[labnetwork] Universal standards of microfab enviornment

[Paolini, Steven]

Shane,
   The most often referenced material is from SEMI standards.  Semistandards.org
Whatever criteria you adopt, please note that it is of the utmost importance to ensure consistency. If temperature and RH vary, it will introduce unwanted variables in sensitive and complex processes. Another important point is to keep the RH relatively high (48%) to reduce ESD. If the RH and temperature fluctuate, you will encounter variation in your photo speed.
Hope this helps.
Steve

Steve Paolini
Principal Equipment Engineer
Harvard University Center for Nanoscale Systems
11 Oxford St.
Cambridge, MA 02138
617- 496- 9816
spaolini at cns.fas.harvard.edu
www.cns.fas.harvard.edu

From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> On Behalf Of Xin (Shane) Guo
Sent: Wednesday, March 06, 2019 1:30 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Universal standards of microfab enviornment

Hi Colleagues,

Is there a universal standard for microfabrication cleanroom, outlining the requirement of humidity, temperature, noise, etc?

Any documentation available?

Cheers

Shane


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