From na2661 at columbia.edu Tue Oct 6 12:03:44 2020 From: na2661 at columbia.edu (Nava Ariel-Sternberg) Date: Tue, 6 Oct 2020 12:03:44 -0400 Subject: [labnetwork] Equipment budget Message-ID: <028e01d69bfa$4502f7c0$cf08e740$@columbia.edu> Dear all, I hope everyone is safe in your corner of the world. We've had some discussions in Columbia about funding for equipment purchases and as always it would be great to know what models exist elsewhere. Where is funding for new or replacement of equipment coming from in your facilities? Is it from PI grants? A separate university budget? Other grants? Do PIs purchase equipment and place it in shared labs? If you can share what is done in your facility and the financial model behind it that would be highly appreciated! Stay safe, Nava Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Labs Columbia University CEPSR/MC 8903 530 west 120th st. NY NY 10027 Office: 212-8549927 Cell: 201-5627600 -------------- next part -------------- An HTML attachment was scrubbed... URL: From ngottron at andrew.cmu.edu Wed Oct 7 15:05:52 2020 From: ngottron at andrew.cmu.edu (Norman J Gottron) Date: Wed, 7 Oct 2020 19:05:52 +0000 Subject: [labnetwork] ZnO Sputtering Message-ID: Hi All, I was wondering if anyone in the LabNetwork community could sputter a couple hundred nm of ZnO on a fee-for-service basis for an external user. The substrate would be a 4" Si wafer. We typically avoid Zn/ZnO in our lab due to contamination concerns, but I'm hoping someone out there has a dedicated system. If so, please reach out. Regards, Norman Gottron Process Engineer, Claire and John Bertucci Nanotechnology Laboratory Electrical and Computer Engineering | Carnegie Mellon University 5000 Forbes Ave Pittsburgh, PA 15213 Phone: 412-268-4205 www.ece.cmu.edu www.nanofab.ece.cmu.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From proma016 at fiu.edu Mon Oct 19 14:20:55 2020 From: proma016 at fiu.edu (Patrick Roman) Date: Mon, 19 Oct 2020 14:20:55 -0400 Subject: [labnetwork] STS DRIE mass flow controller programming Message-ID: Greetings, I have an original STS ASE DRIE system that needs to have the SF6 input increased to optimize silicon etching performance. My SF6 MFC is limited to 50 sccm in the software settings and I would like to increase that limit to 150 sccm. The hardware has 500 sccm capability. Does anyone have this experience/know how? Thanks in advance!!! Regards, Patrick Roman, PhD Associate Professor of Research Mechanical and Materials Engineering Assistant Director, AMERI R&D Engineer, GFJC , NFSTC College of Engineering and Computing Florida International University 10555 West Flagler Street, EC3355 Miami, Florida 33174 Tel (305) 348-1651 Fax (305) 348-1932 Cell (202) 294-8602 -------------- next part -------------- An HTML attachment was scrubbed... URL: From spaolini at cns.fas.harvard.edu Mon Oct 19 17:04:34 2020 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Mon, 19 Oct 2020 21:04:34 +0000 Subject: [labnetwork] STS DRIE mass flow controller programming In-Reply-To: References: Message-ID: Patrick, If you can?t access and modify the configuration files, you will need the vendor to assist you. Best of luck, Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu From: labnetwork-bounces at mtl.mit.edu On Behalf Of Patrick Roman Sent: Monday, October 19, 2020 2:21 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] STS DRIE mass flow controller programming Greetings, I have an original STS ASE DRIE system that needs to have the SF6 input increased to optimize silicon etching performance. My SF6 MFC is limited to 50 sccm in the software settings and I would like to increase that limit to 150 sccm. The hardware has 500 sccm capability. Does anyone have this experience/know how? Thanks in advance!!! Regards, Patrick Roman, PhD Associate Professor of Research Mechanical and Materials Engineering Assistant Director, AMERI R&D Engineer, GFJC, NFSTC College of Engineering and Computing Florida International University 10555 West Flagler Street, EC3355 Miami, Florida 33174 Tel (305) 348-1651 Fax (305) 348-1932 Cell (202) 294-8602 -------------- next part -------------- An HTML attachment was scrubbed... URL: From kjvowen at lnf.umich.edu Mon Oct 19 21:29:49 2020 From: kjvowen at lnf.umich.edu (Kevin Owen) Date: Mon, 19 Oct 2020 21:29:49 -0400 Subject: [labnetwork] STS DRIE mass flow controller programming In-Reply-To: References: Message-ID: At least for the Pegasus software (which I think is the same), the configuration editor requires a 4 digit code that changes weekly. In the past, I've been able to convince SPTS to share the current week's code to make minor changes like that. On Mon, Oct 19, 2020, 9:15 PM Paolini, Steven wrote: > Patrick, > > If you can?t access and modify the configuration files, you will need > the vendor to assist you. > > Best of luck, > > > > Steve Paolini > > Principal Equipment Engineer > > Harvard University Center for Nanoscale Systems > > 11 Oxford St. > > Cambridge, MA 02138 > > 617- 496- 9816 > > spaolini at cns.fas.harvard.edu > > www.cns.fas.harvard.edu > > > > *From:* labnetwork-bounces at mtl.mit.edu *On > Behalf Of *Patrick Roman > *Sent:* Monday, October 19, 2020 2:21 PM > *To:* labnetwork at mtl.mit.edu > *Subject:* [labnetwork] STS DRIE mass flow controller programming > > > > Greetings, > > > > I have an original STS ASE DRIE system that needs to have the SF6 input > increased to optimize silicon etching performance. My SF6 MFC is limited > to 50 sccm in the software settings and I would like to increase that limit > to 150 sccm. The hardware has 500 sccm capability. Does anyone have this > experience/know how? Thanks in advance!!! > > > Regards, > > > > Patrick Roman, PhD > > Associate Professor of Research > > Mechanical and Materials Engineering > > Assistant Director, AMERI > > > R&D Engineer, GFJC > > , NFSTC > > > College of Engineering and Computing > Florida International University > > 10555 West Flagler Street, EC3355 > > Miami, Florida 33174 > > Tel (305) 348-1651 > > Fax (305) 348-1932 > > Cell (202) 294-8602 > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From roco at dtu.dk Tue Oct 20 02:42:33 2020 From: roco at dtu.dk (Roy Cork) Date: Tue, 20 Oct 2020 06:42:33 +0000 Subject: [labnetwork] STS DRIE mass flow controller programming In-Reply-To: References: Message-ID: Hi Patrick, When you say an original STS ASE DRIE system can you please give some details on the software? Is it Win 3.1, a so called trinity PC or a PRO tool? It sounds like they have scaled the software (or even made a mistake, maybe the MFC has been changed?) If the MFC is 500sccm but the software is only allowing 50sccm to be selected then 50 will give you 5V to the MFC and an actual flow of 500sccm (normally the software scaling would be the other way around so 500sccm in the recipe to an actual 50sccm MFC to give you some accuracy control, 355sccm in recipe to give 35.5 actual flow). This control voltage can be easily checked by measuring the SP pin on the MFC connector. Run a recipe with 50sccm and measure the voltage. If it is 5V then you are actually flowing 500sccm (if that is the full range of the MFC). Also check that the MFC is calibrated for SF6 sometimes they are N2 calibrated (there is a 0.26 conversion factor 500sccm x 0.26 gives an actual SF6 flow of 130sccm max). Normally the software would take this into account. Today you are able to buy MFC?s that can be re-programmed in-situ within a certain Window but you would need the correct software and cables to do that and I?m sure the older SPTS didn?t use this type. We may be able to help if you would like to change the software settings to match the MFC, just write some more details also about the software. There is some risk involved though changing software settings and MFC gas settings so it would be at your own risk. Crashed software cannot always be fixed these days and SPTS may not be able to help you recover the system. It would be easier for you to just change the MFC, keep the 50sccm setting but just calculate the difference if you are unsure with the software. Best regards Roy Cork DTU Nanolab Denmark From: labnetwork-bounces at mtl.mit.edu On Behalf Of Patrick Roman Sent: 19. oktober 2020 20:21 To: labnetwork at mtl.mit.edu Subject: [labnetwork] STS DRIE mass flow controller programming Greetings, I have an original STS ASE DRIE system that needs to have the SF6 input increased to optimize silicon etching performance. My SF6 MFC is limited to 50 sccm in the software settings and I would like to increase that limit to 150 sccm. The hardware has 500 sccm capability. Does anyone have this experience/know how? Thanks in advance!!! Regards, Patrick Roman, PhD Associate Professor of Research Mechanical and Materials Engineering Assistant Director, AMERI R&D Engineer, GFJC, NFSTC College of Engineering and Computing Florida International University 10555 West Flagler Street, EC3355 Miami, Florida 33174 Tel (305) 348-1651 Fax (305) 348-1932 Cell (202) 294-8602 -------------- next part -------------- An HTML attachment was scrubbed... URL: From cekendri at mtu.edu Thu Oct 22 11:51:11 2020 From: cekendri at mtu.edu (Chito Kendrick) Date: Thu, 22 Oct 2020 11:51:11 -0400 Subject: [labnetwork] SUPREM-IV Message-ID: Dear All, I was wondering if anyone is running the old suprem-IV software. With COVID still booming and my microfabrication lab class went to a theory course. I was looking into the TCAD software options, but with their costs and if this is only for one semester I do not have a good reason to go that route - I used suprem-IV when I was a grad student and that worked well for running simple simulations of the processes the students will do. I did find a downloadable source for it, but have not got it running yet, but wanted to see if someone else might have it going already. Else I will just make the students do all the calculations by hand. Chito Kendrick -- Chito Kendrick Ph.D. Managing Director of the Microfabrication Facility Research Assistant Professor Electrical and Computer Engineering Michigan Technological University Room 436 M&M Building 1400 Townsend Dr. Houghton, Michigan 49931-1295 814-308-4255 -------------- next part -------------- An HTML attachment was scrubbed... URL: From johnkym at ee.columbia.edu Fri Oct 23 12:55:58 2020 From: johnkym at ee.columbia.edu (Ioannis (John) Kymissis) Date: Fri, 23 Oct 2020 12:55:58 -0400 Subject: [labnetwork] JSID special issue on education in microfabrication and remote labs Message-ID: FYI - in case it is interesting. Please note the journal page charge waiver that applies for the issue discussed in the call. -John [image: JSID logo.png] Call for Papers on Education in Displays, Nano-, and Microfabrication The Journal of the SID (JSID) is soliciting original contributed papers in Education in Displays, Nano-, and Microfabrication, to be published in a special section in the first quarter of 2021. More information about the journal, its scope, and a link to past issues can be found at: https://onlinelibrary.wiley.com/journal/19383657, more information about SID can be found at https://www.sid.org . Topics of interest include, but are not limited to: - *Hybrid and remote learning approaches* - Curricular resources and models available on microfabrication teaching - Reviews of efficacy of teaching modes - Assessment of display, microfabrication, and engineering education - Laboratories in the field and under remote learning conditions - Career impact of microfabrication teaching and learning This special section will be guest edited by Drs. Pat Watson (University of Pennsylvania) and Ioannis Kymissis (Columbia University). Authors are invited to submit manuscripts online in electronic files to the JSID at: http://mc.manuscriptcentral.com/sid Authors submitting their manuscript must identify their manuscripts as being submitted for the Special Section by selecting ?Special Section Paper? as the paper type. The Information for Authors document provides a complete set of guidelines and requirements required for the preparation and submission of a manuscript, including a discussion of the formatting requirements. Journal page charges are waived upon application to the editor for all articles in this special section. The deadline for the submission of manuscripts is December 31, 2020 Please direct any questions to the special section editors at johnkym at ee.columbia.edu, gewatson at seas.upenn, or to the editor of JSID at editor at sid.org. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: JSID logo.png Type: image/png Size: 52615 bytes Desc: not available URL: From manish.keswani01 at gmail.com Sat Oct 24 16:14:29 2020 From: manish.keswani01 at gmail.com (Manish Keswani) Date: Sat, 24 Oct 2020 13:14:29 -0700 Subject: [labnetwork] PDR-04 micromist coater Message-ID: Hello all, We recently purchased a micromist coater PDR-04 and did some initial testing using a negative photoresist to evaluate the effect of PR flow rate, scan speed and pitch on coating thickness on a 4" silicon wafer. Our results showed a film thickness of a few nm with a single pass. The settings were based on the manufacturer's recommendations (3-6 ml/hr, 20-40 mm/s, 1-2 mm pitch, 430 microns nozzle). I would like to know if such small film thickness with a single coat is normal. Any input will be greatly appreciated. Thank you, Manish Keswani Lawrence Livermore National Laboratory -------------- next part -------------- An HTML attachment was scrubbed... URL: From wjkiethe at ncsu.edu Tue Oct 27 09:23:42 2020 From: wjkiethe at ncsu.edu (Bill Kiether) Date: Tue, 27 Oct 2020 09:23:42 -0400 Subject: [labnetwork] High temperature annealing for SiC devices Message-ID: Hello, We are looking for someone (vendor or university) who can quickly (next few weeks) do high temperature annealing. Ideally, the temperature range would be 1600-2000 deg C, but ~1825 C would be sufficient. Our sample is a 6" SiC device wafer, but we are willing to dice it into smaller pieces if necessary or if the 1600-2000 C range is possible. Preferably, the user would also be familiar with and capable of adding the "carbon cap layer" necessary for SiC annealing at these temperature. Anyone out there know of or have these capabilities? We are familiar with Ascatron, but the international logistics make that a tricky option due to our time frame, etc. Dr. Bill Kiether Research Scientist NCSU Nanofabrication Facility wjkiethe at ncsu.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From Edward_F_Gonzales at baylor.edu Tue Oct 27 13:25:35 2020 From: Edward_F_Gonzales at baylor.edu (Gonzales, Edward) Date: Tue, 27 Oct 2020 17:25:35 +0000 Subject: [labnetwork] Korean Thermal Evaporator please post Message-ID: I have a JVAC JV18EVA-F30k2p thermal evaporator that was donated to our lab. The documents I have for the system are in Korean. I have translated on Google Docs, but they are still somewhat cryptic. Does anybody have one of these systems or any documentation that you can relay to me? Thanks, Edward_F_Gonzales at Baylor.edu ************************************ Edward Gonzales Cleanroom Manager Baylor Research Innovation Collaboration (BRIC) Center for Microscopy and Imaging (CMI) 100 Research Parkway Waco, Texas 76704 t: (254) 710-3747 | f: (254) 710-4655 [cid:image001.png at 01D6AC5C.444A0A40] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 2370 bytes Desc: image001.png URL: From tdaunais at hawksemiconductor.com Tue Oct 27 13:53:48 2020 From: tdaunais at hawksemiconductor.com (Thomas Daunais) Date: Tue, 27 Oct 2020 13:53:48 -0400 Subject: [labnetwork] GCA AS200 150 mm chuck source Message-ID: Hello everyone, I am looking to buy a new (or new to us) 150 mm chuck for a GCA AS200 for 675 um thick wafers. Does anyone know where I can purchase one? Thanks, -- *Thomas Daunais, PhD* Lead process engineer Hawk Semiconductor LLC 3260 Hawks Ave. Ann Arbor, MI 48108 hawksemiconductor.com Ph: (231) 740-2720 -------------- next part -------------- An HTML attachment was scrubbed... URL: From dave101260 at gmail.com Wed Oct 28 08:08:46 2020 From: dave101260 at gmail.com (Dave Terry) Date: Wed, 28 Oct 2020 08:08:46 -0400 Subject: [labnetwork] GCA AS200 150 mm chuck source In-Reply-To: References: Message-ID: Have you tried to contact Bob Scruton? On Wed, Oct 28, 2020 at 8:07 AM Thomas Daunais < tdaunais at hawksemiconductor.com> wrote: > Hello everyone, > I am looking to buy a new (or new to us) 150 mm chuck for a GCA AS200 for > 675 um thick wafers. Does anyone know where I can purchase one? > Thanks, > -- > *Thomas Daunais, PhD* > Lead process engineer > Hawk Semiconductor LLC > 3260 Hawks Ave. > > Ann Arbor, MI 48108 > > hawksemiconductor.com > Ph: (231) 740-2720 > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Best Regards, Dave Terry ??????????????????? Sent from Gmail Mobile 617 784 7942 -------------- next part -------------- An HTML attachment was scrubbed... URL: From kmcpeak at lsu.edu Wed Oct 28 11:53:01 2020 From: kmcpeak at lsu.edu (Kevin M McPeak) Date: Wed, 28 Oct 2020 15:53:01 +0000 Subject: [labnetwork] Open Position: Manager LSU Nanofabrication Facility In-Reply-To: References: Message-ID: Dear Colleagues, The cleanroom manager position for the LSU Nanofabrication Facility has been officially posted. You can apply here: https://lsu.wd1.myworkdayjobs.com/LSU/job/0135-CAMD-Office-Building-1/Cleanroom-Scientist---Manager--Research-Associate-5-_R00050752 If you have any questions about the positions don't hesitate to contact me. Regards, Kevin ________________________________________ From: Kevin M McPeak Sent: Friday, September 18, 2020 12:28 AM To: labnetwork at mtl.mit.edu Subject: Open Position: Manager LSU Nanofabrication Facility Dear Colleagues, The LSU Nanofabrication Facility (lsu.edu/nanofabrication) has an open position for a manager. The official position has not been posted yet but if you are interested in applying please send me your resume and cover letter. The position description is attached. Regards, Kevin -- Kevin M. McPeak Assistant Professor | LSU Dept. of Chemical Engineering 225-578-0058 | mcpeaklab.com | lsu.edu/nanofabrication From spb1699 at rit.edu Wed Oct 28 12:30:04 2020 From: spb1699 at rit.edu (Scott Blondell) Date: Wed, 28 Oct 2020 16:30:04 +0000 Subject: [labnetwork] GCA AS200 150 mm chuck source In-Reply-To: References: Message-ID: <13d154dd7c804276beecc360a2a2491c@ex04mail01a.ad.rit.edu> FYI GCA users: https://www.taskerfh.com/obituary/robert-scruton RTS had an inventory auction several yrs. ago. It?s no longer a viable option. Possibly try 3C Technical in AZ ? Matt Pace. They service our GCA 8000 and specialize in GCA tools. http://www.3ctechnical.com/ Regards, Scott P. Blondell Facilities Manager Rochester Institute of Technology Semiconductor & Microsystems Fabrication Laboratory 82 Lomb Memorial Dr. Bldg. 17-2519 Rochester, NY 14623 585 738-4073 c 585 475-2171 o 585 475-5041 f spb1699 at rit.edu www.smfl.rit.edu [http://www.rit.edu/~962www/logos/tiger_walking_rit_color.jpg] From: labnetwork-bounces at mtl.mit.edu On Behalf Of Dave Terry Sent: Wednesday, October 28, 2020 8:09 AM To: Thomas Daunais Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] GCA AS200 150 mm chuck source Have you tried to contact Bob Scruton? On Wed, Oct 28, 2020 at 8:07 AM Thomas Daunais > wrote: Hello everyone, I am looking to buy a new (or new to us) 150 mm chuck for a GCA AS200 for 675 um thick wafers. Does anyone know where I can purchase one? Thanks, -- Thomas Daunais, PhD Lead process engineer Hawk Semiconductor LLC 3260 Hawks Ave. Ann Arbor, MI 48108 hawksemiconductor.com Ph: (231) 740-2720 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Best Regards, Dave Terry ??????????????????? Sent from Gmail Mobile 617 784 7942 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 2550 bytes Desc: image001.jpg URL: