From aju-jugessur at uiowa.edu Tue Jan 3 11:08:11 2017 From: aju-jugessur at uiowa.edu (Jugessur, Aju S) Date: Tue, 3 Jan 2017 16:08:11 +0000 Subject: [labnetwork] Flammable cabinets Message-ID: Hi all, We are looking for used flammable cabinets (40-60 gallon) to store chemicals (mainly solvents) in our labs? Any suggestions or in case anyone has used ones that are not in use, we would be willing to purchase them. Thanks Regards Aju Aju Jugessur Ph.D. Director, University of Iowa Microfabrication Facility Professor (Adj.), Physics and Astronomy OSTC, Iowa Advanced Technology Labs University of Iowa 205 N. Madison St Iowa City, IA 52242 319 -353-2342 aju-jugessur at uiowa.edu http://ostc.uiowa.edu/uimf -------------- next part -------------- An HTML attachment was scrubbed... URL: From mhofheins at unm.edu Wed Jan 4 10:23:20 2017 From: mhofheins at unm.edu (Mark Hofheins) Date: Wed, 4 Jan 2017 15:23:20 +0000 Subject: [labnetwork] AMS 100 I-Speeder Message-ID: Hello All, We have an Alcatel 100 I-speeder DRIE We have been trying to get this tool working for quite some time finding problem after problem. With the help from some IT wizards, we have come to the conclusion that our software disk will not boot up correctly. Would someone with this tool be able to make a software disk copy we could get or purchase? Mark Hofheins mhofheins at unm.edu 505-710-3527 Micro Electronics Technician Manufacturing Engineering University of New Mexico MTTC 800 Bradbury S.E. Suit 235 Albuquerque, New Mexico 87106-4346 -------------- next part -------------- An HTML attachment was scrubbed... URL: From mheiden at engr.ucr.edu Mon Jan 9 14:30:57 2017 From: mheiden at engr.ucr.edu (Mark Heiden) Date: Mon, 9 Jan 2017 19:30:57 +0000 Subject: [labnetwork] Sodium Flouride Sputtering Message-ID: <62f01d645aa74ecfadeadd0aa93152fb@engr.ucr.edu> Greetings, We have been asked to sputter Sodium Flouride in our AJA Orion system and I was wondering if anyone had done this or could share any system contamination or safety concerns on this proposal? I did find targets are commercially available. Thank you in advance, Mark Heiden NanoFab Cleanroom Manager Center for Nanoscale Science and Engineering University of California, Riverside 951-827-2551 -------------- next part -------------- An HTML attachment was scrubbed... URL: From ngottron at andrew.cmu.edu Tue Jan 10 14:10:11 2017 From: ngottron at andrew.cmu.edu (Norman Gottron) Date: Tue, 10 Jan 2017 14:10:11 -0500 Subject: [labnetwork] PDS 2010 Labcoter 2 - Contamination Control Message-ID: <06cd01d26b75$2a8c9e50$7fa5daf0$@andrew.cmu.edu> Hello All, We are looking to relocate our SCS parylene deposition (PDS 2010 Labcoter 2) system to our new cleanroom facility, and it seems wise to consider contamination control in placing this tool. I know that the use of these tools is relatively widespread, and I am wondering how others handle the particles/parylene flakes that are released when the tool is cleaned and maintained. We recently experienced an uptick in use on the tool and began running thicker deposition (on the scale of microns for each deposition), both of which have contributed to particle concerns in the area around the tool. Most of the particle concerns are a result of cleaning the cold trap probe (indicating there may be a better way to do this), but we've had to recently tear into the system and unclog the vaporizer line, which also is a pretty dirty process. In particular, can anyone comment on the following? . Is your system located in clean space? If so, what is the class designation of its location? . How do you mitigate the risk of particle release during tool maintenance/cleaning? Thanks! Norman Gottron Process Engineer, Carnegie Mellon University Nanofabrication Facility Electrical and Computer Engineering | Carnegie Mellon University 5000 Forbes Ave Pittsburgh, PA 15213 Phone: 412-268-4205 Fax: 412-268-3497 www.ece.cmu.edu www.nanofab.ece.cmu.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From bob at eecs.berkeley.edu Tue Jan 10 16:31:30 2017 From: bob at eecs.berkeley.edu (Robert M. HAMILTON) Date: Tue, 10 Jan 2017 13:31:30 -0800 Subject: [labnetwork] PDS 2010 Labcoter 2 - Contamination Control In-Reply-To: <06cd01d26b75$2a8c9e50$7fa5daf0$@andrew.cmu.edu> References: <06cd01d26b75$2a8c9e50$7fa5daf0$@andrew.cmu.edu> Message-ID: Norman Gottron, The UC Berkeley NanoLab and its predecessor, the Microlab have operated a model PDS10 labcoater 2 for more than a decade. It is a reliable tool and SCS has provided good advice and support. As noted, the parylene films it creates needs periodic cleaning from the internals of the coat chamber. These residues might cause issues in a cleanroom; however, from experience they tend to peel off in fairly large, cohesive layers and not as fine particle. To better manage our tool we have made a few modifications: 1) we do not vent to air; we vent to dry nitrogen. Regrettably, too many researchers vented the tool to air while the cold-finger (coldtrap) was still chilled and failed to lift it out of its chamber which resulted in condensation. n warmup this would end up in the Edwards RV-8 wet pump trashing its oil. 2) we exchanged the RV-8 for a Kashiyama NeoDry 15C, a drypump of similar throughput, about few years ago which has performed well and required less maintenance than the wet pump. 3) we keep spare Convectron gauges and periodically check to make sure the 1/8" NPT port for this gauge does not get clogged with parylene. 4) using the resources of our machine chop we built a jig that holds the coldtrap horizontal. It has a rod-guided movable scrapper which facilitates cleaning films from the cold finger. I also am guessing because we use a dry pump we could eliminate LN and replace the cold finger by stuffing some large surface area material, such as a stainless dutch-weave as found in many foreline traps and toss it when it get loaded. A similar recommendation is to test Chore-Boy copper scrubbers as a cheap, large surface area disposable trap material to protect the dry pump from parylene vapor. As of now we have not done a test to see the efficacy of such a process change. It would be easy to place a substrate at the bottom of the trap and measure how much, if any, parylene broke through the trap. [image: Inline image 1] Regards, Bob Hamilton Robert Hamilton University of CA, Berkeley Marvell NanoLab Equipment Manager Rm 520 Sutardja Dai Hall, MC 1754 Berkeley, CA 94720 Phone 510-809-8618 (desk - preferred) Mobile 510-325-7557 (my personal mobile) E-mail preferred: bob at eecs.berkeley.edu http://nanolab.berkeley.edu/ On Tue, Jan 10, 2017 at 11:10 AM, Norman Gottron wrote: > Hello All, > > > > We are looking to relocate our SCS parylene deposition (PDS 2010 Labcoter > 2) system to our new cleanroom facility, and it seems wise to consider > contamination control in placing this tool. I know that the use of these > tools is relatively widespread, and I am wondering how others handle the > particles/parylene flakes that are released when the tool is cleaned and > maintained. We recently experienced an uptick in use on the tool and began > running thicker deposition (on the scale of microns for each deposition), > both of which have contributed to particle concerns in the area around the > tool. Most of the particle concerns are a result of cleaning the cold trap > probe (indicating there may be a better way to do this), but we?ve had to > recently tear into the system and unclog the vaporizer line, which also is > a pretty dirty process. > > > > In particular, can anyone comment on the following? > > ? Is your system located in clean space? If so, what is the > class designation of its location? > > ? How do you mitigate the risk of particle release during tool > maintenance/cleaning? > > > > Thanks! > > > > > > Norman Gottron > > Process Engineer, Carnegie Mellon University Nanofabrication Facility > > Electrical and Computer Engineering | Carnegie Mellon University > > 5000 Forbes Ave > > Pittsburgh, PA 15213 > > Phone: 412-268-4205 <(412)%20268-4205> > > Fax: 412-268-3497 <(412)%20268-3497> > > www.ece.cmu.edu > > www.nanofab.ece.cmu.edu > > > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 198285 bytes Desc: not available URL: From julia.aebersold at louisville.edu Tue Jan 10 16:53:07 2017 From: julia.aebersold at louisville.edu (julia.aebersold at louisville.edu) Date: Tue, 10 Jan 2017 21:53:07 +0000 Subject: [labnetwork] PDS 2010 Labcoter 2 - Contamination Control In-Reply-To: <06cd01d26b75$2a8c9e50$7fa5daf0$@andrew.cmu.edu> References: <06cd01d26b75$2a8c9e50$7fa5daf0$@andrew.cmu.edu> Message-ID: We keep our Parylene coating system in a regular rather than in our cleanroom. It does generate particles, but it can be managed. Cheers! Julia Aebersold, Ph.D. Cleanroom Manager Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 502-852-1572 http://louisville.edu/micronano/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Norman Gottron Sent: Tuesday, January 10, 2017 2:10 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] PDS 2010 Labcoter 2 - Contamination Control Hello All, We are looking to relocate our SCS parylene deposition (PDS 2010 Labcoter 2) system to our new cleanroom facility, and it seems wise to consider contamination control in placing this tool. I know that the use of these tools is relatively widespread, and I am wondering how others handle the particles/parylene flakes that are released when the tool is cleaned and maintained. We recently experienced an uptick in use on the tool and began running thicker deposition (on the scale of microns for each deposition), both of which have contributed to particle concerns in the area around the tool. Most of the particle concerns are a result of cleaning the cold trap probe (indicating there may be a better way to do this), but we've had to recently tear into the system and unclog the vaporizer line, which also is a pretty dirty process. In particular, can anyone comment on the following? * Is your system located in clean space? If so, what is the class designation of its location? * How do you mitigate the risk of particle release during tool maintenance/cleaning? Thanks! Norman Gottron Process Engineer, Carnegie Mellon University Nanofabrication Facility Electrical and Computer Engineering | Carnegie Mellon University 5000 Forbes Ave Pittsburgh, PA 15213 Phone: 412-268-4205 Fax: 412-268-3497 www.ece.cmu.edu www.nanofab.ece.cmu.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From info at fabsurplus.com Wed Jan 11 09:22:15 2017 From: info at fabsurplus.com (Stephen Howe) Date: Wed, 11 Jan 2017 15:22:15 +0100 Subject: [labnetwork] Solitec spin coater schematic In-Reply-To: References: Message-ID: <1484144535.2783.51.camel@stephen-Q500A> Dear Gregg, We have a rather old Solitec 5110 for sale and it includes the manual. There are photos at the link below. Maybe you can use the photos to determine if what we have might possibly be the same as what you have ? https://www.fabsurplus.com/sdi_catalog/salesItemDetails.do?id=73208 SDI ID: 73208 Manufacturer: Solitec Model: 5110 Description: Spin Coater Version: 3 to 6 inch Vintage: 01.10.1998 Quantity: 1 Sales Condition: as is where is Lead Time: immediately Comments: - Model: 5110 - Can process wafers up to 6"/150mm in diameter. - Control Panel has 5 potentiometers for speed setting with individual 0-99.9s timers. - Can be operated in Auto or Manual Operation. - Manuals and drawings included - 3" Vacuum Chuck included -Located in Boerne, TX Yours sincerely, Stephen Howe Company Owner SDI Fabsurplus Group +1 830 388 1071 (Mobile) +39 335 710-7756 (Mobile, Italy) Skype: Stephencshowe email: info at fabsurplus.com WWW.FABSURPLUS.COM Facebook: www.facebook.com/fabsurplus Twitter: http://twitter.com/fabsurplus Google+: https://plus.google.com/+Fabsurplus On Mon, 2016-11-21 at 14:39 -0700, Gregg Cure wrote: > Hello all, > > > I have an elderly Solitec Model 1111-CD spincoater. It's been stalwart > and reliable for over 20 years. > > Recently, one or more of the timers stopped working. The controller is > all relay logic. > > > I know this is a long shot, but would anyone have a schematic for this > spincoater's controller? > > > Thanks, > > Gregg > > -- > Gregg D. Cure` > The University of Arizona > Office for Research and Discovery > Nano Fabrication and Processing Center > 1230 E. Speedway Blvd. > ECE104 Rm 209 > Tucson, AZ 85721-0104 > Office: 520.626.1987 > Cell: 520.307.0925 > Fax: 520.626.7877 > Website: http://mfc.engr.arizona.edu > > Website: http://research.arizona.edu/ > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork From tony.olsen at utah.edu Wed Jan 11 10:45:26 2017 From: tony.olsen at utah.edu (Tony L Olsen) Date: Wed, 11 Jan 2017 15:45:26 +0000 Subject: [labnetwork] PDS 2010 Labcoter 2 - Contamination Control In-Reply-To: <06cd01d26b75$2a8c9e50$7fa5daf0$@andrew.cmu.edu> References: <06cd01d26b75$2a8c9e50$7fa5daf0$@andrew.cmu.edu> Message-ID: <9269F95770688D4FA77843D0D2DA2ABDC7C1E16D@X-MB1.xds.umail.utah.edu> Norman As we moved into our new cleanroom facility a few years ago, this was a topic of discussion. Without question, the system does generate a lot of particles, both during a system/chamber clean and cleaning the thimble or cold finger after each cycle. Although many wanted the tool in the cleanroom and there are ways to reduce the impact of the particles, we decided to install the tool in a room adjacent to the cleanroom. We considered an isolated Class 10000 room in the cleanroom, a tent, a snorkel, and other options, but were not comfortable that any option would prevent migration of particles onto cleanroom clothing and into the rest of the cleanroom. Since we made that decision, it has proved convenient for those lab members who only use the facility to deposit parylene and do not need full cleanroom access and safety training. Also, a user does not need to gown up every time they want to check the status of their process cycle. Although it is not yet active, we have placed a portable ULPA fan filter unit above the coater, believing it may resolve potential concerns about particles in the immediate workspace. Also, we do not allow oil-based pumps in our new facility. We made some minor modifications and switched to an Edwards nXDS15i dry scroll pump. This is the primary scroll pump we use in our facility with spares and rebuild kits on-hand. It has worked well. tonyO Tony Olsen Nanofab Cleanroom Supervisor/Process Engineer University of Utah 36 S Wasatch Dr, Suite 2500 Salt Lake City, UT 84112 801-587-0651 office 801-587-3077 fax www.nanofab.utah.edu From: Norman Gottron [mailto:ngottron at andrew.cmu.edu] Sent: Tuesday, January 10, 2017 12:10 To: labnetwork at mtl.mit.edu Subject: [labnetwork] PDS 2010 Labcoter 2 - Contamination Control Hello All, We are looking to relocate our SCS parylene deposition (PDS 2010 Labcoter 2) system to our new cleanroom facility, and it seems wise to consider contamination control in placing this tool. I know that the use of these tools is relatively widespread, and I am wondering how others handle the particles/parylene flakes that are released when the tool is cleaned and maintained. We recently experienced an uptick in use on the tool and began running thicker deposition (on the scale of microns for each deposition), both of which have contributed to particle concerns in the area around the tool. Most of the particle concerns are a result of cleaning the cold trap probe (indicating there may be a better way to do this), but we've had to recently tear into the system and unclog the vaporizer line, which also is a pretty dirty process. In particular, can anyone comment on the following? * Is your system located in clean space? If so, what is the class designation of its location? * How do you mitigate the risk of particle release during tool maintenance/cleaning? Thanks! Norman Gottron Process Engineer, Carnegie Mellon University Nanofabrication Facility Electrical and Computer Engineering | Carnegie Mellon University 5000 Forbes Ave Pittsburgh, PA 15213 Phone: 412-268-4205 Fax: 412-268-3497 www.ece.cmu.edu www.nanofab.ece.cmu.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From cpvandam at ucdavis.edu Wed Jan 18 15:57:20 2017 From: cpvandam at ucdavis.edu (C.P. van Dam) Date: Wed, 18 Jan 2017 12:57:20 -0800 Subject: [labnetwork] Job posting Laboratory Manager, Center for Nano- and Microfabrication (CNM2) at UC Davis Message-ID: Dear All: There is a new job position at the University of California, Davis. The position title is: CNM2 Laboratory Manager. The link to the job posting is: www.employment.ucdavis.edu/applicants/Central?quickFind=75496 The job summary: Under direction of the CNM2 Faculty Director (chair of the CNM2 Executive Board), the CNM2 Laboratory Manager (Technical Director) is responsible for coordinating and managing the day-to-day operations of the shared resource facility, including supervision of technical staff, ensuring that lab equipment remains in excellent working conditions, coordination of training activities, maintenance of laboratory safety and up-to-date standard operating procedures. The Laboratory Manager attends and presents CNM2 operational reports at Executive Board meetings, assists in the preparation of annual operating budgets, and implements strategic plans developed by the CNM2 Executive Board. Collaborates with the responsible financial account manager to oversee monthly recharge billing. The CNM2 Laboratory Manager serves as the primary point of contact for all current and future potential users, informs about technical capabilities of the facility, and maintains and archives process recipes. Hold regular users meetings, and maintain close communication with facility users. Stay up-to-date about the Research Core Facility Programs to inform users of other available facilities on campus. UC Davis maintains the Research Core Facility Program that will serve as a resource and communication platform for the interaction with other shared resource facilities on campus. The CNM2 Laboratory Manager will assist in educational planning of current and new educational activities related to the CNM2 including classes and short courses. In coordination with the CNM2 Faculty Director, help increase visibility, generate resources, and expand the user base among industry partners. Minimum Qualifications: Advanced science or engineering degree and a minimum of 5 years of experience working in a nano/micro processing and fabrication clean room facility, especially in the fields of materials science and engineering, or semiconductor, nanotechnology, or biotechnology. Project management experience including proven technical contributions and leadership. Experience developing and implementing strategic plans. Experience with core facility management including recharge rate development, instrument maintenance, and business plan development. Experience using interpersonal, communication, presentation and public speaking skills to work effectively and sensitively with diverse constituencies, and to represent UC Davis in a professional, confident manner that promotes a positive image for the Center and the College. Experience in a customer service oriented recharge facility environment. Experience motivating, coaching and mentoring staff, and build interdepartmental and interdisciplinary teams. Skills working in safe laboratory operations and dedication to safe operating procedures. Leadership skills. Preferred Qualifications: Experience with design and planning of update, expansion or new facilities. Experience with micro- and nano-fabrication technology. Experience in materials cross contamination controls. Publication record in peer reviewed journals. Thank you in advance for your interest in this position. C.P. (Case) van Dam Professor, Mechanical and Aerospace Engineering Associate Dean for Facilities and Capital Planning, College of Engineering 1035 Kemper Hall University of California at Davis One Shields Avenue Davis, CA 95616 Phone: (+1) 530-752-7741 Email: cpvandam at ucdavis.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From eabelev at pitt.edu Mon Jan 23 12:41:55 2017 From: eabelev at pitt.edu (Abelev, Esta) Date: Mon, 23 Jan 2017 17:41:55 +0000 Subject: [labnetwork] Ge2Sb2Te5 deposition Message-ID: Hi, We recently got a request to sputter Ge2Sb2Te5. Does anyone have an experience sputtering this material, our cleanroom have only one metal sputtering system that usually dedicated to following materials Au, Ti, Nb, NbGe, Al (we are not allowing any magnetic materials in this system). Some users expressed concerns regarding Sb been a UHV pollutant, any comments? Thank you, Esta ----------------------- Esta Abelev, PhD Technical Director, Petersen Institute of NanoScience and Engineering University of Pittsburgh | 3700 O'Hara Street | 636| Pittsburgh, PA 15261 412-383-4096 | eabelev at pitt.edu | nano.pitt.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From RobertVandusen at cunet.carleton.ca Tue Jan 24 17:12:58 2017 From: RobertVandusen at cunet.carleton.ca (Robert Vandusen) Date: Tue, 24 Jan 2017 22:12:58 +0000 Subject: [labnetwork] poly silicon germanium Message-ID: Hi everyone. A client has contacted me looking for polysilicon germanium deposition capability (with germanium less than 20%). Just wondering if there is anyone on the Labnetwork that might be able to help. Thanks Robert Vandusen Microfabrication and FANSSI Cleanlab Facility Manager Electronics Department Carleton University room: 4184 Mackenzie Building 613-520-2600 ext 5761 rvanduse at doe.carleton.ca -------------- next part -------------- An HTML attachment was scrubbed... URL: From jprovine at stanford.edu Wed Jan 25 10:16:34 2017 From: jprovine at stanford.edu (J Provine) Date: Wed, 25 Jan 2017 07:16:34 -0800 Subject: [labnetwork] poly silicon germanium In-Reply-To: References: Message-ID: hi robert, i'm guessing SiGe is also available some other places, but it definitely is at stanford's SNF ( https://snf.stanford.edu/SNF/equipment/chemical-vapor-deposition/low-pressure-cvd/thermcopoly2-1/characterization/ee412-final-reports) and Berkeley's nanolab ( https://docs.google.com/document/d/1x0lDvrF1Pj04sJk7UTAs8pYEvLgN573C8lutnDwzJjI/edit and https://docs.google.com/document/d/1dK8MPkOfw_Rje439klHMx0WPDXfcvpI-b6KUcajLmpQ/edit ). take care j On Tue, Jan 24, 2017 at 2:12 PM, Robert Vandusen < RobertVandusen at cunet.carleton.ca> wrote: > Hi everyone. > > > > A client has contacted me looking for polysilicon germanium deposition > capability (with germanium less than 20%). > > > > Just wondering if there is anyone on the Labnetwork that might be able to > help. > > > > Thanks > > Robert Vandusen > Microfabrication and FANSSI Cleanlab Facility Manager > Electronics Department > Carleton University > room: 4184 Mackenzie Building > 613-520-2600 ext 5761 <(613)%20520-2600> > rvanduse at doe.carleton.ca > > > > > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Thu Jan 26 06:26:24 2017 From: rmorrison at draper.com (Morrison, Richard H., Jr.) Date: Thu, 26 Jan 2017 11:26:24 +0000 Subject: [labnetwork] doped Poly Question Message-ID: Hi Everyone, I have the need to deposit In-Situ doped P-Type Polysilicon. Do any of you run that process, is so what feed gas is commonly used? I understand that In-Situ doped N-Type poly uses P or As mixed with Silane in the same cylinder is that correct? Do any of you offer P-Type In-Situ doped polysilicon for 150mm wafers? Thanks Rick Richard H. Morrison Principal Member of the Technical Staff Draper 555 Technology Square Cambridge, MA 02139-3573 Work 617-258-3420 Cell 508-930-3461 www.draper.com ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From hower at umich.edu Fri Jan 27 09:51:57 2017 From: hower at umich.edu (Robert Hower) Date: Fri, 27 Jan 2017 09:51:57 -0500 Subject: [labnetwork] doped Poly Question In-Reply-To: References: Message-ID: Richard, At the University of Michigan LNF we have 19 furnaces that can handle up to 150mm including P-type insitu doped poly. Our p-type poly is doped with boron. We have only characterized insitu p-type for 100mm but have not had a request for 150mm so it is not characterized. Can you give me some more information as to what you need? Starting material? Processing done before this deposition? I would be happy to send you the data we have for 4" if you are interested. Rob On Thu, Jan 26, 2017 at 6:26 AM, Morrison, Richard H., Jr. < rmorrison at draper.com> wrote: > Hi Everyone, > > > > I have the need to deposit In-Situ doped P-Type Polysilicon. Do any of you > run that process, is so what feed gas is commonly used? > > > > I understand that In-Situ doped N-Type poly uses P or As mixed with Silane > in the same cylinder is that correct? > > > > Do any of you offer P-Type In-Situ doped polysilicon for 150mm wafers? > > > > > > Thanks > > > > Rick > > > > > > Richard H. Morrison > > Principal Member of the Technical Staff > > Draper > > 555 Technology Square > > Cambridge, MA > > 02139-3573 > > > > Work 617-258-3420 <(617)%20258-3420> > > Cell 508-930-3461 <(508)%20930-3461> > > www.draper.com > > > ------------------------------ > Notice: This email and any attachments may contain proprietary (Draper > non-public) and/or export-controlled information of Draper. If you are not > the intended recipient of this email, please immediately notify the sender > by replying to this email and immediately destroy all copies of this email. > ------------------------------ > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -- Robert W. Hower, Ph.D. The University of Michigan, Lurie Nanofabrication Facility 1301 Beal Ave, 1234A EECS Ann Arbor, MI 48109 734-827-4370 -------------- next part -------------- An HTML attachment was scrubbed... URL: From norman.bergren at nist.gov Tue Jan 31 12:50:20 2017 From: norman.bergren at nist.gov (Bergren, Norman F. (Fed)) Date: Tue, 31 Jan 2017 17:50:20 +0000 Subject: [labnetwork] LED cleanroom lights Message-ID: Hi, We would like to change out our cleanroom lighting (T5) 277v to LEDs. Any suggestions on what to use? Does anyone have experience with a change out? I saw Carnegie Mellon and University of Chicago?s new installation and they seemed well done. Thanks Norm [cid:image001.png at 01D15F30.2A5E7F40] ************************************ Norman F. Bergren Boulder Micro-fabrication Facility 325 Broadway Mail Stop 817.03 Boulder, CO 80305 303-497-5344 bergren at nist.gov -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 2594 bytes Desc: image001.png URL: