[labnetwork] Metallization on rough ceramic substrates

[sangeeth kallatt]

Hi ADITHI,
Could you please describe a little what exactly the problem is?
Do you face delamination of metal?
What is the technique used for deposition?


On Fri, Jan 4, 2019 at 10:12 PM Hitesh Kamble <hit.kamble at gmail.com> wrote:

> Hello Adithi,
>  In case of HMDS ,it will improve adhesion but resists will not remove
> easily from surafce.HMDS is mostly use in etching. Since you're having
> rough surface, Instead of HMDS use LOR 3B or say liftOFF resists which
> helps to improve liftoff process.
> Also for 250nm metallization you need more than 2um thick resists.
>
> We did not do this on ceramic samples exactly but successfully did liftoff
> on etched/textured glass and etched samples(roughness more than~400nm).
> Following are my suggestions:
> -Time  Interval between litho and deposition should be lowest as possible
> - Dehydration at higher temp and for longer time.
> -LOR 3B coating at lower rpm and gradually increase rpm.
> -Keep sample in Remover PG and heat at 80C for 5min or more if metal not
> lifted,(Sonication not recquired in most cases)
>
>
> Thanks,
> Hitesh Kamble
> IITBNF-IIT Bombay
>
>
>
> On Fri 4 Jan, 2019, 6:08 PM ADITHI U <uadithi at iisc.ac.in wrote:
>
>> Dear All,
>>
>>
>>       We are having difficulties in doing metal(Ti/Pt) lift off on
>> ceramic substrates. Does any of you have experience on fabricating metal
>> patterns on the rough Ceramic Substrates. Below are the details of the
>> process done.
>>
>>
>>    The roughness of the ceramic substrates were approximately 400nm. We
>> had used HMDS as adhesion promoter for lithography, the thickness of the
>> Photoresist was ~ 1.5um.The thickness of the Ti/Pt layer was ~ 250nm.
>> Immediately after lithography the deposition was done  followed by 48 hours
>> of lift off(Acetone) process. Ultrasonication(5-10mins) in Acetone was done
>> after 48hours.
>>
>>
>> *Best Regards*
>>
>>
>>
>>
>>
>>
>> *Adithi.USenior Facility Technologist,National Nano Fabrication Centre,CeNSE, Indian Institute of ScienceBangalore*
>>
>>
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-- 
Sangeeth Kallatt
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