From odc1n08 at soton.ac.uk  Fri Apr  1 04:14:19 2022
From: odc1n08 at soton.ac.uk (Owain Clark)
Date: Fri, 1 Apr 2022 08:14:19 +0000
Subject: [labnetwork] Searching for a used desktop RIE etcher for SiN
In-Reply-To: <EF4C629A-3F12-4EE6-87E7-DD5414D35B94@ucsb.edu>
References: <EF4C629A-3F12-4EE6-87E7-DD5414D35B94@ucsb.edu>
Message-ID: <CWXP265MB4876DB44FDD50E8D0D9D4E97B0E09@CWXP265MB4876.GBRP265.PROD.OUTLOOK.COM>

You could try JLS Designs in the UK, recently acquired by Plasmatherm. They make a range of small benchtop RIE systems and are open to customisation discussion.

O.

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Rachel Schoeppner
Sent: 31 March 2022 23:34
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Searching for a used desktop RIE etcher for SiN

CAUTION: This e-mail originated outside the University of Southampton.
Good Afternoon,


Our facility is trying to acquire a used smaller desktop RIE system specifically for etching SiN. Ideally we would like at least 2 gas inputs and the ability to process a few 3? wafers at a time, if possible. We have been looking into something like the Technics PE-IIA Etcher but haven?t been finding any that are currently for sale online. Does anyone on this forum know of any available for purchase that are in decent working condition?

Suggestions for other comparable tools or used equipment retailers would also be greatly appreciated so that I can expand my search online as well.


Best,

Rachel

?

Rachel Schoeppner, Ph.D

Quantum Structures Facility Manager
Confocal Microscopy & Spectroscopy Facility Manager

California NanoSystems Institute (CNSI)
University of California, Santa Barbara
rlschoeppner at ucsb.edu<mailto:rlschoeppner at ucsb.edu>
rachel at cnsi.ucsb.edu<mailto:rachel at cnsi.ucsb.edu>
(805)893-2296










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From butun at northwestern.edu  Fri Apr  1 14:28:29 2022
From: butun at northwestern.edu (Serkan Butun)
Date: Fri, 1 Apr 2022 18:28:29 +0000
Subject: [labnetwork] UV light bulbs for mask aligner
In-Reply-To: <MN2PR19MB34084C7E9AEB47B3913E295FDBE09@MN2PR19MB3408.namprd19.prod.outlook.com>
References: <ccfd44b8-9776-3ed8-c241-c2c72779621f@idonus.com>
 <MN2PR19MB34084C7E9AEB47B3913E295FDBE09@MN2PR19MB3408.namprd19.prod.outlook.com>
Message-ID: <DS7PR05MB722344A4D275CA78F6395BA5DBE09@DS7PR05MB7223.namprd05.prod.outlook.com>

Hi Ana,

Paul asked me about our experience regarding the IDONUS UV LED (365 nm single wavelength) conversion. We have converted both MJB4 and MA6 about 3 years ago and we have been happy ever since. They come for the installation of the MA6 lamp and we installed the MJB4 (Covid happened). It is not very hard to do and they were very helpful during the whole process.

In terms of performance, I am very happy with the power levels. We use it mostly 20 mW/cm2 which is the lowest you can comfortably use on the MJB4. Uniformity is a lot better than the Hg lamp. The fact that is turns on instantly for the duration of exposure and off afterwards, there is no need for N2 cooling and no annoying 10 min worm up/cool down time. We did have Hg lamp explosions a couple of times in the past which were a pain because the elliptical mirrors were broken. With the LED we don?t have this risk.

We did have a few issues but it turned out that there were some loose electrical connections and IDONUS was again very helpful to diagnose the issue. The only real down side I have is the fact that the resist manufacturer datasheet exposure recommendations are not valid anymore. But we did our own tests and publish recommended exposure tables to our users.

You may contact me if you have further questions,

Best,
Serkan




Serkan Butun, PhD.
Research Associate, NUFAB
Northwestern University
Evanston, IL
Phone: 847-467-5959



From: Paul Maciel <paulmaciel at outlook.com>
Sent: Friday, April 01, 2022 9:54 AM
To: Serkan Butun <butun at northwestern.edu>
Subject: Re: [labnetwork] UV light bulbs for mask aligner

Hello Serkan,

How are you?  Hope all is well.

I have a favor to ask.  This message was posted on the labnetwork mailing list.  Could you post a reply to Ana <ana.n.cohen.ctr at army.mil><mailto:ana.n.cohen.ctr at army.mil> and the mailing list <labnetwork at mtl.mit.edu><mailto:labnetwork at mtl.mit.edu> and tell them of your experience with working with Idonus for the light source conversion?

If you could include my contact information it would be much appreciated.

Regards and have a good day,
---Paul

Paul Maciel
Sales and Technical Support
(408) 313-9329 or (603) 347-8820
paulmaciel at outlook.com<mailto:paulmaciel at outlook.com>


-------- Forwarded Message --------
Subject:
Re: [labnetwork] UV light bulbs for mask aligner
Date:
Thu, 31 Mar 2022 17:19:58 +0000
From:
Cohen, Ana N CTR USARMY DEVCOM ARL (USA) <ana.n.cohen.ctr at army.mil><mailto:ana.n.cohen.ctr at army.mil>
To:
na2661 at columbia.edu<mailto:na2661 at columbia.edu> <na2661 at columbia.edu><mailto:na2661 at columbia.edu>, labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu> <labnetwork at mtl.mit.edu><mailto:labnetwork at mtl.mit.edu>




Unfortunately have run into the same issue (checked with Atlanta Light Bulbs and BulbConnection.com). Seems like these distributors are just not getting UV lamp shipments at all. They can get an estimated shipping date for 350W bulbs, but is consistently pushed back each month. 1000W have less hope and are just described as ?critical supply? with no shipping date in sight.

Considering people have luck with purchasing from straight from USHIO I?m going to look into that for our 350W bulbs. Unfortunately our MA8 doesn?t like USHIO (for reasons unbeknownst to us) and needs the harder to get 1000W. I may try contacting OSRAM directly for replacement. Does anyone have any experience there?

As for the LED option, I did ask SUSS directly what they could do for retrofitting and for my tools it?s in the ballpark of $75k (MA6) and $100k-$150k (MA8 Gen3) depending on what additional components may need to be replaced. Not sure I?m going to have much luck arguing adding that into our budget last minute. If anyone has found any Idonus or similar retrofit companies in the US, that would be amazing.



--
Ana N. Cohen [she/her/hers]
Photolithography Technician
US Army Research Laboratory
2800 Powder Mill Road
Adelphi, MD 20783
Tel: 301-394-1527
ana.n.cohen.ctr at army.mil<mailto:ana.n.cohen.ctr at army.mil>


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From lxie at cns.fas.harvard.edu  Fri Apr  1 14:42:24 2022
From: lxie at cns.fas.harvard.edu (Xie, Ling)
Date: Fri, 1 Apr 2022 18:42:24 +0000
Subject: [labnetwork] FW: 2022 NNCI Etch Symposium at the University of
 Pennsylvania on April 21-22
In-Reply-To: <BLAPR07MB77648D2836F4375BC0F9D257C8129@BLAPR07MB7764.namprd07.prod.outlook.com>
References: <BLAPR07MB77648D2836F4375BC0F9D257C8129@BLAPR07MB7764.namprd07.prod.outlook.com>
Message-ID: <BLAPR07MB7764AC9E80F4DE3DD8D76BC5C8139@BLAPR07MB7764.namprd07.prod.outlook.com>

 Hello All,

This is a kindly remind you that the NNCI Etch Symposium at UPenn is ready to registration. If you plan to join, please go ahead to register.




We are pleased to announce the 2022 NNCI Etch Symposium at the University of Pennsylvania on April 21-22. This 2-day in-person symposium, Advances in Micro-and Nanoscale Etching for Novel Electronic, Photonic, and Quantum Based Devices, will feature NNCI site updates, invited vendor technical talks, and an open discussion of any etch related topic on day 1, while day 2 will feature invited and contributed talks from academic labs at Stanford, Penn, U. of Southern California, MIT, UCSB, Penn State, and Northeastern.  Both days will have vendor booth exhibits so that attendees can meet and discuss the manufacturers' most recent etch products and ancillary equipment offerings.

Please see the attached announcement for a detailed agenda and information on how to register.  A list of nearby hotels is also provided.  Please contact any member of the organizing committee if you have any questions.  We look forward to seeing you in Philadelphia for this informative networking event.

Regards,
Vince Genova-Cornell University CNF: Genova at cnf.cornell.edu<mailto:Genova at cnf.cornell.edu>
Eric Johnston-UPenn QNF: ericdj at seas.upenn.edu<mailto:ericdj at seas.upenn.edu>
Ling Xie-Harvard University CNS: lxie at cns.fas.harvard.edu<mailto:lxie at cns.fas.harvard.edu>
Jason Tower-Stanford SNF: towerj at stanford.edu<mailto:towerj at stanford.edu>



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From julia.aebersold at louisville.edu  Mon Apr  4 09:57:31 2022
From: julia.aebersold at louisville.edu (Aebersold,Julia W.)
Date: Mon, 4 Apr 2022 13:57:31 +0000
Subject: [labnetwork] Director of Shared Facilities Position Open at the
 University of Louisville
In-Reply-To: <DS7PR05MB722344A4D275CA78F6395BA5DBE09@DS7PR05MB7223.namprd05.prod.outlook.com>
References: <ccfd44b8-9776-3ed8-c241-c2c72779621f@idonus.com>
 <MN2PR19MB34084C7E9AEB47B3913E295FDBE09@MN2PR19MB3408.namprd19.prod.outlook.com>
 <DS7PR05MB722344A4D275CA78F6395BA5DBE09@DS7PR05MB7223.namprd05.prod.outlook.com>
Message-ID: <DM5PR03MB3098378AFAE0BEBDCCA38A4286E59@DM5PR03MB3098.namprd03.prod.outlook.com>

Hello everyone.  We are seeking for qualified applicants to consider our open position of Director of Shared Facilities here at the University of Louisville.  To apply please click on the green button "Apply on Institution's Website".

https://www.higheredjobs.com/institution/details.cfm?JobCode=177869260&Title=Director%20of%20Shared%20Research%20Facilities%20%28Job%20Id%3A%2042704%29&aID=7137
[https://www.higheredjobs.com/images/facebook-logo.jpg]<https://www.higheredjobs.com/institution/details.cfm?JobCode=177869260&Title=Director%20of%20Shared%20Research%20Facilities%20%28Job%20Id%3A%2042704%29&aID=7137>
Director of Shared Research Facilities (Job Id: 42704) - HigherEdJobs<https://www.higheredjobs.com/institution/details.cfm?JobCode=177869260&Title=Director%20of%20Shared%20Research%20Facilities%20%28Job%20Id%3A%2042704%29&aID=7137>
Jobs in higher education. Faculty and administrative positions at colleges and universities. Updated daily. Free to job seekers.
www.higheredjobs.com



Cheers!


Julia Aebersold, Ph.D.

Manager, Micro/Nano Technology Center

University of Louisville

2210 South Brook Street

Shumaker Research Building, Room 233

Louisville, KY  40292

(502) 852-1572

http://louisville.edu/micronano/<http://louisville.edu/micronano>
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From kckeenan at seas.upenn.edu  Mon Apr  4 12:10:05 2022
From: kckeenan at seas.upenn.edu (Kyle Keenan)
Date: Mon, 4 Apr 2022 12:10:05 -0400
Subject: [labnetwork] FREE: Kratos Axis Ultra X-ray Photoelectron
 Spectroscopy (XPS) system
Message-ID: <CAGTqYdHHOU_NLjH4vGm6iZH_ytBCDZ58EqzvK7efRX73ZqbHjg@mail.gmail.com>

Hello All,

Yes, you read that correctly. We need to get rid of our Kratos Axis Ultra
X-ray Photoelectron Spectroscopy (XPS) system ASAP. It's a system from 2001
that had been refurbished in recent years, purchased from another facility
and installed in ours about 3 years ago, but never bought fully online. It
is presumed to be working, but in need of service. We need the space for a
new piece of equipment, and need to get rid of it ASAP so a site survey can
be performed.

The recipient must commit to hiring a professional rigging company to pick
it up from our dock no later than Friday, 4/29, though earlier is better.
If you wish the system to be crated, this will be your responsibility and
will need to happen off-site. Please bear in mind, I do not know the
weight, but it is approximately 7x3x6' in size.

Please let me know if there are any questions.

Thank you,
-- 
Kyle Keenan

Laboratory Manager
Quattrone Nanofabrication Facility
University of Pennsylvania
P: 215-898-7560
F: 215-573-4925
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From Edward.Gonzales at colorado.edu  Mon Apr  4 12:50:40 2022
From: Edward.Gonzales at colorado.edu (Edward Gonzales)
Date: Mon, 4 Apr 2022 16:50:40 +0000
Subject: [labnetwork] PlasmaTherm 790 Series PECVD
Message-ID: <BN6PR03MB29611E525246164895AB853F9FE59@BN6PR03MB2961.namprd03.prod.outlook.com>

Is anybody still operating a PlasmaTherm 790 series PECVD that was built around 1999? If so, would you be willing to share any documentation that you have?

Thanks,
Edward

Edward Gonzales
Research Facilities Manager
Colorado Shared Instrumentation in Nanofabrication and Characterization
COSINC
University of Colorado Boulder
303-735-1203 (office)
505-450-3338 (cell)
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From price.798 at osu.edu  Mon Apr  4 13:13:14 2022
From: price.798 at osu.edu (Price, Aimee)
Date: Mon, 4 Apr 2022 17:13:14 +0000
Subject: [labnetwork] PlasmaTherm 790 Series PECVD
In-Reply-To: <BN6PR03MB29611E525246164895AB853F9FE59@BN6PR03MB2961.namprd03.prod.outlook.com>
References: <BN6PR03MB29611E525246164895AB853F9FE59@BN6PR03MB2961.namprd03.prod.outlook.com>
Message-ID: <CH0PR01MB71395D1231C8D623CE8E848EBCE59@CH0PR01MB7139.prod.exchangelabs.com>

Hi Edward,
We do, here at Ohio State.  We run both nitride and oxide. In fact, we just resolved a computer issue last week.  Please message me directly and I?ll put you in touch with our engineer who works on it.

As an FYI, PlasmaTherm themselves are VERY responsive and helpful.  I can give you a contact if needed.

Best,
Aimee Bross Price

Manager, Nanofabrication
The Ohio State University
Nanotech West Lab
Institute for Materials Research
1381 Kinnear Road
Suite 100
Columbus, OH 43212
614-292-2753



From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Edward Gonzales
Sent: Monday, April 4, 2022 12:51 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] PlasmaTherm 790 Series PECVD

Is anybody still operating a PlasmaTherm 790 series PECVD that was built around 1999? If so, would you be willing to share any documentation that you have? Thanks, Edward Edward Gonzales Research Facilities Manager ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? 
Is anybody still operating a PlasmaTherm 790 series PECVD that was built around 1999? If so, would you be willing to share any documentation that you have?

Thanks,
Edward

Edward Gonzales
Research Facilities Manager
Colorado Shared Instrumentation in Nanofabrication and Characterization
COSINC
University of Colorado Boulder
303-735-1203 (office)
505-450-3338 (cell)
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From bdemory2 at gmail.com  Wed Apr  6 11:07:12 2022
From: bdemory2 at gmail.com (Brandon Demory)
Date: Wed, 6 Apr 2022 08:07:12 -0700
Subject: [labnetwork] Small Chip fluoroware vendor
Message-ID: <CAC86JTsHrP3HWQKJTDCw4uu++UDp9yuGqPmLMk8W49CSBZq4mA@mail.gmail.com>

Hi all,

We are looking for a vendor of the teflon/PFA small piece sample holders.
The type you could load multiple chips for beaker dips for example.
Our initial search is leading us to ebay links of used products,
unfortunately, in part because we are uncertain of the name of this
component. Would anyone be able to recommend vendors in the USA of these
parts, and what the actual name of the component is? I appreciate your
assistance.

Thank you,
Brandon
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From olms0025 at umn.edu  Wed Apr  6 13:42:13 2022
From: olms0025 at umn.edu (Brian K. Olmsted)
Date: Wed, 6 Apr 2022 12:42:13 -0500
Subject: [labnetwork] RTP-600S replacement candidates
Message-ID: <CAMNfp6_Dm80rrE488Utofe1Zq5wJg70DLvVurm93+vDtzDQGdw@mail.gmail.com>

Hi,

I'm looking at replacing an RTP-600S benchtop thermal processing unit and
am looking for input and testimonials from others who may have a similar
tool from a different vendor.

I'm curious about others' experiences.

Thanks much,

Brian K. Olmsted
Associate Director of Laboratory Operations
University of Minnesota | MNC
www.mnc.umn.edu
612.626.3287
olms0025 at umn.edu
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From apettigr at ualberta.ca  Wed Apr  6 15:53:08 2022
From: apettigr at ualberta.ca (Adam Pettigrew)
Date: Wed, 6 Apr 2022 13:53:08 -0600
Subject: [labnetwork] Cleanroom Pressure Setpoint
Message-ID: <CAF0FFHM9+FQ8sRGG-=2YSeeO1GfBn8X_sN=PZGwjwnoixSYOCg@mail.gmail.com>

Hey All,

I am curious what others have as a setpoint for their cleanroom pressure
relative to an unclean or lower classification cleanroom. I have found some
information which suggests 10-15Pa is more than sufficient. We have ours
set quite high at 60Pa but it typically sits at 45Pa. If you have tried
adjusting the pressure, have you noticed any change in cleanliness/particle
counts? Any information would be really appreciated.

Thanks,
Adam

-- 

Adam Pettigrew

Systems Technician

University of Alberta - nanoFAB

W1-028A ECERF Building

9107 - 116 Street

Edmonton, Alberta

Canada T6G 2V4 Ph: 587-879-1514
www.nanofab.ualberta.ca
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From kurt.kupcho at wisc.edu  Wed Apr  6 17:18:00 2022
From: kurt.kupcho at wisc.edu (Kurt Kupcho)
Date: Wed, 6 Apr 2022 21:18:00 +0000
Subject: [labnetwork] ferrofluidic feed thru
Message-ID: <DM5PR06MB334017F465CF88D2C50F8BF592E79@DM5PR06MB3340.namprd06.prod.outlook.com>

Hi Labnetwork

Does anyone know a repair place that will work on a leaky obsolete ferrofluidic vacuum feed thru?

Thanks!
Kurt


Kurt Kupcho
Materials Science Engineer
Nanoscale Fabrication Center (NFC)
University of Wisconsin
1550 Engineering Dr.
ECB 3110
Madison, WI  53706
E:  kurt.kupcho at wisc.edu<mailto:kurt.kupcho at wisc.edu>
T:  608-262-2982
[cid:image001.png at 01D849D1.E1A132A0]

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From bdemory2 at gmail.com  Wed Apr  6 15:34:21 2022
From: bdemory2 at gmail.com (Brandon Demory)
Date: Wed, 6 Apr 2022 12:34:21 -0700
Subject: [labnetwork] Small Chip fluoroware vendor
In-Reply-To: <CAC86JTsHrP3HWQKJTDCw4uu++UDp9yuGqPmLMk8W49CSBZq4mA@mail.gmail.com>
References: <CAC86JTsHrP3HWQKJTDCw4uu++UDp9yuGqPmLMk8W49CSBZq4mA@mail.gmail.com>
Message-ID: <CAC86JTuvffjV3TYBVJ3nFCWweZwS89X9AbTYTtYGSu_usM9b1A@mail.gmail.com>

Thank you all who replied. Sounds like dippers or baskets are the common
terms and Entegris is the standard vendor. I appreciate the help.

Thank you,
Brandon

On Wed, Apr 6, 2022, 08:07 Brandon Demory <bdemory2 at gmail.com> wrote:

> Hi all,
>
> We are looking for a vendor of the teflon/PFA small piece sample holders.
> The type you could load multiple chips for beaker dips for example.
> Our initial search is leading us to ebay links of used products,
> unfortunately, in part because we are uncertain of the name of this
> component. Would anyone be able to recommend vendors in the USA of these
> parts, and what the actual name of the component is? I appreciate your
> assistance.
>
> Thank you,
> Brandon
>
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From bill_flounders at berkeley.edu  Wed Apr  6 19:14:48 2022
From: bill_flounders at berkeley.edu (Albert William (Bill) Flounders)
Date: Wed, 6 Apr 2022 16:14:48 -0700
Subject: [labnetwork] Cleanroom Pressure Setpoint
In-Reply-To: <CAF0FFHM9+FQ8sRGG-=2YSeeO1GfBn8X_sN=PZGwjwnoixSYOCg@mail.gmail.com>
References: <CAF0FFHM9+FQ8sRGG-=2YSeeO1GfBn8X_sN=PZGwjwnoixSYOCg@mail.gmail.com>
Message-ID: <CAHxjShk3iCLbCAuGQOxvXQ0iJzQVM8FU-UP8rvnCfnUVyoHvuA@mail.gmail.com>

 Adam,
Interesting question.
Ours is set at 0.08 - 0.1 inches water column = 20-25 Pa
45 - 60 Pa seems excessive.

I reviewed "Cleanroom Technology" by William Whyte
(2nd Ed, pg 69)
"Differential pressure of 10 Pa between two cleanrooms, and 15 Pa
between a cleanroom and an unclassified area, are reasonable
minimum design pressures."

I do not have data on particle count vs diff pressure.
When we above ~ 0.2  (50 Pa) our doors begin to have trouble latching
automatically.

Bill Flounders
UC Berkeley

On Wed, Apr 6, 2022 at 3:38 PM Adam Pettigrew <apettigr at ualberta.ca> wrote:

> Hey All,
>
> I am curious what others have as a setpoint for their cleanroom pressure
> relative to an unclean or lower classification cleanroom. I have found some
> information which suggests 10-15Pa is more than sufficient. We have ours
> set quite high at 60Pa but it typically sits at 45Pa. If you have tried
> adjusting the pressure, have you noticed any change in cleanliness/particle
> counts? Any information would be really appreciated.
>
> Thanks,
> Adam
>
> --
>
> Adam Pettigrew
>
> Systems Technician
>
> University of Alberta - nanoFAB
>
> W1-028A ECERF Building
>
> 9107 - 116 Street
>
> Edmonton, Alberta
>
> Canada T6G 2V4 Ph: 587-879-1514
> www.nanofab.ualberta.ca
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From Howard.Northfield at uottawa.ca  Wed Apr  6 15:03:46 2022
From: Howard.Northfield at uottawa.ca (Howard Northfield)
Date: Wed, 6 Apr 2022 19:03:46 +0000
Subject: [labnetwork] RTP-600S replacement candidates
In-Reply-To: <CAMNfp6_Dm80rrE488Utofe1Zq5wJg70DLvVurm93+vDtzDQGdw@mail.gmail.com>
References: <CAMNfp6_Dm80rrE488Utofe1Zq5wJg70DLvVurm93+vDtzDQGdw@mail.gmail.com>
Message-ID: <YT1PR01MB3036F81ED3D4539AAD0560DE9FE79@YT1PR01MB3036.CANPRD01.PROD.OUTLOOK.COM>

I use the attached for rapid thermal annealing (RTA).  Does the job. Thermocouples are pricey to replace, last one lasted 3 years, a spare does come with it.

Howard Northfield
Research Associate
Center for Research in Photonics
University of Ottawa
Ottawa, Ontario
Canada

________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Brian K. Olmsted <olms0025 at umn.edu>
Sent: Wednesday, April 6, 2022 1:42 PM
To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: [labnetwork] RTP-600S replacement candidates

Attention : courriel externe | external email
Hi,

I'm looking at replacing an RTP-600S benchtop thermal processing unit and am looking for input and testimonials from others who may have a similar tool from a different vendor.

I'm curious about others' experiences.

Thanks much,

Brian K. Olmsted
Associate Director of Laboratory Operations
University of Minnesota | MNC
www.mnc.umn.edu<http://www.mnc.umn.edu>
612.626.3287
olms0025 at umn.edu<mailto:olms0025 at umn.edu>

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From bill_flounders at berkeley.edu  Wed Apr  6 16:55:04 2022
From: bill_flounders at berkeley.edu (Albert William (Bill) Flounders)
Date: Wed, 6 Apr 2022 13:55:04 -0700
Subject: [labnetwork] Small Chip fluoroware vendor
In-Reply-To: <CAC86JTsHrP3HWQKJTDCw4uu++UDp9yuGqPmLMk8W49CSBZq4mA@mail.gmail.com>
References: <CAC86JTsHrP3HWQKJTDCw4uu++UDp9yuGqPmLMk8W49CSBZq4mA@mail.gmail.com>
Message-ID: <CAHxjShnh8+HQvJFs1goDFPL8EgAz9-znJy6XbyF+Ft=29WV0DQ@mail.gmail.com>

https://www.ptfeparts.com/applications/teflon-ptfe-labware/
https://www.shape-master.com/silicon-wafer-dippers
https://cleanroomlabware.com/collections/pieces

And the big company is Entegris.
They often have minimum quantity order requirements
https://www.entegris.com/shop/en/USD/products/wafer-handling/wafer-processing/labware/Dippers/p/Dippers

On Wed, Apr 6, 2022 at 11:18 AM Brandon Demory <bdemory2 at gmail.com> wrote:

> Hi all,
>
> We are looking for a vendor of the teflon/PFA small piece sample holders.
> The type you could load multiple chips for beaker dips for example.
> Our initial search is leading us to ebay links of used products,
> unfortunately, in part because we are uncertain of the name of this
> component. Would anyone be able to recommend vendors in the USA of these
> parts, and what the actual name of the component is? I appreciate your
> assistance.
>
> Thank you,
> Brandon
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From Assaf.Hazzan at weizmann.ac.il  Thu Apr  7 04:13:35 2022
From: Assaf.Hazzan at weizmann.ac.il (Assaf Hazzan)
Date: Thu, 7 Apr 2022 08:13:35 +0000
Subject: [labnetwork] RTP-600S replacement candidates
In-Reply-To: <CAMNfp6_Dm80rrE488Utofe1Zq5wJg70DLvVurm93+vDtzDQGdw@mail.gmail.com>
References: <CAMNfp6_Dm80rrE488Utofe1Zq5wJg70DLvVurm93+vDtzDQGdw@mail.gmail.com>
Message-ID: <cae25815f07f4a0d86d85fa2cb0a056c@weizmann.ac.il>

Hi Brian

We are using the AS-One of Anneallsys we are very satisfied. Company link: link<https://www.annealsys.com/products/rtp-and-rtcvd/as-one.html>
It is a very durable instrument and gives very good process capabilities.
The only dissatisfaction is the spare parts and consumables, which are very pricy, but chipper alternatives can be found.

Best regards
Assaf Hazzan
Nanofabrication Center Manager
Department of Chemical Research Support
Weizmann Institute of Science.

Email:    assaf.hazzan at weizmann.ac.il<mailto:assaf.hazzan at weizmann.ac.il>
Site: Weizmann Nano Fabrication<http://www.weizmann.ac.il/ChemicalResearchSupport/nanofabrication/about-the-service>
Phone:  +972-8-9345175  Cell:  +972-52-8679129  Fax:  +972-8-9346069
Office:      Perlman Chemical Sciences Building, Room 20 (-1 floor)

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Brian K. Olmsted
Sent: Wednesday, April 6, 2022 8:42 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] RTP-600S replacement candidates

Hi,

I'm looking at replacing an RTP-600S benchtop thermal processing unit and am looking for input and testimonials from others who may have a similar tool from a different vendor.

I'm curious about others' experiences.

Thanks much,

Brian K. Olmsted
Associate Director of Laboratory Operations
University of Minnesota | MNC
www.mnc.umn.edu<http://www.mnc.umn.edu>
612.626.3287
olms0025 at umn.edu<mailto:olms0025 at umn.edu>

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From bgila at ufl.edu  Thu Apr  7 09:11:35 2022
From: bgila at ufl.edu (Gila,Brent P)
Date: Thu, 7 Apr 2022 09:11:35 -0400
Subject: [labnetwork] RTP-600S replacement candidates
In-Reply-To: <CAMNfp6_Dm80rrE488Utofe1Zq5wJg70DLvVurm93+vDtzDQGdw@mail.gmail.com>
References: <CAMNfp6_Dm80rrE488Utofe1Zq5wJg70DLvVurm93+vDtzDQGdw@mail.gmail.com>
Message-ID: <7a853b41-046f-f5af-70bd-9d64be1c48ad@ufl.edu>

We have had very good success with the Solaris 150 RTA from SSI.? We 
have had this tool for over 10 years and it has been very reliable.

http://ssi-rtp.com/page/products/rtp-solaris-150/

Best Regards,
Brent
-- 
Brent P. Gila, PhD.
Associate Director, Research Service Centers
University of Florida
1041 Center Drive
Gainesville, Florida 32611
Tel:352-273-2245,? Fax:352-846-2877
email: bgila at ufl.edu



On 4/6/2022 1:42 PM, Brian K. Olmsted wrote:
> *[External Email]*
>
> Hi,
>
> I'm looking at replacing an RTP-600S benchtop thermal processing unit 
> and am looking for input and testimonials from others who may have a 
> similar tool from a different vendor.
>
> I'm curious about others' experiences.
>
> Thanks much,
>
> Brian K. Olmsted
> Associate Director of Laboratory Operations
> University of Minnesota | MNC
> www.mnc.umn.edu 
> <https://urldefense.proofpoint.com/v2/url?u=http-3A__www.mnc.umn.edu&d=DwMFaQ&c=sJ6xIWYx-zLMB3EPkvcnVg&r=gl_2fLZA_-_JfH_dOmx7ug&m=pM4UilKvx5cx6AYsmjCE8wAgCQVp6hiSjDRt6Chwa5GZikuRs33qFTI8qj2_qOaK&s=HmaomA6YGS42Ls__2sV2kOtWxlecrph3pKO7EHfA7lo&e=>
> 612.626.3287
> olms0025 at umn.edu
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://urldefense.proofpoint.com/v2/url?u=https-3A__mtl.mit.edu_mailman_listinfo.cgi_labnetwork&d=DwICAg&c=sJ6xIWYx-zLMB3EPkvcnVg&r=gl_2fLZA_-_JfH_dOmx7ug&m=pM4UilKvx5cx6AYsmjCE8wAgCQVp6hiSjDRt6Chwa5GZikuRs33qFTI8qj2_qOaK&s=E_TJ7LlTTcqPv_V75rC69IHvqRxR6WPGYrMDpdtdnR8&e=  
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From robert.macdonald at ge.com  Thu Apr  7 10:07:17 2022
From: robert.macdonald at ge.com (Macdonald, Robert (GE Research, US))
Date: Thu, 7 Apr 2022 14:07:17 +0000
Subject: [labnetwork] EVG Aligner camera motor issues-anyone else?
Message-ID: <5a9c62bc6fb34a229bdf8ab8fd264dd8@ge.com>

About 18 months ago we had one of the motors that drives the bottom optic on our EVG 620 aligner fail. As I understand it, there is a light switch that acts as a limit switch. For some reason, this failed, the motor drove itself into a hard stop, overheated, and failed.

We had no root cause for this failure from the field service engineer. It was a difficult fix, and expensive.

Now it appears it may have occurred a second time. We are waiting for confirmation from EVG.

Here is my question: I used a similar EVG 620 aligner at the U. Washington for years. I never heard of this being a problem. Has anyone else encountered a similar problem? If so, did you ever get a root cause and a  fix?

Thanks you,

Robert MacDonald
MEMS Engineer
Microsystems
GE Global Research
1 Research Circle
Niskayuna, NY 12309
Office KWC-1629
Cell  518 312-5646

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From deonc69 at illinois.edu  Thu Apr  7 10:23:28 2022
From: deonc69 at illinois.edu (Collins, Deon)
Date: Thu, 7 Apr 2022 14:23:28 +0000
Subject: [labnetwork] Cleanroom Pressure Setpoint
In-Reply-To: <CAF0FFHM9+FQ8sRGG-=2YSeeO1GfBn8X_sN=PZGwjwnoixSYOCg@mail.gmail.com>
References: <CAF0FFHM9+FQ8sRGG-=2YSeeO1GfBn8X_sN=PZGwjwnoixSYOCg@mail.gmail.com>
Message-ID: <DM6PR11MB3162441462F2C77D9597E52DD7E69@DM6PR11MB3162.namprd11.prod.outlook.com>

The design of the building and setup of the lab will differ greatly. Your HVAC system design will have the largest effect on your setup as well. We have a recirculating system in our clean room with the Fume hoods as a means for exhaust to the labs. Certain labs do not have fume hoods so we adjust the air movement via VFD?s. Our Clean room in encircled by an enclosed corridor as well so air bleeds to the that corridor and is returned to the make up unit. We also have a system of balancing VAV?s to compensate for any variances.

If you have Fume hoods in the lab you will need enough make up air to feed the Fume hoods or you wont get enough flow through the face of the hood. So basically there is not a one case fits all answer.


Out photolithography lab with 6 8? hoods has the fan speed control set at .30 inwc, the vav is currently at 70 with a supply air flow setpoint of 14000cfm. This unit supplies two labs across an isolated hallway. Note also these specifications will change between and iso 6 and iso 5 lab space.


Deon D. Collins

FACILITY MANAGER
Holonyak Lab
University of Illinois at Urbana-Champaign
208 N Wright St Rm. 248 | 2250
Urbana, IL 61801
217-300-7531 | deonc69 at illinois.edu<mailto:deonc69 at illinois.edu>


[https://webtools.illinois.edu/webservices/js/ds/signature_logo.png]<http://illinois.edu/>

Under the Illinois Freedom of Information Act any written communication to or from university employees regarding university business is a public record and may be subject to public disclosure.

Life is not about watching other people live it. It?s about you living your own!

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Adam Pettigrew
Sent: Wednesday, April 6, 2022 2:53 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Cleanroom Pressure Setpoint

Hey All,

I am curious what others have as a setpoint for their cleanroom pressure relative to an unclean or lower classification cleanroom. I have found some information which suggests 10-15Pa is more than sufficient. We have ours set quite high at 60Pa but it typically sits at 45Pa. If you have tried adjusting the pressure, have you noticed any change in cleanliness/particle counts? Any information would be really appreciated.

Thanks,
Adam

--

Adam Pettigrew

Systems Technician

University of Alberta - nanoFAB

W1-028A ECERF Building

9107 - 116 Street

Edmonton, Alberta

Canada T6G 2V4 Ph: 587-879-1514
www.nanofab.ualberta.ca<https://urldefense.com/v3/__http:/www.nanofab.ualberta.ca/__;!!DZ3fjg!v8VeKmMIi7WoNinUEN-SbYaNPWkOlWAIuzI87oriZ593Uloq9RT0fD2OnX6GV6Zjfzk$>
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From menounos at mit.edu  Thu Apr  7 10:32:09 2022
From: menounos at mit.edu (Nicholas Menounos)
Date: Thu, 7 Apr 2022 14:32:09 +0000
Subject: [labnetwork] Cleanroom Pressure Setpoint
In-Reply-To: <CAF0FFHM9+FQ8sRGG-=2YSeeO1GfBn8X_sN=PZGwjwnoixSYOCg@mail.gmail.com>
References: <CAF0FFHM9+FQ8sRGG-=2YSeeO1GfBn8X_sN=PZGwjwnoixSYOCg@mail.gmail.com>
Message-ID: <a5f4d7fca7e54cfca59d6d57a4c24d72@oc11expo23.exchange.mit.edu>

Hi Adam

In my opinion, anything that is measurably positive is adequate to keep particles out, with diminishing returns above .05?WC.

What is more important is control stability (set CFM offset, my strong preference vs control to DP), cascading gradients of connected spaces (vs pressure sinks of bio containment) and your risk tolerance.

At MIT.nano: Pregown is +0.02? relative to public corridor -> Gowning is +0.02? relative to pre-gown -> Cleanroom is +0.02? relative to gown = Cleanroom 0.06-0.07?WC relative to public corridor.

Nicholas Menounos, PE, LEED AP (he/him/his)
Assistant Director of Infrastructure

MIT.nano
Massachusetts Institute of Technology
77 Massachusetts Ave, Bldg 12-4003
Cambridge, MA 02139
Cell: (508) 932-0938<tel:+15089320938>
Office: (617) 253-7234<tel:+16172537234>
Email: Menounos at mit.edu<mailto:Menounos at mit.edu>

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Adam Pettigrew
Sent: Wednesday, April 6, 2022 3:53 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Cleanroom Pressure Setpoint

Hey All,

I am curious what others have as a setpoint for their cleanroom pressure relative to an unclean or lower classification cleanroom. I have found some information which suggests 10-15Pa is more than sufficient. We have ours set quite high at 60Pa but it typically sits at 45Pa. If you have tried adjusting the pressure, have you noticed any change in cleanliness/particle counts? Any information would be really appreciated.

Thanks,
Adam

--

Adam Pettigrew

Systems Technician

University of Alberta - nanoFAB

W1-028A ECERF Building

9107 - 116 Street

Edmonton, Alberta

Canada T6G 2V4 Ph: 587-879-1514
www.nanofab.ualberta.ca<http://www.nanofab.ualberta.ca/>
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From schweig at umich.edu  Thu Apr  7 10:25:35 2022
From: schweig at umich.edu (Dennis Schweiger)
Date: Thu, 7 Apr 2022 10:25:35 -0400
Subject: [labnetwork] Dichlorosilane availability
Message-ID: <CAKzi2_O8gC7xKkQQ2xV5NhXXa91zvQD20eXruzP_OyPf_VFtmg@mail.gmail.com>

Good morning all,

I was wondering if any of you would be willing to share your contact
information for your Dichlorosilane material?  We're running into a
procurement issue here at UofM in that our provider can find the cylinders,
just not the product to fill them, via their 3rd party.  I'm wondering if
any of you are being told, or have found, the same thing.

Thanks,

Dennis Schweiger
University of Michigan/LNF

734.647.2055 Ofc
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From codreanu at udel.edu  Thu Apr  7 11:20:06 2022
From: codreanu at udel.edu (Iulian Codreanu)
Date: Thu, 7 Apr 2022 11:20:06 -0400
Subject: [labnetwork] Cleanroom Pressure Setpoint
In-Reply-To: <CAHxjShk3iCLbCAuGQOxvXQ0iJzQVM8FU-UP8rvnCfnUVyoHvuA@mail.gmail.com>
References: <CAF0FFHM9+FQ8sRGG-=2YSeeO1GfBn8X_sN=PZGwjwnoixSYOCg@mail.gmail.com>
 <CAHxjShk3iCLbCAuGQOxvXQ0iJzQVM8FU-UP8rvnCfnUVyoHvuA@mail.gmail.com>
Message-ID: <adc75da4-9749-f2a8-1692-7cdaf84839e5@udel.edu>

Hi Adam,

The two cleanrooms I helped build were set between 10 and 15 Pa.

Cheers,

Iulian

iulian Codreanu, Ph.D.
Director, Nanofabrication Facility
University of Delaware
Harker ISE Lab, Room 163
221 Academy Street
Newark, DE 19716
302-831-2784
http://udnf.udel.edu

On 4/6/2022 7:14 PM, Albert William (Bill) Flounders wrote:
> Adam,
> Interesting question.
> Ours is set at 0.08 - 0.1 inches water column = 20-25 Pa
> 45 - 60 Pa seems excessive.
>
> I reviewed "Cleanroom Technology" by William Whyte
> (2nd Ed, pg 69)
> "Differential pressure of 10 Pa between two cleanrooms, and 15 Pa
> between a cleanroom and an unclassified area, are reasonable
> minimum design pressures."
>
> I do not have data on particle count vs diff pressure.
> When we above ~ 0.2? (50 Pa) our doors begin to have trouble latching 
> automatically.
>
> Bill Flounders
> UC Berkeley
>
> On Wed, Apr 6, 2022 at 3:38 PM Adam Pettigrew <apettigr at ualberta.ca> 
> wrote:
>
>     Hey All,
>
>     I am curious what others have as a setpoint for their cleanroom
>     pressure relative to an unclean or lower classification cleanroom.
>     I have found some information which suggests 10-15Pa is more than
>     sufficient. We have ours set quite high at 60Pa but it typically
>     sits at 45Pa. If you have tried adjusting the pressure, have you
>     noticed any change in cleanliness/particle counts? Any information
>     would be really appreciated.
>
>     Thanks,
>     Adam
>
>     -- 
>
>     Adam Pettigrew
>
>     Systems Technician
>
>     University of Alberta - nanoFAB
>
>     W1-028A ECERF Building
>
>     9107 - 116 Street
>
>     Edmonton, Alberta
>
>     Canada T6G 2V4 Ph: 587-879-1514
>
>     www.nanofab.ualberta.ca <http://www.nanofab.ualberta.ca/>
>     _______________________________________________
>     labnetwork mailing list
>     labnetwork at mtl.mit.edu
>     https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From RobertVandusen at cunet.carleton.ca  Thu Apr  7 12:01:39 2022
From: RobertVandusen at cunet.carleton.ca (Robert Vandusen)
Date: Thu, 7 Apr 2022 16:01:39 +0000
Subject: [labnetwork] Looking for a home for older mask making equipment
 :Mann PG1600, Mann PG3000 and Jade step and Repeat Camera
Message-ID: <YT2PR01MB97636E9AD512B4D0EF32370A91E69@YT2PR01MB9763.CANPRD01.PROD.OUTLOOK.COM>

Hi everyone.
A while ago one of my colleagues reached out to see if there was any interest in our older mask making equipment.
Before disposing I thought I would check again to see if there was any interest in the systems themselves or any parts.
We have a Mann PG1600, a Mann PG3000 and Jade step and Repeat Camera.    All 3 systems were in working order a few years ago when we stopped using them.
The PG3000 did have an intermittent stage error.

I can send more details and pictures if needed.

Thanks
Rob
Robert Vandusen
Technical Officer, Microfabrication Lab
Electronics Department
Carleton University
room: 4184 Mackenzie Building
613-520-2600<tel:613-520-2600> ext 5761
Robert_vandusen at cunet.carleton.ca<mailto:Robert_vandusen at cunet.carleton.ca>

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From dcchrist at wisc.edu  Thu Apr  7 15:11:05 2022
From: dcchrist at wisc.edu (Daniel Christensen)
Date: Thu, 7 Apr 2022 19:11:05 +0000
Subject: [labnetwork] UGIM 2022 Registration Needed
Message-ID: <DM5PR06MB2411442CAADDA8B66DA4C1CBBEE69@DM5PR06MB2411.namprd06.prod.outlook.com>

Please register now for UGIM 2022.  Early registration deadline is April 12, 2022.

If you plan to attend UGIM 2022 please register soon.   Registration is currently very low.
I am sure there are a lot of people that are waiting to see how the COVID situation is nearer the conference date.
However, this is causing real planning problems because we cannot rely on past information to predict the attendance for this conference.
If you want to ensure that the conference occurs, then we need to know that you are coming, so please register and submit your abstracts by next Tuesday 4/12/22.

Registration link:
https://ugim2020.wisc.edu/registration/

Abstract link:
https://ugim2020.wisc.edu/abstract-submission-2/

Thank you,
Dan Christensen
Jerry Hunter


Daniel C. Christensen
Laboratory Manager
Nanoscale Fabrication Center
University of Wisconsin-Madison

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From prnelson at cpp.edu  Fri Apr  8 13:52:54 2022
From: prnelson at cpp.edu (Phyllis R. Nelson)
Date: Fri, 8 Apr 2022 17:52:54 +0000
Subject: [labnetwork] Assistance with an antique ellipsometer
Message-ID: <BYAPR01MB4119BD088E47EBBB778FECF7D4E99@BYAPR01MB4119.prod.exchangelabs.com>

Hi all,

We have an old Rudolph Research AutoEL which we are attempting to resurrect for a research project. The best records I can find are that it is an AutoEL 4. I've included a couple of photos.

Does anyone know of a source of manuals for this instrument or somewhere we could get some assistance with getting it up and running again? We would be happy to use it with a pc running in terminal mode to get del and psi.

Thanks!

-Phyllis


Phyllis R. Nelson, PhD
Professor, Electrical and Computer Engineering
Faculty Director of Data Analytics
California State Polytechnic University, Pomona

email: prnelson at cpp dot edu

Cal Poly Pomona not fully back on campus,
I am usually present physically Tuesdays and Wednesdays.
director space: SSB 3340A7
faculty office: 9-317
phone: (909) 869-2649 (email preferred)

Scientists discover the world that exists. Engineers create the world that never was. - Theodore von K?rm?n
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From R.White at tufts.edu  Fri Apr  8 15:24:26 2022
From: R.White at tufts.edu (White, Robert D.)
Date: Fri, 8 Apr 2022 19:24:26 +0000
Subject: [labnetwork] 500 nm AlN c-axis deposition service
Message-ID: <MN2PR05MB6493B302E84A0B05E85B385EFBE99@MN2PR05MB6493.namprd05.prod.outlook.com>

Lab network,

I have been struggling to deposit well aligned c-axis oriented aluminum nitride films on Moly or Pt.  Is anyone aware of a deposition service that could provide a small run (< 10) quality piezoelectric AlN films on 4" substrates?  I could supply the oxidized silicon or SOI substrates either with or without the metal seed layer.

Thank you!

Rob

--
Robert White
Associate Professor
Tufts Mechanical Engineering
https://engineering.tufts.edu/me/people/faculty/robert-white
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From whipp003 at umn.edu  Fri Apr  8 16:02:35 2022
From: whipp003 at umn.edu (Tony Whipple)
Date: Fri, 8 Apr 2022 15:02:35 -0500
Subject: [labnetwork] Assistance with an antique ellipsometer
In-Reply-To: <BYAPR01MB4119BD088E47EBBB778FECF7D4E99@BYAPR01MB4119.prod.exchangelabs.com>
References: <BYAPR01MB4119BD088E47EBBB778FECF7D4E99@BYAPR01MB4119.prod.exchangelabs.com>
Message-ID: <CAOzkqnKwh1NPUzC4P5=B77qsaWuN=1y8QzYON=Qedeez9h5X3w@mail.gmail.com>

Hello;
We have one that we currently use. I will check to see if we happen to have
any documentation next week.
Regards, Tony W.

<https://www.avast.com/sig-email?utm_medium=email&utm_source=link&utm_campaign=sig-email&utm_content=webmail&utm_term=icon>
Virus-free.
www.avast.com
<https://www.avast.com/sig-email?utm_medium=email&utm_source=link&utm_campaign=sig-email&utm_content=webmail&utm_term=link>
<#DAB4FAD8-2DD7-40BB-A1B8-4E2AA1F9FDF2>

On Fri, Apr 8, 2022 at 2:37 PM Phyllis R. Nelson <prnelson at cpp.edu> wrote:

> Hi all,
>
> We have an old Rudolph Research AutoEL which we are attempting to
> resurrect for a research project. The best records I can find are that it
> is an AutoEL 4. I've included a couple of photos.
>
> Does anyone know of a source of manuals for this instrument or somewhere
> we could get some assistance with getting it up and running again? We would
> be happy to use it with a pc running in terminal mode to get del and psi.
>
> Thanks!
>
> -Phyllis
>
>
> Phyllis R. Nelson, PhD
> Professor, Electrical and Computer Engineering
> Faculty Director of Data Analytics
> California State Polytechnic University, Pomona
>
> email: prnelson at cpp dot edu
>
> Cal Poly Pomona not fully back on campus,
> I am usually present physically Tuesdays and Wednesdays.
> director space: SSB 3340A7
> faculty office: 9-317
> phone: (909) 869-2649 (email preferred)
>
> Scientists discover the world that exists. Engineers create the world that
> never was. - Theodore von K?rm?n
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From djculver at aol.com  Fri Apr  8 18:25:57 2022
From: djculver at aol.com (Dennis Culver)
Date: Fri, 8 Apr 2022 22:25:57 +0000 (UTC)
Subject: [labnetwork] Assistance with an antique ellipsometer
In-Reply-To: <BYAPR01MB4119BD088E47EBBB778FECF7D4E99@BYAPR01MB4119.prod.exchangelabs.com>
References: <BYAPR01MB4119BD088E47EBBB778FECF7D4E99@BYAPR01MB4119.prod.exchangelabs.com>
Message-ID: <1134421889.42599.1649456757987@mail.yahoo.com>

 Hello Phyllis,

One of my associates still services Rudolph equipment from Tempe, AZ. The company is Entrepix. You could probably arrange a service call as Tempe to Ontario would be a short, inexpensive flight! 

Steve Horowitz
Entrepix
4717 E. Hilton Ave Suite 200
Phoenix, AZ 85034
 
Phone: 602 426-8667
Fax: 602 426-8678
Cell: 602 614-3303

Best Regards, 

Dennis J. Culver 
Culver Consulting

5960 Valentine Road
Unit 14, Mail box 13
Ventura, CA 93003

Ph (805) 648-1184
Fx (805) 648-1485

Cell(805)680-7389

dennis at culverequipment.com
Website: www.culverequipment.com     On Friday, April 8, 2022, 12:38:48 PM PDT, Phyllis R. Nelson <prnelson at cpp.edu> wrote:  
 
  #yiv6031471760 P {margin-top:0;margin-bottom:0;}Hi all,
We have an old Rudolph Research AutoEL which we are attempting to resurrect for a research project. The best records I can find are that it is an AutoEL 4. I've included a couple of photos.
Does anyone know of a source of manuals for this instrument or somewhere we could get some assistance with getting it up and running again? We would be happy to use it with a pc running in terminal mode to get del and psi.
Thanks!
-Phyllis

Phyllis R. Nelson, PhD
Professor, Electrical and Computer EngineeringFaculty Director of Data Analytics
California State Polytechnic University, Pomona

email: prnelson at cpp dot edu
Cal Poly Pomona not fully back on campus,I am usually present physically Tuesdays and Wednesdays.director space: SSB 3340A7faculty office: 9-317
phone: (909) 869-2649 (email preferred)

Scientists discover the world that exists. Engineers create the world that never was. - Theodore von K?rm?n_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
  
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From shimonel at savion.huji.ac.il  Sun Apr 10 01:31:07 2022
From: shimonel at savion.huji.ac.il (Shimon Eliav)
Date: Sun, 10 Apr 2022 05:31:07 +0000
Subject: [labnetwork] Cleanroom Pressure Setpoint
In-Reply-To: <CAF0FFHM9+FQ8sRGG-=2YSeeO1GfBn8X_sN=PZGwjwnoixSYOCg@mail.gmail.com>
References: <CAF0FFHM9+FQ8sRGG-=2YSeeO1GfBn8X_sN=PZGwjwnoixSYOCg@mail.gmail.com>
Message-ID: <AS8PR10MB49204E1E65A21BAC5B0231A5D6EB9@AS8PR10MB4920.EURPRD10.PROD.OUTLOOK.COM>

Hi Adam,
The pressure set-point for our cleanroom is 15 Pa. Classes 1,000 to 10,000.
We never played with this parameter.
Regards,
Shimon

From: labnetwork [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Adam Pettigrew
Sent: Wednesday, 6 April 2022 22:53
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Cleanroom Pressure Setpoint

Hey All,

I am curious what others have as a setpoint for their cleanroom pressure relative to an unclean or lower classification cleanroom. I have found some information which suggests 10-15Pa is more than sufficient. We have ours set quite high at 60Pa but it typically sits at 45Pa. If you have tried adjusting the pressure, have you noticed any change in cleanliness/particle counts? Any information would be really appreciated.

Thanks,
Adam

--

Adam Pettigrew

Systems Technician

University of Alberta - nanoFAB

W1-028A ECERF Building

9107 - 116 Street

Edmonton, Alberta

Canada T6G 2V4 Ph: 587-879-1514
www.nanofab.ualberta.ca<http://www.nanofab.ualberta.ca/>
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From RobertVandusen at cunet.carleton.ca  Mon Apr 11 08:50:29 2022
From: RobertVandusen at cunet.carleton.ca (Robert Vandusen)
Date: Mon, 11 Apr 2022 12:50:29 +0000
Subject: [labnetwork] Cleanroom Pressure Setpoint
In-Reply-To: <AS8PR10MB49204E1E65A21BAC5B0231A5D6EB9@AS8PR10MB4920.EURPRD10.PROD.OUTLOOK.COM>
References: <CAF0FFHM9+FQ8sRGG-=2YSeeO1GfBn8X_sN=PZGwjwnoixSYOCg@mail.gmail.com>
 <AS8PR10MB49204E1E65A21BAC5B0231A5D6EB9@AS8PR10MB4920.EURPRD10.PROD.OUTLOOK.COM>
Message-ID: <YT2PR01MB9763F086EE570FE631B1166791EA9@YT2PR01MB9763.CANPRD01.PROD.OUTLOOK.COM>

Hi Adam.
Our main cleanroom was build in the early 90?s.  We run our class 100 rooms at ~35Pa, our class 1000 at ~30Pa, and our class 10,000 areas at ~ 22Pa.
We have never had a noticeable issues with particles.  Whenever we have checked the levels are always well below spec.
In instances when our pressures have increased because of control issues we have had to watch to make sure our drop in ceiling tiles (between the HEPA?s) do not start to pop up and unseat.

Our newer class 10,000 cleanroom runs at 12Pa.

Rob
Robert Vandusen
Technical Officer, Microfabrication Lab
Electronics Department
Carleton University
room: 4184 Mackenzie Building
613-520-2600<tel:613-520-2600> ext 5761
Robert_vandusen at cunet.carleton.ca<mailto:Robert_vandusen at cunet.carleton.ca>



From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Shimon Eliav
Sent: April 10, 2022 1:31 AM
To: Adam Pettigrew <apettigr at ualberta.ca>; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Cleanroom Pressure Setpoint

[External Email]
Hi Adam,
The pressure set-point for our cleanroom is 15 Pa. Classes 1,000 to 10,000.
We never played with this parameter.
Regards,
Shimon

From: labnetwork [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Adam Pettigrew
Sent: Wednesday, 6 April 2022 22:53
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Cleanroom Pressure Setpoint

Hey All,

I am curious what others have as a setpoint for their cleanroom pressure relative to an unclean or lower classification cleanroom. I have found some information which suggests 10-15Pa is more than sufficient. We have ours set quite high at 60Pa but it typically sits at 45Pa. If you have tried adjusting the pressure, have you noticed any change in cleanliness/particle counts? Any information would be really appreciated.

Thanks,
Adam

--

Adam Pettigrew

Systems Technician

University of Alberta - nanoFAB

W1-028A ECERF Building

9107 - 116 Street

Edmonton, Alberta

Canada T6G 2V4 Ph: 587-879-1514
www.nanofab.ualberta.ca<http://www.nanofab.ualberta.ca/>
This email contains links to content or websites. Always be cautious when opening external links or attachments.

Please visit https://carleton.ca/its/help-centre/report-phishing/ for information on reporting phishing messages.

When in doubt, the ITS Service Desk can provide assistance. https://carleton.ca/its/chat
-----End of Disclaimer-----

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From ericdj at seas.upenn.edu  Mon Apr 11 11:23:10 2022
From: ericdj at seas.upenn.edu (Eric Johnston)
Date: Mon, 11 Apr 2022 11:23:10 -0400
Subject: [labnetwork] NNCI Etch Symposium Application Deadline
Message-ID: <CABtcwD_+YC953kapYtfh7wz=UOnHJYO6RcQnYwFLx9nd3YeLgg@mail.gmail.com>

If you are interested in attending the NNCI Etch Symposium April 21-22 at
Penn, the last day to register is *Wednesday April 13*. You can register
here <https://www.eventbrite.com/e/66680582417>.


The 2022 NNCI Etch Symposium at the University of Pennsylvania on April
21-22 is a 2-day in-person symposium for Advances in Micro-and Nanoscale
Etching for Novel Electronic, Photonic, and Quantum Based Devices. Day 1
will feature NNCI site updates, invited vendor technical talks, and an open
discussion of any etch related topics. All are invited to Day 2 which will
feature invited and contributed talks from academic labs at Stanford, Penn,
U. of Southern California, MIT, UCSB, Penn State, and Northeastern.  Both
days will have vendor booth exhibits so that attendees can meet and discuss
the manufacturers' most recent etch products and ancillary equipment
offerings.


You can see the full agenda here
<https://www.nano.upenn.edu/2022-etch-symposium/>.



Regards,

Vince Genova-Cornell University CNF: Genova at cnf.cornell.edu

Eric Johnston-UPenn QNF: ericdj at seas.upenn.edu

Ling Xie-Harvard University CNS: lxie at cns.fas.harvard.edu

Jason Tower-Stanford SNF: towerj at stanford.edu
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From nxh195 at case.edu  Mon Apr 11 13:19:55 2022
From: nxh195 at case.edu (Nichole Hoven)
Date: Mon, 11 Apr 2022 13:19:55 -0400
Subject: [labnetwork] Assistance with an antique ellipsometer
In-Reply-To: <BYAPR01MB4119BD088E47EBBB778FECF7D4E99@BYAPR01MB4119.prod.exchangelabs.com>
References: <BYAPR01MB4119BD088E47EBBB778FECF7D4E99@BYAPR01MB4119.prod.exchangelabs.com>
Message-ID: <CABXU_4VxCubJ+VCKDe7r5GzeFJ3Z=gYr-9ZcHVMJ44n_T_MSEg@mail.gmail.com>

Hello Phyllis-

We have an AutoEL IV at Case Western Reserve University. I tried to get it
operational about 6 years ago, and was unsuccessful. I reached out to
Entrepix, and they were available to help bring it back to life, but we
didn't have a great enough use to send it in for repair.

We do have a one page "Condensed Operating Instruction"; who knows if it
will be helpful or not!  We also have pages stapled together that have
varying "Summary" functions, and other miscellaneous things. I've tried
locating a manual a couple different times, and have always failed.

I'll attach what I have!

Good luck!

Nichole Hoven



On Fri, Apr 8, 2022 at 3:41 PM Phyllis R. Nelson <prnelson at cpp.edu> wrote:

> Hi all,
>
> We have an old Rudolph Research AutoEL which we are attempting to
> resurrect for a research project. The best records I can find are that it
> is an AutoEL 4. I've included a couple of photos.
>
> Does anyone know of a source of manuals for this instrument or somewhere
> we could get some assistance with getting it up and running again? We would
> be happy to use it with a pc running in terminal mode to get del and psi.
>
> Thanks!
>
> -Phyllis
>
>
> Phyllis R. Nelson, PhD
> Professor, Electrical and Computer Engineering
> Faculty Director of Data Analytics
> California State Polytechnic University, Pomona
>
> email: prnelson at cpp dot edu
>
> Cal Poly Pomona not fully back on campus,
> I am usually present physically Tuesdays and Wednesdays.
> director space: SSB 3340A7
> faculty office: 9-317
> phone: (909) 869-2649 (email preferred)
>
> Scientists discover the world that exists. Engineers create the world that
> never was. - Theodore von K?rm?n
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From david.evanoff at maine.edu  Mon Apr 11 15:12:25 2022
From: david.evanoff at maine.edu (David Evanoff)
Date: Mon, 11 Apr 2022 15:12:25 -0400
Subject: [labnetwork] Research Facilities Operations Specialist Position at
 the University of Maine
Message-ID: <CABt-o8ORnAzG9K14sHaL27M8+49ft5fTuqrVoU1AEdu1AHQ-sg@mail.gmail.com>

 Job description

*Purpose:*

The purpose of this position, at the University of Maine in Orono, ME, USA,
is to support the operational aspects of research facilities that are
associated with research and development activities in CORE and FIRST,
including the Microfabrication Cleanroom Facility and associated synthesis,
fabrication, and characterization facilities. The responsibilities will
include development and refinement of fabrication processes and
characterization techniques within the facilities, as well as operation and
maintenance of a broad range of equipment in these areas. This position
also provides expertise and training to users of the CORE Microfabrication
Cleanroom and associated FIRST facilities. Typical hiring range for this
position is $51,183 - $70,000 commensurate with qualifications and
experience.

*About UMaine:*

The University of Maine is a community of more than 11,700 undergraduate
and graduate students, and 2,500 employees located on the Orono campus, the
regional campus in Machias, and throughout the state. UMaine is the state
land and sea grant university and maintains a leadership role as the
System?s flagship university. As a result, it is dedicated to providing
excellent teaching, research, and service at the university, state, and
national levels. Further information about UMaine can be found at
https://umaine.edu/

The University of Maine offers a wide range of benefits for employees
including, but not limited to, tuition benefits (employee and dependent),
comprehensive insurance coverage including medical, dental, vision, life
insurance, and short and long term disability as well as retirement plan
options. As a former NSF ADVANCE institution, the University of Maine is
committed to diversity in our workforce and to dual-career couples.

UMaine is located in beautiful Central Maine. Many employees report that a
primary reason for choosing to come to UMaine is quality of life. Numerous
cultural activities, excellent public schools, safe neighborhoods, high
quality medical care, little traffic, and a reasonable cost of living make
the greater Bangor area a wonderful place to live. Learn more about what
the Bangor region has to offer here.

Employees in the University of Maine System are required to comply with UMS
COVID protocols which currently include, but are not limited to, being
vaccinated, obtaining a qualified vaccination exemption, and/or
participating in regular COVID testing.

*Required Qualifications: *

   - Master of Science degree in the Physical Sciences or Engineering and
   three years of relevant professional experience or a Bachelor of Science
   degree in the Physical Sciences or Engineering with more than five years of
   relevant professional experience.
   - Knowledge and experience in one or more of the following areas:
   lithography techniques (photo- and/or electron), wet- and/or plasma etch
   techniques, metal/dielectric thin film deposition, wafer bonding, vacuum
   systems, x-ray and/or electron spectroscopies, microscopies, surface
   characterization techniques.
   - Strong analytical and problem-solving skills, the proven ability to
   succeed in developing practical solutions that will lead to technology
   innovations and development.
   - Demonstrated ability to work collaboratively in an R&D environment.
   - Excellent communication skills, proven organizational skills, and
   demonstrated ability to write high-impact publications, reports and/or
   whitepapers.
   - Significant experience in project management, including establishing
   design of experiments and documenting processes.
   - Experience in dealing with hazardous materials and establishing safe
   operating procedures.

*Preferred Qualifications:*

   - PhD in Physics, Electrical Engineering, Chemistry, Materials Science
   and Engineering, or related field.
   - Prior experience managing a laboratory facility and fostering
   collaborative interactions with clients or stakeholders.
   - Demonstrated ability to effectively train and supervise staff or
   students.
   - Curiosity and capability to research and learn new techniques or
   technical topics, as needed.
   - Proficient in a scientific programming environment (ex. Julia, Python)
   and/or data set analysis tools (ex. JMP, R).

To apply and/or learn more about the position, visit this website:
https://umaine.hiretouch.com/job-details?jobID=74133&job=research-facilities-operations-specialist

*Review of applications to begin: April 11, 2022 and will continue until
filled.*
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From lvchang at Central.UH.EDU  Mon Apr 11 17:09:45 2022
From: lvchang at Central.UH.EDU (Chang, Long)
Date: Mon, 11 Apr 2022 21:09:45 +0000
Subject: [labnetwork] RIE through Silicon
Message-ID: <10E87CAF-D27E-48F8-AEA2-7B7300ACED44@cougarnet.uh.edu>

Hi Guys,

I have an Oxford RIE with backside Helium. I want to etch through the silicon wafer (380um thick). The largest pattern is a 1mm diameter circle. My plan is to ride the 4? sample wafer on a 4" carrier wafer with PR. Does anyone have a good solution to this problem?

Thanks,
Long

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From Matt.Dwyer at drs.com  Mon Apr 11 18:42:47 2022
From: Matt.Dwyer at drs.com (Dwyer, Matt)
Date: Mon, 11 Apr 2022 22:42:47 +0000
Subject: [labnetwork] Quintel 7000 mask aligner donation
Message-ID: <d835c7f85ff742df9cdae0991c8334d0@drs.com>

Hi all,

We have a Quintel 7000 mask aligner we are looking to donate. The tool has a Z axis motor/control issue so should be considered for parts, but might be of value to someone currently supporting a similar tool. The tool is functional apart from the wafer Z movement, which stopped responding to the control hardware. We rewired the Z axis motor so we could manually raise/lower the wafer, but this is not a practical solution and we inevitably saw a lot of wafer-on-mask scraping.

The tool has 4" and 5" mask holders, along with 2" and 3" wafer chucks. It has 4-objective turrets with optics up to 20X. It has an aftermarket IR backside alignment system. We also have a spare bulb.

Please reach out if you are interested.

Thanks,
Matt

[Leonardo-DRS-logo_red]<https://www.leonardodrs.com/?utm_source=employees&utm_medium=email&utm_campaign=signature&utm_content=logo>
            Matt Dwyer
            Principal Process Engineer

            DRS Daylight Solutions
            1832 Wright St, Madison, WI 53704 USA
            Tel +1 608 287 3785
          matt.dwyer at drs.com<mailto:matt.dwyer at drs.com>
          leonardodrs.com<http://www.leonardodrs.com/>
          daylightsolutions.com<http://www.daylightsolutions.com/>

            [cid:image004.png at 01D84DCB.8AF85520] <https://www.linkedin.com/company/leonardodrs/?utm_source=employees&utm_medium=email&utm_campaign=signature&utm_content=linkedin-icon>   [cid:image006.png at 01D84DCB.8AF85520] <https://twitter.com/LeonardoDRSnews?utm_source=employees&utm_medium=email&utm_campaign=signature&utm_content=twitter-icon>   [cid:image008.png at 01D84DCB.8AF85520] <https://www.facebook.com/leonardodrsinc/?utm_source=employees&utm_medium=email&utm_campaign=signature&utm_content=fb-icon>   [cid:image010.png at 01D84DCB.8AF85520] <https://www.instagram.com/leonardodrs/?utm_source=employees&utm_medium=email&utm_campaign=signature&utm_content=instagram-icon>   [cid:image012.png at 01D84DCB.8AF85520] <https://www.youtube.com/c/leonardodrs?utm_source=employees&utm_medium=email&utm_campaign=signature&utm_content=youtube-icon>

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From jupham at gmail.com  Mon Apr 11 23:07:42 2022
From: jupham at gmail.com (Jeremy Upham)
Date: Mon, 11 Apr 2022 23:07:42 -0400
Subject: [labnetwork] RIE through Silicon
In-Reply-To: <0448e3a443c44038990bd83e9b9aab10@YT1PR01MB8604.CANPRD01.PROD.OUTLOOK.COM>
References: <0448e3a443c44038990bd83e9b9aab10@YT1PR01MB8604.CANPRD01.PROD.OUTLOOK.COM>
Message-ID: <CAFu2R8p4=2DBfQXe0cyqhLeQU4XD55Yp-xUxPsHi__GCVZ_m+w@mail.gmail.com>

I think your plan could work, so I'm not sure that I see the problem

In my experience the carbon in the PR can contribute to the plasma
chemistry and affect the etch, so I tend to use vacuum grease as a
thermally conducting binder between the etched sample and the backing wafer
instead. Though your system may well work for your recipe.

Hope that helps,

Jer Upham PhD
Senior Lab Manager / Research Scientist
Quantum Photonics Group
University of Ottawa
Tel.: 1 (613) 562-5800 ext 7325


On Mon, Apr 11, 2022 at 6:54 PM Chang, Long <lvchang at central.uh.edu> wrote:

> *Attention : courriel externe | external email*
> Hi Guys,
>
> I have an Oxford RIE with backside Helium. I want to etch through the
> silicon wafer (380um thick). The largest pattern is a 1mm diameter circle.
> My plan is to ride the 4? sample wafer on a 4" carrier wafer with PR. Does
> anyone have a good solution to this problem?
>
> Thanks,
> Long
>
>
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From hollingshead.19 at osu.edu  Tue Apr 12 09:25:11 2022
From: hollingshead.19 at osu.edu (Hollingshead, Dave)
Date: Tue, 12 Apr 2022 13:25:11 +0000
Subject: [labnetwork] RIE through Silicon
In-Reply-To: <CAFu2R8p4=2DBfQXe0cyqhLeQU4XD55Yp-xUxPsHi__GCVZ_m+w@mail.gmail.com>
References: <0448e3a443c44038990bd83e9b9aab10@YT1PR01MB8604.CANPRD01.PROD.OUTLOOK.COM>
 <CAFu2R8p4=2DBfQXe0cyqhLeQU4XD55Yp-xUxPsHi__GCVZ_m+w@mail.gmail.com>
Message-ID: <SA1PR01MB654451DD853B92CCD7F37129F3ED9@SA1PR01MB6544.prod.exchangelabs.com>

Hi Long,

We do this routinely with our DRIE system. As Jer mentioned, we typically use small drops of santovac 5 oil to adhere the two wafers together to provide thermal conduction. In our case we see etch rate changes or PR ?burning? without a good thermal conductor between the samples.

-Dave

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Jeremy Upham
Sent: Monday, April 11, 2022 23:08
Cc: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] RIE through Silicon

I think your plan could work, so I'm not sure that I see the problem In my experience the carbon in the PR can contribute to the plasma chemistry and affect the etch, so I tend to use vacuum grease as a thermally conducting binder between 
I think your plan could work, so I'm not sure that I see the problem

In my experience the carbon in the PR can contribute to the plasma chemistry and affect the etch, so I tend to use vacuum grease as a thermally conducting binder between the etched sample and the backing wafer instead. Though your system may well work for your recipe.

Hope that helps,

Jer Upham PhD
Senior Lab Manager / Research Scientist
Quantum Photonics Group
University of Ottawa
Tel.: 1 (613) 562-5800 ext 7325


On Mon, Apr 11, 2022 at 6:54 PM Chang, Long <lvchang at central.uh.edu<mailto:lvchang at central.uh.edu>> wrote:
Attention : courriel externe | external email
Hi Guys,

I have an Oxford RIE with backside Helium. I want to etch through the silicon wafer (380um thick). The largest pattern is a 1mm diameter circle. My plan is to ride the 4? sample wafer on a 4" carrier wafer with PR. Does anyone have a good solution to this problem?

Thanks,
Long

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From Otto.CranwellSchaeper at student.uts.edu.au  Tue Apr 12 02:12:25 2022
From: Otto.CranwellSchaeper at student.uts.edu.au (Otto Cranwell Schaeper)
Date: Tue, 12 Apr 2022 06:12:25 +0000
Subject: [labnetwork] FZ silicon wafer suppliers
Message-ID: <SYXPR01MB081649C987E081C772FA516196ED9@SYXPR01MB0816.ausprd01.prod.outlook.com>

Hey All,

I am looking for a silicon wafer supplier to buy wafers with the following specifications (2" isn't necessary but the rest is);
[cid:2fa8ccda-3d55-4888-99cd-698f70ed8fee]

Could you let me know of any supplier who does or may have the capability to supply these

Cheers,
Otto
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From kamal.yadav at gmail.com  Tue Apr 12 12:12:11 2022
From: kamal.yadav at gmail.com (Kamal Yadav)
Date: Tue, 12 Apr 2022 09:12:11 -0700
Subject: [labnetwork] RIE through Silicon
In-Reply-To: <SA1PR01MB654451DD853B92CCD7F37129F3ED9@SA1PR01MB6544.prod.exchangelabs.com>
References: <0448e3a443c44038990bd83e9b9aab10@YT1PR01MB8604.CANPRD01.PROD.OUTLOOK.COM>
 <CAFu2R8p4=2DBfQXe0cyqhLeQU4XD55Yp-xUxPsHi__GCVZ_m+w@mail.gmail.com>
 <SA1PR01MB654451DD853B92CCD7F37129F3ED9@SA1PR01MB6544.prod.exchangelabs.com>
Message-ID: <CAOfoCyj5-MrE_Vbg7Zn=4LkrQ0mjedaSsnOcG8qUcrxaVfq=Cg@mail.gmail.com>

Hi Long,

Your PR will mostly char/ or burn, so cool grease is recommended but when
you do a through silicon via, you may be exposing the cool grease to plasma
and I am not sure what kind of damage it will bring to the devices/chamber.
Of course exposing plasma to photoresist (if that works) is fine. Thanks

On Tue, Apr 12, 2022 at 9:07 AM Hollingshead, Dave <hollingshead.19 at osu.edu>
wrote:

> Hi Long,
>
>
>
> We do this routinely with our DRIE system. As Jer mentioned, we typically
> use small drops of santovac 5 oil to adhere the two wafers together to
> provide thermal conduction. In our case we see etch rate changes or PR
> ?burning? without a good thermal conductor between the samples.
>
>
>
> -Dave
>
>
>
> *From:* labnetwork <labnetwork-bounces at mtl.mit.edu> * On Behalf Of *Jeremy
> Upham
> *Sent:* Monday, April 11, 2022 23:08
> *Cc:* labnetwork at mtl.mit.edu
> *Subject:* Re: [labnetwork] RIE through Silicon
>
>
>
> I think your plan could work, so I'm not sure that I see the problem In my
> experience the carbon in the PR can contribute to the plasma chemistry and
> affect the etch, so I tend to use vacuum grease as a thermally conducting
> binder between
>
> I think your plan could work, so I'm not sure that I see the problem
>
>
>
> In my experience the carbon in the PR can contribute to the plasma
> chemistry and affect the etch, so I tend to use vacuum grease as a
> thermally conducting binder between the etched sample and the backing wafer
> instead. Though your system may well work for your recipe.
>
>
>
> Hope that helps,
>
>
>
> Jer Upham PhD
> Senior Lab Manager / Research Scientist
> Quantum Photonics Group
> University of Ottawa
> Tel.: 1 (613) 562-5800 ext 7325
>
>
>
>
>
> On Mon, Apr 11, 2022 at 6:54 PM Chang, Long <lvchang at central.uh.edu>
> wrote:
>
> *Attention : courriel externe | external email*
>
> Hi Guys,
>
>
>
> I have an Oxford RIE with backside Helium. I want to etch through the
> silicon wafer (380um thick). The largest pattern is a 1mm diameter circle.
> My plan is to ride the 4? sample wafer on a 4" carrier wafer with PR. Does
> anyone have a good solution to this problem?
>
>
>
> Thanks,
>
> Long
>
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>


-- 
Thanks,
Kamal
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From rmorrison at draper.com  Tue Apr 12 13:20:01 2022
From: rmorrison at draper.com (Morrison, Richard H., Jr)
Date: Tue, 12 Apr 2022 17:20:01 +0000
Subject: [labnetwork] RIE through Silicon
In-Reply-To: <CAFu2R8p4=2DBfQXe0cyqhLeQU4XD55Yp-xUxPsHi__GCVZ_m+w@mail.gmail.com>
References: <0448e3a443c44038990bd83e9b9aab10@YT1PR01MB8604.CANPRD01.PROD.OUTLOOK.COM>
 <CAFu2R8p4=2DBfQXe0cyqhLeQU4XD55Yp-xUxPsHi__GCVZ_m+w@mail.gmail.com>
Message-ID: <05b9e506e66b4acc9d9d7b044d639454@draper.com>

We sputter or evaporate a thick layer of Al on the wafer backside 3um it works as an etch stop then you remove it with Al etch.

Richard Morrison
PMTS
Draper Laboratory
555 Technology Square
Cambridge Ma  02139
Office: 617-258-3420
Cell: 508-930-3461





From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Jeremy Upham
Sent: Monday, April 11, 2022 11:08 PM
Cc: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] RIE through Silicon

I think your plan could work, so I'm not sure that I see the problem

In my experience the carbon in the PR can contribute to the plasma chemistry and affect the etch, so I tend to use vacuum grease as a thermally conducting binder between the etched sample and the backing wafer instead. Though your system may well work for your recipe.

Hope that helps,

Jer Upham PhD
Senior Lab Manager / Research Scientist
Quantum Photonics Group
University of Ottawa
Tel.: 1 (613) 562-5800 ext 7325


On Mon, Apr 11, 2022 at 6:54 PM Chang, Long <lvchang at central.uh.edu<mailto:lvchang at central.uh.edu>> wrote:
Attention : courriel externe | external email
Hi Guys,

I have an Oxford RIE with backside Helium. I want to etch through the silicon wafer (380um thick). The largest pattern is a 1mm diameter circle. My plan is to ride the 4? sample wafer on a 4" carrier wafer with PR. Does anyone have a good solution to this problem?

Thanks,
Long

________________________________
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
________________________________
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From vamsinittala at gmail.com  Tue Apr 12 13:44:28 2022
From: vamsinittala at gmail.com (N P Vamsi Krishna)
Date: Tue, 12 Apr 2022 12:44:28 -0500
Subject: [labnetwork] RIE through Silicon
In-Reply-To: <CAFu2R8p4=2DBfQXe0cyqhLeQU4XD55Yp-xUxPsHi__GCVZ_m+w@mail.gmail.com>
References: <0448e3a443c44038990bd83e9b9aab10@YT1PR01MB8604.CANPRD01.PROD.OUTLOOK.COM>
 <CAFu2R8p4=2DBfQXe0cyqhLeQU4XD55Yp-xUxPsHi__GCVZ_m+w@mail.gmail.com>
Message-ID: <CA+SWD1VJgHrxtRYe8pSR_rqyHfD4gPaEpz9MqVQa3cV3+3ixrw@mail.gmail.com>

Hi Long,
I do this routinely in an OXFORD RIE tool by bonding to a carrier wafer
using a crystal bond that is dissolved in hot water after the etch is done.
I have used various other methods of temporary bonding like resist, cool
grease, 3M conductive paste, and Fomblin oil. But, I find crystal bond 555
is much better.

Also, people have used QuickStick? 135 Temporary Mounting Wax or 509-clear
which can be dissolved in Acetone. Also, using the 509- clear I have seen
people preparing a spin coatable solution by dissolving it in PGMEA.

Thanks & br,
vamsi


___________________________________________________

N.P.  Vamsi Krishna, PhD

*Staff Scientist*

Pritzker School of Molecular Engineering, *The University of Chicago *

*Resident **Associate*

Center for Nanoscale Materials, *Argonne National Laboratory *

Phone: 1 (331) 757-8565

On Tue, Apr 12, 2022 at 6:37 AM Jeremy Upham <jupham at gmail.com> wrote:

> I think your plan could work, so I'm not sure that I see the problem
>
> In my experience the carbon in the PR can contribute to the plasma
> chemistry and affect the etch, so I tend to use vacuum grease as a
> thermally conducting binder between the etched sample and the backing wafer
> instead. Though your system may well work for your recipe.
>
> Hope that helps,
>
> Jer Upham PhD
> Senior Lab Manager / Research Scientist
> Quantum Photonics Group
> University of Ottawa
> Tel.: 1 (613) 562-5800 ext 7325
>
>
> On Mon, Apr 11, 2022 at 6:54 PM Chang, Long <lvchang at central.uh.edu>
> wrote:
>
>> *Attention : courriel externe | external email*
>> Hi Guys,
>>
>> I have an Oxford RIE with backside Helium. I want to etch through the
>> silicon wafer (380um thick). The largest pattern is a 1mm diameter circle.
>> My plan is to ride the 4? sample wafer on a 4" carrier wafer with PR. Does
>> anyone have a good solution to this problem?
>>
>> Thanks,
>> Long
>>
>> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>


-- 

___________________________________________________

N.P.  Vamsi Krishna, PhD

*Staff Scientist*

Pritzker School of Molecular Engineering, *The University of Chicago *

*Resident **Associate*

Center for Nanoscale Materials, *Argonne National Laboratory *

Phone: 1 (331) 757-8565
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From hahsieh at ucsc.edu  Tue Apr 12 14:53:46 2022
From: hahsieh at ucsc.edu (Hao-Chieh Hsieh)
Date: Tue, 12 Apr 2022 11:53:46 -0700
Subject: [labnetwork] RIE through Silicon
In-Reply-To: <CAOfoCyj5-MrE_Vbg7Zn=4LkrQ0mjedaSsnOcG8qUcrxaVfq=Cg@mail.gmail.com>
References: <0448e3a443c44038990bd83e9b9aab10@YT1PR01MB8604.CANPRD01.PROD.OUTLOOK.COM>
 <CAFu2R8p4=2DBfQXe0cyqhLeQU4XD55Yp-xUxPsHi__GCVZ_m+w@mail.gmail.com>
 <SA1PR01MB654451DD853B92CCD7F37129F3ED9@SA1PR01MB6544.prod.exchangelabs.com>
 <CAOfoCyj5-MrE_Vbg7Zn=4LkrQ0mjedaSsnOcG8qUcrxaVfq=Cg@mail.gmail.com>
Message-ID: <CAKOCM8GzBJGDDp7K6p8nGZKfYWf8F7nhwydtoJ3mo52Mw7_9GQ@mail.gmail.com>

Hi Long,
We used a vacuum grease to attach the silicon wafer to the Al carrier for
DRIE etching in Utah nanofab . I was able to etch a 50x50um opneing through
a standard 4-inch silicon wafer.  Releasing is time-consuming by soaking
overnight in xylene and final device came out pretty good. We can
discuss more.

Thanks

Hao-Chieh

On Tue, Apr 12, 2022 at 11:22 AM Kamal Yadav <kamal.yadav at gmail.com> wrote:

> Hi Long,
>
> Your PR will mostly char/ or burn, so cool grease is recommended but when
> you do a through silicon via, you may be exposing the cool grease to plasma
> and I am not sure what kind of damage it will bring to the devices/chamber.
> Of course exposing plasma to photoresist (if that works) is fine. Thanks
>
> On Tue, Apr 12, 2022 at 9:07 AM Hollingshead, Dave <
> hollingshead.19 at osu.edu> wrote:
>
>> Hi Long,
>>
>>
>>
>> We do this routinely with our DRIE system. As Jer mentioned, we typically
>> use small drops of santovac 5 oil to adhere the two wafers together to
>> provide thermal conduction. In our case we see etch rate changes or PR
>> ?burning? without a good thermal conductor between the samples.
>>
>>
>>
>> -Dave
>>
>>
>>
>> *From:* labnetwork <labnetwork-bounces at mtl.mit.edu> * On Behalf Of *Jeremy
>> Upham
>> *Sent:* Monday, April 11, 2022 23:08
>> *Cc:* labnetwork at mtl.mit.edu
>> *Subject:* Re: [labnetwork] RIE through Silicon
>>
>>
>>
>> I think your plan could work, so I'm not sure that I see the problem In
>> my experience the carbon in the PR can contribute to the plasma chemistry
>> and affect the etch, so I tend to use vacuum grease as a thermally
>> conducting binder between
>>
>> I think your plan could work, so I'm not sure that I see the problem
>>
>>
>>
>> In my experience the carbon in the PR can contribute to the plasma
>> chemistry and affect the etch, so I tend to use vacuum grease as a
>> thermally conducting binder between the etched sample and the backing wafer
>> instead. Though your system may well work for your recipe.
>>
>>
>>
>> Hope that helps,
>>
>>
>>
>> Jer Upham PhD
>> Senior Lab Manager / Research Scientist
>> Quantum Photonics Group
>> University of Ottawa
>> Tel.: 1 (613) 562-5800 ext 7325
>>
>>
>>
>>
>>
>> On Mon, Apr 11, 2022 at 6:54 PM Chang, Long <lvchang at central.uh.edu>
>> wrote:
>>
>> *Attention : courriel externe | external email*
>>
>> Hi Guys,
>>
>>
>>
>> I have an Oxford RIE with backside Helium. I want to etch through the
>> silicon wafer (380um thick). The largest pattern is a 1mm diameter circle.
>> My plan is to ride the 4? sample wafer on a 4" carrier wafer with PR. Does
>> anyone have a good solution to this problem?
>>
>>
>>
>> Thanks,
>>
>> Long
>>
>>
>>
>> _______________________________________________
>> labnetwork mailing list
>> labnetwork at mtl.mit.edu
>> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>>
>
>
> --
> Thanks,
> Kamal
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From julia.aebersold at louisville.edu  Tue Apr 12 17:18:26 2022
From: julia.aebersold at louisville.edu (Aebersold,Julia W.)
Date: Tue, 12 Apr 2022 21:18:26 +0000
Subject: [labnetwork] RIE through Silicon
In-Reply-To: <CAKOCM8GzBJGDDp7K6p8nGZKfYWf8F7nhwydtoJ3mo52Mw7_9GQ@mail.gmail.com>
References: <0448e3a443c44038990bd83e9b9aab10@YT1PR01MB8604.CANPRD01.PROD.OUTLOOK.COM>
 <CAFu2R8p4=2DBfQXe0cyqhLeQU4XD55Yp-xUxPsHi__GCVZ_m+w@mail.gmail.com>
 <SA1PR01MB654451DD853B92CCD7F37129F3ED9@SA1PR01MB6544.prod.exchangelabs.com>
 <CAOfoCyj5-MrE_Vbg7Zn=4LkrQ0mjedaSsnOcG8qUcrxaVfq=Cg@mail.gmail.com>
 <CAKOCM8GzBJGDDp7K6p8nGZKfYWf8F7nhwydtoJ3mo52Mw7_9GQ@mail.gmail.com>
Message-ID: <DM5PR03MB3098309D278C67B4367E8BDE86ED9@DM5PR03MB3098.namprd03.prod.outlook.com>

We have been using crystal bond.  It provides good thermal transfer and it cleans up well with solvents.

Cheers!

Julia Aebersold, Ph.D.
Manager, Micro/Nano Technology Center
University of Louisville
Shumaker Research Building, Room 233
2210 South Brook Street
Louisville, KY  40292
(502) 852-1572

http://louisville.edu/micronano/

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Hao-Chieh Hsieh
Sent: Tuesday, April 12, 2022 2:54 PM
To: Chang, Long <lvchang at central.uh.edu>
Cc: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] RIE through Silicon

You don't often get email from hahsieh at ucsc.edu<mailto:hahsieh at ucsc.edu>. Learn why this is important<http://aka.ms/LearnAboutSenderIdentification>
CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe.
Hi Long,
We used a vacuum grease to attach the silicon wafer to the Al carrier for DRIE etching in Utah nanofab . I was able to etch a 50x50um opneing through a standard 4-inch silicon wafer.  Releasing is time-consuming by soaking overnight in xylene and final device came out pretty good. We can discuss more.

Thanks

Hao-Chieh

On Tue, Apr 12, 2022 at 11:22 AM Kamal Yadav <kamal.yadav at gmail.com<mailto:kamal.yadav at gmail.com>> wrote:
Hi Long,

Your PR will mostly char/ or burn, so cool grease is recommended but when you do a through silicon via, you may be exposing the cool grease to plasma and I am not sure what kind of damage it will bring to the devices/chamber. Of course exposing plasma to photoresist (if that works) is fine. Thanks

On Tue, Apr 12, 2022 at 9:07 AM Hollingshead, Dave <hollingshead.19 at osu.edu<mailto:hollingshead.19 at osu.edu>> wrote:
Hi Long,

We do this routinely with our DRIE system. As Jer mentioned, we typically use small drops of santovac 5 oil to adhere the two wafers together to provide thermal conduction. In our case we see etch rate changes or PR "burning" without a good thermal conductor between the samples.

-Dave

From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Jeremy Upham
Sent: Monday, April 11, 2022 23:08
Cc: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] RIE through Silicon

I think your plan could work, so I'm not sure that I see the problem In my experience the carbon in the PR can contribute to the plasma chemistry and affect the etch, so I tend to use vacuum grease as a thermally conducting binder between
I think your plan could work, so I'm not sure that I see the problem

In my experience the carbon in the PR can contribute to the plasma chemistry and affect the etch, so I tend to use vacuum grease as a thermally conducting binder between the etched sample and the backing wafer instead. Though your system may well work for your recipe.

Hope that helps,

Jer Upham PhD
Senior Lab Manager / Research Scientist
Quantum Photonics Group
University of Ottawa
Tel.: 1 (613) 562-5800 ext 7325


On Mon, Apr 11, 2022 at 6:54 PM Chang, Long <lvchang at central.uh.edu<mailto:lvchang at central.uh.edu>> wrote:
Attention : courriel externe | external email
Hi Guys,

I have an Oxford RIE with backside Helium. I want to etch through the silicon wafer (380um thick). The largest pattern is a 1mm diameter circle. My plan is to ride the 4" sample wafer on a 4" carrier wafer with PR. Does anyone have a good solution to this problem?

Thanks,
Long

_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
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--
Thanks,
Kamal

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From mmoneck at andrew.cmu.edu  Tue Apr 12 17:26:30 2022
From: mmoneck at andrew.cmu.edu (Matthew Moneck)
Date: Tue, 12 Apr 2022 17:26:30 -0400
Subject: [labnetwork] RIE through Silicon
In-Reply-To: <10E87CAF-D27E-48F8-AEA2-7B7300ACED44@cougarnet.uh.edu>
References: <10E87CAF-D27E-48F8-AEA2-7B7300ACED44@cougarnet.uh.edu>
Message-ID: <37167398b05b0a109135133d50088e5c@mail.gmail.com>

Hi Long,



The PR approach can work, but we have had problems with wafers coming apart
during the etch and subsequently changing the heat transfer properties.  We
now use 150C heat release tape from Revalpha for bonding of full 4? wafers
or large wafer pieces.  We have been able to achieve up to 7-8hrs of
etching in our STS Multiplex without causing activation of the heat release
surface.  However, the trick is to ensure you apply the tape with no
bubbles.  Subsequent debonding of the wafers can then be done using the
standard release temperature for 150C tape.



Best Regards,

Matt



--

*Matthew T. Moneck, Ph.D*

Executive Director, Claire & John Bertucci Nanotechnology Laboratory

Electrical & Computer Engineering | Carnegie Mellon University

5000 Forbes Avenue, Pittsburgh, PA 15213-3890

Phone:  412-268-5430

ece.cmu.edu <http://www.ece.cmu.edu/>

nanofab.ece.cmu.edu <http://www.nanofab.ece.cmu.edu/>



*From:* labnetwork <labnetwork-bounces at mtl.mit.edu> *On Behalf Of *Chang,
Long
*Sent:* Monday, April 11, 2022 5:10 PM
*To:* labnetwork at mtl.mit.edu
*Subject:* [labnetwork] RIE through Silicon



Hi Guys,



I have an Oxford RIE with backside Helium. I want to etch through the
silicon wafer (380um thick). The largest pattern is a 1mm diameter circle.
My plan is to ride the 4? sample wafer on a 4" carrier wafer with PR. Does
anyone have a good solution to this problem?



Thanks,

Long
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From lvchang at Central.UH.EDU  Wed Apr 13 10:18:44 2022
From: lvchang at Central.UH.EDU (Chang, Long)
Date: Wed, 13 Apr 2022 14:18:44 +0000
Subject: [labnetwork] RIE through Silicon
In-Reply-To: <DM5PR03MB3098309D278C67B4367E8BDE86ED9@DM5PR03MB3098.namprd03.prod.outlook.com>
References: <0448e3a443c44038990bd83e9b9aab10@YT1PR01MB8604.CANPRD01.PROD.OUTLOOK.COM>
 <CAFu2R8p4=2DBfQXe0cyqhLeQU4XD55Yp-xUxPsHi__GCVZ_m+w@mail.gmail.com>
 <SA1PR01MB654451DD853B92CCD7F37129F3ED9@SA1PR01MB6544.prod.exchangelabs.com>
 <CAOfoCyj5-MrE_Vbg7Zn=4LkrQ0mjedaSsnOcG8qUcrxaVfq=Cg@mail.gmail.com>
 <CAKOCM8GzBJGDDp7K6p8nGZKfYWf8F7nhwydtoJ3mo52Mw7_9GQ@mail.gmail.com>
 <DM5PR03MB3098309D278C67B4367E8BDE86ED9@DM5PR03MB3098.namprd03.prod.outlook.com>
Message-ID: <023798B4-5D69-4F2A-8525-2275A04D1873@cougarnet.uh.edu>

Hi All,

I appreciate all the responses. I?m going to try the Crystalbond and heat release tape. ?

Thanks,
Long

On Apr 12, 2022, at 4:18 PM, Aebersold,Julia W. <julia.aebersold at louisville.edu<mailto:julia.aebersold at louisville.edu>> wrote:

We have been using crystal bond.  It provides good thermal transfer and it cleans up well with solvents.

Cheers!

Julia Aebersold, Ph.D.
Manager, Micro/Nano Technology Center
University of Louisville
Shumaker Research Building, Room 233
2210 South Brook Street
Louisville, KY  40292
(502) 852-1572

http://louisville.edu/micronano/<https://urldefense.com/v3/__http://louisville.edu/micronano/__;!!LkSTlj0I!AT6I_jlc49FhvQspmfihIEFuSwb318xqvWcjGr3hb6RxGIEhVN0wrwdWki6bnYwtDFButAWQr7lTK5HVLcZUPPFz9ec0OC5mT26s$>

From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Hao-Chieh Hsieh
Sent: Tuesday, April 12, 2022 2:54 PM
To: Chang, Long <lvchang at central.uh.edu<mailto:lvchang at central.uh.edu>>
Cc: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] RIE through Silicon

You don't often get email from hahsieh at ucsc.edu<mailto:hahsieh at ucsc.edu>. Learn why this is important<https://urldefense.com/v3/__http://aka.ms/LearnAboutSenderIdentification__;!!LkSTlj0I!AT6I_jlc49FhvQspmfihIEFuSwb318xqvWcjGr3hb6RxGIEhVN0wrwdWki6bnYwtDFButAWQr7lTK5HVLcZUPPFz9ec0OMAVRu9T$>
CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe.
Hi Long,
We used a vacuum grease to attach the silicon wafer to the Al carrier for DRIE etching in Utah nanofab . I was able to etch a 50x50um opneing through a standard 4-inch silicon wafer.  Releasing is time-consuming by soaking overnight in xylene and final device came out pretty good. We can discuss more.

Thanks

Hao-Chieh

On Tue, Apr 12, 2022 at 11:22 AM Kamal Yadav <kamal.yadav at gmail.com<mailto:kamal.yadav at gmail.com>> wrote:
Hi Long,

Your PR will mostly char/ or burn, so cool grease is recommended but when you do a through silicon via, you may be exposing the cool grease to plasma and I am not sure what kind of damage it will bring to the devices/chamber. Of course exposing plasma to photoresist (if that works) is fine. Thanks

On Tue, Apr 12, 2022 at 9:07 AM Hollingshead, Dave <hollingshead.19 at osu.edu<mailto:hollingshead.19 at osu.edu>> wrote:
Hi Long,

We do this routinely with our DRIE system. As Jer mentioned, we typically use small drops of santovac 5 oil to adhere the two wafers together to provide thermal conduction. In our case we see etch rate changes or PR ?burning? without a good thermal conductor between the samples.

-Dave

From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Jeremy Upham
Sent: Monday, April 11, 2022 23:08
Cc: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] RIE through Silicon

I think your plan could work, so I'm not sure that I see the problem In my experience the carbon in the PR can contribute to the plasma chemistry and affect the etch, so I tend to use vacuum grease as a thermally conducting binder between
I think your plan could work, so I'm not sure that I see the problem

In my experience the carbon in the PR can contribute to the plasma chemistry and affect the etch, so I tend to use vacuum grease as a thermally conducting binder between the etched sample and the backing wafer instead. Though your system may well work for your recipe.

Hope that helps,

Jer Upham PhD
Senior Lab Manager / Research Scientist
Quantum Photonics Group
University of Ottawa
Tel.: 1 (613) 562-5800 ext 7325


On Mon, Apr 11, 2022 at 6:54 PM Chang, Long <lvchang at central.uh.edu<mailto:lvchang at central.uh.edu>> wrote:
Attention : courriel externe | external email
Hi Guys,

I have an Oxford RIE with backside Helium. I want to etch through the silicon wafer (380um thick). The largest pattern is a 1mm diameter circle. My plan is to ride the 4? sample wafer on a 4" carrier wafer with PR. Does anyone have a good solution to this problem?

Thanks,
Long

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--
Thanks,
Kamal

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From olms0025 at umn.edu  Wed Apr 13 15:48:42 2022
From: olms0025 at umn.edu (Brian K. Olmsted)
Date: Wed, 13 Apr 2022 14:48:42 -0500
Subject: [labnetwork] GILD / PLIE capabilities?
Message-ID: <CAMNfp6_zfz8a9nXpUSiaMpjmktVhV7O5WJ_zEJZO+fqjLsJtxw@mail.gmail.com>

Hi,

Does anyone have (or know of a group who has) Gas Immersion Laser Doping
(GILD) or Pulse Laser Induced Epitaxy (PLIE) capabilities for implanting a
high concentration of Boron (1e21/cm^3) into the top ~200 nm of a bare Si
wafer?

Wafer size isn't important.

Thanks much,

Brian K. Olmsted
Associate Director of Laboratory Operations
University of Minnesota | MNC
www.mnc.umn.edu
612.626.3287
olms0025 at umn.edu
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From Khaled.Mnaymneh at nrc-cnrc.gc.ca  Wed Apr 13 16:14:03 2022
From: Khaled.Mnaymneh at nrc-cnrc.gc.ca (Mnaymneh, Khaled)
Date: Wed, 13 Apr 2022 20:14:03 +0000
Subject: [labnetwork] =?windows-1252?q?Postdoctoral_Position_=96_Quantum_?=
 =?windows-1252?q?Optics?=
Message-ID: <d7c10828b76d40f8877aa49cfa553abb@DC01ZWH0011.Corp.nrc.gc.ca>

Postdoctoral Position ? Quantum Optics
The Department of Electronics (ELEC) at Carleton University, Ottawa, Canada, together with the National Research Council (NRC) of Canada, is accepting applications for a Post-Doctoral Research Fellow position dedicated to device design and implementation of integrated quantum optical devices in a silicon nitride platform. The applicant should have research experience in experimental quantum optics, material science, and photonic device modeling, supported by a good publication record. Knowledge of nanofabrication techniques will be considered an asset. The successful applicant will work with our Carleton-NRC team at both campuses on a range of tasks. This includes the development of experimental frequency translation techniques using single photons from quantum dot nanowire-based sources. The candidate will also be responsible for modeling and experimental characterization of silicon nitride materials devices such as frequency combs and cavity resonators. These devices would be geared toward quantum communication applications such as quantum key distribution and the enhancement rates of non-classical light sources.
This position is supported by an external grant and is for a period of 2 years. Candidates must have completed a Ph.D. degree in Engineering Physics, Electrical Engineering, Physics or in a closely related field.
The candidate should ideally have direct research experience and skills in the following areas:

  *   Nonlinear optics, Coupled-mode, optical waveguide and micro-resonator theory and design
  *   Quantum optics in nanostructures and quantum dots, including g(2) measurements
  *   Solid background in optical setup design and optical characterization techniques
For to apply and to get more information, click here:

QSP Postdoc Posting.pdf (carleton.ca)<http://doe.carleton.ca/sites/default/files/content-files/QSP%20Postdoc%20Posting.pdf>

Regards,
Khaled.
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From vamsinittala at gmail.com  Fri Apr 15 00:01:30 2022
From: vamsinittala at gmail.com (N P Vamsi Krishna)
Date: Thu, 14 Apr 2022 23:01:30 -0500
Subject: [labnetwork] Ion milling tool recommendation
Message-ID: <CA+SWD1XQODOgT4ny7iLVeNePOEQt74XJg7bzatyqCdQiopV=Eg@mail.gmail.com>

Hello Labnetwork community,
we are looking to buy an ion milling tool to etch LiCoO2 and Li2TiO3. Can
anybody recommend tools for this particular requirement? Thanks in advance
for your help.

Thanks & best regards,
Vamsi

-- 

___________________________________________________

Pavani Vamsi Krishna Nittala, PhD

*Staff Scientist*

Pritzker School of Molecular Engineering, *The University of Chicago *

*Resident **Associate*

Center for Nanoscale Materials, *Argonne National Laboratory *

Phone: 1 (331) 757-8565
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From Jeffrey.Salzmann at integer.net  Fri Apr 15 10:50:46 2022
From: Jeffrey.Salzmann at integer.net (Salzmann, Jeffrey)
Date: Fri, 15 Apr 2022 14:50:46 +0000
Subject: [labnetwork] Ion milling tool recommendation
In-Reply-To: <CA+SWD1XQODOgT4ny7iLVeNePOEQt74XJg7bzatyqCdQiopV=Eg@mail.gmail.com>
References: <CA+SWD1XQODOgT4ny7iLVeNePOEQt74XJg7bzatyqCdQiopV=Eg@mail.gmail.com>
Message-ID: <MN2PR05MB671914902716D8BA8433D4C08AEE9@MN2PR05MB6719.namprd05.prod.outlook.com>

Just pulled the trigger on a Hitachi ion beam miller. They?ve done excellent demo work for us.

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of N P Vamsi Krishna
Sent: Friday, April 15, 2022 12:02 AM
To: Labnetwork <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Ion milling tool recommendation


CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe.
Hello Labnetwork community,we are looking to buy an ion milling tool to etch LiCoO2 and Li2TiO3. Can anybody recommend tools for this particular requirement? Thanks in advance for your help.Thanks & best regards,Vamsi-- ___________________________________________________Pavan ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ?

[https://alert-dg01.redatatech.com/onprem_security_warning_fetch?r=0&dep=%2BZB8HjQ%2BzAqzr%2FeQdo55MA%3D%3Dg6IiBIdLzmaeIjLZ%2FRldVJSFhg9q74ZtJqkfqecximc1tO7j2EToz%2B%2BETuuLxAJ1Hedu00r0Efv%2BJBBdMO6y%2B95bn6OFly4NaYFIedu4Jw9VV1%2BgkjxI7aSoReliDP5E7zp44TRVKmLZPYKb8kUDoKbTpPb9rQZQFY7swVqG%2F6qvL8sZdPJcWUGMBLc8NA5XswOU2Pgn2K1d2qUdG58MCSWR1hHpUKh%2FptEEK0wxMRqfE1KLMYiI5%2FYdYZKBSFcTM%2B%2FFnOrdoAJIo%2B%2B9vphRVbLsQiaFkm9ENxs7XVok8jDxdYrdX2ogU5wvo%2BypL6wRBCAHBDXQPaq4t2Ha6Lj6nFMkGtvGTDAmLcisAO64ShxhjisIZv7%2B89nTU4XCeSRlve4U8xLSVWAF1OjgT4KYlZGCoWEUzKc04%2BC%2FFH5JNdk0x7HfkRV5dv2HWThiYYJo7rO0%2BHmUrdL5z%2BRtYaJfLlhtXt%2Br3DT00u9xn0eJUWVFcxpwcVKWoUiQWIAmE2aqmmAocBzspXyVZjYNRjFzWDmRRactTihbvVwfqI0ZxWQ%3D]
Hello Labnetwork community,
we are looking to buy an ion milling tool to etch LiCoO2 and Li2TiO3. Can anybody recommend tools for this particular requirement? Thanks in advance for your help.

Thanks & best regards,
Vamsi

--

___________________________________________________
Pavani Vamsi Krishna Nittala, PhD
Staff Scientist

Pritzker School of Molecular Engineering, The University of Chicago

Resident Associate

Center for Nanoscale Materials, Argonne National Laboratory

Phone: 1 (331) 757-8565

________________________________

Integer Confidentiality Notice: This electronic mail transmission is intended for the use of the individual or entity to which it is addressed and may contain confidential or proprietary information belonging to the sender. If you are not the intended recipient, you are hereby notified that any disclosure, copying, distribution, or the taking of any action in reliance on the contents of this information is strictly prohibited. If you have received this transmission in error, please notify the sender immediately by e-mail and delete the original message. Thank you for your cooperation.
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From dcchrist at wisc.edu  Fri Apr 15 13:04:50 2022
From: dcchrist at wisc.edu (Daniel Christensen)
Date: Fri, 15 Apr 2022 17:04:50 +0000
Subject: [labnetwork] UGIM Early registration extended
Message-ID: <DM5PR06MB24113B1B1DAEE236AEB7DA35BEEE9@DM5PR06MB2411.namprd06.prod.outlook.com>


Hi all,

The UGIM 2022 Symposium is ALIVE and well.

Thanks to all of you that registered early so that we could proceed with good planning.
If you have not already registered - we have extended the early bird registration deadline.  So please jump in and join us!

Registration link:  https://ugim2020.wisc.edu/registration/

Thanks much!
Dan C


Daniel C. Christensen
Laboratory Manager
Nanoscale Fabrication Center
University of Wisconsin-Madison

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From christophe.clement at polymtl.ca  Sun Apr 17 14:30:19 2022
From: christophe.clement at polymtl.ca (Christophe =?utf-8?Q?Cl=C3=A9ment?=)
Date: Sun, 17 Apr 2022 14:30:19 -0400 (EDT)
Subject: [labnetwork] Ebeam evaporation of Ge2Sb2Se5 - risks?
Message-ID: <1674610470.3782434.1650220219884.JavaMail.zimbra@polymtl.ca>

Hello Labnetwork community 

We have a user that want to use our shared Ebeam evaporator to deposit Ge2Sb2Se5 material. 
As the tool is used by all of our user, I do not want to contaminate the chamber with something potentially toxic. 
Does any of you can share expericence with such material? Cleaning method, prefered deposition way: Ebeam or sputtering ? 

Thank you for your help 



Christophe Cl?ment 

Technicien laboratoire 

Laboratoire de microfabrication (LMF) 

Groupe des Couches Minces (GCM) [ http://www.gcmlab.ca/ | www.gcmlab.ca ] 


Ecole Polytechnique de Montr?al [ http://www.polymtl.ca/ | www.polymtl.ca ] 


D?partement de g?nie physique 

* 2900 Boulevard Edouard Monpetit 

Pavillon JAB 
Campus de l'Universit? de Montr?al 
Montr?al (Qu?bec) H3T 1J4 


8 [ mailto:christophe.clement at polymtl.ca | christophe.clement at polymtl.ca ] 


( 514 340 4711 #2417 

Fax : 514 340 5195 




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From gilheart at rice.edu  Mon Apr 18 12:18:32 2022
From: gilheart at rice.edu (Timothy J Gilheart)
Date: Mon, 18 Apr 2022 11:18:32 -0500
Subject: [labnetwork] Ebeam evaporation of Ge2Sb2Se5 - risks?
In-Reply-To: <1674610470.3782434.1650220219884.JavaMail.zimbra@polymtl.ca>
References: <1674610470.3782434.1650220219884.JavaMail.zimbra@polymtl.ca>
Message-ID: <D6D9FB96-78D9-470B-B812-021207AE2915@rice.edu>

Hi Christoph,

I?d be very cautious about introducing that to a shared tool. 

Both Sb and Se present with toxicity concerns, which may be sufficient reason alone to deny this request.

Both of them also have relatively high vapor pressure, so they can really contaminate the chamber for subsequent processes, unless you have some specific measures in place to address that.

I?m also not sure about the stoichiometry and/or structure of Ge2Sb2Se5 deposited through PVD. This material (as well as GSST, the Te-doped version of the same thing) is a glass formed through melt-quenching; some of those properties may be lost through subsequent melting and redeposition. I found some references detailing thermal evaporation procedures for GSST, but none for e-beam, so maybe it?s possible on the right tool?

You should decide what?s best for your tool and facility, but I?d deny this material for a general purpose shared tool on the basis of toxicity concerns alone.

Best of luck,

-- 
Tim Gilheart, Ph.D.
Research Scientist - Nanofabrication Cleanroom Manager,
Shared Equipment Authority (SEA), Rice University
Cell: 832-341-5488 | Office: 713-348-3159 | gilheart at rice.edu

> On Apr 17, 2022, at 1:30 PM, Christophe Cl?ment <christophe.clement at polymtl.ca> wrote:
> 
> Hello Labnetwork community
> 
> We have a user that want to use our shared Ebeam evaporator to deposit Ge2Sb2Se5 material.
> As the tool is used by all of our user, I do not want to contaminate  the chamber with something potentially toxic.
> Does any of you can share expericence with such material? Cleaning method, prefered deposition way: Ebeam or sputtering ?
> 
> Thank you for your help
> 
> Christophe Cl?ment
> 
> Technicien laboratoire
> 
> Laboratoire de microfabrication (LMF)
> 
> Groupe des Couches Minces (GCM) www.gcmlab.ca <https://urldefense.com/v3/__http://www.gcmlab.ca/__;!!BuQPrrmRaQ!iNrMecdNdexJ_V7_bDC3K-pUJRKLya-WkrjHZyJRhhqXJ5_6G5IDyJGUM2aqcy2lt2E5KSccMOkobgwnuLApwCagdMCJABY1BmtZdYJzbQ$>
> Ecole Polytechnique de Montr?al www.polymtl.ca <https://urldefense.com/v3/__http://www.polymtl.ca/__;!!BuQPrrmRaQ!iNrMecdNdexJ_V7_bDC3K-pUJRKLya-WkrjHZyJRhhqXJ5_6G5IDyJGUM2aqcy2lt2E5KSccMOkobgwnuLApwCagdMCJABY1BmsGUTKhnQ$>
> D?partement de g?nie physique
> 
> * 2900 Boulevard Edouard Monpetit
> 
> Pavillon JAB
> Campus de l'Universit? de Montr?al
> Montr?al (Qu?bec) H3T 1J4
> 
> 
> 8 christophe.clement at polymtl.ca <mailto:christophe.clement at polymtl.ca>
> ( 514 340 4711 #2417
> 
> Fax : 514 340 5195
> 
>  
>  
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!iNrMecdNdexJ_V7_bDC3K-pUJRKLya-WkrjHZyJRhhqXJ5_6G5IDyJGUM2aqcy2lt2E5KSccMOkobgwnuLApwCagdMCJABY1BmtAlOk9ww$ 

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From djfortie at ualberta.ca  Tue Apr 19 11:18:04 2022
From: djfortie at ualberta.ca (Devin Fortier)
Date: Tue, 19 Apr 2022 09:18:04 -0600
Subject: [labnetwork] Support for Air Products Gas Guard Gas Cabinets
Message-ID: <CALPN8n73_Wd1Vk8dgwHw9YzQrqsrYJAm0cyYp2Ztkwdp0FXyRg@mail.gmail.com>

Hello,

We are running into issues sourcing replacement parts, controller screens
in particular, for our Air Products Gas Guard 500 gas cabinets.  We have
seven of these gas cabinets installed at our facility and have seen the
controller screen go dim on two cabinets making them unusable.  A few years
ago we were able to get a replacement screen from the supplier who sold us
the cabinets, but that does not appear to be the case now.

We wanted to poll the network to see if other labs are using similar
cabinets, and if so, who is your supplier for Air Products gas cabinet
equipment?  Do you have continuing support from them with regards to
spare parts and troubleshooting?  If you use different automatic gas
cabinets, what have your experiences been like with those
brands/suppliers?

Thank you,

-- 

Devin Fortier

Systems/Infrastructure Specialist

Red Seal Instrumentation and Controls Technician

University of Alberta - nanoFAB

W1-028A ECERF Building

9107 - 116 Street

Edmonton, Alberta

Canada T6G 2V4
www.nanofab.ualberta.ca Ph: 780-868-6480
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From schweig at umich.edu  Tue Apr 19 12:27:03 2022
From: schweig at umich.edu (Dennis Schweiger)
Date: Tue, 19 Apr 2022 12:27:03 -0400
Subject: [labnetwork] Support for Air Products Gas Guard Gas Cabinets
In-Reply-To: <CALPN8n73_Wd1Vk8dgwHw9YzQrqsrYJAm0cyYp2Ztkwdp0FXyRg@mail.gmail.com>
References: <CALPN8n73_Wd1Vk8dgwHw9YzQrqsrYJAm0cyYp2Ztkwdp0FXyRg@mail.gmail.com>
Message-ID: <CAKzi2_Mq9aTnmJt_B1jQ6FcRuZOv8KO-RVt9wzMT_ao9AoBKtA@mail.gmail.com>

Devin,

I would check with Tom Britton at Critical Systems.  They've been pretty
good about supporting the older legacy AP cabinets.  At least that has been
my earlier experience.

Here at UofMichigan/LNF, we have several Air Products cabinets (AP10's),
that when the controllers die, we'll replace them with controller hardware
from AES (saving the gas panels and sheet metal cabinets), as the rest of
our gas cabinets were supplied by them, and we're looking to
standardize our operator interfaces.  There'll be some work involved, but
long term, we feel this is the smartest direction for us.

Dennis Schweiger
Facilities Supervisor
University of Michigan/LNF

734.647.2055 Ofc


On Tue, Apr 19, 2022 at 11:48 AM Devin Fortier <djfortie at ualberta.ca> wrote:

> Hello,
>
> We are running into issues sourcing replacement parts, controller screens
> in particular, for our Air Products Gas Guard 500 gas cabinets.  We have
> seven of these gas cabinets installed at our facility and have seen the
> controller screen go dim on two cabinets making them unusable.  A few years
> ago we were able to get a replacement screen from the supplier who sold us
> the cabinets, but that does not appear to be the case now.
>
> We wanted to poll the network to see if other labs are using similar
> cabinets, and if so, who is your supplier for Air Products gas cabinet
> equipment?  Do you have continuing support from them with regards to
> spare parts and troubleshooting?  If you use different automatic gas
> cabinets, what have your experiences been like with those
> brands/suppliers?
>
> Thank you,
>
> --
>
> Devin Fortier
>
> Systems/Infrastructure Specialist
>
> Red Seal Instrumentation and Controls Technician
>
> University of Alberta - nanoFAB
>
> W1-028A ECERF Building
>
> 9107 - 116 Street
>
> Edmonton, Alberta
>
> Canada T6G 2V4
> www.nanofab.ualberta.ca Ph: 780-868-6480
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From kckeenan at seas.upenn.edu  Tue Apr 19 12:30:46 2022
From: kckeenan at seas.upenn.edu (Kyle Keenan)
Date: Tue, 19 Apr 2022 12:30:46 -0400
Subject: [labnetwork] Support for Air Products Gas Guard Gas Cabinets
In-Reply-To: <CALPN8n73_Wd1Vk8dgwHw9YzQrqsrYJAm0cyYp2Ztkwdp0FXyRg@mail.gmail.com>
References: <CALPN8n73_Wd1Vk8dgwHw9YzQrqsrYJAm0cyYp2Ztkwdp0FXyRg@mail.gmail.com>
Message-ID: <CAGTqYdEH8YPD0bc9w86yfQr3hkjw7CaDaUVfOxohWLhvw_edgQ@mail.gmail.com>

Hi Devin,

We use Applied Energy Systems for our GC's and VMB's. The support was okay
before the pandemic, and not so great now, simply because they are very
understaffed. I also know that they are having issues getting supplies.
Having said all of this, they may still be worth contacting as they may be
willing to retrofit your existing stuff.

Kyle

On Tue, Apr 19, 2022 at 11:46 AM Devin Fortier <djfortie at ualberta.ca> wrote:

> Hello,
>
> We are running into issues sourcing replacement parts, controller screens
> in particular, for our Air Products Gas Guard 500 gas cabinets.  We have
> seven of these gas cabinets installed at our facility and have seen the
> controller screen go dim on two cabinets making them unusable.  A few years
> ago we were able to get a replacement screen from the supplier who sold us
> the cabinets, but that does not appear to be the case now.
>
> We wanted to poll the network to see if other labs are using similar
> cabinets, and if so, who is your supplier for Air Products gas cabinet
> equipment?  Do you have continuing support from them with regards to
> spare parts and troubleshooting?  If you use different automatic gas
> cabinets, what have your experiences been like with those
> brands/suppliers?
>
> Thank you,
>
> --
>
> Devin Fortier
>
> Systems/Infrastructure Specialist
>
> Red Seal Instrumentation and Controls Technician
>
> University of Alberta - nanoFAB
>
> W1-028A ECERF Building
>
> 9107 - 116 Street
>
> Edmonton, Alberta
>
> Canada T6G 2V4
> www.nanofab.ualberta.ca
> <https://urldefense.com/v3/__http://www.nanofab.ualberta.ca/__;!!IBzWLUs!DkENU3EYEuFev8n46pAzZPoSPDp9PxbWpyrYOtTlEXy8l3rGbuTCyv5SttOB9R9fChIw$> Ph:
> 780-868-6480
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
>
> https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!IBzWLUs!DkENU3EYEuFev8n46pAzZPoSPDp9PxbWpyrYOtTlEXy8l3rGbuTCyv5SttOB9aH7vBG9$
>


-- 
Kyle Keenan

Laboratory Manager
Quattrone Nanofabrication Facility
University of Pennsylvania
P: 215-898-7560
F: 215-573-4925
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From deonc69 at illinois.edu  Tue Apr 19 12:55:52 2022
From: deonc69 at illinois.edu (Collins, Deon)
Date: Tue, 19 Apr 2022 16:55:52 +0000
Subject: [labnetwork] Support for Air Products Gas Guard Gas Cabinets
In-Reply-To: <CALPN8n73_Wd1Vk8dgwHw9YzQrqsrYJAm0cyYp2Ztkwdp0FXyRg@mail.gmail.com>
References: <CALPN8n73_Wd1Vk8dgwHw9YzQrqsrYJAm0cyYp2Ztkwdp0FXyRg@mail.gmail.com>
Message-ID: <DM6PR11MB316277FE0C4D7A2BFF2F9FECD7F29@DM6PR11MB3162.namprd11.prod.outlook.com>

I need to check the units but I may have tow screen from abandoned equipment in our sub fab. I will let you know on Wednesday.

Deon D. Collins

FACILITY MANAGER
Holonyak Lab
University of Illinois at Urbana-Champaign
208 N Wright St Rm. 248 | 2250
Urbana, IL 61801
217-300-7531 | deonc69 at illinois.edu<mailto:deonc69 at illinois.edu>


[https://webtools.illinois.edu/webservices/js/ds/signature_logo.png]<http://illinois.edu/>

Under the Illinois Freedom of Information Act any written communication to or from university employees regarding university business is a public record and may be subject to public disclosure.

Life is not about watching other people live it. It?s about you living your own!

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Devin Fortier
Sent: Tuesday, April 19, 2022 10:18 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Support for Air Products Gas Guard Gas Cabinets

Hello,

We are running into issues sourcing replacement parts, controller screens in particular, for our Air Products Gas Guard 500 gas cabinets.  We have seven of these gas cabinets installed at our facility and have seen the controller screen go dim on two cabinets making them unusable.  A few years ago we were able to get a replacement screen from the supplier who sold us the cabinets, but that does not appear to be the case now.

We wanted to poll the network to see if other labs are using similar cabinets, and if so, who is your supplier for Air Products gas cabinet equipment?  Do you have continuing support from them with regards to spare parts and troubleshooting?  If you use different automatic gas cabinets, what have your experiences been like with those brands/suppliers?

Thank you,

--

Devin Fortier

Systems/Infrastructure Specialist

Red Seal Instrumentation and Controls Technician

University of Alberta - nanoFAB

W1-028A ECERF Building

9107 - 116 Street

Edmonton, Alberta

Canada T6G 2V4
www.nanofab.ualberta.ca<https://urldefense.com/v3/__http:/www.nanofab.ualberta.ca/__;!!DZ3fjg!pb_gF0KJSCchCYevL6g_kliMNrXtd_aBnoUTLgYkS9pKvdPAtKRJuEoCftbW0M_cd3Q$> Ph: 780-868-6480
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From cg70 at rice.edu  Tue Apr 19 17:12:30 2022
From: cg70 at rice.edu (Carlos Gramajo)
Date: Tue, 19 Apr 2022 16:12:30 -0500
Subject: [labnetwork] Iridium Oxide Reactive Process Problems
Message-ID: <CAN_dhOnLQrqdQ4BRjucsTtwffwc2jyKux_J3udSwRqY1yqf6cg@mail.gmail.com>

Hello everyone,

We have a sputter chamber at Rice in which we are doing a reactive
Iridium Oxide process with an Iridium target. This process produces a lot
of flakes that get lodged in all sorts of crevices and end up shorting the
system out at the base of the gun, under the target. We usually solve the
problem by vacuuming and blowing nitrogen to dislodge stubborn flakes out
of there.

I wonder if there might be a better solution to prevent that from happening
in the first place: maybe a ceramic insert or possibly vacuum grease, to
keep the flakes from getting in there. I just don't know if that will cause
any damage to the system or otherwise prevent it from performing it job.

Does anyone else have this problem and a solution for it?

Thank you,

-- 
Carlos Gramajo
Cleanroom Research Scientist
Shared Equipment Authority (SEA), Rice University
Cell: 713-743-8115; Office: 713-348-8243; cg70 at rice.edu
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From olms0025 at umn.edu  Tue Apr 19 13:03:26 2022
From: olms0025 at umn.edu (Brian K. Olmsted)
Date: Tue, 19 Apr 2022 12:03:26 -0500
Subject: [labnetwork] Iridium sputter target?
Message-ID: <CAMNfp69LstV-LSeOeqchuAgiWgoQ18Uc-ciW=nLBDUcX-e=-+w@mail.gmail.com>

Hi,

I've got a prospective customer interested in sputtering iridium. We don't
have an iridium target and it probably doesn't make a lot of sense for us
to purchase one for extremely limited interest/use. However, if there is
another lab that has this capability I would be happy to steer them to you
for at least this step in their process.

Any information or help is appreciated.

Thanks,

Brian K. Olmsted
Associate Director of Laboratory Operations
University of Minnesota | MNC
www.mnc.umn.edu
612.626.3287
olms0025 at umn.edu
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From tony.olsen at utah.edu  Tue Apr 19 17:21:21 2022
From: tony.olsen at utah.edu (Tony L Olsen)
Date: Tue, 19 Apr 2022 21:21:21 +0000
Subject: [labnetwork] Support for Air Products Gas Guard Gas Cabinets
In-Reply-To: <CALPN8n73_Wd1Vk8dgwHw9YzQrqsrYJAm0cyYp2Ztkwdp0FXyRg@mail.gmail.com>
References: <CALPN8n73_Wd1Vk8dgwHw9YzQrqsrYJAm0cyYp2Ztkwdp0FXyRg@mail.gmail.com>
Message-ID: <BYAPR11MB349610EE02899B94D537CE2FF1F29@BYAPR11MB3496.namprd11.prod.outlook.com>

We have also had good support from Critical Systems.  Our GG500 systems were rebuilt and reprogrammed by them in about 2012.  They should still have the necessary replacement parts or can retrofit, if needed.  One of my screens also went too dim to read the prompts during a cylinder install.  They showed me where to find the brightness and contrast pots on the board and I?ve been able to extend the life of the display.  At the time (late last year), they were prepared to send a replacement if I needed it.

tonyO


Tony Olsen
Nanofab Cleanroom Supervisor/Process Engineer
University of Utah
36 S Wasatch Drive, Suite 2500
Salt Lake City, UT  84112
801-587-0651
www.nanofab.utah.edu


From: Devin Fortier <djfortie at ualberta.ca>
Sent: Tuesday, April 19, 2022 09:18
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Support for Air Products Gas Guard Gas Cabinets

Hello,

We are running into issues sourcing replacement parts, controller screens in particular, for our Air Products Gas Guard 500 gas cabinets.  We have seven of these gas cabinets installed at our facility and have seen the controller screen go dim on two cabinets making them unusable.  A few years ago we were able to get a replacement screen from the supplier who sold us the cabinets, but that does not appear to be the case now.

We wanted to poll the network to see if other labs are using similar cabinets, and if so, who is your supplier for Air Products gas cabinet equipment?  Do you have continuing support from them with regards to spare parts and troubleshooting?  If you use different automatic gas cabinets, what have your experiences been like with those brands/suppliers?

Thank you,

--

Devin Fortier

Systems/Infrastructure Specialist

Red Seal Instrumentation and Controls Technician

University of Alberta - nanoFAB

W1-028A ECERF Building

9107 - 116 Street

Edmonton, Alberta

Canada T6G 2V4
www.nanofab.ualberta.ca<http://www.nanofab.ualberta.ca/> Ph: 780-868-6480
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From julia.aebersold at louisville.edu  Wed Apr 20 11:30:22 2022
From: julia.aebersold at louisville.edu (Aebersold,Julia W.)
Date: Wed, 20 Apr 2022 15:30:22 +0000
Subject: [labnetwork] Iridium sputter target?
In-Reply-To: <CAMNfp69LstV-LSeOeqchuAgiWgoQ18Uc-ciW=nLBDUcX-e=-+w@mail.gmail.com>
References: <CAMNfp69LstV-LSeOeqchuAgiWgoQ18Uc-ciW=nLBDUcX-e=-+w@mail.gmail.com>
Message-ID: <DM5PR03MB3098EFB93BBF3845DAD35DAA86F59@DM5PR03MB3098.namprd03.prod.outlook.com>

We were also asked to deposit iridium last year and the cost of the 3" target immediately stopped the project.

Cheers!

Julia Aebersold, Ph.D.
Manager, Micro/Nano Technology Center
University of Louisville
Shumaker Research Building, Room 233
2210 South Brook Street
Louisville, KY  40292
(502) 852-1572

http://louisville.edu/micronano/

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Brian K. Olmsted
Sent: Tuesday, April 19, 2022 1:03 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Iridium sputter target?

CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe.
Hi,

I've got a prospective customer interested in sputtering iridium. We don't have an iridium target and it probably doesn't make a lot of sense for us to purchase one for extremely limited interest/use. However, if there is another lab that has this capability I would be happy to steer them to you for at least this step in their process.

Any information or help is appreciated.

Thanks,

Brian K. Olmsted
Associate Director of Laboratory Operations
University of Minnesota | MNC
www.mnc.umn.edu<https://nam11.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.mnc.umn.edu%2F&data=05%7C01%7Cjulia.aebersold%40louisville.EDU%7C4f913867e16e4490ad5208da2255449c%7Cdd246e4a54344e158ae391ad9797b209%7C0%7C0%7C637860046892720519%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C1000%7C%7C%7C&sdata=ICuT4PHPzPsTsBRbIAegatGo%2FFAg%2F0EKhkc5Vt0Uisk%3D&reserved=0>
612.626.3287
olms0025 at umn.edu<mailto:olms0025 at umn.edu>

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From sandrine at umich.edu  Wed Apr 20 13:16:22 2022
From: sandrine at umich.edu (Sandrine Martin)
Date: Wed, 20 Apr 2022 13:16:22 -0400
Subject: [labnetwork] Iridium sputter target?
In-Reply-To: <DM5PR03MB3098EFB93BBF3845DAD35DAA86F59@DM5PR03MB3098.namprd03.prod.outlook.com>
References: <CAMNfp69LstV-LSeOeqchuAgiWgoQ18Uc-ciW=nLBDUcX-e=-+w@mail.gmail.com>
 <DM5PR03MB3098EFB93BBF3845DAD35DAA86F59@DM5PR03MB3098.namprd03.prod.outlook.com>
Message-ID: <CAMJO2NCLxyy-HR_xLGC4De1d2O_Sg1=fS-v+iqHEMXqHkJPz3w@mail.gmail.com>

I responded separately to Brian, but just as FYI for others, the LNF does
have Ir sputtering capabilities and service work is an option.

Happy to talk about details with anybody who is interested.
Thanks
Sandrine

On Wed, Apr 20, 2022 at 1:14 PM Aebersold,Julia W. <
julia.aebersold at louisville.edu> wrote:

> We were also asked to deposit iridium last year and the cost of the 3?
> target immediately stopped the project.
>
>
>
> Cheers!
>
>
>
> Julia Aebersold, Ph.D.
>
> Manager, Micro/Nano Technology Center
>
> University of Louisville
>
> Shumaker Research Building, Room 233
>
> 2210 South Brook Street
>
> Louisville, KY  40292
>
> (502) 852-1572
>
>
>
> http://louisville.edu/micronano/
>
>
>
> *From:* labnetwork <labnetwork-bounces at mtl.mit.edu> * On Behalf Of *Brian
> K. Olmsted
> *Sent:* Tuesday, April 19, 2022 1:03 PM
> *To:* labnetwork at mtl.mit.edu
> *Subject:* [labnetwork] Iridium sputter target?
>
>
>
> *CAUTION:* This email originated from outside of our organization. Do not
> click links, open attachments, or respond unless you recognize the sender's
> email address and know the contents are safe.
>
> Hi,
>
>
>
> I've got a prospective customer interested in sputtering iridium. We don't
> have an iridium target and it probably doesn't make a lot of sense for us
> to purchase one for extremely limited interest/use. However, if there is
> another lab that has this capability I would be happy to steer them to you
> for at least this step in their process.
>
>
>
> Any information or help is appreciated.
>
>
>
> Thanks,
>
>
> Brian K. Olmsted
>
> Associate Director of Laboratory Operations
>
> University of Minnesota | MNC
>
> www.mnc.umn.edu
> <https://nam11.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.mnc.umn.edu%2F&data=05%7C01%7Cjulia.aebersold%40louisville.EDU%7C4f913867e16e4490ad5208da2255449c%7Cdd246e4a54344e158ae391ad9797b209%7C0%7C0%7C637860046892720519%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C1000%7C%7C%7C&sdata=ICuT4PHPzPsTsBRbIAegatGo%2FFAg%2F0EKhkc5Vt0Uisk%3D&reserved=0>
>
> 612.626.3287
>
> olms0025 at umn.edu
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>


-- 

Sandrine Martin, Ph.D. (she/her/hers)

University of Michigan

LNF Managing Director

1246D EECS, 1301 Beal Ave

Ann Arbor, MI 48109

Cell 734-277-2365

Fax 734-647-1781

www.LNF.umich.edu <http://www.lnf.umich.edu/>

@LurieNanofab
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From na2661 at columbia.edu  Wed Apr 20 13:19:26 2022
From: na2661 at columbia.edu (Nava Ariel-Sternberg)
Date: Wed, 20 Apr 2022 13:19:26 -0400
Subject: [labnetwork] Iridium sputter target?
In-Reply-To: <DM5PR03MB3098EFB93BBF3845DAD35DAA86F59@DM5PR03MB3098.namprd03.prod.outlook.com>
References: <CAMNfp69LstV-LSeOeqchuAgiWgoQ18Uc-ciW=nLBDUcX-e=-+w@mail.gmail.com>
 <DM5PR03MB3098EFB93BBF3845DAD35DAA86F59@DM5PR03MB3098.namprd03.prod.outlook.com>
Message-ID: <000c01d854da$c9ab4c80$5d01e580$@columbia.edu>

Same. It was 5 digits at least. 

 

Dr. Nava Ariel-Sternberg

Senior Director of CNI Labs

Columbia University

CEPSR/MC 8903 

530 west 120th st. NY

NY 10027

Office: 212-8549927

Cell: 201-5627600

 

 

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of
Aebersold,Julia W.
Sent: Wednesday, April 20, 2022 11:30 AM
To: Brian K. Olmsted <olms0025 at umn.edu>; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Iridium sputter target?

 

We were also asked to deposit iridium last year and the cost of the 3"
target immediately stopped the project. 

 

Cheers!

 

Julia Aebersold, Ph.D.

Manager, Micro/Nano Technology Center

University of Louisville

Shumaker Research Building, Room 233

2210 South Brook Street

Louisville, KY  40292

(502) 852-1572

 

 <http://louisville.edu/micronano/> http://louisville.edu/micronano/

 

From: labnetwork <labnetwork-bounces at mtl.mit.edu
<mailto:labnetwork-bounces at mtl.mit.edu> > On Behalf Of Brian K. Olmsted
Sent: Tuesday, April 19, 2022 1:03 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Iridium sputter target?

 

CAUTION: This email originated from outside of our organization. Do not
click links, open attachments, or respond unless you recognize the sender's
email address and know the contents are safe.

Hi, 

 

I've got a prospective customer interested in sputtering iridium. We don't
have an iridium target and it probably doesn't make a lot of sense for us to
purchase one for extremely limited interest/use. However, if there is
another lab that has this capability I would be happy to steer them to you
for at least this step in their process.

 

Any information or help is appreciated.

 

Thanks,




Brian K. Olmsted

Associate Director of Laboratory Operations

University of Minnesota | MNC

www.mnc.umn.edu
<https://nam11.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.mnc.um
n.edu%2F&data=05%7C01%7Cjulia.aebersold%40louisville.EDU%7C4f913867e16e4490a
d5208da2255449c%7Cdd246e4a54344e158ae391ad9797b209%7C0%7C0%7C637860046892720
519%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1h
aWwiLCJXVCI6Mn0%3D%7C1000%7C%7C%7C&sdata=ICuT4PHPzPsTsBRbIAegatGo%2FFAg%2F0E
Khkc5Vt0Uisk%3D&reserved=0> 

612.626.3287

olms0025 at umn.edu <mailto:olms0025 at umn.edu> 

 

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From tdaunais at hawksemiconductor.com  Wed Apr 20 13:34:24 2022
From: tdaunais at hawksemiconductor.com (Thomas Daunais)
Date: Wed, 20 Apr 2022 13:34:24 -0400
Subject: [labnetwork] Iridium sputter target?
In-Reply-To: <DM5PR03MB3098EFB93BBF3845DAD35DAA86F59@DM5PR03MB3098.namprd03.prod.outlook.com>
References: <CAMNfp69LstV-LSeOeqchuAgiWgoQ18Uc-ciW=nLBDUcX-e=-+w@mail.gmail.com>
 <DM5PR03MB3098EFB93BBF3845DAD35DAA86F59@DM5PR03MB3098.namprd03.prod.outlook.com>
Message-ID: <CAL01fhpYjiTKzh6sT10sey0QAj2J1QGTNi3gND5UqpRnXPFF6g@mail.gmail.com>

Hello Brian,
We can sputter iridium on substrates up to 150 mm and would be happy to
talk to your customer about their needs.
All the best,
--
*Thomas Daunais, PhD*
Lead process engineer
Hawk Semiconductor LLC
4108 Spring Lake Blvd.
Ann Arbor, MI 48108
hawksemiconductor.com
Ph: (231) 740-2720

On Wed, Apr 20, 2022 at 1:13 PM Aebersold,Julia W. <
julia.aebersold at louisville.edu> wrote:

> We were also asked to deposit iridium last year and the cost of the 3?
> target immediately stopped the project.
>
>
>
> Cheers!
>
>
>
> Julia Aebersold, Ph.D.
>
> Manager, Micro/Nano Technology Center
>
> University of Louisville
>
> Shumaker Research Building, Room 233
>
> 2210 South Brook Street
>
> Louisville, KY  40292
>
> (502) 852-1572
>
>
>
> http://louisville.edu/micronano/
>
>
>
> *From:* labnetwork <labnetwork-bounces at mtl.mit.edu> * On Behalf Of *Brian
> K. Olmsted
> *Sent:* Tuesday, April 19, 2022 1:03 PM
> *To:* labnetwork at mtl.mit.edu
> *Subject:* [labnetwork] Iridium sputter target?
>
>
>
> *CAUTION:* This email originated from outside of our organization. Do not
> click links, open attachments, or respond unless you recognize the sender's
> email address and know the contents are safe.
>
> Hi,
>
>
>
> I've got a prospective customer interested in sputtering iridium. We don't
> have an iridium target and it probably doesn't make a lot of sense for us
> to purchase one for extremely limited interest/use. However, if there is
> another lab that has this capability I would be happy to steer them to you
> for at least this step in their process.
>
>
>
> Any information or help is appreciated.
>
>
>
> Thanks,
>
>
> Brian K. Olmsted
>
> Associate Director of Laboratory Operations
>
> University of Minnesota | MNC
>
> www.mnc.umn.edu
> <https://nam11.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.mnc.umn.edu%2F&data=05%7C01%7Cjulia.aebersold%40louisville.EDU%7C4f913867e16e4490ad5208da2255449c%7Cdd246e4a54344e158ae391ad9797b209%7C0%7C0%7C637860046892720519%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C1000%7C%7C%7C&sdata=ICuT4PHPzPsTsBRbIAegatGo%2FFAg%2F0EKhkc5Vt0Uisk%3D&reserved=0>
>
> 612.626.3287
>
> olms0025 at umn.edu
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From zhichaow at udel.edu  Wed Apr 20 13:46:12 2022
From: zhichaow at udel.edu (Zhichao Wang)
Date: Wed, 20 Apr 2022 13:46:12 -0400
Subject: [labnetwork] Iridium sputter target?
In-Reply-To: <DM5PR03MB3098EFB93BBF3845DAD35DAA86F59@DM5PR03MB3098.namprd03.prod.outlook.com>
References: <CAMNfp69LstV-LSeOeqchuAgiWgoQ18Uc-ciW=nLBDUcX-e=-+w@mail.gmail.com>
 <DM5PR03MB3098EFB93BBF3845DAD35DAA86F59@DM5PR03MB3098.namprd03.prod.outlook.com>
Message-ID: <CACeLyv4nu2+9bYHoc8QfKMY+chU=uUci2dm8XSsCHzAYpRjtvg@mail.gmail.com>

The same situation there. We were asked for Ir sputtering last month. The
cost of a 3 inch target is more than $100,000 from the quote that we got
from a supplier. That stops us from proceeding with the project.

Best,
Chao

--


*Zhichao (Chao) Wang, Ph.D.*
*Nano Process Specialist*
*UDNF*
*University of Delaware*
*Pronouns: He/Him/His*
*------------------------*
*Office Number?(302) 831-4839*
*221 Academy St.?RM170*
*Newark, DE 19711*


On Wed, Apr 20, 2022 at 1:11 PM Aebersold,Julia W. <
julia.aebersold at louisville.edu> wrote:

> We were also asked to deposit iridium last year and the cost of the 3?
> target immediately stopped the project.
>
>
>
> Cheers!
>
>
>
> Julia Aebersold, Ph.D.
>
> Manager, Micro/Nano Technology Center
>
> University of Louisville
>
> Shumaker Research Building, Room 233
>
> 2210 South Brook Street
>
> Louisville, KY  40292
>
> (502) 852-1572
>
>
>
> http://louisville.edu/micronano/
>
>
>
> *From:* labnetwork <labnetwork-bounces at mtl.mit.edu> * On Behalf Of *Brian
> K. Olmsted
> *Sent:* Tuesday, April 19, 2022 1:03 PM
> *To:* labnetwork at mtl.mit.edu
> *Subject:* [labnetwork] Iridium sputter target?
>
>
>
> *CAUTION:* This email originated from outside of our organization. Do not
> click links, open attachments, or respond unless you recognize the sender's
> email address and know the contents are safe.
>
> Hi,
>
>
>
> I've got a prospective customer interested in sputtering iridium. We don't
> have an iridium target and it probably doesn't make a lot of sense for us
> to purchase one for extremely limited interest/use. However, if there is
> another lab that has this capability I would be happy to steer them to you
> for at least this step in their process.
>
>
>
> Any information or help is appreciated.
>
>
>
> Thanks,
>
>
> Brian K. Olmsted
>
> Associate Director of Laboratory Operations
>
> University of Minnesota | MNC
>
> www.mnc.umn.edu
> <https://nam11.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.mnc.umn.edu%2F&data=05%7C01%7Cjulia.aebersold%40louisville.EDU%7C4f913867e16e4490ad5208da2255449c%7Cdd246e4a54344e158ae391ad9797b209%7C0%7C0%7C637860046892720519%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C1000%7C%7C%7C&sdata=ICuT4PHPzPsTsBRbIAegatGo%2FFAg%2F0EKhkc5Vt0Uisk%3D&reserved=0>
>
> 612.626.3287
>
> olms0025 at umn.edu
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From prnelson at cpp.edu  Wed Apr 20 15:13:07 2022
From: prnelson at cpp.edu (Phyllis R. Nelson)
Date: Wed, 20 Apr 2022 19:13:07 +0000
Subject: [labnetwork] Thanks for the ellipsometer assistance
Message-ID: <BL0PR01MB41158D3291FAAF90093095E9D4F59@BL0PR01MB4115.prod.exchangelabs.com>

Thanks to everyone who offered assistance! We are currently evaluating whether we have the funds to work with Entrepix.

-Phyllis


Phyllis R. Nelson, PhD
Professor, Electrical and Computer Engineering
Faculty Director of Data Analytics
California State Polytechnic University, Pomona

email: prnelson at cpp dot edu

Cal Poly Pomona not fully back on campus,
I am usually present physically Tuesdays and Wednesdays.
director space: SSB 3340A7
faculty office: 9-317
phone: (909) 869-2649 (email preferred)

Scientists discover the world that exists. Engineers create the world that never was. - Theodore von K?rm?n
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From olms0025 at umn.edu  Wed Apr 20 16:11:50 2022
From: olms0025 at umn.edu (Brian K. Olmsted)
Date: Wed, 20 Apr 2022 15:11:50 -0500
Subject: [labnetwork] Iridium sputter target?
In-Reply-To: <CAMNfp69LstV-LSeOeqchuAgiWgoQ18Uc-ciW=nLBDUcX-e=-+w@mail.gmail.com>
References: <CAMNfp69LstV-LSeOeqchuAgiWgoQ18Uc-ciW=nLBDUcX-e=-+w@mail.gmail.com>
Message-ID: <CAMNfp6-JmvDdNvm=0AmRK9PVEWMLajGpS-LO5HyWjZb8XWRZJA@mail.gmail.com>

Hi,

Thanks for all the replies from everyone. I've got a good pool or resources
to suggest to our user now. And yes, the cost is very very high so we've
encountered the same situation where we can't accommodate the cost of that
target for a single user at this time.

Thanks again,

Brian

On Tue, Apr 19, 2022 at 12:03 PM Brian K. Olmsted <olms0025 at umn.edu> wrote:

> Hi,
>
> I've got a prospective customer interested in sputtering iridium. We don't
> have an iridium target and it probably doesn't make a lot of sense for us
> to purchase one for extremely limited interest/use. However, if there is
> another lab that has this capability I would be happy to steer them to you
> for at least this step in their process.
>
> Any information or help is appreciated.
>
> Thanks,
>
> Brian K. Olmsted
> Associate Director of Laboratory Operations
> University of Minnesota | MNC
> www.mnc.umn.edu
> 612.626.3287
> olms0025 at umn.edu
>
>
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From tony.olsen at utah.edu  Thu Apr 21 12:50:54 2022
From: tony.olsen at utah.edu (Tony L Olsen)
Date: Thu, 21 Apr 2022 16:50:54 +0000
Subject: [labnetwork] Refill ALD Cylinders
Message-ID: <BYAPR11MB3496BF34444FC06C6C4EC6D4F1F49@BYAPR11MB3496.namprd11.prod.outlook.com>

Does anybody have a source to re-use/refill ALD cylinders?  We have a number of spent cylinders (TMA, 3DMAS, TDMAHf, etc.).  It seems a waste to dispose of them, if they can be re-used.  I've found a couple companies that supposedly provide this service, but they have not responded to my inquiries.  Hoping there is a good track record with someone out there.

tonyO


Tony Olsen
Nanofab Cleanroom Supervisor/Process Engineer
University of Utah
36 S Wasatch Drive, Suite 2500
Salt Lake City, UT  84112
801-587-0651
www.nanofab.utah.edu


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From robert.macdonald at ge.com  Thu Apr 21 12:08:22 2022
From: robert.macdonald at ge.com (Macdonald, Robert (GE Research, US))
Date: Thu, 21 Apr 2022 16:08:22 +0000
Subject: [labnetwork] Iridium sputter target?
In-Reply-To: <CACeLyv4nu2+9bYHoc8QfKMY+chU=uUci2dm8XSsCHzAYpRjtvg@mail.gmail.com>
References: <CAMNfp69LstV-LSeOeqchuAgiWgoQ18Uc-ciW=nLBDUcX-e=-+w@mail.gmail.com>
 <DM5PR03MB3098EFB93BBF3845DAD35DAA86F59@DM5PR03MB3098.namprd03.prod.outlook.com>
 <CACeLyv4nu2+9bYHoc8QfKMY+chU=uUci2dm8XSsCHzAYpRjtvg@mail.gmail.com>
Message-ID: <6e8bf742b7b24039b3289aa03789bfb9@ge.com>

UW Seattle used to have an 8? target (yes, 8?!). You can check with them?

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Zhichao Wang
Sent: Wednesday, April 20, 2022 1:46 PM
To: julia.aebersold at louisville.edu
Cc: labnetwork at mtl.mit.edu
Subject: EXT: Re: [labnetwork] Iridium sputter target?

WARNING: This email originated from outside of GE. Please validate the sender's email address before clicking on links or attachments as they may not be safe.

The same situation there. We were asked for Ir sputtering last month. The cost of a 3 inch target is more than $100,000 from the quote that we got from a supplier. That stops us from proceeding with the project.

Best,
Chao

--

[https://drive.google.com/uc?id=1VsUYvli9WeVR0tCaW1bQEncBtx6nEOsd&export=download]
Zhichao (Chao) Wang, Ph.D.
Nano Process Specialist
UDNF
University of Delaware
Pronouns: He/Him/His
------------------------
Office Number?(302) 831-4839
221 Academy St.?RM170
Newark, DE 19711


On Wed, Apr 20, 2022 at 1:11 PM Aebersold,Julia W. <julia.aebersold at louisville.edu<mailto:julia.aebersold at louisville.edu>> wrote:
We were also asked to deposit iridium last year and the cost of the 3? target immediately stopped the project.

Cheers!

Julia Aebersold, Ph.D.
Manager, Micro/Nano Technology Center
University of Louisville
Shumaker Research Building, Room 233
2210 South Brook Street
Louisville, KY  40292
(502) 852-1572

http://louisville.edu/micronano/

From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Brian K. Olmsted
Sent: Tuesday, April 19, 2022 1:03 PM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Iridium sputter target?

CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe.
Hi,

I've got a prospective customer interested in sputtering iridium. We don't have an iridium target and it probably doesn't make a lot of sense for us to purchase one for extremely limited interest/use. However, if there is another lab that has this capability I would be happy to steer them to you for at least this step in their process.

Any information or help is appreciated.

Thanks,

Brian K. Olmsted
Associate Director of Laboratory Operations
University of Minnesota | MNC
www.mnc.umn.edu<https://nam11.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.mnc.umn.edu%2F&data=05%7C01%7Cjulia.aebersold%40louisville.EDU%7C4f913867e16e4490ad5208da2255449c%7Cdd246e4a54344e158ae391ad9797b209%7C0%7C0%7C637860046892720519%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C1000%7C%7C%7C&sdata=ICuT4PHPzPsTsBRbIAegatGo%2FFAg%2F0EKhkc5Vt0Uisk%3D&reserved=0>
612.626.3287
olms0025 at umn.edu<mailto:olms0025 at umn.edu>

_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From fsflack at wisc.edu  Thu Apr 21 16:05:03 2022
From: fsflack at wisc.edu (Frank Flack)
Date: Thu, 21 Apr 2022 20:05:03 +0000
Subject: [labnetwork] Refill ALD Cylinders
In-Reply-To: <BYAPR11MB3496BF34444FC06C6C4EC6D4F1F49@BYAPR11MB3496.namprd11.prod.outlook.com>
References: <BYAPR11MB3496BF34444FC06C6C4EC6D4F1F49@BYAPR11MB3496.namprd11.prod.outlook.com>
Message-ID: <DM5PR0601MB37825F96F3C64319E35A4650D8F49@DM5PR0601MB3782.namprd06.prod.outlook.com>

Hi Tony,

I've just been looking into this myself and, while I haven't gone through the refill process yet, we have several cylinders designated to be refilled by Strem Chemicals.  Looking at the paperwork, they can help you figure out whether your cylinders in particular can be refilled.

Best,
Frank

Frank S. Flack
Wisconsin Centers for Nanoscale Technology
Rm. 3120 Engineering Centers Bldg.
1550 Engineering Drive
Madison, WI 53706

________________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Tony L Olsen <tony.olsen at utah.edu>
Sent: Thursday, April 21, 2022 11:50 AM
To: Lab Network (labnetwork at mtl.mit.edu)
Subject: [labnetwork] Refill ALD Cylinders

Does anybody have a source to re-use/refill ALD cylinders?  We have a number of spent cylinders (TMA, 3DMAS, TDMAHf, etc.).  It seems a waste to dispose of them, if they can be re-used.  I?ve found a couple companies that supposedly provide this service, but they have not responded to my inquiries.  Hoping there is a good track record with someone out there.

tonyO


Tony Olsen
Nanofab Cleanroom Supervisor/Process Engineer
University of Utah
36 S Wasatch Drive, Suite 2500
Salt Lake City, UT  84112
801-587-0651
www.nanofab.utah.edu




From edeguns at gmail.com  Thu Apr 21 16:12:07 2022
From: edeguns at gmail.com (Eric Deguns)
Date: Thu, 21 Apr 2022 16:12:07 -0400
Subject: [labnetwork] Refill ALD Cylinders
In-Reply-To: <BYAPR11MB3496BF34444FC06C6C4EC6D4F1F49@BYAPR11MB3496.namprd11.prod.outlook.com>
References: <BYAPR11MB3496BF34444FC06C6C4EC6D4F1F49@BYAPR11MB3496.namprd11.prod.outlook.com>
Message-ID: <4307E9C2-4AC5-4248-8D43-07CEB3084460@gmail.com>

Hi Tony,

Most of the standard ALD precursors vendors will "clean and refill" cylinders for you - but they will charge you a cleaning fee.  By this, I mean - Strem, Air Liquide, Gelest, etc. Sometimes this cleaning fee can be quite expensive which makes it more cost effective to purchase new ones.

If you have personnel in the Chemistry department who can refill these cylinders in an appropriate glovebox, refilling on top of the same material is also possible.  For example, filling TMA into a empty cylinder which previously held TMA. Proper training and equipment is key here.

For some applications, you many not want to do a refill depending on the precursor "stickiness" or it's purity requirements.

Hope that helps.

Best,

Eric

P.S. My work contact is Edeguns at veeco.com



Sent from my iPhone

> On Apr 21, 2022, at 4:02 PM, Tony L Olsen <tony.olsen at utah.edu> wrote:
> 
> ?
> Does anybody have a source to re-use/refill ALD cylinders?  We have a number of spent cylinders (TMA, 3DMAS, TDMAHf, etc.).  It seems a waste to dispose of them, if they can be re-used.  I?ve found a couple companies that supposedly provide this service, but they have not responded to my inquiries.  Hoping there is a good track record with someone out there.
>  
> tonyO
>  
>  
> Tony Olsen
> Nanofab Cleanroom Supervisor/Process Engineer
> University of Utah
> 36 S Wasatch Drive, Suite 2500
> Salt Lake City, UT  84112
> 801-587-0651
> www.nanofab.utah.edu
>  
>  
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From kckeenan at seas.upenn.edu  Thu Apr 21 16:20:52 2022
From: kckeenan at seas.upenn.edu (Kyle Keenan)
Date: Thu, 21 Apr 2022 16:20:52 -0400
Subject: [labnetwork] Refill ALD Cylinders
In-Reply-To: <BYAPR11MB3496BF34444FC06C6C4EC6D4F1F49@BYAPR11MB3496.namprd11.prod.outlook.com>
References: <BYAPR11MB3496BF34444FC06C6C4EC6D4F1F49@BYAPR11MB3496.namprd11.prod.outlook.com>
Message-ID: <CAGTqYdFg=v3DPqODgpZJmQ_DtP5HKg++Vxyw2Kx6b8G=sH_Q9Q@mail.gmail.com>

Strem Chemical does this for us all the time, so long as you are replacing
like with like.

https://www.strem.com/

Kyle

On Thu, Apr 21, 2022 at 4:00 PM Tony L Olsen <tony.olsen at utah.edu> wrote:

> Does anybody have a source to re-use/refill ALD cylinders?  We have a
> number of spent cylinders (TMA, 3DMAS, TDMAHf, etc.).  It seems a waste to
> dispose of them, if they can be re-used.  I?ve found a couple companies
> that supposedly provide this service, but they have not responded to my
> inquiries.  Hoping there is a good track record with someone out there.
>
>
>
> tonyO
>
>
>
>
>
> Tony Olsen
>
> Nanofab Cleanroom Supervisor/Process Engineer
>
> University of Utah
>
> 36 S Wasatch Drive, Suite 2500
>
> Salt Lake City, UT  84112
>
> 801-587-0651
>
> www.nanofab.utah.edu
> <https://urldefense.com/v3/__http://www.nanofab.utah.edu__;!!IBzWLUs!B0ergMFRhjgMEL_aALldiw9Xee1A1WHwklgMgN4aKynjFuOqg2jVU8l-49LJC6rdTkzI$>
>
>
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
>
> https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!IBzWLUs!B0ergMFRhjgMEL_aALldiw9Xee1A1WHwklgMgN4aKynjFuOqg2jVU8l-49LJC4facgdh$
>


-- 
Kyle Keenan

Laboratory Manager
Quattrone Nanofabrication Facility
University of Pennsylvania
P: 215-898-7560
F: 215-573-4925
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From kckeenan at seas.upenn.edu  Thu Apr 21 16:24:47 2022
From: kckeenan at seas.upenn.edu (Kyle Keenan)
Date: Thu, 21 Apr 2022 16:24:47 -0400
Subject: [labnetwork] Zeiss AxioCam ICc5
Message-ID: <CAGTqYdGJLgbFvDxRQE1QeRUHdvwsoaDVxYu+3+Q7jd+V-jZF7g@mail.gmail.com>

Hello,

Does anyone out there have a spare, working Zeiss AxioCam ICc5 microscope
camera? We have one that died, and Zeiss no longer supports them, not the
software platform on which they run. We're trying to avoid a $10k per scope
upgrade, at least for now (we have 4 of them), so getting a replacement
camera would buy us some time.

Thanks,
-- 
Kyle Keenan

Laboratory Manager
Quattrone Nanofabrication Facility
University of Pennsylvania
P: 215-898-7560
F: 215-573-4925
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From mmoneck at andrew.cmu.edu  Thu Apr 21 21:57:46 2022
From: mmoneck at andrew.cmu.edu (Matthew Moneck)
Date: Thu, 21 Apr 2022 21:57:46 -0400
Subject: [labnetwork] Refill ALD Cylinders
In-Reply-To: <4307E9C2-4AC5-4248-8D43-07CEB3084460@gmail.com>
References: <BYAPR11MB3496BF34444FC06C6C4EC6D4F1F49@BYAPR11MB3496.namprd11.prod.outlook.com>
 <4307E9C2-4AC5-4248-8D43-07CEB3084460@gmail.com>
Message-ID: <6a00c83b0295b68b18a1c3b8758b3582@mail.gmail.com>

Hi Tony,



We have had good experience refilling cylinders with Strem.  As Eric
mentioned, there is a cleaning fee that can make the cost of a new cylinder
either similar or cheaper.  However, we were asked by our EHS Office to
pursue the refill route because as it turned out, it was more expensive to
properly dispose of used cylinders with a hazardous waste vendor than it is
to clean and refill.



Best Regards,


Matt



--

*Matthew T. Moneck, Ph.D*

Executive Director, Claire & John Bertucci Nanotechnology Laboratory

Electrical & Computer Engineering | Carnegie Mellon University

5000 Forbes Avenue, Pittsburgh, PA 15213-3890

Phone:  412-268-5430

ece.cmu.edu <http://www.ece.cmu.edu/>

nanofab.ece.cmu.edu <http://www.nanofab.ece.cmu.edu/>



*From:* labnetwork <labnetwork-bounces at mtl.mit.edu> *On Behalf Of *Eric
Deguns
*Sent:* Thursday, April 21, 2022 4:12 PM
*To:* Tony L Olsen <tony.olsen at utah.edu>
*Cc:* Lab Network (labnetwork at mtl.mit.edu) <labnetwork at mtl.mit.edu>
*Subject:* Re: [labnetwork] Refill ALD Cylinders



Hi Tony,



Most of the standard ALD precursors vendors will "clean and refill"
cylinders for you - but they will charge you a cleaning fee.  By this, I
mean - Strem, Air Liquide, Gelest, etc. Sometimes this cleaning fee can be
quite expensive which makes it more cost effective to purchase new ones.



If you have personnel in the Chemistry department who can refill these
cylinders in an appropriate glovebox, refilling on top of the same material
is also possible.  For example, filling TMA into a empty cylinder which
previously held TMA. Proper training and equipment is key here.



For some applications, you many not want to do a refill depending on the
precursor "stickiness" or it's purity requirements.



Hope that helps.



Best,



Eric



P.S. My work contact is Edeguns at veeco.com





Sent from my iPhone



On Apr 21, 2022, at 4:02 PM, Tony L Olsen <tony.olsen at utah.edu> wrote:

?

Does anybody have a source to re-use/refill ALD cylinders?  We have a
number of spent cylinders (TMA, 3DMAS, TDMAHf, etc.).  It seems a waste to
dispose of them, if they can be re-used.  I?ve found a couple companies
that supposedly provide this service, but they have not responded to my
inquiries.  Hoping there is a good track record with someone out there.



tonyO





Tony Olsen

Nanofab Cleanroom Supervisor/Process Engineer

University of Utah

36 S Wasatch Drive, Suite 2500

Salt Lake City, UT  84112

801-587-0651

www.nanofab.utah.edu





_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From tony.olsen at utah.edu  Thu Apr 21 16:54:56 2022
From: tony.olsen at utah.edu (Tony L Olsen)
Date: Thu, 21 Apr 2022 20:54:56 +0000
Subject: [labnetwork] Refill ALD Cylinders
In-Reply-To: <BYAPR11MB3496BF34444FC06C6C4EC6D4F1F49@BYAPR11MB3496.namprd11.prod.outlook.com>
References: <BYAPR11MB3496BF34444FC06C6C4EC6D4F1F49@BYAPR11MB3496.namprd11.prod.outlook.com>
Message-ID: <BYAPR11MB34963F2611C2A0B6F6A1AE9BF1F49@BYAPR11MB3496.namprd11.prod.outlook.com>

Thanks everyone for the quick response.  Curiously, when I asked Strem a few years ago, they told me they don't refill.  I guess I'll have another discussion with them.

tonyO


From: Tony L Olsen <tony.olsen at utah.edu>
Sent: Thursday, April 21, 2022 10:51
To: Lab Network (labnetwork at mtl.mit.edu) <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Refill ALD Cylinders

Does anybody have a source to re-use/refill ALD cylinders?  We have a number of spent cylinders (TMA, 3DMAS, TDMAHf, etc.).  It seems a waste to dispose of them, if they can be re-used.  I've found a couple companies that supposedly provide this service, but they have not responded to my inquiries.  Hoping there is a good track record with someone out there.

tonyO


Tony Olsen
Nanofab Cleanroom Supervisor/Process Engineer
University of Utah
36 S Wasatch Drive, Suite 2500
Salt Lake City, UT  84112
801-587-0651
www.nanofab.utah.edu


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From patricns at uw.edu  Thu Apr 21 17:26:38 2022
From: patricns at uw.edu (N Shane Patrick)
Date: Thu, 21 Apr 2022 14:26:38 -0700
Subject: [labnetwork] Iridium sputter target?
In-Reply-To: <6e8bf742b7b24039b3289aa03789bfb9@ge.com>
References: <CAMNfp69LstV-LSeOeqchuAgiWgoQ18Uc-ciW=nLBDUcX-e=-+w@mail.gmail.com>
 <DM5PR03MB3098EFB93BBF3845DAD35DAA86F59@DM5PR03MB3098.namprd03.prod.outlook.com>
 <CACeLyv4nu2+9bYHoc8QfKMY+chU=uUci2dm8XSsCHzAYpRjtvg@mail.gmail.com>
 <6e8bf742b7b24039b3289aa03789bfb9@ge.com>
Message-ID: <7DFCBE75-0B8C-44E6-8A54-1D4532DB95FE@uw.edu>

I don?t know who else on campus might be running a system for that, but we, at least, don?t currently have Iridium capability.

N. Shane Patrick
Manager, Lab Operations and Safety
Electron Beam Lithography
Washington Nanofabrication Facility (WNF) 
National Nanotechnology Coordinated Infrastructure (NNCI)
University of Washington - NanoES
Fluke Hall 129, Box 352143
(206) 221-1045
patricns at uw.edu <mailto:patricns at uw.edu>
http://www.wnf.washington.edu/ <http://www.wnf.washington.edu/>

> On Apr 21, 2022, at 9:08 AM, Macdonald, Robert (GE Research, US) <robert.macdonald at ge.com> wrote:
> 
> UW Seattle used to have an 8? target (yes, 8?!). You can check with them?
>  
> From: labnetwork <labnetwork-bounces at mtl.mit.edu <mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Zhichao Wang
> Sent: Wednesday, April 20, 2022 1:46 PM
> To: julia.aebersold at louisville.edu <mailto:julia.aebersold at louisville.edu>
> Cc: labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
> Subject: EXT: Re: [labnetwork] Iridium sputter target?
>  
> WARNING: This email originated from outside of GE. Please validate the sender's email address before clicking on links or attachments as they may not be safe.
> The same situation there. We were asked for Ir sputtering last month. The cost of a 3 inch target is more than $100,000 from the quote that we got from a supplier. That stops us from proceeding with the project. 
>  
> Best,
> Chao
>  
> --
>  
> 
> Zhichao (Chao) Wang, Ph.D.
> Nano Process Specialist
> UDNF
> University of Delaware
> Pronouns: He/Him/His
> ------------------------
> Office Number?(302) 831-4839
> 221 Academy St.?RM170
> Newark, DE 19711
>  
>  
> On Wed, Apr 20, 2022 at 1:11 PM Aebersold,Julia W. <julia.aebersold at louisville.edu <mailto:julia.aebersold at louisville.edu>> wrote:
> We were also asked to deposit iridium last year and the cost of the 3? target immediately stopped the project.
>  
> Cheers!
>  
> Julia Aebersold, Ph.D.
> Manager, Micro/Nano Technology Center
> University of Louisville
> Shumaker Research Building, Room 233
> 2210 South Brook Street
> Louisville, KY  40292
> (502) 852-1572
>  
> http://louisville.edu/micronano/ <http://louisville.edu/micronano/>
>  
> From: labnetwork <labnetwork-bounces at mtl.mit.edu <mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Brian K. Olmsted
> Sent: Tuesday, April 19, 2022 1:03 PM
> To: labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
> Subject: [labnetwork] Iridium sputter target?
>  
> CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe.
> Hi,
>  
> I've got a prospective customer interested in sputtering iridium. We don't have an iridium target and it probably doesn't make a lot of sense for us to purchase one for extremely limited interest/use. However, if there is another lab that has this capability I would be happy to steer them to you for at least this step in their process.
>  
> Any information or help is appreciated.
>  
> Thanks,
> 
> Brian K. Olmsted
> Associate Director of Laboratory Operations
> University of Minnesota | MNC
> www.mnc.umn.edu <https://nam11.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.mnc.umn.edu%2F&data=05%7C01%7Cjulia.aebersold%40louisville.EDU%7C4f913867e16e4490ad5208da2255449c%7Cdd246e4a54344e158ae391ad9797b209%7C0%7C0%7C637860046892720519%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C1000%7C%7C%7C&sdata=ICuT4PHPzPsTsBRbIAegatGo%2FFAg%2F0EKhkc5Vt0Uisk%3D&reserved=0>
> 612.626.3287
> olms0025 at umn.edu <mailto:olms0025 at umn.edu>
>  
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork <https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork>_______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork <https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork>
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From betemc at rit.edu  Fri Apr 22 07:48:41 2022
From: betemc at rit.edu (Bruce Tolleson)
Date: Fri, 22 Apr 2022 11:48:41 +0000
Subject: [labnetwork] Refill ALD Cylinders
In-Reply-To: <4307E9C2-4AC5-4248-8D43-07CEB3084460@gmail.com>
References: <BYAPR11MB3496BF34444FC06C6C4EC6D4F1F49@BYAPR11MB3496.namprd11.prod.outlook.com>
 <4307E9C2-4AC5-4248-8D43-07CEB3084460@gmail.com>
Message-ID: <4d9b55388182440da37479072922372d@ex04mail01a.ad.rit.edu>

Hi Tony,
  We use Strem Chemical to clean and refill all of our precursors.  They are easy to work with and turn them around in short order.
Strem has a Cylinder Refill form on their web site with the instructions and phone numbers.
  I hope this helps,

Bruce E. Tolleson
Rochester Institute of Technology
82  Lomb Memorial Drive, Bldg 17-2627
Rochester, NY 14623-5604
(315) 573-6263
[http://www.rit.edu/~962www/logos/tiger_walking_rit_color.jpg]

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Eric Deguns
Sent: Thursday, April 21, 2022 4:12 PM
To: Tony L Olsen <tony.olsen at utah.edu>
Cc: Lab Network (labnetwork at mtl.mit.edu) <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Refill ALD Cylinders

Hi Tony,

Most of the standard ALD precursors vendors will "clean and refill" cylinders for you - but they will charge you a cleaning fee.  By this, I mean - Strem, Air Liquide, Gelest, etc. Sometimes this cleaning fee can be quite expensive which makes it more cost effective to purchase new ones.

If you have personnel in the Chemistry department who can refill these cylinders in an appropriate glovebox, refilling on top of the same material is also possible.  For example, filling TMA into a empty cylinder which previously held TMA. Proper training and equipment is key here.

For some applications, you many not want to do a refill depending on the precursor "stickiness" or it's purity requirements.

Hope that helps.

Best,

Eric

P.S. My work contact is Edeguns at veeco.com<mailto:Edeguns at veeco.com>


Sent from my iPhone


On Apr 21, 2022, at 4:02 PM, Tony L Olsen <tony.olsen at utah.edu<mailto:tony.olsen at utah.edu>> wrote:
?
Does anybody have a source to re-use/refill ALD cylinders?  We have a number of spent cylinders (TMA, 3DMAS, TDMAHf, etc.).  It seems a waste to dispose of them, if they can be re-used.  I?ve found a couple companies that supposedly provide this service, but they have not responded to my inquiries.  Hoping there is a good track record with someone out there.

tonyO


Tony Olsen
Nanofab Cleanroom Supervisor/Process Engineer
University of Utah
36 S Wasatch Drive, Suite 2500
Salt Lake City, UT  84112
801-587-0651
www.nanofab.utah.edu


_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From michael.martin at louisville.edu  Fri Apr 22 09:05:01 2022
From: michael.martin at louisville.edu (Martin,Michael David)
Date: Fri, 22 Apr 2022 13:05:01 +0000
Subject: [labnetwork] Refill ALD Cylinders
In-Reply-To: <BYAPR11MB34963F2611C2A0B6F6A1AE9BF1F49@BYAPR11MB3496.namprd11.prod.outlook.com>
References: <BYAPR11MB3496BF34444FC06C6C4EC6D4F1F49@BYAPR11MB3496.namprd11.prod.outlook.com>
 <BYAPR11MB34963F2611C2A0B6F6A1AE9BF1F49@BYAPR11MB3496.namprd11.prod.outlook.com>
Message-ID: <BN9PR03MB617050DD6918663BE19FF68CF2F79@BN9PR03MB6170.namprd03.prod.outlook.com>

Hi Tony,
    One caveat to the refilling.  They will not put a different chemical in the cylinders that are DOT certified, i.e. those that have a welded lid as opposed to a Conflat lid.  So you can't say use an empty TMA and change to BDMS, instead you have to buy a new $6k cylinder.   Also, they will not fill the Conflat style as these are not DOT certified.

Regards,
  Michael
________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Tony L Olsen <tony.olsen at utah.edu>
Sent: Thursday, April 21, 2022 4:54 PM
To: Lab Network (labnetwork at mtl.mit.edu) <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Refill ALD Cylinders


CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe.

Thanks everyone for the quick response.  Curiously, when I asked Strem a few years ago, they told me they don?t refill.  I guess I?ll have another discussion with them.



tonyO





From: Tony L Olsen <tony.olsen at utah.edu>
Sent: Thursday, April 21, 2022 10:51
To: Lab Network (labnetwork at mtl.mit.edu) <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Refill ALD Cylinders



Does anybody have a source to re-use/refill ALD cylinders?  We have a number of spent cylinders (TMA, 3DMAS, TDMAHf, etc.).  It seems a waste to dispose of them, if they can be re-used.  I?ve found a couple companies that supposedly provide this service, but they have not responded to my inquiries.  Hoping there is a good track record with someone out there.



tonyO





Tony Olsen

Nanofab Cleanroom Supervisor/Process Engineer

University of Utah

36 S Wasatch Drive, Suite 2500

Salt Lake City, UT  84112

801-587-0651

www.nanofab.utah.edu<https://nam11.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.nanofab.utah.edu%2F&data=05%7C01%7Cmichael.martin%40louisville.EDU%7Caae86e24e8724183b0f408da24584cf9%7Cdd246e4a54344e158ae391ad9797b209%7C0%7C0%7C637862258912977242%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C2000%7C%7C%7C&sdata=vk8AHn3NtmDUM%2FXbR7nOzJVBYmDy%2BHe2SRCMUHwFCOc%3D&reserved=0>




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From bgila at ufl.edu  Fri Apr 22 09:30:35 2022
From: bgila at ufl.edu (Gila,Brent P)
Date: Fri, 22 Apr 2022 09:30:35 -0400
Subject: [labnetwork] Refill ALD Cylinders
In-Reply-To: <4d9b55388182440da37479072922372d@ex04mail01a.ad.rit.edu>
References: <BYAPR11MB3496BF34444FC06C6C4EC6D4F1F49@BYAPR11MB3496.namprd11.prod.outlook.com>
 <4307E9C2-4AC5-4248-8D43-07CEB3084460@gmail.com>
 <4d9b55388182440da37479072922372d@ex04mail01a.ad.rit.edu>
Message-ID: <3466b275-1c6d-68b5-e33d-ceb4c10069d1@ufl.edu>

We have been using Strem for many years and the cylinder refill program 
has been great.

The one thing you may want to be aware of is the additional shipping 
charges for TMA cylinders (pyrophoric hazard).? For us, the additional 
shipping charge for TMA plus the price of the cylinder cleaning is more 
than just purchasing a new cylinder of TMA.? The cylinder cleaning is 
cost effective for many other precursors that are not pyrophoric.

As budgets get tight, these little things can add up.

Best Regards,
Brent
-- 
Brent P. Gila, PhD.
Associate Director, Research Service Centers
University of Florida
1041 Center Drive
Gainesville, Florida 32611
Tel:352-273-2245,? Fax:352-846-2877
email: bgila at ufl.edu



On 4/22/2022 7:48 AM, Bruce Tolleson wrote:
> *[External Email]*
>
> Hi Tony,
>
> ? We use Strem Chemical to clean and refill all of our precursors. 
> They are easy to work with and turn them around in short order.
>
> Strem has a Cylinder Refill form on their web site with the 
> instructions and phone numbers.
>
> ? I hope this helps,
>
> Bruce E. Tolleson
>
> Rochester Institute of Technology
>
> 82? Lomb Memorial Drive, Bldg 17-2627
>
> Rochester, NY 14623-5604
>
> (315) 573-6263
>
> http://www.rit.edu/~962www/logos/tiger_walking_rit_color.jpg
>
> *From:* labnetwork <labnetwork-bounces at mtl.mit.edu> *On Behalf Of 
> *Eric Deguns
> *Sent:* Thursday, April 21, 2022 4:12 PM
> *To:* Tony L Olsen <tony.olsen at utah.edu>
> *Cc:* Lab Network (labnetwork at mtl.mit.edu) <labnetwork at mtl.mit.edu>
> *Subject:* Re: [labnetwork] Refill ALD Cylinders
>
> Hi Tony,
>
> Most of the standard ALD precursors vendors will "clean and refill" 
> cylinders for you - but they will charge you a cleaning fee. ?By this, 
> I mean - Strem, Air Liquide, Gelest, etc. Sometimes this cleaning fee 
> can be quite expensive which makes it more cost effective to purchase 
> new ones.
>
> If you have personnel in the Chemistry department who can refill these 
> cylinders in an appropriate glovebox, refilling on top of the same 
> material is also possible. ?For example, filling TMA into a empty 
> cylinder which previously held TMA. Proper training and equipment is 
> key here.
>
> For some applications, you many not want to do a refill depending on 
> the precursor "stickiness" or it's purity requirements.
>
> Hope that helps.
>
> Best,
>
> Eric
>
> P.S. My work contact is Edeguns at veeco.com
>
> Sent from my iPhone
>
>
>
>     On Apr 21, 2022, at 4:02 PM, Tony L Olsen <tony.olsen at utah.edu> wrote:
>
>     ?
>
>     Does anybody have a source to re-use/refill ALD cylinders?? We
>     have a number of spent cylinders (TMA, 3DMAS, TDMAHf, etc.).? It
>     seems a waste to dispose of them, if they can be re-used. I?ve
>     found a couple companies that supposedly provide this service, but
>     they have not responded to my inquiries.? Hoping there is a good
>     track record with someone out there.
>
>     tonyO
>
>     Tony Olsen
>
>     Nanofab Cleanroom Supervisor/Process Engineer
>
>     University of Utah
>
>     36 S Wasatch Drive, Suite 2500
>
>     Salt Lake City, UT? 84112
>
>     801-587-0651
>
>     www.nanofab.utah.edu
>     <https://urldefense.proofpoint.com/v2/url?u=http-3A__www.nanofab.utah.edu&d=DwMGaQ&c=sJ6xIWYx-zLMB3EPkvcnVg&r=gl_2fLZA_-_JfH_dOmx7ug&m=PxtSg_vKsudG04NMtRL0a1394ecB_uipPM5cTkgOUE-GwS2YKEKlHPFNH5j5nsE8&s=sSECLI_hFYL9z4MswaIMG_2g6iDLUzknoIQh6ZgkEJI&e=>
>
>     _______________________________________________
>     labnetwork mailing list
>     labnetwork at mtl.mit.edu
>     https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>     <https://urldefense.proofpoint.com/v2/url?u=https-3A__mtl.mit.edu_mailman_listinfo.cgi_labnetwork&d=DwMGaQ&c=sJ6xIWYx-zLMB3EPkvcnVg&r=gl_2fLZA_-_JfH_dOmx7ug&m=PxtSg_vKsudG04NMtRL0a1394ecB_uipPM5cTkgOUE-GwS2YKEKlHPFNH5j5nsE8&s=XlxbK8-JHnhxpZPocKuXo5gN2J-q1L5jIL-uavMSt04&e=>
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://urldefense.proofpoint.com/v2/url?u=https-3A__mtl.mit.edu_mailman_listinfo.cgi_labnetwork&d=DwICAg&c=sJ6xIWYx-zLMB3EPkvcnVg&r=gl_2fLZA_-_JfH_dOmx7ug&m=PxtSg_vKsudG04NMtRL0a1394ecB_uipPM5cTkgOUE-GwS2YKEKlHPFNH5j5nsE8&s=XlxbK8-JHnhxpZPocKuXo5gN2J-q1L5jIL-uavMSt04&e=  
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From robert.a.burke96.ctr at army.mil  Fri Apr 22 10:20:44 2022
From: robert.a.burke96.ctr at army.mil (Burke, Robert A CTR USARMY DEVCOM ARL (USA))
Date: Fri, 22 Apr 2022 14:20:44 +0000
Subject: [labnetwork] [URL Verdict: Neutral][Non-DoD Source] Re: Iridium
 sputter target?
In-Reply-To: <7DFCBE75-0B8C-44E6-8A54-1D4532DB95FE@uw.edu>
References: <CAMNfp69LstV-LSeOeqchuAgiWgoQ18Uc-ciW=nLBDUcX-e=-+w@mail.gmail.com>
 <DM5PR03MB3098EFB93BBF3845DAD35DAA86F59@DM5PR03MB3098.namprd03.prod.outlook.com>
 <CACeLyv4nu2+9bYHoc8QfKMY+chU=uUci2dm8XSsCHzAYpRjtvg@mail.gmail.com>
 <6e8bf742b7b24039b3289aa03789bfb9@ge.com>
 <7DFCBE75-0B8C-44E6-8A54-1D4532DB95FE@uw.edu>
Message-ID: <BN1P111MB0722547C0EC63C4EDB1E7BF2E9F79@BN1P111MB0722.NAMP111.PROD.OUTLOOK.COM>

Hi Brian,

 

We might be able to help.  We have an 8? Ir target on one of our sputter systems that we use for Ir and IrO2 sputtering.  The heater is currently down for that system so we would only be able to do room temperature depositions.

 

Best Regards,

 

Rob

 

Robert Burke

Cleanroom Operations Manager

U.S. Army Research Laboratory

2800 Powder Mill Road

Adelphi, Maryland 20783

Bldg. 207 | Z3D-42 | Tel: 301-394-1277

 

General Technical Services, LLC

1451 Route 34 South - Suite 301

Wall Township, NJ 07727

Tel: 732-280-2022 (Main) | Fax: 732-681-9314

 

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of N Shane Patrick
Sent: Thursday, April 21, 2022 5:27 PM
To: Macdonald, Robert (GE Research, US) <robert.macdonald at ge.com>
Cc: labnetwork at mtl.mit.edu
Subject: [URL Verdict: Neutral][Non-DoD Source] Re: [labnetwork] Iridium sputter target?

 

All active links contained in this email were disabled. Please verify the identity of the sender, and confirm the authenticity of all links contained within the message prior to copying and pasting the address to a Web browser.

 

  _____  

 

I don?t know who else on campus might be running a system for that, but we, at least, don?t currently have Iridium capability.

 

N. Shane Patrick
Manager, Lab Operations and Safety
Electron Beam Lithography
Washington Nanofabrication Facility (WNF) 
National Nanotechnology Coordinated Infrastructure (NNCI)
University of Washington - NanoES
Fluke Hall 129, Box 352143
(206) 221-1045
patricns at uw.edu < Caution-mailto:patricns at uw.edu > 
Caution-http://www.wnf.washington.edu/ < Caution-http://www.wnf.washington.edu/ > 





On Apr 21, 2022, at 9:08 AM, Macdonald, Robert (GE Research, US) <robert.macdonald at ge.com < Caution-mailto:robert.macdonald at ge.com > > wrote:

 

UW Seattle used to have an 8? target (yes, 8?!). You can check with them?

 

From: labnetwork <labnetwork-bounces at mtl.mit.edu < Caution-mailto:labnetwork-bounces at mtl.mit.edu > > On Behalf Of Zhichao Wang
Sent: Wednesday, April 20, 2022 1:46 PM
To: julia.aebersold at louisville.edu < Caution-mailto:julia.aebersold at louisville.edu > 
Cc: labnetwork at mtl.mit.edu < Caution-mailto:labnetwork at mtl.mit.edu > 
Subject: EXT: Re: [labnetwork] Iridium sputter target?

 


WARNING: This email originated from outside of GE. Please validate the sender's email address before clicking on links or attachments as they may not be safe.

The same situation there. We were asked for Ir sputtering last month. The cost of a 3 inch target is more than $100,000 from the quote that we got from a supplier. That stops us from proceeding with the project. 

 

Best,

Chao

 

--

 



Zhichao (Chao) Wang, Ph.D.

Nano Process Specialist

UDNF

University of Delaware

Pronouns: He/Him/His

------------------------

Office Number?(302) 831-4839

221 Academy St.?RM170

Newark, DE 19711

 

 

On Wed, Apr 20, 2022 at 1:11 PM Aebersold,Julia W. <julia.aebersold at louisville.edu < Caution-mailto:julia.aebersold at louisville.edu > > wrote:

We were also asked to deposit iridium last year and the cost of the 3? target immediately stopped the project.

 

Cheers!

 

Julia Aebersold, Ph.D.

Manager, Micro/Nano Technology Center

University of Louisville

Shumaker Research Building, Room 233

2210 South Brook Street

Louisville, KY  40292

(502) 852-1572

 

Caution-http://louisville.edu/micronano/ < Caution-http://louisville.edu/micronano/ > 

 

From: labnetwork <labnetwork-bounces at mtl.mit.edu < Caution-mailto:labnetwork-bounces at mtl.mit.edu > > On Behalf Of Brian K. Olmsted
Sent: Tuesday, April 19, 2022 1:03 PM
To: labnetwork at mtl.mit.edu < Caution-mailto:labnetwork at mtl.mit.edu > 
Subject: [labnetwork] Iridium sputter target?

 

CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe.

Hi,

 

I've got a prospective customer interested in sputtering iridium. We don't have an iridium target and it probably doesn't make a lot of sense for us to purchase one for extremely limited interest/use. However, if there is another lab that has this capability I would be happy to steer them to you for at least this step in their process.

 

Any information or help is appreciated.

 

Thanks,




Brian K. Olmsted

Associate Director of Laboratory Operations

University of Minnesota | MNC

Caution-www.mnc.umn.edu < Caution-https://nam11.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.mnc.umn.edu%2F&data=05%7C01%7Cjulia.aebersold%40louisville.EDU%7C4f913867e16e4490ad5208da2255449c%7Cdd246e4a54344e158ae391ad9797b209%7C0%7C0%7C637860046892720519%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C1000%7C%7C%7C&sdata=ICuT4PHPzPsTsBRbIAegatGo%2FFAg%2F0EKhkc5Vt0Uisk%3D&reserved=0 > 

612.626.3287

olms0025 at umn.edu < Caution-mailto:olms0025 at umn.edu > 

 

_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu < Caution-mailto:labnetwork at mtl.mit.edu > 
Caution-https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork < Caution-https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > 

_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu < Caution-mailto:labnetwork at mtl.mit.edu > 
Caution-https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork < Caution-https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > 

 

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From michael.martin at louisville.edu  Mon Apr 25 14:22:19 2022
From: michael.martin at louisville.edu (Martin,Michael David)
Date: Mon, 25 Apr 2022 18:22:19 +0000
Subject: [labnetwork] Th:CsI Evaporation
Message-ID: <BN9PR03MB6170BFA4BABC22A369C61C44F2F89@BN9PR03MB6170.namprd03.prod.outlook.com>

Hi everyone,
    We have a customer with a need to perform evaporation of Th:CsI in an effort to fill some microstructures.  Would anyone have a dirty thermal evaporator to provide this service?

 Regards,
   Michael


Senior Process Engineer

Micro/Nano Technology Center

University of Louisville

(502) 552-1945

Web page: https://louisville.edu/micronano<https://louisville.edu/micronanohttps://www.instagram.com/micronanolouisville/>

Instagram: https://www.instagram.com/micronanolouisville/

Facebook https://www.facebook.com/MNTCUOFL/

YouTube: https://www.youtube.com/channel/UCGiczmq6wVIBJlM7UEGVW9Q

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From na2661 at columbia.edu  Mon Apr 25 12:28:21 2022
From: na2661 at columbia.edu (Nava Ariel-Sternberg)
Date: Mon, 25 Apr 2022 12:28:21 -0400
Subject: [labnetwork] Open position - Nanofabrication engineer
In-Reply-To: <003601d842ca$37584b70$a608e250$@columbia.edu>
References: <003601d842ca$37584b70$a608e250$@columbia.edu>
Message-ID: <017c01d858c1$7b01fd50$7105f7f0$@columbia.edu>

Happy Monday everyone, 

This position is still open. We are looking for a nanofabrication engineer
to join our great team at Columbia University in the city of New York.
Information can be found below. Please apply through the Columbia website
using the link below. 

 

https://academic.careers.columbia.edu/#!/88399

apply.interfolio.com/100101

 

 

Description 

The Columbia Nano Initiative (CNI) at The Fu Foundation School of
Engineering & Applied Science of Columbia University in the City of New York
invites applications for a Senior Staff Associate II Cleanroom engineer in
the area of cleanroom operations. Assisting and taking directions from the
Cleanroom Director and reporting to the Director of the Shared Labs, the
cleanroom engineer will maintain efficient and effective cleanroom
operations. The cleanroom engineer will be responsible for the development
and testing of cleanroom processes and device fabrication. The cleanroom
engineer should be a master of nanofabrication processes and related
software. They should be able to advise students on their research and
assist with process development and recipe testing. The engineer will
develop training procedures and write standard operating procedures for
processes and instruments in the cleanroom. They will teach lab users how to
operate instruments and how to analyze the data obtained. The cleanroom
engineer will create facility protocols of equipment and lab systems'
maintenance. The cleanroom engineer will assist in installing new equipment
in the lab and will perform preventative maintenance and machine repair on
installed pieces of equipment in the cleanroom. This maintenance work
includes cleaning chambers and replacing machines parts as needed. The
cleanroom engineer will be responsible to order spare parts and consumables
needed for cleanroom operation, as well as materials.

The cleanroom engineer should be able to work independently, troubleshoot,
and resolve engineering problems involving both instrument repair and
process related challenges. The engineer should be able to study unfamiliar
techniques and applications quickly and independently. The cleanroom
engineer should be able to communicate clearly with lab users, other team
members, other departments of the university, and with vendors.

The cleanroom engineer will be responsible for maintaining safe and
effective working environment within CNI cleanroom, in compliance with all
University and government requirements and regulations as directed by the
university Environmental, Health, and Safety (EH&S) department. That
includes but not limited to safe handling of chemicals and gas cylinders, as
well as implementing and maintaining safety training and protocols in the
cleanroom. In addition the cleanroom engineer will participate in the
hazardous gas monitoring response team. The cleanroom engineer should be
able to lead cleanroom orientation and lab users' meetings. Knowledge of
word, excel, and powerpoint is required.

Qualifications 

Minimum Qualifications for Senior Staff Associate II:
A bachelor's degree in Electrical Engineering, Mechanical Engineering,
Physics, Chemistry, Materials Science or related field is required. A
minimum of 5 years of working experience in a semiconductor fabrication
facility as an engineer or other related experience is required, 6-10 years
of working experience is preferred.  

Additional desired qualifications include: strong technical experience in
conventional nanofabrication processes used for electronic, physical, and
mechanical device fabrication; understanding of new and modern
laboratory-scale processes required for successful state of the art
fabrication including thin film deposition, electron beam lithography,
photolithography, back end processing, and reactive ion etching; Excellent
interpersonal skills and strong communications skills are needed--the staff
member will serve as a primary interface to cleanroom users; The cleanroom
engineer should have the ability to work with a wide variety of lab users.
Familiarity with equipment and methodology for characterization and
development of semiconductor fabrication processes, including microscopy and
metrology, is a plus.  

Other highly desired attributes include: excellent analytical reasoning and
problem solving skills; good organizational skills; ability to work with
frequent interruptions; ability to work with minimal supervision; knowledge
of safety and working procedures with hazardous gases and chemicals; and
ability to exercise mature judgment and initiative adopting to a flexible
and fast changing environment.  

Application Instructions 

Applicants must apply through the Columbia University website.

 

 

Dr. Nava Ariel-Sternberg

Senior Director of CNI Labs

Columbia University

CEPSR/MC 8903 

530 west 120th st. NY

NY 10027

Office: 212-8549927

Cell: 201-5627600

 

 

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From codreanu at udel.edu  Thu Apr 28 13:46:33 2022
From: codreanu at udel.edu (Iulian Codreanu)
Date: Thu, 28 Apr 2022 13:46:33 -0400
Subject: [labnetwork] Litho engineer position in Delaware
Message-ID: <b3190173-5bea-0ff3-d833-9795bf776774@udel.edu>

Good Afternoon,

I hope this note finds everyone well and in good spirits.

The NanoFab at University of Delaware is looking for a Lithography 
Engineer. The main responsibilities are to provide user training and 
support on the EBPG5200 e-beam writer, MLA100 laser writer, NXQ8006 
aligner, Merlin SEM, and miscellaneous lithography equipment. All the 
tools are six years old or newer.

We are located in an area with a relatively low cost of living (e.g. no 
sales tax and low property taxes) and close to major cities in the 
Northeast as well as the beach and the mountains. In addition to 
competitive salaries, UD offers a generous benefit package; some 
highlights are listed below:
-11% University contribution to the retirement plan
-Tuition-free undergraduate education for employees and family members
-Time off: 22 days of vacation, 7 holidays, and December holiday break
-Health insurance plans with modest premiums and excellent coverage.
http://www.udel.edu/faculty-staff/human-resources/benefits/

The link to the position (Job 498428) is below:
https://careers.udel.edu/cw/en-us/job/498428/lithography-engineer-ud-nanofabrication-facility

Could you please forward to anyone who may be interested? I would be 
happy to answer questions about the position.

Thank you very much,

Iulian

-- 
iulian Codreanu, Ph.D.
Director, Nanofabrication Facility
University of Delaware
Harker ISE Lab, Room 163
221 Academy Street
Newark, DE 19716
302-831-2784
http://udnf.udel.edu
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From vamsinittala at gmail.com  Thu Apr 28 15:12:49 2022
From: vamsinittala at gmail.com (N P Vamsi Krishna)
Date: Thu, 28 Apr 2022 14:12:49 -0500
Subject: [labnetwork] Silicon Carbide wafers CMP
In-Reply-To: <CA+SWD1XQODOgT4ny7iLVeNePOEQt74XJg7bzatyqCdQiopV=Eg@mail.gmail.com>
References: <CA+SWD1XQODOgT4ny7iLVeNePOEQt74XJg7bzatyqCdQiopV=Eg@mail.gmail.com>
Message-ID: <CA+SWD1UJyMpn5=NTfbybU0-DTvvPn+kuHdTsxfVQo0_WANw_Lg@mail.gmail.com>

Hello Labnetwork community,

Hope this email finds you well.

We are looking for CMP on our SiC wafers (15 cm X 15 cm pieces). Can
anybody recommend any university facility or any company that can do this
job for us? ? Thanks in advance for your help.

Thanks & best regards,
Vamsi

-- 

___________________________________________________

Pavani Vamsi Krishna Nittala, PhD

*Staff Scientist*

Pritzker School of Molecular Engineering, *The University of Chicago *

*Resident **Associate*

Center for Nanoscale Materials, *Argonne National Laboratory *

Phone: 1 (331) 757-8565


-- 

___________________________________________________

N.P.  Vamsi Krishna, PhD

*Staff Scientist*

Pritzker School of Molecular Engineering, *The University of Chicago *

*Resident **Associate*

Center for Nanoscale Materials, *Argonne National Laboratory *

Phone: 1 (331) 757-8565
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From sb86922 at usc.edu  Thu Apr 28 16:58:47 2022
From: sb86922 at usc.edu (Shivakumar Bhaskaran)
Date: Thu, 28 Apr 2022 20:58:47 +0000
Subject: [labnetwork] Alcatel ACT600M
In-Reply-To: <BYAPR07MB42626E926BEC37600841BC6DE3FD9@BYAPR07MB4262.namprd07.prod.outlook.com>
References: <BYAPR07MB42626E926BEC37600841BC6DE3FD9@BYAPR07MB4262.namprd07.prod.outlook.com>
Message-ID: <BYAPR07MB426222AB739B3A6C5FED1283E3FD9@BYAPR07MB4262.namprd07.prod.outlook.com>


Hi All,

One of our Oxford DRIE, Turbo controller circuit board burnt out. The only option I have is replace the whole turbo pump which is expensive. I looked in other places, refurbished and used places that sell pumps/semiconductor equipment, but they don't have in stock. Does anyone have Alcatel ACT600M that is not been used then I can buy it from you

If you have one, please let me know.

Thanks
Shiva


Shivakumar Bhaskaran, Ph.D.,
Associate Director,
John D. O'Brien Nanofabrication Laboratory
Michelson Hall, 1002 Childs Way, MCB LL121,
Los Angeles, California 90089, 213 821 2374
[Sign]

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From rkenroyjean at gmail.com  Fri Apr 29 01:24:33 2022
From: rkenroyjean at gmail.com (Rand Jean)
Date: Thu, 28 Apr 2022 22:24:33 -0700
Subject: [labnetwork] Hewlett Packard Labs - Cleanroom Process Engineer
Message-ID: <CANWd7gxKiRNScGnmG=kjbgKjVPtAxvki=1KJWghXJ5gPb5gb-Q@mail.gmail.com>

Hi all,


Hewlett Packard Labs seeks a talented, enthusiastic individual to work as a
laboratory/process engineer to supervise the planning, operation and
maintenance of a research clean room and associated analytical and test
instruments.  This person will report to the Operations Manager for Hewlett
Packard Labs, and work directly with researchers to understand their
equipment and clean room needs.  This person will:

   -

   Have experience with some or all of the following: cleanroom processes,
   wet/dry material etching, thin film deposition, resist spin coating,
   photolithography and ebeam lithography, nano-imprinting, thermal annealing,
   the operation and maintenance of cleanroom process systems, acid and
   solvent wet benches, ICPRIE, ICPCVD, ALD, sputter deposition, ebeam
   deposition, mask aligner, and RTA
   -

   Have worked with or have equivalent experience with characterization
   tools, optical microscope, Dektak, Nano spec, ellipsometer, and surface
   profiler,  SEM, FIB, AFM, EDS
   -

   Be familiar with cleanroom resource management: materials, chemicals and
   safety protection
   -

   Recommend new instrumentation for acquisition and installation; maintain
   existing equipment through service contracts or using internal resources
   -

   Work with corporate facilities personnel to insure that infrastructure
   is operating properly
   -

   Interface with HPE health and safety and with corporate security
   personnel to maintain a safe working environment; participate in the
   Hewlett Packard Labs safety groups; have a leadership role in cleanroom
   tools and safety training.
   -

   Work with the fire department and other local government entities to
   obtain permits for equipment and operations as needed.
   -

   Provide after hours emergency response coverage, shared with others on
   the team.

Examples of activities to be supported:

   -

   Nanofabrication equipment preventive maintenance, training support, and
   tool process baseline test and maintaining.
   -

   Major technical areas include Physical Vapor Deposition (PVD) tools
   (thermal evaporator, e-beam evaporator, and sputtering), packaging and
   back-end equipment (wire bonder, flip-chip bonder, wafer cleaver, chip
   dicing saw...), wet process and various metrology tools.
   -

   Work with staff to maintain Scanning Electron Microscope systems, as
   well as other measurement instruments for nanofabrication.
   -

   Assist staff and train users to operate a diverse range of scientific
   apparatus, and configure them for new experiments, develop processes and
   recipes, and author SOPs and related documents.
   -

   Act as champion of prescribed safety rules and regulations to maintain
   high quality standards and a safe environment in the cleanroom.
   -

   Accurate record keeping of instrument maintenance and repair logs is
   expected.

Hewlett Packard Labs may become a shared-use facility. Collaboration with
Labs personnel and users of other companies to achieve objectives and
enhance service quality is required.

Basic Qualifications

   -

   A Bachelor?s degree of Materials Science, Physics, Chemistry, Chemical
   Engineering, Electrical Engineering, Mechanical Engineering or a related
   field with 5 years or more working experience are required.
   -

   Experience in proper handling and disposal of potentially hazardous
   materials (e.g. clean room gases and solvents) and working knowledge of
   electrical/electronic systems are also required. Hands-on experience
   required, working in class 1 to 1000 Clean Room 60-80% of the time, should
   be comfortable with equipment and their limitations:
   -

   For thin film etching and deposition: RIE, PECVD, ALD.
   -

   For thin film metal deposition: E-beam Evaporator and Sputter
   -

   Metrology tools: SEM, AFM, Ellipsometer, Dektak, ?

Additional Qualifications Desired

   -

   A Masters Degree in a relevant discipline would be advantageous, with
   some experience in research.
   -

   Knowledge of equipment vendors and ability to define systems for
   purchase and modify them as needed.
   -

   Working knowledge and hands-on skills with various microscopes and
   similar scientific imaging/analysis equipment and with complex
   electro-mechanical vacuum systems are preferred.
   -

   Laboratory experience and customer service experience are desirable.
   -

   The candidate should be self-motivated with a strong desire to learn on
   the job as needs arise, to succeed, and to further develop intellectual and
   practical professional skills.
   -

   Ability to work well in teams, to follow directives, and to adopt safe
   working practices is essential.


Physical Requirements:

   -

   Must be able to work in cleanroom, chemical, and measurement laboratory
   environments.
   -

   Will work around compressed gases, acids, solvents, vacuum pump oils,
   and other chemicals.
   -

   Manual dexterity will be required to work on large and small assemblies.
   -

   The position requires lifting of up to 50 lb. on an occasional basis.


All candidates must be authorized to work in the United States.

Job: Engineering

Job Level: Expert


Link to the position:

https://hpe.wd5.myworkdayjobs.com/Jobsathpe/job/Milpitas-California-United-States-of-America/Hewlett-Packard-Labs---Cleanroom-Process-Engineer_1123997


Best,


Rand K. Jean, Ph.D., P.E., C.E.M.
Lead Cleanroom and Scientific Labs Process Engineer
Hewlett Packard Labs
O: 650 236 7008
M: 408 204 7147
rand.jean at hpe.com
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From hollingshead.19 at osu.edu  Fri Apr 29 15:23:20 2022
From: hollingshead.19 at osu.edu (Hollingshead, Dave)
Date: Fri, 29 Apr 2022 19:23:20 +0000
Subject: [labnetwork] Direct write + plasma etch residue
Message-ID: <SA1PR01MB6544A08DAE29A30372507D4FF3FC9@SA1PR01MB6544.prod.exchangelabs.com>

Good afternoon everyone,

We have recently run into some very 'interesting' (completely perplexing) issues while trying to etch some III-V samples in our ICP. Essentially we are seeing some sort of residue on the protected regions of the devices after stripping the resist. Whatever it is, the material seems to also be affecting our etch profiles. The odd part is that the residue has a clear directionality to it and in the present case only appears on two edges. This has led us to believe that is must in some way be a result of some non-uniform / "angled" exposure from our MLA150. While I can completely understand differing etched sidewall slopes or skewed features if the resist sidewalls are not uniform on all sides, I am having difficulty understanding how this might cause the residue we are seeing (especially in a positive resist).

Any thoughts or possible explanations would be greatly appreciated.

Attached are some microscope and SEM images of what we are seeing. I have plenty more I'd be happy to share with those that may be interested!

A few relevant processing notes:

  *   All etches were done using a BCl3/Ar chemistry in our Plasmatherm 770 system
  *   ~18-20 minutes of etch time, total depth of ~2.5-3.0?m
  *   We have repeated these issues on InGaAs device samples as well as bulk GaAs test samples
  *   Issue repeated with both SPR220 and S1827 resist masks (both were un-hardbaked, but this is also something we are going to look into)
  *   Exposures seem to be properly dosed, but we are planning an etch test on a dose/defocus array to see if exposure has any effect
  *   All resist removal was done in 80C NMP
  *   We have attempted some follow-on O?2 plasma etches, that seem to remove the material, but it is very slow

Thanks,
-Dave

Dave Hollingshead
Manager of Research Operations - Nanotech West Lab
The Ohio State University
Suite 100, 1381 Kinnear Road, Columbus, OH 43212
614.292.1355 Office
hollingshead.19 at osu.edu<mailto:hollingshead.19 at osu.edu> osu.edu<http://osu.edu/>

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From rmorrison at draper.com  Fri Apr 29 17:21:35 2022
From: rmorrison at draper.com (Morrison, Richard H., Jr)
Date: Fri, 29 Apr 2022 21:21:35 +0000
Subject: [labnetwork] Direct write + plasma etch residue
In-Reply-To: <SA1PR01MB6544A08DAE29A30372507D4FF3FC9@SA1PR01MB6544.prod.exchangelabs.com>
References: <SA1PR01MB6544A08DAE29A30372507D4FF3FC9@SA1PR01MB6544.prod.exchangelabs.com>
Message-ID: <b041a78b870842d090a1b68031523993@draper.com>

Hi,

I have seen this before in an ION Mill tool. If the resist profile is steep think step profile then the metal catches along the resist edge and makes a stringer, most of the time solved by a high temp hard bake to roll the resist over or maybe you have some sputtering going on, what pressure it the etch at?

Rick



From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Hollingshead, Dave
Sent: Friday, April 29, 2022 3:23 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Direct write + plasma etch residue

Good afternoon everyone,

We have recently run into some very ?interesting? (completely perplexing) issues while trying to etch some III-V samples in our ICP. Essentially we are seeing some sort of residue on the protected regions of the devices after stripping the resist. Whatever it is, the material seems to also be affecting our etch profiles. The odd part is that the residue has a clear directionality to it and in the present case only appears on two edges. This has led us to believe that is must in some way be a result of some non-uniform / ?angled? exposure from our MLA150. While I can completely understand differing etched sidewall slopes or skewed features if the resist sidewalls are not uniform on all sides, I am having difficulty understanding how this might cause the residue we are seeing (especially in a positive resist).

Any thoughts or possible explanations would be greatly appreciated.

Attached are some microscope and SEM images of what we are seeing. I have plenty more I?d be happy to share with those that may be interested!

A few relevant processing notes:

  *   All etches were done using a BCl3/Ar chemistry in our Plasmatherm 770 system
  *   ~18-20 minutes of etch time, total depth of ~2.5-3.0?m
  *   We have repeated these issues on InGaAs device samples as well as bulk GaAs test samples
  *   Issue repeated with both SPR220 and S1827 resist masks (both were un-hardbaked, but this is also something we are going to look into)
  *   Exposures seem to be properly dosed, but we are planning an etch test on a dose/defocus array to see if exposure has any effect
  *   All resist removal was done in 80C NMP
  *   We have attempted some follow-on O?2 plasma etches, that seem to remove the material, but it is very slow

Thanks,
-Dave

Dave Hollingshead
Manager of Research Operations ? Nanotech West Lab
The Ohio State University
Suite 100, 1381 Kinnear Road, Columbus, OH 43212
614.292.1355 Office
hollingshead.19 at osu.edu<mailto:hollingshead.19 at osu.edu> osu.edu<http://osu.edu/>

________________________________
Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email.
________________________________
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From telemann0 at yahoo.com  Fri Apr 29 20:16:05 2022
From: telemann0 at yahoo.com (Joonhyeong Park)
Date: Sat, 30 Apr 2022 00:16:05 +0000 (UTC)
Subject: [labnetwork] Direct write + plasma etch residue
In-Reply-To: <SA1PR01MB6544A08DAE29A30372507D4FF3FC9@SA1PR01MB6544.prod.exchangelabs.com>
References: <SA1PR01MB6544A08DAE29A30372507D4FF3FC9@SA1PR01MB6544.prod.exchangelabs.com>
Message-ID: <1937977434.1689956.1651277765137@mail.yahoo.com>

Hello Mr. Hollingshead,

When you did optical lithography with contact mask aligner, SPR220 and S1827, did you get the similar result such as only one side residue?
Have you checked the cross-section in SEM after develop before etching? If there is a directional problem in MLA150, you may observed the difference in side angle in SEM. You may also check sidewall corner residue under darkfield microscope, too.
I think that you had better break down and narrow down the cause and result step by step.?

Regards,

Joon Park
Research Engineer
Birck Nanotechnology Center
Purdue University


On Friday, April 29, 2022, 03:40:02 PM EDT, Hollingshead, Dave <hollingshead.19 at osu.edu> wrote: 





??


Good afternoon everyone,

?

We have recently run into some very ?interesting? (completely perplexing) issues while trying to etch some III-V samples in our ICP. Essentially we are seeing some sort of residue on the protected regions of the devices after stripping the resist. Whatever it is, the material seems to also be affecting our etch profiles. The odd part is that the residue has a clear directionality to it and in the present case only appears on two edges. This has led us to believe that is must in some way be a result of some non-uniform / ?angled? exposure from our MLA150. While I can completely understand differing etched sidewall slopes or skewed features if the resist sidewalls are not uniform on all sides, I am having difficulty understanding how this might cause the residue we are seeing (especially in a positive resist). 

?

Any thoughts or possible explanations would be greatly appreciated.

?

Attached are some microscope and SEM images of what we are seeing. I have plenty more I?d be happy to share with those that may be interested!

?

A few relevant processing notes:

???? 
????* All etches were done using a BCl3/Ar chemistry in our Plasmatherm 770 system
????* ~18-20 minutes of etch time, total depth of ~2.5-3.0?m
????* We have repeated these issues on InGaAs device samples as well as bulk GaAs test samples
????* Issue repeated with both SPR220 and S1827 resist masks (both were un-hardbaked, but this is also something we are going to look into)
????* Exposures seem to be properly dosed, but we are planning an etch test on a dose/defocus array to see if exposure has any effect
????* All resist removal was done in 80C NMP
????* We have attempted some follow-on O?2 plasma etches, that seem to remove the material, but it is very slow

?

Thanks,

-Dave

?

Dave Hollingshead?Manager of Research Operations ? Nanotech West LabThe Ohio State University

Suite 100, 1381 Kinnear Road, Columbus, OH 43212
614.292.1355 Office
hollingshead.19 at osu.edu?osu.edu

?



_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork


From f.karouta at gmail.com  Sat Apr 30 03:00:07 2022
From: f.karouta at gmail.com (Fouad Karouta)
Date: Sat, 30 Apr 2022 09:00:07 +0200
Subject: [labnetwork] Direct write + plasma etch residue
In-Reply-To: <SA1PR01MB6544A08DAE29A30372507D4FF3FC9@SA1PR01MB6544.prod.exchangelabs.com>
References: <SA1PR01MB6544A08DAE29A30372507D4FF3FC9@SA1PR01MB6544.prod.exchangelabs.com>
Message-ID: <CANYCV9uMUqE56y8bbZUGZezsVQ5z3PC02eos89Ck=_S0EYydQg@mail.gmail.com>

Hi Dave,

A couple of remarks:
1- A Cl2-based chemistry react with resist materials and form a kind of a
compound that is very hard to remove in classic ways, even an O2-ashing may
not be helpful. I usually avoid using resist mask to etch III-V materials
and instead I use a hard mask like SiNx or SiOx (PECVD deposited) as a
mask, pattern it with a resist mask in a F-based chemistry), strip the
resist before going to the Cl2-based ICP RIE etch. After the etch the
remaining hard mask can be removed in BHF or a diluted HF
2- what is the wafer temperature during etch? In does require T>150C to get
the etching product InCl3 volatile. Not doing so will result in
micro-masking (check a paper I published in 2014).

Happy to discuss further details (offline) if you wish.

Fouad Karouta

On Fri, 29 Apr 2022 at 9:39 pm, Hollingshead, Dave <hollingshead.19 at osu.edu>
wrote:

> Good afternoon everyone,
>
>
>
> We have recently run into some very ?interesting? (completely perplexing)
> issues while trying to etch some III-V samples in our ICP. Essentially we
> are seeing some sort of residue on the protected regions of the devices
> after stripping the resist. Whatever it is, the material seems to also be
> affecting our etch profiles. The odd part is that the residue has a clear
> directionality to it and in the present case only appears on two edges.
> This has led us to believe that is must in some way be a result of some
> non-uniform / ?angled? exposure from our MLA150. While I can completely
> understand differing etched sidewall slopes or skewed features if the
> resist sidewalls are not uniform on all sides, I am having difficulty
> understanding how this might cause the residue we are seeing (especially in
> a positive resist).
>
>
>
> Any thoughts or possible explanations would be greatly appreciated.
>
>
>
> Attached are some microscope and SEM images of what we are seeing. I have
> plenty more I?d be happy to share with those that may be interested!
>
>
>
> A few relevant processing notes:
>
>    - All etches were done using a BCl3/Ar chemistry in our Plasmatherm
>    770 system
>    - ~18-20 minutes of etch time, total depth of ~2.5-3.0?m
>    - We have repeated these issues on InGaAs device samples as well as
>    bulk GaAs test samples
>    - Issue repeated with both SPR220 and S1827 resist masks (both were
>    un-hardbaked, but this is also something we are going to look into)
>    - Exposures seem to be properly dosed, but we are planning an etch
>    test on a dose/defocus array to see if exposure has any effect
>    - All resist removal was done in 80C NMP
>    - We have attempted some follow-on O?2 plasma etches, that seem to
>    remove the material, but it is very slow
>
>
>
> Thanks,
>
> -Dave
>
>
>
> *Dave Hollingshead *
> Manager of Research Operations ? Nanotech West Lab
> *The Ohio State University*
>
> Suite 100, 1381 Kinnear Road, Columbus, OH 43212
> <https://www.google.com/maps/search/1381+Kinnear+Road,+Columbus,+OH+43212?entry=gmail&source=g>
> 614.292.1355 Office
> hollingshead.19 at osu.edu osu.edu
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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