From km at abeamtech.com Thu Nov 1 16:42:39 2018 From: km at abeamtech.com (Keiko Munechika aBeam) Date: Thu, 1 Nov 2018 13:42:39 -0700 Subject: [labnetwork] Nanophotonics Engineer Position at aBeam Message-ID: <050101d47223$6e37cec0$4aa76c40$@abeamtech.com> Dear all, We have an immediate opening for a nanophotonics engineer. We are seeking for a candidate with a strong background in Optics and Nanofabrication. The candidate will work at Molecular Foundry, Lawrence Berkeley National Laboratory and an industrial user. Please see the details in the attached description. If anyone is interested, please contact me directly @ km at abeamtech.com Sincerely, Keiko Keiko Munechika, Ph.D. Manager, Nanofabrication aBeam Technologies, Inc. Hayward, CA, USA km at abeamtech.com 1-(360)-402-4112 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.jpg Type: image/jpeg Size: 2028 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Job Description for Nanophotonics Engineer 11-2018.docx.pdf Type: application/pdf Size: 91448 bytes Desc: not available URL: From carsen at stanford.edu Mon Nov 5 11:02:37 2018 From: carsen at stanford.edu (Carsen Kline) Date: Mon, 5 Nov 2018 16:02:37 +0000 Subject: [labnetwork] Tylan / Tystar floppy emulator Message-ID: Hi all, We had an epic power outage last month that took out a third of campus and, with it, some of our most popular equipment. This included our Tylan furnace Tycom floppy drive, and while we happened to have one working spare, it's clear from the mountain of dead drives next to the tool that we're long overdue for modernization. Has anyone out there gotten a floppy emulator to work on these furnaces? I'm looking specifically at this one which looks like it has a winning track record, but no trace of who might have figured it out. Of course, if there are others available I'm all ears. Thanks for the help, Carsen Carsen Kline Lab Operations Manager Stanford Nanofabrication Facility (650)724-8214 http://snf.stanford.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From bill_flounders at berkeley.edu Mon Nov 5 12:03:16 2018 From: bill_flounders at berkeley.edu (A. William (Bill) FLOUNDERS) Date: Mon, 5 Nov 2018 09:03:16 -0800 Subject: [labnetwork] Tylan / Tystar floppy emulator In-Reply-To: References: Message-ID: UC Berkeley has installed a floppy emulator drive for our Tycom controller. I will have engineering team contact you off line. If any one else with a legacy Tycom controller has defined an upgrade path for the controller itself - I'd be most interested. Bill Flounders UC Berkeley On Mon, Nov 5, 2018 at 8:46 AM Carsen Kline wrote: > Hi all, > > > > We had an epic power outage last month that took out a third of campus > and, with it, some of our most popular equipment. This included our Tylan > furnace Tycom floppy drive, and while we happened to have one working > spare, it?s clear from the mountain of dead drives next to the tool that > we?re long overdue for modernization. > > > > Has anyone out there gotten a floppy emulator to work on these furnaces? > I?m looking specifically at this one > > which looks like it has a winning track record, but no trace of who might > have figured it out. Of course, if there are others available I?m all ears. > > > > Thanks for the help, > > > > Carsen > > > > Carsen Kline > Lab Operations Manager > Stanford Nanofabrication Facility > (650)724-8214 > http://snf.stanford.edu > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Mon Nov 5 17:23:51 2018 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Mon, 5 Nov 2018 22:23:51 +0000 Subject: [labnetwork] Tylan / Tystar floppy emulator In-Reply-To: References: Message-ID: Unfortunately, we seem to be experiencing more campus outages in the recent years. Our local provider is not stellar. Cheers! Julia Aebersold Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of A. William (Bill) FLOUNDERS Sent: Monday, November 5, 2018 12:03 PM To: Carsen Kline Cc: Fab Network Subject: Re: [labnetwork] Tylan / Tystar floppy emulator UC Berkeley has installed a floppy emulator drive for our Tycom controller. I will have engineering team contact you off line. If any one else with a legacy Tycom controller has defined an upgrade path for the controller itself - I'd be most interested. Bill Flounders UC Berkeley On Mon, Nov 5, 2018 at 8:46 AM Carsen Kline > wrote: Hi all, We had an epic power outage last month that took out a third of campus and, with it, some of our most popular equipment. This included our Tylan furnace Tycom floppy drive, and while we happened to have one working spare, it?s clear from the mountain of dead drives next to the tool that we?re long overdue for modernization. Has anyone out there gotten a floppy emulator to work on these furnaces? I?m looking specifically at this one which looks like it has a winning track record, but no trace of who might have figured it out. Of course, if there are others available I?m all ears. Thanks for the help, Carsen Carsen Kline Lab Operations Manager Stanford Nanofabrication Facility (650)724-8214 http://snf.stanford.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From rreger at purdue.edu Thu Nov 8 13:45:38 2018 From: rreger at purdue.edu (Reger, Ronald K) Date: Thu, 8 Nov 2018 18:45:38 +0000 Subject: [labnetwork] Mixing Fluorine and Chlorine Chemistries Message-ID: <06c35cd2c525494490aa852a51fb45c7@wppexc01.purdue.lcl> Dear Colleagues, Here at the Birck Nanotechnology Center we have a Panasonic E620 RIE ICP etcher that uses a variety of gases for etching of various materials. It has capability to do both chlorine-based and fluorine-based processes. This has given us a lot of versatility for a wide variety of materials. We're now exploring the implications of using both chemistries in the same etcher, particularly when it comes to making electron devices. We had done a small survey of a few other facilities and are finding a mixed response..... some facilities use dedicated etchers to keep these chemistries separated while others have both gases in the same etcher and use one type of recipe or the other. Particularly for electron devices are there cross-contamination issues/models with using both gases in the same chamber? What would be the failure physics/mechanisms from this? If both chemistries are used in the same system are there standard protocols between switching etch chemistries that we need to follow? Any advice would be greatly appreciated as we're getting into more electron device processing! Thanks, Ron Ron Reger Engineering Manager Birck Nanotechnology Center | Room 2289 | Office: 765.494.6667 | Email: rreger at purdue.edu Wiki: https://wiki.itap.purdue.edu/display/BNCWiki iLabs: https://purdue.ilabsolutions.com/homepage/ ______________________________________________________________ [Purdue_University-150_Years_of_Giant_Leaps.png (300?-66)] www.purdue.edu/giantleaps -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 11196 bytes Desc: image001.png URL: From wjkiethe at ncsu.edu Thu Nov 8 14:26:13 2018 From: wjkiethe at ncsu.edu (Bill Kiether) Date: Thu, 8 Nov 2018 14:26:13 -0500 Subject: [labnetwork] Alcatel ASM100 DRIE Turbopump issues Message-ID: Hello, At NCSU we have an Alcatel ASM100 DRIE that is difficult to operate at times due to the Ring network used for the control software and the fact only one company still provides service. We recently had to acquire a new Turbopump, and the company insists we will also need a new turbocontroller as the one we have does not have the correct firmware for the newer model of the turbo. My question is, has anyone successfully installed a newer turbocontroller on a ASM100 system? Were there any issues with the system control software? I don't want to pay $9000 for a new controller to find out the ASM100 will only talk to the older style controller. Alternatively, is there a software upgrade available anywhere for the legacy controller firmware? Our legacy turbo and controller are: Turbo: Adixen ATH 1600 M Turbo Controller: ACT 1300 M Thanks, Bill Kiether NCSU Nanofabrication Facility -------------- next part -------------- An HTML attachment was scrubbed... URL: From mcvittie at stanford.edu Thu Nov 8 18:58:04 2018 From: mcvittie at stanford.edu (James P McVittie) Date: Thu, 8 Nov 2018 23:58:04 +0000 Subject: [labnetwork] Mixing Fluorine and Chlorine Chemistries In-Reply-To: <06c35cd2c525494490aa852a51fb45c7@wppexc01.purdue.lcl> References: <06c35cd2c525494490aa852a51fb45c7@wppexc01.purdue.lcl> Message-ID: Ron, 1. F in an etch chamber from previous etch runs can slow down a Cl2 etching process. This is of most concern to III-V users. So for a well-controlled Cl2 etch process you want to get all the F based polymers out of the chamber. 2. In Poly Si etching C2F6, CF4 or NF3 are often used to remove surface oxides before start the HBr / Cl2 Si etch. 3. " Small amounts of CF4 (5-10 sccm) are added to the standard BCl3/Cl2/N2 process for residue removal. In some cases (particularly for copper residue), CF4 appears to widen the process window for residue control.CF4 typically helps to eliminate open field residue, but there have been cases where CF4 helped with dense area residue as well. Since the addition of another gas introduces more variables to the process, the use ofCF4 should be minimized." From old AMT Metal (Al) Etch Process Manual In the Stanford Nanofabrication Facility (SNF) we have F containing gases in all our Cl2 etchers. Our Cl2 Si etchers have CF4 and C2F6. Our ICP metal etcher has CF4, and Our III-V etcher has SF6. James (Jim) McVittie, Ph.D. Senior Research Engineer Electrical Engineering Stanford University 336x Paul G. Allen Bldg 420 Via Palou Mall Stanford, CA 94305 mcvittie at stanford.edu 650-725-3640 ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Reger, Ronald K Sent: Thursday, November 8, 2018 10:45 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Mixing Fluorine and Chlorine Chemistries Dear Colleagues, Here at the Birck Nanotechnology Center we have a Panasonic E620 RIE ICP etcher that uses a variety of gases for etching of various materials. It has capability to do both chlorine-based and fluorine-based processes. This has given us a lot of versatility for a wide variety of materials. We?re now exploring the implications of using both chemistries in the same etcher, particularly when it comes to making electron devices. We had done a small survey of a few other facilities and are finding a mixed response?.. some facilities use dedicated etchers to keep these chemistries separated while others have both gases in the same etcher and use one type of recipe or the other. Particularly for electron devices are there cross-contamination issues/models with using both gases in the same chamber? What would be the failure physics/mechanisms from this? If both chemistries are used in the same system are there standard protocols between switching etch chemistries that we need to follow? Any advice would be greatly appreciated as we?re getting into more electron device processing! Thanks, Ron Ron Reger Engineering Manager Birck Nanotechnology Center | Room 2289 | Office: 765.494.6667 | Email: rreger at purdue.edu Wiki: https://wiki.itap.purdue.edu/display/BNCWiki iLabs: https://purdue.ilabsolutions.com/homepage/ ______________________________________________________________ [Purdue_University-150_Years_of_Giant_Leaps.png (300??66)] www.purdue.edu/giantleaps -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 11196 bytes Desc: image001.png URL: From mcwilliamss at mail.smu.edu Thu Nov 8 20:16:39 2018 From: mcwilliamss at mail.smu.edu (McWilliams, Scott) Date: Fri, 9 Nov 2018 01:16:39 +0000 Subject: [labnetwork] Mixing Fluorine and Chlorine Chemistries In-Reply-To: References: <06c35cd2c525494490aa852a51fb45c7@wppexc01.purdue.lcl> Message-ID: <9d2d7665c74c4534936fde3128571a84@mail.smu.edu> Ron, I believe in your case, you are more concerned about switching from one application to another and not so concerned about sequentially using fluorine and chlorine in the same application, right? In addition to Jim's comments about removing oxides in Poly Si etching, when I worked at Lam Research, the gate-level polysilicon etch tools used HBr and chlorine chemistries and the chamber cleans in the same chamber always used fluorine-based gases such as NF3. The protocol for going from one application to another was a fluorine based chamber clean followed by the cycling of application specific dummy wafers. I am unaware of any failure physics/mechanisms of using both chemistries and it will be interesting to hear others respond to this. Also, as Jim pointed out, for III/V processing, many fabs use chlorine/methane/hydrogen type processes that form polymers on just about everything in the chamber, including the mask on the wafer. My own data for low volume III/V processing showed that when I used fluorine based chemistry to open dielectric masks, followed by a chlorine-based ICP etch to etch III/V compounds, we had issues with etch rate and profile control (I should have talked to Jim before trying this!). Regards, Scott From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of James P McVittie Sent: Thursday, November 08, 2018 5:58 PM To: Reger, Ronald K ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Mixing Fluorine and Chlorine Chemistries Ron, 1. F in an etch chamber from previous etch runs can slow down a Cl2 etching process. This is of most concern to III-V users. So for a well-controlled Cl2 etch process you want to get all the F based polymers out of the chamber. 2. In Poly Si etching C2F6, CF4 or NF3 are often used to remove surface oxides before start the HBr / Cl2 Si etch. 3. " Small amounts of CF4 (5-10 sccm) are added to the standard BCl3/Cl2/N2 process for residue removal. In some cases (particularly for copper residue), CF4 appears to widen the process window for residue control.CF4 typically helps to eliminate open field residue, but there have been cases where CF4 helped with dense area residue as well. Since the addition of another gas introduces more variables to the process, the use ofCF4 should be minimized." From old AMT Metal (Al) Etch Process Manual In the Stanford Nanofabrication Facility (SNF) we have F containing gases in all our Cl2 etchers. Our Cl2 Si etchers have CF4 and C2F6. Our ICP metal etcher has CF4, and Our III-V etcher has SF6. James (Jim) McVittie, Ph.D. Senior Research Engineer Electrical Engineering Stanford University 336x Paul G. Allen Bldg 420 Via Palou Mall Stanford, CA 94305 mcvittie at stanford.edu 650-725-3640 ________________________________ From: labnetwork-bounces at mtl.mit.edu > on behalf of Reger, Ronald K > Sent: Thursday, November 8, 2018 10:45 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Mixing Fluorine and Chlorine Chemistries Dear Colleagues, Here at the Birck Nanotechnology Center we have a Panasonic E620 RIE ICP etcher that uses a variety of gases for etching of various materials. It has capability to do both chlorine-based and fluorine-based processes. This has given us a lot of versatility for a wide variety of materials. We're now exploring the implications of using both chemistries in the same etcher, particularly when it comes to making electron devices. We had done a small survey of a few other facilities and are finding a mixed response..... some facilities use dedicated etchers to keep these chemistries separated while others have both gases in the same etcher and use one type of recipe or the other. Particularly for electron devices are there cross-contamination issues/models with using both gases in the same chamber? What would be the failure physics/mechanisms from this? If both chemistries are used in the same system are there standard protocols between switching etch chemistries that we need to follow? Any advice would be greatly appreciated as we're getting into more electron device processing! Thanks, Ron Ron Reger Engineering Manager Birck Nanotechnology Center | Room 2289 | Office: 765.494.6667 | Email: rreger at purdue.edu Wiki: https://wiki.itap.purdue.edu/display/BNCWiki iLabs: https://purdue.ilabsolutions.com/homepage/ ______________________________________________________________ [Purdue_University-150_Years_of_Giant_Leaps.png (300?-66)] www.purdue.edu/giantleaps -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 11196 bytes Desc: image001.png URL: From christophe.clement at polymtl.ca Fri Nov 9 11:31:27 2018 From: christophe.clement at polymtl.ca (=?utf-8?Q?Christophe_Cl=C3=A9ment?=) Date: Fri, 9 Nov 2018 11:31:27 -0500 (EST) Subject: [labnetwork] Hafnium oxide Ebeam evaporation Message-ID: <02be01d47849$a96a03b0$fc3e0b10$@polymtl.ca> Hello community, I?ve been asked to deposit Hafnium Oxide in our Ebeam evaporator, and I do not have any experience with this material, is it safe to evaporate it regarding chamber/clean room contamination? The tool we have does not have load lock and we evaporate mainly most metals and also metallic oxides. I?ve check KJL charts and HfO2 seems to be fair for Ebeam evaporation, if you can share your experience with this material that would be appreciated Many Thanks, Christophe Christophe Cl?ment Technicien laboratoire Laboratoire de microfabrication (LMF) Groupe des Couches Minces (GCM) www.gcmlab.ca Ecole Polytechnique de Montr?al www.polymtl.ca D?partement de g?nie physique * 2900 Boulevard Edouard Monpetit Pavillon JAB Campus de l'Universit? de Montr?al Montr?al (Qu?bec) H3T 1J4 8 christophe.clement at polymtl.ca ( 514 340 4711 Fax : 514 340 4711 # 2417 -------------- next part -------------- An HTML attachment was scrubbed... URL: From james.t.kerwin at gmail.com Sat Nov 10 12:06:15 2018 From: james.t.kerwin at gmail.com (James Kerwin) Date: Sat, 10 Nov 2018 11:06:15 -0600 Subject: [labnetwork] Hafnium oxide Ebeam evaporation In-Reply-To: <02be01d47849$a96a03b0$fc3e0b10$@polymtl.ca> References: <02be01d47849$a96a03b0$fc3e0b10$@polymtl.ca> Message-ID: Christophe, Does it have to be ebeam deposition? HfO2 is a pretty standard ALD process. Most ALD tools can do it at reasonable temperatures with good conformality, if you supply the right precursor. Sincerely, James Kerwin Rice University Cleanroom Support Technician On Fri, Nov 9, 2018, 8:58 PM Christophe Cl?ment < christophe.clement at polymtl.ca wrote: > Hello community, > > I?ve been asked to deposit Hafnium Oxide in our Ebeam evaporator, and I do > not have any experience with this material, is it safe to evaporate it > regarding chamber/clean room contamination? > > The tool we have does not have load lock and we evaporate mainly most > metals and also metallic oxides. I?ve check KJL charts and HfO2 seems to be > fair for Ebeam evaporation, if you can share your experience with this > material that would be appreciated > > > > Many Thanks, > > > > Christophe > > > > *Christophe Cl?ment* > > *Technicien laboratoire* > > Laboratoire de microfabrication (LMF) > > Groupe des Couches Minces (GCM) *www.gcmlab.ca * > > Ecole Polytechnique de Montr?al www.polymtl.ca > > D?partement de g?nie physique > > * 2900 Boulevard Edouard Monpetit > > Pavillon JAB > Campus de l'Universit? de Montr?al > Montr?al (Qu?bec) H3T 1J4 > > > 8 christophe.clement at polymtl.ca > > ( 514 340 4711 > > Fax : 514 340 4711 # 2417 > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From sguo18 at yorku.ca Mon Nov 12 09:10:40 2018 From: sguo18 at yorku.ca (Xin (Shane) Guo) Date: Mon, 12 Nov 2018 14:10:40 +0000 Subject: [labnetwork] recirculated wet processing benches Message-ID: Hi forum members, I just wanna do a small survey to check how many labs here (probably mid to small scaled labs) are using recirculated wet benches without exhaust for microfabrication? We have insufficient makeup air for our new lab space, so someone suggested circulated benches with filters. I personally do not prefer that due to safety concerns when using acids, bases and solvents. However, I would like to learn if someone here has successful experience of using such benches. Cheers Shane -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Mon Nov 12 11:13:45 2018 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Mon, 12 Nov 2018 16:13:45 +0000 Subject: [labnetwork] Post Doc Research Position in Micro/Nano/Additive Manufacturing at Louisville Message-ID: Please see details below. http://www.kymultiscale.net/job-opportunity/ Cheers! Julia Aebersold Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From fouad.karouta at anu.edu.au Mon Nov 12 17:47:11 2018 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Mon, 12 Nov 2018 22:47:11 +0000 Subject: [labnetwork] Mixing Fluorine and Chlorine Chemistries In-Reply-To: <9d2d7665c74c4534936fde3128571a84@mail.smu.edu> References: <06c35cd2c525494490aa852a51fb45c7@wppexc01.purdue.lcl> <9d2d7665c74c4534936fde3128571a84@mail.smu.edu> Message-ID: Hi Ron, Having a fluorine and chlorine in one system is a controversial issue and some people would love it and others would hate. Some manufacturers advise to have SF6 along chlorine for a system to etch mainly III-V semiconductors as SF6 is used for cleaning purposes. That said I worked in the past with systems sharing both chemistries. At the moment we have two systems one fluorinated and one chlorinated. Mixing the gases has pros and cons: Pros: 1- Economic as 1 system is purchased to etch both III-V and dielectrics/Si. In this case ways to avoid problems is to dedicate a lap of time for Cl-based and another for F-based chemistry with a cleaning in between. 2- Cl2 + SF6 offers the possibility of performing selective etch of GaAs/GaN wrt AlGaAs/AlGaN if required 3- Personally in an RIE system I got4x higher etch rate and smooth when etching GaN in SiCl4+SF6 vs SiCl4 (RIE system and not ICP nor ECR). Cons: 1- May affect reproducibility, however a good policy for switching the chemistries may address this concern. 2- May not be suitable to achieve best performance in Si etching Happy to discuss further, if required, off-line any issue. Best regards, Fouad Karouta ************************************* Manager ANFF ACT Node Australian National Fabrication Facility Research School of Physics and Engineering L. Huxley Building (#56), Mills Road, Room 4.02 Australian National University ACT 2601, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au http://anff-act.anu.edu.au/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of McWilliams, Scott Sent: Friday, 9 November 2018 12:17 PM To: James P McVittie ; Reger, Ronald K ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Mixing Fluorine and Chlorine Chemistries Ron, I believe in your case, you are more concerned about switching from one application to another and not so concerned about sequentially using fluorine and chlorine in the same application, right? In addition to Jim's comments about removing oxides in Poly Si etching, when I worked at Lam Research, the gate-level polysilicon etch tools used HBr and chlorine chemistries and the chamber cleans in the same chamber always used fluorine-based gases such as NF3. The protocol for going from one application to another was a fluorine based chamber clean followed by the cycling of application specific dummy wafers. I am unaware of any failure physics/mechanisms of using both chemistries and it will be interesting to hear others respond to this. Also, as Jim pointed out, for III/V processing, many fabs use chlorine/methane/hydrogen type processes that form polymers on just about everything in the chamber, including the mask on the wafer. My own data for low volume III/V processing showed that when I used fluorine based chemistry to open dielectric masks, followed by a chlorine-based ICP etch to etch III/V compounds, we had issues with etch rate and profile control (I should have talked to Jim before trying this!). Regards, Scott From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of James P McVittie Sent: Thursday, November 08, 2018 5:58 PM To: Reger, Ronald K >; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Mixing Fluorine and Chlorine Chemistries Ron, 1. F in an etch chamber from previous etch runs can slow down a Cl2 etching process. This is of most concern to III-V users. So for a well-controlled Cl2 etch process you want to get all the F based polymers out of the chamber. 2. In Poly Si etching C2F6, CF4 or NF3 are often used to remove surface oxides before start the HBr / Cl2 Si etch. 3. " Small amounts of CF4 (5-10 sccm) are added to the standard BCl3/Cl2/N2 process for residue removal. In some cases (particularly for copper residue), CF4 appears to widen the process window for residue control.CF4 typically helps to eliminate open field residue, but there have been cases where CF4 helped with dense area residue as well. Since the addition of another gas introduces more variables to the process, the use ofCF4 should be minimized." From old AMT Metal (Al) Etch Process Manual In the Stanford Nanofabrication Facility (SNF) we have F containing gases in all our Cl2 etchers. Our Cl2 Si etchers have CF4 and C2F6. Our ICP metal etcher has CF4, and Our III-V etcher has SF6. James (Jim) McVittie, Ph.D. Senior Research Engineer Electrical Engineering Stanford University 336x Paul G. Allen Bldg 420 Via Palou Mall Stanford, CA 94305 mcvittie at stanford.edu 650-725-3640 ________________________________ From: labnetwork-bounces at mtl.mit.edu > on behalf of Reger, Ronald K > Sent: Thursday, November 8, 2018 10:45 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Mixing Fluorine and Chlorine Chemistries Dear Colleagues, Here at the Birck Nanotechnology Center we have a Panasonic E620 RIE ICP etcher that uses a variety of gases for etching of various materials. It has capability to do both chlorine-based and fluorine-based processes. This has given us a lot of versatility for a wide variety of materials. We're now exploring the implications of using both chemistries in the same etcher, particularly when it comes to making electron devices. We had done a small survey of a few other facilities and are finding a mixed response..... some facilities use dedicated etchers to keep these chemistries separated while others have both gases in the same etcher and use one type of recipe or the other. Particularly for electron devices are there cross-contamination issues/models with using both gases in the same chamber? What would be the failure physics/mechanisms from this? If both chemistries are used in the same system are there standard protocols between switching etch chemistries that we need to follow? Any advice would be greatly appreciated as we're getting into more electron device processing! Thanks, Ron Ron Reger Engineering Manager Birck Nanotechnology Center | Room 2289 | Office: 765.494.6667 | Email: rreger at purdue.edu Wiki: https://wiki.itap.purdue.edu/display/BNCWiki iLabs: https://purdue.ilabsolutions.com/homepage/ ______________________________________________________________ [Purdue_University-150_Years_of_Giant_Leaps.png (300?-66)] www.purdue.edu/giantleaps -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 11196 bytes Desc: image001.png URL: From amahmood at hbku.edu.qa Tue Nov 13 00:20:59 2018 From: amahmood at hbku.edu.qa (Dr. Aamer Mahmood) Date: Tue, 13 Nov 2018 05:20:59 +0000 Subject: [labnetwork] Liftoff ink for inkjet printer Message-ID: <12A976BAF5CA81498991F859A5F9B8E56E4A73D5@QFM00013.qf.org.qa> Hello All, We have a Dimatix DMP2850 and a Pixdro LP50 inkjet printer systems with which we'd like to print a pattern for liftoff on silicon and glass substrates. The liftoff films will be metals or metal oxides typically 100 nm thick deposited using physical vapor deposition techniques like evaporation. Critical feature sizes will be ~50 microns. I would appreciate any information on products we can use for this application. Ideally the product should be soluble in acetone. Thanks. -- Aamer Mahmood Senior Scientist Qatar Environment and Energy Research Institute, Qatar Foundation Doha, Qatar Tel: +974 44548132 (work) www.qeeri.org.qa This email message, including any attachments is intended solely for the addressee(s), and may contain information that is confidential or legally protected. Any use, disclosure, copying, printing or distribution of the information contained herein by persons other than the designated addressee is unauthorized and may be unlawful. If you believe that you have received this email in error, please notify the sender immediately and delete this email and any attachments from your system and discard any printout thereof. Qatar Foundation makes no warranty that this email is error- or virus-free .The views, opinions, conclusions, and other information expressed in this email are not necessarily endorsed by Qatar Foundation unless otherwise indicated by an authorized representative. As such, Qatar Foundation does not accept any liability for any emails and attachments that may violate the relevant applicable laws. -------------- next part -------------- An HTML attachment was scrubbed... URL: From sivapenmetsapr at gmail.com Mon Nov 19 04:43:34 2018 From: sivapenmetsapr at gmail.com (Siva Penmetsa) Date: Mon, 19 Nov 2018 15:13:34 +0530 Subject: [labnetwork] Photo Mask Cleaning Message-ID: Dear All, We are planning to upgrade our Photomask Cleaning process, (currently using Acetone, IPA and Piranha). Please let us know your recommendations on the solutions, materials, scrubbing. Any suggestions on the suppliers? Thanks in advance, With Regards, Siva Penmetsa, Technology Manager, National Nano Fabrication Centre(NNfC), Centre for Nano Science And Engineering(CeNSE), Indian Institute of Science(IISc), Bangalore -------------- next part -------------- An HTML attachment was scrubbed... URL: From Thomas_Ferraguto at uml.edu Mon Nov 19 08:41:13 2018 From: Thomas_Ferraguto at uml.edu (Ferraguto, Thomas S) Date: Mon, 19 Nov 2018 13:41:13 +0000 Subject: [labnetwork] Job Opening at UMass Lowell Message-ID: Colleagues, We have a position opened at UMass Lowell for Assistant Clean Room Manager. This is a HANDS ON position training students, working on equipment and managing our industrial users. Here's the link to the position and a couple youtube videos of the lab. http://explorejobs.uml.edu/lowell/en-us/job/496354/assistant-laboratory-manager-nanofabrication https://www.youtube.com/watch?v=8JcnxzahsW8 https://www.youtube.com/watch?v=W2k08_8YcJc Feel free to contact me directly. Happy Thanksgiving ! Tom Thomas S. Ferraguto Saab ETIC Nanofabrication Laboratory Director Saab ETIC Building Director 1 University Avenue Lowell MA 01854 Mobile 617-755-0910 Land 978-934-1809 Fax 978-934-1014 -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Mon Nov 19 11:14:21 2018 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Mon, 19 Nov 2018 16:14:21 +0000 Subject: [labnetwork] Photo Mask Cleaning In-Reply-To: References: Message-ID: We use NMP to clean our photomasks, but would love to go maskless. Cheers! Julia Aebersold, Ph.D. MNTC Cleanroom Manager University of Louisville 2210 South Brook Street Shumaker Research Building, Room 233 Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Siva Penmetsa Sent: Monday, November 19, 2018 4:43:34 AM To: Fab Network Subject: [labnetwork] Photo Mask Cleaning Dear All, We are planning to upgrade our Photomask Cleaning process, (currently using Acetone, IPA and Piranha). Please let us know your recommendations on the solutions, materials, scrubbing. Any suggestions on the suppliers? Thanks in advance, With Regards, Siva Penmetsa, Technology Manager, National Nano Fabrication Centre(NNfC), Centre for Nano Science And Engineering(CeNSE), Indian Institute of Science(IISc), Bangalore -------------- next part -------------- An HTML attachment was scrubbed... URL: From Stergios.Papadakis at jhuapl.edu Mon Nov 19 17:45:44 2018 From: Stergios.Papadakis at jhuapl.edu (Papadakis, Stergios J.) Date: Mon, 19 Nov 2018 22:45:44 +0000 Subject: [labnetwork] JHU/APL microfabrication chief position Message-ID: <02FCFA92-E2C9-4FFF-A32E-33AF200E38DA@contoso.com> Dear Microfabrication network, The Johns Hopkins University Applied Physics Laboratory, a University-Affiliated Research Center located between Baltimore, MD, and Washington D.C., is searching for a manager for our microfabrication facility. The manager will be responsible for operation and maintenance of the facility, and strategic planning for future growth. The full description is below, and the link is here: https://www.jhuapl.edu/Careers/Opportunities Sincerely, Stergios Papadakis Stergios J. Papadakis, Ph.D. Senior Scientist Chief Scientist - Experimental & Computational Physics Group Johns Hopkins University Applied Physics Laboratory Mail Stop 21-N109 11100 Johns Hopkins Rd. Laurel, MD 20723 Phone (443) 778 1905 email: stergios.papadakis at jhuapl.edu Job Description Nano/Microfabrication Facility Chief-18892 Position Description The Johns Hopkins University Applied Physics Laboratory (APL) is a national leader in scientific research and development. APL is actively seeking a Nano/Microfabrication Facility Chief. This new role will support our micro and nano-fabrication capabilities, across the Research and Exploratory Development Department (REDD), in order to meet the rapidly evolving microelectronic and microelectromechanical systems needs. APL?s micro- and nano-fabrication facilities span over 12,000 square feet of class 100,000 to 1,000 cleanroom space, as well as distributed facilities supporting SEM / FIB, MBE, MOCVD, plasma coatings, CNT and other advanced atomic scale fabrication techniques. We provide fabrication of devices, circuits and material synthesis that have applications across Engineering, Biosciences, Material Science, and Physics (electromagnetic manipulation, quantum sensing and optics). Whether it is for general MEMS, flexible electronics, metamaterials, thermoelectrics, microfluidics or silicon photonics and optics, these capabilities span virtually every research and application area across the laboratory. Key current and future capabilities include photolithography, thermal evaporation of metals, sputtering of various materials, thick-film processing, ceramics, and packaging capabilities, Deep Reactive Ion Etching, plating, plasma-enhanced chemical vapor deposition and high precision e-beam writing for IR metamaterials and photonics. The Johns Hopkins Applied Physics Laboratory (APL) is located midway between Baltimore and Washington, DC. Job Summary: The Research and Exploratory Development Department is seeking a highly skilled and motivated director of our micro- and nano-fabrication facilities to help oversee and provide technical leadership of these strategic emerging capabilities. This position will play a key role in helping to develop, support, and expand the micro- and nanoscale processing capabilities of the enterprise, supporting tens of millions of dollars of research and translational development activities each year. The successful candidate will have direct operational responsibility for a multimillion dollar facility, dictating the operation of an open facility to include SOPs, safety, training and recurring maintenance. The Chief will also be instrumental in developing an integrated multi-year strategy and will guide future strategic investment. The Chief will lead APL to be a state-of-the-art and multidisciplinary facility; educate, train and produce a highly skilled workforce in the nanofabrication area; foster cross-disciplinary collaborations and ensure excellent facility-user experiences Duties: 1.Serve as the director for the microfabrication laboratories. Responsible for administrative matters related to the planning, organization, operations and management of the microfabrication laboratories. Establish standard protocols, practices, procedures, and techniques for effective and safe operation of the laboratory. Responsible for planning the use of laboratory space to best fit the needs of primary users. Undertake quality assurance measures and train users in lab safety practices. Monitor and enforce lab access granted to users. Research and implement best practices, capabilities, and effectiveness of operational elements in similar or related laboratories. Develop and maintain effective working relationships across the Department, Laboratory and with external sponsors. (50%) 2.Develop and execute a comprehensive microfabrication strategic plan that enables the emerging research needs, while supporting engineering development. Support new business activities and research goals by ensuring alignment and evolution of capabilities with existing and planned work. Develop and execute the multi-year investment plan for both capital and indirect expenditures necessary to sustain a state-of-the-art facility. Manage the laboratory inventory, including placing and monitoring orders and receipts for equipment and supplies. Track and manage laboratory expenditures. (20%) 3.Develop and implement strategic relationships with external fabrication organizations as required to support exceptional capabilities needed outside organic APL facilities. (10%) 4.Supervise, lead and mentor assigned core facility staff. Recruit and develop staff with superior technical capabilities. Define expectations, coach performance, and provide professional development. Identify and develop key talent for future leadership roles. (10%) 5.Provide technical leadership. Establish and promote a climate conducive to intellectual curiosity, creativity, innovation, collaboration, growth, productivity, respect for others, and unquestionable integrity. (10%) Note: This job summary and listing of duties is for the purpose of describing the position and its essential functions at time of hire and may change over time. Qualifications : Required Qualifications: ?PHD in a scientific or engineering field ?At least 10 years of experience in cleanroom technology, process development and device fabrication. Five years or more of industry experience with micro and nanofabrication equipment and processes. ?Experience in a multi-user fabrication facility. ?Experience with process development, characterization, and documentation. ?Experience with processing equipment support and maintenance. ?Superlative communication (verbal and written) and personnel skills related to supervising professional researchers, engineers, and technicians as well as interfacing directly with external customers, and senior management. ?Ability to clearly summarize and report complex plans and technical decisions to management and faculty. Ability to develop and implement a multi-year strategic plan. ?Thorough understanding of clean room technology and microfabrication processing including thin film deposition, optical and electron beam lithography, reactive ion etching and inductively coupled plasma etching, rapid thermal annealing, LPCVD film growth, scanning electron microscopy and a number of common metrology techniques such as spectrophotometry and ellipsometry. ?Clear understanding of cleanroom safety requirements, including industry-accepted safety standards, handling and storage of toxic gases and dangerous chemicals, high voltage/current systems, high temperature systems, etc. ?Ability to develop budget projections and manage annual budgets ?Good organizational skills to plan for and hire the appropriate engineer for each process area. Desired Qualifications: ?Previous facility management experience. Special Working Conditions: None Security: Applicant selected will be subject to a government security clearance investigation and must meet the requirements for access to classified information. Eligibility requirements include U.S. citizenship. Benefits: APL offers a comprehensive benefits package including a liberal vacation plan, a matching retirement program, significant educational assistance, a scholarship tuition program for staff with dependents, and competitive salaries commensurate with skills and experience. For more information about our organization, please visit our web site at www.jhuapl.edu. Equal Employment Opportunity: Johns Hopkins University/Applied Physics Laboratory (APL) is an Equal Opportunity/Affirmative Action employer that complies with Title IX of the Education Amendments Acts of 1972, as well as other applicable laws. All qualified applicants will receive consideration for employment without regard to race, color, religion, sexual orientation, gender identity, national origin, disability, or protected Veteran status. Primary Location *United States-*Maryland-*Laurel Schedule Full-time -------------- next part -------------- An HTML attachment was scrubbed... URL: From gilheart at rice.edu Tue Nov 20 16:20:09 2018 From: gilheart at rice.edu (Tim Gilheart) Date: Tue, 20 Nov 2018 15:20:09 -0600 Subject: [labnetwork] Research Support Technician in Rice U. cleanroom Message-ID: Greetings colleagues, We have an opening for a research support technician on the cleanroom team with the Shared Equipment Authority (SEA) at Rice University. The cleanroom team comprises 2 Ph.D. research scientists and 1 technician (the opening). More information about the position may be found here: https://jobs.rice.edu/postings/17340 The cleanroom at Rice is part of the SEA, a larger umbrella organization under the Vice Provost for Research, that administers a number of shared core labs (electron microscopy, nanofab cleanroom, NMR, mass spec, optical microscopy, XRD, etc) located throughout the university. This position is part of the SEA's collegial team of scientists that support research efforts from the schools of engineering and natural sciences. More information about the SEA can be found on our website: https://sea.rice.edu/ Rice is still accepting applications for this position, so if you know a good candidate, please pass this information along to them. We have completed the move to our new cleanroom facility and will reopen for users in the next week or two. With the move, we are more than doubling our facility size, adding new capabilities, replacing some workhorse tools, and generally modernizing overall. Interested candidates are welcome to contact me or SEA director of operations Angelo Benedetto (angelo at rice.edu ) directly with any questions. Thanks for your time and consideration, -- Tim Gilheart, Ph.D. Research Scientist - Nanofabrication Clean Room Manager, Shared Equipment Authority (SEA), Rice University Cell: 832-341-5488 | Office: 713-348-3159 | gilheart at rice.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From jcn8004 at rit.edu Thu Nov 29 09:41:33 2018 From: jcn8004 at rit.edu (John Nash) Date: Thu, 29 Nov 2018 14:41:33 +0000 Subject: [labnetwork] STS/STPS support Message-ID: Does anyone have an STS/ STPS tool that knows of a good 3rd party support organization? At the moment we are looking for a VAC3 controller or someone that knows how to fix them. Regards, John C Nash SMFL - Technician Rochester Institute of Technology Semiconductor & Microsystems Fabrication Laboratory 82 Lomb Memorial Dr. Bldg. 17-2627 Rochester, NY 14623 585 478-3835 cell john.nash at rit.edu www.smfl.rit.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From bill_flounders at berkeley.edu Thu Nov 29 12:28:55 2018 From: bill_flounders at berkeley.edu (A. William (Bill) FLOUNDERS) Date: Thu, 29 Nov 2018 09:28:55 -0800 Subject: [labnetwork] Bonding Wire Suppliers Message-ID: I am seeking suppliers of Al and Au bond wire. Thank you in advance for any recommendations. Bill Flounders UC Berkeley Marvell NanoLab -------------- next part -------------- An HTML attachment was scrubbed... URL: From codreanu at udel.edu Thu Nov 29 12:40:10 2018 From: codreanu at udel.edu (Iulian Codreanu) Date: Thu, 29 Nov 2018 12:40:10 -0500 Subject: [labnetwork] CPD vendors Message-ID: Good afternoon, I am considering purchasing a critical point dryer and I am wondering what other vendors are out there besides Tousimis and Leica. Thank you for your input, Iulian -- iulian Codreanu, Ph.D. Director of Operations, UD NanoFab 163 ISE Lab 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu From rosendo.bindoy at kaust.edu.sa Thu Nov 29 13:24:19 2018 From: rosendo.bindoy at kaust.edu.sa (Rosendo Bindoy) Date: Thu, 29 Nov 2018 18:24:19 +0000 Subject: [labnetwork] STS/STPS support Message-ID: Hello John, Normally the reason why VAC module fails is because of corrupted EPROM. When you open the module you will find and EPROM labeled as VAC3 ver. XXX (or something like that). Maybe you can try replacing it first if you have a spare VAC EPROM. Regards, Rosendo M. Bindoy Equipment Engineer Nanofabrication Core Lab Ibn Sina Bldg. 3 (Sea Side), Level 0 Room 0246 King Abdullah University of Science and Technology Phone: +966 12 808 4413 Mobile: +966 54 251 5257 Email: rosendo.bindoy at kaust.edu.sa From: > on behalf of John Nash > Date: Thursday, November 29, 2018 at 5:41 PM To: "labnetwork at mtl.mit.edu" > Subject: [labnetwork] STS/STPS support Does anyone have an STS/ STPS tool that knows of a good 3rd party support organization? At the moment we are looking for a VAC3 controller or someone that knows how to fix them. Regards, John C Nash SMFL - Technician Rochester Institute of Technology Semiconductor & Microsystems Fabrication Laboratory 82 Lomb Memorial Dr. Bldg. 17-2627 Rochester, NY 14623 585 478-3835 cell john.nash at rit.edu www.smfl.rit.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From mweiler at andrew.cmu.edu Thu Nov 29 14:08:58 2018 From: mweiler at andrew.cmu.edu (Mark Weiler) Date: Thu, 29 Nov 2018 19:08:58 +0000 Subject: [labnetwork] STS/STPS support In-Reply-To: References: Message-ID: Hi John, You should try Jeff or Gareth? Jeff Hawks Hawks Technical Services LLC. 2715 Swamp Creek Rd. Green Lane, PA. 18054 jeffhawks at verizon.net Mobile: 215-872-0944 Gareth Morgan CTP Company Services 3 Commercial Road Cwmfelinfach Nr Newport Gwent garethmorganctp at outlook.com Mobile: +44 07754002875 Best regards, Mark ________________________________________________________________ Mark Weiler Equipment & Facilites Manager Clair and John Bertucci Nanotechnology Laboratory Eden Hall Nanofabrication Cleanroom Carnegie Mellon University P: 412-268-2471 http://www.nanofab.ece.cmu.edu [cid:2D2E01E3-CEC1-4F48-A845-224D8D7CED12 at wv.cc.cmu.edu] On Nov 29, 2018, at 9:41 AM, John Nash > wrote: Does anyone have an STS/ STPS tool that knows of a good 3rd party support organization? At the moment we are looking for a VAC3 controller or someone that knows how to fix them. Regards, John C Nash SMFL - Technician Rochester Institute of Technology Semiconductor & Microsystems Fabrication Laboratory 82 Lomb Memorial Dr. Bldg. 17-2627 Rochester, NY 14623 585 478-3835 cell john.nash at rit.edu www.smfl.rit.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: images.png Type: image/png Size: 720 bytes Desc: images.png URL: From lrehn at tamu.edu Thu Nov 29 16:08:44 2018 From: lrehn at tamu.edu (Rehn, Larry A) Date: Thu, 29 Nov 2018 21:08:44 +0000 Subject: [labnetwork] STS/STPS support In-Reply-To: References: Message-ID: Hello John, We have been working with Gareth for the past few months to bring up an STS for our lab. I like him and he seems very competent. I think both Jeff and Gareth used to work at STS. Regards, Larry A Rehn Technical Lab Manager AggieFab Nanofabrication Facility Texas A&M University 979 845-3199 lrehn at tamu.edu [cid:image001.jpg at 01CEC37D.FAF8C9E0] From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Mark Weiler Sent: Thursday, November 29, 2018 1:09 PM To: John Nash Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] STS/STPS support Hi John, You should try Jeff or Gareth? Jeff Hawks Hawks Technical Services LLC. 2715 Swamp Creek Rd. Green Lane, PA. 18054 jeffhawks at verizon.net Mobile: 215-872-0944 Gareth Morgan CTP Company Services 3 Commercial Road Cwmfelinfach Nr Newport Gwent garethmorganctp at outlook.com Mobile: +44 07754002875 Best regards, Mark ________________________________________________________________ Mark Weiler Equipment & Facilites Manager Clair and John Bertucci Nanotechnology Laboratory Eden Hall Nanofabrication Cleanroom Carnegie Mellon University P: 412-268-2471 http://www.nanofab.ece.cmu.edu [cid:image002.png at 01D487F5.6A2872C0] On Nov 29, 2018, at 9:41 AM, John Nash > wrote: Does anyone have an STS/ STPS tool that knows of a good 3rd party support organization? At the moment we are looking for a VAC3 controller or someone that knows how to fix them. Regards, John C Nash SMFL - Technician Rochester Institute of Technology Semiconductor & Microsystems Fabrication Laboratory 82 Lomb Memorial Dr. Bldg. 17-2627 Rochester, NY 14623 585 478-3835 cell john.nash at rit.edu www.smfl.rit.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 13188 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 720 bytes Desc: image002.png URL: From jfraser96 at byu.edu Thu Nov 29 16:28:06 2018 From: jfraser96 at byu.edu (Jim Fraser) Date: Thu, 29 Nov 2018 21:28:06 +0000 Subject: [labnetwork] STS/STPS support In-Reply-To: References: Message-ID: <1543526892519.78717@byu.edu> Hi John, Here is the link to the company that works on older STS systems: http://ctpcompanyservices.co.uk/?. If you need outside help, they have service and parts available. I worked with Gareth Morgan on an issue last year and he was knowledgeable and responsive. Thanks, Jim Fraser ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Rosendo Bindoy Sent: Thursday, November 29, 2018 11:24 AM To: John Nash; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] STS/STPS support Hello John, Normally the reason why VAC module fails is because of corrupted EPROM. When you open the module you will find and EPROM labeled as VAC3 ver. XXX (or something like that). Maybe you can try replacing it first if you have a spare VAC EPROM. Regards, Rosendo M. Bindoy Equipment Engineer Nanofabrication Core Lab Ibn Sina Bldg. 3 (Sea Side), Level 0 Room 0246 King Abdullah University of Science and Technology Phone: +966 12 808 4413 Mobile: +966 54 251 5257 Email: rosendo.bindoy at kaust.edu.sa From: > on behalf of John Nash > Date: Thursday, November 29, 2018 at 5:41 PM To: "labnetwork at mtl.mit.edu" > Subject: [labnetwork] STS/STPS support Does anyone have an STS/ STPS tool that knows of a good 3rd party support organization? At the moment we are looking for a VAC3 controller or someone that knows how to fix them. Regards, John C Nash SMFL - Technician Rochester Institute of Technology Semiconductor & Microsystems Fabrication Laboratory 82 Lomb Memorial Dr. Bldg. 17-2627 Rochester, NY 14623 585 478-3835 cell john.nash at rit.edu www.smfl.rit.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From rc at danchip.dtu.dk Thu Nov 29 16:51:33 2018 From: rc at danchip.dtu.dk (Roy Cork) Date: Thu, 29 Nov 2018 21:51:33 +0000 Subject: [labnetwork] STS/STPS support In-Reply-To: References: Message-ID: <3b2d6531a9de4126be5596e73f1099e8@danchip.dtu.dk> Hi John, What issues are you having? The two most common issues are dead power supply and not communicating. Let me know and I can give you some ideas and maybe dig out some drawings if you don?t have them. Cheers Roy DTU Danchip ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of John Nash Sent: Thursday, November 29, 2018 3:41:33 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] STS/STPS support Does anyone have an STS/ STPS tool that knows of a good 3rd party support organization? At the moment we are looking for a VAC3 controller or someone that knows how to fix them. Regards, John C Nash SMFL - Technician Rochester Institute of Technology Semiconductor & Microsystems Fabrication Laboratory 82 Lomb Memorial Dr. Bldg. 17-2627 Rochester, NY 14623 585 478-3835 cell john.nash at rit.edu www.smfl.rit.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Thu Nov 29 17:11:23 2018 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Thu, 29 Nov 2018 22:11:23 +0000 Subject: [labnetwork] Bonding Wire Suppliers In-Reply-To: References: Message-ID: California Fine Wire https://www.calfinewire.com/index.html Cheers! Julia Aebersold Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of A. William (Bill) FLOUNDERS Sent: Thursday, November 29, 2018 12:29 PM To: Fab Network Subject: [labnetwork] Bonding Wire Suppliers I am seeking suppliers of Al and Au bond wire. Thank you in advance for any recommendations. Bill Flounders UC Berkeley Marvell NanoLab -------------- next part -------------- An HTML attachment was scrubbed... URL: From bill_flounders at berkeley.edu Thu Nov 29 17:27:57 2018 From: bill_flounders at berkeley.edu (A. William (Bill) FLOUNDERS) Date: Thu, 29 Nov 2018 14:27:57 -0800 Subject: [labnetwork] Bonding Wire Suppliers In-Reply-To: References: Message-ID: Thank you for the prompt multiple responses - I am now set. Bill On Thu, Nov 29, 2018 at 2:11 PM Aebersold,Julia W. < julia.aebersold at louisville.edu> wrote: > California Fine Wire > > > > https://www.calfinewire.com/index.html > > > > Cheers! > > > > Julia Aebersold > > Manager, Micro/Nano Technology Center > > University of Louisville > > Shumaker Research Building, Room 233 > > 2210 South Brook Street > > Louisville, KY 40292 > > (502) 852-1572 > > > > http://louisville.edu/micronano/ > > > > *From:* labnetwork-bounces at mtl.mit.edu [mailto: > labnetwork-bounces at mtl.mit.edu] *On Behalf Of *A. William (Bill) FLOUNDERS > *Sent:* Thursday, November 29, 2018 12:29 PM > *To:* Fab Network > *Subject:* [labnetwork] Bonding Wire Suppliers > > > > I am seeking suppliers of Al and Au bond wire. > > Thank you in advance for any recommendations. > > Bill Flounders > > UC Berkeley Marvell NanoLab > -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Fri Nov 30 11:17:02 2018 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Fri, 30 Nov 2018 16:17:02 +0000 Subject: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? Message-ID: Other than Foss Industries and PTB Sales are there recommendations for places that are familiar and may be able to repair the Leybold MAG.DRIVE 1000 Turbo Controller? Cheers! Julia Aebersold Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From lambdaconsulting at comcast.net Fri Nov 30 11:24:05 2018 From: lambdaconsulting at comcast.net (JOHN HAGOPIAN) Date: Fri, 30 Nov 2018 11:24:05 -0500 (EST) Subject: [labnetwork] PECVD Message-ID: <830340248.836858.1543595046276@connect.xfinity.com> Looking for advice on use of PECVD for nanotube growth.. I have a tube furnace and purchased a RF generator and coil from a Chinese company that has provided little to no documentation or support on the equipment. It turns out they pretty much cloned another manufacturers hardware without some of the safety features. This is the company's website. My advice is to steer clear of them... That being said does anyone have their PECVD system, they claimed to have sold them to several universities. Thanks John -------------- next part -------------- An HTML attachment was scrubbed... URL: From spaolini at cns.fas.harvard.edu Fri Nov 30 11:55:00 2018 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Fri, 30 Nov 2018 16:55:00 +0000 Subject: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? In-Reply-To: References: Message-ID: Julia, Try Turbovac in Florida. We have very good luck with them. Steve ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Aebersold,Julia W. Sent: Friday, November 30, 2018 12:17 PM To: Fab Network Subject: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? Other than Foss Industries and PTB Sales are there recommendations for places that are familiar and may be able to repair the Leybold MAG.DRIVE 1000 Turbo Controller? Cheers! Julia Aebersold Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From ahryciw at ualberta.ca Fri Nov 30 12:11:24 2018 From: ahryciw at ualberta.ca (Aaron Hryciw) Date: Fri, 30 Nov 2018 10:11:24 -0700 Subject: [labnetwork] Advanced lithography position at U Alberta nanoFAB Centre Message-ID: Dear colleagues, The University of Alberta nanoFAB is seeking to fill an Applications/Research Specialist role within its Fabrication group, with the principal duties including user training and process development in advanced lithography techniques. This position will have a primary expertise in optical, direct-write, electron-beam, and two-photon lithography, with a proven and strong background in 2D/3D pattern design/manipulation and modelling. A secondary expertise of physical and chemical vapour deposition, wet chemical processing, plasma etching, and related ancillary characterization tools will be considered an asset. For more information or to apply, please refer to the Careers @ U of A website, Competition #S107437717 . Please forward this career opportunity to any qualified individuals you feel would be interested. Many thanks. Cheers, ? Aaron Aaron Hryciw, PhD, PEng Fabrication Group Manager University of Alberta - nanoFAB W1-060 ECERF Building 9107 - 116 Street Edmonton, Alberta Canada T6G 2V4 Ph: 780-940-7938 www.nanofab.ualberta.ca -------------- next part -------------- An HTML attachment was scrubbed... URL: From spritchett at eng.utah.edu Fri Nov 30 13:24:47 2018 From: spritchett at eng.utah.edu (Steve Pritchett) Date: Fri, 30 Nov 2018 12:24:47 -0600 Subject: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? Message-ID: Hi Julia, For my failure condition ?ext.15/24V short? , TCS has had ~ 30% chance of repairing these. I?m sending mine today and hoping we?ll get lucky. Contact Dave Gardner Texas Capitol Semiconductor 110 S. Southgate Drive Suite 1 Chandler, AZ 85226 480-834-3000 Good luck, Steve From: "Aebersold,Julia W." Date: Friday, November 30, 2018 at 10:17 AM To: Fab Network Subject: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? Other than Foss Industries and PTB Sales are there recommendations for places that are familiar and may be able to repair the Leybold MAG.DRIVE 1000 Turbo Controller? Cheers! Julia Aebersold Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From Rob.Breisch at trilliumsubfab.com Fri Nov 30 14:54:39 2018 From: Rob.Breisch at trilliumsubfab.com (Rob Breisch) Date: Fri, 30 Nov 2018 19:54:39 +0000 Subject: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? In-Reply-To: References: Message-ID: <9973C6784F21124B9C9CD4FD39EA8D84A4A81F06@MAIL02.trilliumsubfab.com> Julia - We don't repair them, but I do have customers that have us send their Leybold turbos and controllers to Leybold directly. We've not had any complaints with their service. I am just not certain if they still service this controller - but I would be happy to find out for you. Regards, Rob Breisch Vice President, Sales and Marketing [email logo 3] Trillium US, Inc. My Direct: 801-416-0827 My Mobile: 801-726-5035 Trillium Toll Free: 800-453-1340 Email: rob.breisch at trilliumus.com WebSite: www.trilliumus.com Follow Trillium on LinkedIn This transmission is intended for the named addressee(s) only and may contain confidential and privileged information. Reading, copying or disseminating this transmission by anyone other than the named addressee(s) is strictly prohibited. If you have received this message in error, please notify us immediately by reply e-mail or phone at (503) 682-3837. From: labnetwork-bounces at mtl.mit.edu On Behalf Of Aebersold,Julia W. Sent: Friday, November 30, 2018 9:17 AM To: Fab Network Subject: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? Other than Foss Industries and PTB Sales are there recommendations for places that are familiar and may be able to repair the Leybold MAG.DRIVE 1000 Turbo Controller? Cheers! Julia Aebersold Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 7265 bytes Desc: image001.png URL: From kurt.kupcho at wisc.edu Fri Nov 30 15:58:03 2018 From: kurt.kupcho at wisc.edu (Kurt Kupcho) Date: Fri, 30 Nov 2018 20:58:03 +0000 Subject: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? In-Reply-To: <9973C6784F21124B9C9CD4FD39EA8D84A4A81F06@MAIL02.trilliumsubfab.com> References: <9973C6784F21124B9C9CD4FD39EA8D84A4A81F06@MAIL02.trilliumsubfab.com> Message-ID: Leybold wont support any of their older turbos or controllers, which is why Mag 900CT and Mag 1000 controllers are always being discussed. --------------------------------------------------- Kurt Kupcho Process Engineer/Safety Officer NFC 1550 Engineering Drive ECB Room 3110 Madison, WI 53706 E: kurt.kupcho at wisc.edu T: 608-262-2982 [Nano-Fab_color-flush] From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Rob Breisch Sent: Friday, November 30, 2018 1:55 PM To: Aebersold,Julia W.; Fab Network Subject: Re: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? Julia - We don't repair them, but I do have customers that have us send their Leybold turbos and controllers to Leybold directly. We've not had any complaints with their service. I am just not certain if they still service this controller - but I would be happy to find out for you. Regards, Rob Breisch Vice President, Sales and Marketing [email logo 3] Trillium US, Inc. My Direct: 801-416-0827 My Mobile: 801-726-5035 Trillium Toll Free: 800-453-1340 Email: rob.breisch at trilliumus.com WebSite: www.trilliumus.com Follow Trillium on LinkedIn This transmission is intended for the named addressee(s) only and may contain confidential and privileged information. Reading, copying or disseminating this transmission by anyone other than the named addressee(s) is strictly prohibited. If you have received this message in error, please notify us immediately by reply e-mail or phone at (503) 682-3837. From: labnetwork-bounces at mtl.mit.edu On Behalf Of Aebersold,Julia W. Sent: Friday, November 30, 2018 9:17 AM To: Fab Network Subject: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? Other than Foss Industries and PTB Sales are there recommendations for places that are familiar and may be able to repair the Leybold MAG.DRIVE 1000 Turbo Controller? Cheers! Julia Aebersold Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 39543 bytes Desc: image002.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.png Type: image/png Size: 7265 bytes Desc: image003.png URL: From kurt.kupcho at wisc.edu Fri Nov 30 15:56:47 2018 From: kurt.kupcho at wisc.edu (Kurt Kupcho) Date: Fri, 30 Nov 2018 20:56:47 +0000 Subject: [labnetwork] dicing III-V materials Message-ID: Hi all We have a few dicing saws here that we are starting to get requests for dicing materials like InAs, InP, InGaAsP, etc. My question is about safety during dicing, like worries about airborne particles being breathed in. Our saws have water spray and exhaust to mitigate this but normally meant for Si is this sufficient for the III-V materials as well? My other question is the waste water with wafer dust. If you do allow dicing of these III-V materials what do you do if anything about the water with wafer dust going down the drain? Anything? Some sort of trap? Your responses are much appreciated! Thank you - Kurt --------------------------------------------------- Kurt Kupcho Process Engineer/Safety Officer NFC 1550 Engineering Drive ECB Room 3110 Madison, WI 53706 E: kurt.kupcho at wisc.edu T: 608-262-2982 [Nano-Fab_color-flush] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 39543 bytes Desc: image001.png URL: From julia.aebersold at louisville.edu Fri Nov 30 17:15:28 2018 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Fri, 30 Nov 2018 22:15:28 +0000 Subject: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? In-Reply-To: References: <9973C6784F21124B9C9CD4FD39EA8D84A4A81F06@MAIL02.trilliumsubfab.com> Message-ID: Yup. What Kurt said. Cheers! Julia Aebersold Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ From: Kurt Kupcho [mailto:kurt.kupcho at wisc.edu] Sent: Friday, November 30, 2018 3:58 PM To: Rob Breisch ; Aebersold,Julia W. ; Fab Network Subject: RE: Repair of Leybold MAG.DRIVE 1000 Turbo Controller? Leybold wont support any of their older turbos or controllers, which is why Mag 900CT and Mag 1000 controllers are always being discussed. --------------------------------------------------- Kurt Kupcho Process Engineer/Safety Officer NFC 1550 Engineering Drive ECB Room 3110 Madison, WI 53706 E: kurt.kupcho at wisc.edu T: 608-262-2982 [Nano-Fab_color-flush] From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Rob Breisch Sent: Friday, November 30, 2018 1:55 PM To: Aebersold,Julia W.; Fab Network Subject: Re: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? Julia - We don't repair them, but I do have customers that have us send their Leybold turbos and controllers to Leybold directly. We've not had any complaints with their service. I am just not certain if they still service this controller - but I would be happy to find out for you. Regards, Rob Breisch Vice President, Sales and Marketing [email logo 3] Trillium US, Inc. My Direct: 801-416-0827 My Mobile: 801-726-5035 Trillium Toll Free: 800-453-1340 Email: rob.breisch at trilliumus.com WebSite: www.trilliumus.com Follow Trillium on LinkedIn This transmission is intended for the named addressee(s) only and may contain confidential and privileged information. Reading, copying or disseminating this transmission by anyone other than the named addressee(s) is strictly prohibited. If you have received this message in error, please notify us immediately by reply e-mail or phone at (503) 682-3837. From: labnetwork-bounces at mtl.mit.edu > On Behalf Of Aebersold,Julia W. Sent: Friday, November 30, 2018 9:17 AM To: Fab Network > Subject: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? Other than Foss Industries and PTB Sales are there recommendations for places that are familiar and may be able to repair the Leybold MAG.DRIVE 1000 Turbo Controller? Cheers! Julia Aebersold Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 39543 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 7265 bytes Desc: image002.png URL: From spritchett at eng.utah.edu Fri Nov 30 16:54:52 2018 From: spritchett at eng.utah.edu (Steve Pritchett) Date: Fri, 30 Nov 2018 15:54:52 -0600 Subject: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? Message-ID: Hi Rob, I can save you the trouble. Leybold replied to me that they no longer attempt repairs on Mag Drive 1000 of the Mag 900CT, no more parts either. Best regards, Steve Pritchett Utah nanofab From: Rob Breisch Date: Friday, November 30, 2018 at 1:54 PM To: "Aebersold,Julia W." , Fab Network Subject: Re: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? Julia ? We don?t repair them, but I do have customers that have us send their Leybold turbos and controllers to Leybold directly. We?ve not had any complaints with their service. I am just not certain if they still service this controller ? but I would be happy to find out for you. Regards, Rob Breisch Vice President, Sales and Marketing Trillium US, Inc. My Direct: 801-416-0827 My Mobile: 801-726-5035 Trillium Toll Free: 800-453-1340 Email: rob.breisch at trilliumus.com WebSite: www.trilliumus.com Follow Trillium on LinkedIn This transmission is intended for the named addressee(s) only and may contain confidential and privileged information. Reading, copying or disseminating this transmission by anyone other than the named addressee(s) is strictly prohibited. If you have received this message in error, please notify us immediately by reply e-mail or phone at (503) 682-3837. From: labnetwork-bounces at mtl.mit.edu On Behalf Of Aebersold,Julia W. Sent: Friday, November 30, 2018 9:17 AM To: Fab Network Subject: [labnetwork] Repair of Leybold MAG.DRIVE 1000 Turbo Controller? Other than Foss Industries and PTB Sales are there recommendations for places that are familiar and may be able to repair the Leybold MAG.DRIVE 1000 Turbo Controller? Cheers! Julia Aebersold Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 7265 bytes Desc: not available URL: From fouad.karouta at anu.edu.au Fri Nov 30 20:10:14 2018 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Sat, 1 Dec 2018 01:10:14 +0000 Subject: [labnetwork] dicing III-V materials In-Reply-To: References: Message-ID: Hi Kurt, You should consider having a kind of filter and treat the solid waste as hazardous and dispose off correctly. Note III-V are easy to cleave hence am not sure the reason behind to use a diving saw. Best regards Fouad Karouta On 1 Dec 2018, at 11:59 am, Kurt Kupcho > wrote: Hi all We have a few dicing saws here that we are starting to get requests for dicing materials like InAs, InP, InGaAsP, etc. My question is about safety during dicing, like worries about airborne particles being breathed in. Our saws have water spray and exhaust to mitigate this but normally meant for Si is this sufficient for the III-V materials as well? My other question is the waste water with wafer dust. If you do allow dicing of these III-V materials what do you do if anything about the water with wafer dust going down the drain? Anything? Some sort of trap? Your responses are much appreciated! Thank you - Kurt --------------------------------------------------- Kurt Kupcho Process Engineer/Safety Officer NFC 1550 Engineering Drive ECB Room 3110 Madison, WI 53706 E: kurt.kupcho at wisc.edu T: 608-262-2982 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 39543 bytes Desc: image001.png URL: