From juliet.gopinath at Colorado.EDU Thu Jan 4 16:36:51 2018 From: juliet.gopinath at Colorado.EDU (Juliet Gopinath) Date: Thu, 4 Jan 2018 14:36:51 -0700 Subject: [labnetwork] University of Colorado Boulder: Director of Fabrication and Characterization Facilities Message-ID: <52fe6797-0efe-8a9e-40af-98f919bfc23b@colorado.edu> The college of engineering at CU Boulder is in a period of expansion of students, faculty and facilities. ?We are seeking an experienced clean room manager to help us operate and grow our microfabrication and nano characterization facilities (http://cnl.colorado.edu/cnl/index.php?option=com_content&view=article&id=211&Itemid=155). This position will lead in the design and installation of a new facility, hire and manage laboratory personnel, manage laboratory finances, acquire equipment as needed, manage personnel to train and maintain the usage of nanofabrication and nanocharacterization equipment, and lead all marketing plans to target and attract internal and external groups to our laboratory facilities. More information can be found at the following link: https://cu.taleo.net/careersection/2/jobdetail.ftl?job=12232&lang=en The posting number on Taleo is 12232 and the title, Director of Fabrication and Characterization Facilities. -- Juliet Gopinath Associate Professor in Electrical, Computer and Energy Engineering University of Colorado at Boulder Engineering Center, Room ECEE 1B43 425 UCB Boulder CO 80309 Tel: 303 492 5568 Fax: 303 492 2758 Juliet.Gopinath at colorado.edu http://ecee.colorado.edu/~julietg/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From hbtusainc at yahoo.com Fri Jan 5 09:08:43 2018 From: hbtusainc at yahoo.com (Mario Portillo) Date: Fri, 5 Jan 2018 14:08:43 +0000 (UTC) Subject: [labnetwork] Image Reversal oven References: <1963286202.1029804.1515161323339.ref@mail.yahoo.com> Message-ID: <1963286202.1029804.1515161323339@mail.yahoo.com> Question for the lab members in California using NH3 to do Image reversal... in your respective areas is a permit needed to operate n use ammonia?? Thanks in advance? Sent from Yahoo Mail for iPhone Mario Portillo, hbtusainc at yahoo.com -------------- next part -------------- An HTML attachment was scrubbed... URL: From jguo5 at Central.UH.EDU Mon Jan 8 11:15:23 2018 From: jguo5 at Central.UH.EDU (Guo, Jing) Date: Mon, 8 Jan 2018 10:15:23 -0600 Subject: [labnetwork] Co sputtering targets question Message-ID: <36F46100-55A1-42AA-8DBC-1B20C3F91CBA@central.uh.edu> Dear Colleagues, Happy new year! I found a lot of used Co targets while I was checking all the sputtering targets. They are all Co targets from two orders which showed different property as shown in the attachment. For the top row, all of them surface is shinning but the sputtered ring is not perfect round shape and sharp. For the second row, the surface is quite different from the top row. And the sputtering mark/ring is sharp and round. The second picture is Ag (99.99%) targets from different company. The surface showed different property after sputtering also. I guess the difference came from the different fabrication process to make the targets. Is there anyone familiar about the targets fabrication process? Will this difference affect the sputtering property? Could you please advise which type of the targets should be ordered next time? Thank you. Best Regards, Jing Research Lab Supervisor Nanofabrication Facility University of Houston Postal Address: UNIVERSITY OF HOUSTON NANOFABRICATION FACILITY 3517 CULLEN BLVD, RM 1011 HOUSTON TX 77204-5062 Phone: 832-842-8822 Email: jguo5 at central.uh.edu Web: www.uh.edu/nanofab [cid:2A56ACF0-B851-4F27-B157-F49FE6E5AD2E at uh.edu][cid:F607D494-473A-4370-9716-7DC609CE5FA3 at uh.edu] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Co targets.jpeg Type: image/jpeg Size: 95298 bytes Desc: Co targets.jpeg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: IMG_20170417_095618.jpeg Type: image/jpg Size: 163411 bytes Desc: IMG_20170417_095618.jpeg URL: From swagoner at binghamton.edu Mon Jan 8 14:43:52 2018 From: swagoner at binghamton.edu (Shawn L Wagoner) Date: Mon, 8 Jan 2018 14:43:52 -0500 Subject: [labnetwork] Zeiss help Message-ID: Hello, I have a Mim microscope that needs service. I have been trying to get Zeiss to come service the instrument since October. They responded to emails and phone calls up until the end of November. I have been sending emails every 10 days or so and it has been over a month since I got a reply to any of my messages. I am happy to pay for the service but can't seem to get anywhere with these folks. I have never had this much trouble getting service before. I need some help shaking the tree. Do any members of the Labnetwork community have contact information for anybody in Zeiss that could help me. The folks on the east coast of the US have not been responsive. I really just want my scope fixed. Thanks Shawn -- Shawn Wagoner Director, Nanofabrication Laboratory at Binghamton University 607-777-6131 -------------- next part -------------- An HTML attachment was scrubbed... URL: From dylan.klomparens at nist.gov Tue Jan 9 16:26:18 2018 From: dylan.klomparens at nist.gov (Klomparens, Dylan L. (Fed)) Date: Tue, 9 Jan 2018 21:26:18 +0000 Subject: [labnetwork] NEMO lab management software is open source Message-ID: Hello everyone, NIST is pleased to announce that the NanoFab Equipment Management & Operations (NEMO) web application is now officially open source and free. NEMO is laboratory logistics software that strives to be intuitive and easy to use, making life easier in the lab. It manages tool reservations, control access to tools, and streamline logistics and communication. Organizations can customize NEMO for their own laboratory, and any customer with a desktop or mobile device can access it. NEMO is hosted on GitHub at https://github.com/usnistgov/NEMO, where you can find screenshots, documentation, deployment instructions, and much more about the project. It is written in the Python programming language and uses the Django web framework. We are adopting a standard open source model for the project, which intended to be a collaborative effort (primarily for nanofabrication labs) and for other labs in general. NIST welcomes ideas, discussion, and questions on the NEMO mailing list hosted by Google Groups. We hope the nanofabrication community is excited about the release of this software, and we look forward to sharing it! Cheers, -- Dylan Klomparens -------------- next part -------------- An HTML attachment was scrubbed... URL: From swagoner at binghamton.edu Wed Jan 10 07:56:44 2018 From: swagoner at binghamton.edu (Shawn L Wagoner) Date: Wed, 10 Jan 2018 07:56:44 -0500 Subject: [labnetwork] Zeiss help In-Reply-To: References: Message-ID: Thanks to all of you that contacted me and made efforts on my behalf. It seems that contacting the community did the trick. I now have a quote for a service call and repair. Again, I am grateful and hope I can return the favor some day. Shawn On Mon, Jan 8, 2018 at 2:43 PM, Shawn L Wagoner wrote: > Hello, I have a Mim microscope that needs service. I have been trying to > get Zeiss to come service the instrument since October. They responded to > emails and phone calls up until the end of November. I have been sending > emails every 10 days or so and it has been over a month since I got a reply > to any of my messages. I am happy to pay for the service but can't seem to > get anywhere with these folks. > > I have never had this much trouble getting service before. I need some > help shaking the tree. Do any members of the Labnetwork community have > contact information for anybody in Zeiss that could help me. The folks on > the east coast of the US have not been responsive. I really just want my > scope fixed. > > Thanks > Shawn > -- > Shawn Wagoner > Director, Nanofabrication Laboratory at Binghamton University > 607-777-6131 <(607)%20777-6131> > -- Shawn Wagoner Director, Nanofabrication Laboratory at Binghamton University 607-777-6131 -------------- next part -------------- An HTML attachment was scrubbed... URL: From petho.laszlo at gmail.com Wed Jan 10 08:33:09 2018 From: petho.laszlo at gmail.com (=?UTF-8?Q?Laszlo_Peth=C3=B6?=) Date: Wed, 10 Jan 2018 14:33:09 +0100 Subject: [labnetwork] Co sputtering targets question In-Reply-To: <36F46100-55A1-42AA-8DBC-1B20C3F91CBA@central.uh.edu> References: <36F46100-55A1-42AA-8DBC-1B20C3F91CBA@central.uh.edu> Message-ID: Dear Jing, The surface of the targets can look vastly different depending on the process conditions they have been used with. Some parameters that will influence this: - The power that goes into the target during sputtering ? plasma power minus backside cooling - Plasma density: the type of magnets used in the magnetron, and the power source type (DC/RF/HiPIMS) - If reactive sputtering was used; including a chamber or argon line leak You can often observe target recrystallization and grain growth if the plasma power is too high. There must be already stronger than standard magnets in the magnetron, since cobalt is ferromagnetic. The cross-sections of the racetrack patterns show that you have different strength magnets as well ? eg. the bottom left target shows a sharp V-shape. This magnet was about double as strong as the one used with the target on the top left. The matte surface can result either from low plasma powers or from a compound formed on the target during sputtering. In my experience this looks like the latter, probably from a leak in the argon line. See the dark grey central disc on the target in the top row, center. This should be porous cobalt oxide, might be useful to check with EDX or XRF. The supplier is not relevant in this aspect; these surfaces can be obtained with targets from any source. I would recommend the following: - Run a leak check on the argon line with a RGA - Use a getter metal (Zr, Ti, Al) and check the oxygen content of deposited films - Decrease power if you see large, mm-sized grains - Check if backside water cooling is sufficient I hope this helps! All the best, Laszlo Laszlo Peth? Scientist Empa Swiss Federal Laboratories for Materials Science and Technology Feuerwerkerstrasse 39 3602 Thun Switzerland Tel +41 58 765 63 45 Fax +41 58 765 69 90 laszlo.petho at empa.ch www.empa.ch Diese Mitteilung ist ausschliesslich f?r die als Empf?nger aufgef?hrte Person(en) oder Firma bestimmt. Sie kann pers?nliche und/oder vertrauliche Informationen enthalten. Sollten Sie diese Mitteilung irrt?mlicherweise erhalten haben, bitten wir Sie, uns umgehend per E-Mail zu informieren, s?mtliche Ausdrucke zu vernichten und die E-Mail-Dateien zu l?schen. This message is intended for the exclusive use of the individual(s) or entity to whom it is addressed. It may contain information that is privileged and/or confidential. Should you have received this message erroneously, please notify us immediately by e-mail, destroy any printouts and delete all electronic files contained in this message. On Mon, Jan 8, 2018 at 5:15 PM, Guo, Jing wrote: > Dear Colleagues, > > Happy new year! > > I found a lot of used Co targets while I was checking all the sputtering > targets. They are all Co targets from two orders which showed different > property as shown in the attachment. > > For the top row, all of them surface is shinning but the sputtered ring is > not perfect round shape and sharp. > For the second row, the surface is quite different from the top row. And > the sputtering mark/ring is sharp and round. > > The second picture is Ag (99.99%) targets from different company. The > surface showed different property after sputtering also. > > I guess the difference came from the different fabrication process to make > the targets. Is there anyone familiar about the targets fabrication > process? Will this difference affect the sputtering property? > Could you please advise which type of the targets should be ordered next > time? > > Thank you. > > > > Best Regards, > > Jing > > Research Lab Supervisor > Nanofabrication Facility > University of Houston > Postal Address: > UNIVERSITY OF HOUSTON > NANOFABRICATION FACILITY > 3517 CULLEN BLVD, RM 1011 > HOUSTON TX 77204-5062 > Phone: 832-842-8822 <(832)%20842-8822> > Email: jguo5 at central.uh.edu > Web: www.uh.edu/nanofab > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: IMG_20170417_095618.jpeg Type: image/jpg Size: 163411 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Co targets.jpeg Type: image/jpeg Size: 95298 bytes Desc: not available URL: From james.bohlman at nova-ir.com Wed Jan 10 17:52:50 2018 From: james.bohlman at nova-ir.com (james.bohlman at nova-ir.com) Date: Wed, 10 Jan 2018 14:52:50 -0800 (PST) Subject: [labnetwork] Lighting source for Nanometrics Nanpspec 180 Message-ID: <1515624770.412522700@mail.nova-ir.com> Hello I'm looking for lighting source for Nanometrics Nanpspec 180, a thin film layer measurement tool for SiO2 and nitride measurement. Any leads on where to look? James -------------- next part -------------- An HTML attachment was scrubbed... URL: From paj1 at email.gwu.edu Thu Jan 11 09:44:06 2018 From: paj1 at email.gwu.edu (Johnson, Patrick) Date: Thu, 11 Jan 2018 09:44:06 -0500 Subject: [labnetwork] Harkris Chiller Quality issues Message-ID: Good Morning All, We purchased all new Haskris chillers both large and small in late 2014 and since the start up in early 2015 have had numerous failures, all of my pumps started to leak at the input shaft seal, replacement pumps form Haskris have started to leak as well. The most problematic has been the large R0300 Haskris air cooled and now one of the compressors just failed and we have to get repaired out of our pocket. I'm interested to know if anyone else has had similar issues with there Haskris chillers. Thanks Patrick *Patrick Johnson* *George Washington University* *Nano Fabrication Lab Manager * *Science and Engineering Hall* *800 NW 22nd Street Rm-B2815* *Washington D.C. 20052* *Cell 703 258 2465* *Desk 202 994 2346* -------------- next part -------------- An HTML attachment was scrubbed... URL: From RobertVandusen at cunet.carleton.ca Thu Jan 11 10:48:00 2018 From: RobertVandusen at cunet.carleton.ca (Robert Vandusen) Date: Thu, 11 Jan 2018 15:48:00 +0000 Subject: [labnetwork] Lighting source for Nanometrics Nanpspec 180 In-Reply-To: <1515624770.412522700@mail.nova-ir.com> References: <1515624770.412522700@mail.nova-ir.com> Message-ID: HI James. We also have a Nanospec AFT 180. The bulbs I have bought in the past are: US8C103 from Bulbtronics. (6v, 15W). See this webpage or search on Bulbtronics. https://www.bulbtronics.com/Search-The-Warehouse/SearchResults.aspx?stype=quick&tech=Bulbs%20/%20Lamps&uin=US8C103&oc=0&page=1&ptype=INCA&mfg=&specs=&specsValue=&gridview=True The issue I have had with these bulbs is getting enough intensity. No matter how they are aligned sometimes I just can?t reach the 31.5 intensity value I need., and have to pick through other bulbs until I find one that works. Unless the problem is with our detector. Let me know how you make out. Rob. Robert Vandusen Microfabrication and FANSSI Cleanlab Facility Manager Electronics Department Carleton University room: 4184 Mackenzie Building 613-520-2600 ext 5761 Robert_vandusen at cunet.carleton.ca From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of james.bohlman at nova-ir.com Sent: Wednesday, January 10, 2018 5:53 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Lighting source for Nanometrics Nanpspec 180 Hello I'm looking for lighting source for Nanometrics Nanpspec 180, a thin film layer measurement tool for SiO2 and nitride measurement. Any leads on where to look? James -------------- next part -------------- An HTML attachment was scrubbed... URL: From myoung6 at nd.edu Thu Jan 11 12:31:21 2018 From: myoung6 at nd.edu (Michael Young) Date: Thu, 11 Jan 2018 12:31:21 -0500 Subject: [labnetwork] Harkris Chiller Quality issues In-Reply-To: References: Message-ID: An HTML attachment was scrubbed... URL: From patricns at uw.edu Thu Jan 11 14:17:00 2018 From: patricns at uw.edu (N . Shane Patrick) Date: Thu, 11 Jan 2018 11:17:00 -0800 Subject: [labnetwork] Harkris Chiller Quality issues In-Reply-To: References: Message-ID: <1243CF62-45D0-47BF-99F7-F37FC0CBA777@uw.edu> Hi Patrick, We have an air-cooled R-series Haskris (the exact model is escaping me) that runs continuously as the cooling source for our JEOL SEM. This chiller was selected at JEOL?s recommendation due to the low pulsing/surging/noise level it produces, which we found had a tremendous impact on our imaging capabilities. This chiller has been a part of this SEM installation since 2011 I believe, possibly earlier, and we?ve had no major trouble out of it. In general, our lab has had very good service and customer support from Haskris, so I?m very perplexed to hear of your troubles. It certainly clashes with our experience with them. I?m not sure I have any useful advice to add other than being sure your usage of the system matches what it is spec?d for. Good luck, and hopefully better pumping days ahead! N. Shane Patrick Research Engineer, Washington Nanofabrication Facility (WNF) National Nanotechnology Coordinated Infrastructure (NNCI) University of Washington Fluke Hall 132, Box 352143 (206) 221-1045 patricns at uw.edu http://www.wnf.washington.edu/ > On Jan 11, 2018, at 6:44 AM, Johnson, Patrick wrote: > > Good Morning All, We purchased all new Haskris chillers both large and small in late 2014 and since the start up in early 2015 have had numerous failures, all of my pumps started to leak at the input shaft seal, replacement pumps form Haskris have started to leak as well. > The most problematic has been the large R0300 Haskris air cooled and now one of the compressors just failed and we have to get repaired out of our pocket. I'm interested to know if anyone else has had similar issues with there Haskris chillers. > Thanks Patrick > > > > Patrick Johnson > George Washington University > Nano Fabrication Lab Manager > Science and Engineering Hall > 800 NW 22nd Street Rm-B2815 > Washington D.C. 20052 > Cell 703 258 2465 > Desk 202 994 2346 > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: signature.asc Type: application/pgp-signature Size: 833 bytes Desc: Message signed with OpenPGP URL: From tierney at mtl.mit.edu Thu Jan 11 15:15:36 2018 From: tierney at mtl.mit.edu (Paul Tierney) Date: Thu, 11 Jan 2018 15:15:36 -0500 Subject: [labnetwork] Neslab RTE 221 free to good home Message-ID: <4D24D012-EDAD-4DFF-B959-E977C45EEFC9@mtl.mit.edu> Hello all, MIT?s Microsystems Lab has a surplus Neslab RTE 221 Refrigerated Bath/Circulator available for reuse. It is 1993 vintage, but not used since 1999, stored in a clean room. Here is the operations manual : http://www.chillercity.com/OPMANUAL/rtexx1a.pdf Here is a product specs brochure of similar units : http://thermo.com.cn/Resources/200802/productPDF_25045.pdf. Paul Tierney MIT Microsystem Technology Labs (617)253-5245 -------------- next part -------------- An HTML attachment was scrubbed... URL: From spaolini at cns.fas.harvard.edu Thu Jan 11 15:46:23 2018 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Thu, 11 Jan 2018 20:46:23 +0000 Subject: [labnetwork] Harkris Chiller Quality issues In-Reply-To: References: Message-ID: Patrick, As ironic as this may sound, my three older (2002-2005) Haskris chillers are the most reliable units that we have! I always liked these because there are no proprietary components in them. Most anything in these units can be purchased off the shelf from an industrial supplier. The older units always had Copeland compressors which can be found in 75% of all commercial coolers and air conditioners. I don?t know how the new ones are set up and if they are trying to cut costs but the water pumps are generally Procon with a GE motor coupled by a sacrificial brass ?spider? It is critical that these two components are properly aligned but if they aren?t, the brass spider wears prematurely before stressing the pump shaft out of true and thus creating a seal leak. I must ask you what the PH of the recirculating water is and if you spike it with any additives. Distilled water is best for these units. Do NOT use DI. Steve Paolini Equipment Dood Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Johnson, Patrick Sent: Thursday, January 11, 2018 9:44 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Harkris Chiller Quality issues Good Morning All, We purchased all new Haskris chillers both large and small in late 2014 and since the start up in early 2015 have had numerous failures, all of my pumps started to leak at the input shaft seal, replacement pumps form Haskris have started to leak as well. The most problematic has been the large R0300 Haskris air cooled and now one of the compressors just failed and we have to get repaired out of our pocket. I'm interested to know if anyone else has had similar issues with there Haskris chillers. Thanks Patrick Patrick Johnson George Washington University Nano Fabrication Lab Manager Science and Engineering Hall 800 NW 22nd Street Rm-B2815 Washington D.C. 20052 Cell 703 258 2465 Desk 202 994 2346 -------------- next part -------------- An HTML attachment was scrubbed... URL: From donghaiz at usc.edu Thu Jan 11 16:22:33 2018 From: donghaiz at usc.edu (Donghai Zhu) Date: Thu, 11 Jan 2018 21:22:33 +0000 Subject: [labnetwork] Harkris Chiller Quality issues In-Reply-To: References: Message-ID: Hello Patrick, We have a Haskris chiller for EBL system that runs continuously. The compressor failed after three or four years? service. The cost of the repair is more than half of the price of the chiller due to urgent on site repair. I remember there was an issue in the design of the chiller. The local service company made a little modification on it. Donghai Zhu University of Southern California From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Johnson, Patrick Sent: Thursday, January 11, 2018 6:44 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Harkris Chiller Quality issues Good Morning All, We purchased all new Haskris chillers both large and small in late 2014 and since the start up in early 2015 have had numerous failures, all of my pumps started to leak at the input shaft seal, replacement pumps form Haskris have started to leak as well. The most problematic has been the large R0300 Haskris air cooled and now one of the compressors just failed and we have to get repaired out of our pocket. I'm interested to know if anyone else has had similar issues with there Haskris chillers. Thanks Patrick Patrick Johnson George Washington University Nano Fabrication Lab Manager Science and Engineering Hall 800 NW 22nd Street Rm-B2815 Washington D.C. 20052 Cell 703 258 2465 Desk 202 994 2346 -------------- next part -------------- An HTML attachment was scrubbed... URL: From tierney at mtl.mit.edu Fri Jan 12 11:31:26 2018 From: tierney at mtl.mit.edu (Paul Tierney) Date: Fri, 12 Jan 2018 11:31:26 -0500 Subject: [labnetwork] The Neslab RTE 221 refrigerated bath has been claimed. Message-ID: <1C0663C2-67BD-48E7-83EE-FF840AC4596F@mtl.mit.edu> From peter.hung at aero.org Tue Jan 16 13:53:42 2018 From: peter.hung at aero.org (Peter Hung) Date: Tue, 16 Jan 2018 18:53:42 +0000 Subject: [labnetwork] Cleanroom Door Message-ID: Hi Everyone, Our automatic sliding door separating the Class 5 (3520 particles/m^3) and Class 6 (35200 particles/m^3) areas is broken and we're thinking of replacing it. The current doors are embedded in the wall and we're thinking of going with surface mount doors due to the lower cost. Does anyone know if there's a reason to go with either a surface mount sliding door or an embedded door besides costs? Thank you so much! Peter Hung Member of the Technical Staff Microelectronics Reliability & Radiation Effects The Aerospace Corporation Peter.hung at aero.org 310.336.5238 -------------- next part -------------- An HTML attachment was scrubbed... URL: From lej at danchip.dtu.dk Wed Jan 17 04:41:50 2018 From: lej at danchip.dtu.dk (Leif Johansen) Date: Wed, 17 Jan 2018 09:41:50 +0000 Subject: [labnetwork] Cleanroom Door In-Reply-To: References: Message-ID: <23a0500e8fe845419d66e2d0c781e9d1@danchip.dtu.dk> Hi Peter, We have both embedded and surface mounted sliding doors, as well as "old school" hinged doors. Our puritans don't like sliding doors at all, especially not the embedded door, because they are afraid that we cannot clean the cavity properly and thus might have a particle pump. We have surface mounted sliding doors to three of our ISO 4 ("class 10") rooms and have not detected any particle issue. >From a cost-of-ownership point of view, the manual hinged doors are the cheapest option. The sliding doors need annual service visits. Best regards, Leif Leif Johansen Head of Operations, Ph.D. DTU Danchip Technical University of Denmark Nationalt Center for Mikro- and Nanofabrikation ?rsteds Plads, Byg. 347 Building 347, Room 170 2800 Lyngby Direct +45 45255713 Mobile +45 25348992 lesjo at danchip.dtu.dk www.dtu.dk/english [http://www.dtu.dk/~/media/DTU_Generelt/Andet/DTU_email_logo_01.gif] From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Peter Hung Sent: 16. januar 2018 19:54 To: labnetwork at mtl.mit.edu Subject: [labnetwork] Cleanroom Door Hi Everyone, Our automatic sliding door separating the Class 5 (3520 particles/m^3) and Class 6 (35200 particles/m^3) areas is broken and we're thinking of replacing it. The current doors are embedded in the wall and we're thinking of going with surface mount doors due to the lower cost. Does anyone know if there's a reason to go with either a surface mount sliding door or an embedded door besides costs? Thank you so much! Peter Hung Member of the Technical Staff Microelectronics Reliability & Radiation Effects The Aerospace Corporation Peter.hung at aero.org 310.336.5238 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.gif Type: image/gif Size: 1055 bytes Desc: image001.gif URL: From horng at udel.edu Thu Jan 18 14:28:21 2018 From: horng at udel.edu (Horng, Paul S.) Date: Thu, 18 Jan 2018 19:28:21 +0000 Subject: [labnetwork] ICP etch of LiNbO3 Message-ID: <79882e7a0c774317bf00f27cb37929f9@udel.edu> Hi, Has anyone had experience with plasma etching of LiNbO3 films ? It is hard to etch so higher platen power is needed to enhance physical sputtering. What is the impact on etch rate of other processes like etching of Si, SiO2, SiN, etc. in the same chamber ? How often is chamber liner needed to be scrubbed clean ? Will it shorten the life of turbo pump ? Thank You, Paul S. Horng, Ph.D Process Engineer, UD NanoFab 457 ISE Lab 221 Academy Street, Newark, DE 19716 (302)831-4827 http://udnf.udel.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From bernard at mtl.mit.edu Thu Jan 18 16:00:34 2018 From: bernard at mtl.mit.edu (Bernard Alamariu) Date: Thu, 18 Jan 2018 16:00:34 -0500 Subject: [labnetwork] ICP etch of LiNbO3 In-Reply-To: <79882e7a0c774317bf00f27cb37929f9@udel.edu> References: <79882e7a0c774317bf00f27cb37929f9@udel.edu> Message-ID: Hello, The system will get contaminated with Alkali metal Lithium which is a highly mobile ion in Si, SiO2 and actually it is worst than Sodium for Si based devices. Thanks, Bernard On 1/18/18 2:28 PM, Horng, Paul S. wrote: > > Hi, > > Has anyone had experience with plasma etching of LiNbO3 films ? It is > hard to etch so higher platen power is needed to enhance physical > sputtering. What is the impact on etch rate of other processes like > etching of Si, SiO2, SiN, etc. in the same chamber ? How often is > chamber liner needed to be scrubbed clean ? Will it shorten the life > of turbo pump ? > > Thank You, > > Paul S. Horng, Ph.D > > Process Engineer, UD NanoFab > > 457 ISE Lab > > 221 Academy Street, Newark, DE 19716 > > (302)831-4827 > > http://udnf.udel.edu > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From patricns at uw.edu Thu Jan 18 16:57:32 2018 From: patricns at uw.edu (N . Shane Patrick) Date: Thu, 18 Jan 2018 13:57:32 -0800 Subject: [labnetwork] ICP etch of LiNbO3 In-Reply-To: <79882e7a0c774317bf00f27cb37929f9@udel.edu> References: <79882e7a0c774317bf00f27cb37929f9@udel.edu> Message-ID: Hello Paul, We?ve had some experience now with lithium niobate materials in an Oxford Plasmalab 100 ICP tool using fluorine chemistry. The problem we have found is that the by-products are not truly volatile and tend to deposit on everything where they are, in subsequent processes, likely to to be etched and redeposited. This has lead to micro masking, deposition on other substrates where it is not ideal, and plasma loading to the point of significant degradation of etch rates and uniformity. because of this, we were forced to do a hard, open chamber scrub and clean each time this process was run, followed by a few etch and clean cycles to get mostly back to normal operation. The maintenance time is such that I recommend staying away form this process if at all possible. We?ve not seen a negative effect on ultimate vacuum pressure or pump lifetime, but we?ve also reduced the frequency at which we allow this process due to the cleaning involved, so it may be we just haven?t had enough material go through to truly evaluate pump performance and lifetime expectancy. Best of luck. If you?d like more information on what we?ve seen, let me know and I?ll put you in contact with our etch engineer who has been attempting to cope with the matter. N. Shane Patrick Research Engineer, Washington Nanofabrication Facility (WNF) National Nanotechnology Coordinated Infrastructure (NNCI) University of Washington Fluke Hall 132, Box 352143 (206) 221-1045 patricns at uw.edu http://www.wnf.washington.edu/ > On Jan 18, 2018, at 11:28 AM, Horng, Paul S. wrote: > > Hi, > Has anyone had experience with plasma etching of LiNbO3 films ? It is hard to etch so higher platen power is needed to enhance physical sputtering. What is the impact on etch rate of other processes like etching of Si, SiO2, SiN, etc. in the same chamber ? How often is chamber liner needed to be scrubbed clean ? Will it shorten the life of turbo pump ? > > Thank You, > > Paul S. Horng, Ph.D > Process Engineer, UD NanoFab > 457 ISE Lab > 221 Academy Street, Newark, DE 19716 > (302)831-4827 > http://udnf.udel.edu > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: signature.asc Type: application/pgp-signature Size: 833 bytes Desc: Message signed with OpenPGP URL: From carsen at stanford.edu Thu Jan 18 18:33:11 2018 From: carsen at stanford.edu (Carsen Kline) Date: Thu, 18 Jan 2018 23:33:11 +0000 Subject: [labnetwork] Job opportunity at Stanford Nanofabrication Facility Message-ID: Dear colleagues, The Stanford Nanofabrication Facility is seeking an entry level engineer to support lab operations, and I am hoping that you could help spread the word to your communities. This is an opportunity for a candidate with strong engineering fundamentals and a sense of adventure to "learn the ropes" of our trade and support equipment, processing, and operations as a whole. The complete job description and details on how to apply are found here: https://stanford.taleo.net/careersection/2/jobdetail.ftl?job=77607&lang=en Thanks for your attention, Carsen Carsen Kline Lab Manager Stanford Nanofabrication Facility (650)724-8214 http://snf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From jdeng at cns.fas.harvard.edu Thu Jan 18 23:03:28 2018 From: jdeng at cns.fas.harvard.edu (Deng, Jiangdong) Date: Fri, 19 Jan 2018 04:03:28 +0000 Subject: [labnetwork] ICP etch of LiNbO3 In-Reply-To: References: <79882e7a0c774317bf00f27cb37929f9@udel.edu> Message-ID: HI, Paul, We in CNS evaluated different chambers and ICP systems for LiNbO3 etching, and it turned out Ulvac ICP NLD-570 gave us better results. Instead of fluorine, we just used Ar (physical sputtering). Redeposition is always an issue for LiNbO3 etching, and it is critical to tune the power, pressure and temperature. This etching process/recipe have been used for LiNbO3 high speed modulator application for about 2 years (please check Prof. Marko Loncar group's recent publication). Our ULVAC NLD-570 RIE is dedicated for oxide material etching, we haven?t seen too much impact to the SiO2, SiN etching. We have different chamber for Si device process. the tool is relative new (2 years old), we just opened the chamber for deep PM once. Please feel free to contact us (Kenlin- cced and myself) if you need more detailed information? Best! -JD -- Jiangdong Deng (JD), Ph.D, Associate Director Senior Principal Scientist, Center for Nanoscale Systems, Head of Nanofabrication Facility Harvard University, Cambridge, MA 02138 Tel: 617-495-3396 From: > on behalf of "patricns at uw.edu" > Date: Thursday, January 18, 2018 at 4:57 PM To: "Horng, Paul S." > Cc: "labnetwork at mtl. Network" > Subject: Re: [labnetwork] ICP etch of LiNbO3 Hello Paul, We?ve had some experience now with lithium niobate materials in an Oxford Plasmalab 100 ICP tool using fluorine chemistry. The problem we have found is that the by-products are not truly volatile and tend to deposit on everything where they are, in subsequent processes, likely to to be etched and redeposited. This has lead to micro masking, deposition on other substrates where it is not ideal, and plasma loading to the point of significant degradation of etch rates and uniformity. because of this, we were forced to do a hard, open chamber scrub and clean each time this process was run, followed by a few etch and clean cycles to get mostly back to normal operation. The maintenance time is such that I recommend staying away form this process if at all possible. We?ve not seen a negative effect on ultimate vacuum pressure or pump lifetime, but we?ve also reduced the frequency at which we allow this process due to the cleaning involved, so it may be we just haven?t had enough material go through to truly evaluate pump performance and lifetime expectancy. Best of luck. If you?d like more information on what we?ve seen, let me know and I?ll put you in contact with our etch engineer who has been attempting to cope with the matter. N. Shane Patrick Research Engineer, Washington Nanofabrication Facility (WNF) National Nanotechnology Coordinated Infrastructure (NNCI) University of Washington Fluke Hall 132, Box 352143 (206) 221-1045 patricns at uw.edu http://www.wnf.washington.edu/ On Jan 18, 2018, at 11:28 AM, Horng, Paul S. > wrote: Hi, Has anyone had experience with plasma etching of LiNbO3 films ? It is hard to etch so higher platen power is needed to enhance physical sputtering. What is the impact on etch rate of other processes like etching of Si, SiO2, SiN, etc. in the same chamber ? How often is chamber liner needed to be scrubbed clean ? Will it shorten the life of turbo pump ? Thank You, Paul S. Horng, Ph.D Process Engineer, UD NanoFab 457 ISE Lab 221 Academy Street, Newark, DE 19716 (302)831-4827 http://udnf.udel.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From sieb at 4dlabs.ca Fri Jan 19 18:58:55 2018 From: sieb at 4dlabs.ca (Nathanael Sieb) Date: Fri, 19 Jan 2018 15:58:55 -0800 Subject: [labnetwork] Job opportunity at 4D LABS Message-ID: An HTML attachment was scrubbed... URL: From nclay at seas.upenn.edu Mon Jan 22 11:28:01 2018 From: nclay at seas.upenn.edu (Noah Clay) Date: Mon, 22 Jan 2018 11:28:01 -0500 Subject: [labnetwork] UGIM 2018: June 24 -27th, 2018 in Philadelphia. Message-ID: Dear Colleagues, We are pleased to announce UGIM 2018 at the University of Pennsylvania. The conference will be on Penn?s main campus in the City of Philadelphia from June 24-27th, 2018. The Program Chair is Vincent Luciani, NanoFab Manager at the National Institute of Standards and Technology in Gaithersburg, MD. Conference information can be found on the following web site: ugim.nano.upenn.edu Vince and I will be finalizing session chairs in the coming weeks; in the interim, please review the Call For Papers section of the web site. Registration and abstract uploading capabilities will go live in early February. We have tentatively set a submission deadline for March 15th, 2018. Lastly, please consider you travel plans for this summer. I reserved a bunch of rooms at the Sheraton Hotel in University City, which is three blocks from the main conference venue on Penn?s campus. Contact information for the hotel (and discounted rate information) can be found in the travel section of the UGIM 2018 web site. We look forward to seeing you in Philadelphia! Kind regards, Noah Clay Chair UGIM 2018 Vincent Luciani Program Chair, UGIM 2018 -------------- next part -------------- An HTML attachment was scrubbed... URL: From beaudoin at physics.ubc.ca Mon Jan 22 15:46:20 2018 From: beaudoin at physics.ubc.ca (Beaudoin, Mario) Date: Mon, 22 Jan 2018 12:46:20 -0800 Subject: [labnetwork] EBL engineer position at UBC's Quantum Matter Institute Message-ID: <55410441-4d60-4aa8-bfef-7a3a68c50a12@physics.ubc.ca> We are looking for an Electron-Beam Lithography & Process Engineer for the UBC QMI Nanofabrication facility, working with the new Jeol 8100FS 100 keV 8? system. ?The research involves silicon photonics for both classical and quantum information applications, and Majorana fermion quantum computing, among other topics. Do you know anyone who may be interested? ?Can you please share with your colleagues and networks? See attached. ?More info about the institute and the position at http://qmi.ubc.ca/?page_id=62, and application page: www.staffcareers.ubc.ca/28728 -- *Mario Beaudoin, Ph.D.* Research Associate Nanofabrication Facility Stewart Blusson Quantum Matter Institute University of British Columbia 2355 East Mall, Vancouver, B.C., V6T 1Z4 T: 604-822-1853 E: beaudoin at physics.ubc.ca -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Applicant Searches SBQMI EBL engineer.pdf Type: application/pdf Size: 70638 bytes Desc: not available URL: From bic at mtl.mit.edu Wed Jan 24 08:58:49 2018 From: bic at mtl.mit.edu (Bob Bicchieri) Date: Wed, 24 Jan 2018 08:58:49 -0500 Subject: [labnetwork] Vanadium Pentoxide V2O5 Message-ID: <006401d3951b$75bd1d20$61375760$@mtl.mit.edu> Has anyone had any problems with putting this in an etcher-ie memory effect contaminating it for others (like zinc oxide) Thanks, Bob ----------------------------------------------------------------- Robert J. Bicchieri Research Specialist Massachusetts Institute of Technology Microsystems Technology Laboratories 60 Vassar St. Bldg. 39-215 Cambridge, MA 02139 Phone 617.253.6418 Fax 617.258.8500 -------------- next part -------------- An HTML attachment was scrubbed... URL: From eabelev at pitt.edu Wed Jan 24 14:51:47 2018 From: eabelev at pitt.edu (Abelev, Esta) Date: Wed, 24 Jan 2018 19:51:47 +0000 Subject: [labnetwork] Nanoscribe consumables Message-ID: Dear Colleagues, New Nanoscribe system was recently installed in our facility. It is quite expansive to buy the glass substrates from the Nanoscribe (~7$ for plate) does anyone found a cheaper source, please advise. Best, Esta ----------------------- Esta Abelev, PhD Technical Director, Petersen Institute of NanoScience and Engineering University of Pittsburgh | 3700 O'Hara Street | 636| Pittsburgh, PA 15261 412-383-4096 | eabelev at pitt.edu | nano.pitt.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From eabelev at pitt.edu Wed Jan 24 14:56:48 2018 From: eabelev at pitt.edu (Abelev, Esta) Date: Wed, 24 Jan 2018 19:56:48 +0000 Subject: [labnetwork] Device on PDMS Message-ID: Dear All, We have a group here that is interesting to make some gold electrodes on PDMS substrates. We found it is very challenging to bake the resist on PDMS dew to it temp. sensitivity (shrinks). Can anyone advise us on how to do it, any tricks? Thank you, Esta ----------------------- Esta Abelev, PhD Technical Director, Petersen Institute of NanoScience and Engineering University of Pittsburgh | 3700 O'Hara Street | 636| Pittsburgh, PA 15261 412-383-4096 | eabelev at pitt.edu | nano.pitt.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From patricns at uw.edu Wed Jan 24 15:46:01 2018 From: patricns at uw.edu (N . Shane Patrick) Date: Wed, 24 Jan 2018 12:46:01 -0800 Subject: [labnetwork] Nanoscribe consumables In-Reply-To: References: Message-ID: Hello Esta, We have a relatively recent installation of one of these tools ourselves, and while here for setup the representative basically recommended microscope cover slides could be used if you want to do things on the cheap. The biggest issue is to ensure they are as clean as possible to help ensure adhesion to the substrate. I could also imagine issues with flatness and glass purity if those are issues for your project. Please note, however, this is all hearsay on my part, as we haven?t had to procure any of these ourselves at this point. N. Shane Patrick Research Engineer, Washington Nanofabrication Facility (WNF) National Nanotechnology Coordinated Infrastructure (NNCI) University of Washington Fluke Hall 132, Box 352143 (206) 221-1045 patricns at uw.edu http://www.wnf.washington.edu/ > On Jan 24, 2018, at 11:51 AM, Abelev, Esta wrote: > > Dear Colleagues, > > New Nanoscribe system was recently installed in our facility. It is quite expansive to buy the glass substrates from the Nanoscribe (~7$ for plate) does anyone found a cheaper source, please advise. > > Best, Esta > > ----------------------- > Esta Abelev, PhD > Technical Director, Petersen Institute of NanoScience and Engineering > University of Pittsburgh | 3700 O?Hara Street | 636| Pittsburgh, PA 15261 > 412-383-4096 | eabelev at pitt.edu | nano.pitt.edu > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: signature.asc Type: application/pgp-signature Size: 833 bytes Desc: Message signed with OpenPGP URL: From Ashley.Mulligan at ll.mit.edu Wed Jan 24 16:09:47 2018 From: Ashley.Mulligan at ll.mit.edu (Mulligan, Ashley - 0010 - MITLL) Date: Wed, 24 Jan 2018 21:09:47 +0000 Subject: [labnetwork] TGMS Benchmarking Help Message-ID: <80FDE71C8DC3464B854E89237E91162A61A5F8@LLE2K10-MBX02.mitll.ad.local> Hi Folks, I work at MIT Lincoln Lab and it's my first time posting to this thread. Looking to get some data about how other fabs are conducting bump testing for their TGMS. Please see attached survey and send responses to ashley.mulligan at ll.mit.edu Thanks in advance for your time! Ashley S. Mulligan EHS Associate MIT Lincoln Laboratory 244 Wood Street Lexington, MA 02421 Office:781-981-9080 Cell:781-879-3570 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: TGMS Questionnaire.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 12330 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: smime.p7s Type: application/pkcs7-signature Size: 5473 bytes Desc: not available URL: From Jacob.Trevino at asrc.cuny.edu Wed Jan 24 18:17:10 2018 From: Jacob.Trevino at asrc.cuny.edu (Jacob Trevino) Date: Wed, 24 Jan 2018 23:17:10 +0000 Subject: [labnetwork] Nanoscribe consumables In-Reply-To: References: , Message-ID: <4a061515-b15d-4e7a-8aa2-89b42397c166@asrc.cuny.edu> Hi all, We have had a system for almost 2 years now and we now make our own substrates and it works just fine. We buy fused silica wafers at the correct thickness and dice them into the predefined dimensions, according to the substrate holder parameters defined by Nanoscribe. Also, for those applications where it is needed, we sputter a few nm of ITO or PECVD SiN on them to get the index contrast needed (this is dependent on the resist and mode you are running in). The software is preprogrammed to look for the substrate/resist interface in a certain range determined by the holder and position you chose, so the thickness does matter. I have a PDF I can supply if needed that gives you parameters for each particular holder/position combo. It wasn't provided at the time of installation, but only after asking many times (maybe this is different now). Its still a young technology, so there are many tricks of trade to learn as an owner, but it certainly is a fun and interesting system with amazing capabilities. Best, Jacob --------------- Jacob Trevino, PhD NanoFabrication Facility Director | Research Associate Professor CUNY Advanced Science Research Center 85 St. Nicholas Terrace, New York, NY 10031 212-413-3310 | jacob.trevino at asrc.cuny.edu| http://nanofab.asrc.cuny.edu/ ________________________________ From: "N . Shane Patrick" Sent: Wednesday, January 24, 2018 5:28 PM To: Abelev, Esta Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Nanoscribe consumables Hello Esta, We have a relatively recent installation of one of these tools ourselves, and while here for setup the representative basically recommended microscope cover slides could be used if you want to do things on the cheap. The biggest issue is to ensure they are as clean as possible to help ensure adhesion to the substrate. I could also imagine issues with flatness and glass purity if those are issues for your project. Please note, however, this is all hearsay on my part, as we haven't had to procure any of these ourselves at this point. N. Shane Patrick Research Engineer, Washington Nanofabrication Facility (WNF) National Nanotechnology Coordinated Infrastructure (NNCI) University of Washington Fluke Hall 132, Box 352143 (206) 221-1045 patricns at uw.edu http://www.wnf.washington.edu/ On Jan 24, 2018, at 11:51 AM, Abelev, Esta > wrote: Dear Colleagues, New Nanoscribe system was recently installed in our facility. It is quite expansive to buy the glass substrates from the Nanoscribe (~7$ for plate) does anyone found a cheaper source, please advise. Best, Esta ----------------------- Esta Abelev, PhD Technical Director, Petersen Institute of NanoScience and Engineering University of Pittsburgh | 3700 O'Hara Street | 636| Pittsburgh, PA 15261 412-383-4096 | eabelev at pitt.edu | nano.pitt.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From carsen at stanford.edu Thu Jan 25 09:59:40 2018 From: carsen at stanford.edu (Carsen Kline) Date: Thu, 25 Jan 2018 14:59:40 +0000 Subject: [labnetwork] Device on PDMS In-Reply-To: References: Message-ID: Hello Esta, Have you considered using a shadow mask and an evaporator? Substrate shape and topography could present a challenge, and some fixturing would be required, but no resist would be required and with a great enough throw distance (on the order of 60cm+), your temperatures should stay cool enough to get the job done. Best, Carsen From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Abelev, Esta Sent: Wednesday, January 24, 2018 11:57 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Device on PDMS Dear All, We have a group here that is interesting to make some gold electrodes on PDMS substrates. We found it is very challenging to bake the resist on PDMS dew to it temp. sensitivity (shrinks). Can anyone advise us on how to do it, any tricks? Thank you, Esta ----------------------- Esta Abelev, PhD Technical Director, Petersen Institute of NanoScience and Engineering University of Pittsburgh | 3700 O'Hara Street | 636| Pittsburgh, PA 15261 412-383-4096 | eabelev at pitt.edu | nano.pitt.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From mghoneim at mit.edu Thu Jan 25 16:03:26 2018 From: mghoneim at mit.edu (Mohamed Ghoneim) Date: Thu, 25 Jan 2018 16:03:26 -0500 Subject: [labnetwork] Device on PDMS In-Reply-To: References: Message-ID: **This might work for having electrodes on PDMS without running into thermal expansion/shrinking issues.....but it depends on what you are trying to do ultimately. [image: Inline image 1] **You can also try transfer printing the electrodes or using the traditional process with PR (additive or lift-off) but with slower heating up and cooling down rates (sometimes, moving to 70% of required temperature then 100% does the trick and same when cooling down to room temperature). Best of luck and wish you all a great day! Mohamed T. Ghoneim , Postdoctoral Researcher MIT Media Lab, Building E-15, Fourth Floor, Room 443g. Website On Thu, Jan 25, 2018 at 9:59 AM, Carsen Kline wrote: > Hello Esta, > > > > Have you considered using a shadow mask and an evaporator? Substrate shape > and topography could present a challenge, and some fixturing would be > required, but no resist would be required and with a great enough throw > distance (on the order of 60cm+), your temperatures should stay cool enough > to get the job done. > > > > Best, > > > Carsen > > > > > > *From:* labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl > .mit.edu] *On Behalf Of *Abelev, Esta > *Sent:* Wednesday, January 24, 2018 11:57 AM > *To:* labnetwork at mtl.mit.edu > *Subject:* [labnetwork] Device on PDMS > > > > Dear All, > > > > We have a group here that is interesting to make some gold electrodes on > PDMS substrates. > > We found it is very challenging to bake the resist on PDMS dew to it temp. > sensitivity (shrinks). > > Can anyone advise us on how to do it, any tricks? > > > > Thank you, Esta > > > > ----------------------- > > *Esta Abelev, PhD* > > Technical Director, Petersen Institute of NanoScience and Engineering > > University of Pittsburgh | 3700 O?Hara Street | 636| Pittsburgh, PA 15261 > > 412-383-4096 <(412)%20383-4096> | eabelev at pitt.edu | nano.pitt.edu > > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 17942 bytes Desc: not available URL: From hit.kamble at gmail.com Thu Jan 25 20:59:30 2018 From: hit.kamble at gmail.com (Hitesh Kamble) Date: Fri, 26 Jan 2018 07:29:30 +0530 Subject: [labnetwork] Device on PDMS In-Reply-To: References: Message-ID: Hello Esta, Adehsion issue occurs in this most so slowly ramping temp works well, Coat PR on PDMS, put sample at hotplate @50deg C and ramp up to 80deg C for 2min. Next shrink/expand issue: during deposition/ evaporation chamber temp should not exceed more than 90deg C. Thanks, Hitesh On 26-Jan-2018 6:35 AM, "Mohamed Ghoneim" wrote: **This might work for having electrodes on PDMS without running into thermal expansion/shrinking issues.....but it depends on what you are trying to do ultimately. [image: Inline image 1] **You can also try transfer printing the electrodes or using the traditional process with PR (additive or lift-off) but with slower heating up and cooling down rates (sometimes, moving to 70% of required temperature then 100% does the trick and same when cooling down to room temperature). Best of luck and wish you all a great day! Mohamed T. Ghoneim , Postdoctoral Researcher MIT Media Lab, Building E-15, Fourth Floor, Room 443g. Website On Thu, Jan 25, 2018 at 9:59 AM, Carsen Kline wrote: > Hello Esta, > > > > Have you considered using a shadow mask and an evaporator? Substrate shape > and topography could present a challenge, and some fixturing would be > required, but no resist would be required and with a great enough throw > distance (on the order of 60cm+), your temperatures should stay cool enough > to get the job done. > > > > Best, > > > Carsen > > > > > > *From:* labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl > .mit.edu] *On Behalf Of *Abelev, Esta > *Sent:* Wednesday, January 24, 2018 11:57 AM > *To:* labnetwork at mtl.mit.edu > *Subject:* [labnetwork] Device on PDMS > > > > Dear All, > > > > We have a group here that is interesting to make some gold electrodes on > PDMS substrates. > > We found it is very challenging to bake the resist on PDMS dew to it temp. > sensitivity (shrinks). > > Can anyone advise us on how to do it, any tricks? > > > > Thank you, Esta > > > > ----------------------- > > *Esta Abelev, PhD* > > Technical Director, Petersen Institute of NanoScience and Engineering > > University of Pittsburgh | 3700 O?Hara Street | 636| Pittsburgh, PA 15261 > > 412-383-4096 <(412)%20383-4096> | eabelev at pitt.edu | nano.pitt.edu > > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 17942 bytes Desc: not available URL: From mohamed.t.ghoneim at gmail.com Mon Jan 29 10:31:21 2018 From: mohamed.t.ghoneim at gmail.com (Mohamed Ghoneim) Date: Mon, 29 Jan 2018 10:31:21 -0500 Subject: [labnetwork] Cleaning the Surface of ZnO Message-ID: Dear All, I am sputtering ZnO thin films for pH sensing. Getting repeatable and stable results is a challenge that I though first has to do with chemical fouling and other selectivity issues but based on the literature these issues are there for ZnO but usually do not affect the reliability of measurements to a great extent. I am more concerned now about the crystallinity and stoichiometry effects and as well as surface cleaning techniques to make sure I do not have contaminants on the surface that significantly affects the surface chemistry. These are the XRD results of the films (x-axis is 2Theta and the blue (XYZ) are for ZnO: [image: Inline image 1] These are the XPS results of the films (the blue one is the as-deposited ZnO and the red one is after some tests in buffer solutions): [image: Inline image 2] Can you please share thoughts about the effect of (a) Crystalline Structure and (b) Stoichiometry (or elemental composition) of ZnO thin film on its pH sensing capabilities and how it affects the surface integrity in terms of: 1- Sensitivity 2- Repeatability 3- Stability of the Measurments. All thoughts, comments are highly appreciated, Thanks in advance and wish you a great day! Mohamed T. Ghoneim , Postdoctoral Researcher MIT Media Lab, Building E-15, Fourth Floor, Room 443g. Website -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 245493 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 67278 bytes Desc: not available URL: From mohamed.t.ghoneim at gmail.com Tue Jan 30 10:06:12 2018 From: mohamed.t.ghoneim at gmail.com (Mohamed Ghoneim) Date: Tue, 30 Jan 2018 10:06:12 -0500 Subject: [labnetwork] Cleaning the Surface of ZnO In-Reply-To: References: Message-ID: I wanted to add that I used RF Sputtering at room temperature from a ZnO target with 99.99% purity and Ar:O2 flow with the ratio of 2:1, if you can provide any suggestions for improving the film quality that would be great. Thanks again and wish you all a great day! Mohamed T. Ghoneim , Postdoctoral Researcher MIT Media Lab, Building E-15, Fourth Floor, Room 443g. Website On Mon, Jan 29, 2018 at 10:31 AM, Mohamed Ghoneim < mohamed.t.ghoneim at gmail.com> wrote: > Dear All, > > I am sputtering ZnO thin films for pH sensing. Getting repeatable and > stable results is a challenge that I though first has to do with chemical > fouling and other selectivity issues but based on the literature these > issues are there for ZnO but usually do not affect the reliability of > measurements to a great extent. I am more concerned now about the > crystallinity and stoichiometry effects and as well as surface cleaning > techniques to make sure I do not have contaminants on the surface that > significantly affects the surface chemistry. > These are the XRD results of the films (x-axis is 2Theta and the blue > (XYZ) are for ZnO: > [image: Inline image 1] > These are the XPS results of the films (the blue one is the as-deposited > ZnO and the red one is after some tests in buffer solutions): > [image: Inline image 2] > > Can you please share thoughts about the effect of (a) Crystalline > Structure and (b) Stoichiometry (or elemental composition) of ZnO thin film > on its pH sensing capabilities and how it affects the surface integrity in > terms of: 1- Sensitivity 2- Repeatability 3- Stability of the Measurments. > All thoughts, comments are highly appreciated, > Thanks in advance and wish you a great day! > > > Mohamed T. Ghoneim > > , > Postdoctoral Researcher > MIT Media Lab, Building E-15, Fourth Floor, Room 443g. > Website > > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 245493 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 67278 bytes Desc: not available URL: From Irharvey at eng.utah.edu Tue Jan 30 10:57:24 2018 From: Irharvey at eng.utah.edu (Ian Harvey) Date: Tue, 30 Jan 2018 08:57:24 -0700 Subject: [labnetwork] =?windows-1252?q?Free_to_a_good_home=3A_Acid_waste_n?= =?windows-1252?q?eutralization_system=85?= References: <5DC3DB08183C734BB47923A6BC0BA6D0DC387008@X-MB4.xds.umail.utah.edu> Message-ID: Dear Labnetwork Colleagues, When we moved out of our basement microfab we abandoned this 10-year old, 3GPM AWN system. "free to a good home". Schematic, photos, Quote and design documents attached. ?Ian Ian R. Harvey, Ph.D. Associate Director Utah Nanofab at the University of Utah Cleanroom Fabrication and nanoImaging & Surface Analysis 801/585-6162 (voicemail) www.nanofab.utah.edu http://sal.nanofab.utah.edu Micron Technology Foundation Inc., Microscopy Suite Sorenson Molecular Biotechnology Building ? A USTAR Innovation Center 36 South Wasatch Drive Suite 2500 Salt Lake City, Utah 84112-9011 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: PastedGraphic-2.pdf Type: application/pdf Size: 22517 bytes Desc: not available URL: -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... 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URL: From hathaway at cns.fas.harvard.edu Tue Jan 30 15:15:29 2018 From: hathaway at cns.fas.harvard.edu (Mac Hathaway) Date: Tue, 30 Jan 2018 15:15:29 -0500 Subject: [labnetwork] Cleaning the Surface of ZnO In-Reply-To: References: Message-ID: <5A70D261.3020101@cns.fas.harvard.edu> Hi Mohamed, I don't know about the details of ZnO for pH sensing, but just an fyi, ALD ZnO is particularly pure, and can be deposited at a range of temperatures, which might allow your to modulate your sensing/stability response. The stoichiometry for ALD films can be expected to be very precise, and stable over a range of deposition temperatures. ALD is available at Harvard CNS. For resistivity of the deposited film, we have found that an anneal helps to stabilize the film. This might also help to stabilize your pH response in your sputtered film. From what I know about reactively sputtered oxides, their stoichiometry is pretty sensitive to process conditions, which would presumably lead to sample-to-sample variability in your pH measurements. Mac Mac Hathaway Senior Process and Systems Engineer Harvard Center for Nanoscale Systems 11 Oxford St. Cambridge, MA02138 617-495-9012 On 1/29/2018 10:31 AM, Mohamed Ghoneim wrote: > Dear All, > > I am sputtering ZnO thin films for pH sensing. Getting repeatable and > stable results is a challenge that I though first has to do with > chemical fouling and other selectivity issues but based on the > literature these issues are there for ZnO but usually do not affect > the reliability of measurements to a great extent. I am more concerned > now about the crystallinity and stoichiometry effects and as well as > surface cleaning techniques to make sure I do not have contaminants on > the surface that significantly affects the surface chemistry. > These are the XRD results of the films (x-axis is 2Theta and the blue > (XYZ) are for ZnO: > Inline image 1 > These are the XPS results of the films (the blue one is the > as-deposited ZnO and the red one is after some tests in buffer solutions): > Inline image 2 > > Can you please share thoughts about the effect of (a) Crystalline > Structure and (b) Stoichiometry (or elemental composition) of ZnO thin > film on its pH sensing capabilities and how it affects the surface > integrity in terms of: 1- Sensitivity 2- Repeatability 3- Stability of > the Measurments. > All thoughts, comments are highly appreciated, > Thanks in advance and wish you a great day! > > > Mohamed T. Ghoneim > , > > Postdoctoral Researcher > MIT Media Lab, Building E-15, Fourth Floor, Room 443g. > Website > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/png Size: 245493 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: not available Type: image/png Size: 67278 bytes Desc: not available URL: From mohamed.t.ghoneim at gmail.com Wed Jan 31 09:28:59 2018 From: mohamed.t.ghoneim at gmail.com (Mohamed Ghoneim) Date: Wed, 31 Jan 2018 09:28:59 -0500 Subject: [labnetwork] Should a pH Sensing Membrane be Conductive or Insulating? Message-ID: When using EGFET pH sensing configuration (very similar to a metal/sensing membrane to collect ions from solution and generate voltage).....does the sensing thin film have to be conductive or insulating? Example Setup: [image: Inline image 1] I am using EGFET setup with commercial transistor that is connected to a Au electrode with a ZnO thin film (150 nm) on the part to be immersed in solution to sense the pH. I also use a reference electrode to set the offset voltage and bias the transistor.....does my ZnO thin film have to be conductive or insulating for reliable sensor performance? It is generally reported in literature that the preferred orientation of ZnO used for such purposes is (002) although few reported amorphous....but conductivity is not usually discussed. Since ZnO's conductivity is highly tunable, it would be very helpful if its conductivity matches the requirement for a good sensitivity and reliable measurements. All responses and discussions are appreciated...thanks in advance, Mohamed T. Ghoneim , Postdoctoral Researcher MIT Media Lab, Building E-15, Fourth Floor, Room 443g. Website -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 59636 bytes Desc: not available URL: From codreanu at udel.edu Wed Jan 31 10:54:46 2018 From: codreanu at udel.edu (Iulian Codreanu) Date: Wed, 31 Jan 2018 10:54:46 -0500 Subject: [labnetwork] ICP etch of LiNbO3 In-Reply-To: References: <79882e7a0c774317bf00f27cb37929f9@udel.edu> Message-ID: <742b19cc-9c23-7fcd-ebfb-fc44f27ca3ae@udel.edu> Dear Colleagues, Thank you to all who have replied to this thread. Does anyone have experience with etching LiNbO3 in a chlorine-based chamber that is used to process III-V materials? We would use fluorinated gases to etch the LiNbO3 as we have those available as cleaning gases. Other than "dirtying up" the chamber (which could be remedied by mechanical scrubbing and reconditioning), would the III-V materials be more tolerable to the LiNbO3 etch byproducts than Si? Thank you, Iulian iulian Codreanu, Ph.D. Director of Operations, UD NanoFab 163 ISE Lab 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 1/18/2018 11:03 PM, Deng, Jiangdong wrote: > HI, Paul, > We in CNS evaluated different chambers and ICP systems for LiNbO3 > etching, and it turned out Ulvac ICP NLD-570 gave us better results. > ?Instead of fluorine, we just used Ar (physical sputtering). > Redeposition is always an issue for LiNbO3 etching, and it is critical > to tune the power, pressure and temperature. ?This etching > process/recipe have been used for LiNbO3 high speed modulator > application for about 2 years (please check Prof. Marko Loncar group's > recent publication). > Our ULVAC NLD-570 RIE is dedicated for oxide material etching, we > haven?t seen too much impact to the SiO2, SiN etching. We have > different chamber for Si device process. the tool is relative new (2 > years old), we just opened the chamber for deep PM once. > Please feel free to contact us (Kenlin- cced and myself) if you need > more detailed information? > > Best! > > > -JD > > > -- Jiangdong Deng (JD), Ph.D, > > Associate Director > Senior Principal Scientist, > Center for Nanoscale Systems, > Head of Nanofabrication Facility > Harvard University, > Cambridge, MA 02138 > Tel: 617-495-3396 > > > From: > on behalf of "patricns at uw.edu > " > > Date: Thursday, January 18, 2018 at 4:57 PM > To: "Horng, Paul S." > > Cc: "labnetwork at mtl. Network" > > Subject: Re: [labnetwork] ICP etch of LiNbO3 > > Hello Paul, > > We?ve had some experience now with lithium niobate materials in an > Oxford Plasmalab 100 ICP tool using fluorine chemistry. The problem we > have found is that the by-products are not truly volatile and tend to > deposit on everything where they are, in subsequent processes, likely > to to be etched and redeposited. > > This has lead to micro masking, deposition on other substrates where > it is not ideal, and plasma loading to the point of significant > degradation of etch rates and uniformity. because of this, we were > forced to do a hard, open chamber scrub and clean each time this > process was run, followed by a few etch and clean cycles to get mostly > back to normal operation. The maintenance time is such that I > recommend staying away form this process if at all possible. > > We?ve not seen a negative effect on ultimate vacuum pressure or pump > lifetime, but we?ve also reduced the frequency at which we allow this > process due to the cleaning involved, so it may be we just haven?t had > enough material go through to truly evaluate pump performance and > lifetime expectancy. > > Best of luck. If you?d like more information on what we?ve seen, let > me know and I?ll put you in contact with our etch engineer who has > been attempting to cope with the matter. > > N. Shane Patrick > Research Engineer, Washington Nanofabrication Facility (WNF) > National Nanotechnology Coordinated Infrastructure (NNCI) > University of Washington > Fluke Hall 132, Box 352143 > (206) 221-1045 > patricns at uw.edu > http://www.wnf.washington.edu/ > >> On Jan 18, 2018, at 11:28 AM, Horng, Paul S. > > wrote: >> >> Hi, >> Has anyone had experience with plasma etching of LiNbO3 films ? It is >> hard to etch so higher platen power is needed to enhance physical >> sputtering. What is the impact on etch rate of other processes like >> etching of Si, SiO2, SiN, etc. in the same chamber ? ?How often is >> chamber liner needed to be scrubbed clean ? Will it shorten the life >> of turbo pump ? >> Thank You, >> Paul S. Horng, Ph.D >> Process Engineer, UD NanoFab >> 457 ISE Lab >> 221 Academy Street, Newark, DE 19716 >> (302)831-4827 >> http://udnf.udel.edu >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From na2661 at columbia.edu Wed Jan 31 14:06:54 2018 From: na2661 at columbia.edu (Nava Ariel-Sternberg) Date: Wed, 31 Jan 2018 14:06:54 -0500 Subject: [labnetwork] Hazardous gas delivery logistics Message-ID: <012c01d39ac6$a8c1c670$fa455350$@columbia.edu> Dear all, I am very happy to say that we are finally gearing up to full operations in the Columbia University clean room (after a long renovation period, inspections, permits etc.). The final stage will be to bring on-line systems that use toxic and other hazardous gases that we do not yet have on site. As we are getting ready to receive those gases, we started discussing what would be the safest way to receive them and the logistics involved. This has brought some interesting questions and I wanted to get some inputs from other facilities. Could you please comment on the toxic gases receiving procedures in your facility? Is the delivery done at special times in the day? Are you securing the cylinder path? (making sure no one is in the corridor/elevator etc.?) Are you performing leak checks when the cylinder arrives to campus? Are staff wearing SCBA when handling the cylinders? When is the transfer point between the gas company and the technical staff of the clean room? Thanks, Nava Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Facilities Columbia University 530 w120th st., NY 10027 Room 1015/MC 8903 Office: 212-854-9927 Cell: 201-562-7600 ? -------------- next part -------------- An HTML attachment was scrubbed... URL: From bill_flounders at berkeley.edu Wed Jan 31 16:05:55 2018 From: bill_flounders at berkeley.edu (A. William (Bill) FLOUNDERS) Date: Wed, 31 Jan 2018 13:05:55 -0800 Subject: [labnetwork] Should a pH Sensing Membrane be Conductive or Insulating? In-Reply-To: References: Message-ID: Mohamed Ghoneim, Your gate insulator should be highly insulating. You are attempting to monitor the degree of protonation of surface hydroxyl groups as a function of solution pH. I encourage you to review detailed principles of operation and review articles from research group of Piet Bergveld. (1980 -2000). I will continue conversation with you offline. I repeat my regular proposal / request that labnet not host such detailed research specific inquiries. I welcome ongoing discussion of our network. Bill Flounders UC Berkeley On Wed, Jan 31, 2018 at 6:28 AM, Mohamed Ghoneim < mohamed.t.ghoneim at gmail.com> wrote: > When using EGFET pH sensing configuration (very similar to a metal/sensing > membrane to collect ions from solution and generate voltage).....does the > sensing thin film have to be conductive or insulating? > > Example Setup: > > [image: Inline image 1] > > I am using EGFET setup with commercial transistor that is connected to a > Au electrode with a ZnO thin film (150 nm) on the part to be immersed in > solution to sense the pH. I also use a reference electrode to set the > offset voltage and bias the transistor.....does my ZnO thin film have to be > conductive or insulating for reliable sensor performance? > > It is generally reported in literature that the preferred orientation of > ZnO used for such purposes is (002) although few reported amorphous....but > conductivity is not usually discussed. Since ZnO's conductivity is highly > tunable, it would be very helpful if its conductivity matches the > requirement for a good sensitivity and reliable measurements. > > > All responses and discussions are appreciated...thanks in advance, > > Mohamed T. Ghoneim > > , > Postdoctoral Researcher > MIT Media Lab, Building E-15, Fourth Floor, Room 443g. > Website > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 59636 bytes Desc: not available URL: From mohamed.t.ghoneim at gmail.com Wed Jan 31 16:44:57 2018 From: mohamed.t.ghoneim at gmail.com (Mohamed Ghoneim) Date: Wed, 31 Jan 2018 16:44:57 -0500 Subject: [labnetwork] Should a pH Sensing Membrane be Conductive or Insulating? In-Reply-To: References: Message-ID: Thanks Bill for the helpful tips and the note. Apologies for the research specific query. Wish you all a great day! Mohamed T. Ghoneim , Postdoctoral Researcher MIT Media Lab, Building E-15, Fourth Floor, Room 443g. Website On Wed, Jan 31, 2018 at 4:05 PM, A. William (Bill) FLOUNDERS < bill_flounders at berkeley.edu> wrote: > Mohamed Ghoneim, > Your gate insulator should be highly insulating. > You are attempting to monitor the degree of protonation of > surface hydroxyl groups as a function of solution pH. > > I encourage you to review detailed principles of operation > and review articles from research group of Piet Bergveld. (1980 -2000). > I will continue conversation with you offline. > > I repeat my regular proposal / request that labnet not host such detailed > research specific inquiries. I welcome ongoing discussion of our network. > > Bill Flounders > UC Berkeley > > On Wed, Jan 31, 2018 at 6:28 AM, Mohamed Ghoneim < > mohamed.t.ghoneim at gmail.com> wrote: > >> When using EGFET pH sensing configuration (very similar to a >> metal/sensing membrane to collect ions from solution and generate >> voltage).....does the sensing thin film have to be conductive or insulating? >> >> Example Setup: >> >> [image: Inline image 1] >> >> I am using EGFET setup with commercial transistor that is connected to a >> Au electrode with a ZnO thin film (150 nm) on the part to be immersed in >> solution to sense the pH. I also use a reference electrode to set the >> offset voltage and bias the transistor.....does my ZnO thin film have to be >> conductive or insulating for reliable sensor performance? >> >> It is generally reported in literature that the preferred orientation of >> ZnO used for such purposes is (002) although few reported amorphous....but >> conductivity is not usually discussed. Since ZnO's conductivity is highly >> tunable, it would be very helpful if its conductivity matches the >> requirement for a good sensitivity and reliable measurements. >> >> >> All responses and discussions are appreciated...thanks in advance, >> >> Mohamed T. Ghoneim >> >> , >> Postdoctoral Researcher >> MIT Media Lab, Building E-15, Fourth Floor, Room 443g. >> Website >> >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork >> >> > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 59636 bytes Desc: not available URL: