From grallion at ncsu.edu  Mon Jun  3 08:35:38 2019
From: grallion at ncsu.edu (Greg Allion)
Date: Mon, 3 Jun 2019 08:35:38 -0400
Subject: [labnetwork] Gold Deposition over Chrome
In-Reply-To: <1a80dabc-cfb9-aa23-6958-7d0e9da2a40b@4dlabs.ca>
References: <CACVEG9hTnddxSNkTLHiNnoRpRaHqU4K4Ef-jsWTegMGi_vz4Ew@mail.gmail.com>
 <847898314bf749a3aa68c76b6d1b8db0@draper.com>
 <1a80dabc-cfb9-aa23-6958-7d0e9da2a40b@4dlabs.ca>
Message-ID: <CAAFf2sDiiS0jrsMUuM-uCSJfuFY_nQ3YJyrcxovZrDoLxzX64w@mail.gmail.com>

Maybe I'm not understanding your process correctly, but couldn't you just
write the mask inverted, develop, evaporate your Au, lift-off, then Cr
etch?  The Au will act as a your mask then for the Ctr etch.
-Greg

On Fri, May 31, 2019 at 7:37 PM Nathanael Sieb <sieb at 4dlabs.ca> wrote:

> A similar interesting idea might be to use a fluoro-silane to make a
> fluorinated surface in the glass areas.  I've never tried it before for
> this application, but it might work.
>
> Thanks,
>
> Nathanael
> On 2019-05-31 3:40 a.m., Morrison, Richard H., Jr wrote:
>
> Here?s a crazy idea try vapor HMDS, it will react with the glass but not
> the Chrome and it might help. Gold does not really like to stick to glass
> how thick is the film?
>
>
>
> Rick
>
>
>
>
>
>
>
> *From:* labnetwork-bounces at mtl.mit.edu [
> mailto:labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu>] *On
> Behalf Of *Jim Carroll
> *Sent:* Thursday, May 30, 2019 4:24 PM
> *To:* labnetwork at mtl.mit.edu
> *Subject:* [labnetwork] Gold Deposition over Chrome
>
>
>
> Dear LabNetwork colleagues,
>
>
>
> We are trying to add a thin film of gold over patterned chrome on a
> standard photomask using e-beam evaporation.  We want the gold to
> preferentially adhere to the chrome while lifting off the glass.
>
>
> After a few tests, it appears that the gold sticks equally well to both
> the glass and chrome.  Ultrasonic agitation and swabbing do not selectively
> remove the gold from the glass while leaving it on the chrome.  Eventually,
> after enough pressure is applied with a swab, the gold releases from both
> the glass and chrome.
>
>
>
> Does anyone have a suggested approach?
>
>
> Thanks,
>
> Jim Carroll
> *PhotomaskPORTAL*
>
> *We help you make masks*
> (415) 448-6275
>
> ?         [image: Image removed by sender.]
> <http://www.photomaskportal.com>
> ------------------------------
> Notice: This email and any attachments may contain proprietary (Draper
> non-public) and/or export-controlled information of Draper. If you are not
> the intended recipient of this email, please immediately notify the sender
> by replying to this email and immediately destroy all copies of this email.
> ------------------------------
>
> _______________________________________________
> labnetwork mailing listlabnetwork at mtl.mit.eduhttps://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
>
> ------------------------------
> *Nathanael Sieb*
> Director of Operations and Administration
>
> 4D LABS, Simon Fraser University    8888 University Drive, Burnaby, B.C.
> V5A 1S6
>
> E sieb at 4dlabs.ca T 778.782.8084 F 778.782.3765 W www.4dlabs.ca
>
> <https://www.4dlabs.ca> <https://www.linkedin.com/company/sfu-4d-labs>
> <https://twitter.com/4D_LABS> <https://www.facebook.com/4dlabs>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From rosendo.bindoy at kaust.edu.sa  Mon Jun  3 09:58:56 2019
From: rosendo.bindoy at kaust.edu.sa (Rosendo Bindoy)
Date: Mon, 3 Jun 2019 13:58:56 +0000
Subject: [labnetwork] Manual Spin/Rinse/Dryer from MicroProcess Technologies
Message-ID: <9AAB50C9-F068-4D8B-AC3F-2FF3EE83A739@kaust.edu.sa>

Hello Everyone,

I?m looking for a service manual of a Spin/Rinse/Dryer (8800SRD) from MicroProcess Technologies. Can somebody with a kind heart share a copy of it.

Regards,

Rosendo M. Bindoy
Equipment Engineer
Nanofabrication Core Lab
Ibn Sina Bldg. 3 (Sea Side), Level 0 Room 0252
King Abdullah University of Science and Technology
Phone: +966 12 808 4413  Mobile: +966 54 251 5257
Email: rosendo.bindoy at kaust.edu.sa<mailto:rosendo.bindoy at kaust.edu.sa>

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From yaofootball at gmail.com  Mon Jun  3 10:53:40 2019
From: yaofootball at gmail.com (Football)
Date: Mon, 3 Jun 2019 09:53:40 -0500
Subject: [labnetwork] Research Scientist position available at University of
	Illinois at Urbana-Champaign
Message-ID: <CAOycKMbm0hmqZdrFZ4xEcX-LBtwztEw2bKS9EcNMt9wX84Kunw@mail.gmail.com>

Dear All,

I'm excited to join in the network. I would like to post a Research
Scientist position available in Materials Research laboratory at University
of Illinois at Urbana-Champaign. Please feel free to share the information
to your friends and colleagues. Please find the details about the position
below.


Thanks.
Fubo Rao, Ph.D.,
Research Scientist,
Materials Research Laboratory
University of Illinois at Urbana-Champaign



----------------------------------
Research Scientist
Materials Research Laboratory
University of Illinois at Urbana-Champaign

The Materials Research Laboratory (MRL) at the University of Illinois at
Urbana-Champaign is seeking a highly motivated Research Scientist to
participate and/or actively support research in the areas of x-ray
scattering and cryo-magneto analysis of materials. The Research Scientist
will provide comprehensive technical support and user training for
equipment, procedures, and safety in the broad areas of materials
microanalysis and microfabrication.
The successful candidate will become a member of the dedicated staff of
approximately 20 scientists and engineers, who maintain major research
instruments in the MRL?s core facilities for soft materials
characterization, scanning probe microscopy, laser and optical
spectroscopy, electron microscopy, surface analysis, x-ray diffraction, and
nanofabrication facilities including two cleanrooms. Over 1,000 researchers
from across our campus as well as other academic institutions, industry,
and national laboratories use the facilities, logging more than 100,000
user hours annually. The lab is recognized as one of the premier mid-sized
user facilities in the nation. For details, please visit us online at
https://mrl.illinois.edu/facilities/.
The University of Illinois is an Equal Opportunity, Affirmative Action
employer. Minorities, women, veterans and individuals with disabilities are
encouraged to apply. For more information, visit http://go.illinois.edu/EEO.
Responsibilities include:
? Actively participate in research using x-ray scattering techniques in new
materials, such as ceramics, semiconductor multilayers and super lattices,
polymer and biological materials, etc. The use of new, high-resolution
detector capabilities just added to the x-ray lab will be emphasized. A
second set of responsibilities will involve similar work in the MPMS
(magnetic property measurement system) and PPMS (physical property
measurements systems).
? Prepare and deliver primary and advanced training on the various
techniques and instrumentation available in the x-ray analysis laboratory
such as XRD, SAXS/WAXS, XRF and Laue camera systems, and in the MPMS and
PPMS laboratory in the MRL.
? Formulate, compile and distribute suitable suggestions for documentation
improvements for collective staff scientist review. Incorporate approved
modifications into training documents and procedures.
? Perform routine preventative maintenance tasks which vary among daily,
monthly, and annual basis for assigned laboratory instrumentation. Examples
include daily checks to ensure instruments are running correctly; monthly
proactive checks to ensure no hazards are present (e.g. x-ray enclosure
fail safes are functional); annual maintenance service on vacuum pumps and
supporting mechanical equipment.
? Analyze performance and procedures for assigned equipment during regular
operation and scheduled maintenance routines to determine if modifications
are necessary to improve or augment their reliability, performance, or
capabilities.
? Identify hazards and/or potential failure modes by comparing equipment
usage and performance to establish safety protocols while conducting user
training or performing maintenance. If the equipment is not operating
within tolerances or any engineering safety
controls are malfunctioning, determine corrective actions to hardware,
operating procedures or user training in conjunction with the assigned
staff scientist and implement the changes.
? Perform facility-wide safety tasks as assigned.
? Conduct department or campus specified lab inspections for assigned
operating areas and participate in reviews of non-assigned areas as
requested.
? Assume additional responsibilities to promote the unit?s mission as
needed.
Minimum Qualifications
? Master?s degree in engineering or physical sciences.
? Three years of hands-on laboratory experience via degree coursework or
independent research.
? Three years of instructional/training experience delivering technical
information.
? Two years of experience with x-ray analytical tools.
? Excellent oral and written communication skills.
Preferred Qualifications
? PhD in engineering or physical sciences.
? Experience working in a multi-user academic research facility.
? Familiarity with a wide variety of analytical tools such as XRD, XRF,
SAXS, PPMS and MPMS systems.
? Chemistry background necessary for identifying chemicals for waste
processing.
This is a full-time, benefits-eligible academic professional position
appointed on a 12-month service basis. The expected start date is as soon
as possible. Salary is commensurate with experience and qualifications. To
apply, please complete a candidate profile at http://jobs.illinois.edu and
upload the following as a single file: a cover letter, resume, and the
names and contact information for three professional references. To ensure
full consideration, all requested information must be submitted by July 5,
2019. Applicants may be interviewed before the closing date; however, no
hiring decision will be made until after that date.
For further information regarding application procedures, contact Summer
Redman at sredman at illinois.edu or 217-300-5400.
The University of Illinois conducts criminal background checks on all job
candidates upon acceptance of a contingent offer.
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From jim at photomaskportal.com  Mon Jun  3 17:01:53 2019
From: jim at photomaskportal.com (Jim Carroll)
Date: Mon, 3 Jun 2019 16:01:53 -0500
Subject: [labnetwork] Gold Deposition over Chrome
In-Reply-To: <CAAFf2sDiiS0jrsMUuM-uCSJfuFY_nQ3YJyrcxovZrDoLxzX64w@mail.gmail.com>
References: <CACVEG9hTnddxSNkTLHiNnoRpRaHqU4K4Ef-jsWTegMGi_vz4Ew@mail.gmail.com>
 <847898314bf749a3aa68c76b6d1b8db0@draper.com>
 <1a80dabc-cfb9-aa23-6958-7d0e9da2a40b@4dlabs.ca>
 <CAAFf2sDiiS0jrsMUuM-uCSJfuFY_nQ3YJyrcxovZrDoLxzX64w@mail.gmail.com>
Message-ID: <CACVEG9iocWwe6SrjNY55C0tdgZHGbYosmVh8v9r8bUGQPn7Uug@mail.gmail.com>

Hi Greg,

Thanks, that sounds like a viable option.  In this specific case, since we
already have patterned chrome masks, we're going to try the "?Reverse-side
exposure Lift-Off? process mentioned by Andrei near the beginning of the
thread, plus the addition of an anneal step to punch through the oxide
layer and improve adhesion.

Thanks,
Jim Carroll
*PhotomaskPORTAL*
*We help you make masks*
(415) 448-6275

   -
   <http://www.photomaskportal.com>



On Mon, Jun 3, 2019 at 2:49 PM Greg Allion <grallion at ncsu.edu> wrote:

> Maybe I'm not understanding your process correctly, but couldn't you just
> write the mask inverted, develop, evaporate your Au, lift-off, then Cr
> etch?  The Au will act as a your mask then for the Ctr etch.
> -Greg
>
> On Fri, May 31, 2019 at 7:37 PM Nathanael Sieb <sieb at 4dlabs.ca> wrote:
>
>> A similar interesting idea might be to use a fluoro-silane to make a
>> fluorinated surface in the glass areas.  I've never tried it before for
>> this application, but it might work.
>>
>> Thanks,
>>
>> Nathanael
>> On 2019-05-31 3:40 a.m., Morrison, Richard H., Jr wrote:
>>
>> Here?s a crazy idea try vapor HMDS, it will react with the glass but not
>> the Chrome and it might help. Gold does not really like to stick to glass
>> how thick is the film?
>>
>>
>>
>> Rick
>>
>>
>>
>>
>>
>>
>>
>> *From:* labnetwork-bounces at mtl.mit.edu [
>> mailto:labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu>] *On
>> Behalf Of *Jim Carroll
>> *Sent:* Thursday, May 30, 2019 4:24 PM
>> *To:* labnetwork at mtl.mit.edu
>> *Subject:* [labnetwork] Gold Deposition over Chrome
>>
>>
>>
>> Dear LabNetwork colleagues,
>>
>>
>>
>> We are trying to add a thin film of gold over patterned chrome on a
>> standard photomask using e-beam evaporation.  We want the gold to
>> preferentially adhere to the chrome while lifting off the glass.
>>
>>
>> After a few tests, it appears that the gold sticks equally well to both
>> the glass and chrome.  Ultrasonic agitation and swabbing do not selectively
>> remove the gold from the glass while leaving it on the chrome.  Eventually,
>> after enough pressure is applied with a swab, the gold releases from both
>> the glass and chrome.
>>
>>
>>
>> Does anyone have a suggested approach?
>>
>>
>> Thanks,
>>
>> Jim Carroll
>> *PhotomaskPORTAL*
>>
>> *We help you make masks*
>> (415) 448-6275
>>
>> ?         [image: Image removed by sender.]
>> <http://www.photomaskportal.com>
>> ------------------------------
>> Notice: This email and any attachments may contain proprietary (Draper
>> non-public) and/or export-controlled information of Draper. If you are not
>> the intended recipient of this email, please immediately notify the sender
>> by replying to this email and immediately destroy all copies of this email.
>> ------------------------------
>>
>> _______________________________________________
>> labnetwork mailing listlabnetwork at mtl.mit.eduhttps://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>>
>>
>> ------------------------------
>> *Nathanael Sieb*
>> Director of Operations and Administration
>>
>> 4D LABS, Simon Fraser University    8888 University Drive, Burnaby, B.C.
>> V5A 1S6
>>
>> E sieb at 4dlabs.ca T 778.782.8084 F 778.782.3765 W www.4dlabs.ca
>>
>> <https://www.4dlabs.ca> <https://www.linkedin.com/company/sfu-4d-labs>
>> <https://twitter.com/4D_LABS> <https://www.facebook.com/4dlabs>
>>
>> _______________________________________________
>> labnetwork mailing list
>> labnetwork at mtl.mit.edu
>> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From aandreib at gmail.com  Tue Jun  4 01:48:46 2019
From: aandreib at gmail.com (Andrei Alamariu)
Date: Tue, 4 Jun 2019 01:48:46 -0400
Subject: [labnetwork] Gold Deposition over Chrome
In-Reply-To: <CACVEG9iocWwe6SrjNY55C0tdgZHGbYosmVh8v9r8bUGQPn7Uug@mail.gmail.com>
References: <CACVEG9hTnddxSNkTLHiNnoRpRaHqU4K4Ef-jsWTegMGi_vz4Ew@mail.gmail.com>
 <847898314bf749a3aa68c76b6d1b8db0@draper.com>
 <1a80dabc-cfb9-aa23-6958-7d0e9da2a40b@4dlabs.ca>
 <CAAFf2sDiiS0jrsMUuM-uCSJfuFY_nQ3YJyrcxovZrDoLxzX64w@mail.gmail.com>
 <CACVEG9iocWwe6SrjNY55C0tdgZHGbYosmVh8v9r8bUGQPn7Uug@mail.gmail.com>
Message-ID: <23509478-322C-4475-9F27-4FE3BFE3C260@gmail.com>

Hello Jim,
 
The Gold - Cr2O3 adherence test you had done applying enough pressure with
a swab was very conclusive, and this problem has to be addressed indeed.

I think there are some constraints for heating up a mask plate.
First Cr itself might get Sinter like alloyed with the Glass/Quartz plate, resulting 
a rough top surface (pinholes too) for such a thin 1000A film: as the metal
is ?suck? like in the substrate. The lines edges might get affected.
All these for 15 min at ~ 400-500C : actually it depends on the ?Temperature-Time
budget? 
Au, Cu, Cr, Fe diffuse very fast in Silicon based materials; TiN blocks them/ see
the Damascene process.
Very possible that Au to significantly diffuse in Cr2O3, or other thermal assisted 
enhanced adherence reaction.
You could try to use RTA. 

Second is the mask plate flatness issue.
The Glass plate is safe limited to ~ 490C to minimize the plastic-gravity deformation.
The plate bending due to the metal stress and metal-Glass expansion coefficient 
mismatch might not be a problem as the metal is very thin and is not continuous
being patterned.

Also possible you might think of depositing in-situ Cr & Au, or Cr2O3-Au and see
how it goes cold or after anneal.

Success!
Bernard




Sent from my iPad

> On Jun 3, 2019, at 5:01 PM, Jim Carroll <jim at photomaskportal.com> wrote:
> 
> Hi Greg,
> 
> Thanks, that sounds like a viable option.  In this specific case, since we already have patterned chrome masks, we're going to try the "?Reverse-side exposure Lift-Off? process mentioned by Andrei near the beginning of the thread, plus the addition of an anneal step to punch through the oxide layer and improve adhesion.
> 
> Thanks,
> Jim Carroll
> PhotomaskPORTAL
> We help you make masks
> (415) 448-6275
> 
> 
> 
>> On Mon, Jun 3, 2019 at 2:49 PM Greg Allion <grallion at ncsu.edu> wrote:
>> Maybe I'm not understanding your process correctly, but couldn't you just write the mask inverted, develop, evaporate your Au, lift-off, then Cr etch?  The Au will act as a your mask then for the Ctr etch.
>> -Greg
>> 
>>> On Fri, May 31, 2019 at 7:37 PM Nathanael Sieb <sieb at 4dlabs.ca> wrote:
>>> A similar interesting idea might be to use a fluoro-silane to make a fluorinated surface in the glass areas.  I've never tried it before for this application, but it might work.
>>> Thanks,
>>> 
>>> Nathanael
>>>> On 2019-05-31 3:40 a.m., Morrison, Richard H., Jr wrote:
>>>> Here?s a crazy idea try vapor HMDS, it will react with the glass but not the Chrome and it might help. Gold does not really like to stick to glass how thick is the film?
>>>> 
>>>>  
>>>> 
>>>> Rick
>>>> 
>>>>  
>>>> 
>>>>  
>>>> 
>>>>  
>>>> 
>>>> From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Jim Carroll
>>>> Sent: Thursday, May 30, 2019 4:24 PM
>>>> To: labnetwork at mtl.mit.edu
>>>> Subject: [labnetwork] Gold Deposition over Chrome
>>>> 
>>>>  
>>>> 
>>>> Dear LabNetwork colleagues,
>>>> 
>>>>  
>>>> 
>>>> We are trying to add a thin film of gold over patterned chrome on a standard photomask using e-beam evaporation.  We want the gold to preferentially adhere to the chrome while lifting off the glass.
>>>> 
>>>> 
>>>> After a few tests, it appears that the gold sticks equally well to both the glass and chrome.  Ultrasonic agitation and swabbing do not selectively remove the gold from the glass while leaving it on the chrome.  Eventually, after enough pressure is applied with a swab, the gold releases from both the glass and chrome.  
>>>> 
>>>>  
>>>> 
>>>> Does anyone have a suggested approach?
>>>>  
>>>> 
>>>> Thanks,
>>>> 
>>>> Jim Carroll
>>>> PhotomaskPORTAL
>>>> 
>>>> We help you make masks
>>>> (415) 448-6275
>>>> 
>>>> ?         <image001.jpg>
>>>> 
>>>> Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
>>>> 
>>>> 
>>>> _______________________________________________
>>>> labnetwork mailing list
>>>> labnetwork at mtl.mit.edu
>>>> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>>> 
>>> Nathanael Sieb
>>> Director of Operations and Administration
>>> 4D LABS, Simon Fraser University    8888 University Drive, Burnaby, B.C. V5A 1S6
>>> E sieb at 4dlabs.ca T 778.782.8084 F 778.782.3765 W www.4dlabs.ca
>>>        
>>> 
>>> _______________________________________________
>>> labnetwork mailing list
>>> labnetwork at mtl.mit.edu
>>> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>> _______________________________________________
>> labnetwork mailing list
>> labnetwork at mtl.mit.edu
>> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From skooi at mit.edu  Tue Jun  4 09:00:23 2019
From: skooi at mit.edu (Steven Earl Kooi)
Date: Tue, 4 Jun 2019 13:00:23 +0000
Subject: [labnetwork] Job posting - Electron and Surface Microscopy
 Instrumentation Specialist @ MIT
Message-ID: <EE12FB17-2292-40A7-908C-4BCD92695B40@mit.edu>

Hello,

The Institute for Soldier Nanotechnologies (ISN) at MIT has an open position for an "Electron and Surface Microscopy Instrumentation Specialist?

The candidate will be responsible for user training, operation, and maintenance of our SEMs and selected other research instruments at the ISN research facility.  Responsibilities include providing one-on-one and group training for a variety of instruments, maintaining/troubleshooting research instrumentation including simple repairs, cleanings, routine calibrations, etc., and working with vendors to schedule more complex repairs/maintenance.  The candidate should also be interested in learning new techniques and expanding their expertise as additional equipment is added to the facility.

Anyone interested can find out more about the position and apply at:

https://careers.peopleclick.com/careerscp/client_mit/external/jobDetails/jobDetail.html?jobPostId=14851&localeCode=en-us


Best,

Steve.

Steven Kooi, Ph.D.
Principal Research Scientist
Institute for Soldier Nanotechnologies
Massachusetts Institute of Technology

Phone: 617-324-6416
Fax: 617-253-5859
Email: skooi at mit.edu<mailto:skooi at mit.edu>
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From rmorrison at draper.com  Tue Jun  4 10:25:10 2019
From: rmorrison at draper.com (Morrison, Richard H., Jr)
Date: Tue, 4 Jun 2019 14:25:10 +0000
Subject: [labnetwork] DI water Question
Message-ID: <660fc24b98d04c11a9310ba47810cc25@draper.com>

Hi,

I have a question about Chloride in DI water, the E1 water spec states 0.1ppm for Chlorides, have any of your operations monitor for this?

I had a test done and my6 redcir tank is 10ppm and the RO output is 25 these seem high to me, any data out there

Rick


Richard H. Morrison
Principal Member of the Technical Staff
Draper
555 Technology Square
Cambridge, MA
02139-3573

Work  617-258-3420
Cell  508-930-3461
www.draper.com<http://www.draper.com>

________________________________
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
________________________________
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From lrehn at tamu.edu  Tue Jun  4 15:39:02 2019
From: lrehn at tamu.edu (Rehn, Larry A)
Date: Tue, 4 Jun 2019 19:39:02 +0000
Subject: [labnetwork] DI water Question
In-Reply-To: <660fc24b98d04c11a9310ba47810cc25@draper.com>
References: <660fc24b98d04c11a9310ba47810cc25@draper.com>
Message-ID: <b8c20d9719b24a31a67a0d7d4836a84c@tamu.edu>

Hello Richard,

We recently had our DI system sanitized by our service provider with a chlorine treatment.  They used a chlorine color drop test indicator to determine that the chlorine was present at all drops in our system, and then later to determine that it was rinsed to around < 1ppm.  After that I was told that the DI resin beds would continue to remove remaining chlorine as indicated by the resistivity getting back into the Mohm range.  We experienced a gradual climb in DI resistivity from about 15Mohm up.  Our service provider offered the following explanation (of why it did not immediately climb back to 18Mohm), which might be useful to answer your question about chlorine.  The numbers he mentions refers to data in the attachment.

....Usually, it means that a longer rinse should have been done on the regeneration, meaning that a very slight amount of regenerant hasn't been fully rinsed out. I've attached one for the purpose of explanation. Six Megohm is equal to 83 ppb and eight megohm is equal to 63 ppb, so we're talking about t 20 ppb difference overnight. The difference between 14 megohm and 16 megohm is only 5ppb. I honestly believe that the quality will continue to climb very slowly and reach it's highest quality in the course of a few days. I've just seen this scenario too many times over the 30 plus years I've been working with high purity water.

FYI: When we regenerate the resin in our shop, we recirculate DI water for typically 24-48 hours through the separately regenerated cation and anion beds before we achieve the quality we desire, prior to mixing it. I suspect very strongly that a batch didn't get fully rinsed. Going back to the paragraph above, it comes down to ppb levels of regenerants (HCl and NaOH) that haven't been fully removed through the resin. If you consume water throughout the day (which in essence is the same as rinsing), along with constant recirculation, I truly believe the quality will climb.

So, my interpretation is that maintaining high DI resistivity essentially guarantees that you will not have much chlorine in your water.  Therefore, there may not be a need to make a separate measurement for Cl-.

I agree that the ppm numbers you cite below seem high.  Maybe I am missing something.

Regards,
Larry A Rehn
Technical Lab Manager
AggieFab Nanofabrication Facility
Texas A&M University
979 845-3199
lrehn at tamu.edu<mailto:lrehn at tamu.edu>
[cid:image001.jpg at 01CEC37D.FAF8C9E0]



From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Morrison, Richard H., Jr
Sent: Tuesday, June 04, 2019 9:25 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] DI water Question

Hi,

I have a question about Chloride in DI water, the E1 water spec states 0.1ppm for Chlorides, have any of your operations monitor for this?

I had a test done and my6 redcir tank is 10ppm and the RO output is 25 these seem high to me, any data out there

Rick


Richard H. Morrison
Principal Member of the Technical Staff
Draper
555 Technology Square
Cambridge, MA
02139-3573

Work  617-258-3420
Cell  508-930-3461
www.draper.com<https://urldefense.proofpoint.com/v2/url?u=http-3A__www.draper.com&d=DwMFAg&c=ODFT-G5SujMiGrKuoJJjVg&r=viXbs6wGaGZ-o2y0LFbqZrWN_jy4Cw47zl8d3Wrr2M4&m=uLNn-r8zP-kxERCwIPXndhVVF0pihv0wAkHwnqmnSrY&s=1i1iCz-M3loX7C-Ak-x1sUCzjWrMQDtWIxVjSkL-vsg&e=>

________________________________
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
________________________________
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From lrehn at tamu.edu  Tue Jun  4 16:06:27 2019
From: lrehn at tamu.edu (Rehn, Larry A)
Date: Tue, 4 Jun 2019 20:06:27 +0000
Subject: [labnetwork] Name Tags on Cleanroom Gowns
Message-ID: <20c22f9e607b4948b2390b603cc67779@tamu.edu>

All,

Do you have a good method to attach name tags for users in your labs?  We have standard bunny suit garments with no pockets or loops.  We use plastic name tag holders with the metal clips, but these seem to fall off rather easily when stored on hangars of the gowning racks.

Best regards,
Larry A Rehn
Technical Lab Manager
AggieFab Nanofabrication Facility
Texas A&M University
979 845-3199
lrehn at tamu.edu<mailto:lrehn at tamu.edu>
[cid:image001.jpg at 01CEC37D.FAF8C9E0]


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From rmorrison at draper.com  Wed Jun  5 12:59:44 2019
From: rmorrison at draper.com (Morrison, Richard H., Jr)
Date: Wed, 5 Jun 2019 16:59:44 +0000
Subject: [labnetwork] DI water Question
In-Reply-To: <b8c20d9719b24a31a67a0d7d4836a84c@tamu.edu>
References: <660fc24b98d04c11a9310ba47810cc25@draper.com>
 <b8c20d9719b24a31a67a0d7d4836a84c@tamu.edu>
Message-ID: <0717924438984df883e708fed53c9b7d@draper.com>

I just had the annual PM done I will look at the DI mixed bed rinsing.

Rick


From: Rehn, Larry A [mailto:lrehn at tamu.edu]
Sent: Tuesday, June 04, 2019 3:39 PM
To: Morrison, Richard H., Jr <rmorrison at draper.com>; labnetwork at mtl.mit.edu
Subject: RE: DI water Question

Hello Richard,

We recently had our DI system sanitized by our service provider with a chlorine treatment.  They used a chlorine color drop test indicator to determine that the chlorine was present at all drops in our system, and then later to determine that it was rinsed to around < 1ppm.  After that I was told that the DI resin beds would continue to remove remaining chlorine as indicated by the resistivity getting back into the Mohm range.  We experienced a gradual climb in DI resistivity from about 15Mohm up.  Our service provider offered the following explanation (of why it did not immediately climb back to 18Mohm), which might be useful to answer your question about chlorine.  The numbers he mentions refers to data in the attachment.

....Usually, it means that a longer rinse should have been done on the regeneration, meaning that a very slight amount of regenerant hasn't been fully rinsed out. I've attached one for the purpose of explanation. Six Megohm is equal to 83 ppb and eight megohm is equal to 63 ppb, so we're talking about t 20 ppb difference overnight. The difference between 14 megohm and 16 megohm is only 5ppb. I honestly believe that the quality will continue to climb very slowly and reach it's highest quality in the course of a few days. I've just seen this scenario too many times over the 30 plus years I've been working with high purity water.

FYI: When we regenerate the resin in our shop, we recirculate DI water for typically 24-48 hours through the separately regenerated cation and anion beds before we achieve the quality we desire, prior to mixing it. I suspect very strongly that a batch didn't get fully rinsed. Going back to the paragraph above, it comes down to ppb levels of regenerants (HCl and NaOH) that haven't been fully removed through the resin. If you consume water throughout the day (which in essence is the same as rinsing), along with constant recirculation, I truly believe the quality will climb.

So, my interpretation is that maintaining high DI resistivity essentially guarantees that you will not have much chlorine in your water.  Therefore, there may not be a need to make a separate measurement for Cl-.

I agree that the ppm numbers you cite below seem high.  Maybe I am missing something.

Regards,
Larry A Rehn
Technical Lab Manager
AggieFab Nanofabrication Facility
Texas A&M University
979 845-3199
lrehn at tamu.edu<mailto:lrehn at tamu.edu>
[cid:image001.jpg at 01CEC37D.FAF8C9E0]



From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Morrison, Richard H., Jr
Sent: Tuesday, June 04, 2019 9:25 AM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] DI water Question

Hi,

I have a question about Chloride in DI water, the E1 water spec states 0.1ppm for Chlorides, have any of your operations monitor for this?

I had a test done and my6 redcir tank is 10ppm and the RO output is 25 these seem high to me, any data out there

Rick


Richard H. Morrison
Principal Member of the Technical Staff
Draper
555 Technology Square
Cambridge, MA
02139-3573

Work  617-258-3420
Cell  508-930-3461
www.draper.com<https://urldefense.proofpoint.com/v2/url?u=http-3A__www.draper.com&d=DwMFAg&c=ODFT-G5SujMiGrKuoJJjVg&r=viXbs6wGaGZ-o2y0LFbqZrWN_jy4Cw47zl8d3Wrr2M4&m=uLNn-r8zP-kxERCwIPXndhVVF0pihv0wAkHwnqmnSrY&s=1i1iCz-M3loX7C-Ak-x1sUCzjWrMQDtWIxVjSkL-vsg&e=>

________________________________
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
________________________________
________________________________
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
________________________________
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From dlafleur at cns.fas.harvard.edu  Wed Jun  5 13:50:18 2019
From: dlafleur at cns.fas.harvard.edu (LaFleur, David W)
Date: Wed, 5 Jun 2019 17:50:18 +0000
Subject: [labnetwork] Name Tags on Cleanroom Gowns
Message-ID: <8AAA62CE-8360-463D-AEE6-495CBA530BE3@cns.fas.harvard.edu>

Hi Larry,

Rare earth magnets work well. Metal strip on the tag and magnets inside the garment.

Best Regards,

Dave LaFleur
Harvard CNS


[cid:image001.jpg at 01D51BA5.9CB94900]

From: "labnetwork-bounces at mtl.mit.edu" <labnetwork-bounces at mtl.mit.edu> on behalf of "Rehn, Larry A" <lrehn at tamu.edu>
Date: Tuesday, June 4, 2019 at 4:06 PM
To: "labnetwork at mtl.mit.edu" <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Name Tags on Cleanroom Gowns

All,

Do you have a good method to attach name tags for users in your labs?  We have standard bunny suit garments with no pockets or loops.  We use plastic name tag holders with the metal clips, but these seem to fall off rather easily when stored on hangars of the gowning racks.

Best regards,
Larry A Rehn
Technical Lab Manager
AggieFab Nanofabrication Facility
Texas A&M University
979 845-3199
lrehn at tamu.edu<mailto:lrehn at tamu.edu>
[id:image001.jpg at 01CEC37D.FAF8C9E0]


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From lrehn at tamu.edu  Wed Jun  5 14:20:00 2019
From: lrehn at tamu.edu (Rehn, Larry A)
Date: Wed, 5 Jun 2019 18:20:00 +0000
Subject: [labnetwork] DI water Question
In-Reply-To: <0717924438984df883e708fed53c9b7d@draper.com>
References: <660fc24b98d04c11a9310ba47810cc25@draper.com>
 <b8c20d9719b24a31a67a0d7d4836a84c@tamu.edu>
 <0717924438984df883e708fed53c9b7d@draper.com>
Message-ID: <8a3e355cb844453db7d78ea70a7ed482@tamu.edu>

You might be seeing the same thing as we are experiencing.  I am still at about 17.5 Mohm and it has been about 2 weeks since they changed out every DI resin bed.  But it continues to climb back to the normal 18 Mohm ever so slowly.

Larry

From: Morrison, Richard H., Jr [mailto:rmorrison at draper.com]
Sent: Wednesday, June 05, 2019 12:00 PM
To: Rehn, Larry A <lrehn at tamu.edu>; labnetwork at mtl.mit.edu
Subject: RE: DI water Question

I just had the annual PM done I will look at the DI mixed bed rinsing.

Rick


From: Rehn, Larry A [mailto:lrehn at tamu.edu]
Sent: Tuesday, June 04, 2019 3:39 PM
To: Morrison, Richard H., Jr <rmorrison at draper.com<mailto:rmorrison at draper.com>>; labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: RE: DI water Question

Hello Richard,

We recently had our DI system sanitized by our service provider with a chlorine treatment.  They used a chlorine color drop test indicator to determine that the chlorine was present at all drops in our system, and then later to determine that it was rinsed to around < 1ppm.  After that I was told that the DI resin beds would continue to remove remaining chlorine as indicated by the resistivity getting back into the Mohm range.  We experienced a gradual climb in DI resistivity from about 15Mohm up.  Our service provider offered the following explanation (of why it did not immediately climb back to 18Mohm), which might be useful to answer your question about chlorine.  The numbers he mentions refers to data in the attachment.

....Usually, it means that a longer rinse should have been done on the regeneration, meaning that a very slight amount of regenerant hasn't been fully rinsed out. I've attached one for the purpose of explanation. Six Megohm is equal to 83 ppb and eight megohm is equal to 63 ppb, so we're talking about t 20 ppb difference overnight. The difference between 14 megohm and 16 megohm is only 5ppb. I honestly believe that the quality will continue to climb very slowly and reach it's highest quality in the course of a few days. I've just seen this scenario too many times over the 30 plus years I've been working with high purity water.

FYI: When we regenerate the resin in our shop, we recirculate DI water for typically 24-48 hours through the separately regenerated cation and anion beds before we achieve the quality we desire, prior to mixing it. I suspect very strongly that a batch didn't get fully rinsed. Going back to the paragraph above, it comes down to ppb levels of regenerants (HCl and NaOH) that haven't been fully removed through the resin. If you consume water throughout the day (which in essence is the same as rinsing), along with constant recirculation, I truly believe the quality will climb.

So, my interpretation is that maintaining high DI resistivity essentially guarantees that you will not have much chlorine in your water.  Therefore, there may not be a need to make a separate measurement for Cl-.

I agree that the ppm numbers you cite below seem high.  Maybe I am missing something.

Regards,
Larry A Rehn
Technical Lab Manager
AggieFab Nanofabrication Facility
Texas A&M University
979 845-3199
lrehn at tamu.edu<mailto:lrehn at tamu.edu>
[cid:image001.jpg at 01CEC37D.FAF8C9E0]



From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Morrison, Richard H., Jr
Sent: Tuesday, June 04, 2019 9:25 AM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] DI water Question

Hi,

I have a question about Chloride in DI water, the E1 water spec states 0.1ppm for Chlorides, have any of your operations monitor for this?

I had a test done and my6 redcir tank is 10ppm and the RO output is 25 these seem high to me, any data out there

Rick


Richard H. Morrison
Principal Member of the Technical Staff
Draper
555 Technology Square
Cambridge, MA
02139-3573

Work  617-258-3420
Cell  508-930-3461
www.draper.com<https://urldefense.proofpoint.com/v2/url?u=http-3A__www.draper.com&d=DwMFAg&c=ODFT-G5SujMiGrKuoJJjVg&r=viXbs6wGaGZ-o2y0LFbqZrWN_jy4Cw47zl8d3Wrr2M4&m=uLNn-r8zP-kxERCwIPXndhVVF0pihv0wAkHwnqmnSrY&s=1i1iCz-M3loX7C-Ak-x1sUCzjWrMQDtWIxVjSkL-vsg&e=>

________________________________
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
________________________________
________________________________
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
________________________________
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From derose at caltech.edu  Wed Jun  5 16:50:27 2019
From: derose at caltech.edu (DeRose, Guy A.)
Date: Wed, 5 Jun 2019 20:50:27 +0000
Subject: [labnetwork] Name Tags on Cleanroom Gowns
In-Reply-To: <8AAA62CE-8360-463D-AEE6-495CBA530BE3@cns.fas.harvard.edu>
References: <8AAA62CE-8360-463D-AEE6-495CBA530BE3@cns.fas.harvard.edu>
Message-ID: <32A1F9F4-32DD-435D-92B3-08F15D67CFC1@caltech.edu>

Hello group,

We don?t put name tags on our garments, but rather on the hangers. We just use a ?P-Touch? labeler to make a tape with the wearer?s name on it and attach it to the neck of the hanger.  It wraps around the hanger wire and sticks to itself, so they know which garments is theirs and where to find it on the garment rack when going in and out of the cleanroom. Maybe this works at Caltech inspired by Sheldon of ?The Big Bang Theory? having his spot.

If you are looking for a solution with names on garments to track people on the cameras, I know of at least one lab at another university that has modified their garments such that a fabric strip with the person?s name is attached with snaps to the back like a sports jersey.

Guy DeRose, PhD, Member of the Professional Staff
Associate Director of Technical Operations, Kavli Nanoscience Institute
California Institute of Technology, Pasadena, CA USA
(O) 1-626-395-3423 (M) 1-626-676-8529
http://kni.caltech.edu

From: <labnetwork-bounces at mtl.mit.edu> on behalf of "LaFleur, David W" <dlafleur at cns.fas.harvard.edu>
Date: Wednesday, June 5, 2019 at 1:08 PM
To: "Rehn, Larry A" <lrehn at tamu.edu>, "labnetwork at mtl.mit.edu" <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Name Tags on Cleanroom Gowns

Hi Larry,

Rare earth magnets work well. Metal strip on the tag and magnets inside the garment.

Best Regards,

Dave LaFleur
Harvard CNS


[cid:image001.jpg at 01D51BA5.9CB94900]

From: "labnetwork-bounces at mtl.mit.edu" <labnetwork-bounces at mtl.mit.edu> on behalf of "Rehn, Larry A" <lrehn at tamu.edu>
Date: Tuesday, June 4, 2019 at 4:06 PM
To: "labnetwork at mtl.mit.edu" <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Name Tags on Cleanroom Gowns

All,

Do you have a good method to attach name tags for users in your labs?  We have standard bunny suit garments with no pockets or loops.  We use plastic name tag holders with the metal clips, but these seem to fall off rather easily when stored on hangars of the gowning racks.

Best regards,
Larry A Rehn
Technical Lab Manager
AggieFab Nanofabrication Facility
Texas A&M University
979 845-3199
lrehn at tamu.edu<mailto:lrehn at tamu.edu>
[id:image001.jpg at 01CEC37D.FAF8C9E0]


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From sguo18 at yorku.ca  Fri Jun  7 12:16:13 2019
From: sguo18 at yorku.ca (Xin (Shane) Guo)
Date: Fri, 7 Jun 2019 16:16:13 +0000
Subject: [labnetwork] special canisters of DES and TEOS for PECVD
Message-ID: <CAKLE_GZSLT2s4V=qY_oLKr_nNC76Ws8Qs5qEd=UvG+Fnczbdmg@mail.gmail.com>

Hi Colleagues,

Does anyone know where to buy stainless steel canisters with control valves to supply DES and TEOS to PECVD? Some vendors sell DES in a bottle which cannot be connected to the PECVD.

Any feedback is highly appreciated!

Best

Shane

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From fnewman at uw.edu  Fri Jun  7 16:22:57 2019
From: fnewman at uw.edu (Fred Newman)
Date: Fri, 7 Jun 2019 13:22:57 -0700
Subject: [labnetwork] special canisters of DES and TEOS for PECVD
In-Reply-To: <CAKLE_GZSLT2s4V=qY_oLKr_nNC76Ws8Qs5qEd=UvG+Fnczbdmg@mail.gmail.com>
References: <CAKLE_GZSLT2s4V=qY_oLKr_nNC76Ws8Qs5qEd=UvG+Fnczbdmg@mail.gmail.com>
Message-ID: <CAHwjARPKkondpkcvLPAiMNTJnGM5e49KRZj+pgxUUj7SDhj2Fw@mail.gmail.com>

Hi Shane,

STREM sells these canisters:  https://www.strem.com/catalog/accessories.php

Best regards
Fred


On Fri, Jun 7, 2019 at 1:18 PM Xin (Shane) Guo <sguo18 at yorku.ca> wrote:

> Hi Colleagues,
>
> Does anyone know where to buy stainless steel canisters with control
> valves to supply DES and TEOS to PECVD? Some vendors sell DES in a bottle
> which cannot be connected to the PECVD.
>
> Any feedback is highly appreciated!
>
> Best
>
> Shane
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>


-- 
Fred Newman
Research Engineer
Washington Nanofabrication Facility (WNF)
University of Washington
Fluke Hall 115, Box 352143
office 206-616-3534
mobile 505-450-4447
fnewman at uw.edu
https://www.wnf.washington.edu/
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From tbritton at criticalsystemsinc.com  Fri Jun  7 16:58:40 2019
From: tbritton at criticalsystemsinc.com (Tom Britton)
Date: Fri, 7 Jun 2019 20:58:40 +0000
Subject: [labnetwork] special canisters of DES and TEOS for PECVD
In-Reply-To: <CAKLE_GZSLT2s4V=qY_oLKr_nNC76Ws8Qs5qEd=UvG+Fnczbdmg@mail.gmail.com>
References: <CAKLE_GZSLT2s4V=qY_oLKr_nNC76Ws8Qs5qEd=UvG+Fnczbdmg@mail.gmail.com>
Message-ID: <BYAPR08MB53350451975EC9461D0D9E58A0100@BYAPR08MB5335.namprd08.prod.outlook.com>

Hi Shane,

We provide these. Can I ask what you are looking for?

Tom

Tom Britton
Director of Sales
Critical Systems, Inc.
Direct: 208-890-1417
Office: 877-572-5515
Skype: tombrittoncsi
www.CriticalSystemsInc.com<http://www.criticalsystemsinc.com/>

[logo for email signature png]



From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> On Behalf Of Xin (Shane) Guo
Sent: Friday, June 07, 2019 10:16 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] special canisters of DES and TEOS for PECVD

Hi Colleagues,

Does anyone know where to buy stainless steel canisters with control valves to supply DES and TEOS to PECVD? Some vendors sell DES in a bottle which cannot be connected to the PECVD.

Any feedback is highly appreciated!

Best

Shane

This email and any files transmitted with it are confidential and intended solely for the use of the individual or entity to whom they are addressed. If you have received this email in error please notify the system manager. This message contains confidential information and is intended only for the individual named. If you are not the named addressee you should not disseminate, distribute or copy this e-mail. Please notify the sender immediately by e-mail if you have received this e-mail by mistake and delete this e-mail from your system. If you are not the intended recipient you are notified that disclosing, copying, distributing or taking any action in reliance on the contents of this information is strictly prohibited.'. If the disclaimer can't be applied, attach the message to a new disclaimer message.
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From fouad.karouta at anu.edu.au  Fri Jun  7 18:51:04 2019
From: fouad.karouta at anu.edu.au (Fouad Karouta)
Date: Fri, 7 Jun 2019 22:51:04 +0000
Subject: [labnetwork] special canisters of DES and TEOS for PECVD
In-Reply-To: <CAKLE_GZSLT2s4V=qY_oLKr_nNC76Ws8Qs5qEd=UvG+Fnczbdmg@mail.gmail.com>
References: <CAKLE_GZSLT2s4V=qY_oLKr_nNC76Ws8Qs5qEd=UvG+Fnczbdmg@mail.gmail.com>
Message-ID: <F68EB390-7A88-40C8-A95E-DB217A6360F2@anu.edu.au>

Hi Shane,
We have an Oxford PECVD with a TEOS module and first canister we purchased from Air Products in USA and the second time we used Pegasus in UK http://pegasuschemicals.com/
Hope this helps,
Fouad Karouta


On 8 Jun 2019, at 6:20 am, Xin (Shane) Guo <sguo18 at yorku.ca<mailto:sguo18 at yorku.ca>> wrote:

Hi Colleagues,

Does anyone know where to buy stainless steel canisters with control valves to supply DES and TEOS to PECVD? Some vendors sell DES in a bottle which cannot be connected to the PECVD.

Any feedback is highly appreciated!

Best

Shane

_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From ahad.syed at kaust.edu.sa  Sat Jun  8 03:49:15 2019
From: ahad.syed at kaust.edu.sa (Ahad Syed)
Date: Sat, 8 Jun 2019 07:49:15 +0000
Subject: [labnetwork] special canisters of DES and TEOS for PECVD
In-Reply-To: <CAKLE_GZSLT2s4V=qY_oLKr_nNC76Ws8Qs5qEd=UvG+Fnczbdmg@mail.gmail.com>
References: <CAKLE_GZSLT2s4V=qY_oLKr_nNC76Ws8Qs5qEd=UvG+Fnczbdmg@mail.gmail.com>
Message-ID: <1559980155219.23443@kaust.edu.sa>

Hello Shane,


We have an Oxford Instruments PlasmaLab100 with the TEOS module. We buy our TEOS canisters from Versum Materials. Our contact is


Ramos Alonso, Aida <Aida.RamosAlonso at versummaterials.com>



All the best,

Ahad

--
Nanofabrication Core Lab
4700 King Abdullah University of Science and Technology
0247 Building 3, Thuwal 23955-6900, Kingdom of Saudi Arabia
Tel:+966 12 808 2348
Visit The Core Labs<https://corelabs.kaust.edu.sa/visitor-information>
________________________________
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> on behalf of Xin (Shane) Guo <sguo18 at yorku.ca>
Sent: Friday, June 7, 2019 7:16 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] special canisters of DES and TEOS for PECVD

Hi Colleagues,

Does anyone know where to buy stainless steel canisters with control valves to supply DES and TEOS to PECVD? Some vendors sell DES in a bottle which cannot be connected to the PECVD.

Any feedback is highly appreciated!

Best

Shane



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From sguo18 at yorku.ca  Mon Jun 10 10:22:23 2019
From: sguo18 at yorku.ca (Xin (Shane) Guo)
Date: Mon, 10 Jun 2019 14:22:23 +0000
Subject: [labnetwork] special canisters of DES and TEOS for PECVD
In-Reply-To: <CAKLE_GZSLT2s4V=qY_oLKr_nNC76Ws8Qs5qEd=UvG+Fnczbdmg@mail.gmail.com>
References: <CAKLE_GZSLT2s4V=qY_oLKr_nNC76Ws8Qs5qEd=UvG+Fnczbdmg@mail.gmail.com>
Message-ID: <CAKLE_GZJXkg6PqG2SQuEV8jPha=jJWjuQoJP6znPkMQfbyweNA@mail.gmail.com>

Hi Colleagues,

Thank you all for the kind suggestions.

Best

Shane

On Fri, Jun 7, 2019 at 12:15 PM Xin (Shane) GUO <sguo18 at yorku.ca<mailto:sguo18 at yorku.ca>> wrote:
Hi Colleagues,

Does anyone know where to buy stainless steel canisters with control valves to supply DES and TEOS to PECVD? Some vendors sell DES in a bottle which cannot be connected to the PECVD.

Any feedback is highly appreciated!

Best

Shane
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From tbritton at criticalsystemsinc.com  Mon Jun 10 11:59:38 2019
From: tbritton at criticalsystemsinc.com (Tom Britton)
Date: Mon, 10 Jun 2019 15:59:38 +0000
Subject: [labnetwork] Special canisters of DES and TEOS for PECVD
Message-ID: <BYAPR08MB53353B8D548FB8837B7EEFF2A0130@BYAPR08MB5335.namprd08.prod.outlook.com>

Hi Shane,

We provide these. Can I ask what you are looking for?

Tom

Tom Britton
Director of Sales
Critical Systems, Inc.
Direct: 208-890-1417
Office: 877-572-5515
Skype: tombrittoncsi
www.CriticalSystemsInc.com<http://www.criticalsystemsinc.com/>

[logo for email signature png]



From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Xin (Shane) Guo
Sent: Friday, June 07, 2019 10:16 AM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] special canisters of DES and TEOS for PECVD

Hi Colleagues,

Does anyone know where to buy stainless steel canisters with control valves to supply DES and TEOS to PECVD? Some vendors sell DES in a bottle which cannot be connected to the PECVD.

Any feedback is highly appreciated!

Best

Shane

This email and any files transmitted with it are confidential and intended solely for the use of the individual or entity to whom they are addressed. If you have received this email in error please notify the system manager. This message contains confidential information and is intended only for the individual named. If you are not the named addressee you should not disseminate, distribute or copy this e-mail. Please notify the sender immediately by e-mail if you have received this e-mail by mistake and delete this e-mail from your system. If you are not the intended recipient you are notified that disclosing, copying, distributing or taking any action in reliance on the contents of this information is strictly prohibited.'. If the disclaimer can't be applied, attach the message to a new disclaimer message.
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From noreply at gphjournal18.xyz  Tue Jun 11 07:14:53 2019
From: noreply at gphjournal18.xyz (IJO Journal)
Date: Tue, 11 Jun 2019 16:44:53 +0530
Subject: [labnetwork] =?utf-8?q?Open_access_Publication_Volume=3A_2=2C_Iss?=
 =?utf-8?b?dWUgNuKAkyAyMDE5?=
Message-ID: <c8aeb61f42b178f1fa3a2f97329e5c98@gphjournal18.xyz>

CALL FOR PAPER 

HELLO, 

It gives an immense pleasure to inform you that IJO JOURNAL, an
International Journal in various fields of science and technology,
engineering, medical, management and social studies and more invites the
researcher to submit their research paper for publication. 

IJO journal is double blind peer reviewed journal. The review process
takes maximum a week to notify the author about his/her article's
status. 

For submission of research paper please mail us at
submission at ijojournal.com for more information please visit us at
_HTTP://IJOJOURNAL.COM/_ [1] 

If you are interested in joining editorial board please mail your CV at
editor at ijojournal.com 

CONTACT FOR CONFERENCE AT: - info at ijojournal.com 

Feel free to contact us for any query. We are happy to help you. 

Thanks 

Best Regards 

Chief Editor 

You can unsubscribe at any time. Please send a message on
unsubscribeijo at gmail.com 

  

Links:
------
[1] http://ijojournal.com/%0d
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From hromans at eng.ucsd.edu  Wed Jun 12 14:17:21 2019
From: hromans at eng.ucsd.edu (J Romans)
Date: Wed, 12 Jun 2019 11:17:21 -0700
Subject: [labnetwork] Sputtering Mg, MgO, MgF2
Message-ID: <CAD74n=nec0Qud-SQJFqwyy5BRKsj-VGeFpMrUzXDcVE-heY69w@mail.gmail.com>

Hello Esteemed Colleagues -
Does anyone have any experience sputtering Mg, MgO, MgF2? We have a faculty
inquiry and need to make a determination on risk/possible complications?
Thanks,
J. Hal Romans
Equipment Engineer
Nano3 Cleanroom Facility
University of California San Diego
ph: (858) 534-6674
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From dcchrist at wisc.edu  Thu Jun 13 09:00:03 2019
From: dcchrist at wisc.edu (Daniel Christensen)
Date: Thu, 13 Jun 2019 13:00:03 +0000
Subject: [labnetwork] UGIM 2020 - Save the date
Message-ID: <DM5PR0601MB3669CAE0732C65B81FDA91CFBEEF0@DM5PR0601MB3669.namprd06.prod.outlook.com>


Save the date!  UGIM 2020 Symposium
Sunday June 14, 2020 thru noon on Wednesday June 17, 2020
University of Wisconsin-Madison
Madison, WI 53706

Much more information to come in the near future.  Our symposium website has not been generated yet, we will make another announcement when it is up and running.

See you there!
Dan Christensen and Jerry Hunter


Daniel C. Christensen
Nanoscale Fabrication Center
University of Wisconsin-Madison
1550 Engineering Dr
Madison, WI 53706

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From rmorrison at draper.com  Thu Jun 13 10:13:26 2019
From: rmorrison at draper.com (Morrison, Richard H., Jr)
Date: Thu, 13 Jun 2019 14:13:26 +0000
Subject: [labnetwork] temperature measurment
Message-ID: <8b8601f09d594b26bb2b6fc2d45dc486@draper.com>

Hi Everyone,

For years we have been using Sensarray wafers to calibrate ovens and hot plates, the issue is they are silicon and break and at $7.5 k each it is costing me $$ I would rather spend on other things.

Do any of you use temperature calibration wafers made of metal, I used to get anodized Aluminum wafers for handler issues from H2Squared are they still around?

Thanks

Rick


Richard H. Morrison
Principal Member of the Technical Staff
Draper
555 Technology Square
Cambridge, MA
02139-3573

Work  617-258-3420
Cell  508-930-3461
www.draper.com<http://www.draper.com>

________________________________
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
________________________________
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From james.beall at nist.gov  Thu Jun 13 13:09:35 2019
From: james.beall at nist.gov (Beall, James A. (Fed))
Date: Thu, 13 Jun 2019 17:09:35 +0000
Subject: [labnetwork] temperature measurment
In-Reply-To: <8b8601f09d594b26bb2b6fc2d45dc486@draper.com>
References: <8b8601f09d594b26bb2b6fc2d45dc486@draper.com>
Message-ID: <04610CA8-2C47-4E5E-BD26-8713DD492786@nist.gov>

My latest contact with H-Squared was:

Uina Kubota
H-Square Corporation
3100 Patrick Henry Dr.
Santa Clara  CA 95054
Tel: 1-408-982-9108x104
ukubota at h-square.com<mailto:ukubota at h-square.com>
www.h-square.com<http://www.h-square.com>



Jim Beall
National Institute of Standards and Technology
Quantum Sensors Group
Mailcode 687.08
325 Broadway 1C-110
Boulder, CO 80305-3328
303-497-5989
303-497-3042 (fax)

On Jun 13, 2019, at 8:13 AM, Morrison, Richard H., Jr <rmorrison at draper.com<mailto:rmorrison at draper.com>> wrote:

Hi Everyone,

For years we have been using Sensarray wafers to calibrate ovens and hot plates, the issue is they are silicon and break and at $7.5 k each it is costing me $$ I would rather spend on other things.

Do any of you use temperature calibration wafers made of metal, I used to get anodized Aluminum wafers for handler issues from H2Squared are they still around?

Thanks

Rick


Richard H. Morrison
Principal Member of the Technical Staff
Draper
555 Technology Square
Cambridge, MA
02139-3573

Work  617-258-3420
Cell  508-930-3461
www.draper.com<https://gcc01.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.draper.com&data=02%7C01%7Cjames.beall%40nist.gov%7Cc80e1a5b2b874d12a4cc08d6f015e72c%7C2ab5d82fd8fa4797a93e054655c61dec%7C1%7C0%7C636960374198015196&sdata=RfJP8wAjGxoh92O5Te4JuLBguOEf2FNE3t%2BE4uR8Ze0%3D&reserved=0>

________________________________
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
________________________________
_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://gcc01.safelinks.protection.outlook.com/?url=https%3A%2F%2Fmtl.mit.edu%2Fmailman%2Flistinfo.cgi%2Flabnetwork&amp;data=02%7C01%7Cjames.beall%40nist.gov%7Cc80e1a5b2b874d12a4cc08d6f015e72c%7C2ab5d82fd8fa4797a93e054655c61dec%7C1%7C0%7C636960374198045175&amp;sdata=%2FlGB1IiOY8YgxN6qLDROQm89N70h1c1hnLoGsNggyDM%3D&amp;reserved=0

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From jim at photomaskportal.com  Thu Jun 13 15:20:03 2019
From: jim at photomaskportal.com (Jim Carroll)
Date: Thu, 13 Jun 2019 15:20:03 -0400
Subject: [labnetwork] temperature measurment
In-Reply-To: <8b8601f09d594b26bb2b6fc2d45dc486@draper.com>
References: <8b8601f09d594b26bb2b6fc2d45dc486@draper.com>
Message-ID: <CACVEG9iLg35ccFAsXcKfFStM1jnBmedNzAcy4fCqXxgTTFTAvw@mail.gmail.com>

Hi Rick,

We buy mask handling equipment from H-Square.  Is that who you are thinking
of?

http://www.h-square.com/ <http://www.h-square.com/A_Photomask_Handling.html>

Jim Carroll
PhotomaskPORTAL

On Jun 13, 2019, at 9:13 AM, Morrison, Richard H., Jr <rmorrison at draper.com>
wrote:

Hi Everyone,



For years we have been using Sensarray wafers to calibrate ovens and hot
plates, the issue is they are silicon and break and at $7.5 k each it is
costing me $$ I would rather spend on other things.



Do any of you use temperature calibration wafers made of metal, I used to
get anodized Aluminum wafers for handler issues from H2Squared are they
still around?



Thanks



Rick





Richard H. Morrison

Principal Member of the Technical Staff

Draper

555 Technology Square

Cambridge, MA

02139-3573



Work  617-258-3420

Cell  508-930-3461

www.draper.com


------------------------------
Notice: This email and any attachments may contain proprietary (Draper
non-public) and/or export-controlled information of Draper. If you are not
the intended recipient of this email, please immediately notify the sender
by replying to this email and immediately destroy all copies of this email.
------------------------------

_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From ahryciw at ualberta.ca  Fri Jun 14 12:27:36 2019
From: ahryciw at ualberta.ca (Aaron Hryciw)
Date: Fri, 14 Jun 2019 10:27:36 -0600
Subject: [labnetwork] Ag-Bi-Zn films in high vacuum
Message-ID: <CAPt+QB-sfE=5J5J=dPoRmQokYrHAS_44sGfr11tBSAoeSuv=Hw@mail.gmail.com>

Dear colleagues,

I'm hoping you can offer some advice on the wisdom of allowing substrates
coated with a Zn-containing thin film into some of our open-access
facility's shared high vacuum systems.

The material in question is a Ag-Bi-Zn alloy (98.9 at% Ag, 0.1 at% Bi, 1.0
at% Zn), which one of our user groups wants to deposit as a cathode layer
for an OLED process.  A 50 nm thick film of this material is being
deposited elsewhere (not in our shared equipment).  However, they would
like to continue processing this film in our equipment, which includes two
vacuum deposition steps (thermal evaporation for organics, then sputtering
for the anode layer, patterned via lift-off).  Both of these deposition
processes nominally have the substrate at room temperature, although there
is no active substrate cooling to offset heating from the process itself.
The maximum exposed area of the Ag-Bi-Zn would be ~20 cm? (i.e., equivalent
of a quarter of a 4" wafer).

I understand that due to its high vapour pressure, having metallic Zn is
generally a bad idea in shared systems if you want Zn-free films
thereafter, but I wanted to discuss how likely we'd be to see Zn
contamination in either the organics evaporator or the sputtering tool,
given the relatively low (?) total volume of exposed Zn that would be
involved.  I am mostly concerned about the organics evaporator, as the
Ag-Bi-Zn film would be exposed to high vacuum; in the sputtering tool, the
Ag-Bi-Zn would already be coated by several layers of organics.

Could contamination risk be mitigated by copious foiling/shielding of the
chamber?  Does anyone have any recommendations for a (non-destructive) test
that could be done to determine the extent of Zn contamination during the
organics evaporation step?  Any advice would be greatly appreciated.  Many
thanks.

Cheers,

 ? Aaron




Aaron Hryciw, PhD, PEng

Fabrication Group Manager

University of Alberta - nanoFAB

W1-060 ECERF Building

9107 - 116 Street

Edmonton, Alberta

Canada T6G 2V4 Ph: 780-940-7938
www.nanofab.ualberta.ca
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From wrightsh at lnf.umich.edu  Tue Jun 18 15:41:25 2019
From: wrightsh at lnf.umich.edu (Shawn Wright)
Date: Tue, 18 Jun 2019 15:41:25 -0400
Subject: [labnetwork] Cassette Loading Spinner/Developer Tools
Message-ID: <DD723BFF-C96B-4FC9-BDC5-712F99079B2F@lnf.umich.edu>

Hi Everyone,

We?re currently looking at replacing our SUSS ACS200 cluster tool, it?s showing it?s age and SUSS no longer supports it for replacement parts.  It would be good to hear what people are running for automated spin coating and developing, especially any experience with reliability and vendor support.  Specifically we?re looking for tools that can do cassette loading for 4? and 6? wafers that can do vapor prime, photoresist spinning, bake, and aqueous develop.


Thanks for your help,
Shawn Wright
Lead Engineer in Research
Lurie Nanofabrication Facility
University of Michigan

From fouad.karouta at anu.edu.au  Tue Jun 18 20:29:44 2019
From: fouad.karouta at anu.edu.au (Fouad Karouta)
Date: Wed, 19 Jun 2019 00:29:44 +0000
Subject: [labnetwork] Clean Room Ceiling
Message-ID: <SYBPR01MB5307C7E56EA6A15B09DE0C01C0E50@SYBPR01MB5307.ausprd01.prod.outlook.com>

Dear all,

We are in the process of getting a new building that includes a 650 m2 clean room (class 100 and 1000) with a sub-fab to host chiller, pumps, scrubbers, etc.

We are looking to possible suppliers of clean room compartmented ceiling to host light, Hepa filters and others like fire sprinklers, etc.
Any suggestions for suppliers are welcome.
Please also comment on what to include or avoid in ceiling.

Thanks,
Fouad Karouta

*************************************
Manager ANFF ACT Node
Australian National Fabrication Facility
Research School of Physics and Engineering
L. Huxley Building (#56), Mills Road, Room 4.02
Australian National University
ACT 2601, Canberra, Australia
Tel: + 61 2 6125 7174
Mob: + 61 451 046 412
Email: fouad.karouta at anu.edu.au<mailto:fouad.karouta at anu.edu.au>
http://anff-act.anu.edu.au/

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From kpayer at mit.edu  Tue Jun 18 20:34:31 2019
From: kpayer at mit.edu (Kristofor Robert Payer)
Date: Wed, 19 Jun 2019 00:34:31 +0000
Subject: [labnetwork] Cassette Loading Spinner/Developer Tools
In-Reply-To: <DD723BFF-C96B-4FC9-BDC5-712F99079B2F@lnf.umich.edu>
References: <DD723BFF-C96B-4FC9-BDC5-712F99079B2F@lnf.umich.edu>
Message-ID: <BC7E3767-45EB-4515-AFF1-B25B0C6A7B80@mit.edu>

Hi Shawn,
We (MTL) bought a coater/developer unit from PicoTrack a couple of years ago and have been very happy with the system.  Its features were comparable to the Suss cluster tool.  They have a highly customizable interface, easy to use software and great support.  If I remember correctly PicoTrack was founded by former SVG engineers.  I'm happy to answer any specific questions you might have on the system, just send me an email or give me a call offline.

Kris

Kristofor Payer
MIT.nano
Massachusetts Institute of Technology
60 Vassar Street
12-4011
Cambridge, MA 02139
617-324-1469
kpayer at mit.edu
 


?On 6/18/19, 8:18 PM, "labnetwork-bounces at mtl.mit.edu on behalf of Shawn Wright" <labnetwork-bounces at mtl.mit.edu on behalf of wrightsh at lnf.umich.edu> wrote:

    Hi Everyone,
    
    We?re currently looking at replacing our SUSS ACS200 cluster tool, it?s showing it?s age and SUSS no longer supports it for replacement parts.  It would be good to hear what people are running for automated spin coating and developing, especially any experience with reliability and vendor support.  Specifically we?re looking for tools that can do cassette loading for 4? and 6? wafers that can do vapor prime, photoresist spinning, bake, and aqueous develop.
    
    
    Thanks for your help,
    Shawn Wright
    Lead Engineer in Research
    Lurie Nanofabrication Facility
    University of Michigan
    _______________________________________________
    labnetwork mailing list
    labnetwork at mtl.mit.edu
    https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
    


From mweiler at andrew.cmu.edu  Wed Jun 19 10:11:39 2019
From: mweiler at andrew.cmu.edu (Mark Weiler)
Date: Wed, 19 Jun 2019 14:11:39 +0000
Subject: [labnetwork] Clean Room Ceiling
In-Reply-To: <SYBPR01MB5307C7E56EA6A15B09DE0C01C0E50@SYBPR01MB5307.ausprd01.prod.outlook.com>
References: <SYBPR01MB5307C7E56EA6A15B09DE0C01C0E50@SYBPR01MB5307.ausprd01.prod.outlook.com>
Message-ID: <C245338A-B131-4B0B-9651-12A2B7ED972D@andrew.cmu.edu>

Hi Fouad,

Take a look at Plascore and their product line?

https://www.plascore.com/honeycomb/cleanrooms/semiconductor-system/ceiling-panels/


All the best,

Mark



________________________________________________________________

Mark Weiler
Equipment & Facilites Manager
Clair and John Bertucci Nanotechnology Laboratory
Eden Hall Nanofabrication Cleanroom
Carnegie Mellon University
P:  412-268-2471
http://www.nanofab.ece.cmu.edu


[cid:2D2E01E3-CEC1-4F48-A845-224D8D7CED12 at wv.cc.cmu.edu] <https://www.linkedin.com/in/marksbasics>
<https://www.linkedin.com/in/marksbasics>

On Jun 18, 2019, at 8:29 PM, Fouad Karouta <fouad.karouta at anu.edu.au<mailto:fouad.karouta at anu.edu.au>> wrote:

Dear all,

We are in the process of getting a new building that includes a 650 m2 clean room (class 100 and 1000) with a sub-fab to host chiller, pumps, scrubbers, etc.

We are looking to possible suppliers of clean room compartmented ceiling to host light, Hepa filters and others like fire sprinklers, etc.
Any suggestions for suppliers are welcome.
Please also comment on what to include or avoid in ceiling.

Thanks,
Fouad Karouta

*************************************
Manager ANFF ACT Node
Australian National Fabrication Facility
Research School of Physics and Engineering
L. Huxley Building (#56), Mills Road, Room 4.02
Australian National University
ACT 2601, Canberra, Australia
Tel: + 61 2 6125 7174
Mob: + 61 451 046 412
Email: fouad.karouta at anu.edu.au<mailto:fouad.karouta at anu.edu.au>
http://anff-act.anu.edu.au/

_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork

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From nnelsonfitzpatrick at uwaterloo.ca  Wed Jun 19 12:37:33 2019
From: nnelsonfitzpatrick at uwaterloo.ca (Nathan Nelson - Fitzpatrick)
Date: Wed, 19 Jun 2019 16:37:33 +0000
Subject: [labnetwork] Cleaning reactive deposition materials prior to
	install in UHV tool
Message-ID: <4434FE40-9444-437C-B40D-22CF08B53857@uwaterloo.ca>

Hi Everyone,

I received a question from another lab on campus here and I?m not sure of the correct advice, I was hoping to rely on this experienced community.

This lab in question is interested in using reactive metal materials (Ba, Sr, etc..) in one of their UHV deposition tools.  Since these materials are reactive in air, they were shipped immersed in an oil.  They were asking me about the best way to clean off the oil prior to installing the material in their deposition system.  I believe they have already tried IPA and were not too happy with its effectiveness.  The vendor recommended ?100% mineral spirits?, but a quick google search indicates that this is a sort of vaguely defined solution of short chain hydrocarbons (alkanes?).  I was wondering if anyone has experience they could share regarding this type of problem and how they cleaned their materials?

Thank you in advance,
  -Nathan

--
Nathan Nelson-Fitzpatrick  PhD
Nanofabrication Process & Characterization Engineering Manager
Quantum-Nano Fabrication and Characterization Facility (QNFCF)
Office of Research
University of Waterloo
200 University Avenue West, Waterloo, ON  N2L 3G1
P: 519-888-4567 ext. 31796
C: 226-218-3206
https://fab.qnc.uwaterloo.ca

[/Users/nnelsonf/Desktop/university-of-waterloo-logo-esig.png]

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From sean.rinehart at yale.edu  Wed Jun 19 13:15:26 2019
From: sean.rinehart at yale.edu (Rinehart, Sean)
Date: Wed, 19 Jun 2019 17:15:26 +0000
Subject: [labnetwork] Argon in a BCl3 cylinder
Message-ID: <BN6PR08MB2466EC728FD8EF7D4166E7E199E50@BN6PR08MB2466.namprd08.prod.outlook.com>

Hello all,

Recently our facility's BCl3 cylinder had been charged with argon, increasing the delivery pressure to 25 psi. The cause has been corrected, but now I'm evaluating whether or not the cylinder needs to be replaced, and would appreciate some advice.

Since the root issue was fixed, the pressure has slowly dropped from 25 psi to 15 psi with use. Based on this, it seems like with more use the argon should completely deplete from the cylinder, but maybe someone can tell me if that's actually true, and if there's a way to evaluate gas concentrations. Additionally, the plasma glow is whitish instead of pink, so there's definitely BCl3 content in the delivered gas.

Thank you,

Sean Rinehart
Assistant Director, Cleanroom Operations
Yale University
203 432 4303

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From Dwayne.Chrusch at umanitoba.ca  Wed Jun 19 14:28:14 2019
From: Dwayne.Chrusch at umanitoba.ca (Dwayne Chrusch)
Date: Wed, 19 Jun 2019 18:28:14 +0000
Subject: [labnetwork] Clean Room Ceiling
In-Reply-To: <SYBPR01MB5307C7E56EA6A15B09DE0C01C0E50@SYBPR01MB5307.ausprd01.prod.outlook.com>
References: <SYBPR01MB5307C7E56EA6A15B09DE0C01C0E50@SYBPR01MB5307.ausprd01.prod.outlook.com>
Message-ID: <9876E680-AAAF-46EC-95E9-A1419DE41FDF@umanitoba.ca>

Hello,

A few years ago, we bought a self standing soft wall cleanroom from Terra Universal. 

Link;
https://www.terrauniversal.com/cleanrooms/valuline-softwall-cleanroom.php

The ceiling is designed around 2? x 4? (610mm x 1219mm) panels (fans, lights, etc..). The panels are mounted similar to a drop/suspended ceiling that are popular in basements here in Canada/USA. Blank panels could easily be used for sprinkler heads. 

Terra sells complete (customizable) kits, and/or individual units. Thus, you could simply order the ceiling panels you need, and construct the room in-house.

Their distributer in Australia is;
Arden Pty. Ltd.
Australia
Jeff Newing
www.arden.com.au
Phone: + 61 3 9706 4023
Fax: + 61 3 9706 4034
Email: jeff at arden.com.au



Regards,

Dwayne D. Chrusch, MSc.
Operations Manager, Training & Safety Coordinator
Nanosystem Fabrication Lab (NSFL)
E3-487 Engineering
75A Chancellor's Circle
University of Manitoba
Winnipeg, Manitoba
Canada, R3T 5V6
Tel: +1 (204) 474-8246
Fax +1 (204) 261-4639
http://home.cc.umanitoba.ca/~shafaic/NSFL_site/NSFL_Home.html


> On Jun 18, 2019, at 7:29 PM, Fouad Karouta <fouad.karouta at anu.edu.au> wrote:
> 
> Dear all,
>  
> We are in the process of getting a new building that includes a 650 m2 clean room (class 100 and 1000) with a sub-fab to host chiller, pumps, scrubbers, etc.
>  
> We are looking to possible suppliers of clean room compartmented ceiling to host light, Hepa filters and others like fire sprinklers, etc.
> Any suggestions for suppliers are welcome.
> Please also comment on what to include or avoid in ceiling. 
>  
> Thanks,
> Fouad Karouta
>  
> *************************************
> Manager ANFF ACT Node
> Australian National Fabrication Facility
> Research School of Physics and Engineering
> L. Huxley Building (#56), Mills Road, Room 4.02
> Australian National University
> ACT 2601, Canberra, Australia
> Tel: + 61 2 6125 7174
> Mob: + 61 451 046 412
> Email: fouad.karouta at anu.edu.au
> http://anff-act.anu.edu.au/
>  
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork


From spaolini at cns.fas.harvard.edu  Wed Jun 19 16:40:53 2019
From: spaolini at cns.fas.harvard.edu (Paolini, Steven)
Date: Wed, 19 Jun 2019 20:40:53 +0000
Subject: [labnetwork] Argon in a BCl3 cylinder
In-Reply-To: <BN6PR08MB2466EC728FD8EF7D4166E7E199E50@BN6PR08MB2466.namprd08.prod.outlook.com>
References: <BN6PR08MB2466EC728FD8EF7D4166E7E199E50@BN6PR08MB2466.namprd08.prod.outlook.com>
Message-ID: <BL0PR07MB4004921578CED0896B003437DFE50@BL0PR07MB4004.namprd07.prod.outlook.com>

Sean,
  I am not entirely sure, but it's not likely that the gases will completely disassociate from each other, even if the pressure drops. I'm assuming that because the vapor pressure of BCL3 is a constant because it is a liquid, you are determining that mostly Ar is being consumed because of the pressure drop. I would recommend a complete pump and purge of the entire gas circuit and replacing the cylinder of BCL3.
The simplest way to evaluate the gas concentrations is with an RGA but I don't think it's a good idea to expose the filament to a corrosive such as BCL3
    Steve "Equipment Dood" Paolini

Steve Paolini
Principal Equipment Engineer
Harvard University Center for Nanoscale Systems
11 Oxford St.
Cambridge, MA 02138
617- 496- 9816
spaolini at cns.fas.harvard.edu
www.cns.fas.harvard.edu

From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> On Behalf Of Rinehart, Sean
Sent: Wednesday, June 19, 2019 1:15 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Argon in a BCl3 cylinder

Hello all,

Recently our facility's BCl3 cylinder had been charged with argon, increasing the delivery pressure to 25 psi. The cause has been corrected, but now I'm evaluating whether or not the cylinder needs to be replaced, and would appreciate some advice.

Since the root issue was fixed, the pressure has slowly dropped from 25 psi to 15 psi with use. Based on this, it seems like with more use the argon should completely deplete from the cylinder, but maybe someone can tell me if that's actually true, and if there's a way to evaluate gas concentrations. Additionally, the plasma glow is whitish instead of pink, so there's definitely BCl3 content in the delivered gas.

Thank you,

Sean Rinehart
Assistant Director, Cleanroom Operations
Yale University
203 432 4303

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From wrhess at mit.edu  Wed Jun 19 16:47:08 2019
From: wrhess at mit.edu (Whitney Rochelle Hess)
Date: Wed, 19 Jun 2019 20:47:08 +0000
Subject: [labnetwork] Cleaning reactive deposition materials prior
	to	install in UHV tool
In-Reply-To: <4434FE40-9444-437C-B40D-22CF08B53857@uwaterloo.ca>
References: <4434FE40-9444-437C-B40D-22CF08B53857@uwaterloo.ca>
Message-ID: <1560977227654.96584@mit.edu>

Hi Nathan,


Cleaning with anhydrous hexane should work. This should be done in an inert atmosphere glovebox.


Best,

Whitney

_________________________________________
Whitney Hess, PhD
EHS Coordinator
MIT.nano | Microsystems Technology Laboratories
MIT, Room 39-213
Phone: 617-253-8567
Email: wrhess at mit.edu
________________________________
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> on behalf of Nathan Nelson - Fitzpatrick <nnelsonfitzpatrick at uwaterloo.ca>
Sent: Wednesday, June 19, 2019 12:37 PM
To: labnetwork at mtl.mit.edu
Cc: Saba Sadeghi
Subject: [labnetwork] Cleaning reactive deposition materials prior to install in UHV tool

Hi Everyone,

I received a question from another lab on campus here and I'm not sure of the correct advice, I was hoping to rely on this experienced community.

This lab in question is interested in using reactive metal materials (Ba, Sr, etc..) in one of their UHV deposition tools.  Since these materials are reactive in air, they were shipped immersed in an oil.  They were asking me about the best way to clean off the oil prior to installing the material in their deposition system.  I believe they have already tried IPA and were not too happy with its effectiveness.  The vendor recommended "100% mineral spirits", but a quick google search indicates that this is a sort of vaguely defined solution of short chain hydrocarbons (alkanes?).  I was wondering if anyone has experience they could share regarding this type of problem and how they cleaned their materials?

Thank you in advance,
  -Nathan

--
Nathan Nelson-Fitzpatrick  PhD
Nanofabrication Process & Characterization Engineering Manager
Quantum-Nano Fabrication and Characterization Facility (QNFCF)
Office of Research
University of Waterloo
200 University Avenue West, Waterloo, ON  N2L 3G1
P: 519-888-4567 ext. 31796
C: 226-218-3206
https://fab.qnc.uwaterloo.ca

[/Users/nnelsonf/Desktop/university-of-waterloo-logo-esig.png]

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From Dwayne.Chrusch at umanitoba.ca  Wed Jun 19 17:17:02 2019
From: Dwayne.Chrusch at umanitoba.ca (Dwayne Chrusch)
Date: Wed, 19 Jun 2019 21:17:02 +0000
Subject: [labnetwork] Argon in a BCl3 cylinder
In-Reply-To: <BN6PR08MB2466EC728FD8EF7D4166E7E199E50@BN6PR08MB2466.namprd08.prod.outlook.com>
References: <BN6PR08MB2466EC728FD8EF7D4166E7E199E50@BN6PR08MB2466.namprd08.prod.outlook.com>
Message-ID: <D075099D-A548-41C9-97B3-3557A74057FD@umanitoba.ca>

Hello,

If you?re using a 2 stage (or multi-stage) regulator, only the second stage (regulator output) and intermediate stage chambers are contaminated.

Here?s a link to how a 2 stage regulator works;
https://www.youtube.com/watch?v=UfaucxS5rIc

In order to flow gas from the intermediate chamber to the secondary chamber, the secondary pressure must be lower than the intermediate pressure. If the pressure in the secondary is greater than the intermediate, the orifice between the intermediate chamber and the gas cylinder would remain closed. 

You should be able to purge the contaminated gas out. First, close off the cylinder. Next, use your vacuum system to evacuate the gas from the system. Let the MFC drop to zero flow. Set the gas flow rate to as high as safely possible. This will pull the contaminated gas out of the low side and intermediate chamber of the regulator (assuming it?s dual stage). In theory, there will always be some stubborn Ar gas, but it may be practical to purge ?enough?. You could always recharge the gas line, and then re-purge it. 


Regards,

Dwayne D. Chrusch, MSc.
Operations Manager, Training & Safety Coordinator
Nanosystem Fabrication Lab (NSFL)
E3-487 Engineering
75A Chancellor's Circle
University of Manitoba
Winnipeg, Manitoba
Canada, R3T 5V6
Tel: +1 (204) 474-8246
Fax +1 (204) 261-4639
http://home.cc.umanitoba.ca/~shafaic/NSFL_site/NSFL_Home.html


> On Jun 19, 2019, at 12:15 PM, Rinehart, Sean <sean.rinehart at yale.edu> wrote:
> 
> Hello all,
>  
> Recently our facility?s BCl3 cylinder had been charged with argon, increasing the delivery pressure to 25 psi. The cause has been corrected, but now I?m evaluating whether or not the cylinder needs to be replaced, and would appreciate some advice.
>  
> Since the root issue was fixed, the pressure has slowly dropped from 25 psi to 15 psi with use. Based on this, it seems like with more use the argon should completely deplete from the cylinder, but maybe someone can tell me if that?s actually true, and if there?s a way to evaluate gas concentrations. Additionally, the plasma glow is whitish instead of pink, so there?s definitely BCl3 content in the delivered gas.
>  
> Thank you,
>  
> Sean Rinehart
> Assistant Director, Cleanroom Operations
> Yale University
> 203 432 4303 
>  
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork


From julia.aebersold at louisville.edu  Wed Jun 19 17:54:44 2019
From: julia.aebersold at louisville.edu (Aebersold,Julia W.)
Date: Wed, 19 Jun 2019 21:54:44 +0000
Subject: [labnetwork] Argon in a BCl3 cylinder
In-Reply-To: <BN6PR08MB2466EC728FD8EF7D4166E7E199E50@BN6PR08MB2466.namprd08.prod.outlook.com>
References: <BN6PR08MB2466EC728FD8EF7D4166E7E199E50@BN6PR08MB2466.namprd08.prod.outlook.com>
Message-ID: <DM5PR03MB2794121F2B47DB8E472340AE86E50@DM5PR03MB2794.namprd03.prod.outlook.com>

Hi Sean.  I'm not sure if what I have to offer can help, but our cylinder is 100% BCL3 with no mixed argon.  We also have heat tape on all the gas delivery lines for it loves to condense at ambient temps.  We have noticed that during an oxygen plasma clean in the processing chamber using BCl3 that if the color is not a nice blue then we still have BCl3 trapped in the primary delivery gas line to the chamber.  If argon was injected into the cylinder then I would replace it for the concentration may be enough throw off the actual flow rate form your MFC.


Another tid bit is that we discovered after processing with BCl3 the photoresist chemistry changes and hardens and is extremely difficult to remove.  We are testing with Dyanstrip to see if that will remove the resist.


Cheers!


Julia Aebersold, Ph.D.

MNTC Cleanroom Manager

University of Louisville

2210 South Brook Street

Shumaker Research Building, Room 233

Louisville, KY  40292

(502) 852-1572

http://louisville.edu/micronano/<http://louisville.edu/micronano>


________________________________
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> on behalf of Rinehart, Sean <sean.rinehart at yale.edu>
Sent: Wednesday, June 19, 2019 1:15:26 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Argon in a BCl3 cylinder


Hello all,



Recently our facility?s BCl3 cylinder had been charged with argon, increasing the delivery pressure to 25 psi. The cause has been corrected, but now I?m evaluating whether or not the cylinder needs to be replaced, and would appreciate some advice.



Since the root issue was fixed, the pressure has slowly dropped from 25 psi to 15 psi with use. Based on this, it seems like with more use the argon should completely deplete from the cylinder, but maybe someone can tell me if that?s actually true, and if there?s a way to evaluate gas concentrations. Additionally, the plasma glow is whitish instead of pink, so there?s definitely BCl3 content in the delivered gas.



Thank you,



Sean Rinehart

Assistant Director, Cleanroom Operations

Yale University

203 432 4303


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From fouad.karouta at anu.edu.au  Wed Jun 19 19:44:39 2019
From: fouad.karouta at anu.edu.au (Fouad Karouta)
Date: Wed, 19 Jun 2019 23:44:39 +0000
Subject: [labnetwork] Argon in a BCl3 cylinder
In-Reply-To: <D075099D-A548-41C9-97B3-3557A74057FD@umanitoba.ca>
References: <BN6PR08MB2466EC728FD8EF7D4166E7E199E50@BN6PR08MB2466.namprd08.prod.outlook.com>
 <D075099D-A548-41C9-97B3-3557A74057FD@umanitoba.ca>
Message-ID: <SYBPR01MB53070691781EB3C28FFC1735C0E50@SYBPR01MB5307.ausprd01.prod.outlook.com>

Hi Sean,

I rather agree with Steven Paolini and you should replace the BCl3 cylinder.
As the BCl3 is liquid an exposure to another gas like Ar at a pressure > 15 psi would lead to Ar going into the cylinder. 
We did have a similar issue in the past with a different gas and after solving the leak issue the BCl3 never behaved as before and especially etching results with BCl3 were no longer satisfactory as before the leak. 
We ended up replacing the cylinder.

Kind regards,
Fouad

*************************************
Manager ANFF ACT Node
Australian National Fabrication Facility
Research School of Physics and Engineering
L. Huxley Building (#56), Mills Road, Room 4.02
Australian National University
ACT 2601, Canberra, Australia
Tel: + 61 2 6125 7174
Mob: + 61 451 046 412
Email: fouad.karouta at anu.edu.au
http://anff-act.anu.edu.au/



-----Original Message-----
From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Dwayne Chrusch
Sent: Thursday, 20 June 2019 7:17 AM
To: Rinehart, Sean <sean.rinehart at yale.edu>
Cc: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Argon in a BCl3 cylinder

Hello,

If you?re using a 2 stage (or multi-stage) regulator, only the second stage (regulator output) and intermediate stage chambers are contaminated.

Here?s a link to how a 2 stage regulator works; https://www.youtube.com/watch?v=UfaucxS5rIc

In order to flow gas from the intermediate chamber to the secondary chamber, the secondary pressure must be lower than the intermediate pressure. If the pressure in the secondary is greater than the intermediate, the orifice between the intermediate chamber and the gas cylinder would remain closed. 

You should be able to purge the contaminated gas out. First, close off the cylinder. Next, use your vacuum system to evacuate the gas from the system. Let the MFC drop to zero flow. Set the gas flow rate to as high as safely possible. This will pull the contaminated gas out of the low side and intermediate chamber of the regulator (assuming it?s dual stage). In theory, there will always be some stubborn Ar gas, but it may be practical to purge ?enough?. You could always recharge the gas line, and then re-purge it. 


Regards,

Dwayne D. Chrusch, MSc.
Operations Manager, Training & Safety Coordinator Nanosystem Fabrication Lab (NSFL)
E3-487 Engineering
75A Chancellor's Circle
University of Manitoba
Winnipeg, Manitoba
Canada, R3T 5V6
Tel: +1 (204) 474-8246
Fax +1 (204) 261-4639
http://home.cc.umanitoba.ca/~shafaic/NSFL_site/NSFL_Home.html


> On Jun 19, 2019, at 12:15 PM, Rinehart, Sean <sean.rinehart at yale.edu> wrote:
> 
> Hello all,
>  
> Recently our facility?s BCl3 cylinder had been charged with argon, increasing the delivery pressure to 25 psi. The cause has been corrected, but now I?m evaluating whether or not the cylinder needs to be replaced, and would appreciate some advice.
>  
> Since the root issue was fixed, the pressure has slowly dropped from 25 psi to 15 psi with use. Based on this, it seems like with more use the argon should completely deplete from the cylinder, but maybe someone can tell me if that?s actually true, and if there?s a way to evaluate gas concentrations. Additionally, the plasma glow is whitish instead of pink, so there?s definitely BCl3 content in the delivered gas.
>  
> Thank you,
>  
> Sean Rinehart
> Assistant Director, Cleanroom Operations Yale University
> 203 432 4303
>  
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork

_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork

From mmoneck at andrew.cmu.edu  Wed Jun 19 20:45:33 2019
From: mmoneck at andrew.cmu.edu (Matthew Moneck)
Date: Thu, 20 Jun 2019 00:45:33 +0000
Subject: [labnetwork] Clean Room Ceiling
In-Reply-To: <SYBPR01MB5307C7E56EA6A15B09DE0C01C0E50@SYBPR01MB5307.ausprd01.prod.outlook.com>
References: <SYBPR01MB5307C7E56EA6A15B09DE0C01C0E50@SYBPR01MB5307.ausprd01.prod.outlook.com>
Message-ID: <63c9b617700d4cf1b1c9e968709c4f0d@andrew.cmu.edu>

Hi Fouad,

We have a Cleanpak ceiling plenum system from Nortek/Hunt Air (http://www.nortekair.com/product/cleanpak-custom-cleanroom-systems/) for our 8,500 sqft Class 10/100 cleanroom.  The plenum comes in prefab sections containing the grid for gel mount filter assemblies, integrated piping for fire sprinklers, LED light bars (located in between the filters as opposed to replacing filter locations), and safety shower plumbing/mounts.  Above the plenum grid, we have recirculating air handlers mounted to the plenums, also from Hunt Air.

Best Regards,

Matt

--
Matthew T. Moneck, Ph.D.
Executive Manager, Claire & John Bertucci Nanotechnology Laboratory
Electrical and Computer Engineering | Carnegie Mellon University
5000 Forbes Ave., Pittsburgh, PA 15213-3890
T: 412.268.5430
F: 412.268.3497
www.ece.cmu.edu<http://www.ece.cmu.edu/>
nanofab.ece.cmu.edu

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Fouad Karouta
Sent: Tuesday, June 18, 2019 8:30 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Clean Room Ceiling

Dear all,

We are in the process of getting a new building that includes a 650 m2 clean room (class 100 and 1000) with a sub-fab to host chiller, pumps, scrubbers, etc.

We are looking to possible suppliers of clean room compartmented ceiling to host light, Hepa filters and others like fire sprinklers, etc.
Any suggestions for suppliers are welcome.
Please also comment on what to include or avoid in ceiling.

Thanks,
Fouad Karouta

*************************************
Manager ANFF ACT Node
Australian National Fabrication Facility
Research School of Physics and Engineering
L. Huxley Building (#56), Mills Road, Room 4.02
Australian National University
ACT 2601, Canberra, Australia
Tel: + 61 2 6125 7174
Mob: + 61 451 046 412
Email: fouad.karouta at anu.edu.au<mailto:fouad.karouta at anu.edu.au>
http://anff-act.anu.edu.au/

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From shott at stanford.edu  Wed Jun 19 20:47:56 2019
From: shott at stanford.edu (John D Shott)
Date: Thu, 20 Jun 2019 00:47:56 +0000
Subject: [labnetwork] Argon in a BCl3 cylinder
In-Reply-To: <D075099D-A548-41C9-97B3-3557A74057FD@umanitoba.ca>
References: <BN6PR08MB2466EC728FD8EF7D4166E7E199E50@BN6PR08MB2466.namprd08.prod.outlook.com>,
 <D075099D-A548-41C9-97B3-3557A74057FD@umanitoba.ca>
Message-ID: <EEED2CE5-CBB4-4396-A0C5-EBC1DD8CCE01@stanford.edu>

Sean:

Just to add a bit to the others comments. 

My guess was that, when full, this was something like a 5 or a 9 lb cylinder ? or maybe 2.5 or 4 kg equivalent. In other words, many moles ?

How much Ar did you add? The head volume of the cylinder at a pressure of 25 PSIG minus the vapor pressure of the BCl3. I?m guessing that is a fraction of a mole. 

Of course, in the vapor it is the partial  pressure of the two components that determines the initial mixture you are extracting. 

However, as you extract gas, argon leaves permanently, whereas the BCl3 is replaced by vaporization. 
So, in principle, it will get more and more pure ? but never 100%. By estimating the total flow of gas, you should be able to estimate when you get to 99% BCl3 in the vapor, or 99.9%, or whatever you?d like. 

For example, starting with equal vapor pressures of Ar and BCl3 (that is a 50% mixture), if you extract one ?head volume? of gas, you should be down to 25% Ar. One more head volume of flow, you should be down to 12.5%, etc. 

How can you make that happen faster? By chilling the BCl3 so that the Ar is initially the more dominant gas in the mixture and thus preferentially removed. 

At least that is the first order analysis I would consider as an old timer ?

Good luck. 

A word of caution: it might be tempting to put the cylinder in a tub of ice water to reduce the BCl3 vapor pressure and, as a result increase Ar extraction. Remember that BCl3 is water reactive and an external leak of BCl3 would react to form HCl. 

Why do I think of that? When I was young ? we are talking 1972 or 1973, I think ? we had a ?Coke syrup canister? full of 50 lbs of SiCl4 for an old epitaxial reactor. To keep the deposition rate constant during a long run, the canister lived in a tub of water to minimize vaporization cooling of the SiCl4. One night the canister developed a leak so that the remaining SiCl4 liquid reacted with the water in the tub and released a whole lot of HCl that corroded everything in sight. Fortunately, this all happened in the middle of the night and we did have a crude scrubber ? so nobody was exposed to or injured by HCl. It is, however, not a scenario you want to replicate. 

Have a good day. 

John

Sent from my iPhone

> On Jun 19, 2019, at 4:40 PM, Dwayne Chrusch <Dwayne.Chrusch at umanitoba.ca> wrote:
> 
> Hello,
> 
> If you?re using a 2 stage (or multi-stage) regulator, only the second stage (regulator output) and intermediate stage chambers are contaminated.
> 
> Here?s a link to how a 2 stage regulator works;
> https://www.youtube.com/watch?v=UfaucxS5rIc
> 
> In order to flow gas from the intermediate chamber to the secondary chamber, the secondary pressure must be lower than the intermediate pressure. If the pressure in the secondary is greater than the intermediate, the orifice between the intermediate chamber and the gas cylinder would remain closed. 
> 
> You should be able to purge the contaminated gas out. First, close off the cylinder. Next, use your vacuum system to evacuate the gas from the system. Let the MFC drop to zero flow. Set the gas flow rate to as high as safely possible. This will pull the contaminated gas out of the low side and intermediate chamber of the regulator (assuming it?s dual stage). In theory, there will always be some stubborn Ar gas, but it may be practical to purge ?enough?. You could always recharge the gas line, and then re-purge it. 
> 
> 
> Regards,
> 
> Dwayne D. Chrusch, MSc.
> Operations Manager, Training & Safety Coordinator
> Nanosystem Fabrication Lab (NSFL)
> E3-487 Engineering
> 75A Chancellor's Circle
> University of Manitoba
> Winnipeg, Manitoba
> Canada, R3T 5V6
> Tel: +1 (204) 474-8246
> Fax +1 (204) 261-4639
> http://home.cc.umanitoba.ca/~shafaic/NSFL_site/NSFL_Home.html
> 
> 
>> On Jun 19, 2019, at 12:15 PM, Rinehart, Sean <sean.rinehart at yale.edu> wrote:
>> 
>> Hello all,
>> 
>> Recently our facility?s BCl3 cylinder had been charged with argon, increasing the delivery pressure to 25 psi. The cause has been corrected, but now I?m evaluating whether or not the cylinder needs to be replaced, and would appreciate some advice.
>> 
>> Since the root issue was fixed, the pressure has slowly dropped from 25 psi to 15 psi with use. Based on this, it seems like with more use the argon should completely deplete from the cylinder, but maybe someone can tell me if that?s actually true, and if there?s a way to evaluate gas concentrations. Additionally, the plasma glow is whitish instead of pink, so there?s definitely BCl3 content in the delivered gas.
>> 
>> Thank you,
>> 
>> Sean Rinehart
>> Assistant Director, Cleanroom Operations
>> Yale University
>> 203 432 4303 
>> 
>> _______________________________________________
>> labnetwork mailing list
>> labnetwork at mtl.mit.edu
>> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
> 
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork

From quantumrods at gmail.com  Thu Jun 20 02:47:28 2019
From: quantumrods at gmail.com (Alexander Fox)
Date: Thu, 20 Jun 2019 09:47:28 +0300
Subject: [labnetwork] Clean Room Ceiling
In-Reply-To: <SYBPR01MB5307C7E56EA6A15B09DE0C01C0E50@SYBPR01MB5307.ausprd01.prod.outlook.com>
References: <SYBPR01MB5307C7E56EA6A15B09DE0C01C0E50@SYBPR01MB5307.ausprd01.prod.outlook.com>
Message-ID: <CACdQVaexBhzwsbXYwnesDevuYq1MUej-OsrngcCRxrmSg6P_3g@mail.gmail.com>

Dear Fouad,

Make sure cleanroon ceilings are accessable and walkable from above. If not
-- provide catwalks there necessary. Also use FFUs instead of regular HEPA
boxes. This way you have better control over the flow and less crowded
space above the ceiling. Use LED stripes or 2x4 panels integrated into
suspended ceiling (beams), do not use protruding luminairs in clean zones
in order to not collect any dust.


On Wed, Jun 19, 2019 at 2:50 PM Fouad Karouta <fouad.karouta at anu.edu.au>
wrote:

> Dear all,
>
>
>
> We are in the process of getting a new building that includes a 650 m2
> clean room (class 100 and 1000) with a sub-fab to host chiller, pumps,
> scrubbers, etc.
>
>
>
> We are looking to possible suppliers of clean room compartmented ceiling
> to host light, Hepa filters and others like fire sprinklers, etc.
>
> Any suggestions for suppliers are welcome.
>
> Please also comment on what to include or avoid in ceiling.
>
>
>
> Thanks,
>
> Fouad Karouta
>
>
>
> *************************************
>
> Manager ANFF ACT Node
>
> Australian National Fabrication Facility
>
> Research School of Physics and Engineering
>
> L. Huxley Building (#56), Mills Road, Room 4.02
>
> Australian National University
>
> ACT 2601, Canberra, Australia
>
> Tel: + 61 2 6125 7174
>
> Mob: + 61 451 046 412
>
> Email: fouad.karouta at anu.edu.au
>
> http://anff-act.anu.edu.au/
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>


-- 
Alexander Fox
Clean Room Design Engineer
*CSJC ?Elar?*
68 Toreza prospect,
Saint-Petersburg,
Russia
194223
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From feargal.nolan at tyndall.ie  Thu Jun 20 08:16:43 2019
From: feargal.nolan at tyndall.ie (Feargal Nolan)
Date: Thu, 20 Jun 2019 12:16:43 +0000
Subject: [labnetwork] Argon in a BCl3 cylinder
In-Reply-To: <BN6PR08MB2466EC728FD8EF7D4166E7E199E50@BN6PR08MB2466.namprd08.prod.outlook.com>
References: <BN6PR08MB2466EC728FD8EF7D4166E7E199E50@BN6PR08MB2466.namprd08.prod.outlook.com>
Message-ID: <BE9EE51380810B4EAD86AEF37044C7AD0108523009@MAILBOXSERVER.tyndall.ie>

Hi Sean,

We had a similar problem with SiCl4 but in our case it was charged with nitrogen.  On our system we were able to use the venturi on the gas panel to evacuate the N2 from the cylinder.  We ran several tests afterwards and we did not see any adverse effects in our process.

Regards


Feargal Nolan
Maintenance Manager
Tyndall National Institute
Lee Maltings, Dyke Parade
Cork,  T12 R5CP
Ireland
t   +353 21 234 6656
m +353 87 635 7673




From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Rinehart, Sean
Sent: 19 June 2019 18:15
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Argon in a BCl3 cylinder

Hello all,

Recently our facility's BCl3 cylinder had been charged with argon, increasing the delivery pressure to 25 psi. The cause has been corrected, but now I'm evaluating whether or not the cylinder needs to be replaced, and would appreciate some advice.

Since the root issue was fixed, the pressure has slowly dropped from 25 psi to 15 psi with use. Based on this, it seems like with more use the argon should completely deplete from the cylinder, but maybe someone can tell me if that's actually true, and if there's a way to evaluate gas concentrations. Additionally, the plasma glow is whitish instead of pink, so there's definitely BCl3 content in the delivered gas.

Thank you,

Sean Rinehart
Assistant Director, Cleanroom Operations
Yale University
203 432 4303

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From jpalmer at Princeton.EDU  Thu Jun 20 09:14:00 2019
From: jpalmer at Princeton.EDU (Joseph E. Palmer)
Date: Thu, 20 Jun 2019 09:14:00 -0400
Subject: [labnetwork] Argon in a BCl3 cylinder
In-Reply-To: <BL0PR07MB4004921578CED0896B003437DFE50@BL0PR07MB4004.namprd07.prod.outlook.com>
References: <BN6PR08MB2466EC728FD8EF7D4166E7E199E50@BN6PR08MB2466.namprd08.prod.outlook.com>
 <BL0PR07MB4004921578CED0896B003437DFE50@BL0PR07MB4004.namprd07.prod.outlook.com>
Message-ID: <f57c5e14-1bcb-7379-d11b-ffe6f5d4f74f@exchange.princeton.edu>

Sean,

 ???? From a research point of view, I would see this as an unacceptable 
unknown.? I would strongly suggest changing out the cylinder.

Regards,

Joe Palmer
Operations Manager
PRISM MNFL
Princeton University

On 6/19/2019 4:40 PM, Paolini, Steven wrote:
>
> Sean,
>
> ? I am not entirely sure, but it?s not likely that the gases will 
> completely disassociate from each other, even if the pressure drops. 
> I?m assuming that because the vapor pressure of BCL3 is a constant 
> because it is a liquid, you are determining that mostly Ar is being 
> consumed because of the pressure drop. I would recommend a complete 
> pump and purge of the entire gas circuit and replacing the cylinder of 
> BCL3.
>
> The simplest way to evaluate the gas concentrations is with an RGA but 
> I don?t think it?s a good idea to expose the filament to a corrosive 
> such as BCL3
>
> ??? Steve ?Equipment Dood? Paolini
>
> Steve Paolini
>
> Principal Equipment Engineer
>
> Harvard University Center for Nanoscale Systems
>
> 11 Oxford St.
>
> Cambridge, MA 02138
>
> 617- 496- 9816
>
> spaolini at cns.fas.harvard.edu
>
> www.cns.fas.harvard.edu
>
> *From:* labnetwork-bounces at mtl.mit.edu 
> <labnetwork-bounces at mtl.mit.edu> *On Behalf Of *Rinehart, Sean
> *Sent:* Wednesday, June 19, 2019 1:15 PM
> *To:* labnetwork at mtl.mit.edu
> *Subject:* [labnetwork] Argon in a BCl3 cylinder
>
> Hello all,
>
> Recently our facility?s BCl3 cylinder had been charged with argon, 
> increasing the delivery pressure to 25 psi. The cause has been 
> corrected, but now I?m evaluating whether or not the cylinder needs to 
> be replaced, and would appreciate some advice.
>
> Since the root issue was fixed, the pressure has slowly dropped from 
> 25 psi to 15 psi with use. Based on this, it seems like with more use 
> the argon should completely deplete from the cylinder, but maybe 
> someone can tell me if that?s actually true, and if there?s a way to 
> evaluate gas concentrations. Additionally, the plasma glow is whitish 
> instead of pink, so there?s definitely BCl3 content in the delivered gas.
>
> Thank you,
>
> Sean Rinehart
>
> Assistant Director, Cleanroom Operations
>
> Yale University
>
> 203 432 4303
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork

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From spb1699 at rit.edu  Thu Jun 20 17:17:22 2019
From: spb1699 at rit.edu (Scott Blondell)
Date: Thu, 20 Jun 2019 21:17:22 +0000
Subject: [labnetwork] Argon in a BCl3 cylinder
In-Reply-To: <BE9EE51380810B4EAD86AEF37044C7AD0108523009@MAILBOXSERVER.tyndall.ie>
References: <BN6PR08MB2466EC728FD8EF7D4166E7E199E50@BN6PR08MB2466.namprd08.prod.outlook.com>
 <BE9EE51380810B4EAD86AEF37044C7AD0108523009@MAILBOXSERVER.tyndall.ie>
Message-ID: <9987076b5fdb4cfba325938143988ad8@ex04mail01a.ad.rit.edu>

Is this a case where a check valve at the BCl3 source failed, or was non-existent?
Would a valve cracking pressure of 0.5 psi have prevented this unwanted backflow.

Scott P. Blondell
Facilities Manager
Rochester Institute of Technology
Semiconductor & Microsystems Fabrication Laboratory<http://www.smfl.rit.edu/>
82 Lomb Memorial Dr.
Bldg. 17-2519
Rochester, NY 14623

585 738-4073 c
585 475-2171 o
585 475-5041 f
spb1699 at rit.edu<mailto:spb1699 at rit.edu>
www.smfl.rit.edu<http://www.smfl.rit.edu>

[http://www.rit.edu/~962www/logos/tiger_walking_rit_color.jpg]



From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Feargal Nolan
Sent: Thursday, June 20, 2019 8:17 AM
To: Rinehart, Sean <sean.rinehart at yale.edu>; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Argon in a BCl3 cylinder

Hi Sean,

We had a similar problem with SiCl4 but in our case it was charged with nitrogen.  On our system we were able to use the venturi on the gas panel to evacuate the N2 from the cylinder.  We ran several tests afterwards and we did not see any adverse effects in our process.

Regards


Feargal Nolan
Maintenance Manager
Tyndall National Institute
Lee Maltings, Dyke Parade
Cork,  T12 R5CP
Ireland
t   +353 21 234 6656
m +353 87 635 7673




From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Rinehart, Sean
Sent: 19 June 2019 18:15
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Argon in a BCl3 cylinder

Hello all,

Recently our facility's BCl3 cylinder had been charged with argon, increasing the delivery pressure to 25 psi. The cause has been corrected, but now I'm evaluating whether or not the cylinder needs to be replaced, and would appreciate some advice.

Since the root issue was fixed, the pressure has slowly dropped from 25 psi to 15 psi with use. Based on this, it seems like with more use the argon should completely deplete from the cylinder, but maybe someone can tell me if that's actually true, and if there's a way to evaluate gas concentrations. Additionally, the plasma glow is whitish instead of pink, so there's definitely BCl3 content in the delivered gas.

Thank you,

Sean Rinehart
Assistant Director, Cleanroom Operations
Yale University
203 432 4303

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From fouad.karouta at anu.edu.au  Sun Jun 23 19:20:51 2019
From: fouad.karouta at anu.edu.au (Fouad Karouta)
Date: Sun, 23 Jun 2019 23:20:51 +0000
Subject: [labnetwork] Clean Room Ceiling
In-Reply-To: <SYBPR01MB5307C7E56EA6A15B09DE0C01C0E50@SYBPR01MB5307.ausprd01.prod.outlook.com>
References: <SYBPR01MB5307C7E56EA6A15B09DE0C01C0E50@SYBPR01MB5307.ausprd01.prod.outlook.com>
Message-ID: <SYBPR01MB53078C9293FFED116E061862C0E10@SYBPR01MB5307.ausprd01.prod.outlook.com>

Thank you all for your useful suggestions about my request below.
Fouad

From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Fouad Karouta
Sent: Wednesday, 19 June 2019 10:30 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Clean Room Ceiling

Dear all,

We are in the process of getting a new building that includes a 650 m2 clean room (class 100 and 1000) with a sub-fab to host chiller, pumps, scrubbers, etc.

We are looking to possible suppliers of clean room compartmented ceiling to host light, Hepa filters and others like fire sprinklers, etc.
Any suggestions for suppliers are welcome.
Please also comment on what to include or avoid in ceiling.

Thanks,
Fouad Karouta

*************************************
Manager ANFF ACT Node
Australian National Fabrication Facility
Research School of Physics and Engineering
L. Huxley Building (#56), Mills Road, Room 4.02
Australian National University
ACT 2601, Canberra, Australia
Tel: + 61 2 6125 7174
Mob: + 61 451 046 412
Email: fouad.karouta at anu.edu.au<mailto:fouad.karouta at anu.edu.au>
http://anff-act.anu.edu.au/

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From sang-joon.lee at sjsu.edu  Mon Jun 24 18:25:24 2019
From: sang-joon.lee at sjsu.edu (John Lee)
Date: Mon, 24 Jun 2019 15:25:24 -0700
Subject: [labnetwork] =?utf-8?q?Jay_D=2E_Pinson_Microfabrication_Laborator?=
	=?utf-8?q?y_Manager_at_San_Jos=C3=A9_State_University_-_position_a?=
	=?utf-8?q?nnouncement?=
Message-ID: <CAFgFAXDw3EgDfNhJ0ozPNw98_L6jLeyX7=Q3q_PYRDy2Hf_G-w@mail.gmail.com>

All,
Please allow me to share this information across this distribution
list, and please be welcome to relay to others who might be
interested. Details and application instructions are the following
link, specifically under Job ID 25024.

  http://www.sjsu.edu/up/careers/staff_jobs/

Part of the position description is as follows:

  "The Jay D. Pinson Microfabrication Laboratory Manager will support
and enhance capabilities and user experience in the Microscale Process
Engineering Laboratory (MPEL) in the Charles W. Davidson College of
Engineering at San Jos? State University.  The incumbent reports to
the Director of General Engineering, and receives work lead direction
from a multidisciplinary faculty user group (MPEL Steering Committee)
to help ensure that the facility can effectively serve the needs of
education and research that depend on hands-on microfabrication
capabilities."

Thank you,
-John
________________________________________
Sang-Joon (John) Lee, Professor
Mechanical Engineering, San Jos? State University
One Washington Square, San Jos?, CA 95192-0087
408-924-7167 | sang-joon.lee at sjsu.edu
http://www.sjsu.edu/people/sang-joon.lee/


From mxm31 at case.edu  Mon Jun 24 19:04:05 2019
From: mxm31 at case.edu (Mehran Mehregany)
Date: Mon, 24 Jun 2019 16:04:05 -0700
Subject: [labnetwork] SPTS Pro AOE system for sale
Message-ID: <D05FC58B-1083-4527-95DE-0BC6DAE0C4DC@case.edu>

I have a lightly used, older SPTS Pro AOE in my lab that I would like to sell. It is a complete system and was purchased new and installed in 2006. We used it for a research project early on, but have not turned it on for 9-10 years. Attached please find info on the system. 

Please e-mail me if interested to know more,

Mehran Mehregany, Ph.D.
Veale Professor of Wireless Health Innovation
Director, Case School of Engineering?San Diego <http://engineering.case.edu/sandiego>
Case Western Reserve University
6540 Lusk Blvd, Suite C272
San Diego, CA 92121
858-869-0100 (direct line)
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From sean.rinehart at yale.edu  Tue Jun 25 11:34:18 2019
From: sean.rinehart at yale.edu (Rinehart, Sean)
Date: Tue, 25 Jun 2019 15:34:18 +0000
Subject: [labnetwork] Argon in a BCl3 cylinder
In-Reply-To: <9987076b5fdb4cfba325938143988ad8@ex04mail01a.ad.rit.edu>
References: <BN6PR08MB2466EC728FD8EF7D4166E7E199E50@BN6PR08MB2466.namprd08.prod.outlook.com>
 <BE9EE51380810B4EAD86AEF37044C7AD0108523009@MAILBOXSERVER.tyndall.ie>
 <9987076b5fdb4cfba325938143988ad8@ex04mail01a.ad.rit.edu>
Message-ID: <BN6PR08MB24662AB686DBA87934DF2C4D99E30@BN6PR08MB2466.namprd08.prod.outlook.com>

Scott,
In this case the check valve at the source was non-existent. The main cylinder valve had become stuck partly open, and it wasn't caught until the damage was done.

Everyone,
Thank you for your input on this issue. Definitely a lot of food for thought!


From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> On Behalf Of Scott Blondell
Sent: Thursday, June 20, 2019 5:17 PM
To: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Argon in a BCl3 cylinder

Is this a case where a check valve at the BCl3 source failed, or was non-existent?
Would a valve cracking pressure of 0.5 psi have prevented this unwanted backflow.

Scott P. Blondell
Facilities Manager
Rochester Institute of Technology
Semiconductor & Microsystems Fabrication Laboratory<https://nam05.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.smfl.rit.edu%2F&data=02%7C01%7Csean.rinehart%40yale.edu%7Cd0ca4592d45c4d93604808d6f5d8cf0f%7Cdd8cbebb21394df8b4114e3e87abeb5c%7C0%7C1%7C636966708894568889&sdata=1yJxJV6G5wt%2FmiExX12%2BwTPRtDpzoOE%2BpIGH9soHXOY%3D&reserved=0>
82 Lomb Memorial Dr.
Bldg. 17-2519
Rochester, NY 14623

585 738-4073 c
585 475-2171 o
585 475-5041 f
spb1699 at rit.edu<mailto:spb1699 at rit.edu>
www.smfl.rit.edu<https://nam05.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.smfl.rit.edu&data=02%7C01%7Csean.rinehart%40yale.edu%7Cd0ca4592d45c4d93604808d6f5d8cf0f%7Cdd8cbebb21394df8b4114e3e87abeb5c%7C0%7C1%7C636966708894578901&sdata=9mVSfdrOvo3rUMHoUg2SI0Yo926VzLw7YlK%2Fg0oeipM%3D&reserved=0>

[http://www.rit.edu/~962www/logos/tiger_walking_rit_color.jpg]


From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Feargal Nolan
Sent: Thursday, June 20, 2019 8:17 AM
To: Rinehart, Sean <sean.rinehart at yale.edu<mailto:sean.rinehart at yale.edu>>; labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Argon in a BCl3 cylinder

Hi Sean,

We had a similar problem with SiCl4 but in our case it was charged with nitrogen.  On our system we were able to use the venturi on the gas panel to evacuate the N2 from the cylinder.  We ran several tests afterwards and we did not see any adverse effects in our process.

Regards


Feargal Nolan
Maintenance Manager
Tyndall National Institute
Lee Maltings, Dyke Parade
Cork,  T12 R5CP
Ireland
t   +353 21 234 6656
m +353 87 635 7673




From: labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu> [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Rinehart, Sean
Sent: 19 June 2019 18:15
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Argon in a BCl3 cylinder

Hello all,

Recently our facility's BCl3 cylinder had been charged with argon, increasing the delivery pressure to 25 psi. The cause has been corrected, but now I'm evaluating whether or not the cylinder needs to be replaced, and would appreciate some advice.

Since the root issue was fixed, the pressure has slowly dropped from 25 psi to 15 psi with use. Based on this, it seems like with more use the argon should completely deplete from the cylinder, but maybe someone can tell me if that's actually true, and if there's a way to evaluate gas concentrations. Additionally, the plasma glow is whitish instead of pink, so there's definitely BCl3 content in the delivered gas.

Thank you,

Sean Rinehart
Assistant Director, Cleanroom Operations
Yale University
203 432 4303

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From jpalmer at Princeton.EDU  Wed Jun 26 15:35:59 2019
From: jpalmer at Princeton.EDU (Joseph E. Palmer)
Date: Wed, 26 Jun 2019 15:35:59 -0400
Subject: [labnetwork] Fwd: Nanofab staff opening at UIowa
In-Reply-To: <DM6PR04MB508432FF330C2C7B442A73D1F8EF0@DM6PR04MB5084.namprd04.prod.outlook.com>
References: <DM6PR04MB508432FF330C2C7B442A73D1F8EF0@DM6PR04MB5084.namprd04.prod.outlook.com>
Message-ID: <daf6b8db-529b-7b62-8918-b368a42640b7@exchange.princeton.edu>

Please excuse me, as I help spread the word on the job opportunity 
below. - J. Palmer

I am reaching out to you today to see if you can help spread the word 
for a job opening at our nanofabrication facility: 
https://uiowa.referrals.selectminds.com/jobs/core-facility-research-specialist-3341 
which is equipped with these tools:

?Direct-write Electron-Beam Lithography (recently purchased): high speed 
pattern 
generatoronthenano-scalewithsub-20nmresolutionpatterningcapabilityandplacement 
accuracy.

?Electron Beam Lithography Proximity effects control software: GenISys 
Beamer: control the electron beam dose and electron scattering effects 
for various pattern geometries and densities.

?Optical lithography: OAI Model 800 mask aligner with back-side 
alignment capabilities for pattern exposures down to 1?m.

?Thin-film deposition: Electron-beam deposition system (Angstrom 
Engineering 450) and Thermal evaporator (Edwards Auto 306) for coating 
conformal thin metal layers down to sub-10 nm thickness with highuniformity.

?Plasma etcher: Reactive ion etchers (RIE) (Oxford PlasmaPro NGP 80) and 
ICP Plasma Pro S100 for the etching of various semiconductor and 
insulation materials with features on the micro- and nano-scale using 
several gas chemistries. These tools offer anisotropic etching on 
various materials that include glass, silicon, III-V materials, metals 
with near verticalsidewalls.

?Atomic Layer deposition (ALD): The ALD system (Oxford Opal) provides 
the ability to precisely coat materials at the atomic level conformally 
using sequential and self-limiting surface reactions. This tool is used 
to deposit a wide range of materials, including oxidessuch as TiO_2 , 
SiO_2 , ZnO, HfO_2 and Nitrides, TiN, Si_3 N_4 and metals such as Ru, 
Pt, with a typical uniformity of < 2 % and provides excellent step 
coverage even inside high aspect ratiostructures.

?NanoimprintLithography:Thetool(NanonexNX-1006)isafullwafernanoimprintorwith 
thermal imprint capability. This tool is capable of imprinting features 
on the micro- and 
nano-scaleoverlargeareasinthecentimeterranges?suitableforlow-costandlarge-scale 
fabrication.

?Thin-film sputtering system: The tool (Intlvac Nanochrome 1) uses any 
combinations ofRF, AC and DC magnetron sputtering cathodes to produce 
thin films (including Si, SiO_2 , Si_3 N_4 ) for precision coatings on a 
wide range ofmaterials.

?Plasma cleaner: The tool (Branson 3100) uses an oxygen plasma to remove 
thin layers of polymer on semiconductor or insulatingmaterials.

?Wet-processing: Several laminar flow wet-benches and hoods are 
available for wet- processing using a wide range of solvents and acids 
for wetetching.

The salary and benefits are competitive. For more information, the 
interested party can contact me directly as well, and I can connect them 
to the hiring manager. Thanks.

Regards,

Fatima

--------------------------------------------------------------------------------------------------------------------

Fatima Toor, Ph.D.

Assistant Professor

Electrical & Computer Engineering

Physics & Astronomy

UI Informatics Initiative (UI3)

Center for Computer Aided Design (CCAD)

Iowa CREATES and MATFab Facility

Affiliate Member, Holden Comprehensive Cancer Center - Experimental 
Therapeutics

Office: 116 Iowa Advanced Technology Laboratories (IATL)

205 N. Madison Street, The University of Iowa, Iowa City, IA 52242-1727, USA

Phone: +1 (319) 335-6071

Fax: +1 (319) 335-6028

https://ftoor.lab.uiowa.edu/

Technical Group Development Chair, OSA Board of Meetings

Associate Editor, SPIE Journal of Photonics for Energy 
<https://www.spiedigitallibrary.org/journals/journal-of-photonics-for-energy?SSO=1>

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From sb86922 at usc.edu  Thu Jun 27 15:05:59 2019
From: sb86922 at usc.edu (Shivakumar Bhaskaran)
Date: Thu, 27 Jun 2019 19:05:59 +0000
Subject: [labnetwork] Dry pump in Savannah ALD & Pd deposition
Message-ID: <BYAPR07MB6053FB514CC4D5AD332B4500E3FD0@BYAPR07MB6053.namprd07.prod.outlook.com>

Hello,

We are looking into the options of buying ALD; one of the tools that we are considering is Savannah ALD. We are planning to use the tool with a dry pump; the vendor mentioned that most of their recipes work well with the rotary vane pump. And we might have to tweak the recipe. Has anyone tried using the dry pump, if so what was your experience and recommendation on what dry pump we should buy.

And has anyone tried depositing Pd using ALD,  based on literature survey I see Pd(hfac)2 precursor? Anyone has experience in using this precursor and if so would you mind sharing your recipes.

Thanks,
Shiva


Shivakumar Bhaskaran, Ph.D.,
John D. O'Brien Nanofabrication Laboratory
Michelson Hall, 1002 Childs Way, MCB LL121,
Los Angeles, California 90089, 213 821 2374
[Sign]




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