[labnetwork] Has anyone using thicker than 200nm HSQ for EBL patterning?

[Michael Rooks]

Multiple-spins seldom produce good results. It's easier to use a thicker 
solution of HSQ. Of course you can buy thicker HSQ, such as Fox-16, but 
if you are in a hurry you can thicken the 6% HSQ (well, any resist 
really) by bubbling nitrogen through it. Just put a tube in the bottle 
and blow in some dry nitrogen. The solvent will evaporate, and the 
bubbles will keep the solution agitated, so a skin does not form on the 
surface. No need to be precise about the solution. Just keep bubbling 
until you get the thickness you want.


------------------------------------
Michael Rooks
Yale Institute for Nanoscience and Quantum Engineering
nano.yale.edu


On 3/8/2019 10:02 PM, Zhao, Mengdi wrote:
>
> Hello everyone,
>
>
> I am trying to spin 350nm HSQ by double coating XR1541 6% at 2000rpm 
> and bake at 80C between coating. However, HSQ thickness measured by 
> reflectance spectrum actually get thinner after the second spin and 
> bake. I wonder if the HSQ still get dissolved again during the 2nd 
> dispense even with 80C bake for 4min after the first coating. Any 
> suggestion on getting over 200nm HSQ spin coated on Si?
>
>
> Best regards,
>
>
> Mengdi
>
>
>
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