[labnetwork] plasma etching of niobium

[Manish Keswani]

Happy Friday Everyone,

I have a question about the plasma etching of Niobium. One of our customers
is interested in creating sloped sidewall (45 deg, trapezoidal) patterns in
Nb (500 nm thick film). Although we have some experience creating similar
patterns in silicon and have a general idea about which direction to go in
terms of process parameters, we have not done this for Nb. The features are
600 microns x 600 microns or 3 microns x 600 microns openings after the
Litho step.

Does anyone have suggestions?

Thanks,
Manish Keswani
Lawrence Livermore National Laboratory
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