From codreanu at udel.edu Thu Sep 1 09:02:18 2022 From: codreanu at udel.edu (Iulian Codreanu) Date: Thu, 1 Sep 2022 09:02:18 -0400 Subject: [labnetwork] wirebonder for shared academic facility In-Reply-To: References: Message-ID: Hi Edmond, We have a HB05 from TPT. Like all manual wire bonders, it has a very steep learning curve. Even with rigorous training, some users run into trouble with the machine. Cheers, Iulian iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 8/31/2022 4:08 PM, Edmond Chow wrote: > We are looking to purchase a new wire bonder?for our multi-user > facility. We currently have one old K&S?4524AD?ball bonder. However, > it has been difficult to maintain as the tool is prone to be messed up > by inexperienced users, whom we have encountered often in our lab. > > We are seeking advice for a more user-friendly wire bonder, which can > better tolerate some operator error without messing up the machine too > badly. > > Thank you in?advance. > > -- > Edmond Chow > > *Nick Holonyak, Jr. Micro and Nanotechnology Lab (HMNTL)* > > *University of Illinois** > *Rm 2300, MC-249 > > 208 North Wright St. Urbana, IL 61801 > > Email: echow at illinois.edu > > Web: http://mntl.illinois.edu/ > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Thu Sep 1 10:32:20 2022 From: julia.aebersold at louisville.edu (Aebersold, Julia) Date: Thu, 1 Sep 2022 14:32:20 +0000 Subject: [labnetwork] wirebonder for shared academic facility In-Reply-To: References: Message-ID: I know you're looking for a new one, but Dan Haver of Sunshine Semiconductor does a great job in getting wirebonders back to optimal performance. dan.haver at sunsemi.com https://sunsemi.com/ Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ From: labnetwork On Behalf Of Edmond Chow Sent: Wednesday, August 31, 2022 4:08 PM To: Fab Network Subject: [labnetwork] wirebonder for shared academic facility Some people who received this message don't often get email from kchow10 at gmail.com. Learn why this is important CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. We are looking to purchase a new wire bonder for our multi-user facility. We currently have one old K&S 4524AD ball bonder. However, it has been difficult to maintain as the tool is prone to be messed up by inexperienced users, whom we have encountered often in our lab. We are seeking advice for a more user-friendly wire bonder, which can better tolerate some operator error without messing up the machine too badly. Thank you in advance. -- Edmond Chow Nick Holonyak, Jr. Micro and Nanotechnology Lab (HMNTL) University of Illinois Rm 2300, MC-249 208 North Wright St. Urbana, IL 61801 Email: echow at illinois.edu Web: http://mntl.illinois.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From plenvik at ucsb.edu Thu Sep 1 10:32:48 2022 From: plenvik at ucsb.edu (Peder Lenvik) Date: Thu, 1 Sep 2022 07:32:48 -0700 Subject: [labnetwork] wirebonder for shared academic facility In-Reply-To: References: Message-ID: My previous employer has Palomar and it seemed pretty solid. *Peder* *From:* labnetwork *On Behalf Of *Edmond Chow *Sent:* Wednesday, August 31, 2022 1:08 PM *To:* Fab Network *Subject:* [labnetwork] wirebonder for shared academic facility We are looking to purchase a new wire bonder for our multi-user facility. We currently have one old K&S 4524AD ball bonder. However, it has been difficult to maintain as the tool is prone to be messed up by inexperienced users, whom we have encountered often in our lab. We are seeking advice for a more user-friendly wire bonder, which can better tolerate some operator error without messing up the machine too badly. Thank you in advance. -- Edmond Chow *Nick Holonyak, Jr. Micro and Nanotechnology Lab (HMNTL)* *University of Illinois* Rm 2300, MC-249 208 North Wright St. Urbana, IL 61801 Email: echow at illinois.edu Web: http://mntl.illinois.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From tonyes at umich.edu Thu Sep 1 11:42:14 2022 From: tonyes at umich.edu (Tony Sebastian) Date: Thu, 1 Sep 2022 11:42:14 -0400 Subject: [labnetwork] Open Position- Senior Equipment Engineer @ University of Michigan LNF Message-ID: Hello everyone, There is an open position at the University of Michigan Lurie Nanofabrication Facility (LNF). The position is for a senior level equipment engineer that will assist in supporting both LNF plasma etch and lithography technologies. Please follow the link below for more information and how to apply: https://careers.umich.edu/job_detail/222927/senior-engineer-research-lnf-operations Thanks, -- Tony Sebastian Sr Director- LNF Operations Lurie Nanofabrication Facility University of Michigan 1301 Beal Ave Room 1247 Ann Arbor, MI 48109 -------------- next part -------------- An HTML attachment was scrubbed... URL: From michael.martin at louisville.edu Thu Sep 1 12:39:34 2022 From: michael.martin at louisville.edu (Martin, Michael) Date: Thu, 1 Sep 2022 16:39:34 +0000 Subject: [labnetwork] wirebonder for shared academic facility In-Reply-To: References: Message-ID: Hi Edmond, Our take on students wire bonding is that they should just leave it to the staff unless they are going to be regularly performing it for years. It is tedious and takes a degree of patience. Regards, Michael ________________________________ From: labnetwork on behalf of Edmond Chow Sent: Wednesday, August 31, 2022 4:08 PM To: Fab Network Subject: [labnetwork] wirebonder for shared academic facility Some people who received this message don't often get email from kchow10 at gmail.com. Learn why this is important CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. We are looking to purchase a new wire bonder for our multi-user facility. We currently have one old K&S 4524AD ball bonder. However, it has been difficult to maintain as the tool is prone to be messed up by inexperienced users, whom we have encountered often in our lab. We are seeking advice for a more user-friendly wire bonder, which can better tolerate some operator error without messing up the machine too badly. Thank you in advance. -- Edmond Chow Nick Holonyak, Jr. Micro and Nanotechnology Lab (HMNTL) University of Illinois Rm 2300, MC-249 208 North Wright St. Urbana, IL 61801 Email: echow at illinois.edu Web: http://mntl.illinois.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From jaransom at uark.edu Thu Sep 1 12:42:03 2022 From: jaransom at uark.edu (John Ransom) Date: Thu, 1 Sep 2022 16:42:03 +0000 Subject: [labnetwork] Stainless Steel Tubing Message-ID: I have gotten recommendations that I should use 3/8" SS tubing EP 316L, but the availability of that is out into May or June of 2023. ?" is better. But can I use ?" with a process that runs <1slm? The fittings to most of the tools is ?" VCR or swagelok. But I have a 90ft run in one case. Any guidance is appreciated. John Ransom Program Manager - MUSiC Facility Multi-User SiC Fabrication Facility University of Arkansas -------------- next part -------------- An HTML attachment was scrubbed... URL: From kchow10 at gmail.com Thu Sep 1 13:01:02 2022 From: kchow10 at gmail.com (Edmond Chow) Date: Thu, 1 Sep 2022 12:01:02 -0500 Subject: [labnetwork] wirebonder for shared academic facility In-Reply-To: References: Message-ID: Hi, Thank you everyone for your advice, I really appreciate it. *Edmond K.C. Chow* ------------------------------------------------------------------------- *Nick Holonyak, Jr. Micro and Nanotechnology Lab (HMNTL)* *University of Illinois* Rm 2300, MC-249 208 North Wright St. Urbana, IL 61801 Fax:217-244-6375 Email: echow at illinois.edu Web: http://mntl.illinois.edu/ On Thu, Sep 1, 2022 at 11:39 AM Martin, Michael < michael.martin at louisville.edu> wrote: > Hi Edmond, > Our take on students wire bonding is that they should just leave it to > the staff unless they are going to be regularly performing it for years. > It is tedious and takes a degree of patience. > > Regards, > Michael > ------------------------------ > *From:* labnetwork on behalf of Edmond > Chow > *Sent:* Wednesday, August 31, 2022 4:08 PM > *To:* Fab Network > *Subject:* [labnetwork] wirebonder for shared academic facility > > Some people who received this message don't often get email from > kchow10 at gmail.com. Learn why this is important > > > *CAUTION:* This email originated from outside of our organization. Do not > click links, open attachments, or respond unless you recognize the sender's > email address and know the contents are safe. > We are looking to purchase a new wire bonder for our multi-user facility. > We currently have one old K&S 4524AD ball bonder. However, it has been > difficult to maintain as the tool is prone to be messed up by inexperienced > users, whom we have encountered often in our lab. > > We are seeking advice for a more user-friendly wire bonder, which can > better tolerate some operator error without messing up the machine too > badly. > > Thank you in advance. > > -- > Edmond Chow > > *Nick Holonyak, Jr. Micro and Nanotechnology Lab (HMNTL)* > > *University of Illinois* > Rm 2300, MC-249 > > 208 North Wright St. Urbana, IL 61801 > > Email: echow at illinois.edu > > Web: http://mntl.illinois.edu/ > > -- Edmond Chow -------------- next part -------------- An HTML attachment was scrubbed... URL: From codreanu at udel.edu Thu Sep 1 17:35:30 2022 From: codreanu at udel.edu (Iulian Codreanu) Date: Thu, 1 Sep 2022 17:35:30 -0400 Subject: [labnetwork] Stainless Steel Tubing In-Reply-To: References: Message-ID: Yes, you can do 1 slpm with 1/4" tubing. iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 9/1/2022 12:42 PM, John Ransom wrote: > > I have gotten recommendations that I should use 3/8? SS tubing EP > 316L, but the availability of that is out into May or June of 2023.? > ?? is better. > > But can I use ?? with a process that runs <1slm?? The fittings to most > of the tools is ?? VCR or swagelok.? But I have a 90ft run in one > case.? Any guidance is appreciated. > > John Ransom > > Program Manager ? MUSiC Facility > > *M*ulti-*U*ser *SiC* Fabrication Facility > > University of Arkansas > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From dwolff at nelhydrogen.com Thu Sep 1 17:37:26 2022 From: dwolff at nelhydrogen.com (David Wolff) Date: Thu, 1 Sep 2022 21:37:26 +0000 Subject: [labnetwork] Stainless Steel Tubing In-Reply-To: References: Message-ID: For what gas ? The denser the gas, the more the pressure drop in smaller tubing. For hydrogen, the ?" is fine. Dave Wolff Region Sales Manager [cid:image001.png at 01D8BE29.7F3ADBD0] Nel Hydrogen 10 Technology Drive, Wallingford, CT 06492 USA Office: M +1 860-604-3282 Fax: +1 203-949-8016 dwolff at nelhydrogen.com www.nelhydrogen.com From: labnetwork On Behalf Of John Ransom Sent: Thursday, September 1, 2022 12:42 To: labnetwork at mtl.mit.edu Subject: [labnetwork] Stainless Steel Tubing CAUTION: Our automatic validation of the sender of this mail failed. Pay extra attention to attachments as well as links!! I have gotten recommendations that I should use 3/8" SS tubing EP 316L, but the availability of that is out into May or June of 2023. ?" is better. But can I use ?" with a process that runs <1slm? The fittings to most of the tools is ?" VCR or swagelok. But I have a 90ft run in one case. Any guidance is appreciated. John Ransom Program Manager - MUSiC Facility Multi-User SiC Fabrication Facility University of Arkansas -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 4499 bytes Desc: image001.png URL: From yb2471 at columbia.edu Thu Sep 1 17:41:05 2022 From: yb2471 at columbia.edu (Youry Borisenkov) Date: Thu, 1 Sep 2022 17:41:05 -0400 Subject: [labnetwork] wirebonder for shared academic facility In-Reply-To: References: Message-ID: Hey! Here at Columbia we recently (3?4 months ago) got our new TPT H80 wire bonder. It looks great so far. Can get both wedge or ball tools, can have both Au and Al wires installed simultaneously so this gives flexibility. It has many cool features that work. I used to work with K&S bonders in the past, and it was a pain. Please feel free to reach out if you have any questions. Best, Youry On Thu, Sep 1, 2022 at 12:31 PM Peder Lenvik wrote: > My previous employer has Palomar and it seemed pretty solid. > > > > > > > > > > *Peder* > > > > *From:* labnetwork *On Behalf Of *Edmond > Chow > *Sent:* Wednesday, August 31, 2022 1:08 PM > *To:* Fab Network > *Subject:* [labnetwork] wirebonder for shared academic facility > > > > We are looking to purchase a new wire bonder for our multi-user facility. > We currently have one old K&S 4524AD ball bonder. However, it has been > difficult to maintain as the tool is prone to be messed up by inexperienced > users, whom we have encountered often in our lab. > > > > We are seeking advice for a more user-friendly wire bonder, which can > better tolerate some operator error without messing up the machine too > badly. > > > > Thank you in advance. > > > > -- > > Edmond Chow > > *Nick Holonyak, Jr. Micro and Nanotechnology Lab (HMNTL)* > > *University of Illinois* > Rm 2300, MC-249 > > 208 North Wright St. Urbana, IL 61801 > > > Email: echow at illinois.edu > > Web: http://mntl.illinois.edu/ > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > > https://urldefense.proofpoint.com/v2/url?u=https-3A__mtl.mit.edu_mailman_listinfo.cgi_labnetwork&d=DwICAg&c=009klHSCxuh5AI1vNQzSO0KGjl4nbi2Q0M1QLJX9BeE&r=-s6JocV5E0wqGBIx8T7r2r5AeZ7Q3e53LV38GalxD2Y&m=wfiJp9w7x6mchHs2Q7U8UygMySGUCm47rvwGUNh-EZ3S5p3LZNHYdDpAIarJn6Eg&s=ZyGNvthVCBdWYSXbBLZEc15S3f9Urg8lvlgCKNniJSw&e= > > -------------- next part -------------- An HTML attachment was scrubbed... URL: From schweig at umich.edu Fri Sep 2 05:44:33 2022 From: schweig at umich.edu (Dennis Schweiger) Date: Fri, 2 Sep 2022 05:44:33 -0400 Subject: [labnetwork] Stainless Steel Tubing In-Reply-To: References: Message-ID: John, Good morning. My rough guess is that 1/4" will be fine for your application, but without knowing the gas (density), and the delivery pressures, it's hard to give a definitive answer. The larger tubing size would give you a future margin for error if your process needs were ever to change, and using an HVCR fitting still gets you a connection that will work with the 1/4" VCR components. One of the things you could consider is to deliver to the tools at a higher pressure, then step the pressure down at the tool with a mini regulator of some sort. It's hard to provide a better answer without knowing more about your delivery system. As always, if you want to discuss further, please feel free to give me a call. Good luck, Dennis Schweiger University of Michigan/LNF Facilities Supervisor 734.647.2055 Ofc On Thu, Sep 1, 2022 at 5:25 PM John Ransom wrote: > I have gotten recommendations that I should use 3/8? SS tubing EP 316L, > but the availability of that is out into May or June of 2023. ?? is > better. > > > > But can I use ?? with a process that runs <1slm? The fittings to most of > the tools is ?? VCR or swagelok. But I have a 90ft run in one case. Any > guidance is appreciated. > > > > John Ransom > > Program Manager ? MUSiC Facility > > *M*ulti-*U*ser *SiC* Fabrication Facility > > University of Arkansas > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From price.798 at osu.edu Fri Sep 2 09:08:07 2022 From: price.798 at osu.edu (Price, Aimee) Date: Fri, 2 Sep 2022 13:08:07 +0000 Subject: [labnetwork] ALD of LNO material Message-ID: Does anyone have an ALD in which you currently do or could deposit Lithium Niobium Oxide materials? I have a customer who wants to do this deposition but we do not allow the proposed precursors in our Picosun SunAle ALD for various reasons, including safety concerns and cross contamination. The precursors suggested were Lithium tert-butoxide, niobium ethoxide, and water. I think they would be amenable to other precursors if applicable. They referenced two papers: Nano Energy 78 (2020) 105107 ACS Appl. Mater. Interfaces 2018, 10, 1654?1661 If you have this capability and are willing to work with customers outside your institution, please contact me. Thanks in advance. Best, Aimee Bross Price Manager, Nanofabrication The Ohio State University Nanotech West Lab Institute for Materials Research 1381 Kinnear Road Suite 100 Columbus, OH 43212 614-292-2753 -------------- next part -------------- An HTML attachment was scrubbed... URL: From johnboyle at fast.net Fri Sep 2 10:44:12 2022 From: johnboyle at fast.net (John Boyle) Date: Fri, 2 Sep 2022 10:44:12 -0400 Subject: [labnetwork] Stainless Steel Tubing In-Reply-To: References: Message-ID: <09e201d8beda$7cbd7a50$76386ef0$@net> I ran a quick calculation at your flow for a gas as heavy as propane in a ?? ODT and it would be in the 2-5 PSI range. H2 pressure drop is under 1 PSID. Often piping contractors like to use 3/8? as it is more rigid and pipe-like, easier to keep straight and does not need tubing supports as close together. This is especially true in longer tube runs where ?? can show a visible ?droop? . John Boyle John Boyle Consulting, LLC 4848 Canterbury Drive Emmaus, PA 18049 484-432-7596 Cell 610-965-3208 Office From: labnetwork [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Dennis Schweiger Sent: Friday, September 02, 2022 5:45 AM To: John Ransom Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Stainless Steel Tubing John, Good morning. My rough guess is that 1/4" will be fine for your application, but without knowing the gas (density), and the delivery pressures, it's hard to give a definitive answer. The larger tubing size would give you a future margin for error if your process needs were ever to change, and using an HVCR fitting still gets you a connection that will work with the 1/4" VCR components. One of the things you could consider is to deliver to the tools at a higher pressure, then step the pressure down at the tool with a mini regulator of some sort. It's hard to provide a better answer without knowing more about your delivery system. As always, if you want to discuss further, please feel free to give me a call. Good luck, Dennis Schweiger University of Michigan/LNF Facilities Supervisor 734.647.2055 Ofc On Thu, Sep 1, 2022 at 5:25 PM John Ransom wrote: I have gotten recommendations that I should use 3/8? SS tubing EP 316L, but the availability of that is out into May or June of 2023. ?? is better. But can I use ?? with a process that runs <1slm? The fittings to most of the tools is ?? VCR or swagelok. But I have a 90ft run in one case. Any guidance is appreciated. John Ransom Program Manager ? MUSiC Facility Multi-User SiC Fabrication Facility University of Arkansas _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From shimonel at savion.huji.ac.il Sun Sep 4 01:54:59 2022 From: shimonel at savion.huji.ac.il (Shimon Eliav) Date: Sun, 4 Sep 2022 05:54:59 +0000 Subject: [labnetwork] wirebonder for shared academic facility In-Reply-To: References: Message-ID: Hi Edmond, For many years, here at Hebrew University we have two KS wire bonders (models 4526 and 4524). From our experience, they can only be operated by the staff. As others already said, it is difficult for students to learn this tool. Recently we received a new bonder: a Westbond model 7476D. It is simpler to operate and "student resistent". Our idea is to retire our KS wedge bonder and replace it for the Westbond. Regards, Shimon Dr. Shimon Eliav The Hebrew University of Jerusalem The Unit for Nano Fabrication Campus Givat Ram - Jerusalem - Israel ________________________________ From: labnetwork on behalf of Edmond Chow Sent: Thursday, September 1, 2022 2:38 AM To: Fab Network Subject: [labnetwork] wirebonder for shared academic facility We are looking to purchase a new wire bonder for our multi-user facility. We currently have one old K&S 4524AD ball bonder. However, it has been difficult to maintain as the tool is prone to be messed up by inexperienced users, whom we have encountered often in our lab. We are seeking advice for a more user-friendly wire bonder, which can better tolerate some operator error without messing up the machine too badly. Thank you in advance. -- Edmond Chow Nick Holonyak, Jr. Micro and Nanotechnology Lab (HMNTL) University of Illinois Rm 2300, MC-249 208 North Wright St. Urbana, IL 61801 Email: echow at illinois.edu Web: http://mntl.illinois.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From price.798 at osu.edu Tue Sep 6 16:14:35 2022 From: price.798 at osu.edu (Price, Aimee) Date: Tue, 6 Sep 2022 20:14:35 +0000 Subject: [labnetwork] MAEBL 2022 - September 14-15, last week to register Message-ID: The Meeting for Advanced Electron Beam Lithography 2022 is coming up on September 14-15, 2022 hybrid online and in person at Caltech. Registration is closed for in person attendees but is STILL OPEN for online attendees. We use Gather Town hybrid format so everyone is included in talks, conversations, and breakout sessions. There are two days of content, day 1 is Foundations Workshop which is basics of ebeam lithography, focused on new tool users and owners, but everyone is encouraged to attend. Day 2 is MAEBL Core and is the meeting that started it all. There is a full day lineup of presentations, time for sharing experiences, common challenges, and networking. There are already over 80 registered attendees from 53 institutions across academia, govt, and industry spanning 7 countries. Registration closes Monday 9/12. Feel free to reach out to me with any questions. [cid:image001.png at 01D8C20B.ADF0D520] Best, Aimee Bross Price President and Co-Founder MAEBL Inc. Manager, Nanofabrication The Ohio State University Nanotech West Lab Institute for Materials Research 1381 Kinnear Road Suite 100 Columbus, OH 43212 614-292-2753 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 43757 bytes Desc: image001.png URL: From Howard.Northfield at uottawa.ca Wed Sep 7 10:05:15 2022 From: Howard.Northfield at uottawa.ca (Howard Northfield) Date: Wed, 7 Sep 2022 14:05:15 +0000 Subject: [labnetwork] Need a power supply for a Sigma-Pioneer from Zeiss Message-ID: Need a power supply for a Sigma-Pioneer from Zeiss. Photo (of the rear of the unit) attached. Thank you all Howard Northfield Research Associate Advanced Research Complex (ARC) University of Ottawa -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Zeiss Sigma-Pioneer power supply.jpg Type: image/jpeg Size: 369239 bytes Desc: Zeiss Sigma-Pioneer power supply.jpg URL: From scholvin at mit.edu Wed Sep 7 11:30:18 2022 From: scholvin at mit.edu (Jorg Scholvin) Date: Wed, 7 Sep 2022 15:30:18 +0000 Subject: [labnetwork] Job opening, Domain Expert Imaging/Metrology/Characterization, MIT.nano Message-ID: We have a job opening for a "Domain Expert Imaging/Metrology/Characterization" at MIT.nano, details and links below: DOMAIN EXPERT IMAGING/METROLOGY/CHARACTERIZATION, MIT.nano, to provide characterization equipment oversight and support. Responsibilities include sample handling and preparation for metrology, imaging, and analysis; operation of characterization and preparation equipment; providing training for facility users; overseeing the scheduler to assure accurate records of equipment utilization; supporting regular maintenance of the auxiliary instrumentation; routine laboratory tasks such as lab supplies handling and inventory; communicating to users about schedules/equipment status/expected downtimes during maintenance and repair; and fostering a cooperative environment with fellow staff members, faculty, and the user community. Job Requirements REQUIRED: bachelor's degree in material science, mechanical or chemical engineering, physics, chemistry, or related discipline; four years' experience with material characterization processes; excellent interpersonal and written and oral communication skills; good judgment; and ability to work independently or within a team in a goal-oriented, highly research-oriented yet disciplined environment that involves frequent interaction with faculty, students, and research staff. PREFERRED: M.Sc. degree; expertise in optical, electron, and probe microscopy imaging techniques; solid understanding of and ability to explain the effects of changing tool parameters on instrument performance; hands-on experience with operation of advanced characterization equipment (spectroscopic ellipsometry, absorption and transmission spectroscopy, optical profilometry, photoluminescence, scanning electron microscopy, atomic force microscopy, X-ray imaging, and sample preparation techniques); experience with in one-on-one and group training and ability to convey technical content to a community with diverse backgrounds; working knowledge of established and emerging research processes and desire to gain new knowledge/skills; attention to detail; comfort with literature searches and troubleshooting technical issues; experience using computational software (e.g., Python, MATLAB, MathCad). Job #21531 Link to posting: https://careers.peopleclick.com/careerscp/client_mit/external/jobDetails/jobDetail.html?jobPostId=24794&localeCode=en-us https://hr.mit.edu/careers -------------- next part -------------- An HTML attachment was scrubbed... URL: From zhichaow at udel.edu Wed Sep 7 17:01:56 2022 From: zhichaow at udel.edu (Zhichao Wang) Date: Wed, 7 Sep 2022 17:01:56 -0400 Subject: [labnetwork] In2Se3 sputtering Message-ID: Dear Lab network community, We have a customer who is interested in sputtering In2Se3 films. In2Se3 does not seem to adversely affect vacuum. But it's listed as category 3 health hazard ("Acute Inhalation Toxicity - Dusts and Mists"). Does anyone have experience with In2Se3 to share? Any suggestions/Inputs are highly appreciated. -- *Zhichao (Chao) Wang, Ph.D.* *Nano Process Specialist* *UDNF* *University of Delaware* *Pronouns: He/Him/His* *------------------------* *Office Number?(302) 831-4839* *221 Academy St.?RM170* *Newark, DE 19711* -------------- next part -------------- An HTML attachment was scrubbed... URL: From grallion at ncsu.edu Thu Sep 8 12:42:12 2022 From: grallion at ncsu.edu (Greg Allion) Date: Thu, 8 Sep 2022 12:42:12 -0400 Subject: [labnetwork] Suss MA-6 retrofit Message-ID: Hi all, Our Suss MA/BA-6 aligner has the joystick option for stage motion control. I know micrometers are much more common on these systems. Suss is unable to support our joysticks any more in regards to the joysticks themselves and the control cards. I would like to know if anyone has ever converted their system from joysticks to micrometers. Thank you, Greg -- Greg Allion NC State University Nanofabrication Facility (NNF) Lithography Engineer -------------- next part -------------- An HTML attachment was scrubbed... URL: From saba.sadeghi at uwaterloo.ca Thu Sep 8 14:28:38 2022 From: saba.sadeghi at uwaterloo.ca (Saba Sadeghi) Date: Thu, 8 Sep 2022 18:28:38 +0000 Subject: [labnetwork] Thin film sputtering issue Message-ID: Dear colleagues, I was hoping to get your input on a sputtering issue; the pictures attached are from a magnetron-sputtered metal film (200nm), growth rate of 3 A/s at elevated growth temperature. Can you identify these features and what could have caused them? Thank you very much for your feedback, Best, Saba -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Screen Shot 2022-09-08 at 2.14.35 PM.png Type: image/png Size: 589765 bytes Desc: Screen Shot 2022-09-08 at 2.14.35 PM.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Screen Shot 2022-09-08 at 2.15.03 PM.png Type: image/png Size: 471744 bytes Desc: Screen Shot 2022-09-08 at 2.15.03 PM.png URL: From rmorrison at draper.com Fri Sep 9 06:50:35 2022 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Fri, 9 Sep 2022 10:50:35 +0000 Subject: [labnetwork] Thin film sputtering issue In-Reply-To: References: Message-ID: <651a960a16ba4499a2554efe05c2a572@draper.com> Looks like either dried solvent trail or dried water trail, left behind when the liquid dried. Rick Richard Morrison PMTS Draper Laboratory 555 Technology Square Cambridge Ma 02139 Office: 617-258-3420 Cell: 508-930-3461 From: labnetwork On Behalf Of Saba Sadeghi Sent: Thursday, September 8, 2022 2:29 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Thin film sputtering issue Dear colleagues, I was hoping to get your input on a sputtering issue; the pictures attached are from a magnetron-sputtered metal film (200nm), growth rate of 3 A/s at elevated growth temperature. Can you identify these features and what could have caused them? Thank you very much for your feedback, Best, Saba ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From cg70 at rice.edu Fri Sep 9 10:27:59 2022 From: cg70 at rice.edu (Carlos Gramajo) Date: Fri, 9 Sep 2022 09:27:59 -0500 Subject: [labnetwork] Thin film sputtering issue In-Reply-To: <651a960a16ba4499a2554efe05c2a572@draper.com> References: <651a960a16ba4499a2554efe05c2a572@draper.com> Message-ID: To me it looks like dendritic growth from nucleation sites. I think the samples were not properly cleaned and concur with Rick that some trace was left behind during sample preparation. Cheers, Carlos On Fri, Sep 9, 2022 at 6:58 AM Morrison, Richard H., Jr < rmorrison at draper.com> wrote: > Looks like either dried solvent trail or dried water trail, left behind > when the liquid dried. > > > > Rick > > > > Richard Morrison > > PMTS > > Draper Laboratory > > 555 Technology Square > > Cambridge Ma 02139 > > Office: 617-258-3420 > > Cell: 508-930-3461 > > > > > > > > *From:* labnetwork * On Behalf Of *Saba > Sadeghi > *Sent:* Thursday, September 8, 2022 2:29 PM > *To:* labnetwork at mtl.mit.edu > *Subject:* [labnetwork] Thin film sputtering issue > > > > Dear colleagues, > > > > I was hoping to get your input on a sputtering issue; the pictures > attached are from a magnetron-sputtered metal film (200nm), growth rate of > 3 A/s at elevated growth temperature. Can you identify these features and > what could have caused them? > > > > Thank you very much for your feedback, > > > > Best, > > Saba > ------------------------------ > Notice: This email and any attachments may contain proprietary (Draper > non-public) and/or export-controlled information of Draper. If you are not > the intended recipient of this email, please immediately notify the sender > by replying to this email and immediately destroy all copies of this email. > ------------------------------ > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!ixT6llFBuXD5_mj9MiCd7aj65scWY8qC_erPjPuC85XsClmUHr8ckPmz7fsCmfq5o9L5qCfO8rYRYOZQp_5XeaIu$ > > -- Carlos Gramajo Cleanroom Research Scientist Shared Equipment Authority (SEA), Rice University Cell: 713-743-8115; Office: 713-348-8243; cg70 at rice.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From Aju.Jugessur at Colorado.EDU Fri Sep 9 10:53:22 2022 From: Aju.Jugessur at Colorado.EDU (Aju Jugessur) Date: Fri, 9 Sep 2022 14:53:22 +0000 Subject: [labnetwork] Cleanroom staff position open Message-ID: Hello all, I am writing to share a cleanroom manager position that is available immediately within our shared-user facility. This is an exciting time to be part of a team that is growing and provide support in our cleanroom operations and new characterization facilities. We will be moving in our new cleanroom in the fall and new instrumentation will be commissioned. In addition, this position will also support our new EBL system (EBPG5150plus) that we won through an NSF award. https://jobs.colorado.edu/jobs/JobDetail/?jobId=42756 Please share widely with anyone who may be a good fit. Thanks so much, Regards Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Facility Member of Inclusive Culture Council (ICC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEC | Boulder, CO 80303| P: 303.735.5019 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur www.colorado.edu/facility/cosinc (MBA candidate, CU, Class of 2023) [signature_804197951] Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6302 bytes Desc: image001.png URL: From ingburo.hk at gmail.com Sun Sep 11 09:57:43 2022 From: ingburo.hk at gmail.com (IngBuro HK) Date: Sun, 11 Sep 2022 15:57:43 +0200 Subject: [labnetwork] Suss MA-6 retrofit In-Reply-To: <23e9e634-52ea-5907-07bc-46eeccd148eb@idonus.com> References: , <23e9e634-52ea-5907-07bc-46eeccd148eb@idonus.com> Message-ID: An HTML attachment was scrubbed... URL: From aamer.mahmood at mail.wvu.edu Wed Sep 14 12:05:24 2022 From: aamer.mahmood at mail.wvu.edu (Aamer Mahmood) Date: Wed, 14 Sep 2022 16:05:24 +0000 Subject: [labnetwork] Manuals for Integrated Dynamics Engineering (IDE) equipment? In-Reply-To: References: Message-ID: Hi Colleagues, I inherited an Integrated Dynamics Engineering (IDE) system for testing out environmental characteristics of rooms for high-performance electron microscopes. This includes: a USB Data Acquisition TANGO unit, a Biaxis MicroVelocity vibration sensor (BAS-4000), as well as all the cables. See attached picture. Does anyone have the manuals for these instruments. Or some documentation that shows how to hook them up. Thanks. -- Aamer Mahmood Director Shared Research Facilities West Virginia University Morgantown, WV (304) 293 9418 (work) https://sharedresearchfacilities.wvu.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: -7456987158538000487.jpg Type: image/jpeg Size: 773554 bytes Desc: -7456987158538000487.jpg URL: From mweiler at andrew.cmu.edu Wed Sep 14 14:04:43 2022 From: mweiler at andrew.cmu.edu (Mark Weiler) Date: Wed, 14 Sep 2022 14:04:43 -0400 Subject: [labnetwork] Manual with schematics needed for Nanometrics Nanospec 210XP Message-ID: <2E8649A0-31B2-402B-8645-A1DE5AF6187F@andrew.cmu.edu> Howdy Nanopeeps? Do any of you know where we can get our hands or eyes on the schematics for a Nanospec 210XP? Best Regards, Mark ________________________________________________________________ Mark Weiler Manager, Equipment & Facilities Bertucci Nanotechnology Laboratory Eden Hall Nanofabrication Cleanroom Carnegie Mellon University P: 412-268-2471 F: 412-268-3497 http://www.nanofab.ece.cmu.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: images.png Type: image/png Size: 720 bytes Desc: not available URL: From lesjo at dtu.dk Wed Sep 14 16:27:49 2022 From: lesjo at dtu.dk (Leif Steen Johansen) Date: Wed, 14 Sep 2022 20:27:49 +0000 Subject: [labnetwork] Manuals for Integrated Dynamics Engineering (IDE) equipment? In-Reply-To: References: Message-ID: Hello Aamer, You could try calling IDE's headquarters in Germany. They are quite helpful and recently provided us with a manual for our old MK4 field cancelling system. Phone, main switchboard: +49 6142 9400 0. Good luck, Leif [http://www.dtu.dk/-/media/DTU_Generelt/Andet/mail-signature-logo.png] Leif Steen Johansen Head of Operations, Ph.D. Dir. +45 45 25 57 13 Mob. +45 25 34 89 92 lesjo at dtu.dk ?rsteds Plads, Byg. 347 Building 347 2800 Lyngby www.dtu.dk/english From: labnetwork On Behalf Of Aamer Mahmood Sent: 14. september 2022 18:05 To: labnetwork at mtl.mit.edu Subject: [labnetwork] Manuals for Integrated Dynamics Engineering (IDE) equipment? Hi Colleagues, I inherited an Integrated Dynamics Engineering (IDE) system for testing out environmental characteristics of rooms for high-performance electron microscopes. This includes: a USB Data Acquisition TANGO unit, a Biaxis MicroVelocity vibration sensor (BAS-4000), as well as all the cables. See attached picture. Does anyone have the manuals for these instruments. Or some documentation that shows how to hook them up. Thanks. -- Aamer Mahmood Director Shared Research Facilities West Virginia University Morgantown, WV (304) 293 9418 (work) https://sharedresearchfacilities.wvu.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From Aju.Jugessur at Colorado.EDU Thu Sep 15 11:06:47 2022 From: Aju.Jugessur at Colorado.EDU (Aju Jugessur) Date: Thu, 15 Sep 2022 15:06:47 +0000 Subject: [labnetwork] Cleanroom staff position open In-Reply-To: References: Message-ID: Hi all, I am sharing this open position again. Please help me to share this opening widely. Thanks so much, Aju From: Aju Jugessur Date: Friday, September 9, 2022 at 8:53 AM To: Fab Network Cc: Aju Jugessur Subject: Cleanroom staff position open Hello all, I am writing to share a cleanroom manager position that is available immediately within our shared-user facility. This is an exciting time to be part of a team that is growing and provide support in our cleanroom operations and new characterization facilities. We will be moving in our new cleanroom in the fall and new instrumentation will be commissioned. In addition, this position will also support our new EBL system (EBPG5150plus) that we won through an NSF award. https://jobs.colorado.edu/jobs/JobDetail/?jobId=42756 Please share widely with anyone who may be a good fit. Thanks so much, Regards Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Facility Member of Inclusive Culture Council (ICC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEC | Boulder, CO 80303| P: 303.735.5019 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur www.colorado.edu/facility/cosinc (MBA candidate, CU, Class of 2023) [signature_804197951] Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6302 bytes Desc: image001.png URL: From codreanu at udel.edu Tue Sep 20 16:39:54 2022 From: codreanu at udel.edu (Iulian Codreanu) Date: Tue, 20 Sep 2022 16:39:54 -0400 Subject: [labnetwork] Drytek PS602-H rebuild Message-ID: Hello, We have a Drytek PS602-H that will need to be rebuilt in the future. Has anyone had this type of pump rebuilt? By whom? Thank you very much, Iulian -- iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu From thomas.ferraguto at baesystems.com Wed Sep 21 09:21:29 2022 From: thomas.ferraguto at baesystems.com (Ferraguto, Thomas S (US)) Date: Wed, 21 Sep 2022 13:21:29 +0000 Subject: [labnetwork] E-Beam Engineer Position Message-ID: We have an opening for an E-Beam Engineer here in Nashua NH (just over the Massachusetts border) at the Micro Electronics Center. We just signed off on a 100kev JEOL and have a 50kev Raith. It's a great opportunity for someone who wants to push the technology and apply it to small production lots. I'd be happy to speak anyone interested. https://jobs.baesystems.com/global/en/job/84899BR/Ebeam-Process-Engineer "In this role, you will guide the installation of state-of-the-art ebeam lithography process tools including Raith and JEOL ebeam writing tool and develop next-generation processes for advanced III-V MMICs. In your daily activities, you will work to sustain production processes and tools in the ebeam lithography area of a III-V semiconductor wafer foundry. You will be responsible for making continuous process improvements using DOE methodologies, implementing SPC controls for yield improvement, and driving cycle time and cost reduction projects to completion. Responsibilities also include qualifying new tools for production including documentation and training/certification of operators and working with advanced engineering group on new technology development. Multi-tasking is expected in our fast-paced environment with delivery commitments to both internal and external customers. A strong background in ebeam lithography processes as related to III-V materials is preferred." Tom (formally from UMass Lowell) Thomas Ferraguto FMI Manager Electronic Systems BAE Systems, Inc. T: +x 603 885 4172 | M: +x 603 402 6432 0000 | E:Thomas.ferraguto at baesystems.com 65 Spit Brook Road, Nashua, NH, 03060 | Pronouns: He/Him baesystems.com Connect with BAE Systems: [cid:image007.png at 01D54BA5.AE3D07E0] [cid:image002.png at 01D54BA5.AE3D07E0] [cid:image008.png at 01D54BA5.AE3D07E0] [cid:image009.png at 01D54BA5.AE3D07E0] [cid:image010.png at 01D54BA5.AE3D07E0] [cid:image006.png at 01D54BA5.AE3D07E0] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 1290 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 905 bytes Desc: image002.png URL: -------------- next part -------------- A non-text attachment was scrubbed... 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Name: image006.png Type: image/png Size: 1588 bytes Desc: image006.png URL: From plenvik at ucsb.edu Wed Sep 21 10:51:29 2022 From: plenvik at ucsb.edu (Peder Lenvik) Date: Wed, 21 Sep 2022 07:51:29 -0700 Subject: [labnetwork] Drytek PS602-H rebuild In-Reply-To: References: Message-ID: <1a5e9727174ff5e4396781922269dd96@mail.gmail.com> https://www.ptbsales.com/ Peder -----Original Message----- From: labnetwork On Behalf Of Iulian Codreanu Sent: Tuesday, September 20, 2022 1:40 PM To: Fab Network Subject: [labnetwork] Drytek PS602-H rebuild Hello, We have a Drytek PS602-H that will need to be rebuilt in the future. Has anyone had this type of pump rebuilt? By whom? Thank you very much, Iulian -- iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork From kckeenan at seas.upenn.edu Thu Sep 22 10:05:09 2022 From: kckeenan at seas.upenn.edu (Kyle Keenan) Date: Thu, 22 Sep 2022 10:05:09 -0400 Subject: [labnetwork] CTI cryogenics compressors and pumps repairs Message-ID: Hello All, Can anybody recommend a company that might be willing to come to Philadelphia that would pick up and repair CTI cryogenics compressors and pumps? The company we usually use for this purpose has been less than stellar, lately, and another company I have found will pick up, but does not perform cryo pump related work. Thanks for your help. -- Kyle Keenan Laboratory Manager Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 -------------- next part -------------- An HTML attachment was scrubbed... URL: From lvchang at Central.UH.EDU Thu Sep 22 11:55:38 2022 From: lvchang at Central.UH.EDU (Chang, Long) Date: Thu, 22 Sep 2022 15:55:38 +0000 Subject: [labnetwork] CTI cryogenics compressors and pumps repairs In-Reply-To: References: Message-ID: <854E7C87-5C59-4661-9288-D833B1E852BB@central.uh.edu> I reach out to both Trillium or PTBSales and request an exchange. They charge a little more and send you a refurbished unit. It comes with packaging that you can use to ship them your unit. Once they receive the unit, they can charge you more if it is in very bad condition. Long > On Sep 22, 2022, at 9:05 AM, Kyle Keenan wrote: > > Hello All, > > Can anybody recommend a company that might be willing to come to Philadelphia that would pick up and repair CTI cryogenics compressors and pumps? The company we usually use for this purpose has been less than stellar, lately, and another company I have found will pick up, but does not perform cryo pump related work. > > Thanks for your help. > > -- > Kyle Keenan > > Laboratory Manager > Quattrone Nanofabrication Facility > University of Pennsylvania > P: 215-898-7560 > F: 215-573-4925 > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!LkSTlj0I!DMTqaj54jHa4_htUOS4Z_D1IxxDT4ImwYOdZXHEPIZQLcULvbx-chUOiJiee7c1SdPofLfAYbHLor_dVWX3wRNi4VwQ$ From glenne at ualberta.ca Thu Sep 22 12:05:21 2022 From: glenne at ualberta.ca (Glenn Elaschuk) Date: Thu, 22 Sep 2022 10:05:21 -0600 Subject: [labnetwork] CTI cryogenics compressors and pumps repairs In-Reply-To: References: Message-ID: Hi, We mail our cyro pumps to Syn-Sys-Co for repair. They have done a very good job. https://synsysco.com/ Regards, On Thu, Sep 22, 2022 at 9:41 AM Kyle Keenan wrote: > Hello All, > > Can anybody recommend a company that might be willing to come to > Philadelphia that would pick up and repair CTI cryogenics compressors and > pumps? The company we usually use for this purpose has been less than > stellar, lately, and another company I have found will pick up, but does > not perform cryo pump related work. > > Thanks for your help. > > -- > Kyle Keenan > > Laboratory Manager > Quattrone Nanofabrication Facility > University of Pennsylvania > P: 215-898-7560 > F: 215-573-4925 > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Glenn Elaschuk, EET Systems/Infrastructure Specialist. University of Alberta - nanoFAB W1-060 ECERF Building 9107-116 Street Edmonton, AB. Canada T6G 2V4 Ph. 587-879-1518 www.nanofab.ualberta.ca -------------- next part -------------- An HTML attachment was scrubbed... URL: From escarra at tulane.edu Thu Sep 22 12:30:13 2022 From: escarra at tulane.edu (Escarra, Matt D) Date: Thu, 22 Sep 2022 16:30:13 +0000 Subject: [labnetwork] Cleanroom staff position open at Tulane University Message-ID: Hi all, We are building a new micro/nanofab cleanroom at Tulane and are looking to expand our technical staff. The below linked position is a dual role split 50/50 between cleanroom technical support and teaching lab technical support for the Physics & Engineering Physics department. Feel free to share and let me know if you are interested in the position. https://jobs.tulane.edu/position/IRC24688 More info on our current cleanroom: https://sse.tulane.edu/cif/micronano-fabrication-facility Thanks! Matt ? Matthew Escarra Associate Professor, Physics and Engineering Physics Tulane University, New Orleans, LA (504) 862-8673 escarra.tulane.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From wjkiethe at ncsu.edu Thu Sep 22 14:33:57 2022 From: wjkiethe at ncsu.edu (William Kiether) Date: Thu, 22 Sep 2022 14:33:57 -0400 Subject: [labnetwork] CTI cryogenics compressors and pumps repairs In-Reply-To: References: Message-ID: We have had very good results with Texas Capital Semiconductor with respect to Cryo refurbishment and repair. tcsemi.com - Not sure if they will travel, as they sent us crates and we shipped it to them. Bill Kiether NCSU Nanotfabrication Facility On Thu, Sep 22, 2022 at 11:41 AM Kyle Keenan wrote: > Hello All, > > Can anybody recommend a company that might be willing to come to > Philadelphia that would pick up and repair CTI cryogenics compressors and > pumps? The company we usually use for this purpose has been less than > stellar, lately, and another company I have found will pick up, but does > not perform cryo pump related work. > > Thanks for your help. > > -- > Kyle Keenan > > Laboratory Manager > Quattrone Nanofabrication Facility > University of Pennsylvania > P: 215-898-7560 > F: 215-573-4925 > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From beach at umich.edu Thu Sep 22 16:02:02 2022 From: beach at umich.edu (Katharine Beach) Date: Thu, 22 Sep 2022 16:02:02 -0400 Subject: [labnetwork] PRS-2000 replacment Message-ID: We've been using PRS-2000 for our positive resist strip for years. Due to some supply chain issues, we are considering updating our supplied chemicals. I was wondering what photo resists stripers others are using and would recommend. Thanks, Katharine Beach Lurie Nanofabrication Facility -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Fri Sep 23 07:08:13 2022 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Fri, 23 Sep 2022 11:08:13 +0000 Subject: [labnetwork] PRS-2000 replacment In-Reply-To: References: Message-ID: <6dd5641267f24a4c8d1ac0dc613015af@draper.com> HI, At Draper we use SVC-14 excellent results with AZ 46xx and 44xx and Shipley 1822 type resist, sometimes after long DRIE we use EKC-240. Rick Richard Morrison PMTS Draper Laboratory 555 Technology Square Cambridge Ma 02139 Office: 617-258-3420 Cell: 508-930-3461 From: labnetwork On Behalf Of Katharine Beach Sent: Thursday, September 22, 2022 4:02 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] PRS-2000 replacment We've been using PRS-2000 for our positive resist strip for years. Due to some supply chain issues, we are considering updating our supplied chemicals. I was wondering what photo resists stripers others are using and would recommend. Thanks, Katharine Beach Lurie Nanofabrication Facility ________________________________ Notice: This email and any attachments may contain proprietary (Draper non-public) and/or export-controlled information of Draper. If you are not the intended recipient of this email, please immediately notify the sender by replying to this email and immediately destroy all copies of this email. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: From sguo18 at yorku.ca Fri Sep 23 07:12:04 2022 From: sguo18 at yorku.ca (Xin (Shane) Guo) Date: Fri, 23 Sep 2022 11:12:04 +0000 Subject: [labnetwork] TEOS and DES supplier Message-ID: Hello Our facility is looking for a TEOS and DES chemical supplier for our PECVD. Currently I am in talk with Versum, but they are super slow in quotation nowadays. Are there other suppliers in Canada or States that can supply them? We also need the supplier to provide vapor draw ampules for such chemicals. The TEOS ampule needs a diptube. Thank you for any suggestions in advance! Shane Guo YMF -------------- next part -------------- An HTML attachment was scrubbed... URL: From jaransom at uark.edu Fri Sep 23 09:29:18 2022 From: jaransom at uark.edu (John Ransom) Date: Fri, 23 Sep 2022 13:29:18 +0000 Subject: [labnetwork] PRS-2000 replacment In-Reply-To: References: Message-ID: A fab that I worked in a few years ago used Gensolve. I don?t know exactly what version, but searching ?Gensolve resist stripper? brings up a website from vwr and I am sure you could call them to get the right chemical for you. There was an earlier reply that mentioned EKC after a long plasma etch ? I second that recommendation. If you have Si containing polymers, you will need an EKC type of chemical to break down the polymer. It is classic in older semiconductor fabs to strip resist after an oxide via or contact etch to use EKC. It removes ?via crowns?. Good Luck John Ransom Program Manager ? MUSiC Facility Multi-User SiC Fabrication Facility University of Arkansas From: labnetwork On Behalf Of Katharine Beach Sent: Thursday, September 22, 2022 3:02 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] PRS-2000 replacment We've been using PRS-2000 for our positive resist strip for years. Due to some supply chain issues, we are considering updating our supplied chemicals. I was wondering what photo resists stripers others are using and would recommend. Thanks, Katharine Beach Lurie Nanofabrication Facility -------------- next part -------------- An HTML attachment was scrubbed... URL: From glenne at ualberta.ca Fri Sep 23 11:59:58 2022 From: glenne at ualberta.ca (Glenn Elaschuk) Date: Fri, 23 Sep 2022 09:59:58 -0600 Subject: [labnetwork] TEOS and DES supplier In-Reply-To: References: Message-ID: Hello, We order our TEOS and DES from the following companies. Versum Materials - TEOS https://www.gelest.com/ - DES Cheers, On Fri, Sep 23, 2022 at 5:45 AM Xin (Shane) Guo wrote: > Hello > > > > Our facility is looking for a TEOS and DES chemical supplier for our > PECVD. Currently I am in talk with Versum, but they are super slow in > quotation nowadays. Are there other suppliers in Canada or States that can > supply them? We also need the supplier to provide vapor draw ampules for > such chemicals. The TEOS ampule needs a diptube. > > > > Thank you for any suggestions in advance! > > > > Shane Guo > > YMF > > > > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Glenn Elaschuk, EET Systems/Infrastructure Specialist. University of Alberta - nanoFAB W1-060 ECERF Building 9107-116 Street Edmonton, AB. Canada T6G 2V4 Ph. 587-879-1518 www.nanofab.ualberta.ca -------------- next part -------------- An HTML attachment was scrubbed... URL: From bdemory2 at gmail.com Fri Sep 23 15:06:01 2022 From: bdemory2 at gmail.com (Brandon Demory) Date: Fri, 23 Sep 2022 12:06:01 -0700 Subject: [labnetwork] PRS-2000 replacment In-Reply-To: References: Message-ID: We started using MLO-07. I am seeing similar results to prs 2000 using a similar heated bath process. -Brandon On Fri, Sep 23, 2022, 11:52 AM John Ransom wrote: > A fab that I worked in a few years ago used Gensolve. I don?t know > exactly what version, but searching ?Gensolve resist stripper? brings up a > website from vwr and I am sure you could call them to get the right > chemical for you. There was an earlier reply that mentioned EKC after a > long plasma etch ? I second that recommendation. If you have Si containing > polymers, you will need an EKC type of chemical to break down the polymer. > It is classic in older semiconductor fabs to strip resist after an oxide > via or contact etch to use EKC. It removes ?via crowns?. > > Good Luck > > > > John Ransom > > Program Manager ? MUSiC Facility > > *M*ulti-*U*ser *SiC* Fabrication Facility > > University of Arkansas > > > > > > > > *From:* labnetwork * On Behalf Of *Katharine > Beach > *Sent:* Thursday, September 22, 2022 3:02 PM > *To:* labnetwork at mtl.mit.edu > *Subject:* [labnetwork] PRS-2000 replacment > > > > We've been using PRS-2000 for our positive resist strip for years. Due to > some supply chain issues, we are considering updating our supplied > chemicals. I was wondering what photo resists stripers others are using and > would recommend. > > > > Thanks, > > Katharine Beach > > Lurie Nanofabrication Facility > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From beaudoin at physics.ubc.ca Fri Sep 23 16:40:57 2022 From: beaudoin at physics.ubc.ca (Beaudoin, Mario) Date: Fri, 23 Sep 2022 13:40:57 -0700 Subject: [labnetwork] PRS-2000 replacment In-Reply-To: References: Message-ID: <403ef617-87f6-7290-cf47-1309292d3284@physics.ubc.ca> Remover 1165 from Kayaku. On 2022-09-22 1:02 p.m., Katharine Beach wrote: > [*CAUTION:* Non-UBC Email] > > We've been using PRS-2000 for our positive resist strip for years. Due > to some supply chain issues, we are considering updating our supplied > chemicals. I was wondering what photo resists stripers others are > using and would recommend. > > Thanks, > Katharine Beach > Lurie Nanofabrication Facility > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig 2.jpg Type: image/jpeg Size: 21446 bytes Desc: not available URL: From yakimom at sunypoly.edu Fri Sep 23 20:49:39 2022 From: yakimom at sunypoly.edu (Michael Yakimov) Date: Sat, 24 Sep 2022 00:49:39 +0000 Subject: [labnetwork] PRS-2000 replacment In-Reply-To: References: Message-ID: Depends on your materials. 1165 and AZ Kwik Strip are two things I used PRS-2000 principal components are NMP and Sulpholane. 1165 recommended above is a (relatively) pure NMP, and it will work - a bit worse, though. Sulpholane is expensive, and probably the cause of the shortage I vaguely remember a few more NMP based cleaners - including pure NMP sold as a chemical. NMP has a habit of absorbing water and causing galvanic corrosion, especially for III-V contact lift-off if left exposed to air for a while. Not sure if adding sulpholane mitigates it. Generally not a problem for Silicon process. AZ Kwik Strip is (was?) a sulpholane-based, marketed as "III-V safe" stripper. No SDS for SVC-14 - as usual, Microchem / Kayaku are very bad at that, I should say - but seems like vanilla NMP as well. Disregard "safe for everything!!" overselling datasheet Gensolve is a family of many chemicals, mostly non-disclosed "non-hazardous" composition, including some mixtures that shouldn't be brought into the cleanroom (NaOH). I would stay away as you cannot be sure it wouldn't kill your wafers regardless of vendor statements. Looks like an upsold family of machine shop cleaners. Limonene, as a wild guess. Mike ________________________________ From: labnetwork on behalf of Katharine Beach Sent: Thursday, September 22, 2022 4:02 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] PRS-2000 replacment We've been using PRS-2000 for our positive resist strip for years. Due to some supply chain issues, we are considering updating our supplied chemicals. I was wondering what photo resists stripers others are using and would recommend. Thanks, Katharine Beach Lurie Nanofabrication Facility -------------- next part -------------- An HTML attachment was scrubbed... URL: From jaransom at uark.edu Mon Sep 26 14:43:28 2022 From: jaransom at uark.edu (John Ransom) Date: Mon, 26 Sep 2022 18:43:28 +0000 Subject: [labnetwork] Facilities Engineer Position Open - University of Arkansas SiC Fab Message-ID: I will be posting a Facilities Engineer and Safety Officer position within the next few weeks. Requirement: Must be a US Citizen or have Permanent Resident status. Given the nature of projects and awards, some of which require Citizen or Permanent Resident status, we will only accept applicants who can meet this requirement. Requirement: Must have experience in facilities management of a cleanroom and some equipment maintenance experience. Preferred: Associates or Bachelor's degree in Electrical or Electronics Engineering or Mechanical Engineering. Preferred: Familiar with safety standards and certifications Responsibilities: Will help install, manage, and maintain all aspects of the cleanroom facility. Will also be a member of the Multi-User SiC Fab team (MUSiC Team) that provides oversight in the design and construction of the new green-field fab/cleanroom. John Ransom Program Manager - MUSiC Facility Multi-User SiC Fabrication Facility University of Arkansas -------------- next part -------------- An HTML attachment was scrubbed... URL: From dsbarth at seas.upenn.edu Wed Sep 28 13:20:18 2022 From: dsbarth at seas.upenn.edu (David Barth) Date: Wed, 28 Sep 2022 13:20:18 -0400 Subject: [labnetwork] Deposition of InAs and InSb Message-ID: Dear Labnetwork, We have a user who is looking to deposit InAs and InSb on SiC substrates. This could be evaporation, or epitaxial liftoff and transfer would also be an option. Is anyone aware of a lab or company that has this capability and might perform this as a service? Thanks for any help and advice! Best, David Barth Senior Manager QNF, Singh Center for Nanotechnology University of Pennsylvania dsbarth at seas.upenn.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From diadiuk at mit.edu Wed Sep 28 16:10:11 2022 From: diadiuk at mit.edu (Vicky Diadiuk) Date: Wed, 28 Sep 2022 20:10:11 +0000 Subject: [labnetwork] optical table free to gd home References: <496819FD-5B91-422A-886E-90DE6FA50FEE@mit.edu> Message-ID: Hi, It?s not needed anymore & is available immediately. If interested pls reply directly to MacKenzie at levangie at mit.edu Thx, Vicky 8? x 4? and floatable [IMG_1439.jpg] [IMG_1440.jpg] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: IMG_1439.jpg Type: image/jpeg Size: 103807 bytes Desc: IMG_1439.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... 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