From Aju.Jugessur at Colorado.EDU Fri Nov 1 15:15:40 2019 From: Aju.Jugessur at Colorado.EDU (Aju Jugessur) Date: Fri, 1 Nov 2019 19:15:40 +0000 Subject: [labnetwork] Cleanroom gowns: laundered in house Message-ID: <062D535C-385D-4415-951F-312BDDDAFE9F@colorado.edu> Hi all, I am reaching out to the ISO 5 and 6 cleanroom users regarding cleanroom gowns. Does anyone opted to laundered their own cleanroom gowns in house? If yes, what type of washers/dryers you use? I am aware that washers specific for cleanroom can be very expensive and outsourcing the task is also expensive. I am also aware that some labs are using dedicated regular washers. Any advice and suggestions will be great. Thanks so much. Regards Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Engineering Staff Council Member (Communications and Outreach) Discovery Learning Center University of Colorado Boulder | College of Engineering & Applied Science 1111 Engineering Drive ? 1B09 DLC | Boulder, CO 80309-0422 | P: 303.735.5019| F: 303.492.2199 https://www.colorado.edu/facility/cosinc E-mail: aju.jugessur at colorado.edu Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) [signature_57561636] [signature_2026065586] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 70328 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 3107 bytes Desc: image002.png URL: From bill_flounders at berkeley.edu Fri Nov 1 17:38:12 2019 From: bill_flounders at berkeley.edu (Albert William (Bill) Flounders) Date: Fri, 1 Nov 2019 14:38:12 -0700 Subject: [labnetwork] Cleanroom gowns: laundered in house In-Reply-To: <062D535C-385D-4415-951F-312BDDDAFE9F@colorado.edu> References: <062D535C-385D-4415-951F-312BDDDAFE9F@colorado.edu> Message-ID: This topic has come up multiple times. Using google to search the labnetwork is recommended. Use search term "labnetwork" and the topic of interest. Using "labnetwork" and "gown" brought up threads from 2009, 2013, and 2017. Fresh responses not discouraged. We use disposables - over and over. Bill Flounders UC Berkeley On Fri, Nov 1, 2019 at 2:11 PM Aju Jugessur wrote: > Hi all, > > > > I am reaching out to the ISO 5 and 6 cleanroom users regarding cleanroom > gowns. > > > > Does anyone opted to laundered their own cleanroom gowns in house? If yes, > what type of washers/dryers you use? I am aware that washers specific for > cleanroom can be very expensive and outsourcing the task is also expensive. > I am also aware that some labs are using dedicated regular washers. > > > > Any advice and suggestions will be great. > > > > Thanks so much. > > Regards > > Aju > > > > > > > > > > Aju Jugessur *Ph.D. IEEE Sr. Member* > > Director, Colorado Shared Instrumentation in Nanofabrication and > Characterization (COSINC) > > Engineering Staff Council Member (Communications and Outreach) > > Discovery Learning Center > > *University of Colorado Boulder | **College of Engineering & Applied > Science* > > 1111 Engineering Drive ? 1B09 DLC *|* Boulder, CO 80309-0422 *|* *P:* > 303.735.5019*| F:* 303.492.2199 > > https://www.colorado.edu/facility/cosinc > > E-mail: aju.jugessur at colorado.edu > > > *Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever > (CliftonStrengths)* > > > > [image: signature_57561636] > > [image: signature_2026065586] > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 70328 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 3107 bytes Desc: not available URL: From larry.rehn at att.net Sat Nov 2 10:14:52 2019 From: larry.rehn at att.net (larry.rehn) Date: Sat, 02 Nov 2019 09:14:52 -0500 Subject: [labnetwork] Cleanroom gowns: laundered in house In-Reply-To: <062D535C-385D-4415-951F-312BDDDAFE9F@colorado.edu> Message-ID: We faced the same issues that you describe. We determined that our user base has moved almost entirely away from traditional semiconductor work with concerns for sodium, towards various MEMS devices for bioengineering, optics, lab-on-a-chip, etc. Further, not too sensitive to extreme measures for particle control.?Therefore we elected to purchase an industrial top load Maytag washer installed in a janitor room very close to our gowning area. After washing we take them inside the first cleanroom bay to drip dry.Works quite well.?Larry RehnAggiefab Nanofabrication FacilitySent via the Samsung Galaxy S8, an AT&T 5G Evolution capable smartphone -------- Original message --------From: Aju Jugessur Date: 11/1/19 2:15 PM (GMT-06:00) To: labnetwork at mtl.mit.edu Subject: [labnetwork] Cleanroom gowns: laundered in house Hi all, ? I am reaching out to the ISO 5 and 6 cleanroom users regarding cleanroom gowns. ? Does anyone opted to laundered their own cleanroom gowns in house? If yes, what type of washers/dryers you use? I am aware that washers specific for cleanroom can be very expensive and outsourcing the task is also expensive. I am also aware that some labs are using dedicated regular washers. ? Any advice and suggestions will be great. ? Thanks so much. Regards Aju ? ? ? ? Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Engineering Staff Council Member (Communications and Outreach) Discovery Learning Center University of Colorado Boulder |?College of Engineering & Applied Science 1111 Engineering Drive ? 1B09 DLC?|?Boulder, CO 80309-0422?|?P:?303.735.5019| F:?303.492.2199 https://www.colorado.edu/facility/cosinc E-mail: aju.jugessur at colorado.edu Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) ? -------------- next part -------------- An HTML attachment was scrubbed... URL: From shimonel at savion.huji.ac.il Sun Nov 3 01:45:58 2019 From: shimonel at savion.huji.ac.il (Shimon Eliav) Date: Sun, 3 Nov 2019 06:45:58 +0000 Subject: [labnetwork] Cleanroom gowns: laundered in house In-Reply-To: <062D535C-385D-4415-951F-312BDDDAFE9F@colorado.edu> References: <062D535C-385D-4415-951F-312BDDDAFE9F@colorado.edu> Message-ID: Hi Aju, The small company that used to clean wash our gowns closed its doors some good years ago. The other company dealing with this here had very expensive rates and not comfortable conditions (minimum quantity and frequency). We purchased a simple washing machine, placed it in one of our chases and connected it to our RO water supply. We have three sets of 25 gowns and once a week we exchange and wash them. After washing they are left in that chase to dry. It is a simple task done by the responsible for the clean room cleaning. Before that company closed they learned us what detergent to use and so on. This arrangement works just fine. We save a lot of money and have maximum flexibility. Regards, Shimon The Hebrew University of Jerusalem The Unit for Nano Fabrication - UNF From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Aju Jugessur Sent: Friday, 1 November 2019 21:16 To: labnetwork at mtl.mit.edu Subject: [labnetwork] Cleanroom gowns: laundered in house Hi all, I am reaching out to the ISO 5 and 6 cleanroom users regarding cleanroom gowns. Does anyone opted to laundered their own cleanroom gowns in house? If yes, what type of washers/dryers you use? I am aware that washers specific for cleanroom can be very expensive and outsourcing the task is also expensive. I am also aware that some labs are using dedicated regular washers. Any advice and suggestions will be great. Thanks so much. Regards Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Engineering Staff Council Member (Communications and Outreach) Discovery Learning Center University of Colorado Boulder | College of Engineering & Applied Science 1111 Engineering Drive ? 1B09 DLC | Boulder, CO 80309-0422 | P: 303.735.5019| F: 303.492.2199 https://www.colorado.edu/facility/cosinc E-mail: aju.jugessur at colorado.edu Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) [signature_57561636] [signature_2026065586] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 5228 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 4549 bytes Desc: image002.png URL: From nyaupanepradeep at gmail.com Sun Nov 3 08:21:06 2019 From: nyaupanepradeep at gmail.com (Pradeep Nyaupane) Date: Sun, 3 Nov 2019 18:51:06 +0530 Subject: [labnetwork] Backing Vacuum Pump - Dry pumps vs Oil Pumps Message-ID: Dear All, We have been using Dry pumps for turbo pump backing for Sputters, E-beam evaporators. And are planning to swap to oil pump with an anti-suck back valve, whenever required (in case dry pumps go bad). We would like to know whether any of you are using oil pumps are being used as backing pump for Turbo / Cryo / DP. Any advice / suggestions would be greatly appreciated. Thank You in advance. Thanks & Regards, Pradeep Nyaupane Technical Superintendent, Equipment Maintenance Team In-charge, IITBNF, Electrical Engg Dept IIT Bombay, India Tel No. 02225764471(O) -------------- next part -------------- An HTML attachment was scrubbed... URL: From mapril at draper.com Mon Nov 4 05:39:12 2019 From: mapril at draper.com (April, Mark R.) Date: Mon, 4 Nov 2019 10:39:12 +0000 Subject: [labnetwork] Backing Vacuum Pump - Dry pumps vs Oil Pumps In-Reply-To: References: Message-ID: <50a89d4aca8e4305bc20d69cbce040a9@draper.com> Good Morning I only use Dry pumps in my clean room at Draper. I removed all of the oil pumps several years ago Thanks Mark R. April [https://intranet.draper.com/pcweb/media/branding/images/logo_styles/color_logo.jpg] Senior Equipment Engineer Microfabrication Laboratory Lead 555 Technology Square Cambridge, MA 02139 mapril at draper.com O # 617-258-1613 C # 617-455-1596 www.draper.com From: labnetwork-bounces at mtl.mit.edu On Behalf Of Pradeep Nyaupane Sent: Sunday, November 3, 2019 8:21 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Backing Vacuum Pump - Dry pumps vs Oil Pumps Dear All, We have been using Dry pumps for turbo pump backing for Sputters, E-beam evaporators. And are planning to swap to oil pump with an anti-suck back valve, whenever required (in case dry pumps go bad). We would like to know whether any of you are using oil pumps are being used as backing pump for Turbo / Cryo / DP. Any advice / suggestions would be greatly appreciated. Thank You in advance. Thanks & Regards, Pradeep Nyaupane Technical Superintendent, Equipment Maintenance Team In-charge, IITBNF, Electrical Engg Dept IIT Bombay, India Tel No. 02225764471(O) ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 1923 bytes Desc: image001.jpg URL: From bgila at ufl.edu Mon Nov 4 09:40:53 2019 From: bgila at ufl.edu (Brent Gila) Date: Mon, 4 Nov 2019 09:40:53 -0500 Subject: [labnetwork] Backing Vacuum Pump - Dry pumps vs Oil Pumps In-Reply-To: <50a89d4aca8e4305bc20d69cbce040a9@draper.com> References: <50a89d4aca8e4305bc20d69cbce040a9@draper.com> Message-ID: <5e940b68-cd8f-1db3-f4e1-1005f0d469c4@ufl.edu> Hello Pradeep, We use mostly dry pumps but the few wet pumps we have we use a Fomblin type oil and soft start vacuum valves like this one from VAT (http://www.vatvalve.com/business/valves/catalog/H/311_1_A).? The soft start valve helps to minimize the rush of oil back streaming when pumping down chambers from atmosphere and is a little more gentler on pumps.? We have not seen an effect in ultimate pressure, but pump down times are extended due to the added restriction in the conductance. I highly recommend a dry roughing pump on the cryopump for regenerating.? The 15K charcoal array in the cryo pump can absorb pump oil and decrease the cryo pump efficiency over time, which will increase the frequency for regens and increase down time. Best Regards, Brent -- Brent P. Gila, PhD. Director, Nanoscale Research Facility 1041 Center Drive University of Florida Gainesville, Florida 32611 Tel:352-273-2245 Fax:352-846-2877 email:bgila at ufl.edu On 11/4/2019 5:39 AM, April, Mark R. wrote: > *[External Email]* > > Good Morning > > I only use Dry pumps in my clean room at ?? Draper. > > I removed all of the oil pumps several years ago > > Thanks > > *Mark R. April* > > https://intranet.draper.com/pcweb/media/branding/images/logo_styles/color_logo.jpg > Senior Equipment Engineer > > Microfabrication Laboratory Lead > /555 Technology Square/ > > /Cambridge, MA? 02139/ > > /mapril at draper.com / > > /O # 617-258-1613 C # 617-455-1596/ > > /www.draper.com > / > > *From:*labnetwork-bounces at mtl.mit.edu > *On Behalf Of *Pradeep Nyaupane > *Sent:* Sunday, November 3, 2019 8:21 AM > *To:* labnetwork at mtl.mit.edu > *Subject:* [labnetwork] Backing Vacuum Pump - Dry pumps vs Oil Pumps > > Dear All, > > ?We have been using Dry pumps for turbo pump backing for Sputters, > E-beam evaporators. And are planning to swap to oil pump with an > anti-suck back valve, whenever?required?(in case dry pumps go bad). > > We would like to know whether any of you are using oil pumps are being > used as backing pump for Turbo / Cryo / DP. > > Any advice / suggestions would be greatly appreciated. > > Thank You in advance. > > > Thanks & Regards, > Pradeep Nyaupane > > Technical Superintendent, > > Equipment Maintenance Team In-charge, > > IITBNF, Electrical Engg Dept > > IIT Bombay, India > > Tel No. 02225764471(O) > > ------------------------------------------------------------------------ > Notice: This email and any attachments may contain proprietary (Draper > non-public) and/or export-controlled information of Draper. If you are > not the intended recipient of this email, please immediately notify > the sender by replying to this email and immediately destroy all > copies of this email. > ------------------------------------------------------------------------ > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://urldefense.proofpoint.com/v2/url?u=https-3A__mtl.mit.edu_mailman_listinfo.cgi_labnetwork&d=DwICAg&c=sJ6xIWYx-zLMB3EPkvcnVg&r=gl_2fLZA_-_JfH_dOmx7ug&m=r5rIOAO6mwwu499DOGlm3KInSe3pP9iF64SaEDshfYA&s=-w3DLimaT2XywZG8S4xth595hMvyNcFtINhPI6ZvaUw&e= -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 1923 bytes Desc: not available URL: From iharvey at princeton.edu Mon Nov 4 14:08:22 2019 From: iharvey at princeton.edu (Ian Harvey) Date: Mon, 4 Nov 2019 19:08:22 +0000 Subject: [labnetwork] Backing Vacuum Pump - Dry pumps vs Oil Pumps Message-ID: <1D4C0B03-3F20-4405-B2BA-91D5306988FD@princeton.edu> Dear Pradeep and all, Here are some thoughts and experiences: At Utah we made the conscious decision to move to dry pumps and not allow any wet pumps into the facility as we moved into our new nanofab. We cleaned and PM'ed every tool that was previously on wet pumps, and used all new downstream hardware. This decision was based on: 1) the observation of pump oil saturating the downstream exhaust system and mixing with hazardous reaction products to create dripping toxic cocktails. This greatly complicates any modifications to the exhaust line, places trade workers at risk during modification or demolition, and places the exhaust system itself under corrosive liquid attack. 2) Not concerned for back pressure events contaminating chambers but instead concerned for the steady state back diffusion of volatile oils into the deposition chamber. This is something an anti-suckback valve will not help, nor will other schemes such as molecular sieves (after a short period). I would be very interested in any data that peers have to validate empirical observation of delaminating or non-adhering thin films onto oil contaminated surfaces. 3) The contamination of the lab itself from the leaky pumps. Each pump sits in a drip tray and the volatile oils soon coat every lab surface, creating slippery floors and loading the HEPA filters. Some individuals are sensitive to the effects of prolonged breathing of these vapors in what is otherwise considered a clean-for-breathing airspace. 4) Once a lab is contaminated with pump oil it is very difficult and expensive to revert back. I have also seen failed oil-sealed pumps backstreaming oil up into the nitrogen ballast line, so that the needle valve, bb-style N2 rotameter was bubbling in oil. This resulted in back contamination of the "ultra-pure" nitrogen line. I shudder to think of a decision to revert from dry back to wet pumps with all the ramifications such a decision entails. ?Ian Harvey Ian R. Harvey PRISM Cleanroom Director Princeton University 70 Prospect Avenue, Princeton, NJ 08540 609-258-5922 (office) 609-285-9951 (cell) iharvey at princeton.edu PRISM-Cleanroom.princeton.edu Begin forwarded message: From: Pradeep Nyaupane > Subject: [labnetwork] Backing Vacuum Pump - Dry pumps vs Oil Pumps Date: November 3, 2019 8:21:06 AM EST To: "labnetwork at mtl.mit.edu" > Dear All, We have been using Dry pumps for turbo pump backing for Sputters, E-beam evaporators. And are planning to swap to oil pump with an anti-suck back valve, whenever required (in case dry pumps go bad). We would like to know whether any of you are using oil pumps are being used as backing pump for Turbo / Cryo / DP. Any advice / suggestions would be greatly appreciated. Thank You in advance. Thanks & Regards, Pradeep Nyaupane Technical Superintendent, Equipment Maintenance Team In-charge, IITBNF, Electrical Engg Dept IIT Bombay, India Tel No. 02225764471(O) _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From schweig at umich.edu Mon Nov 4 14:46:39 2019 From: schweig at umich.edu (Dennis Schweiger) Date: Mon, 4 Nov 2019 14:46:39 -0500 Subject: [labnetwork] Cleanroom gowns: laundered in house In-Reply-To: <062D535C-385D-4415-951F-312BDDDAFE9F@colorado.edu> References: <062D535C-385D-4415-951F-312BDDDAFE9F@colorado.edu> Message-ID: Aju, we're probably the odd man out in regard to launderable clothing, as we have a contract with Cintas to handle all of our launderable garments. We turn in for cleaning anywhere from 400-550 pieces of clothing every week for our fab, with the average load size being about 450 pieces. It's an added expense that we're adjusting on a quarterly basis to make sure we have the correct number of clothing pieces, for both size, and variation of articles. In addition, our vendor has modified our suits and smocks so that we can put name tags on the backs of them for better identification of individuals, which is a prerequisite for working after hours in our facility. That functionality is working out quite well here. At one time we used disposable materials, but that was getting expensive, and had its own management problems. I'm curious for those that do this laundry service themselves, just how many pieces they're washing on a weekly basis..... With our current laundry load, there is no way I'd want to try and do this on our own, even if the labor was free. Dennis Schweiger Facility Manager University of Michigan/LNF 734.647.2055 Ofc On Fri, Nov 1, 2019 at 5:13 PM Aju Jugessur wrote: > Hi all, > > > > I am reaching out to the ISO 5 and 6 cleanroom users regarding cleanroom > gowns. > > > > Does anyone opted to laundered their own cleanroom gowns in house? If yes, > what type of washers/dryers you use? I am aware that washers specific for > cleanroom can be very expensive and outsourcing the task is also expensive. > I am also aware that some labs are using dedicated regular washers. > > > > Any advice and suggestions will be great. > > > > Thanks so much. > > Regards > > Aju > > > > > > > > > > Aju Jugessur *Ph.D. IEEE Sr. Member* > > Director, Colorado Shared Instrumentation in Nanofabrication and > Characterization (COSINC) > > Engineering Staff Council Member (Communications and Outreach) > > Discovery Learning Center > > *University of Colorado Boulder | **College of Engineering & Applied > Science* > > 1111 Engineering Drive ? 1B09 DLC *|* Boulder, CO 80309-0422 *|* *P:* > 303.735.5019*| F:* 303.492.2199 > > https://www.colorado.edu/facility/cosinc > > E-mail: aju.jugessur at colorado.edu > > > *Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever > (CliftonStrengths)* > > > > [image: signature_57561636] > > [image: signature_2026065586] > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 70328 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 3107 bytes Desc: not available URL: From shimonel at savion.huji.ac.il Tue Nov 5 01:41:16 2019 From: shimonel at savion.huji.ac.il (Shimon Eliav) Date: Tue, 5 Nov 2019 06:41:16 +0000 Subject: [labnetwork] Cleanroom gowns: laundered in house In-Reply-To: References: <062D535C-385D-4415-951F-312BDDDAFE9F@colorado.edu> Message-ID: Hi Dennis, Regarding your question about how many pieces we're washing on a weekly basis: we are a small lab (300m2) with 25 garments available in the gowning room. We have a hundred students allowed to use our clean room and five staff members. That is all. So, for this amount of garments, the in house laundry is very suitable. For the amount you mentioned (450 pieces a month) this is not a good solution, for sure. Regards, Shimon From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Dennis Schweiger Sent: Monday, 4 November 2019 21:47 To: Aju Jugessur Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Cleanroom gowns: laundered in house Aju, we're probably the odd man out in regard to launderable clothing, as we have a contract with Cintas to handle all of our launderable garments. We turn in for cleaning anywhere from 400-550 pieces of clothing every week for our fab, with the average load size being about 450 pieces. It's an added expense that we're adjusting on a quarterly basis to make sure we have the correct number of clothing pieces, for both size, and variation of articles. In addition, our vendor has modified our suits and smocks so that we can put name tags on the backs of them for better identification of individuals, which is a prerequisite for working after hours in our facility. That functionality is working out quite well here. At one time we used disposable materials, but that was getting expensive, and had its own management problems. I'm curious for those that do this laundry service themselves, just how many pieces they're washing on a weekly basis..... With our current laundry load, there is no way I'd want to try and do this on our own, even if the labor was free. Dennis Schweiger Facility Manager University of Michigan/LNF 734.647.2055 Ofc On Fri, Nov 1, 2019 at 5:13 PM Aju Jugessur > wrote: Hi all, I am reaching out to the ISO 5 and 6 cleanroom users regarding cleanroom gowns. Does anyone opted to laundered their own cleanroom gowns in house? If yes, what type of washers/dryers you use? I am aware that washers specific for cleanroom can be very expensive and outsourcing the task is also expensive. I am also aware that some labs are using dedicated regular washers. Any advice and suggestions will be great. Thanks so much. Regards Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Engineering Staff Council Member (Communications and Outreach) Discovery Learning Center University of Colorado Boulder | College of Engineering & Applied Science 1111 Engineering Drive ? 1B09 DLC | Boulder, CO 80309-0422 | P: 303.735.5019| F: 303.492.2199 https://www.colorado.edu/facility/cosinc E-mail: aju.jugessur at colorado.edu Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) [signature_57561636] [signature_2026065586] _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 5226 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.png Type: image/png Size: 4549 bytes Desc: image003.png URL: From patricns at uw.edu Tue Nov 5 09:53:51 2019 From: patricns at uw.edu (N Shane Patrick) Date: Tue, 5 Nov 2019 06:53:51 -0800 Subject: [labnetwork] Cleanroom gowns: laundered in house In-Reply-To: References: <062D535C-385D-4415-951F-312BDDDAFE9F@colorado.edu> Message-ID: <3958B5DE-586F-4155-ADD9-8869328060CC@uw.edu> Just to chime in - we also use a laundry service for these. We?ve used both Cintas and Aramark, but are currently with Cintas. Gowning and cleaning have been comparable between both companies, though each has its issues. Happy to discuss offline if anyone is looking for info there, but since that wasn?t the original topic, I won?t drag it out here. N. Shane Patrick Direct Write and Stepper Lithography Research Engineer, Washington Nanofabrication Facility (WNF) National Nanotechnology Coordinated Infrastructure (NNCI) University of Washington Fluke Hall 129, Box 352143 (206) 221-1045 patricns at uw.edu http://www.wnf.washington.edu/ > On Nov 4, 2019, at 10:41 PM, Shimon Eliav wrote: > > Hi Dennis, > > Regarding your question about how many pieces we're washing on a weekly basis: we are a small lab (300m2) with 25 garments available in the gowning room. We have a hundred students allowed to use our clean room and five staff members. That is all. So, for this amount of garments, the in house laundry is very suitable. For the amount you mentioned (450 pieces a month) this is not a good solution, for sure. > > Regards, > > Shimon > > From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu ] On Behalf Of Dennis Schweiger > Sent: Monday, 4 November 2019 21:47 > To: Aju Jugessur > > Cc: labnetwork at mtl.mit.edu > Subject: Re: [labnetwork] Cleanroom gowns: laundered in house > > Aju, > > we're probably the odd man out in regard to launderable clothing, as we have a contract with Cintas to handle all of our launderable garments. We turn in for cleaning anywhere from 400-550 pieces of clothing every week for our fab, with the average load size being about 450 pieces. It's an added expense that we're adjusting on a quarterly basis to make sure we have the correct number of clothing pieces, for both size, and variation of articles. In addition, our vendor has modified our suits and smocks so that we can put name tags on the backs of them for better identification of individuals, which is a prerequisite for working after hours in our facility. That functionality is working out quite well here. > > At one time we used disposable materials, but that was getting expensive, and had its own management problems. > > I'm curious for those that do this laundry service themselves, just how many pieces they're washing on a weekly basis..... With our current laundry load, there is no way I'd want to try and do this on our own, even if the labor was free. > > Dennis Schweiger > Facility Manager > University of Michigan/LNF > > 734.647.2055 Ofc > > > On Fri, Nov 1, 2019 at 5:13 PM Aju Jugessur > wrote: > Hi all, > > I am reaching out to the ISO 5 and 6 cleanroom users regarding cleanroom gowns. > > Does anyone opted to laundered their own cleanroom gowns in house? If yes, what type of washers/dryers you use? I am aware that washers specific for cleanroom can be very expensive and outsourcing the task is also expensive. I am also aware that some labs are using dedicated regular washers. > > Any advice and suggestions will be great. > > Thanks so much. > Regards > Aju > > > > > Aju Jugessur Ph.D. IEEE Sr. Member > Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) > Engineering Staff Council Member (Communications and Outreach) > Discovery Learning Center > University of Colorado Boulder | College of Engineering & Applied Science > 1111 Engineering Drive ? 1B09 DLC | Boulder, CO 80309-0422 | P: 303.735.5019| F: 303.492.2199 > > https://www.colorado.edu/facility/cosinc > E-mail: aju.jugessur at colorado.edu > Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever > (CliftonStrengths) > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From sojilori at gmail.com Tue Nov 5 10:35:38 2019 From: sojilori at gmail.com (Olusoji Ilori) Date: Tue, 5 Nov 2019 10:35:38 -0500 Subject: [labnetwork] Resusictaton of Autoprobe CP AFM Message-ID: Hi All, I am trying to resuscitate an Autoprobe CP Atomic Force Microscope manufactured by Park Systems but no longer supported. It is very old and runs on Windows 98. Does anybody have the software that controls the AFM or has written one, probably in LabVIEW, from scratch and willing to share? Cheers Soji Olusoji O. Ilori Postdoctoral Associate Microsystems Technology Laboratories Massachusetts Institute of Technology 77 Massachusetts Ave., Bldg. 39-655 Cambridge, MA 02139 m: 617-417-3486 -------------- next part -------------- An HTML attachment was scrubbed... URL: From Aju.Jugessur at Colorado.EDU Tue Nov 5 12:20:13 2019 From: Aju.Jugessur at Colorado.EDU (Aju Jugessur) Date: Tue, 5 Nov 2019 17:20:13 +0000 Subject: [labnetwork] Cleanroom gowns: laundered in house In-Reply-To: <062D535C-385D-4415-951F-312BDDDAFE9F@colorado.edu> References: <062D535C-385D-4415-951F-312BDDDAFE9F@colorado.edu> Message-ID: <3B2EA559-EAAF-403F-BF24-9FEAD994FCD2@colorado.edu> Hello members of the Labnetwork, Thanks so much for the valuable responses and suggestions that you have provided on this topic. They are helping us with our decision. Regards, Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Engineering Staff Council Member (Communications and Outreach) Discovery Learning Center University of Colorado Boulder | College of Engineering & Applied Science 1111 Engineering Drive ? 1B09 DLC | Boulder, CO 80309-0422 | P: 303.735.5019| F: 303.492.2199 https://www.colorado.edu/facility/cosinc E-mail: aju.jugessur at colorado.edu Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) [signature_2042960239] [signature_1273378589] From: Aju Jugessur Date: Friday, November 1, 2019 at 1:15 PM To: "labnetwork at mtl.mit.edu" Subject: Cleanroom gowns: laundered in house Hi all, I am reaching out to the ISO 5 and 6 cleanroom users regarding cleanroom gowns. Does anyone opt to laundered their own cleanroom gowns in house? If yes, what type of washers/dryers you use? I am aware that washers specific for cleanroom can be very expensive and outsourcing the task is also expensive. I am also aware that some labs are using dedicated regular washers. Any advice and suggestions will be great. Thanks so much. Regards Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Engineering Staff Council Member (Communications and Outreach) Discovery Learning Center University of Colorado Boulder | College of Engineering & Applied Science 1111 Engineering Drive ? 1B09 DLC | Boulder, CO 80309-0422 | P: 303.735.5019| F: 303.492.2199 https://www.colorado.edu/facility/cosinc E-mail: aju.jugessur at colorado.edu Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) [signature_57561636] [signature_2026065586] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 70328 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 3107 bytes Desc: image002.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.jpg Type: image/jpeg Size: 70329 bytes Desc: image003.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image004.png Type: image/png Size: 3108 bytes Desc: image004.png URL: From sguo18 at yorku.ca Wed Nov 6 09:01:16 2019 From: sguo18 at yorku.ca (Xin (Shane) Guo) Date: Wed, 6 Nov 2019 14:01:16 +0000 Subject: [labnetwork] Gas exhaust Message-ID: Hi Colleagues, We are trying to set up a dual chamber PECVD-RIE system. Our internal team has concerns of mixed fumes sharing the same exhaust. The gases involve NH3(in a gas cabinet), N2, O2, Ar, He, SF6, CHF3, CF4, TEOS and DES (vapor draw), though it should be only traces of the waste gases going into the exhaust. Can you share what your practice is in your facility? Do you use separate exhaust for different groups of gases? What is the best place to find the guideline or regulation of such thing? Best Shane -------------- next part -------------- An HTML attachment was scrubbed... URL: From codreanu at udel.edu Wed Nov 6 12:41:18 2019 From: codreanu at udel.edu (Iulian Codreanu) Date: Wed, 6 Nov 2019 12:41:18 -0500 Subject: [labnetwork] Gas exhaust In-Reply-To: References: Message-ID: <7f3a61f1-6cb8-2560-35e5-60218e85f105@udel.edu> Hi Shane, Our PECVD pump's exhaust goes through a scrubber on its way to a teflon-coated stainless steel exhaust system. We have a "solvent" exhaust system (stainless steel) and a "corrosive" exhaust system (teflon-coated stainless steel). It's easy to connect fume hoods to the "proper" exhaust system. It's not so easy for tools (because they use combinations of types of gases) so we tend to connect the etchers and the CVD tools to the corrosive system. The teflon-coated system offers both corrosion protection (through the teflon coating) and fire protection (through the stainless steel). As I mentioned at the beginning, we use point of use abatement on those tools as an added measure. Iulian iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 11/6/2019 9:01 AM, Xin (Shane) Guo wrote: > Hi Colleagues, > > We are trying to set up a dual chamber PECVD-RIE system. Our internal > team has concerns of mixed fumes sharing the same exhaust. The gases > involve NH3(in a gas cabinet), N2, O2, Ar, He, SF6, CHF3, CF4, TEOS > and DES (vapor draw), though it should be only traces of the waste > gases going into the exhaust. > > Can you share what your practice is in your facility? Do you use > separate exhaust for different groups of gases? What is the best place > to find the guideline or regulation of such thing? > > Best > > Shane > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From shimonel at savion.huji.ac.il Wed Nov 6 12:42:07 2019 From: shimonel at savion.huji.ac.il (Shimon Eliav) Date: Wed, 6 Nov 2019 17:42:07 +0000 Subject: [labnetwork] Gas exhaust In-Reply-To: References: Message-ID: Hi Shane, We have two separate systems with separate vacuum pumps. The exhaust lines are separated. For the PECVD the exhaust line is made of Stainless Steel. For the ICP-RIE it is made of PPS. Both system are equipped with dry pumps. During process there is a N2 flow of 30 l/min going through the pumps, so it dilutes the waste gases going to exhaust. Both systems are running for more about ten years with no incident. Regards, Shimon The Hebrew University of Jerusalem The Unit for Nano Fabrication From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Xin (Shane) Guo Sent: Wednesday, 6 November 2019 16:01 To: labnetwork at mtl.mit.edu Subject: [labnetwork] Gas exhaust Hi Colleagues, We are trying to set up a dual chamber PECVD-RIE system. Our internal team has concerns of mixed fumes sharing the same exhaust. The gases involve NH3(in a gas cabinet), N2, O2, Ar, He, SF6, CHF3, CF4, TEOS and DES (vapor draw), though it should be only traces of the waste gases going into the exhaust. Can you share what your practice is in your facility? Do you use separate exhaust for different groups of gases? What is the best place to find the guideline or regulation of such thing? Best Shane -------------- next part -------------- An HTML attachment was scrubbed... URL: From vamsinittala at gmail.com Wed Nov 6 17:29:29 2019 From: vamsinittala at gmail.com (N P VAMSI KRISHNA) Date: Wed, 6 Nov 2019 16:29:29 -0600 Subject: [labnetwork] Gas exhaust In-Reply-To: References: Message-ID: Dear Xin Guo, in my previous workplace, we used to have a separate point of use (POU) abatement systems for PECVD (Burn box at 800 C) and RIE-Fl (NaOH scrubber). Looks like you are not using most of the toxic gases in PECVD (Ex. Silane, Diborane, Hydrogen, phosphine...). If you want to use them, it may be a good idea to have a separate POU scrubber for PECVD and the exhaust of the burn-box/dry scrubber you can merge with the central dry exhaust. Thanks & best regards, Vamsi On Wed, Nov 6, 2019 at 10:49 AM Xin (Shane) Guo wrote: > Hi Colleagues, > > We are trying to set up a dual chamber PECVD-RIE system. Our internal team > has concerns of mixed fumes sharing the same exhaust. The gases involve > NH3(in a gas cabinet), N2, O2, Ar, He, SF6, CHF3, CF4, TEOS and DES (vapor > draw), though it should be only traces of the waste gases going into the > exhaust. > > Can you share what your practice is in your facility? Do you use separate > exhaust for different groups of gases? What is the best place to find the > guideline or regulation of such thing? > > Best > > Shane > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- ___________________________________________________ N.P. Vamsi Krishna, PhD Postdoctoral Fellow Pritzker School of Molecular Engineering, *The University of Chicago * Center for Nanoscale Materials, *Argonne National Laboratory * Phone: 1 (331) 757-8565 -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtkhbeis at gmail.com Wed Nov 6 18:41:23 2019 From: mtkhbeis at gmail.com (mtkhbeis at gmail.com) Date: Wed, 6 Nov 2019 15:41:23 -0800 Subject: [labnetwork] Open Position- Cleanroom Manager Message-ID: <3134B906-7F73-46A0-BF90-89E20B9819CB@gmail.com> Facebook Reality Labs is currently recruiting for a Cleanroom manager. If you are interested in applying, please send me your CV. Best regards, Dr. Michael Khbeis (C) 443.254.5192 -------------- next part -------------- An HTML attachment was scrubbed... URL: From mheiden at engr.ucr.edu Wed Nov 6 21:54:40 2019 From: mheiden at engr.ucr.edu (Mark Heiden) Date: Thu, 7 Nov 2019 02:54:40 +0000 Subject: [labnetwork] Gas exhaust In-Reply-To: <7f3a61f1-6cb8-2560-35e5-60218e85f105@udel.edu> References: <7f3a61f1-6cb8-2560-35e5-60218e85f105@udel.edu> Message-ID: Hi Shane, Our lab setup is very similar to that described by Iulian except we don?t have POU scrubbers. We do however have toxic gas monitors in all exhaust streams and in 15 years they have never measured a detectable amount to trigger an alarm. My guess is that would be the first sign that we had any kind of risk. Mark Heiden NanoFab Cleanroom Manager Center for Nanoscale Science and Engineering University of California, Riverside 951-827-2551 https://nanofab.ucr.edu/ From: labnetwork-bounces at mtl.mit.edu On Behalf Of Iulian Codreanu Sent: Wednesday, November 06, 2019 9:41 AM To: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Gas exhaust Hi Shane, Our PECVD pump's exhaust goes through a scrubber on its way to a teflon-coated stainless steel exhaust system. We have a "solvent" exhaust system (stainless steel) and a "corrosive" exhaust system (teflon-coated stainless steel). It's easy to connect fume hoods to the "proper" exhaust system. It's not so easy for tools (because they use combinations of types of gases) so we tend to connect the etchers and the CVD tools to the corrosive system. The teflon-coated system offers both corrosion protection (through the teflon coating) and fire protection (through the stainless steel). As I mentioned at the beginning, we use point of use abatement on those tools as an added measure. Iulian iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 11/6/2019 9:01 AM, Xin (Shane) Guo wrote: Hi Colleagues, We are trying to set up a dual chamber PECVD-RIE system. Our internal team has concerns of mixed fumes sharing the same exhaust. The gases involve NH3(in a gas cabinet), N2, O2, Ar, He, SF6, CHF3, CF4, TEOS and DES (vapor draw), though it should be only traces of the waste gases going into the exhaust. Can you share what your practice is in your facility? Do you use separate exhaust for different groups of gases? What is the best place to find the guideline or regulation of such thing? Best Shane _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From usha at stanford.edu Thu Nov 7 15:43:33 2019 From: usha at stanford.edu (Usha Raghuram) Date: Thu, 7 Nov 2019 20:43:33 +0000 Subject: [labnetwork] 2019 NNCI Etch Symposium - December 5-6, 2019 - Harvard University Message-ID: Hello Everyone, This year's NNCI Etch Symposium, Novel Nanoscale Etching of Electronic, Photonic and Quantum Materials, at Harvard is quickly approaching and we are looking forward to another very successful networking event. We have planned a full 2-day event with day 1(Dec.5) being a closed session for NNCI and non-NNCI site academic staff to present site updates detailing etch capabilities and processes. Day 2 (Dec.6) is open to the public and will feature talks from experts in nano and quantum technology. There will be a vendor exhibit on both days where attendees can interface with etch system manufacturing representatives and learn about their latest offerings. Attached are the announcement letter with details about the symposium, including information about registration and accommodations, and symposium agenda for Dec.6. We are asking everyone planning to attend to register for the event at https://cns1.rc.fas.harvard.edu/nnci-2019-etch-symposium/ so that we can plan accordingly. Invited speakers for day 2 are asked to submit a short bio to members of the organizing committee. We look forward to your attendance and participation in making this symposium a great success. If you have questions, please contact any member of the organizing committee. Regards, Usha Raghuram-Stanford: usha at stanford.edu Ling Xie-Harvard: lxie at cns.fas.harvard.edu Vince Genova-Cornell: Genova at cnf.cornell.edu Sarmita Majumder-U. Texas: sarmita at utexas.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: NNCI 2019 Etch Symposium program final.pdf Type: application/pdf Size: 2594609 bytes Desc: NNCI 2019 Etch Symposium program final.pdf URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: NNCI 2019 Etch Symposium announcement 11-2019.pdf Type: application/pdf Size: 129171 bytes Desc: NNCI 2019 Etch Symposium announcement 11-2019.pdf URL: From lei.z.wang at yale.edu Fri Nov 8 14:19:59 2019 From: lei.z.wang at yale.edu (Wang, Lei) Date: Fri, 8 Nov 2019 19:19:59 +0000 Subject: [labnetwork] Bulkhead between cleanroom and regular service room Message-ID: Dear Colleagues, We are working on cleanroom expansion, but might with a regular service room. Does anyone have experience with bulkhead method between cleanroom and 'dirty' service room? The front of our new e beam evaporator will sit in cleanroom, but the back might be in a regular service room. Anyone knows is there any issue for this wall mount method? Do we need to seal all the gaps to avoid the contamination coming from the service room? Is the vibration a big problem when the system is running? All suggestions and comments are welcome. Thank you so much. Lei Lei Wang, Ph.D. Yale West Campus Cleanroom 750 West Campus Drive West Haven, CT, 06516 lei.z.wang at yale.edu 203-737-6579 -------------- next part -------------- An HTML attachment was scrubbed... URL: From hollingshead.19 at osu.edu Fri Nov 8 16:07:29 2019 From: hollingshead.19 at osu.edu (Hollingshead, David) Date: Fri, 8 Nov 2019 21:07:29 +0000 Subject: [labnetwork] Hot Plate Organization Racks Message-ID: Hi all, We currently have a number of stand-alone hotplates simply placed on a work table in our litho bay. While easily accessible, it is not exactly the most efficient use of space. We would like to consolidate these into some sort of rack or shelving to free up room in the bay. I've seen nice examples of pull-out drawer units in some other labs (MIT and possibly Harvard come to mind?) that we were thinking of replicating. Does anyone on labnetwork have suggestions on where to buy/build a similar unit? Any other tips or ideas? Thank you, -Dave Dave Hollingshead Senior Research Associate - Nanotech West Lab The Ohio State University Suite 100, 1381 Kinnear Road, Columbus, OH 43212 614.292.1355 Office hollingshead.19 at osu.edu osu.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From ana.sanchez at louisville.edu Fri Nov 8 12:01:36 2019 From: ana.sanchez at louisville.edu (KY Multiscale Manufacturing and Nano Integration Node) Date: Fri, 8 Nov 2019 12:01:36 -0500 (EST) Subject: [labnetwork] Upcoming KY Multiscale Event: Workshop by Lesker on Vacuum Technology Message-ID: <1133490317255.1131404001080.2098960567.0.251200JL.2102@scheduler.constantcontact.com> ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ Lesker University Vacuum Technology Workshop ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ When Thursday, November 14, 2019 from 8:00 AM to 5:00 PM EST Add to Calendar [http://r20.rs6.net/tn.jsp?f=001Mend4wCQkp0-TKC2p7JPh5Y3dXqGZaYQAm-kYky9W_lri_QUsN04C1yJyvR8Qy2eJWgSvVLXvVss-xbFJEWptSfax12oxyu3wGUwMCwn0IQf8EED2cRatkcqMmeJKV6YRU32_hPmTuH74JFke7PUiYbJOUzicR_QRgBAyvLhUHK6fm2fBjZF_CNVdymvsXdDa0dg46SoYR5MZ7A_Xzpmaf5QRIRqe7CPMY8rVJ_zS6Lw31xNzit9G4JF_jHEZ54YrDmlFKqV6c0=&c=ST-LrHSr5jOzg0LSTBqzEC7-_T6ynJtJsx6vTVnL5OM_44m1awGZEw==&ch=maDAA1zx6IYOfCUijLnAvwXWUtAQ1DHZKDcQeyXhSqweXtRI7BvX8Q==] Where Vogt Building, Room 311 334 Eastern Parkway Louisville, KY 40292 Driving Directions [http://r20.rs6.net/tn.jsp?f=001Mend4wCQkp0-TKC2p7JPh5Y3dXqGZaYQAm-kYky9W_lri_QUsN04C1yJyvR8Qy2eI-TOWuzLjUIbG3cqOM2QQOAzcc2Fk0y1P-MLowgHFnDHGps6DrOmutzRty6Xu3C8KV3or9glcoBUROx0U2G6VQXDAQMsUhES7_y0fL2wDo6qyfBNKJMGAo2kBfKofzXd8FfS2NF1W8VwkMa6sasRMw9SYLzNcHxEHOd4LLbVfGxnU1MkRPD1QfDeLIYvEsiVA5XOuxAlKk8=&c=ST-LrHSr5jOzg0LSTBqzEC7-_T6ynJtJsx6vTVnL5OM_44m1awGZEw==&ch=maDAA1zx6IYOfCUijLnAvwXWUtAQ1DHZKDcQeyXhSqweXtRI7BvX8Q==] ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ Dear Lab Network Mail list, The KY Multiscale [http://r20.rs6.net/tn.jsp?f=001Mend4wCQkp0-TKC2p7JPh5Y3dXqGZaYQAm-kYky9W_lri_QUsN04C0Wqz_cr1Re_Wx9B-lJjayl9DGwOCEux5wArbHdQyDEgaK5EwL7Z6h1kwr8MsBkukKqMV8SQDfKT1p5p7_866JP3e2-33YnQ_ubATl-U5EcURRJqjPpJ-dOAVjk-jeJEvg==&c=ST-LrHSr5jOzg0LSTBqzEC7-_T6ynJtJsx6vTVnL5OM_44m1awGZEw==&ch=maDAA1zx6IYOfCUijLnAvwXWUtAQ1DHZKDcQeyXhSqweXtRI7BvX8Q==] and Micro/Nano Technology Center [http://r20.rs6.net/tn.jsp?f=001Mend4wCQkp0-TKC2p7JPh5Y3dXqGZaYQAm-kYky9W_lri_QUsN04CyZ7mRvi_8lR0GndP_NGJtlwD-hl7lwMlKcBDd5CTBF8G5B3_CWLr6aW357XIiRrFHjsb7qlQc5QL4BImmCVZWsWPXiPm37iKtKB5nAtv2bQdJ2KwwvKxb0xwKJNfGTksg==&c=ST-LrHSr5jOzg0LSTBqzEC7-_T6ynJtJsx6vTVnL5OM_44m1awGZEw==&ch=maDAA1zx6IYOfCUijLnAvwXWUtAQ1DHZKDcQeyXhSqweXtRI7BvX8Q==] will be hosting a Vacuum Technology Workshop by Kurt J.Lesker [http://r20.rs6.net/tn.jsp?f=001Mend4wCQkp0-TKC2p7JPh5Y3dXqGZaYQAm-kYky9W_lri_QUsN04C1yJyvR8Qy2eSVKdvL_K8vgvYtgnIbI0KNm8URBEw4ug1g_-0Ki5nkYZ72f7rxtY20aTauLQyho_nQpH3R2HfYTeO2N92zbA_cDXPwJvgEQfq20xYFCPWMqd33uvzJHFYQ==&c=ST-LrHSr5jOzg0LSTBqzEC7-_T6ynJtJsx6vTVnL5OM_44m1awGZEw==&ch=maDAA1zx6IYOfCUijLnAvwXWUtAQ1DHZKDcQeyXhSqweXtRI7BvX8Q==] Company. The event will take place at the University of Louisville Belknap campus. We welcome you to attend this workshop and free lunch. Registration is free, RSVP is required. Please register by November 11. Only 4 spots left!!! Course Topics and Schedule: * 8am - Registration * * 8:30am to 12:30pm - Introduction to Vacuum Science and System Design * * 12:30pm to 1pm - Lunch provided to registered attendees * * 1pm to 5pm - Physical Vapor Deposition and Thin Film Growth Models ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ Click here for full agenda and more information [http://events.r20.constantcontact.com/register/event?oeidk=a07egky5ff42f284cb7&c=c77ec6f2-d328-11e9-9f7e-d4ae526edd6c&ch=c77fd010-d328-11e9-9f7e-d4ae526edd6c] Register Now! [http://events.r20.constantcontact.com/register/regform?oeidk=a07egky5ff42f284cb7&c=c77ec6f2-d328-11e9-9f7e-d4ae526edd6c&ch=c77fd010-d328-11e9-9f7e-d4ae526edd6c] I can't make it [http://events.r20.constantcontact.com/register/decline?oeidk=a07egky5ff42f284cb7&c=c77ec6f2-d328-11e9-9f7e-d4ae526edd6c&ch=c77fd010-d328-11e9-9f7e-d4ae526edd6c] ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ If you have any questions about the event or how to register please contact Ana Sanchez at ana.sanchez at louisville.edu. Thank you for your attention and response, we look forward to seeing you at this event. Sincerely, KY Multiscale Manufacturing and Nano Integration Node KY MMNIN ana.sanchez at louisville.edu 502-852-1568 ~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~~ Forward email http://ui.constantcontact.com/sa/fwtf.jsp?llr=yz46ow6ab&m=1131404001080&ea=labnetwork at mtl.mit.edu&a=1133490317255 This email was sent to labnetwork at mtl.mit.edu by ana.sanchez at louisville.edu. 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URL: From spaolini at cns.fas.harvard.edu Fri Nov 8 17:56:32 2019 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Fri, 8 Nov 2019 22:56:32 +0000 Subject: [labnetwork] Bulkhead between cleanroom and regular service room In-Reply-To: References: Message-ID: Lei, I need to know a few things before answering; Is your clean room a ballroom style with raised floors or is it a traditional "sidewinder" style where the return air passes into the chases and back up to the pre-filters? Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu From: labnetwork-bounces at mtl.mit.edu On Behalf Of Wang, Lei Sent: Friday, November 08, 2019 2:20 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Bulkhead between cleanroom and regular service room Dear Colleagues, We are working on cleanroom expansion, but might with a regular service room. Does anyone have experience with bulkhead method between cleanroom and 'dirty' service room? The front of our new e beam evaporator will sit in cleanroom, but the back might be in a regular service room. Anyone knows is there any issue for this wall mount method? Do we need to seal all the gaps to avoid the contamination coming from the service room? Is the vibration a big problem when the system is running? All suggestions and comments are welcome. Thank you so much. Lei Lei Wang, Ph.D. Yale West Campus Cleanroom 750 West Campus Drive West Haven, CT, 06516 lei.z.wang at yale.edu 203-737-6579 -------------- next part -------------- An HTML attachment was scrubbed... URL: From nclay at upenn.edu Fri Nov 8 18:17:02 2019 From: nclay at upenn.edu (Noah Clay) Date: Fri, 8 Nov 2019 18:17:02 -0500 Subject: [labnetwork] Hot Plate Organization Racks In-Reply-To: References: Message-ID: <2C09E7F0-2912-424E-A682-64B02F585691@upenn.edu> Hi David, We use Reynolds Tech hot plate towers. They?re great and save us a ton of room. My contact is Vince Reynolds: vr at reynoldstech.com Noah Clay University of Pennsylvania Philadelphia, PA Sent from my iPhone > On Nov 8, 2019, at 18:08, Hollingshead, David wrote: > > ? > Hi all, > > We currently have a number of stand-alone hotplates simply placed on a work table in our litho bay. While easily accessible, it is not exactly the most efficient use of space. We would like to consolidate these into some sort of rack or shelving to free up room in the bay. I?ve seen nice examples of pull-out drawer units in some other labs (MIT and possibly Harvard come to mind?) that we were thinking of replicating. > > Does anyone on labnetwork have suggestions on where to buy/build a similar unit? Any other tips or ideas? > > Thank you, > -Dave > > Dave Hollingshead > Senior Research Associate ? Nanotech West Lab > The Ohio State University > Suite 100, 1381 Kinnear Road, Columbus, OH 43212 > 614.292.1355 Office > hollingshead.19 at osu.edu osu.edu > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From lei.z.wang at yale.edu Fri Nov 8 18:33:21 2019 From: lei.z.wang at yale.edu (Wang, Lei) Date: Fri, 8 Nov 2019 23:33:21 +0000 Subject: [labnetwork] Bulkhead between cleanroom and regular service room In-Reply-To: References: , Message-ID: Hi Steven, Thank you very much for your reply. It will be a traditional sidewinder style. But the air will return to the pre-filters via closed pipe lines, without passing into the service chase. So our cleanroom and service room are isolated. Have a great weekend. Best Lei ________________________________ From: Paolini, Steven Sent: Friday, November 8, 2019 5:56 PM To: Wang, Lei ; labnetwork at mtl.mit.edu Subject: RE: Bulkhead between cleanroom and regular service room Lei, I need to know a few things before answering; Is your clean room a ballroom style with raised floors or is it a traditional ?sidewinder? style where the return air passes into the chases and back up to the pre-filters? Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu From: labnetwork-bounces at mtl.mit.edu On Behalf Of Wang, Lei Sent: Friday, November 08, 2019 2:20 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Bulkhead between cleanroom and regular service room Dear Colleagues, We are working on cleanroom expansion, but might with a regular service room. Does anyone have experience with bulkhead method between cleanroom and 'dirty' service room? The front of our new e beam evaporator will sit in cleanroom, but the back might be in a regular service room. Anyone knows is there any issue for this wall mount method? Do we need to seal all the gaps to avoid the contamination coming from the service room? Is the vibration a big problem when the system is running? All suggestions and comments are welcome. Thank you so much. Lei Lei Wang, Ph.D. Yale West Campus Cleanroom 750 West Campus Drive West Haven, CT, 06516 lei.z.wang at yale.edu 203-737-6579 -------------- next part -------------- An HTML attachment was scrubbed... URL: From kpayer at mit.edu Fri Nov 8 23:14:50 2019 From: kpayer at mit.edu (Kristofor Robert Payer) Date: Sat, 9 Nov 2019 04:14:50 +0000 Subject: [labnetwork] Hot Plate Organization Racks Message-ID: <909B107D-4209-4F62-BF98-D03E3DAC3519@mit.edu> Hi Dave, At MIT.nano, we looked into this about a year and a half ago. We knew UPenn and Harvard had some of these ?Hotplate Towers? based on previous visits there. UPenn had some useful feedback for us: cord management is an important feature, as well as leveling capabilities. We decided to build a unit with fixed shelves (instead of sliding shelves like other have) to help with both of these issues? we also increased space between fixed shelves to compensate for working space as well as added lights (with filters for photolithography). Both Air Control and Reynolds Tech had excellent design solutions. We ended up buying some nice units from Air Control and we are very happy with the Towers (photo attached). Happy to answer any additional questions you may have, feel free to reach out. Best, Kris Kristofor Payer MIT.nano Massachusetts Institute of Technology 60 Vassar Street 12-4011 Cambridge, MA 02139 617-324-1469 kpayer at mit.edu From: on behalf of "Hollingshead, David" Date: Friday, November 8, 2019 at 6:11 PM To: "labnetwork at mtl.mit.edu" Subject: [labnetwork] Hot Plate Organization Racks Hi all, We currently have a number of stand-alone hotplates simply placed on a work table in our litho bay. While easily accessible, it is not exactly the most efficient use of space. We would like to consolidate these into some sort of rack or shelving to free up room in the bay. I?ve seen nice examples of pull-out drawer units in some other labs (MIT and possibly Harvard come to mind?) that we were thinking of replicating. Does anyone on labnetwork have suggestions on where to buy/build a similar unit? Any other tips or ideas? Thank you, -Dave Dave Hollingshead Senior Research Associate ? Nanotech West Lab The Ohio State University Suite 100, 1381 Kinnear Road, Columbus, OH 43212 614.292.1355 Office hollingshead.19 at osu.edu osu.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 011119 Hotplate Tower MoveIn.jpg Type: image/jpeg Size: 1890334 bytes Desc: 011119 Hotplate Tower MoveIn.jpg URL: From sguo18 at yorku.ca Sat Nov 9 20:39:36 2019 From: sguo18 at yorku.ca (Xin (Shane) Guo) Date: Sun, 10 Nov 2019 01:39:36 +0000 Subject: [labnetwork] Gas exhaust In-Reply-To: References: <7f3a61f1-6cb8-2560-35e5-60218e85f105@udel.edu> Message-ID: Thank you for all the suggestions! Regards Shane On Thu, Nov 7, 2019 at 8:25 AM Mark Heiden > wrote: Hi Shane, Our lab setup is very similar to that described by Iulian except we don?t have POU scrubbers. We do however have toxic gas monitors in all exhaust streams and in 15 years they have never measured a detectable amount to trigger an alarm. My guess is that would be the first sign that we had any kind of risk. Mark Heiden NanoFab Cleanroom Manager Center for Nanoscale Science and Engineering University of California, Riverside 951-827-2551 https://nanofab.ucr.edu/ From: labnetwork-bounces at mtl.mit.edu > On Behalf Of Iulian Codreanu Sent: Wednesday, November 06, 2019 9:41 AM To: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Gas exhaust Hi Shane, Our PECVD pump's exhaust goes through a scrubber on its way to a teflon-coated stainless steel exhaust system. We have a "solvent" exhaust system (stainless steel) and a "corrosive" exhaust system (teflon-coated stainless steel). It's easy to connect fume hoods to the "proper" exhaust system. It's not so easy for tools (because they use combinations of types of gases) so we tend to connect the etchers and the CVD tools to the corrosive system. The teflon-coated system offers both corrosion protection (through the teflon coating) and fire protection (through the stainless steel). As I mentioned at the beginning, we use point of use abatement on those tools as an added measure. Iulian iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 11/6/2019 9:01 AM, Xin (Shane) Guo wrote: Hi Colleagues, We are trying to set up a dual chamber PECVD-RIE system. Our internal team has concerns of mixed fumes sharing the same exhaust. The gases involve NH3(in a gas cabinet), N2, O2, Ar, He, SF6, CHF3, CF4, TEOS and DES (vapor draw), though it should be only traces of the waste gases going into the exhaust. Can you share what your practice is in your facility? Do you use separate exhaust for different groups of gases? What is the best place to find the guideline or regulation of such thing? Best Shane _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From amahmood at hbku.edu.qa Sun Nov 10 05:53:56 2019 From: amahmood at hbku.edu.qa (Dr. Aamer Mahmood) Date: Sun, 10 Nov 2019 10:53:56 +0000 Subject: [labnetwork] Cross contamination due to evaporation on lead containing perovskite material Message-ID: Hello all, I have been asked by a colleague to evaporate gold on some organic photovoltaic cells. The cells contain lead containing perovskite material. The evaporator used traditionally for perovskite based research is currently down and to save time the use of another evaporator used for evaporation of metals and reactively deposited metal oxides is being explored. I am concerned about contamination of the chamber - especially by lead. I would appreciate relevant experiences and opinions. Thanks. -Aamer Mahmood -------------- next part -------------- An HTML attachment was scrubbed... URL: From nclay at upenn.edu Sun Nov 10 13:57:11 2019 From: nclay at upenn.edu (Noah Clay) Date: Sun, 10 Nov 2019 13:57:11 -0500 Subject: [labnetwork] Cross contamination due to evaporation on lead containing perovskite material In-Reply-To: References: Message-ID: Hi Aamer, It?s a tough situation when you have to put a material in a chamber that makes you uneasy and could affect other researchers? work in your lab. If it must be done, I recommend avoiding ion pre-cleans, substrate bias, heating or other wafer-level processes that might volatilize Pb from the perovskites. Here?s my two cents, FWIW: 1. Benchmark your chamber: deposit a film such as silver on a bare wafer, which entrains background contamination and can be used in SIMS or XPS analysis to fingerprint the current chamber state. 2. Protect the chamber: UHV foil wrap appropriate inner chamber hardware. Run the process and tear down the foil. 3. Compare chamber states: Repeat #1 and quantify any deltas. Good luck, Noah Clay University of Pennsylvania Philadelphia, PA Sent from my iPhone > On Nov 10, 2019, at 08:57, Dr. Aamer Mahmood wrote: > > ? > Hello all, > I have been asked by a colleague to evaporate gold on some organic photovoltaic cells. The cells contain lead containing perovskite material. > The evaporator used traditionally for perovskite based research is currently down and to save time the use of another evaporator used for evaporation of metals and reactively deposited metal oxides is being explored. > I am concerned about contamination of the chamber ? especially by lead. > I would appreciate relevant experiences and opinions. > Thanks. > -Aamer Mahmood > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From fouad.karouta at anu.edu.au Sun Nov 10 17:17:53 2019 From: fouad.karouta at anu.edu.au (Fouad Karouta) Date: Sun, 10 Nov 2019 22:17:53 +0000 Subject: [labnetwork] Cross contamination due to evaporation on lead containing perovskite material In-Reply-To: References: Message-ID: Dear Aamer, Our open access e-beam evaporator is regularly used to evaporate gold on perovskite materials. We haven't experienced any issue with this. Only point of attention, pumping time may go bit longer to reach the required vacuum. Some users reduce the system base pressure when they use it for evaporating gold on perovskite. Best regards, Fouad ************************************* Manager ANFF ACT Node Australian National Fabrication Facility Research School of Physics L. Huxley Building (#56), Mills Road, Room 4.02 Australian National University ACT 2601, Canberra, Australia Tel: + 61 2 6125 7174 Mob: + 61 451 046 412 Email: fouad.karouta at anu.edu.au http://anff-act.anu.edu.au/ From: labnetwork-bounces at mtl.mit.edu On Behalf Of Dr. Aamer Mahmood Sent: Sunday, 10 November 2019 9:54 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Cross contamination due to evaporation on lead containing perovskite material Hello all, I have been asked by a colleague to evaporate gold on some organic photovoltaic cells. The cells contain lead containing perovskite material. The evaporator used traditionally for perovskite based research is currently down and to save time the use of another evaporator used for evaporation of metals and reactively deposited metal oxides is being explored. I am concerned about contamination of the chamber - especially by lead. I would appreciate relevant experiences and opinions. Thanks. -Aamer Mahmood -------------- next part -------------- An HTML attachment was scrubbed... URL: From mapril at draper.com Mon Nov 11 05:12:10 2019 From: mapril at draper.com (April, Mark R.) Date: Mon, 11 Nov 2019 10:12:10 +0000 Subject: [labnetwork] Bulkhead between cleanroom and regular service room In-Reply-To: References: Message-ID: <2bce2cabe131458dbc781e4df9e43c36@draper.com> HI Lei Here at Draper we have a traditional "sidewinder" style clean room. A large majority of our tools are bulkhead mounted, with very slight air gaps between the tool and wall. Of course the rooms were balanced with this in mind. We have not had any particle issues and can maintain class 100 and 1000 in those areas. All of our pumps ,chillers , critical alignment tools are on vibration isolation pads that really helped out tremendously. I found them at isolateit.com there are different types. Thanks Mark R. April [https://intranet.draper.com/pcweb/media/branding/images/logo_styles/color_logo.jpg] Senior Equipment Engineer Microfabrication Laboratory Lead 555 Technology Square Cambridge, MA 02139 mapril at draper.com O # 617-258-1613 C # 617-455-1596 www.draper.com From: labnetwork-bounces at mtl.mit.edu On Behalf Of Paolini, Steven Sent: Friday, November 8, 2019 5:57 PM To: Wang, Lei ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Bulkhead between cleanroom and regular service room Lei, I need to know a few things before answering; Is your clean room a ballroom style with raised floors or is it a traditional "sidewinder" style where the return air passes into the chases and back up to the pre-filters? Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu From: labnetwork-bounces at mtl.mit.edu > On Behalf Of Wang, Lei Sent: Friday, November 08, 2019 2:20 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Bulkhead between cleanroom and regular service room Dear Colleagues, We are working on cleanroom expansion, but might with a regular service room. Does anyone have experience with bulkhead method between cleanroom and 'dirty' service room? The front of our new e beam evaporator will sit in cleanroom, but the back might be in a regular service room. Anyone knows is there any issue for this wall mount method? Do we need to seal all the gaps to avoid the contamination coming from the service room? Is the vibration a big problem when the system is running? All suggestions and comments are welcome. Thank you so much. Lei Lei Wang, Ph.D. Yale West Campus Cleanroom 750 West Campus Drive West Haven, CT, 06516 lei.z.wang at yale.edu 203-737-6579 ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 1923 bytes Desc: image001.jpg URL: From ksnagaraj7 at gmail.com Wed Nov 13 12:56:56 2019 From: ksnagaraj7 at gmail.com (Nagaraj Krishna Subbaiah) Date: Wed, 13 Nov 2019 18:56:56 +0100 Subject: [labnetwork] Flexible Polymer Molds for R2R UV imprinting Message-ID: Dear Members, Would be interested to know if any of the members here are working on R2R UV processes. I would be glad to hear about how one fabricates large area flexible molds. The flexible mold would then be mounted onto the drum/imprint roller of the system. Sincerely, Nagaraj -------------- next part -------------- An HTML attachment was scrubbed... URL: From pradnya.chabbi at gmail.com Fri Nov 15 07:08:37 2019 From: pradnya.chabbi at gmail.com (Pradnya Chabbi) Date: Fri, 15 Nov 2019 17:38:37 +0530 Subject: [labnetwork] e-beam evaporation after e-beam lithography Message-ID: Dear all, We are trying to deposit Ni-10nm and Au-50nm on top patterned EL9-PMMA e-beam lithography sample for liftoff. But the deposited film is grainy and agglomerated. This problem does not occur with photolitithography resists or for any other depositions. It only arises in case of samples that have undergone e-beam lithography and have patterned e-beam resist on top. We are unable to troubleshoot the root cause. Attaching an image below Has anyone else faced similar problems? Did you manage to troubleshoot the issue and find a solution? Kindly let us know. [image: image.png] -- Thanks & regards Pradnya ------------------------------------------- Process Technologist, CEN, IITBNF, Electrical Engg Dept, Annexe, IIT Bombay, Mumbai, Powai- 400076 Contact - 09420391187(M) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 19663 bytes Desc: not available URL: From nnelsonfitzpatrick at uwaterloo.ca Fri Nov 15 09:21:52 2019 From: nnelsonfitzpatrick at uwaterloo.ca (Nathan Nelson - Fitzpatrick) Date: Fri, 15 Nov 2019 14:21:52 +0000 Subject: [labnetwork] e-beam evaporation after e-beam lithography In-Reply-To: References: Message-ID: Hi Pradnya, I have experienced this problem in the past and in fact it was discussed in good detail on Labnetwork earlier this year in the thread ?Blistering of metal film stack on PMMA?. https://mtl.mit.edu/pipermail/labnetwork/2019-February/thread.html#start Long story short, it could be due to excessive sample temperature or bombardment with electrons (scattered from your E-gun) or X-rays. There are a number of solutions to this problem such as: * Increasing source to sample distance * Avoiding carbon contamination in the crucible (avoiding ?Fabmate? crucible liners for Gold) * Deflecting electrons away from the sample using electrostatic or magnetic methods * Increasing deposition rate to reduce time sample is being bombarded by electrons Best of luck! -Nathan -- Nathan Nelson-Fitzpatrick PhD Nanofabrication Process & Characterization Engineering Manager Quantum-Nano Fabrication and Characterization Facility (QNFCF) Office of Research University of Waterloo 200 University Avenue West, Waterloo, ON N2L 3G1 P: 519-888-4567 ext. 31796 C: 226-218-3206 https://fab.qnc.uwaterloo.ca [/Users/nnelsonf/Desktop/university-of-waterloo-logo-esig.png] From: on behalf of Pradnya Chabbi Date: Friday, November 15, 2019 at 8:00 AM To: "labnetwork at mtl.mit.edu" Subject: [labnetwork] e-beam evaporation after e-beam lithography Dear all, We are trying to deposit Ni-10nm and Au-50nm on top patterned EL9-PMMA e-beam lithography sample for liftoff. But the deposited film is grainy and agglomerated. This problem does not occur with photolitithography resists or for any other depositions. It only arises in case of samples that have undergone e-beam lithography and have patterned e-beam resist on top. We are unable to troubleshoot the root cause. Attaching an image below Has anyone else faced similar problems? Did you manage to troubleshoot the issue and find a solution? Kindly let us know. [image.png] -- Thanks & regards Pradnya ------------------------------------------- Process Technologist, CEN, IITBNF, Electrical Engg Dept, Annexe, IIT Bombay, Mumbai, Powai- 400076 Contact - 09420391187(M) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 11994 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 19664 bytes Desc: image002.png URL: From hathaway at cns.fas.harvard.edu Fri Nov 15 10:16:51 2019 From: hathaway at cns.fas.harvard.edu (Hathaway, Malcolm R) Date: Fri, 15 Nov 2019 15:16:51 +0000 Subject: [labnetwork] e-beam evaporation after e-beam lithography In-Reply-To: References: Message-ID: <5DCEC167.90700@cns.fas.harvard.edu> Hi Pradnya, I'm not an expert in these areas, but a similar issue arose some time ago on labnetwork. Your situation could be related to electron emissions from the evaporator melt re-exposing or affecting the e-beam resist during the e-beam evaporation run. There are e-beam evaporator setups which incorporate an "electron filter" to sweep the electrons out of the deposition path, so they can't effect the e-beam resist. Others will no doubt weigh in shortly, with more specific details. Mac Mac Hathaway Senior Process and Systems Engineer Harvard Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617-495-9012 On 11/15/2019 7:08 AM, Pradnya Chabbi wrote: Dear all, We are trying to deposit Ni-10nm and Au-50nm on top patterned EL9-PMMA e-beam lithography sample for liftoff. But the deposited film is grainy and agglomerated. This problem does not occur with photolitithography resists or for any other depositions. It only arises in case of samples that have undergone e-beam lithography and have patterned e-beam resist on top. We are unable to troubleshoot the root cause. Attaching an image below Has anyone else faced similar problems? Did you manage to troubleshoot the issue and find a solution? Kindly let us know. [image.png] -- Thanks & regards Pradnya ------------------------------------------- Process Technologist, CEN, IITBNF, Electrical Engg Dept, Annexe, IIT Bombay, Mumbai, Powai- 400076 Contact - 09420391187(M) _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: ATT00001.png Type: image/png Size: 19663 bytes Desc: ATT00001.png URL: From Aju.Jugessur at Colorado.EDU Fri Nov 15 11:54:46 2019 From: Aju.Jugessur at Colorado.EDU (Aju Jugessur) Date: Fri, 15 Nov 2019 16:54:46 +0000 Subject: [labnetwork] e-beam evaporation after e-beam lithography In-Reply-To: References: Message-ID: <9CDF8146-3ED1-43A1-8475-EA33958A2BF2@colorado.edu> Pradnya, This is a common issue. Are you using Ebeam evaporation to coat the ebeam resist coated samples? If yes, the scattered electrons may be exposing your ebeam resist as well, resulting in what you observe on your samples. Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Engineering Staff Council Member (Communications and Outreach) Discovery Learning Center University of Colorado Boulder | College of Engineering & Applied Science 1111 Engineering Drive ? 1B09 DLC | Boulder, CO 80309-0422 | P: 303.735.5019| F: 303.492.2199 https://www.colorado.edu/facility/cosinc E-mail: aju.jugessur at colorado.edu Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) [signature_1381777236] [signature_1976523186] From: on behalf of Pradnya Chabbi Date: Friday, November 15, 2019 at 5:57 AM To: "labnetwork at mtl.mit.edu" Subject: [labnetwork] e-beam evaporation after e-beam lithography Dear all, We are trying to deposit Ni-10nm and Au-50nm on top patterned EL9-PMMA e-beam lithography sample for liftoff. But the deposited film is grainy and agglomerated. This problem does not occur with photolitithography resists or for any other depositions. It only arises in case of samples that have undergone e-beam lithography and have patterned e-beam resist on top. We are unable to troubleshoot the root cause. Attaching an image below Has anyone else faced similar problems? Did you manage to troubleshoot the issue and find a solution? Kindly let us know. [cid:image003.png at 01D59B9A.B649B3D0] -- Thanks & regards Pradnya ------------------------------------------- Process Technologist, CEN, IITBNF, Electrical Engg Dept, Annexe, IIT Bombay, Mumbai, Powai- 400076 Contact - 09420391187(M) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 70328 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 3107 bytes Desc: image002.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.png Type: image/png Size: 19664 bytes Desc: image003.png URL: From mondol at mit.edu Fri Nov 15 12:33:12 2019 From: mondol at mit.edu (Mark K Mondol) Date: Fri, 15 Nov 2019 17:33:12 +0000 Subject: [labnetwork] e-beam evaporation after e-beam lithography In-Reply-To: References: Message-ID: <1573839179185.34875@mit.edu> Pradnya: The image is too small to make any judgements. I am not entirely sure what EL9-PMMA is, what is the molecular weight and thickness of your film? Regards, Mark K Mondol ---------------------------------------------------------------------------------- Mark K Mondol Assistant Director NanoStructures Laboratory And Facility Manager Scanning Electron Beam Lithography Facility Bldg 36 Room 229 mondol at mit.edu office - 617-253-9617 cell - 617-224-8756 ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Pradnya Chabbi Sent: Friday, November 15, 2019 7:08 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] e-beam evaporation after e-beam lithography Dear all, We are trying to deposit Ni-10nm and Au-50nm on top patterned EL9-PMMA e-beam lithography sample for liftoff. But the deposited film is grainy and agglomerated. This problem does not occur with photolitithography resists or for any other depositions. It only arises in case of samples that have undergone e-beam lithography and have patterned e-beam resist on top. We are unable to troubleshoot the root cause. Attaching an image below Has anyone else faced similar problems? Did you manage to troubleshoot the issue and find a solution? Kindly let us know. [image.png] -- Thanks & regards Pradnya ------------------------------------------- Process Technologist, CEN, IITBNF, Electrical Engg Dept, Annexe, IIT Bombay, Mumbai, Powai- 400076 Contact - 09420391187(M) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 19663 bytes Desc: image.png URL: From bic at mtl.mit.edu Tue Nov 19 13:01:48 2019 From: bic at mtl.mit.edu (bic at mtl.mit.edu) Date: Tue, 19 Nov 2019 13:01:48 -0500 Subject: [labnetwork] Plasmaquest Model 145 software Message-ID: <008e01d59f03$699ddf90$3cd99eb0$@mtl.mit.edu> Hi All, The tool software for our 1996 Plasmaquest Model 145 crashed the other day. It is on three, 3.5" floppy disks, (for Windows 95) and my copies got corrupted. Does anyone have a copy to share? Thanks, Bob ----------------------------------------------------------------- Robert J. Bicchieri Research Specialist Massachusetts Institute of Technology MIT. Nano 60 Vassar St. Bldg. 39-215 Cambridge, MA 02139 Phone 617.253.6418 Fax 617.258.8500 -------------- next part -------------- An HTML attachment was scrubbed... URL: From dlafleur at cns.fas.harvard.edu Wed Nov 20 09:54:31 2019 From: dlafleur at cns.fas.harvard.edu (LaFleur, David W) Date: Wed, 20 Nov 2019 14:54:31 +0000 Subject: [labnetwork] Plasmaquest Model 145 software In-Reply-To: <008e01d59f03$699ddf90$3cd99eb0$@mtl.mit.edu> References: <008e01d59f03$699ddf90$3cd99eb0$@mtl.mit.edu> Message-ID: <9172D27B-0C9A-4CE3-B9AA-9D6B4A756731@cns.fas.harvard.edu> Hi Bob, I looked up your system on the web and it looks nearly identical to 2 Nexx system we had here at Harvard. Same components, chamber, loadlock, even the enclosure panels are the same. Everything except the monitor, ours was not a touch screen. I wonder if they run the same software? Ours was windows 98 too. We have a backup hard drive with the software we can give to you to try. Do you have a picture of the main screen when it was operational? This is a long shot so if no one else responds you may want to give it a try as a last resort. Regards, David LaFleur CNS Equipment Engineer From: "labnetwork-bounces at mtl.mit.edu" on behalf of "bic at mtl.mit.edu" Date: Tuesday, November 19, 2019 at 1:01 PM To: "labnetwork at mtl.mit.edu" Subject: [labnetwork] Plasmaquest Model 145 software Hi All, The tool software for our 1996 Plasmaquest Model 145 crashed the other day. It is on three, 3.5? floppy disks, (for Windows 95) and my copies got corrupted. Does anyone have a copy to share? Thanks, Bob ----------------------------------------------------------------- Robert J. Bicchieri Research Specialist Massachusetts Institute of Technology MIT. Nano 60 Vassar St. Bldg. 39-215 Cambridge, MA 02139 Phone 617.253.6418 Fax 617.258.8500 -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Wed Nov 20 12:17:05 2019 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Wed, 20 Nov 2019 17:17:05 +0000 Subject: [labnetwork] boiler water question Message-ID: Hi Everyone, We have just finished the retube of our steam boilers. We are using a sodium hydroxide, sodium polyacrylate, sodium nitrite chemical to treat the condensate/feedwater to the boilers. I was wondering what the consenus was among my fellow fab managers for treatment? Rick Richard H. Morrison Principal Member of the Technical Staff Draper 555 Technology Square Cambridge, MA 02139-3573 Work 617-258-3420 Cell 508-930-3461 www.draper.com ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From beaudoin at physics.ubc.ca Wed Nov 20 12:51:09 2019 From: beaudoin at physics.ubc.ca (Beaudoin, Mario) Date: Wed, 20 Nov 2019 09:51:09 -0800 Subject: [labnetwork] Plasmaquest Model 145 software In-Reply-To: <9172D27B-0C9A-4CE3-B9AA-9D6B4A756731@cns.fas.harvard.edu> References: <008e01d59f03$699ddf90$3cd99eb0$@mtl.mit.edu> <9172D27B-0C9A-4CE3-B9AA-9D6B4A756731@cns.fas.harvard.edu> Message-ID: <9843dff4-2a64-7db9-80cd-6409ccfcdb0b@physics.ubc.ca> Bob, I have software on my HD.? I can put it on a Google drive and give you access. Mario On 2019-11-20 6:54 a.m., LaFleur, David W wrote: > > Hi Bob, > > I looked up your system on the web and it looks nearly identical to 2 > Nexx system we had here at Harvard. Same components, chamber, > loadlock, even the enclosure panels are the same. Everything except > the monitor, ours was not a touch screen. I wonder if they run the > same software? Ours was windows 98 too. We have a backup hard drive > with the software we can give to you to try. Do you have a picture of > the main screen when it was operational? This is a long shot so if no > one else responds you may want to give it a try as a last resort. > > Regards, > > David LaFleur > > CNS Equipment Engineer > > *From: *"labnetwork-bounces at mtl.mit.edu" > on behalf of "bic at mtl.mit.edu" > > *Date: *Tuesday, November 19, 2019 at 1:01 PM > *To: *"labnetwork at mtl.mit.edu" > *Subject: *[labnetwork] Plasmaquest Model 145 software > > Hi All, > > The tool software for our 1996 Plasmaquest Model 145 crashed the other > day. It is on three, 3.5? floppy disks, (for Windows 95) and my copies > got corrupted. > > Does anyone have a copy to share? > > Thanks, > > Bob > > ----------------------------------------------------------------- > > Robert J. Bicchieri > > Research Specialist > > Massachusetts Institute of Technology > > MIT. Nano > > 60 Vassar St. Bldg. 39-215 > > Cambridge, MA 02139 > > Phone 617.253.6418 > > Fax 617.258.8500 > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig 2.jpg Type: image/jpeg Size: 21446 bytes Desc: not available URL: From spaolini at cns.fas.harvard.edu Thu Nov 21 10:45:01 2019 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Thu, 21 Nov 2019 15:45:01 +0000 Subject: [labnetwork] boiler water question In-Reply-To: References: Message-ID: Rich, I would recommend that you have your makeup water analyzed first, and then consult with the ASME standards. I know that Cambridge water is not the cleanest. Steve down the street Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu From: labnetwork-bounces at mtl.mit.edu On Behalf Of Morrison, Richard H., Jr Sent: Wednesday, November 20, 2019 12:17 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] boiler water question Hi Everyone, We have just finished the retube of our steam boilers. We are using a sodium hydroxide, sodium polyacrylate, sodium nitrite chemical to treat the condensate/feedwater to the boilers. I was wondering what the consenus was among my fellow fab managers for treatment? Rick Richard H. Morrison Principal Member of the Technical Staff Draper 555 Technology Square Cambridge, MA 02139-3573 Work 617-258-3420 Cell 508-930-3461 www.draper.com ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From rrand at ucdavis.edu Thu Nov 21 11:49:44 2019 From: rrand at ucdavis.edu (Ryan R Anderson) Date: Thu, 21 Nov 2019 16:49:44 +0000 Subject: [labnetwork] Research and Development Engineer position available - Center for Nano-Micro Manufacturing, University of California, Davis Message-ID: The Center for Nano-Micro Manufacturing at UC Davis has a Research and Development Engineer position available. The job summary is as follows: Center for Nano-Micro Manufacturing (CNM2) is a 10,000 ASF class-100 clean room operated and administered by the College of Engineering Dean's Office. CNM2 is a service organization. The primary goals of this facility are to foster research and education in the area of nanofabrication techniques and interdisciplinary application of nano- and micro-fabrication. Activities relate to micro fabrication using lithography, plasma etch, wet etch, and chemical vapor deposition techniques. Under general direction, oversee operation and maintenance of high-value capital equipment and associated spaces, including environmental controls required to ensure specifications are met. Provide engineering information and advice to principal investigators and other research personnel regarding micro- and nano-fabrication processes. Manage engineering aspects of research project implementation involving photolithography, plasma etch and chemical vapor deposition equipment. Develop and implement new nano and micro fabrication processes. Provide direct and hands on technical involvement with existing processes or those to be developed. Consult with faculty researchers and graduate students regarding the equipment needed for their projects. Provide training, advice and guidance on use of machines, selection of novel chemicals and materials, and suggests processes. At times, instruct user how to perform project, use equipment, chemicals and materials. Prepare initial documentation of new processes; upgrade existing processes and track processing data and their implementation in CNM2's web site. Review, qualify and accept or reject hazards posed by novel chemical processing. Review new chemicals proposed for use in the laboratory to ensure they do not pose a hazard, which includes implementation and maintenance of SDS documents. Train and provide technical leadership to other CNM2 employees, who may include part-time and full-time employees. You can find the full posting including minimum qualifications, pay rate, etc. here. Thank you Ryan Anderson Manager, Center for Nano-MicroManufacturing 1209 Kemper Hall University of California at Davis One Shields Avenue Davis, CA 95616 Phone: 530-601-3943 Email: rrand at ucdavis.edu https://cnm2.ucdavis.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From saba.sadeghi at uwaterloo.ca Thu Nov 21 12:45:43 2019 From: saba.sadeghi at uwaterloo.ca (Saba Sadeghi) Date: Thu, 21 Nov 2019 17:45:43 +0000 Subject: [labnetwork] Outgassing and evaporation of Barium source in MBE Message-ID: Hello everyone, I was wondering if anyone has worked with evaporation of Barium using effusion cell in a MBE chamber and I was hoping to get some insight from this experienced community. I have issues with outgassing of the Ba source; since it is very reactive with air outgassing to get rid of H2 and H2O would take time. I tried to limit the time that the Ba source was exposed to air after cleaning with hexane (it's shipped in mineral oil), but for me it's taking more than two weeks now to reach pressure of below 1.00 E-7 mbar while keeping the source temperature at 400 oC. The base pressure of the chamber is 2 E-10mbar. I was wondering if anyone has experienced this problem and what's the best way to degas Ba before evaporation? Thanks in advance, Saba -- Saba Sadeghi, PhD Quantum Devices Fabrication Scientist Institute for Quantum Computing, University of Waterloo Phone: 519-888-4567 ext. 31111 Email: saba.sadeghi at uwaterloo.ca -------------- next part -------------- An HTML attachment was scrubbed... URL: From hathaway at cns.fas.harvard.edu Thu Nov 21 15:09:23 2019 From: hathaway at cns.fas.harvard.edu (Hathaway, Malcolm R) Date: Thu, 21 Nov 2019 20:09:23 +0000 Subject: [labnetwork] Outgassing and evaporation of Barium source in MBE In-Reply-To: References: Message-ID: Hi Saba, I checked with my MBE guy, and he offered the following: "I've used barium quite a bit. I definitely recommend purchasing dendritic barium sealed in a glass ampoule instead of packed with oil and then minimize exposure to oxygen and water. We would try to load it right before pumping down. Some suppliers can even load the Ba into a customer supplied crucible for you under argon. I've seen some reports of pre-melting the Ba source in a crucible under inert atmosphere to provide a uniform surface but that takes a bit more effort." I'll forward you his e-ddress in a PM. Mac Harvard CNS ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Saba Sadeghi Sent: Thursday, November 21, 2019 12:45 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Outgassing and evaporation of Barium source in MBE Hello everyone, I was wondering if anyone has worked with evaporation of Barium using effusion cell in a MBE chamber and I was hoping to get some insight from this experienced community. I have issues with outgassing of the Ba source; since it is very reactive with air outgassing to get rid of H2 and H2O would take time. I tried to limit the time that the Ba source was exposed to air after cleaning with hexane (it's shipped in mineral oil), but for me it's taking more than two weeks now to reach pressure of below 1.00 E-7 mbar while keeping the source temperature at 400 oC. The base pressure of the chamber is 2 E-10mbar. I was wondering if anyone has experienced this problem and what's the best way to degas Ba before evaporation? Thanks in advance, Saba -- Saba Sadeghi, PhD Quantum Devices Fabrication Scientist Institute for Quantum Computing, University of Waterloo Phone: 519-888-4567 ext. 31111 Email: saba.sadeghi at uwaterloo.ca -------------- next part -------------- An HTML attachment was scrubbed... URL: From wjkiethe at ncsu.edu Fri Nov 22 10:09:30 2019 From: wjkiethe at ncsu.edu (Bill Kiether) Date: Fri, 22 Nov 2019 10:09:30 -0500 Subject: [labnetwork] Bismuth Telluride thin film deposition Message-ID: Hello, Does anyone offer bismuth telluride PV deposition (evap or sputter) as a service, or have experience with it from a safety and tool perspective? We have a need for depositions of 300 nm-2um bt on 4" oxide-on-silicon wafers, and want to explore all the options. Bill Kiether, PhD Photonics Lab Manager, NCSU wjkiethe at ncsu.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From Sa'ad.Hassan at nrc-cnrc.gc.ca Fri Nov 22 10:15:21 2019 From: Sa'ad.Hassan at nrc-cnrc.gc.ca (Hassan, Sa'ad) Date: Fri, 22 Nov 2019 15:15:21 +0000 Subject: [labnetwork] Disposal of Dicing Blades Message-ID: Good Morning, We are thinking of storing our broken blades as "contaminated sharps". How are broken dicing blades disposed of in your facilities? Cheers, Sa'ad -------------- next part -------------- An HTML attachment was scrubbed... URL: From shimonel at savion.huji.ac.il Sun Nov 24 10:12:26 2019 From: shimonel at savion.huji.ac.il (Shimon Eliav) Date: Sun, 24 Nov 2019 15:12:26 +0000 Subject: [labnetwork] Bismuth Telluride thin film deposition In-Reply-To: References: Message-ID: I would not perform this on an evaporator: Bi, Te and Bi2Te3 all have relatively high vapor pressure at relative low temperature. Shimon From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Bill Kiether Sent: Friday, 22 November 2019 17:10 To: labnetwork at mtl.mit.edu Cc: Philip Barletta Subject: [labnetwork] Bismuth Telluride thin film deposition Hello, Does anyone offer bismuth telluride PV deposition (evap or sputter) as a service, or have experience with it from a safety and tool perspective? We have a need for depositions of 300 nm-2um bt on 4" oxide-on-silicon wafers, and want to explore all the options. Bill Kiether, PhD Photonics Lab Manager, NCSU wjkiethe at ncsu.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From kchow10 at gmail.com Mon Nov 25 12:41:23 2019 From: kchow10 at gmail.com (Edmond Chow) Date: Mon, 25 Nov 2019 11:41:23 -0600 Subject: [labnetwork] Blisters on PMMA resists In-Reply-To: References: <83583687862B8444A85296A4944147DF95553943@CIO-TNC-D2MBX03.osuad.osu.edu> Message-ID: We found that we don't have blistering problem with ZEP or PMMA if we have PMGI underneath. Below is the picture of 5 samples we put in for ebeam evaporation (Ti/Au 5nm/50nm) Ti deposition rate is at 0.5A/s and Au deposition rate is at 0.5A/s for first 5nm and then ramp to 1A/s for the rest. Sample1: Si sample with 250nm SF6(PMGI) and 300nm ZEP and ebeam pattern --> smooth surface after evaporation Sample2: Si sample with no resist --> smooth surface after evaporation Sample3: glass slide --> smooth surface after evaporation. Sample4: Si sample with 300nm ZEP (no ebeam pattern) --> blistering problem Sample5: Si sample with 300nm PMMA (no ebeam pattern) --> blistering problem We are using SF6 as liftoff resist anyway, so it is just an added bonus that it solve the problem with ebeam resist blistering problem, but we don't understand why it helps, does anyone have some explanation for that? Thanks. Edmond Micro and NanoTechnology Lab (MNTL) Rm 2300 Micro and Nanotechnology Lab, MC-249 208 North Wright St. Urbana, IL 61801 [image: image.png] On Thu, Apr 6, 2017 at 3:52 PM Shivakumar Bhaskaran wrote: > Yes, higher deposition rate helped in reducing the blisters or completely > gone. However, some users want to do at a low deposition rate. Sometimes we > start at low rate and change to a higher rate. > > > > -thanks > > -Shiva > > > > *From:* Mark Giulio Chiappa [mailto:mark.chiappa at ntnu.no] > *Sent:* Thursday, April 6, 2017 10:37 AM > *To:* Price, Aimee > *Cc:* Shivakumar Bhaskaran ; LabNet ( > labnetwork at mtl.mit.edu) > *Subject:* Re: [labnetwork] Blisters on PMMA resists > > > > Hi Shiva, > > > > I agree it's probably a thermal issue. When we had the same issue we > experimented with PMMA from different batches, baking times and temps as > well as thermally conductive mounts (mung etc) to no avail. Interestingly > we solved the issue by increasing the deposition rate. > > > > So it seems there is no definite answer I suppose it is dependant in the > distance between source an substrate. I don't remember how much we > experimented with wait times but that sounds like a good idea. > > > > Kind regards > > Mark. > > > Sent from my iPhone > > > On 6 Apr 2017, at 18:23, Price, Aimee wrote: > > Hi Shiva, > > I believe we?ve had a thread on this subject in the last year or so. Can > someone remind me how to find the old/archived threads (or do we just look > in our email history)? > > > > Past that, we have had this several different times on a couple different > evaporators, almost always with Ti/Au or Ni/Au ? Assuming we?ve baked the > PMMA sufficiently it appears to be heating, though we?ve tried thermal dots > alongside and not found very high temps. Our solution has been to slow the > deposition rate and put a ?wait? step in during thick Au, Ni, sometimes Pt > steps. The rate we use is 1-2A/s in most cases and the wait times vary but > are usually halfway through the Au step. > > > > Lastly, we have a lot of people working with piezoelectric materials and > this happens sometimes with those. That?s a separate topic. I?m assuming > you are working with more ?standard? semiconductor substrates and the issue > is caused by the metal/PMMA not the substrate itself? > > > > Feel free to reach out to me off-line at price.798 at osu.edu if you want > more details. We did a lot of work with this at two different times, about > 3 years ago and 10 years ago. We even had students travel back to UlUC to > use their evaporator when we were diagnosing this issue the first time. > > > > Best of luck. > > > > Aimee > > > > *From:* labnetwork-bounces at mtl.mit.edu [ > mailto:labnetwork-bounces at mtl.mit.edu ] *On > Behalf Of *Shivakumar Bhaskaran > *Sent:* Wednesday, April 05, 2017 10:03 PM > *To:* LabNet (labnetwork at mtl.mit.edu) > *Subject:* [labnetwork] Blisters on PMMA resists > > > > Hi All, > > > > We are getting blisters or metal film peeling off when depositing metals > (Ti/Au/Al) on PMMA resists using EBeam Evaporation. > > > > Did anyone had this issue in your EBeam Evaporation tool. If so how did > you fix this? > > > > -thanks > > -Shiva > > > > SNSF > > http://snsf.stanford.edu/ > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Edmond Chow -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 472485 bytes Desc: not available URL: From usha at stanford.edu Mon Nov 25 16:28:09 2019 From: usha at stanford.edu (Usha Raghuram) Date: Mon, 25 Nov 2019 21:28:09 +0000 Subject: [labnetwork] 2019 NNCI Etch Symposium - December 5-6, 2019 - Harvard University In-Reply-To: References: Message-ID: Hello Everyone, This year's NNCI Etch Symposium, Novel Nanoscale Etching of Electronic, Photonic and Quantum Materials, at Harvard is quickly approaching and we are looking forward to another very successful networking event. We have planned a full 2-day event with day 1(Dec.5) being a closed session for NNCI and non-NNCI site academic staff to present site updates detailing etch capabilities and processes. Day 2 (Dec.6) is open to the public and will feature talks from experts in nano and quantum technology. There will be a vendor exhibit on both days where attendees can interface with etch system manufacturing representatives and learn about their latest offerings. Attached are the announcement letter with details about the symposium, including information about registration and accommodations, and symposium agenda for Dec.6. We are asking everyone planning to attend to register for the event at https://cns1.rc.fas.harvard.edu/nnci-2019-etch-symposium/ so that we can plan accordingly. Invited speakers for day 2 are asked to submit a short bio to members of the organizing committee. We look forward to your attendance and participation in making this symposium a great success. If you have questions, please contact any member of the organizing committee. Regards, Usha Raghuram-Stanford: usha at stanford.edu Ling Xie-Harvard: lxie at cns.fas.harvard.edu Vince Genova-Cornell: Genova at cnf.cornell.edu Sarmita Majumder-U. Texas: sarmita at utexas.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: NNCI 2019 Etch Symposium program final.pdf Type: application/pdf Size: 2594609 bytes Desc: NNCI 2019 Etch Symposium program final.pdf URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: NNCI 2019 Etch Symposium announcement 11-2019.pdf Type: application/pdf Size: 129171 bytes Desc: NNCI 2019 Etch Symposium announcement 11-2019.pdf URL: