[labnetwork] Raith vs. Elionix E-beam writers

[Kevin McPeak]

Dear Colleagues,

My colleagues at Tulane University and I recently were awarded an NSF
MRI grant for an E-beam lithography system. We are currently looking
at two different suppliers for this system, Raith and Elionix. For
Raith we are looking at their Voyager100 (50 kV) and E-Line Plus (30
kV) systems and for Elionix we are looking at their latest ELS-S50EX
(50 kV) model. All three systems have been placed within our budget.

Our group of e-beam writers is interested in achieving both large
single field sizes of periodic arrays of nanostructures (e.g. ~200 nm
features over 500 um x 500 um region) and excellent stitching accuracy
for writing 5 mm x 5 mm arrays of nanostructures.

I would appreciate any input you have on using Raith and Elionix
systems for high-performance e-beam writing (i.e. custom support,
usability, uptime, etc.)

Thank you.

Regards,
Kevin

-- 
Kevin M. McPeak
Assistant Professor
Louisiana State University
Dept. of Chemical Engineering
110 Chemical Engineering Bldg Room 324
S. Stadium Drive
Baton Rouge, LA  70803
email: kmcpeak at lsu.edu
phone: 225-578-0058