[labnetwork] TDMAS SiO2 recipe on a Beneq system

Martin,Michael David michael.martin at louisville.edu
Wed Jul 14 10:40:16 EDT 2021


Hi guys,
    Would anyone be willing to share process details for using TDMAS (Tris(dimethylamino)silane) on a Beneq ALD system?  Beneq tells me they do not have experience with that precursor.  Barring a recipe for the particular tool, it would be helpful to just have a general starting point such as precursor temperature, injection and purge times, substrate temperature, ozone flow rate, etc.  There seems to be a frustrating lack of detail in the literature and I have a customer that is chomping at the bit to get SiO2 down.  <https://www.sigmaaldrich.com/US/en/substance/trisdimethylaminosilane1613215112897?context=product>

Regards,
   Michael


Senior Process Engineer

Micro/Nano Technology Center

University of Louisville

(502) 852-7671

Web page: https://louisville.edu/micronano<https://louisville.edu/micronanohttps://www.instagram.com/micronanolouisville/>

Instagram: https://www.instagram.com/micronanolouisville/

Facebook https://www.facebook.com/MNTCUOFL/

YouTube: https://www.youtube.com/channel/UCGiczmq6wVIBJlM7UEGVW9Q

-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20210714/9957504e/attachment.html>


More information about the labnetwork mailing list