From na2661 at columbia.edu Mon Jan 4 12:21:20 2021 From: na2661 at columbia.edu (Nava Ariel-Sternberg) Date: Mon, 4 Jan 2021 12:21:20 -0500 Subject: [labnetwork] SUSS mask aligner consumable replacement Message-ID: <041801d6e2be$04c41030$0e4c3090$@columbia.edu> Hi all, I hope you all had a good and relaxing break. Happy New Year! I was hoping to see if anyone has ever replaced the ellipsoidal reflector in a SUSS mask aligner and can provide some assistance/tips. It shouldn't be too complicated but we want to make sure we do it right and don't miss anything that could potentially degrade the tool's performance. The company is refusing to help us. Any procedures/pointers would be greatly appreciated! Nava Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Labs Columbia University CEPSR/MC 8903 530 west 120th st. NY NY 10027 Office: 212-8549927 Cell: 201-5627600 -------------- next part -------------- An HTML attachment was scrubbed... URL: From telemann0 at yahoo.com Mon Jan 4 17:19:30 2021 From: telemann0 at yahoo.com (Joonhyeong Park) Date: Mon, 4 Jan 2021 22:19:30 +0000 (UTC) Subject: [labnetwork] SUSS mask aligner consumable replacement In-Reply-To: <041801d6e2be$04c41030$0e4c3090$@columbia.edu> References: <041801d6e2be$04c41030$0e4c3090$@columbia.edu> Message-ID: <1790112246.4292457.1609798770981@mail.yahoo.com> Hello, What is your model of SUSS aligner? It is straightforward to replace the ellipsoidal reflector for MJB3, MJB4 and MA6. The reflector costed around $860 at SUSS two years ago. I heard that there is a reconditioning service or some companies are selling the reconditioning part with sending old reflector. Make sure that you turned off the UV lamp power and wait at least 15 min with keeping N2 line to cool the lamp. When you open the lamp house, remove any dust and clean the optic component at lamp house with IPA. After replacing the reflector, you need to adjust the optics using x, y, x knobs and intensity meter. Regards, Joon Park Brick Nanotechnology Center Purdue University On Monday, January 4, 2021, 3:56:39 PM EST, Nava Ariel-Sternberg wrote: Hi all, I hope you all had a good and relaxing break. Happy New Year! I was hoping to see if anyone has ever replaced the ellipsoidal reflector in a SUSS mask aligner and can provide some assistance/tips. It shouldn?t be too complicated but we want to make sure we do it right and don?t miss anything that could potentially degrade the tool?s performance. The company is refusing to help us. Any procedures/pointers would be greatly appreciated! Nava ? Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Labs Columbia University CEPSR/MC 8903 530 west 120th st. NY NY 10027 Office: 212-8549927 Cell: 201-5627600 ? ? _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork From ander906 at purdue.edu Tue Jan 5 08:47:06 2021 From: ander906 at purdue.edu (Jackson Anderson) Date: Tue, 5 Jan 2021 08:47:06 -0500 Subject: [labnetwork] Tellurene 2D material safety Message-ID: Hello all, My advisor and a co-PI are looking at the possibility of investigating some tellurene-based 2D devices here at Purdue in the Birck Nanotechnology Center. Due to the toxicity of bulk elemental Te, the staff are (understandably) concerned about the safety of the material, even in thin 2D flakes. I talked with them before the holidays and as part of their review process they asked us to reach out and see how other labs who have more experience with the material have been handling it. If any of you have looked at the material and rejected/approved it for use in your labs, I would be interested to hear your thoughts and/or processes for material handling. Thanks in advance for your input. Regards, Jackson *Jackson Anderson* *Graduate Research Assistant* *Electrical and Computer Engineering* *ander906 at purdue.edu * *https://engineering.purdue.edu/hybridmems/ * -------------- next part -------------- An HTML attachment was scrubbed... URL: From blewis at eng.ufl.edu Tue Jan 5 09:03:35 2021 From: blewis at eng.ufl.edu (Lewis,William) Date: Tue, 5 Jan 2021 14:03:35 +0000 Subject: [labnetwork] SUSS mask aligner consumable replacement In-Reply-To: References: <041801d6e2be$04c41030$0e4c3090$@columbia.edu> Message-ID: Hi Nava, I have replaced it. It's very simple. Remove the lamp. There are 3 or 4 hex screws with a rectangle shaped washer that holds the mirror in place. With the housing laying on it's side, remove the screws and washers. Remove the mirror without touching the reflective aluminum surface (grab at the lamp feed through hole at the top) and remove it. I would not purchase the mirror from Suss. I have done so in the past and the aluminum flaked off within a year. I purchased one from Class One Equipment and it has lasted several years. It was also 1/4th of the cost from Suss. Not sure who manufactured the mirror but probably Edmund Optics or similar vendor. Bill Lewis Research Service Center University of Florida 1041 Center Dr Gainesville, FL 32611 From: labnetwork-bounces at mtl.mit.edu

