From thejohnnicholson at gmail.com Thu Jul 1 16:29:32 2021 From: thejohnnicholson at gmail.com (John Nicholson) Date: Thu, 1 Jul 2021 16:29:32 -0400 Subject: [labnetwork] UMass Amherst Clean Room Technician Position Message-ID: https://careers.umass.edu/amherst/en-us/job/508963/technical-assistant-iii-educ-cleanroom-technician Technical Assistant III (Educ) - Cleanroom Technician Apply now Job no: 508963 Work type: Staff Full Time Location: UMass Amherst Department: Personalized Health Monitoring Union: USA/MTA Categories: Laboratory & Research, Research About UMass Amherst UMass Amherst, the Commonwealth's flagship campus, is a nationally ranked public research university offering a full range of undergraduate, graduate and professional degrees. The University sits on nearly 1,450-acres in the scenic Pioneer Valley of Western Massachusetts, and offers a rich cultural environment in a bucolic setting close to major urban centers. In addition, the University is part of the Five Colleges (including Amherst College, Hampshire College, Mount Holyoke College, and Smith College), which adds to the intellectual energy of the region. Job Summary The Cleanroom Technician (part of the IALS Core Facilities team) will provide daily technical operational support, equipment maintenance, and user training to the flexible-hybrid electronics research and development team, including areas such as printed circuit design, advanced packaging development, reliability assessment, electronic circuit design and test, silicon die preparation, handling pick-and-place attachment, roll-to-roll and print processes, breadboard prototyping, and flexible-hybrid electronics manufacturing. Essential Functions Ensure daily operation of all lab equipment in the cleanrooms, with major pieces including evaporator, sputter, plasma etchers, wafer bonders, mask aligner, chemical and acid hoods, inspection and metrology tools, roll-to-roll (R2R) and bench top coating and printing lines, Have prior knowledge and hands on experience with vacuum pumps, chillers, high vacuum system, pressurized gas distribution systems, compressors, and related valves, regulators and hardware, Develop and maintain a preventative maintenance program for the cleanroom facilities and provide preventative maintenance in accordance with manufacturer guidelines. Troubleshoot and coordinate with technical services of tool vendors for equipment services and repair in the event of equipment malfunctions, minimizing the equipment downtime. Ensure the cleanroom facilities comply with the University general health and safety standards, local environmental safety standards and appropriate quality assurance standards. Maintain datasheets with respect to hazardous materials and records of inspection and safety procedures. Train and supervise users of the cleanroom facilities lab; work with individual users to ensure proper functionality of equipment in designing experiments for their research. Stay current with technology development and suggest purchase of new equipment, negotiate technical specifications and price for new instruments purchases, and supervise the installation of the instruments. Respond promptly and appropriately to emergencies or urgent issues as they arise. Other Functions Performs other duties as assigned. Minimum Qualifications (Knowledge, Skills, Abilities, Education, Experience, Certifications, Licensure) Associates degree in physical sciences or engineering with 5+ years of relevant professional experience required Five years? experience of cleanroom operation, tool maintenance is required Excellent communication skills, interpersonal ability to liaise effectively with staff, students, contractors and industrialists at all levels is required Basic knowledge of printed electronics, integrated circuit and device fabrication methods and functions Preferred Qualifications (Knowledge, Skills, Abilities, Education, Experience, Certifications, Licensure) 5+ years? experience in industry in an engineering and design environment conducting printed circuit board design, process, and silicon IC packaging, silicon microfabrication and related processes activities preferred Physical Demands/Working Conditions Ability to work in a cleanroom / laboratory environment. Additional Details May supervise 2-3 students. Work Schedule 37.5 hours/week, Monday through Friday. Salary Information USA/MTA Grade 15 Special Instructions to Applicants Please submit cover letter, resume, and names and contact information for three professional references. Priority review of applications to begin 7/7/21. UMass Amherst is committed to a policy of equal opportunity without regard to race, color, religion, gender, gender identity or expression, age, sexual orientation, national origin, ancestry, disability, military status, or genetic information in employment, admission to and participation in academic programs, activities, and services, and the selection of vendors who provide services or products to the University. To fulfill that policy, UMass Amherst is further committed to a program of affirmative action to eliminate or mitigate artificial barriers and to increase opportunities for the recruitment and advancement of qualified minorities, women, persons with disabilities, and covered veterans. It is the policy of the UMass Amherst to comply with the applicable federal and state statutes, rules, and regulations concerning equal opportunity and affirmative action. Advertised: Jun 24 2021 Eastern Daylight Time Applications close: Jul 7 2021 Eastern Daylight Time -------------- next part -------------- An HTML attachment was scrubbed... URL: From mfcchung at ust.hk Sun Jul 4 22:41:33 2021 From: mfcchung at ust.hk (Wing Leong CHUNG) Date: Mon, 5 Jul 2021 02:41:33 +0000 Subject: [labnetwork] Cleanroom circulation air In-Reply-To: References: Message-ID: Dear all, NFF of HKUST operates over 25 years and HKUST is planning to build a new cleanroom (including class 10, 100 and 1000) which size is around 1800m2. We use a subfab approach and cleanroom build on a waffle slab structure (design with VC-C standard, with active vibration control platform for high vibration sensitive equipment). I know there are two arrangements for cleanroom air return 1. Through the space between raised floor and waffle slab; and back to AHUs/FFU 2. Through subfab and back to AHUs/FFUs (cheese structure of waffle slab) [cid:08d69118-7ec0-4e4f-a68e-e5d6268e9684] May I have your recommendation/suggestion of which types of configurations is more suitable for a research lab? And what are the pro and cons? Any network member can show/share your current structure? Your great help is highly appreciated. Jeff -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 67153 bytes Desc: image.png URL: From sguo18 at yorku.ca Tue Jul 6 09:58:18 2021 From: sguo18 at yorku.ca (Xin (Shane) GUO) Date: Tue, 6 Jul 2021 09:58:18 -0400 Subject: [labnetwork] A vacuum pump for a spin coater Message-ID: Hi guys We have two spin coaters that need a vacuum pump. Considering the budget, I prefer to get a pump to run both units. Is it possible to get any low-cost pump for this purpose? Any recommendations of the choice of a pump? Another issue is the flow rate. One of the spin coater suppliers suggested a flow rate of 1.6 to 4.5 SCFM (0.11 cubic meters/minute) at 0 inches Hg while the other supplier didn't specify the flow rate requirement. I am not sure how flow rate matters for this type of application. When your lab ordered a pump for your spin coater, did you consider the flow rate? Thank you for all your suggestions in advance. Best Shane -------------- next part -------------- An HTML attachment was scrubbed... URL: From price.798 at osu.edu Tue Jul 6 12:40:37 2021 From: price.798 at osu.edu (Price, Aimee) Date: Tue, 6 Jul 2021 16:40:37 +0000 Subject: [labnetwork] Hotplate options for resist baking Message-ID: Hello everyone, We are looking for a couple standalone hotplates for resist soft and hard bakes. We have one nice, uniform hotplate attached to one of our CEE coaters. However, it takes a long time to change temps and doesn?t get used as much as it should. The lab hotplates we have are ok for general lab use and not cheap, but are not uniform or reproducible enough for resist baking for sensitive processes (I think that means all processes?). I?m sure I?ll be overwhelmed with ideas, so thanks in advance. What are your suggestions for resist bake hotplates with uniformity of at least +/- 1 deg F? I do not necessarily need vacuum or proximity, in fact would likely rather not have those options. Best, Aimee Sr. Research Associate The Ohio State University Nanotech West Lab Institute for Materials Research 1381 Kinnear Road Suite 100 Columbus, OH 43212 614-292-2753 -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Tue Jul 6 17:28:15 2021 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Tue, 6 Jul 2021 21:28:15 +0000 Subject: [labnetwork] Hotplate options for resist baking In-Reply-To: References: Message-ID: <22ec6a413237491b8a1ae3712a1ff098@draper.com> Hi Aimee, Here at Draper we use Wensco very good flat accurate hot plates, these are our hot plates for resist bake. WENESCO INC 3057 N ROCKWELL STREET CHICAGO IL 60618 United States Richard Morrison PMTS Draper Laboratory 555 Technology Square Cambridge Ma 02139 Office: 617-258-3420 Cell: 508-930-3461 From: labnetwork On Behalf Of Price, Aimee Sent: Tuesday, July 6, 2021 12:41 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Hotplate options for resist baking Hello everyone, We are looking for a couple standalone hotplates for resist soft and hard bakes. We have one nice, uniform hotplate attached to one of our CEE coaters. However, it takes a long time to change temps and doesn?t get used as much as it should. The lab hotplates we have are ok for general lab use and not cheap, but are not uniform or reproducible enough for resist baking for sensitive processes (I think that means all processes?). I?m sure I?ll be overwhelmed with ideas, so thanks in advance. What are your suggestions for resist bake hotplates with uniformity of at least +/- 1 deg F? I do not necessarily need vacuum or proximity, in fact would likely rather not have those options. Best, Aimee Sr. Research Associate The Ohio State University Nanotech West Lab Institute for Materials Research 1381 Kinnear Road Suite 100 Columbus, OH 43212 614-292-2753 ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From lino.eugene at uwaterloo.ca Tue Jul 6 19:11:43 2021 From: lino.eugene at uwaterloo.ca (Lino Eugene) Date: Tue, 6 Jul 2021 23:11:43 +0000 Subject: [labnetwork] Hotplate options for resist baking In-Reply-To: References: Message-ID: Hi Aimee, Back in 2015, I purchased an EMS 1000-1 hotplate from Electronic Micro Systems in UK. http://electronicmicrosystems.co.uk/products/hot-plate-1000-1/ I was happy with this hotplate and the customer service. Best, Lino Eugene, P.Eng., Ph.D., Micro/nanofabrication process engineer Quantum-Nano Fabrication and Characterization Facility QNC 1611 University of Waterloo 200 University Avenue West Waterloo, ON, Canada N2L 3G1 Ph: +1 519-888-4567 #37788 Cell: +1 226-929-1685 Website: https://qnfcf.uwaterloo.ca/ De : labnetwork De la part de Price, Aimee Envoy? : 6 juillet 2021 12:41 ? : labnetwork at mtl.mit.edu Objet : [labnetwork] Hotplate options for resist baking Hello everyone, We are looking for a couple standalone hotplates for resist soft and hard bakes. We have one nice, uniform hotplate attached to one of our CEE coaters. However, it takes a long time to change temps and doesn?t get used as much as it should. The lab hotplates we have are ok for general lab use and not cheap, but are not uniform or reproducible enough for resist baking for sensitive processes (I think that means all processes?). I?m sure I?ll be overwhelmed with ideas, so thanks in advance. What are your suggestions for resist bake hotplates with uniformity of at least +/- 1 deg F? I do not necessarily need vacuum or proximity, in fact would likely rather not have those options. Best, Aimee Sr. Research Associate The Ohio State University Nanotech West Lab Institute for Materials Research 1381 Kinnear Road Suite 100 Columbus, OH 43212 614-292-2753 -------------- next part -------------- An HTML attachment was scrubbed... URL: From admueller84 at gmail.com Tue Jul 6 21:02:52 2021 From: admueller84 at gmail.com (Aaron Mueller) Date: Wed, 7 Jul 2021 09:02:52 +0800 Subject: [labnetwork] Hotplate options for resist baking In-Reply-To: <22ec6a413237491b8a1ae3712a1ff098@draper.com> References: <22ec6a413237491b8a1ae3712a1ff098@draper.com> Message-ID: Hi All, Not sure if you're looking for smaller samples/wafers/both, but for wafers, where we need high uniformity, I really like the the SPS POLOS hotplates (e.g. https://www.sps-europe.com/order/polos-hotplate-200s-230vac---single-without-options/15965/), though it does take a bit long to get to temperature, e.g. 17?C-120?C 45 min, 120?C-140?C 15 min. What I like about how it operates is that you place the wafer on raised pins, When you start the recipe, they lower, and when it's finished, they rise. My two cents... Best Regards, Aaron Research Fellow Nanyang Technological University School of Materials Science and Engineering 50 Nanyang Ave, N4.1-01-14 Singapore 639798 +65 81217105 On Wed, Jul 7, 2021 at 8:07 AM Morrison, Richard H., Jr < rmorrison at draper.com> wrote: > Hi Aimee, > > > > Here at Draper we use Wensco very good flat accurate hot plates, these are > our hot plates for resist bake. > > > > WENESCO INC > > 3057 N ROCKWELL STREET > > CHICAGO IL 60618 > > United States > > > > > > Richard Morrison > > PMTS > > Draper Laboratory > > 555 Technology Square > > Cambridge Ma 02139 > > Office: 617-258-3420 > > Cell: 508-930-3461 > > > > > > > > *From:* labnetwork * On Behalf Of *Price, > Aimee > *Sent:* Tuesday, July 6, 2021 12:41 PM > *To:* labnetwork at mtl.mit.edu > *Subject:* [labnetwork] Hotplate options for resist baking > > > > Hello everyone, > > We are looking for a couple standalone hotplates for resist soft and hard > bakes. We have one nice, uniform hotplate attached to one of our CEE > coaters. However, it takes a long time to change temps and doesn?t get > used as much as it should. The lab hotplates we have are ok for general > lab use and not cheap, but are not uniform or reproducible enough for > resist baking for sensitive processes (I think that means all processes?). > > > > > I?m sure I?ll be overwhelmed with ideas, so thanks in advance. What are > your suggestions for resist bake hotplates with uniformity of at least +/- > 1 deg F? I do not necessarily need vacuum or proximity, in fact would > likely rather not have those options. > > > > Best, > > Aimee > > > > Sr. Research Associate > > The Ohio State University > > Nanotech West Lab > > Institute for Materials Research > > 1381 Kinnear Road > > Suite 100 > > Columbus, OH 43212 > > 614-292-2753 > > > ------------------------------ > Notice: This email and any attachments may contain proprietary (Draper > non-public) and/or export-controlled information of Draper. If you are not > the intended recipient of this email, please immediately notify the sender > by replying to this email and immediately destroy all copies of this email. > ------------------------------ > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From manish.keswani01 at gmail.com Thu Jul 8 06:10:21 2021 From: manish.keswani01 at gmail.com (Manish Keswani) Date: Thu, 8 Jul 2021 03:10:21 -0700 Subject: [labnetwork] reducing noise in the chase area Message-ID: Hello all, We have significant noise in the chase area due to equipment and pumps. Do you know of any sound absorbing materials that are compatible with cleanroom or other noise reduction options that are effective. Thanks so much. Manish Keswani Lawrence Livermore National Laboratory -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Thu Jul 8 08:32:18 2021 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Thu, 8 Jul 2021 12:32:18 +0000 Subject: [labnetwork] reducing noise in the chase area In-Reply-To: References: Message-ID: <269b1bcf661341a5b129e0db817bd983@draper.com> You could try to place sound enclosures around your pumps, just need to be careful of the heat buildup. Here is a link for that: https://www.acoustiblok.com/2018/05/15/vacuum-pump-noise-enclosures/?gclid=EAIaIQobChMI-prOk7zT8QIVj3xvBB1jcAmREAAYASAAEgK8XPD_BwE A lot of pump suppliers ell exhaust silencers, we did that on our EBARA pumps and really reduced the noise. Rick Richard Morrison PMTS Draper Laboratory 555 Technology Square Cambridge Ma 02139 Office: 617-258-3420 Cell: 508-930-3461 From: labnetwork On Behalf Of Manish Keswani Sent: Thursday, July 8, 2021 6:10 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] reducing noise in the chase area Hello all, We have significant noise in the chase area due to equipment and pumps. Do you know of any sound absorbing materials that are compatible with cleanroom or other noise reduction options that are effective. Thanks so much. Manish Keswani Lawrence Livermore National Laboratory ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Thu Jul 8 09:34:39 2021 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Thu, 8 Jul 2021 13:34:39 +0000 Subject: [labnetwork] reducing noise in the chase area In-Reply-To: References: Message-ID: Use mufflers and check valves for noise abatement on pumps. They work wonders. Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ From: labnetwork [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Manish Keswani Sent: Thursday, July 8, 2021 6:10 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] reducing noise in the chase area CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Hello all, We have significant noise in the chase area due to equipment and pumps. Do you know of any sound absorbing materials that are compatible with cleanroom or other noise reduction options that are effective. Thanks so much. Manish Keswani Lawrence Livermore National Laboratory -------------- next part -------------- An HTML attachment was scrubbed... URL: From michael.rooks at yale.edu Thu Jul 8 12:32:06 2021 From: michael.rooks at yale.edu (Michael Rooks) Date: Thu, 8 Jul 2021 12:32:06 -0400 Subject: [labnetwork] reducing noise in the chase area In-Reply-To: <269b1bcf661341a5b129e0db817bd983@draper.com> References: <269b1bcf661341a5b129e0db817bd983@draper.com> Message-ID: Ebara pumps and mufflers are good advice. The least expensive solution is noise-cancellation headphones. The Bose in-ear model is really great, and also plugs into a phone for those tech-support calls. -------------------------------- Michael Rooks nano.yale.edu On Thu, Jul 8, 2021 at 12:10 PM Morrison, Richard H., Jr < rmorrison at draper.com> wrote: > You could try to place sound enclosures around your pumps, just need to be > careful of the heat buildup. > > > > Here is a link for that: > https://www.acoustiblok.com/2018/05/15/vacuum-pump-noise-enclosures/?gclid=EAIaIQobChMI-prOk7zT8QIVj3xvBB1jcAmREAAYASAAEgK8XPD_BwE > > > > A lot of pump suppliers ell exhaust silencers, we did that on our EBARA > pumps and really reduced the noise. > > > > Rick > > > > > > Richard Morrison > > PMTS > > Draper Laboratory > > 555 Technology Square > > Cambridge Ma 02139 > > Office: 617-258-3420 > > Cell: 508-930-3461 > > > > > > > > *From:* labnetwork *On Behalf Of *Manish > Keswani > *Sent:* Thursday, July 8, 2021 6:10 AM > *To:* labnetwork at mtl.mit.edu > *Subject:* [labnetwork] reducing noise in the chase area > > > > Hello all, > > > > We have significant noise in the chase area due to equipment and pumps. Do > you know of any sound absorbing materials that are compatible with > cleanroom or other noise reduction options that are effective. > > > > Thanks so much. > > > > Manish Keswani > > Lawrence Livermore National Laboratory > ------------------------------ > Notice: This email and any attachments may contain proprietary (Draper > non-public) and/or export-controlled information of Draper. If you are not > the intended recipient of this email, please immediately notify the sender > by replying to this email and immediately destroy all copies of this email. > ------------------------------ > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From rob.breisch at trilliumus.com Thu Jul 8 12:48:22 2021 From: rob.breisch at trilliumus.com (Rob Breisch) Date: Thu, 8 Jul 2021 16:48:22 +0000 Subject: [labnetwork] reducing noise in the chase area In-Reply-To: <269b1bcf661341a5b129e0db817bd983@draper.com> References: <269b1bcf661341a5b129e0db817bd983@draper.com> Message-ID: <9973C6784F21124B9C9CD4FD39EA8D8402C8722A82@MAIL02.trilliumsubfab.com> Manish ? If you send the pump models, I would be happy let you know if silencers are available for those models, as well as if they have a factory option for enclosures. As Richard said, Ebara as well as Edwards and Pfeiffer (Acatel/Adixen) make silencers for their dry pump products (claw, multilobe, screw, and scroll). If you are running mainly oil sealed pumps (wet pumps) ? reducing the noise from those will be more challenging. For this reason, many facilities have moved to dry pumps with water cooled motors, as much of the noise generated by vacuum pumps comes from the motor fan on these air-cooled units. As Richard mentioned, you have to be careful about enclosing these, because the fan is designed to move air as any restriction of this can be problematic on air cooled units. If you have cryo pump compressors and chillers in your chase (another noise source), these also can be transitioned to water cooled to reduce some of the noise. Obviously, you need to have sufficient PCW capacity available to make these changes. One thing to check - these units always come from the factory with panels or enclosures. So, if you have these units with missing panels, that would be another good place to start. At our former factory in Austin, we had an air-cooled PCW chiller for testing water cooled pumps ? it had panels, but I found that using insulating foam tape around the edges (where the panel contacts the chassis) served to reduce panel vibration, which is sometimes another source of noise. That should not inhibit air flow for cooling - you can purchase that at your local home improvement store, Amazon, etc.. Again, if you want to share your pump models, I?d be happy to give you some info on what might be available. Regards, Rob Breisch Vice President, Sales and Marketing [email logo 3] Trillium US, Inc. My Mobile: 801-726-5035 Trillium Toll Free: 800-453-1340 Email: rob.breisch at trilliumus.com WebSite: www.trilliumus.com Follow Trillium on LinkedIn This transmission is intended for the named addressee(s) only and may contain confidential and privileged information. Reading, copying or disseminating this transmission by anyone other than the named addressee(s) is strictly prohibited. If you have received this message in error, please notify us immediately by reply e-mail or phone at (503) 682-3837. From: labnetwork On Behalf Of Morrison, Richard H., Jr Sent: Thursday, July 8, 2021 6:32 AM To: Manish Keswani ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] reducing noise in the chase area You could try to place sound enclosures around your pumps, just need to be careful of the heat buildup. Here is a link for that: https://www.acoustiblok.com/2018/05/15/vacuum-pump-noise-enclosures/?gclid=EAIaIQobChMI-prOk7zT8QIVj3xvBB1jcAmREAAYASAAEgK8XPD_BwE A lot of pump suppliers ell exhaust silencers, we did that on our EBARA pumps and really reduced the noise. Rick Richard Morrison PMTS Draper Laboratory 555 Technology Square Cambridge Ma 02139 Office: 617-258-3420 Cell: 508-930-3461 From: labnetwork > On Behalf Of Manish Keswani Sent: Thursday, July 8, 2021 6:10 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] reducing noise in the chase area Hello all, We have significant noise in the chase area due to equipment and pumps. Do you know of any sound absorbing materials that are compatible with cleanroom or other noise reduction options that are effective. Thanks so much. Manish Keswani Lawrence Livermore National Laboratory ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 7265 bytes Desc: image001.png URL: From sieb at 4dlabs.ca Thu Jul 8 13:07:14 2021 From: sieb at 4dlabs.ca (Nathanael Sieb) Date: Thu, 8 Jul 2021 10:07:14 -0700 Subject: [labnetwork] troubleshooting an e-beam source Message-ID: Hi all, We are trying to trouble-shoot a PVD e-beam source and can't seem to figure out the problem.? Early in the year we sent the assembly out for repair and refurbishment. (we burned a hole in the internal bellows tubing, long story)? When we got it back we connected it back to the system and started it up.? However, we haven't been able to get a stable emission current.? The HV stays on but the filament current, and hence emission current, occasionally cuts out.? It comes back a second later, over-shoots the target current, and then restabilizes.? It happens at low emission currents and some higher ones.? The timing is random. Sometimes it happens frequently, sometimes you can run 15 min without a problem.? There are no errors from the power supply. We took a video of the issue and it happens at around the 1min mark here . The advice from vendors was to look for a loose connection.? We have checked all the external connections and tried to look at the internal ones too.? Last week we removed the filament and reinstalled it.? We didn't see any problems and we still have the same issue. We're running out of ideas other than sending it back to the vendor to examine the entire assembly again.? Has anyone else encountered this type of problem?? Any suggestions? Thanks, Nathanael *Nathanael Sieb * Director of Operations and Administration ?| 4D LABS Simon Fraser University 8888 University Dr., Burnaby, B.C. V5A 1S6 T: 778.782.8084?| F: 778.782.3765 | www.4dlabs.ca Facebook ?| Twitter ?| LinkedIn -------------- next part -------------- An HTML attachment was scrubbed... URL: From hathaway at cns.fas.harvard.edu Thu Jul 8 13:56:11 2021 From: hathaway at cns.fas.harvard.edu (Mac Hathaway) Date: Thu, 8 Jul 2021 13:56:11 -0400 Subject: [labnetwork] Dry pumps on ALD systems? Message-ID: <0b9cf3fc-497d-1565-7d12-c545fa8e031f@cns.fas.harvard.edu> Hello Folks, I'm wondering: how many of you have tried a dry pump on your ALD system? If you have, how did it work out? If you could supply the following details, that would be great: ALD system model; Dry pump model and CFM; How long it's been running that way; Any issues you've run in to. For background, we have long been working under the assumption that, due to the reactive nature of the ALD precursors, and the abrasive nature of the effluent, PFPE-base wet pumps are the way to go.? However, we grow tired of dealing with pump oil and associated issues, and we're using dry pumps successfully elsewhere in the fab... Thanks! Mac -- Mac Hathaway Senior Process and Systems Engineer Harvard Center for Nanoscale Systems 11 Oxford St. Cambridge, MA02138 617-495-9012 -------------- next part -------------- An HTML attachment was scrubbed... URL: From jtmitch5 at ncsu.edu Thu Jul 8 16:23:34 2021 From: jtmitch5 at ncsu.edu (James Mitchell) Date: Thu, 8 Jul 2021 16:23:34 -0400 Subject: [labnetwork] troubleshooting an e-beam source In-Reply-To: References: Message-ID: Have you tried rebuilding the gun assembly? Sometimes the ceramic pieces get too much metal on them and cause a short. Replace all the ceramics and make sure your filament has good clearance. Some filaments can only go in one way because of the coil direction. Jim On Thu, Jul 8, 2021 at 3:57 PM Nathanael Sieb wrote: > Hi all, > > We are trying to trouble-shoot a PVD e-beam source and can't seem to > figure out the problem. Early in the year we sent the assembly out for > repair and refurbishment. (we burned a hole in the internal bellows tubing, > long story) When we got it back we connected it back to the system and > started it up. However, we haven't been able to get a stable emission > current. The HV stays on but the filament current, and hence emission > current, occasionally cuts out. It comes back a second later, over-shoots > the target current, and then restabilizes. It happens at low emission > currents and some higher ones. The timing is random. Sometimes it happens > frequently, sometimes you can run 15 min without a problem. There are no > errors from the power supply. > > We took a video of the issue and it happens at around the 1min mark here > . > The advice from vendors was to look for a loose connection. We have > checked all the external connections and tried to look at the internal ones > too. Last week we removed the filament and reinstalled it. We didn't see > any problems and we still have the same issue. > > We're running out of ideas other than sending it back to the vendor to > examine the entire assembly again. Has anyone else encountered this type > of problem? Any suggestions? > > Thanks, > Nathanael > > * Nathanael Sieb * > Director of Operations and Administration | 4D LABS > > Simon Fraser University > 8888 University Dr., Burnaby, B.C. V5A 1S6 > T: 778.782.8084 | F: 778.782.3765 | www.4dlabs.ca > Facebook | Twitter > | LinkedIn > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- *James Mitchell* *Specialty Trades Technician* *Dept. of Electrical and Computer Engineering* *NCSU Nanofabrication Facility* *MRC RM243A **Box 7911* *2410 Campus Shore Dr., Raleigh, NC 27606* *jtmitch5 at ncsu.edu* *Desk: 919-515-5394* *Cell: 919-717-7325* -------------- next part -------------- An HTML attachment was scrubbed... URL: From myakimov at sunypoly.edu Thu Jul 8 16:37:06 2021 From: myakimov at sunypoly.edu (Yakimov, Michael) Date: Thu, 8 Jul 2021 20:37:06 +0000 Subject: [labnetwork] troubleshooting an e-beam source In-Reply-To: References: Message-ID: <1625776626379.48159@sunypoly.edu> Hard to point a finger at test points without knowing your exact setup. Since you have filament current going to 0, not flickering, I would look at control circuitry upstream. Generic diagram of evaporator high voltage source is attached. Transformer T1 is usually a big heavy block near/under the chamber; solid state relay/triac T2 can be in the same block or in a main electronic unit. R1 is your filament. Items to check from upstream to downstream: 1. 0-5 (0-10) V from the controller (Inficon or whatever you use). 2. This voltage can pass through some emission stabilizing circuitry or something similar before coming to the triac/SSR; (I actually had to bypass that stabilizer in our machine in Thermionics HV set because of a similar issue) 3. voltage after the SSR on the primary windings of transformer - WHATCH FOR HV!!! 4. voltage at transformer output (chamber input) STRICTLY WITH HIGH VOLTAGE CABLE DISCONNECTED AT THE SOURCE!! Thanks Mike ________________________________ From: labnetwork on behalf of Nathanael Sieb Sent: Thursday, July 8, 2021 1:07 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] troubleshooting an e-beam source Hi all, We are trying to trouble-shoot a PVD e-beam source and can't seem to figure out the problem. Early in the year we sent the assembly out for repair and refurbishment. (we burned a hole in the internal bellows tubing, long story) When we got it back we connected it back to the system and started it up. However, we haven't been able to get a stable emission current. The HV stays on but the filament current, and hence emission current, occasionally cuts out. It comes back a second later, over-shoots the target current, and then restabilizes. It happens at low emission currents and some higher ones. The timing is random. Sometimes it happens frequently, sometimes you can run 15 min without a problem. There are no errors from the power supply. We took a video of the issue and it happens at around the 1min mark here. The advice from vendors was to look for a loose connection. We have checked all the external connections and tried to look at the internal ones too. Last week we removed the filament and reinstalled it. We didn't see any problems and we still have the same issue. We're running out of ideas other than sending it back to the vendor to examine the entire assembly again. Has anyone else encountered this type of problem? Any suggestions? Thanks, Nathanael Nathanael Sieb Director of Operations and Administration | 4D LABS Simon Fraser University 8888 University Dr., Burnaby, B.C. V5A 1S6 T: 778.782.8084 | F: 778.782.3765 | www.4dlabs.ca Facebook | Twitter | LinkedIn [http://www.4dlabs.ca/content/dam/sfu/4dlabs/images/SFU_4DLabs_logo.png] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: evaporator.png Type: image/png Size: 17609 bytes Desc: evaporator.png URL: From bgila at ufl.edu Thu Jul 8 17:25:44 2021 From: bgila at ufl.edu (Gila,Brent P) Date: Thu, 8 Jul 2021 17:25:44 -0400 Subject: [labnetwork] Dry pumps on ALD systems? In-Reply-To: <0b9cf3fc-497d-1565-7d12-c545fa8e031f@cns.fas.harvard.edu> References: <0b9cf3fc-497d-1565-7d12-c545fa8e031f@cns.fas.harvard.edu> Message-ID: Hello Mac, We have been running an Edwards QDP80 dry pump (56CFM, 7mTorr) on our Fiji 200 ALD for several years now, no issues.? The Fiji 200 came with a different manufacturer dry pump and we switched over to this when it died.? We did not have to change any of process recipes, the Edwards QDP80 matched up well with the original pump. The Edwards QDP80 has been our go to pump for many applications and there are a lot of these pumps on the secondary/remanufactured market. Best Regards, Brent -- Brent P. Gila, PhD. Associate Director, Research Service Centers University of Florida 1041 Center Drive Gainesville, Florida 32611 Tel:352-273-2245,? Fax:352-846-2877 email: bgila at ufl.edu On 7/8/2021 1:56 PM, Mac Hathaway wrote: > *[External Email]* > > Hello Folks, > > I'm wondering: how many of you have tried a dry pump on your ALD system? > > If you have, how did it work out? > > If you could supply the following details, that would be great: > > ALD system model; > > Dry pump model and CFM; > > How long it's been running that way; > > Any issues you've run in to. > > For background, we have long been working under the assumption that, > due to the reactive nature of the ALD precursors, and the abrasive > nature of the effluent, PFPE-base wet pumps are the way to go.? > However, we grow tired of dealing with pump oil and associated issues, > and we're using dry pumps successfully elsewhere in the fab... > > Thanks! > > Mac > > > -- > > Mac Hathaway > > Senior Process and Systems Engineer > > Harvard Center for Nanoscale Systems > > 11 Oxford St. > > Cambridge, MA02138 > > 617-495-9012 > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://urldefense.proofpoint.com/v2/url?u=https-3A__mtl.mit.edu_mailman_listinfo.cgi_labnetwork&d=DwICAg&c=sJ6xIWYx-zLMB3EPkvcnVg&r=gl_2fLZA_-_JfH_dOmx7ug&m=lYQwwoPICv4lYEHWZDQXGw00lAO0MfD4aOq9BrpNpzU&s=CV3leBWD8qeArVtYlOlZXHoX52QcYWLJ8tCuEyhBfZE&e= -------------- next part -------------- An HTML attachment was scrubbed... URL: From spaolini at cns.fas.harvard.edu Thu Jul 8 18:16:43 2021 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Thu, 8 Jul 2021 22:16:43 +0000 Subject: [labnetwork] troubleshooting an e-beam source In-Reply-To: References: Message-ID: Nathanael, Does it stabilize at low power? Does it get worse at high power? I would be highly suspicious of your HV feedthroughs. You state that you removed the "assembly" in which I presume is the E-beam gun and hearth. By doing this, you would have to had removed the HV leads off the feedthroughs. It is very easy and not noticeable to crack the ceramic insulators when reinstalling the leads. There is also a good chance after disturbing them that you unintentionally made a path to ground with any leftover metal debris. Shut down the HV power supply and lock it out. Ground the atmosphere side leads with a "chicken stick" to ensure there is no power present and remove the atmosphere side leads. Next, remove the vacuum side HV leads and check the center post of each feedthrough to ground with an Ohmmeter. The reading must be infinity. A better way to do this is with a Megger since you can test insulation properties with the power the Megger has. I hope this helps, Equipment Dood ________________________________ From: labnetwork on behalf of Nathanael Sieb Sent: Thursday, July 8, 2021 2:07 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] troubleshooting an e-beam source Hi all, We are trying to trouble-shoot a PVD e-beam source and can't seem to figure out the problem. Early in the year we sent the assembly out for repair and refurbishment. (we burned a hole in the internal bellows tubing, long story) When we got it back we connected it back to the system and started it up. However, we haven't been able to get a stable emission current. The HV stays on but the filament current, and hence emission current, occasionally cuts out. It comes back a second later, over-shoots the target current, and then restabilizes. It happens at low emission currents and some higher ones. The timing is random. Sometimes it happens frequently, sometimes you can run 15 min without a problem. There are no errors from the power supply. We took a video of the issue and it happens at around the 1min mark here. The advice from vendors was to look for a loose connection. We have checked all the external connections and tried to look at the internal ones too. Last week we removed the filament and reinstalled it. We didn't see any problems and we still have the same issue. We're running out of ideas other than sending it back to the vendor to examine the entire assembly again. Has anyone else encountered this type of problem? Any suggestions? Thanks, Nathanael Nathanael Sieb Director of Operations and Administration | 4D LABS Simon Fraser University 8888 University Dr., Burnaby, B.C. V5A 1S6 T: 778.782.8084 | F: 778.782.3765 | www.4dlabs.ca Facebook | Twitter | LinkedIn [http://www.4dlabs.ca/content/dam/sfu/4dlabs/images/SFU_4DLabs_logo.png] -------------- next part -------------- An HTML attachment was scrubbed... URL: From info at fabsurplus.com Fri Jul 9 04:13:33 2021 From: info at fabsurplus.com (Stephen Howe) Date: Fri, 09 Jul 2021 10:13:33 +0200 Subject: [labnetwork] troubleshooting an e-beam source In-Reply-To: References: Message-ID: In my opinion, you need to study the problem more methodically using the data you have to find the cause of the problem.For starters I would plot graphs of how all the parameters you are measuring change during the incident, which should allow you to see what is causing the problem.I would guess it looks like a high voltage breakdown.That can be often due to bad insulation or a vacuum problem . A part of a high voltage circuit that often fails is the driver part for the signals which end up sitting at high voltage.As the control signals go from the part of the circuits at low voltage to the part of the circuits at high voltage, they have to pass through some kind of transformer, which can suffer from problems of large back emfs , which can blow the drivers. Yours sincerely, SDI Fabsurplus GroupStephen HoweCompany Owneremail: info at fabsurplus.comMobile (USA) : +1 830-388-1071Mobile (Italy) : +39 335-710-7756WWW.FABSURPLUS.COMYour Marketplace for Used Semiconductor Equipment On Thu, 2021-07-08 at 10:07 -0700, Nathanael Sieb wrote: > Hi all, > > We are trying to trouble-shoot a PVD e-beam source and can't seem > to figure out the problem. Early in the year we sent the > assembly > out for repair and refurbishment. (we burned a hole in the > internal bellows tubing, long story) When we got it back we > connected it back to the system and started it up. However, we > haven't been able to get a stable emission current. The HV > stays > on but the filament current, and hence emission current, > occasionally cuts out. It comes back a second later, over- > shoots > the target current, and then restabilizes. It happens at low > emission currents and some higher ones. The timing is random. > Sometimes it happens frequently, sometimes you can run 15 min > without a problem. There are no errors from the power supply. > > > > We took a video of the issue and it happens at around the 1min > mark here. > The advice from vendors was to look for a loose connection. We > have checked all the external connections and tried to look at > the > internal ones too. Last week we removed the filament and > reinstalled it. We didn't see any problems and we still have > the > same issue. > > We're running out of ideas other than sending it back to the > vendor to examine the entire assembly again. Has anyone else > encountered this type of problem? Any suggestions? > > Thanks, > > Nathanael > > > > > > > > Nathanael Sieb > > Director of > Operations and Administration | 4D LABS > > > Simon Fraser University > > 8888 University Dr., Burnaby, B.C. V5A 1S6 > > > T: 778.782.8084 | F: 778.782.3765 | www.4dlabs.ca > > > Facebook | Twitter | > LinkedIn > > > > > > > > _______________________________________________labnetwork mailing > listlabnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From r.khanna at ucl.ac.uk Fri Jul 9 08:51:10 2021 From: r.khanna at ucl.ac.uk (Khanna, Rohit) Date: Fri, 9 Jul 2021 12:51:10 +0000 Subject: [labnetwork] troubleshooting an e-beam source In-Reply-To: References: , Message-ID: Hi, Based on the video that was shared, I suspect there is an issue with the filament current. To begin with I am not sure how thick the filament is and 26 Amp seems on the high side. Check the manual if the filament is rated to work at such high currents. Secondly check the the power supply that runs the filament as in the video there was a dip in the filament current before the emission current dipped. The emission current is highly dependent on the filament temperature which depends on the filament current. For 26-30 amp filament current the cable should be fairly thick and any issue with the vacuum feed thru or connector (corroded or oxidized will lead to localized heating or melting). Check the cable connector and filament power supply before sensing the unit back. Warm Regards Rohit Khanna Electronic Test & Measurement Engineer London Centre for NANO Technology, UCL Ph:+44-020-76799984 Int Ext: 39984 ________________________________ From: labnetwork on behalf of Stephen Howe Sent: 09 July 2021 09:13 To: Nathanael Sieb ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] troubleshooting an e-beam source In my opinion, you need to study the problem more methodically using the data you have to find the cause of the problem. For starters I would plot graphs of how all the parameters you are measuring change during the incident, which should allow you to see what is causing the problem. I would guess it looks like a high voltage breakdown. That can be often due to bad insulation or a vacuum problem . A part of a high voltage circuit that often fails is the driver part for the signals which end up sitting at high voltage. As the control signals go from the part of the circuits at low voltage to the part of the circuits at high voltage, they have to pass through some kind of transformer, which can suffer from problems of large back emfs , which can blow the drivers. Yours sincerely, SDI Fabsurplus Group Stephen Howe Company Owner email: info at fabsurplus.com Mobile (USA) : +1 830-388-1071 Mobile (Italy) : +39 335-710-7756 WWW.FABSURPLUS.COM Your Marketplace for Used Semiconductor Equipment On Thu, 2021-07-08 at 10:07 -0700, Nathanael Sieb wrote: Hi all, We are trying to trouble-shoot a PVD e-beam source and can't seem to figure out the problem. Early in the year we sent the assembly out for repair and refurbishment. (we burned a hole in the internal bellows tubing, long story) When we got it back we connected it back to the system and started it up. However, we haven't been able to get a stable emission current. The HV stays on but the filament current, and hence emission current, occasionally cuts out. It comes back a second later, over-shoots the target current, and then restabilizes. It happens at low emission currents and some higher ones. The timing is random. Sometimes it happens frequently, sometimes you can run 15 min without a problem. There are no errors from the power supply. We took a video of the issue and it happens at around the 1min mark here. The advice from vendors was to look for a loose connection. We have checked all the external connections and tried to look at the internal ones too. Last week we removed the filament and reinstalled it. We didn't see any problems and we still have the same issue. We're running out of ideas other than sending it back to the vendor to examine the entire assembly again. Has anyone else encountered this type of problem? Any suggestions? Thanks, Nathanael Nathanael Sieb Director of Operations and Administration | 4D LABS Simon Fraser University 8888 University Dr., Burnaby, B.C. V5A 1S6 T: 778.782.8084 | F: 778.782.3765 | www.4dlabs.ca Facebook | Twitter | LinkedIn [http://www.4dlabs.ca/content/dam/sfu/4dlabs/images/SFU_4DLabs_logo.png] _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From codreanu at udel.edu Fri Jul 9 10:38:23 2021 From: codreanu at udel.edu (Iulian Codreanu) Date: Fri, 9 Jul 2021 10:38:23 -0400 Subject: [labnetwork] Dry pumps on ALD systems? In-Reply-To: <0b9cf3fc-497d-1565-7d12-c545fa8e031f@cns.fas.harvard.edu> References: <0b9cf3fc-497d-1565-7d12-c545fa8e031f@cns.fas.harvard.edu> Message-ID: Hi Mac, Our FlexAL came with an Adixen ADS 602P four years ago. At some point the service engineer had to adjust a breaker inside the tool's power box to allow the pump to draw more current at startup. Cheers, Iulian iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 7/8/2021 1:56 PM, Mac Hathaway wrote: > Hello Folks, > > I'm wondering: how many of you have tried a dry pump on your ALD system? > > If you have, how did it work out? > > If you could supply the following details, that would be great: > > ALD system model; > > Dry pump model and CFM; > > How long it's been running that way; > > Any issues you've run in to. > > For background, we have long been working under the assumption that, > due to the reactive nature of the ALD precursors, and the abrasive > nature of the effluent, PFPE-base wet pumps are the way to go. > However, we grow tired of dealing with pump oil and associated issues, > and we're using dry pumps successfully elsewhere in the fab... > > Thanks! > > Mac > > > -- > > Mac Hathaway > > Senior Process and Systems Engineer > > Harvard Center for Nanoscale Systems > > 11 Oxford St. > > Cambridge, MA02138 > > 617-495-9012 > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From mapril at draper.com Fri Jul 9 11:47:27 2021 From: mapril at draper.com (April, Mark R.) Date: Fri, 9 Jul 2021 15:47:27 +0000 Subject: [labnetwork] Dry pumps on ALD systems? In-Reply-To: References: <0b9cf3fc-497d-1565-7d12-c545fa8e031f@cns.fas.harvard.edu> Message-ID: <00e5208ee3154211bcbc47219fa34204@draper.com> Hi Mac, I have an Ebara A10S dry pump connected to the ALD system at Draper. Prior to the dry pump, I have a multi-trap with a SS gauze filter and an activated charcoal filter element. The dry pump has been in operation since the purchase of the ALD in 2013 and we have not had any issues Thanks Mark R. April Senior Equipment Engineer Microfabrication Laboratory [color_logo_small4] 555 Technology Square Cambridge, MA 02139 mapril at draper.com O # 617-258-1613 C # 617-455-1596 www.draper.com From: labnetwork On Behalf Of Iulian Codreanu Sent: Friday, July 9, 2021 10:38 AM To: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Dry pumps on ALD systems? Hi Mac, Our FlexAL came with an Adixen ADS 602P four years ago. At some point the service engineer had to adjust a breaker inside the tool's power box to allow the pump to draw more current at startup. Cheers, Iulian iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 7/8/2021 1:56 PM, Mac Hathaway wrote: Hello Folks, I'm wondering: how many of you have tried a dry pump on your ALD system? If you have, how did it work out? If you could supply the following details, that would be great: ALD system model; Dry pump model and CFM; How long it's been running that way; Any issues you've run in to. For background, we have long been working under the assumption that, due to the reactive nature of the ALD precursors, and the abrasive nature of the effluent, PFPE-base wet pumps are the way to go. However, we grow tired of dealing with pump oil and associated issues, and we're using dry pumps successfully elsewhere in the fab... Thanks! Mac -- Mac Hathaway Senior Process and Systems Engineer Harvard Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617-495-9012 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 1560 bytes Desc: image001.png URL: From codreanu at udel.edu Fri Jul 9 11:53:59 2021 From: codreanu at udel.edu (Iulian Codreanu) Date: Fri, 9 Jul 2021 11:53:59 -0400 Subject: [labnetwork] Dry pumps on ALD systems? In-Reply-To: <00e5208ee3154211bcbc47219fa34204@draper.com> References: <0b9cf3fc-497d-1565-7d12-c545fa8e031f@cns.fas.harvard.edu> <00e5208ee3154211bcbc47219fa34204@draper.com> Message-ID: Mark's note reminded me that I also have a precursor foreline trap (Mass-Vac 355063). iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 7/9/2021 11:47 AM, April, Mark R. wrote: > > Hi Mac, > > I have an Ebara ?A10S dry pump connected to the ALD system at Draper.? > Prior to the dry pump, I have a multi-trap with a SS gauze filter and > an activated charcoal filter element. > > The dry pump has been in operation since the purchase of the ALD in > 2013 and we have not had any issues > > Thanks > > *Mark R. April* > Senior Equipment Engineer > > Microfabrication Laboratory > color_logo_small4/ > 555 Technology Square/ > > /Cambridge, MA 02139/ > > /mapril at draper.com / > > /O # 617-258-1613 C # 617-455-1596/ > > /www.draper.com / > > *From:* labnetwork *On Behalf Of > *Iulian Codreanu > *Sent:* Friday, July 9, 2021 10:38 AM > *To:* labnetwork at mtl.mit.edu > *Subject:* Re: [labnetwork] Dry pumps on ALD systems? > > Hi Mac, > > Our FlexAL came with an Adixen ADS 602P four years ago. At some point > the service engineer had to adjust a breaker inside the tool's power > box to allow the pump to draw more current at startup. > > Cheers, > > Iulian > > > iulian Codreanu, Ph.D. > Director, Nanofabrication Facility > University of Delaware > Harker ISE Lab, Room 163 > 221 Academy Street > Newark, DE 19716 > 302-831-2784 > http://udnf.udel.edu > > On 7/8/2021 1:56 PM, Mac Hathaway wrote: > > Hello Folks, > > I'm wondering: how many of you have tried a dry pump on your ALD > system? > > If you have, how did it work out? > > If you could supply the following details, that would be great: > > ALD system model; > > Dry pump model and CFM; > > How long it's been running that way; > > Any issues you've run in to. > > For background, we have long been working under the assumption > that, due to the reactive nature of the ALD precursors, and the > abrasive nature of the effluent, PFPE-base wet pumps are the way > to go.? However, we grow tired of dealing with pump oil and > associated issues, and we're using dry pumps successfully > elsewhere in the fab... > > Thanks! > > Mac > > -- > > Mac Hathaway > > Senior Process and Systems Engineer > > Harvard Center for Nanoscale Systems > > 11 Oxford St. > > Cambridge, MA? 02138 > > 617-495-9012 > > > > _______________________________________________ > > labnetwork mailing list > > labnetwork at mtl.mit.edu > > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > ------------------------------------------------------------------------ > Notice: This email and any attachments may contain proprietary (Draper > non-public) and/or export-controlled information of Draper. If you are > not the intended recipient of this email, please immediately notify > the sender by replying to this email and immediately destroy all > copies of this email. > ------------------------------------------------------------------------ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 1560 bytes Desc: not available URL: From demis at ucsb.edu Fri Jul 9 11:59:34 2021 From: demis at ucsb.edu (Demis D. John) Date: Fri, 9 Jul 2021 08:59:34 -0700 Subject: [labnetwork] troubleshooting an e-beam source In-Reply-To: References: Message-ID: I think what you see in the video, when the Emissions current spikes to ~130mA, is an electrical arc - the HV suddenly arcs to ground or somewhere. Looks for burn marks around insulators etc. to see if you can locate the arcing region. I agree to check the ceramic insulators- miniscule fractures or metal coating could cause such arcs. On our Ion-beam dep, we've found that hard to see cracks in the many ceramic insulators around wiring will enable similar arcing, causing Currents to spike like in your video ? the power supply then faults temporarily (for a split second), shutting it off and then attempts to recover back to the setpoint. -- Demis ---------------------------------------- * Process Scientist Manager* *UCSB Nanofabrication Facility* Demis' Contact Info ---------------------------------------- *Reminder*: The NanoFab has a publications policy On Fri, Jul 9, 2021 at 8:41 AM Khanna, Rohit wrote: > Hi, > Based on the video that was shared, I suspect there is an issue with > the filament current. > To begin with I am not sure how thick the filament is and 26 Amp seems on > the high side. > Check the manual if the filament is rated to work at such high currents. > Secondly check the > the power supply that runs the filament as in the video there was a dip in > the filament current > before the emission current dipped. The emission current is highly > dependent on the filament temperature > which depends on the filament current. For 26-30 amp filament current the > cable should be fairly thick and > any issue with the vacuum feed thru or connector (corroded or oxidized > will lead to localized heating or melting). > Check the cable connector and filament power supply before sensing the > unit back. > > > Warm Regards > Rohit Khanna > Electronic Test & Measurement Engineer > London Centre for NANO Technology, UCL > Ph:+44-020-76799984 > Int Ext: 39984 > > ------------------------------ > *From:* labnetwork on behalf of Stephen > Howe > *Sent:* 09 July 2021 09:13 > *To:* Nathanael Sieb ; labnetwork at mtl.mit.edu < > labnetwork at mtl.mit.edu> > *Subject:* Re: [labnetwork] troubleshooting an e-beam source > > In my opinion, you need to study the problem more methodically using the > data you have to find the cause of the problem. > For starters I would plot graphs of how all the parameters you are > measuring change during the incident, which should allow you to see what is > causing the problem. > I would guess it looks like a high voltage breakdown. > That can be often due to bad insulation or a vacuum problem . > A part of a high voltage circuit that often fails is the driver part for > the signals which end up sitting at high voltage. > As the control signals go from the part of the circuits at low voltage to > the part of the circuits at high voltage, they have to pass through some > kind of transformer, which can suffer from problems of large back emfs , > which can blow the drivers. > > Yours sincerely, > > SDI Fabsurplus Group > Stephen Howe > Company Owner > email: info at fabsurplus.com > Mobile (USA) : +1 830-388-1071 > Mobile (Italy) : +39 335-710-7756 > WWW.FABSURPLUS.COM > Your Marketplace for Used Semiconductor Equipment > > > On Thu, 2021-07-08 at 10:07 -0700, Nathanael Sieb wrote: > > Hi all, > > We are trying to trouble-shoot a PVD e-beam source and can't seem to > figure out the problem. Early in the year we sent the assembly out for > repair and refurbishment. (we burned a hole in the internal bellows tubing, > long story) When we got it back we connected it back to the system and > started it up. However, we haven't been able to get a stable emission > current. The HV stays on but the filament current, and hence emission > current, occasionally cuts out. It comes back a second later, over-shoots > the target current, and then restabilizes. It happens at low emission > currents and some higher ones. The timing is random. Sometimes it happens > frequently, sometimes you can run 15 min without a problem. There are no > errors from the power supply. > > We took a video of the issue and it happens at around the 1min mark here > . > The advice from vendors was to look for a loose connection. We have > checked all the external connections and tried to look at the internal ones > too. Last week we removed the filament and reinstalled it. We didn't see > any problems and we still have the same issue. > > We're running out of ideas other than sending it back to the vendor to > examine the entire assembly again. Has anyone else encountered this type > of problem? Any suggestions? > > Thanks, > Nathanael > > *Nathanael Sieb * > Director of Operations and Administration | 4D LABS > > Simon Fraser University > 8888 University Dr., Burnaby, B.C. V5A 1S6 > T: 778.782.8084 | F: 778.782.3765 | www.4dlabs.ca > > Facebook > | > Twitter | LinkedIn > > > _______________________________________________ > > labnetwork mailing list > > labnetwork at mtl.mit.edu > > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From travisgabel at boisestate.edu Fri Jul 9 15:08:24 2021 From: travisgabel at boisestate.edu (Travis Gabel) Date: Fri, 9 Jul 2021 13:08:24 -0600 Subject: [labnetwork] 100mm wafer 2um TEOS Message-ID: Hi We had an inquiry for 2um of TEOS on 100mm wafers. We don't have teos capability in the IML so I am reaching out to the lab network to see if anyone has teos process capability in their lab. The customer is looking for 50 wafers to be processed. If anyone has the capability please let me know and I will pass along your contact information. Thanks Travis -------------- next part -------------- An HTML attachment was scrubbed... URL: From michael.martin at louisville.edu Fri Jul 9 17:03:58 2021 From: michael.martin at louisville.edu (Martin,Michael David) Date: Fri, 9 Jul 2021 21:03:58 +0000 Subject: [labnetwork] 100mm wafer 2um TEOS In-Reply-To: References: Message-ID: Hi Travis, We can do PECVD TEOS. We just installed a new bubbler. Please forward my contact info if you like. Regards, Michael ________________________________ From: labnetwork on behalf of Travis Gabel Sent: Friday, July 9, 2021 3:08 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] 100mm wafer 2um TEOS CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Hi We had an inquiry for 2um of TEOS on 100mm wafers. We don't have teos capability in the IML so I am reaching out to the lab network to see if anyone has teos process capability in their lab. The customer is looking for 50 wafers to be processed. If anyone has the capability please let me know and I will pass along your contact information. Thanks Travis -------------- next part -------------- An HTML attachment was scrubbed... URL: From john.snyder at redwaveenergy.com Sun Jul 11 16:02:27 2021 From: john.snyder at redwaveenergy.com (John Snyder) Date: Sun, 11 Jul 2021 15:02:27 -0500 Subject: [labnetwork] Venture-funded startup looking to hire a wafer process engineer/technician to work at the University of Michigan in Ann Arbor Message-ID: [image: image.png] *SEMICONDUCTOR WAFER PROCESS ENGINEER* RedWave Energy Inc, a venture-funded Colorado-based startup in the field of energy harvesting, is seeking qualified candidates for the role of semiconductor/wafer process engineer/technician to work at the Lurie Nanofabrication Facility (LNF) at the University of Michigan in Ann Arbor, MI. Essential responsibilities include: ? Support a successful fabrication process transfer to the LNF toolset ? Perform engineering experiments in coordination with other team members ? Ability to conduct work independently with regular remote input from Colorado engineering team. ? Actively participate in continuous improvement processes with the Colorado-based engineering team. ? Actively participate in initial and recurrent training on semiconductor toolset(s); Attain high proficiency with the LNF toolset(s) ? Process wafers using defined procedures ? Monitor, control, and qualify equipment & processes ? React to error messages of factory systems and/or equipment ? Operate metrology / inspection equipment and interpret results ? Perform visual inspections (quality check) ? Recover from process and tool interruptions ? Identify and address potential areas for improvement and optimize tool availability, cycle time, utilization and cost ? Complete all required reporting and documentation ? Understand and follow all health, safety, and environmental procedures and requirements ? Ensure RedWave remains a respected member of the LNF community by conducting your work with care, integrity, and respect for those we share the facility with. After completing work, ensure workspace, materials, and tools are tidy/clean for next user(s) *POSITION QUALIFICATIONS:* ? A Bachelor?s Degree in Electrical or Chemical Engineering, or related technical field (ie: Engineering, Physics, etc.) is required ? 3 months? experience working with silicon wafers in a clean room environment required ? Able to work in a cleanroom environment and abide by facility requirements required ? Able to wear all required clean room protective clothing and equipment for normal (8 hour) shift (excluding breaks) required ? Ability to perform work in a standing position for majority of shift (excluding breaks) required ? Able to lift a minimum of 20 pounds on a periodic basis throughout the shift required ? An advanced degree in Electrical or Chemical Engineering, or related technical field (ie: Engineering, Physics, etc.) preferred. ? 3 or more years? experience working with silicon wafers in a clean room environment preferred. ? Demonstrated technical skills and knowledge of processing and process equipment preferred ? Experience working in the clean room at LNF preferred ? Demonstrated technical skills and knowledge of processing and process equipment, including photolithography, etching, deposition of metal and dielectric films, furnace anneals, wet cleans, and the like preferred. This is a full time role which includes benefits. Compensation will be commensurate with education and experience. If interested, please email us at humanresources at redwaveenergy.com (or respond to this email) with an updated resume and cover letter. We look forward to hearing from you! -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 16392 bytes Desc: not available URL: From zlewicka at princeton.edu Mon Jul 12 09:54:31 2021 From: zlewicka at princeton.edu (Zuzanna A. Lewicka) Date: Mon, 12 Jul 2021 13:54:31 +0000 Subject: [labnetwork] Dry pumps on ALD systems? In-Reply-To: References: <0b9cf3fc-497d-1565-7d12-c545fa8e031f@cns.fas.harvard.edu> <00e5208ee3154211bcbc47219fa34204@draper.com> Message-ID: Hello, We have recently upgraded our thermal ALD (Savannah 100) unit and installed Edwards dry scroll pump nxds15ic (8.8 CFM) with heated ALD trap provided by Veeco. So far, we have run about 25,000 cycles with no issues. Best regards, Zuzanna Lewicka Princeton University From: labnetwork On Behalf Of Iulian Codreanu Sent: Friday, July 9, 2021 11:54 AM To: April, Mark R. ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Dry pumps on ALD systems? Mark's note reminded me that I also have a precursor foreline trap (Mass-Vac 355063). iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 7/9/2021 11:47 AM, April, Mark R. wrote: Hi Mac, I have an Ebara A10S dry pump connected to the ALD system at Draper. Prior to the dry pump, I have a multi-trap with a SS gauze filter and an activated charcoal filter element. The dry pump has been in operation since the purchase of the ALD in 2013 and we have not had any issues Thanks Mark R. April Senior Equipment Engineer Microfabrication Laboratory [color_logo_small4] 555 Technology Square Cambridge, MA 02139 mapril at draper.com O # 617-258-1613 C # 617-455-1596 www.draper.com From: labnetwork On Behalf Of Iulian Codreanu Sent: Friday, July 9, 2021 10:38 AM To: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Dry pumps on ALD systems? Hi Mac, Our FlexAL came with an Adixen ADS 602P four years ago. At some point the service engineer had to adjust a breaker inside the tool's power box to allow the pump to draw more current at startup. Cheers, Iulian iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 7/8/2021 1:56 PM, Mac Hathaway wrote: Hello Folks, I'm wondering: how many of you have tried a dry pump on your ALD system? If you have, how did it work out? If you could supply the following details, that would be great: ALD system model; Dry pump model and CFM; How long it's been running that way; Any issues you've run in to. For background, we have long been working under the assumption that, due to the reactive nature of the ALD precursors, and the abrasive nature of the effluent, PFPE-base wet pumps are the way to go. However, we grow tired of dealing with pump oil and associated issues, and we're using dry pumps successfully elsewhere in the fab... Thanks! Mac -- Mac Hathaway Senior Process and Systems Engineer Harvard Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617-495-9012 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 1560 bytes Desc: image001.png URL: From diadiuk at mit.edu Mon Jul 12 13:24:05 2021 From: diadiuk at mit.edu (Vicky Diadiuk) Date: Mon, 12 Jul 2021 17:24:05 +0000 Subject: [labnetwork] Gaertner ellipsometer Message-ID: Hi, We have a working Gaertner ellipsometer, Model L116B, free to good home (shipping paid by acquirer). It?s available immediately. Pls reply directly to me at diadiuk at mit.edu [pls don?t spam the entire network :) ] Thx, Vicky Diadiuk From smalvea at lsu.edu Mon Jul 12 14:38:30 2021 From: smalvea at lsu.edu (Shaloma M Malveaux) Date: Mon, 12 Jul 2021 18:38:30 +0000 Subject: [labnetwork] Vacuum Oven Controls Message-ID: Are there any labs using controllers to program heat, ramp, dwell and cool down parameters for vacuum ovens or other heating sources? If so, what is a recommended brand that is easily programmed from the controller? Also, interested in companies that have reliable technical support and repair service. We have a Heraeus brand vacuum oven. Shaloma Malveaux Louisiana State University/CAMD Nanofabrication Facility (NFF) 6980 Jefferson Highway Baton Rouge, LA 70806 Phone: (225) 578-9343 lsu.edu/nanofabrication -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Mon Jul 12 17:21:10 2021 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Mon, 12 Jul 2021 21:21:10 +0000 Subject: [labnetwork] Vacuum Oven Controls In-Reply-To: References: Message-ID: Hi, We use the little controllers from Omega see the link below, they work great. https://www.omega.com/en-us/control-monitoring/controllers/c/pid-controllers Rick Richard Morrison PMTS Draper Laboratory 555 Technology Square Cambridge Ma 02139 Office: 617-258-3420 Cell: 508-930-3461 From: labnetwork On Behalf Of Shaloma M Malveaux Sent: Monday, July 12, 2021 2:39 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Vacuum Oven Controls Are there any labs using controllers to program heat, ramp, dwell and cool down parameters for vacuum ovens or other heating sources? If so, what is a recommended brand that is easily programmed from the controller? Also, interested in companies that have reliable technical support and repair service. We have a Heraeus brand vacuum oven. Shaloma Malveaux Louisiana State University/CAMD Nanofabrication Facility (NFF) 6980 Jefferson Highway Baton Rouge, LA 70806 Phone: (225) 578-9343 lsu.edu/nanofabrication ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From johnkym at ee.columbia.edu Mon Jul 12 21:53:18 2021 From: johnkym at ee.columbia.edu (Ioannis (John) Kymissis) Date: Mon, 12 Jul 2021 21:53:18 -0400 Subject: [labnetwork] Vacuum Oven Controls In-Reply-To: References: Message-ID: Let me second this suggestion - We use these extremely similar Delta 1/32 DIN controllers in nearly everything we build- which model makes sense depends on what power supply you have available (and how much current you are switching). All of these (including the Omegas) can be programmed from the front panel or over RS485, can do cooling and heating, and have autotune, etc. https://www.factorymation.com/shop?keywords=delta+controllers They are cheap enough that I have used them as a standalone thermocouple readout.... Thanks, -John ----- Ioannis (John) Kymissis Kenneth Brayer Professor of Electrical Engineering Chair, Department of Electrical Engineering Columbia University SEAS 500 W120th Street Room 1300/MC 4712 New York, NY 10027 Tel/Fax/SMS: (212) 853-8561 johnkym at ee.columbia.edu http://kymissis.columbia.edu On Mon, Jul 12, 2021 at 7:37 PM Morrison, Richard H., Jr < rmorrison at draper.com> wrote: > Hi, > > > > We use the little controllers from Omega see the link below, they work > great. > > > > > https://www.omega.com/en-us/control-monitoring/controllers/c/pid-controllers > > > > Rick > > > > > > Richard Morrison > > PMTS > > Draper Laboratory > > 555 Technology Square > > Cambridge Ma 02139 > > Office: 617-258-3420 > > Cell: 508-930-3461 > > > > > > > > *From:* labnetwork * On Behalf Of *Shaloma > M Malveaux > *Sent:* Monday, July 12, 2021 2:39 PM > *To:* labnetwork at mtl.mit.edu > *Subject:* [labnetwork] Vacuum Oven Controls > > > > Are there any labs using controllers to program heat, ramp, dwell and cool > down parameters for vacuum ovens or other heating sources? If so, what is > a recommended brand that is easily programmed from the controller? Also, > interested in companies that have reliable technical support and repair > service. We have a Heraeus brand vacuum oven. > > > > Shaloma Malveaux > > Louisiana State University/CAMD > > Nanofabrication Facility (NFF) > > 6980 Jefferson Highway > > Baton Rouge, LA 70806 > > Phone: (225) 578-9343 > > lsu.edu/nanofabrication > > > ------------------------------ > Notice: This email and any attachments may contain proprietary (Draper > non-public) and/or export-controlled information of Draper. If you are not > the intended recipient of this email, please immediately notify the sender > by replying to this email and immediately destroy all copies of this email. > ------------------------------ > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From blewis at eng.ufl.edu Tue Jul 13 08:57:52 2021 From: blewis at eng.ufl.edu (Lewis,William) Date: Tue, 13 Jul 2021 12:57:52 +0000 Subject: [labnetwork] Supplier for BCL3 in lecture bottles Message-ID: Hi Everyone, Anyone know of a source for BCL3 in lecture bottles. Matheson has quoted a 40 day lead time and we would like to get one sooner. Bill Lewis Research Service Center University of Florida walewis at ufl.edu https://rsc.aux.eng.ufl.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From sb86922 at usc.edu Tue Jul 13 19:36:58 2021 From: sb86922 at usc.edu (Shivakumar Bhaskaran) Date: Tue, 13 Jul 2021 23:36:58 +0000 Subject: [labnetwork] TMAH Alternatives Message-ID: Hi All, Before we completely stop using the TMAH. I would like to know whether anyone found alternative to TMAH. Thanks Shiva Associate Director, John D. O'Brien Nanofabrication Laboratory Michelson Hall, 1002 Childs Way, MCB LL121, Los Angeles, California 90089, 213 821 2374 [Sign] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 2931 bytes Desc: image001.jpg URL: From nabeel.aslam at kaust.edu.sa Wed Jul 14 10:27:49 2021 From: nabeel.aslam at kaust.edu.sa (Nabeel Aslam) Date: Wed, 14 Jul 2021 14:27:49 +0000 Subject: [labnetwork] TMAH Alternatives In-Reply-To: References: Message-ID: <60087b0542714fb79c7a09d16e847eee@SCBMCHP06.kaustcloud.com> Hi Shiva, There are some alternative with respect to decomposition and VP. [cid:image001.jpg at 01D778D5.902CEEF0] Regards Nabeel From: labnetwork On Behalf Of Shivakumar Bhaskaran Sent: Wednesday, 14 July 2021 02:37 To: labnetwork at mtl.mit.edu Subject: [labnetwork] TMAH Alternatives Hi All, Before we completely stop using the TMAH. I would like to know whether anyone found alternative to TMAH. Thanks Shiva Associate Director, John D. O'Brien Nanofabrication Laboratory Michelson Hall, 1002 Childs Way, MCB LL121, Los Angeles, California 90089, 213 821 2374 [Sign] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 56811 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image004.jpg Type: image/jpeg Size: 4151 bytes Desc: image004.jpg URL: From michael.martin at louisville.edu Wed Jul 14 10:40:16 2021 From: michael.martin at louisville.edu (Martin,Michael David) Date: Wed, 14 Jul 2021 14:40:16 +0000 Subject: [labnetwork] TDMAS SiO2 recipe on a Beneq system Message-ID: Hi guys, Would anyone be willing to share process details for using TDMAS (Tris(dimethylamino)silane) on a Beneq ALD system? Beneq tells me they do not have experience with that precursor. Barring a recipe for the particular tool, it would be helpful to just have a general starting point such as precursor temperature, injection and purge times, substrate temperature, ozone flow rate, etc. There seems to be a frustrating lack of detail in the literature and I have a customer that is chomping at the bit to get SiO2 down. Regards, Michael Senior Process Engineer Micro/Nano Technology Center University of Louisville (502) 852-7671 Web page: https://louisville.edu/micronano Instagram: https://www.instagram.com/micronanolouisville/ Facebook https://www.facebook.com/MNTCUOFL/ YouTube: https://www.youtube.com/channel/UCGiczmq6wVIBJlM7UEGVW9Q -------------- next part -------------- An HTML attachment was scrubbed... URL: From jtmitch5 at ncsu.edu Wed Jul 14 12:08:14 2021 From: jtmitch5 at ncsu.edu (James Mitchell) Date: Wed, 14 Jul 2021 12:08:14 -0400 Subject: [labnetwork] TDMAS SiO2 recipe on a Beneq system In-Reply-To: References: Message-ID: Try asking Veeco.com. They sell the Ultratech ALD. On Wed, Jul 14, 2021, 11:41 AM Martin,Michael David < michael.martin at louisville.edu> wrote: > Hi guys, > Would anyone be willing to share process details for using TDMAS > (Tris(dimethylamino)silane) on a Beneq ALD system? Beneq tells me they do > not have experience with that precursor. Barring a recipe for the > particular tool, it would be helpful to just have a general starting point > such as precursor temperature, injection and purge times, substrate > temperature, ozone flow rate, etc. There seems to be a frustrating lack of > detail in the literature and I have a customer that is chomping at the bit > to get SiO2 down. > > > Regards, > Michael > > Senior Process Engineer > > Micro/Nano Technology Center > > University of Louisville > (502) 852-7671 > > Web page: https://louisville.edu/micronano > > > Instagram: https://www.instagram.com/micronanolouisville/ > > Facebook https://www.facebook.com/MNTCUOFL/ > YouTube: https://www.youtube.com/channel/UCGiczmq6wVIBJlM7UEGVW9Q > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From samtsitrin at berkeley.edu Wed Jul 14 12:23:55 2021 From: samtsitrin at berkeley.edu (Sam Tsitrin) Date: Wed, 14 Jul 2021 09:23:55 -0700 Subject: [labnetwork] TDMAS SiO2 recipe on a Beneq system In-Reply-To: References: Message-ID: Hi Michael- we don't have a Beneq here but we have used TDMAS with our Fiji200, with O2 plasma as the oxygen source. I'm not sure if the pulse, purge times would be relevant for a different chamber. We kept TDMAS at room temperature and have done depositions of SiO2 at substrate temp of 100C-250C. Recently we have also tried BTBAS (heat to 50C) for our SiO2 film with some decent results. Best, Sam On Wed, Jul 14, 2021 at 8:40 AM Martin,Michael David < michael.martin at louisville.edu> wrote: > Hi guys, > Would anyone be willing to share process details for using TDMAS > (Tris(dimethylamino)silane) on a Beneq ALD system? Beneq tells me they do > not have experience with that precursor. Barring a recipe for the > particular tool, it would be helpful to just have a general starting point > such as precursor temperature, injection and purge times, substrate > temperature, ozone flow rate, etc. There seems to be a frustrating lack of > detail in the literature and I have a customer that is chomping at the bit > to get SiO2 down. > > > Regards, > Michael > > Senior Process Engineer > > Micro/Nano Technology Center > > University of Louisville > (502) 852-7671 > > Web page: https://louisville.edu/micronano > > > Instagram: https://www.instagram.com/micronanolouisville/ > > Facebook https://www.facebook.com/MNTCUOFL/ > YouTube: https://www.youtube.com/channel/UCGiczmq6wVIBJlM7UEGVW9Q > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Sam Tsitrin R&D Engineer UC Berkeley Marvell Nanolab -------------- next part -------------- An HTML attachment was scrubbed... URL: From edeguns at gmail.com Thu Jul 15 07:05:33 2021 From: edeguns at gmail.com (Eric Deguns) Date: Thu, 15 Jul 2021 07:05:33 -0400 Subject: [labnetwork] TDMAS SiO2 recipe on a Beneq system In-Reply-To: References: Message-ID: Good morning Martin, I'm the product manager for the Savannah and Fiji ALD products for Veeco (formerly Cambridge NanoTech). We've previously used HSi(NMe2)3 or TDMASi in the past for SiO2 depositions. Most of our thermal users have moved away from this Si molecule for a few reasons: - it is slow to saturate - it requires an extended dose of O3 to fully react and provide a high quality film In our ALD systems, we use the stopvalve to isolate the chamber from dynamic vacuum and expose the substrate to a long(ish) dose of HSi(NMe2)3 and O3. Consider 15-30 seconds. I'm not sure that the TFS-200 that you have (please confirm the model number) can do extended exposures of precursors. (You might need to dose a lot of precursor to get saturation - definitely not a good thing for your vacuum pumps). Here is an old conference presentation to some prior work we've done with HSi(NMe2)3 and O3: https://www.seas.upenn.edu/~nanosop/documents/SiO2fromTDMASandozone_ALD2011.pdf There are certainly more recent thermal SiO2 precursors available out there. If there isn't a compelling reason you need to use HSi(NMe2)3 it might be better to pick a different Si source. Also a friendly reminder that Veeco provides process recipes and support to our customers (past and present). We also offer depositions in our applications lab if that might be helpful for your end user. Feel free to reach out to me at edeguns at veeco.com. Best, Eric On Wed, Jul 14, 2021 at 11:38 AM Martin,Michael David < michael.martin at louisville.edu> wrote: > Hi guys, > Would anyone be willing to share process details for using TDMAS > (Tris(dimethylamino)silane) on a Beneq ALD system? Beneq tells me they do > not have experience with that precursor. Barring a recipe for the > particular tool, it would be helpful to just have a general starting point > such as precursor temperature, injection and purge times, substrate > temperature, ozone flow rate, etc. There seems to be a frustrating lack of > detail in the literature and I have a customer that is chomping at the bit > to get SiO2 down. > > > Regards, > Michael > > Senior Process Engineer > > Micro/Nano Technology Center > > University of Louisville > (502) 852-7671 > > Web page: https://louisville.edu/micronano > > > Instagram: https://www.instagram.com/micronanolouisville/ > > Facebook https://www.facebook.com/MNTCUOFL/ > YouTube: https://www.youtube.com/channel/UCGiczmq6wVIBJlM7UEGVW9Q > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Thu Jul 15 09:55:00 2021 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Thu, 15 Jul 2021 13:55:00 +0000 Subject: [labnetwork] Nitrogen purifier question Message-ID: <9b2126cfd62e49caa3d1132211dc5d1c@draper.com> Hi everyone, Can any of you recommend a Nitrogen purifier, I am looking to install one on my EVG bonder to make 99.9999% purity for a bond application. Thanks in advance Rick Richard Morrison PMTS Draper Laboratory 555 Technology Square Cambridge Ma 02139 Office: 617-258-3420 Cell: 508-930-3461 ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From michael.martin at louisville.edu Fri Jul 16 16:29:01 2021 From: michael.martin at louisville.edu (Martin,Michael David) Date: Fri, 16 Jul 2021 20:29:01 +0000 Subject: [labnetwork] TDMAS SiO2 recipe on a Beneq system In-Reply-To: References: , Message-ID: Thank you everyone for the advice. Running 500 cycles now. Fingers crossed. One major concern, pointed out by Tony Whipple of Minnesota, is proper operation of the ozone generator and dosing of the ozone. He strongly recommended installing an ozone sensor. Regards, Michael ________________________________ From: Eric Deguns Sent: Thursday, July 15, 2021 7:05 AM To: Martin,Michael David Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] TDMAS SiO2 recipe on a Beneq system CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Good morning Martin, I'm the product manager for the Savannah and Fiji ALD products for Veeco (formerly Cambridge NanoTech). We've previously used HSi(NMe2)3 or TDMASi in the past for SiO2 depositions. Most of our thermal users have moved away from this Si molecule for a few reasons: - it is slow to saturate - it requires an extended dose of O3 to fully react and provide a high quality film In our ALD systems, we use the stopvalve to isolate the chamber from dynamic vacuum and expose the substrate to a long(ish) dose of HSi(NMe2)3 and O3. Consider 15-30 seconds. I'm not sure that the TFS-200 that you have (please confirm the model number) can do extended exposures of precursors. (You might need to dose a lot of precursor to get saturation - definitely not a good thing for your vacuum pumps). Here is an old conference presentation to some prior work we've done with HSi(NMe2)3 and O3: https://www.seas.upenn.edu/~nanosop/documents/SiO2fromTDMASandozone_ALD2011.pdf There are certainly more recent thermal SiO2 precursors available out there. If there isn't a compelling reason you need to use HSi(NMe2)3 it might be better to pick a different Si source. Also a friendly reminder that Veeco provides process recipes and support to our customers (past and present). We also offer depositions in our applications lab if that might be helpful for your end user. Feel free to reach out to me at edeguns at veeco.com. Best, Eric On Wed, Jul 14, 2021 at 11:38 AM Martin,Michael David > wrote: Hi guys, Would anyone be willing to share process details for using TDMAS (Tris(dimethylamino)silane) on a Beneq ALD system? Beneq tells me they do not have experience with that precursor. Barring a recipe for the particular tool, it would be helpful to just have a general starting point such as precursor temperature, injection and purge times, substrate temperature, ozone flow rate, etc. There seems to be a frustrating lack of detail in the literature and I have a customer that is chomping at the bit to get SiO2 down. Regards, Michael Senior Process Engineer Micro/Nano Technology Center University of Louisville (502) 852-7671 Web page: https://louisville.edu/micronano Instagram: https://www.instagram.com/micronanolouisville/ Facebook https://www.facebook.com/MNTCUOFL/ YouTube: https://www.youtube.com/channel/UCGiczmq6wVIBJlM7UEGVW9Q _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From derose at caltech.edu Sun Jul 18 19:58:18 2021 From: derose at caltech.edu (DeRose, Guy A.) Date: Sun, 18 Jul 2021 23:58:18 +0000 Subject: [labnetwork] Dry pumps on ALD systems? In-Reply-To: References: <0b9cf3fc-497d-1565-7d12-c545fa8e031f@cns.fas.harvard.edu> <00e5208ee3154211bcbc47219fa34204@draper.com> Message-ID: <494A043C-AFED-489E-AE56-B6DBD80C99C6@caltech.edu> Hello group, Our Oxford FlexAL ALD system was purchased new in 2019 with an Adixen A604H dry pump. It has worked very well since then ? just make sure you provide the specified amount of cooling water from your facility / chiller. Our Oxford PECVD has an ADS 602P dry pump, and those run very well also. We have had that PECVD in operation since 2005, and we have a spare ADS 602P, which we swap out for rebuilds roughly on an annual basis. FYI, Guy Guy DeRose, PhD, Member of the Professional Staff Associate Director of Technical Operations, Kavli Nanoscience Institute California Institute of Technology, Pasadena, CA USA (O) 1-626-395-3423 (M) 1-626-676-8529 http://kni.caltech.edu From: labnetwork on behalf of "Zuzanna A. Lewicka" Date: Monday, July 12, 2021 at 8:40 AM To: "April, Mark R." , "labnetwork at mtl.mit.edu" Subject: Re: [labnetwork] Dry pumps on ALD systems? Hello, We have recently upgraded our thermal ALD (Savannah 100) unit and installed Edwards dry scroll pump nxds15ic (8.8 CFM) with heated ALD trap provided by Veeco. So far, we have run about 25,000 cycles with no issues. Best regards, Zuzanna Lewicka Princeton University From: labnetwork On Behalf Of Iulian Codreanu Sent: Friday, July 9, 2021 11:54 AM To: April, Mark R. ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Dry pumps on ALD systems? Mark's note reminded me that I also have a precursor foreline trap (Mass-Vac 355063). iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 7/9/2021 11:47 AM, April, Mark R. wrote: Hi Mac, I have an Ebara A10S dry pump connected to the ALD system at Draper. Prior to the dry pump, I have a multi-trap with a SS gauze filter and an activated charcoal filter element. The dry pump has been in operation since the purchase of the ALD in 2013 and we have not had any issues Thanks Mark R. April Senior Equipment Engineer Microfabrication Laboratory [color_logo_small4] 555 Technology Square Cambridge, MA 02139 mapril at draper.com O # 617-258-1613 C # 617-455-1596 www.draper.com From: labnetwork On Behalf Of Iulian Codreanu Sent: Friday, July 9, 2021 10:38 AM To: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Dry pumps on ALD systems? Hi Mac, Our FlexAL came with an Adixen ADS 602P four years ago. At some point the service engineer had to adjust a breaker inside the tool's power box to allow the pump to draw more current at startup. Cheers, Iulian iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 7/8/2021 1:56 PM, Mac Hathaway wrote: Hello Folks, I'm wondering: how many of you have tried a dry pump on your ALD system? If you have, how did it work out? If you could supply the following details, that would be great: ALD system model; Dry pump model and CFM; How long it's been running that way; Any issues you've run in to. For background, we have long been working under the assumption that, due to the reactive nature of the ALD precursors, and the abrasive nature of the effluent, PFPE-base wet pumps are the way to go. However, we grow tired of dealing with pump oil and associated issues, and we're using dry pumps successfully elsewhere in the fab... Thanks! Mac -- Mac Hathaway Senior Process and Systems Engineer Harvard Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617-495-9012 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 1561 bytes Desc: image001.png URL: From manish.keswani01 at gmail.com Sun Jul 18 23:56:12 2021 From: manish.keswani01 at gmail.com (Manish Keswani) Date: Sun, 18 Jul 2021 20:56:12 -0700 Subject: [labnetwork] reducing noise in the chase area In-Reply-To: References: Message-ID: Thank you Thomas, Rick, Julia, MIke, and Rob for your responses and comments. I had trouble accessing my email for the past few days so could not respond sooner. Most of our pumps already have mufflers and they come with a primary sound enclosure. We have put a secondary sound enclosure on a couple of them, which has helped a lot. Our maintenance team does not think that heat build up would be an issue but we will keep an eye on it. We are also looking into sound absorbing panels and will reach out to acoustiblok (link that Rick provided). Rob had an interesting comment about water cooled motors and I think we would explore that if adding sound panels does not help. I will pass on your feedback to our maintenance team. We dd not see any benefit with noise cancelling headphones so Mike if you have a specific model that has worked well for you, please let me know. Again, thank you for your awesome suggestions. They were super helpful. Regards, Manish On Thu, Jul 8, 2021 at 3:10 AM Manish Keswani wrote: > Hello all, > > We have significant noise in the chase area due to equipment and pumps. Do > you know of any sound absorbing materials that are compatible with > cleanroom or other noise reduction options that are effective. > > Thanks so much. > > Manish Keswani > Lawrence Livermore National Laboratory > -------------- next part -------------- An HTML attachment was scrubbed... URL: From jshepar at purdue.edu Wed Jul 21 09:43:32 2021 From: jshepar at purdue.edu (Shepard, Jeremiah J) Date: Wed, 21 Jul 2021 13:43:32 +0000 Subject: [labnetwork] ICP STS ASE Issue Message-ID: I am having some trouble determining what this issue is? We have found a bad capacitor in the matching network, and replaced that, thought all was good but now we face this issue. Now I am having trouble with grass formation on student sample. Anyone know where to look for this kind of thing? Is it just sample recipe or something else perhaps? Any thoughts are appreciated! Also unsure of what's going on with the carrier wafer around the sample...? Thanks, Jerry Shepard [cid:b5ebd4e6-f9a5-41ac-91e8-fb784f88dacc] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 747979 bytes Desc: image.png URL: From hollingshead.19 at osu.edu Wed Jul 21 12:45:01 2021 From: hollingshead.19 at osu.edu (Hollingshead, Dave) Date: Wed, 21 Jul 2021 16:45:01 +0000 Subject: [labnetwork] ICP STS ASE Issue In-Reply-To: References: Message-ID: Hi Jerry, I'm not familiar with the STS ASE system specifically but based on the pattern starting at the top edge of the wafer extending down towards the center of the sample it looks like a wafer sealing issue to me. We've seen similar coloration/roughness patterns when our Plasmatherm 770 system is not sealing well. I think that would be a good place to start. Do you know the rest of the process conditions (gases/powers/etc)? That would be the next piece to consider if the sealing is OK and the problem is still present. -Dave Dave Hollingshead Manager of Research Operations - Nanotech West Lab The Ohio State University Suite 100, 1381 Kinnear Road, Columbus, OH 43212 614.292.1355 Office hollingshead.19 at osu.edu osu.edu From: labnetwork On Behalf Of Shepard, Jeremiah J Sent: Wednesday, July 21, 2021 09:44 To: labnetwork at mtl.mit.edu Subject: [labnetwork] ICP STS ASE Issue I am having some trouble determining what this issue is? We have found a bad capacitor in the matching network, and replaced that, thought all was good but now we face this issue. Now I am having trouble with grass formation on student sample. Anyone know where to look for this kind of thing? Is it just sample recipe or something else perhaps? Any thoughts are appreciated! Also unsure of what's going on with the carrier wafer around the sample...? Thanks, Jerry Shepard [cid:image001.png at 01D77E2E.37A318F0] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 747979 bytes Desc: image001.png URL: From vamsinittala at gmail.com Wed Jul 21 16:40:35 2021 From: vamsinittala at gmail.com (N P Vamsi Krishna) Date: Wed, 21 Jul 2021 15:40:35 -0500 Subject: [labnetwork] ICP STS ASE Issue In-Reply-To: References: Message-ID: Hi Jerry, As Dave suggested, I would also doubt the Helium leak issue if it's an electrostatic chuck. Try to see if any of the wafer lift pins are bent/protruding out or any silicon particle is stuck in the wafer lift pins area. Also, see if all the pins are rising and lowering uniformly. You may want to open the box under the chamber and see if the wafer pins are rising and lowering or any of your low-temperature cooling lines are obstructing the movements. Other things I would check is if the Peak-Peak voltage (Vpp) and the bias voltage are consistent with your previous runs. Hope this helps. Thanks & Regards, Vamsi On Wed, Jul 21, 2021 at 10:53 AM Shepard, Jeremiah J wrote: > I am having some trouble determining what this issue is? We have found a > bad capacitor in the matching network, and replaced that, thought all was > good but now we face this issue. > > Now I am having trouble with grass formation on student sample. Anyone > know where to look for this kind of thing? Is it just sample recipe or > something else perhaps? Any thoughts are appreciated! Also unsure of what's > going on with the carrier wafer around the sample...? > > Thanks, > Jerry Shepard > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- ___________________________________________________ N.P. Vamsi Krishna, PhD *Staff Scientist* Pritzker School of Molecular Engineering, *The University of Chicago * *Resident **Associate* Center for Nanoscale Materials, *Argonne National Laboratory * Phone: 1 (331) 757-8565 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 747979 bytes Desc: not available URL: From julia.aebersold at louisville.edu Wed Jul 21 18:15:37 2021 From: julia.aebersold at louisville.edu (Aebersold,Julia W.) Date: Wed, 21 Jul 2021 22:15:37 +0000 Subject: [labnetwork] ICP STS ASE Issue In-Reply-To: References: Message-ID: Make sure your litho is clean, your C4F8 cycle may be too long or your SF6 cycle is too short. Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ From: labnetwork [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of N P Vamsi Krishna Sent: Wednesday, July 21, 2021 4:41 PM To: Shepard, Jeremiah J Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] ICP STS ASE Issue CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Hi Jerry, As Dave suggested, I would also doubt the Helium leak issue if it's an electrostatic chuck. Try to see if any of the wafer lift pins are bent/protruding out or any silicon particle is stuck in the wafer lift pins area. Also, see if all the pins are rising and lowering uniformly. You may want to open the box under the chamber and see if the wafer pins are rising and lowering or any of your low-temperature cooling lines are obstructing the movements. Other things I would check is if the Peak-Peak voltage (Vpp) and the bias voltage are consistent with your previous runs. Hope this helps. Thanks & Regards, Vamsi On Wed, Jul 21, 2021 at 10:53 AM Shepard, Jeremiah J > wrote: I am having some trouble determining what this issue is? We have found a bad capacitor in the matching network, and replaced that, thought all was good but now we face this issue. Now I am having trouble with grass formation on student sample. Anyone know where to look for this kind of thing? Is it just sample recipe or something else perhaps? Any thoughts are appreciated! Also unsure of what's going on with the carrier wafer around the sample...? Thanks, Jerry Shepard [cid:image001.png at 01D77E5C.90694CB0] _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- ___________________________________________________ N.P. Vamsi Krishna, PhD Staff Scientist Pritzker School of Molecular Engineering, The University of Chicago Resident Associate Center for Nanoscale Materials, Argonne National Laboratory Phone: 1 (331) 757-8565 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 747979 bytes Desc: image001.png URL: From elliscd at auburn.edu Wed Jul 21 19:59:08 2021 From: elliscd at auburn.edu (Charles Ellis) Date: Wed, 21 Jul 2021 23:59:08 +0000 Subject: [labnetwork] ICP STS ASE Issue In-Reply-To: References: Message-ID: I assume you are coating your carrier wafer - too much exposed silicon can be a problem. Always make sure you develop your process for a fixed amount of exposed silicon and try to maintain it. Get Outlook for iOS ________________________________ From: labnetwork on behalf of Shepard, Jeremiah J Sent: Wednesday, July 21, 2021 8:43:32 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] ICP STS ASE Issue I am having some trouble determining what this issue is? We have found a bad capacitor in the matching network, and replaced that, thought all was good but now we face this issue. Now I am having trouble with grass formation on student sample. Anyone know where to look for this kind of thing? Is it just sample recipe or something else perhaps? Any thoughts are appreciated! Also unsure of what's going on with the carrier wafer around the sample...? Thanks, Jerry Shepard [cid:b5ebd4e6-f9a5-41ac-91e8-fb784f88dacc] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 747979 bytes Desc: image.png URL: From rosendo.bindoy at kaust.edu.sa Thu Jul 22 03:50:56 2021 From: rosendo.bindoy at kaust.edu.sa (Rosendo Bindoy) Date: Thu, 22 Jul 2021 07:50:56 +0000 Subject: [labnetwork] ICP STS ASE Issue In-Reply-To: References: Message-ID: Hello Jerry, Since you replaced a bad capacitor you may need to retune the load and tune position first to be sure that it is matching well. Plasma may not be stable and the cooling rate on the surface of the wafer is higher that the heat rate created during etching. You can try setting a higher chiller temp and see if the grass formation is lessen or eliminated. Regards Rosendo Get Outlook for iOS ________________________________ From: labnetwork on behalf of Shepard, Jeremiah J Sent: Wednesday, July 21, 2021 6:54 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] ICP STS ASE Issue I am having some trouble determining what this issue is? We have found a bad capacitor in the matching network, and replaced that, thought all was good but now we face this issue. Now I am having trouble with grass formation on student sample. Anyone know where to look for this kind of thing? Is it just sample recipe or something else perhaps? Any thoughts are appreciated! Also unsure of what's going on with the carrier wafer around the sample...? Thanks, Jerry Shepard [cid:b5ebd4e6-f9a5-41ac-91e8-fb784f88dacc] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 747979 bytes Desc: image.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 747979 bytes Desc: image.png URL: From jshepar at purdue.edu Thu Jul 22 09:52:06 2021 From: jshepar at purdue.edu (Shepard, Jeremiah J) Date: Thu, 22 Jul 2021 13:52:06 +0000 Subject: [labnetwork] Fw: ICP STS ASE Issue In-Reply-To: <5b0c1a8d6b7a4e3eb251ad5aab5eb5b4@ex04mail01a.ad.rit.edu> References: , <5b0c1a8d6b7a4e3eb251ad5aab5eb5b4@ex04mail01a.ad.rit.edu> Message-ID: Ok so here are my process parameters: #1 Recipe (this is the "standard recipe" for users) 10 second Etch / 10 second Dep 30 mTorr Etch pressure / 50 mTorr Dep pressure 1000 watts Etch coil / 1000 watts Dep coil 10 watts Etch Platen Hf / 0 watts Dep Platen Hf 250 sccm Sf6 with 30 sccm O2 Etch gas / 100 sccm C4F8 Dep gas #2 Recipe (This is not standard but is still producing grass) 5 second Etch / 5 second Dep 25 mTorr Etch pressure / 25 mTorr Dep pressure 450 watts Etch coil / 800 watts Dep coil 13 watts Etch Platen Hf / 0 watts Dep Platen Hf 85 sccm Sf6 with 8.5 O2 Etch gas / 130 sccm C4F8 Dep gas Etch and tune caps are Auto tuned so I'm not sure how to adjust these if possible. Thanks, Jerry ________________________________ From: Bruce Tolleson Sent: Thursday, July 22, 2021 7:58 AM To: Shepard, Jeremiah J Subject: RE: ICP STS ASE Issue This is DRIE? Is the carrier made of Silicon with no capping layer of metal (this is what it appears to be). If that is the case, there is the (big) problem: DRIE is extremely dependent on exposed silicon area, so having a massive amount of silicon available would certainly cause strange things like this. Bruce E. Tolleson Rochester Institute of Technology 82 Lomb Memorial Drive, Bldg 17-2627 Rochester, NY 14623-5604 (585) 478-3836 [http://www.rit.edu/~962www/logos/tiger_walking_rit_color.jpg] From: labnetwork On Behalf Of Shepard, Jeremiah J Sent: Wednesday, July 21, 2021 9:44 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] ICP STS ASE Issue I am having some trouble determining what this issue is? We have found a bad capacitor in the matching network, and replaced that, thought all was good but now we face this issue. Now I am having trouble with grass formation on student sample. Anyone know where to look for this kind of thing? Is it just sample recipe or something else perhaps? Any thoughts are appreciated! Also unsure of what's going on with the carrier wafer around the sample...? Thanks, Jerry Shepard [cid:image002.png at 01D77ECF.5823A4E0] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 2550 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 747979 bytes Desc: image002.png URL: From odc1n08 at soton.ac.uk Fri Jul 23 05:47:52 2021 From: odc1n08 at soton.ac.uk (Owain Clark) Date: Fri, 23 Jul 2021 09:47:52 +0000 Subject: [labnetwork] ICP STS ASE Issue In-Reply-To: References: , <5b0c1a8d6b7a4e3eb251ad5aab5eb5b4@ex04mail01a.ad.rit.edu> Message-ID: I think this is a summary of what others have said, but to recap from my experience. Rule out matching issues first, if your process log shows a good match with low reflected power then you are generally good. Can be hard to see sometimes in the fast switching steps of DRIE so make sure you log interval is sufficiently fast for good resolution. Once that is sorted grassing is nearly always a result of poor C:F matching in process relative to the active material areas exposed to the plasma. Broadly speaking Si is a F sink, resist will contribute C back to the plasma, SiO2 is an F sink but not as much as C and will contribute O back to the plasma which can reduce C density. Very hand wavy but broadly true. If you see black silicon then the surface has roughened. If the surface is roughened then logically you have not cleared the polymer from it sufficiently before the isotropic SF6 etch step. So to combat this you need a shorter C4F8 dep step or a longer anisotropic SF6 etch to ensure polymer removal from planar surfaces. A 2nd hypothesis is that you also have insufficient SF6 flow in the isotropic etch step for your exposed Si area but I find this less likely. Still worth investigating. 3rd hypothesis - another user of the tool has been using excessive vacuum oil or involatile mask materials which have then redeposited from chamber walls to micromask the black Si areas. An Al mask would be a classic via involatile AlF formation. This is a problem for us in shared use non-DRIE ICP tools occasionally. Not much you can do apart from wet clean/plasma clean the chamber until problem goes away. If you are running similar chip sizes on Si wafers before with no issues perhaps consider this idea more. When we train users on etch tools we always mention to them the issue of processes that are sensitive to exposed material areas, and C:F etch processes are a classic. A lot of our users are running what I call 'mixed Boschs' which is a constant flow of SF6:C4F8 intended to tune sidewall angle on standard ICP tools. When it works, it works very well. But if they upscale from chip to wafer, or change mask pattern, or change carrier wafer material the performance will shift and DRIE is the same. We try to educate them in this as early as possible to save pain. Despite the extra work involved if they intend to upscale from chip to wafer then it is best to start with a carrier wafer that mimics the final wafer as much as possible, which usually involves a resist spun carrier wafer. More work initially but saves time in the long run. Once I saw a user perfect a Ta2O5 C4F8/O2 etch on a 20mm chip, C4F8/O2 process, excellent sidewalls. He was very surprised when he upscaled to a 4" Tas2O5 wafer (still on 6" Si carrier) and the etch shifted from etch to deposition and he ended up with a layer of CF polymer all over his device wafer. Since then, we try to avoid this with early education! We don't allow chips in our DRIE anymore, it was too much of a problem relating to issues like this, chamber contamination with vacuum oil affecting other users processes etc. It is supposed to be a clean Si/Si dielectric/resist only tool so best to not allow in Can't really comment on the recipes being as all tools have their own personalities, we run a Plasmatherm Versaline. Regards, Owain From: labnetwork On Behalf Of Shepard, Jeremiah J Sent: 22 July 2021 14:52 To: labnetwork at mtl.mit.edu Subject: [labnetwork] Fw: ICP STS ASE Issue CAUTION: This e-mail originated outside the University of Southampton. Ok so here are my process parameters: #1 Recipe (this is the "standard recipe" for users) 10 second Etch / 10 second Dep 30 mTorr Etch pressure / 50 mTorr Dep pressure 1000 watts Etch coil / 1000 watts Dep coil 10 watts Etch Platen Hf / 0 watts Dep Platen Hf 250 sccm Sf6 with 30 sccm O2 Etch gas / 100 sccm C4F8 Dep gas #2 Recipe (This is not standard but is still producing grass) 5 second Etch / 5 second Dep 25 mTorr Etch pressure / 25 mTorr Dep pressure 450 watts Etch coil / 800 watts Dep coil 13 watts Etch Platen Hf / 0 watts Dep Platen Hf 85 sccm Sf6 with 8.5 O2 Etch gas / 130 sccm C4F8 Dep gas Etch and tune caps are Auto tuned so I'm not sure how to adjust these if possible. Thanks, Jerry ________________________________ From: Bruce Tolleson > Sent: Thursday, July 22, 2021 7:58 AM To: Shepard, Jeremiah J > Subject: RE: ICP STS ASE Issue This is DRIE? Is the carrier made of Silicon with no capping layer of metal (this is what it appears to be). If that is the case, there is the (big) problem: DRIE is extremely dependent on exposed silicon area, so having a massive amount of silicon available would certainly cause strange things like this. Bruce E. Tolleson Rochester Institute of Technology 82 Lomb Memorial Drive, Bldg 17-2627 Rochester, NY 14623-5604 (585) 478-3836 [http://www.rit.edu/~962www/logos/tiger_walking_rit_color.jpg] From: labnetwork > On Behalf Of Shepard, Jeremiah J Sent: Wednesday, July 21, 2021 9:44 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] ICP STS ASE Issue I am having some trouble determining what this issue is? We have found a bad capacitor in the matching network, and replaced that, thought all was good but now we face this issue. Now I am having trouble with grass formation on student sample. Anyone know where to look for this kind of thing? Is it just sample recipe or something else perhaps? Any thoughts are appreciated! Also unsure of what's going on with the carrier wafer around the sample...? Thanks, Jerry Shepard [cid:image002.png at 01D77FAF.AF1089E0] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 2550 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 747979 bytes Desc: image002.png URL: From bill_flounders at berkeley.edu Tue Jul 27 21:18:26 2021 From: bill_flounders at berkeley.edu (Albert William (Bill) Flounders) Date: Tue, 27 Jul 2021 18:18:26 -0700 Subject: [labnetwork] Equipment Engineering Position Message-ID: Colleagues, I've seen positions posted across the network this spring; UC Berkeley is recruiting also. Perhaps a new team of experts is tired of flying around the world to production Fabs and ready to settle in for some creative work at our research Labs. Lab Network, The UC Berkeley NanoLab has been seeking an R&D3 engineer for several months. This engineer would join the NanoLab Equipment Engineering and Support team. As colleagues on this network know, these are unique and demanding positions. Lab Network academic laboratory engineering positions require a broad range of experience and a willingness to to learn as much as the expert who designed the tool with each new repair or rebuild challenge. This specific position is not a process engineering specialist nor an academic research appointment - but you will communicate with thos specialists all day. This position is ideal for a hands on, mechanically inclined individual who likes to take equipment apart - and call upon an in-house custom machine shop to make improved parts - then put things back together. The selected candidate is more comfortable with a wrench than tweezers but uses both. They regularly reach for a DVM or an HLD; they often use an oscilloscope or a spectrometer. They take pride in tool performance and custom capabilities and monitor uptime more than publications or conferences. Our job posting is here - Job ID 17709 If you're considering relocation to the SF Bay Area, take a look. Sincerely, Bill Flounders, Ph.D. Executive Director Berkeley NanoLab -------------- next part -------------- An HTML attachment was scrubbed... URL: From jtmitch5 at ncsu.edu Thu Jul 29 11:44:00 2021 From: jtmitch5 at ncsu.edu (James Mitchell) Date: Thu, 29 Jul 2021 11:44:00 -0400 Subject: [labnetwork] Dektak 150 Service Message-ID: Does anyone know of someone who supports this tool? It is a stylus profilometer. Thanks, Jim -- *James Mitchell* *Specialty Trades Technician* *Dept. of Electrical and Computer Engineering* *NCSU Nanofabrication Facility* *MRC RM243A **Box 7911* *2410 Campus Shore Dr., Raleigh, NC 27606* *jtmitch5 at ncsu.edu* *Desk: 919-515-5394* *Cell: 919-717-7325* -------------- next part -------------- An HTML attachment was scrubbed... URL: From beaudoin at physics.ubc.ca Thu Jul 29 16:08:15 2021 From: beaudoin at physics.ubc.ca (Beaudoin, Mario) Date: Thu, 29 Jul 2021 13:08:15 -0700 Subject: [labnetwork] Dektak 150 Service In-Reply-To: References: Message-ID: <06bb352c-9d25-70f8-f3c8-2c41b18cea12@physics.ubc.ca> Bruker bought this from Veeco I believe. Mario On 2021-07-29 8:44 a.m., James Mitchell wrote: > [*CAUTION:* Non-UBC Email] > > Does anyone know of someone who supports this tool? > It is a stylus?profilometer. > > Thanks, Jim > > -- > /*James Mitchell*/ > /*Specialty Trades Technician*/ > /Dept. of Electrical and Computer Engineering/ > /NCSU Nanofabrication Facility/ > /MRC RM243A //Box 7911// > / > /2410 Campus Shore Dr., Raleigh, NC 27606/ > /jtmitch5 at ncsu.edu/ > /Desk:?919-515-5394/ > /Cell: 919-717-7325/ > / > / > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig 2.jpg Type: image/jpeg Size: 21446 bytes Desc: not available URL: From brian.wajdyk at uky.edu Fri Jul 30 12:53:22 2021 From: brian.wajdyk at uky.edu (Wajdyk, Brian L.) Date: Fri, 30 Jul 2021 16:53:22 +0000 Subject: [labnetwork] Local vacuum pump repair Message-ID: Hi Looking for a vaccum pump repair/rebuilder for Edawrds pumps in KY or Cincinati. Anyone have any recommendations? -Brian ********************************************* Brian Wajdyk Facility Manager / Research Center for Nanoscale Science and Engineering. University of Kentucky Office: ASTeCC 372 Email: Brian.Wajdyk at uky.edu Ph: 859-218-6548 ********************************************* -------------- next part -------------- An HTML attachment was scrubbed... URL: From James.Vlahakis at tufts.edu Fri Jul 30 12:56:32 2021 From: James.Vlahakis at tufts.edu (Vlahakis, James) Date: Fri, 30 Jul 2021 16:56:32 +0000 Subject: [labnetwork] Dektak 150 Service In-Reply-To: <06bb352c-9d25-70f8-f3c8-2c41b18cea12@physics.ubc.ca> References: <06bb352c-9d25-70f8-f3c8-2c41b18cea12@physics.ubc.ca> Message-ID: Mario is correct and, unfortunately, Bruker no longer supports the ?leqacy? systems At least that was the case when I looked into it a few years ago. You might try - https://hrdektak.com/ - we haven?t utilized their services so I cannot provide any sort of review Let us know how it works out! jim From: labnetwork On Behalf Of Beaudoin, Mario Sent: Thursday, July 29, 2021 4:08 PM To: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Dektak 150 Service Bruker bought this from Veeco I believe. Mario On 2021-07-29 8:44 a.m., James Mitchell wrote: [CAUTION: Non-UBC Email] Does anyone know of someone who supports this tool? It is a stylus profilometer. Thanks, Jim -- James Mitchell Specialty Trades Technician Dept. of Electrical and Computer Engineering NCSU Nanofabrication Facility MRC RM243A Box 7911 2410 Campus Shore Dr., Raleigh, NC 27606 jtmitch5 at ncsu.edu Desk: 919-515-5394 Cell: 919-717-7325 [https://docs.google.com/uc?export=download&id=1QiGLugvY4oVHF_7tSBf4gS9OLOrs_wZf&revid=0B6IsvvpTMVVfZ1Q1Q2gzejVsY3dhRmZ3U3FwdnR5d0x1cWdVPQ] _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- [cid:image001.jpg at 01D78541.FF74C490] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 21446 bytes Desc: image001.jpg URL: From bill_flounders at berkeley.edu Fri Jul 30 13:17:07 2021 From: bill_flounders at berkeley.edu (Albert William (Bill) Flounders) Date: Fri, 30 Jul 2021 10:17:07 -0700 Subject: [labnetwork] Dektak 150 Service In-Reply-To: <06bb352c-9d25-70f8-f3c8-2c41b18cea12@physics.ubc.ca> References: <06bb352c-9d25-70f8-f3c8-2c41b18cea12@physics.ubc.ca> Message-ID: >From Previous LabNet posts (many years old) but the website for culverequipment.com is still live Dennis J. Culver Culver Consulting 57 W. McFarlane St. Ventura, CA 93001 Ph (805) 648-1184 Fx (805) 648-1485 Cell (805)680-7389 dennis at culverequipment.com Website: www.culverequipment.com HR CONSULTING DEKTAK REPAIR SERVICE & SALES 590 E. GUTIERREZ ST. STE. C. SANTA BARBARA, CA 93103 UNITED STATES Phone: 805.845.1618. Cell: 805.680.1368 Fax: 805.845.1619 E-mail: hr-consulting at cox.net On Fri, Jul 30, 2021 at 9:22 AM Beaudoin, Mario wrote: > Bruker bought this from Veeco I believe. > > Mario > On 2021-07-29 8:44 a.m., James Mitchell wrote: > > [*CAUTION:* Non-UBC Email] > Does anyone know of someone who supports this tool? > It is a stylus profilometer. > > Thanks, Jim > > -- > *James Mitchell* > *Specialty Trades Technician* > *Dept. of Electrical and Computer Engineering* > *NCSU Nanofabrication Facility* > *MRC RM243A **Box 7911* > *2410 Campus Shore Dr., Raleigh, NC 27606* > *jtmitch5 at ncsu.edu* > *Desk: 919-515-5394* > *Cell: 919-717-7325* > > > _______________________________________________ > labnetwork mailing listlabnetwork at mtl.mit.eduhttps://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -- > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig 2.jpg Type: image/jpeg Size: 21446 bytes Desc: not available URL: From price.798 at osu.edu Fri Jul 30 13:38:40 2021 From: price.798 at osu.edu (Price, Aimee) Date: Fri, 30 Jul 2021 17:38:40 +0000 Subject: [labnetwork] Dektak 150 Service In-Reply-To: References: Message-ID: We just had our Dektak3 repaired by Hank Calles (HRC Consulting, third-party Dektak repair). We were very happy. I can find his contact info when our engineer on that tool is back in town on Monday. However, it looks like this is Hank?s LinkedIn profile. https://www.linkedin.com/in/hank-calles-35194750/ Aimee From: labnetwork On Behalf Of James Mitchell Sent: Thursday, July 29, 2021 11:44 AM To: Fab Network Subject: [labnetwork] Dektak 150 Service Does anyone know of someone who supports this tool? It is a stylus profilometer. Thanks, Jim -- James Mitchell Specialty Trades Technician Dept. of Electrical and Computer Engineering NCSU Nanofabrication Facility MRC RM243A Box 7911 2410 Campus Shore Dr., Raleigh, NC 27606 jtmitch5 at ncsu.edu Desk: 919-515-5394 Cell: 919-717-7325 [https://docs.google.com/uc?export=download&id=1QiGLugvY4oVHF_7tSBf4gS9OLOrs_wZf&revid=0B6IsvvpTMVVfZ1Q1Q2gzejVsY3dhRmZ3U3FwdnR5d0x1cWdVPQ] -------------- next part -------------- An HTML attachment was scrubbed... URL: From beaudoin at physics.ubc.ca Fri Jul 30 14:16:26 2021 From: beaudoin at physics.ubc.ca (Beaudoin, Mario) Date: Fri, 30 Jul 2021 11:16:26 -0700 Subject: [labnetwork] Fwd: Job posting for the Nanofabrication network email list - Nanofabrication Technician at QMI In-Reply-To: References: Message-ID: <73a358fa-496d-c4a1-6b7f-5f2bc00efa3e@physics.ubc.ca> -------- Forwarded Message -------- Subject: Job posting for the Nanofabrication network email list - Nanofabrication Technician at QMI Date: Fri, 30 Jul 2021 17:10:25 +0000 From: Bendickson, Aven To: NanoFab, Info (physics.ubc.ca) CC: Bendickson, Aven Hi Mario, You are still a member of a few nanofabrication group email lists such as the Canadian Network for Nanofabrication, correct? As a member, would you be able to post the attached job to the groups? Here also is the direct link to the job posting: https://ubc.wd10.myworkdayjobs.com/en-US/ubcstaffjobs/job/UBC-Vancouver-Campus/Nanofabrication-Technician_JR3558 Thanks in advance! Aven Bendickson, RCIC Human Resources Manager Stewart Blusson Quantum Matter Institute The University of British Columbia | Vancouver 319 - 2355 East Mall | Vancouver BC | V6T 1Z4 Canada Phone 604 827 4420 aven.bendickson at ubc.ca www.qmi.ubc.ca [cid:image003.png at 01D29C01.960E0FD0] -- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig 2.jpg Type: image/jpeg Size: 21446 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Nanofabrication Technician advertisement 2021 July.pdf Type: application/octet-stream Size: 173777 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: application/octet-stream Size: 8910 bytes Desc: not available URL: From djculver at aol.com Fri Jul 30 18:33:37 2021 From: djculver at aol.com (Dennis Culver) Date: Fri, 30 Jul 2021 22:33:37 +0000 (UTC) Subject: [labnetwork] Dektak 150 Service In-Reply-To: References: <06bb352c-9d25-70f8-f3c8-2c41b18cea12@physics.ubc.ca> Message-ID: <1506216787.1717058.1627684417280@mail.yahoo.com> Hello All,Dennis Culver from Culver Consulting. FYI ?I continue to support Veeco/Sloan Legacy systems such as the Dektak II, IIA, IID, 3030, 3030 Auto 1 [can no longer support the 3030 Auto II programmable stage or automation however I can still keep the base profiler operational] Dektak 3030ST, Dektak 3 and D3ktak 3ST systems. ?I am now dropping legacy support of the Dektak "V" series systems as much of the motion controller section is obsolete and can't be supported. ?No replacements available. ?Bruker has chosen not to allow outside support of their Legacy systems in favor of letting those systems die so you are stuck with replacing them. I continue to support Veeco ion beam etching systems such as the ME 301, ME 302, ME 601, ME 602 & ME 1001 systems to include gauge controllers and power supplies. ? When in doubt, please contact me directly. Dennis J. ?Culver ?Culver Consulting 5960 Valentine RoadUnit 14, Mail box 13Ventura, CA 93003 Ph (805) 648-1184Fx (805) 648-1485 Cell(805)680-7389 dennis at culverequipment.com -----Original Message----- From: Albert William (Bill) Flounders To: Beaudoin, Mario Cc: Fab Network Sent: Fri, Jul 30, 2021 10:17 am Subject: Re: [labnetwork] Dektak 150 Service >From Previous LabNet posts (many years old) but the website for culverequipment.com is still live Dennis J.? Culver Culver Consulting 57 W. McFarlane St. Ventura, CA 93001 Ph (805) 648-1184 Fx (805) 648-1485 Cell (805)680-7389 dennis at culverequipment.com Website: www.culverequipment.com HR CONSULTING DEKTAK REPAIR SERVICE & SALES 590 E. GUTIERREZ ST. STE. C. SANTA BARBARA, CA 93103 UNITED STATES Phone: 805.845.1618. Cell: 805.680.1368 Fax: 805.845.1619 E-mail: hr-consulting at cox.net On Fri, Jul 30, 2021 at 9:22 AM Beaudoin, Mario wrote: Bruker bought this from Veeco I believe. Mario On 2021-07-29 8:44 a.m., James Mitchell wrote: | [CAUTION: Non-UBC Email] | Does anyone know of someone who supports this tool? It is a stylus?profilometer. Thanks, Jim -- James Mitchell Specialty Trades Technician Dept. of Electrical and Computer Engineering NCSU Nanofabrication Facility MRC RM243A?Box 7911 2410 Campus Shore Dr., Raleigh, NC 27606 jtmitch5 at ncsu.edu Desk:?919-515-5394 Cell: 919-717-7325 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig 2.jpg Type: image/jpeg Size: 21446 bytes Desc: not available URL: From mtang at stanford.edu Sat Jul 31 12:14:07 2021 From: mtang at stanford.edu (Mary Tang) Date: Sat, 31 Jul 2021 09:14:07 -0700 Subject: [labnetwork] Engineering positions at Stanford's Nanofab Message-ID: <6d6c2d8c-f564-aaf5-e65b-ca7b7da4fd02@stanford.edu> Dear fellow Labnetworkers - We too have a Nanofab staffer position to fill.? We are seeking a Process Engineer for our plasma etch area.? More info can be found here: https://careersearch.stanford.edu/jobs/process-engineer-13452 We are also expecting to post a position soon for an Equipment Engineer.? Anyone interested in learning more about either can get in touch with me. Thanks for you attention, Mary -- Mary X. Tang, Ph.D. Managing Director Stanford Nanofabrication Facility Paul G. Allen Building 420 Via Palou Mall Stanford, CA 94305 https://snf.stanford.edu mtang at stanford.edu From jmullany at sitekprocess.com Fri Jul 30 16:23:30 2021 From: jmullany at sitekprocess.com (jmullany at sitekprocess.com) Date: Fri, 30 Jul 2021 13:23:30 -0700 (PDT) Subject: [labnetwork] Dektak 150 Service Message-ID: <1652626.1627676610805.JavaMail.javamailuser@localhost> An HTML attachment was scrubbed... URL: