), so their design (and all the time we sunk into it) was worthless, and we had to start over (with new consultants.) I don?t recall the exact technical details about H use and B use (are those the right terms?) but that is the gist of the story. )#)$#&*$(#&#$(#*(#&@!! So Beware (and be safe) Jim Sturm ******************************************** Prof. James C. Sturm Stephen R. Forrest Professor in Electrical Engineering Princeton University B410 E-Quad, Olden St. Princeton, NJ 08540 609-258-5610, fax: 609-258-1177 sturm at princeton.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Paul, Jack Sent: Thursday, December 07, 2017 8:37 PM To: Michael Hume ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Silane Installation below grade Michael, The building and fire codes in your jurisdiction (Edmonton) are probably different than the International Building and Fire Codes, but the general approach of those codes (IBC and IFC) is to restrict hazardous materials in basements because a) it is extremely difficult to fight fires at basement level, and b) basements are harder to exit, and c) typically basements cannot have explosion venting (as John Schott noted they had at Stanford). As a pyrophoric gas, silane deflagrates extremely fast ? almost fast enough to be officially labeled an ?explosion? and thus when it is stored indoors it is often required to have an explosion vent (this is the lightly fastened roof structure that John mentioned in his email). The IBC and IFC restrict the quantity of any pyrophoric material allowable in a single control area (i.e. one floor, or one fire-wall isolated area of a floor) to maximum of 4 lbs or 50 cu ft in storage, and 10 cu ft in ?use-closed system?. As I noted, your jurisdiction in Canada probably has not adopted the IBC and IFC, but my guess is that whatever code applies in your municipality, it will have similar restrictions. Additionally, it may also refer to CGA G13 (as does the IFC) for design requirements for silane systems, thus adopting CGA-13 by reference. In short ? you may be violating building and fire code restrictions by placing the silane in the basement level. Your campus architect or fire marshal should be able to provide guidance, or alternatively a friendly architect or lab planner. Jack Paul, RA, LEED AP BD+C D 602.474.3940 M 602.369.2086 hdrinc.com/follow-us From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Michael Hume Sent: Thursday, December 7, 2017 11:05 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Silane Installation below grade Hello Colleagues, We are in the process if installing a new PECVD system which will use 100% SiH4. In reviewing CGA-G13, it states: 7.2 Indoor storage and use Buildings, rooms, or areas used for silane storage shall be constructed in accordance with the requirements of the local AHJ. Silane shall not be stored in locations below grade and silane bulk sources shall not be located indoors. For transfilling exceptions, see Section 18. In our case, an installation below grade may be preferred. I am wondering if anyone can provide any insight into the reasoning behind this. Does anybody store/use Silane below grade? Thank-you, -Mike. -- PLEASE NOTE MY PHONE NUMBER HAS CHANGED: 780-953-5081 Michael Hume Operations Manager University of Alberta - nanoFAB W1-060 ECERF Building 9107 - 116 Street Edmonton, Alberta Canada T6G 2V4 www.nanofab.ualberta.ca Ph: 780-953-5081* (New) -------------- next part -------------- An HTML attachment was scrubbed... URL: From rizik at intengr.com Fri Dec 8 09:59:32 2017 From: rizik at intengr.com (rizik at intengr.com) Date: Fri, 8 Dec 2017 06:59:32 -0800 Subject: [labnetwork] Silane Installation below grade In-Reply-To: <35fd1573851f4ed18f17c48c9c5061e7@hdrinc.com> References: <35fd1573851f4ed18f17c48c9c5061e7@hdrinc.com> Message-ID: <000001d37035$286128b0$79237a10$@intengr.com> Michael & Jack, In Silicon Valley, CA 100% Silane gas cabinet indoor installation is not permitted by local jurisdictions. It is highly recommended that 100% Silane gas cabinets be installed within an exterior H-Occupancy gas bunker with 2-hour construction, explosion venting, ventilation to ensure less than 25% of the LEL in the event of a leak, Explosion proof lighting, etc. Let me know if we can be of any help. Rizik Michael, PE Principal Integrated Engineering Services 70 Saratoga Ave, Ste 200, Santa Clara, CA 95051 Office: (408) 261-3500, Ext. 201 Cell: (408) 718-0927 From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Paul, Jack Sent: Thursday, December 7, 2017 5:37 PM To: Michael Hume ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Silane Installation below grade Michael, The building and fire codes in your jurisdiction (Edmonton) are probably different than the International Building and Fire Codes, but the general approach of those codes (IBC and IFC) is to restrict hazardous materials in basements because a) it is extremely difficult to fight fires at basement level, and b) basements are harder to exit, and c) typically basements cannot have explosion venting (as John Schott noted they had at Stanford). As a pyrophoric gas, silane deflagrates extremely fast ? almost fast enough to be officially labeled an ?explosion? and thus when it is stored indoors it is often required to have an explosion vent (this is the lightly fastened roof structure that John mentioned in his email). The IBC and IFC restrict the quantity of any pyrophoric material allowable in a single control area (i.e. one floor, or one fire-wall isolated area of a floor) to maximum of 4 lbs or 50 cu ft in storage, and 10 cu ft in ?use-closed system?. As I noted, your jurisdiction in Canada probably has not adopted the IBC and IFC, but my guess is that whatever code applies in your municipality, it will have similar restrictions. Additionally, it may also refer to CGA G13 (as does the IFC) for design requirements for silane systems, thus adopting CGA-13 by reference. In short ? you may be violating building and fire code restrictions by placing the silane in the basement level. Your campus architect or fire marshal should be able to provide guidance, or alternatively a friendly architect or lab planner. Jack Paul, RA, LEED AP BD+C D 602.474.3940 M 602.369.2086 hdrinc.com/follow-us From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Michael Hume Sent: Thursday, December 7, 2017 11:05 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Silane Installation below grade Hello Colleagues, We are in the process if installing a new PECVD system which will use 100% SiH4. In reviewing CGA-G13, it states: 7.2 Indoor storage and use Buildings, rooms, or areas used for silane storage shall be constructed in accordance with the requirements of the local AHJ. Silane shall not be stored in locations below grade and silane bulk sources shall not be located indoors. For transfilling exceptions, see Section 18. In our case, an installation below grade may be preferred. I am wondering if anyone can provide any insight into the reasoning behind this. Does anybody store/use Silane below grade? Thank-you, -Mike. -- PLEASE NOTE MY PHONE NUMBER HAS CHANGED: 780-953-5081 Michael Hume Operations Manager University of Alberta - nanoFAB W1-060 ECERF Building 9107 - 116 Street Edmonton, Alberta Canada T6G 2V4 www.nanofab.ualberta.ca Ph: 780-953-5081* (New) -------------- next part -------------- An HTML attachment was scrubbed... URL: From JSwedell at COArchitects.com Fri Dec 8 12:46:30 2017 From: JSwedell at COArchitects.com (Jennifer Swedell) Date: Fri, 8 Dec 2017 17:46:30 +0000 Subject: [labnetwork] Silane Installation below grade In-Reply-To: <9C4552F2D4B19C44970F1CB90360C991A7C6D98C@CSGMBX211W.pu.win.princeton.edu> References: <35fd1573851f4ed18f17c48c9c5061e7@hdrinc.com> <9C4552F2D4B19C44970F1CB90360C991A7C6D98C@CSGMBX211W.pu.win.princeton.edu> Message-ID: <7560BD169693584E87A8135B54F927C61248F846@cs03emaild1.COArchitects.net> We recently conducted a site analysis for a basement lab where the PI was looking to purchase an instrument that would use toxic and pyrophoric gases. The site was on a corner of campus that had frequent pedestrian traffic and was adjacent to a major street in the city. The concern for public safety was paramount. Retrofitting the building with proper fire protection, egress and areaway access to satisfy both the code and the local fire marshal was more than the University wanted to spend or risk so the project went on hold. As an alternative, nearby off-campus single story industrial parks that allow lab build-outs are one way campuses are avoiding an uphill battle with codes. Jennifer Swedell, AIA, LEED Associate Principal, Laboratory Planner CO ARCHITECTS LA Office: 5055 Wilshire Blvd., Los Angeles, CA 90036 San Diego Office: 600 B Street, San Diego, CA 92101 Cell: 323.333.9237 jswedell at coarchitects.com www.coarchitects.com From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of James C. Sturm Sent: Friday, December 08, 2017 5:39 AM To: Paul, Jack ; Michael Hume ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Silane Installation below grade One other note we ran up against in Princeton about 10-15 years ago: The Harvard lab (built perhaps 15-20 years ago) is below grade, but on one side the ground was somewhat excavated to let some minimal daylight in, so you might claim it is not below grade. As a result, they were able to either store (maybe) or use (that I?m fairly sure about) silane in the lab. We were designing a new building in a tight space, with some highly-paid consultants and architects who were supposedly experts on lab design and fire codes. They came up for us with something similar following the Harvard approach. After the design was done (and we had paid them), it turned out we found out that the national code (IBC, IFC??) that had allowed the Harvard approach had changed (which our ?experts? were not at all aware of), so their design (and all the time we sunk into it) was worthless, and we had to start over (with new consultants.) I don?t recall the exact technical details about H use and B use (are those the right terms?) but that is the gist of the story. )#)$#&*$(#&#$(#*(#&@!! So Beware (and be safe) Jim Sturm ******************************************** Prof. James C. Sturm Stephen R. Forrest Professor in Electrical Engineering Princeton University B410 E-Quad, Olden St. Princeton, NJ 08540 609-258-5610, fax: 609-258-1177 sturm at princeton.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Paul, Jack Sent: Thursday, December 07, 2017 8:37 PM To: Michael Hume >; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Silane Installation below grade Michael, The building and fire codes in your jurisdiction (Edmonton) are probably different than the International Building and Fire Codes, but the general approach of those codes (IBC and IFC) is to restrict hazardous materials in basements because a) it is extremely difficult to fight fires at basement level, and b) basements are harder to exit, and c) typically basements cannot have explosion venting (as John Schott noted they had at Stanford). As a pyrophoric gas, silane deflagrates extremely fast ? almost fast enough to be officially labeled an ?explosion? and thus when it is stored indoors it is often required to have an explosion vent (this is the lightly fastened roof structure that John mentioned in his email). The IBC and IFC restrict the quantity of any pyrophoric material allowable in a single control area (i.e. one floor, or one fire-wall isolated area of a floor) to maximum of 4 lbs or 50 cu ft in storage, and 10 cu ft in ?use-closed system?. As I noted, your jurisdiction in Canada probably has not adopted the IBC and IFC, but my guess is that whatever code applies in your municipality, it will have similar restrictions. Additionally, it may also refer to CGA G13 (as does the IFC) for design requirements for silane systems, thus adopting CGA-13 by reference. In short ? you may be violating building and fire code restrictions by placing the silane in the basement level. Your campus architect or fire marshal should be able to provide guidance, or alternatively a friendly architect or lab planner. Jack Paul, RA, LEED AP BD+C D 602.474.3940 M 602.369.2086 hdrinc.com/follow-us From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Michael Hume Sent: Thursday, December 7, 2017 11:05 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Silane Installation below grade Hello Colleagues, We are in the process if installing a new PECVD system which will use 100% SiH4. In reviewing CGA-G13, it states: 7.2 Indoor storage and use Buildings, rooms, or areas used for silane storage shall be constructed in accordance with the requirements of the local AHJ. Silane shall not be stored in locations below grade and silane bulk sources shall not be located indoors. For transfilling exceptions, see Section 18. In our case, an installation below grade may be preferred. I am wondering if anyone can provide any insight into the reasoning behind this. Does anybody store/use Silane below grade? Thank-you, -Mike. -- PLEASE NOTE MY PHONE NUMBER HAS CHANGED: 780-953-5081 Michael Hume Operations Manager University of Alberta - nanoFAB W1-060 ECERF Building 9107 - 116 Street Edmonton, Alberta Canada T6G 2V4 www.nanofab.ualberta.ca Ph: 780-953-5081* (New) -------------- next part -------------- An HTML attachment was scrubbed... URL: From emailtodilan at gmail.com Fri Dec 8 15:36:24 2017 From: emailtodilan at gmail.com (Dilan Ratnayake) Date: Fri, 8 Dec 2017 15:36:24 -0500 Subject: [labnetwork] Low-stress Sputtered Ir In-Reply-To: References: Message-ID: Hi Matt, I have published a paper about engineering stress on PECVD and sputtered thin films and attached to this email. Hope this helps you. Let me know if you have any questions. Dilan Ratnayake On Thu, Nov 30, 2017 at 10:46 AM, Matthew Oonk wrote: > Hello all > We are having difficulty getting a low-stress (less than +/- 200MPA) > sputtered Ir film here for a couple of users. > > -It's a batch-to-batch variability so the first Ir wafer can vary between > -100 and >1000MPA for the first wafer and then films are consistently that > same stress wafer-to-wafer when we run 5 wafer batches. (There is a small > first wafer affect but not anywhere near the run-to-run magnitude shifts.) > > -We start with similar base pressure and we have tried pre-coating the > chamber with Ti and running Ir burn-in but the large batch-to-batch stress > variability persists. > > -We run low-stress similar metals such as Ti, W, Ta, TiW on the same tool > with consistent stress and these all respond typically to pressure and > power changes as well. > > -The vendor has very little insight. > > -The Ir film stress changes as expected with pressure, power and bias. So > we could run the film now by measuring the first wafer stress and then > adjusting the bias but this burns thru target and makes the runs more > likely to flake out on the shielding. > > > Does anybody run sputtered Ir with consistent stress? Any insight as to > what else we could try? > > Thanks for any information > -Matt > > Matthew Oonk > Research Engineer > Lurie Nanofabrication Facility > University of Michigan > 734-646-1275 <(734)%20646-1275> > mwoonk at umich.edu > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Ratnayake_2015_J._Micromech._Microeng._25_125025.pdf Type: application/pdf Size: 1269100 bytes Desc: not available URL: From agregg at abbiegregg.com Fri Dec 8 23:25:39 2017 From: agregg at abbiegregg.com (Abbie Gregg) Date: Sat, 9 Dec 2017 04:25:39 +0000 Subject: [labnetwork] Silane Installation below grade In-Reply-To: <9C4552F2D4B19C44970F1CB90360C991A7C6D98C@CSGMBX211W.pu.win.princeton.edu> References: <35fd1573851f4ed18f17c48c9c5061e7@hdrinc.com> <9C4552F2D4B19C44970F1CB90360C991A7C6D98C@CSGMBX211W.pu.win.princeton.edu> Message-ID: <00e3b40b300749e28e145ba36ca0010b@mail31.netvigour.com> Hi All, I am sorry to hear that someone provided a design that could not work for you, James. AGI participated in the Harvard LISE Nanofab design and more recently in the U of Chicago WERC Nanofab and USC MCB Nanofab Designs of the H occupancy cleanrooms below grade. In general, although these were all covered by different codes, the following allowed them to be constructed with the full approval of the Authorities having jurisdiction. We have had success with this approach on both level and sloped sites. Duke University FCIEMAS and the UC Berkeley Nanofab use similar techniques due to their unique locations on a sloped site. 1- The HPM (H-2/4 and H-3/4) storage and dispense rooms (gas cabinet and bottle location) were located AT Grade, even though the H-5 occupancy for the Nanofab is below grade. The gases were piped down to the cleanroom in stainless steel tubing (double wall in the required cases) with gas monitoring, via properly separated shafts with firestopping etc. This worked very well and did not require hazardous gas bottles such as those for Highly toxic or pyrophoric gases to travel anyplace but a few feet from the loading dock or outdoors, directly to HPM rooms at grade. These HPM rooms have exposed outside walls (25% of perimeter), doors to outside, explosion venting, explosion proof lighting etc?. Only the tubing with a very small amount of hazardous gas at much lower pressure travels to the Cleanroom and labs below for use in process tools. 2- Note that there is a calculation in the code to establish exactly where the ?grade plane? is, and how much of the floor is ?below grade?. Thus , the Harvard HPM rooms are NOT actually located Below grade according to the calculation at that time. However, a variance was also obtained related to the canopy over the loading dock. . 3- Fire department approach and egress of occupants are provided by a large Areaway and stair from the Lower level cleanroom to allow for proper egress from the H-5 Occupancy below grade. Fire departments have varying ideas of how they would like those areaways and access stairs to be configured, based on their equipment and local codes. It is essential to configure the areaway to meet their needs. 4- In all cases a few conversations with the local fire department, building officials and other authorities having jurisdiction are strongly suggested to be done early! Often a variance is required, which has not been denied, after a collaborative design, in our experience. Our experience with this continues to the present day all over the USA and abroad. The use of SEMs and EBeam lithography as well as TEMs, and other vibration sensitive tools to support Nanofabrication efforts in clean or close to clean environments, have pushed nanofabs in urban or otherwise vibration and EMI prone settings, to want the cleanrooms below grade where abatement of disturbances occurs, and better tool performance is possible. Best Regards, Abbie Gregg President Abbie Gregg, Inc. 1130 East University Drive, Suite 105 Tempe, Arizona 85281 Phone 480 446-8000 x 107 Cell 480-577-5083 FAX 480-446-8001 email agregg at abbiegregg.com website www.abbiegregg.com CONFIDENTIALITY NOTICE: All information contained in or attached to this email constitutes confidential information belonging to Abbie Gregg, Inc., its affiliates and subsidiaries and/or its clients. This email and any attachments are proprietary and/or confidential and are intended for business use of the addressee(s) only. All other uses or disclosures are strictly prohibited. If the reader is not the intended recipient you are hereby notified that the perusal, copying or dissemination of this email is strictly prohibited. If you have received this communication in error, please notify the sender, and delete all copies of this message and its attachments immediately. From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of James C. Sturm Sent: Friday, December 8, 2017 6:39 AM To: Paul, Jack ; Michael Hume ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Silane Installation below grade One other note we ran up against in Princeton about 10-15 years ago: The Harvard lab (built perhaps 15-20 years ago) is below grade, but on one side the ground was somewhat excavated to let some minimal daylight in, so you might claim it is not below grade. As a result, they were able to either store (maybe) or use (that I?m fairly sure about) silane in the lab. We were designing a new building in a tight space, with some highly-paid consultants and architects who were supposedly experts on lab design and fire codes. They came up for us with something similar following the Harvard approach. After the design was done (and we had paid them), it turned out we found out that the national code (IBC, IFC??) that had allowed the Harvard approach had changed (which our ?experts? were not at all aware of), so their design (and all the time we sunk into it) was worthless, and we had to start over (with new consultants.) I don?t recall the exact technical details about H use and B use (are those the right terms?) but that is the gist of the story. )#)$#&*$(#&#$(#*(#&@!! So Beware (and be safe) Jim Sturm ******************************************** Prof. James C. Sturm Stephen R. Forrest Professor in Electrical Engineering Princeton University B410 E-Quad, Olden St. Princeton, NJ 08540 609-258-5610, fax: 609-258-1177 sturm at princeton.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Paul, Jack Sent: Thursday, December 07, 2017 8:37 PM To: Michael Hume >; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Silane Installation below grade Michael, The building and fire codes in your jurisdiction (Edmonton) are probably different than the International Building and Fire Codes, but the general approach of those codes (IBC and IFC) is to restrict hazardous materials in basements because a) it is extremely difficult to fight fires at basement level, and b) basements are harder to exit, and c) typically basements cannot have explosion venting (as John Schott noted they had at Stanford). As a pyrophoric gas, silane deflagrates extremely fast ? almost fast enough to be officially labeled an ?explosion? and thus when it is stored indoors it is often required to have an explosion vent (this is the lightly fastened roof structure that John mentioned in his email). The IBC and IFC restrict the quantity of any pyrophoric material allowable in a single control area (i.e. one floor, or one fire-wall isolated area of a floor) to maximum of 4 lbs or 50 cu ft in storage, and 10 cu ft in ?use-closed system?. As I noted, your jurisdiction in Canada probably has not adopted the IBC and IFC, but my guess is that whatever code applies in your municipality, it will have similar restrictions. Additionally, it may also refer to CGA G13 (as does the IFC) for design requirements for silane systems, thus adopting CGA-13 by reference. In short ? you may be violating building and fire code restrictions by placing the silane in the basement level. Your campus architect or fire marshal should be able to provide guidance, or alternatively a friendly architect or lab planner. Jack Paul, RA, LEED AP BD+C D 602.474.3940 M 602.369.2086 hdrinc.com/follow-us From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Michael Hume Sent: Thursday, December 7, 2017 11:05 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Silane Installation below grade Hello Colleagues, We are in the process if installing a new PECVD system which will use 100% SiH4. In reviewing CGA-G13, it states: 7.2 Indoor storage and use Buildings, rooms, or areas used for silane storage shall be constructed in accordance with the requirements of the local AHJ. Silane shall not be stored in locations below grade and silane bulk sources shall not be located indoors. For transfilling exceptions, see Section 18. In our case, an installation below grade may be preferred. I am wondering if anyone can provide any insight into the reasoning behind this. Does anybody store/use Silane below grade? Thank-you, -Mike. -- PLEASE NOTE MY PHONE NUMBER HAS CHANGED: 780-953-5081 Michael Hume Operations Manager University of Alberta - nanoFAB W1-060 ECERF Building 9107 - 116 Street Edmonton, Alberta Canada T6G 2V4 www.nanofab.ualberta.ca Ph: 780-953-5081* (New) -------------- next part -------------- An HTML attachment was scrubbed... URL: From jdeng at cns.fas.harvard.edu Sun Dec 10 22:59:59 2017 From: jdeng at cns.fas.harvard.edu (Deng, Jiangdong) Date: Mon, 11 Dec 2017 03:59:59 +0000 Subject: [labnetwork] Silane Installation below grade In-Reply-To: <00e3b40b300749e28e145ba36ca0010b@mail31.netvigour.com> References: <35fd1573851f4ed18f17c48c9c5061e7@hdrinc.com> <9C4552F2D4B19C44970F1CB90360C991A7C6D98C@CSGMBX211W.pu.win.princeton.edu> <00e3b40b300749e28e145ba36ca0010b@mail31.netvigour.com> Message-ID: Hi, All, Sounds that Harvard silane gas room caused some confusion in the network. Many thanks to Abbie for such detailed clarification! I couldn?t know and explain better than her:) One more note I would like to add is, our silane gas cabinets were installed in 2006, and compliant with the older regulations (2006). Last year, the cabinets had been upgraded and certificated to meet the new code 2015 (mainly modified the exhausting/venting line). If you are interested in more details, please let us know. Best regards, and happy holidays! -JD -- Jiangdong Deng (JD), Ph.D, Associate Director, Nanofabrication Facility, Center for Nanoscale Systems, Harvard University, Cambridge, MA 02138 Tel: 617-495-3396 From: > on behalf of Abbie Gregg > Date: Friday, December 8, 2017 at 11:25 PM To: "James C. Sturm" >, "Paul, Jack" >, Michael Hume >, "labnetwork at mtl. Network" > Subject: Re: [labnetwork] Silane Installation below grade Hi All, I am sorry to hear that someone provided a design that could not work for you, James. AGI participated in the Harvard LISE Nanofab design and more recently in the U of Chicago WERC Nanofab and USC MCB Nanofab Designs of the H occupancy cleanrooms below grade. In general, although these were all covered by different codes, the following allowed them to be constructed with the full approval of the Authorities having jurisdiction. We have had success with this approach on both level and sloped sites. Duke University FCIEMAS and the UC Berkeley Nanofab use similar techniques due to their unique locations on a sloped site. 1- The HPM (H-2/4 and H-3/4) storage and dispense rooms (gas cabinet and bottle location) were located AT Grade, even though the H-5 occupancy for the Nanofab is below grade. The gases were piped down to the cleanroom in stainless steel tubing (double wall in the required cases) with gas monitoring, via properly separated shafts with firestopping etc. This worked very well and did not require hazardous gas bottles such as those for Highly toxic or pyrophoric gases to travel anyplace but a few feet from the loading dock or outdoors, directly to HPM rooms at grade. These HPM rooms have exposed outside walls (25% of perimeter), doors to outside, explosion venting, explosion proof lighting etc?. Only the tubing with a very small amount of hazardous gas at much lower pressure travels to the Cleanroom and labs below for use in process tools. 2- Note that there is a calculation in the code to establish exactly where the ?grade plane? is, and how much of the floor is ?below grade?. Thus , the Harvard HPM rooms are NOT actually located Below grade according to the calculation at that time. However, a variance was also obtained related to the canopy over the loading dock. . 3- Fire department approach and egress of occupants are provided by a large Areaway and stair from the Lower level cleanroom to allow for proper egress from the H-5 Occupancy below grade. Fire departments have varying ideas of how they would like those areaways and access stairs to be configured, based on their equipment and local codes. It is essential to configure the areaway to meet their needs. 4- In all cases a few conversations with the local fire department, building officials and other authorities having jurisdiction are strongly suggested to be done early! Often a variance is required, which has not been denied, after a collaborative design, in our experience. Our experience with this continues to the present day all over the USA and abroad. The use of SEMs and EBeam lithography as well as TEMs, and other vibration sensitive tools to support Nanofabrication efforts in clean or close to clean environments, have pushed nanofabs in urban or otherwise vibration and EMI prone settings, to want the cleanrooms below grade where abatement of disturbances occurs, and better tool performance is possible. Best Regards, Abbie Gregg President Abbie Gregg, Inc. 1130 East University Drive, Suite 105 Tempe, Arizona 85281 Phone 480 446-8000 x 107 Cell 480-577-5083 FAX 480-446-8001 email agregg at abbiegregg.com website www.abbiegregg.com CONFIDENTIALITY NOTICE: All information contained in or attached to this email constitutes confidential information belonging to Abbie Gregg, Inc., its affiliates and subsidiaries and/or its clients. This email and any attachments are proprietary and/or confidential and are intended for business use of the addressee(s) only. All other uses or disclosures are strictly prohibited. If the reader is not the intended recipient you are hereby notified that the perusal, copying or dissemination of this email is strictly prohibited. If you have received this communication in error, please notify the sender, and delete all copies of this message and its attachments immediately. From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of James C. Sturm Sent: Friday, December 8, 2017 6:39 AM To: Paul, Jack >; Michael Hume >; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Silane Installation below grade One other note we ran up against in Princeton about 10-15 years ago: The Harvard lab (built perhaps 15-20 years ago) is below grade, but on one side the ground was somewhat excavated to let some minimal daylight in, so you might claim it is not below grade. As a result, they were able to either store (maybe) or use (that I?m fairly sure about) silane in the lab. We were designing a new building in a tight space, with some highly-paid consultants and architects who were supposedly experts on lab design and fire codes. They came up for us with something similar following the Harvard approach. After the design was done (and we had paid them), it turned out we found out that the national code (IBC, IFC??) that had allowed the Harvard approach had changed (which our ?experts? were not at all aware of), so their design (and all the time we sunk into it) was worthless, and we had to start over (with new consultants.) I don?t recall the exact technical details about H use and B use (are those the right terms?) but that is the gist of the story. )#)$#&*$(#&#$(#*(#&@!! So Beware (and be safe) Jim Sturm ******************************************** Prof. James C. Sturm Stephen R. Forrest Professor in Electrical Engineering Princeton University B410 E-Quad, Olden St. Princeton, NJ 08540 609-258-5610, fax: 609-258-1177 sturm at princeton.edu From:labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Paul, Jack Sent: Thursday, December 07, 2017 8:37 PM To: Michael Hume >; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Silane Installation below grade Michael, The building and fire codes in your jurisdiction (Edmonton) are probably different than the International Building and Fire Codes, but the general approach of those codes (IBC and IFC) is to restrict hazardous materials in basements because a) it is extremely difficult to fight fires at basement level, and b) basements are harder to exit, and c) typically basements cannot have explosion venting (as John Schott noted they had at Stanford). As a pyrophoric gas, silane deflagrates extremely fast ? almost fast enough to be officially labeled an ?explosion? and thus when it is stored indoors it is often required to have an explosion vent (this is the lightly fastened roof structure that John mentioned in his email). The IBC and IFC restrict the quantity of any pyrophoric material allowable in a single control area (i.e. one floor, or one fire-wall isolated area of a floor) to maximum of 4 lbs or 50 cu ft in storage, and 10 cu ft in ?use-closed system?. As I noted, your jurisdiction in Canada probably has not adopted the IBC and IFC, but my guess is that whatever code applies in your municipality, it will have similar restrictions. Additionally, it may also refer to CGA G13 (as does the IFC) for design requirements for silane systems, thus adopting CGA-13 by reference. In short ? you may be violating building and fire code restrictions by placing the silane in the basement level. Your campus architect or fire marshal should be able to provide guidance, or alternatively a friendly architect or lab planner. Jack Paul,RA, LEED AP BD+C D 602.474.3940 M 602.369.2086 hdrinc.com/follow-us From:labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Michael Hume Sent: Thursday, December 7, 2017 11:05 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Silane Installation below grade Hello Colleagues, We are in the process if installing a new PECVD system which will use 100% SiH4. In reviewing CGA-G13, it states: 7.2 Indoor storage and use Buildings, rooms, or areas used for silane storage shall be constructed in accordance with the requirements of the local AHJ. Silane shall not be stored in locations below grade and silane bulk sources shall not be located indoors. For transfilling exceptions, see Section 18. In our case, an installation below grade may be preferred. I am wondering if anyone can provide any insight into the reasoning behind this. Does anybody store/use Silane below grade? Thank-you, -Mike. -- PLEASE NOTE MY PHONE NUMBER HAS CHANGED:780-953-5081 Michael Hume Operations Manager University of Alberta - nanoFAB W1-060 ECERF Building 9107 - 116 Street Edmonton, Alberta Canada T6G 2V4 www.nanofab.ualberta.ca Ph: 780-953-5081* (New) -------------- next part -------------- An HTML attachment was scrubbed... URL: From HASENKAMP at unisinos.br Wed Dec 13 15:54:18 2017 From: HASENKAMP at unisinos.br (Willyan Hasenkamp Carreira) Date: Wed, 13 Dec 2017 20:54:18 +0000 Subject: [labnetwork] Tools for a new lab Message-ID: Hello Everybody, I?ve recently registered to this mailing (thanks to Mary Tang from Stanford) and it?s great. We have recently finished our small cleanroom, down south in Brazil, and just yesterday we got the grant for purchasing a few microfabrication tools. Literaly we have nothing, lab is empty... but we would like to start doing some microsystems. It would be very nice to have your opinion and references on equipment we could purchase. Please consider equipment flexibility, versatility, maintainance cost and difficulties. Also, students will be allowed to use them... which can be a burden. I do not know if we are going in a good direction but we have selected some equipment to start with: - Laserwriter (which way to go? Maskless aligner or direct laser write. Any suggestion? Brand? We know of Heidelberg, but what about Microwriter ML3 or Picomaster 2000, anyother? Does anybody have some comments?) - Mask aligner... we will need it if the choice is to go with direct laser write... (Here we have suss and evg. Which one would you prefer?) - Plasma etch - RIE (Any equipment suggestion? We found Oxford equipment... any other that could fit?) - Sputtering/PECVD (Does a dual system for metal and dielectrics make sense? Which fabricant do you have a good user and maintainance experience?) - Wetbench... (its hard to find such things here in Brazil. Do you have any configuration suggestion that has being working?) - Resist coating and development (Any suggestion? Suss has some things but are there other suggestions? I think Brewer also have some things...) - Other suggestions? Wafer bonding, RTP, spin track for coat and dev, oven... It is really basic things, we just once dreamed to build such small facility 5 years ago and things are fortunately moving. Also some disclaimer... We have never done it, all the people here probably have used your facilities but it is another level to build and run one... therefore your honest opion is again extremelly important. Thank you all for your attention and I will keep you posted how things move on. Kind regards, Willyan -- Willyan Hasenkamp Universidade do Vale do Rio dos Sinos - Unisinos Instituto Tecnol?gico de Semicondutores - itt Chip Escola Polit?cnica Programa de P?s-Gradua??o em Engenharia El?trica Av. Unisinos 950, 93022-750, S?o Leopoldo, RS www.unisinos.br - Phone: +55 (51) 3591-1122 / Ramal: 3181 Aviso legal: Esta mensagem eletr?nica e seus respectivos anexos, podem conter informa??es confidenciais. Se voc? n?o ? o(a) destinat?rio(a) correto(a) e/ou o conte?do do e-mail n?o lhe diz respeito notifique-nos, respondendo a este e-mail com c?pia para esirc at asav.org.br, e apague-o imediatamente. Fica, desde j?, notificado que qualquer a??o baseada no conte?do desta mensagem ? estritamente proibida e ilegal. -------------- next part -------------- An HTML attachment was scrubbed... URL: From nclay at upenn.edu Wed Dec 13 20:18:56 2017 From: nclay at upenn.edu (Noah Clay) Date: Thu, 14 Dec 2017 02:18:56 +0100 Subject: [labnetwork] Tools for a new lab In-Reply-To: References: Message-ID: Hello Willyan, It?s great to hear about your new facility. Congratulations! Most of us received assistance from experienced semiconductor equipment design firms to develop a master plan for tool layout. It?s great that you?re reaching out with advice on fab tools. While you?re assembling the list, if you haven?t already, please consider working with a firm to design the tool layout and installation package. Best wishes, Noah Clay University of Pennsylvania Philadelphia, PA Sent from my iPhone > On Dec 13, 2017, at 21:54, Willyan Hasenkamp Carreira wrote: > > Hello Everybody, > > I?ve recently registered to this mailing (thanks to Mary Tang from Stanford) and it?s great. > We have recently finished our small cleanroom, down south in Brazil, and just yesterday we got the grant for purchasing a few microfabrication tools. > Literaly we have nothing, lab is empty... but we would like to start doing some microsystems. > > It would be very nice to have your opinion and references on equipment we could purchase. > Please consider equipment flexibility, versatility, maintainance cost and difficulties. Also, students will be allowed to use them... which can be a burden. > > I do not know if we are going in a good direction but we have selected some equipment to start with: > - Laserwriter (which way to go? Maskless aligner or direct laser write. Any suggestion? Brand? We know of Heidelberg, but what about Microwriter ML3 or Picomaster 2000, anyother? Does anybody have some comments?) > - Mask aligner... we will need it if the choice is to go with direct laser write... (Here we have suss and evg. Which one would you prefer?) > - Plasma etch ? RIE (Any equipment suggestion? We found Oxford equipment... any other that could fit?) > - Sputtering/PECVD (Does a dual system for metal and dielectrics make sense? Which fabricant do you have a good user and maintainance experience?) > - Wetbench... (its hard to find such things here in Brazil. Do you have any configuration suggestion that has being working?) > - Resist coating and development (Any suggestion? Suss has some things but are there other suggestions? I think Brewer also have some things...) > > - Other suggestions? Wafer bonding, RTP, spin track for coat and dev, oven... > > It is really basic things, we just once dreamed to build such small facility 5 years ago and things are fortunately moving. > Also some disclaimer... We have never done it, all the people here probably have used your facilities but it is another level to build and run one... therefore your honest opion is again extremelly important. Thank you all for your attention and I will keep you posted how things move on. > > Kind regards, > Willyan > > -- > Willyan Hasenkamp > Universidade do Vale do Rio dos Sinos - Unisinos > Instituto Tecnol?gico de Semicondutores - itt Chip > Escola Polit?cnica > Programa de P?s-Gradua??o em Engenharia El?trica > Av. Unisinos 950, 93022-750, S?o Leopoldo, RS > www.unisinos.br - Phone: +55 (51) 3591-1122 / Ramal: 3181 > > > Aviso legal: Esta mensagem eletr?nica e seus respectivos anexos, podem conter informa??es confidenciais. Se voc? n?o ? o(a) destinat?rio(a) correto(a) e/ou o conte?do do e-mail n?o lhe diz respeito notifique-nos, respondendo a este e-mail com c?pia para esirc at asav.org.br, e apague-o imediatamente. Fica, desde j?, notificado que qualquer a??o baseada no conte?do desta mensagem ? estritamente proibida e ilegal. > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From jguo5 at Central.UH.EDU Thu Dec 14 12:50:05 2017 From: jguo5 at Central.UH.EDU (Guo, Jing) Date: Thu, 14 Dec 2017 11:50:05 -0600 Subject: [labnetwork] Sputtering targets storage Message-ID: <5CFDEA6C-BA36-4EEF-9890-90D5659AB370@central.uh.edu> Hi All, We have a lot sputtering targets for our UHV sputtering system. Right now each target is covered by Aluminum foil stored in a plastic box. We are wondering whether the Aluminum foil is necessary for all the targets. After several times the foil will become wrinkled and it is kind annoying to cover a target with wrinkled foil. Do you have any good idea to store those targets? Please advise. And for those used ones, any good way to dispose them or recycle them? Thanks. Best Regards, Jing Research Lab Supervisor Nanofabrication Facility University of Houston Postal Address: UNIVERSITY OF HOUSTON NANOFABRICATION FACILITY 3517 CULLEN BLVD, RM 1011 HOUSTON TX 77204-5062 Phone: 832-842-8822 Email: jguo5 at central.uh.edu Web: www.uh.edu/nanofab -------------- next part -------------- An HTML attachment was scrubbed... URL: From bill_flounders at berkeley.edu Thu Dec 14 13:30:14 2017 From: bill_flounders at berkeley.edu (A. William (Bill) FLOUNDERS) Date: Thu, 14 Dec 2017 10:30:14 -0800 Subject: [labnetwork] Tools for a new lab In-Reply-To: References: Message-ID: Willyan, Congratulations on completion of your cleanroom! I recall your initial inquiries in 2012. I expect you will receive many labnet responses to your inquiry. When communicating within/through the network, we avoid identifying, recommending, or discouraging specific vendors. However, personal recommendations or advisements are often offered via separate email directly to the poster. Network recommendations are more generic and I note Noah Clay from UPenn has already set an excellent tone by encouraging you to consider a firm for layout and install support. Similarly, I offer two thoughts: 1. Noah is being too modest - UPenn will host the next UGIM conference https://ugim.nano.upenn.edu/ This is an excellent forum for you to hear personal stories and receive in person vendor and equipment reviews (good and bad) from many of us. 2. I compliment your initial focus on wet benches and general purpose lithography equipment. This is the necessary and best place to start. I hope to see you in Philadelphia in June 2018. Bill Flounders UC Berkeley On Wed, Dec 13, 2017 at 12:54 PM, Willyan Hasenkamp Carreira < HASENKAMP at unisinos.br> wrote: > Hello Everybody, > > > > I?ve recently registered to this mailing (thanks to Mary Tang from > Stanford) and it?s great. > > We have recently finished our small cleanroom, down south in Brazil, and > just yesterday we got the grant for purchasing a few microfabrication tools. > > Literaly we have nothing, lab is empty... but we would like to start doing > some microsystems. > > > > It would be very nice to have your opinion and references on equipment we > could purchase. > > Please consider equipment flexibility, versatility, maintainance cost and > difficulties. Also, students will be allowed to use them... which can be a > burden. > > > > I do not know if we are going in a good direction but we have selected > some equipment to start with: > > - Laserwriter (which way to go? Maskless aligner or direct laser write. > Any suggestion? Brand? We know of Heidelberg, but what about Microwriter > ML3 or Picomaster 2000, anyother? Does anybody have some comments?) > > - Mask aligner... we will need it if the choice is to go with direct laser > write... (Here we have suss and evg. Which one would you prefer?) > > - Plasma etch ? RIE (Any equipment suggestion? We found Oxford > equipment... any other that could fit?) > > - Sputtering/PECVD (Does a dual system for metal and dielectrics make > sense? Which fabricant do you have a good user and maintainance experience?) > > - Wetbench... (its hard to find such things here in Brazil. Do you have > any configuration suggestion that has being working?) > > - Resist coating and development (Any suggestion? Suss has some things but > are there other suggestions? I think Brewer also have some things...) > > > > - Other suggestions? Wafer bonding, RTP, spin track for coat and dev, > oven... > > > > It is really basic things, we just once dreamed to build such small > facility 5 years ago and things are fortunately moving. > > Also some disclaimer... We have never done it, all the people here > probably have used your facilities but it is another level to build and run > one... therefore your honest opion is again extremelly important. Thank you > all for your attention and I will keep you posted how things move on. > > > > Kind regards, > > Willyan > > > > -- > > *Willyan Hasenkamp* > > Universidade do Vale do Rio dos Sinos - Unisinos > > Instituto Tecnol?gico de Semicondutores - itt Chip > > Escola Polit?cnica > > Programa de P?s-Gradua??o em Engenharia El?trica > > Av. Unisinos 950, 93022-750, S?o Leopoldo, RS > > www.unisinos.br - Phone: +55 (51) 3591-1122 <+55%2051%203591-1122> / > Ramal: 3181 > > > > *Aviso legal*: Esta mensagem eletr?nica e seus respectivos anexos, podem > conter informa??es confidenciais. Se voc? n?o ? o(a) destinat?rio(a) > correto(a) e/ou o conte?do do *e-mail* n?o lhe diz respeito > notifique-nos, respondendo a este *e-mail* com c?pia para > esirc at asav.org.br, e apague-o imediatamente. Fica, desde j?, notificado > que qualquer a??o baseada no conte?do desta mensagem ? estritamente > proibida e ilegal. > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From maryna at neuralink.com Thu Dec 14 15:12:04 2017 From: maryna at neuralink.com (Maryna Sivaieva) Date: Thu, 14 Dec 2017 12:12:04 -0800 Subject: [labnetwork] Looking for a Laboratory Manager to help us merge biological and digital intelligence! Message-ID: Hello! Here at Neuralink we are currently developing high bandwidth brain-machine interfaces. We are looking for our first Laboratory Manager to facilitate state of the art research in nanotechnology and microelectromechanical systems by managing cleanroom, laboratory build-out, and operations. If you are up for the challenge please click on the following link to learn more and apply: https://jobs.lever.co/neuralink/3715b6f3-6f90-4930-8e9a-5ae5c7184c02 Thank you! Sincerely, Maryna -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Thu Dec 14 15:52:48 2017 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Thu, 14 Dec 2017 20:52:48 +0000 Subject: [labnetwork] Sputtering targets storage In-Reply-To: <5CFDEA6C-BA36-4EEF-9890-90D5659AB370@central.uh.edu> References: <5CFDEA6C-BA36-4EEF-9890-90D5659AB370@central.uh.edu> Message-ID: We currently do not store our targets in foil. Only in the container they arrived in and in a storage cabinet in the cleanroom. Cheers! Julia Aebersold Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Guo, Jing Sent: Thursday, December 14, 2017 12:50 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Sputtering targets storage Hi All, We have a lot sputtering targets for our UHV sputtering system. Right now each target is covered by Aluminum foil stored in a plastic box. We are wondering whether the Aluminum foil is necessary for all the targets. After several times the foil will become wrinkled and it is kind annoying to cover a target with wrinkled foil. Do you have any good idea to store those targets? Please advise. And for those used ones, any good way to dispose them or recycle them? Thanks. Best Regards, Jing Research Lab Supervisor Nanofabrication Facility University of Houston Postal Address: UNIVERSITY OF HOUSTON NANOFABRICATION FACILITY 3517 CULLEN BLVD, RM 1011 HOUSTON TX 77204-5062 Phone: 832-842-8822 Email: jguo5 at central.uh.edu Web: www.uh.edu/nanofab -------------- next part -------------- An HTML attachment was scrubbed... URL: From rdevito at draper.com Thu Dec 14 16:16:09 2017 From: rdevito at draper.com (DeVito, Richard) Date: Thu, 14 Dec 2017 21:16:09 +0000 Subject: [labnetwork] Sputtering targets storage In-Reply-To: <5CFDEA6C-BA36-4EEF-9890-90D5659AB370@central.uh.edu> References: <5CFDEA6C-BA36-4EEF-9890-90D5659AB370@central.uh.edu> Message-ID: Don't use generic aluminum foil ,they spray it with vegetable oil so it won't bind!. You must clean it or buy pre cleaned foil. We generally store our targets in a desiccator . The sensitive ones we purge the cabinets with N2 Rich DeVito Principle Member Technical Staff Group Leader Microfabrication Lab Draper 555 Technology Square, Cambridge, MA 02139 Phone: 617-258-3819 www.draper.com From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Guo, Jing Sent: Thursday, December 14, 2017 12:50 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Sputtering targets storage Hi All, We have a lot sputtering targets for our UHV sputtering system. Right now each target is covered by Aluminum foil stored in a plastic box. We are wondering whether the Aluminum foil is necessary for all the targets. After several times the foil will become wrinkled and it is kind annoying to cover a target with wrinkled foil. Do you have any good idea to store those targets? Please advise. And for those used ones, any good way to dispose them or recycle them? Thanks. Best Regards, Jing Research Lab Supervisor Nanofabrication Facility University of Houston Postal Address: UNIVERSITY OF HOUSTON NANOFABRICATION FACILITY 3517 CULLEN BLVD, RM 1011 HOUSTON TX 77204-5062 Phone: 832-842-8822 Email: jguo5 at central.uh.edu Web: www.uh.edu/nanofab ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From hathaway at cns.fas.harvard.edu Thu Dec 14 16:35:01 2017 From: hathaway at cns.fas.harvard.edu (Mac Hathaway) Date: Thu, 14 Dec 2017 16:35:01 -0500 Subject: [labnetwork] Tools for a new lab In-Reply-To: References: Message-ID: <5A32EE85.9050105@cns.fas.harvard.edu> Hi Willyan, Sounds like a fun project you've got there! So, to steer the discussion a bit, perhaps you could share some details: How much clean space do you have (inside cleanroom, under HEPA coverage, as opposed to "gray area" or "chase", where pumps go)? How much chase area do you have? At Harvard, we have found that roughly equal is good, and possibly a bit more than 50% chase area would be nice, too, if you get handy with bulk-head mounting of equipment (i.e. mounting systems through a hole in the cleanroom wall, so the back-end of tool is in chase). What class room is it? (Class 10, 100, 1000, etc). What is your own level of semiconductor experience? Just academic cleanrooms, worked for Intel/IBM, worked for capital equipment vendor (Lam/Ulvac/Applied Materials)? This will help folks know what level of details to go into in their answers. What do your professors want to work on? This is usually the first question we ask when considering new purchases. What do you expect the balance to be between academic users and commercial users (startup companies will often use shared-use facilities to demonstrate "proof-of-concept", before they get major funding for their own facilities.) From my own experience, I would say: Never mind a track system, as they are more aimed at cassette-loads and full wafers, i.e. industrial users. Ditto wafer bonder. Ours gets very little use. Our maskless aligners seem to be getting very popular. Atomic Layer Deposition should be on your list, unless you know everyone will only be making large devices with micron-scale films (as opposed to nano-scale films less than 200nm). They are cheap, easy to maintain, and, at CNS, easily the 3rd or 4th busiest tools (after evaporators, sputters, and E-Beam lithography, which probably is not on your list). Very handy, easy to use, just the ticket! Last but not least!: What is your budget? That is usually the most determining factor, for all of us! Do you think you will get continuing/any support from your institution, or do you have to make your first infusion of money go a really long way?... With a few experienced, saavy engineers, you can make a few $100K go a long way with used equipment, carefully selected. (Well, maybe not a /long/ way...) And, since our characterization guru just walked in, have you given thought to characterization equipment, and at least a few metrology tools? Profilometer, ellipsometer, and a few high quality microscopes, I should think... Let us know about the above parameters, and the ideas will start flowing, no doubt. One approach, if these questions are keeping you up at night, is to go various academic cleanroom websites (Harvard CNS, Cornell, Stanford, Berkeley, all the old NNIN and the new NNCI locations) and look at their tool sets. This will give you some good ideas for a starting place (similar to the items on your list, but with vendor/model information). Mac Mac Hathaway Senior Process and Systems Engineer Harvard Center for Nanoscale Systems 11 Oxford St. Cambridge, MA02138 617-495-9012 On 12/14/2017 1:30 PM, A. William (Bill) FLOUNDERS wrote: > Willyan, > Congratulations on completion of your cleanroom! > I recall your initial inquiries in 2012. > I expect you will receive many labnet responses to your inquiry. > When communicating within/through the network, we avoid > identifying, recommending, or discouraging specific vendors. > However, personal recommendations or advisements are often > offered via separate email directly to the poster. > > Network recommendations are more generic and I note Noah Clay from UPenn > has already set an excellent tone by encouraging you to consider a > firm for layout > and install support. > > Similarly, I offer two thoughts: > 1. Noah is being too modest - UPenn will host the next UGIM conference > https://ugim.nano.upenn.edu/ > > This is an excellent forum for you to hear personal stories and receive in > person vendor and equipment reviews (good and bad) from many of us. > > 2. I compliment your initial focus on wet benches and general purpose > lithography > equipment. This is the necessary and best place to start. > > I hope to see you in Philadelphia in June 2018. > Bill Flounders > UC Berkeley > > > On Wed, Dec 13, 2017 at 12:54 PM, Willyan Hasenkamp Carreira > > wrote: > > Hello Everybody, > > I?ve recently registered to this mailing (thanks to Mary Tang from > Stanford) and it?s great. > > We have recently finished our small cleanroom, down south in > Brazil, and just yesterday we got the grant for purchasing a few > microfabrication tools. > > Literaly we have nothing, lab is empty... but we would like to > start doing some microsystems. > > It would be very nice to have your opinion and references on > equipment we could purchase. > > Please consider equipment flexibility, versatility, maintainance > cost and difficulties. Also, students will be allowed to use > them... which can be a burden. > > I do not know if we are going in a good direction but we have > selected some equipment to start with: > > - Laserwriter (which way to go? Maskless aligner or direct laser > write. Any suggestion? Brand? We know of Heidelberg, but what > about Microwriter ML3 or Picomaster 2000, anyother? Does anybody > have some comments?) > > - Mask aligner... we will need it if the choice is to go with > direct laser write... (Here we have suss and evg. Which one would > you prefer?) > > - Plasma etch -- RIE (Any equipment suggestion? We found Oxford > equipment... any other that could fit?) > > - Sputtering/PECVD (Does a dual system for metal and dielectrics > make sense? Which fabricant do you have a good user and > maintainance experience?) > > - Wetbench... (its hard to find such things here in Brazil. Do you > have any configuration suggestion that has being working?) > > - Resist coating and development (Any suggestion? Suss has some > things but are there other suggestions? I think Brewer also have > some things...) > > - Other suggestions? Wafer bonding, RTP, spin track for coat and > dev, oven... > > It is really basic things, we just once dreamed to build such > small facility 5 years ago and things are fortunately moving. > > Also some disclaimer... We have never done it, all the people here > probably have used your facilities but it is another level to > build and run one... therefore your honest opion is again > extremelly important. Thank you all for your attention and I will > keep you posted how things move on. > > Kind regards, > > Willyan > > -- > > *Willyan Hasenkamp* > > Universidade do Vale do Rio dos Sinos - Unisinos > > Instituto Tecnol?gico de Semicondutores - itt Chip > > Escola Polit?cnica > > Programa de P?s-Gradua??o em Engenharia El?trica > > Av. Unisinos 950, 93022-750, S?o Leopoldo, RS > > www.unisinos.br > > - Phone: +55 (51) 3591-1122 / Ramal: 3181 > > > *Aviso legal*: Esta mensagem eletr?nica e seus respectivos anexos, > podem conter informa??es confidenciais. Se voc? n?o ? o(a) > destinat?rio(a) correto(a) e/ou o conte?do do /e-mail/ n?o lhe diz > respeito notifique-nos, respondendo a este /e-mail/ com c?pia para > esirc at asav.org.br , e apague-o > imediatamente. Fica, desde j?, notificado que qualquer a??o > baseada no conte?do desta mensagem ? estritamente proibida e ilegal. > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From spaolini at cns.fas.harvard.edu Thu Dec 14 16:51:14 2017 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Thu, 14 Dec 2017 21:51:14 +0000 Subject: [labnetwork] Sputtering targets storage In-Reply-To: <5CFDEA6C-BA36-4EEF-9890-90D5659AB370@central.uh.edu> References: <5CFDEA6C-BA36-4EEF-9890-90D5659AB370@central.uh.edu> Message-ID: Jing, I see no reason to cover the targets at all. Keep in mind that when you begin the process, you are sputtering onto a shutter which reveals homogeneous material free of oxidation and airborn contaminants. We have always stored them in a plastic food container for general protection from damage and put them in a nitrogen flooded dry box for good measure but I don't believe it makes any difference. Perhaps someone else in the network can attest or disagree with my practice since I'm sure that if there are experts in these sciences, they subscribe. For the record, I will offer to dispose of all your used silver, gold, platinum, and palladium targets, free of charge :) Equipment Dood Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Guo, Jing Sent: Thursday, December 14, 2017 12:50 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Sputtering targets storage Hi All, We have a lot sputtering targets for our UHV sputtering system. Right now each target is covered by Aluminum foil stored in a plastic box. We are wondering whether the Aluminum foil is necessary for all the targets. After several times the foil will become wrinkled and it is kind annoying to cover a target with wrinkled foil. Do you have any good idea to store those targets? Please advise. And for those used ones, any good way to dispose them or recycle them? Thanks. Best Regards, Jing Research Lab Supervisor Nanofabrication Facility University of Houston Postal Address: UNIVERSITY OF HOUSTON NANOFABRICATION FACILITY 3517 CULLEN BLVD, RM 1011 HOUSTON TX 77204-5062 Phone: 832-842-8822 Email: jguo5 at central.uh.edu Web: www.uh.edu/nanofab -------------- next part -------------- An HTML attachment was scrubbed... URL: From fouad.karouta at anu.edu.au Thu Dec 14 23:25:48 2017 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Fri, 15 Dec 2017 04:25:48 +0000 Subject: [labnetwork] Sputtering targets storage In-Reply-To: References: <5CFDEA6C-BA36-4EEF-9890-90D5659AB370@central.uh.edu> Message-ID: Hi Jing, Agree with Steve on keeping the targets. Depending on targets some do require to be kept in inert atmosphere. We had a bad experience with a Lanthanum target that was left in original package and not in N2 and after a year it degraded (became powder). About the used targets you can dispose of them through regular way of getting rid of chemical products (depending on SDS). Of course precious materials can be recycled (I used to remove copper plate from Au and Pt by dipping it a concentrated sulfuric acid that fully consumes the copper). Best regards, Fouad Karouta ************************************* Manager ANFF ACT Node Australian National Fabrication Facility Research School of Physics and Engineering L. Huxley Building (#56), Mills Road, Room 4.02 Australian National University ACT 0200, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au http://anff-act.anu.edu.au/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Paolini, Steven Sent: Friday, 15 December 2017 8:51 AM To: Guo, Jing ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Sputtering targets storage Jing, I see no reason to cover the targets at all. Keep in mind that when you begin the process, you are sputtering onto a shutter which reveals homogeneous material free of oxidation and airborn contaminants. We have always stored them in a plastic food container for general protection from damage and put them in a nitrogen flooded dry box for good measure but I don't believe it makes any difference. Perhaps someone else in the network can attest or disagree with my practice since I'm sure that if there are experts in these sciences, they subscribe. For the record, I will offer to dispose of all your used silver, gold, platinum, and palladium targets, free of charge :) Equipment Dood Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Guo, Jing Sent: Thursday, December 14, 2017 12:50 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Sputtering targets storage Hi All, We have a lot sputtering targets for our UHV sputtering system. Right now each target is covered by Aluminum foil stored in a plastic box. We are wondering whether the Aluminum foil is necessary for all the targets. After several times the foil will become wrinkled and it is kind annoying to cover a target with wrinkled foil. Do you have any good idea to store those targets? Please advise. And for those used ones, any good way to dispose them or recycle them? Thanks. Best Regards, Jing Research Lab Supervisor Nanofabrication Facility University of Houston Postal Address: UNIVERSITY OF HOUSTON NANOFABRICATION FACILITY 3517 CULLEN BLVD, RM 1011 HOUSTON TX 77204-5062 Phone: 832-842-8822 Email: jguo5 at central.uh.edu Web: www.uh.edu/nanofab -------------- next part -------------- An HTML attachment was scrubbed... URL: From rlbemc at rit.edu Fri Dec 15 07:31:26 2017 From: rlbemc at rit.edu (Richard Battaglia) Date: Fri, 15 Dec 2017 12:31:26 +0000 Subject: [labnetwork] Varian 350D Message-ID: Hello all, We have a Varian 350D here at RIT and it is having some very odd issues. Right now I am unable to get the End Station Controller to boot up. I have checked all voltages on all power supplies, checked, and replaced, various tantalum caps that looked odd, even tried a separate CPU and memory card thinking it might be the issue but no luck. When it is powered up I get both the hold and start light on both end stations illuminated and the display is either -----350D----- or an error of some sort, never the same. The only lights that illuminate on the End Station Controller are the Chuck Extend 2 and 1 and Platen open 1 and 2. The system never goes any farther than that. I'm not sure where to go at this point without knowing what the End Station should be doing on boot up. If anyone has an experience with this I would greatly appreciate some advice. Thank You, Richard L Battaglia Richard L Battaglia Rochester Institute of Technology Semiconductor & Microsystems Fabrication Laboratory 82 Lomb Memorial Dr. Bldg. 17-2627 Rochester, NY 14623 585 478-3834 c 585 475-5041 f [http://www.rit.edu/~962www/logos/tiger_walking_rit_color.jpg] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 2550 bytes Desc: image001.jpg URL: From irharvey at eng.utah.edu Wed Dec 13 10:30:27 2017 From: irharvey at eng.utah.edu (Ian Harvey) Date: Wed, 13 Dec 2017 08:30:27 -0700 Subject: [labnetwork] Happy Holidays from Utah Nanofab! References: <4DDC1D7F-784E-4844-A8FD-86109BCCC21B@utah.edu> Message-ID: <63DD3E25-CAE1-4CC2-9F18-9CF649669E33@eng.utah.edu> Dear Labnetwork Colleagues, Happy Holidays from the Utah Crowd! See you in Philly '18! ?Ian Ian R. Harvey, Ph.D. Associate Director Utah Nanofab at the University of Utah Cleanroom Fabrication and nanoImaging & Surface Analysis 801/585-6162 (voicemail) www.nanofab.utah.edu sal.nanofab.utah.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From rlbemc at rit.edu Fri Dec 15 10:49:31 2017 From: rlbemc at rit.edu (Richard Battaglia) Date: Fri, 15 Dec 2017 15:49:31 +0000 Subject: [labnetwork] 350D Message-ID: <209808f030b340d98fece4fea673adbb@ex04mail02a.ad.rit.edu> Does anybody know who offers phone support for a Varian 350D Ion Implanter? Richard L Battaglia Richard L Battaglia Rochester Institute of Technology Semiconductor & Microsystems Fabrication Laboratory 82 Lomb Memorial Dr. Bldg. 17-2627 Rochester, NY 14623 585 478-3834 c 585 475-5041 f [http://www.rit.edu/~962www/logos/tiger_walking_rit_color.jpg] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 2550 bytes Desc: image001.jpg URL: From prabhakararaoyp at gmail.com Fri Dec 15 12:27:32 2017 From: prabhakararaoyp at gmail.com (prabhakararao yp) Date: Fri, 15 Dec 2017 22:57:32 +0530 Subject: [labnetwork] Sputtering targets storage In-Reply-To: <5CFDEA6C-BA36-4EEF-9890-90D5659AB370@central.uh.edu> References: <5CFDEA6C-BA36-4EEF-9890-90D5659AB370@central.uh.edu> Message-ID: hi, you can store targets at slightly at elevated temperature from room temp in nitrogen ambient oven with out plastic case Thanks& regards, prabhakararao Dr. Y.P. Prabhakara Rao .M.Tech.Ph.D National Nanofabrication centre Centre For Nanoscience and Engineering, Indian Institute Of Science,Bangalore-560012 Mobile: +91 9448365748 Tel: +91 80 22933181 extn 321 Email: prabhakarayp at iisc.ac.in prabhakararaoyp at gmail.com On Thu, Dec 14, 2017 at 11:20 PM, Guo, Jing wrote: > Hi All, > > We have a lot sputtering targets for our UHV sputtering system. Right now > each target is covered by Aluminum foil stored in a plastic box. > We are wondering whether the Aluminum foil is necessary for all the > targets. After several times the foil will become wrinkled and it is kind > annoying to cover a target with wrinkled foil. > Do you have any good idea to store those targets? Please advise. > And for those used ones, any good way to dispose them or recycle them? > > Thanks. > > Best Regards, > > Jing > > Research Lab Supervisor > Nanofabrication Facility > University of Houston > Postal Address: > UNIVERSITY OF HOUSTON > NANOFABRICATION FACILITY > 3517 CULLEN BLVD, RM 1011 > HOUSTON TX 77204-5062 > Phone: 832-842-8822 > Email: jguo5 at central.uh.edu > Web: www.uh.edu/nanofab > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From twangens at mail.usf.edu Fri Dec 15 17:29:39 2017 From: twangens at mail.usf.edu (Ted Wangensteen) Date: Fri, 15 Dec 2017 14:29:39 -0800 Subject: [labnetwork] Tools for a new lab In-Reply-To: References: Message-ID: One thing that turns out to be surprisingly important is shelve space. If you need storage or at least work space for users, keep that in mind. A place to put your stuff and containers,etc. while working. Ted Wangensteen Engineer, and coming from Industry Fabs and previously university NanoFab environments On Wed, Dec 13, 2017 at 5:18 PM, Noah Clay wrote: > Hello Willyan, > > It?s great to hear about your new facility. Congratulations! > > Most of us received assistance from experienced semiconductor equipment > design firms to develop a master plan for tool layout. It?s great that > you?re reaching out with advice on fab tools. While you?re assembling the > list, if you haven?t already, please consider working with a firm to design > the tool layout and installation package. > > Best wishes, > Noah Clay > > University of Pennsylvania > Philadelphia, PA > > Sent from my iPhone > > On Dec 13, 2017, at 21:54, Willyan Hasenkamp Carreira < > HASENKAMP at unisinos.br> wrote: > > Hello Everybody, > > > > I?ve recently registered to this mailing (thanks to Mary Tang from > Stanford) and it?s great. > > We have recently finished our small cleanroom, down south in Brazil, and > just yesterday we got the grant for purchasing a few microfabrication tools. > > Literaly we have nothing, lab is empty... but we would like to start doing > some microsystems. > > > > It would be very nice to have your opinion and references on equipment we > could purchase. > > Please consider equipment flexibility, versatility, maintainance cost and > difficulties. Also, students will be allowed to use them... which can be a > burden. > > > > I do not know if we are going in a good direction but we have selected > some equipment to start with: > > - Laserwriter (which way to go? Maskless aligner or direct laser write. > Any suggestion? Brand? We know of Heidelberg, but what about Microwriter > ML3 or Picomaster 2000, anyother? Does anybody have some comments?) > > - Mask aligner... we will need it if the choice is to go with direct laser > write... (Here we have suss and evg. Which one would you prefer?) > > - Plasma etch ? RIE (Any equipment suggestion? We found Oxford > equipment... any other that could fit?) > > - Sputtering/PECVD (Does a dual system for metal and dielectrics make > sense? Which fabricant do you have a good user and maintainance experience?) > > - Wetbench... (its hard to find such things here in Brazil. Do you have > any configuration suggestion that has being working?) > > - Resist coating and development (Any suggestion? Suss has some things but > are there other suggestions? I think Brewer also have some things...) > > > > - Other suggestions? Wafer bonding, RTP, spin track for coat and dev, > oven... > > > > It is really basic things, we just once dreamed to build such small > facility 5 years ago and things are fortunately moving. > > Also some disclaimer... We have never done it, all the people here > probably have used your facilities but it is another level to build and run > one... therefore your honest opion is again extremelly important. Thank you > all for your attention and I will keep you posted how things move on. > > > > Kind regards, > > Willyan > > > > -- > > *Willyan Hasenkamp* > > Universidade do Vale do Rio dos Sinos - Unisinos > > Instituto Tecnol?gico de Semicondutores - itt Chip > > Escola Polit?cnica > > Programa de P?s-Gradua??o em Engenharia El?trica > > Av. Unisinos 950, 93022-750, S?o Leopoldo, RS > > www.unisinos.br - Phone: +55 (51) 3591-1122 <+55%2051%203591-1122> / > Ramal: 3181 > > > > *Aviso legal*: Esta mensagem eletr?nica e seus respectivos anexos, podem > conter informa??es confidenciais. Se voc? n?o ? o(a) destinat?rio(a) > correto(a) e/ou o conte?do do *e-mail* n?o lhe diz respeito > notifique-nos, respondendo a este *e-mail* com c?pia para > esirc at asav.org.br, e apague-o imediatamente. Fica, desde j?, notificado > que qualquer a??o baseada no conte?do desta mensagem ? estritamente > proibida e ilegal. > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From kmcpeak at lsu.edu Sun Dec 17 08:54:26 2017 From: kmcpeak at lsu.edu (Kevin McPeak) Date: Sun, 17 Dec 2017 07:54:26 -0600 Subject: [labnetwork] Adsorber maintenance 8200 compressor Message-ID: Dear Colleagues, I need to replace the adsorber in my Brooks 8200 compressor, per the annual maintenance guidelines. This is my first time sourcing the adsorber. Are most of you simply buying a new one from Brooks/CTI or are you working with 3rd parties to rebuild/exchange your existing adsorber? If the later, recommendations (offline) would be most appreciated. Thank you Regards, Kevin -- Kevin McPeak Assistant Professor Department of Chemical Engineering Louisiana State University email: kmcpeak at lsu.edu phone: 225-578-0058 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jcn8004 at rit.edu Sun Dec 17 12:57:13 2017 From: jcn8004 at rit.edu (John Nash) Date: Sun, 17 Dec 2017 17:57:13 +0000 Subject: [labnetwork] Adsorber maintenance 8200 compressor In-Reply-To: References: Message-ID: <0e25bb6a2a9c4a33b9cb321dbbf0dd38@ex04mail01b.ad.rit.edu> We source ours through Trillium. Their rebuild / service center for cryo pumps is the old Austin Scientific. Sent from my Sprint Samsung Galaxy S? 6. -------- Original message -------- From: Kevin McPeak Date: 12/17/17 11:48 AM (GMT-05:00) To: labnetwork at mtl.mit.edu Subject: [labnetwork] Adsorber maintenance 8200 compressor Dear Colleagues, I need to replace the adsorber in my Brooks 8200 compressor, per the annual maintenance guidelines. This is my first time sourcing the adsorber. Are most of you simply buying a new one from Brooks/CTI or are you working with 3rd parties to rebuild/exchange your existing adsorber? If the later, recommendations (offline) would be most appreciated. Thank you Regards, Kevin -- Kevin McPeak Assistant Professor Department of Chemical Engineering Louisiana State University email: kmcpeak at lsu.edu phone: 225-578-0058 -------------- next part -------------- An HTML attachment was scrubbed... URL: From travisgabel at boisestate.edu Mon Dec 18 13:30:09 2017 From: travisgabel at boisestate.edu (Travis Gabel) Date: Mon, 18 Dec 2017 11:30:09 -0700 Subject: [labnetwork] nScypt 150-3Dn-HP manuals/users guide Message-ID: Hi Our lab(Idaho Microfabrication Lab) recently installed a nscrypt 150-3dn-HP. The documentation we received with the printer seems to be lacking in the parameter definitions. Does anyone have any documentation that they can share? Thanks Travis -------------- next part -------------- An HTML attachment was scrubbed... URL: From gilheart at rice.edu Mon Dec 18 15:09:47 2017 From: gilheart at rice.edu (Tim Gilheart) Date: Mon, 18 Dec 2017 14:09:47 -0600 Subject: [labnetwork] Adsorber maintenance 8200 compressor In-Reply-To: <0e25bb6a2a9c4a33b9cb321dbbf0dd38@ex04mail01b.ad.rit.edu> References: <0e25bb6a2a9c4a33b9cb321dbbf0dd38@ex04mail01b.ad.rit.edu> Message-ID: Same for us. We also utilize the for vacuum pump repairs We are fortunately close enough to benefit from their regular delivery/service truck runs to Houston, so shipping costs are also lowered. -- Tim Gilheart, Ph.D. Research Scientist - Nanofabrication Clean Room Manager, Shared Equipment Authority (SEA), Rice University Cell: 832-341-5488 | Office: 713-348-3159 | gilheart at rice.edu > On Dec 17, 2017, at 11:57 AM, John Nash wrote: > > We source ours through Trillium. Their rebuild / service center for cryo pumps is the old Austin Scientific. > > > > Sent from my Sprint Samsung Galaxy S? 6. > > > -------- Original message -------- > From: Kevin McPeak > Date: 12/17/17 11:48 AM (GMT-05:00) > To: labnetwork at mtl.mit.edu > Subject: [labnetwork] Adsorber maintenance 8200 compressor > > Dear Colleagues, > > I need to replace the adsorber in my Brooks 8200 compressor, per the annual maintenance guidelines. > > This is my first time sourcing the adsorber. Are most of you simply buying a new one from Brooks/CTI or are you working with 3rd parties to rebuild/exchange your existing adsorber? > > If the later, recommendations (offline) would be most appreciated. Thank you > > Regards, > Kevin > > -- > Kevin McPeak > Assistant Professor > Department of Chemical Engineering > Louisiana State University > email: kmcpeak at lsu.edu > phone: 225-578-0058 > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From marylene at mer.utexas.edu Tue Dec 19 15:04:34 2017 From: marylene at mer.utexas.edu (Palard, Marylene) Date: Tue, 19 Dec 2017 20:04:34 +0000 Subject: [labnetwork] Two SEM/EBLs set up in the same room : comments In-Reply-To: References: Message-ID: Dear Lab Managers E-beam photolithography/ SEM experts, At UT Austin we are lucky to have the task of installing a new EBL/SEM in our NNCI cleanroom lab. The operation team is leaning towards having the new EBL/SEM system in the same room as the 10 years old one. Assuming that - both items are fitting in the room, - the manufacturer site survey passed, - we agreed with jagged edges pictures due to cleanroom flow Could you please share your thoughts on that plan. Sincerely Marylene, an avid reader of the labnetwork messages _______________________________ Marylene Palard, Ph.D. Program Manager http://www.mrc.utexas.edu/ (512) 965 6671 The University of Texas | Microelectronics Research Center Bldg #160 | 10100 Burnet road | Austin, TX 78758-4445 From HASENKAMP at unisinos.br Tue Dec 19 16:21:45 2017 From: HASENKAMP at unisinos.br (Willyan Hasenkamp Carreira) Date: Tue, 19 Dec 2017 21:21:45 +0000 Subject: [labnetwork] New lab in Brazil Message-ID: Hi, I just would like to THANK everyone for the feddback, it?s been very helpful. I'm trying to compile all the shared information and I will try to answer everyone in private. I?ve just realize it was hard to imagine what we have here, so attached there is a small presentation on the infrastructure and the space available for setting up the new lab (microfab). Thank you again! Kind regards, Willyan -- Prof. Dr. Willyan Hasenkamp Universidade do Vale do Rio dos Sinos - Unisinos Instituto Tecnol?gico de Semicondutores - itt Chip Escola Polit?cnica Programa de P?s-Gradua??o em Engenharia El?trica Av. Unisinos 950, 93022-750, S?o Leopoldo, RS www.unisinos.br - Phone: +55 (51) 3591-1122 / Ramal: 3181 Aviso legal: Esta mensagem eletr?nica e seus respectivos anexos, podem conter informa??es confidenciais. Se voc? n?o ? o(a) destinat?rio(a) correto(a) e/ou o conte?do do e-mail n?o lhe diz respeito notifique-nos, respondendo a este e-mail com c?pia para esirc at asav.org.br, e apague-o imediatamente. Fica, desde j?, notificado que qualquer a??o baseada no conte?do desta mensagem ? estritamente proibida e ilegal. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: itt Chip-presentation.pdf Type: application/pdf Size: 3490182 bytes Desc: itt Chip-presentation.pdf URL: From mondol at mit.edu Tue Dec 19 16:41:36 2017 From: mondol at mit.edu (Mark K Mondol) Date: Tue, 19 Dec 2017 16:41:36 -0500 Subject: [labnetwork] Two SEM/EBLs set up in the same room : comments In-Reply-To: References: Message-ID: I think that you would want to have some sort of Spicer or ADE field cancellation system on both systems. Large changes in lens current might couple to the SEM. However I defer to Mike Rooks opinion on this as he actually operated a lab with both. I have an Elionix tool about 10 meters from a Raith (Zeiss Gemini column) and they seem to do alright, with the Spicer cancellation system. There is also a Zeiss Orion He Ion about another 10 meters away and a JEOL 2010 TEM nearby too. Regards, Mark K Mondol On 12/19/2017 3:04 PM, Palard, Marylene wrote: > Dear Lab Managers > E-beam photolithography/ SEM experts, > > At UT Austin we are lucky to have the task of installing a new EBL/SEM in our NNCI cleanroom lab. > > The operation team is leaning towards having the new EBL/SEM system in the same room as the 10 years old one. > > Assuming that > - both items are fitting in the room, > - the manufacturer site survey passed, > - we agreed with jagged edges pictures due to cleanroom flow > Could you please share your thoughts on that plan. > > Sincerely > Marylene, an avid reader of the labnetwork messages -- Mark K Mondol Assistant Director NanoStructures Laboratory And Facility Manager Scanning Electron Beam Lithography Facility Bldg 36 Room 229 www.rle.mit.edu/sebl mondol at mit.edu office - 617-253-9617 cell - 617-224-8756 From hathaway at cns.fas.harvard.edu Tue Dec 19 16:41:36 2017 From: hathaway at cns.fas.harvard.edu (Mac Hathaway) Date: Tue, 19 Dec 2017 16:41:36 -0500 Subject: [labnetwork] Two SEM/EBLs set up in the same room : comments In-Reply-To: References: Message-ID: <5A398790.6090509@cns.fas.harvard.edu> Hi Marylene, At Harvard CNS, we have two Elionix in the same room, with no ill affects. The columns are maybe 15 ft from each other. Congrats on your new tool! Mac Mac Hathaway Senior Process and Systems Engineer Harvard Center for Nanoscale Systems 11 Oxford St. Cambridge, MA02138 617-495-9012 On 12/19/2017 3:04 PM, Palard, Marylene wrote: > Dear Lab Managers > E-beam photolithography/ SEM experts, > > At UT Austin we are lucky to have the task of installing a new EBL/SEM in our NNCI cleanroom lab. > > The operation team is leaning towards having the new EBL/SEM system in the same room as the 10 years old one. > > Assuming that > - both items are fitting in the room, > - the manufacturer site survey passed, > - we agreed with jagged edges pictures due to cleanroom flow > Could you please share your thoughts on that plan. > > Sincerely > Marylene, an avid reader of the labnetwork messages > > _______________________________ > Marylene Palard, Ph.D. > Program Manager > http://www.mrc.utexas.edu/ > (512) 965 6671 > > The University of Texas | Microelectronics Research Center > Bldg #160 | 10100 Burnet road | Austin, TX 78758-4445 > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From roberto.panepucci at cti.gov.br Tue Dec 19 16:57:25 2017 From: roberto.panepucci at cti.gov.br (Roberto R. Panepucci) Date: Tue, 19 Dec 2017 19:57:25 -0200 (BRST) Subject: [labnetwork] New lab in Brazil In-Reply-To: References: Message-ID: <1789591855.6258119.1513720645886.JavaMail.zimbra@cti.gov.br> Hi Willyan, Nice to see that you are looking for feedback. Congratulations on the new lab, it looks nice. Your initial suggestions for tools make sense. Here in Campinas, SP there are currently 6 cleanroom facilities, some of which have all of the tools you mentioned operational. It may be worth a short trip to hear from the managers and users about it. I am sure you know of a few of them, but here is the list: 1. CTI 2. CCS/Unicamp 3. LAMult/UNICAMP 4. LMF/CNPEM 5.LNNano/CNPEM 6.CPqD About an hour from here, in S?o Paulo, SP you will find a few more: 1. Poli/USP 2. IPT/USP 3. Mackgraphe There are probably more, but this gives you an idea. What you will find out is that due to all of our customs paperwork, reliability and a service center that keeps spare parts in-country, are key issues. Look forward to hearing from you. Regards, Roberto R. Panepucci, PhD Pesquisador Titular/Senior Researcher Head NCSH Centro de Tecnologia da Informa??o Renato Archer - CTI Rodovia Dom Pedro I, km 143,6 Campinas - S?o Paulo - Brasil - CEP 13069-901 Telefone: +55 19 3746-6072/6672 https://scholar.google.com.br/citations?user=lIGSDCcAAAAJ&hl=pt-BR ----- Em 19 de Dez de 2017, em 19:21, Willyan Hasenkamp Carreira escreveu: > Hi, > I just would like to THANK everyone for the feddback, it?s been very helpful. > I?m trying to compile all the shared information and I will try to answer > everyone in private. > I?ve just realize it was hard to imagine what we have here, so attached there is > a small presentation on the infrastructure and the space available for setting > up the new lab (microfab). > Thank you again! > Kind regards, > Willyan > -- > Prof. Dr. Willyan Hasenkamp > Universidade do Vale do Rio dos Sinos - Unisinos > Instituto Tecnol?gico de Semicondutores - itt Chip > Escola Polit?cnica > Programa de P?s-Gradua??o em Engenharia El?trica > Av. Unisinos 950, 93022-750, S?o Leopoldo, RS > [ http://www.unisinos.br/ | www.unisinos.br ] - Phone: +55 (51) 3591-1122 / > Ramal: 3181 > Aviso legal : Esta mensagem eletr?nica e seus respectivos anexos, podem conter > informa??es confidenciais. Se voc? n?o ? o(a) destinat?rio(a) correto(a) e/ou o > conte?do do e-mail n?o lhe diz respeito notifique-nos, respondendo a este > e-mail com c?pia para [ mailto:esirc at asav.org.br | esirc at asav.org.br ] , e > apague-o imediatamente. Fica, desde j?, notificado que qualquer a??o baseada no > conte?do desta mensagem ? estritamente proibida e ilegal. > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From michael.rooks at yale.edu Tue Dec 19 17:12:02 2017 From: michael.rooks at yale.edu (Michael Rooks) Date: Tue, 19 Dec 2017 17:12:02 -0500 Subject: [labnetwork] Two SEM/EBLs set up in the same room : comments In-Reply-To: References: Message-ID: <5A398EB2.8030509@yale.edu> When you say "jagged edges pictures", I take that to mean that there is considerable vibration and/or acoustical noise in the cleanroom. It is foolish to throw away the SEM's resolution just so it can be inside a cleanroom. Both viewing resolution and e-beam writing resolution will suffer. I suggest you put the SEM on a firm basement or bedrock floor. I may get some flak for saying this, but: you don't need a cleanroom for e-beam writing, because you are not (presumably) printing integrated circuits. Low vibration should be a higher priority than convenience and particle counts. Around here we give the students the choice of doing the spinning and developing in a cleanroom, or in a non-clean fume hood. If the manufacturer passes the site while you can see vibration in the old SEM, you should find a better manufacturer. -------------------------------- Michael Rooks Yale Institute of Nanoscience and Quantum Engineering nano.yale.edu On 12/19/2017 03:04 PM, Palard, Marylene wrote: > Dear Lab Managers > E-beam photolithography/ SEM experts, > > At UT Austin we are lucky to have the task of installing a new EBL/SEM in our NNCI cleanroom lab. > > The operation team is leaning towards having the new EBL/SEM system in the same room as the 10 years old one. > > Assuming that > - both items are fitting in the room, > - the manufacturer site survey passed, > - we agreed with jagged edges pictures due to cleanroom flow > Could you please share your thoughts on that plan. > > Sincerely > Marylene, an avid reader of the labnetwork messages > > _______________________________ > Marylene Palard, Ph.D. > Program Manager > http://www.mrc.utexas.edu/ > (512) 965 6671 > > The University of Texas | Microelectronics Research Center > Bldg #160 | 10100 Burnet road | Austin, TX 78758-4445 > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From fouad.karouta at anu.edu.au Tue Dec 19 20:20:29 2017 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Wed, 20 Dec 2017 01:20:29 +0000 Subject: [labnetwork] Two SEM/EBLs set up in the same room : comments In-Reply-To: <5A398790.6090509@cns.fas.harvard.edu> References: <5A398790.6090509@cns.fas.harvard.edu> Message-ID: Hi Marylene, About the remark of having a high resolution SEM in a clean room I am a strong supporter of having the SEM in a CR environment as for developing new etching processes one need to jump from an etcher to SEM and vice versa several times. But I admit it is a controversial subject. Back to your question: We are in the process of designing a new clean room in which we planned a room for an EBL system (Raith 150) and as we are hoping to get funds to get a 100kV machine we have included the new system with the old one in one room but clean room designers suggested to separate them into two rooms (acoustic from CR filters) so now they are planned in two rooms but the two rooms will be on one concrete stable slab. Hope this helps, Fouad Karouta ************************************* Manager ANFF ACT Node Australian National Fabrication Facility Research School of Physics and Engineering L. Huxley Building (#56), Mills Road, Room 4.02 Australian National University ACT 0200, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au http://anff-act.anu.edu.au/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Mac Hathaway Sent: Wednesday, 20 December 2017 8:42 AM To: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Two SEM/EBLs set up in the same room : comments Hi Marylene, At Harvard CNS, we have two Elionix in the same room, with no ill affects. The columns are maybe 15 ft from each other. Congrats on your new tool! Mac Mac Hathaway Senior Process and Systems Engineer Harvard Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617-495-9012 On 12/19/2017 3:04 PM, Palard, Marylene wrote: Dear Lab Managers E-beam photolithography/ SEM experts, At UT Austin we are lucky to have the task of installing a new EBL/SEM in our NNCI cleanroom lab. The operation team is leaning towards having the new EBL/SEM system in the same room as the 10 years old one. Assuming that - both items are fitting in the room, - the manufacturer site survey passed, - we agreed with jagged edges pictures due to cleanroom flow Could you please share your thoughts on that plan. Sincerely Marylene, an avid reader of the labnetwork messages _______________________________ Marylene Palard, Ph.D. Program Manager http://www.mrc.utexas.edu/ (512) 965 6671 The University of Texas | Microelectronics Research Center Bldg #160 | 10100 Burnet road | Austin, TX 78758-4445 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From jdeng at cns.fas.harvard.edu Tue Dec 19 22:43:06 2017 From: jdeng at cns.fas.harvard.edu (Deng, Jiangdong) Date: Wed, 20 Dec 2017 03:43:06 +0000 Subject: [labnetwork] Two SEM/EBLs set up in the same room : comments In-Reply-To: References: Message-ID: Hi, Marylene, Nice to know you have a new EBL tool! Echoing Mark?s view, it is important to have a field cancellation system for each EBL/SEM to reducing the EM interference. Our two Elionix systems share the same room, but each has its own cancelation system (Spicer). You mentioned that "manufacturer site survey passed?, does it include the floor noise/vibration test? When the Elionix EBL was installed, the company performed the noise test to ensure the room vibration performance meets the tool?s noise spec.. we also occasionally have an outside company to redo the noise test, especially when we have other big tool installation nearby. Please feel free to call in if you need more details? -JD On 12/19/17, 4:41 PM, "labnetwork-bounces at mtl.mit.edu on behalf of Mark K Mondol" wrote: >I think that you would want to have some sort of Spicer or ADE field >cancellation system on both systems. Large changes in lens current might >couple to the SEM. > >However I defer to Mike Rooks opinion on this as he actually operated a >lab with both. > >I have an Elionix tool about 10 meters from a Raith (Zeiss Gemini >column) and they seem to do alright, with the Spicer cancellation >system. There is also a Zeiss Orion He Ion about another 10 meters away >and a JEOL 2010 TEM nearby too. > >Regards, > >Mark K Mondol > > >On 12/19/2017 3:04 PM, Palard, Marylene wrote: >> Dear Lab Managers >> E-beam photolithography/ SEM experts, >> >> At UT Austin we are lucky to have the task of installing a new EBL/SEM >>in our NNCI cleanroom lab. >> >> The operation team is leaning towards having the new EBL/SEM system in >>the same room as the 10 years old one. >> >> Assuming that >> - both items are fitting in the room, >> - the manufacturer site survey passed, >> - we agreed with jagged edges pictures due to cleanroom flow >> Could you please share your thoughts on that plan. >> >> Sincerely >> Marylene, an avid reader of the labnetwork messages > >-- >Mark K Mondol >Assistant Director NanoStructures Laboratory >And >Facility Manager >Scanning Electron Beam Lithography Facility >Bldg 36 Room 229 >www.rle.mit.edu/sebl >mondol at mit.edu >office - 617-253-9617 >cell - 617-224-8756 > > >_______________________________________________ >labnetwork mailing list >labnetwork at mtl.mit.edu >https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork From ida.noddeland at ntnu.no Wed Dec 20 05:11:37 2017 From: ida.noddeland at ntnu.no (Ida Noddeland) Date: Wed, 20 Dec 2017 10:11:37 +0000 Subject: [labnetwork] Open position in Trondheim, Norway Message-ID: <1b57e60b053c496ab480563ae4c4662f@it-ex11.win.ntnu.no> Dear all, We have two open positions as cleanroom engineers at NTNU NanoLab in Trondheim, Norway. We would be very grateful if you could spread the word and these two links to people who may be interested! https://www.jobbnorge.no/ledige-stillinger/stilling/145849/senior-engineer-ntnu-nanolab-thin-film-dry-etch https://www.jobbnorge.no/ledige-stillinger/stilling/145848/senior-engineer-ntnu-nanolab-characterisation-processing Best regards Ida Noddeland Head of Laboratory NTNU NanoLab Sem S?lands vei 14, K1-123 7491 Trondheim +47 412 88 808 www.ntnu.edu/nano/nanolab -------------- next part -------------- An HTML attachment was scrubbed... URL: From price.798 at osu.edu Wed Dec 20 09:22:54 2017 From: price.798 at osu.edu (Price, Aimee) Date: Wed, 20 Dec 2017 14:22:54 +0000 Subject: [labnetwork] Two SEM/EBLs set up in the same room : comments In-Reply-To: References: Message-ID: <83583687862B8444A85296A4944147DFC31FA407@CIO-TNC-D2MBX03.osuad.osu.edu> Hi all, We have two columns (one Vistec/Raith EBPG5000 EBL and one Zeiss Ultra Plus SEM) 16 feet apart. They both do have Spicer systems and also vibration cancellation, but we have no ill effects from either. Both vendors did site surveys and suggested the proper noise cancellation. Yes the cleanroom acoustics and sometimes vibration can reduce the ultimate resolution of your microscope, but most vendors have approaches to minimize it (noise cancellation of some sort). Best of luck to you and congratulations on your new systems! Aimee -----Original Message----- From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Mark K Mondol Sent: Tuesday, December 19, 2017 4:42 PM To: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Two SEM/EBLs set up in the same room : comments I think that you would want to have some sort of Spicer or ADE field cancellation system on both systems. Large changes in lens current might couple to the SEM. However I defer to Mike Rooks opinion on this as he actually operated a lab with both. I have an Elionix tool about 10 meters from a Raith (Zeiss Gemini column) and they seem to do alright, with the Spicer cancellation system. There is also a Zeiss Orion He Ion about another 10 meters away and a JEOL 2010 TEM nearby too. Regards, Mark K Mondol On 12/19/2017 3:04 PM, Palard, Marylene wrote: > Dear Lab Managers > E-beam photolithography/ SEM experts, > > At UT Austin we are lucky to have the task of installing a new EBL/SEM in our NNCI cleanroom lab. > > The operation team is leaning towards having the new EBL/SEM system in the same room as the 10 years old one. > > Assuming that > - both items are fitting in the room, > - the manufacturer site survey passed, > - we agreed with jagged edges pictures due to cleanroom flow Could you > please share your thoughts on that plan. > > Sincerely > Marylene, an avid reader of the labnetwork messages -- Mark K Mondol Assistant Director NanoStructures Laboratory And Facility Manager Scanning Electron Beam Lithography Facility Bldg 36 Room 229 www.rle.mit.edu/sebl mondol at mit.edu office - 617-253-9617 cell - 617-224-8756 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork From aju-jugessur at uiowa.edu Wed Dec 20 10:01:26 2017 From: aju-jugessur at uiowa.edu (Jugessur, Aju S) Date: Wed, 20 Dec 2017 15:01:26 +0000 Subject: [labnetwork] Two SEM/EBLs set up in the same room : comments In-Reply-To: References: Message-ID: Marylene, We have also made provision to add a second Ebeam tool or an FIBSEM in the same cleanroom as our current Raith Voyager. I do note that you have already received some useful comments. I would like to add the following: (a) If you do plan to add any EM cancellation systems on both tools, please ensure that the two systems do not interact with each other. (b) Have an independent party survey the site including the interference/interraction of the two EM cancellation systems. I had the experience of the tool vendor passing the site surveys or relaxing the specs only for us to accept the tool and we ended up modifying the site substantially ($$$) to accommodate the existing environmental influences. (c) Our tools are in a cleanroom environment. We do not have any CR filters right above the tool to reduce any acoustic noise vibrations. All the best with your new tool. Regards Aju On Dec 19, 2017, at 2:04 PM, Palard, Marylene > wrote: Dear Lab Managers E-beam photolithography/ SEM experts, At UT Austin we are lucky to have the task of installing a new EBL/SEM in our NNCI cleanroom lab. The operation team is leaning towards having the new EBL/SEM system in the same room as the 10 years old one. Assuming that - both items are fitting in the room, - the manufacturer site survey passed, - we agreed with jagged edges pictures due to cleanroom flow Could you please share your thoughts on that plan. Sincerely Marylene, an avid reader of the labnetwork messages _______________________________ Marylene Palard, Ph.D. Program Manager http://www.mrc.utexas.edu/ (512) 965 6671 The University of Texas | Microelectronics Research Center Bldg #160 | 10100 Burnet road | Austin, TX 78758-4445 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork Aju Jugessur, Ph.D. Director, University of Iowa Microfabrication Facility (UIMF) Optical Science and Technology Center Professor Adjunct, Physics and Astronomy University of Iowa Office: IATL 202, Tel: 319-3532342 Labs: IATL 170, 172, 174 https://ostc.uiowa.edu/uimf -------------- next part -------------- An HTML attachment was scrubbed... URL: From sieb at 4dlabs.ca Wed Dec 20 13:01:47 2017 From: sieb at 4dlabs.ca (Nathanael Sieb) Date: Wed, 20 Dec 2017 10:01:47 -0800 Subject: [labnetwork] surplus equipment Message-ID: <3615841a-1c64-bf21-75cf-164af4268aef@4dlabs.ca> An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: M3305-2504 Safety & Maintenance Manual-partial.pdf Type: application/pdf Size: 1358684 bytes Desc: not available URL: From agregg at abbiegregg.com Sat Dec 30 03:05:30 2017 From: agregg at abbiegregg.com (Abbie Gregg) Date: Sat, 30 Dec 2017 08:05:30 +0000 Subject: [labnetwork] New lab in Brazil In-Reply-To: References: Message-ID: <46ab2a796ea04b40b2723f6c4961bd8b@mail31.netvigour.com> HI Willyan, Thanks for sharing the photos and functions, it gives us a much better idea of what you have! Quite a bit of space! Chase space for support equipment seems limited in the long direction of the rooms. HEPA coverage and return air looks a little light in the Class 1000 area. Have you measured the cleanliness or air flow pattern? I am sure the tool shopping, tool hookup and tool start up will be exciting! How will you access the required tool utilities from the inside of the cleanrooms? Best Regards, Abbie Gregg President Abbie Gregg, Inc. 1130 East University Drive, Suite 105 Tempe, Arizona 85281 Phone 480 446-8000 x 107 Cell 480-577-5083 FAX 480-446-8001 email agregg at abbiegregg.com website www.abbiegregg.com CONFIDENTIALITY NOTICE: All information contained in or attached to this email constitutes confidential information belonging to Abbie Gregg, Inc., its affiliates and subsidiaries and/or its clients. This email and any attachments are proprietary and/or confidential and are intended for business use of the addressee(s) only. All other uses or disclosures are strictly prohibited. If the reader is not the intended recipient you are hereby notified that the perusal, copying or dissemination of this email is strictly prohibited. If you have received this communication in error, please notify the sender, and delete all copies of this message and its attachments immediately. From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Willyan Hasenkamp Carreira Sent: Tuesday, December 19, 2017 2:22 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] New lab in Brazil Hi, I just would like to THANK everyone for the feddback, it?s been very helpful. I'm trying to compile all the shared information and I will try to answer everyone in private. I?ve just realize it was hard to imagine what we have here, so attached there is a small presentation on the infrastructure and the space available for setting up the new lab (microfab). Thank you again! Kind regards, Willyan -- Prof. Dr. Willyan Hasenkamp Universidade do Vale do Rio dos Sinos - Unisinos Instituto Tecnol?gico de Semicondutores - itt Chip Escola Polit?cnica Programa de P?s-Gradua??o em Engenharia El?trica Av. Unisinos 950, 93022-750, S?o Leopoldo, RS www.unisinos.br - Phone: +55 (51) 3591-1122 / Ramal: 3181 Aviso legal: Esta mensagem eletr?nica e seus respectivos anexos, podem conter informa??es confidenciais. Se voc? n?o ? o(a) destinat?rio(a) correto(a) e/ou o conte?do do e-mail n?o lhe diz respeito notifique-nos, respondendo a este e-mail com c?pia para esirc at asav.org.br, e apague-o imediatamente. Fica, desde j?, notificado que qualquer a??o baseada no conte?do desta mensagem ? estritamente proibida e ilegal. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... 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