[labnetwork] e-beam evaporation after e-beam lithography

[Pradnya Chabbi]

Dear all,
We are trying to deposit Ni-10nm and Au-50nm on top patterned EL9-PMMA
e-beam lithography sample for liftoff. But the deposited film is grainy and
agglomerated.
This problem does not occur with photolitithography resists or for any
other depositions. It only arises in case of samples that have undergone
e-beam lithography and have patterned e-beam resist on top. We are unable
to troubleshoot the root cause. Attaching an image below

Has anyone else faced similar problems?
Did you manage to troubleshoot the issue and find a solution?
Kindly let us know.


[image: image.png]

-- 
Thanks & regards
Pradnya
-------------------------------------------
Process Technologist,
CEN, IITBNF, Electrical Engg Dept, Annexe,
IIT Bombay, Mumbai, Powai- 400076
Contact - 09420391187(M)
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