[labnetwork] SU-8 in a DRIE

[Kurt Kupcho]

Labnetwork -

We have been asked to allow SU-8 in our DRIE.  I am reluctant to do so because of reports I have read that SU-8 contaminates ICP etch chambers worse than regular photoresist and it can produce antimony contaminants on the surface from the SU-8.

Do any of you have experience in allowing SU-8 in your DRIE or denying it?  What was your decision based on?

Thank you for your help.


-          Kurt


---------------------------------------------------
Kurt Kupcho
Process Engineer/Safety Officer

NFC
1550 Engineering Drive
ECB Room 3110
Madison, WI  53706

E:  kurt.kupcho at wisc.edu<mailto:kurt.kupcho at wisc.edu>
T:  608-262-2982

[Nano-Fab_color-flush]

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