[labnetwork] ALD availability in the midwest

[Price, Aimee]

Hi Jerry,
At Ohio State Nanotech West Lab, we are not open to new users at this time due to COVID-19 protocols but I have some ability to do remote service work.  I have an older PicoSun SunALE150 without plasma.

We do NOT have SiOx, but I do have Al2O3 and HfO2.  My current HfO2 process is high temperature however.  We have numerous low temperature Al2O3 processes, so that's no issue.  I'd be happy to discuss further if you like.  I do have some other contacts I can put you in touch with as well if my facility isn't a good fit.

Best,
Aimee Bross Price

Sr. Research Associate
The Ohio State University
Nanotech West Lab
Institute for Materials Research
1381 Kinnear Road
Suite 100
Columbus, OH 43212
614-292-2753



From: labnetwork-bounces at mtl.mit.edu <labnetwork-bounces at mtl.mit.edu> On Behalf Of Shepard, Jeremiah J
Sent: Monday, August 10, 2020 9:04 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] ALD availability in the midwest

All,
Good morning!  I am an engineer with Purdue's Birck Nanotechnology fab.  Our ALD system has went down and will be down for several weeks.  I am looking for alternatives for our researchers to use until our system comes back online.  We are located in West Lafayette, Indiana and options would need to be within a few hours driving distance of our location, or provide the service through mail.

Our system is equipped with AlOx, HfOx,  and SiOx.  The majority of our users are growing AlOx and HfOx.  We have many users interested in low temp growths at 90 to 110 C and we have a limit of 50 nm film thickness.  We also have many users growing at more traditional 200 C temps.  I would expect work coming from our fab to fall within these parameters.

Any leads would be greatly appreciated!

Thank you,
Jerry Shepard

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