From jun.li at mcgill.ca Tue Apr 3 11:39:26 2018 From: jun.li at mcgill.ca (Jun Li, Mr) Date: Tue, 3 Apr 2018 15:39:26 +0000 Subject: [labnetwork] Upgrade EVG620 Mask aligner computer Message-ID: Good morning All, We have EVG620 Mask aligner system in our fab, with original the PC of Window 2000 system about 10+yrs age. These years from time to time, the computer or software is "freeze" during use. We have to restart the PC from time to time. EVG has an option to upgrade the PC system, basically it will be Old tool with NEW PC control +some hardware modifications. According to EVG, several customers have done that, we are wondering if anyone here did that option before and how is the experience after that? Many thanks for your feedbacks. Jun Li Nanotool Fab McGill University Rutherford Physics Building 3600 University Street Montreal, Quebec H3A 2T8 Canada T: 514 398-5708 F: 514 398-8434 From mmoneck at andrew.cmu.edu Tue Apr 3 16:06:29 2018 From: mmoneck at andrew.cmu.edu (Matthew Moneck) Date: Tue, 3 Apr 2018 20:06:29 +0000 Subject: [labnetwork] Dicing of Langasite Message-ID: <4c2b162b87c343c7bb4046206762dd38@DCNS-MSGMLT-03.andrew.ad.cmu.edu> Dear Colleagues, We have recently had a request to dice langasite (La3Ga5SiO14) on our wafer dicing saw. Have any of you had experience with this material? I have only been able to gather limited information on this material, so first and foremost, I would like to know whether there are any concerns over toxicity if we choose to dice this substance. Best Regards, Matt -- Matthew T. Moneck, Ph.D. Executive Manager, Carnegie Mellon Nanofabrication Facility Electrical and Computer Engineering | Carnegie Mellon University 5000 Forbes Ave., Pittsburgh, PA 15213-3890 T: 412.268.5430 F: 412.268.3497 www.ece.cmu.edu nanofab.ece.cmu.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From nclay at seas.upenn.edu Tue Apr 3 17:11:44 2018 From: nclay at seas.upenn.edu (Noah Clay) Date: Tue, 3 Apr 2018 17:11:44 -0400 Subject: [labnetwork] UGIM 2018 At Penn. Message-ID: Dear All, With under three months to go until this year?s UGIM Conference at the University of Pennsylvania, I?m writing to gently remind interested parties to kindly register, plan your travel and kindly book your hotel rooms. Our program is nearly full and our sponsorships (fundraising) are nearly complete. We are featuring several keynote speakers, whose bios I?ll update shortly on the UGIM website (ugim.nano.upenn.edu ) 1. Prof. Jared Haun from UC Irvine will discuss ?Embracing the Nanobiology Future" 2. Donald Tennant from Cornell?s Nanoscale Science & Technology will lead off a keynote on Electron Beam Lithography 3. Prof. Ken Shepard from Columbia will discuss Ben Franklin?s contributions to science (Ben = Penn?s founder) 4. We are close to booking one of the White House?s appointees from the Office of Science & Technology Policy?perhaps a long shot, but stay tuned! Kind regards, Noah Clay (Penn) & Vincent Luciani (NIST) -------------- next part -------------- An HTML attachment was scrubbed... URL: From spaolini at cns.fas.harvard.edu Tue Apr 3 17:25:38 2018 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Tue, 3 Apr 2018 21:25:38 +0000 Subject: [labnetwork] Jipelec Jetfirst RTP Message-ID: Greetings fellow Nanofabbers, I was wondering if anyone out there has a software disc for a Jipelec Jetfirst 150 including the PIMS portion. The computer for my system did not survive a dose of cooling water over the weekend. I am attempting to clone the hard drive and install it on a new PC but I can't find the software that I installed in 2008. Should someone lend me the disc I need, I can return the favor with a boat ride in Boston harbor over the summer, refreshments and fishing tackle included. Thanks! Steve Paolini Equipment dood Harvard Center for Nanoscale systems Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From dave101260 at gmail.com Tue Apr 3 19:04:43 2018 From: dave101260 at gmail.com (Dave Terry) Date: Tue, 03 Apr 2018 23:04:43 +0000 Subject: [labnetwork] Upgrade EVG620 Mask aligner computer In-Reply-To: References: Message-ID: Hello Jun Li, Last November I experienced the same issues on one of the 620?s at MIT until the PC finally would not boot up. I found the issue to be several burst capacitors on the PC motherboard. By replacing the motherboard (with a similar, slightly better one) the tool was back up and running for a total cost of $200 dollars. No machine hardware needed to be changed or modified. I know that this solution isn?t something that EVG would ever suggest, or even investigate, but It worked out really well for our lab. (And our budget) Feel free to contact me if you?d like further details. All the best, Dave Terry Project Technician, MIT On Tue, Apr 3, 2018 at 3:49 PM Jun Li, Mr wrote: > Good morning All, > > We have EVG620 Mask aligner system in our fab, with original the PC of > Window 2000 system about 10+yrs age. These years from time to time, the > computer or software is "freeze" during use. We have to restart the PC from > time to time. EVG has an option to upgrade the PC system, basically it > will be Old tool with NEW PC control +some hardware modifications. > According to EVG, several customers have done that, we are wondering if > anyone here did that option before and how is the experience after that? > > Many thanks for your feedbacks. > > > Jun Li > Nanotool Fab > McGill University > Rutherford Physics Building > 3600 University Street > Montreal, Quebec H3A 2T8 Canada > T: 514 398-5708 > F: 514 398-8434 > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Best Regards, Dave Terry ??????????????????? Sent from Gmail Mobile on iPhone 5s 617 784 7942 -------------- next part -------------- An HTML attachment was scrubbed... URL: From fouad.karouta at anu.edu.au Tue Apr 3 23:56:00 2018 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Wed, 4 Apr 2018 03:56:00 +0000 Subject: [labnetwork] Ball Rooms Message-ID: Dear all, At ANU we are in the process of designing a new clean room facility 650 m2 ball room and similar surface of a subfab to host facilities of equipment in ball room. The ball room will be split into two parts: one ISO5 and one ISO6. There is an intention to have a tour in Europe to visit such clean room facilities with a similar configuration: ball room and subfab. Hence I am making a call to our European network members with similar facilities to respond to this email (not necessarily through the network) informing me about your facility and that a visit to your site is possible. Thank you, Fouad Karouta ************************************* Manager ANFF ACT Node Australian National Fabrication Facility Research School of Physics and Engineering L. Huxley Building (#56), Mills Road, Room 4.02 Australian National University ACT 2601, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au http://anff-act.anu.edu.au/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From fouad.karouta at anu.edu.au Wed Apr 4 00:05:56 2018 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Wed, 4 Apr 2018 04:05:56 +0000 Subject: [labnetwork] Etching III-V and Al/Cr Message-ID: Dear colleagues, I am looking for information regarding using a same ICP-RIE etcher to do etching of III-V semiconductors (processes like BCl3:Cl2:Ar, SiCl4:Ar, Cl2:Ar:H2, etc.) along etching some metals like Cr (Cl2:O2) or Al (BCl3). Our core business is III-V materials and we are keen to keep the integrity of the machine with respect to this type of processing: etching waveguides and nano-pillars (aspect ratio of 10:1 or higher) and Knowing that etching AlGaAs/AlAs layers is authorised in the system I like to know your experience with etching pure metals like Al or Cr in the same system along III-V and whether the metal etching may cause any reproducibility issues. Your feedback is much appreciated! Regards, Fouad Karouta ************************************* Manager ANFF ACT Node Australian National Fabrication Facility Research School of Physics and Engineering L. Huxley Building (#56), Mills Road, Room 4.02 Australian National University ACT 2601, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au http://anff-act.anu.edu.au From tem at umd.edu Wed Apr 4 11:37:06 2018 From: tem at umd.edu (Thomas E. Murphy) Date: Wed, 4 Apr 2018 11:37:06 -0400 Subject: [labnetwork] UMD seeks Electron-Beam Lithography Specialist Message-ID: I would be very grateful if you could please share this posting with any individuals you know of who you feel might be interested. Please also feel free to circulate to others who may know of likely candidates. Many thanks, Thomas E. Murphy *Title*: *Nanolithography Specialist* *Posting: **https://www.nanocenter.umd.edu/about/jobs/ * *Description*: This individual is responsible for overseeing the operation of the electron-beam lithography facility in the University of Maryland Nanocenter. Key responsibilities shall include: training and advising users in the safe and effective use of the instruments; assisting with and documenting lithographic process and recipe development; establishing and fostering a thriving, collaborative community of users; coordinating all scheduled and unscheduled service of the instruments; developing and managing a facility budget; general lab maintenance; maintenance of safety documentation, procedures, and training; interfacing with electron-beam lithography system vendors and service providers; collaborating with other Nanocenter staff to integrate electron-beam lithography processes and practices with other lithographic, deposition, metrological and microscopy tools; interfacing with regional partners and peers at neighboring facilities; and advising the Nanocenter leadership and steering committee about facility usage, policies, and best practices in the field of electron-beam nanolithography. The individual should have at least 4 year of prior experience in operating electron-beam lithography systems. A Ph.D. in engineering or science is expected, although prior experience with nanolithography beyond the 4 years stated above may substitute for educational degrees. Because of the significant required interaction with students and other users, strong communication and interpersonal skills are as important as technical acumen. *To apply*: Interested applicants are asked to directly email a resume, cover letter and curriculum vitae to EBLnanocenter at umd.edu Best consideration date is April 20, 2018 -- *Thomas E. Murphy* (tem at umd.edu) Professor, Department of Electrical & Computer Engineering Director, Institute for Research in Electronics & Applied Physics University of Maryland 301-405-0030 (ERF 1201J) http://www.photonics.umd.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From mheiden at engr.ucr.edu Thu Apr 5 16:50:38 2018 From: mheiden at engr.ucr.edu (Mark Heiden) Date: Thu, 5 Apr 2018 20:50:38 +0000 Subject: [labnetwork] Tri-fold Cleanroom Wipes Message-ID: <17215b71d6f6447abce3c41e7fc8ae44@engr.ucr.edu> Greetings! Our Cleanroom supply vendor for over 10 years provided us with 12 x 12 Tri-folded Class 100 Cleanroom wipes. Last year they somehow lost access to that product and have only been able to provide an equivalent wipe that was flat stacked. This makes it virtually impossible to pick up one or two wipes from the stack with a gloved hand. This sounds a bit petty I know, but the ergonomics of the tri-folded wipes is just far superior and minimizes wasting expensive wipes. The problem is the only substitute I have found is a product by TechSpray which is only 9 x 9 inches and costs more than twice as much as the original. Does anyone have a vendor that still provides Class 100 wipes, Tri-folded at a value price? Thanks in advance, Mark Heiden NanoFab Cleanroom Manager Center for Nanoscale Science and Engineering University of California, Riverside 951-827-2551 -------------- next part -------------- An HTML attachment was scrubbed... URL: From James.Vlahakis at tufts.edu Thu Apr 5 20:26:07 2018 From: James.Vlahakis at tufts.edu (Vlahakis, James) Date: Fri, 6 Apr 2018 00:26:07 +0000 Subject: [labnetwork] Tri-fold Cleanroom Wipes In-Reply-To: <17215b71d6f6447abce3c41e7fc8ae44@engr.ucr.edu> References: <17215b71d6f6447abce3c41e7fc8ae44@engr.ucr.edu> Message-ID: <676C9381B5E6AC4FAE9CD9CFCC40DF1EE4B0EEC2@tabvmexdag1mb03.tufts.ad.tufts.edu> Hi Mark, this isn't petty at all, the ability to quickly grab a single wipe is Important! We "fan" flat stacked 12x12 wipes using an old bartender's trick - see the youtube video linked below https://www.youtube.com/watch?v=kgK2PLjKd04 Typically I use a gloved hand rather than a beer glass though :-) jim From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Mark Heiden Sent: Thursday, April 5, 2018 4:51 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Tri-fold Cleanroom Wipes Greetings! Our Cleanroom supply vendor for over 10 years provided us with 12 x 12 Tri-folded Class 100 Cleanroom wipes. Last year they somehow lost access to that product and have only been able to provide an equivalent wipe that was flat stacked. This makes it virtually impossible to pick up one or two wipes from the stack with a gloved hand. This sounds a bit petty I know, but the ergonomics of the tri-folded wipes is just far superior and minimizes wasting expensive wipes. The problem is the only substitute I have found is a product by TechSpray which is only 9 x 9 inches and costs more than twice as much as the original. Does anyone have a vendor that still provides Class 100 wipes, Tri-folded at a value price? Thanks in advance, Mark Heiden NanoFab Cleanroom Manager Center for Nanoscale Science and Engineering University of California, Riverside 951-827-2551 -------------- next part -------------- An HTML attachment was scrubbed... URL: From Jasper.Nijdam at georgetown.edu Tue Apr 10 13:16:02 2018 From: Jasper.Nijdam at georgetown.edu (Jasper Nijdam) Date: Tue, 10 Apr 2018 13:16:02 -0400 Subject: [labnetwork] Filter replacement inside the lab Message-ID: Heho All, Our HEPA filters are mounted such that we have to replace them from the inside of the lab. Can anybody share an SOP on how to do this while minimizing the amount of dust polluting the lab? Also, while I have your attention: Does anybody know a reliable repair service for our very old Dektak 3030? Thanks, -- Jasper Nijdam Technical Manager GNuLab, Georgetown University -------------- next part -------------- An HTML attachment was scrubbed... URL: From spaolini at cns.fas.harvard.edu Thu Apr 12 11:01:41 2018 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Thu, 12 Apr 2018 15:01:41 +0000 Subject: [labnetwork] Filter replacement inside the lab In-Reply-To: References: Message-ID: Please clarify whether you are referring to the pre-filters Upstream of the air handlers) or the actual HEPA filters in the ceiling downstream from the air handlers. In my experience, HEPA?s are never replaced. The best way to determine if the HEPA?s are struggling is to compare the motor amperage draw on the VFD?s with a baseline to the present readings. You must of course, run the motors at the same speed for comparison. If the filters are struggling, the amperage will be lower for a given speed, sort of like a shop vac when the inlet is clogged. Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Jasper Nijdam Sent: Tuesday, April 10, 2018 1:16 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Filter replacement inside the lab Heho All, Our HEPA filters are mounted such that we have to replace them from the inside of the lab. Can anybody share an SOP on how to do this while minimizing the amount of dust polluting the lab? Also, while I have your attention: Does anybody know a reliable repair service for our very old Dektak 3030? Thanks, -- Jasper Nijdam Technical Manager GNuLab, Georgetown University -------------- next part -------------- An HTML attachment was scrubbed... URL: From tobi at stanford.edu Thu Apr 12 15:57:35 2018 From: tobi at stanford.edu (Tobi Beetz) Date: Thu, 12 Apr 2018 19:57:35 +0000 Subject: [labnetwork] Job opening at Stanford: Electron Beam Lithography Manager Message-ID: Dear All - please help us spread the word about our open position for an e-beam lithography manager. Electron Beam Lithography Manager, Stanford Nano Shared Facilities The Stanford Nano Shared Facilities (SNSF) is seeking an Electron Beam Lithography (EBL) scientist to lead the operations of the facilities' Raith 150 EBL system, located at the Stanford Nanofabrication Facility (SNF), lead the operations of a new EBL system, as well as assist with the JEOL 6300FS EBL system, both located at SNSF. The successful candidate will manage the day-to-day operations, and maintenance of the instruments. S(he) will provide training and support to researchers, develop and implement advanced techniques and also be involved in planning for upgrades and new equipment. The EBL manager will report to the Associate Director of SNSF. Stanford's shared nanofacilities offer a comprehensive array of advanced nanofabrication and nanocharacterization tools. Over 1,300 researchers make use of the shared facilities each year in order to further their research programs. The goal of the shared facilities at Stanford University is to provide open, cost-effective access to state-of-the-art nanofabrication and nanocharacterization facilities for scientists and engineers from academia, small and large companies, and government laboratories. For more information about SNSF and SNF, visit http://snsf.stanford.edu and http://snf.stanford.edu. http://m.rfer.us/STANFORDmHX4o Tobi Tobi Beetz, Ph.D., Associate Director, Stanford Nano Shared Facilities, Stanford University 348 Via Pueblo, Spilker Building, Room 105, Stanford, CA 94305-4088, 650-644-9541, http://snsf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From myriad at ipa.net Thu Apr 12 20:15:52 2018 From: myriad at ipa.net (Bobby Hobbs) Date: Fri, 13 Apr 2018 00:15:52 +0000 Subject: [labnetwork] Tools for a new lab Message-ID: In the event you choose a standard mask alignment system?. what size mask and what size device will you be processing? What size geometries will you be printing? I have Mask aligners in stock that are custom configured to customer requirements. They are fully supportable with parts , service and consultation. Our price includes labor for installation, documentation and training. Sent from Windows Mail -------------- next part -------------- An HTML attachment was scrubbed... URL: From jpsnyder at alum.mit.edu Fri Apr 13 11:44:35 2018 From: jpsnyder at alum.mit.edu (John Snyder) Date: Fri, 13 Apr 2018 10:44:35 -0500 Subject: [labnetwork] bottle of XeF2 available for sale and quick delivery Message-ID: Hello, I have a bottle containing ~500 g of XeF2 available for purchase. Originally acquired from Pelchem in South Africa, the bottle was briefly used only once and likely still has ~99% of the original amount of XeF2. If interested please email me at jpsnyder at alum.mit.edu. Thanks John S -------------- next part -------------- An HTML attachment was scrubbed... URL: From kckeenan at seas.upenn.edu Fri Apr 13 13:19:40 2018 From: kckeenan at seas.upenn.edu (Kyle Keenan) Date: Fri, 13 Apr 2018 13:19:40 -0400 Subject: [labnetwork] Nanonex NX2600BA mask aligner available Message-ID: <7195cfc8-9601-cb9b-6915-5cce6df04e12@seas.upenn.edu> Hello, Our NX2600BA mask aligner module (originally part of our Nanonex NX2600/2600BA combo system), is no longer needed in our lab, and we are fielding offers to purchase the unit. Due to a need to create room for more equipment, and the fact that all of our mask alignment work has migrated to our Suss aligner, the unit has just been decoupled from the nanoimprint module, and is available immediately. The system is in good working order, and in great condition. It is currently set up for 4" wafers, but can handle up to 6", and is outfitted with the backside alignment option (including BS alignment chuck). Please note that the PC and two side panels are not included with the aligner. Some of the tool specs include: *Newport/Oriel SP97436-1000 flood exposure UV flood exposure unit *currently set up for 500w arc lamp (365 & 405mn wavelengths) *4" wafer chucks and pieces chuck *5x5" mask holder *better than 1um layer to layer alignment accuracy *manual drive of x, y, theta *motorized z drive (WEC) with encoder *dual front and backside CCD cameras/optics If you are interested in purchasing this unit, you can email me directly with your offer, or if you have any questions. Please note that the purchaser would be responsible for crating/packaging/shipping/pickup costs and/or arrangements. Thank you, -- Kyle Keenan Laboratory Manager Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 From turan at plymouthgrating.com Fri Apr 13 13:23:21 2018 From: turan at plymouthgrating.com (Turan Erdogan) Date: Fri, 13 Apr 2018 17:23:21 +0000 Subject: [labnetwork] Source for thick 9 inch square photo mask blanks Message-ID: <143a57a8cc104f30a7170f5fa53e0265@E15NYDAG-D02N04.sh11.lan> Hello All: Does anyone know of a good source for thick, 9-inch square photomask blanks? For our application we require 9 mm thickness. We have heard that these are available, but we have not been able to find a source. Thank you. Sincerely, Turan -------------- next part -------------- An HTML attachment was scrubbed... URL: From rsavage at calpoly.edu Fri Apr 13 16:34:11 2018 From: rsavage at calpoly.edu (Richard N. Savage) Date: Fri, 13 Apr 2018 20:34:11 +0000 Subject: [labnetwork] Oxygen 2-way valve Solenoid In-Reply-To: <7195cfc8-9601-cb9b-6915-5cce6df04e12@seas.upenn.edu> References: <7195cfc8-9601-cb9b-6915-5cce6df04e12@seas.upenn.edu> Message-ID: Anyone know of a good 2-way valve for use with high purity oxygen that has 24VDC solenoid actuation? Rich Richard N. Savage, Ph.D. Dean of Graduate Education Director of Microfab Lab Cal Poly State University San Luis Obispo, CA 93407 805-756-6519 ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Kyle Keenan Sent: Friday, April 13, 2018 10:19 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Nanonex NX2600BA mask aligner available Hello, Our NX2600BA mask aligner module (originally part of our Nanonex NX2600/2600BA combo system), is no longer needed in our lab, and we are fielding offers to purchase the unit. Due to a need to create room for more equipment, and the fact that all of our mask alignment work has migrated to our Suss aligner, the unit has just been decoupled from the nanoimprint module, and is available immediately. The system is in good working order, and in great condition. It is currently set up for 4" wafers, but can handle up to 6", and is outfitted with the backside alignment option (including BS alignment chuck). Please note that the PC and two side panels are not included with the aligner. Some of the tool specs include: *Newport/Oriel SP97436-1000 flood exposure UV flood exposure unit *currently set up for 500w arc lamp (365 & 405mn wavelengths) *4" wafer chucks and pieces chuck *5x5" mask holder *better than 1um layer to layer alignment accuracy *manual drive of x, y, theta *motorized z drive (WEC) with encoder *dual front and backside CCD cameras/optics If you are interested in purchasing this unit, you can email me directly with your offer, or if you have any questions. Please note that the purchaser would be responsible for crating/packaging/shipping/pickup costs and/or arrangements. Thank you, -- Kyle Keenan Laboratory Manager Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From xklu at eng.ucsd.edu Sat Apr 14 01:06:59 2018 From: xklu at eng.ucsd.edu (Xuekun Lu) Date: Fri, 13 Apr 2018 22:06:59 -0700 Subject: [labnetwork] i-line filter for contact mask aligner? Message-ID: Dear all, I am wondering if there is any benefit to install an i-line filter on contact mask aligner. We have a user wanting to create a large hexagonal array of holes in positive resist. The diameter of the holes is 1um, edge to edge spacing 0.5~0.6um. Since the spacing is pretty close to the long wavelength in the broadband light source. I am afraid there will be some diffraction/inteference issues. Does anybody have experience with this? Will i-line filter hlep in this case? Thanks for any feedback, Xuekun -- ---------------------------------------- Dr. Xuekun Lu University of California, San Diego Calit2 M/C 0436 9500 Gilman Drive La Jolla, CA 92093-0436 For Fedex Shipping: Dr. Xuekun Lu University of California, San Diego Atkinson Hall 5th Floor Front Desk 9500 Gilman Drive La Jolla, CA 92093 Phone: (858) 246-0411 Fax: (858) 246-0408 E-mail: xklu at ucsd.edu http://nano3.calit2.net/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From spaolini at cns.fas.harvard.edu Mon Apr 16 11:03:07 2018 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Mon, 16 Apr 2018 15:03:07 +0000 Subject: [labnetwork] Oxygen 2-way valve Solenoid In-Reply-To: References: <7195cfc8-9601-cb9b-6915-5cce6df04e12@seas.upenn.edu> Message-ID: Rich, I my experience I would prefer to have a pneumatic bellows sealed or diaphragm style valve controlling O2. You could simply use the 24V to fire a cheap 2 way, self relieving valve to fire the compressed air. Hope this helps Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Richard N. Savage Sent: Friday, April 13, 2018 4:34 PM To: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Oxygen 2-way valve Solenoid Anyone know of a good 2-way valve for use with high purity oxygen that has 24VDC solenoid actuation? Rich Richard N. Savage, Ph.D. Dean of Graduate Education Director of Microfab Lab Cal Poly State University San Luis Obispo, CA 93407 805-756-6519 ________________________________ From: labnetwork-bounces at mtl.mit.edu > on behalf of Kyle Keenan > Sent: Friday, April 13, 2018 10:19 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Nanonex NX2600BA mask aligner available Hello, Our NX2600BA mask aligner module (originally part of our Nanonex NX2600/2600BA combo system), is no longer needed in our lab, and we are fielding offers to purchase the unit. Due to a need to create room for more equipment, and the fact that all of our mask alignment work has migrated to our Suss aligner, the unit has just been decoupled from the nanoimprint module, and is available immediately. The system is in good working order, and in great condition. It is currently set up for 4" wafers, but can handle up to 6", and is outfitted with the backside alignment option (including BS alignment chuck). Please note that the PC and two side panels are not included with the aligner. Some of the tool specs include: *Newport/Oriel SP97436-1000 flood exposure UV flood exposure unit *currently set up for 500w arc lamp (365 & 405mn wavelengths) *4" wafer chucks and pieces chuck *5x5" mask holder *better than 1um layer to layer alignment accuracy *manual drive of x, y, theta *motorized z drive (WEC) with encoder *dual front and backside CCD cameras/optics If you are interested in purchasing this unit, you can email me directly with your offer, or if you have any questions. Please note that the purchaser would be responsible for crating/packaging/shipping/pickup costs and/or arrangements. Thank you, -- Kyle Keenan Laboratory Manager Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From sieb at 4dlabs.ca Mon Apr 16 12:31:34 2018 From: sieb at 4dlabs.ca (Nathanael Sieb) Date: Mon, 16 Apr 2018 09:31:34 -0700 Subject: [labnetwork] dealing with photoresist fumes Message-ID: <6c328ee3-c5ab-28b9-c944-bdd86c7a2803@4dlabs.ca> An HTML attachment was scrubbed... URL: From patricns at uw.edu Mon Apr 16 16:31:58 2018 From: patricns at uw.edu (N. Shane Patrick) Date: Mon, 16 Apr 2018 13:31:58 -0700 Subject: [labnetwork] dealing with photoresist fumes In-Reply-To: <6c328ee3-c5ab-28b9-c944-bdd86c7a2803@4dlabs.ca> References: <6c328ee3-c5ab-28b9-c944-bdd86c7a2803@4dlabs.ca> Message-ID: <1DD273C2-668B-480C-8EBD-2C3450357D89@uw.edu> Hello Nathaniel, All chemical use in our facility, including photoresist, is restricted to fume hoods which are compliant with the established safe operating conditions per our campus Environment, Health and Safety (EH&S) department. Whenever it?s a question of safety, I recommend working with the associated department for your location. SFU appears to have an EH&S office who should be able to assist with this: http://www.sfu.ca/srs/ehs.html N. Shane Patrick Research Engineer, Washington Nanofabrication Facility (WNF) National Nanotechnology Coordinated Infrastructure (NNCI) University of Washington Fluke Hall 132, Box 352143 (206) 221-1045 patricns at uw.edu http://www.wnf.washington.edu/ > On Apr 16, 2018, at 9:31 AM, Nathanael Sieb wrote: > > Hi all, > > I'm curious how the different labs out there deal with photoresist safety. I know that the fumes can be toxic, but it is difficult to deal with completely. We have all of our spin coaters under a canopy exhaust that captures a lot of the fumes, but you can still smell it. Do others put the coaters in a fume hood? Perhaps use respirators? Or is it not that big of a concern if you capture most of it? > > Thanks, > > Nathanael > > Nathanael Sieb > Director of Operations and Administration > 4D LABS, Simon Fraser University 8888 University Drive, Burnaby, B.C. V5A 1S6 > E sieb at 4dlabs.ca T 778.782.8084 F 778.782.3765 W www.4dlabs.ca > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: signature.asc Type: application/pgp-signature Size: 833 bytes Desc: Message signed with OpenPGP URL: From khbeis at uw.edu Mon Apr 16 16:33:13 2018 From: khbeis at uw.edu (Michael Khbeis) Date: Mon, 16 Apr 2018 13:33:13 -0700 Subject: [labnetwork] dealing with photoresist fumes In-Reply-To: <6c328ee3-c5ab-28b9-c944-bdd86c7a2803@4dlabs.ca> References: <6c328ee3-c5ab-28b9-c944-bdd86c7a2803@4dlabs.ca> Message-ID: <023966F9-4A66-42A9-8AEF-2CFD66A6DD27@uw.edu> Nathanael, For our manual spin stations, we keep spinners mounted or embedded in a fume hood below deck level. Bowls are exhausted through plenum. Top side of the hood has FFU to help minimize particulate and the hood stays slightly negative pressure to the room. We will always have such workstations to remain flexible on the multitude of resists being processed, but are working on bringing up some coat tracks to address the most common resists. Best, Dr. Michael Khbeis Director, Washington Nanofabrication Facility (WNF) National Nanotechnology Coordinated Infrastructure (NNCI) University of Washington Fluke Hall, Box 352143 (O) 206.543.5101 (F) 206.221.1681 (C) 443.254.5192 khbeis at uw.edu www.wnf.washington.edu/ > On Apr 16, 2018, at 9:31 AM, Nathanael Sieb wrote: > > Hi all, > > I'm curious how the different labs out there deal with photoresist safety. I know that the fumes can be toxic, but it is difficult to deal with completely. We have all of our spin coaters under a canopy exhaust that captures a lot of the fumes, but you can still smell it. Do others put the coaters in a fume hood? Perhaps use respirators? Or is it not that big of a concern if you capture most of it? > > Thanks, > > Nathanael > > Nathanael Sieb > Director of Operations and Administration > 4D LABS, Simon Fraser University 8888 University Drive, Burnaby, B.C. V5A 1S6 > E sieb at 4dlabs.ca T 778.782.8084 F 778.782.3765 W www.4dlabs.ca > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork From spaolini at cns.fas.harvard.edu Mon Apr 16 18:05:38 2018 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Mon, 16 Apr 2018 22:05:38 +0000 Subject: [labnetwork] dealing with photoresist fumes In-Reply-To: <6c328ee3-c5ab-28b9-c944-bdd86c7a2803@4dlabs.ca> References: <6c328ee3-c5ab-28b9-c944-bdd86c7a2803@4dlabs.ca> Message-ID: Nathanael, If you can smell the fumes, it?s not working. Try reducing the work opening which will increase the velocity of the exhaust. Regards, Steve Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Nathanael Sieb Sent: Monday, April 16, 2018 12:32 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] dealing with photoresist fumes Hi all, I'm curious how the different labs out there deal with photoresist safety. I know that the fumes can be toxic, but it is difficult to deal with completely. We have all of our spin coaters under a canopy exhaust that captures a lot of the fumes, but you can still smell it. Do others put the coaters in a fume hood? Perhaps use respirators? Or is it not that big of a concern if you capture most of it? Thanks, Nathanael ________________________________ Nathanael Sieb Director of Operations and Administration 4D LABS, Simon Fraser University 8888 University Drive, Burnaby, B.C. V5A 1S6 E sieb at 4dlabs.ca T 778.782.8084 F 778.782.3765 W www.4dlabs.ca [http://www.4dlabs.ca/content/dam/sfu/4dlabs/images/4D-logo-tiny.png][http://www.4dlabs.ca/content/dam/sfu/4dlabs/images/linkedin_circle_color.jpg][http://www.4dlabs.ca/content/dam/sfu/4dlabs/images/twitter_circle_color.jpg][http://www.4dlabs.ca/content/dam/sfu/4dlabs/images/facebook_circle_color.jpg] -------------- next part -------------- An HTML attachment was scrubbed... URL: From na2661 at columbia.edu Tue Apr 17 08:19:52 2018 From: na2661 at columbia.edu (Nava Ariel-Sternberg) Date: Tue, 17 Apr 2018 08:19:52 -0400 Subject: [labnetwork] dealing with photoresist fumes In-Reply-To: <6c328ee3-c5ab-28b9-c944-bdd86c7a2803@4dlabs.ca> References: <6c328ee3-c5ab-28b9-c944-bdd86c7a2803@4dlabs.ca> Message-ID: <007e01d3d646$6381c4a0$2a854de0$@columbia.edu> Hi Nathanael, Our spinners are inside fume hoods and we also added an exhaust point above the fridge where the photoresists are stored as past experience showed that there was bad smell just by opening the resist fridge. The nose is a very sensitive detector but it?s not an accurate one so it?s hard to tell how much of the fumes are captured or not based on what you wrote? Consulting EH&S as was suggested here sounds like a good idea. Thanks, Nava Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Facilities Columbia University 530 w120th st., NY 10027 Room 1015/MC 8903 Office: 212-854-9927 Cell: 201-562-7600 ? From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Nathanael Sieb Sent: Monday, April 16, 2018 12:32 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] dealing with photoresist fumes Hi all, I'm curious how the different labs out there deal with photoresist safety. I know that the fumes can be toxic, but it is difficult to deal with completely. We have all of our spin coaters under a canopy exhaust that captures a lot of the fumes, but you can still smell it. Do others put the coaters in a fume hood? Perhaps use respirators? Or is it not that big of a concern if you capture most of it? Thanks, Nathanael _____ Nathanael Sieb Director of Operations and Administration 4D LABS, Simon Fraser University 8888 University Drive, Burnaby, B.C. V5A 1S6 E sieb at 4dlabs.ca T 778.782.8084 F 778.782.3765 W www.4dlabs.ca -------------- next part -------------- An HTML attachment was scrubbed... URL: From na2661 at columbia.edu Mon Apr 30 15:54:00 2018 From: na2661 at columbia.edu (Nava Ariel-Sternberg) Date: Mon, 30 Apr 2018 15:54:00 -0400 Subject: [labnetwork] Clean room engineer position at Columbia University Message-ID: <018b01d3e0bc$fc382dd0$f4a88970$@columbia.edu> Dear all, The Clean room engineer position at Columbia University is still open and I?d appreciate your help in spreading the word to your colleagues and potential candidates. Clean room working experience is required. For more information and in order to apply please go to the link below: academicjobs.columbia.edu/applicants/Central?quickFind=66071 Thanks, Nava Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Facilities Columbia University 530 w120th st., NY 10027 Room 1015/MC 8903 Office: 212-854-9927 Cell: 201-562-7600 ? -------------- next part -------------- An HTML attachment was scrubbed... URL: From peter.hung at aero.org Mon Apr 30 17:22:04 2018 From: peter.hung at aero.org (Peter Hung) Date: Mon, 30 Apr 2018 21:22:04 +0000 Subject: [labnetwork] Heating of Chemicals Message-ID: Hi Everyone, I'm wondering what protocol you're all following for heating up chemicals. In particular, we have a need to heat up a chemical for 4 - 8 hours. Would your current policy require the user to be there during the whole time and/or are there other guidelines that you have? Thanks! Peter Hung Member of the Technical Staff Microelectronics Reliability & Radiation Effects The Aerospace Corporation Peter.hung at aero.org 310.336.5238 -------------- next part -------------- An HTML attachment was scrubbed... URL: From myoung6 at nd.edu Mon Apr 30 20:29:40 2018 From: myoung6 at nd.edu (Mike Young) Date: Mon, 30 Apr 2018 20:29:40 -0400 Subject: [labnetwork] Heating of Chemicals In-Reply-To: References: Message-ID: <19136ffe-709d-faa8-37d4-6f57d881e497@nd.edu> I'll wager the answer hinges greatly on (1) what chemical, and (2) how hot... --Mike On 4/30/2018 5:22 PM, Peter Hung wrote: > > Hi Everyone, > > I?m wondering what protocol you?re all following for heating up > chemicals. In particular, we have a need to heat up a chemical for 4 ? > 8 hours. Would your current policy require the user to be there during > the whole time and/or are there other guidelines that you have? Thanks! > > Peter Hung > > Member of the Technical Staff > > Microelectronics Reliability & Radiation Effects > > The Aerospace Corporation > > Peter.hung at aero.org > > 310.336.5238 > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Michael P. Young (574) 631-3268 (office) Nanofabrication Specialist (574) 631-4393 (fax) Department of Electrical Engineering (765) 637-3784 (cell) University of Notre Dame mike.young at nd.edu B-38 Stinson-Remick Hall Notre Dame, IN 46556-5637 -------------- next part -------------- An HTML attachment was scrubbed... URL: From ahad.syed at kaust.edu.sa Mon Apr 30 22:56:33 2018 From: ahad.syed at kaust.edu.sa (Ahad Syed) Date: Tue, 1 May 2018 02:56:33 +0000 Subject: [labnetwork] Air-Showers in the Cleanroom Message-ID: <1525143394746.33461@kaust.edu.sa> Dear Colleagues, We have been conducting a feasibility study for installing air showers in our cleanroom at KAUST. Could you please share with us some info regarding your facilities? Cleanroom ISO 6 or 5 (class 1000 or 100) Area: Approximate number of users: Have installed air showers: (Y/N) Comments: Your responses are highly appreciated. Thanks, Ahad -- Lead Scientist, Safety & Facility Nanofabrication Core Lab 4700 King Abdullah University of Science and Technology 0247 Building 3, Thuwal 23955-6900, Kingdom of Saudi Arabia Tel:+966 12 808 2348 Visit The Core Labs ________________________________ This message and its contents including attachments are intended solely for the original recipient. If you are not the intended recipient or have received this message in error, please notify me immediately and delete this message from your computer system. Any unauthorized use or distribution is prohibited. Please consider the environment before printing this email. -------------- next part -------------- An HTML attachment was scrubbed... URL: