From stuart.pearce at huawei.com Thu Mar 1 07:29:35 2018 From: stuart.pearce at huawei.com (Stuart Pearce) Date: Thu, 1 Mar 2018 12:29:35 +0000 Subject: [labnetwork] ALD question Message-ID: <12365E1B3369A349B4716C5F18F5365A3744C24F@FRAEML521-MBX.china.huawei.com> Hi, We are looking to purchase an ALD tool and am now down to the final two possibilities and I was wondering if any of the forum users out there have knowledge/experience (good and bad) of both tools. If you have a film properties you can share such as roughness, uniformity and particles for materials like SiO2, SiN, Al203 as well that would be very helpful. I?ve already spoken to a few users of both tools so have some idea on them but would now like to broadcast to a wider audience to gather more information. Tool 1: Picosun R-200 Advanced Tool 2: Fiji 200 Gen 2 I hope to hear from you soon. Best Regards, Stuart Dr. Stuart Pearce Senior Process Engineer/Cleanroom Manager I Ipswich Research Centre Tel: +44(0)01473663153 I E-mail: stuart.pearce at huawei.com Company: Huawei Technologies Research&Development (UK) Limited I Address: Phoenix House (B55) Adastral Park, Martlesham Heath, Ipswich, IP5 3RE, UK [315px-Huawei] http://www.huawei.com [cid:image002.jpg at 01D38A19.FB41DF10] This e-mail and its attachments contain confidential information from HUAWEI, which is intended only for the person or entity whose address is listed above. Any use of the information contained herein in any way (including, but not limited to, total or partial disclosure,reproduction, or dissemination) by persons other than the intended recipient(s) is prohibited. If you receive this e-mail in error, please notify the sender by phone or email immediately and delete it ! ??????????????????????????? ???????????????????????????????????????????????????????????????????????????????????????? -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 5951 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.jpg Type: image/jpeg Size: 5938 bytes Desc: image002.jpg URL: From mathilde.i.barriet at ntnu.no Fri Mar 2 02:24:50 2018 From: mathilde.i.barriet at ntnu.no (Mathilde Isabelle Barriet) Date: Fri, 2 Mar 2018 07:24:50 +0000 Subject: [labnetwork] PDMS Sylgard 184 Message-ID: <88893824ca984cd5a08f9af0f1f39f4c@it-ex11.win.ntnu.no> Dear All As many of you we are using Sylgard 184. In Norway we have no other choice than buying it as a kit (1kg elastomer + 100g of curing agent). For some unknown reasons we have many cans of elastomers unused and no curing agent to go with... I have been trying to buy the curing agent alone through different channels (our supplier, dow corning) but with no success. Any of you has any advice or contacts so I can get the curing agent only. Thanks Kind regards Mathilde Senior Engineer NTNU NanoLab ---------------------------- Sem S?lands vei 14, K1-113 NO-7491 Trondheim +47 91 89 72 08 www.ntnu.no/nanolab From James_Goodman at uml.edu Fri Mar 2 11:29:47 2018 From: James_Goodman at uml.edu (Goodman, James R) Date: Fri, 2 Mar 2018 16:29:47 +0000 Subject: [labnetwork] Single tube furnace duct temperature Message-ID: Good Afternoon colleagues, We are in the process of installing a donated single tube diffusion furnace. It is an MRL 1018 with an auto loader. Our facilities group is concerned about the temperature of the exhaust and its impact on building systems and ductwork. Does anyone have a system like this that would be willing to take some temperature measurements of the exhaust duct while running at 1000 degC? Thanks, Jay. ? James Goodman University of Massachusetts, Lowell Core Research Facilities Nano Fabrication Lab 1 University Ave Lowell MA 01854 978-934-3469 -------------- next part -------------- An HTML attachment was scrubbed... URL: From johnkym at gmail.com Fri Mar 2 12:05:33 2018 From: johnkym at gmail.com (Ioannis (John) Kymissis) Date: Fri, 2 Mar 2018 12:05:33 -0500 Subject: [labnetwork] PDMS Sylgard 184 In-Reply-To: <88893824ca984cd5a08f9af0f1f39f4c@it-ex11.win.ntnu.no> References: <88893824ca984cd5a08f9af0f1f39f4c@it-ex11.win.ntnu.no> Message-ID: <78D1706B-3F1D-441A-A992-2D00309A9E10@gmail.com> I?ve never tried ordering only curing agent, but one of the distributors we use for kits also lists it as a stand-alone product (albeit in rather large quantities): https://www.ellsworth.com/cart/add-to-cart/?item=184-CURING-AGENT-20.4KG-PL&qty=1 Thanks, John ---- Sent from my mobile device Ioannis (John) Kymissis Associate Professor, Electrical Engineering Columbia University SEAS 500 W120th Street Room 1300/MC 4712 New York, NY 10027 Tel: 347-850-0235 Fax: 212-932-9421 johnkym at ee.columbia.edu http://kymissis.columbia.edu > On Mar 2, 2018, at 2:24 AM, Mathilde Isabelle Barriet wrote: > > Dear All > As many of you we are using Sylgard 184. In Norway we have no other choice than buying it as a kit (1kg elastomer + 100g of curing agent). > For some unknown reasons we have many cans of elastomers unused and no curing agent to go with... I have been trying to buy the curing agent alone through different channels (our supplier, dow corning) but with no success. > Any of you has any advice or contacts so I can get the curing agent only. > Thanks > Kind regards > Mathilde > > Senior Engineer > NTNU NanoLab > ---------------------------- > Sem S?lands vei 14, K1-113 > NO-7491 Trondheim > +47 91 89 72 08 > www.ntnu.no/nanolab > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From pilarhf at umich.edu Fri Mar 2 12:22:50 2018 From: pilarhf at umich.edu (Pilar Herrera-Fierro) Date: Fri, 2 Mar 2018 12:22:50 -0500 Subject: [labnetwork] PDMS Sylgard 184 In-Reply-To: <88893824ca984cd5a08f9af0f1f39f4c@it-ex11.win.ntnu.no> References: <88893824ca984cd5a08f9af0f1f39f4c@it-ex11.win.ntnu.no> Message-ID: Hello Mathilde, Here at LNF (U-Michigan), we have the same problem. We have, also, tried to buy just the curing agent, but no luck. If you manage to convince Dow to sell us extra curing agent, please let us know!. Pilar On Fri, Mar 2, 2018 at 2:24 AM, Mathilde Isabelle Barriet < mathilde.i.barriet at ntnu.no> wrote: > Dear All > As many of you we are using Sylgard 184. In Norway we have no other choice > than buying it as a kit (1kg elastomer + 100g of curing agent). > For some unknown reasons we have many cans of elastomers unused and no > curing agent to go with... I have been trying to buy the curing agent alone > through different channels (our supplier, dow corning) but with no success. > Any of you has any advice or contacts so I can get the curing agent only. > Thanks > Kind regards > Mathilde > > Senior Engineer > NTNU NanoLab > ---------------------------- > Sem S?lands vei 14, K1-113 > NO-7491 Trondheim > +47 91 89 72 08 > www.ntnu.no/nanolab > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Pilar Herrera-Fierro, Ph.D. LNF User Services Director Lurie Nanofabrication Facility University of Michigan RM 1239 EECS Building 1301 Beal Ave. Ann Arbor, MI 48109-2122 *Cell* 734 646 1399 (734) 646 1399 www.lnf.umich.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From spaolini at cns.fas.harvard.edu Fri Mar 2 15:28:38 2018 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Fri, 2 Mar 2018 20:28:38 +0000 Subject: [labnetwork] Single tube furnace duct temperature In-Reply-To: References: Message-ID: James, I am assuming that this is an atmospheric furnace. If so, there's really no concern about exhaust temperature since the "load" end of the tube should have a loose fitting cap with a vent hole in it and the "source" end of the tube should have a transitional fitting to mate tubing to glass. Since the exhaust is always at the load end (called a "scavenger"), there is simply not enough gas going through the quartz tube to add any substantial heat load to your house exhaust. If the cabinet that houses the heating element has exhaust, most furnace manufacturers will provide a water cooled "radiator" at the top to keep the temperature down. This is quite common on vertically stacked, multi tube furnaces but uncommon for a single. You are welcome to tour our facility and see our arrangement, just E-mail me a couple of days in advance. Steve "Equipment Dood" Paolini Harvard Center for Nanoscale Systems ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Goodman, James R Sent: Friday, March 2, 2018 12:29 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Single tube furnace duct temperature Good Afternoon colleagues, We are in the process of installing a donated single tube diffusion furnace. It is an MRL 1018 with an auto loader. Our facilities group is concerned about the temperature of the exhaust and its impact on building systems and ductwork. Does anyone have a system like this that would be willing to take some temperature measurements of the exhaust duct while running at 1000 degC? Thanks, Jay. ? James Goodman University of Massachusetts, Lowell Core Research Facilities Nano Fabrication Lab 1 University Ave Lowell MA 01854 978-934-3469 -------------- next part -------------- An HTML attachment was scrubbed... URL: From Thomas_Ferraguto at uml.edu Wed Mar 7 07:44:07 2018 From: Thomas_Ferraguto at uml.edu (Ferraguto, Thomas S) Date: Wed, 7 Mar 2018 12:44:07 +0000 Subject: [labnetwork] Core Research Showcase Message-ID: Colleagues, We're having a Core Research Facility Showcase on March 22nd, 2018 5:00 PM to 8:00 PM at Saab ETIC UMass Lowell. https://www.eventbrite.com/e/core-research-facilities-crf-research-showcase-tickets-42565839572?aff=es2 We're having 90 Second Flash Talks by users from Industry and Academic Researchers in addition to Posters from all the UMass Lowell Cores. The idea is to "cross pollenate" across disciplines and areas of expertise. If you're in the area please register... It's free and they're will be pizza and soft drinks. Here's a list of the flash talks (some flash talks). Flash talk KwokFan Chow (Chemical Engineering faculty) Richard Gaschnig (Earth Science faculty) Tehila Nahum (Adv Surface Tech) Christian Pfluegle (Pendar Laser) Richard Dennis (Qmagiq) Joel Therrien (UML Electrical Engineering) Tom Ferraguto (Nanofabrication Lab Director) Wendy Gavin (Biomolecular Characterization Lab Manager, NMR Spectroscopy Facility Manager) Earl Ada (MCL Lab Director) Margert SobokowiczKline (Plastics Engineering) William Kessler (PSI - Vial Line Partnership with UML) Leo Bobek (Nuclear Reactor Supervisor) Dr. Jennifer Fish (Biological Science) Dr. Matt Gage (Chemistry Dept) Dr. Dhimiter Bello (Biomed & Nutritional Sciences) Best Regards Tom Thomas S. Ferraguto Saab ETIC Nanofabrication Laboratory Director Saab ETIC Building Director 1 University Avenue Lowell MA 01854 Mobile 617-755-0910 Land 978-934-1809 Fax 978-934-1014 -------------- next part -------------- An HTML attachment was scrubbed... URL: From Thomas_Ferraguto at uml.edu Wed Mar 7 08:29:16 2018 From: Thomas_Ferraguto at uml.edu (Ferraguto, Thomas S) Date: Wed, 7 Mar 2018 13:29:16 +0000 Subject: [labnetwork] RFID interlocks Message-ID: Colleagues, To resolve the issue of untracked use of equipment at our Nanofab, I've been working with a Easyclocking in Florida with mixed results. The goal was to have RFID badges to open and close interlocks on our equipment and provide a data table with which we could reconcile accounts. Is anyone else using an RFID system to track equipment usage? I am trying to use existing services and hardware to get to a better tracking system (I don't have the resources to develop a system internally). Please let me know? Best Regards Thomas S. Ferraguto Saab ETIC Nanofabrication Laboratory Director Saab ETIC Building Director 1 University Avenue Lowell MA 01854 Mobile 617-755-0910 Land 978-934-1809 Fax 978-934-1014 -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Wed Mar 7 11:54:26 2018 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Wed, 7 Mar 2018 16:54:26 +0000 Subject: [labnetwork] RFID interlocks In-Reply-To: References: Message-ID: Thomas there are many options available, but we use FOM. It has IP addressable relays that turn on and off 110 V power. We use it for computer monitors, compressed air valves, etc. Cheers! Julia Aebersold Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Ferraguto, Thomas S Sent: Wednesday, March 7, 2018 8:29 AM To: 'labnetwork at mtl.mit.edu' Subject: [labnetwork] RFID interlocks Colleagues, To resolve the issue of untracked use of equipment at our Nanofab, I've been working with a Easyclocking in Florida with mixed results. The goal was to have RFID badges to open and close interlocks on our equipment and provide a data table with which we could reconcile accounts. Is anyone else using an RFID system to track equipment usage? I am trying to use existing services and hardware to get to a better tracking system (I don't have the resources to develop a system internally). Please let me know? Best Regards Thomas S. Ferraguto Saab ETIC Nanofabrication Laboratory Director Saab ETIC Building Director 1 University Avenue Lowell MA 01854 Mobile 617-755-0910 Land 978-934-1809 Fax 978-934-1014 -------------- next part -------------- An HTML attachment was scrubbed... URL: From myoung6 at nd.edu Wed Mar 7 12:51:02 2018 From: myoung6 at nd.edu (Michael Young) Date: Wed, 7 Mar 2018 12:51:02 -0500 Subject: [labnetwork] RFID interlocks In-Reply-To: References: Message-ID: <9f98a09a-fca2-8614-7a36-d2ebfaaecfd7@nd.edu> An HTML attachment was scrubbed... URL: From shuyou at fomnetworks.com Wed Mar 7 13:07:48 2018 From: shuyou at fomnetworks.com (Shuyou Li) Date: Wed, 7 Mar 2018 12:07:48 -0600 Subject: [labnetwork] RFID interlocks In-Reply-To: References: Message-ID: Hi Tom, I believe you would have interest in the EasyLogon module that we recently developed as a part of our FOM system. I will send you an intro video in a separate email off the mailing list. Thanks, Shuyou _________________ Shuyou Li, Ph.D. FOM Networks, Inc. www.fomnetworks.com Ph: (224) 225-9168 Fax: (224) 218-2807 ? On Wed, Mar 7, 2018 at 7:29 AM, Ferraguto, Thomas S < Thomas_Ferraguto at uml.edu> wrote: > Colleagues, > > > > To resolve the issue of untracked use of equipment at our Nanofab, I?ve > been working with a Easyclocking in Florida with mixed results. > > > > The goal was to have RFID badges to open and close interlocks on our > equipment and provide a data table with which we could reconcile accounts. > > > > Is anyone else using an RFID system to track equipment usage? > > > > I am trying to use existing services and hardware to get to a better > tracking system (I don?t have the resources to develop a system internally). > > > > Please let me know? > > > > Best Regards > > > > > > Thomas S. Ferraguto > > Saab ETIC Nanofabrication Laboratory Director > > Saab ETIC Building Director > > 1 University Avenue > > Lowell MA 01854 > > Mobile 617-755-0910 <(617)%20755-0910> > > Land 978-934-1809 <(978)%20934-1809> > > Fax 978-934-1014 <(978)%20934-1014> > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From mike at badgerlms.com Wed Mar 7 17:24:24 2018 From: mike at badgerlms.com (Michael Bell) Date: Wed, 7 Mar 2018 14:24:24 -0800 Subject: [labnetwork] RFID interlocks In-Reply-To: References: Message-ID: <01fa01d3b663$0cc549f0$264fddd0$@badgerlms.com> Hi Tom, I believe you're familiar with the IP interlocks used with Badger. If the goal is to minimize in-lab computers, we now have a streamlined mobile version of Badger that handles functions commonly accessed by members. You can enable/disable, report issues, checkout inventory and more, very quickly with any smart phone. Obviously, use of a strictly RFID based system would need to rely on a "default" account for charging instead of allowing the user to select from multiple accounts. Nor would it accommodate data collection forms upon device disable. I can imagine a hybrid approach where the RFID performs the login and opens Badger to the salient screen for either enable or disable. At that point the user could hit a "return and log-off" button to accept the defaults or perform additional functions. A preference defined for the device could allow for a simple enable or disable without opening a session. We're about finished with our upgrade to the most current database version and could investigate this if there was enough interest. My understanding is that most labs aren't troubled with members erroneously enabling devices remotely; so, I'd guess defeating that behavior isn't one of the motivations? Cheers, Mike PS - We've made a lot of enhancements to Badger. Let me know if you'd like a look at the latest. From: labnetwork-bounces at mtl.mit.edu On Behalf Of Ferraguto, Thomas S Sent: Wednesday, March 07, 2018 5:29 AM To: 'labnetwork at mtl.mit.edu' Subject: [labnetwork] RFID interlocks Colleagues, To resolve the issue of untracked use of equipment at our Nanofab, I've been working with a Easyclocking in Florida with mixed results. The goal was to have RFID badges to open and close interlocks on our equipment and provide a data table with which we could reconcile accounts. Is anyone else using an RFID system to track equipment usage? I am trying to use existing services and hardware to get to a better tracking system (I don't have the resources to develop a system internally). Please let me know? Best Regards Thomas S. Ferraguto Saab ETIC Nanofabrication Laboratory Director Saab ETIC Building Director 1 University Avenue Lowell MA 01854 Mobile 617-755-0910 Land 978-934-1809 Fax 978-934-1014 -------------- next part -------------- An HTML attachment was scrubbed... URL: From khbeis at uw.edu Wed Mar 7 21:43:07 2018 From: khbeis at uw.edu (Michael Khbeis) Date: Wed, 7 Mar 2018 18:43:07 -0800 Subject: [labnetwork] RFID interlocks In-Reply-To: <9f98a09a-fca2-8614-7a36-d2ebfaaecfd7@nd.edu> References: <9f98a09a-fca2-8614-7a36-d2ebfaaecfd7@nd.edu> Message-ID: Tom, We are using a highly customized version of Web-CORAL. RFID is a challenge because of numerous accounts and simultaneous tool enable scenarios. We use CORAL screen locks whenever feasible and for non-PC controlled systems, the high voltage/pneumatic interlocks. It works quite well for us. Mike, Our biggest deterrent to the forgot to disable problem - fees for forgetting. We will make non-fee adjustments for things like equipment failure and planned overnight runs where we only charge valid use of course. However, we have an annual progressive fee schedule for adjusting ?forgot to disable" times where (N-1)*$25 for each reoccurring incident, where N is the count of change requests. So the first offense is free and then the charges grow quickly. As you can imagine, this is a strong deterrent and we have had very few ?forgetfulness? adjustment requests since implementing this policy. Of course we hate charging erroneous fees, but I hated wasting significant staff time each week fixing the billing issues. Maybe a little draconian and simple, but effective. Best, Dr. Michael Khbeis Director, Washington Nanofabrication Facility (WNF) National Nanotechnology Coordinated Infrastructure (NNCI) University of Washington Fluke Hall, Box 352143 (O) 206.543.5101 (F) 206.221.1681 (C) 443.254.5192 khbeis at uw.edu www.wnf.washington.edu/ > On Mar 7, 2018, at 9:51 AM, Michael Young wrote: > > Hi Tom. At NDNF, we are approaching this model, slowly. Our campus recently switched to RFID+magstripe smart cards to replace magstripe-only student/staff/faculty ID cards. I was able to locate a generic (Pacific Rim origin) RFID reader for about $10; it's USB and it reliably reads the card ID from these new smart cards. My goal is to add these readers to key equipment, as well as to our Coral computers, in the cleanroom. For equipment, the reader can be connected to, say, a networked Raspberry Pi, one per tool, which can inform the Coral server that someone needs that tool to be enabled. The coral server can then take care of the bookkeeping, and also tell the hardware interlock to enable. > > The good thing: this approach builds on our current infrastructure, at a manageable one-time cost. The bad thing: it's not quite what you are looking for, as it's not a comprehensive 3rd-party turnkey solution. > > The other big drawback: I expect to see the same sort of behavior that we get now with Coral + hardware interlocks: folks enable and then forget to disable. (I'm not even sure a big bright flashing "ENABLED!!!" display on the tool would help.) This of course messes up the monthly cost recovery ("I used it for HOW MANY HOURS?????"), and also allows (or "fails to prevent") other users sneaking in and using the tool while it's enabled. I've thought about implementing auto-timeouts (disable on timeout), but this quickly becomes very tool-specific and can potentially cause process disruption ("Hey, how come the spinner just stopped?!?"). > > Anyone have any good ideas regarding this issue? > > --Mike (who really didn't intend to hijack Tom's thread...) > > > > On 3/7/18 8:29 AM, Ferraguto, Thomas S wrote: >> Colleagues, >> >> To resolve the issue of untracked use of equipment at our Nanofab, I?ve been working with a Easyclocking in Florida with mixed results. >> >> The goal was to have RFID badges to open and close interlocks on our equipment and provide a data table with which we could reconcile accounts. >> >> Is anyone else using an RFID system to track equipment usage? >> >> I am trying to use existing services and hardware to get to a better tracking system (I don?t have the resources to develop a system internally). >> >> Please let me know? >> >> Best Regards >> >> >> Thomas S. Ferraguto >> Saab ETIC Nanofabrication Laboratory Director >> Saab ETIC Building Director >> 1 University Avenue >> Lowell MA 01854 >> Mobile 617-755-0910 >> Land 978-934-1809 >> Fax 978-934-1014 >> > > -- > Michael P. Young (574) 631-3268 (office) > Nanofabrication Specialist (574) 631-4393 (fax) > Department of Electrical Engineering (765) 637-3784 (cell) > University of Notre Dame mike.young at nd.edu > B-38 Stinson-Remick Hall > Notre Dame, IN 46556-5637 > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: smime.p7s Type: application/pkcs7-signature Size: 1350 bytes Desc: not available URL: From codreanu at udel.edu Thu Mar 8 08:31:34 2018 From: codreanu at udel.edu (Iulian Codreanu) Date: Thu, 8 Mar 2018 08:31:34 -0500 Subject: [labnetwork] RFID interlocks In-Reply-To: References: <9f98a09a-fca2-8614-7a36-d2ebfaaecfd7@nd.edu> Message-ID: <0ae143ed-fbff-e347-5525-158139257ba7@udel.edu> Mike, I am working on a system similar to Michael's. I am a little more "lenient" than him (I use N-3). One of the more difficult aspects of it is that I work under the policy that no "penalty" fees can be charged to grants so I am aiming for the PI's discretionary funds. That should generate a very strong incentive for the users to minimize the number of times they forget to log out of tools and swipe out of the cleanroom. Iulian iulian Codreanu, Ph.D. Director of Operations, UD NanoFab 163 ISE Lab 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 3/7/2018 9:43 PM, Michael Khbeis wrote: > Tom, > > We are using a highly customized version of Web-CORAL. RFID is a > challenge because of numerous accounts and simultaneous tool enable > scenarios. We use CORAL screen locks whenever feasible and for non-PC > controlled systems, the high voltage/pneumatic interlocks. It works > quite well for us. > > Mike, > > Our biggest deterrent to the forgot to disable problem - fees for > forgetting. We will make non-fee adjustments for things like equipment > failure and planned overnight runs where we only charge valid use of > course. However, we have an annual progressive fee schedule for > adjusting ?forgot to disable" times where (N-1)*$25 for each > reoccurring incident, where N is the count of change requests. So the > first offense is free and then the charges grow quickly. As you can > imagine, this is a strong deterrent and we have had very few > ?forgetfulness? adjustment requests since implementing this policy. Of > course we hate charging erroneous fees, but I hated wasting > significant staff time each week fixing the billing issues. > > Maybe a little draconian and simple, but effective. > > Best, From rmorrison at draper.com Thu Mar 8 09:20:45 2018 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Thu, 8 Mar 2018 14:20:45 +0000 Subject: [labnetwork] equipment question Message-ID: <9c905d7a5bd34498b34e8c1c0555dedf@draper.com> Hi everyone, I have a question on some equipment choices. I am helping a Draper vendor sort out some equipment choices. We are looking at coat/develop cluster systems, we use a negative and a positive resist developed by TMAH and KOH based developers, current process uses the old SVG type tracks but these have lots of PM issues and particles are an issue. Do any of you have any experience with robot feed cluster coat/develop system if so send me an email offline so we can chat, or if you have industry contacts I could speak to that would be good. Thanks Rick Richard H. Morrison Principal Member of the Technical Staff Draper 555 Technology Square Cambridge, MA 02139-3573 Work 617-258-3420 Cell 508-930-3461 www.draper.com ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From vito.logiudice at uwaterloo.ca Mon Mar 12 12:08:56 2018 From: vito.logiudice at uwaterloo.ca (Vito Logiudice) Date: Mon, 12 Mar 2018 16:08:56 +0000 Subject: [labnetwork] Spare parts for INFICON CI-100 crucible indexer Message-ID: <5B0A453A-3E01-4C82-850C-A067BFAE1CFD@connect.uwaterloo.ca> Dear Colleagues, The INFICON CI-100 crucible indexer on our 4-pocket e-beam evaporator has failed and since the assembly appears to be obsolete, we are having difficulty finding replacement parts. Our original controller as well as a spare controller that one of our suppliers was kind enough to allow us to try out both display an ?E? when attempting to drive the motor drive unit. When activated, the motor drive unit appears to want to move in the proper direction but lacks the strength to complete the rotation. It therefore appears that this motor drive unit might be the issue. A photo of the front page of the manual is attached for reference. I?m reaching out in the hopes that someone in our community might be able to share the name of an equipment vendor which might carry this unit. Any insights are greatly appreciated. Many thanks. Best regards, Vito -- Vito Logiudice P.Eng. Director, Quantum NanoFab University of Waterloo Lazaridis QNC 1207 200 University Avenue West Waterloo, ON Canada N2L 3G1 Tel.: (519) 888-4567 ext. 38703 Email: vito.logiudice at uwaterloo.ca Website: https://fab.qnc.uwaterloo.ca -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: INFICON CI-100 Crucible Indexer.pdf Type: application/pdf Size: 1054998 bytes Desc: INFICON CI-100 Crucible Indexer.pdf URL: From rosendo.bindoy at kaust.edu.sa Mon Mar 12 21:19:20 2018 From: rosendo.bindoy at kaust.edu.sa (Rosendo Bindoy) Date: Tue, 13 Mar 2018 01:19:20 +0000 Subject: [labnetwork] Spare parts for INFICON CI-100 crucible indexer In-Reply-To: <5B0A453A-3E01-4C82-850C-A067BFAE1CFD@connect.uwaterloo.ca> References: <5B0A453A-3E01-4C82-850C-A067BFAE1CFD@connect.uwaterloo.ca> Message-ID: <4077547B28C2B3D8.BDF0C4A7-6BCF-476B-8066-B51CFA13943C@mail.outlook.com> Hi Vito, I saw this in the internet. Maybe they can help you source out the part you need for your tool. http://www.nextroninc.com/pdt/selectPagePDTCate2.do?cateSeqNo=140 Regards, Rosendo M. Bindoy Equipment Engineer KAUST-Nanofabrication Core Lab On Mon, Mar 12, 2018 at 11:22 PM +0300, "Vito Logiudice" > wrote: Dear Colleagues, The INFICON CI-100 crucible indexer on our 4-pocket e-beam evaporator has failed and since the assembly appears to be obsolete, we are having difficulty finding replacement parts. Our original controller as well as a spare controller that one of our suppliers was kind enough to allow us to try out both display an ?E? when attempting to drive the motor drive unit. When activated, the motor drive unit appears to want to move in the proper direction but lacks the strength to complete the rotation. It therefore appears that this motor drive unit might be the issue. A photo of the front page of the manual is attached for reference. I?m reaching out in the hopes that someone in our community might be able to share the name of an equipment vendor which might carry this unit. Any insights are greatly appreciated. Many thanks. Best regards, Vito -- Vito Logiudice P.Eng. Director, Quantum NanoFab University of Waterloo Lazaridis QNC 1207 200 University Avenue West Waterloo, ON Canada N2L 3G1 Tel.: (519) 888-4567 ext. 38703 Email: vito.logiudice at uwaterloo.ca Website: https://fab.qnc.uwaterloo.ca ________________________________ This message and its contents including attachments are intended solely for the original recipient. If you are not the intended recipient or have received this message in error, please notify me immediately and delete this message from your computer system. Any unauthorized use or distribution is prohibited. Please consider the environment before printing this email. -------------- next part -------------- An HTML attachment was scrubbed... URL: From aju-jugessur at uiowa.edu Tue Mar 13 13:12:53 2018 From: aju-jugessur at uiowa.edu (Jugessur, Aju S) Date: Tue, 13 Mar 2018 17:12:53 +0000 Subject: [labnetwork] Burn-off arsenic using ALD References: Message-ID: <33080EDD-8EA8-467B-9C25-33915B9B1BE5@uiowa.edu> Hi all, I have a user who would like to use the ALD to burn off arsenic materia (2-3 microns) on their Indinium phosphide substrate, at 300 C. Pump the arsenic away and then ALD coat Al203. They do not want any oxidation of their samples after the removal of the arsenic, hence the suggested approach. Can anyone please comment on this? Both from a health/safety and the technical approach. We have an Oxford Opal. Thanks for your feedback. Regards Aju Begin forwarded message: From: "Zhang, Kailing" > Subject: questions about ALD Date: March 13, 2018 at 11:35:51 AM CDT To: "Jugessur, Aju S" > Hi Aju, I have a question about 174 ALD system. We have a plan of depositing 2-3um of arsenic on our nanowire samples, then transfer them into ALD, heat them up to ~300C to burn off arsenic and let it get pumped out(by the pump on ALD), then depositing Al2O3 on nanowires. Please let me know what you think about this plan, if it is feasible. Thanks! Kailing Aju Jugessur, Ph.D. Director, University of Iowa Microfabrication Facility (UIMF) Optical Science and Technology Center Professor Adjunct, Physics and Astronomy University of Iowa Office: IATL 202, Tel: 319-3532342 Labs: IATL 170, 172, 174 https://ostc.uiowa.edu/uimf -------------- next part -------------- An HTML attachment was scrubbed... URL: From nclay at seas.upenn.edu Tue Mar 13 16:03:45 2018 From: nclay at seas.upenn.edu (Noah Clay) Date: Tue, 13 Mar 2018 16:03:45 -0400 Subject: [labnetwork] Burn-off arsenic using ALD In-Reply-To: <33080EDD-8EA8-467B-9C25-33915B9B1BE5@uiowa.edu> References: <33080EDD-8EA8-467B-9C25-33915B9B1BE5@uiowa.edu> Message-ID: <47B6BCCD-35AF-48A3-AB0F-A3AA8662A9DC@seas.upenn.edu> Hi Aju, If I?m not mistaken, you?ll need hydrogen to reduce As and make it volatile so it pumps more efficiently out of your system. Perhaps it desorbs from the InP surface at 300C, but without promoting the gas phase, I think it will condense elsewhere in your ALD or pumping system. There are a number of wet chemical passivations for InP surfaces that are used for pre-ALD cleans. If you?d like, please get in touch and I can share my experiences with you. Best, Noah > On Mar 13, 2018, at 1:12 PM, Jugessur, Aju S wrote: > > Hi all, > > I have a user who would like to use the ALD to burn off arsenic materia (2-3 microns) on their Indinium phosphide substrate, at 300 C. Pump the arsenic away and then ALD coat Al203. > They do not want any oxidation of their samples after the removal of the arsenic, hence the suggested approach. > > Can anyone please comment on this? Both from a health/safety and the technical approach. We have an Oxford Opal. > > Thanks for your feedback. > > Regards > Aju > >> Begin forwarded message: >> >> From: "Zhang, Kailing" > >> Subject: questions about ALD >> Date: March 13, 2018 at 11:35:51 AM CDT >> To: "Jugessur, Aju S" > >> >> Hi Aju, >> I have a question about 174 ALD system. We have a plan of depositing 2-3um of arsenic on our nanowire samples, then transfer them into ALD, heat them up to ~300C to burn off arsenic and let it get pumped out(by the pump on ALD), then depositing Al2O3 on nanowires. Please let me know what you think about this plan, if it is feasible. Thanks! >> >> Kailing > > Aju Jugessur, Ph.D. > Director, University of Iowa Microfabrication Facility (UIMF) > Optical Science and Technology Center > Professor Adjunct, Physics and Astronomy > University of Iowa > Office: IATL 202, Tel: 319-3532342 > Labs: IATL 170, 172, 174 > https://ostc.uiowa.edu/uimf > > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From na2661 at columbia.edu Fri Mar 16 10:51:29 2018 From: na2661 at columbia.edu (Nava Ariel-Sternberg) Date: Fri, 16 Mar 2018 10:51:29 -0400 Subject: [labnetwork] Clean Room Engineer Position at Columbia University in the City of NY Message-ID: <009c01d3bd36$447ef150$cd7cd3f0$@columbia.edu> Dear all, CNI at Columbia University is looking for a clean room engineer to work in our shared labs clean room. A Bachelor degree and clean room working experience are required. For more information please see the ad post at RAPS and see position description copied from the ad below this email: https://academicjobs.columbia.edu/applicants/jsp/shared/frameset/Frameset.jsp?time=1521210896722 Thanks and have a great weekend, Nava Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Facilities Columbia University 530 w120th st., NY 10027 Room 1015/MC 8903 Office: 212-854-9927 Cell: 201-562-7600 Requisition Number: 0008612 Field(s) of Specialization: Electrical Engineering, Physics, Materials Science Position Title: Staff Associate Department: 5260- ENG Centers Department Number: 520610X Location: Morningside Summary Description: The Columbia Nano Initiative (CNI) at The Fu Foundation School of Engineering & Applied Science of Columbia University in the City of New York invites applications for a Staff Associate Clean Room engineer position in the area of Clean Room Operations. Assisting and taking directions from the Clean Room Director and reporting to the Director of the Shared Facilities, the clean room engineer staff associate will: maintain efficient and effective clean room operations. The clean room engineer will be responsible for the development and maintenance of clean room processes and device fabrication, as well as user process machine training and certification. The engineer will work closely with clean room users to develop training procedures, Standard Operating Procedures, create facility protocols on new equipment and protocols for newly developed processes. The clean room engineer will assist in installing new equipment in the lab and will perform preventative maintenance and machine repair including ordering of parts, materials, and consumables. The engineer will be able to consult on suitable processes and process flows for fabrication of a range of devices. In addition the clean room engineer will support the operation of the user fees billing system as needed. The clean room engineer will coordinate and share the responsibility with the clean room supervisor for creating and maintaining safe and effective working environment within CNI clean room, in compliance with all University and government requirements and regulations as directed by the university Environmental, Health, and Safety (EH&S) department. That includes but not limited to safe handling of chemicals and gas cylinders, implementing and maintaining safety training and safe manner of work in the clean room, providing clean room orientation to new users of the clean room, and keeping track of safety training credential for users. School/Institute/Unit: Engineering and Applied Science, The Fu Foundation School of Minimum Degree Required: Bachelor's Degree (BA/BS) Minimum Qualifications: All applicants MUST meet these minimum qualifications to be considered for the position. Minimum Qualifications for Staff Associate: A bachelor's degree in Electrical Engineering, Physics, Materials Science or related field is required. A minimum of 2 years of operational experience in a semiconductor fabrication facility or related experience is required, 5-10 years of operational experience preferred. Preferred Qualifications: Additional desired qualifications include: strong technical experience in conventional clean processes used for electronic and mechanical device fabrication; understanding of new and modern laboratory-scale fabrication processes required for successful state of the art fabrication including thin film deposition, electron beam lithography, nanoimprint lithography and reactive ion etching; excellent interpersonal skills and strong communications skills--the staff member will serve as a primary interface to Clean Room Users; the ability to work with wide variety of users including biologists, chemists, physicists, electrical engineers, and mechanical engineers; experience and expertise in the design of recipe-driven processes that can be used by researchers to construct demonstration devices; familiarity with equipment and methodology for characterization and development of semiconductor fabrication processes, including microscopy and metrology. Additional Information: Other highly desired attributes include: excellent analytical reasoning and problem solving skills; good organizational skills; ability to work with frequent interruptions; ability to work with minimal supervision; knowledge of safety and hazardous waste protocols; and ability to exercise mature judgment and initiative. Posting Date: 03-16-2018 Closing Date: Open Until Filled Special Instructions to Applicants: Proposed Start Date: 05-01-2018 EEO Statement Columbia University is an Equal Opportunity/Affirmative Action employer --Race/Gender/Disability/Veteran. Date Review Begins 03-31-2018 Required Applicant Documents for Upload: Curriculum Vitae Cover Letter Optional Applicant Documents for Upload List of References Quicklink for Posting: academicjobs.columbia.edu/applicants/Central?quickFind=66071 Return to Search Results ? -------------- next part -------------- An HTML attachment was scrubbed... URL: From hathaway at cns.fas.harvard.edu Wed Mar 21 10:10:20 2018 From: hathaway at cns.fas.harvard.edu (Mac Hathaway) Date: Wed, 21 Mar 2018 10:10:20 -0400 Subject: [labnetwork] Recommendations for plasma monitor In-Reply-To: <47B6BCCD-35AF-48A3-AB0F-A3AA8662A9DC@seas.upenn.edu> References: <33080EDD-8EA8-467B-9C25-33915B9B1BE5@uiowa.edu> <47B6BCCD-35AF-48A3-AB0F-A3AA8662A9DC@seas.upenn.edu> Message-ID: <5AB267CC.6040803@cns.fas.harvard.edu> Hello All, We are considering getting a plasma monitor/spectrometer for general plasma diagnostics. We are considering Ocean Optics (Maya2000 Pro), but I was wondering if folks have had good/bad experiences with other makes and models. One that includes peak identification software would be nice, but not critical. Also, if you have used yours for any interesting applications, that would be good to hear about, as well. Thanks, Mac Mac Hathaway Senior Process and Systems Engineer Harvard Center for Nanoscale Systems 11 Oxford St. Cambridge, MA02138 617-495-9012 -------------- next part -------------- An HTML attachment was scrubbed... URL: From pddeepa at iisc.ac.in Thu Mar 29 08:19:00 2018 From: pddeepa at iisc.ac.in (Deepalakshmi Putchen Dakshinamoorthy) Date: Thu, 29 Mar 2018 12:19:00 +0000 Subject: [labnetwork] Standards for XPS Message-ID: Dear all, We have Ultra Axis XPS and the standard we are using is Ag and Cu. I would like to know what is the best standard for depth profiling How to check whether the tool is fine at different modes (XPS, UPX, depth profiling, mapping) Apreciate your valuable inputs Dr Deepalakshmi PD Technology Manager Micro and Nano Characterisation Facility (MNCF) Room No. GF-12 Centre for Nano Science and Engineering (CeNSE) Indian Institute of Science (IISc) Bengaluru-560 012, INDIA T: +91 80 2293 3181 (Ext:130) M: +91-9886106429 E: pddeepa at iisc.ac.in W: www.mncf.cense.iisc.ac.in -------------- next part -------------- An HTML attachment was scrubbed... URL: From pchapman at latech.edu Thu Mar 29 09:41:38 2018 From: pchapman at latech.edu (Phillip Chapman) Date: Thu, 29 Mar 2018 08:41:38 -0500 Subject: [labnetwork] Job Opening - Associate Director of Operations - Louisiana Tech University IfM Message-ID: <002201d3c763$a9959a80$fcc0cf80$@latech.edu> The Institute for Micromanufacturing (IfM) at Louisiana Tech University is searching for an Associate Director of Operations. For a more detailed description go to the university posting http://finance.latech.edu/hr/vacan2720.php Short Description: As a key member of the IfM technical staff, the Associate Director of Operations is expected to: 1. create and manage a program to maintain and modernize the equipment and infrastructure that enable the core micro/nano fabrication and metrology capabilities of the IfM; 2. oversee and participate in the process/equipment/safety training of student users; 3. advise, consult, and assist IfM faculty on their research projects, as practical and appropriate; 4. be the principal liaison for external academic and industrial services and partnerships; and 5. be a contributing member of the IfM's Management Team, which provides long-term vision and planning of capabilities-related initiatives. Minimum Qualifications: B.S. in a relevant engineering or science discipline plus ten (l0) years of relevant experience, or M.S. in a relevant discipline plus five (5) years of relevant experience, or Ph.D. in a relevant discipline plus three (3) years of relevance experience. To apply, send a cover letter, resume, and contact information for three references by email to: Dr. Niel Crews, PhD, PE Director, Institute for Micromanufacturing Associate Professor of Mechanical Engineering ifmsearch at latech.edu Phil Chapman Outgoing Associate Director-Operations Institute for Micromanufacturing Louisiana Tech University Office: (318) 257-5114 Fax: (318) 257-5104 E-mail: pchapman at latech.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From aju-jugessur at uiowa.edu Thu Mar 29 10:30:51 2018 From: aju-jugessur at uiowa.edu (Jugessur, Aju S) Date: Thu, 29 Mar 2018 14:30:51 +0000 Subject: [labnetwork] Triboindenter Message-ID: Hi all Does anyone have any experience with a Triboindenter? We have a new faculty candidate who wants to install this tool in our Microfab. We do not have any experience with this tool. Any suggestions or advice on this will be much appreciated? Thanks Regards Aju Sent from my iPhone From pilarhf at umich.edu Thu Mar 29 14:50:31 2018 From: pilarhf at umich.edu (Pilar Herrera-Fierro) Date: Thu, 29 Mar 2018 14:50:31 -0400 Subject: [labnetwork] Standards for XPS In-Reply-To: References: Message-ID: Hello, It was common to use Ta oxide, that can be made electrochemically. Recipes are in the web. It has the advantage that you can see the size of the crater, so you can determine rates for different size areas. You can see the oxygen (oxide) peak disappear in the profile, and it sputters easily. Pilar On Thu, Mar 29, 2018 at 8:19 AM, Deepalakshmi Putchen Dakshinamoorthy < pddeepa at iisc.ac.in> wrote: > Dear all, > > > We have Ultra Axis XPS and the standard we are using is Ag and Cu. > > > I would like to know what is the best standard for depth profiling > > How to check whether the tool is fine at different modes (XPS, UPX, depth > profiling, mapping) > > > Apreciate your valuable inputs > > > Dr Deepalakshmi PD > > Technology Manager > > Micro and Nano Characterisation Facility (MNCF) > Room No. GF-12 > Centre for Nano Science and Engineering (CeNSE) > Indian Institute of Science (IISc) > Bengaluru-560 012, INDIA > T: +91 80 2293 3181 <+91%2080%202293%203181> (Ext:130) > M: +91-9886106429 <+91%2075501%2084746> > E: pddeepa at iisc.ac.in > W: www.mncf.cense.iisc.ac.in > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -- Pilar Herrera-Fierro, Ph.D. LNF User Services Director Lurie Nanofabrication Facility University of Michigan RM 1239 EECS Building 1301 Beal Ave. Ann Arbor, MI 48109-2122 *Cell* 734 646 1399 (734) 646 1399 www.lnf.umich.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From elhadj.diallo at kaust.edu.sa Thu Mar 29 17:12:47 2018 From: elhadj.diallo at kaust.edu.sa (Elhadj M. Diallo) Date: Thu, 29 Mar 2018 21:12:47 +0000 Subject: [labnetwork] Standards for XPS In-Reply-To: References: Message-ID: <11FF32C5-C72C-4967-B06C-DC8035278286@kaust.edu.sa> Dear Deepalakshmi, 1) For your 1st question, I could say try to use a Ta2O5 thin layer with a known thickness for your depth profiling 2) For the XPS mode spectral reference you can use, Ag, Au, Cu, PET; For UPS spectral reference you can use Ag, Au For Profiling use a thin layer of Ta2O5 For mapping use an Au grid I hope this will help you? Thanks, Marwane KAUST, KSA On Mar 29, 2018, at 3:19 PM, Deepalakshmi Putchen Dakshinamoorthy > wrote: Dear all, We have Ultra Axis XPS and the standard we are using is Ag and Cu. I would like to know what is the best standard for depth profiling How to check whether the tool is fine at different modes (XPS, UPX, depth profiling, mapping) Apreciate your valuable inputs Dr Deepalakshmi PD Technology Manager Micro and Nano Characterisation Facility (MNCF) Room No. GF-12 Centre for Nano Science and Engineering (CeNSE) Indian Institute of Science (IISc) Bengaluru-560 012, INDIA T: +91 80 2293 3181 (Ext:130) M: +91-9886106429 E: pddeepa at iisc.ac.in W: www.mncf.cense.iisc.ac.in _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork ________________________________ This message and its contents including attachments are intended solely for the original recipient. If you are not the intended recipient or have received this message in error, please notify me immediately and delete this message from your computer system. Any unauthorized use or distribution is prohibited. Please consider the environment before printing this email. -------------- next part -------------- An HTML attachment was scrubbed... URL: