From betemc at rit.edu Mon Feb 1 15:45:44 2021 From: betemc at rit.edu (Bruce Tolleson) Date: Mon, 1 Feb 2021 20:45:44 +0000 Subject: [labnetwork] Manual for an MKS ENI ACG 10B RF Unit Message-ID: <1ec57aad25384adbafd39792dad84183@ex04mail01a.ad.rit.edu> Dear Labnetwork, Does anyone have a manual for the MKS ENI OEM 10B 13.56Mhz RF Supply? We have a one of unit installaed and we have no manual for the RF supply. Thank you, Bruce E. Tolleson Rochester Institute of Technology 82 Lomb Memorial Drive, Bldg 17-2627 Rochester, NY 14623-5604 (585) 478-3836 [http://www.rit.edu/~962www/logos/tiger_walking_rit_color.jpg] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 2550 bytes Desc: image001.jpg URL: From schweig at umich.edu Wed Feb 3 10:07:21 2021 From: schweig at umich.edu (Dennis Schweiger) Date: Wed, 3 Feb 2021 10:07:21 -0500 Subject: [labnetwork] custom mixing gas chemistries Message-ID: Good morning all, Who have you used to supply the custom gas mixes for your fab, particularly the HPM products? We have an application where we want to procure some 15%PH3 in Silane, and the current provider has fallen on their face repeatedly in over-promising, and under-performing. We're typically looking at smaller cylinder sizes (4-6" diameter, and 16-24" tall), with DISS cylinder valves. I have to believe this is a niche market, but someone must be doing it.... Thank you, Dennis Schweiger University of Michigan/LNF Facilities Supervisor 734.647.2055 Ofc "People can be divided into 3 groups - those that make things happen, those that watch things happen, and those that wonder what happened." Within which group do you belong? -------------- next part -------------- An HTML attachment was scrubbed... URL: From tony.olsen at utah.edu Wed Feb 3 13:09:27 2021 From: tony.olsen at utah.edu (Tony L Olsen) Date: Wed, 3 Feb 2021 18:09:27 +0000 Subject: [labnetwork] custom mixing gas chemistries In-Reply-To: References: Message-ID: Dennis We are required to order all our gases through Campus General Stores. They use Airgas for all gases, but the Airgas rep works with other vendors when they can't meet the request. I have both a 6% and 9% PH3 in Silane on-site in 7liter cylinders with DISS (CGA 632) fittings and pneumatic valve. They were provided by AirLiquide (who acquired Airgas). tonyO Tony Olsen Nanofab Cleanroom Supervisor/Process Engineer University of Utah 36 S Wasatch Drive, Suite 2500 Salt Lake City, UT 84112 801-587-0651 www.nanofab.utah.edu From: Dennis Schweiger Sent: Wednesday, February 3, 2021 08:07 To: Fab Network Subject: [labnetwork] custom mixing gas chemistries Good morning all, Who have you used to supply the custom gas mixes for your fab, particularly the HPM products? We have an application where we want to procure some 15%PH3 in Silane, and the current provider has fallen on their face repeatedly in over-promising, and under-performing. We're typically looking at smaller cylinder sizes (4-6" diameter, and 16-24" tall), with DISS cylinder valves. I have to believe this is a niche market, but someone must be doing it.... Thank you, Dennis Schweiger University of Michigan/LNF Facilities Supervisor 734.647.2055 Ofc "People can be divided into 3 groups - those that make things happen, those that watch things happen, and those that wonder what happened." Within which group do you belong? -------------- next part -------------- An HTML attachment was scrubbed... URL: From dlafleur at cns.fas.harvard.edu Wed Feb 3 16:12:14 2021 From: dlafleur at cns.fas.harvard.edu (LaFleur, David W) Date: Wed, 3 Feb 2021 21:12:14 +0000 Subject: [labnetwork] custom mixing gas chemistries In-Reply-To: References: , Message-ID: <2A7C4DB0-FB75-434C-8429-1A33656F011A@cns.fas.harvard.edu> Hi Tony, I would try Matheson Gas. They provide us all our toxic gases in all types of sizes and mixtures. David LaFleur Equipment Engineer CNS Harvard University Sent from my iPhone On Feb 3, 2021, at 4:00 PM, Tony L Olsen wrote: ? Dennis We are required to order all our gases through Campus General Stores. They use Airgas for all gases, but the Airgas rep works with other vendors when they can?t meet the request. I have both a 6% and 9% PH3 in Silane on-site in 7liter cylinders with DISS (CGA 632) fittings and pneumatic valve. They were provided by AirLiquide (who acquired Airgas). tonyO Tony Olsen Nanofab Cleanroom Supervisor/Process Engineer University of Utah 36 S Wasatch Drive, Suite 2500 Salt Lake City, UT 84112 801-587-0651 www.nanofab.utah.edu From: Dennis Schweiger Sent: Wednesday, February 3, 2021 08:07 To: Fab Network Subject: [labnetwork] custom mixing gas chemistries Good morning all, Who have you used to supply the custom gas mixes for your fab, particularly the HPM products? We have an application where we want to procure some 15%PH3 in Silane, and the current provider has fallen on their face repeatedly in over-promising, and under-performing. We're typically looking at smaller cylinder sizes (4-6" diameter, and 16-24" tall), with DISS cylinder valves. I have to believe this is a niche market, but someone must be doing it.... Thank you, Dennis Schweiger University of Michigan/LNF Facilities Supervisor 734.647.2055 Ofc "People can be divided into 3 groups - those that make things happen, those that watch things happen, and those that wonder what happened." Within which group do you belong? _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From gilheart at rice.edu Wed Feb 3 16:17:11 2021 From: gilheart at rice.edu (Tim Gilheart) Date: Wed, 3 Feb 2021 15:17:11 -0600 Subject: [labnetwork] Electroless Ni waste management? Message-ID: <4A321539-0685-4C4C-8E6F-39C6015A3B41@rice.edu> Greetings all, The Rice cleanroom team is working with our counterparts in Environmental Health & Safety to identify best practices for managing the waste generated by the electroless nickel plating process our users now need us to support. This process is based on Transene?s Nickelex product (https://transene.com/ni/ ), and we do not have a dedicated plating bench. Our users anticipate working with beaker-scale quantities, which our staff team believes we can properly support at our acid bench. Our EHS colleague is concerned about the amount of Ni in solution the leftover plating bath will generate, and is uncertain if our waste treatment system will be sufficient. Our treatment system treats all our waste water with sodium bicarbonate and treats with NaOH/H2SO4 as needed to meet the pH specs we?ve set. We?re expecting plating waste to be 1-L per day or less on average, and our wastewater outflow exceeds a thousand gallons per day. We may be close to acceptable Ni levels in the waste stream (2.0 ppm locally) already, just by volume alone, but this is probably not ideal. I?m sure managing electroless nickel waste is routine for a good number of you on the list, so we?d appreciate any insights you can share. Thanks in advance! -- Tim Gilheart, Ph.D. Research Scientist - Nanofabrication Cleanroom Manager, Shared Equipment Authority (SEA), Rice University Cell: 832-341-5488 | Office: 713-348-3159 | gilheart at rice.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From blewis at eng.ufl.edu Wed Feb 3 17:02:17 2021 From: blewis at eng.ufl.edu (Lewis,William) Date: Wed, 3 Feb 2021 22:02:17 +0000 Subject: [labnetwork] custom mixing gas chemistries In-Reply-To: References: Message-ID: Matheson Trigas should be able to do this for you. Bill Lewis Research Service Center University of Florida 1041 Center Dr Gainesville, FL 32611 Desk 352-273-2285 From: labnetwork-bounces at mtl.mit.edu On Behalf Of Tony L Olsen Sent: Wednesday, February 3, 2021 1:09 PM To: Dennis Schweiger ; Fab Network Subject: Re: [labnetwork] custom mixing gas chemistries [External Email] Dennis We are required to order all our gases through Campus General Stores. They use Airgas for all gases, but the Airgas rep works with other vendors when they can't meet the request. I have both a 6% and 9% PH3 in Silane on-site in 7liter cylinders with DISS (CGA 632) fittings and pneumatic valve. They were provided by AirLiquide (who acquired Airgas). tonyO Tony Olsen Nanofab Cleanroom Supervisor/Process Engineer University of Utah 36 S Wasatch Drive, Suite 2500 Salt Lake City, UT 84112 801-587-0651 www.nanofab.utah.edu From: Dennis Schweiger > Sent: Wednesday, February 3, 2021 08:07 To: Fab Network > Subject: [labnetwork] custom mixing gas chemistries Good morning all, Who have you used to supply the custom gas mixes for your fab, particularly the HPM products? We have an application where we want to procure some 15%PH3 in Silane, and the current provider has fallen on their face repeatedly in over-promising, and under-performing. We're typically looking at smaller cylinder sizes (4-6" diameter, and 16-24" tall), with DISS cylinder valves. I have to believe this is a niche market, but someone must be doing it.... Thank you, Dennis Schweiger University of Michigan/LNF Facilities Supervisor 734.647.2055 Ofc "People can be divided into 3 groups - those that make things happen, those that watch things happen, and those that wonder what happened." Within which group do you belong? -------------- next part -------------- An HTML attachment was scrubbed... URL: From jtmitch5 at ncsu.edu Thu Feb 4 08:09:19 2021 From: jtmitch5 at ncsu.edu (James Mitchell) Date: Thu, 4 Feb 2021 08:09:19 -0500 Subject: [labnetwork] custom mixing gas chemistries In-Reply-To: References: Message-ID: Give Linde a try. https://www.lindeus.com/ Jim On Wed, Feb 3, 2021 at 12:10 PM Dennis Schweiger wrote: > Good morning all, > > Who have you used to supply the custom gas mixes for your fab, > particularly the HPM products? We have an application where we want to > procure some 15%PH3 in Silane, and the current provider has fallen on their > face repeatedly in over-promising, and under-performing. We're typically > looking at smaller cylinder sizes (4-6" diameter, and 16-24" tall), with > DISS cylinder valves. > > I have to believe this is a niche market, but someone must be doing it.... > > Thank you, > > Dennis Schweiger > University of Michigan/LNF > Facilities Supervisor > > 734.647.2055 Ofc > > "People can be divided into 3 groups - those that make things happen, > those that watch things happen, and those that wonder what happened." > Within which group do you belong? > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- *James Mitchell* *Specialty Trades Technician* *Dept. of Electrical and Computer Engineering* *NCSU Nanofabrication Facility* *MRC RM243A **Box 7911* *2410 Campus Shore Dr., Raleigh, NC 27606* *jtmitch5 at ncsu.edu* *Desk: 919-515-5394* *Cell: 919-717-7325* -------------- next part -------------- An HTML attachment was scrubbed... URL: From ssmaraschin at unisinos.br Thu Feb 4 08:28:31 2021 From: ssmaraschin at unisinos.br (Samuel Tavares da Silva Maraschin) Date: Thu, 4 Feb 2021 13:28:31 +0000 Subject: [labnetwork] pvd alliance concept Message-ID: Hi everyone, Recently we bought a PVD equipment from Alliance Concept model AC450. We have been experienced several problems: overheating (even melt an Alumminium target); DC Source only works up to 10% of its power, over that it generates arc; Target contamination even when the shutter is closed. We are in touch with manufacture but they seem useless. I don't know if the machine has a problem or the equipment is just bad. I would appreciate any help regarding these issues. Did anyone have same problems with this equipment? Regards, [http://projeto.unisinos.br/emm/2019/institucional/reposicionamento/ass-email-uni/400px-assinaEMAIL_v2_r1_c1.jpg] Samuel Tavares da Silva Maraschin [http://projeto.unisinos.br/emm/2019/institucional/reposicionamento/ass-email-uni/400px-assinaEMAIL_v2_r3_c1.jpg] Auxiliar T?cnico e de Pesquisa Instituto Tecnol?gico de Semicondutores - itt CHIP 55 51 3591-1122 | Ramal 3184 [http://projeto.unisinos.br/emm/2019/institucional/reposicionamento/ass-email-uni/400px-assinaEMAIL_v2_r5_c1-correct.jpg] Aviso legal: Esta mensagem eletr?nica e seus respectivos anexos, podem conter informa??es confidenciais. Se voc? n?o ? o(a) destinat?rio(a) correto(a) e/ou o conte?do do e-mail n?o lhe diz respeito notifique-nos, respondendo a este e-mail com c?pia para esirc at asav.org.br, e apague-o imediatamente. Fica, desde j?, notificado que qualquer a??o baseada no conte?do desta mensagem ? estritamente proibida e ilegal. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 308 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.jpg Type: image/jpeg Size: 1298 bytes Desc: image002.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image005.jpg Type: image/jpeg Size: 21486 bytes Desc: image005.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.jpg Type: image/jpeg Size: 343 bytes Desc: image003.jpg URL: From jsalzmann at pcb.com Thu Feb 4 08:45:36 2021 From: jsalzmann at pcb.com (Jeff Salzmann) Date: Thu, 4 Feb 2021 13:45:36 +0000 Subject: [labnetwork] Electroless Ni waste management? In-Reply-To: <4A321539-0685-4C4C-8E6F-39C6015A3B41@rice.edu> References: <4A321539-0685-4C4C-8E6F-39C6015A3B41@rice.edu> Message-ID: <6082E83331E49D41A9DE3F109A76690CA3FCC850@NYDMS11.pcb.com> Tim, Feel free to contact me directly. I am literally doing this informational work right now, for a production line. Regards, Jeff [cid:image001.png at 01D6FAD2.1AB39060] Jeff Salzmann Research and Development Engineering PCB Piezotronics | 716 684 0002 ext 2907 [cid:image002.jpg at 01D6FAD2.1AB39060] From: labnetwork-bounces at mtl.mit.edu On Behalf Of Tim Gilheart Sent: Wednesday, February 3, 2021 16:17 To: labnetwork at mtl.mit.edu Subject: [labnetwork] Electroless Ni waste management? External Email Notice: This email originated from outside the MTS / PCB organization. Greetings all, The Rice cleanroom team is working with our counterparts in Environmental Health & Safety to identify best practices for managing the waste generated by the electroless nickel plating process our users now need us to support. This process is based on Transene?s Nickelex product (https://transene.com/ni/), and we do not have a dedicated plating bench. Our users anticipate working with beaker-scale quantities, which our staff team believes we can properly support at our acid bench. Our EHS colleague is concerned about the amount of Ni in solution the leftover plating bath will generate, and is uncertain if our waste treatment system will be sufficient. Our treatment system treats all our waste water with sodium bicarbonate and treats with NaOH/H2SO4 as needed to meet the pH specs we?ve set. We?re expecting plating waste to be 1-L per day or less on average, and our wastewater outflow exceeds a thousand gallons per day. We may be close to acceptable Ni levels in the waste stream (2.0 ppm locally) already, just by volume alone, but this is probably not ideal. I?m sure managing electroless nickel waste is routine for a good number of you on the list, so we?d appreciate any insights you can share. Thanks in advance! -- Tim Gilheart, Ph.D. Research Scientist - Nanofabrication Cleanroom Manager, Shared Equipment Authority (SEA), Rice University Cell: 832-341-5488 | Office: 713-348-3159 | gilheart at rice.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 9207 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.jpg Type: image/jpeg Size: 21001 bytes Desc: image002.jpg URL: From wrightsh at lnf.umich.edu Thu Feb 4 11:38:42 2021 From: wrightsh at lnf.umich.edu (Shawn Wright) Date: Thu, 4 Feb 2021 11:38:42 -0500 Subject: [labnetwork] Electroless Ni waste management? In-Reply-To: <4A321539-0685-4C4C-8E6F-39C6015A3B41@rice.edu> References: <4A321539-0685-4C4C-8E6F-39C6015A3B41@rice.edu> Message-ID: <9C7BB04F-E1BE-43CD-9F12-F874FB195492@lnf.umich.edu> Hi Tim, You could look into caswellplating, they have an EN Nickel process/kit and basically they take a couple steps to plate out all of the nickel in the solution so that it?s no longer hazardous. Their products aren't geared towards semi work, but you might be able to do something similar for the Transene process. Thanks, Shawn Wright Lead Research Engineer Operations Group, Lurie Nanofabrication Facility University of Michigan > On Feb 3, 2021, at 4:17 PM, Tim Gilheart wrote: > > Greetings all, > > The Rice cleanroom team is working with our counterparts in Environmental Health & Safety to identify best practices for managing the waste generated by the electroless nickel plating process our users now need us to support. > > This process is based on Transene?s Nickelex product (https://transene.com/ni/ ), and we do not have a dedicated plating bench. Our users anticipate working with beaker-scale quantities, which our staff team believes we can properly support at our acid bench. > > Our EHS colleague is concerned about the amount of Ni in solution the leftover plating bath will generate, and is uncertain if our waste treatment system will be sufficient. Our treatment system treats all our waste water with sodium bicarbonate and treats with NaOH/H2SO4 as needed to meet the pH specs we?ve set. > > We?re expecting plating waste to be 1-L per day or less on average, and our wastewater outflow exceeds a thousand gallons per day. We may be close to acceptable Ni levels in the waste stream (2.0 ppm locally) already, just by volume alone, but this is probably not ideal. > > I?m sure managing electroless nickel waste is routine for a good number of you on the list, so we?d appreciate any insights you can share. > > Thanks in advance! > > -- > Tim Gilheart, Ph.D. > Research Scientist - Nanofabrication Cleanroom Manager, > Shared Equipment Authority (SEA), Rice University > Cell: 832-341-5488 | Office: 713-348-3159 | gilheart at rice.edu > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From lvchang at Central.UH.EDU Thu Feb 4 15:08:48 2021 From: lvchang at Central.UH.EDU (Chang, Long) Date: Thu, 4 Feb 2021 20:08:48 +0000 Subject: [labnetwork] Nanonex Membranes Message-ID: Hi All, We own a Nanonex NX-2004 nanoimprinter. The system uses a pair of membranes that needs to be replaced when damaged. The membrane pair cost $340 (used to be $60 in 2013). Does anyone have an alternative source? Thanks, Long -------------- next part -------------- An HTML attachment was scrubbed... URL: From travisgabel at boisestate.edu Fri Feb 5 11:34:47 2021 From: travisgabel at boisestate.edu (Travis Gabel) Date: Fri, 5 Feb 2021 09:34:47 -0700 Subject: [labnetwork] wafer bonding and thinning Message-ID: Hi We have a project in our lab that requires some wafer to glass bonding. Are there any labs that offer this service or any vendors that you have used for a similar process? We are looking for anodic bonding. After bonding we need the silicon thinned to ~50um. Does anyone offer this or have a vendor that they have worked with? Thanks Travis -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Fri Feb 5 16:22:32 2021 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Fri, 5 Feb 2021 21:22:32 +0000 Subject: [labnetwork] wafer bonding and thinning In-Reply-To: References: Message-ID: Hi Travis. The MNTC in Louisville offers anodic bonding, but we are not as skilled in wafer thinning. http://louisville.edu/micronano/ [http://louisville.edu/micronano/files/images/photos/slide6] Welcome to the MNTC - We are open! ? Micro/Nano Technology Center The Micro/Nano Technology Center (MNTC) is a class 100/1000 $30 million 10,000 ft 2 cleanroom facility and the Huson Imaging & Characterization Laboratory. louisville.edu Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville 2210 South Brook Street Shumaker Research Building, Room 233 Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Travis Gabel Sent: Friday, February 5, 2021 11:34 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] wafer bonding and thinning CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Hi We have a project in our lab that requires some wafer to glass bonding. Are there any labs that offer this service or any vendors that you have used for a similar process? We are looking for anodic bonding. After bonding we need the silicon thinned to ~50um. Does anyone offer this or have a vendor that they have worked with? Thanks Travis -------------- next part -------------- An HTML attachment was scrubbed... URL: From pilarhf at umich.edu Fri Feb 5 18:45:30 2021 From: pilarhf at umich.edu (Pilar Herrera-Fierro) Date: Fri, 5 Feb 2021 18:45:30 -0500 Subject: [labnetwork] wafer bonding and thinning In-Reply-To: References: Message-ID: Travis, We do have anodic bonding at LNF and several techniques that will allow you thinning the Si wafer .. lapping, RIE, also HNA etch. . Do you need a polished Si surface? Pilar On Fri, Feb 5, 2021 at 4:10 PM Travis Gabel wrote: > Hi > > We have a project in our lab that requires some wafer to glass bonding. > Are there any labs that offer this service or any vendors that you have > used for a similar process? We are looking for anodic bonding. > > After bonding we need the silicon thinned to ~50um. Does anyone offer > this or have a vendor that they have worked with? > > Thanks > Travis > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Pilar Herrera-Fierro, Ph.D. LNF User Services Director Lurie Nanofabrication Facility University of Michigan RM 1239 EECS Building 1301 Beal Ave. Ann Arbor, MI 48109-2122 *Cell* 734 646 1399 (734) 646 1399 www.lnf.umich.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From jsalzmann at pcb.com Mon Feb 8 08:02:15 2021 From: jsalzmann at pcb.com (Jeff Salzmann) Date: Mon, 8 Feb 2021 13:02:15 +0000 Subject: [labnetwork] wafer bonding and thinning In-Reply-To: References: Message-ID: <6082E83331E49D41A9DE3F109A76690CA3FCD682@NYDMS11.pcb.com> Axustech might be able to help?. https://axustech.com/wp-content/uploads/2019/10/Wafer-Bonding-App-Note-Rev-01-11-13.pdf From: labnetwork-bounces at mtl.mit.edu On Behalf Of Travis Gabel Sent: Friday, February 5, 2021 11:35 To: labnetwork at mtl.mit.edu Subject: [labnetwork] wafer bonding and thinning External Email Notice: This email originated from outside the MTS / PCB organization. Hi We have a project in our lab that requires some wafer to glass bonding. Are there any labs that offer this service or any vendors that you have used for a similar process? We are looking for anodic bonding. After bonding we need the silicon thinned to ~50um. Does anyone offer this or have a vendor that they have worked with? Thanks Travis -------------- next part -------------- An HTML attachment was scrubbed... URL: From beaudoin at physics.ubc.ca Mon Feb 8 12:36:09 2021 From: beaudoin at physics.ubc.ca (Beaudoin, Mario) Date: Mon, 8 Feb 2021 09:36:09 -0800 Subject: [labnetwork] Job opening: Photonic Wirebonder (PWB) technician In-Reply-To: References: Message-ID: ----- Forwarded Message ----- We have an opening for technician position at UBC's Quantum Matter Institute.? The work will involve photonic wirebonding using the tool from Vanguard photonics.? Details at the following link: https://ubc.wd10.myworkdayjobs.com/en-US/ubcstaffjobs/job/UBC-Vancouver-Campus/Nanofabrication-Technician_JR1122 * Lukas Chrostowski*,?PEng.,/?Professor/ Electrical and Computer Engineering *University of British Columbia* Principal Investigator, Quantum Matter Institute 4039-2332 Main Mall, Kaiser Building Vancouver, B.C.,*Canada,*V6T-1Z4 Office: Room/4039//?Kaiser/Building Work: 604-822-8507 mobile: 604-761-4798 lukasc at ece.ubc.ca_http://www.ece.ubc.ca/~lukasc_ -- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig 2.jpg Type: image/jpeg Size: 21446 bytes Desc: not available URL: From peterggordon at gmail.com Wed Feb 10 09:27:02 2021 From: peterggordon at gmail.com (Peter Gordon) Date: Wed, 10 Feb 2021 09:27:02 -0500 Subject: [labnetwork] valve cleaning advice Message-ID: Hi all, I've had an oil pump backflush up into an XMD-40-XN1A valve (link ), which now no longer works. Does anyone have any advice regarding cleaning? I'm not familiar enough with the internal workings to decide whether it's a lost cause or not. Any advice is appreciated. Cheers, Peter -- Peter G. Gordon, PhD CU NanoFab Facility Administrator Department of Chemistry Carleton University (613) 520-2600 ext.7561 https://carleton.ca/fanssi/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From aali at eng.ucsd.edu Wed Feb 10 13:51:56 2021 From: aali at eng.ucsd.edu (Ahdam Ali) Date: Wed, 10 Feb 2021 10:51:56 -0800 Subject: [labnetwork] valve cleaning advice In-Reply-To: References: Message-ID: Peter, Seems like this valve can be easily taken apart. There should not be too many parts; if you keep track of everything while disassembling you should be fine with putting it back together. Make sure the sealing materials are compatible with whatever solvent you use to clean it. Best, On Wed, Feb 10, 2021 at 10:43 AM Peter Gordon wrote: > Hi all, > > I've had an oil pump backflush up into an XMD-40-XN1A valve (link > ), > which now no longer works. Does anyone have any advice regarding cleaning? > I'm not familiar enough with the internal workings to decide whether it's a > lost cause or not. Any advice is appreciated. > > Cheers, > Peter > > -- > Peter G. Gordon, PhD > CU NanoFab Facility Administrator > Department of Chemistry > Carleton University > (613) 520-2600 ext.7561 > https://carleton.ca/fanssi/ > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Ahdam Ali R&D Engineer II UCSD Calit2 Nano3 Facility Atkinson Hall M/C0436 9500 Gilman Drive La Jolla, CA 92093-0436 Email: aali at eng.ucsd.edu Phone: (858)-534-4768 -------------- next part -------------- An HTML attachment was scrubbed... URL: From usha at stanford.edu Wed Feb 10 14:35:18 2021 From: usha at stanford.edu (Usha Raghuram) Date: Wed, 10 Feb 2021 19:35:18 +0000 Subject: [labnetwork] Applied Materials P5000 Etcher Message-ID: Hello, The electrode insulation ring in our P5000 etcher needs replacement. So far, our attempts to get the part have been unsuccessful. Can anyone recommend a supplier? Thanks, Usha -------------- next part -------------- An HTML attachment was scrubbed... URL: From westgn at mit.edu Wed Feb 10 23:36:06 2021 From: westgn at mit.edu (Gavin Neal West) Date: Thu, 11 Feb 2021 04:36:06 +0000 Subject: [labnetwork] Equipment for sale at MIT Message-ID: <701d67afd31949ecbb19334b8a37055c@oc11expo8.exchange.mit.edu> Hello everyone, My lab has an Omicron cryogenic SFM we are looking to get rid of. The system was originally purchased in 2000, and has not been used for several years. It was fully operating when shut down. Due to age and the need for custom parts to enact any future repairs, we do not expect it is practical/realistic to get the tool back in fully operating condition. The system appears in good shape and we are open to parting it out. Below is a list of the major parts, and a link to some pictures. Let me know if you are interested in anything. Cheers, Gavin West MIT Photos of individual parts: https://photos.app.goo.gl/nTkhgiEGnuSgUZwY7 Additional photos at request. Major parts list: JANIS 16CNDT-OPVT-20UHV optical cryostat (He) Varian StarCell ion pump Varian Multivac pump controller Varian sublimation controller VAT UHV gate (manual) VAT UHV gate (motorized) VAT pneumatic right angle solenoid valve (26328-KA41-0001/1380) Sample preparation chamber w/ manipulators Load lock chamber Pfeiffer TSF 012 vent valve Pfeiffer TMU 260 turbo pump Magnetic coupled transfer rod (looks like a Vacgen MLRD, part number is given as MLRM 204) Vertical transfer rod (omicron custom? Lowers sample from preparation chamber into He dewar, 8X optical/electronic feedthrough ports on top chamber) Lakeshore 340 temperature controller AML PGC2 UHV pressure gauge controller Twickenham helium depth indicator -------------- next part -------------- An HTML attachment was scrubbed... URL: From lino.eugene at uwaterloo.ca Fri Feb 12 10:44:20 2021 From: lino.eugene at uwaterloo.ca (Lino Eugene) Date: Fri, 12 Feb 2021 15:44:20 +0000 Subject: [labnetwork] DLTS service Message-ID: Hi everyone, We are looking for a lab equipped with Deep Level Transient Spectroscopy (DLTS) to analyze some MOS caps fabricated in our fab. Thanks, Lino Eugene, P.Eng., Ph.D., Micro/nanofabrication process engineer Quantum-Nano Fabrication and Characterization Facility QNC 1611 University of Waterloo 200 University Avenue West Waterloo, ON, Canada N2L 3G1 Ph: +1 519-888-4567 #37788 Cell: +1 226-929-1685 Website: https://fab.qnc.uwaterloo.ca/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From sandra.malhotra at tamu.edu Fri Feb 12 16:25:09 2021 From: sandra.malhotra at tamu.edu (Sandra Malhotra) Date: Fri, 12 Feb 2021 15:25:09 -0600 Subject: [labnetwork] Pump for load lock on ASM Polygon 8200 Cluster tool Message-ID: Howdy All, We are having issues with a scroll pump for the load lock on an ASM Polygon 8200 Cluster tool. Does anyone have a recommendation for a better type of pump and model to use? I understand a pump capable of 16 cfm that can maintain 1 - 3 T should do the trick. Thanks! -- *Sandra G. Malhotra, Ph.D.* | Technical Lab Manager AggieFab Nanofabrication Facility Department of Electrical & Computer Engineering, College of Engineering | Texas A&M University 3253 TAMU | College Station, TX 77843 ph: 979.845.3199 | s andra.malhotra at tamu.edu - - - - - - - - - - - - - - - - - - - - - - - - *TEXAS A&M UNIVERSITY* | FEARLESS on Every Front -------------- next part -------------- An HTML attachment was scrubbed... URL: From jeffhawks at verizon.net Sat Feb 13 09:22:44 2021 From: jeffhawks at verizon.net (Jeff Hawks) Date: Sat, 13 Feb 2021 09:22:44 -0500 Subject: [labnetwork] Pump for load lock on ASM Polygon 8200 Cluster tool In-Reply-To: References: Message-ID: <001301d70213$b2e07e50$18a17af0$@net> Hi Sandra, Most scroll pump manufactures sell tip seal replacement kits along with replacement procedures on YouTube. I believe they recommend annual tip seal maintenance. Best regards, Jeff Hawks Hawks Technical Services LLC. 2715 Swamp Creek Rd. Green Lane, PA. 18054 C 215-872-0944 From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Sandra Malhotra Sent: Friday, February 12, 2021 4:25 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Pump for load lock on ASM Polygon 8200 Cluster tool Howdy All, We are having issues with a scroll pump for the load lock on an ASM Polygon 8200 Cluster tool. Does anyone have a recommendation for a better type of pump and model to use? I understand a pump capable of 16 cfm that can maintain 1 - 3 T should do the trick. Thanks! -- Sandra G. Malhotra, Ph.D. | Technical Lab Manager AggieFab Nanofabrication Facility Department of Electrical & Computer Engineering, College of Engineering | Texas A&M University 3253 TAMU | College Station, TX 77843 ph: 979.845.3199 | sandra.malhotra at tamu.edu - - - - - - - - - - - - - - - - - - - - - - - - TEXAS A&M UNIVERSITY | FEARLESS on Every Front -------------- next part -------------- An HTML attachment was scrubbed... URL: From mweiler at andrew.cmu.edu Sat Feb 13 09:44:35 2021 From: mweiler at andrew.cmu.edu (Mark Weiler) Date: Sat, 13 Feb 2021 14:44:35 +0000 Subject: [labnetwork] Equipment for Sale at CMU In-Reply-To: References: , Message-ID: Hi Stephen... I?ve been troubleshooting and coordi system refurbishment like crazy lately, and wanted to touch base. We are actually considering trades also. For instance, we are looking for an ellipsometer. In any case, are you referring to the leybold Z-650? If so, it was working a decade ago when removed from service... and it stayed in Cleanroom. We figured that someone would want the vacuum chambers as a PVD. In the images attached, some of the power supplies in the 19 inch rack will not be sold with the system, as they are not original, and we will keep. [cid:FD06D3B2-35FA-4A88-B8B5-CFA754E3736E] [cid:7A482188-E628-46BC-B646-C5997BFD2791] I have another Leybold, but am unsure of the model. It looks, intuitively, like a CVD or RIE chamber, and it has likely been sitting in storage for well over a decade... likely two. It is wrapped in heavily dusted plastic, but we will be opening it soon to add to the sale. [cid:07F5E79E-EFF3-48CB-8107-4A51C3EB5831] We have a few systems that were in our ?mothball fleet? and our unwrapping them one at a time. For instance, we have a large Temescal evaporator chamber in storage and still on shipping skid. It looks to be at least 1000 L chamber size. The door is over 1 meter wide and on dolly. It has a 20? cryo, and an Edwards 175 pump with EH-1200 blower. [cid:35D499D7-EE4E-4E58-BE82-7B5892F9C19C] [cid:AA05E937-E98B-47BD-B8F1-D2F8C15BB841] [cid:98C6970B-0577-4C20-8BF0-C27F5A1C6BAF] [cid:9FB4C96D-386F-4631-BC80-86671298B31F] Unfortunately, I do not have a picture of the chamber. I will need to go to a different building where it sits. The Nikon Stepper was our workhorse until 2017. It received regular maintenance and has a modern Windows based computer using an emulator for the Nikon software. Best Regards, Mark ________________________________________________________________ Mark Weiler Manager, Equipment & Facilites Claire and John Bertucci Nanotechnology Laboratory Eden Hall Nanofabrication Cleanroom Carnegie Mellon University P: 412-268-2471 F: 412-268-3497 http://www.nanofab.ece.cmu.edu "Be kind; everyone is on their own journey." Daniel Ek Sent from my iPhone On Jan 30, 2021, at 4:41 AM, Stephen Howe wrote: ? I'm interested in all these tools. But, please send me more details. Have an active buyer for a PVD system. So, could be interested in the Leybold. But, need more details. On Fri, 2021-01-29 at 22:12 +0000, Mark Weiler wrote: Hello Again, We have come to the realization that the Intlvac DLC would not be 100% operational after assembly. There have been parts cannibalized, and we want to scrutinize what is needed prior to putting it up for sale as a system. It may be that we need to sell the parts separately, or to someone willing to take it as is. I will update in a week, or so. Additionally, we understand the lack of need for a Z-650 system. If anyone is interested in the chambers, the electronics (complete with super-fast bubble memory), or any other component, we are willing to part out this system. Best Regards, Mark ________________________________________________________________ Mark Weiler Manager, Equipment & Facilites Claire and John Bertucci Nanotechnology Laboratory Eden Hall Nanofabrication Cleanroom Carnegie Mellon University P: 412-268-2471 F: 412-268-3497 http://www.nanofab.ece.cmu.edu On Jan 26, 2021, at 5:00 PM, Mark Weiler > wrote: Hello Everyone, We have some equipment from our cleanrooms and laboratories that we are no longer in need of, and are putting up for sale. Please let me know directly if you are interested. Systems: - Micrion Focused Ion Beam Model 2500 (keyboard issue) - Nikon NSR model 1505G4D (working system) - Heidelberg DWL 66 Laser Lithography System (working system) - Lebold-Heraeus Z-650 Sputtering System (Semi-functional) - Intlvac Ion Beam DLC coater- complete system with LL (working system prior to decommission and storage) Miscellaneous: - A very large variety of small to mid-size oil-based roughing pumps (90%+ working before removal from service and replacement with dry pumps) - Two CTI 8 Cryotorr cryogenic pumps (rebuilt and ready for use) - One CTI 10F Onboard pump with CF flange (rebuilt and ready for use) Best Regards, Mark ________________________________________________________________ Mark Weiler Manager, Equipment & Facilites Claire and John Bertucci Nanotechnology Laboratory Eden Hall Nanofabrication Cleanroom Carnegie Mellon University P: 412-268-2471 F: 412-268-3497 http://www.nanofab.ece.cmu.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... 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Name: image.jpg Type: image/jpeg Size: 71667 bytes Desc: image.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.jpg Type: image/jpeg Size: 89900 bytes Desc: image.jpg URL: From gheorghe.iordache at kaust.edu.sa Mon Feb 15 04:18:06 2021 From: gheorghe.iordache at kaust.edu.sa (Gheorghe Iordache) Date: Mon, 15 Feb 2021 09:18:06 +0000 Subject: [labnetwork] lab benchmarking exercise Message-ID: <3ed1e29d88da4cd0ba6f41f0881ee0c6@SCBMCHP02.kaustcloud.com> Dear colleagues, I'm running a lab benchmarking exercise and I would like to kindly ask for your feedback to the extent you will be able to share the info. Please see the table below with the numbers for KAUST Nanofabrication Core Lab and if you will be able to help please fill in your lab numbers on the dedicated column and send it to me in confidence to gheorghe.iordache at kaust.edu.sa . IMPORTANT NOTE: Your input will be used by me only for the above mentioned exercise and it will not be disclosed to anyone else. Thank you in advance and all please Stay Safe! Question KAUST Your lab here Academic or Industry? University Government of private? private user shared lab with independent management or run by faculty? independent Core Lab in charge with equipment maintenance and training users; faculty would suggest new equipment to be purchased cleanroom area [sq. meter] 2000 cleanroom class (ISO) 5 no. of lab staff / PhD / Engineers / Technicians 19 / 10 / 6 / 3 no. of current users 178 no. of faculty 48 no. of equipment 140 cleanroom open to users 24/7 ? NO do you run a cost recovery business model? NO the 3 most used equipment / their usage % 24h / backup equipment available? Deposition e-beam Evaporator / 37% / YES PPMS_2B_tf / 22% / YES PPMS_2_tf / 21% / YES Cleanroom Specific safety training and emergency response YES Training tracking system YES / Badger Safety Training refresher for staff and users every 3 years Critical Equipment Training refresher if not used for 6 months Equipment reservation system ? YES / Badger Equipment/Asset maintenance system ? YES/FiiX lab ISO 14644 compliant or certified ? ISO 14644 compliant do you have a microfluidics lab? YES hosting SME research or production? NO equipment mainenance - mostly [in-house or service contracts] in-house Buddy system recommended or compulsory? recommended Lab Control System monitored 24/7 YES Emergency response communication Core Labs WhatsApp on business mobile phones. Connected to campus emergency response Emergency response team [lab internal or external] Campus Fire Department Toxic Gas Monitoring System YES All Alarm response to Fire Department YES Safety Walkthrough Biweekly Kind regards, ======================= Gheorghe IORDACHE, PhD Physics, MBA Director of the Nanofabrication Core Lab KAUST King Abdullah University of Science and Technology Al Khawarizmi Building 1 East, Level 3, Office 3415 Thuwal 23955-6900 Kingdom of Saudi Arabia Office: +966 (0)12 8080447 Mobile: +966 (0)540381154 Email: gheorghe.iordache at kaust.edu.sa Linkedin: https://www.linkedin.com/in/gheorghe-iordache-phd-physics-mba/ Follow the Core Labs: corelabs.kaust.edu.sa; https://twitter.com/kaust_corelabs; https://www.instagram.com/kaustcorelabs/; https://www.linkedin.com/showcase/12179999 Visit the Core Labs: https://corelabs.kaust.edu.sa/visitor-information ================ Please note that the weekend in Saudi Arabia is Friday and Saturday ======== What you do for yourself vanishes once you're gone. What you do for others stays for others as your legacy. -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Mon Feb 15 09:27:52 2021 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Mon, 15 Feb 2021 14:27:52 +0000 Subject: [labnetwork] Pump for load lock on ASM Polygon 8200 Cluster tool In-Reply-To: References: Message-ID: <61dd9fe609d2421ba839ce1e7f0d16bc@draper.com> Hi everyone, Here at Draper we have removed all our scroll pumps, because they are not meant to be on 24/7 with EBARA EV-A. this is a great small pump package with great reliability. Rick Richard H. Morrison Principal Member of the Technical Staff Draper 555 Technology Square Cambridge, MA 02139-3573 Work 617-258-3420 Cell 508-930-3461 www.draper.com From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Sandra Malhotra Sent: Friday, February 12, 2021 4:25 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Pump for load lock on ASM Polygon 8200 Cluster tool Howdy All, We are having issues with a scroll pump for the load lock on an ASM Polygon 8200 Cluster tool. Does anyone have a recommendation for a better type of pump and model to use? I understand a pump capable of 16 cfm that can maintain 1 - 3 T should do the trick. Thanks! -- Sandra G. Malhotra, Ph.D. | Technical Lab Manager AggieFab Nanofabrication Facility Department of Electrical & Computer Engineering, College of Engineering | Texas A&M University 3253 TAMU | College Station, TX 77843 ph: 979.845.3199 | sandra.malhotra at tamu.edu - - - - - - - - - - - - - - - - - - - - - - - - TEXAS A&M UNIVERSITY | FEARLESS on Every Front ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: EBARA EV-A Dry Pump Brochure.pdf Type: application/pdf Size: 838794 bytes Desc: EBARA EV-A Dry Pump Brochure.pdf URL: From julia.aebersold at louisville.edu Mon Feb 15 10:16:11 2021 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Mon, 15 Feb 2021 15:16:11 +0000 Subject: [labnetwork] lab benchmarking exercise In-Reply-To: <3ed1e29d88da4cd0ba6f41f0881ee0c6@SCBMCHP02.kaustcloud.com> References: <3ed1e29d88da4cd0ba6f41f0881ee0c6@SCBMCHP02.kaustcloud.com> Message-ID: Can you give moer information on how the data will be used and if it will be shared with this group thereafter? Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville 2210 South Brook Street Shumaker Research Building, Room 233 Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Gheorghe Iordache Sent: Monday, February 15, 2021 4:18 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] lab benchmarking exercise CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Dear colleagues, I?m running a lab benchmarking exercise and I would like to kindly ask for your feedback to the extent you will be able to share the info. Please see the table below with the numbers for KAUST Nanofabrication Core Lab and if you will be able to help please fill in your lab numbers on the dedicated column and send it to me in confidence to gheorghe.iordache at kaust.edu.sa . IMPORTANT NOTE: Your input will be used by me only for the above mentioned exercise and it will not be disclosed to anyone else. Thank you in advance and all please Stay Safe! Question KAUST Your lab here Academic or Industry? University Government of private? private user shared lab with independent management or run by faculty? independent Core Lab in charge with equipment maintenance and training users; faculty would suggest new equipment to be purchased cleanroom area [sq. meter] 2000 cleanroom class (ISO) 5 no. of lab staff / PhD / Engineers / Technicians 19 / 10 / 6 / 3 no. of current users 178 no. of faculty 48 no. of equipment 140 cleanroom open to users 24/7 ? NO do you run a cost recovery business model? NO the 3 most used equipment / their usage % 24h / backup equipment available? Deposition e-beam Evaporator / 37% / YES PPMS_2B_tf / 22% / YES PPMS_2_tf / 21% / YES Cleanroom Specific safety training and emergency response YES Training tracking system YES / Badger Safety Training refresher for staff and users every 3 years Critical Equipment Training refresher if not used for 6 months Equipment reservation system ? YES / Badger Equipment/Asset maintenance system ? YES/FiiX lab ISO 14644 compliant or certified ? ISO 14644 compliant do you have a microfluidics lab? YES hosting SME research or production? NO equipment mainenance - mostly [in-house or service contracts] in-house Buddy system recommended or compulsory? recommended Lab Control System monitored 24/7 YES Emergency response communication Core Labs WhatsApp on business mobile phones. Connected to campus emergency response Emergency response team [lab internal or external] Campus Fire Department Toxic Gas Monitoring System YES All Alarm response to Fire Department YES Safety Walkthrough Biweekly Kind regards, ======================= Gheorghe IORDACHE, PhD Physics, MBA Director of the Nanofabrication Core Lab KAUST King Abdullah University of Science and Technology Al Khawarizmi Building 1 East, Level 3, Office 3415 Thuwal 23955-6900 Kingdom of Saudi Arabia Office: +966 (0)12 8080447 Mobile: +966 (0)540381154 Email: gheorghe.iordache at kaust.edu.sa Linkedin: https://www.linkedin.com/in/gheorghe-iordache-phd-physics-mba/ Follow the Core Labs: corelabs.kaust.edu.sa; https://twitter.com/kaust_corelabs; https://www.instagram.com/kaustcorelabs/; https://www.linkedin.com/showcase/12179999 Visit the Core Labs: https://corelabs.kaust.edu.sa/visitor-information ================ Please note that the weekend in Saudi Arabia is Friday and Saturday ======== What you do for yourself vanishes once you're gone. What you do for others stays for others as your legacy. -------------- next part -------------- An HTML attachment was scrubbed... URL: From repemc at rit.edu Mon Feb 15 12:16:02 2021 From: repemc at rit.edu (Robert Pearson) Date: Mon, 15 Feb 2021 17:16:02 +0000 Subject: [labnetwork] lab benchmarking exercise In-Reply-To: References: <3ed1e29d88da4cd0ba6f41f0881ee0c6@SCBMCHP02.kaustcloud.com> Message-ID: <1dcb8e80244c455dbf9e6ddf52788a81@ex04mail02c.ad.rit.edu> Hello Gheorghe, A agree with Julia, I would also like to see a summary of your final results. I think that you should share them at the 2022 University Government Industry Micro/Nano Electronics Symposium that will be held at the University of Wisconsin, June 6-9 2022. https://ugim2020.wisc.edu/ Sincerely, Rob [rob_image_2012] Robert E. Pearson, PhD Electrical & Microelectronic Engineering Rochester Institute of Technology Rochester NY 14623 (585) 475-2923 voice robert.pearson at rit.edu http://people.rit.edu/~repemc/ From: labnetwork-bounces at mtl.mit.edu On Behalf Of Aebersold,Julia W. Sent: Monday, February 15, 2021 10:16 AM To: Gheorghe Iordache ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] lab benchmarking exercise Can you give moer information on how the data will be used and if it will be shared with this group thereafter? Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville 2210 South Brook Street Shumaker Research Building, Room 233 Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ ________________________________ From: labnetwork-bounces at mtl.mit.edu > on behalf of Gheorghe Iordache > Sent: Monday, February 15, 2021 4:18 AM To: labnetwork at mtl.mit.edu > Subject: [labnetwork] lab benchmarking exercise CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Dear colleagues, I'm running a lab benchmarking exercise and I would like to kindly ask for your feedback to the extent you will be able to share the info. Please see the table below with the numbers for KAUST Nanofabrication Core Lab and if you will be able to help please fill in your lab numbers on the dedicated column and send it to me in confidence to gheorghe.iordache at kaust.edu.sa . IMPORTANT NOTE: Your input will be used by me only for the above mentioned exercise and it will not be disclosed to anyone else. Thank you in advance and all please Stay Safe! Question KAUST Your lab here Academic or Industry? University Government of private? private user shared lab with independent management or run by faculty? independent Core Lab in charge with equipment maintenance and training users; faculty would suggest new equipment to be purchased cleanroom area [sq. meter] 2000 cleanroom class (ISO) 5 no. of lab staff / PhD / Engineers / Technicians 19 / 10 / 6 / 3 no. of current users 178 no. of faculty 48 no. of equipment 140 cleanroom open to users 24/7 ? NO do you run a cost recovery business model? NO the 3 most used equipment / their usage % 24h / backup equipment available? Deposition e-beam Evaporator / 37% / YES PPMS_2B_tf / 22% / YES PPMS_2_tf / 21% / YES Cleanroom Specific safety training and emergency response YES Training tracking system YES / Badger Safety Training refresher for staff and users every 3 years Critical Equipment Training refresher if not used for 6 months Equipment reservation system ? YES / Badger Equipment/Asset maintenance system ? YES/FiiX lab ISO 14644 compliant or certified ? ISO 14644 compliant do you have a microfluidics lab? YES hosting SME research or production? NO equipment mainenance - mostly [in-house or service contracts] in-house Buddy system recommended or compulsory? recommended Lab Control System monitored 24/7 YES Emergency response communication Core Labs WhatsApp on business mobile phones. Connected to campus emergency response Emergency response team [lab internal or external] Campus Fire Department Toxic Gas Monitoring System YES All Alarm response to Fire Department YES Safety Walkthrough Biweekly Kind regards, ======================= Gheorghe IORDACHE, PhD Physics, MBA Director of the Nanofabrication Core Lab KAUST King Abdullah University of Science and Technology Al Khawarizmi Building 1 East, Level 3, Office 3415 Thuwal 23955-6900 Kingdom of Saudi Arabia Office: +966 (0)12 8080447 Mobile: +966 (0)540381154 Email: gheorghe.iordache at kaust.edu.sa Linkedin: https://www.linkedin.com/in/gheorghe-iordache-phd-physics-mba/ Follow the Core Labs: corelabs.kaust.edu.sa; https://twitter.com/kaust_corelabs; https://www.instagram.com/kaustcorelabs/; https://www.linkedin.com/showcase/12179999 Visit the Core Labs: https://corelabs.kaust.edu.sa/visitor-information ================ Please note that the weekend in Saudi Arabia is Friday and Saturday ======== What you do for yourself vanishes once you're gone. What you do for others stays for others as your legacy. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 124773 bytes Desc: image001.png URL: From gheorghe.iordache at kaust.edu.sa Mon Feb 15 14:12:21 2021 From: gheorghe.iordache at kaust.edu.sa (Gheorghe Iordache) Date: Mon, 15 Feb 2021 19:12:21 +0000 Subject: [labnetwork] UPDATE: lab benchmarking exercise Message-ID: <117245841af84747b83bbb68bcb6adc0@SCBMCHP02.kaustcloud.com> Dear Julia, Thank you so much for your message. You raised indeed two great questions. To answer the first question, my first attempt was to simply compare the ratio no of lab staff to no of users and PIs. However, I have extended the questionnaire with some questions for sure all of us have been thinking about and I have been trying to understand where my lab would be positioned within the big picture of our community and find ways to improve our activity here taking into account the influence of some important specific parameters as: - SA perceived as a remote location by equipment and consumables suppliers and by service providers, hence our mostly in-house equipment maintenance; - a rather low request from local industry, hence my question about the cost recovery management system, I cannot apply; - connected to the above, a fully subsidized activity here, which I guess should be an advantage for us... -etc. To answer the second question, of course, apart from the immediate use to benchmarking my lab, I will be very much looking forward to see you all again during our next UGIM meeting, after we get rid of this disruptive virus to share the findings of this study with you all, if you will be considering this interesting. No link between place and numbers will be disclosed though... only statistics. I still recall the fruitful discussions we had at Penn and I regret that our meeting at Wisconsin U last year had to be postponed... I hope some of you will be able to send me some info. Again, all this will be completely confidential. Meanwhile, please, please, stay safe everyone! Our users will need our continuous support! :) Kind regards, Gheorghe From: Aebersold,Julia W. [mailto:julia.aebersold at louisville.edu] Sent: 15 February 2021 18:16 To: Gheorghe Iordache ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] lab benchmarking exercise Can you give moer information on how the data will be used and if it will be shared with this group thereafter? Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville 2210 South Brook Street Shumaker Research Building, Room 233 Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ ________________________________ From: labnetwork-bounces at mtl.mit.edu > on behalf of Gheorghe Iordache > Sent: Monday, February 15, 2021 4:18 AM To: labnetwork at mtl.mit.edu > Subject: [labnetwork] lab benchmarking exercise CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Dear colleagues, I'm running a lab benchmarking exercise and I would like to kindly ask for your feedback to the extent you will be able to share the info. Please see the table below with the numbers for KAUST Nanofabrication Core Lab and if you will be able to help please fill in your lab numbers on the dedicated column and send it to me in confidence to gheorghe.iordache at kaust.edu.sa . IMPORTANT NOTE: Your input will be used by me only for the above mentioned exercise and it will not be disclosed to anyone else. Thank you in advance and all please Stay Safe! Question KAUST Your lab here Academic or Industry? University Government of private? private user shared lab with independent management or run by faculty? independent Core Lab in charge with equipment maintenance and training users; faculty would suggest new equipment to be purchased cleanroom area [sq. meter] 2000 cleanroom class (ISO) 5 no. of lab staff / PhD / Engineers / Technicians 19 / 10 / 6 / 3 no. of current users 178 no. of faculty 48 no. of equipment 140 cleanroom open to users 24/7 ? NO do you run a cost recovery business model? NO the 3 most used equipment / their usage % 24h / backup equipment available? Deposition e-beam Evaporator / 37% / YES PPMS_2B_tf / 22% / YES PPMS_2_tf / 21% / YES Cleanroom Specific safety training and emergency response YES Training tracking system YES / Badger Safety Training refresher for staff and users every 3 years Critical Equipment Training refresher if not used for 6 months Equipment reservation system ? YES / Badger Equipment/Asset maintenance system ? YES/FiiX lab ISO 14644 compliant or certified ? ISO 14644 compliant do you have a microfluidics lab? YES hosting SME research or production? NO equipment mainenance - mostly [in-house or service contracts] in-house Buddy system recommended or compulsory? recommended Lab Control System monitored 24/7 YES Emergency response communication Core Labs WhatsApp on business mobile phones. Connected to campus emergency response Emergency response team [lab internal or external] Campus Fire Department Toxic Gas Monitoring System YES All Alarm response to Fire Department YES Safety Walkthrough Biweekly Kind regards, ======================= Gheorghe IORDACHE, PhD Physics, MBA Director of the Nanofabrication Core Lab KAUST King Abdullah University of Science and Technology Al Khawarizmi Building 1 East, Level 3, Office 3415 Thuwal 23955-6900 Kingdom of Saudi Arabia Office: +966 (0)12 8080447 Mobile: +966 (0)540381154 Email: gheorghe.iordache at kaust.edu.sa Linkedin: https://www.linkedin.com/in/gheorghe-iordache-phd-physics-mba/ Follow the Core Labs: corelabs.kaust.edu.sa; https://twitter.com/kaust_corelabs; https://www.instagram.com/kaustcorelabs/; https://www.linkedin.com/showcase/12179999 Visit the Core Labs: https://corelabs.kaust.edu.sa/visitor-information ================ Please note that the weekend in Saudi Arabia is Friday and Saturday ======== What you do for yourself vanishes once you're gone. What you do for others stays for others as your legacy. -------------- next part -------------- An HTML attachment was scrubbed... URL: From jtmitch5 at ncsu.edu Mon Feb 15 14:39:33 2021 From: jtmitch5 at ncsu.edu (James Mitchell) Date: Mon, 15 Feb 2021 14:39:33 -0500 Subject: [labnetwork] ALCATEL AMS100 Manual Message-ID: Looking for a service manual for this RIE ICP system. Thanks, Jim -- *James Mitchell* *Specialty Trades Technician* *Dept. of Electrical and Computer Engineering* *NCSU Nanofabrication Facility* *MRC RM243A **Box 7911* *2410 Campus Shore Dr., Raleigh, NC 27606* *jtmitch5 at ncsu.edu* *Desk: 919-515-5394* *Cell: 919-717-7325* -------------- next part -------------- An HTML attachment was scrubbed... URL: From Thomas_Ferraguto at uml.edu Tue Feb 16 07:32:21 2021 From: Thomas_Ferraguto at uml.edu (Ferraguto, Thomas S) Date: Tue, 16 Feb 2021 12:32:21 +0000 Subject: [labnetwork] lab benchmarking exercise In-Reply-To: <3ed1e29d88da4cd0ba6f41f0881ee0c6@SCBMCHP02.kaustcloud.com> References: <3ed1e29d88da4cd0ba6f41f0881ee0c6@SCBMCHP02.kaustcloud.com> Message-ID: I did this presentation in Utah 2016... I'll send you this data directly. You can add it build on it... There's some overlap Best Tom Thomas S. Ferraguto Saab ETIC Nanofabrication Laboratory Director Saab ETIC Building Director 1 University Avenue Lowell MA 01854 Mobile 617-755-0910 Land 978-934-1809 Fax 978-934-1014 From: labnetwork-bounces at mtl.mit.edu On Behalf Of Gheorghe Iordache Sent: Monday, February 15, 2021 4:18 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] lab benchmarking exercise This e-mail originated from outside the UMass Lowell network. ________________________________ Dear colleagues, I'm running a lab benchmarking exercise and I would like to kindly ask for your feedback to the extent you will be able to share the info. Please see the table below with the numbers for KAUST Nanofabrication Core Lab and if you will be able to help please fill in your lab numbers on the dedicated column and send it to me in confidence to gheorghe.iordache at kaust.edu.sa . IMPORTANT NOTE: Your input will be used by me only for the above mentioned exercise and it will not be disclosed to anyone else. Thank you in advance and all please Stay Safe! Question KAUST Your lab here Academic or Industry? University Government of private? private user shared lab with independent management or run by faculty? independent Core Lab in charge with equipment maintenance and training users; faculty would suggest new equipment to be purchased cleanroom area [sq. meter] 2000 cleanroom class (ISO) 5 no. of lab staff / PhD / Engineers / Technicians 19 / 10 / 6 / 3 no. of current users 178 no. of faculty 48 no. of equipment 140 cleanroom open to users 24/7 ? NO do you run a cost recovery business model? NO the 3 most used equipment / their usage % 24h / backup equipment available? Deposition e-beam Evaporator / 37% / YES PPMS_2B_tf / 22% / YES PPMS_2_tf / 21% / YES Cleanroom Specific safety training and emergency response YES Training tracking system YES / Badger Safety Training refresher for staff and users every 3 years Critical Equipment Training refresher if not used for 6 months Equipment reservation system ? YES / Badger Equipment/Asset maintenance system ? YES/FiiX lab ISO 14644 compliant or certified ? ISO 14644 compliant do you have a microfluidics lab? YES hosting SME research or production? NO equipment mainenance - mostly [in-house or service contracts] in-house Buddy system recommended or compulsory? recommended Lab Control System monitored 24/7 YES Emergency response communication Core Labs WhatsApp on business mobile phones. Connected to campus emergency response Emergency response team [lab internal or external] Campus Fire Department Toxic Gas Monitoring System YES All Alarm response to Fire Department YES Safety Walkthrough Biweekly Kind regards, ======================= Gheorghe IORDACHE, PhD Physics, MBA Director of the Nanofabrication Core Lab KAUST King Abdullah University of Science and Technology Al Khawarizmi Building 1 East, Level 3, Office 3415 Thuwal 23955-6900 Kingdom of Saudi Arabia Office: +966 (0)12 8080447 Mobile: +966 (0)540381154 Email: gheorghe.iordache at kaust.edu.sa Linkedin: https://www.linkedin.com/in/gheorghe-iordache-phd-physics-mba/ Follow the Core Labs: corelabs.kaust.edu.sa; https://twitter.com/kaust_corelabs; https://www.instagram.com/kaustcorelabs/; https://www.linkedin.com/showcase/12179999 Visit the Core Labs: https://corelabs.kaust.edu.sa/visitor-information ================ Please note that the weekend in Saudi Arabia is Friday and Saturday ======== What you do for yourself vanishes once you're gone. What you do for others stays for others as your legacy. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Survey Presentation Tom Ferraguto UML 13Jun2016.pptx Type: application/vnd.openxmlformats-officedocument.presentationml.presentation Size: 5964975 bytes Desc: Survey Presentation Tom Ferraguto UML 13Jun2016.pptx URL: From rharlan at purdue.edu Tue Feb 16 16:30:21 2021 From: rharlan at purdue.edu (Harlan, Richard D) Date: Tue, 16 Feb 2021 21:30:21 +0000 Subject: [labnetwork] Liquid Nitrogen Vacuum Jacketed Line Maintenance Question Message-ID: Greetings All, Our facility is now 15 years old and starting to require more preventative maintenance. The vacuum jacketed liquid nitrogen line was showing an increased leak rate for a short period of time. It has since stabilized, but has raised questions about potential leaks in the system. Have any of your facilities experienced this type of problem and what PM's have you put in place to address the LN2 and vacuum jacketed line integrity? Thank you in advance for the feedback. Thanks, Rich Harlan Research Engineering Birck Nanotechnology Center | Room 2287C Office: 765.494.6697 | Email: rharlan at purdue.edu [cid:image001.png at 01D7047B.65E20A00] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 14241 bytes Desc: image001.png URL: From schweig at umich.edu Wed Feb 17 07:42:54 2021 From: schweig at umich.edu (Dennis Schweiger) Date: Wed, 17 Feb 2021 07:42:54 -0500 Subject: [labnetwork] Liquid Nitrogen Vacuum Jacketed Line Maintenance Question In-Reply-To: References: Message-ID: Rich, good morning. Here at the University of Michigan/LNF, we have about 250-300' of assorted LN2 piping systems delivering LN2 at 50PSI to various phase separators that are serving MBE tools, and gravity fill stations. All of our piping, except for about 75', is actively pumped through the vacuum pumps that support each of the five LN2 phase separators. Typically, when we have an issue with the piping (frosting over on the atmosphere jacket) it's because one of the users violated the vacuum integrity of the jacket at their tool connection. In those instances, we'll isolate the section of the system and allow it to warm up while under vacuum. That usually fixes the issue. On occasion, we have had to shut down the entire delivery system and allow it to warm up to fix the thermal violation. We have not noticed any issues with the static vacuum lines, and they've been installed since 1987. I will say that our delivery system is designed so that by manipulating vacuum valves, we can "select" which vacuum pump is "pulling" on the annular space of the vacuum jacket. It wasn't always like this. We made some changes once we had more than two MBE tools (PI's) on the delivery system. If you have any additional questions, just give me a call. Dennis schweiger University of Michigan/LNF Facilities Manager 734.647.2055 Ofc On Tue, Feb 16, 2021 at 7:48 PM Harlan, Richard D wrote: > Greetings All, > > Our facility is now 15 years old and starting to require more preventative > maintenance. The vacuum jacketed liquid nitrogen line was showing an > increased leak rate for a short period of time. It has since stabilized, > but has raised questions about potential leaks in the system. > > Have any of your facilities experienced this type of problem and what PM?s > have you put in place to address the LN2 and vacuum jacketed line integrity? > > Thank you in advance for the feedback. > > > > Thanks, > > Rich Harlan > > Research Engineering > > Birck Nanotechnology Center | Room 2287C > > *Office:* 765.494.6697 | *Email:* rharlan at purdue.edu > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 14241 bytes Desc: not available URL: From menounos at mit.edu Wed Feb 17 08:03:07 2021 From: menounos at mit.edu (Nicholas Menounos) Date: Wed, 17 Feb 2021 13:03:07 +0000 Subject: [labnetwork] Liquid Nitrogen Vacuum Jacketed Line Maintenance Question In-Reply-To: References: Message-ID: Hi Rich, I don't know the type of system you have (dynamic - always pumped, static sections "factory sealed", custom static or flexible), but the industry standard for "good" vacuum on VJ is ~10 micron cold and 40 micron warm. If you have a vacuum pump port, you should be able to measure and/or pump down. If you are unable to maintain vacuum, you can identify leaks with He leak checker. If you have some form of getter in the interstitial, it may need to be regenerated (unlikely)...Flexible stuff is generally replaced. Also worth noting on a system that age: Thermal safety reliefs in the piping should be replaced every 10 years and every 5 years on the ASME pressure vessels. Nicholas Menounos, PE, LEED AP (he/him/his) Assistant Director of Infrastructure MIT.nano Massachusetts Institute of Technology 77 Massachusetts Ave, Bldg 12-4003 Cambridge, MA 02139 Cell: (508) 932-0938 Office: (617) 253-7234 Email: Menounos at mit.edu From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Harlan, Richard D Sent: Tuesday, February 16, 2021 4:30 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Liquid Nitrogen Vacuum Jacketed Line Maintenance Question Greetings All, Our facility is now 15 years old and starting to require more preventative maintenance. The vacuum jacketed liquid nitrogen line was showing an increased leak rate for a short period of time. It has since stabilized, but has raised questions about potential leaks in the system. Have any of your facilities experienced this type of problem and what PM's have you put in place to address the LN2 and vacuum jacketed line integrity? Thank you in advance for the feedback. Thanks, Rich Harlan Research Engineering Birck Nanotechnology Center | Room 2287C Office: 765.494.6697 | Email: rharlan at purdue.edu [cid:image001.png at 01D70502.9AF48AB0] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 14241 bytes Desc: image001.png URL: From myakimov at sunypoly.edu Wed Feb 17 11:30:58 2021 From: myakimov at sunypoly.edu (Yakimov, Michael) Date: Wed, 17 Feb 2021 16:30:58 +0000 Subject: [labnetwork] Liquid Nitrogen Vacuum Jacketed Line Maintenance Question In-Reply-To: References: Message-ID: <1613579458088.39153@sunypoly.edu> Rich, I assume you're talking VBC system? We have such a system for many years. Other than regular oil changes and pump service, only thing I encounter was a totally flattened viton gasket in a vacuum bellow jumper. It didn't leak, but it really looked like a washer, not as an o-ring. I am thinking about doing wholesale o-ring change on our system as such o-rings are just waiting to leak. Thanks Mike _______________________ Michael Yakimov Research Scientist State University of NY SUNY Polytechnic Institute 251 Fuller rd Albany NY 12203 myakimov at sunypoly.edu Phone:518-229-9561 cell Phone 518-437-8609 lab ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Harlan, Richard D Sent: Tuesday, February 16, 2021 4:30 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Liquid Nitrogen Vacuum Jacketed Line Maintenance Question Greetings All, Our facility is now 15 years old and starting to require more preventative maintenance. The vacuum jacketed liquid nitrogen line was showing an increased leak rate for a short period of time. It has since stabilized, but has raised questions about potential leaks in the system. Have any of your facilities experienced this type of problem and what PM's have you put in place to address the LN2 and vacuum jacketed line integrity? Thank you in advance for the feedback. Thanks, Rich Harlan Research Engineering Birck Nanotechnology Center | Room 2287C Office: 765.494.6697 | Email: rharlan at purdue.edu [cid:image001.png at 01D7047B.65E20A00] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 14241 bytes Desc: image001.png URL: From chonglee at mit.edu Wed Feb 17 11:54:03 2021 From: chonglee at mit.edu (Chong Lee) Date: Wed, 17 Feb 2021 16:54:03 +0000 Subject: [labnetwork] Kanto Chemical BOSE IGZO etchant Message-ID: I am new to this email list, let me know if this is appropriate to ask: Does anyone know if above etchant will attack common metals like Al and Mo? Where would I look for data or compatibility chart? Has anyone used it at MTL before? Chong -------------- next part -------------- An HTML attachment was scrubbed... URL: From sturm at princeton.edu Wed Feb 17 13:17:19 2021 From: sturm at princeton.edu (James C. Sturm) Date: Wed, 17 Feb 2021 18:17:19 +0000 Subject: [labnetwork] On-line teaching reference for simple microfabrication Message-ID: I'm looking for a simple straightforward on-line teaching reference for simple microfabrication with clear schematic step by step figures. i. How you can use photolithography to pattern a selective etch, or for liftoff, ii. Some figures and qualitative description of some different thin film formation or deposition methods iii. A few simple integrated processes to make a device of some sort. I'm sure they are out there. Thanks, Jim Sturm -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Wed Feb 17 13:43:43 2021 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Wed, 17 Feb 2021 18:43:43 +0000 Subject: [labnetwork] Kanto Chemical BOSE IGZO etchant In-Reply-To: References: Message-ID: Get the SDS of the etchant and see what the etch is made out of. Then there are on line chemical compatibility charts and see what etches the metals of interest. Good resource is the CRC Physics and Chemistry handbook and back in the late 1990 there was a paper published by Berkeley that listed etch rates for a tone of semiconductor material, I think the author was Kirt Williams? It was a 2 part article. Rick Richard H. Morrison Principal Member of the Technical Staff Draper 555 Technology Square Cambridge, MA 02139-3573 Work 617-258-3420 Cell 508-930-3461 www.draper.com From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Chong Lee Sent: Wednesday, February 17, 2021 11:54 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Kanto Chemical BOSE IGZO etchant I am new to this email list, let me know if this is appropriate to ask: Does anyone know if above etchant will attack common metals like Al and Mo? Where would I look for data or compatibility chart? Has anyone used it at MTL before? Chong ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From rreger at purdue.edu Wed Feb 17 14:24:36 2021 From: rreger at purdue.edu (Reger, Ronald K) Date: Wed, 17 Feb 2021 19:24:36 +0000 Subject: [labnetwork] Challenging Oxide Etch Process In-Reply-To: References: Message-ID: Dear Colleagues, One of our faculty members has a process he needs to run in which nano-scale oxide definition is required to expose a gold contact pad. With our shared-use RIEs we are very concerned about Au contamination in our etch tools, particularly for our electron device researchers. We're seeking your input from your facilities whether you may have etch tools that allow Au processing for these specialty kinds of processes, and if you have a procedure for dealing with such contamination. A generic sketch about what our faculty member needs is shown below. So, have you dealt with this contamination issue with your multi-use tools before, and how do you deal with mitigating the contamination? Do any of you have a tool that could be used by this research group? Thanks very much in advance. Ron Reger Birck Nanotechnology Center Purdue University Generic process steps: Fabrication need: metal connection to a sub-micron-size metal pad buried under <=50nm ALD oxide (HfO2 or Al2O3). Conventional fabrication steps (see sketch attached): (1) cover metal pad with etch-resistive metal, e.g. Au, (2) ALD-grow oxide (20-50nm), (3) define a sum-micron PMMA mask using e-beam lithography, (4) dry etch oxide with Au serving as a stop-etch layer (ICP-assisted etch using BCl3 or SF6 gases), (5-6) subsequent standard e-beam lithography to connect the exposed Au pad to the outside circuit. Problem: Au (or any other metal which forms non-volatile compounds in RIE system) may be problematic for some electron device processes and is restricted from being used in shared-use RIE oxide etchers. Current work-around: for large (>10 micron) pads steps (3-4) can be performed by optical lithography + wet etch in HF. e-beam resists like PMMA are attacked by HF and this work-around cannot be used if sub-micron lithography is needed. [cid:926E0593-F8D0-4658-9033-EEF1A6A25DF1 at lfytina2.metronetinc.net] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: process_steps.jpg Type: image/jpeg Size: 65828 bytes Desc: process_steps.jpg URL: From gheorghe.iordache at kaust.edu.sa Wed Feb 17 15:19:43 2021 From: gheorghe.iordache at kaust.edu.sa (Gheorghe Iordache) Date: Wed, 17 Feb 2021 20:19:43 +0000 Subject: [labnetwork] lab benchmarking exercise In-Reply-To: <1dcb8e80244c455dbf9e6ddf52788a81@ex04mail02c.ad.rit.edu> References: <3ed1e29d88da4cd0ba6f41f0881ee0c6@SCBMCHP02.kaustcloud.com> <1dcb8e80244c455dbf9e6ddf52788a81@ex04mail02c.ad.rit.edu> Message-ID: Dear Rob, As I mentioned in my reply to Julia and labnetwork, I will definitely share the conclusions with our community, hopefully at the UGIM 2022. I hope I'll get enough feedback to make the exercise meaningful. Please Stay Safe. Kind regards, Gheorghe From: Robert Pearson [mailto:repemc at rit.edu] Sent: 15 February 2021 20:16 To: Aebersold,Julia W. ; Gheorghe Iordache ; labnetwork at mtl.mit.edu Subject: RE: [labnetwork] lab benchmarking exercise Hello Gheorghe, A agree with Julia, I would also like to see a summary of your final results. I think that you should share them at the 2022 University Government Industry Micro/Nano Electronics Symposium that will be held at the University of Wisconsin, June 6-9 2022. https://ugim2020.wisc.edu/ Sincerely, Rob [rob_image_2012] Robert E. Pearson, PhD Electrical & Microelectronic Engineering Rochester Institute of Technology Rochester NY 14623 (585) 475-2923 voice robert.pearson at rit.edu http://people.rit.edu/~repemc/ From: labnetwork-bounces at mtl.mit.edu > On Behalf Of Aebersold,Julia W. Sent: Monday, February 15, 2021 10:16 AM To: Gheorghe Iordache >; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] lab benchmarking exercise Can you give moer information on how the data will be used and if it will be shared with this group thereafter? Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville 2210 South Brook Street Shumaker Research Building, Room 233 Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ ________________________________ From: labnetwork-bounces at mtl.mit.edu > on behalf of Gheorghe Iordache > Sent: Monday, February 15, 2021 4:18 AM To: labnetwork at mtl.mit.edu > Subject: [labnetwork] lab benchmarking exercise CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Dear colleagues, I'm running a lab benchmarking exercise and I would like to kindly ask for your feedback to the extent you will be able to share the info. Please see the table below with the numbers for KAUST Nanofabrication Core Lab and if you will be able to help please fill in your lab numbers on the dedicated column and send it to me in confidence to gheorghe.iordache at kaust.edu.sa . IMPORTANT NOTE: Your input will be used by me only for the above mentioned exercise and it will not be disclosed to anyone else. Thank you in advance and all please Stay Safe! Question KAUST Your lab here Academic or Industry? University Government of private? private user shared lab with independent management or run by faculty? independent Core Lab in charge with equipment maintenance and training users; faculty would suggest new equipment to be purchased cleanroom area [sq. meter] 2000 cleanroom class (ISO) 5 no. of lab staff / PhD / Engineers / Technicians 19 / 10 / 6 / 3 no. of current users 178 no. of faculty 48 no. of equipment 140 cleanroom open to users 24/7 ? NO do you run a cost recovery business model? NO the 3 most used equipment / their usage % 24h / backup equipment available? Deposition e-beam Evaporator / 37% / YES PPMS_2B_tf / 22% / YES PPMS_2_tf / 21% / YES Cleanroom Specific safety training and emergency response YES Training tracking system YES / Badger Safety Training refresher for staff and users every 3 years Critical Equipment Training refresher if not used for 6 months Equipment reservation system ? YES / Badger Equipment/Asset maintenance system ? YES/FiiX lab ISO 14644 compliant or certified ? ISO 14644 compliant do you have a microfluidics lab? YES hosting SME research or production? NO equipment mainenance - mostly [in-house or service contracts] in-house Buddy system recommended or compulsory? recommended Lab Control System monitored 24/7 YES Emergency response communication Core Labs WhatsApp on business mobile phones. Connected to campus emergency response Emergency response team [lab internal or external] Campus Fire Department Toxic Gas Monitoring System YES All Alarm response to Fire Department YES Safety Walkthrough Biweekly Kind regards, ======================= Gheorghe IORDACHE, PhD Physics, MBA Director of the Nanofabrication Core Lab KAUST King Abdullah University of Science and Technology Al Khawarizmi Building 1 East, Level 3, Office 3415 Thuwal 23955-6900 Kingdom of Saudi Arabia Office: +966 (0)12 8080447 Mobile: +966 (0)540381154 Email: gheorghe.iordache at kaust.edu.sa Linkedin: https://www.linkedin.com/in/gheorghe-iordache-phd-physics-mba/ Follow the Core Labs: corelabs.kaust.edu.sa; https://twitter.com/kaust_corelabs; https://www.instagram.com/kaustcorelabs/; https://www.linkedin.com/showcase/12179999 Visit the Core Labs: https://corelabs.kaust.edu.sa/visitor-information ================ Please note that the weekend in Saudi Arabia is Friday and Saturday ======== What you do for yourself vanishes once you're gone. What you do for others stays for others as your legacy. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 124773 bytes Desc: image001.png URL: From adove at berkeley.edu Wed Feb 17 15:49:56 2021 From: adove at berkeley.edu (Allison Dove) Date: Wed, 17 Feb 2021 12:49:56 -0800 Subject: [labnetwork] On-line teaching reference for simple microfabrication In-Reply-To: References: Message-ID: We have a bunch of these materials in our Equipment manual . Look for any link with the word "class". There are slides as well as videos. Lithoclass: https://docs.google.com/document/d/180PVAoG4aHmo6MvY8xEEAdhE9btpokxOwNKk2_wmMso/edit#heading=h.2w3i6baqm8n8 Evapclass: https://docs.google.com/document/d/1OjWWVVjChGvfVVLsB9EmjXsRyu27mAst-DRUfGdiY-U/edit Etchclass: https://docs.google.com/document/d/1SPxL8MlCYzybYCHoS-A-eFuDolS3CyHToNwhNha1e40/edit -Allison On Wed, Feb 17, 2021 at 12:43 PM James C. Sturm wrote: > I?m looking for a simple straightforward on-line teaching reference for > simple microfabrication with clear schematic step by step figures. > > i. How you can use photolithography to pattern a > selective etch, or for liftoff, > > ii. Some figures and qualitative description of some > different thin film formation or deposition methods > > iii. A few simple integrated processes to make a device > of some sort. > > I?m sure they are out there. > > Thanks, Jim Sturm > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Allison Dove Process Engineer Marvell Nanofabrication Laboratory UC Berkeley adove at berkeley.edu Pronouns: she/her -------------- next part -------------- An HTML attachment was scrubbed... URL: From kevin.walsh at louisville.edu Wed Feb 17 16:43:48 2021 From: kevin.walsh at louisville.edu (Walsh,Kevin M.) Date: Wed, 17 Feb 2021 21:43:48 +0000 Subject: [labnetwork] On-line teaching reference for simple microfabrication In-Reply-To: References: Message-ID: If you locate them, could you share a list with the network. That would be very helpful! Thanks, Kevin From: labnetwork-bounces at mtl.mit.edu On Behalf Of James C. Sturm Sent: Wednesday, February 17, 2021 1:17 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] On-line teaching reference for simple microfabrication CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. I'm looking for a simple straightforward on-line teaching reference for simple microfabrication with clear schematic step by step figures. i. How you can use photolithography to pattern a selective etch, or for liftoff, ii. Some figures and qualitative description of some different thin film formation or deposition methods iii. A few simple integrated processes to make a device of some sort. I'm sure they are out there. Thanks, Jim Sturm -------------- next part -------------- An HTML attachment was scrubbed... URL: From pilarhf at umich.edu Wed Feb 17 17:19:26 2021 From: pilarhf at umich.edu (Pilar Herrera-Fierro) Date: Wed, 17 Feb 2021 17:19:26 -0500 Subject: [labnetwork] Challenging Oxide Etch Process In-Reply-To: References: Message-ID: Hello Ronald, This is Pilar, from LNF. First thank you for the help with the vapor HF. What we sometimes do is to deposit Ti on top of the Au, because some plasma tools do take Ti. Ti is easily wet etched from gold. Now, I am not sure if there will be surface tension issues with such a small cavity but good thing is silicon dioxide is hydrophilic... Hope it helps, Pilar On Wed, Feb 17, 2021 at 3:50 PM Reger, Ronald K wrote: > Dear Colleagues, > > > > One of our faculty members has a process he needs to run in which > nano-scale oxide definition is required to expose a gold contact pad. With > our shared-use RIEs we are very concerned about Au contamination in our > etch tools, particularly for our electron device researchers. We?re > seeking your input from your facilities whether you may have etch tools > that allow Au processing for these specialty kinds of processes, and if you > have a procedure for dealing with such contamination. A generic sketch > about what our faculty member needs is shown below. > > > > So, have you dealt with this contamination issue with your multi-use tools > before, and how do you deal with mitigating the contamination? Do any of > you have a tool that could be used by this research group? > > > > Thanks very much in advance. > > > > Ron Reger > > Birck Nanotechnology Center > > Purdue University > > > > > > *Generic process steps*: > > > > Fabrication need: metal connection to a sub-micron-size metal pad buried > under <=50nm ALD oxide (HfO2 or Al2O3). > > Conventional fabrication steps (see sketch attached): > (1) cover metal pad with etch-resistive metal, e.g. Au, > (2) ALD-grow oxide (20-50nm), > (3) define a sum-micron PMMA mask using e-beam lithography, > (4) dry etch oxide with Au serving as a stop-etch layer (ICP-assisted > etch using BCl3 or SF6 gases), > (5-6) subsequent standard e-beam lithography to connect the exposed Au > pad to the outside circuit. > > Problem: Au (or any other metal which forms non-volatile compounds in RIE > system) may be problematic for some electron device processes and is > restricted from being used in shared-use RIE oxide etchers. > > Current work-around: for large (>10 micron) pads steps (3-4) can be > performed by optical lithography + wet etch in HF. e-beam resists like PMMA > are attacked by HF and this work-around cannot be used if sub-micron > lithography is needed. > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Pilar Herrera-Fierro, Ph.D. LNF User Services Director Lurie Nanofabrication Facility University of Michigan RM 1239 EECS Building 1301 Beal Ave. Ann Arbor, MI 48109-2122 *Cell* 734 646 1399 (734) 646 1399 www.lnf.umich.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: process_steps.jpg Type: image/jpeg Size: 65828 bytes Desc: not available URL: From jane.fitzpatrick at anff.org.au Wed Feb 17 17:47:07 2021 From: jane.fitzpatrick at anff.org.au (Jane Fitzpatrick) Date: Wed, 17 Feb 2021 22:47:07 +0000 Subject: [labnetwork] On-line teaching reference for simple microfabrication In-Reply-To: References: Message-ID: Hi James, I am sure there are some already out there. This might not help you in the short term but at ANFF here in Australia have decided to build our own. We are in the building phase at the moment but we hope to have something usable in place by the middle of the year. I would be happy to ask this group to take a look at the resource and provide comment. We do intend to make it open access once we are happy with it. It will have Fabrication area modules to cover the general theory (deposition, etching, lithography etc) and these will then have technique specific courses related to them (Sputtering, EB evap, etc for deposition). Some of the fab area courses will also have example process flows for devices but these will be later in the development. Cheers Jane [https://lh3.googleusercontent.com/3gxBE6Mm8gBLDWNyGJ7NVh9wFwqwXAlRqL0nuGZAb3uJ6bbSQq5-vAhqwFckaTXUZRvUB1O7SSMYsX-mEs204URBx0yCSKWJdVQBFt7aWOtMyvFBWukZaptxWL9W8O-EZlyftimd] Jane Fitzpatrick, PhD Chief Operating Officer, ANFF Tel: +61 7 334 69360 Mob: +61 439 778 766 Web: www.anff.org.au Australian National Fabrication Facility CAI, Building 57 Research Road UQ, St Lucia, QLD 4072 This email (and any attachments) is intended for the addressee named and may contain privileged/confidential information. If you are not the intended recipient, please notify the sender and delete the message and attachments immediately and be advised that its use, disclosure or copying is unauthorised. The views expressed, unless you are otherwise advised, are those of the sender and not necessarily the views of the ANFF Ltd. From: labnetwork-bounces at mtl.mit.edu On Behalf Of James C. Sturm Sent: Thursday, 18 February 2021 4:17 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] On-line teaching reference for simple microfabrication I'm looking for a simple straightforward on-line teaching reference for simple microfabrication with clear schematic step by step figures. i. How you can use photolithography to pattern a selective etch, or for liftoff, ii. Some figures and qualitative description of some different thin film formation or deposition methods iii. A few simple integrated processes to make a device of some sort. I'm sure they are out there. Thanks, Jim Sturm -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 60462 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.jpg Type: image/jpeg Size: 4349 bytes Desc: image003.jpg URL: From orad at reshef.ca Wed Feb 17 17:51:45 2021 From: orad at reshef.ca (Orad Reshef) Date: Wed, 17 Feb 2021 17:51:45 -0500 Subject: [labnetwork] On-line teaching reference for simple microfabrication In-Reply-To: References: Message-ID: Hey Jim, I drafted a helpful intro chapter that I share with my students. Maybe this can be helpful to you: http://reshef.ca/wp-content/uploads/2019/04/2017-Reshef-Introduction-to-Nanofabrication.pdf Best, Orad On Wed, Feb 17, 2021 at 5:19 PM James C. Sturm wrote: > I?m looking for a simple straightforward on-line teaching reference for > simple microfabrication with clear schematic step by step figures. > > i. How you can use photolithography to pattern a > selective etch, or for liftoff, > > ii. Some figures and qualitative description of some > different thin film formation or deposition methods > > iii. A few simple integrated processes to make a device > of some sort. > > I?m sure they are out there. > > Thanks, Jim Sturm > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Orad Reshef, PhD D?partement de physique | Department of Physics Universit? d?Ottawa | University of Ottawa boydnlo.ca | reshef.ca -------------- next part -------------- An HTML attachment was scrubbed... URL: From chonglee at mit.edu Wed Feb 17 18:23:19 2021 From: chonglee at mit.edu (Chong Lee) Date: Wed, 17 Feb 2021 23:23:19 +0000 Subject: [labnetwork] Kanto Chemical BOSE IGZO etchant In-Reply-To: References: Message-ID: Thanks Rick for kind reply. I found Williams reference. Found KOH, 5:1 BHF, and CR-7 will not attack Mo, but no way to find out if they will etch IGZO. I am still curious if anyone has or used Kanto IGZO etchant. Even better if there is a compatibility chart. Chong From: Morrison, Richard H., Jr Sent: Wednesday, February 17, 2021 1:44 PM To: Chong Lee ; labnetwork at mtl.mit.edu Subject: RE: Kanto Chemical BOSE IGZO etchant Get the SDS of the etchant and see what the etch is made out of. Then there are on line chemical compatibility charts and see what etches the metals of interest. Good resource is the CRC Physics and Chemistry handbook and back in the late 1990 there was a paper published by Berkeley that listed etch rates for a tone of semiconductor material, I think the author was Kirt Williams? It was a 2 part article. Rick Richard H. Morrison Principal Member of the Technical Staff Draper 555 Technology Square Cambridge, MA 02139-3573 Work 617-258-3420 Cell 508-930-3461 www.draper.com From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Chong Lee Sent: Wednesday, February 17, 2021 11:54 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Kanto Chemical BOSE IGZO etchant I am new to this email list, let me know if this is appropriate to ask: Does anyone know if above etchant will attack common metals like Al and Mo? Where would I look for data or compatibility chart? Has anyone used it at MTL before? Chong ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From demis at ucsb.edu Wed Feb 17 19:47:38 2021 From: demis at ucsb.edu (Demis D. John) Date: Wed, 17 Feb 2021 16:47:38 -0800 Subject: [labnetwork] Challenging Oxide Etch Process In-Reply-To: References: Message-ID: We would generally permit this, although discourage it for volume or more frequent use. But one time would be acceptable. We would recommend using a system equipped with a laser etch monitor to minimize overetch into the Au. We could run this etch if you need it, using our Fluorine ICP . Since the Au will only be exposed for a short time, risk of sputtering in the tool is low. However, the Au will likely get sputtered onto the etched SiO2 sidewalls - which should be acceptable if the next step is further metallization through the via. Contact me privately if you want to discuss further. On Wed, Feb 17, 2021 at 12:49 PM Reger, Ronald K wrote: > Dear Colleagues, > > > > One of our faculty members has a process he needs to run in which > nano-scale oxide definition is required to expose a gold contact pad. With > our shared-use RIEs we are very concerned about Au contamination in our > etch tools, particularly for our electron device researchers. We?re > seeking your input from your facilities whether you may have etch tools > that allow Au processing for these specialty kinds of processes, and if you > have a procedure for dealing with such contamination. A generic sketch > about what our faculty member needs is shown below. > > > > So, have you dealt with this contamination issue with your multi-use tools > before, and how do you deal with mitigating the contamination? Do any of > you have a tool that could be used by this research group? > > > > Thanks very much in advance. > > > > Ron Reger > > Birck Nanotechnology Center > > Purdue University > > > > > > *Generic process steps*: > > > > Fabrication need: metal connection to a sub-micron-size metal pad buried > under <=50nm ALD oxide (HfO2 or Al2O3). > > Conventional fabrication steps (see sketch attached): > (1) cover metal pad with etch-resistive metal, e.g. Au, > (2) ALD-grow oxide (20-50nm), > (3) define a sum-micron PMMA mask using e-beam lithography, > (4) dry etch oxide with Au serving as a stop-etch layer (ICP-assisted > etch using BCl3 or SF6 gases), > (5-6) subsequent standard e-beam lithography to connect the exposed Au > pad to the outside circuit. > > Problem: Au (or any other metal which forms non-volatile compounds in RIE > system) may be problematic for some electron device processes and is > restricted from being used in shared-use RIE oxide etchers. > > Current work-around: for large (>10 micron) pads steps (3-4) can be > performed by optical lithography + wet etch in HF. e-beam resists like PMMA > are attacked by HF and this work-around cannot be used if sub-micron > lithography is needed. > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: process_steps.jpg Type: image/jpeg Size: 65828 bytes Desc: not available URL: From karlb at uw.edu Wed Feb 17 23:45:19 2021 From: karlb at uw.edu (Karl F. Bohringer) Date: Thu, 18 Feb 2021 04:45:19 +0000 Subject: [labnetwork] 2 open positions at the Washington Nanofabrication Facility Message-ID: Washington Nanofabrication Facility University of Washington, Seattle 1. Lithography Engineer The Washington Nanofabrication Facility (WNF), a member of the NSF National Nanotechnology Coordinated Infrastructure (NNCI) network, has an open position for a lithography engineer. The engineer will be responsible for research support, baseline process monitoring, equipment checks, and user training and assistance in support of WNF's electron beam lithography process line and photolithography lines. More information about this position can be found at https://www.wnf.washington.edu/wnf-seeks-a-lithography-engineer/. 2. Fabrication/Equipment Service Engineer The Washington Nanofabrication Facility (WNF), a member of the NSF National Nanotechnology Coordinated Infrastructure (NNCI) network, has an open position for a fabrication/equipment service engineer. The engineer will be responsible for equipment troubleshooting, facilities infrastructure monitoring and support, baseline process monitoring, tool ownership, and executing contract manufacturing efforts. More information about this position can be found at https://www.wnf.washington.edu/wnf-seeks-a-fabrication-service-equipment-engineer/. Applications should be uploaded via the UWHires job portal (accessible from the position descriptions above). General inquiries can be sent to wnfinfo at uw.edu. Karl F. B?hringer, Ph.D. Professor of Electrical & Computer Engineering and Bioengineering Director, Nano-engineered Systems Institute (NanoES) Site Director, National Nanotechnology Coordinated Infrastructure (NNCI) University of Washington Campus Box 352500 Seattle, WA 98195-2500, USA karlb at uw.edu nano.uw.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From info at fabsurplus.com Thu Feb 18 03:06:48 2021 From: info at fabsurplus.com (Stephen Howe) Date: Thu, 18 Feb 2021 09:06:48 +0100 Subject: [labnetwork] On-line teaching reference for simple microfabrication In-Reply-To: References: Message-ID: <26af027211222e63291ff6a027755ffe78771a13.camel@fabsurplus.com> MKS wrote "MKS Instruments Handbook Semiconductor Devices and Process Technology" which is a good overview of everything.I think you can download the PDF from their website still , or else you could send an email to the Office of the CTO. -- Yours Sincerely, SDI Fabsurplus LLC Stephen Howe Company Owner email: info at fabsurplus.com Mobile: +1 830-388-1071 Skype: stephencshowe WWW.FABSURPLUS.COM Linkedin: https://www.linkedin.com/company/sdi-fabsurplus Twitter: https://twitter.com/fabsurplus Instagram: www.instagram.com/fabsurplus Facebook:www.facebook.com/fabsurplus On Wed, 2021-02-17 at 17:51 -0500, Orad Reshef wrote: > Hey Jim, > > I drafted a helpful intro chapter that I share with my students. > Maybe this can be helpful to you: > http://reshef.ca/wp-content/uploads/2019/04/2017-Reshef-Introduction-to-Nanofabrication.pdf > Best, > Orad > > On Wed, Feb 17, 2021 at 5:19 PM James C. Sturm > wrote: > > > > > > > > > > > > > > I?m looking for a simple straightforward on-line teaching reference > > for simple microfabrication with clear schematic step by step > > figures. > > > > > > i. > > How you can use photolithography to pattern a selective etch, or > > for liftoff, > > > > ii. > > Some figures and qualitative description of some different thin > > film formation or deposition methods > > > > iii. > > A few simple integrated processes to make a device of some sort. > > I?m sure they are out there. > > Thanks, Jim Sturm > > > > > > > > > > _______________________________________________ > > > > labnetwork mailing list > > > > labnetwork at mtl.mit.edu > > > > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > > -- > Orad Reshef, PhD > > D?partement de physique | Department of Physics > Universit? d?Ottawa | University of Ottawa > boydnlo.ca | reshef.ca > > > _______________________________________________labnetwork mailing > listlabnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From michael.martin at louisville.edu Thu Feb 18 09:24:00 2021 From: michael.martin at louisville.edu (Martin,Michael David) Date: Thu, 18 Feb 2021 14:24:00 +0000 Subject: [labnetwork] On-line teaching reference for simple microfabrication In-Reply-To: References: , Message-ID: Hi, At U. of Louisville we've been experimenting with our YouTube production and run a channel called Practical Microfabrication. It really isn't centered on a formal class-like structure but is aimed at more of an edutainment approach. We started out with video SOP's and decided they were insanely boring. So recently we've been exploring project focused videos where we show the fabrication steps in some detail, along with showing the project traveler. Of course, the projects are chosen so that there are no IP issues which allows us to go into excruciating detail while addressing the practical aspects of running a project through the fab. The tone is kept light and informal like we were teaching a grad student one-on-one. https://www.youtube.com/channel/UCGiczmq6wVIBJlM7UEGVW9Q [https://yt3.ggpht.com/ytc/AAUvwnj2XTs3VRT5AxgovDj6yIYe7p3n9RGKC0HDwUY2=s900-c-k-c0x00ffffff-no-rj] Practical Microfabrication www.youtube.com Regards, Michael ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Allison Dove Sent: Wednesday, February 17, 2021 3:49 PM To: James C. Sturm Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] On-line teaching reference for simple microfabrication CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. We have a bunch of these materials in our Equipment manual. Look for any link with the word "class". There are slides as well as videos. Lithoclass: https://docs.google.com/document/d/180PVAoG4aHmo6MvY8xEEAdhE9btpokxOwNKk2_wmMso/edit#heading=h.2w3i6baqm8n8 Evapclass: https://docs.google.com/document/d/1OjWWVVjChGvfVVLsB9EmjXsRyu27mAst-DRUfGdiY-U/edit Etchclass: https://docs.google.com/document/d/1SPxL8MlCYzybYCHoS-A-eFuDolS3CyHToNwhNha1e40/edit -Allison On Wed, Feb 17, 2021 at 12:43 PM James C. Sturm > wrote: I?m looking for a simple straightforward on-line teaching reference for simple microfabrication with clear schematic step by step figures. i. How you can use photolithography to pattern a selective etch, or for liftoff, ii. Some figures and qualitative description of some different thin film formation or deposition methods iii. A few simple integrated processes to make a device of some sort. I?m sure they are out there. Thanks, Jim Sturm _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Allison Dove Process Engineer Marvell Nanofabrication Laboratory UC Berkeley adove at berkeley.edu Pronouns: she/her -------------- next part -------------- An HTML attachment was scrubbed... URL: From vamsinittala at gmail.com Thu Feb 18 11:50:40 2021 From: vamsinittala at gmail.com (N P Vamsi Krishna) Date: Thu, 18 Feb 2021 10:50:40 -0600 Subject: [labnetwork] Challenging Oxide Etch Process In-Reply-To: References: Message-ID: Hi Ron, I would try reducing the etch powers/parameters and develop a very low power recipe. Leave a few nanometers of oxide in the dry etch (making sure gold is not exposed) and the final mile oxide etch can be in the BOE. or Cr/Au/Cr instead of Cr/Au and then wet etch chrome. Thanks & br, vamsi On Thu, Feb 18, 2021 at 8:35 AM Demis D. John wrote: > We would generally permit this, although discourage it for volume or more > frequent use. But one time would be acceptable. We would recommend using > a system equipped with a laser etch monitor > to minimize > overetch into the Au. > We could run this etch if you need it, using our Fluorine ICP > . > Since the Au will only be exposed for a short time, risk of sputtering in > the tool is low. However, the Au will likely get sputtered onto the etched > SiO2 sidewalls - which should be acceptable if the next step is further > metallization through the via. > > Contact me privately if you want to discuss further. > > On Wed, Feb 17, 2021 at 12:49 PM Reger, Ronald K > wrote: > >> Dear Colleagues, >> >> >> >> One of our faculty members has a process he needs to run in which >> nano-scale oxide definition is required to expose a gold contact pad. With >> our shared-use RIEs we are very concerned about Au contamination in our >> etch tools, particularly for our electron device researchers. We?re >> seeking your input from your facilities whether you may have etch tools >> that allow Au processing for these specialty kinds of processes, and if you >> have a procedure for dealing with such contamination. A generic sketch >> about what our faculty member needs is shown below. >> >> >> >> So, have you dealt with this contamination issue with your multi-use >> tools before, and how do you deal with mitigating the contamination? Do >> any of you have a tool that could be used by this research group? >> >> >> >> Thanks very much in advance. >> >> >> >> Ron Reger >> >> Birck Nanotechnology Center >> >> Purdue University >> >> >> >> >> >> *Generic process steps*: >> >> >> >> Fabrication need: metal connection to a sub-micron-size metal pad buried >> under <=50nm ALD oxide (HfO2 or Al2O3). >> >> Conventional fabrication steps (see sketch attached): >> (1) cover metal pad with etch-resistive metal, e.g. Au, >> (2) ALD-grow oxide (20-50nm), >> (3) define a sum-micron PMMA mask using e-beam lithography, >> (4) dry etch oxide with Au serving as a stop-etch layer (ICP-assisted >> etch using BCl3 or SF6 gases), >> (5-6) subsequent standard e-beam lithography to connect the exposed Au >> pad to the outside circuit. >> >> Problem: Au (or any other metal which forms non-volatile compounds in RIE >> system) may be problematic for some electron device processes and is >> restricted from being used in shared-use RIE oxide etchers. >> >> Current work-around: for large (>10 micron) pads steps (3-4) can be >> performed by optical lithography + wet etch in HF. e-beam resists like PMMA >> are attacked by HF and this work-around cannot be used if sub-micron >> lithography is needed. >> >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork >> > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- ___________________________________________________ N.P. Vamsi Krishna, PhD *Staff Scientist* Pritzker School of Molecular Engineering, *The University of Chicago * *Resident **Associate* Center for Nanoscale Materials, *Argonne National Laboratory * Phone: 1 (331) 757-8565 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: process_steps.jpg Type: image/jpeg Size: 65828 bytes Desc: not available URL: From bdemory2 at gmail.com Thu Feb 18 13:58:02 2021 From: bdemory2 at gmail.com (Brandon Demory) Date: Thu, 18 Feb 2021 10:58:02 -0800 Subject: [labnetwork] Amorphous silicon carbide deposition Message-ID: Hi all, My name is Brandon and I am a researcher for Lawrence Livermore National Labs. I am looking for a facility with amorphous silicon carbide deposition capability on 4" Silicon substrates; ideally with recipes that have determined the methane to silane ratios and the hydrogenation of the SiC film. I would prefer something local to northern California area so that I may attend, but I am not limited as shipping is a possibility. Please reach out to me if you have this capability. We are always interested in new collaborations. Thank you, Brandon Demory LLNL -------------- next part -------------- An HTML attachment was scrubbed... URL: From wjkiethe at ncsu.edu Fri Feb 19 09:30:09 2021 From: wjkiethe at ncsu.edu (Bill Kiether) Date: Fri, 19 Feb 2021 09:30:09 -0500 Subject: [labnetwork] Low-Stress silicon nitride via LPCVD capability Message-ID: Hello all, We have a customer that needs some specific capabilities for low stress Silicon Nitride that we can't provide right now. Does anyone have a well established process that can reach these values. The specs are: 4" wafers Target thicknesses are 500A and 1500A, with stress 200MPa +/- 50 and refractive index 2.15 +/- 0.05 Please send me your contact info and I will pass it along. -------------- next part -------------- An HTML attachment was scrubbed... URL: From price.798 at osu.edu Fri Feb 19 13:54:47 2021 From: price.798 at osu.edu (Price, Aimee) Date: Fri, 19 Feb 2021 18:54:47 +0000 Subject: [labnetwork] Low-Stress silicon nitride via LPCVD capability In-Reply-To: References: Message-ID: Hi Bill, We have an LPCVD nitride process (Ohio State) that meets those specs. That process hasn?t been run in a while, generally we run our stoichiometric nitride more often than the low stress. However the furnace is capable of it. There may be a bit of process testing/verification needed ahead of any real product run. I?m happy to speak to your customer as appropriate. Best, Aimee Bross Price Sr. Research Associate The Ohio State University Nanotech West Lab Institute for Materials Research 1381 Kinnear Road Suite 100 Columbus, OH 43212 614-292-2753 From: labnetwork-bounces at mtl.mit.edu On Behalf Of Bill Kiether Sent: Friday, February 19, 2021 9:30 AM To: labnetwork at mtl.mit.edu Cc: Philip Barletta Subject: [labnetwork] Low-Stress silicon nitride via LPCVD capability Hello all, We have a customer that needs some specific capabilities for low stress Silicon Nitride that we can't provide right now. Does anyone have a well established process that can reach these values. The specs are: 4" wafers Target thicknesses are 500A and 1500A, with stress 200MPa +/- 50 and refractive index 2.15 +/- 0.05 Please send me your contact info and I will pass it along. -------------- next part -------------- An HTML attachment was scrubbed... URL: From phimmer at stanford.edu Fri Feb 19 13:55:01 2021 From: phimmer at stanford.edu (Phillip Himmer) Date: Fri, 19 Feb 2021 18:55:01 +0000 Subject: [labnetwork] On-line teaching reference for simple microfabrication In-Reply-To: References: Message-ID: Hi James Stanford has been developing a nanofabrication training course called nano at stanford hosted on edX https://www.edx.org/course/nano-stanford If you find this of interest we would enjoy hearing back from you Angela Hwang is the academic program manager for Sanford, you can contact her or myself with any questions regards Phillip From: labnetwork-bounces at mtl.mit.edu On Behalf Of James C. Sturm Sent: Wednesday, February 17, 2021 10:17 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] On-line teaching reference for simple microfabrication I'm looking for a simple straightforward on-line teaching reference for simple microfabrication with clear schematic step by step figures. i. How you can use photolithography to pattern a selective etch, or for liftoff, ii. Some figures and qualitative description of some different thin film formation or deposition methods iii. A few simple integrated processes to make a device of some sort. I'm sure they are out there. Thanks, Jim Sturm -------------- next part -------------- An HTML attachment was scrubbed... URL: From michael.martin at louisville.edu Mon Feb 22 12:39:08 2021 From: michael.martin at louisville.edu (Martin,Michael David) Date: Mon, 22 Feb 2021 17:39:08 +0000 Subject: [labnetwork] Low-Stress silicon nitride via LPCVD capability In-Reply-To: References: Message-ID: Hi Bill, We have a characterized PECVD SiNx recipe that can get close to those stress specifications but we would have to verify the index of refraction. Specifications/data are here: https://louisville.edu/micronano/files/documents/characterization-data/PECVDSiliconNitrideStressControlandRateData.pdf Stress Measurements and Rates in the Oxford PECVD Stress Measurements and Rates in the Oxford PECVD Daniel Porter and Michael Martin Feb. 13, 2012 louisville.edu Regards, Michael ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Bill Kiether Sent: Friday, February 19, 2021 9:30 AM To: labnetwork at mtl.mit.edu Cc: Philip Barletta Subject: [labnetwork] Low-Stress silicon nitride via LPCVD capability CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Hello all, We have a customer that needs some specific capabilities for low stress Silicon Nitride that we can't provide right now. Does anyone have a well established process that can reach these values. The specs are: 4" wafers Target thicknesses are 500A and 1500A, with stress 200MPa +/- 50 and refractive index 2.15 +/- 0.05 Please send me your contact info and I will pass it along. -------------- next part -------------- An HTML attachment was scrubbed... URL: From xklu at eng.ucsd.edu Mon Feb 22 15:55:59 2021 From: xklu at eng.ucsd.edu (Xuekun Lu) Date: Mon, 22 Feb 2021 12:55:59 -0800 Subject: [labnetwork] Low-Stress silicon nitride via LPCVD capability In-Reply-To: References: Message-ID: Hi Bill, Is PECVD acceptable? We can do this with our Plasma-Therm SLR PECVD ( https://nano3.calit2.net/equipment/machine.php?eid=93). Best, Xuekun On Fri, Feb 19, 2021 at 8:37 AM Bill Kiether wrote: > Hello all, > > We have a customer that needs some specific capabilities for low stress > Silicon Nitride that we can't provide right now. Does anyone have a well > established process that can reach these values. The specs are: > > 4" wafers > Target thicknesses are 500A and 1500A, > with stress 200MPa +/- 50 and refractive index 2.15 +/- 0.05 > > Please send me your contact info and I will pass it along. > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!Mih3wA!SmQcMNwzGr1aXxYgRAN3GfJfvJD5cfYanR7JuqfWRJIxKbsX0fUqwUqmHwYy-w$ > -------------- next part -------------- An HTML attachment was scrubbed... URL: From beaudoin at physics.ubc.ca Mon Feb 22 18:46:19 2021 From: beaudoin at physics.ubc.ca (Beaudoin, Mario) Date: Mon, 22 Feb 2021 15:46:19 -0800 Subject: [labnetwork] Recommendation for small footprint LPCVD system? Message-ID: <99511f98-7759-7382-2ad1-4266ef9696af@physics.ubc.ca> Dear Labnetwork experts, We're looking to purchase an LPCVD system to deposit SiN and SiO2 for silicon photonics.? We have low volumes but occasionally need to deposit on 200mm wafers.? Ideally, we would prefer a vertical system that only needs to accommodate one 200 mm wafer on occasion while most of the work will be on multiple smaller samples (eg 25x25mm). Any suggestions or recommendations are welcomed. Mario -- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig 2.jpg Type: image/jpeg Size: 21446 bytes Desc: not available URL: From kent at desertsilicon.com Mon Feb 22 20:40:13 2021 From: kent at desertsilicon.com (Kent Ridgeway) Date: Mon, 22 Feb 2021 18:40:13 -0700 Subject: [labnetwork] Nitride deposition Message-ID: <8e4f7456-2a06-d4a7-70e3-e3e174b48e81@desertsilicon.com> We can help with your nitride requirement. Please let us know what is on the wafers and what are the quantities. -- Sincerely, Kent Ridgeway CEO-Desert Silicon, Inc. cell 602-618-8452 kent at desertsilicon.com http://www.desertsilicon.com/ 941 S. Park Lane Tempe, AZ 85281 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: kent.vcf Type: text/x-vcard Size: 4 bytes Desc: not available URL: From philippe.fluckiger at epfl.ch Tue Feb 23 02:50:37 2021 From: philippe.fluckiger at epfl.ch (=?iso-8859-1?Q?Fl=FCckiger_Philippe?=) Date: Tue, 23 Feb 2021 07:50:37 +0000 Subject: [labnetwork] On-line teaching reference for simple microfabrication In-Reply-To: References: Message-ID: <252ac460295d447082a6665549ce6709@epfl.ch> Hello James, You might want to have a look to the EPFL online course Micro and Nanofabrication (MEMS): - https://www.edx.org/course/micro-and-nanofabrication-mems With my very best regards, Philippe Dr Philippe Fl?ckiger Director of Operations http://cmi.epfl.ch/ Phone +41 21 693 6695 From: labnetwork-bounces at mtl.mit.edu On Behalf Of Phillip Himmer Sent: vendredi, 19 f?vrier 2021 19:55 To: James C. Sturm Cc: labnetwork at mtl.mit.edu; Angela Hwang Subject: Re: [labnetwork] On-line teaching reference for simple microfabrication Hi James Stanford has been developing a nanofabrication training course called nano at stanford hosted on edX https://www.edx.org/course/nano-stanford If you find this of interest we would enjoy hearing back from you Angela Hwang is the academic program manager for Sanford, you can contact her or myself with any questions regards Phillip From: labnetwork-bounces at mtl.mit.edu > On Behalf Of James C. Sturm Sent: Wednesday, February 17, 2021 10:17 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] On-line teaching reference for simple microfabrication I'm looking for a simple straightforward on-line teaching reference for simple microfabrication with clear schematic step by step figures. i. How you can use photolithography to pattern a selective etch, or for liftoff, ii. Some figures and qualitative description of some different thin film formation or deposition methods iii. A few simple integrated processes to make a device of some sort. I'm sure they are out there. Thanks, Jim Sturm -------------- next part -------------- An HTML attachment was scrubbed... URL: From Etienne.Grondin at USherbrooke.ca Tue Feb 23 03:43:43 2021 From: Etienne.Grondin at USherbrooke.ca (=?utf-8?B?w4l0aWVubmUgR3JvbmRpbg==?=) Date: Tue, 23 Feb 2021 08:43:43 +0000 Subject: [labnetwork] Recommendation for small footprint LPCVD system? In-Reply-To: <99511f98-7759-7382-2ad1-4266ef9696af@physics.ubc.ca> References: <99511f98-7759-7382-2ad1-4266ef9696af@physics.ubc.ca> Message-ID: Hello Mario, Same issue here in Sherbrooke. We plan to purchase a replacement for our furnace in the coming years so I?ve started my search and had some fruitful discussions with these guys : exper-tech.com, Barrie VanDevender >. You could consider the compact models. I?m curious of what these small footprint systems can achieve. Best regards, ?tienne Grondin Coordonnateur de laboratoire 3IT Universit? de Sherbrooke e.grondin at usherbrooke.ca (819) 821-8000 poste 61941 [cid:image003.jpg at 01D70995.D3C7E930] De : labnetwork-bounces at mtl.mit.edu De la part de Beaudoin, Mario Envoy? : 22 f?vrier 2021 18:46 ? : labnetwork at mtl.mit.edu Cc : Gou, Steven Objet : [labnetwork] Recommendation for small footprint LPCVD system? Dear Labnetwork experts, We're looking to purchase an LPCVD system to deposit SiN and SiO2 for silicon photonics. We have low volumes but occasionally need to deposit on 200mm wafers. Ideally, we would prefer a vertical system that only needs to accommodate one 200 mm wafer on occasion while most of the work will be on multiple smaller samples (eg 25x25mm). Any suggestions or recommendations are welcomed. Mario -- [cid:image001.jpg at 01D70995.541C5900] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 21446 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.jpg Type: image/jpeg Size: 5117 bytes Desc: image003.jpg URL: From jsmith at tystar.com Tue Feb 23 12:13:57 2021 From: jsmith at tystar.com (jsmith at tystar.com) Date: Tue, 23 Feb 2021 09:13:57 -0800 Subject: [labnetwork] Recommendation for small footprint LPCVD system? In-Reply-To: <99511f98-7759-7382-2ad1-4266ef9696af@physics.ubc.ca> References: <99511f98-7759-7382-2ad1-4266ef9696af@physics.ubc.ca> Message-ID: <003501d70a07$45bad540$d1307fc0$@tystar.com> Hi Mario, Please have a look at www.tystar.com . We have a few different methods of depositing SiO2 and Si3N4 on 200mm wafers, LPCVD and Photo Enhanced CVD. If you have any questions please let me know. Thanks Best Regards, Jim Smith Business Development Mgr. Tystar Corporation 7050 Lampson Ave. Garden Grove, Calif. 92841 * Office: 310-781-9219 ext 216 * Cell: 310-618-4018 * Fax: 310-781-9438 * jsmith at tystar.com http://www.tystar.com This Document is confidential and it is intended only for the addressee(s). Any review, dissemination, distribution, or copying of this message by persons or entities other than the intended recipient is strictly prohibited. From: labnetwork-bounces at mtl.mit.edu On Behalf Of Beaudoin, Mario Sent: Monday, February 22, 2021 3:46 PM To: labnetwork at mtl.mit.edu Cc: Gou, Steven Subject: [labnetwork] Recommendation for small footprint LPCVD system? Dear Labnetwork experts, We're looking to purchase an LPCVD system to deposit SiN and SiO2 for silicon photonics. We have low volumes but occasionally need to deposit on 200mm wafers. Ideally, we would prefer a vertical system that only needs to accommodate one 200 mm wafer on occasion while most of the work will be on multiple smaller samples (eg 25x25mm). Any suggestions or recommendations are welcomed. Mario -- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 21446 bytes Desc: not available URL: From na2661 at columbia.edu Wed Feb 24 08:20:39 2021 From: na2661 at columbia.edu (Nava Ariel-Sternberg) Date: Wed, 24 Feb 2021 08:20:39 -0500 Subject: [labnetwork] clean room garments laundry vendors Message-ID: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> Hi all, I know this topic was discussed in the past but I feel like the options in this area are very limited and the vendors are taking advantage of that. What is your solution for clean room garments laundry? Are you renting and sending them out to laundry? If so, could you please let me know which vendor you're using? You can respond directly to me if you don't feel comfortable sharing your feedback with everyone. Thanks, Nava Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Labs Columbia University CEPSR/MC 8903 530 west 120th st. NY NY 10027 Office: 212-8549927 Cell: 201-5627600 -------------- next part -------------- An HTML attachment was scrubbed... URL: From schweig at umich.edu Wed Feb 24 12:30:19 2021 From: schweig at umich.edu (Dennis Schweiger) Date: Wed, 24 Feb 2021 12:30:19 -0500 Subject: [labnetwork] clean room garments laundry vendors In-Reply-To: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> References: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> Message-ID: Nava, good afternoon. Here at the University of Michigan/LNF we're using Cintas, renting their garments, and then they pick up a "set" of them up once a week to launder them. We have a little over "four sets" in our rotation. It takes about three weeks to rotate the dirty garments through the laundry till we get them back at our site, clean, individually packaged, and sorted. Dennis Schweiger University of Michigan/LNF 734.647.2055 Ofc On Wed, Feb 24, 2021 at 12:09 PM Nava Ariel-Sternberg wrote: > Hi all, > > I know this topic was discussed in the past but I feel like the options in > this area are very limited and the vendors are taking advantage of that. > > What is your solution for clean room garments laundry? Are you renting and > sending them out to laundry? If so, could you please let me know which > vendor you?re using? > > You can respond directly to me if you don?t feel comfortable sharing your > feedback with everyone. > > Thanks, > > Nava > > > > > > Nava Ariel-Sternberg, Ph.D. > > Director of CNI Shared Labs > > Columbia University > > CEPSR/MC 8903 > > 530 west 120th st. NY > > NY 10027 > > Office: 212-8549927 > > Cell: 201-5627600 > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From beaudoin at physics.ubc.ca Wed Feb 24 12:46:36 2021 From: beaudoin at physics.ubc.ca (Beaudoin, Mario) Date: Wed, 24 Feb 2021 09:46:36 -0800 Subject: [labnetwork] clean room garments laundry vendors In-Reply-To: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> References: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> Message-ID: We purchase a washer/dryer (dryer in same machine) that is dedicated to cleanroom garments only to prevent lint.? We could not afford both the cleaning and transport costs associated with using a specialized cleaning service. On 2021-02-24 5:20 a.m., Nava Ariel-Sternberg wrote: > [*CAUTION:* Non-UBC Email] > > Hi all, > > I know this topic was discussed in the past but I feel like the > options in this area are very limited and the vendors are taking > advantage of that. > > What is your solution for clean room garments laundry? Are you renting > and sending them out to laundry? If so, could you please let me know > which vendor you?re using? > > You can respond directly to me if you don?t feel comfortable sharing > your feedback with everyone. > > Thanks, > > Nava > > Nava Ariel-Sternberg, Ph.D. > > Director of CNI Shared Labs > > Columbia University > > CEPSR/MC 8903 > > 530 west 120^th st. NY > > NY 10027 > > Office: 212-8549927 > > Cell: 201-5627600 > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig 2.jpg Type: image/jpeg Size: 21446 bytes Desc: not available URL: From julia.aebersold at louisville.edu Wed Feb 24 13:16:03 2021 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Wed, 24 Feb 2021 18:16:03 +0000 Subject: [labnetwork] clean room garments laundry vendors In-Reply-To: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> References: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> Message-ID: We wash our own in our washing machine with DI. Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville 2210 South Brook Street Shumaker Research Building, Room 233 Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Nava Ariel-Sternberg Sent: Wednesday, February 24, 2021 8:20 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] clean room garments laundry vendors CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Hi all, I know this topic was discussed in the past but I feel like the options in this area are very limited and the vendors are taking advantage of that. What is your solution for clean room garments laundry? Are you renting and sending them out to laundry? If so, could you please let me know which vendor you?re using? You can respond directly to me if you don?t feel comfortable sharing your feedback with everyone. Thanks, Nava Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Labs Columbia University CEPSR/MC 8903 530 west 120th st. NY NY 10027 Office: 212-8549927 Cell: 201-5627600 -------------- next part -------------- An HTML attachment was scrubbed... URL: From sieb at 4dlabs.ca Wed Feb 24 14:29:41 2021 From: sieb at 4dlabs.ca (Nathanael Sieb) Date: Wed, 24 Feb 2021 11:29:41 -0800 Subject: [labnetwork] clean room garments laundry vendors In-Reply-To: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> References: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> Message-ID: Hi Nava, We send ours out to TSB Micron in Quebec (http://www.tsbmicron.com/).? It is a bit of a pain to deal with shipping, but we didn't find anything in our local area that we were confident were using Clean Room compatible processes. Thanks, Nathanael On 2021-02-24 5:20 a.m., Nava Ariel-Sternberg wrote: > > Hi all, > > I know this topic was discussed in the past but I feel like the > options in this area are very limited and the vendors are taking > advantage of that. > > What is your solution for clean room garments laundry? Are you renting > and sending them out to laundry? If so, could you please let me know > which vendor you?re using? > > You can respond directly to me if you don?t feel comfortable sharing > your feedback with everyone. > > Thanks, > > Nava > > Nava Ariel-Sternberg, Ph.D. > > Director of CNI Shared Labs > > Columbia University > > CEPSR/MC 8903 > > 530 west 120^th st. NY > > NY 10027 > > Office: 212-8549927 > > Cell: 201-5627600 > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork *Nathanael Sieb * Director of Operations and Administration ?| 4D LABS Simon Fraser University 8888 University Dr., Burnaby, B.C. V5A 1S6 T: 778.782.8084?| F: 778.782.3765 | www.4dlabs.ca Facebook ?| Twitter ?| LinkedIn -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Wed Feb 24 15:01:54 2021 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Wed, 24 Feb 2021 20:01:54 +0000 Subject: [labnetwork] clean room garments laundry vendors In-Reply-To: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> References: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> Message-ID: <4d73e44b0b3b422dbdf89afb9baf504a@draper.com> Hi Everyone, Here at Draper we use Cintas for the cleanroom garments we have 2 labs that have full face hoods with coveralls and boots, then 5-6 labs with just frocks. If they offer insurance you should by that we the garments. We started out with no insurance and then were spending money replacing the garments every week for rips and stains, then we got insurance and the replacement rate magically dropped. You can email me directly if you want more candid comments Richard H. Morrison Principal Member of the Technical Staff Draper 555 Technology Square Cambridge, MA 02139-3573 Work 617-258-3420 Cell 508-930-3461 www.draper.com . Rick From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Nava Ariel-Sternberg Sent: Wednesday, February 24, 2021 8:21 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] clean room garments laundry vendors Hi all, I know this topic was discussed in the past but I feel like the options in this area are very limited and the vendors are taking advantage of that. What is your solution for clean room garments laundry? Are you renting and sending them out to laundry? If so, could you please let me know which vendor you're using? You can respond directly to me if you don't feel comfortable sharing your feedback with everyone. Thanks, Nava Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Labs Columbia University CEPSR/MC 8903 530 west 120th st. NY NY 10027 Office: 212-8549927 Cell: 201-5627600 ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From mweiler at andrew.cmu.edu Wed Feb 24 12:13:24 2021 From: mweiler at andrew.cmu.edu (Mark Weiler) Date: Wed, 24 Feb 2021 17:13:24 +0000 Subject: [labnetwork] clean room garments laundry vendors In-Reply-To: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> References: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> Message-ID: <565DC907-ADC9-4A1D-A10B-B76FB40C14BA@andrew.cmu.edu> Hi Nava, It?s a crooked industry in general... but if you can remember three words, you can save yourself a lot of pain later. Don?t-Use-Aramark... Two pennies... Best Regards, Mark ________________________________________________________________ Mark Weiler Manager, Equipment & Facilites Claire and John Bertucci Nanotechnology Laboratory Eden Hall Nanofabrication Cleanroom Carnegie Mellon University P: 412-268-2471 F: 412-268-3497 http://www.nanofab.ece.cmu.edu "Be kind; everyone is on their own journey." Daniel Ek Sent from my iPhone On Feb 24, 2021, at 12:07 PM, Nava Ariel-Sternberg wrote: ? Hi all, I know this topic was discussed in the past but I feel like the options in this area are very limited and the vendors are taking advantage of that. What is your solution for clean room garments laundry? Are you renting and sending them out to laundry? If so, could you please let me know which vendor you?re using? You can respond directly to me if you don?t feel comfortable sharing your feedback with everyone. Thanks, Nava Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Labs Columbia University CEPSR/MC 8903 530 west 120th st. NY NY 10027 Office: 212-8549927 Cell: 201-5627600 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From Aju.Jugessur at Colorado.EDU Wed Feb 24 15:47:33 2021 From: Aju.Jugessur at Colorado.EDU (Aju Jugessur) Date: Wed, 24 Feb 2021 20:47:33 +0000 Subject: [labnetwork] clean room garments laundry vendors In-Reply-To: References: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> Message-ID: Julia, I am intrigued by this. We did consider washing our own garments but the costs outweigh the benefits and savings, especially if you have a large number of garments to wash regularly. In addition, the quality control involved in onsite washed garments, in terms of particulates etc is quite time consuming. I do not want to detract from the main question, but I am curious if you are using any specialized equipment for washing. Thanks Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Member of Engineering Staff Council (ESC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEL | Boulder, CO 80303| P: 303.735.5019| F: 303.492.2199 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur www.colorado.edu/facility/cosinc [signature_1465302918] Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) From: on behalf of "Aebersold,Julia W." Date: Wednesday, February 24, 2021 at 1:42 PM To: Nava Ariel-Sternberg , "labnetwork at mtl.mit.edu" Subject: Re: [labnetwork] clean room garments laundry vendors We wash our own in our washing machine with DI. Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville 2210 South Brook Street Shumaker Research Building, Room 233 Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Nava Ariel-Sternberg Sent: Wednesday, February 24, 2021 8:20 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] clean room garments laundry vendors CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Hi all, I know this topic was discussed in the past but I feel like the options in this area are very limited and the vendors are taking advantage of that. What is your solution for clean room garments laundry? Are you renting and sending them out to laundry? If so, could you please let me know which vendor you?re using? You can respond directly to me if you don?t feel comfortable sharing your feedback with everyone. Thanks, Nava Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Labs Columbia University CEPSR/MC 8903 530 west 120th st. NY NY 10027 Office: 212-8549927 Cell: 201-5627600 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6294 bytes Desc: image001.png URL: From na2661 at columbia.edu Wed Feb 24 15:49:04 2021 From: na2661 at columbia.edu (Nava Ariel-Sternberg) Date: Wed, 24 Feb 2021 15:49:04 -0500 Subject: [labnetwork] clean room garments laundry vendors In-Reply-To: References: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> Message-ID: <038901d70aee$7cf93500$76eb9f00$@columbia.edu> This is not detracting. We are considering all options. I?ve been responding directly to all who responded but this discussion (and the responses I got) including this question is very helpful! Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Labs Columbia University CEPSR/MC 8903 530 west 120th st. NY NY 10027 Office: 212-8549927 Cell: 201-5627600 From: Aju Jugessur Sent: Wednesday, February 24, 2021 3:48 PM To: Aebersold,Julia W. ; Nava Ariel-Sternberg ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] clean room garments laundry vendors Julia, I am intrigued by this. We did consider washing our own garments but the costs outweigh the benefits and savings, especially if you have a large number of garments to wash regularly. In addition, the quality control involved in onsite washed garments, in terms of particulates etc is quite time consuming. I do not want to detract from the main question, but I am curious if you are using any specialized equipment for washing. Thanks Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Member of Engineering Staff Council (ESC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEL | Boulder, CO 80303| P: 303.735.5019| F: 303.492.2199 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ ajugessur www.colorado.edu/facility/cosinc Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) From: > on behalf of "Aebersold,Julia W." > Date: Wednesday, February 24, 2021 at 1:42 PM To: Nava Ariel-Sternberg >, "labnetwork at mtl.mit.edu " > Subject: Re: [labnetwork] clean room garments laundry vendors We wash our own in our washing machine with DI. Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville 2210 South Brook Street Shumaker Research Building, Room 233 Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ _____ From: labnetwork-bounces at mtl.mit.edu > on behalf of Nava Ariel-Sternberg > Sent: Wednesday, February 24, 2021 8:20 AM To: labnetwork at mtl.mit.edu > Subject: [labnetwork] clean room garments laundry vendors CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Hi all, I know this topic was discussed in the past but I feel like the options in this area are very limited and the vendors are taking advantage of that. What is your solution for clean room garments laundry? Are you renting and sending them out to laundry? If so, could you please let me know which vendor you?re using? You can respond directly to me if you don?t feel comfortable sharing your feedback with everyone. Thanks, Nava Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Labs Columbia University CEPSR/MC 8903 530 west 120th st. NY NY 10027 Office: 212-8549927 Cell: 201-5627600 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6294 bytes Desc: not available URL: From carl.chow at hpe.com Thu Feb 25 01:12:48 2021 From: carl.chow at hpe.com (Chow, Carl) Date: Thu, 25 Feb 2021 06:12:48 +0000 Subject: [labnetwork] clean room garments laundry vendors In-Reply-To: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> References: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> Message-ID: Nava: We used Aramark in the past, but now use Prudential. I was told Cintas didn't offer cleanroom services in the Bay Area. The business model of these large providers is based on a long term relationship. They ask for 7-8 year contracts and structure pricing to recover their costs based on this length of contract. We negotiated down to 5 years. Start-up costs are in picking the type garments (hoods, gowns, frocks, boots, shoe covers), sizes, (S, M, L, XL, XXL, etc.) and number of garments (1/3 in house, 1/3 in transit*, 1/3 being cleaned). Also, each garment is bar coded, so this is how they keep track of them. We keep our inventory with FIFO (first in first out) because if they don't see a garment for 6 months, they think it is lost and may charge you. Or, you will need to send unused garments back just so they can be scanned. Some vendors have minimum dollar amounts. Check their terms, like net 30 to see if that is compatible with your company/school's Accounts Payable policy. We did not opt for the insurance option, which would have added 10%. We have had DBR (damaged beyond repair) garments that they charge us for and return, and we keep them on hand for dirty jobs (bar code is marked out with a black sharpie). Lastly, check the fine print for charges involved with breaking/terminating the contract (fees, notice length, registered letter, etc.). * this was true when garment cleaning facility was 500 miles away. Now, provider is about 2 miles away, so split is more like 80% in house, 20% in transit/being cleaned. You end up with lots and lots of plastic, which unfortunately, they don't take back or recycle. We have found other uses for the larger plastic bags. Delivery is another logistical challenge. Our driver comes sometime on Friday afternoons. He rings our doorbell, which rings my cell phone. If I'm on site, no issue, but if I'm not, I try to get Security to meet the driver and have the used garment bag ready to go. I thought of having a secure bin outside the building, but that wouldn't be good for dust. Our lobby doors are locked and with covid, we can't issue a badge. And, they send different drivers, who can't share a badge. In our case, we saved a lot by going with a local supplier, we don't worry about running out of garments, they are professionally cleaned, and we have an account manager with quarterly reviews. I toured their cleaning plant before deciding to switch. With our somewhat fixed weekly price, we clear the gown room racks every week. Carl Chow Hewlett Packard Labs From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Nava Ariel-Sternberg Sent: Wednesday, February 24, 2021 5:21 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] clean room garments laundry vendors Hi all, I know this topic was discussed in the past but I feel like the options in this area are very limited and the vendors are taking advantage of that. What is your solution for clean room garments laundry? Are you renting and sending them out to laundry? If so, could you please let me know which vendor you're using? You can respond directly to me if you don't feel comfortable sharing your feedback with everyone. Thanks, Nava Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Labs Columbia University CEPSR/MC 8903 530 west 120th st. NY NY 10027 Office: 212-8549927 Cell: 201-5627600 -------------- next part -------------- An HTML attachment was scrubbed... URL: From shimonel at savion.huji.ac.il Thu Feb 25 02:18:15 2021 From: shimonel at savion.huji.ac.il (Shimon Eliav) Date: Thu, 25 Feb 2021 07:18:15 +0000 Subject: [labnetwork] clean room garments laundry vendors In-Reply-To: References: <000001d70aaf$d880e740$8982b5c0$@columbia.edu> Message-ID: Also we. Shimon From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Aebersold,Julia W. Sent: Wednesday, 24 February 2021 20:16 To: Nava Ariel-Sternberg ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] clean room garments laundry vendors We wash our own in our washing machine with DI. Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville 2210 South Brook Street Shumaker Research Building, Room 233 Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ ________________________________ From: labnetwork-bounces at mtl.mit.edu > on behalf of Nava Ariel-Sternberg > Sent: Wednesday, February 24, 2021 8:20 AM To: labnetwork at mtl.mit.edu > Subject: [labnetwork] clean room garments laundry vendors CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Hi all, I know this topic was discussed in the past but I feel like the options in this area are very limited and the vendors are taking advantage of that. What is your solution for clean room garments laundry? Are you renting and sending them out to laundry? If so, could you please let me know which vendor you're using? You can respond directly to me if you don't feel comfortable sharing your feedback with everyone. Thanks, Nava Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Labs Columbia University CEPSR/MC 8903 530 west 120th st. NY NY 10027 Office: 212-8549927 Cell: 201-5627600 -------------- next part -------------- An HTML attachment was scrubbed... URL: From saba.sadeghi at uwaterloo.ca Fri Feb 26 13:02:18 2021 From: saba.sadeghi at uwaterloo.ca (Saba Sadeghi) Date: Fri, 26 Feb 2021 18:02:18 +0000 Subject: [labnetwork] cleaning procedure for chillers Message-ID: <6694eabc9af440879bddcc1b1ef71072@uwaterloo.ca> Dear colleagues, We have chillers from Haskris for cooling our MBE deposition system and also XRD system; I was wondering if you have a procedure that you recommend for cleaning the chillers' water. According to Haskris you can use hydrogen peroxide to clean the water should there be any biological growth in the chiller. For this, do I need to isolate the chiller from the system or can hydrogen peroxide be run through the entire system? I appreciate your input. Best, Saba -- Saba Sadeghi, PhD Quantum Devices Fabrication Scientist Institute for Quantum Computing, University of Waterloo Email: saba.sadeghi at uwaterloo.ca From jfraser96 at byu.edu Fri Feb 26 16:00:12 2021 From: jfraser96 at byu.edu (Jim Fraser) Date: Fri, 26 Feb 2021 21:00:12 +0000 Subject: [labnetwork] Denton Integrity Control System - Parts needed Message-ID: All, We have a Denton Integrity E-Beam Evaporator that has been a workhorse in our cleanroom for many years. Apparently too many years. After several bypass surgeries and two heart transplants it seems to have given up the ghost. The control system no longer operates. We are working with the supplier to upgrade the control system, but due to COVID caused delays it looks like at least 4 to 6 months lead time. I'm asking if anyone has and old controller or parts for one of these systems. The goal is just to be able to survive until the upgrade can be done. Any input is welcomed! Thanks, James R Fraser IML Manager 460-L EB Brigham Young University 801-422-4344 -------------- next part -------------- An HTML attachment was scrubbed... URL: From gary.spinner at ien.gatech.edu Fri Feb 26 21:53:12 2021 From: gary.spinner at ien.gatech.edu (Spinner, Gary) Date: Sat, 27 Feb 2021 02:53:12 +0000 Subject: [labnetwork] Denton Integrity Control System - Parts needed In-Reply-To: References: Message-ID: Hi James, Please share some pictures of the parts you require. A few years ago, we upgraded the controls on our Denton Infinity evaporator system. We might have the parts you need to keep your system running until you complete your upgrade. Thanks, Gary Spinner - Sr. Asst. Dir-Research Ops The Institute for Electronics and Nanotechnology at Georgia Tech 345 Ferst Drive, Atlanta GA, 30332 (o) 404.385.5252 | (c) 404.391.9182 https://cleanroom.gatech.edu/ ________________________________ From: labnetwork-bounces at mtl.mit.edu on behalf of Jim Fraser Sent: Friday, February 26, 2021 4:00 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Denton Integrity Control System - Parts needed All, We have a Denton Integrity E-Beam Evaporator that has been a workhorse in our cleanroom for many years. Apparently too many years. After several bypass surgeries and two heart transplants it seems to have given up the ghost. The control system no longer operates. We are working with the supplier to upgrade the control system, but due to COVID caused delays it looks like at least 4 to 6 months lead time. I?m asking if anyone has and old controller or parts for one of these systems. The goal is just to be able to survive until the upgrade can be done. Any input is welcomed! Thanks, James R Fraser IML Manager 460-L EB Brigham Young University 801-422-4344 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jtmitch5 at ncsu.edu Sat Feb 27 10:17:27 2021 From: jtmitch5 at ncsu.edu (James Mitchell) Date: Sat, 27 Feb 2021 10:17:27 -0500 Subject: [labnetwork] cleaning procedure for chillers In-Reply-To: <6694eabc9af440879bddcc1b1ef71072@uwaterloo.ca> References: <6694eabc9af440879bddcc1b1ef71072@uwaterloo.ca> Message-ID: I have used CLR to clean out cooling lines but you would want to flush it out afterwards. Mix the CLR with water and drain out after cycling. There are biocides you can add to cooling water to keep it clean. Jim On Fri, Feb 26, 2021, 3:42 PM Saba Sadeghi wrote: > Dear colleagues, > > We have chillers from Haskris for cooling our MBE deposition system and > also XRD system; I was wondering if you have a procedure that you recommend > for cleaning the chillers' water. According to Haskris you can use hydrogen > peroxide to clean the water should there be any biological growth in the > chiller. For this, do I need to isolate the chiller from the system or can > hydrogen peroxide be run through the entire system? > > I appreciate your input. > > Best, > Saba > -- > Saba Sadeghi, PhD > Quantum Devices Fabrication Scientist > Institute for Quantum Computing, University of Waterloo > Email: saba.sadeghi at uwaterloo.ca > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From rob.breisch at trilliumus.com Sat Feb 27 12:23:48 2021 From: rob.breisch at trilliumus.com (Rob Breisch) Date: Sat, 27 Feb 2021 17:23:48 +0000 Subject: [labnetwork] cleaning procedure for chillers In-Reply-To: References: <6694eabc9af440879bddcc1b1ef71072@uwaterloo.ca> Message-ID: <9973C6784F21124B9C9CD4FD39EA8D8402C84B3740@MAIL02.trilliumsubfab.com> Saba ? Generally, when we repair chillers, we first drain the fluid from the system and examine the cleanliness. Depending upon what fluid you are using, it might be a good first step to refill it with clean fluid, run it for a bit, drain it and reinspect to see if cleanliness is improving. If it?s expensive fluid, that may not be practical. Next, we would inspect the reservoir for scale and other deposits and clean it. You may need to flush it again after this depending how much debris is generated. Once you are satisfied with the cleanliness, clean the coolant strainer (if equipped) and replace the coolant filter (if equipped). I don?t know which model you are running, but I know units like the R033 have a coolant filter that needs periodic replacement. If debris has built up in the hoses between the chiller and the MBE, you might consider replacing them if they are inexpensive. Generally, their length prevents effective cleaning. You might also consider adding an additional filter on the supply outlet if your unit is not equipped. Here is a link to the Haskris Maintenance Instructions if you?ve not found this yet. https://haskris.com/wp/wp-content/uploads/2018/02/Haskris_OpsMaintenance_102920.pdf Just keep in mind, anything you put into the chiller has the possibility of contacting the seal on the recirculation pump. I?m not sure what material from which yours is constructed, but certainly avoid anything abrasive that might damage it, else you will wind up with a bigger problem. Rob Breisch Vice President, Sales and Marketing [email logo 3] Trillium US, Inc. My Mobile: 801-726-5035 Trillium Toll Free: 800-453-1340 Email: rob.breisch at trilliumus.com WebSite: www.trilliumus.com Follow Trillium on LinkedIn This transmission is intended for the named addressee(s) only and may contain confidential and privileged information. Reading, copying or disseminating this transmission by anyone other than the named addressee(s) is strictly prohibited. If you have received this message in error, please notify us immediately by reply e-mail or phone at (503) 682-3837. From: labnetwork-bounces at mtl.mit.edu On Behalf Of James Mitchell Sent: Saturday, February 27, 2021 8:17 AM To: Saba Sadeghi Cc: Fab Network Subject: Re: [labnetwork] cleaning procedure for chillers I have used CLR to clean out cooling lines but you would want to flush it out afterwards. Mix the CLR with water and drain out after cycling. There are biocides you can add to cooling water to keep it clean. Jim On Fri, Feb 26, 2021, 3:42 PM Saba Sadeghi > wrote: Dear colleagues, We have chillers from Haskris for cooling our MBE deposition system and also XRD system; I was wondering if you have a procedure that you recommend for cleaning the chillers' water. According to Haskris you can use hydrogen peroxide to clean the water should there be any biological growth in the chiller. For this, do I need to isolate the chiller from the system or can hydrogen peroxide be run through the entire system? I appreciate your input. Best, Saba -- Saba Sadeghi, PhD Quantum Devices Fabrication Scientist Institute for Quantum Computing, University of Waterloo Email: saba.sadeghi at uwaterloo.ca _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 7265 bytes Desc: image001.png URL: From patricns at uw.edu Sat Feb 27 12:34:43 2021 From: patricns at uw.edu (N Shane Patrick) Date: Sat, 27 Feb 2021 09:34:43 -0800 Subject: [labnetwork] cleaning procedure for chillers In-Reply-To: References: Message-ID: We have a haskris chiller on a JEOL SEM and the agreed procedure is to add a bottle of drug store peroxide to tank, let it run normally, no isolation, overnight or so, then drain, flush, and fill and return to service. Algae is usually our biggest issue, and this is more than enough to handle it. I suspect most anything will hold up fine to the dilute peroxide solution. I have other chillers and systems where CLR has been used for other types of clean out. -Shane Sent from my iPhone > On Feb 27, 2021, at 9:10 AM, James Mitchell wrote: > > ? > I have used CLR to clean out cooling lines but you would want to flush it out afterwards. Mix the CLR with water and drain out after cycling. There are biocides you can add to cooling water to keep it clean. > > Jim > >> On Fri, Feb 26, 2021, 3:42 PM Saba Sadeghi wrote: >> Dear colleagues, >> >> We have chillers from Haskris for cooling our MBE deposition system and also XRD system; I was wondering if you have a procedure that you recommend for cleaning the chillers' water. According to Haskris you can use hydrogen peroxide to clean the water should there be any biological growth in the chiller. For this, do I need to isolate the chiller from the system or can hydrogen peroxide be run through the entire system? >> >> I appreciate your input. >> >> Best, >> Saba >> -- >> Saba Sadeghi, PhD >> Quantum Devices Fabrication Scientist >> Institute for Quantum Computing, University of Waterloo >> Email: saba.sadeghi at uwaterloo.ca >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: