[labnetwork] e-beam evaporation after e-beam lithography

[Mark K Mondol]

Pradnya:

The image is too small to make any judgements.  I am not entirely sure what EL9-PMMA is, what is the molecular weight and thickness of your film?

Regards,

Mark K Mondol


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Mark K Mondol
Assistant Director NanoStructures Laboratory
And
Facility Manager Scanning Electron Beam Lithography Facility
Bldg 36 Room 229
 mondol at mit.edu
office - 617-253-9617
cell - 617-224-8756
________________________________
From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> on behalf of Pradnya Chabbi <pradnya.chabbi at gmail.com>
Sent: Friday, November 15, 2019 7:08 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] e-beam evaporation after e-beam lithography

Dear all,
We are trying to deposit Ni-10nm and Au-50nm on top patterned EL9-PMMA e-beam lithography sample for liftoff. But the deposited film is grainy and agglomerated.
This problem does not occur with photolitithography resists or for any other depositions. It only arises in case of samples that have undergone e-beam lithography and have patterned e-beam resist on top. We are unable to troubleshoot the root cause. Attaching an image below

Has anyone else faced similar problems?
Did you manage to troubleshoot the issue and find a solution?
Kindly let us know.


[image.png]

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Thanks & regards
Pradnya
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Process Technologist,
CEN, IITBNF, Electrical Engg Dept, Annexe,
IIT Bombay, Mumbai, Powai- 400076
Contact - 09420391187(M)
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