> On Behalf Of Nava Ariel-Sternberg Sent: Monday, January 4, 2021 12:21 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] SUSS mask aligner consumable replacement [External Email] Hi all, I hope you all had a good and relaxing break. Happy New Year! I was hoping to see if anyone has ever replaced the ellipsoidal reflector in a SUSS mask aligner and can provide some assistance/tips. It shouldn't be too complicated but we want to make sure we do it right and don't miss anything that could potentially degrade the tool's performance. The company is refusing to help us. Any procedures/pointers would be greatly appreciated! Nava Nava Ariel-Sternberg, Ph.D. Director of CNI Shared Labs Columbia University CEPSR/MC 8903 530 west 120th st. NY NY 10027 Office: 212-8549927 Cell: 201-5627600 -------------- next part -------------- An HTML attachment was scrubbed... URL: From bfruhberger at ucsd.edu Tue Jan 5 16:34:47 2021 From: bfruhberger at ucsd.edu (Bernd Fruhberger) Date: Tue, 5 Jan 2021 13:34:47 -0800 Subject: [labnetwork] PlasmaScope Horiba Jobin Yvon Message-ID: Hello everyone, I am wondering if anyone could help us out with some very old software for a PlasmaScope End Point Detector from Horiba Jobin Yvon. We have contacted the original supplier but they don't seem to be able to help (we purchased the tool ~2003; the system label says "Type: 23300318 C"). The hard drive in the system died. We were able to replace the drive, install the ancient operating system but the original software from Horiba (disc labeled "PlasmaScope" is unreadable). Would anyone out there have a copy of the software to help us out? I've attached a couple of images of the original software CD. Thanks a lot! Bernd -- Bernd Fruhberger, PhD Technical Director, Nano3 Cleanroom Facility Assoc. Director, Operations, San Diego Nanotechnology Infrastructure UCSD Calit2 M/C0436 9500 Gilman Drive La Jolla, CA 92093-0436 Ph (858) 534-4518 Fax (858) 534-9092 bfruhberger at ucsd.edu http://sdni.ucsd.edu/ http://nano3.calit2.net/ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: IMG_20210105_094356605.jpg Type: image/jpeg Size: 1074107 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: IMG_20210105_094409668.jpg Type: image/jpeg Size: 1088872 bytes Desc: not available URL: From Michael.D.Thomas.20 at nd.edu Fri Jan 8 13:52:22 2021 From: Michael.D.Thomas.20 at nd.edu (Michael Thomas) Date: Fri, 8 Jan 2021 13:52:22 -0500 Subject: [labnetwork] Open Position - Nanofabrication Facility Manager @ University of Notre Dame In-Reply-To: References: Message-ID: All, There is an open position at the University of Notre Dame in the Nanofabrication Facility. The position is for the Facility Manager. Please follow the link below for more information/job description: https://jobs.nd.edu/postings/20184 Thank you *Michael Thomas* *Manager, Cleanroom Operations* *University of Notre Dame* *B37 Stinson Remick Hall* *Notre Dame, IN 46556* *Ph. 574-631-7493 <574-631-7493>* *Fx. 574-631-4393 <574-631-4393>* -------------- next part -------------- An HTML attachment was scrubbed... URL: From lvchang at Central.UH.EDU Fri Jan 8 15:15:32 2021 From: lvchang at Central.UH.EDU (Chang, Long) Date: Fri, 8 Jan 2021 20:15:32 +0000 Subject: [labnetwork] Spin Coating VO2 (Vanadyl Acetylacetonate) Message-ID: Hello, A user wants to spin coat VO2 dissolved in methanol. Does anyone know if this is safe to use in a shared spin coater inside a wet bench? Thanks, Long Chang UH Nanofabrication Facility (UHNF) University of Houston 713-743-5235 nanofab.uh.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From wrhess at mit.edu Wed Jan 13 09:59:21 2021 From: wrhess at mit.edu (Whitney Rochelle Hess) Date: Wed, 13 Jan 2021 14:59:21 +0000 Subject: [labnetwork] Sputtering Yttrium Message-ID: <1610549961030.86598@mit.edu> Hi all, We've received a request to sputter yttrium. If you have experience sputtering this material, it would be helpful if you could share details on the safety precautions you've taken. Our sputterer is loaded from ambient air, so our main concerns are during maintenance and cleanup if we have generated high surface area films, flakes, or powders that are more water reactive, and potentially pyrophoric. Thanks! Whitney _________________________________________ Whitney Hess, PhD Manager of Safety Systems and Programs | MIT.nano MIT, Room 12-5025 Phone: 617-253-8567 Email: wrhess at mit.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From kevin.walsh at louisville.edu Sun Jan 17 12:11:44 2021 From: kevin.walsh at louisville.edu (Walsh,Kevin M.) Date: Sun, 17 Jan 2021 17:11:44 +0000 Subject: [labnetwork] FW: Search for ECE Faculty and MNTC Director In-Reply-To: References: Message-ID: Dear Colleagues, We just opened a critical search for a new research-active ECE faculty member who will also serve as the Faculty Director of our $30M, 10,000 sq ft Micro/NanoTechnology Cleanroom and Associate Director of our NNCI KY Multiscale site. The ad is below, as well as attached. I appreciate your help identifying viable candidates for this important position. If you or your colleagues have any questions, please have them contact me. Thanks so much! Kevin Walsh walsh at louisville.edu __________________________________________________________________________________________________________________________ JOB OPPORTUNITY Job Opening ID: 40336 Posting Title: Professor (Open Rank) Location: Electrical Engineering, University of Louisville, Louisville, KY Professor of Electrical and Computer Engineering - Faculty Position [cid:image013.jpg at 01D6ECC8.57188F50] [cid:image015.png at 01D6ECC8.57188F50] [cid:image016.png at 01D6ECC8.57188F50] [cid:image017.png at 01D6ECC8.57188F50] Position Description The Department of Electrical and Computer Engineering (ECE) at the University of Louisville invites applications and nominations for an associate or full professor faculty position. Candidates are expected to have outstanding academic credentials; a demonstrated commitment to excellence in research in the field of nanotechnology, microtechnology, MEMS, electronics or other closely-related discipline; excellent teaching, communication and team skills; and the interest, experience and ability to serve as faculty director of our $30M Micro/Nano Technology Center (MNTC), which is part of the prestigious NSF NNCI national nanotechnology network. The successful candidate will also serve as associate director of our NSF KY Multiscale NNCI site (www.kymultiscale.net), with the expectation to lead the University's proposal for renewal in 2025. An earned doctorate in electrical or computer engineering or a closely related field is required. The ECE Department provides instruction at the bachelor's, master's, and Ph.D. levels, with areas of specialty including robotics, nanotechnology, MEMS, electronics, electro-optics, computer vision and image processing, medical imaging, communication systems, intelligent control, and computational intelligence. Although ECE will be the primary home department for the successful applicant, this position encourages crossing traditional academic boundaries to engage interested faculty from our other engineering departments at the Speed School of Engineering, as well as related units in Arts &Science and the Medical School. As a recipient of an NSF ADVANCE award to increase the advancement of women faculty in STEM, UofL provides a range of networking, mentoring and development opportunities for under-represented faculty. In addition, the university offers excellent benefits including domestic partner benefits. The University of Louisville is a state-supported metropolitan research university located in Kentucky's largest urban area, and an equal opportunity, affirmative action employer. The city of Louisville has world-class performing arts, great sports, nationally acclaimed parks and is home to the Kentucky Derby. It was named one of the Top 20 Places to Visit in the U.S. by TripAdvisor in 2019, Top 10 U.S. Cities with the Happiest Workers by Kununu.com in 2019, Best Cities for College Grads by Smart Asset in 2019, a Top City for Millennials by CNBC in 2018, and a Top City for women in technology by SmartAsset in 2018. All application materials should be collected into a single document for upload. The application materials should include a curriculum vitae, an application letter detailing your experience and qualifications for the position, your vision and credentials for leading a research center, separate statements of your research and teaching philosophy, a brief description of your approach to creating an inclusive environment for students from different backgrounds, and the names of at least three references with full contact information. For full consideration, applications should be received by April 1, 2021. Review of applications will continue until the position is filled. Additional information concerning the department and position is available at http://louisville.edu/speed/electrical. Equal Employment Opportunity The University of Louisville is an equal opportunity, affirmative action employer, and is committed to providing employment opportunities to all qualified applicants without regard to race, sex, age, color, national origin, ethnicity, creed, religion, disability, genetic information, sexual orientation, gender, gender identity and expression, marital status, pregnancy, or veteran status. If you are unable to use our online application process due to an impairment or disability, please contact the Employment team at employment at louisville.edu or 502.852.6258. [CLICK HERE TO APPLY NOW] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image013.jpg Type: image/jpeg Size: 25507 bytes Desc: image013.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... 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Name: image002.png Type: image/png Size: 3299 bytes Desc: image002.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: UofL ECE Faculty Ad V2.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 1274983 bytes Desc: UofL ECE Faculty Ad V2.docx URL: From dcchrist at wisc.edu Wed Jan 20 14:15:02 2021 From: dcchrist at wisc.edu (Daniel Christensen) Date: Wed, 20 Jan 2021 19:15:02 +0000 Subject: [labnetwork] UGM Symposium moved to 2022 Message-ID: UGIM 2020 (that was postponed until 2021) has again been postponed until 2022. The UGIM 2022 Symposium will be held June 6-9, 2022 at the University of Wisconsin-Madison. The website remains the same at: https://ugim2020.wisc.edu/ The hosts and the UGIM Steering Committee believe that if the symposium were to still be held this summer the chances of a successful in-person meeting are slim. Everyone strongly felt that a virtual meeting or partial virtual meeting was not desirable. Therefore, we will see everyone, sans face masks, in 2022! Dan Christensen and Jerry Hunter Daniel C. Christensen Laboratory Manager Nanoscale Fabrication Center University of Wisconsin-Madison -------------- next part -------------- An HTML attachment was scrubbed... URL: From jenni at meetiqm.com Thu Jan 21 08:43:33 2021 From: jenni at meetiqm.com (Jenni Kuokkanen) Date: Thu, 21 Jan 2021 13:43:33 +0000 Subject: [labnetwork] Job advertisement for the lab network Message-ID: <3EE7506B-F5B1-4335-9ED2-7A431CF7E76A@meetiqm.com> Hello, I heard about labnetwork email listing and possibility to advertise a job opening for the recipients. We at IQM (Espoo, Finland) are looking to hire a Cleanroom & Facilities Manager and wonder if we could attract interest for the position via labnetwork. Here is a link to the job ad: https://iqm.teamtailor.com/jobs/1053053-cleanroom-and-facilities-manager Please let me know if you can help me sharing this and if there is anything else you would need. Kind regards, Jenni Kuokkanen HR Manager IQM Finland Oy +358401483660 Keilaranta 19, 02150 Espoo, Finland www.meetiqm.com This e-mail may contain confidential and/or privileged information. If you are not the intended recipient (or have received this e-mail in error) please notify the sender immediately and destroy this e-mail. Any unauthorised copying, disclosure or distribution of the material in this e-mail is strictly forbidden. -------------- next part -------------- An HTML attachment was scrubbed... URL: From michael.call at maine.edu Fri Jan 22 09:30:49 2021 From: michael.call at maine.edu (Michael Call) Date: Fri, 22 Jan 2021 09:30:49 -0500 Subject: [labnetwork] SPR220-7.0 and SU-8 Distributors Message-ID: Hello all, We are looking for a supplier of SU-8 and SPR220 photoresists; as our original supplier has dropped the photoresist lines. Has anyone had any experience with this? Thanks, -- Mike Call Research Engineer University of Maine Frontier Institute for Research in Sensor Technologies (FIRST) Coordinated Research entities Cleanroom ESRB Barrows Hall room 294 207-581-3382 [image: image.png] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 53624 bytes Desc: not available URL: From carsen at stanford.edu Fri Jan 22 11:53:16 2021 From: carsen at stanford.edu (Carsen Kline) Date: Fri, 22 Jan 2021 16:53:16 +0000 Subject: [labnetwork] SPR220-7.0 and SU-8 Distributors In-Reply-To: References: Message-ID: Kayaku Advanced Materials carries both. From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Michael Call Sent: Friday, January 22, 2021 6:31 AM To: Lab Network (labnetwork at mtl.mit.edu) Subject: [labnetwork] SPR220-7.0 and SU-8 Distributors Hello all, We are looking for a supplier of SU-8 and SPR220 photoresists; as our original supplier has dropped the photoresist lines. Has anyone had any experience with this? Thanks, -- Mike Call Research Engineer University of Maine Frontier Institute for Research in Sensor Technologies (FIRST) Coordinated Research entities Cleanroom ESRB Barrows Hall room 294 207-581-3382 [image.png] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 21570 bytes Desc: image001.png URL: From michael.call at maine.edu Fri Jan 22 12:12:02 2021 From: michael.call at maine.edu (Michael Call) Date: Fri, 22 Jan 2021 12:12:02 -0500 Subject: [labnetwork] SPR220-7.0 and SU-8 Distributors In-Reply-To: References: Message-ID: Thank you, everyone for the information. I will try Kayaku again. Mike On Fri, Jan 22, 2021 at 9:30 AM Michael Call wrote: > Hello all, > > We are looking for a supplier of SU-8 and SPR220 photoresists; as our > original supplier has dropped the photoresist lines. Has anyone had any > experience with this? > > Thanks, > -- > Mike Call > Research Engineer > University of Maine > Frontier Institute for Research in Sensor Technologies (FIRST) > Coordinated Research entities Cleanroom > ESRB Barrows Hall room 294 > 207-581-3382 > [image: image.png] > -- Mike Call Research Engineer University of Maine Frontier Institute for Research in Sensor Technologies (FIRST) Coordinated Research entities Cleanroom ESRB Barrows Hall room 294 207-581-3382 [image: image.png] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 53624 bytes Desc: not available URL: From beaudoin at physics.ubc.ca Fri Jan 22 12:24:35 2021 From: beaudoin at physics.ubc.ca (Beaudoin, Mario) Date: Fri, 22 Jan 2021 09:24:35 -0800 Subject: [labnetwork] SPR220-7.0 and SU-8 Distributors In-Reply-To: References: Message-ID: <5382cd5d-52cb-3614-c576-b960f6fd36a2@physics.ubc.ca> Kayakuam.com? they recently bought out Microchem.? I get our SU-8 from them and I think they carry SPR line as well. Mario On 2021-01-22 6:30 a.m., Michael Call wrote: > Hello all, > > We are looking for a supplier of SU-8 and SPR220 photoresists; as our > original supplier has dropped the photoresist lines.? Has anyone had > any experience with this? > > Thanks, > -- > Mike Call > Research Engineer > University of Maine > Frontier Institute for Research in Sensor Technologies (FIRST) > Coordinated Research entities Cleanroom > ESRB Barrows Hall room 294 > 207-581-3382 > image.png > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 53624 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig 2.jpg Type: image/jpeg Size: 21446 bytes Desc: not available URL: From dale at slac.stanford.edu Fri Jan 22 12:30:19 2021 From: dale at slac.stanford.edu (Miller, Dale A.) Date: Fri, 22 Jan 2021 17:30:19 +0000 Subject: [labnetwork] Low Z passivating layer Message-ID: Labnetwork, I am developing a ~1.5 microns of SiO2 via a Sloan RF magnetron. I am running at 10mT, 200 watts with a Cu substrate at ~ 300 degree C. I am getting a slightly brown film that seems to be conductive. Anybody have any ideas? Any ideas of other materials to deposit to get a passivating layer? Thanks, Dale Miller Master Science and Engineering Technician APFD -Coating Lab SLAC National Accelerator Laboratory 926-5202 -------------- next part -------------- An HTML attachment was scrubbed... URL: From dianasanchez at ipt.br Fri Jan 22 12:36:40 2021 From: dianasanchez at ipt.br (Diana Lizeth Torres Sanchez) Date: Fri, 22 Jan 2021 17:36:40 +0000 Subject: [labnetwork] SPR220-7.0 and SU-8 Distributors In-Reply-To: References: Message-ID: Hello Mike, We have purchased SPR220 from Kayaku Advanced Materials. Here is the contact information: Rob Hardman rhardman at kayakuam.com https://kayakuam.com/product-list/ Product List | Kayaku Advanced Materials, Inc. A Broad Range of Products to Serve Your Needs. Kayaku Advanced Materials, Inc. offers a broad range of resist and ancillary products to meet almost any application?s need, including our own products such as PMGI and LOR bi-layer, lift-off resists, SU-8 and KMPR ? epoxy resists for various sacrificial and permanent imaging applications and PMMA resists for e-beam processing. kayakuam.com ??????[Descri??o: Descri??o: Descri??o: Descri??o: http://www.ipt.br/banco_imagens/3609_maior.jpg] ??????Diana L. Torres S?nchez Postdoctoral researcher Micromanufacturing Laboratory - LMI Group for BioNanoManufacturing - BIONANO linkedin.com/in/diana-torres-s?nchez-30771a158 +55 11 3767-4333 www.ipt.br? ________________________________ De: labnetwork-bounces at mtl.mit.edu em nome de Michael Call Enviado: sexta-feira, 22 de janeiro de 2021 11:30 Para: Lab Network (labnetwork at mtl.mit.edu) Assunto: [labnetwork] SPR220-7.0 and SU-8 Distributors Hello all, We are looking for a supplier of SU-8 and SPR220 photoresists; as our original supplier has dropped the photoresist lines. Has anyone had any experience with this? Thanks, -- Mike Call Research Engineer University of Maine Frontier Institute for Research in Sensor Technologies (FIRST) Coordinated Research entities Cleanroom ESRB Barrows Hall room 294 207-581-3382 [image.png] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 53624 bytes Desc: image.png URL: From rgc5 at psu.edu Fri Jan 22 15:28:02 2021 From: rgc5 at psu.edu (Cornwall, Bob) Date: Fri, 22 Jan 2021 20:28:02 +0000 Subject: [labnetwork] UGM Symposium moved to 2022 In-Reply-To: References: Message-ID: I would be interested in seeing something being offered this spring/summer via some type of virtual platform. I am guessing there are some strategic activities that we have all engaged in that could benefit and not wait another year to share. PSU for one could talk about our transition to the revamped NEMO platform for PSU which we have named LEO. Laboratory Equipment Operations. There has been a significant branch of the base code to include multiple cores and even an add on billing capability that connects to LEO plus a ton of other modifications upgrades. NIST has not stood still on this and they could also present some of the improvements they have made. I know other labs have considered this tool but we transitioned very successfully. It would be great to share our experience and hear from others on this topic alone. We started using a platform called Gathertown for more interactive meetings. Check out their platform for a virtual event. https://gather.town/ It actually works pretty well to maintain collaboration opportunities in our virtual world. I am sure that others have similar information to share that does not need to wait a year. But even if we could set up a half day meeting or a series of 4 one hour talks, I think we could get significant participation. Bob Robert Cornwall Penn State Materials Research Institute Managing Director Rgc5 at psu.edu W 814-863-8735 C 814-571-3438 Connect with MRI https://www.mri.psu.edu/opt From: labnetwork-bounces at mtl.mit.edu On Behalf Of Daniel Christensen Sent: Wednesday, January 20, 2021 2:15 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] UGM Symposium moved to 2022 UGIM 2020 (that was postponed until 2021) has again been postponed until 2022. The UGIM 2022 Symposium will be held June 6-9, 2022 at the University of Wisconsin-Madison. The website remains the same at: https://ugim2020.wisc.edu/ The hosts and the UGIM Steering Committee believe that if the symposium were to still be held this summer the chances of a successful in-person meeting are slim. Everyone strongly felt that a virtual meeting or partial virtual meeting was not desirable. Therefore, we will see everyone, sans face masks, in 2022! Dan Christensen and Jerry Hunter Daniel C. Christensen Laboratory Manager Nanoscale Fabrication Center University of Wisconsin-Madison -------------- next part -------------- An HTML attachment was scrubbed... URL: From RobertVandusen at cunet.carleton.ca Mon Jan 25 14:35:21 2021 From: RobertVandusen at cunet.carleton.ca (Robert Vandusen) Date: Mon, 25 Jan 2021 19:35:21 +0000 Subject: [labnetwork] Tepla PS210 question Message-ID: Hello community. I have a question for anyone who may have a Tepla PS210 plasma ashing system. We have noticed that our plasma may look dimmer and more unstable than normal. We seem to be etching but need to verify our etch rates. One of the things we noticed is that even thought actual power output display on the runscreen is reading the setpoint of 500W, on the maintenance screen we see a value of ~ 120 on the output. I would have expected this to read to close to the setpoint, but we are not completely sure if this is problem as we hadn't looked at this before. Tepla hasn't been able to confirm for sure whether this is a problem. If someone would be able to check on another system to confirm that would be great. [cid:image002.jpg at 01D6F327.4EA1A9A0] [cid:image003.jpg at 01D6F327.4EA1A9A0] Thanks Rob Robert Vandusen Technical Officer, Microfabrication Lab Electronics Department Carleton University room: 4184 Mackenzie Building 613-520-2600 ext 5761 Robert_vandusen at cunet.carleton.ca -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.jpg Type: image/jpeg Size: 20810 bytes Desc: image002.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.jpg Type: image/jpeg Size: 16409 bytes Desc: image003.jpg URL: From jsalzmann at pcb.com Mon Jan 25 16:52:35 2021 From: jsalzmann at pcb.com (Jeff Salzmann) Date: Mon, 25 Jan 2021 21:52:35 +0000 Subject: [labnetwork] Tepla PS210 question In-Reply-To: References: Message-ID: <6082E83331E49D41A9DE3F109A76690CA3FC0938@NYDMS11.pcb.com> Robert, If you can observe it, see how long the match takes to tune. You might have a blown air-cap (they arc from time to time) and they'll try to tune for a long period of time. I don't use a Tepla system but I have seen this on old Matrix ashers in need of new match networks. Any questions, contact me directly. Good luck, Jeff [cid:image001.png at 01D6F33A.7AC67ED0] Jeff Salzmann Research and Development Engineering PCB Piezotronics | 716 684 0002 ext 2907 [cid:image004.jpg at 01D6F33A.7AC67ED0] From: labnetwork-bounces at mtl.mit.edu On Behalf Of Robert Vandusen Sent: Monday, January 25, 2021 14:35 To: labnetwork at mtl.mit.edu Subject: [labnetwork] Tepla PS210 question External Email Notice: This email originated from outside the MTS / PCB organization. Hello community. I have a question for anyone who may have a Tepla PS210 plasma ashing system. We have noticed that our plasma may look dimmer and more unstable than normal. We seem to be etching but need to verify our etch rates. One of the things we noticed is that even thought actual power output display on the runscreen is reading the setpoint of 500W, on the maintenance screen we see a value of ~ 120 on the output. I would have expected this to read to close to the setpoint, but we are not completely sure if this is problem as we hadn't looked at this before. Tepla hasn't been able to confirm for sure whether this is a problem. If someone would be able to check on another system to confirm that would be great. [cid:image005.jpg at 01D6F33A.7AC67ED0] [cid:image006.jpg at 01D6F33A.7AC67ED0] Thanks Rob Robert Vandusen Technical Officer, Microfabrication Lab Electronics Department Carleton University room: 4184 Mackenzie Building 613-520-2600 ext 5761 Robert_vandusen at cunet.carleton.ca -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 9207 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image004.jpg Type: image/jpeg Size: 20950 bytes Desc: image004.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image005.jpg Type: image/jpeg Size: 20810 bytes Desc: image005.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image006.jpg Type: image/jpeg Size: 16409 bytes Desc: image006.jpg URL: From spb1699 at rit.edu Tue Jan 26 10:07:30 2021 From: spb1699 at rit.edu (Scott Blondell) Date: Tue, 26 Jan 2021 15:07:30 +0000 Subject: [labnetwork] Tepla PS210 question In-Reply-To: <6082E83331E49D41A9DE3F109A76690CA3FC0938@NYDMS11.pcb.com> References: <6082E83331E49D41A9DE3F109A76690CA3FC0938@NYDMS11.pcb.com> Message-ID: Robert, as Jeff mentioned, visually check your tunable caps and other components for any signs of arcing/overheating. Do you have any indication of reflected power levels? Verify all power connections are clean and tight. Is there excessive build-up of resist residue, etc. on the electrode insulators? This would manifest as arcing or flickering plasma and higher than normal reflected power. Any reason to suspect the power source (tube or solid state section) of the supply is reaching end of life? Do you have an RF power meter and/or dummy load you can use as a test to eliminate the chamber being the problem? Not sure how to interpret the discrepancy between your power readings. Regards, Scott P. Blondell Facilities Manager Rochester Institute of Technology Semiconductor & Microsystems Fabrication Laboratory 82 Lomb Memorial Dr. Bldg. 17-2519 Rochester, NY 14623 585 738-4073 c 585 475-2171 o 585 475-5041 f spb1699 at rit.edu www.smfl.rit.edu [http://www.rit.edu/~962www/logos/tiger_walking_rit_color.jpg] From: labnetwork-bounces at mtl.mit.edu On Behalf Of Jeff Salzmann Sent: Monday, January 25, 2021 4:53 PM To: Robert Vandusen ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Tepla PS210 question Robert, If you can observe it, see how long the match takes to tune. You might have a blown air-cap (they arc from time to time) and they'll try to tune for a long period of time. I don't use a Tepla system but I have seen this on old Matrix ashers in need of new match networks. Any questions, contact me directly. Good luck, Jeff [cid:image003.png at 01D6F3C9.F82308F0] Jeff Salzmann Research and Development Engineering PCB Piezotronics | 716 684 0002 ext 2907 [cid:image004.jpg at 01D6F3C9.F82308F0] From: labnetwork-bounces at mtl.mit.edu

> On Behalf Of Jeff Salzmann Sent: Monday, January 25, 2021 4:53 PM To: Robert Vandusen >; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Tepla PS210 question Robert, If you can observe it, see how long the match takes to tune. You might have a blown air-cap (they arc from time to time) and they'll try to tune for a long period of time. I don't use a Tepla system but I have seen this on old Matrix ashers in need of new match networks. Any questions, contact me directly. Good luck, Jeff [cid:image002.png at 01D6F3CD.2CBA9940] Jeff Salzmann Research and Development Engineering PCB Piezotronics | 716 684 0002 ext 2907 [cid:image003.jpg at 01D6F3CD.2CBA9940] From: labnetwork-bounces at mtl.mit.edu

> On Behalf Of Robert Vandusen Sent: Monday, January 25, 2021 14:35 To: labnetwork at mtl.mit.edu Subject: [labnetwork] Tepla PS210 question External Email Notice: This email originated from outside the MTS / PCB organization. Hello community. I have a question for anyone who may have a Tepla PS210 plasma ashing system. We have noticed that our plasma may look dimmer and more unstable than normal. We seem to be etching but need to verify our etch rates. One of the things we noticed is that even thought actual power output display on the runscreen is reading the setpoint of 500W, on the maintenance screen we see a value of ~ 120 on the output. I would have expected this to read to close to the setpoint, but we are not completely sure if this is problem as we hadn't looked at this before. Tepla hasn't been able to confirm for sure whether this is a problem. If someone would be able to check on another system to confirm that would be great. [cid:image004.jpg at 01D6F3CD.2CBA9940] [cid:image005.jpg at 01D6F3CD.2CBA9940] Thanks Rob Robert Vandusen Technical Officer, Microfabrication Lab Electronics Department Carleton University room: 4184 Mackenzie Building 613-520-2600 ext 5761 Robert_vandusen at cunet.carleton.ca This email contains links to content or websites. Always be cautious when clicking on external links or attachments. If in doubt, please forward suspicious emails to phishing at carleton.ca. -----End of Disclaimer----- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 2550 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 9207 bytes Desc: image002.png URL: -------------- next part -------------- A non-text attachment was scrubbed... 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Name: Project Request FORM 2017 for metrology SEM and AFM.xls Type: application/vnd.ms-excel Size: 31232 bytes Desc: Project Request FORM 2017 for metrology SEM and AFM.xls URL: From tony.olsen at utah.edu Tue Jan 26 13:18:57 2021 From: tony.olsen at utah.edu (Tony L Olsen) Date: Tue, 26 Jan 2021 18:18:57 +0000 Subject: [labnetwork] Open Position: Equipment Engineer at University of Utah Nanofab Message-ID: <3f8c4dd46fc64b73b4e0561497b8e6f4@utah.edu> All We have an open position for an Equipment/Process Engineer in the Nanofab at the University of Utah. The job listing and application is available at https://utah.peopleadmin.com/postings/110907. Feel free to spread the word. Thank you Tony Olsen Nanofab Cleanroom Supervisor/Process Engineer University of Utah 36 S Wasatch Drive, Suite 2500 Salt Lake City, UT 84112 801-587-0651 www.nanofab.utah.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From mweiler at andrew.cmu.edu Tue Jan 26 17:00:23 2021 From: mweiler at andrew.cmu.edu (Mark Weiler) Date: Tue, 26 Jan 2021 22:00:23 +0000 Subject: [labnetwork] Equipment for Sale at CMU Message-ID: Hello Everyone, We have some equipment from our cleanrooms and laboratories that we are no longer in need of, and are putting up for sale. Please let me know directly if you are interested. Systems: - Micrion Focused Ion Beam Model 2500 (keyboard issue) - Nikon NSR model 1505G4D (working system) - Heidelberg DWL 66 Laser Lithography System (working system) - Lebold-Heraeus Z-650 Sputtering System (Semi-functional) - Intlvac Ion Beam DLC coater- complete system with LL (working system prior to decommission and storage) Miscellaneous: - A very large variety of small to mid-size oil-based roughing pumps (90%+ working before removal from service and replacement with dry pumps) - Two CTI 8 Cryotorr cryogenic pumps (rebuilt and ready for use) - One CTI 10F Onboard pump with CF flange (rebuilt and ready for use) Best Regards, Mark ________________________________________________________________ Mark Weiler Manager, Equipment & Facilites Claire and John Bertucci Nanotechnology Laboratory Eden Hall Nanofabrication Cleanroom Carnegie Mellon University P: 412-268-2471 F: 412-268-3497 http://www.nanofab.ece.cmu.edu [cid:2D2E01E3-CEC1-4F48-A845-224D8D7CED12 at wv.cc.cmu.edu] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: images.png Type: image/png Size: 720 bytes Desc: images.png URL: From karlb at uw.edu Wed Jan 27 23:02:42 2021 From: karlb at uw.edu (Karl F. Bohringer) Date: Thu, 28 Jan 2021 04:02:42 +0000 Subject: [labnetwork] Open position at the Washington Nanofabrication Facility Message-ID: Fabrication/Equipment Service Engineer Washington Nanofabrication Facility University of Washington, Seattle The Washington Nanofabrication Facility (WNF), a member of the NSF National Nanotechnology Coordinated Infrastructure (NNCI) network, has an open position for a fabrication/equipment service engineer. The engineer will be responsible for equipment troubleshooting, facilities infrastructure monitoring and support, baseline process monitoring, tool ownership, and executing contract manufacturing efforts. More information about this position can be found at https://www.wnf.washington.edu/wnf-seeks-a-fabrication-service-equipment-engineer/. Applications should be uploaded via the UWHires job portal (accessible from the position description above). General inquiries can be sent to wnfinfo at uw.edu. In addition, we also anticipate an opening for a senior lithography engineer. Please check the WNF site again in the coming weeks. Karl F. B?hringer, Ph.D. Professor of Electrical & Computer Engineering and Bioengineering Director, Nano-engineered Systems Institute (NanoES) Site Director, National Nanotechnology Coordinated Infrastructure (NNCI) University of Washington Campus Box 352500 Seattle, WA 98195-2500, USA karlb at uw.edu nano.uw.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From lan.zhang at baesystems.com Fri Jan 29 12:59:21 2021 From: lan.zhang at baesystems.com (Zhang, Lan (US)) Date: Fri, 29 Jan 2021 17:59:21 +0000 Subject: [labnetwork] Job opening: Ebeam Lithography Engineer at BAE Systems Message-ID: Hello all, We are looking for an ebeam lithography engineer at our Nashua, NH site. BAE offers competitive pay and every other Friday off. New Hampshire doesn't have state income taxes and sales taxes. If you have experience with EBPG or JEOL ebeam writer, please check out the link below: https://jobs.baesystems.com/global/en/job/65709BR/Electron-Beam-Lithography-Engineer Stay safe and healthy! Lan Zhang -------------- next part -------------- An HTML attachment was scrubbed... URL: From mweiler at andrew.cmu.edu Fri Jan 29 17:12:21 2021 From: mweiler at andrew.cmu.edu (Mark Weiler) Date: Fri, 29 Jan 2021 22:12:21 +0000 Subject: [labnetwork] Equipment for Sale at CMU In-Reply-To: References: Message-ID: Hello Again, We have come to the realization that the Intlvac DLC would not be 100% operational after assembly. There have been parts cannibalized, and we want to scrutinize what is needed prior to putting it up for sale as a system. It may be that we need to sell the parts separately, or to someone willing to take it as is. I will update in a week, or so. Additionally, we understand the lack of need for a Z-650 system. If anyone is interested in the chambers, the electronics (complete with super-fast bubble memory), or any other component, we are willing to part out this system. Best Regards, Mark ________________________________________________________________ Mark Weiler Manager, Equipment & Facilites Claire and John Bertucci Nanotechnology Laboratory Eden Hall Nanofabrication Cleanroom Carnegie Mellon University P: 412-268-2471 F: 412-268-3497 http://www.nanofab.ece.cmu.edu [cid:2D2E01E3-CEC1-4F48-A845-224D8D7CED12 at wv.cc.cmu.edu] On Jan 26, 2021, at 5:00 PM, Mark Weiler > wrote: Hello Everyone, We have some equipment from our cleanrooms and laboratories that we are no longer in need of, and are putting up for sale. Please let me know directly if you are interested. Systems: - Micrion Focused Ion Beam Model 2500 (keyboard issue) - Nikon NSR model 1505G4D (working system) - Heidelberg DWL 66 Laser Lithography System (working system) - Lebold-Heraeus Z-650 Sputtering System (Semi-functional) - Intlvac Ion Beam DLC coater- complete system with LL (working system prior to decommission and storage) Miscellaneous: - A very large variety of small to mid-size oil-based roughing pumps (90%+ working before removal from service and replacement with dry pumps) - Two CTI 8 Cryotorr cryogenic pumps (rebuilt and ready for use) - One CTI 10F Onboard pump with CF flange (rebuilt and ready for use) Best Regards, Mark ________________________________________________________________ Mark Weiler Manager, Equipment & Facilites Claire and John Bertucci Nanotechnology Laboratory Eden Hall Nanofabrication Cleanroom Carnegie Mellon University P: 412-268-2471 F: 412-268-3497 http://www.nanofab.ece.cmu.edu -------------- next part -------------- An HTML attachment was scrubbed... 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