[labnetwork] Metamaterials deposition - Ag and SiO2

[Abelev, Esta]

Dear Colleagues,

Recently, we got a request to deposit SiO2 and Ag in our e-beam evaporator. We have only one e-beam UHV evaporator (brand new) which we planned to dedicate for metals (only). From what was discussed the group is planning to deposit alternative layers of SiO2 and Ag (10-20nm thick) to ~1micron thick overall thickness.
Did anyone have experience with similar multilayer structures, would you advise me if e-beam evaporation or sputtering would better for this project?
If we will have to go with evaporation of SiO2, will it have contamination issues with metal deposition?

Thanks for advice, Esta

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Esta Abelev, PhD
Technical Director, Petersen Institute of NanoScience and Engineering
University of Pittsburgh | 3700 O'Hara Street | 636| Pittsburgh, PA 15261
412-383-4096 | eabelev at pitt.edu<mailto:eabelev at pitt.edu> | nano.pitt.edu<https://na01.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.nano.pitt.edu%2F&data=01%7C01%7Ceabelev%40pitt.edu%7C9f5bd58ba84940765cf308d4024fbe18%7C9ef9f489e0a04eeb87cc3a526112fd0d%7C1&sdata=3KfbG5VbshqdoIAPxvX%2F2s1UeU7ultmBoZmm%2FaZ2Itc%3D&reserved=0>


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