[labnetwork] PDS 2010 Labcoter 2 - Contamination Control

[julia.aebersold at louisville.edu]

We keep our Parylene coating system in a regular rather than in our cleanroom.  It does generate particles, but it can be managed.

Cheers!

Julia Aebersold, Ph.D.
Cleanroom Manager
Micro/Nano Technology Center
University of Louisville
Shumaker Research Building, Room 233
2210 South Brook Street
Louisville, KY  40292

502-852-1572
http://louisville.edu/micronano/

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Norman Gottron
Sent: Tuesday, January 10, 2017 2:10 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] PDS 2010 Labcoter 2 - Contamination Control

Hello All,

We are looking to relocate our SCS parylene deposition (PDS 2010 Labcoter 2) system to our new cleanroom facility, and it seems wise to consider contamination control in placing this tool.  I know that the use of these tools is relatively widespread, and I am wondering how others handle the particles/parylene flakes that are released when the tool is cleaned and maintained.  We recently experienced an uptick in use on the tool and began running thicker deposition (on the scale of microns for each deposition), both of which have contributed to particle concerns in the area around the tool.  Most of the particle concerns are a result of cleaning the cold trap probe (indicating there may be a better way to do this), but we've had to recently tear into the system and unclog the vaporizer line, which also is a pretty dirty process.

In particular, can anyone comment on the following?

*        Is your system located in clean space?  If so, what is the class designation of its location?

*        How do you mitigate the risk of particle release during tool maintenance/cleaning?

Thanks!


Norman Gottron
Process Engineer, Carnegie Mellon University Nanofabrication Facility
Electrical and Computer Engineering | Carnegie Mellon University
5000 Forbes Ave
Pittsburgh, PA 15213
Phone: 412-268-4205
Fax: 412-268-3497
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