From caseysj at umich.edu Sat Apr 1 10:23:32 2023 From: caseysj at umich.edu (Casey Jackson) Date: Sat, 1 Apr 2023 10:23:32 -0400 Subject: [labnetwork] Anodic Bonding In-Reply-To: <627376754.216534.1680208714984@webmail2b.networksolutionsemail.com> References: <627376754.216534.1680208714984@webmail2b.networksolutionsemail.com> Message-ID: Hi Edward, I'm a but of a novice no both of these fronts but I do have a little experience with both so I'll share my thoughts: First my assumptions: - Raman spectroscopy is tuned to respond to symetrically bonded electron pairs ei will give a signal for Si-Si but wont for Si-O. -Anodic bonding creates a bond by charge separating ions from the ion rich SiO2 glass into the ion deficient native SiO2 on the Si surface. If both these assumption are true then running your anodic bonding process for a reduced period of time may eliminate your issue. If you are pushing your ions through the entirety of your native oxide such that the ions are now positioned directly on top of your Si layer, you may have some Si-Si bonded electrons that have slightly different resonance due to the presence of local ions. This would create broader peaks in your Raman and possibly the excess fluorescence your seeing. Again my experience with this is limited on both Raman and Anodic bonding but my first guess would be to reduce the time you allow the bond to form. I hope this helps and good luck! *Best,* *Casey Jackson - UM Staff & Student* *Equipment Engineer | **LNF * *MPA Class 2026 | FSPP* On Fri, Mar 31, 2023 at 5:47?AM edward.gonzales < edward.gonzales at armonicatech.com> wrote: > Does anyone have experience with anodic bonding? I have successful bonds > with various thickness of SiO2 on Si, 300nm to 1um. The problem is the > fluorescence seen duing Raman Spectroscopy. Would anyone know what may > cause this? > > Thanks, > Edward > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From James.Grant at glasgow.ac.uk Mon Apr 3 08:38:54 2023 From: James.Grant at glasgow.ac.uk (James Grant) Date: Mon, 3 Apr 2023 12:38:54 +0000 Subject: [labnetwork] HBr Gas Cabinets - UK Vendors for Purchase/Service? Message-ID: Hello, We are looking to purchase a replacement gas cabinet for our HBr supply. We've not had to purchase a gas cabinet ourselves for many a year. Additionally we have found it very difficult to find vendors who will service/maintain our existing gas cabinets. In the course of my, very brief and very incomplete research, came across a helpful labnetwork email exchange from 2016: https://mtl.mit.edu/pipermail/labnetwork/2016-April/002170.html I have found that Matheson (https://store.mathesongas.com/gas-cabinets/) also have very useful literature on the topic. We have found several UK based companies who do supply cabinets (Eb gas, Spectron, Gas Control Technologies, Cambridge Fluid Systems). My question is, can anyone recommend any UK based vendors of gas cabinets? Would appreciate if people could share their experiences/thoughts on the topic. Cheers, James Dr. James Paul Grant Research Engineer in Plasma Processing Plasma Processing Group james.grant at glasgow.ac.uk [cid:image001.png at 01D96630.AB34D510] www.JWNC.gla.ac.uk [cid:image002.png at 01D96630.AB34D510] LinkedIn.com/company/JWNC [cid:image003.png at 01D96630.AB34D510] @UofG_JWNC -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 26666 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 1538 bytes Desc: image002.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.png Type: image/png Size: 1717 bytes Desc: image003.png URL: From mccleery.7 at osu.edu Mon Apr 3 12:35:14 2023 From: mccleery.7 at osu.edu (McCleery, Mary) Date: Mon, 3 Apr 2023 16:35:14 +0000 Subject: [labnetwork] FW: Habitual late payments from external clients In-Reply-To: References: Message-ID: Julia, We?ve definitely had clients that pay late habitually. In the past I?ve had to pester them and, unfortunately, we?ve never charged a late fee. However, OSU has switched to a centralized invoicing system so all invoices are sent from the same address and payment is made centrally. It?s good in that they do the follow-up on late bills by sending dunning letters and sending them to university collections, which usually gets people to act. The problem is that if it goes to collections and gets collected, we get charged a collection fee and they still don?t charge the client a fee, so we eat it. I try to keep an eye on things and notify late payers before it goes to internal collections at 90 days just to avoid that charge that they don?t pass on to the client. The funny thing is that the invoices state that they can charge late fees as did my invoices when I invoiced directly. ?Finance charges and/or late fees may apply after the due date listed above? I?m still waiting for central AR to start that. Not much of an answer but it?s where we?re at. Mary McCleery Nanotech West Lab 614-688-3119 mccleery.7 at osu.edu [CharleyHarperOhio] From: Steffen, Paul Sent: Tuesday, March 21, 2023 8:33 AM To: McCleery, Mary Subject: FW: Habitual late payments from external clients From: labnetwork > On Behalf Of Aebersold, Julia Sent: Monday, March 20, 2023 6:26 PM To: 'labnetwork at mtl.mit.edu' > Subject: [labnetwork] Habitual late payments from external clients Hello everyone. We have a few external clients that are habitual late payers for their invoices. How does your facility deal with these late payers? I?m thinking of applying an interest payment after a certain time period similar to credit Hello everyone. We have a few external clients that are habitual late payers for their invoices. How does your facility deal with these late payers? I?m thinking of applying an interest payment after a certain time period similar to credit card companies, but I want to hear what others do to encourage clients to pay on time. Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 3233 bytes Desc: image001.jpg URL: -------------- next part -------------- An embedded and charset-unspecified text was scrubbed... Name: ATT00001.txt URL: From blewis at eng.ufl.edu Tue Apr 4 15:45:54 2023 From: blewis at eng.ufl.edu (Lewis,William) Date: Tue, 4 Apr 2023 19:45:54 +0000 Subject: [labnetwork] Baker PRS3000 PR Strip alternative Message-ID: Hi Everyone, We were recently told Baker is discontinuing PRS3000. Just curious what metal friendly PR solvent strippers others are using. We ordered some Technic Micro D2 and MLO 07 to try out. Thanks for any input Cheers, Bill Lewis Research Service Center University of Florida 1041 Center Dr Gainesville, FL 32611 walewis at ufl.edu 3five2-258-zero5zero7 https://rsc.aux.eng.ufl.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From vsoares at inesc-mn.pt Wed Apr 5 13:38:55 2023 From: vsoares at inesc-mn.pt (vsoares at inesc-mn.pt) Date: Wed, 05 Apr 2023 18:38:55 +0100 Subject: [labnetwork] Dektak 3030 ST stylus issues Message-ID: <56f502e3581a0ec5723bdadf1153754d@inesc-mn.pt> Dear all, our lab still has a Dektak 3030ST profilometer and we are having issues with the stylus. First it would go down and wouldn't go up, then I managed to get it working for a few measurements and know we have the opposite problem: the stylus won't go down. Plus I moved the optics to see if the sytlus would go up (or down, now that it is in an upper position), but the scan head doesn't move at all. Does naybody have any idea what this could be due to? Thanks Virginia -- Melhores cumprimentos/Best Regards Virginia Soares www.inesc-mn.pt INESC-MN Rua Alves Redol,9 1000-029 LISBOA PORTUGAL From lopezg at seas.upenn.edu Wed Apr 5 14:44:59 2023 From: lopezg at seas.upenn.edu (Gerald Lopez) Date: Wed, 5 Apr 2023 14:44:59 -0400 Subject: [labnetwork] MAEBL 2023 - Registration Open Message-ID: Dear Colleagues: You are cordially invited to register for the 7th *Meeting for Advanced Electron Beam Lithography* (MAEBL) on *September 12-14, 2022*. - Where: the *University of Chicago *(UChicago)* and online*. The hybrid event will stream the live talks through the GatherTown platform, but *attendees are strongly encouraged to attend in person*. - *Register: *https://maebl.eventbrite.com . Registration is the same ($175) if you attend online or in person.* Invited speakers have their registration waived.* If you are interested in presenting, please let us know. Priority will be given to those that can speak in person. - MAEBL 2023 - Sept 12, 2023: Host tour and Operations Discussion - Sept 13, 2023: MAEBL Foundations Workshop - Sept 14, 2023: MAEBL Core Meeting - MAEBLx - shorter meetings and online only - EBL Vendor Applications: May 3, 2023 - Asia-Pacific: TBD - North America: November 15, 2023 MAEBL 2023 is a highly anticipated 2.5-day event, featuring diverse activities to foster knowledge exchange and community engagement among electron beam lithographers. On the first day, attendees are invited to participate in a tour of the esteemed University of Chicago Pritzker Nanofabrication Facility and a lab operations discussion segment for those arriving early and attending in person. The event's second day will feature the MAEBL Foundations Workshop, designed specifically for electron beam lithography (EBL) beginners, including researchers and students. This workshop offers an excellent opportunity for participants to acquire or brush up on their knowledge of EBL fundamentals, such as machine-agnostic tool operation, data preparation, and process development. By the end of the Foundations Workshop, participants will have developed a sound understanding of EBL and be encouraged to participate in the MAEBL Core Workshop. The final component of the event is the MAEBL Core Meeting, which serves as a platform for the community to engage in meaningful conversations and learn from one another. The meeting aims to connect active novices with experienced EBL tool owners and users in an open forum to exchange practical and directly applicable EBL knowledge. Attendees are encouraged to network with an opportunity to present their most challenging patterns or processing issues for collaborative expert advice from the community. The event features invited talks from users in the field, adding to the richness of the conversation. Finally, we have several online MAEBLx meetings scheduled throughout the year and access is included in the registration. Depending on the host region's time zone, these meetings are held online at different times. [image: mockup.png] Register at https://maebl.eventbrite.com and feel free to invite others that might be interested. * Registration is only $175* for the full meeting at UChicago and bonus meetings (MAEBLx) access, whether attending online or in person. All attendees will receive a commemorative MAEBL 2023 t-shirt. We look forward to seeing you soon, and please don't hesitate to contact me with any questions or concerns. Sincerely, Gerald G. Lopez, Ph.D. (he/him/his) Co-Founder and Board Chair, MAEBL Register: https://maebl.eventbrite.com Gerald G. Lopez, Ph.D. (he/him/his) Director of Operations and Business Development & Center Associate Director University of Pennsylvania | Singh Center for Nanotechnology NNCI Mid-Atlantic Nanotechnology Hub (MANTH) ? nnci.net 3205 Walnut Street, Philadelphia, PA 19104 USA Deliveries: 3231 Walnut Street, LRSM Building, Philadelphia, PA 19104 nano.upenn.edu ? lopezg at seas.upenn.edu ? +1-215-573-4041 ? linkedin.com/in/geraldglopez/ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: mockup.png Type: image/png Size: 58972 bytes Desc: not available URL: From nnelsonfitzpatrick at uwaterloo.ca Wed Apr 5 14:46:52 2023 From: nnelsonfitzpatrick at uwaterloo.ca (Nathan Nelson - Fitzpatrick) Date: Wed, 5 Apr 2023 18:46:52 +0000 Subject: [labnetwork] N2 consumption by SRDs Message-ID: Hi labnetwork, My lab is going through a process of auditing our Nitrogen use, and an early target for saving on N2 are our spin rinse dryers. We have four Sitek SRDs which are configured to continuously purge with N2 and to run occasionally (on a timer) to exercise the SRDs and run some DI water through them. The constant N2 purge obviously consumes a ton of N2. We?re considering either: * Purchasing an (expensive) valve from Sitek that would cut off N2 flow when the SRD controllers are off. We would then leave the SRD controllers off when they are not enabled by our lab users. * Or we might consider setting up an interlock to drive a solenoid valve that would cut off N2 flow to the SRDs when they are not enabled in our lab management software. I?m wondering what other interesting solutions people have fashioned to reduce N2 consumption by SRDs? I?m also curious if there are any pitfalls we should look out for when pursuing something like this? Many thanks in advance, -Nathan -- Nathan Nelson-Fitzpatrick PhD, PEng (He/Him) Director, Quantum-Nano Fabrication and Characterization Facility (QNFCF) Office of Research University of Waterloo 200 University Avenue West, Waterloo, ON N2L 3G1 P: 519-888-4567 ext. 31796 C: 226-218-3206 https://uwaterloo.ca/quantum-nano-fabrication-and-characterization-facility/ [signature_312461171] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 11997 bytes Desc: image001.png URL: From rmorrison at draper.com Wed Apr 5 16:12:54 2023 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Wed, 5 Apr 2023 20:12:54 +0000 Subject: [labnetwork] [EXTERNAL] N2 consumption by SRDs In-Reply-To: References: Message-ID: HI, Here at Draper we shut off the N2 when not in use and we have every user run the SRD before they use it to ensure that there is not extra particles generated. If you do not run it for a cycle the SRD tend to deposit a lot of particles on your wafer. Rick Richard Morrison DMTS Draper Laboratory 555 Technology Square Cambridge Ma 02139 Office: 617-258-3420 Cell: 508-930-3461 From: labnetwork On Behalf Of Nathan Nelson - Fitzpatrick Sent: Wednesday, April 5, 2023 2:47 PM To: labnetwork at mtl.mit.edu Subject: [EXTERNAL] [labnetwork] N2 consumption by SRDs CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe. Hi labnetwork, My lab is going through a process of auditing our Nitrogen use, and an early target for saving on N2 are our spin rinse dryers. We have four Sitek SRDs which are configured to continuously purge with N2 and to run occasionally (on a timer) to exercise the SRDs and run some DI water through them. The constant N2 purge obviously consumes a ton of N2. We're considering either: * Purchasing an (expensive) valve from Sitek that would cut off N2 flow when the SRD controllers are off. We would then leave the SRD controllers off when they are not enabled by our lab users. * Or we might consider setting up an interlock to drive a solenoid valve that would cut off N2 flow to the SRDs when they are not enabled in our lab management software. I'm wondering what other interesting solutions people have fashioned to reduce N2 consumption by SRDs? I'm also curious if there are any pitfalls we should look out for when pursuing something like this? Many thanks in advance, -Nathan -- Nathan Nelson-Fitzpatrick PhD, PEng (He/Him) Director, Quantum-Nano Fabrication and Characterization Facility (QNFCF) Office of Research University of Waterloo 200 University Avenue West, Waterloo, ON N2L 3G1 P: 519-888-4567 ext. 31796 C: 226-218-3206 https://uwaterloo.ca/quantum-nano-fabrication-and-characterization-facility/ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 11997 bytes Desc: image001.png URL: From kckeenan at seas.upenn.edu Wed Apr 5 16:46:44 2023 From: kckeenan at seas.upenn.edu (Kyle Keenan) Date: Wed, 5 Apr 2023 16:46:44 -0400 Subject: [labnetwork] N2 consumption by SRDs In-Reply-To: References: Message-ID: Hi Nathan, I'm surprised to hear that they have a constant N2 purge. This seems very odd to me. Stating the obvious, here, but can't Sitek reconfigure them? We've had (very old) Verteq Superclean SRD's and now RENA Compass SRD's, and neither type had a constant N2 purge. Kyle On Wed, Apr 5, 2023 at 4:15?PM Nathan Nelson - Fitzpatrick < nnelsonfitzpatrick at uwaterloo.ca> wrote: > Hi labnetwork, > > > > My lab is going through a process of auditing our Nitrogen use, and an > early target for saving on N2 are our spin rinse dryers. > > > > We have four Sitek SRDs which are configured to continuously purge with N2 > and to run occasionally (on a timer) to exercise the SRDs and run some DI > water through them. The constant N2 purge obviously consumes a ton of N2. > > > > We?re considering either: > > > > - Purchasing an (expensive) valve from Sitek that would cut off N2 > flow when the SRD controllers are off. We would then leave the SRD > controllers off when they are not enabled by our lab users. > - Or we might consider setting up an interlock to drive a solenoid > valve that would cut off N2 flow to the SRDs when they are not enabled > in our lab management software. > > > > I?m wondering what other interesting solutions people have fashioned to > reduce N2 consumption by SRDs? > > > > I?m also curious if there are any pitfalls we should look out for when > pursuing something like this? > > > > Many thanks in advance, > > -Nathan > > > > -- > > Nathan Nelson-Fitzpatrick PhD, PEng (He/Him) > > Director, Quantum-Nano Fabrication and Characterization Facility (QNFCF) > > Office of Research > > University of Waterloo > > 200 University Avenue West, Waterloo, ON N2L 3G1 > > P: 519-888-4567 ext. 31796 > > C: 226-218-3206 > > > https://uwaterloo.ca/quantum-nano-fabrication-and-characterization-facility/ > > > [image: signature_312461171] > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!IBzWLUs!T8PC5-A25plwFv8OVmNvllNdSvKRgMR3IZ7Uqa8wriIGD70Ss_OlZtLE_gGeHoV1YsZKQkIK2pDI8eebEKZad3OVmt7KUAPD744v$ > -- Kyle Keenan Senior Manager - Laboratory Operations Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 11997 bytes Desc: not available URL: From spaolini at cns.fas.harvard.edu Wed Apr 5 17:24:58 2023 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Wed, 5 Apr 2023 21:24:58 +0000 Subject: [labnetwork] N2 consumption by SRDs In-Reply-To: References: Message-ID: Nathan, Some, if not most SRD's have a N2 driven venturi that keeps the ferrofluidic rotor seal at some level of vacuum for when the seal ultimately fails. This is an effort to eliminate particles from contaminating the bowl when it occurs. The fix would be to switch the venturi feed to CDA which is quite less expensive but be careful that the N2 does not share the same feed as the bowl purge. Interlocking the N2 with your lab software is a good way to reduce the N2 consumption but you must find a way to bleed some N2 into the bowl at idle. The N2 keeps the room's RH from clinging to the interior parts of the bowl which will drastically increase the time of rinsing to a resistance setpoint because of the water vapor in air not being deionized. I hope this helps, Equipment Dood Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu From: labnetwork On Behalf Of Nathan Nelson - Fitzpatrick Sent: Wednesday, April 05, 2023 2:47 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] N2 consumption by SRDs Hi labnetwork, My lab is going through a process of auditing our Nitrogen use, and an early target for saving on N2 are our spin rinse dryers. We have four Sitek SRDs which are configured to continuously purge with N2 and to run occasionally (on a timer) to exercise the SRDs and run some DI water through them. The constant N2 purge obviously consumes a ton of N2. We're considering either: * Purchasing an (expensive) valve from Sitek that would cut off N2 flow when the SRD controllers are off. We would then leave the SRD controllers off when they are not enabled by our lab users. * Or we might consider setting up an interlock to drive a solenoid valve that would cut off N2 flow to the SRDs when they are not enabled in our lab management software. I'm wondering what other interesting solutions people have fashioned to reduce N2 consumption by SRDs? I'm also curious if there are any pitfalls we should look out for when pursuing something like this? Many thanks in advance, -Nathan -- Nathan Nelson-Fitzpatrick PhD, PEng (He/Him) Director, Quantum-Nano Fabrication and Characterization Facility (QNFCF) Office of Research University of Waterloo 200 University Avenue West, Waterloo, ON N2L 3G1 P: 519-888-4567 ext. 31796 C: 226-218-3206 https://uwaterloo.ca/quantum-nano-fabrication-and-characterization-facility/ [signature_312461171] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 11997 bytes Desc: image001.png URL: From mapril at draper.com Thu Apr 6 05:49:37 2023 From: mapril at draper.com (April, Mark R.) Date: Thu, 6 Apr 2023 09:49:37 +0000 Subject: [labnetwork] [EXTERNAL] Re: N2 consumption by SRDs In-Reply-To: References: Message-ID: Hi All, SITEK does offer a new controller called SLICK ONE, this does have a setting to shut off the N2 purge. The new controllers are really nice also, they allow easy troubleshooting and programming. Thanks Mark R. April Senior Equipment Engineer Microfabrication Laboratory [color_logo_small4] 555 Technology Square Cambridge, MA 02139 mapril at draper.com O # 617-258-1613 C # 617-455-1596 www.draper.com From: labnetwork On Behalf Of Kyle Keenan Sent: Wednesday, April 5, 2023 4:47 PM To: Nathan Nelson - Fitzpatrick Cc: labnetwork at mtl.mit.edu Subject: [EXTERNAL] Re: [labnetwork] N2 consumption by SRDs CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe. Hi Nathan, I'm surprised to hear that they have a constant N2 purge. This seems very odd to me. Stating the obvious, here, but can't Sitek reconfigure them? We've had (very old) Verteq Superclean SRD's and now RENA Compass SRD's, and neither type had a constant N2 purge. Kyle On Wed, Apr 5, 2023 at 4:15?PM Nathan Nelson - Fitzpatrick > wrote: Hi labnetwork, My lab is going through a process of auditing our Nitrogen use, and an early target for saving on N2 are our spin rinse dryers. We have four Sitek SRDs which are configured to continuously purge with N2 and to run occasionally (on a timer) to exercise the SRDs and run some DI water through them. The constant N2 purge obviously consumes a ton of N2. We?re considering either: * Purchasing an (expensive) valve from Sitek that would cut off N2 flow when the SRD controllers are off. We would then leave the SRD controllers off when they are not enabled by our lab users. * Or we might consider setting up an interlock to drive a solenoid valve that would cut off N2 flow to the SRDs when they are not enabled in our lab management software. I?m wondering what other interesting solutions people have fashioned to reduce N2 consumption by SRDs? I?m also curious if there are any pitfalls we should look out for when pursuing something like this? Many thanks in advance, -Nathan -- Nathan Nelson-Fitzpatrick PhD, PEng (He/Him) Director, Quantum-Nano Fabrication and Characterization Facility (QNFCF) Office of Research University of Waterloo 200 University Avenue West, Waterloo, ON N2L 3G1 P: 519-888-4567 ext. 31796 C: 226-218-3206 https://uwaterloo.ca/quantum-nano-fabrication-and-characterization-facility/ [signature_312461171] _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!IBzWLUs!T8PC5-A25plwFv8OVmNvllNdSvKRgMR3IZ7Uqa8wriIGD70Ss_OlZtLE_gGeHoV1YsZKQkIK2pDI8eebEKZad3OVmt7KUAPD744v$ -- Kyle Keenan Senior Manager - Laboratory Operations Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 1560 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 11997 bytes Desc: image002.png URL: From vsoares at inesc-mn.pt Thu Apr 6 07:08:55 2023 From: vsoares at inesc-mn.pt (=?utf-8?Q?Virg=C3=ADnia_Soares?=) Date: Thu, 6 Apr 2023 12:08:55 +0100 Subject: [labnetwork] Dektak 3030 ST stylus issues In-Reply-To: <365706524.3269005.1680731356881@mail.yahoo.com> References: <56f502e3581a0ec5723bdadf1153754d@inesc-mn.pt> <365706524.3269005.1680731356881@mail.yahoo.com> Message-ID: <000801d96878$2e5ad810$8b108830$@inesc-mn.pt> Thanks for your help Dennis, But actually I am able to move the optics, just the stylus arm won?t move accordingly. At one point yesterday the stylus would not go up, then it somehow reset itself and worked for a few measurements and then it would simply not go down. It somehow feels like something in the electronics? Virginia Melhores Cumprimentos/Best Regards Virginia Soares INESC-MN Rua Alves Redol,9 1000-029 Lisboa Portugal www.inesc-mn.pt From: Dennis Culver Sent: 5 de abril de 2023 22:49 To: vsoares at inesc-mn.pt Subject: Re: [labnetwork] Dektak 3030 ST stylus issues Hello Virginia, With the optics stuck in the UP position, with the focus knob not allowing the user to lower the optics, is typically caused by the stylus sensor circuitry thinking the stylus is on a sample. The most likely issue is that the smoked plexiglass stylus "guard" at the front of the sensor has been pushed UP inadvertently by the optics being driven DOWN, raising the stylus arm UP from its resting position on the small pin in that guard. This happens when the optics are left in a high magnification position where the user can easily lower through the field of focus. You can loosen the Philips head screw attaching that guard to the front of the sensor nose and lower it slightly, then try lowering the optics knob down. If it still does not move, lower the guard a little more, making sure the stylus arm can "swing" within its arc ~ 1/8 inch. If the optics are still stuck in the up position, then its very likely that the sensor tower leadscrew is jammed at its stop within the sensor tower; this will require service by a qualified Veeco/Sloan Technology service engineer. You can contact me directly for additional help. Dennis J. Culver Culver Consulting 5960 Valentine Rd. Unit 14, Mail box 13 Ventura, CA 93003 Ph (805) 648-1184 Fx (805) 648-1485 Cell (805)680-7389 dennis at culverequipment.com Website: www.culverequipment.com -----Original Message----- From: vsoares at inesc-mn.pt To: labnetwork at mtl.mit.edu Sent: Wed, Apr 5, 2023 10:38 am Subject: [labnetwork] Dektak 3030 ST stylus issues Dear all, our lab still has a Dektak 3030ST profilometer and we are having issues with the stylus. First it would go down and wouldn't go up, then I managed to get it working for a few measurements and know we have the opposite problem: the stylus won't go down. Plus I moved the optics to see if the sytlus would go up (or down, now that it is in an upper position), but the scan head doesn't move at all. Does naybody have any idea what this could be due to? Thanks Virginia -- Melhores cumprimentos/Best Regards Virginia Soares www.inesc-mn.pt INESC-MN Rua Alves Redol,9 1000-029 LISBOA PORTUGAL _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From michael.rooks at yale.edu Thu Apr 6 12:42:05 2023 From: michael.rooks at yale.edu (Michael Rooks) Date: Thu, 6 Apr 2023 12:42:05 -0400 Subject: [labnetwork] Staff Scientist position at Yale University Cleanroom In-Reply-To: References: Message-ID: The Yale University cleanroom is looking for a talented Staff Scientist to assist in managing the cleanroom operation. Engineers with hands-on experience in maintaining equipment related to Dry Etching or Thin Film Growth, are encouraged to apply. We're also interested in applicants who have experience in the following areas: (i) toxic gas safety; (ii) UHV maintenance; (iii) optical lithography. Applicants must be willing to work in a cleanroom environment, must be interested in training new users. See Yale Requisition Number: 80634BR Posting Title: Staff Scientist https://sjobs.brassring.com/TGnewUI/Search/Home/Home?partnerid=25053&siteid=5248#jobDetails=1574450_5248 or look on linkedin: https://www.linkedin.com/jobs/view/3551289737 or contact yong.sun at yale.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From vsoares at inesc-mn.pt Mon Apr 10 12:34:53 2023 From: vsoares at inesc-mn.pt (=?iso-8859-1?Q?Virg=EDnia_Soares?=) Date: Mon, 10 Apr 2023 17:34:53 +0100 Subject: [labnetwork] Dektak 3030 ST stylus issues In-Reply-To: References: <56f502e3581a0ec5723bdadf1153754d@inesc-mn.pt> Message-ID: <001a01d96bca$6178c1d0$246a4570$@inesc-mn.pt> Thank you for your help, actually we found out the problem was that the motor sometimes gets stuck and we need to help it a bit to move with the Z axis lead screw and then t starts working again. Probably as Dennis said, the lubricant may be getting hardened. Ours is also a 1991 or 1993 vintage tool and obsolete but we finally got some funding to buy a new one, we just need to keep this one working for the next few months. Virgnia Melhores Cumprimentos/Best Regards Virginia Soares INESC-MN Rua Alves Redol,9 1000-029 Lisboa Portugal www.inesc-mn.pt -----Original Message----- From: Richard Everly Sent: 7 de abril de 2023 21:19 To: vsoares at inesc-mn.pt Subject: RE: [labnetwork] Dektak 3030 ST stylus issues Virginia, I'm not sure if this applicable but ours sometimes get stuck in the up position. if the stylus is raised to high, about 2" above the surface, then it might have jammed the Z axis lead screw in the top position. You have to take off the monitor and the top cover ( I actually just drilled a hole through the top cover roughly near the top of the Z axis removing the cover seemed to much hassle at the time) and use a large flat head screw driver in the end of the lead screw, to break it loose and drive it back down. As I precaution I train my students not raise the stylus more then about 12 to 18mm above the chuck surface. Also, our unit sometimes will get stuck in the down position, and then the system becomes unresponsive. I've just assumed that this is some glitch in the software, because if power cycle the system, it seems to correct itself, and the works normally afterwards. the unit is a 1991 vintage tool and obsolete by most standards so I've just learned to live with it, until money comes along for a newer model. Richard Everly University of South Florida College of Engineering Nanotechnology Research and Education Center 4202 E. Fowler Ave. MS: ENG 030 Tampa, FL 33620 Office: (813) 974-5365 Fax: (813) 974-3610 Cell: (813) 760-3934 http://www.nrec.usf.edu/ everly at usf.edu -----Original Message----- From: labnetwork On Behalf Of vsoares at inesc-mn.pt Sent: Wednesday, April 5, 2023 1:39 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Dektak 3030 ST stylus issues [You don't often get email from vsoares at inesc-mn.pt. Learn why this is important at https://aka.ms/LearnAboutSenderIdentification ] Dear all, our lab still has a Dektak 3030ST profilometer and we are having issues with the stylus. First it would go down and wouldn't go up, then I managed to get it working for a few measurements and know we have the opposite problem: the stylus won't go down. Plus I moved the optics to see if the sytlus would go up (or down, now that it is in an upper position), but the scan head doesn't move at all. Does naybody have any idea what this could be due to? Thanks Virginia -- Melhores cumprimentos/Best Regards Virginia Soares http://www.inesc-mn.pt/ INESC-MN Rua Alves Redol,9 1000-029 LISBOA PORTUGAL _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork [EXTERNAL EMAIL] DO NOT CLICK links or attachments unless you recognize the sender and know the content is safe. From vk409 at soe.rutgers.edu Tue Apr 11 11:40:56 2023 From: vk409 at soe.rutgers.edu (Vibhor Kumar) Date: Tue, 11 Apr 2023 15:40:56 +0000 Subject: [labnetwork] Suggestions on fume hood Message-ID: Dear Labnetwork Community, We have a user who wants to access fume hood for spin coating of solution containing: lanthanum nitrate hexahydrate (La(NO3)3?6H2O) (solid) + nickel(II) acetate tetrahydrate (Ni(CH3COO)2? 4H2O) (solid) Mixed with mixture of 2-methoxy ethanol and acetic acid (volume ratio = 9:1). The user will be using his own spinner. Our concerns are that : 1. Which Fume hood will be ideal for them. i.e., Acid OR Solvent? 2. Is there any contamination issue that affects other users OR disposal issue of used aluminum foils? Thanks in advance, Sincerely, -Vibhor Kumar- Research Scientist, School of Engineering, Rutgers, The State University of New Jersey, NJ USA. -------------- next part -------------- An HTML attachment was scrubbed... URL: From lino.eugene at uwaterloo.ca Thu Apr 13 16:37:49 2023 From: lino.eugene at uwaterloo.ca (Lino Eugene) Date: Thu, 13 Apr 2023 20:37:49 +0000 Subject: [labnetwork] Evaluation of heavy metal contamination in oxidation furnace Message-ID: Hi all, We have a Tystar furnace dedicated to thermal oxidation. We do not have a chlorine source for tube cleaning. So far, only bare prime Si wafers cleaned in RCA solutions have been loaded in the furnace. MOS capacitors with 20 nm thermal oxide were fabricated and C-V measurements did not show hysteresis due to mobile ions and I-V measurements showed nice Fowler-Nordheim curves up to 20 V with no breakdown . Quasi-static CV curves showed low density of interface traps. We tried the Zerbst method to determine the minority carrier lifetime generation but somehow it did not work. For those of you who care about metal contamination in quartz furnaces, I am curious to know how you evaluate it. I learned about surface charge analyzing that can work on bare and dielectric coated wafers and measure the minority carrier lifetime. I have contacted Berkeley and Georgia Tech for a characterization service. I am also considering TXRF (Total X-ray Fluorescence) but the cost to analyze few wafers with a specialized analytical company is quite high. Any suggestion is welcome. Best, Lino Eugene, P.Eng., Ph.D., Micro/nanofabrication process engineer Quantum-Nano Fabrication and Characterization Facility Office of Research QNC 1611 University of Waterloo 200 University Avenue West Waterloo, ON, Canada N2L 3G1 Ph: +1 519-888-4567 #37788 Cell: +1 226-929-1685 Websites: https://uwaterloo.ca/quantum-nano-fabrication-and-characterization-facility/ https://fab.qnc.uwaterloo.ca/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From saba.sadeghi at uwaterloo.ca Thu Apr 13 19:55:02 2023 From: saba.sadeghi at uwaterloo.ca (Saba Sadeghi) Date: Thu, 13 Apr 2023 23:55:02 +0000 Subject: [labnetwork] Sputtering issue Message-ID: Dear Labnetwork community, I am having an issue with magnetron-sputtering of tantalum with DC power. After a few minutes of sputtering Ta glow spots appear on the surface of the target that eventually cause the plasma to distinguish. I have loaded two fresh 0.31?-thick Ta targets, but both times the same problem occurred, and both times it generated enough particles in a short amount of time ( about 2 hours of sputtering, accumulatively) that led to shorting of the source. I suspected that this might be a cooling issue, but there is enough flow rate at the sputtering source, and I use indium thin foil for thermal contact between the cathode and the target (recommended by the company- MeiVac). Have you experienced such a problem? I am wondering if this could be an issue with the sputtering source or could somehow the two Ta targets I loaded have been compromised? Thank you very much. Best regards, Saba Sadeghi IQC, University of Waterloo -------------- next part -------------- An HTML attachment was scrubbed... URL: From jerry.hunter at wisc.edu Thu Apr 13 20:02:08 2023 From: jerry.hunter at wisc.edu (Jerry Hunter) Date: Fri, 14 Apr 2023 00:02:08 +0000 Subject: [labnetwork] Evaluation of heavy metal contamination in oxidation furnace In-Reply-To: References: Message-ID: <502669FA-F247-4182-9227-F360FD2C582E@wisc.edu> TXRF will detect metallic contamination on the very surface down to ppm levels. If you are looking for more the bulk (>5nm) of the film with depth profiling then SIMS is a better choice (as long as the concentration is less than 1%) and will give you detection down to ppb levels. If the concentration is > 0.1% then XPS is a good choice and easier to do than SIMS. Jerry Hunter On Apr 13, 2023, at 6:42 PM, Lino Eugene wrote: ? Hi all, We have a Tystar furnace dedicated to thermal oxidation. We do not have a chlorine source for tube cleaning. So far, only bare prime Si wafers cleaned in RCA solutions have been loaded in the furnace. MOS capacitors with 20 nm thermal oxide were fabricated and C-V measurements did not show hysteresis due to mobile ions and I-V measurements showed nice Fowler-Nordheim curves up to 20 V with no breakdown . Quasi-static CV curves showed low density of interface traps. We tried the Zerbst method to determine the minority carrier lifetime generation but somehow it did not work. For those of you who care about metal contamination in quartz furnaces, I am curious to know how you evaluate it. I learned about surface charge analyzing that can work on bare and dielectric coated wafers and measure the minority carrier lifetime. I have contacted Berkeley and Georgia Tech for a characterization service. I am also considering TXRF (Total X-ray Fluorescence) but the cost to analyze few wafers with a specialized analytical company is quite high. Any suggestion is welcome. Best, Lino Eugene, P.Eng., Ph.D., Micro/nanofabrication process engineer Quantum-Nano Fabrication and Characterization Facility Office of Research QNC 1611 University of Waterloo 200 University Avenue West Waterloo, ON, Canada N2L 3G1 Ph: +1 519-888-4567 #37788 Cell: +1 226-929-1685 Websites: https://uwaterloo.ca/quantum-nano-fabrication-and-characterization-facility/ https://fab.qnc.uwaterloo.ca/ _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From jeanne.guo at rice.edu Fri Apr 14 10:25:05 2023 From: jeanne.guo at rice.edu (Jing Guo) Date: Fri, 14 Apr 2023 09:25:05 -0500 Subject: [labnetwork] Sputtering issue In-Reply-To: References: Message-ID: <70A3D258-EC7F-4534-A275-539D7F366AA9@rice.edu> Hi Saba, Was the process a pure Ta sputtering or reactive sputtering? For a pure Ta DC power sputtering process, usually it shouldn?t generate that much particles. Ta coating on the sputter gun house/chimney should have a good adhesion. Any accumulated particles on the Ta target surface after ~ 2 hours sputtering? If the chimney or clamp ring for the target has been coated too much materials, you need to clean the whole kit and measure the gun to the ground layer by layer once you install a target. Another issue could be that some magnets got demagnetized which cannot provide strong magnetic field on the target surface. What was the strike condition, like pressure, power, gun voltage/current? Did you see whether the voltage/current can stabilize once the plasma was generated? There are several ways to figure out it is the sputter gun issue or a Ta target issue. Normally targets should be fine. Thanks. Best, Jing --------------------------------------- Jing Guo Ph.D. Research Scientist SEA Cleanroom (SST 017) Rice University Houston, TX jeanne.guo at rice.edu 713-348-8227 > On Apr 13, 2023, at 6:55 PM, Saba Sadeghi wrote: > > Dear Labnetwork community, > > I am having an issue with magnetron-sputtering of tantalum with DC power. After a few minutes of sputtering Ta glow spots appear on the surface of the target that eventually cause the plasma to distinguish. I have loaded two fresh 0.31?-thick Ta targets, but both times the same problem occurred, and both times it generated enough particles in a short amount of time ( about 2 hours of sputtering, accumulatively) that led to shorting of the source. > > I suspected that this might be a cooling issue, but there is enough flow rate at the sputtering source,and I use indium thin foil for thermal contact between the cathode and the target (recommended by the company- MeiVac). > > Have you experienced such a problem? I am wondering if this could be an issue with the sputtering source or could somehow the two Ta targets I loaded have been compromised? > > Thank you very much. > > Best regards, > Saba Sadeghi > IQC, University of Waterloo > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!kxlcKJiirMsFBnN6_pix8dvETfN-5vXnpaJXAA_4g3Jh5zmL_s-vuowA7xmr2s77ZKDztvk-khToRLa3a5M1qDmnShX9c4XwH0zL-Q$ -------------- next part -------------- An HTML attachment was scrubbed... URL: From Kevin.Hilgers at asu.edu Fri Apr 14 11:09:07 2023 From: Kevin.Hilgers at asu.edu (Kevin Hilgers) Date: Fri, 14 Apr 2023 15:09:07 +0000 Subject: [labnetwork] JEOL JBX-6000 EBL Up for Auction Message-ID: Hello, Arizona State University is auctioning off a JEOL JBX-6000 Electron Beam Lithography system with no reserve price. The JBX-6000 EBL is currently operational and being sold as-is where-is at ASU's NanoFab. Further details can be found via the link below. https://www.govdeals.com/index.cfm?fa=Main.Item&itemid=2431&acctid=7547 The tool resides in class 1000 cleanroom and can be viewed by contacting the NanoFab's Director of Operations, Kevin Hilgers Kevin.Hilgers at ASU.edu Best regards, Kevin Kevin Hilgers Director of Operations NanoFab, Office of Knowledge Enterprise Development Arizona State University 551 E. Tyler Mall, ERC153, Mail Code 6206 Tempe, AZ 85287-6206 -------------- next part -------------- An HTML attachment was scrubbed... URL: From saba.sadeghi at uwaterloo.ca Fri Apr 14 16:15:25 2023 From: saba.sadeghi at uwaterloo.ca (Saba Sadeghi) Date: Fri, 14 Apr 2023 20:15:25 +0000 Subject: [labnetwork] Sputtering issue In-Reply-To: <70A3D258-EC7F-4534-A275-539D7F366AA9@rice.edu> References: <70A3D258-EC7F-4534-A275-539D7F366AA9@rice.edu> Message-ID: Hi Jing, Thanks a lot for getting back to me and the helpful discussion. This was a pure Ta sputtering. I could ignite the plasma at 50 W, 30 sccm Ar, 2E-3 mbar pressure but then the glow spots appear after a few minutes which led to the plasma extinguishing! I could reignite the plasma again by ramping down the power and then up to 50W! by the two hours of sputtering, I meant the sputtering collectively lasted two hours until it shorted. The sputtering gun housing were clean before the sputtering, but after it looks like particles accumulated on the surface of the target! and eventually ended up in the housing and caused the short (picture attached) Thank you. Best, Saba ________________________________ From: Jing Guo Sent: April 14, 2023 10:25 AM To: Saba Sadeghi Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Sputtering issue Hi Saba, Was the process a pure Ta sputtering or reactive sputtering? For a pure Ta DC power sputtering process, usually it shouldn?t generate that much particles. Ta coating on the sputter gun house/chimney should have a good adhesion. Any accumulated particles on the Ta target surface after ~ 2 hours sputtering? If the chimney or clamp ring for the target has been coated too much materials, you need to clean the whole kit and measure the gun to the ground layer by layer once you install a target. Another issue could be that some magnets got demagnetized which cannot provide strong magnetic field on the target surface. What was the strike condition, like pressure, power, gun voltage/current? Did you see whether the voltage/current can stabilize once the plasma was generated? There are several ways to figure out it is the sputter gun issue or a Ta target issue. Normally targets should be fine. Thanks. Best, Jing --------------------------------------- Jing Guo Ph.D. Research Scientist SEA Cleanroom (SST 017) Rice University Houston, TX jeanne.guo at rice.edu 713-348-8227 On Apr 13, 2023, at 6:55 PM, Saba Sadeghi wrote: Dear Labnetwork community, I am having an issue with magnetron-sputtering of tantalum with DC power. After a few minutes of sputtering Ta glow spots appear on the surface of the target that eventually cause the plasma to distinguish. I have loaded two fresh 0.31?-thick Ta targets, but both times the same problem occurred, and both times it generated enough particles in a short amount of time ( about 2 hours of sputtering, accumulatively) that led to shorting of the source. I suspected that this might be a cooling issue, but there is enough flow rate at the sputtering source,and I use indium thin foil for thermal contact between the cathode and the target (recommended by the company- MeiVac). Have you experienced such a problem? I am wondering if this could be an issue with the sputtering source or could somehow the two Ta targets I loaded have been compromised? Thank you very much. Best regards, Saba Sadeghi IQC, University of Waterloo _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!kxlcKJiirMsFBnN6_pix8dvETfN-5vXnpaJXAA_4g3Jh5zmL_s-vuowA7xmr2s77ZKDztvk-khToRLa3a5M1qDmnShX9c4XwH0zL-Q$ Get Outlook for Android -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 20221219_114341 (1).jpg Type: image/jpeg Size: 2759049 bytes Desc: 20221219_114341 (1).jpg URL: From yakimom at sunypoly.edu Sat Apr 15 14:55:27 2023 From: yakimom at sunypoly.edu (Michael Yakimov) Date: Sat, 15 Apr 2023 18:55:27 +0000 Subject: [labnetwork] Sputtering issue In-Reply-To: References: <70A3D258-EC7F-4534-A275-539D7F366AA9@rice.edu> Message-ID: I would check magnets' condition. Once upon a time, I had a ring magnet on a similar one to partially lose magnetization. The result was the strange shape of plasma and a few other funny things. Once removed, it was fairly obvious that the screwdriver sticks to some areas better than others. _______________________________________________ Michael Yakimov Research scientist College of Nanoscale Science and Engineering SUNY Polytechnic Institute 253 Fuller rd. Albany NY 12203 Phone: 518-437-8609 lab e-mail: yakimom at sunypoly.edu ________________________________ From: labnetwork on behalf of Saba Sadeghi Sent: Friday, April 14, 2023 4:15 PM To: Jing Guo Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Sputtering issue Hi Jing, Thanks a lot for getting back to me and the helpful discussion. This was a pure Ta sputtering. I could ignite the plasma at 50 W, 30 sccm Ar, 2E-3 mbar pressure but then the glow spots appear after a few minutes which led to the plasma extinguishing! I could reignite the plasma again by ramping down the power and then up to 50W! by the two hours of sputtering, I meant the sputtering collectively lasted two hours until it shorted. The sputtering gun housing were clean before the sputtering, but after it looks like particles accumulated on the surface of the target! and eventually ended up in the housing and caused the short (picture attached) Thank you. Best, Saba ________________________________ From: Jing Guo Sent: April 14, 2023 10:25 AM To: Saba Sadeghi Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Sputtering issue Hi Saba, Was the process a pure Ta sputtering or reactive sputtering? For a pure Ta DC power sputtering process, usually it shouldn?t generate that much particles. Ta coating on the sputter gun house/chimney should have a good adhesion. Any accumulated particles on the Ta target surface after ~ 2 hours sputtering? If the chimney or clamp ring for the target has been coated too much materials, you need to clean the whole kit and measure the gun to the ground layer by layer once you install a target. Another issue could be that some magnets got demagnetized which cannot provide strong magnetic field on the target surface. What was the strike condition, like pressure, power, gun voltage/current? Did you see whether the voltage/current can stabilize once the plasma was generated? There are several ways to figure out it is the sputter gun issue or a Ta target issue. Normally targets should be fine. Thanks. Best, Jing --------------------------------------- Jing Guo Ph.D. Research Scientist SEA Cleanroom (SST 017) Rice University Houston, TX jeanne.guo at rice.edu 713-348-8227 On Apr 13, 2023, at 6:55 PM, Saba Sadeghi wrote: Dear Labnetwork community, I am having an issue with magnetron-sputtering of tantalum with DC power. After a few minutes of sputtering Ta glow spots appear on the surface of the target that eventually cause the plasma to distinguish. I have loaded two fresh 0.31?-thick Ta targets, but both times the same problem occurred, and both times it generated enough particles in a short amount of time ( about 2 hours of sputtering, accumulatively) that led to shorting of the source. I suspected that this might be a cooling issue, but there is enough flow rate at the sputtering source,and I use indium thin foil for thermal contact between the cathode and the target (recommended by the company- MeiVac). Have you experienced such a problem? I am wondering if this could be an issue with the sputtering source or could somehow the two Ta targets I loaded have been compromised? Thank you very much. Best regards, Saba Sadeghi IQC, University of Waterloo _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!kxlcKJiirMsFBnN6_pix8dvETfN-5vXnpaJXAA_4g3Jh5zmL_s-vuowA7xmr2s77ZKDztvk-khToRLa3a5M1qDmnShX9c4XwH0zL-Q$ Get Outlook for Android -------------- next part -------------- An HTML attachment was scrubbed... URL: From jeanne.guo at rice.edu Mon Apr 17 09:59:14 2023 From: jeanne.guo at rice.edu (Jing Guo) Date: Mon, 17 Apr 2023 08:59:14 -0500 Subject: [labnetwork] Sputtering issue In-Reply-To: References: <70A3D258-EC7F-4534-A275-539D7F366AA9@rice.edu> Message-ID: <51AB45EB-5E81-4506-B4C9-7D95F13E3E40@rice.edu> Hi Saba, The strike pressure (2e-3 mbar which is about 1.5 mTorr) sounds too low for me. Usually from my sputter system, the strike pressure would be 20~30 mTorr, then we would adjust it below 5 mTorr for deposition. If the pressure is low, sometime there will be some difficulties to start the plasma. It might be the reason it cannot support the stable plasma status especially for brand new targets. If your system can show you the current, voltage for the sputter gun including ?50W?, you may be able to get more information once the plasma is struggling. The flakes on the target could be generated by too much arching during the sputtering process. You could test a different easy target like Al on the same gun to see what is the performance. I also agree with Michael about the magnets. What does the magnet look like, a ring magnet? If you have a Gauss meter, you can check the magnets? condition. If not, check it as Micheal suggested. If the sputtered mark on the target is not a regular ring, you?d better check the magnets underneath. Best, Jing --------------------------------------- Jing Guo Ph.D. Research Scientist SEA Cleanroom (SST 017) Rice University Houston, TX jeanne.guo at rice.edu 713-348-8227 > On Apr 15, 2023, at 1:55 PM, Michael Yakimov wrote: > > I would check magnets' condition. Once upon a time, I had a ring magnet on a similar one to partially lose magnetization. The result was the strange shape of plasma and a few other funny things. Once removed, it was fairly obvious that the screwdriver sticks to some areas better than others. > > _______________________________________________ > Michael Yakimov > Research scientist > College of Nanoscale Science and Engineering > SUNY Polytechnic Institute > > 253 Fuller rd. > Albany NY 12203 > > Phone: 518-437-8609 lab > e-mail: yakimom at sunypoly.edu > > > > From: labnetwork > on behalf of Saba Sadeghi > > Sent: Friday, April 14, 2023 4:15 PM > To: Jing Guo > > Cc: labnetwork at mtl.mit.edu > > Subject: Re: [labnetwork] Sputtering issue > > Hi Jing, > > Thanks a lot for getting back to me and the helpful discussion. > > This was a pure Ta sputtering. I could ignite the plasma at 50 W, 30 sccm Ar, 2E-3 mbar pressure but then the glow spots appear after a few minutes which led to the plasma extinguishing! I could reignite the plasma again by ramping down the power and then up to 50W! by the two hours of sputtering, I meant the sputtering collectively lasted two hours until it shorted. > > The sputtering gun housing were clean before the sputtering, but after it looks like particles accumulated on the surface of the target! and eventually ended up in the housing and caused the short (picture attached) > > > Thank you. > > Best, > Saba > > > From: Jing Guo > > Sent: April 14, 2023 10:25 AM > To: Saba Sadeghi > > Cc: labnetwork at mtl.mit.edu > > Subject: Re: [labnetwork] Sputtering issue > > Hi Saba, > > Was the process a pure Ta sputtering or reactive sputtering? For a pure Ta DC power sputtering process, usually it shouldn?t generate that much particles. Ta coating on the sputter gun house/chimney should have a good adhesion. Any accumulated particles on the Ta target surface after ~ 2 hours sputtering? > > If the chimney or clamp ring for the target has been coated too much materials, you need to clean the whole kit and measure the gun to the ground layer by layer once you install a target. Another issue could be that some magnets got demagnetized which cannot provide strong magnetic field on the target surface. > > What was the strike condition, like pressure, power, gun voltage/current? Did you see whether the voltage/current can stabilize once the plasma was generated? > > There are several ways to figure out it is the sputter gun issue or a Ta target issue. Normally targets should be fine. > > Thanks. > > > > Best, > Jing > --------------------------------------- > Jing Guo Ph.D. > Research Scientist > SEA Cleanroom (SST 017) > Rice University > Houston, TX > jeanne.guo at rice.edu > 713-348-8227 > > > > > > > >> On Apr 13, 2023, at 6:55 PM, Saba Sadeghi > wrote: >> >> Dear Labnetwork community, >> >> I am having an issue with magnetron-sputtering of tantalum with DC power. After a few minutes of sputtering Ta glow spots appear on the surface of the target that eventually cause the plasma to distinguish. I have loaded two fresh 0.31?-thick Ta targets, but both times the same problem occurred, and both times it generated enough particles in a short amount of time ( about 2 hours of sputtering, accumulatively) that led to shorting of the source. >> >> I suspected that this might be a cooling issue, but there is enough flow rate at the sputtering source,and I use indium thin foil for thermal contact between the cathode and the target (recommended by the company- MeiVac). >> >> Have you experienced such a problem? I am wondering if this could be an issue with the sputtering source or could somehow the two Ta targets I loaded have been compromised? >> >> Thank you very much. >> >> Best regards, >> Saba Sadeghi >> IQC, University of Waterloo >> >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!kxlcKJiirMsFBnN6_pix8dvETfN-5vXnpaJXAA_4g3Jh5zmL_s-vuowA7xmr2s77ZKDztvk-khToRLa3a5M1qDmnShX9c4XwH0zL-Q$ > > > Get Outlook for Android _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!k2g1scR3qzaeb1tQiLClZN7JqMS_fLnM-wyk1ysARAGyBpfKIZWZuoqQZhz12L8yMBYH7O--WSID-TelN2s3r6647R5jRGI$ -------------- next part -------------- An HTML attachment was scrubbed... URL: From kckeenan at seas.upenn.edu Mon Apr 17 14:58:10 2023 From: kckeenan at seas.upenn.edu (Kyle Keenan) Date: Mon, 17 Apr 2023 14:58:10 -0400 Subject: [labnetwork] service (cleaning) for Ecosys Vector Ultra 3000 wet scrubber Message-ID: Hello All, I'm looking for recommendations for a company that can service/clean our Ecosys Vector Ultra 3000 wet scrubber. We purchased it from Trillium several years ago, however, they no longer have anyone available to service the unit. The scrubber is used for LPCVD & MOVCD chemistries. Thank you, -- Kyle Keenan Senior Manager - Laboratory Operations Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 -------------- next part -------------- An HTML attachment was scrubbed... URL: From minji at seas.ucla.edu Mon Apr 17 16:40:33 2023 From: minji at seas.ucla.edu (Minji) Date: Mon, 17 Apr 2023 13:40:33 -0700 Subject: [labnetwork] Sputtering issue In-Reply-To: <51AB45EB-5E81-4506-B4C9-7D95F13E3E40@rice.edu> References: <70A3D258-EC7F-4534-A275-539D7F366AA9@rice.edu> <51AB45EB-5E81-4506-B4C9-7D95F13E3E40@rice.edu> Message-ID: Hi Jing, >From my previous experience, this is most likely caused by the TaxOy isolation layer built on the surface of the target, which then brings a lot of arc to break down the dielectric layer. Trying to lower the base vacuum(Less O2 left in the chamber)before you send the Ar gas in will help, another way is switching the DC sputtering power supply to some kind of mid-Frequency power source, that will help to zero the accumulated voltage potential on the surface of the isolation layer. Many years ago, I designed a special pulsed sputtering power supply(adding a very short positive microsecond pulse on top of Negative sputtering voltage) which could solve the problem totally. Best, Minji ____________________________________________________________ Minji Zhu | Manager Center for High Frequency Electronics UCLA SAMUELI SCHOOL OF ENGINEERING 64-124 Eng IV, 420 Westwood PLZ Los Angeles, CA 90095-1600 O: 310.825.4940 / M: 310.807.6168 www.chfe.ee.ucla.edu On Mon, Apr 17, 2023 at 8:45?AM Jing Guo wrote: > > Hi Saba, > > The strike pressure (2e-3 mbar which is about 1.5 mTorr) sounds too low for me. Usually from my sputter system, the strike pressure would be 20~30 mTorr, then we would adjust it below 5 mTorr for deposition. > If the pressure is low, sometime there will be some difficulties to start the plasma. It might be the reason it cannot support the stable plasma status especially for brand new targets. > > If your system can show you the current, voltage for the sputter gun including ?50W?, you may be able to get more information once the plasma is struggling. > The flakes on the target could be generated by too much arching during the sputtering process. You could test a different easy target like Al on the same gun to see what is the performance. > > I also agree with Michael about the magnets. What does the magnet look like, a ring magnet? If you have a Gauss meter, you can check the magnets? condition. If not, check it as Micheal suggested. If the sputtered mark on the target is not a regular ring, you?d better check the magnets underneath. > > > > Best, > Jing > --------------------------------------- > Jing Guo Ph.D. > Research Scientist > SEA Cleanroom (SST 017) > Rice University > Houston, TX > jeanne.guo at rice.edu > 713-348-8227 > > > > > > > > On Apr 15, 2023, at 1:55 PM, Michael Yakimov wrote: > > I would check magnets' condition. Once upon a time, I had a ring magnet on a similar one to partially lose magnetization. The result was the strange shape of plasma and a few other funny things. Once removed, it was fairly obvious that the screwdriver sticks to some areas better than others. > > _______________________________________________ > Michael Yakimov > Research scientist > College of Nanoscale Science and Engineering > SUNY Polytechnic Institute > > > > 253 Fuller rd. > Albany NY 12203 > > > > Phone: 518-437-8609 lab > e-mail: yakimom at sunypoly.edu > > > > ________________________________ > From: labnetwork on behalf of Saba Sadeghi > Sent: Friday, April 14, 2023 4:15 PM > To: Jing Guo > Cc: labnetwork at mtl.mit.edu > Subject: Re: [labnetwork] Sputtering issue > > Hi Jing, > > > > Thanks a lot for getting back to me and the helpful discussion. > > > > This was a pure Ta sputtering. I could ignite the plasma at 50 W, 30 sccm Ar, 2E-3 mbar pressure but then the glow spots appear after a few minutes which led to the plasma extinguishing! I could reignite the plasma again by ramping down the power and then up to 50W! by the two hours of sputtering, I meant the sputtering collectively lasted two hours until it shorted. > > > > The sputtering gun housing were clean before the sputtering, but after it looks like particles accumulated on the surface of the target! and eventually ended up in the housing and caused the short (picture attached) > > > > > > Thank you. > > > > Best, > Saba > > > ________________________________ > From: Jing Guo > Sent: April 14, 2023 10:25 AM > To: Saba Sadeghi > Cc: labnetwork at mtl.mit.edu > Subject: Re: [labnetwork] Sputtering issue > > Hi Saba, > > Was the process a pure Ta sputtering or reactive sputtering? For a pure Ta DC power sputtering process, usually it shouldn?t generate that much particles. Ta coating on the sputter gun house/chimney should have a good adhesion. Any accumulated particles on the Ta target surface after ~ 2 hours sputtering? > > If the chimney or clamp ring for the target has been coated too much materials, you need to clean the whole kit and measure the gun to the ground layer by layer once you install a target. Another issue could be that some magnets got demagnetized which cannot provide strong magnetic field on the target surface. > > What was the strike condition, like pressure, power, gun voltage/current? Did you see whether the voltage/current can stabilize once the plasma was generated? > > There are several ways to figure out it is the sputter gun issue or a Ta target issue. Normally targets should be fine. > > Thanks. > > > > Best, > Jing > --------------------------------------- > Jing Guo Ph.D. > Research Scientist > SEA Cleanroom (SST 017) > Rice University > Houston, TX > jeanne.guo at rice.edu > 713-348-8227 > > > > > > > > On Apr 13, 2023, at 6:55 PM, Saba Sadeghi wrote: > > Dear Labnetwork community, > > I am having an issue with magnetron-sputtering of tantalum with DC power. After a few minutes of sputtering Ta glow spots appear on the surface of the target that eventually cause the plasma to distinguish. I have loaded two fresh 0.31?-thick Ta targets, but both times the same problem occurred, and both times it generated enough particles in a short amount of time ( about 2 hours of sputtering, accumulatively) that led to shorting of the source. > > I suspected that this might be a cooling issue, but there is enough flow rate at the sputtering source,and I use indium thin foil for thermal contact between the cathode and the target (recommended by the company- MeiVac). > > Have you experienced such a problem? I am wondering if this could be an issue with the sputtering source or could somehow the two Ta targets I loaded have been compromised? > > Thank you very much. > > Best regards, > Saba Sadeghi > IQC, University of Waterloo > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!kxlcKJiirMsFBnN6_pix8dvETfN-5vXnpaJXAA_4g3Jh5zmL_s-vuowA7xmr2s77ZKDztvk-khToRLa3a5M1qDmnShX9c4XwH0zL-Q$ > > > > Get Outlook for Android > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!k2g1scR3qzaeb1tQiLClZN7JqMS_fLnM-wyk1ysARAGyBpfKIZWZuoqQZhz12L8yMBYH7O--WSID-TelN2s3r6647R5jRGI$ > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork From saba.sadeghi at uwaterloo.ca Wed Apr 19 11:37:50 2023 From: saba.sadeghi at uwaterloo.ca (Saba Sadeghi) Date: Wed, 19 Apr 2023 15:37:50 +0000 Subject: [labnetwork] Sputtering issue In-Reply-To: References: <70A3D258-EC7F-4534-A275-539D7F366AA9@rice.edu> <51AB45EB-5E81-4506-B4C9-7D95F13E3E40@rice.edu> Message-ID: Thanks so much for everyone?s helpful feedback and contribution to this discussion. Here is the summary of the responses I received: 1. Check the magnetic field strength of the magnets 2. Use a thinner target (the Ta target I?ve been using 0.31? thick) 3. Use a conductive elastomer between the cathode and the target (I used indium foil that was suggested by the manufacturer) 4. There might be a chance of tantalum oxide on the surface of the target that one can get rid of by using pulsed DC 5. Make sure the housing is clean (This is a very valid concern but since the sputtering gun I am using have never been used it is not the case for me, the picture I attached that shows the particles were generated during the sputtering of the tantalum) 6. Test the sputtering gun with another material Best, Saba ________________________________ From: Minji Sent: April 17, 2023 4:40 PM To: Jing Guo Cc: Michael Yakimov ; Saba Sadeghi ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Sputtering issue Hi Jing, From my previous experience, this is most likely caused by the TaxOy isolation layer built on the surface of the target, which then brings a lot of arc to break down the dielectric layer. Trying to lower the base vacuum(Less O2 left in the chamber)before you send the Ar gas in will help, another way is switching the DC sputtering power supply to some kind of mid-Frequency power source, that will help to zero the accumulated voltage potential on the surface of the isolation layer. Many years ago, I designed a special pulsed sputtering power supply(adding a very short positive microsecond pulse on top of Negative sputtering voltage) which could solve the problem totally. Best, Minji ____________________________________________________________ Minji Zhu | Manager Center for High Frequency Electronics UCLA SAMUELI SCHOOL OF ENGINEERING 64-124 Eng IV, 420 Westwood PLZ Los Angeles, CA 90095-1600 O: 310.825.4940 / M: 310.807.6168 www.chfe.ee.ucla.edu On Mon, Apr 17, 2023 at 8:45?AM Jing Guo wrote: > > Hi Saba, > > The strike pressure (2e-3 mbar which is about 1.5 mTorr) sounds too low for me. Usually from my sputter system, the strike pressure would be 20~30 mTorr, then we would adjust it below 5 mTorr for deposition. > If the pressure is low, sometime there will be some difficulties to start the plasma. It might be the reason it cannot support the stable plasma status especially for brand new targets. > > If your system can show you the current, voltage for the sputter gun including ?50W?, you may be able to get more information once the plasma is struggling. > The flakes on the target could be generated by too much arching during the sputtering process. You could test a different easy target like Al on the same gun to see what is the performance. > > I also agree with Michael about the magnets. What does the magnet look like, a ring magnet? If you have a Gauss meter, you can check the magnets? condition. If not, check it as Micheal suggested. If the sputtered mark on the target is not a regular ring, you?d better check the magnets underneath. > > > > Best, > Jing > --------------------------------------- > Jing Guo Ph.D. > Research Scientist > SEA Cleanroom (SST 017) > Rice University > Houston, TX > jeanne.guo at rice.edu > 713-348-8227 > > > > > > > > On Apr 15, 2023, at 1:55 PM, Michael Yakimov wrote: > > I would check magnets' condition. Once upon a time, I had a ring magnet on a similar one to partially lose magnetization. The result was the strange shape of plasma and a few other funny things. Once removed, it was fairly obvious that the screwdriver sticks to some areas better than others. > > _______________________________________________ > Michael Yakimov > Research scientist > College of Nanoscale Science and Engineering > SUNY Polytechnic Institute > > > > 253 Fuller rd. > Albany NY 12203 > > > > Phone: 518-437-8609 lab > e-mail: yakimom at sunypoly.edu > > > > ________________________________ > From: labnetwork on behalf of Saba Sadeghi > Sent: Friday, April 14, 2023 4:15 PM > To: Jing Guo > Cc: labnetwork at mtl.mit.edu > Subject: Re: [labnetwork] Sputtering issue > > Hi Jing, > > > > Thanks a lot for getting back to me and the helpful discussion. > > > > This was a pure Ta sputtering. I could ignite the plasma at 50 W, 30 sccm Ar, 2E-3 mbar pressure but then the glow spots appear after a few minutes which led to the plasma extinguishing! I could reignite the plasma again by ramping down the power and then up to 50W! by the two hours of sputtering, I meant the sputtering collectively lasted two hours until it shorted. > > > > The sputtering gun housing were clean before the sputtering, but after it looks like particles accumulated on the surface of the target! and eventually ended up in the housing and caused the short (picture attached) > > > > > > Thank you. > > > > Best, > Saba > > > ________________________________ > From: Jing Guo > Sent: April 14, 2023 10:25 AM > To: Saba Sadeghi > Cc: labnetwork at mtl.mit.edu > Subject: Re: [labnetwork] Sputtering issue > > Hi Saba, > > Was the process a pure Ta sputtering or reactive sputtering? For a pure Ta DC power sputtering process, usually it shouldn?t generate that much particles. Ta coating on the sputter gun house/chimney should have a good adhesion. Any accumulated particles on the Ta target surface after ~ 2 hours sputtering? > > If the chimney or clamp ring for the target has been coated too much materials, you need to clean the whole kit and measure the gun to the ground layer by layer once you install a target. Another issue could be that some magnets got demagnetized which cannot provide strong magnetic field on the target surface. > > What was the strike condition, like pressure, power, gun voltage/current? Did you see whether the voltage/current can stabilize once the plasma was generated? > > There are several ways to figure out it is the sputter gun issue or a Ta target issue. Normally targets should be fine. > > Thanks. > > > > Best, > Jing > --------------------------------------- > Jing Guo Ph.D. > Research Scientist > SEA Cleanroom (SST 017) > Rice University > Houston, TX > jeanne.guo at rice.edu > 713-348-8227 > > > > > > > > On Apr 13, 2023, at 6:55 PM, Saba Sadeghi wrote: > > Dear Labnetwork community, > > I am having an issue with magnetron-sputtering of tantalum with DC power. After a few minutes of sputtering Ta glow spots appear on the surface of the target that eventually cause the plasma to distinguish. I have loaded two fresh 0.31?-thick Ta targets, but both times the same problem occurred, and both times it generated enough particles in a short amount of time ( about 2 hours of sputtering, accumulatively) that led to shorting of the source. > > I suspected that this might be a cooling issue, but there is enough flow rate at the sputtering source,and I use indium thin foil for thermal contact between the cathode and the target (recommended by the company- MeiVac). > > Have you experienced such a problem? I am wondering if this could be an issue with the sputtering source or could somehow the two Ta targets I loaded have been compromised? > > Thank you very much. > > Best regards, > Saba Sadeghi > IQC, University of Waterloo > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!kxlcKJiirMsFBnN6_pix8dvETfN-5vXnpaJXAA_4g3Jh5zmL_s-vuowA7xmr2s77ZKDztvk-khToRLa3a5M1qDmnShX9c4XwH0zL-Q$ > > > > Get Outlook for Android > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!k2g1scR3qzaeb1tQiLClZN7JqMS_fLnM-wyk1ysARAGyBpfKIZWZuoqQZhz12L8yMBYH7O--WSID-TelN2s3r6647R5jRGI$ > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From rlc12 at cornell.edu Mon Apr 24 17:01:35 2023 From: rlc12 at cornell.edu (Rebecca Lee Vliet) Date: Mon, 24 Apr 2023 21:01:35 +0000 Subject: [labnetwork] June 2023 CNF TCN Short Course - REGISTRATION OPEN! Message-ID: Please post the attached flyer as well as share the announcement below with other members of the scientific communities. Thank you! CNF Technology & Characterization at the Nanoscale (CNF TCN) IN-PERSON Short Course June 6, 2022 - June 9, 2023 The CNF TCN will be held in-person Tuesday, June 6, 2023 - Friday, June 10, 2023. Each day offers lectures and laboratory demonstrations designed to impart a broad understanding of the science and technology required to undertake research in nanoscience. TCN is an ideal way for faculty, students, post docs and staff members to rapidly come up to speed in many of the technologies that users of the CNF need to employ. Members of the high tech business community will also find it an effective way to learn best practices for success in a nanofab environment. Attendance is open to the general scientific community. Note: The short course does not replace the three part training required to become a user of our facility. To become a CNF user, please visit the "Getting Started" link (https:cnf.cornell.edu/howto) on the CNF website. For more information and to register visit: https://cnf.cornell.edu/education/tcn [Text Description automatically generated] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 146975 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: REGISTER_JUNE-2023.jpg Type: image/jpeg Size: 146975 bytes Desc: REGISTER_JUNE-2023.jpg URL: From sieb at 4dlabs.ca Tue Apr 25 17:29:14 2023 From: sieb at 4dlabs.ca (Nathanael Sieb) Date: Tue, 25 Apr 2023 14:29:14 -0700 Subject: [labnetwork] publication acknowledgements Message-ID: <5f5905e2-42f2-dc9c-8885-5b114f4f5ce1@4dlabs.ca> Hi all, I have a question for the hive mind about publication acknowledgements.? As most of you do, at 4D LABS we require our users to include us in the acknowledgement section of publications resulting from work in our facility.? This is obviously helpful to show our impact but also helps us track publications through search terms.? It is also beneficial to our staff if they are acknowledged by name, but currently isn't a requirement. However, we don't have an easy way to make sure this is actually done.? While I'm sure most of our users are great, lately we have been finding some papers that left us out.? When asked about it, the responses varied from silence, to 'sorry I forgot', to 'I'm paying to access the facility'.? I don't have the ability to try to check every paper that might be coming out of here. So I'm curious, how do other labs deal with this?? Do you have any way to check or just hope for the best?? Do you send out reminders or just have the typical wording included on your websites or forms?? I'm open to any feedback you may have. Thanks, Nathanael *Nathanael Sieb * Director of Operations and Administration ?| 4D LABS Simon Fraser University 8888 University Dr., Burnaby, B.C. V5A 1S6 T: 778.782.8084?| F: 778.782.3765 | www.4dlabs.ca Facebook ?| Twitter ?| LinkedIn -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtang at stanford.edu Wed Apr 26 10:58:27 2023 From: mtang at stanford.edu (Mary Tang) Date: Wed, 26 Apr 2023 07:58:27 -0700 Subject: [labnetwork] publication acknowledgements In-Reply-To: <5f5905e2-42f2-dc9c-8885-5b114f4f5ce1@4dlabs.ca> References: <5f5905e2-42f2-dc9c-8885-5b114f4f5ce1@4dlabs.ca> Message-ID: <8570b1cd-08e4-4130-bce7-8ffff1e15fd0@stanford.edu> Hi Nathanael - Excellent question, as it's easier and cheaper to simulate a device than it is to build it, so we always need to demonstrate the value of our facilities in the research ecosystem. I can share what we do now (though will defer to Sara, our nano at stanford program manager who is managing the process this year) and would be glad to hear what others do.? Since we receive partial support from NSF, we provide a list of publications every year.? We currently use two approaches in parallel. 1. The libraries.? We work with a wonderful Project & Data manager in Stanford's Digital Libraries group who runs searches on various publications databases for us.? This is done in several rounds using keywords with decreasing specificity, which require increasing levels of human filtering.? For example, the first round is a search in the acknowledgements for our NSF award, "nano at stanford", "Stanford Nanofabrication Facility", and "Stanford Nano Shared Facilities" and other keywords (like staff names) that are uniquely associated with our enterprise.? These publications are accepted without further review.? The next round would be for additional publications from any and all of our labmembers that were not discovered in the first round.? For Stanford researchers, it's pretty easy to ensure uniqueness of individuals since the libraries have a database of ORCID's for Stanford students, faculty, and staff. For non-Stanford researchers, the search is done on their names and associated orgs (an additional step is needed to verify the standard name of the org.)? For this round, additional filters are needed to validate use of our facilities, such as "SNF" or "SNSF", where we need to be sure this indicates Stanford, rather than "Skilled Nursing Facility" or the "Swiss National Science Foundation" - though Sara found instances where "SNSF" meant both!).? Or names of equipment or capabilities which are fairly unique to our facilities.? This is actually a fun project, if you like puzzles and have the time, as you get to learn a lot about your facility, and the people and research areas you serve. 2.? The researchers.? We ask researchers to fill in an online survey form with their publications for the year, enticing them with drawings for gift cards for the local eatery.? It's amazing how many people are motivated by gift cards (and yes, the Coupa Cafe is a very popular and convenient spot.) To be honest, the bulk of what we get is already discovered in the first approach, but there are always some new treasures.? Most important, though, is building community awareness ("the winner in our drawing today is:? Jo Doe!? There's still time to submit your publications for tomorrow's drawing.? And please remember to credit our shared facilities in your next pub!") Our Libraries group is encouraging us (and other campus shared facilities) to make sure that everyone on staff has registered ORCID's.? This is part of an overall push for a cultural shift to use acknowledgements to credit staff and others who make significant contributions, but not at the co-author level.? The Libraries are also encouraging us to adopt RRID's (like ORCID's, but for non-personnel resources) for our individual facilities and even individual equipment.? RRID's are used more broadly in bio/pharma and can even be used to denote individual lot numbers of reagents, for those institutions with the diligence and wherewithal to ensure compliance, this kind of notebook-level detail is essential for data reproducibility. There are also time stamps associated with each RRID, so it can be used to identify the configuration individual piece of equipment at a specific time - provided people are diligent in documenting this info.? The idea is that RRID's would be part of the methods addendums and researchers' electronic notebooks. This kind of cyberinfrastructure would make it way easier to measure the impact of our facilities on the research enterprise -- someday in the not too distant future... I would love to hear what other facilities do -- and would welcome any discussions and thoughts about ORCID's and RRID's in facilities -- Cheers - Mary -- Mary X. Tang, Ph.D. Managing Director Stanford Nanofabrication Facility Paul G. Allen Building 420 Via Palou Mall Stanford, CA 94305 https://snf.stanford.edu mtang at stanford.edu On 4/25/2023 2:29 PM, Nathanael Sieb wrote: > > Hi all, > > I have a question for the hive mind about publication > acknowledgements.? As most of you do, at 4D LABS we require our users > to include us in the acknowledgement section of publications resulting > from work in our facility.? This is obviously helpful to show our > impact but also helps us track publications through search terms.? It > is also beneficial to our staff if they are acknowledged by name, but > currently isn't a requirement. > > However, we don't have an easy way to make sure this is actually > done.? While I'm sure most of our users are great, lately we have been > finding some papers that left us out.? When asked about it, the > responses varied from silence, to 'sorry I forgot', to 'I'm paying to > access the facility'.? I don't have the ability to try to check every > paper that might be coming out of here. > > So I'm curious, how do other labs deal with this?? Do you have any way > to check or just hope for the best?? Do you send out reminders or just > have the typical wording included on your websites or forms?? I'm open > to any feedback you may have. > > Thanks, > > Nathanael > > *Nathanael Sieb * > Director of Operations and Administration ?| 4D LABS > > Simon Fraser University > 8888 University Dr., Burnaby, B.C. V5A 1S6 > T: 778.782.8084?| F: 778.782.3765 | www.4dlabs.ca > Facebook ?| Twitter > ?| LinkedIn > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From welander at slac.stanford.edu Thu Apr 27 16:23:53 2023 From: welander at slac.stanford.edu (Welander, Paul B.) Date: Thu, 27 Apr 2023 20:23:53 +0000 Subject: [labnetwork] Job Posting: DMF Lab Manager @ SLAC Message-ID: Colleagues, please see the job posting below, and forward to any potential candidates in your network: The Detector Microfabrication Facility (DMF) at SLAC National Accelerator Laboratory in Menlo Park, CA, is a new 5,500-square-foot class-100 cleanroom with a toolset dedicated to fabrication and metrology of superconducting materials and devices. The focus of the lab manager position will be initially to assist with the build-out and commissioning of DMF, including assistance in tool acceptance and installation, and establishment of safety protocols for tool start-up, commissioning, and operations. During this phase, the lab manager will report to the DMF construction project organization. Completion of the DMF cleanroom is expected in 2024, after which the lab manager will turn to facility operations, with responsibilities including safety and training protocols, facility and tool maintenance programs, and hazardous material handling. Once operations commence, the lab manager will report under the DMF operations organization. Learn more and apply Thanks! Paul ****************************************** Paul B. Welander, Ph.D. Technology Innovation Directorate SLAC National Accelerator Laboratory 2575 Sand Hill Road, M/S 94 Menlo Park, CA 94025 ****************************************** -------------- next part -------------- An HTML attachment was scrubbed... URL: