[labnetwork] ALD process for ZnO?

[Rinehart, Sean]

Hi Tim,

We haven't grown ZnO in our systems, but it's come up before. Something to keep in mind with DEZ (Diethylzinc) based ZnO deposition is its incompatibility with TMA (Trimethyl Aluminum) based Al2O3. TMA can react with ZnO films to form DEZ, and DEZ can react with Al2O3 to form triethyl aluminum. Both of these byproducts are going to affect your intended results. If you run both processes in the same system you'll want to insulate the two films with a few 10s of nms of something that doesn't react with alkyl ligand precursors, e.g., HfO2.

Hope this helps!

Sean Rinehart
Assistant Director, Cleanroom Operations
Yale University
203 432 4303

-----Original Message-----
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> On Behalf Of Tim Gilheart
Sent: Wednesday, August 21, 2019 2:50 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] ALD process for ZnO?

Greetings all,

We’re working with some of our users who may need to explore ZnO deposition, ideally at lower temperatures (100 C or less). 

We’re not equipped to do this on any of our PVD systems without inviting other problems, but we understand that several teams on this list have reported accomplishing this via ALD.

If anyone has suggestions, process notes, and/or cautionary tales, we’d appreciate hearing your perspective.

Thanks,

--
Tim Gilheart, Ph.D.
Research Scientist - Nanofabrication Cleanroom Manager, Shared Equipment Authority (SEA), Rice University
Office: 713-348-3159 | gilheart at rice.edu


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