From shimonel at savion.huji.ac.il Tue May 4 02:29:01 2021 From: shimonel at savion.huji.ac.il (Shimon Eliav) Date: Tue, 4 May 2021 06:29:01 +0000 Subject: [labnetwork] ZEP worth it? In-Reply-To: <39D63588-A2F4-40B1-902F-1EAF5CBD5549@cougarnet.uh.edu> References: <39D63588-A2F4-40B1-902F-1EAF5CBD5549@cougarnet.uh.edu> Message-ID: Dear Long, Thanks for originating this discussion. It was nice to learn from the experience of several people. I think it is very useful and I did a summary of the replies, please find attached. Regards, Shimon Hebrew University of Jerusalem Israel From: labnetwork [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Chang, Long Sent: Friday, 30 April 2021 18:29 To: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] ZEP worth it? Thanks Everyone. It?s clear what I should do. Long On Apr 30, 2021, at 6:08 AM, Lapointe, Jean > wrote: Hi Long, It does last for years, about the same as PMMA as far as I can tell. We just finished a bottle with a 2016 expiry and saw no change after opening a new bottle. It was stored at room T. It can withstands plasma etching much better than PMMA but doesn?t have as good an adhesion to semiconductors. So it is not a good mask for wet etching semiconductors. It works very well for lift-off. It is expensive but can easily be diluted to get thinner films. It can also be developed in N-amyl acetate; much safer than xylene and with the same contrast and dose-to-clear. Jean From: labnetwork [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Chang, Long Sent: April 29, 2021 10:29 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] ZEP worth it? ***ATTENTION*** This email originated from outside of the NRC. ***ATTENTION*** Ce courriel provient de l'ext?rieur du CNRC Hi Guys, I have no experience with ZEP, but the data sheet suggest a critical dose of ~35 uC/cm2, approximately 1/10 of PMMA. What are the problems with ZEP and under what conditions is it worth the cost? Does it last forever in storage like PMMA? Thanks, Long -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Is ZEP Worth Its Price.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 15752 bytes Desc: Is ZEP Worth Its Price.docx URL: From derose at caltech.edu Tue May 4 22:50:07 2021 From: derose at caltech.edu (DeRose, Guy A.) Date: Wed, 5 May 2021 02:50:07 +0000 Subject: [labnetwork] Cleanroom air showers: On or off? Message-ID: <05D46806-A535-4A05-B2CD-ED853A4041BA@caltech.edu> Hello group, A few months ago during the height of the pandemic one of our lab users who also works in another cleanroom in our local area had mentioned that they had disabled the air shower from the gowning room to the main cleanroom as a covid precaution. Following that, we did the same at Caltech. If your cleanroom has an air shower between the gowning area and main cleanroom, I would like to ask a few questions. Did you turn your air shower off at any point as a covid precaution? If so, have you resumed using the air shower? Did you ever get any direction from your safety department on whether to use it or not? Have you found a noticeable difference in how clean the lab is when it is in use vs disabled? As we are ramping our research activities back up on campus, we are looking for guidelines from other labs on best practices, and this is an area of interest. Thanks and best regards, Guy Guy DeRose, PhD, Member of the Professional Staff Associate Director of Technical Operations, Kavli Nanoscience Institute California Institute of Technology, Pasadena, CA USA (O) 1-626-395-3423 (M) 1-626-676-8529 http://kni.caltech.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From deonc69 at illinois.edu Wed May 5 09:28:24 2021 From: deonc69 at illinois.edu (Collins, Deon Douglas) Date: Wed, 5 May 2021 13:28:24 +0000 Subject: [labnetwork] Cleanroom air showers: On or off? In-Reply-To: <05D46806-A535-4A05-B2CD-ED853A4041BA@caltech.edu> References: <05D46806-A535-4A05-B2CD-ED853A4041BA@caltech.edu> Message-ID: Does your air shower not have a Hepa filter? If it does I see little to no reason why it can not be used. Deon D. Collins FACILITY MANAGER Holonyak Lab University of Illinois at Urbana-Champaign 208 N Wright St Rm. 248 | 2250 Urbana, IL 61801 217-300-7531 | deonc69 at illinois.edu [https://webtools.illinois.edu/webservices/js/ds/signature_logo.png] Under the Illinois Freedom of Information Act any written communication to or from university employees regarding university business is a public record and may be subject to public disclosure. I?m so tired of being tired, Sure as night will follow day, Most things I worry about never happen anyway. Tom Petty From: labnetwork On Behalf Of DeRose, Guy A. Sent: Tuesday, May 4, 2021 9:50 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Cleanroom air showers: On or off? Hello group, A few months ago during the height of the pandemic one of our lab users who also works in another cleanroom in our local area had mentioned that they had disabled the air shower from the gowning room to the main cleanroom as a covid precaution. Following that, we did the same at Caltech. If your cleanroom has an air shower between the gowning area and main cleanroom, I would like to ask a few questions. Did you turn your air shower off at any point as a covid precaution? If so, have you resumed using the air shower? Did you ever get any direction from your safety department on whether to use it or not? Have you found a noticeable difference in how clean the lab is when it is in use vs disabled? As we are ramping our research activities back up on campus, we are looking for guidelines from other labs on best practices, and this is an area of interest. Thanks and best regards, Guy Guy DeRose, PhD, Member of the Professional Staff Associate Director of Technical Operations, Kavli Nanoscience Institute California Institute of Technology, Pasadena, CA USA (O) 1-626-395-3423 (M) 1-626-676-8529 http://kni.caltech.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 2602 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mr_ Deon D_ Collins.vcf Type: text/x-vcard Size: 2025 bytes Desc: Mr_ Deon D_ Collins.vcf URL: From lvchang at Central.UH.EDU Thu May 6 12:26:39 2021 From: lvchang at Central.UH.EDU (Chang, Long) Date: Thu, 6 May 2021 16:26:39 +0000 Subject: [labnetwork] HSQ Alternatives Message-ID: <78B9C6DC-3779-4B11-A61F-134A885E1652@cougarnet.uh.edu> Hi All, I?m looking for HSQ alternatives since it?s expensive, has a 14 week lead time and comes in 250mL bottle. We waste most of the bottle due to it?s 6 months shelf life. Although we had some bottles still good after 2 years at 5C, it?s just a huge gamble after a year. We tried LN2 freezing, but it takes too much effort. I?ve attached a table of the cost per mL for the alternatives I found assuming you want 100nm thick. The AQM and EMResist are in powder form and advertise 1 year powder shelf life and 3 months mixture shelf life. They can distribute the powder into many small bottles. Particularly interesting is the Medusa 82 which has the lowest cost and advertises better shelf life. Does anyone have experience with these HSQ alternatives? [cid:EA246686-78D1-44AC-9192-C364E1E8651D at serc.dhcp.e.uh.edu] Thanks, Long -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Screen Shot 2021-05-06 at 11.08.36 AM.png Type: image/png Size: 16936 bytes Desc: Screen Shot 2021-05-06 at 11.08.36 AM.png URL: From lopezg at seas.upenn.edu Thu May 6 16:41:32 2021 From: lopezg at seas.upenn.edu (Gerald Lopez) Date: Thu, 6 May 2021 16:41:32 -0400 Subject: [labnetwork] HSQ Alternatives In-Reply-To: <78B9C6DC-3779-4B11-A61F-134A885E1652@cougarnet.uh.edu> References: <78B9C6DC-3779-4B11-A61F-134A885E1652@cougarnet.uh.edu> Message-ID: You should look into DisChem. MAEBL has worked with them in developing a viable HSQ alternative that is pretty much made to order and in smaller quantities. They ship out of PA. https://discheminc.com/ On Thu, May 6, 2021, 16:16 Chang, Long wrote: > Hi All, > > I?m looking for HSQ alternatives since it?s expensive, has a 14 week lead > time and comes in 250mL bottle. We waste most of the bottle due to it?s 6 > months shelf life. Although we had some bottles still good after 2 years at > 5C, it?s just a huge gamble after a year. We tried LN2 freezing, but it > takes too much effort. > > I?ve attached a table of the cost per mL for the alternatives I found > assuming you want 100nm thick. The AQM and EMResist are in powder form and > advertise 1 year powder shelf life and 3 months mixture shelf life. They > can distribute the powder into many small bottles. > > Particularly interesting is the Medusa 82 which has the lowest cost and > advertises better shelf life. Does anyone have experience with these HSQ > alternatives? > > > Thanks, > Long > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Screen Shot 2021-05-06 at 11.08.36 AM.png Type: image/png Size: 16936 bytes Desc: not available URL: From mondol at mit.edu Thu May 6 16:47:17 2021 From: mondol at mit.edu (Mark K Mondol) Date: Thu, 6 May 2021 20:47:17 +0000 Subject: [labnetwork] HSQ Alternatives In-Reply-To: <78B9C6DC-3779-4B11-A61F-134A885E1652@cougarnet.uh.edu> References: <78B9C6DC-3779-4B11-A61F-134A885E1652@cougarnet.uh.edu> Message-ID: <1620334038530.53033@mit.edu> Long: Mike Rooks will probably also chime in with better information than I have, but LN2 freezing has worked really well for me and is reasonably convenient for me as I already have LN2 dewars in my lab for other reasons. I bought a big dewar that holds racks of cryo tubes (Chart MVE CryoSystem4000Cryogenic about $3,800 with wheels) that makes it easy to store. The hold time when about 1/3 filled so that the HSQ is not actually immersed in liquid is >6weeks, probably much more. One way of reducing cost is to order the 6% HSQ and dilute it with Dow MIBK which is very expensive but has worked well for me ( $420/500ml - DC MIBK RINSE SOLVENT 500 ML) which should be available from your HSQ distributor. Regards, Mark K Mondol ---------------------------------------------------------------------------------- Mark K Mondol Assistant Director NanoStructures Laboratory And Facility Manager Scanning Electron Beam Lithography Facility Bldg 36 Room 229 mondol at mit.edu office - 617-253-9617 cell - 617-224-8756 ________________________________ From: labnetwork on behalf of Chang, Long Sent: Thursday, May 6, 2021 12:26 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] HSQ Alternatives Hi All, I'm looking for HSQ alternatives since it's expensive, has a 14 week lead time and comes in 250mL bottle. We waste most of the bottle due to it's 6 months shelf life. Although we had some bottles still good after 2 years at 5C, it's just a huge gamble after a year. We tried LN2 freezing, but it takes too much effort. I've attached a table of the cost per mL for the alternatives I found assuming you want 100nm thick. The AQM and EMResist are in powder form and advertise 1 year powder shelf life and 3 months mixture shelf life. They can distribute the powder into many small bottles. Particularly interesting is the Medusa 82 which has the lowest cost and advertises better shelf life. Does anyone have experience with these HSQ alternatives? [cid:EA246686-78D1-44AC-9192-C364E1E8651D at serc.dhcp.e.uh.edu] Thanks, Long -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Screen Shot 2021-05-06 at 11.08.36 AM.png Type: image/png Size: 16936 bytes Desc: Screen Shot 2021-05-06 at 11.08.36 AM.png URL: From andy at discheminc.com Thu May 6 17:53:23 2021 From: andy at discheminc.com (DisChem) Date: Thu, 6 May 2021 17:53:23 -0400 Subject: [labnetwork] HSQ Alternatives In-Reply-To: References: Message-ID: Hello Long, Our product HSiQ is made to order as ready to use solutions in quantities as little as 20 ml and ships within a week with 100% shelf life. Andy DisChem, Inc. > On May 6, 2021, at 4:42 PM, Gerald Lopez wrote: > > ? > You should look into DisChem. MAEBL has worked with them in developing a viable HSQ alternative that is pretty much made to order and in smaller quantities. They ship out of PA. https://discheminc.com/ > >> On Thu, May 6, 2021, 16:16 Chang, Long wrote: >> Hi All, >> >> I?m looking for HSQ alternatives since it?s expensive, has a 14 week lead time and comes in 250mL bottle. We waste most of the bottle due to it?s 6 months shelf life. Although we had some bottles still good after 2 years at 5C, it?s just a huge gamble after a year. We tried LN2 freezing, but it takes too much effort. >> >> I?ve attached a table of the cost per mL for the alternatives I found assuming you want 100nm thick. The AQM and EMResist are in powder form and advertise 1 year powder shelf life and 3 months mixture shelf life. They can distribute the powder into many small bottles. >> >> Particularly interesting is the Medusa 82 which has the lowest cost and advertises better shelf life. Does anyone have experience with these HSQ alternatives? >> >> >> >> Thanks, >> Long >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From Jean.Lapointe at nrc-cnrc.gc.ca Thu May 6 18:23:57 2021 From: Jean.Lapointe at nrc-cnrc.gc.ca (Lapointe, Jean) Date: Thu, 6 May 2021 22:23:57 +0000 Subject: [labnetwork] HSQ Alternatives In-Reply-To: <78B9C6DC-3779-4B11-A61F-134A885E1652@cougarnet.uh.edu> References: <78B9C6DC-3779-4B11-A61F-134A885E1652@cougarnet.uh.edu> Message-ID: HI Long, Also have a look at Dischem?s HSiQ made from the powder. It is cheaper than Dow Corning?s XR-1541 and the lead time is shorter than 2 weeks. The Dischem HSiQ behaves almost the same as Dow?s but requires different bake conditions and needs to be filtered upon dispensing. The Medusa resist has a slightly different composition (not really HSQ) and we had severe adhesion issue to Si. It was only used for some initial test a few years ago but could not be used to pattern any submicron structures. Someone may have more recent results? Jean From: labnetwork [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Chang, Long Sent: May 6, 2021 12:27 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] HSQ Alternatives ***ATTENTION*** This email originated from outside of the NRC. ***ATTENTION*** Ce courriel provient de l'ext?rieur du CNRC Hi All, I?m looking for HSQ alternatives since it?s expensive, has a 14 week lead time and comes in 250mL bottle. We waste most of the bottle due to it?s 6 months shelf life. Although we had some bottles still good after 2 years at 5C, it?s just a huge gamble after a year. We tried LN2 freezing, but it takes too much effort. I?ve attached a table of the cost per mL for the alternatives I found assuming you want 100nm thick. The AQM and EMResist are in powder form and advertise 1 year powder shelf life and 3 months mixture shelf life. They can distribute the powder into many small bottles. Particularly interesting is the Medusa 82 which has the lowest cost and advertises better shelf life. Does anyone have experience with these HSQ alternatives? [cid:image001.png at 01D742A4.F9863170] Thanks, Long -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 16936 bytes Desc: image001.png URL: From lopezg at seas.upenn.edu Thu May 6 18:47:32 2021 From: lopezg at seas.upenn.edu (Gerald Lopez) Date: Thu, 6 May 2021 18:47:32 -0400 Subject: [labnetwork] HSQ Alternatives In-Reply-To: References: Message-ID: Long - DisChem also makes water based anti-charging agent that is also compatible with HSQ (along with PMMA, ZEP, and others) and has a shelf life of up to 2 years. Best, Gerald- On Thu, May 6, 2021, 17:53 DisChem wrote: > Hello Long, > > Our product HSiQ is made to order as ready to use solutions in quantities > as little as 20 ml and ships within a week with 100% shelf life. > > Andy > DisChem, Inc. > > On May 6, 2021, at 4:42 PM, Gerald Lopez wrote: > > ? > You should look into DisChem. MAEBL has worked with them in developing a > viable HSQ alternative that is pretty much made to order and in smaller > quantities. They ship out of PA. https://discheminc.com/ > > On Thu, May 6, 2021, 16:16 Chang, Long wrote: > >> Hi All, >> >> I?m looking for HSQ alternatives since it?s expensive, has a 14 week lead >> time and comes in 250mL bottle. We waste most of the bottle due to it?s 6 >> months shelf life. Although we had some bottles still good after 2 years at >> 5C, it?s just a huge gamble after a year. We tried LN2 freezing, but it >> takes too much effort. >> >> I?ve attached a table of the cost per mL for the alternatives I found >> assuming you want 100nm thick. The AQM and EMResist are in powder form and >> advertise 1 year powder shelf life and 3 months mixture shelf life. They >> can distribute the powder into many small bottles. >> >> Particularly interesting is the Medusa 82 which has the lowest cost and >> advertises better shelf life. Does anyone have experience with these HSQ >> alternatives? >> >> >> Thanks, >> Long >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork >> > > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From michael.rooks at yale.edu Thu May 6 20:13:54 2021 From: michael.rooks at yale.edu (Michael Rooks) Date: Thu, 6 May 2021 20:13:54 -0400 Subject: [labnetwork] HSQ Alternatives In-Reply-To: <1620334038530.53033@mit.edu> References: <78B9C6DC-3779-4B11-A61F-134A885E1652@cougarnet.uh.edu> <1620334038530.53033@mit.edu> Message-ID: Medusa has adhesion problems- that's old news. Do we have a faq file about that? HSQ storage and use tips can be found on this page. https://nano.yale.edu/hsq-essential-tips I just ordered another liter of fox16, with a three-month lead time. No problem- we'll just freeze it. This is convenient and easy. -------------------------------- Michael Rooks nano.yale.edu On Thu, May 6, 2021 at 7:45 PM Mark K Mondol wrote: > Long: > > > Mike Rooks will probably also chime in with better information than I > have, but LN2 freezing has worked really well for me and is reasonably > convenient for me as I already have LN2 dewars in my lab for other reasons. > I bought a big dewar that holds racks of cryo tubes (Chart MVE > CryoSystem4000Cryogenic about $3,800 with wheels) that makes it easy to > store. The hold time when about 1/3 filled so that the HSQ is not actually > immersed in liquid is >6weeks, probably much more. > > > One way of reducing cost is to order the 6% HSQ and dilute it with Dow > MIBK which is very expensive but has worked well for me ( $420/500ml - > > DC MIBK RINSE SOLVENT 500 ML) which should be available from your HSQ > distributor. > > > Regards, > > > Mark K Mondol > > ---------------------------------------------------------------------------------- > Mark K Mondol > Assistant Director NanoStructures Laboratory > And > Facility Manager Scanning Electron Beam Lithography Facility > Bldg 36 Room 229 > mondol at mit.edu > office - 617-253-9617 > cell - 617-224-8756 > ------------------------------ > *From:* labnetwork on behalf of Chang, > Long > *Sent:* Thursday, May 6, 2021 12:26 PM > *To:* labnetwork at mtl.mit.edu > *Subject:* [labnetwork] HSQ Alternatives > > Hi All, > > I?m looking for HSQ alternatives since it?s expensive, has a 14 week lead > time and comes in 250mL bottle. We waste most of the bottle due to it?s 6 > months shelf life. Although we had some bottles still good after 2 years at > 5C, it?s just a huge gamble after a year. We tried LN2 freezing, but it > takes too much effort. > > I?ve attached a table of the cost per mL for the alternatives I found > assuming you want 100nm thick. The AQM and EMResist are in powder form and > advertise 1 year powder shelf life and 3 months mixture shelf life. They > can distribute the powder into many small bottles. > > Particularly interesting is the Medusa 82 which has the lowest cost and > advertises better shelf life. Does anyone have experience with these HSQ > alternatives? > > > Thanks, > Long > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Screen Shot 2021-05-06 at 11.08.36 AM.png Type: image/png Size: 16936 bytes Desc: not available URL: From mjsilva at ucsb.edu Fri May 7 10:51:21 2021 From: mjsilva at ucsb.edu (Michael Silva) Date: Fri, 7 May 2021 07:51:21 -0700 Subject: [labnetwork] Equipment Engineer Position Available Message-ID: <55259BDB-AAE9-4472-BA35-89F3CDC8FDE8@hxcore.ol> An HTML attachment was scrubbed... URL: From wjkiethe at ncsu.edu Fri May 7 13:57:40 2021 From: wjkiethe at ncsu.edu (Bill Kiether) Date: Fri, 7 May 2021 13:57:40 -0400 Subject: [labnetwork] Alcatel AMS100 DRIE pin configuration for stepper motor. Message-ID: Hi all, We need the connector PIN configuration of the *Allen Bradley - Y-2012-2-H00AA - PART# 193521* motor used in the *ALCATEL AMS100 DRIE. * We can find the replacement motor, but believe the pinouts/cable is set to a European (or Alcatel specific) standard. Has anybody replaced this motor and configured the cable for it? Bill Kiether Sr Research Staff NCSU Nanofabrication Facility wjkiethe at ncsu.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From mbegliarbekov at gc.cuny.edu Fri May 7 15:22:52 2021 From: mbegliarbekov at gc.cuny.edu (Begliarbekov, Milan) Date: Fri, 7 May 2021 19:22:52 +0000 Subject: [labnetwork] Process Engineer Position at CUNY's Advanced Science Research Center Message-ID: <50db2b080c494b23ac3def916f650404@wd5b.gc.cuny.edu> Dear All, We have a vacancy for a process engineer at the NanoFabrication Facility at the City University of New York's Advanced Science Research Center. This position is expected to start in early August. If you are interested in applying, please do so using the following link: https://cuny.jobs/new-york-ny/process-engineer-research-programs-specialist-nanofabrication-facility-advanced-science-research-center/CC5895C1AEFA4A35A1B33A900E2814CF/job/ Please apply before the closing date, which is June 5th, and be sure to submit all of the materials required for the application in order to be considered. Incomplete applications (that is, applications with missing materials) cannot be reviewed. Best, milan -------------- next part -------------- An HTML attachment was scrubbed... URL: From jcwirth at purdue.edu Mon May 10 12:33:45 2021 From: jcwirth at purdue.edu (Wirth, Justin C) Date: Mon, 10 May 2021 16:33:45 +0000 Subject: [labnetwork] HSQ Alternatives In-Reply-To: References: Message-ID: Hi Long, For an XR-1541 alternative, we?ve used 2% and 6% HSiQ from DisChem and it?s been great. I was referred to them by AQM as the US distributor of a pre-mixed version of their powdered HSQ, and the added cost is for DisChem to do the preparation is so low, and the turn around is so quick, that we saw no reason to try to use the powder ourselves. As Andy mentioned, it?s shipped very quickly and available in smaller quantities. The quality was great and we saw no issues that made us miss XR-1541. And aside from a minute difference in solvent composition, HSiQ is chemically identical to XR-1541, and it IS hydrogen silsesquioxane (HSQ). Medusa 82 is another chemical entirely, a carbon containing silsesquioxane (that AllResist hasn?t specified) dissolved in PGME. I suspect it?s maybe methylsilsesquioxane (MSQ) because a methyl group is the smallest organic R group, and because it fits the product name? But that?s just an idle guess, I?m not a chemist. I suspect that the carbon presence is what causes the adhesion issues (Medusa is more polar than HSQ) and drastically worse O2 etch resistance (although supposedly at bakes >=300 C the carbon will bake out via pyrolysis, and I?m not sure anyone has tried this). Since it?s an entirely different thing, it really needs like a master?s thesis to try and figure out how to use it well and what it can be good at, but it?s definitely not a drop in replacement for HSQ. The only downside for Dischem?s HSiQ is that, since it?s using the powder as the precursor, the price scales with concentration. This isn?t a problem for smaller quantities around the 2%-6% range, but it gets much more expensive for thick HSQ (e.g. FOX-16) and is less cost competitive vs large volumes from Dow especially as concentration increases. So for sites that can stand the 14 week lead time, ordering higher concentrations + self-diluting in MIBK, and storing in LN2, XR-1541 is probably the better way to go. But for super quick HSQ orders of smaller volumes of typically thin resist, DisChem?s HSiQ is the way to go. Thanks, Justin Justin C. Wirth, PhD Research Engineer ? EBL Processes & Nanofab Process Consultation Birck Nanotechnology Center | Room 2287A 765.494.8203 | jcwirth at purdue.edu https://wiki.itap.purdue.edu/display/BNCWiki https://purdue.ilabsolutions.com From: labnetwork On Behalf Of DisChem Sent: Thursday, May 6, 2021 5:53 PM To: Gerald Lopez Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] HSQ Alternatives Hello Long, Our product HSiQ is made to order as ready to use solutions in quantities as little as 20 ml and ships within a week with 100% shelf life. Andy DisChem, Inc. On May 6, 2021, at 4:42 PM, Gerald Lopez > wrote: ? You should look into DisChem. MAEBL has worked with them in developing a viable HSQ alternative that is pretty much made to order and in smaller quantities. They ship out of PA. https://discheminc.com/ On Thu, May 6, 2021, 16:16 Chang, Long > wrote: Hi All, I?m looking for HSQ alternatives since it?s expensive, has a 14 week lead time and comes in 250mL bottle. We waste most of the bottle due to it?s 6 months shelf life. Although we had some bottles still good after 2 years at 5C, it?s just a huge gamble after a year. We tried LN2 freezing, but it takes too much effort. I?ve attached a table of the cost per mL for the alternatives I found assuming you want 100nm thick. The AQM and EMResist are in powder form and advertise 1 year powder shelf life and 3 months mixture shelf life. They can distribute the powder into many small bottles. Particularly interesting is the Medusa 82 which has the lowest cost and advertises better shelf life. Does anyone have experience with these HSQ alternatives? Thanks, Long _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From ksnagaraj7 at gmail.com Mon May 10 13:13:27 2021 From: ksnagaraj7 at gmail.com (Nagaraj Krishna Subbaiah) Date: Mon, 10 May 2021 19:13:27 +0200 Subject: [labnetwork] Nanoscribe Users Message-ID: Hi All, Addressing all users of Nanoscribe. Would like to know how the users of nanoscribe are procuring their consumables. Especially the ITO coated substrates, do you purchase them from the company itself or sigma or any other resource?. If you've used substrates from other resources, have you faced any problems with printing? And has the company turned down the support because you've used substrates bought from elsewhere?. Your feedback is appreciated, Thank you, Nagaraj -------------- next part -------------- An HTML attachment was scrubbed... URL: From saba.sadeghi at uwaterloo.ca Mon May 10 14:01:17 2021 From: saba.sadeghi at uwaterloo.ca (Saba Sadeghi) Date: Mon, 10 May 2021 18:01:17 +0000 Subject: [labnetwork] Selenium trap Message-ID: <5a65af9431074bc5939a13b4e350b0b6@uwaterloo.ca> Dear colleagues, I was wondering if you have experience with growth of selenium with MBE. My main question is about safe handling of the Se vapor. We are going to have a water-cooled baffle installed between the MBE chamber and turbo pump. Would a water-cooled baffle suffice for trapping the Se vapor? What precautions do you take when you need bake the system and how often do you need to clean the Se trap? I'd appreciate your input, Thank you, Saba Sadeghi, PhD Quantum Devices Fabrication Scientist Institute for Quantum Computing, University of Waterloo Phone: 519-888-4567 ext. 39825 Email: saba.sadeghi at uwaterloo.ca From deolivei at ualberta.ca Mon May 10 16:14:33 2021 From: deolivei at ualberta.ca (Gustavo de Oliveira Luiz) Date: Mon, 10 May 2021 14:14:33 -0600 Subject: [labnetwork] Nanoscribe Users In-Reply-To: References: Message-ID: Hi Nagaraj, We found a good source in the US called Delta Technologies, LTD . Besides their main manufacturing lines, they offer special cuts (not necessarily needed for Nanoscribe) and they have surplus sale offers, which can considerably lower the price if what you need is in that list. It was very easy to order from them and they ship very quickly (to Canda in our case). Cheers, -- Gustavo de Oliveira Luiz, PhD Applications/Research Specialist nanoFAB, University of Alberta On Mon, May 10, 2021 at 1:43 PM Nagaraj Krishna Subbaiah < ksnagaraj7 at gmail.com> wrote: > Hi All, > > Addressing all users of Nanoscribe. Would like to know how the users of > nanoscribe are procuring their consumables. Especially the ITO coated > substrates, do you purchase them from the company itself or sigma or any > other resource?. > If you've used substrates from other resources, have you faced any > problems with printing? And has the company turned down the support because > you've used substrates bought from elsewhere?. > > Your feedback is appreciated, > Thank you, > Nagaraj > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From blaicher at nanoscribe.com Tue May 11 03:44:40 2021 From: blaicher at nanoscribe.com (Matthias Blaicher) Date: Tue, 11 May 2021 07:44:40 +0000 Subject: [labnetwork] Nanoscribe Users In-Reply-To: References: Message-ID: Hi Nagaraj, At Nanoscribe we go through considerable length to assure the quality of the ITO coatings for cleanliness and coating thickness. However, we do not force you to use our substrates. You can certainly source your own substrates. The substrate specifications are documented in the user-accessible and free Nanoguide [0]. If you have not registered there, I wholeheartedly recommend it. If you decide on not using our substrates, please check that the ITO surface resistance is low enough to guarantee a working interface detection. Also, if you use thicker than the standard 0.7mm samples, please talk to our support to have a custom holder registered in the software. That allows you to use substrate thicker than the usual substrates with safe interface finding. If you are an advanced user, you can also do this according to the documentation [1]. Be advised however, that misconfiguration of the NanoWrite configuration files can result in damage to the printer if hardware-dependent parameters are missing or incorrectly set by the user. If in doubt, simply reach out to our support. Very Best, Matthias Blaicher [cid:image001.png at 01D74649.78FC0C20] R&D Engineer Phone E-mail Web +49 721 981 980 720 blaicher at nanoscribe.com www.nanoscribe.com Nanoscribe GmbH & Co. KG Hermann-von-Helmholtz-Platz 6 76344 Eggenstein-Leopoldshafen Germany Registered office: Registered office: Eggenstein-Leopoldshafen, Germany; Commercial Registry Mannheim, HRA 709547; VAT-No. DE334074592 Partner with unlimited liability: Nanoscribe Verwaltungs GmbH, CEO: Martin Hermatschweiler, CFO: Lars Tritschler; Registered Office: Eggenstein-Leopoldshafen, Commercial Registry: Mannheim, HRB 737409 Your privacy as well as the new European regulation on the protection of personal data (GDPR) are very important to us. More information can be found in the privacy policy on our website. This email and any files transmitted with it are confidential and may contain privileged or otherwise protected information. You should not disseminate, distribute or copy this email. Please notify the sender immediately by email if you have received this email by mistake and delete this email from your system. [0] https://support.nanoscribe.com/hc/en-gb/articles/360001695714-ITO-Coated-Substrates-3D-MF-DiLL- [1] https://support.nanoscribe.com/hc/en-gb/articles/360018530554-Editing-ini-Configuration-Files Von: labnetwork Im Auftrag von Nagaraj Krishna Subbaiah Gesendet: Montag, 10. Mai 2021 19:13 An: labnetwork at mtl.mit.edu Betreff: [labnetwork] Nanoscribe Users Hi All, Addressing all users of Nanoscribe. Would like to know how the users of nanoscribe are procuring their consumables. Especially the ITO coated substrates, do you purchase them from the company itself or sigma or any other resource?. If you've used substrates from other resources, have you faced any problems with printing? And has the company turned down the support because you've used substrates bought from elsewhere?. Your feedback is appreciated, Thank you, Nagaraj -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 3663 bytes Desc: image001.png URL: From gilheart at rice.edu Tue May 11 12:38:06 2021 From: gilheart at rice.edu (Tim Gilheart) Date: Tue, 11 May 2021 11:38:06 -0500 Subject: [labnetwork] Nanoscribe Users In-Reply-To: References: Message-ID: <617A607A-9D5B-41AA-A27D-DF9A91F096AD@rice.edu> Hi Nagaraj, As others have discussed on this list before, many of our facilities are equipped with the right tools to prepare these Nanoscribe substrates correctly from readily-available stock wafers. In addition to dicing the different glass and silicon substrates for Nanoscribe use, we also developed our own ITO sputtering process that meets the specs in the Nanoguide resource Matthias refers to. Also: we have had no issues with continued support from Nanoscibe after switching to our in-house prepared substrates. As Matthias notes, however: be sure to follow carefully all the documented protocols when deviating from standard thicknesses to avoid a crash. My teammate Jing (copied here) has the lead on our Nanoscribe tool, and we?d be happy to discuss further with you directly as needed. Regards, -- Tim Gilheart, Ph.D. Research Scientist - Nanofabrication Cleanroom Manager, Shared Equipment Authority (SEA), Rice University Cell: 832-341-5488 | Office: 713-348-3159 | gilheart at rice.edu > On May 11, 2021, at 2:44 AM, Matthias Blaicher wrote: > > Hi Nagaraj, > > At Nanoscribe we go through considerable length to assure the quality of the ITO coatings for cleanliness and coating thickness. However, we do not force you to use our substrates. You can certainly source your own substrates. The substrate specifications are documented in the user-accessible and free Nanoguide [0]. If you have not registered there, I wholeheartedly recommend it. > > If you decide on not using our substrates, please check that the ITO surface resistance is low enough to guarantee a working interface detection. Also, if you use thicker than the standard 0.7mm samples, please talk to our support to have a custom holder registered in the software. That allows you to use substrate thicker than the usual substrates with safe interface finding. If you are an advanced user, you can also do this according to the documentation [1]. Be advised however, that misconfiguration of the NanoWriteconfiguration files can result in damage to the printer if hardware-dependent parameters are missing or incorrectly set by the user. If in doubt, simply reach out to our support. > > Very Best, > > Matthias Blaicher > > R&D Engineer > > Phone > E-mail > Web > > +49 721 981 980 720 > blaicher at nanoscribe.com > www.nanoscribe.com > > Nanoscribe GmbH & Co. KG > Hermann-von-Helmholtz-Platz 6 > 76344 Eggenstein-Leopoldshafen > Germany > > Registered office: Registered office: Eggenstein-Leopoldshafen, Germany; Commercial Registry Mannheim, HRA 709547; VAT-No. DE334074592 > > Partner with unlimited liability: Nanoscribe Verwaltungs GmbH, CEO: Martin Hermatschweiler, CFO: Lars Tritschler; Registered Office: Eggenstein-Leopoldshafen, Commercial Registry: Mannheim, HRB 737409 > > Your privacy as well as the new European regulation on the protection of personal data (GDPR) are very important to us. More information can be found in the privacy policy on our website. > > This email and any files transmitted with it are confidential and may contain privileged or otherwise protected information. You should not disseminate, distribute or copy this email. Please notify the sender immediately by email if you have received this email by mistake and delete this email from your system. > > > > > [0] https://support.nanoscribe.com/hc/en-gb/articles/360001695714-ITO-Coated-Substrates-3D-MF-DiLL- > [1] https://support.nanoscribe.com/hc/en-gb/articles/360018530554-Editing-ini-Configuration-Files > > Von: labnetwork Im Auftrag von Nagaraj Krishna Subbaiah > Gesendet: Montag, 10. Mai 2021 19:13 > An: labnetwork at mtl.mit.edu > Betreff: [labnetwork] Nanoscribe Users > > Hi All, > > Addressing all users of Nanoscribe. Would like to know how the users of nanoscribe are procuring their consumables. Especially the ITO coated substrates, do you purchase them from the company itself or sigma or any other resource?. > If you've used substrates from other resources, have you faced any problems with printing? And has the company turned down the support because you've used substrates bought from elsewhere?. > > Your feedback is appreciated, > Thank you, > Nagaraj > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From vnarang at gc.cuny.edu Tue May 11 15:48:30 2021 From: vnarang at gc.cuny.edu (Narang, Vishal) Date: Tue, 11 May 2021 19:48:30 +0000 Subject: [labnetwork] Process Engineer Position at CUNY's Advanced Science Research Center Message-ID: <1620762511927.54839@gc.cuny.edu> Dear All, We have a vacancy for a process engineer at the Nanofabrication Facility at the City University of New York's Advanced Science Research Center. This position is expected to start in early August. If you are interested in applying, please do so using the following link: https://cuny.jobs/new-york-ny/process-engineer-research-programs-specialist-nanofabrication-facility-advanced-science-research-center/CC5895C1AEFA4A35A1B33A900E2814CF/job/ Please apply before the closing date, which is June 5th, and be sure to submit all of the materials required for the application in order to be considered. Incomplete applications (that is, applications with missing materials) cannot be reviewed. Best, Vishal? Vishal Narang, PhD Senior Scientist (NanoFabrication) The City University of New York (CUNY) Advanced Science Research Center (ASRC) Tel. (212) 413-3313 -------------- next part -------------- An HTML attachment was scrubbed... URL: From lvchang at Central.UH.EDU Wed May 12 10:08:13 2021 From: lvchang at Central.UH.EDU (Chang, Long) Date: Wed, 12 May 2021 14:08:13 +0000 Subject: [labnetwork] HSQ Alternatives In-Reply-To: References: Message-ID: <257C2876-984B-48C5-A2E8-A8637BE87775@cougarnet.uh.edu> Thanks everyone. Great discussion as always. Long On May 10, 2021, at 11:33 AM, Wirth, Justin C > wrote: Hi Long, For an XR-1541 alternative, we?ve used 2% and 6% HSiQ from DisChem and it?s been great. I was referred to them by AQM as the US distributor of a pre-mixed version of their powdered HSQ, and the added cost is for DisChem to do the preparation is so low, and the turn around is so quick, that we saw no reason to try to use the powder ourselves. As Andy mentioned, it?s shipped very quickly and available in smaller quantities. The quality was great and we saw no issues that made us miss XR-1541. And aside from a minute difference in solvent composition, HSiQ is chemically identical to XR-1541, and it IS hydrogen silsesquioxane (HSQ). Medusa 82 is another chemical entirely, a carbon containing silsesquioxane (that AllResist hasn?t specified) dissolved in PGME. I suspect it?s maybe methylsilsesquioxane (MSQ) because a methyl group is the smallest organic R group, and because it fits the product name? But that?s just an idle guess, I?m not a chemist. I suspect that the carbon presence is what causes the adhesion issues (Medusa is more polar than HSQ) and drastically worse O2 etch resistance (although supposedly at bakes >=300 C the carbon will bake out via pyrolysis, and I?m not sure anyone has tried this). Since it?s an entirely different thing, it really needs like a master?s thesis to try and figure out how to use it well and what it can be good at, but it?s definitely not a drop in replacement for HSQ. The only downside for Dischem?s HSiQ is that, since it?s using the powder as the precursor, the price scales with concentration. This isn?t a problem for smaller quantities around the 2%-6% range, but it gets much more expensive for thick HSQ (e.g. FOX-16) and is less cost competitive vs large volumes from Dow especially as concentration increases. So for sites that can stand the 14 week lead time, ordering higher concentrations + self-diluting in MIBK, and storing in LN2, XR-1541 is probably the better way to go. But for super quick HSQ orders of smaller volumes of typically thin resist, DisChem?s HSiQ is the way to go. Thanks, Justin Justin C. Wirth, PhD Research Engineer ? EBL Processes & Nanofab Process Consultation Birck Nanotechnology Center | Room 2287A 765.494.8203 | jcwirth at purdue.edu https://wiki.itap.purdue.edu/display/BNCWiki https://purdue.ilabsolutions.com From: labnetwork > On Behalf Of DisChem Sent: Thursday, May 6, 2021 5:53 PM To: Gerald Lopez > Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] HSQ Alternatives Hello Long, Our product HSiQ is made to order as ready to use solutions in quantities as little as 20 ml and ships within a week with 100% shelf life. Andy DisChem, Inc. On May 6, 2021, at 4:42 PM, Gerald Lopez > wrote: ? You should look into DisChem. MAEBL has worked with them in developing a viable HSQ alternative that is pretty much made to order and in smaller quantities. They ship out of PA.https://discheminc.com/ On Thu, May 6, 2021, 16:16 Chang, Long > wrote: Hi All, I?m looking for HSQ alternatives since it?s expensive, has a 14 week lead time and comes in 250mL bottle. We waste most of the bottle due to it?s 6 months shelf life. Although we had some bottles still good after 2 years at 5C, it?s just a huge gamble after a year. We tried LN2 freezing, but it takes too much effort. I?ve attached a table of the cost per mL for the alternatives I found assuming you want 100nm thick. The AQM and EMResist are in powder form and advertise 1 year powder shelf life and 3 months mixture shelf life. They can distribute the powder into many small bottles. Particularly interesting is the Medusa 82 which has the lowest cost and advertises better shelf life. Does anyone have experience with these HSQ alternatives? Thanks, Long _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!LkSTlj0I!RPB3psdh8MUSsrnxVkDaTefL1lpGV87jQAzh81yA9CEo076QXFIN_vwCfg5Pbbu_0MX2$ -------------- next part -------------- An HTML attachment was scrubbed... URL: From ksnagaraj7 at gmail.com Wed May 12 14:29:55 2021 From: ksnagaraj7 at gmail.com (Nagaraj Krishna Subbaiah) Date: Wed, 12 May 2021 20:29:55 +0200 Subject: [labnetwork] Nanoscribe Users In-Reply-To: <617A607A-9D5B-41AA-A27D-DF9A91F096AD@rice.edu> References: <617A607A-9D5B-41AA-A27D-DF9A91F096AD@rice.edu> Message-ID: Many thanks to all of you, much appreciated. Sincerely, Nagaraj On Tue, May 11, 2021, 18:38 Tim Gilheart wrote: > Hi Nagaraj, > > As others have discussed on this list before, many of our facilities are > equipped with the right tools to prepare these Nanoscribe substrates > correctly from readily-available stock wafers. > > In addition to dicing the different glass and silicon substrates for > Nanoscribe use, we also developed our own ITO sputtering process that meets > the specs in the Nanoguide resource Matthias refers to. > > Also: we have had no issues with continued support from Nanoscibe after > switching to our in-house prepared substrates. As Matthias notes, however: > be sure to follow carefully all the documented protocols when deviating > from standard thicknesses to avoid a crash. > > My teammate Jing (copied here) has the lead on our Nanoscribe tool, and > we?d be happy to discuss further with you directly as needed. > > Regards, > > -- > Tim Gilheart, Ph.D. > Research Scientist - Nanofabrication Cleanroom Manager, > Shared Equipment Authority (SEA), Rice University > Cell: 832-341-5488 | Office: 713-348-3159 | gilheart at rice.edu > > On May 11, 2021, at 2:44 AM, Matthias Blaicher > wrote: > > Hi Nagaraj, > > At Nanoscribe we go through considerable length to assure the quality of > the ITO coatings for cleanliness and coating thickness. However, we do not > force you to use our substrates. You can certainly source your own > substrates. The substrate specifications are documented in the > user-accessible and free Nanoguide [0]. If you have not registered there, > I wholeheartedly recommend it. > > If you decide on not using our substrates, please check that the ITO > surface resistance is low enough to guarantee a working interface > detection. Also, if you use thicker than the standard 0.7mm samples, please > talk to our support to have a custom holder registered in the software. > That allows you to use substrate thicker than the usual substrates with > safe interface finding. If you are an advanced user, you can also do this > according to the documentation [1]. Be advised however, that > misconfiguration of the *NanoWrite*configuration files can result in > damage to the printer if hardware-dependent parameters are missing or > incorrectly set by the user. If in doubt, simply reach out to our support. > > Very Best, > > *Matthias Blaicher * > > R&D Engineer > > *Phone* > *E-mail* > *Web* > > +49 721 981 980 720 > blaicher at nanoscribe.com > www.nanoscribe.com > > *Nanoscribe GmbH & Co. KG* > Hermann-von-Helmholtz-Platz 6 > 76344 Eggenstein-Leopoldshafen > Germany > > Registered office: Registered office: Eggenstein-Leopoldshafen, Germany; > Commercial Registry Mannheim, HRA 709547; VAT-No. DE334074592 > > Partner with unlimited liability: Nanoscribe Verwaltungs GmbH, CEO: Martin > Hermatschweiler, CFO: Lars Tritschler; Registered Office: > Eggenstein-Leopoldshafen, Commercial Registry: Mannheim, HRB 737409 > > Your privacy as well as the new European regulation on the protection of > personal data (GDPR) are very important to us. More information can be > found in the privacy policy > on our website. > > > This email and any files transmitted with it are confidential and may > contain privileged or otherwise protected information. You should not > disseminate, distribute or copy this email. Please notify the sender > immediately by email if you have received this email by mistake and delete > this email from your system. > > > > [0] > https://support.nanoscribe.com/hc/en-gb/articles/360001695714-ITO-Coated-Substrates-3D-MF-DiLL- > [1] > https://support.nanoscribe.com/hc/en-gb/articles/360018530554-Editing-ini-Configuration-Files > > *Von:* labnetwork *Im Auftrag von *Nagaraj > Krishna Subbaiah > *Gesendet:* Montag, 10. Mai 2021 19:13 > *An:* labnetwork at mtl.mit.edu > *Betreff:* [labnetwork] Nanoscribe Users > > Hi All, > > Addressing all users of Nanoscribe. Would like to know how the users of > nanoscribe are procuring their consumables. Especially the ITO coated > substrates, do you purchase them from the company itself or sigma or any > other resource?. > If you've used substrates from other resources, have you faced any > problems with printing? And has the company turned down the support because > you've used substrates bought from elsewhere?. > > Your feedback is appreciated, > Thank you, > Nagaraj > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From price.798 at osu.edu Wed May 12 17:48:25 2021 From: price.798 at osu.edu (Price, Aimee) Date: Wed, 12 May 2021 21:48:25 +0000 Subject: [labnetwork] Equipment Technician at The Ohio State University Nanotech West Lab Message-ID: Ohio State Nanotech West Lab is hiring an experienced equipment technician. Please share with those in your network who may be interested in this opportunity. https://osu.wd1.myworkdayjobs.com/OSUCareers/job/Columbus-Campus/Equipment-Technician_R15071-2 Please reach out to me with any questions. Thanks, Aimee Bross Price Sr. Research Associate The Ohio State University Nanotech West Lab Institute for Materials Research 1381 Kinnear Road Suite 100 Columbus, OH 43212 614-292-2753 -------------- next part -------------- An HTML attachment was scrubbed... URL: From tony.olsen at utah.edu Wed May 12 20:15:59 2021 From: tony.olsen at utah.edu (Tony L Olsen) Date: Thu, 13 May 2021 00:15:59 +0000 Subject: [labnetwork] Open Position for Cleanroom Engineer Message-ID: <6fb9d450e6a346aa83504573807cdcc8@utah.edu> The Nanofab at the University of Utah has posted a position for an Engineer. This position will have various responsibilities, including Lab Safety Systems, Equipment Maintenance, and Facility Infrastructure. Details of the position are found at https://utah.peopleadmin.com/postings/114924. Please apply if interested and/or pass the information along to others. tonyO Tony Olsen Nanofab Cleanroom Supervisor/Process Engineer University of Utah 36 S Wasatch Drive, Suite 2500 Salt Lake City, UT 84112 801-587-0651 www.nanofab.utah.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From m.rampant at prometheuscomputing.com Thu May 13 09:32:19 2021 From: m.rampant at prometheuscomputing.com (Mathieu Rampant) Date: Thu, 13 May 2021 09:32:19 -0400 Subject: [labnetwork] NEMO Virtual Conference Registration - June 8th 1PM to 5PM Eastern Message-ID: Good morning, For those who haven't registered already for the virtual conference and wish to attend, please go to the following website and click on the registration link (registration is required to attend): https://nemo.prometheuscomputing.com/nemo-virtual-conference The web page will also provide the current program for the event. Thank you! -- Mathieu Rampant Software Architect NEMO Project Lead Prometheus Computing LLC -------------- next part -------------- An HTML attachment was scrubbed... URL: From jshepar at purdue.edu Thu May 13 14:19:47 2021 From: jshepar at purdue.edu (Shepard, Jeremiah J) Date: Thu, 13 May 2021 18:19:47 +0000 Subject: [labnetwork] Job Posting for Purdue University Message-ID: Purdue University seeks an Instrumentation Engineer / Scientist to join our Amy Instrumentation Facility in the Department of Chemistry. The facility has a long standing tradition of collaborating with faculty to develop new and novel scientific instrumentation hardware and methodologies to solve cutting edge research and education objectives. For a glimpse of the challenges we enjoy and what our people do, visit our website at https://www.chem.purdue.edu/jafci. For information on applying, visit: External posting link for those off campus https://career8.successfactors.com/sfcareer/jobreqcareer?jobId=12950&company=purdueuniv Internal posting link for those on campus https://performancemanager8.successfactors.com/sf/jobreq?jobId=12950&company=purdueuniv -------------- next part -------------- An HTML attachment was scrubbed... URL: From loik.gence at fis.puc.cl Thu May 13 16:16:18 2021 From: loik.gence at fis.puc.cl (=?UTF-8?B?RHIuIExvw69rIEdlbmNl?=) Date: Thu, 13 May 2021 16:16:18 -0400 Subject: [labnetwork] Gas Purity Grade for RIE In-Reply-To: <6fb9d450e6a346aa83504573807cdcc8@utah.edu> References: <6fb9d450e6a346aa83504573807cdcc8@utah.edu> Message-ID: <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> Hi All, I hope you are all fine and safe. We are planning the installation of our first RIE with chlorine and Fluorine chemistries. I was wondering, what are purity grade of the gases you are using.? Always electronic grade, 5.0 grade or above ?? To avoid potential contamination of the gas lines, chamber, etc...? of course, choosing the best purity available is a solution. However, thinking about the cost/utility for standard etching processes, and with potential problem of local availability of high grade, what grade range would you consider safe for the equipment and standard processes? Thanks in advance for your comment. Best, Lo?k -- Dr. Lo?k Gence Assistant Professor Instituto de F?sica Pontificia Universidad Cat?lica de Chile Avda. Vicu?a Mackenna 4860, CP 7820436 Santiago Lab: +56 95504 9648 From kbarnes at semitorrdist.com Thu May 13 20:08:24 2021 From: kbarnes at semitorrdist.com (Keith Barnes) Date: Fri, 14 May 2021 00:08:24 +0000 Subject: [labnetwork] Gas Purity Grade for RIE In-Reply-To: <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> References: <6fb9d450e6a346aa83504573807cdcc8@utah.edu>, <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> Message-ID: <505C58B5-AB8F-46C8-930F-80825A22A288@semitorrdist.com> Why not use a purifier? Sent from my iPhone > On May 13, 2021, at 4:38 PM, Dr. Lo?k Gence wrote: > > ?Hi All, > > I hope you are all fine and safe. > > We are planning the installation of our first RIE with chlorine and Fluorine chemistries. > > I was wondering, what are purity grade of the gases you are using. Always electronic grade, 5.0 grade or above ? To avoid potential contamination of the gas lines, chamber, etc... of course, choosing the best purity available is a solution. However, thinking about the cost/utility for standard etching processes, and with potential problem of local availability of high grade, what grade range would you consider safe for the equipment and standard processes? > > Thanks in advance for your comment. > > > Best, > > Lo?k > > > > -- > > Dr. Lo?k Gence > Assistant Professor > Instituto de F?sica > Pontificia Universidad Cat?lica de Chile > Avda. Vicu?a Mackenna 4860, > CP 7820436 Santiago > Lab: +56 95504 9648 > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork From loik.gence at fis.puc.cl Thu May 13 20:52:59 2021 From: loik.gence at fis.puc.cl (=?UTF-8?B?RHIuIExvw69rIEdlbmNl?=) Date: Thu, 13 May 2021 20:52:59 -0400 Subject: [labnetwork] Gas Purity Grade for RIE In-Reply-To: <505C58B5-AB8F-46C8-930F-80825A22A288@semitorrdist.com> References: <6fb9d450e6a346aa83504573807cdcc8@utah.edu> <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> <505C58B5-AB8F-46C8-930F-80825A22A288@semitorrdist.com> Message-ID: <6965d02e-bea4-5c41-fb32-5721ab2d7e38@fis.puc.cl> Hi Keith, Thanks for your comment. that would be great. However, a purifier would represent additional costs of equipment and maintenance that seems expensive. We are talking about a small university cleanroom, and this will be the first RIE in Chile. The matter is mainly for SF6, Cl2, BCl3, CHF3, and CF4. I guess, purification of BCl3 and Cl2 is not that easy. Best, Lo?k Le 13/05/2021 ? 20:08, Keith Barnes a ?crit?: > Why not use a purifier? > > Sent from my iPhone > >> On May 13, 2021, at 4:38 PM, Dr. Lo?k Gence wrote: >> >> ?Hi All, >> >> I hope you are all fine and safe. >> >> We are planning the installation of our first RIE with chlorine and Fluorine chemistries. >> >> I was wondering, what are purity grade of the gases you are using. Always electronic grade, 5.0 grade or above ? To avoid potential contamination of the gas lines, chamber, etc... of course, choosing the best purity available is a solution. However, thinking about the cost/utility for standard etching processes, and with potential problem of local availability of high grade, what grade range would you consider safe for the equipment and standard processes? >> >> Thanks in advance for your comment. >> >> >> Best, >> >> Lo?k >> >> From natalia.a.pankratova at gmail.com Fri May 14 07:24:48 2021 From: natalia.a.pankratova at gmail.com (Natalia Pankratova) Date: Fri, 14 May 2021 13:24:48 +0200 Subject: [labnetwork] Sapphire dicing Message-ID: Dear All, Can you please share your experience on dicing sapphire wafers? Blade dicing or laser? Do you have a favorite dicing brand/model? Thank you in advance! Best regards, Natalia Pankratova. *Alice&Bob* *Nanofabrication engineer* -------------- next part -------------- An HTML attachment was scrubbed... URL: From shimonel at savion.huji.ac.il Fri May 14 08:10:53 2021 From: shimonel at savion.huji.ac.il (Shimon Eliav) Date: Fri, 14 May 2021 12:10:53 +0000 Subject: [labnetwork] Gas Purity Grade for RIE In-Reply-To: <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> References: <6fb9d450e6a346aa83504573807cdcc8@utah.edu> <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> Message-ID: Hi Lo?k, Please see below the list of gases we have installed here at UNF-HUJI. This set-up is running for more than ten years (with periodic cylinder exchanges) providing repeatable results. Regards, Shimon [cid:image001.jpg at 01D748D3.54CB06D0] -----Original Message----- From: labnetwork [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Dr. Lo?k Gence Sent: Thursday, 13 May 2021 23:16 To: labnetwork at mtl.mit.edu Subject: [labnetwork] Gas Purity Grade for RIE Hi All, I hope you are all fine and safe. We are planning the installation of our first RIE with chlorine and Fluorine chemistries. I was wondering, what are purity grade of the gases you are using. Always electronic grade, 5.0 grade or above ? To avoid potential contamination of the gas lines, chamber, etc... of course, choosing the best purity available is a solution. However, thinking about the cost/utility for standard etching processes, and with potential problem of local availability of high grade, what grade range would you consider safe for the equipment and standard processes? Thanks in advance for your comment. Best, Lo?k -- Dr. Lo?k Gence Assistant Professor Instituto de F?sica Pontificia Universidad Cat?lica de Chile Avda. Vicu?a Mackenna 4860, CP 7820436 Santiago Lab: +56 95504 9648 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 26362 bytes Desc: image001.jpg URL: From rmorrison at draper.com Fri May 14 08:19:04 2021 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Fri, 14 May 2021 12:19:04 +0000 Subject: [labnetwork] Gas Purity Grade for RIE In-Reply-To: <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> References: <6fb9d450e6a346aa83504573807cdcc8@utah.edu> <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> Message-ID: <645e42af24454713a8bb8b4314e23f8d@draper.com> HI, I would just purchase the best purity gas you can in your area, most will be between grade 3 and grade 5, the BCL3 is a liquid so make sure you heat the lines and use the proper regulator in the gas cabinet to deliver the low pressure gas. Rick Richard Morrison PMTS Draper Laboratory 555 Technology Square Cambridge Ma 02139 Office: 617-258-3420 Cell: 508-930-3461 -----Original Message----- From: labnetwork On Behalf Of Dr. Lo?k Gence Sent: Thursday, May 13, 2021 4:16 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Gas Purity Grade for RIE Hi All, I hope you are all fine and safe. We are planning the installation of our first RIE with chlorine and Fluorine chemistries. I was wondering, what are purity grade of the gases you are using. Always electronic grade, 5.0 grade or above ? To avoid potential contamination of the gas lines, chamber, etc... of course, choosing the best purity available is a solution. However, thinking about the cost/utility for standard etching processes, and with potential problem of local availability of high grade, what grade range would you consider safe for the equipment and standard processes? Thanks in advance for your comment. Best, Lo?k -- Dr. Lo?k Gence Assistant Professor Instituto de F?sica Pontificia Universidad Cat?lica de Chile Avda. Vicu?a Mackenna 4860, CP 7820436 Santiago Lab: +56 95504 9648 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ From jtmitch5 at ncsu.edu Fri May 14 08:46:15 2021 From: jtmitch5 at ncsu.edu (James Mitchell) Date: Fri, 14 May 2021 08:46:15 -0400 Subject: [labnetwork] Gas Purity Grade for RIE In-Reply-To: <6965d02e-bea4-5c41-fb32-5721ab2d7e38@fis.puc.cl> References: <6fb9d450e6a346aa83504573807cdcc8@utah.edu> <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> <505C58B5-AB8F-46C8-930F-80825A22A288@semitorrdist.com> <6965d02e-bea4-5c41-fb32-5721ab2d7e38@fis.puc.cl> Message-ID: Five 9's (99.999) is good, Six 9's better. Most suppliers call five 9's research grade. I think either would be good. Safety note: If you are going to use Chlorine, make sure your system has a load lock and some kind of toxic monitoring system. Honeywell makes some good ones. Also put your toxics gas bottles in an exhausted gas cabinet. Jim On Fri, May 14, 2021 at 7:59 AM Dr. Lo?k Gence wrote: > Hi Keith, > > Thanks for your comment. > > that would be great. However, a purifier would represent additional > costs of equipment and maintenance that seems expensive. > > We are talking about a small university cleanroom, and this will be the > first RIE in Chile. > > The matter is mainly for SF6, Cl2, BCl3, CHF3, and CF4. I guess, > purification of BCl3 and Cl2 is not that easy. > > > Best, > > Lo?k > > > Le 13/05/2021 ? 20:08, Keith Barnes a ?crit : > > Why not use a purifier? > > > > Sent from my iPhone > > > >> On May 13, 2021, at 4:38 PM, Dr. Lo?k Gence > wrote: > >> > >> ?Hi All, > >> > >> I hope you are all fine and safe. > >> > >> We are planning the installation of our first RIE with chlorine and > Fluorine chemistries. > >> > >> I was wondering, what are purity grade of the gases you are using. > Always electronic grade, 5.0 grade or above ? To avoid potential > contamination of the gas lines, chamber, etc... of course, choosing the > best purity available is a solution. However, thinking about the > cost/utility for standard etching processes, and with potential problem of > local availability of high grade, what grade range would you consider safe > for the equipment and standard processes? > >> > >> Thanks in advance for your comment. > >> > >> > >> Best, > >> > >> Lo?k > >> > >> > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- *James Mitchell* *Specialty Trades Technician* *Dept. of Electrical and Computer Engineering* *NCSU Nanofabrication Facility* *MRC RM243A **Box 7911* *2410 Campus Shore Dr., Raleigh, NC 27606* *jtmitch5 at ncsu.edu* *Desk: 919-515-5394* *Cell: 919-717-7325* -------------- next part -------------- An HTML attachment was scrubbed... URL: From blewis at eng.ufl.edu Fri May 14 09:40:53 2021 From: blewis at eng.ufl.edu (Lewis,William) Date: Fri, 14 May 2021 13:40:53 +0000 Subject: [labnetwork] Gas Purity Grade for RIE In-Reply-To: <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> References: <6fb9d450e6a346aa83504573807cdcc8@utah.edu> <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> Message-ID: Hi Lo?k, Four nines is definitely clean enough for plasma etch processes.....and, I seriously doubt 3 nines would be an issue for most processes. The cost jumps quite a bit from 4 nines to 5 nines. Filtration and purification matters much more for PVD, PECVD etc... -----Original Message----- From: labnetwork On Behalf Of Dr. Lo?k Gence Sent: Thursday, May 13, 2021 4:16 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Gas Purity Grade for RIE [External Email] Hi All, I hope you are all fine and safe. We are planning the installation of our first RIE with chlorine and Fluorine chemistries. I was wondering, what are purity grade of the gases you are using. Always electronic grade, 5.0 grade or above ? To avoid potential contamination of the gas lines, chamber, etc... of course, choosing the best purity available is a solution. However, thinking about the cost/utility for standard etching processes, and with potential problem of local availability of high grade, what grade range would you consider safe for the equipment and standard processes? Thanks in advance for your comment. Best, Lo?k -- Dr. Lo?k Gence Assistant Professor Instituto de F?sica Pontificia Universidad Cat?lica de Chile Avda. Vicu?a Mackenna 4860, CP 7820436 Santiago Lab: +56 95504 9648 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://urldefense.proofpoint.com/v2/url?u=https-3A__mtl.mit.edu_mailman_listinfo.cgi_labnetwork&d=DwIF-g&c=sJ6xIWYx-zLMB3EPkvcnVg&r=KLqajKKMPd-Sg2KTwpmzjQ&m=SRquyqY4N6ZR-IT3r94J7uamhbhhKQAnATVAhAtx8Y8&s=mCOKXeSSAoJVcaLeWfKnt6_K5WCUhqhh41DAUKCpt90&e= From aali at eng.ucsd.edu Fri May 14 11:11:37 2021 From: aali at eng.ucsd.edu (Ahdam Ali) Date: Fri, 14 May 2021 08:11:37 -0700 Subject: [labnetwork] Sapphire dicing In-Reply-To: References: Message-ID: Natalia, At Nano3, we utilize a Disco DAD3220 Dicing Saw with Hubless blades in order to dice sapphire substrates. The process is relatively fool-proof, but one must be careful with dicing parameters. Cutting glass or sapphire typically require depth steps (multiple passes along a single cut) as well as very low feed speeds in order to ensure the integrity of the sample. This results in a considerably lower throughput when compared to dicing of a material such as Si. Best, On Fri, May 14, 2021 at 4:57 AM Natalia Pankratova < natalia.a.pankratova at gmail.com> wrote: > Dear All, > > Can you please share your experience on dicing sapphire wafers? Blade > dicing or laser? Do you have a favorite dicing brand/model? > > Thank you in advance! > > Best regards, > > Natalia Pankratova. > *Alice&Bob* > *Nanofabrication engineer* > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Ahdam Ali R&D Engineer II UCSD Calit2 Nano3 Facility Atkinson Hall M/C0436 9500 Gilman Drive La Jolla, CA 92093-0436 Email: aali at eng.ucsd.edu Phone: (858)-534-4768 -------------- next part -------------- An HTML attachment was scrubbed... URL: From beaudoin at physics.ubc.ca Fri May 14 11:27:43 2021 From: beaudoin at physics.ubc.ca (Beaudoin, Mario) Date: Fri, 14 May 2021 08:27:43 -0700 Subject: [labnetwork] Gas Purity Grade for RIE In-Reply-To: <6965d02e-bea4-5c41-fb32-5721ab2d7e38@fis.puc.cl> References: <6fb9d450e6a346aa83504573807cdcc8@utah.edu> <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> <505C58B5-AB8F-46C8-930F-80825A22A288@semitorrdist.com> <6965d02e-bea4-5c41-fb32-5721ab2d7e38@fis.puc.cl> Message-ID: <24af2c72-d168-6be6-f1c6-f71086317a95@physics.ubc.ca> We are using 5.0 gases for ICP and ECR RIE here at UBC with good results. M. On 2021-05-13 5:52 p.m., Dr. Lo?k Gence wrote: > [CAUTION: Non-UBC Email] > > Hi Keith, > > Thanks for your comment. > > that would be great. However, a purifier would represent additional > costs of equipment and maintenance that seems expensive. > > We are talking about a small university cleanroom, and this will be > the first RIE in Chile. > > The matter is mainly for SF6, Cl2, BCl3, CHF3, and CF4. I guess, > purification of BCl3 and Cl2 is not that easy. > > > Best, > > Lo?k > > > Le 13/05/2021 ? 20:08, Keith Barnes a ?crit?: >> Why not use a purifier? >> >> Sent from my iPhone >> >>> On May 13, 2021, at 4:38 PM, Dr. Lo?k Gence >>> wrote: >>> >>> ?Hi All, >>> >>> I hope you are all fine and safe. >>> >>> We are planning the installation of our first RIE with chlorine and >>> Fluorine chemistries. >>> >>> I was wondering, what are purity grade of the gases you are using.? >>> Always electronic grade, 5.0 grade or above ?? To avoid potential >>> contamination of the gas lines, chamber, etc...? of course, choosing >>> the best purity available is a solution. However, thinking about the >>> cost/utility for standard etching processes, and with potential >>> problem of local availability of high grade, what grade range would >>> you consider safe for the equipment and standard processes? >>> >>> Thanks in advance for your comment. >>> >>> >>> Best, >>> >>> Lo?k >>> >>> > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig 2.jpg Type: image/jpeg Size: 21446 bytes Desc: not available URL: From sreevyas at gmail.com Fri May 14 11:46:46 2021 From: sreevyas at gmail.com (Srinivasa Reddy) Date: Fri, 14 May 2021 21:16:46 +0530 Subject: [labnetwork] Gas Purity Grade for RIE In-Reply-To: <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> References: <6fb9d450e6a346aa83504573807cdcc8@utah.edu> <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> Message-ID: Dear Loik, Depending upon the application you can choose the purity. Mostly we are using 5N (99.999%), or 4N5 (99.995) purity gases. Linde and Mathison can supply the cylinders (bottles) Thanks & Regards Srinivasa Reddy Kuppireddi Project Manager Center for NEMS & Nano Photonics (CNNP) ESB 225, Dept. of Electrical Engineering Indian Institute of Technology(IIT) Madras Chennai-600036, Indian +91 44 2257 5493 (O) +91 789 326 8010(M) On Fri, May 14, 2021 at 5:10 AM Dr. Lo?k Gence wrote: > Hi All, > > I hope you are all fine and safe. > > We are planning the installation of our first RIE with chlorine and > Fluorine chemistries. > > I was wondering, what are purity grade of the gases you are using. > Always electronic grade, 5.0 grade or above ? To avoid potential > contamination of the gas lines, chamber, etc... of course, choosing the > best purity available is a solution. However, thinking about the > cost/utility for standard etching processes, and with potential problem > of local availability of high grade, what grade range would you consider > safe for the equipment and standard processes? > > Thanks in advance for your comment. > > > Best, > > Lo?k > > > > -- > > Dr. Lo?k Gence > Assistant Professor > Instituto de F?sica > Pontificia Universidad Cat?lica de Chile > Avda. Vicu?a Mackenna 4860, > CP 7820436 Santiago > Lab: +56 95504 9648 > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From tbritton at criticalsystemsinc.com Fri May 14 12:10:07 2021 From: tbritton at criticalsystemsinc.com (Tom Britton) Date: Fri, 14 May 2021 16:10:07 +0000 Subject: [labnetwork] Gas Purity Grade for RIE In-Reply-To: References: <6fb9d450e6a346aa83504573807cdcc8@utah.edu> <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> Message-ID: Hi Loik, One area to make sure you have high purity gas is the gas cabinet purge gas. When you purge your gas cabinet process panel or perform a cylinder change you are introducing nitrogen to displace the chlorine and fluorine chemistries. If that purge gas isn't completely dry, the trace moisture will react with the acids and start corroding/contaminating your panel. The first place this typically shows up is in the regulators with the inability to hold a setpoint, and the outlet pressure starts to increase. This happens because the pressure drop is higher through the regulator, and this causes the moisture to fall out and the corrosion starts. If this happens, you can look in the outlet fitting of the regulator and you'll see the corrosion. Usually by this time, the panel is in bad shape. For these types of gases, when our customers can't guarantee that their nitrogen will be 5 nines, or if there is a chance that the wrong bottle of nitrogen can make its way to the purge panel, we recommend a purge gas purifier to remove the trace moisture. It will make your panels last a lot longer. Also, if possible, order your gas cabinets with a "trickle purge" on the automated N2 purge inlet valve connected to your process panel as this will keep the nitrogen flowing through the cylinder connection when you are replacing the process cylinders. This keeps atmosphere from going into the process lines when you remove the spent cylinder. Also, if possible, order your purge cylinders with DISS cylinder connections. It's very unusual to order general purpose nitrogen with DISS cylinder fittings and is cheap insurance to assure that the wrong grade of nitrogen doesn't end up connected to your chlorine or fluorine gas cabinets. Hope this helps, Tom Tom Britton Director of Sales Critical Systems, Inc. Direct: 208.890.1417 Office: 877.572.5515 Skype: tombrittoncsi www.CriticalSystemsInc.com [logo for email signature png] Note: 7 days per week Technical Support Phone: 1-888-218-6308 Email: Fieldservices at criticalsystemsinc.com -----Original Message----- From: labnetwork > On Behalf Of Lewis,William Sent: Friday, May 14, 2021 7:41 AM To: Dr. Lo?k Gence >; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Gas Purity Grade for RIE [EXTERNAL EMAIL] This message originated outside of your organization. Remember to always use caution when opening attachments or clicking on links. Hi Lo?k, Four nines is definitely clean enough for plasma etch processes.....and, I seriously doubt 3 nines would be an issue for most processes. The cost jumps quite a bit from 4 nines to 5 nines. Filtration and purification matters much more for PVD, PECVD etc... -----Original Message----- From: labnetwork > On Behalf Of Dr. Lo?k Gence Sent: Thursday, May 13, 2021 4:16 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Gas Purity Grade for RIE [External Email] Hi All, I hope you are all fine and safe. We are planning the installation of our first RIE with chlorine and Fluorine chemistries. I was wondering, what are purity grade of the gases you are using. Always electronic grade, 5.0 grade or above ? To avoid potential contamination of the gas lines, chamber, etc... of course, choosing the best purity available is a solution. However, thinking about the cost/utility for standard etching processes, and with potential problem of local availability of high grade, what grade range would you consider safe for the equipment and standard processes? Thanks in advance for your comment. Best, Lo?k -- Dr. Lo?k Gence Assistant Professor Instituto de F?sica Pontificia Universidad Cat?lica de Chile Avda. Vicu?a Mackenna 4860, CP 7820436 Santiago Lab: +56 95504 9648 _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://urldefense.proofpoint.com/v2/url?u=https-3A__mtl.mit.edu_mailman_listinfo.cgi_labnetwork&d=DwIF-g&c=sJ6xIWYx-zLMB3EPkvcnVg&r=KLqajKKMPd-Sg2KTwpmzjQ&m=SRquyqY4N6ZR-IT3r94J7uamhbhhKQAnATVAhAtx8Y8&s=mCOKXeSSAoJVcaLeWfKnt6_K5WCUhqhh41DAUKCpt90&e= _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://urldefense.proofpoint.com/v2/url?u=https-3A__mtl.mit.edu_mailman_listinfo.cgi_labnetwork&d=DwIFAw&c=euGZstcaTDllvimEN8b7jXrwqOf-v5A_CdpgnVfiiMM&r=D1j3aH4gf_B24MHGaru0vse-Gx_NllaIE8kLU3iLsM0&m=Vk0QFufNVI842V2s_mQmsWKk3hGhKQsUzqKpV9RLDmY&s=1RL-aMWXWuuXVjKSbwf_wmTEAcxe0gX6qowXaaiIScU&e= This email and any files transmitted with it are confidential and intended solely for the use of the individual or entity to whom they are addressed. If you have received this email in error please notify the system manager. This message contains confidential information and is intended only for the individual named. If you are not the named addressee you should not disseminate, distribute or copy this e-mail. Please notify the sender immediately by e-mail if you have received this e-mail by mistake and delete this e-mail from your system. If you are not the intended recipient you are notified that disclosing, copying, distributing or taking any action in reliance on the contents of this information is strictly prohibited.'. If the disclaimer can't be applied, attach the message to a new disclaimer message. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 9501 bytes Desc: image001.png URL: From loik.gence at fis.puc.cl Fri May 14 12:23:11 2021 From: loik.gence at fis.puc.cl (=?UTF-8?B?RHIuIExvw69rIEdlbmNl?=) Date: Fri, 14 May 2021 12:23:11 -0400 Subject: [labnetwork] Gas Purity Grade for RIE In-Reply-To: References: <6fb9d450e6a346aa83504573807cdcc8@utah.edu> <4fc4d8da-d846-cc1a-a056-21b8ac09375b@fis.puc.cl> Message-ID: Hi Srinivasa & All, The RIE will include a loadloack and is design to work also with corrosive gases. The venting N2 should be at least 4.0.? As suggested, I'll check with the provider all the possibilities to get higher than 4.0. but for sure, the semiconductor grade gases will be imported. thanks a lot for your valuable feedback! Best, Lo?k Le 14/05/2021 ? 11:46, Srinivasa Reddy a ?crit?: > Dear Loik, > > Depending upon the application you can choose the purity. > Mostly we are using 5N (99.999%), or 4N5 (99.995) purity gases. > Linde and Mathison can supply the cylinders? (bottles) > > Thanks & Regards > Srinivasa Reddy Kuppireddi > Project Manager > Center for NEMS & Nano Photonics (CNNP) > ESB 225, Dept. of Electrical Engineering > Indian Institute of Technology(IIT) Madras > Chennai-600036, Indian > +91 44 2257 5493 (O) > +91 789 326 8010(M) > > > On Fri, May 14, 2021 at 5:10 AM Dr. Lo?k Gence > wrote: > > Hi All, > > I hope you are all fine and safe. > > We are planning the installation of our first RIE with chlorine and > Fluorine chemistries. > > I was wondering, what are purity grade of the gases you are using. > Always electronic grade, 5.0 grade or above ?? To avoid potential > contamination of the gas lines, chamber, etc...? of course, > choosing the > best purity available is a solution. However, thinking about the > cost/utility for standard etching processes, and with potential > problem > of local availability of high grade, what grade range would you > consider > safe for the equipment and standard processes? > > Thanks in advance for your comment. > > > Best, > > Lo?k > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > -- Dr. Lo?k Gence Assistant Professor Instituto de F?sica Pontificia Universidad Cat?lica de Chile Avda. Vicu?a Mackenna 4860, CP 7820436 Santiago Lab: +56 95504 9648 -------------- next part -------------- An HTML attachment was scrubbed... URL: From bfruhberger at ucsd.edu Fri May 14 16:08:00 2021 From: bfruhberger at ucsd.edu (Bernd Fruhberger) Date: Fri, 14 May 2021 13:08:00 -0700 Subject: [labnetwork] Senior Equipment Engineer Position at UCSD Message-ID: The Nano3 cleanroom facility at UCSD, one of the 16 NSF supported NNCI sites, has an immediate opportunity for a seasoned senior equipment engineer. This is a hands-on position for someone who enjoys making a difference in a very vibrant academia based environment that services a highly diverse user base from academia, industry and government labs. We are looking for an energetic person who wants to help us further grow and improve the quality of our operation. The ideal candidate will have multiple years of work experience in a research and development environment, with a solid background in troubleshooting and maintaining equipment for semiconductor processing and evaluation, as well as a thorough understanding of the processing aspects of a large subset of techniques. The candidate will report directly to leadership of our facility and will be involved in strategic decision-making. For the official job posting and to submit an application, please see: http://jobs.ucsd.edu/bulletin/job.aspx?jobnum_in=109423 -- Bernd Fruhberger, PhD Technical Director, Nano3 Cleanroom Facility Assoc. Director, Operations, San Diego Nanotechnology Infrastructure UCSD Calit2 M/C0436 9500 Gilman Drive La Jolla, CA 92093-0436 Ph (858) 534-4518 Fax (858) 534-9092 bfruhberger at ucsd.edu http://sdni.ucsd.edu/ http://nano3.calit2.net/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From benard.ouma at ttu.ac.ke Mon May 17 02:11:27 2021 From: benard.ouma at ttu.ac.ke (Benard Ouma) Date: Mon, 17 May 2021 09:11:27 +0300 Subject: [labnetwork] Material for Temporary Storage of Wet Chemistry Chemical Message-ID: Hi All, Could anyone recommend to me the best temporary storage tanks for the chemicals from the wet chemistry (acids, base and solvents) that we can purchase. The tanks will be used to hold the chemicals before they are emptied in a different location. Best Regards Benard -------------- next part -------------- An HTML attachment was scrubbed... URL: From jtmitch5 at ncsu.edu Mon May 17 10:55:50 2021 From: jtmitch5 at ncsu.edu (James Mitchell) Date: Mon, 17 May 2021 10:55:50 -0400 Subject: [labnetwork] Connector? Message-ID: Anyone know what or who makes this connector? There is no branding on it. [image: Screenshot_6.jpg] [image: Screenshot_5.jpg] Thanks, Jim -- *James Mitchell* *Specialty Trades Technician* *Dept. of Electrical and Computer Engineering* *NCSU Nanofabrication Facility* *MRC RM243A **Box 7911* *2410 Campus Shore Dr., Raleigh, NC 27606* *jtmitch5 at ncsu.edu* *Desk: 919-515-5394* *Cell: 919-717-7325* -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Screenshot_6.jpg Type: image/jpeg Size: 88170 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Screenshot_5.jpg Type: image/jpeg Size: 73658 bytes Desc: not available URL: From jtmitch5 at ncsu.edu Mon May 17 12:28:24 2021 From: jtmitch5 at ncsu.edu (James Mitchell) Date: Mon, 17 May 2021 12:28:24 -0400 Subject: [labnetwork] Connector? In-Reply-To: References: Message-ID: Found it. Just need to find the pins. [image: image.png] On Mon, May 17, 2021 at 10:55 AM James Mitchell wrote: > Anyone know what or who makes this connector? > There is no branding on it. > [image: Screenshot_6.jpg] > [image: Screenshot_5.jpg] > > Thanks, Jim > -- > *James Mitchell* > *Specialty Trades Technician* > *Dept. of Electrical and Computer Engineering* > *NCSU Nanofabrication Facility* > *MRC RM243A **Box 7911* > *2410 Campus Shore Dr., Raleigh, NC 27606* > *jtmitch5 at ncsu.edu* > *Desk: 919-515-5394* > *Cell: 919-717-7325* > > -- *James Mitchell* *Specialty Trades Technician* *Dept. of Electrical and Computer Engineering* *NCSU Nanofabrication Facility* *MRC RM243A **Box 7911* *2410 Campus Shore Dr., Raleigh, NC 27606* *jtmitch5 at ncsu.edu* *Desk: 919-515-5394* *Cell: 919-717-7325* -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Screenshot_6.jpg Type: image/jpeg Size: 88170 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Screenshot_5.jpg Type: image/jpeg Size: 73658 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 174557 bytes Desc: not available URL: From dcchrist at wisc.edu Mon May 17 17:13:06 2021 From: dcchrist at wisc.edu (Daniel Christensen) Date: Mon, 17 May 2021 21:13:06 +0000 Subject: [labnetwork] University of Wisconsin-Madison is seeking a nano-fabrication engineer Message-ID: University of Wisconsin-Madison is seeking a nano-fabrication engineer - Applications close May 26th. The Nanoscale Fabrication Center (NFC) at the University of Wisconsin-Madison is seeking a nano-fabrication engineer. Position Vacancy Listing (PVL) is #233629 titled Instrumentation Technologist with an anticipated start date of August 1, 2021. A minimum of BS in Electrical Engineering, Chemical Engineering, Physics, Materials Science, or Interdisciplinary Program Degree with micro/nano device fabrication experience is required. An advanced degree is desirable or equivalent professional experience and knowledge in varied area of semiconductor fabrication and process design. The candidate must have a strong background in the use of micro- and nanofabrication techniques, equipment, and clean room protocols. Special consideration will be given to candidates with experience in one or more of these fabrication techniques: lithography, e-beam evaporators, sputter deposition tools, reactive ion etchers, horizontal tube furnaces, or LPCVD systems. Experience and expertise in electrical and electronic, mechanical, pneumatic, and vacuum components as related to semiconductor/device fabrication. Maintenance will be performed independently by the candidate and in close collaboration with field service engineers. The candidate will be expected to assist students and other researchers in all areas of tool use and process development. The position will be responsible for developing documentation and training materials. The position will be responsible to training new users on the proper operation of the nano-fabrication systems. For a full position description information and specific application instructions, go to: https://jobs.hr.wisc.edu/en-us/job/508955/instrumentation-tech All applications must be placed online through the link above. A successful applicant will be responsible for ensuring eligibility for employment in the United States on or before the effective date of the appointment. University sponsorship is not available for this position. Unless confidentiality is requested in writing, information regarding applicants must be released upon request. Finalists cannot be guaranteed confidentiality. UW-Madison provides equal employment opportunity for all persons and is in compliance with State and Federal regulations. Daniel C. Christensen Laboratory Manager Nanoscale Fabrication Center University of Wisconsin-Madison -------------- next part -------------- An HTML attachment was scrubbed... URL: From gloria.qiu at sydney.edu.au Mon May 17 19:54:00 2021 From: gloria.qiu at sydney.edu.au (Gloria Qiu) Date: Mon, 17 May 2021 23:54:00 +0000 Subject: [labnetwork] Sapphire dicing In-Reply-To: References: Message-ID: Hi Natalia, I?ve tried dicing 600um sapphire with resin hubless blade at 3mm/sec, 15krmp, and the blades always chip. The manufacturer also recommended depth-step as Ahdam suggested but I haven?t got time to try it. (It would be quite slow though). My colleague at UNSW uses a standard procedure (one-step) with VT07/12 blades that I am keen to try. I found the blade and dicing information here and the result looks pretty decent. https://www.aurotech.com/index.php/en/products/dicing-blade/vt07-12-series-detail Hope this helps. Best, Gloria Wenlan (Gloria) Qiu Senior Process Engineer | Research & Prototype Foundry Core Research Facilities | Research Portfolio THE UNIVERSITY OF SYDNEY Level 4, Sydney Nanoscience Hub A31 | The University of Sydney | NSW | 2006 T +61 02 8627 9756 E gloria.qiu at sydney.edu.au | W Research and Prototype Foundry CRICOS 00026A This email plus any attachments to it are confidential. Any unauthorised use is strictly prohibited. If you receive this email in error, please delete it and any attachments. Please think of our environment and only print this e-mail if necessary. From: labnetwork On Behalf Of Ahdam Ali Sent: Saturday, May 15, 2021 1:12 AM To: Natalia Pankratova Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Sapphire dicing Natalia, At Nano3, we utilize a Disco DAD3220 Dicing Saw with Hubless blades in order to dice sapphire substrates. The process is relatively fool-proof, but one must be careful with dicing parameters. Cutting glass or sapphire typically require depth steps (multiple passes along a single cut) as well as very low feed speeds in order to ensure the integrity of the sample. This results in a considerably lower throughput when compared to dicing of a material such as Si. Best, On Fri, May 14, 2021 at 4:57 AM Natalia Pankratova > wrote: Dear All, Can you please share your experience on dicing sapphire wafers? Blade dicing or laser? Do you have a favorite dicing brand/model? Thank you in advance! Best regards, Natalia Pankratova. Alice&Bob Nanofabrication engineer _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Ahdam Ali R&D Engineer II UCSD Calit2 Nano3 Facility Atkinson Hall M/C0436 9500 Gilman Drive La Jolla, CA 92093-0436 Email: aali at eng.ucsd.edu Phone: (858)-534-4768 -------------- next part -------------- An HTML attachment was scrubbed... URL: From aali at eng.ucsd.edu Mon May 17 21:42:27 2021 From: aali at eng.ucsd.edu (Ahdam Ali) Date: Mon, 17 May 2021 18:42:27 -0700 Subject: [labnetwork] Sapphire dicing In-Reply-To: References: Message-ID: <037F432C-51CF-4A66-9079-8FD852F9DD49@eng.ucsd.edu> Gloria and Natalia, I?ll write up a procedure and include consumables/parts. Discussions with a professional dicing service has taught me that it?s possible to dice sapphire with a single pass up to 1mm, but they dress very heavily for each sample (removing 20% of the samples thickness from the blade) and even they blow up blades. It?s quite a difficult material to dice. Depth steps seem to the most viable route. Best, Ahdam Ali R&D Engineer II UCSD Calit2 Nano3 Facility Atkinson Hall M/C0436 9500 Gilman Drive La Jolla, CA 92093-0436 Email: aali at eng.ucsd.edu Phone: (858)-534-4768 > On May 17, 2021, at 4:54 PM, Gloria Qiu wrote: > ? > Hi Natalia, > > I?ve tried dicing 600um sapphire with resin hubless blade at 3mm/sec, 15krmp, and the blades always chip. The manufacturer also recommended depth-step as Ahdam suggested but I haven?t got time to try it. (It would be quite slow though). > My colleague at UNSW uses a standard procedure (one-step) with VT07/12 blades that I am keen to try. I found the blade and dicing information here and the result looks pretty decent. > https://www.aurotech.com/index.php/en/products/dicing-blade/vt07-12-series-detail > > Hope this helps. > > > Best, > > Gloria > > Wenlan (Gloria) Qiu > Senior Process Engineer | Research & Prototype Foundry > Core Research Facilities | Research Portfolio > > THE UNIVERSITY OF SYDNEY > Level 4, Sydney Nanoscience Hub A31 | The University of Sydney | NSW | 2006 > T +61 02 8627 9756 > E gloria.qiu at sydney.edu.au | W Research and Prototype Foundry > > > CRICOS 00026A > This email plus any attachments to it are confidential. Any unauthorised use is strictly prohibited. If you receive this email in error, please delete it and any attachments. > > Please think of our environment and only print this e-mail if necessary. > > > > From: labnetwork On Behalf Of Ahdam Ali > Sent: Saturday, May 15, 2021 1:12 AM > To: Natalia Pankratova > Cc: labnetwork at mtl.mit.edu > Subject: Re: [labnetwork] Sapphire dicing > > Natalia, > > At Nano3, we utilize a Disco DAD3220 Dicing Saw with Hubless blades in order to dice sapphire substrates. The process is relatively fool-proof, but one must be careful with dicing parameters. Cutting glass or sapphire typically require depth steps (multiple passes along a single cut) as well as very low feed speeds in order to ensure the integrity of the sample. This results in a considerably lower throughput when compared to dicing of a material such as Si. > > Best, > > On Fri, May 14, 2021 at 4:57 AM Natalia Pankratova wrote: > Dear All, > > Can you please share your experience on dicing sapphire wafers? Blade dicing or laser? Do you have a favorite dicing brand/model? > > Thank you in advance! > > Best regards, > > Natalia Pankratova. > Alice&Bob > Nanofabrication engineer > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > -- > Ahdam Ali > R&D Engineer II > UCSD Calit2 Nano3 Facility > Atkinson Hall M/C0436 > 9500 Gilman Drive > La Jolla, CA 92093-0436 > > Email: aali at eng.ucsd.edu > Phone: (858)-534-4768 -------------- next part -------------- An HTML attachment was scrubbed... URL: From nadia.court at sydney.edu.au Mon May 17 23:41:11 2021 From: nadia.court at sydney.edu.au (Nadia Court) Date: Tue, 18 May 2021 03:41:11 +0000 Subject: [labnetwork] Process Engineer Role - University of Sydney Message-ID: Dear Colleagues, The University of Sydney is looking to hire a process engineer to work within the Research and Prototype Foundry, a Core Research Facility and part of the New South Wales node of the Australian National Fabrication Facility. The successful candidate for this position will engage with researchers working in the quantum technologies space and facilitate cross-facility utilisation of ANFF-NSW capabilities at the University of Sydney and UNSW. Please share this opportunity with any colleagues who may be interested. https://usyd.wd3.myworkdayjobs.com/en-US/USYD_EXTERNAL_CAREER_SITE/job/Other-Facilities/XMLNAME--Senior--Process-Engineer--Quantum-Technologies_0080601-3 Kind Regards, Nadia Dr Nadia Court | Technical Director, Research & Prototype Foundry The University of Sydney Core Research Facilities, Research Portfolio Rm 4019, Sydney Nanoscience Hub A31 | The University of Sydney | NSW | 2006 +61 2 8627 8671 | nadia.court at sydney.edu.au | Sydney's Core Research Facilities Part of the NSW Node of the Australian National Fabrication Facility: www.anff.org.au Register for the RPF induction ? via the Sydney University website CRICOS 00026A This email plus any attachments to it are confidential. Any unauthorised use is strictly prohibited. If you receive this email in error, please delete it and any attachments. Please think of our environment and only print this e-mail if necessary. -------------- next part -------------- An HTML attachment was scrubbed... URL: From shimonel at savion.huji.ac.il Tue May 18 08:20:28 2021 From: shimonel at savion.huji.ac.il (Shimon Eliav) Date: Tue, 18 May 2021 12:20:28 +0000 Subject: [labnetwork] Sapphire dicing In-Reply-To: References: Message-ID: Hi Natalia, We use Blade Dicing. System: ADT Provectus 7100 Blade: ADT Resinoid Speed: 0.4mm/sec Every Pass: 140 ?m deep Regards, Shimon From: labnetwork [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Natalia Pankratova Sent: Friday, 14 May 2021 14:25 To: labnetwork at mtl.mit.edu Subject: [labnetwork] Sapphire dicing Dear All, Can you please share your experience on dicing sapphire wafers? Blade dicing or laser? Do you have a favorite dicing brand/model? Thank you in advance! Best regards, Natalia Pankratova. Alice&Bob Nanofabrication engineer -------------- next part -------------- An HTML attachment was scrubbed... URL: From rlc12 at cornell.edu Tue May 18 08:44:20 2021 From: rlc12 at cornell.edu (Rebecca Lee Vliet) Date: Tue, 18 May 2021 12:44:20 +0000 Subject: [labnetwork] Register now for the June 2021 CNF TCN VIRTUAL Short Course! Message-ID: Please share with anyone who might be interested. Thank you! CNF Technology & Characterization at the Nanoscale (CNF TCN) VIRTUAL Short Course June 9, 2021 - June 11, 2021 The CNF TCN is going virtual for June 2021! The course is being offered at a reduced fee of $60.00 per person to enable a broader audience to attend. The course will be held Wednesday, June 9, 2021 - Friday, June 11, 2021, daily from 11:00am to 4:00pm (EDT). Each day offers lectures and laboratory demonstrations designed to impart a broad understanding of the science and technology required to undertake research in nanoscience. TCN is an ideal way for faculty, students, post docs and staff members to rapidly come up to speed in many of the technologies that users of the CNF need to employ. Members of the high tech business community will also find it an effective way to learn best practices for success in a nanofab environment. Attendance is open to the general scientific community. Note: The short course does not replace the three part training required to become a user of our facility. To become a CNF user, please visit the "Getting Started" link (https:cnf.cornell.edu/howto) on the CNF website. For more information and to register visit: https://cnf.cornell.edu/education/tcn [Text Description automatically generated] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 349280 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: TCN_JUNE2021.jpg Type: image/jpeg Size: 349280 bytes Desc: TCN_JUNE2021.jpg URL: From robert.j.macdon at gmail.com Tue May 18 10:22:55 2021 From: robert.j.macdon at gmail.com (Robert MacDonald) Date: Tue, 18 May 2021 10:22:55 -0400 Subject: [labnetwork] Material for Temporary Storage of Wet Chemistry Chemical In-Reply-To: References: Message-ID: My first rule: alwaycheck the container the chemical shipped in as a guide for compatibility If plastic try USA Plastic for 5 gallon stackable carboys. Second rule: be careful. Safety ! This is a hard problem and you need to think through the entire process door to door. Thanks, Rob Sent from my iDidntspellcheckit > On May 17, 2021, at 2:11 AM, Benard Ouma wrote: > > Hi All, > Could anyone recommend to me the best temporary storage tanks for the chemicals from the wet chemistry (acids, base and solvents) that we can purchase. The tanks will be used to hold the chemicals before they are emptied in a different location. > > Best Regards > Benard > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From nicholas.butzin at gmail.com Wed May 19 14:07:12 2021 From: nicholas.butzin at gmail.com (Nicholas Butzin) Date: Wed, 19 May 2021 13:07:12 -0500 Subject: [labnetwork] Job Posting, postdoc position in microfluidic design and operation Message-ID: A postdoctoral scholar position is available at South Dakota State University (SDSU) in Dr. Nicholas C. Butzin and Dr. ZhengRong (Jimmy) Gu labs. The ideal start date is July 1, 2021, but later dates may be considered. *JOB Duties:* The postdoctoral scholar will develop new microfluidic biosensor for characterization of bacterial biofilms. Specifically, the post-doc scholar is expected to use nanoparticle and polymer 3D printing to create mechanically and electrically robust 3D microfluidic devices for microbial detection and sensing. Research tasks include but are not limited to: 1) Microfluidic device fabrication and characterization, 2) Microfluidics-based analyses including microbial responsiveness to environmental stress, and interactions between hosts and microbes and surfaces of agricultural significance; 3) Microfluidics platforms for high throughput profiling (e.g. sequencing) of diverse cell types including microbes. *QUALIFICATIONS *Applicants must hold a doctoral degree in Biological Engineering, Chemical Engineering, Materials Engineering, and/or a related field. A background in biosensing of microbes and other biomolecules, 3D printing, microfabrication, microfluidic device engineering, and knowledge of structure-property relations of materials is necessary. Experience with fluorescent detection, electrochemical analysis, and sensor circuit design is a significant plus. Familiarity with material-biomolecule interface (such as conjugation of biomolecules), high-resolution 3D printer, knowledge of the chemistry of 3D printing ink preparation, and microfluidic device designation and fabrication is a plus. Familiarity with characterization tools such as SEM and TEM is highly desirable. Candidates who have very strong records of scholarship supported by publications are highly desirable. Experience working with diverse student populations and first-generation students is highly desirable. *Dr. Butzin and Dr. Gu Lab Information* Butzin: https://sites.google.com/site/nicholascbutzin/ Gu: https://www.sdstate.edu/directory/zhengrong-gu Candidates should email their CV to Dr. Butzin at nicholas.butzin at gmail.com with the subject heading: ?postdoc microfluidics 2021?. -------------- next part -------------- An HTML attachment was scrubbed... URL: From bfruhberger at ucsd.edu Thu May 20 12:41:49 2021 From: bfruhberger at ucsd.edu (Bernd Fruhberger) Date: Thu, 20 May 2021 09:41:49 -0700 Subject: [labnetwork] Research and Development Engineer Position at UCSD Message-ID: The Nano3 cleanroom and materials characterization facility at UCSD, one of 16 NSF supported NNCI sites, has an immediate opportunity for a Research and Development Engineer 3. This is a hands-on position at the Associate Engineer level, primarily focused on supporting our electron-beam imaging and materials characterization laboratory. We are looking for a candidate who enjoys working directly with students, postdocs and researchers from industry and government labs in a vibrant academia based environment with a highly diverse user base. The ideal candidate will have multiple years of work experience in a research and development environment with a solid background in scanning electron microscopy and associated techniques for materials characterization. For the official job posting and to submit an application, please see: http://jobs.ucsd.edu/bulletin/job.aspx?jobnum_in=109527 -- Bernd Fruhberger, PhD Technical Director, Nano3 Cleanroom Facility Assoc. Director, Operations, San Diego Nanotechnology Infrastructure UCSD Calit2 M/C0436 9500 Gilman Drive La Jolla, CA 92093-0436 Ph (858) 534-4518 Fax (858) 534-9092 bfruhberger at ucsd.edu http://sdni.ucsd.edu/ http://nano3.calit2.net/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From csmiller at anl.gov Thu May 20 15:16:18 2021 From: csmiller at anl.gov (Miller, Suzanne) Date: Thu, 20 May 2021 19:16:18 +0000 Subject: [labnetwork] Sapphire dicing In-Reply-To: <037F432C-51CF-4A66-9079-8FD852F9DD49@eng.ucsd.edu> References: , <037F432C-51CF-4A66-9079-8FD852F9DD49@eng.ucsd.edu> Message-ID: Here at Argonne, we use an ADT dicing saw with a resin blade with 46 micron grit .8mm/s slices of 100-150 microns Yours Suzanne ________________________________ From: labnetwork on behalf of Ahdam Ali Sent: Monday, May 17, 2021 8:42 PM To: Gloria Qiu Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Sapphire dicing Gloria and Natalia, I?ll write up a procedure and include consumables/parts. Discussions with a professional dicing service has taught me that it?s possible to dice sapphire with a single pass up to 1mm, but they dress very heavily for each sample (removing 20% of the samples thickness from the blade) and even they blow up blades. It?s quite a difficult material to dice. Depth steps seem to the most viable route. Best, Ahdam Ali R&D Engineer II UCSD Calit2 Nano3 Facility Atkinson Hall M/C0436 9500 Gilman Drive La Jolla, CA 92093-0436 Email: aali at eng.ucsd.edu Phone: (858)-534-4768 On May 17, 2021, at 4:54 PM, Gloria Qiu wrote: ? Hi Natalia, I?ve tried dicing 600um sapphire with resin hubless blade at 3mm/sec, 15krmp, and the blades always chip. The manufacturer also recommended depth-step as Ahdam suggested but I haven?t got time to try it. (It would be quite slow though). My colleague at UNSW uses a standard procedure (one-step) with VT07/12 blades that I am keen to try. I found the blade and dicing information here and the result looks pretty decent. https://www.aurotech.com/index.php/en/products/dicing-blade/vt07-12-series-detail Hope this helps. Best, Gloria Wenlan (Gloria) Qiu Senior Process Engineer | Research & Prototype Foundry Core Research Facilities | Research Portfolio THE UNIVERSITY OF SYDNEY Level 4, Sydney Nanoscience Hub A31 | The University of Sydney | NSW | 2006 T +61 02 8627 9756 E gloria.qiu at sydney.edu.au | W Research and Prototype Foundry CRICOS 00026A This email plus any attachments to it are confidential. Any unauthorised use is strictly prohibited. If you receive this email in error, please delete it and any attachments. Please think of our environment and only print this e-mail if necessary. From: labnetwork On Behalf Of Ahdam Ali Sent: Saturday, May 15, 2021 1:12 AM To: Natalia Pankratova Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Sapphire dicing Natalia, At Nano3, we utilize a Disco DAD3220 Dicing Saw with Hubless blades in order to dice sapphire substrates. The process is relatively fool-proof, but one must be careful with dicing parameters. Cutting glass or sapphire typically require depth steps (multiple passes along a single cut) as well as very low feed speeds in order to ensure the integrity of the sample. This results in a considerably lower throughput when compared to dicing of a material such as Si. Best, On Fri, May 14, 2021 at 4:57 AM Natalia Pankratova > wrote: Dear All, Can you please share your experience on dicing sapphire wafers? Blade dicing or laser? Do you have a favorite dicing brand/model? Thank you in advance! Best regards, Natalia Pankratova. Alice&Bob Nanofabrication engineer _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Ahdam Ali R&D Engineer II UCSD Calit2 Nano3 Facility Atkinson Hall M/C0436 9500 Gilman Drive La Jolla, CA 92093-0436 Email: aali at eng.ucsd.edu Phone: (858)-534-4768 -------------- next part -------------- An HTML attachment was scrubbed... URL: From mrichmon at nd.edu Thu May 20 15:46:27 2021 From: mrichmon at nd.edu (Mark Richmond) Date: Thu, 20 May 2021 15:46:27 -0400 Subject: [labnetwork] Open Position at University of Notre Dame Message-ID: The University of Notre Dame Nanofabrication Facility is seeking a Nanofabrication Engineering Specialist. A quick summary of the position: The Nanofabrication Engineering Specialist will be responsible for providing process consulting expertise to cleanroom (NDNF) users, process engineering support and service for users, and for repair and maintenance of cleanroom processing equipment. This position will also involve liaising with external users, as well as training of new and existing users on equipment. For full job details and to apply, please see: https://jobs.nd.edu/postings/20992 Thank you Mark Richmond Notre Dame Nanofabrication Facility Manager 275 Fitzpatrick Hall Notre Dame, IN 46556 ph: 574-631-6478 -------------- next part -------------- An HTML attachment was scrubbed... URL: From derose at caltech.edu Fri May 21 12:46:52 2021 From: derose at caltech.edu (DeRose, Guy A.) Date: Fri, 21 May 2021 16:46:52 +0000 Subject: [labnetwork] Opening for Laboratory Technical Staff at Kavli Nanoscience Institute, Caltech Message-ID: <98A4E26E-6C1F-424A-9753-930E353C8502@caltech.edu> The Kavli Nanoscience Institute (KNI) is seeking a highly organized, proactive problem solver to serve as a Laboratory Technician and assist in the daily technical maintenance operations of a 7,500 ft2 cleanroom facility and affiliated lab spaces on the Caltech campus. For full details of this position, see the listing on Caltech?s HR website: https://phf.tbe.taleo.net/phf03/ats/careers/v2/viewRequisition?org=CALTECH&cws=37&rid=5791 If you are interested in the position, or would like to recommend someone who is, please apply / influence that person to apply, and you may contact me directly. This position is available immediately. FYI, Guy DeRose, PhD, Member of the Professional Staff Associate Director of Technical Operations, Kavli Nanoscience Institute California Institute of Technology, Pasadena, CA USA (O) 1-626-395-3423 (M) 1-626-676-8529 http://kni.caltech.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From rrand at ucdavis.edu Fri May 21 17:44:19 2021 From: rrand at ucdavis.edu (Ryan R Anderson) Date: Fri, 21 May 2021 21:44:19 +0000 Subject: [labnetwork] MIDAS gas sensor replacement shortage Message-ID: Hi everyone, I am encountering extremely long lead times for replacement sensor cartridges used in Honeywell MIDAS gas detectors. The longest lead time is for the chlorine sensor cartridges. I ordered the chlorine sensor cartridges in March and the expected ship date is not till July. The delay is apparently pandemic related. Due to the long delay, the calibration of our current sensors has expired and our TGMS has shut down those gas lines. This is seriously affecting our users so I wanted to let everyone know about this in case this situation might happen to you as well. It is possible to reset the date and time on the internal clocks on the sensors to buy more time, but it is something I would like to avoid doing since the sensor calibration is expired and it's not certain how the sensor will function. Of course, Honeywell recommends not to do this. I need six chlorine sensors (part number MIDAS-E-HAL MIDAS HAL (CL2 F2)SENSOR CART E/W) and eight HBr/BCl3 sensors (MIDAS-E-HCL MIDAS HCL-BCL3 H2CL2SI HBR HCL CART E/W) to clear the remote shutdowns. I have already asked around to some other facilities but have had no luck. If anyone has any unexpired spares that they can part with (I realize that, given the current situation, it is not likely) I would be happy to send you mine once they arrive. Thanks in advance! Ryan Anderson Manager, Center for Nano-MicroManufacturing 1209 Kemper Hall University of California at Davis One Shields Avenue Davis, CA 95616 Phone: 530-601-3943 Email: rrand at ucdavis.edu https://cnm2.ucdavis.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From bfruhberger at ucsd.edu Sat May 22 15:48:59 2021 From: bfruhberger at ucsd.edu (Bernd Fruhberger) Date: Sat, 22 May 2021 12:48:59 -0700 Subject: [labnetwork] Equipment Engineer Position at UCSD Message-ID: The Nano3 cleanroom and materials characterization facility at UCSD, one of 16 NSF supported NNCI sites, has an immediate opportunity for an Equipment Engineer (Research and Development Engineer 3). This is a hands-on position in Nano3's equipment group which is responsible for equipment and laboratory infrastructure of our extensive cleanroom and materials characterization laboratories. We are looking for an energetic candidate who enjoys supporting an academic R&D environment utilized by a diverse group of students, postdocs and researchers from industry and government labs. For the official job posting and to submit an application, please see: http://jobs.ucsd.edu/bulletin/job.aspx?jobnum_in=109605 -- Bernd Fruhberger, PhD Technical Director, Nano3 Cleanroom Facility Assoc. Director, Operations, San Diego Nanotechnology Infrastructure UCSD Calit2 M/C0436 9500 Gilman Drive La Jolla, CA 92093-0436 Ph (858) 534-4518 Fax (858) 534-9092 bfruhberger at ucsd.edu http://sdni.ucsd.edu/ http://nano3.calit2.net/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From nicholas.butzin at gmail.com Tue May 25 11:04:58 2021 From: nicholas.butzin at gmail.com (Nicholas Butzin) Date: Tue, 25 May 2021 10:04:58 -0500 Subject: [labnetwork] postdoc position at SDstate Message-ID: A postdoctoral scholar position is available at South Dakota State University (SDstate; SDSU) in Dr. Nicholas C. Butzin and Dr. ZhengRong (Jimmy) Gu labs. The ideal start date is July 1, 2021, but later dates may be considered. *JOB Duties:* The postdoctoral scholar will develop new microfluidic biosensor for characterization of bacterial biofilms. Specifically, the post-doc scholar is expected to use nanoparticle and polymer 3D printing to create mechanically and electrically robust 3D microfluidic devices for microbial detection and sensing. Research tasks include but are not limited to: 1) Microfluidic device fabrication and characterization, 2) Microfluidics-based analyses including microbial responsiveness to environmental stress, and interactions between hosts and microbes and surfaces of agricultural significance; 3) Microfluidics platforms for high throughput profiling (e.g. sequencing) of diverse cell types including microbes. *QUALIFICATIONS *Applicants must hold a doctoral degree in Biological Engineering, Chemical Engineering, Materials Engineering, and/or a related field. A background in biosensing of microbes and other biomolecules, 3D printing, microfabrication, microfluidic device engineering, and knowledge of structure-property relations of materials is necessary. Experience with fluorescent detection, electrochemical analysis, and sensor circuit design is a significant plus. Familiarity with material-biomolecule interface (such as conjugation of biomolecules), high-resolution 3D printer, knowledge of the chemistry of 3D printing ink preparation, and microfluidic device designation and fabrication is a plus. Familiarity with characterization tools such as SEM and TEM is highly desirable. Candidates who have very strong records of scholarship supported by publications are highly desirable. Experience working with diverse student populations and first-generation students is highly desirable. *Dr. Butzin and Dr. Gu Lab Information* Butzin: https://sites.google.com/site/nicholascbutzin/ Gu: https://www.sdstate.edu/directory/zhengrong-gu Candidates should email their CV to Dr. Butzin at nicholas.butzin at gmail.com with the subject heading: ?postdoc microfluidics 2021?. -------------- next part -------------- An HTML attachment was scrubbed... URL: From Aju.Jugessur at Colorado.EDU Tue May 25 13:17:55 2021 From: Aju.Jugessur at Colorado.EDU (Aju Jugessur) Date: Tue, 25 May 2021 17:17:55 +0000 Subject: [labnetwork] Information request: PVD reactor based on LAFAD technology Message-ID: <3C75D2CF-1ED4-41F6-99AA-9AA4B61830A1@colorado.edu> Dear all, I am reaching out to the community to get some feedback on facilities that may have a plasma-enhanced PVD reactor based on large area filtered arc deposition (LAFAD) technology, for surface engineering and deposition of various thin and thick film coatings and surface modifications. I am attaching a flyer that contains some of the technical information and the model under consideration is LAFAD 600C and the original manufacturer is ARCOMAC. I would like to obtain some information and your perspectives on the following (if you have any model from this manufacturer) 1. Maintenance/repairs and issues with the instrument 2. Availability of parts and any third-party services on the instrument 3. Estimated usage (hrs)/year 4. Diversity of application areas of the technology 5. Any other comments and concerns Since I am not familiar with this specific instrument, I would be grateful for any information, advice and perspectives that you may share with me. You may contact me directly or let me know as I can also call you as well. Thanks so much, Regards Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Member of Engineering Staff Council (ESC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEL | Boulder, CO 80303| P: 303.735.5019| F: 303.492.2199 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur www.colorado.edu/facility/cosinc [signature_578491268] Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6294 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: AdvancedSourcesforCathodicArcDepositionEquipment_Example.pdf Type: application/pdf Size: 788651 bytes Desc: AdvancedSourcesforCathodicArcDepositionEquipment_Example.pdf URL: From jdeng at cns.fas.harvard.edu Wed May 26 16:49:58 2021 From: jdeng at cns.fas.harvard.edu (Deng, Jiangdong) Date: Wed, 26 May 2021 20:49:58 +0000 Subject: [labnetwork] postdoc position at CNS in Harvard University Message-ID: Hi, All A postdoctoral scholar position is available in the Center for Nanoscale System (CNS) of Harvard University. The ideal start date is July 1, 2021. Responsibilities: We are seeking a full-time postdoctoral research fellow to work on the development of novel micro-TMS coils for biomedical applications. This 2-year long appointment will be made at the rank of postdoctoral fellow at Center for Nanoscale Systems at Harvard University. Requirements: A candidate must be highly motivated, with a demonstrated excellent research track record in the fields of MEMS device design, nano-/micro- fabrication, and characterization. Independent process skills in nano-fabrication, including E-beam lithography, Photolithography, RIE, film deposition and electron microscopy (EM), as well as experimental and numerical characterizations of material, electrical, and thermal properties, are required. Experience in high currents amplifiers, and non-invasive human experiments is desired but not required. A PhD (or equivalent) in physics, applied physics, electrical engineering, chemical/biomedical engineering, material sciences or a related field is required. The successful postdoc candidate is expected to have a strong publication record and good communication skills. To apply: Please send a full CV and a cover letter to Dr. Jiangdong (JD) Deng at jdeng at cns.fas.harvard.edu. Reference letters are not required for initial inquiry but could be helpful for full consideration if arranged to be sent directly to Dr. Deng via email. Additional Qualifications: The candidate should be self-motivated with a strong desire to acquire on-the-job training, to succeed, and to develop intellectual, and practical professional skills. Demonstrated ability to work well in teams is essential. Physical Requirements: Must be able to work in cleanroom, chemical, and measurement laboratory environments. Will work around compressed gases, acids, solvents, and other chemicals. Thanks! -JD -- Jiangdong Deng (JD), Ph. D Associate Director, Center for Nanoscale Systems Head of Nanofabrication Facility, Harvard University, 11 Oxford St., LISE-G54, Cambridge, MA 02138 Tel: 617-495-3396 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Post-doc-NIH-uMS project.pdf Type: application/pdf Size: 60717 bytes Desc: Post-doc-NIH-uMS project.pdf URL: From sguo18 at yorku.ca Thu May 27 10:02:39 2021 From: sguo18 at yorku.ca (Xin (Shane) GUO) Date: Thu, 27 May 2021 10:02:39 -0400 Subject: [labnetwork] Yellow filters for litho room: what specs are out there? In-Reply-To: <425037fe-b7a8-f486-5351-515f2e9a3a24@physics.ubc.ca> References: <425037fe-b7a8-f486-5351-515f2e9a3a24@physics.ubc.ca> Message-ID: Hello Mario, I saw your past post regarding amber UV filter films for the cleanroom. I am in a similar situation looking for UV filter films for our cleanroom lights. Lithoprotect is also what I have found so far. I am wondering if you have identified suppliers from North America and can share such information with me. Best *Shane Guo, PhD, P.Eng.,* *PMP* *Lab Manager* *York MicroFab Facilities (YMF)/ESSE* C 289-588-6605 T 416-736-2100 ext 44160 sguo18 at yorku.ca | lassonde.yorku.ca Lassonde School of Engineering | York University RM037, Bergeron Building 4700 Keele Street Toronto ON, Canada M3J 1P3 On Thu, Dec 20, 2018 at 8:09 PM Beaudoin, Mario wrote: > Dear Labnetworks community, > > I'm in the process of renovating our cleanroom and want yellow filters > that meet the specs of *Lithoprotect*, specifically, I want way less than > 1% transmission below 500nm. *Lithoprotect* (see link below) claims less > than 0.001% transmission below about 475nm. In our old cleanroom, we used > to have traditional 1% yellow windows that turned out to be inadequate for > our maskless lithography system. > > > https://www.microchemicals.com/technical_information/170823_Lithoprotect_Flyer_EN_Web.pdf > > Does anyone know of a US supplier that offers similar product? On the > other hand, does anyone know of products that are not quite as performing > but still offer say 0.01% transmission below 500nm? We will be using 405nm > and 365nm light with a traditional mask aligner and a maskless system. We > typically use AZ 5214E-IR and nLoF 2020 resists for down to 1um features; > some users still use Shipley 1813 and we have another set of groups using > SU-8 resists. We're not committed to any supplier but do require tight > performance. > > I'm cc'ing our cleanroom manufacturer engineers in this thread. > > Regards, > > Mario > -- > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig.png Type: image/png Size: 17513 bytes Desc: not available URL: From Jeffrey.Salzmann at integer.net Thu May 27 15:54:50 2021 From: Jeffrey.Salzmann at integer.net (Salzmann, Jeffrey) Date: Thu, 27 May 2021 19:54:50 +0000 Subject: [labnetwork] Yellow filters for litho room: what specs are out there? In-Reply-To: References: <425037fe-b7a8-f486-5351-515f2e9a3a24@physics.ubc.ca> Message-ID: <26f90b917a70471b856ee639b4a54ae6@integer.net> Shane, You might wish to consider using LED lighting, you can get a ?no blue? light (it looks like white light!) that has none of the problematic wavelengths. I am not familiar with vendors but I?ve tested them in two different photo bay (365 and 405 nm) and measured zero intensity. Regards, Jeff Jeff Salzmann Senior Research Engineer Advanced Materials Technology Group Integer* 10000 Wehrle Drive Clarence, NY, 14031 Tel +1 716.759.5796 Cell +1 716.867.1302 Jeffrey.Salzmann at integer.net www.integer.net * Integer comprises the following companies: Greatbatch Medical -?? Lake Region Medical -?? Electrochem From: labnetwork On Behalf Of Xin (Shane) GUO Sent: Thursday, May 27, 2021 10:03 AM To: Beaudoin, Mario Cc: labnetwork at mtl.mit.edu; fblais at mecart.com; david Arrouart ; Michelakis, Kostis Subject: Re: [labnetwork] Yellow filters for litho room: what specs are out there? CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe. Hello Mario, I saw your past post regarding amber UV filter films for the cleanroom. I am in a similar situation looking for UV filter films for our cleanroom lights. Lithoprotect is also what I have found so far. I am wondering if you have identified suppliers from North America and can share such information with me. Best Shane Guo, PhD, P.Eng., PMP Lab Manager York MicroFab Facilities (YMF)/ESSE C 289-588-6605 T 416-736-2100 ext 44160 sguo18 at yorku.ca | lassonde.yorku.ca Lassonde School of Engineering | York University RM037, Bergeron Building 4700 Keele Street Toronto ON, Canada M3J 1P3 [Image removed by sender.] On Thu, Dec 20, 2018 at 8:09 PM Beaudoin, Mario > wrote: Dear Labnetworks community, I'm in the process of renovating our cleanroom and want yellow filters that meet the specs of Lithoprotect, specifically, I want way less than 1% transmission below 500nm. Lithoprotect (see link below) claims less than 0.001% transmission below about 475nm. In our old cleanroom, we used to have traditional 1% yellow windows that turned out to be inadequate for our maskless lithography system. https://www.microchemicals.com/technical_information/170823_Lithoprotect_Flyer_EN_Web.pdf Does anyone know of a US supplier that offers similar product? On the other hand, does anyone know of products that are not quite as performing but still offer say 0.01% transmission below 500nm? We will be using 405nm and 365nm light with a traditional mask aligner and a maskless system. We typically use AZ 5214E-IR and nLoF 2020 resists for down to 1um features; some users still use Shipley 1813 and we have another set of groups using SU-8 resists. We're not committed to any supplier but do require tight performance. I'm cc'ing our cleanroom manufacturer engineers in this thread. Regards, Mario -- [cid:image001.png at 01D75310.2CF75DB0] _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork ________________________________ Integer Confidentiality Notice: This electronic mail transmission is intended for the use of the individual or entity to which it is addressed and may contain confidential or proprietary information belonging to the sender. If you are not the intended recipient, you are hereby notified that any disclosure, copying, distribution, or the taking of any action in reliance on the contents of this information is strictly prohibited. If you have received this transmission in error, please notify the sender immediately by e-mail and delete the original message. Thank you for your cooperation. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: ~WRD0000.jpg Type: image/jpeg Size: 823 bytes Desc: ~WRD0000.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 17513 bytes Desc: image001.png URL: From jtmitch5 at ncsu.edu Thu May 27 16:22:54 2021 From: jtmitch5 at ncsu.edu (James Mitchell) Date: Thu, 27 May 2021 16:22:54 -0400 Subject: [labnetwork] Yellow filters for litho room: what specs are out there? In-Reply-To: References: <425037fe-b7a8-f486-5351-515f2e9a3a24@physics.ubc.ca> Message-ID: This web site has yellow 4 foot fluorescent tubes that will work, no filter needed. https://www.bulbs.com/results.aspx?Ntt=TLD36W/16 Jim On Thu, May 27, 2021 at 3:09 PM Xin (Shane) GUO wrote: > Hello Mario, > > I saw your past post regarding amber UV filter films for the cleanroom. I > am in a similar situation looking for UV filter films for our cleanroom > lights. Lithoprotect is also what I have found so far. I am wondering if > you have identified suppliers from North America and can share such > information with me. > > Best > > *Shane Guo, PhD, P.Eng.,* *PMP* > *Lab Manager* > *York MicroFab Facilities (YMF)/ESSE* > C 289-588-6605 > T 416-736-2100 ext 44160 > sguo18 at yorku.ca | lassonde.yorku.ca > Lassonde School of Engineering | York University > RM037, Bergeron Building > 4700 Keele Street Toronto ON, Canada M3J 1P3 > > > > On Thu, Dec 20, 2018 at 8:09 PM Beaudoin, Mario > wrote: > >> Dear Labnetworks community, >> >> I'm in the process of renovating our cleanroom and want yellow filters >> that meet the specs of *Lithoprotect*, specifically, I want way less >> than 1% transmission below 500nm. *Lithoprotect* (see link below) >> claims less than 0.001% transmission below about 475nm. In our old >> cleanroom, we used to have traditional 1% yellow windows that turned out to >> be inadequate for our maskless lithography system. >> >> >> https://www.microchemicals.com/technical_information/170823_Lithoprotect_Flyer_EN_Web.pdf >> >> Does anyone know of a US supplier that offers similar product? On the >> other hand, does anyone know of products that are not quite as performing >> but still offer say 0.01% transmission below 500nm? We will be using 405nm >> and 365nm light with a traditional mask aligner and a maskless system. We >> typically use AZ 5214E-IR and nLoF 2020 resists for down to 1um features; >> some users still use Shipley 1813 and we have another set of groups using >> SU-8 resists. We're not committed to any supplier but do require tight >> performance. >> >> I'm cc'ing our cleanroom manufacturer engineers in this thread. >> >> Regards, >> >> Mario >> -- >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork >> > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- *James Mitchell* *Specialty Trades Technician* *Dept. of Electrical and Computer Engineering* *NCSU Nanofabrication Facility* *MRC RM243A **Box 7911* *2410 Campus Shore Dr., Raleigh, NC 27606* *jtmitch5 at ncsu.edu* *Desk: 919-515-5394* *Cell: 919-717-7325* -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig.png Type: image/png Size: 17513 bytes Desc: not available URL: From schweig at umich.edu Fri May 28 09:38:13 2021 From: schweig at umich.edu (Dennis Schweiger) Date: Fri, 28 May 2021 09:38:13 -0400 Subject: [labnetwork] Yellow filters for litho room: what specs are out there? In-Reply-To: References: <425037fe-b7a8-f486-5351-515f2e9a3a24@physics.ubc.ca> Message-ID: Shane, When we migrated to LED, replacing T-8's with an LED version, we used a product from this company for the areas we wanted to keep as "yellow" light. We've had them in since May of 2017 with no issues. https://www.ergomart.com/ergonomic-furniture/fluorescent-light-filters/tapr50-uv-light-filter Dennis 734.647.2055 Ofc On Thu, May 27, 2021 at 3:07 PM Xin (Shane) GUO wrote: > Hello Mario, > > I saw your past post regarding amber UV filter films for the cleanroom. I > am in a similar situation looking for UV filter films for our cleanroom > lights. Lithoprotect is also what I have found so far. I am wondering if > you have identified suppliers from North America and can share such > information with me. > > Best > > *Shane Guo, PhD, P.Eng.,* *PMP* > *Lab Manager* > *York MicroFab Facilities (YMF)/ESSE* > C 289-588-6605 > T 416-736-2100 ext 44160 > sguo18 at yorku.ca | lassonde.yorku.ca > Lassonde School of Engineering | York University > RM037, Bergeron Building > 4700 Keele Street Toronto ON, Canada M3J 1P3 > > > > On Thu, Dec 20, 2018 at 8:09 PM Beaudoin, Mario > wrote: > >> Dear Labnetworks community, >> >> I'm in the process of renovating our cleanroom and want yellow filters >> that meet the specs of *Lithoprotect*, specifically, I want way less >> than 1% transmission below 500nm. *Lithoprotect* (see link below) >> claims less than 0.001% transmission below about 475nm. In our old >> cleanroom, we used to have traditional 1% yellow windows that turned out to >> be inadequate for our maskless lithography system. >> >> >> https://www.microchemicals.com/technical_information/170823_Lithoprotect_Flyer_EN_Web.pdf >> >> Does anyone know of a US supplier that offers similar product? On the >> other hand, does anyone know of products that are not quite as performing >> but still offer say 0.01% transmission below 500nm? We will be using 405nm >> and 365nm light with a traditional mask aligner and a maskless system. We >> typically use AZ 5214E-IR and nLoF 2020 resists for down to 1um features; >> some users still use Shipley 1813 and we have another set of groups using >> SU-8 resists. We're not committed to any supplier but do require tight >> performance. >> >> I'm cc'ing our cleanroom manufacturer engineers in this thread. >> >> Regards, >> >> Mario >> -- >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork >> > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig.png Type: image/png Size: 17513 bytes Desc: not available URL: From Aju.Jugessur at Colorado.EDU Fri May 28 13:16:53 2021 From: Aju.Jugessur at Colorado.EDU (Aju Jugessur) Date: Fri, 28 May 2021 17:16:53 +0000 Subject: [labnetwork] FW: Information request: PVD reactor based on LAFAD technology In-Reply-To: <3C75D2CF-1ED4-41F6-99AA-9AA4B61830A1@colorado.edu> References: <3C75D2CF-1ED4-41F6-99AA-9AA4B61830A1@colorado.edu> Message-ID: Hi all, I am following up on this note that was sent on Monday. I have not received any feedback yet which makes me believe that no one in the network is familiar with it. Otherwise, any feedback/advice will be very much appreciated. Thanks Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Member of Engineering Staff Council (ESC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEL | Boulder, CO 80303| P: 303.735.5019| F: 303.492.2199 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur www.colorado.edu/facility/cosinc [signature_1879882941] Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) From: Aju Jugessur Date: Tuesday, May 25, 2021 at 11:17 AM To: "labnetwork at mtl.mit.edu" Cc: Aju Jugessur Subject: Information request: PVD reactor based on LAFAD technology Dear all, I am reaching out to the community to get some feedback on facilities that may have a plasma-enhanced PVD reactor based on large area filtered arc deposition (LAFAD) technology, for surface engineering and deposition of various thin and thick film coatings and surface modifications. I am attaching a flyer that contains some of the technical information and the model under consideration is LAFAD 600C and the original manufacturer is ARCOMAC. I would like to obtain some information and your perspectives on the following (if you have any model from this manufacturer) 1. Maintenance/repairs and issues with the instrument 2. Availability of parts and any third-party services on the instrument 3. Estimated usage (hrs)/year 4. Diversity of application areas of the technology 5. Any other comments and concerns Since I am not familiar with this specific instrument, I would be grateful for any information, advice and perspectives that you may share with me. You may contact me directly or let me know as I can also call you as well. Thanks so much, Regards Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Member of Engineering Staff Council (ESC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEL | Boulder, CO 80303| P: 303.735.5019| F: 303.492.2199 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur www.colorado.edu/facility/cosinc [signature_578491268] Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6294 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 6295 bytes Desc: image002.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: AdvancedSourcesforCathodicArcDepositionEquipment_Example.pdf Type: application/pdf Size: 788651 bytes Desc: AdvancedSourcesforCathodicArcDepositionEquipment_Example.pdf URL: From rlc12 at cornell.edu Fri May 28 18:04:20 2021 From: rlc12 at cornell.edu (Rebecca Lee Vliet) Date: Fri, 28 May 2021 22:04:20 +0000 Subject: [labnetwork] Registration closing soon! June 2021 CNF TCN VIRTUAL Short Course Message-ID: Please share with anyone who might be interested. Thank you! CNF Technology & Characterization at the Nanoscale (CNF TCN) VIRTUAL Short Course June 9, 2021 - June 11, 2021 The CNF TCN is going virtual for June 2021! The course is being offered at a reduced fee of $60.00 per person to enable a broader audience to attend. The course will be held Wednesday, June 9, 2021 - Friday, June 11, 2021, daily from 11:00am to 4:00pm (EDT). Each day offers lectures and laboratory demonstrations designed to impart a broad understanding of the science and technology required to undertake research in nanoscience. TCN is an ideal way for faculty, students, post docs and staff members to rapidly come up to speed in many of the technologies that users of the CNF need to employ. Members of the high tech business community will also find it an effective way to learn best practices for success in a nanofab environment. Attendance is open to the general scientific community. Note: The short course does not replace the three part training required to become a user of our facility. To become a CNF user, please visit the "Getting Started" link (https:cnf.cornell.edu/howto) on the CNF website. 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