[labnetwork] PRS-2000 replacment

[Brandon Demory]

We started using MLO-07. I am seeing similar results to prs 2000 using a
similar heated bath process.

-Brandon

On Fri, Sep 23, 2022, 11:52 AM John Ransom <jaransom at uark.edu> wrote:

> A fab that I worked in a few years ago used Gensolve.  I don’t know
> exactly what version, but searching “Gensolve resist stripper” brings up a
> website  from vwr and I am sure you could call them to get the right
> chemical for you. There was an earlier reply that mentioned EKC after a
> long plasma etch – I second that recommendation.  If you have Si containing
> polymers, you will need an EKC type of chemical to break down the polymer.
> It is classic in older semiconductor fabs to strip resist after an oxide
> via or contact etch to use EKC.  It removes “via crowns”.
>
> Good Luck
>
>
>
> John Ransom
>
> Program Manager – MUSiC Facility
>
> *M*ulti-*U*ser *SiC* Fabrication Facility
>
> University of Arkansas
>
>
>
>
>
>
>
> *From:* labnetwork <labnetwork-bounces at mtl.mit.edu> * On Behalf Of *Katharine
> Beach
> *Sent:* Thursday, September 22, 2022 3:02 PM
> *To:* labnetwork at mtl.mit.edu
> *Subject:* [labnetwork] PRS-2000 replacment
>
>
>
> We've been using PRS-2000 for our positive resist strip for years. Due to
> some supply chain issues, we are considering updating our supplied
> chemicals. I was wondering what photo resists stripers others are using and
> would recommend.
>
>
>
> Thanks,
>
> Katharine Beach
>
> Lurie Nanofabrication Facility
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20220923/14bed6c9/attachment.html>