From swagone at gmu.edu  Wed Feb  1 07:22:52 2023
From: swagone at gmu.edu (Shawn Wagoner)
Date: Wed, 1 Feb 2023 12:22:52 +0000
Subject: [labnetwork] Question about DC sputtering of zinc
In-Reply-To: <SA2PR11MB4873AB280451150B96DCC1FA88D39@SA2PR11MB4873.namprd11.prod.outlook.com>
References: <SA2PR11MB4873AB280451150B96DCC1FA88D39@SA2PR11MB4873.namprd11.prod.outlook.com>
Message-ID: <BYAPR05MB4647FB0B4EAA7BD09940AFB1B9D19@BYAPR05MB4647.namprd05.prod.outlook.com>

I would not allow Zinc in any system I ran at Binghamton University.  I would not even allow it in the cleanroom.  It represents a significant contamination risk for shared use facilities.  If I were fortunate enough to have two systems, one clean and one "dirty", I might consider it in the dirty system.  Its vapor pressure is so high I am not sure there is much you can do to cover it up with Ti.

Shawn

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Malhotra, Sandra Guy
Sent: Monday, January 30, 2023 4:40 PM
To: Fab Network <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Question about DC sputtering of zinc

Howdy All from AggieFab,
We have a user who requested permission to sputter zinc in our shared Lesker PVD75 DC sputtering tool.  On the Lesker website, there is the following note:

"This material has a relatively high vapor pressure at low temperatures which can cause ppm level contamination in the chamber and subsequent films. Careful consideration should be taken before this material is used in any deposition system. For this reason, some users prefer to use only dedicated vacuum chambers for deposition."

I'd like to ask the group if they allow zinc depositions in their shared tools if they follow it by a thorough paste with another material, like Ti? Or if this material is prohibited because it is problematic.

Thanks in advance for any inputs you may have.

Best,

Sandra G. Malhotra, Ph.D.  |  Technical Lab Manager

AggieFab Nanofabrication Facility
https://aggiefab.tamu.edu/<https://nam11.safelinks.protection.outlook.com/?url=https%3A%2F%2Faggiefab.tamu.edu%2F&data=05%7C01%7Cswagone%40gmu.edu%7C701883f7c7244957be4108db03237a96%7C9e857255df574c47a0c00546460380cb%7C0%7C0%7C638107223189605602%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C2000%7C%7C%7C&sdata=Qvwl9IyHCzbpDHi%2BTs1FZrY65j79ftUQV83kJBELqLg%3D&reserved=0>
Department of Electrical & Computer Engineering, College of Engineering | Texas A&M University
3253 TAMU | College Station, TX 77843
ph: 979.845.3199  |  sandra.malhotra at tamu.edu<mailto:sandra.malhotra at tamu.edu>
- - - - - - - - - - - - - - - - - - - - - - - -
TEXAS A&M UNIVERSITY | FEARLESS on Every Front

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From yakimom at sunypoly.edu  Wed Feb  1 10:20:51 2023
From: yakimom at sunypoly.edu (Michael Yakimov)
Date: Wed, 1 Feb 2023 15:20:51 +0000
Subject: [labnetwork] Question about DC sputtering of zinc
In-Reply-To: <BYAPR05MB4647FB0B4EAA7BD09940AFB1B9D19@BYAPR05MB4647.namprd05.prod.outlook.com>
References: <SA2PR11MB4873AB280451150B96DCC1FA88D39@SA2PR11MB4873.namprd11.prod.outlook.com>
 <BYAPR05MB4647FB0B4EAA7BD09940AFB1B9D19@BYAPR05MB4647.namprd05.prod.outlook.com>
Message-ID: <BY3PR05MB8260F11BE403C1BDEE451009CED19@BY3PR05MB8260.namprd05.prod.outlook.com>

I would also ask if process goal can be achieved with zinc compound, like ZnO.

Thanks

Mike



________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Shawn Wagoner <swagone at gmu.edu>
Sent: Wednesday, February 1, 2023 7:22 AM
To: Malhotra, Sandra Guy <sandra.malhotra at tamu.edu>; Fab Network <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Question about DC sputtering of zinc


I would not allow Zinc in any system I ran at Binghamton University.  I would not even allow it in the cleanroom.  It represents a significant contamination risk for shared use facilities.  If I were fortunate enough to have two systems, one clean and one ?dirty?, I might consider it in the dirty system.  Its vapor pressure is so high I am not sure there is much you can do to cover it up with Ti.



Shawn



From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Malhotra, Sandra Guy
Sent: Monday, January 30, 2023 4:40 PM
To: Fab Network <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Question about DC sputtering of zinc



Howdy All from AggieFab,

We have a user who requested permission to sputter zinc in our shared Lesker PVD75 DC sputtering tool.  On the Lesker website, there is the following note:



"This material has a relatively high vapor pressure at low temperatures which can cause ppm level contamination in the chamber and subsequent films. Careful consideration should be taken before this material is used in any deposition system. For this reason, some users prefer to use only dedicated vacuum chambers for deposition."



I'd like to ask the group if they allow zinc depositions in their shared tools if they follow it by a thorough paste with another material, like Ti? Or if this material is prohibited because it is problematic.



Thanks in advance for any inputs you may have.



Best,



Sandra G. Malhotra, Ph.D.  |  Technical Lab Manager



AggieFab Nanofabrication Facility

https://aggiefab.tamu.edu/<https://nam11.safelinks.protection.outlook.com/?url=https%3A%2F%2Faggiefab.tamu.edu%2F&data=05%7C01%7Cswagone%40gmu.edu%7C701883f7c7244957be4108db03237a96%7C9e857255df574c47a0c00546460380cb%7C0%7C0%7C638107223189605602%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C2000%7C%7C%7C&sdata=Qvwl9IyHCzbpDHi%2BTs1FZrY65j79ftUQV83kJBELqLg%3D&reserved=0>

Department of Electrical & Computer Engineering, College of Engineering | Texas A&M University

3253 TAMU | College Station, TX 77843

ph: 979.845.3199  |  sandra.malhotra at tamu.edu<mailto:sandra.malhotra at tamu.edu>

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TEXAS A&M UNIVERSITY | FEARLESS on Every Front


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From James.Vlahakis at tufts.edu  Wed Feb  1 10:43:02 2023
From: James.Vlahakis at tufts.edu (Vlahakis, James)
Date: Wed, 1 Feb 2023 15:43:02 +0000
Subject: [labnetwork] [External]  Question about DC sputtering of zinc
In-Reply-To: <SA2PR11MB4873AB280451150B96DCC1FA88D39@SA2PR11MB4873.namprd11.prod.outlook.com>
References: <SA2PR11MB4873AB280451150B96DCC1FA88D39@SA2PR11MB4873.namprd11.prod.outlook.com>
Message-ID: <BYAPR05MB6598D812DBBD76BBCF0439FD9DD19@BYAPR05MB6598.namprd05.prod.outlook.com>

Hi Sandra, a few years ago we allowed Zn deposition in our "dirty" sputter tool without a heated platen. Consider the attached vapor pressure v Temp chart - at the temps seen in our tool the vapor pressure is below the system base pressure. Since that time we've noted no significant changes in base pressure and other users haven't complained about their films being lower quality.

Please take this with a grain of salt - Zn dep is not very common here, just a few times per year. In addition, our users are not fabricating CMOS devices, almost all are biomed focused these days

jim


From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Malhotra, Sandra Guy
Sent: Monday, January 30, 2023 4:40 PM
To: Fab Network <labnetwork at mtl.mit.edu>
Subject: [External] [labnetwork] Question about DC sputtering of zinc

Howdy All from AggieFab,
We have a user who requested permission to sputter zinc in our shared Lesker PVD75 DC sputtering tool.  On the Lesker website, there is the following note:

"This material has a relatively high vapor pressure at low temperatures which can cause ppm level contamination in the chamber and subsequent films. Careful consideration should be taken before this material is used in any deposition system. For this reason, some users prefer to use only dedicated vacuum chambers for deposition."

I'd like to ask the group if they allow zinc depositions in their shared tools if they follow it by a thorough paste with another material, like Ti? Or if this material is prohibited because it is problematic.

Thanks in advance for any inputs you may have.

Best,

Sandra G. Malhotra, Ph.D.  |  Technical Lab Manager

AggieFab Nanofabrication Facility
https://aggiefab.tamu.edu/
Department of Electrical & Computer Engineering, College of Engineering | Texas A&M University
3253 TAMU | College Station, TX 77843
ph: 979.845.3199  |  sandra.malhotra at tamu.edu<mailto:sandra.malhotra at tamu.edu>
- - - - - - - - - - - - - - - - - - - - - - - -
TEXAS A&M UNIVERSITY | FEARLESS on Every Front


Caution: This message originated from outside of the Tufts University organization. Please exercise caution when clicking links or opening attachments. When in doubt, email the TTS Service Desk at it at tufts.edu<mailto:it at tufts.edu> or call them directly at 617-627-3376.

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From odc1n08 at soton.ac.uk  Wed Feb  1 11:49:01 2023
From: odc1n08 at soton.ac.uk (Owain Clark)
Date: Wed, 1 Feb 2023 16:49:01 +0000
Subject: [labnetwork] Question about DC sputtering of zinc
In-Reply-To: <BYAPR05MB4647FB0B4EAA7BD09940AFB1B9D19@BYAPR05MB4647.namprd05.prod.outlook.com>
References: <SA2PR11MB4873AB280451150B96DCC1FA88D39@SA2PR11MB4873.namprd11.prod.outlook.com>
 <BYAPR05MB4647FB0B4EAA7BD09940AFB1B9D19@BYAPR05MB4647.namprd05.prod.outlook.com>
Message-ID: <CWXP265MB487612AD649280F4A5BB0FE0B0D19@CWXP265MB4876.GBRP265.PROD.OUTLOOK.COM>

Agreed, tried it once in a dirty evaporator and it makes a difficult to remove low density coating. Did evaporate ok with e-beam though.

Another cleanroom here less concerned about such things sputters it regularly for Zn doped Li Niobate applications. All depends what you want out of your shared tools.

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Shawn Wagoner
Sent: 01 February 2023 12:23
To: Malhotra, Sandra Guy <sandra.malhotra at tamu.edu>; Fab Network <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] Question about DC sputtering of zinc

CAUTION: This e-mail originated outside the University of Southampton.
I would not allow Zinc in any system I ran at Binghamton University.  I would not even allow it in the cleanroom.  It represents a significant contamination risk for shared use facilities.  If I were fortunate enough to have two systems, one clean and one "dirty", I might consider it in the dirty system.  Its vapor pressure is so high I am not sure there is much you can do to cover it up with Ti.

Shawn

From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Malhotra, Sandra Guy
Sent: Monday, January 30, 2023 4:40 PM
To: Fab Network <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: [labnetwork] Question about DC sputtering of zinc

Howdy All from AggieFab,
We have a user who requested permission to sputter zinc in our shared Lesker PVD75 DC sputtering tool.  On the Lesker website, there is the following note:

"This material has a relatively high vapor pressure at low temperatures which can cause ppm level contamination in the chamber and subsequent films. Careful consideration should be taken before this material is used in any deposition system. For this reason, some users prefer to use only dedicated vacuum chambers for deposition."

I'd like to ask the group if they allow zinc depositions in their shared tools if they follow it by a thorough paste with another material, like Ti? Or if this material is prohibited because it is problematic.

Thanks in advance for any inputs you may have.

Best,

Sandra G. Malhotra, Ph.D.  |  Technical Lab Manager

AggieFab Nanofabrication Facility
https://aggiefab.tamu.edu/<https://eur03.safelinks.protection.outlook.com/?url=https%3A%2F%2Faggiefab.tamu.edu%2F&data=05%7C01%7Codc1n08%40soton.ac.uk%7Cf768842984b24838cb2d08db0450d4e6%7C4a5378f929f44d3ebe89669d03ada9d8%7C0%7C0%7C638108517696830366%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C2000%7C%7C%7C&sdata=F%2FIJW1EiWWibsTx7iwdmFJBSYGo4%2F%2BlSkC8u%2F6dtk6I%3D&reserved=0>
Department of Electrical & Computer Engineering, College of Engineering | Texas A&M University
3253 TAMU | College Station, TX 77843
ph: 979.845.3199  |  sandra.malhotra at tamu.edu<mailto:sandra.malhotra at tamu.edu>
- - - - - - - - - - - - - - - - - - - - - - - -
TEXAS A&M UNIVERSITY | FEARLESS on Every Front

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From price.798 at osu.edu  Wed Feb  1 12:36:57 2023
From: price.798 at osu.edu (Price, Aimee)
Date: Wed, 1 Feb 2023 17:36:57 +0000
Subject: [labnetwork] Signatures with affiliation
Message-ID: <CH0PR01MB71390E29141F6970901B2671BCD19@CH0PR01MB7139.prod.exchangelabs.com>

Hi Labnetwork administrators,

Would it be possible to kindly ask those who post and who respond to include their affiliation in a signature block? It would be very helpful and instructive to know where and what type of institution was responding as that often matters, I.e. industry and academia are different, different regions have different needs, etc. You can't always tell the from tne email address or name alone.

Thank you,

Aimee

Aimee Bross Price
Manager, Nanofabrication
Nanotech West Lab
The Ohio State University

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From C.Heidelberger at ll.mit.edu  Wed Feb  1 12:59:57 2023
From: C.Heidelberger at ll.mit.edu (Heidelberger, Christopher - 0889 - MITLL)
Date: Wed, 1 Feb 2023 17:59:57 +0000
Subject: [labnetwork] Contract SiO2 Deposition on 300 mm Wafers
Message-ID: <SA1P110MB097371B798BEAF4E40433215BFD19@SA1P110MB0973.NAMP110.PROD.OUTLOOK.COM>

Hello,

 

Does anyone know of a business or other entity that does contract deposition
of SiO2 films on 300 mm wafers? I would like to have 50 nm SiO2 deposited by
PECVD on just two 300 mm Si wafers. It would need to be in a Au-free system.


 

Best,

Chris

 

-

Christopher Heidelberger, PhD
Technical Staff, Quantum Information and Integrated Nanosystems Group
MIT Lincoln Laboratory, 244 Wood Street, Lexington, MA 02421-6246
Phone: 781-981-9052 | Email: c.heidelberger at ll.mit.edu
<mailto:c.heidelberger at ll.mit.edu>  | he/him

 

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From lvchang at Central.UH.EDU  Wed Feb  1 14:02:00 2023
From: lvchang at Central.UH.EDU (Chang, Long)
Date: Wed, 1 Feb 2023 19:02:00 +0000
Subject: [labnetwork] Question about DC sputtering of zinc
In-Reply-To: <BY3PR05MB8260F11BE403C1BDEE451009CED19@BY3PR05MB8260.namprd05.prod.outlook.com>
References: <SA2PR11MB4873AB280451150B96DCC1FA88D39@SA2PR11MB4873.namprd11.prod.outlook.com>
 <BYAPR05MB4647FB0B4EAA7BD09940AFB1B9D19@BYAPR05MB4647.namprd05.prod.outlook.com>
 <BY3PR05MB8260F11BE403C1BDEE451009CED19@BY3PR05MB8260.namprd05.prod.outlook.com>
Message-ID: <8F0F4660-12C7-497E-AF80-8853B535CB87@central.uh.edu>

Hi All,

Does anyone have a list of banned materials for sputtering they can share? I made a list over the years through discussions on labnetwork whenever a new material gets requested, see attached photo. It?ll be nice to have a publicly searchable database, similar to this google sheet (https://docs.google.com/spreadsheets/d/1z0iyCsDUTpi6nkhtIxSp_rSMKGF4jeiqGbVRfnF5CRk).

Thanks,
Long
[cid:DDECC2FB-B7D7-4A97-BBFD-B712E4A2427F]
On Feb 1, 2023, at 9:20 AM, Michael Yakimov <yakimom at sunypoly.edu<mailto:yakimom at sunypoly.edu>> wrote:

I would also ask if process goal can be achieved with zinc compound, like ZnO.

Thanks

Mike



________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> on behalf of Shawn Wagoner <swagone at gmu.edu<mailto:swagone at gmu.edu>>
Sent: Wednesday, February 1, 2023 7:22 AM
To: Malhotra, Sandra Guy <sandra.malhotra at tamu.edu<mailto:sandra.malhotra at tamu.edu>>; Fab Network <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: Re: [labnetwork] Question about DC sputtering of zinc

I would not allow Zinc in any system I ran at Binghamton University.  I would not even allow it in the cleanroom.  It represents a significant contamination risk for shared use facilities.  If I were fortunate enough to have two systems, one clean and one ?dirty?, I might consider it in the dirty system.  Its vapor pressure is so high I am not sure there is much you can do to cover it up with Ti.



Shawn



From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Malhotra, Sandra Guy
Sent: Monday, January 30, 2023 4:40 PM
To: Fab Network <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: [labnetwork] Question about DC sputtering of zinc



Howdy All from AggieFab,
We have a user who requested permission to sputter zinc in our shared Lesker PVD75 DC sputtering tool.  On the Lesker website, there is the following note:



"This material has a relatively high vapor pressure at low temperatures which can cause ppm level contamination in the chamber and subsequent films. Careful consideration should be taken before this material is used in any deposition system. For this reason, some users prefer to use only dedicated vacuum chambers for deposition."



I'd like to ask the group if they allow zinc depositions in their shared tools if they follow it by a thorough paste with another material, like Ti? Or if this material is prohibited because it is problematic.



Thanks in advance for any inputs you may have.



Best,



Sandra G. Malhotra, Ph.D.  |  Technical Lab Manager



AggieFab Nanofabrication Facility
https://aggiefab.tamu.edu/<https://urldefense.com/v3/__https://nam11.safelinks.protection.outlook.com/?url=https*3A*2F*2Faggiefab.tamu.edu*2F&data=05*7C01*7Cswagone*40gmu.edu*7C701883f7c7244957be4108db03237a96*7C9e857255df574c47a0c00546460380cb*7C0*7C0*7C638107223189605602*7CUnknown*7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0*3D*7C2000*7C*7C*7C&sdata=Qvwl9IyHCzbpDHi*2BTs1FZrY65j79ftUQV83kJBELqLg*3D&reserved=0__;JSUlJSUlJSUlJSUlJSUlJSUlJSUl!!LkSTlj0I!Aesqckjzk4BJyH4BTgx7gpd2zSbcvoD0aNb_4EiUCkoLdUYfIvVH6gEOcN2-6xdSIojkXl2Q3CtgiyRTh1NKZUsvgQ$>
Department of Electrical & Computer Engineering, College of Engineering | Texas A&M University
3253 TAMU | College Station, TX 77843
ph: 979.845.3199  |  sandra.malhotra at tamu.edu<mailto:sandra.malhotra at tamu.edu>
- - - - - - - - - - - - - - - - - - - - - - - -
TEXAS A&M UNIVERSITY | FEARLESS on Every Front



_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!LkSTlj0I!Aesqckjzk4BJyH4BTgx7gpd2zSbcvoD0aNb_4EiUCkoLdUYfIvVH6gEOcN2-6xdSIojkXl2Q3CtgiyRTh1O4DIsD2Q$

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From beaudoin at physics.ubc.ca  Wed Feb  1 14:07:43 2023
From: beaudoin at physics.ubc.ca (Beaudoin, Mario)
Date: Wed, 1 Feb 2023 11:07:43 -0800
Subject: [labnetwork] Question: adhesion of metal to BPDA/PPD polyimide
Message-ID: <3d0e9163-6746-d694-7209-b84abc4598be@physics.ubc.ca>

Dear Networkers,

I'm new to polyimide processing.? We have a student project that 
requires deposition of metal on polyimide (BPDA/PPD PI-2600 series from 
HD microsystems).? We tried liftoff with depositon of Ti/Pt by Ebeam.? 
Despite a 1min O2 plasma, albeit at low power, the metal was peeling 
off.? Moreover, the photoresist was also peeling off from the 
polyimide.? Does anyone have a good working recipe for metalization of 
polyimide?

Thanks,

Mario

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From skooi at mit.edu  Wed Feb  1 15:30:48 2023
From: skooi at mit.edu (Steven Earl Kooi)
Date: Wed, 1 Feb 2023 20:30:48 +0000
Subject: [labnetwork] Job posting - Instrumentation Specialist
Message-ID: <A0B55F72-E293-427B-813C-E15A566BFFD5@mit.edu>

Hello,

The Institute for Soldier Nanotechnologies (ISN) at MIT has an open position for an "Instrumentation Specialist?. We are looking for someone interested in hands-on daily responsibility for user training, operation, and maintenance for a range of instruments (e.g., microscopy; spectroscopy; optical, thermal and mechanical characterization) in our research facility.

Anyone interested can find out more about the position and apply at:

<https://careers.peopleclick.com/careerscp/client_mit/external/jobDetails/jobDetail.html?jobPostId=26311&localeCode=en-us>
[reach-5c9f84a028.jpeg]
Instrumentation Specialist<https://careers.peopleclick.com/careerscp/client_mit/external/jobDetails/jobDetail.html?jobPostId=26311&localeCode=en-us>
careers.peopleclick.com<https://careers.peopleclick.com/careerscp/client_mit/external/jobDetails/jobDetail.html?jobPostId=26311&localeCode=en-us>




Best,

Steve.

Steven Kooi, Ph.D.
Principal Research Scientist
Institute for Soldier Nanotechnologies
Massachusetts Institute of Technology

Phone: 617-324-6416
Email: skooi at mit.edu<mailto:skooi at mit.edu>

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From bill_flounders at berkeley.edu  Wed Feb  1 16:51:11 2023
From: bill_flounders at berkeley.edu (Albert William (Bill) Flounders)
Date: Wed, 1 Feb 2023 13:51:11 -0800
Subject: [labnetwork] Signatures with affiliation
In-Reply-To: <CH0PR01MB71390E29141F6970901B2671BCD19@CH0PR01MB7139.prod.exchangelabs.com>
References: <CH0PR01MB71390E29141F6970901B2671BCD19@CH0PR01MB7139.prod.exchangelabs.com>
Message-ID: <CAHxjSh=dT4TWkf6EFDNUNmi03_xyeupHp=Ovx6mO-JSVfA7guQ@mail.gmail.com>

Aimee,
Thank you for this excellent etiquette recommendation.
I have also requested that the exceptional moderator of LabNetwork
consider adding this guideline to the Lab Network sign up page.
Sincerely,
Bill

Bill Flounders
UC Berkeley NanoLab
https://nanolab.berkeley.edu/

On Wed, Feb 1, 2023 at 12:48 PM Price, Aimee <price.798 at osu.edu> wrote:

> Hi Labnetwork administrators,
>
> Would it be possible to kindly ask those who post and who respond to
> include their affiliation in a signature block? It would be very helpful
> and instructive to know where and what type of institution was responding
> as that often matters, I.e. industry and academia are different, different
> regions have different needs, etc. You can't always tell the from tne
> email address or name alone.
>
> Thank you,
>
> Aimee
>
> Aimee Bross Price
> Manager, Nanofabrication
> Nanotech West Lab
> The Ohio State University
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From Khaled.Mnaymneh at nrc-cnrc.gc.ca  Wed Feb  1 20:59:15 2023
From: Khaled.Mnaymneh at nrc-cnrc.gc.ca (Mnaymneh, Khaled)
Date: Thu, 2 Feb 2023 01:59:15 +0000
Subject: [labnetwork] Postdoctoral Fellowship, Silicon Nitride Platform
Message-ID: <eb818f564b2e4c20b825c6c73d93c4d7@DC01ZWH0011.Corp.nrc.gc.ca>

Hi All,

Please distribute to interested parties and networks.

Cheers,
Khaled.

Postdoctoral Fellowship, A Canadian-Based Silicon Nitride Platform (nrc-cnrc.gc.ca)<https://recruitment-recrutement.nrc-cnrc.gc.ca/job/Ottawa-Postdoctoral-Fellowship%2C-A-Canadian-Based-Silicon-Nitride-Platform-ON/567307317/>

This project will establish a silicon-nitride platform for optical devices targeting classical and quantum applications. Silicon nitride is set to be the new "silicon" for the world's next-generation photonic technologies. Because we are in early days of adaption, there is an excellent opportunity to shape Canada's nitride platform in a unique way and to be an international trendsetter. Continuing to build upon current material and device research, the successful applicant will be expected to lead design, fabrication and characterization efforts in silicon nitride photonics and phononics. Specifically, this will entail a Quantum-Optics-Lab-On-A-Chip approach; design, fabricate and characterize chip components that perform and process optical information. Working with our university partner, you will perform a careful study of film-material parameters; more specifically, the refractive index of highly stoichiometric Si3N4, and how it governs the dispersion engineering and nonlinear optical qualities needed to achieve on-chip all-optical performance.

Education
PhD in Physics, Electrical Engineering, Engineering Physics or a relevant Engineering field.
For information on certificates and diplomas issued abroad, please see Degree equivalency

Experience

  *   Hands-on nanofabrication and thin-film experience
  *   Knowledge of integrated optics and chip design, designing and constructing experimental apparatus
  *   Experience with lasers, non-linear optics, and detectors
  *   Experience with fiber optics
  *   Experience with cryostats, vacuum cryogenics would be considered as an asset

Language Requirements
English, Information on language requirements and self-assessment tests

Condition of Employment
Reliability Status

Who is eligible?

  *   Fellowships will be for two years contingent on satisfactory progress achieved during the first year.
  *   Candidates should have obtained a PhD (or equivalent) within the past three years (PhD received on or after July 1, 2020) or expect to complete their PhD within 6 months of appointment.
  *   Fellows will work in a lab under the direct supervision of an NRC researcher.

Application Requirements
In order to be considered for the program please include the following in your application, please note that you will need to attach the required documents as per the list below when submitting your application. Failure to do so will result in your application being excluded from searches.


  *   Resume
  *   Statement of Interest in the project (maximum one page in length)
  *   PhD Transcript - an electronic copy is sufficient, it does not have to be an official version.
  *   List of Publications

When submitting your application you can include the required documents in any attachment field such as ?Second language evaluation results? or ?Other attachments?

In addition, applicants who best meet the requirements of the position will be asked to provide three letters of recommendation at a later stage of the competition process.

Relocation
Relocation assistance will be determined in accordance with the NRC's directives.

Compensation
The intent of this hiring action is to staff through the Postdoctoral Fellowships Program at the RCO-2/AsRO level, which is an early-career level position with a salary range of $74,230 to $103,093.

NOTE: Salary determination will be based on a review of the candidate's expertise, outcomes and impacts of their previous work experience relative to the requirements of the level. As a guide, the current annual PhD recruiting rate is $74,230.

NRC employees enjoy a wide-range of competitive benefits including comprehensive health and dental plans, pension and insurance plans, vacation and other leave entitlements.

Notes

  *   Fellowships are open to nationals of all countries, although preference will be given to Canadian Citizens and Permanent Residents of Canada. Please include citizenship information in your application.
  *   The incumbent must adhere to safe workplace practices at all times.
  *   We thank all those who apply, however only those selected for further consideration will be contacted.

Please direct your questions, with the requisition number (18898) to:
E-mail: NRC.NRCHiring-EmbaucheCNRC.CNRC at nrc-cnrc.gc.ca
Telephone: 343-548-5849

Closing Date: 27 March 2023 - 23:59 Eastern Time


--
Dr Khaled Mnaymneh, PEng
Senior Staff Scientist, National Research Council Canada
Adjunct Research Professor, Carleton University

This message and any attachments may contain confidential and privileged material classified as "Protected A" and is for the sole use of the intended recipient. Any review, use, distribution or disclosure by (or to) others is strictly prohibited. If you are not the intended recipient (or authorized to receive for the recipient), please contact the sender by reply email and delete all copies of this message. Thank You.

Ce message et toute pi?ce jointe connexe pourraient contenir de l'information confidentielle ou privil?gi?e d?sign?e ? Prot?g? A ?. Ils s'adressent exclusivement ? leur destinataire. L'examen, l'utilisation, la distribution et la communication de ce message par ou ? d'autres personnes sont strictement interdits. Si ce message ne vous est pas destin? (ou si vous n'avez pas l'autorisation expresse de le recevoir au nom du destinataire), veuillez contacter l'exp?diteur en r?pondant ? ce courriel et d?truire toute copie du message. Merci.

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From reet at dtu.dk  Thu Feb  2 05:35:31 2023
From: reet at dtu.dk (Rebecca Bolt Ettlinger)
Date: Thu, 2 Feb 2023 10:35:31 +0000
Subject: [labnetwork] [External]  Question about DC sputtering of zinc
In-Reply-To: <BYAPR05MB6598D812DBBD76BBCF0439FD9DD19@BYAPR05MB6598.namprd05.prod.outlook.com>
References: <SA2PR11MB4873AB280451150B96DCC1FA88D39@SA2PR11MB4873.namprd11.prod.outlook.com>
 <BYAPR05MB6598D812DBBD76BBCF0439FD9DD19@BYAPR05MB6598.namprd05.prod.outlook.com>
Message-ID: <4166ef25910444038e5ec4b00007263d@dtu.dk>

Hi Sandra,

We have allowed Zn in a thermal evaporator here at DTU Nanolab (a multi-user university facility). We didn't allow it in our sputter systems as we were concerned about the cryo pumps on those systems being overloaded. Zn was not so easy to control in thermal evaporation and we concluded that the optimal solution would be sputtering in a dedicated system with a turbo pump.

After evaporation of course Zn was all over the chamber so it required thorough cleaning and also several "bakeout" evaporation runs of Al to get rid of Zn in the deposited layers (we usually use the evaporator for Al and Ag and the chamber gets heated most from the Al evaporation). We checked the deposited Al for traces of Zn by XPS before and after allowing Zn in the chamber and eventually got back to a state where the Zn was not detectable by XPS. We have had no user complaints afterwards but are wary of letting future users deposit Zn again because of the work involved to clean it out and check whether it is gone.

All the best,
Rebecca

Process specialist at DTU Nanolab, Technical University of Denmark

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Vlahakis, James
Sent: 1. februar 2023 16:43
To: Malhotra, Sandra Guy <sandra.malhotra at tamu.edu>; Fab Network <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] [External] Question about DC sputtering of zinc

Hi Sandra, a few years ago we allowed Zn deposition in our "dirty" sputter tool without a heated platen. Consider the attached vapor pressure v Temp chart - at the temps seen in our tool the vapor pressure is below the system base pressure. Since that time we've noted no significant changes in base pressure and other users haven't complained about their films being lower quality.

Please take this with a grain of salt - Zn dep is not very common here, just a few times per year. In addition, our users are not fabricating CMOS devices, almost all are biomed focused these days

jim


From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Malhotra, Sandra Guy
Sent: Monday, January 30, 2023 4:40 PM
To: Fab Network <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: [External] [labnetwork] Question about DC sputtering of zinc

Howdy All from AggieFab,
We have a user who requested permission to sputter zinc in our shared Lesker PVD75 DC sputtering tool.  On the Lesker website, there is the following note:

"This material has a relatively high vapor pressure at low temperatures which can cause ppm level contamination in the chamber and subsequent films. Careful consideration should be taken before this material is used in any deposition system. For this reason, some users prefer to use only dedicated vacuum chambers for deposition."

I'd like to ask the group if they allow zinc depositions in their shared tools if they follow it by a thorough paste with another material, like Ti? Or if this material is prohibited because it is problematic.

Thanks in advance for any inputs you may have.

Best,

Sandra G. Malhotra, Ph.D.  |  Technical Lab Manager

AggieFab Nanofabrication Facility
https://aggiefab.tamu.edu/
Department of Electrical & Computer Engineering, College of Engineering | Texas A&M University
3253 TAMU | College Station, TX 77843
ph: 979.845.3199  |  sandra.malhotra at tamu.edu<mailto:sandra.malhotra at tamu.edu>
- - - - - - - - - - - - - - - - - - - - - - - -
TEXAS A&M UNIVERSITY | FEARLESS on Every Front



Caution: This message originated from outside of the Tufts University organization. Please exercise caution when clicking links or opening attachments. When in doubt, email the TTS Service Desk at it at tufts.edu<mailto:it at tufts.edu> or call them directly at 617-627-3376.


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From renato.beraldo at hotmail.com  Thu Feb  2 11:44:49 2023
From: renato.beraldo at hotmail.com (Renato Massaroto Beraldo)
Date: Thu, 2 Feb 2023 16:44:49 +0000
Subject: [labnetwork] Help with technical manual
Message-ID: <DM5PR02MB325707CA070F5540F1EC767391D69@DM5PR02MB3257.namprd02.prod.outlook.com>

Hello, can you have a technical manual from JETFIRST 150  ?


I saw your messagen in a internet page https://mtl.mit.edu/pipermail/labnetwork/2021-November/005093.html

And I'm trying to get this manual.

Best regards.
Ph.D. Canditade - Renato M. Beraldo - Metal Thin film Dep. Division
UNICAMP University - Brazil
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From grallion at ncsu.edu  Fri Feb  3 11:04:59 2023
From: grallion at ncsu.edu (Greg Allion)
Date: Fri, 3 Feb 2023 11:04:59 -0500
Subject: [labnetwork] Semiconductor Research Engineer positions opening
Message-ID: <CAAFf2sBMDmZ7t30DfqeqsHr25b7n+riv2oUG3sVi5XX1primqw@mail.gmail.com>

Greetings Colleagues,

Please forward this to any potential candidates that may come to mind.

I?m pleased to announce that the North Carolina State University
Nanofabrication Facility (NNF) is expanding.

We will be filling two positions for process engineers.  The ideal
candidate will have a strong background with either plasma/dry etch or
Lithography and be familiar with other semiconductor fab processing
capabilities.  Processing experience with wide band gap materials is also
highly desirable.

NNF is located in Raleigh at the eastern tip of the Research Triangle which
is defined by the top 3 research Universities in the state.  The triangle
area has become one of the largest research parks in the country and is one
of the fastest growing regions.  The Raleigh area offers an east coast
lifestyle, sunny ?winters?, and is still very close to a midwest cost of
living.  Raleigh is only a 2-3 hour drive from either mountains and beaches.



Please see the link to the job posting below and feel free to contact me
directly if you have any additional questions or issues accessing the job
posting.  A flyer is also attached with some additional details.

https://jobs.ncsu.edu/postings/178184

Best Regards,

Greg

-- 
Greg Allion
NC State University Nanofabrication Facility (NNF)
Process Integration Engineering Manager

Monteith Research Center
2410 Campus Shore Drive rm.243E
Raleigh, NC 27606
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From ana.n.cohen.ctr at army.mil  Fri Feb  3 14:59:49 2023
From: ana.n.cohen.ctr at army.mil (Cohen, Ana N CTR USARMY DEVCOM ARL (USA))
Date: Fri, 3 Feb 2023 19:59:49 +0000
Subject: [labnetwork] OSRAM 1000W Bulbs
Message-ID: <BN8P111MB1447D294436110F31147099B9FD79@BN8P111MB1447.NAMP111.PROD.OUTLOOK.COM>

Good afternoon Travis,

No spares here. Unfortunately, our lab has had a purchase of these bulbs on
back order for multiple years now. 

There's been some conversation on here about others stuck in similar
predicaments. Depending on how soon you need 1000W bulbs again, Ushio
usually has quickly available stock of their USH1000KS. They also recently
have started supplying USH1001KS bulbs that are supposed to more match the
1500hr lifetime of the Osram bulbs. If you're interested in using this
opportunity to retrofit your tool, there also are LED UV sources available.

(Also, if anyone has had any luck receiving orders from Osram again, please
let me know! I've taken a break from bothering the distributor for more
details, but I'll take it up again if other orders are coming in.)

Kindly,
Ana

--
Ana N. Cohen [she/her/hers]
Photolithography Cleanroom Technician
Contractor | General Technical Services, LLC
US Army Research Laboratory

--

[labnetwork] Suss MA06 Mask Aligner
Travis Venables venables at seas.upenn.edu
Mon Jan 30 13:06:13 EST 2023

Hello,

I am reaching out from UPENN's Quattrone Nanofabrication Facility. We have
recently ordered some spare bulbs for our MA06 mask aligner that seem to
have quite a long lead time. I was wondering if anyone had some spare units
that we could borrow and replace upon the receipt of our newly ordered
bulbs. Attached is a link to the specific bulb we are interested in. Thanks!

https://rstvisions.com/products/osram-69200-hbo-1000w-d?_pos=1&_sid=c03e23b8
2&_ss=r

-- 
Travis Venables

Lead Cleanroom Equipment Engineer
Quattrone Nanofabrication Facility
University of Pennsylvania
P: 215-898-1787
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From James.Grant at glasgow.ac.uk  Mon Feb  6 09:37:33 2023
From: James.Grant at glasgow.ac.uk (James Grant)
Date: Mon, 6 Feb 2023 14:37:33 +0000
Subject: [labnetwork] SPTS Rapier Module - Laser/White Light Interferometry
Message-ID: <LO2P302MB0043867A07D47A9DBB41821BB0DA9@LO2P302MB0043.GBRP302.PROD.OUTLOOK.COM>

Hello,

Hoping the community can feedback on their experiences.

In 2019 we purchased an SPTS Rapier DSiE tool. As well as doing Bosch processing we also require the tool to do mixed process etching. Quite a few of our users, on our other Si etch tools (OIPT Estrelas and STS Multiplex), use mixed process to etch SOI materials or a-Si on fused silica substrates. These systems have Intellemetrics LEP 410/500 red laser interferometer units for the purpose of end-point detection.

When we purchased the Rapier, SPTS did tell us that a laser end-point system could not be used. They encouraged us instead to use the Claritas OES system on the tool, however when we pointed out our typical use scenario (small substrate size, low % open area) they admitted that the Claritas would struggle to differentiate when to end-point. Our preferred laser interferometer vendor, Intellemetrics, say they have sold LEP 500 red laser interferometer units to SPTS but cannot say on what systems they have been used.

We have found that EPFL use white light interferometry<https://www.epfl.ch/research/facilities/cmi/equipment/etching/spts-rapier/> end-point detection on their Rapier module - have contacted Phillipe Fluckiger separately.

My question to the community is has anyone used a laser interferometry system on an SPTS Rapier? If so, could they feedback with their experiences. Apologies I'm asking such an open question!

Cheers,

James

Dr. James Paul Grant
Research Engineer in Plasma Processing

Plasma Processing Group
james.grant at glasgow.ac.uk<mailto:james.grant at glasgow.ac.uk>

 [cid:image001.png at 01D93A36.DE509BD0]
      www.JWNC.gla.ac.uk<http://www.jwnc.gla.ac.uk/>
[cid:image002.png at 01D93A36.DE509BD0]  LinkedIn.com/company/JWNC
[cid:image003.png at 01D93A36.DE509BD0]  @UofG_JWNC<https://twitter.com/uofg_jwnc>

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From massey21 at llnl.gov  Mon Feb  6 13:58:47 2023
From: massey21 at llnl.gov (Massey, Travis)
Date: Mon, 6 Feb 2023 18:58:47 +0000
Subject: [labnetwork] Question: adhesion of metal to BPDA/PPD polyimide
In-Reply-To: <3d0e9163-6746-d694-7209-b84abc4598be@physics.ubc.ca>
References: <3d0e9163-6746-d694-7209-b84abc4598be@physics.ubc.ca>
Message-ID: <BY5PR09MB5442BFB518C62303ADA6F2FBBBDA9@BY5PR09MB5442.namprd09.prod.outlook.com>

Hi Mario,

We use PI-2600 (2610 and 2611) extensively with Ti-Pt and Ti-Au metallization (sputtered).  Films are 2 um and 5 um, respectively.

Recipes and procedures are often tailored to specific toolsets and projects, so let?s start higher level with some general thoughts:


  1.  I suggest a vacuum dehydration bake before each film deposition ? so, before the polyimide and again before the metal.  We use our polyimide oven for this.  The dehydration bake before metal dep has had a marked impact on our metal adhesion.
  2.  Are you imizing your polyimide at >350 C under an inert (N2) atmosphere?  We do 375C because nothing in our stack is that temperature sensitive.  Occasionally our oven crashes before reaching 375C and I?ve seen bubbles beneath the metal and other issues down the line.  I?ve heard of some people curing the polyimide at lower temperatures, and while you can drive off all the solvent and get a mechanically stable film, the imidization may be incomplete.
  3.  Our process deviates from the datasheet on the softbake.  We softbake for 10 minutes at 95C (so, lower temp for longer time).  This is unusually cool for NMP drive-off, but the process has worked for our team since long before I arrived.  If your films are thicker, you may need to increase one parameter or the other.
  4.  Does your polyimide curing oven get used for organics other than polyimide?
  5.  I avoid adhesion promoters between Si and PI unless it?s strictly necessary (and it?s generally not, for my processes).  I view it as another variable and possible contaminant down the line ? this contamination possibility is why I bring it up here.  That said, others in my facility have used adhesion promoters for polyimide on glass without issue? but it?s good to reduce variables where you can.


I?m happy to discuss further if you have additional questions/issues or want a detailed procedure.

Best,
Travis Massey
Lawrence Livermore National Laboratory
7000 East Avenue, Livermore, CA 94550
925-422-9509 (desk)
925-495-7103 (work cell)
massey21 at llnl.gov<mailto:massey21 at llnl.gov>


From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Beaudoin, Mario
Sent: Wednesday, February 1, 2023 11:08 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Question: adhesion of metal to BPDA/PPD polyimide


Dear Networkers,

I'm new to polyimide processing.  We have a student project that requires deposition of metal on polyimide (BPDA/PPD PI-2600 series from HD microsystems).  We tried liftoff with depositon of Ti/Pt by Ebeam.  Despite a 1min O2 plasma, albeit at low power, the metal was peeling off.  Moreover, the photoresist was also peeling off from the polyimide.  Does anyone have a good working recipe for metalization of polyimide?

Thanks,

Mario
--
[cid:image001.jpg at 01D93A19.FC28DC70]
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From michael.rooks at yale.edu  Mon Feb  6 15:47:26 2023
From: michael.rooks at yale.edu (Michael Rooks)
Date: Mon, 6 Feb 2023 15:47:26 -0500
Subject: [labnetwork] job opening - yale nano
Message-ID: <CAMH=Voj__Xrfvnsw8eobeg6s8fg6aRT2H3JyiCAL4HNGedw_GA@mail.gmail.com>

Job opening at Yale University: e-beam lithography, electron microscopy,
and AFM in a shared core facility. New Haven CT (USA), BS-level or higher.

Check out the job posting here.
<https://sjobs.brassring.com/TGnewUI/Search/Home/Home?partnerid=25053&siteid=5248#jobDetails=1570595_5248>

--------------------------------
Michael Rooks
Yale University
nano.yale.edu
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From daniel.woodie at cornell.edu  Mon Feb  6 15:57:14 2023
From: daniel.woodie at cornell.edu (Dan P. Woodie)
Date: Mon, 6 Feb 2023 20:57:14 +0000
Subject: [labnetwork] Question: adhesion of metal to BPDA/PPD polyimide
In-Reply-To: <BY5PR09MB5442BFB518C62303ADA6F2FBBBDA9@BY5PR09MB5442.namprd09.prod.outlook.com>
References: <3d0e9163-6746-d694-7209-b84abc4598be@physics.ubc.ca>
 <BY5PR09MB5442BFB518C62303ADA6F2FBBBDA9@BY5PR09MB5442.namprd09.prod.outlook.com>
Message-ID: <BL0PR04MB4612EC999FB9E88614234AF3EFDA9@BL0PR04MB4612.namprd04.prod.outlook.com>

A solid cure of the polyimide is critical, as the imidization reaction releases water as a by-product, which will cause bubbling and delamination issues for any films over it. The challenge is that you never reach 100% curing as it is an asymptotic approach. So, you need to ensure that the cure is done at a sufficiently long enough time and high enough temperature that no further cross-linking will occur during any subsequent steps. You may want to also consider using Cyclotene from Dow instead of polyimide. It has many properties like polyimide but does not have any volatile byproducts from the cross linking, so issues like this mostly go away. I used it for my thesis electroplating copper into some thick structures and is an improvement on polyimide in many aspects.

Dan

Daniel Woodie
Interim Asst. Director of Facilities / Safety Manager / Facilities Engineer - (formerly an engineer at the Cornell NanoScale Facility)
College of Engineering

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Massey, Travis
Sent: Monday, February 6, 2023 1:59 PM
To: Beaudoin, Mario <beaudoin at physics.ubc.ca>; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Question: adhesion of metal to BPDA/PPD polyimide

Hi Mario,

We use PI-2600 (2610 and 2611) extensively with Ti-Pt and Ti-Au metallization (sputtered).  Films are 2 um and 5 um, respectively.

Recipes and procedures are often tailored to specific toolsets and projects, so let?s start higher level with some general thoughts:


  1.  I suggest a vacuum dehydration bake before each film deposition ? so, before the polyimide and again before the metal.  We use our polyimide oven for this.  The dehydration bake before metal dep has had a marked impact on our metal adhesion.
  2.  Are you imizing your polyimide at >350 C under an inert (N2) atmosphere?  We do 375C because nothing in our stack is that temperature sensitive.  Occasionally our oven crashes before reaching 375C and I?ve seen bubbles beneath the metal and other issues down the line.  I?ve heard of some people curing the polyimide at lower temperatures, and while you can drive off all the solvent and get a mechanically stable film, the imidization may be incomplete.
  3.  Our process deviates from the datasheet on the softbake.  We softbake for 10 minutes at 95C (so, lower temp for longer time).  This is unusually cool for NMP drive-off, but the process has worked for our team since long before I arrived.  If your films are thicker, you may need to increase one parameter or the other.
  4.  Does your polyimide curing oven get used for organics other than polyimide?
  5.  I avoid adhesion promoters between Si and PI unless it?s strictly necessary (and it?s generally not, for my processes).  I view it as another variable and possible contaminant down the line ? this contamination possibility is why I bring it up here.  That said, others in my facility have used adhesion promoters for polyimide on glass without issue? but it?s good to reduce variables where you can.


I?m happy to discuss further if you have additional questions/issues or want a detailed procedure.

Best,
Travis Massey
Lawrence Livermore National Laboratory
7000 East Avenue, Livermore, CA 94550
925-422-9509 (desk)
925-495-7103 (work cell)
massey21 at llnl.gov<mailto:massey21 at llnl.gov>


From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Beaudoin, Mario
Sent: Wednesday, February 1, 2023 11:08 AM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] Question: adhesion of metal to BPDA/PPD polyimide


Dear Networkers,

I'm new to polyimide processing.  We have a student project that requires deposition of metal on polyimide (BPDA/PPD PI-2600 series from HD microsystems).  We tried liftoff with depositon of Ti/Pt by Ebeam.  Despite a 1min O2 plasma, albeit at low power, the metal was peeling off.  Moreover, the photoresist was also peeling off from the polyimide.  Does anyone have a good working recipe for metalization of polyimide?

Thanks,

Mario
--
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From odc1n08 at soton.ac.uk  Tue Feb  7 04:31:20 2023
From: odc1n08 at soton.ac.uk (Owain Clark)
Date: Tue, 7 Feb 2023 09:31:20 +0000
Subject: [labnetwork] SPTS Rapier Module - Laser/White Light
 Interferometry
In-Reply-To: <LO2P302MB0043867A07D47A9DBB41821BB0DA9@LO2P302MB0043.GBRP302.PROD.OUTLOOK.COM>
References: <LO2P302MB0043867A07D47A9DBB41821BB0DA9@LO2P302MB0043.GBRP302.PROD.OUTLOOK.COM>
Message-ID: <CWXP265MB487696001B032E4C8FA82D72B0DB9@CWXP265MB4876.GBRP265.PROD.OUTLOOK.COM>

Hi James, we don't have a rapier but we have an intellemetrics system on an OIPT chamber here. If there is a suitable optical KF/NW standard 40mm+ port located normally above the wafer then I expect it would work fine. We use IR wavelength for better compatibility with Si+Si dielectrics. I integrated the system without an assistance from OIPT, it does not interact with the tool control s/w so you need to manually observe one and hit stop on the other.

Downsides of our system are tricky to manually focus and get the back reflection in the detector plus you have to create your masks with an opening in the correct spot, with limited XY translation possible. Can't tell you anything about etch uniformity either.

I agree with SPTS in general, OES is a better and more versatile method of etch detection. Particularly if you have a full spectrum based system, also can be useful for plasma diagnostics and chamber cleaning information so it is more than just etch process. An inferometer gives you none of that additional info.

Make us an offer if you like, I can't remember the last time our system got used. It's easier/quicker to take wafers out part etch and use the ellipsometer to characterise... Very easy to detach from tool and reinstall elsewhere.

BR, Owain

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of James Grant
Sent: 06 February 2023 14:38
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] SPTS Rapier Module - Laser/White Light Interferometry

CAUTION: This e-mail originated outside the University of Southampton.
Hello,

Hoping the community can feedback on their experiences.

In 2019 we purchased an SPTS Rapier DSiE tool. As well as doing Bosch processing we also require the tool to do mixed process etching. Quite a few of our users, on our other Si etch tools (OIPT Estrelas and STS Multiplex), use mixed process to etch SOI materials or a-Si on fused silica substrates. These systems have Intellemetrics LEP 410/500 red laser interferometer units for the purpose of end-point detection.

When we purchased the Rapier, SPTS did tell us that a laser end-point system could not be used. They encouraged us instead to use the Claritas OES system on the tool, however when we pointed out our typical use scenario (small substrate size, low % open area) they admitted that the Claritas would struggle to differentiate when to end-point. Our preferred laser interferometer vendor, Intellemetrics, say they have sold LEP 500 red laser interferometer units to SPTS but cannot say on what systems they have been used.

We have found that EPFL use white light interferometry<https://eur03.safelinks.protection.outlook.com/?url=https%3A%2F%2Fwww.epfl.ch%2Fresearch%2Ffacilities%2Fcmi%2Fequipment%2Fetching%2Fspts-rapier%2F&data=05%7C01%7Codc1n08%40soton.ac.uk%7C004af8b4b7bf4f0a863708db0883f48d%7C4a5378f929f44d3ebe89669d03ada9d8%7C0%7C0%7C638113135056428938%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C2000%7C%7C%7C&sdata=VIOSQ%2BUUKBvJCc3U0dKErvhSez4nRB3Llf3VhbVJm9s%3D&reserved=0> end-point detection on their Rapier module - have contacted Phillipe Fluckiger separately.

My question to the community is has anyone used a laser interferometry system on an SPTS Rapier? If so, could they feedback with their experiences. Apologies I'm asking such an open question!

Cheers,

James

Dr. James Paul Grant
Research Engineer in Plasma Processing

Plasma Processing Group
james.grant at glasgow.ac.uk<mailto:james.grant at glasgow.ac.uk>

 [cid:image001.png at 01D93AD6.EF4C07D0]
      www.JWNC.gla.ac.uk<https://eur03.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.jwnc.gla.ac.uk%2F&data=05%7C01%7Codc1n08%40soton.ac.uk%7C004af8b4b7bf4f0a863708db0883f48d%7C4a5378f929f44d3ebe89669d03ada9d8%7C0%7C0%7C638113135056428938%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C2000%7C%7C%7C&sdata=fJZ8727czqzMHaN0d2krU7Z%2FdEKn1m3JJI67Oj5zg28%3D&reserved=0>
[cid:image004.png at 01D93AD6.EF4C07D0]  LinkedIn.com/company/JWNC<https://eur03.safelinks.protection.outlook.com/?url=http%3A%2F%2Flinkedin.com%2Fcompany%2FJWNC&data=05%7C01%7Codc1n08%40soton.ac.uk%7C004af8b4b7bf4f0a863708db0883f48d%7C4a5378f929f44d3ebe89669d03ada9d8%7C0%7C0%7C638113135056428938%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C2000%7C%7C%7C&sdata=itidWzOB6kOOKfCj2D1WRQ25AGhy2d2JePiF1CPTOc8%3D&reserved=0>
[cid:image005.png at 01D93AD6.EF4C07D0]  @UofG_JWNC<https://eur03.safelinks.protection.outlook.com/?url=https%3A%2F%2Ftwitter.com%2Fuofg_jwnc&data=05%7C01%7Codc1n08%40soton.ac.uk%7C004af8b4b7bf4f0a863708db0883f48d%7C4a5378f929f44d3ebe89669d03ada9d8%7C0%7C0%7C638113135056428938%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C2000%7C%7C%7C&sdata=LVxGF6aYr8MaW3x9%2B0F27Q%2BCFJoct3RMYb9wtIcmjRs%3D&reserved=0>

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From kmcpeak at lsu.edu  Tue Feb  7 18:01:17 2023
From: kmcpeak at lsu.edu (Kevin M McPeak)
Date: Tue, 7 Feb 2023 23:01:17 +0000
Subject: [labnetwork] Budgeting a cleanroom build
Message-ID: <BL3P221MB04043F3C01FB6E6E6949AC41B0DB9@BL3P221MB0404.NAMP221.PROD.OUTLOOK.COM>

Dear Colleagues,

At LSU, we are putting together a proposal to build a cleanroom on campus (our current one is 15 min away). Our VP of research has asked me to determine a rough budget for constructing a microelectronics cleanroom. Below are the itemized details:

- Size: 2000 sqft of class 100 space and 2000 sqft of grey room space. Our current off-campus cleanroom is 2000 sqft.
- Location: 5th floor (top floor) of chemistry building (total space of 5th floor is 12,000 sqft)
- Current condition of space:  5th floor is unfinished, i.e., concrete floors with pipes coming from the ground and 10ft ceilings.

I want to factor in the following costs: air handlers, toxic gas handling for PECVD, LPCVD, and ICP-RIE machines, and getting utilities to each tool, i.e., power, water, and N2.

$8 million is the current number that people are tossing around. I would greatly appreciate the feedback on that value. I certainly don't want to underfund the project. Thanks!

Regards,
Kevin

From beaudoin at physics.ubc.ca  Tue Feb  7 20:05:53 2023
From: beaudoin at physics.ubc.ca (Beaudoin, Mario)
Date: Tue, 7 Feb 2023 17:05:53 -0800
Subject: [labnetwork] Budgeting a cleanroom build
In-Reply-To: <BL3P221MB04043F3C01FB6E6E6949AC41B0DB9@BL3P221MB0404.NAMP221.PROD.OUTLOOK.COM>
References: <BL3P221MB04043F3C01FB6E6E6949AC41B0DB9@BL3P221MB0404.NAMP221.PROD.OUTLOOK.COM>
Message-ID: <1b544477-05b4-7e93-2203-4acff0961e5d@physics.ubc.ca>

Kevin,

We did a 1500 sq ft cleanroom:

  * Yellow room, class 100, 350 sq ft
  * Yellow room, class 1000, 350 sq ft
  * white room, class 1000, 900 sq ft
  * 9ft high inside clearance

The cost to purchase the cleanroom and have it installed in an old 
building where all the services are in a mezzanine above the room cost 
us 5M$ CAD (roughly 4M$ USD).? Hope this helps.

Mario

On 2023-02-07 3:01 p.m., Kevin M McPeak wrote:
> [CAUTION: Non-UBC Email]
>
> Dear Colleagues,
>
> At LSU, we are putting together a proposal to build a cleanroom on campus (our current one is 15 min away). Our VP of research has asked me to determine a rough budget for constructing a microelectronics cleanroom. Below are the itemized details:
>
> - Size: 2000 sqft of class 100 space and 2000 sqft of grey room space. Our current off-campus cleanroom is 2000 sqft.
> - Location: 5th floor (top floor) of chemistry building (total space of 5th floor is 12,000 sqft)
> - Current condition of space:  5th floor is unfinished, i.e., concrete floors with pipes coming from the ground and 10ft ceilings.
>
> I want to factor in the following costs: air handlers, toxic gas handling for PECVD, LPCVD, and ICP-RIE machines, and getting utilities to each tool, i.e., power, water, and N2.
>
> $8 million is the current number that people are tossing around. I would greatly appreciate the feedback on that value. I certainly don't want to underfund the project. Thanks!
>
> Regards,
> Kevin
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
-- 
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From julia.aebersold at louisville.edu  Wed Feb  8 12:36:22 2023
From: julia.aebersold at louisville.edu (Aebersold, Julia)
Date: Wed, 8 Feb 2023 17:36:22 +0000
Subject: [labnetwork] Budgeting a cleanroom build
In-Reply-To: <BL3P221MB04043F3C01FB6E6E6949AC41B0DB9@BL3P221MB0404.NAMP221.PROD.OUTLOOK.COM>
References: <BL3P221MB04043F3C01FB6E6E6949AC41B0DB9@BL3P221MB0404.NAMP221.PROD.OUTLOOK.COM>
Message-ID: <DM5PR03MB30986B853232FC90A2D4515F86D89@DM5PR03MB3098.namprd03.prod.outlook.com>

Kevin, Dennis Grimard at MITnano would be a great resource to ask this question.

Essentially, its going to cost more than you expect.  Also, make sure you lock in rock solid commitment of long term support for infrastructure and equipment.

Cheers!

Julia Aebersold, Ph.D.
Manager, Micro/Nano Technology Center
University of Louisville
Shumaker Research Building, Room 233
2210 South Brook Street
Louisville, KY? 40292
(502) 852-1572
?
http://louisville.edu/micronano/

-----Original Message-----
From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Kevin M McPeak
Sent: Tuesday, February 7, 2023 6:01 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Budgeting a cleanroom build

CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe.

Dear Colleagues,

At LSU, we are putting together a proposal to build a cleanroom on campus (our current one is 15 min away). Our VP of research has asked me to determine a rough budget for constructing a microelectronics cleanroom. Below are the itemized details:

- Size: 2000 sqft of class 100 space and 2000 sqft of grey room space. Our current off-campus cleanroom is 2000 sqft.
- Location: 5th floor (top floor) of chemistry building (total space of 5th floor is 12,000 sqft)
- Current condition of space:  5th floor is unfinished, i.e., concrete floors with pipes coming from the ground and 10ft ceilings.

I want to factor in the following costs: air handlers, toxic gas handling for PECVD, LPCVD, and ICP-RIE machines, and getting utilities to each tool, i.e., power, water, and N2.

$8 million is the current number that people are tossing around. I would greatly appreciate the feedback on that value. I certainly don't want to underfund the project. Thanks!

Regards,
Kevin
_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://nam11.safelinks.protection.outlook.com/?url=https%3A%2F%2Fmtl.mit.edu%2Fmailman%2Flistinfo.cgi%2Flabnetwork&data=05%7C01%7Cjulia.aebersold%40louisville.EDU%7Cbfc2b5d1a59a47aa0bf008db096f5484%7Cdd246e4a54344e158ae391ad9797b209%7C0%7C0%7C638114145992578330%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C3000%7C%7C%7C&sdata=61ESPgIoWI8eABK0px1EK8Ro2pTyinSJOJUnYGTvm4I%3D&reserved=0


From lvchang at Central.UH.EDU  Thu Feb  9 10:14:36 2023
From: lvchang at Central.UH.EDU (Chang, Long)
Date: Thu, 9 Feb 2023 15:14:36 +0000
Subject: [labnetwork] HDD Best Practice
Message-ID: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>

Hi All,

Yesterday we experienced a HDD failure for our AFM. This event should have been prevented by the Raid Mirror with 2 HDD. Our setup where we just have a single working drive and a spare backup clone has been more successful. We are planning to move away from Raid Mirror. Anyone has expertise/experience here they can share? 

Thanks,
Long Chang
Technical Director
UH Nanofabrication Facility
Houston, TX
lvchang at central.uh.edu





From demis at ucsb.edu  Thu Feb  9 12:08:47 2023
From: demis at ucsb.edu (Demis D. John)
Date: Thu, 9 Feb 2023 09:08:47 -0800
Subject: [labnetwork] HDD Best Practice
In-Reply-To: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>
References: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>
Message-ID: <5AA84C0C-1CB7-4560-8632-A077E1E41BB6@ucsb.edu>

We have also found that keeping a cloned HDD *outside* the computer chassis is very important.  

Once a tool has been set up satisfactorily, we then take the tool down, clone the HDD onto a similar one (using external HDD cloners), and then keep the clone in a separate cabinet (anti-static etc).

In addition, we have all user recipes, software folders backed up from the live tool computer to our network storage. 

So for restore - we can swap the cloned HDD back into the computer, 
And then copy the backed up network files to the computer. 

We had a power glitch result in damaging Both HDD?s (including raid backup) within our ASML computer)!

-- Demis


> On Feb 9, 2023, at 08:42, Chang, Long <lvchang at central.uh.edu> wrote:
> 
> ?Hi All,
> 
> Yesterday we experienced a HDD failure for our AFM. This event should have been prevented by the Raid Mirror with 2 HDD. Our setup where we just have a single working drive and a spare backup clone has been more successful. We are planning to move away from Raid Mirror. Anyone has expertise/experience here they can share? 
> 
> Thanks,
> Long Chang
> Technical Director
> UH Nanofabrication Facility
> Houston, TX
> lvchang at central.uh.edu
> 
> 
> 
> 
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork


From patricns at uw.edu  Thu Feb  9 12:17:45 2023
From: patricns at uw.edu (N Shane Patrick)
Date: Thu, 9 Feb 2023 09:17:45 -0800
Subject: [labnetwork] HDD Best Practice
In-Reply-To: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>
References: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>
Message-ID: <D2CF5324-1E35-42B1-B32F-3C4CB21D44C6@uw.edu>

RAID mirrors are incredibly useful tools when the expectations and management are properly handled, but they are not a backup and don?t replace the need for a separate backup.

RAID mirrors are a downtime mitigation tool. They allow the computer to continue operating in the event a single disk fails (assuming RAID 1, there are multi-mirror RAID setups as well) and are based on it being statistically unlikely that all disks in the array fail simultaneously. This gives the maintainer time to swap out the bad disk and allow the array to re-silver, all while keeping the system online in most cases. It isn?t uncommon to treat a raid array as a ?built-in backup?, but that?s not the true purpose of it.

For instance, having a RAID mirror array will fail if there aren?t policies requiring regular checks on the status of the array or automated monitoring and alert tasks to notify the maintainer of a disk problem. It will also fail if nothing is done about any signs of failure or alerts. It will also not save you if the controller (software or hardware) malfunctions or fails and starts writing corrupted data to both mirrors, or if something in an operating system or on the data bus goes screwy and causes data streams to be garbled before or during transmission. Bad data into the array, bad array. You still need a full backup solution, or at least a backup solution of critical data, like an automated incremental backup solution or a regular disk clone solution like you mention in your post.

So. RAID mirror - minimize downtime if managed properly, not a backup.
Backups allow for recovery when, not if, a failure and downtime occurs. Backups should be segregated copies of data ideally held somewhere other than on the system being backed up.



N. Shane Patrick
Manager, Lab Operations and Safety
Electron Beam Lithography
Washington Nanofabrication Facility (WNF) 
National Nanotechnology Coordinated Infrastructure (NNCI)
University of Washington - NanoES
Fluke Hall 129, Box 352143
(206) 221-1045
patricns at uw.edu <mailto:patricns at uw.edu>
http://www.wnf.washington.edu/ <http://www.wnf.washington.edu/>

> On Feb 9, 2023, at 7:14 AM, Chang, Long <lvchang at Central.UH.EDU> wrote:
> 
> Hi All,
> 
> Yesterday we experienced a HDD failure for our AFM. This event should have been prevented by the Raid Mirror with 2 HDD. Our setup where we just have a single working drive and a spare backup clone has been more successful. We are planning to move away from Raid Mirror. Anyone has expertise/experience here they can share? 
> 
> Thanks,
> Long Chang
> Technical Director
> UH Nanofabrication Facility
> Houston, TX
> lvchang at central.uh.edu
> 
> 
> 
> 
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!K-Hz7m0Vt54!kD3GvIsu3cdHCobhN6JZoubyakmhXr0GbvPzLpQkuvlVc4J3kVmQo00o47eLqZ8G7rDSz02L0KnseCkmbfg2$ 

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From michael.martin at louisville.edu  Thu Feb  9 12:52:13 2023
From: michael.martin at louisville.edu (Martin, Michael)
Date: Thu, 9 Feb 2023 17:52:13 +0000
Subject: [labnetwork] HDD Best Practice
In-Reply-To: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>
References: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>
Message-ID: <BN9PR03MB61704514FC75A9098DC2A788F2D99@BN9PR03MB6170.namprd03.prod.outlook.com>

Hi Long,
    Yes, we use the drive clone method instead of RAID.  We clone the drive and then put the clone in the computers as sometimes there are clone glitches.

Regards,
  Michael
________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Chang, Long <lvchang at Central.UH.EDU>
Sent: Thursday, February 9, 2023 10:14 AM
To: Fab Network <labnetwork at mtl.mit.edu>
Subject: [labnetwork] HDD Best Practice

CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe.

Hi All,

Yesterday we experienced a HDD failure for our AFM. This event should have been prevented by the Raid Mirror with 2 HDD. Our setup where we just have a single working drive and a spare backup clone has been more successful. We are planning to move away from Raid Mirror. Anyone has expertise/experience here they can share?

Thanks,
Long Chang
Technical Director
UH Nanofabrication Facility
Houston, TX
lvchang at central.uh.edu




_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
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From sieb at 4dlabs.ca  Thu Feb  9 12:57:57 2023
From: sieb at 4dlabs.ca (Nathanael Sieb)
Date: Thu, 9 Feb 2023 09:57:57 -0800
Subject: [labnetwork] HDD Best Practice
In-Reply-To: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>
References: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>
Message-ID: <af974fb8-295a-761b-8623-e6d270d896bf@4dlabs.ca>

Hi Long,

We use Macrium Reflect to save an image of our drives on an external 
server.? That way when a hard-drive dies, we just need to restore the 
image.? We set it on a schedule for some systems where frequent backups 
are useful.? Other systems are a single backup and then we disconnect 
the tool from the network connection.? It has saved us a lot of times.

Thanks,
Nathanael

On 2023-02-09 7:14 a.m., Chang, Long wrote:
> Hi All,
>
> Yesterday we experienced a HDD failure for our AFM. This event should have been prevented by the Raid Mirror with 2 HDD. Our setup where we just have a single working drive and a spare backup clone has been more successful. We are planning to move away from Raid Mirror. Anyone has expertise/experience here they can share?
>
> Thanks,
> Long Chang
> Technical Director
> UH Nanofabrication Facility
> Houston, TX
> lvchang at central.uh.edu
>
>
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork

*Nathanael Sieb *
Director of Operations and Administration ?| 4D LABS 
<http://www.4dlabs.ca/>
Simon Fraser University
8888 University Dr., Burnaby, B.C. V5A 1S6
T: 778.782.8084?| F: 778.782.3765 | www.4dlabs.ca <http://www.4dlabs.ca>
Facebook <https://www.facebook.com/4dlabs/>?| Twitter 
<https://twitter.com/4D_LABS>?| LinkedIn 
<https://www.linkedin.com/company/sfu-4d-labs/about/>
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From massey21 at llnl.gov  Thu Feb  9 16:01:33 2023
From: massey21 at llnl.gov (Massey, Travis)
Date: Thu, 9 Feb 2023 21:01:33 +0000
Subject: [labnetwork] HDD Best Practice
In-Reply-To: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>
References: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>
Message-ID: <BY5PR09MB54424DDAAF5D171EB76C7FC4BBD99@BY5PR09MB5442.namprd09.prod.outlook.com>

Hi Long,

Very few of our tools are networked (or could be networked) for backups to a server, so I recently started using Clonezilla to create clones of all of the tools.  Clonezilla is a lightweight bootable Linux build whose sole purpose is to clone drives.  Just put it on a flash drive (or CD, for tools older than flash drive support -- first-gen Windows XP and earlier), stick it in the tool, and boot to it.  It'll guide you through the steps.

Once I have the clone, I keep the dedicated clone drive in a safe place *and* manually put the clone image on a server in case something happens to the physical copy of the clone.

Best,
Travis Massey
Center for Micro and Nanotechnology | Center for Bioengineering
Lawrence Livermore National Laboratory


-----Original Message-----
From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Chang, Long
Sent: Thursday, February 9, 2023 7:15 AM
To: Fab Network <labnetwork at mtl.mit.edu>
Subject: [labnetwork] HDD Best Practice

Hi All,

Yesterday we experienced a HDD failure for our AFM. This event should have been prevented by the Raid Mirror with 2 HDD. Our setup where we just have a single working drive and a spare backup clone has been more successful. We are planning to move away from Raid Mirror. Anyone has expertise/experience here they can share? 

Thanks,
Long Chang
Technical Director
UH Nanofabrication Facility
Houston, TX
lvchang at central.uh.edu




_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://urldefense.us/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!G2kpM7uM-TzIFchu!iZO-N1yGztn99AIvATf_riH_OinnPkqjv6GW8GmSVVfpaTXYv-PKEVu_asDHO1px0Q$ 


From whipp003 at umn.edu  Thu Feb  9 16:40:56 2023
From: whipp003 at umn.edu (Tony Whipple)
Date: Thu, 9 Feb 2023 15:40:56 -0600
Subject: [labnetwork] HDD Best Practice
In-Reply-To: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>
References: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>
Message-ID: <CAOzkqnJJQtXtYWpUjORt5h6NpQ5L2KWVmBH-+M056HOF7xMQng@mail.gmail.com>

Hello Long;
We have some systems that are older but still work great and have a legacy
computer. The computer sometimes can not be
upgraded if it also uses older cards such as ISA slots. The limited life
time of spinning hard drives caused us to switch to using
SSD for the older IDE interface drives.  Making a duplicate on a second SSD
and keeping the backup in a static bag nearby is
a low cost backup.    We have needed to use this a few times and it was
quick and easy to swap it out.
Regards, Tony W.

On Thu, Feb 9, 2023 at 10:38 AM Chang, Long <lvchang at central.uh.edu> wrote:

> Hi All,
>
> Yesterday we experienced a HDD failure for our AFM. This event should have
> been prevented by the Raid Mirror with 2 HDD. Our setup where we just have
> a single working drive and a spare backup clone has been more successful.
> We are planning to move away from Raid Mirror. Anyone has
> expertise/experience here they can share?
>
> Thanks,
> Long Chang
> Technical Director
> UH Nanofabrication Facility
> Houston, TX
> lvchang at central.uh.edu
>
>
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From lino.eugene at uwaterloo.ca  Fri Feb 10 13:20:13 2023
From: lino.eugene at uwaterloo.ca (Lino Eugene)
Date: Fri, 10 Feb 2023 18:20:13 +0000
Subject: [labnetwork] HDD Best Practice
In-Reply-To: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>
References: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>
Message-ID: <YT2PR01MB43997B906731947303E9A02189DE9@YT2PR01MB4399.CANPRD01.PROD.OUTLOOK.COM>

Hi Long,

Most of our computers are connected to a Synology NAS with RAID 1 configuration in a private network. The Synology software Active to Backup Business does back up the Windows 7 and 10 computers and Macrium Reflect is used for Windows XP. Backups are run weekly and several versions are kept for few months. We also have an offline backup of the NAS.

When a hard drive fails, a new one is installed and the computer can be booted from a recovery media and connects to the NAS to recover a backup. This has saved us from long downtimes few times.

Best,

Lino Eugene, P.Eng., Ph.D.,
Micro/nanofabrication process engineer
Quantum-Nano Fabrication and Characterization Facility
Office of Research
QNC 1611
University of Waterloo
200 University Avenue West
Waterloo, ON, Canada
N2L 3G1

Ph: +1 519-888-4567 #37788
Cell: +1 226-929-1685
Websites:
https://uwaterloo.ca/quantum-nano-fabrication-and-characterization-facility/
https://fab.qnc.uwaterloo.ca/

-----Message d'origine-----
De : labnetwork <labnetwork-bounces at mtl.mit.edu> De la part de Chang, Long
Envoy? : 9 f?vrier 2023 10:15
? : Fab Network <labnetwork at mtl.mit.edu>
Objet : [labnetwork] HDD Best Practice

Hi All,

Yesterday we experienced a HDD failure for our AFM. This event should have been prevented by the Raid Mirror with 2 HDD. Our setup where we just have a single working drive and a spare backup clone has been more successful. We are planning to move away from Raid Mirror. Anyone has expertise/experience here they can share?

Thanks,
Long Chang
Technical Director
UH Nanofabrication Facility
Houston, TX
lvchang at central.uh.edu




_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From jtamelier at eng.ucsd.edu  Mon Feb 13 12:02:45 2023
From: jtamelier at eng.ucsd.edu (John Tamelier)
Date: Mon, 13 Feb 2023 09:02:45 -0800
Subject: [labnetwork] O2 8%/CF4 gas cylinder
Message-ID: <6443ece4-9b28-096b-4a78-473408048db3@eng.ucsd.edu>

Hello all,

We have been having difficulty getting a cylinder of O2 8%/CF4. We 
placed an order in early November 2022 with Linde and have yet to 
receive a ship date for the material. We have three orders out, but need 
the material urgently. The shortest lead time we have found is 9 weeks.

Does anyone have any contacts for purchasing this gas or other options 
for obtaining a cylinder of this gas? Is anyone else experiencing this 
type of lead time for gas cylinders?

Thank you,

John

-----------------------------------
John Tamelier, Ph.D.
Interim Director - Nano3

University of California, San Diego
Atkinson Hall, 5th Floor Front Desk, M/C 0436
9500 Gilman Drive
La Jolla, California 92093-0436
Phone: (858) 246-2735
Fax:?? (858) 534-9092
E-mail: jtamelier at ucsd.edu
http://nano3.calit2.net
----------------------------------



From olms0025 at umn.edu  Mon Feb 13 15:37:18 2023
From: olms0025 at umn.edu (Brian K. Olmsted)
Date: Mon, 13 Feb 2023 14:37:18 -0600
Subject: [labnetwork] group buy: Entegris 5" mask holder?
Message-ID: <CAMNfp68LqG-rrgmkKLg5D8LRB1aW3LvHtsFJcSZdGKVk=vrd-Q@mail.gmail.com>

Hi,

We are looking at adding a 5" mask holder from Entegris (A94-0215), but the
minimum order is 8. Is anyone interested in going in together to share a
minimum quantity order? We only need one.

The price per unit is $643.26.

Thanks,

Brian K. Olmsted
Associate Director of Laboratory Operations
University of Minnesota | MNC
cse.umn.edu/mnc
612.626.3287
olms0025 at umn.edu

[image: image.png]
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From massey21 at llnl.gov  Mon Feb 13 17:39:56 2023
From: massey21 at llnl.gov (Massey, Travis)
Date: Mon, 13 Feb 2023 22:39:56 +0000
Subject: [labnetwork] Light filtering in photolithography bays
Message-ID: <BY5PR09MB5442585854E48D959D031137BBDD9@BY5PR09MB5442.namprd09.prod.outlook.com>

Hi all,

LLNL recently changed out its cleanroom lighting to LEDs from fluorescent tubes.  A few months later, we found we were having lithography issues - our resist is getting exposed under ambient light within the litho bays within 5-15 minutes.  The lights in our litho bays all have ~30 year old plastic diffusers that snap on over the tubes, and these diffusers have a filter film inside.  We speculate that the new LEDs may have photobleached the aging photosensitive pigments.  Measurements of the light intensity in the cleanroom at 365, 405, and 435 nm indicate that our litho bays have just as much light at these wavelengths than our non-litho bays!

-- As an alternative to filtering the light, has anyone found LED cleanroom lighting that does not emit in the >450 nm range?  For example, form-compatible LED 'tubes' that only emit at ~580 nm (yellow)?
-- How do all of you solve this problem?  What product do you use to filter your lights (e.g., tube covers, panel covers, applied films, solid dyed plastics, laser safety products...)
-- Have you found that your filters have a finite lifespan?  For example, I've heard in previous discussions that window films are only good for 5 years or so before the wavelength-absorbent pigment decomposes and is ineffective.
-- To what extent have you found computer monitors' light emissions to be a point of concern?
-- Other thoughts/suggestions that we should explore or consider?

Thanks,
Travis Massey
Center for Micro and Nanotechnology (CMNT)
Lawrence Livermore National Laboratory
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From jtmitch5 at ncsu.edu  Tue Feb 14 01:05:41 2023
From: jtmitch5 at ncsu.edu (James Mitchell)
Date: Tue, 14 Feb 2023 01:05:41 -0500
Subject: [labnetwork] O2 8%/CF4 gas cylinder
In-Reply-To: <6443ece4-9b28-096b-4a78-473408048db3@eng.ucsd.edu>
References: <6443ece4-9b28-096b-4a78-473408048db3@eng.ucsd.edu>
Message-ID: <CAEXS_M-F20gpAri=DhbfG2BTd7sOWs-60x+fHq9tAx6pJ+YWwA@mail.gmail.com>

Have you tried Airgas?

Jim

On Mon, Feb 13, 2023, 5:37 PM John Tamelier <jtamelier at eng.ucsd.edu> wrote:

> Hello all,
>
> We have been having difficulty getting a cylinder of O2 8%/CF4. We
> placed an order in early November 2022 with Linde and have yet to
> receive a ship date for the material. We have three orders out, but need
> the material urgently. The shortest lead time we have found is 9 weeks.
>
> Does anyone have any contacts for purchasing this gas or other options
> for obtaining a cylinder of this gas? Is anyone else experiencing this
> type of lead time for gas cylinders?
>
> Thank you,
>
> John
>
> -----------------------------------
> John Tamelier, Ph.D.
> Interim Director - Nano3
>
> University of California, San Diego
> Atkinson Hall, 5th Floor Front Desk, M/C 0436
> 9500 Gilman Drive
> La Jolla, California 92093-0436
> Phone: (858) 246-2735
> Fax:   (858) 534-9092
> E-mail: jtamelier at ucsd.edu
> http://nano3.calit2.net
> ----------------------------------
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From christian.pies at heidelberg-instruments.com  Tue Feb 14 03:48:48 2023
From: christian.pies at heidelberg-instruments.com (Christian Pies)
Date: Tue, 14 Feb 2023 08:48:48 +0000
Subject: [labnetwork] Light filtering in photolithography bays
In-Reply-To: <BY5PR09MB5442585854E48D959D031137BBDD9@BY5PR09MB5442.namprd09.prod.outlook.com>
References: <BY5PR09MB5442585854E48D959D031137BBDD9@BY5PR09MB5442.namprd09.prod.outlook.com>
Message-ID: <DB8P189MB09988995F91F9D7708C7762AB5A29@DB8P189MB0998.EURP189.PROD.OUTLOOK.COM>

Hi Travis,

when we planned our new cleanroom facilities, we wanted to switch to LED lighting, but were also quite concerned about accidentally exposing the photoresists. After some discussions with one of our resist suppliers, we learned that wavelengths below 500 nm must be avoided. Unfortunately, most yellow LEDs show a sidepeak around 420 - 450 nm, which is often not visible in the datasheets unless the emission spectrum is shown in a logarithmic representation. The LEDs we originally looked at had a side peak of 0.4% intensity, which was still too much.
Pure yellow light LEDs have a lower efficiency, but covering the lamps with a filter film probably reduces the output in a similar way or even more.

We finally decided for the following LEDs:
https://dammedia.osram.info/media/resource/hires/osram-dam-6665600/LY%20CKBP_EN.pdf
They are in use for almost two years now and we haven't experienced any problems with our resists so far. They are a bit more orange than the typical lighting, which feels a bit unfamiliar at the beginning.

Computer monitors can be an issue. If we leave our coated substrates on the desk in front of the monitor, the resist is typically exposed within a few hours. A short time next to the monitor while setting up the machine is usually uncritical (depending on the sensitivity of the resist). "Light contamination" of the entire room from the monitors has not been a problem in our case. But of course this depends on the local conditions. Turning down the brightness and switching off the monitors when not in use is for sure not a mistake.

Best regards,
Christian


Dr. Christian Pies | Head of the Process & Application Lab
T | +49 6221 728899-0
E | christian.pies at heidelberg-instruments.com

Heidelberg Instruments Mikrotechnik GmbH
Mittelgewannweg 27
69123 Heidelberg

[Heidelberg Instruments]<http://www.heidelberg-instruments.com/>

Handelsregister: Mannheim HRB 333834
Gesch?ftsf?hrer: Konrad Roessler, Steffen Diez

Diese E-Mail enth?lt vertrauliche und/oder rechtlich gesch?tzte Informationen. Wenn Sie nicht der richtige Adressat sind oder diese E-Mail irrt?mlich erhalten haben, informieren Sie bitte sofort den Absender und vernichten Sie diese Mail. Das unerlaubte Kopieren sowie die unbefugte Weitergabe dieser Mail sind nicht gestattet.

This e-mail may contain confidential and/or privileged information. If you are not the intended recipient (or have received this e-mail in error) please notify the sender immediately and destroy this e-mail. Any unauthorized copying, disclosure, or distribution of the material in this e-mail is strictly forbidden.

www.heidelberg-instruments.com

Von: labnetwork <labnetwork-bounces at mtl.mit.edu> Im Auftrag von Massey, Travis
Gesendet: Montag, 13. Februar 2023 23:40
An: labnetwork at mtl.mit.edu
Betreff: [labnetwork] Light filtering in photolithography bays

Hi all,

LLNL recently changed out its cleanroom lighting to LEDs from fluorescent tubes.  A few months later, we found we were having lithography issues - our resist is getting exposed under ambient light within the litho bays within 5-15 minutes.  The lights in our litho bays all have ~30 year old plastic diffusers that snap on over the tubes, and these diffusers have a filter film inside.  We speculate that the new LEDs may have photobleached the aging photosensitive pigments.  Measurements of the light intensity in the cleanroom at 365, 405, and 435 nm indicate that our litho bays have just as much light at these wavelengths than our non-litho bays!

-- As an alternative to filtering the light, has anyone found LED cleanroom lighting that does not emit in the >450 nm range?  For example, form-compatible LED 'tubes' that only emit at ~580 nm (yellow)?
-- How do all of you solve this problem?  What product do you use to filter your lights (e.g., tube covers, panel covers, applied films, solid dyed plastics, laser safety products...)
-- Have you found that your filters have a finite lifespan?  For example, I've heard in previous discussions that window films are only good for 5 years or so before the wavelength-absorbent pigment decomposes and is ineffective.
-- To what extent have you found computer monitors' light emissions to be a point of concern?
-- Other thoughts/suggestions that we should explore or consider?

Thanks,
Travis Massey
Center for Micro and Nanotechnology (CMNT)
Lawrence Livermore National Laboratory
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From johnboyle at fast.net  Tue Feb 14 11:38:08 2023
From: johnboyle at fast.net (John Boyle)
Date: Tue, 14 Feb 2023 11:38:08 -0500
Subject: [labnetwork] O2 8%/CF4 gas cylinder
In-Reply-To: <CAEXS_M-F20gpAri=DhbfG2BTd7sOWs-60x+fHq9tAx6pJ+YWwA@mail.gmail.com>
References: <6443ece4-9b28-096b-4a78-473408048db3@eng.ucsd.edu>
 <CAEXS_M-F20gpAri=DhbfG2BTd7sOWs-60x+fHq9tAx6pJ+YWwA@mail.gmail.com>
Message-ID: <019201d94092$b871f820$2955e860$@net>

Matheson Gas. They have 2 locations in Southern California and numerous locations in US. I think they carry CF4 and they do blending. 

 

 

John Boyle

John Boyle Consulting, LLC

4848 Canterbury Drive

Emmaus, PA 18049

484-432-7596 Cell

610-965-3208 Office

 

 

 

From: labnetwork [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of James Mitchell
Sent: Tuesday, February 14, 2023 1:06 AM
To: John Tamelier
Cc: Fab Network
Subject: Re: [labnetwork] O2 8%/CF4 gas cylinder

 

Have you tried Airgas?

 

Jim

 

On Mon, Feb 13, 2023, 5:37 PM John Tamelier <jtamelier at eng.ucsd.edu> wrote:

Hello all,

We have been having difficulty getting a cylinder of O2 8%/CF4. We 
placed an order in early November 2022 with Linde and have yet to 
receive a ship date for the material. We have three orders out, but need 
the material urgently. The shortest lead time we have found is 9 weeks.

Does anyone have any contacts for purchasing this gas or other options 
for obtaining a cylinder of this gas? Is anyone else experiencing this 
type of lead time for gas cylinders?

Thank you,

John

-----------------------------------
John Tamelier, Ph.D.
Interim Director - Nano3

University of California, San Diego
Atkinson Hall, 5th Floor Front Desk, M/C 0436
9500 Gilman Drive
La Jolla, California 92093-0436
Phone: (858) 246-2735
Fax:   (858) 534-9092
E-mail: jtamelier at ucsd.edu
http://nano3.calit2.net
----------------------------------


_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork

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From Pavel at efgases.com  Tue Feb 14 18:37:00 2023
From: Pavel at efgases.com (Pavel Perlov)
Date: Tue, 14 Feb 2023 23:37:00 +0000
Subject: [labnetwork] O2 8%/CF4 gas cylinder
In-Reply-To: <019201d94092$b871f820$2955e860$@net>
References: <6443ece4-9b28-096b-4a78-473408048db3@eng.ucsd.edu>
 <CAEXS_M-F20gpAri=DhbfG2BTd7sOWs-60x+fHq9tAx6pJ+YWwA@mail.gmail.com>
 <019201d94092$b871f820$2955e860$@net>
Message-ID: <BL1PR12MB52059C2EC9BC859E02CFCCE8BBA29@BL1PR12MB5205.namprd12.prod.outlook.com>


Jim,

We can help you out with this mix.  I'm with Electronic Fluorocarbons  www.efgases.com, I cc'd our sales team to assist with your request below.

Regards
Pavel


Sent via the Samsung Galaxy S22+ 5G, an AT&T 5G smartphone



-------- Original message --------
From: John Boyle <johnboyle at fast.net>
Date: 2/14/23 6:24 PM (GMT-05:00)
To: 'James Mitchell' <jtmitch5 at ncsu.edu>, 'John Tamelier' <jtamelier at eng.ucsd.edu>
Cc: 'Fab Network' <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] O2 8%/CF4 gas cylinder

CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe.
Matheson Gas. They have 2 locations in Southern California and numerous locations in US. I think they carry CF4 and they do blending.


John Boyle
John Boyle Consulting, LLC
4848 Canterbury Drive
Emmaus, PA 18049
484-432-7596 Cell
610-965-3208 Office



From: labnetwork [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of James Mitchell
Sent: Tuesday, February 14, 2023 1:06 AM
To: John Tamelier
Cc: Fab Network
Subject: Re: [labnetwork] O2 8%/CF4 gas cylinder

Have you tried Airgas?

Jim

On Mon, Feb 13, 2023, 5:37 PM John Tamelier <jtamelier at eng.ucsd.edu<mailto:jtamelier at eng.ucsd.edu>> wrote:
Hello all,

We have been having difficulty getting a cylinder of O2 8%/CF4. We
placed an order in early November 2022 with Linde and have yet to
receive a ship date for the material. We have three orders out, but need
the material urgently. The shortest lead time we have found is 9 weeks.

Does anyone have any contacts for purchasing this gas or other options
for obtaining a cylinder of this gas? Is anyone else experiencing this
type of lead time for gas cylinders?

Thank you,

John

-----------------------------------
John Tamelier, Ph.D.
Interim Director - Nano3

University of California, San Diego
Atkinson Hall, 5th Floor Front Desk, M/C 0436
9500 Gilman Drive
La Jolla, California 92093-0436
Phone: (858) 246-2735
Fax:   (858) 534-9092
E-mail: jtamelier at ucsd.edu<mailto:jtamelier at ucsd.edu>
http://nano3.calit2.net<https://linkprotect.cudasvc.com/url?a=http%3a%2f%2fnano3.calit2.net&c=E,1,UnK73e8Ez6v_oSTX1WMQ4LV6fYJCHfdIQ9f2uxJgp0U2UIF6Ga0K26FigCbcLr4FaXDIPu6UxlQjTuoSv62Rmrlk7ky5vcbRtZ3jyFe5LRVbO2cmUkU2&typo=1>
----------------------------------


_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From savithap at iisc.ac.in  Wed Feb 15 07:19:03 2023
From: savithap at iisc.ac.in (Savitha P)
Date: Wed, 15 Feb 2023 12:19:03 +0000
Subject: [labnetwork] HF storage
Message-ID: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>

Hi!

We recently had a couple of occasions where users had mistakenly used Hydrofluoric acid in place of Hydrochloric acid during RCA cleaning. To avoid this, one of the suggestions we have received from our OLSEH is to store HF in a different coloured bottle (currently all acids are stored in white translucent polypropylene bottles which are properly labelled). Accordingly, we had considered storing HF in opaque, brown colour HDPE bottles. However, that was not deemed acceptable by a section of users saying bottles should be translucent so that acid level inside can be judged.

Could you please let me know how small quantities of HF are stored in your respective fabs. Is there any regulation governing storage of HF, so that we could implement the same.

Thanks and regards,
Savitha


Dr. Savitha P
Chief Operating Officer
National Nanofabrication Centre
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph. +91 80 2293 3319
www.cense.iisc.ac.in
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From hosler0 at purdue.edu  Wed Feb 15 10:03:43 2023
From: hosler0 at purdue.edu (Hosler, Richard S)
Date: Wed, 15 Feb 2023 15:03:43 +0000
Subject: [labnetwork] HF storage
In-Reply-To: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
References: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
Message-ID: <CH2PR22MB1781BB0C2C45B9ADFFA9B6AE9CA39@CH2PR22MB1781.namprd22.prod.outlook.com>

For our RCA process at Purdue/BNC, we have a small (6ft.) dedicated Kinetics RCA cleaning hood with heated below deck level baths for SC1/SC2 and a smaller unheated bath for HF. I have installed a separate cabinet for the HF and HCl adjacent to the hood. This is marked as for RCA only to a) separate the RCA supplies from the main supply and b) to shorten the distance between the cabinet and hood.

The HF is in a smaller semi-opaque white bottle that is easy to determine the level. The HCl bottles are double the size and glass. Each has their own shelf to visually separate them as well. H2O2 goes into a small fridge on the other side of the hood, again to separate the supply and provide quick access.

Access to this hood is restricted by requiring a 2 hour training session in which the user sets up, uses, and cleans up the process from start to finish. Prior HF procedures that are outlined originally in the cleanroom access training are reinforced here and the nearest HF exposure kit (6ft behind the user) is pointed out.

Basically the strategy is a sort of defense-in-depth of individual mistake-proofing features. To my knowledge we haven't had any exposure incidents stemming from this hood in the ~4 years it's been operational.

My catchphrase when working with RCA and Piranha is as follows: "If you ever stop being scared and respectful of these chemicals, you need to  stop working with them."

Rich Hosler
Research Engineer (Thermal/PECVD)
Purdue University - Birck Nanotechnology Center
hosler0 at purdue.edu

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Savitha P
Sent: Wednesday, February 15, 2023 7:19 AM
To: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] HF storage

---- External Email: Use caution with attachments, links, or sharing data ----

Hi!

We recently had a couple of occasions where users had mistakenly used Hydrofluoric acid in place of Hydrochloric acid during RCA cleaning. To avoid this, one of the suggestions we have received from our OLSEH is to store HF in a different coloured bottle (currently all acids are stored in white translucent polypropylene bottles which are properly labelled). Accordingly, we had considered storing HF in opaque, brown colour HDPE bottles. However, that was not deemed acceptable by a section of users saying bottles should be translucent so that acid level inside can be judged.

Could you please let me know how small quantities of HF are stored in your respective fabs. Is there any regulation governing storage of HF, so that we could implement the same.

Thanks and regards,
Savitha

Dr. Savitha P
Chief Operating Officer
National Nanofabrication Centre
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph. +91 80 2293 3319
www.cense.iisc.ac.in<http://www.cense.iisc.ac.in>
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From deolivei at ualberta.ca  Wed Feb 15 11:25:19 2023
From: deolivei at ualberta.ca (Gustavo de Oliveira Luiz)
Date: Wed, 15 Feb 2023 09:25:19 -0700
Subject: [labnetwork] HF storage
In-Reply-To: <CH2PR22MB1781BB0C2C45B9ADFFA9B6AE9CA39@CH2PR22MB1781.namprd22.prod.outlook.com>
References: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
 <CH2PR22MB1781BB0C2C45B9ADFFA9B6AE9CA39@CH2PR22MB1781.namprd22.prod.outlook.com>
Message-ID: <CALPuYFw=HC5S3JigEy+KxTP7D52Cb6_-nhi9qW2e+n+60-u2JA@mail.gmail.com>

Hi Savitha,

Here at the University of Alberta's nanoFAB, we store HF and HCl in
completely separate cabinets. In fact, the HF cabinet only contains 49%-HF,
BOE, Borofloat etch (HNO, HF mixture) and CaCl2 (for neutralization of
these solutions after usage). HCl is kept in a cabinet where other acids
and metal etchants may also be found, and it is the responsibility of the
user to read labels before pouring chemicals into beakers or other
containers.

It is understandable that we want to have our labs basically fool-proof,
but space always comes at a premium and it may not be an option to have
separate cabinets for every single chemical we stock ? again, we still have
different acids in the same cabinets, only HF and sulfuric have their
unique cabinets. The only option left then is taking administrative action
to make sure users follow basic rules.

We require all users to be trained and signed off by a staff member before
they can process by themselves. Whenever something this serious happens, we
remove their user status and set them back to trainee, and they are not
allowed to process alone until they regain a staff memeber's confidence
that they can do so safely. And, of course, reincidence is followed by more
drastic consequences affecting their access to the process or even the
clean room.

I echo Rich's motto, everyone must be a little bit afraid of these
chemicals, just enough so we remember to be careful around them.

Best,
--
Gustavo de Oliveira Luiz, PhD
Applications/Research Specialist
nanoFAB, University of Alberta

On Wed, Feb 15, 2023 at 9:14 AM Hosler, Richard S <hosler0 at purdue.edu>
wrote:

> For our RCA process at Purdue/BNC, we have a small (6ft.) dedicated
> Kinetics RCA cleaning hood with heated below deck level baths for SC1/SC2
> and a smaller unheated bath for HF. I have installed a separate cabinet for
> the HF and HCl adjacent to the hood. This is marked as for RCA only to a)
> separate the RCA supplies from the main supply and b) to shorten the
> distance between the cabinet and hood.
>
>
>
> The HF is in a smaller semi-opaque white bottle that is easy to determine
> the level. The HCl bottles are double the size and glass. Each has their
> own shelf to visually separate them as well. H2O2 goes into a small fridge
> on the other side of the hood, again to separate the supply and provide
> quick access.
>
>
>
> Access to this hood is restricted by requiring a 2 hour training session
> in which the user sets up, uses, and cleans up the process from start to
> finish. Prior HF procedures that are outlined originally in the cleanroom
> access training are reinforced here and the nearest HF exposure kit (6ft
> behind the user) is pointed out.
>
>
>
> Basically the strategy is a sort of defense-in-depth of individual
> mistake-proofing features. To my knowledge we haven?t had any exposure
> incidents stemming from this hood in the ~4 years it?s been operational.
>
>
>
> My catchphrase when working with RCA and Piranha is as follows: ?If you
> ever stop being scared and respectful of these chemicals, you need to  stop
> working with them.?
>
>
>
> Rich Hosler
>
> Research Engineer (Thermal/PECVD)
>
> Purdue University ? Birck Nanotechnology Center
>
> hosler0 at purdue.edu
>
>
>
> *From:* labnetwork <labnetwork-bounces at mtl.mit.edu> * On Behalf Of *Savitha
> P
> *Sent:* Wednesday, February 15, 2023 7:19 AM
> *To:* labnetwork at mtl.mit.edu
> *Subject:* Re: [labnetwork] HF storage
>
>
>
> ---- *External Email*: Use caution with attachments, links, or sharing
> data ----
>
>
>
> Hi!
>
>
>
> We recently had a couple of occasions where users had mistakenly used
> Hydrofluoric acid in place of Hydrochloric acid during RCA cleaning. To
> avoid this, one of the suggestions we have received from our OLSEH is to
> store HF in a different coloured bottle (currently all acids are stored in
> white translucent polypropylene bottles which are properly labelled).
> Accordingly, we had considered storing HF in opaque, brown colour HDPE
> bottles. However, that was not deemed acceptable by a section of users
> saying bottles should be translucent so that acid level inside can be
> judged.
>
>
>
> Could you please let me know how small quantities of HF are stored in your
> respective fabs. Is there any regulation governing storage of HF, so that
> we could implement the same.
>
>
>
> Thanks and regards,
>
> Savitha
>
>
>
> Dr. Savitha P
> Chief Operating Officer
>
> National Nanofabrication Centre
> Centre for Nanoscience and Engineering
> Indian Institute of Science
> Bangalore - 560012
> India.
> Ph. +91 80 2293 3319
> www.cense.iisc.ac.in
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From mmoneck at andrew.cmu.edu  Wed Feb 15 12:14:57 2023
From: mmoneck at andrew.cmu.edu (Matt Moneck)
Date: Wed, 15 Feb 2023 12:14:57 -0500
Subject: [labnetwork] HSQ Availability
Message-ID: <BF4FDD24-FA03-444E-8C40-A12259B210A6@hxcore.ol>

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From yakimom at sunypoly.edu  Wed Feb 15 12:14:56 2023
From: yakimom at sunypoly.edu (Michael Yakimov)
Date: Wed, 15 Feb 2023 17:14:56 +0000
Subject: [labnetwork] HF storage
In-Reply-To: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
References: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
Message-ID: <BY3PR05MB8260FFED4DCE822A6B4934DCCEA39@BY3PR05MB8260.namprd05.prod.outlook.com>

I wonder if your bottles come from the same supplier, look the same, and have chemical name buried into huge DANGER, HAZARD, WARNING symbols. I definitely had some bottles (not pointing fingers, but I have some specific companies in mind) where finding chemical name required literally 2-3 minutes of reading. Can you share bottle pictures to see if that is the issue?

If I had a penny every time I was told "check the bottle to make sure..." - so that is what I would emphasize.
Instantly readable labeling is a must. Low cost ideas":  Secondary "HF" or "HCl" stickers on the bottle in large letters, maybe in different colors. Highlighting chemical name on the label, possibly with different color markers. Switching one of chemicals to a different brand so bottle has different shape and label style...

Mike






_______________________________________________

Michael Yakimov

Research scientist

College of Nanoscale Science and Engineering

SUNY Polytechnic Institute



253 Fuller rd.

Albany NY 12203



Phone: 518-437-8609 lab

e-mail: yakimom at sunypoly.edu



________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Savitha P <savithap at iisc.ac.in>
Sent: Wednesday, February 15, 2023 7:19 AM
To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] HF storage

Hi!

We recently had a couple of occasions where users had mistakenly used Hydrofluoric acid in place of Hydrochloric acid during RCA cleaning. To avoid this, one of the suggestions we have received from our OLSEH is to store HF in a different coloured bottle (currently all acids are stored in white translucent polypropylene bottles which are properly labelled). Accordingly, we had considered storing HF in opaque, brown colour HDPE bottles. However, that was not deemed acceptable by a section of users saying bottles should be translucent so that acid level inside can be judged.

Could you please let me know how small quantities of HF are stored in your respective fabs. Is there any regulation governing storage of HF, so that we could implement the same.

Thanks and regards,
Savitha


Dr. Savitha P
Chief Operating Officer
National Nanofabrication Centre
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph. +91 80 2293 3319
www.cense.iisc.ac.in
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From hathaway at cns.fas.harvard.edu  Wed Feb 15 13:12:34 2023
From: hathaway at cns.fas.harvard.edu (Hathaway, Malcolm R)
Date: Wed, 15 Feb 2023 18:12:34 +0000
Subject: [labnetwork] HF storage
In-Reply-To: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
References: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
Message-ID: <MN2PR07MB6526861EEF35BF4FDE8D87D6CBA39@MN2PR07MB6526.namprd07.prod.outlook.com>

Hi Savitha,

This is Mac Hathaway, the Nanofabrication Safety officer at Harvard CNS.  This is an interesting question from a general perspective, of what and how much to do about the occasional lapse in user behavior which could have bad consequences.

In our lab, we do not repackage hazardous chemicals, and rely on proper reading of labels for proper use of chemicals.  Occasionally, we have considered repackaging for various purposes (smaller bottle size, usually) but have concluded that the additional risk to staff from extra handling of hazardous materials would not be worth it.  (it turns out pouring a full gallon bottle of toxic chemical from one jug to another through a funnel is not as trivial as it may sound.)

Different cap colors might help (our acids come with different cap colors, but the particular colors seem relatively random.  For reference, HF cap is white).  Marking HF bottles in large bold letters with a permanent marker might also help.

The most important element in this kind of situation is to teach the users the importance of the concept of Situation Awareness, the idea that every user must Pay Attention to what they are doing ALL THE TIME.  I don't want this to sound facetious, as it is literally the most important concept that we teach in our chemical safety training.  We hammer away at this concept all the time, for exactly the situation you describe.

Quite seriously, no amount of fancy labeling, signage, color codes, etc. will prevent the user lacking situation awareness from making the most monumental errors.

It would be interesting to know what the circumstances were surrounding these incidents.  Was this late at night?  Did they mistake the bottles, or did they mistake the recipe?  Where they rookies, or in a hurry?  Often, attention to these other aspects of the incidents can pay greater dividends.

Specifically with regard to HF, I find that scaring the dickens out of the users during their introduction to the chemicals enhances their retention of the important points.


Mac Hathaway
Process and Systems Engineer
Harvard CNS

________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Savitha P <savithap at iisc.ac.in>
Sent: Wednesday, February 15, 2023 7:19 AM
To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] HF storage

Hi!

We recently had a couple of occasions where users had mistakenly used Hydrofluoric acid in place of Hydrochloric acid during RCA cleaning. To avoid this, one of the suggestions we have received from our OLSEH is to store HF in a different coloured bottle (currently all acids are stored in white translucent polypropylene bottles which are properly labelled). Accordingly, we had considered storing HF in opaque, brown colour HDPE bottles. However, that was not deemed acceptable by a section of users saying bottles should be translucent so that acid level inside can be judged.

Could you please let me know how small quantities of HF are stored in your respective fabs. Is there any regulation governing storage of HF, so that we could implement the same.

Thanks and regards,
Savitha


Dr. Savitha P
Chief Operating Officer
National Nanofabrication Centre
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph. +91 80 2293 3319
www.cense.iisc.ac.in
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From price.798 at osu.edu  Wed Feb 15 16:03:38 2023
From: price.798 at osu.edu (Price, Aimee)
Date: Wed, 15 Feb 2023 21:03:38 +0000
Subject: [labnetwork] HSQ Availability
In-Reply-To: <BF4FDD24-FA03-444E-8C40-A12259B210A6@hxcore.ol>
References: <BF4FDD24-FA03-444E-8C40-A12259B210A6@hxcore.ol>
Message-ID: <CH0PR01MB713959EF4CAD0AFB5E9F9CBFBCA39@CH0PR01MB7139.prod.exchangelabs.com>

Hi Matthew,
The MAEBL community has dealt with this for many years.  We reached out to Dischem (Andy Thompson) and he is providing many of us Ebeamers in the US with our HSQ.  He is actually in your backyard in western Pa.  He packages up HSQ into the same/similar thicknesses and solids content that Dow did.  He also will make small quantities and ships fast.  I just bought a 20mL bottle from him which works great for us.  Happy to share more if you are interested.  It?s not cheap, but it?s inline with the trajectory of the HSQ from Dow before it skyrocketed.  You could compare directly with a quote from him.

Andy?s contact info is Andy Thompson andy at discheminc.com<mailto:andy at discheminc.com>

I do know that some people are still able to get it from Dow distributors, but it can be quite painful.

Feel free to call me if you have any questions.

Aimee


Manager, Nanofabrication
The Ohio State University
Nanotech West Lab
Institute for Materials Research
1381 Kinnear Road
Suite 100
Columbus, OH 43212
614-292-2753
Price.798 at osu.edu<mailto:Price.798 at osu.edu>
Nanotech.osu.edu

Pronouns: she/her/hers




From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Matt Moneck
Sent: Wednesday, February 15, 2023 12:15 PM
To: labnetwork <labnetwork at mtl.mit.edu>
Subject: [labnetwork] HSQ Availability

Hi All, I would like to solicit your feedback on HSQ options for ebeam litho. Our group has traditionally worked with Dow Corning?s XR-1541-002 HSQ, and it has fit our needs for many years. However, as our stock is now reaching a reorder point,

Hi All,

I would like to solicit your feedback on HSQ options for ebeam litho.  Our group has traditionally worked with Dow Corning?s XR-1541-002 HSQ, and it has fit our needs for many years.  However, as our stock is now reaching a reorder point, we have reached out to vendors for quotes only to find that pricing has increased to a level we could have never imagined (not to mention lead times on the order of 80 business days).  With that in mind, we have been looking at alternative suppliers, including EM Resist (distributed through Integrated Micro Materials) and Allresist (Medusa 82).

If anyone has experience working with the EM Resist and Allresist products, we would appreciate any feedback you might you might have on how they compare to the XR-1541.  For example, do you see any major differences in resolution, adhesion, dosing, etch resistance, etc.?

If you have other alternatives, we would love to hear about them as well, although, we do prefer to buy pre-mixed solutions as opposed to mixing dry HSQ with MIBK ourselves.

Best Regards,

Matt

--
Matthew T. Moneck, Ph.D
Executive Director, Claire & John Bertucci Nanotechnology Laboratory
Electrical & Computer Engineering | Carnegie Mellon University
5000 Forbes Avenue, Pittsburgh, PA 15213-3890
Phone: 412-268-5430
ece.cmu.edu
nanofab.ece.cmu.edu

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From kevlister at mac.com  Wed Feb 15 16:14:51 2023
From: kevlister at mac.com (Kevin Lister)
Date: Wed, 15 Feb 2023 13:14:51 -0800
Subject: [labnetwork] HSQ Availability
In-Reply-To: <BF4FDD24-FA03-444E-8C40-A12259B210A6@hxcore.ol>
References: <BF4FDD24-FA03-444E-8C40-A12259B210A6@hxcore.ol>
Message-ID: <87FBFC02-CCC3-432F-BA2A-FFC16F8CAEC0@mac.com>

Hi Matt,
I would suggest you look at DisChem (https://discheminc.com/ <https://discheminc.com/>) as they have a good HSQ substitute with a short lead time. I have no affliction with DisChem.

Allresists? Medusa 82 is not really a direct substitute for HSQ.

Best Kevin

 



> On Feb 15, 2023, at 9:14 AM, Matt Moneck <mmoneck at andrew.cmu.edu> wrote:
> 
> Hi All,
>  
> I would like to solicit your feedback on HSQ options for ebeam litho.  Our group has traditionally worked with Dow Corning?s XR-1541-002 HSQ, and it has fit our needs for many years.  However, as our stock is now reaching a reorder point, we have reached out to vendors for quotes only to find that pricing has increased to a level we could have never imagined (not to mention lead times on the order of 80 business days).  With that in mind, we have been looking at alternative suppliers, including EM Resist (distributed through Integrated Micro Materials) and Allresist (Medusa 82).  
>  
> If anyone has experience working with the EM Resist and Allresist products, we would appreciate any feedback you might you might have on how they compare to the XR-1541.  For example, do you see any major differences in resolution, adhesion, dosing, etch resistance, etc.?  
>  
> If you have other alternatives, we would love to hear about them as well, although, we do prefer to buy pre-mixed solutions as opposed to mixing dry HSQ with MIBK ourselves.  
>  
> Best Regards,
> 
> Matt
>  
> --
> Matthew T. Moneck, Ph.D
> Executive Director, Claire & John Bertucci Nanotechnology Laboratory
> Electrical & Computer Engineering | Carnegie Mellon University
> 5000 Forbes Avenue, Pittsburgh, PA 15213-3890
> Phone: 412-268-5430
> ece.cmu.edu <http://ece.cmu.edu/> 
> nanofab.ece.cmu.edu <http://nanofab.ece.cmu.edu/>
>  
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork <https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork>
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From michael.rooks at yale.edu  Wed Feb 15 16:34:26 2023
From: michael.rooks at yale.edu (Michael Rooks)
Date: Wed, 15 Feb 2023 16:34:26 -0500
Subject: [labnetwork] HSQ Availability
In-Reply-To: <BF4FDD24-FA03-444E-8C40-A12259B210A6@hxcore.ol>
References: <BF4FDD24-FA03-444E-8C40-A12259B210A6@hxcore.ol>
Message-ID: <CAMH=VogPy3mo6D+eR-H40FceHkc20892SjZ1GGUTx4T_Vm2djA@mail.gmail.com>

We are now buying HSQ from Dischem <https://discheminc.com/>, in
Pennsylvania. Dischem and EMresist buy HSQ powder from AQM in Canada, and
then mix it in MIBK.
The resolution and sensitivity are similar to that of HSQ from Dow, but we
found that the Dischem HSQ sticks better if we bake it at 120C after
spinning.
Prices for thin HSQ are high, but manageable. Prices for thick HSQ (like
Dow's Fox-16) are prohibitively expensive. We will have to rework our
processes when we run out. We store HSQ in liquid nitrogen, so shelf life
is not an issue. You can also buy HSQ powder directly from AQM.

--------------------------------
Michael Rooks
nano.yale.edu


On Wed, Feb 15, 2023 at 3:59 PM Matt Moneck <mmoneck at andrew.cmu.edu> wrote:

> Hi All,
>
>
>
> I would like to solicit your feedback on HSQ options for ebeam litho.  Our
> group has traditionally worked with Dow Corning?s XR-1541-002 HSQ, and it
> has fit our needs for many years.  However, as our stock is now reaching a
> reorder point, we have reached out to vendors for quotes only to find that
> pricing has increased to a level we could have never imagined (not to
> mention lead times on the order of 80 business days).  With that in mind,
> we have been looking at alternative suppliers, including EM Resist
> (distributed through Integrated Micro Materials) and Allresist (Medusa
> 82).
>
>
>
> If anyone has experience working with the EM Resist and Allresist
> products, we would appreciate any feedback you might you might have on how
> they compare to the XR-1541.  For example, do you see any major differences
> in resolution, adhesion, dosing, etch resistance, etc.?
>
>
>
> If you have other alternatives, we would love to hear about them as well,
> although, we do prefer to buy pre-mixed solutions as opposed to mixing dry
> HSQ with MIBK ourselves.
>
>
>
> Best Regards,
>
>
> Matt
>
>
>
> --
> Matthew T. Moneck, Ph.D
> Executive Director, Claire & John Bertucci Nanotechnology Laboratory
> Electrical & Computer Engineering | Carnegie Mellon University
> 5000 Forbes Avenue, Pittsburgh, PA 15213-3890
> Phone: 412-268-5430
> ece.cmu.edu
> nanofab.ece.cmu.edu
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From lvchang at Central.UH.EDU  Wed Feb 15 17:03:32 2023
From: lvchang at Central.UH.EDU (Chang, Long)
Date: Wed, 15 Feb 2023 22:03:32 +0000
Subject: [labnetwork] HDD Best Practice
In-Reply-To: <YT2PR01MB43997B906731947303E9A02189DE9@YT2PR01MB4399.CANPRD01.PROD.OUTLOOK.COM>
References: <590390B9-BEB6-4FB7-AA4F-EC7FE04A1270@central.uh.edu>
 <YT2PR01MB43997B906731947303E9A02189DE9@YT2PR01MB4399.CANPRD01.PROD.OUTLOOK.COM>
Message-ID: <C3A2245E-CC1C-447A-B13E-73BDE04DBF58@central.uh.edu>

Hi All,

Thanks for the excellent feedback. I?ve learned that:
1) Raid Mirror can fail and requires proper management
2) Clone the drive and use the clone
3) Cloning software works, but not on all systems

Spoke with our IT guys and they did not recommend cloning over Raid Mirror because some security stuff doesn?t get cloned. The most likely scenario for our incident is that Drive 0 (master) got corrupted, Drive 1 mirrored and got corrupted, then Drive 0 failed. To keep our IT guys happy, we will do Raid Mirror and clone both drives. Use the cloned drives and store the original.

Thanks,
Long Chang
Technical Director
UH Nanofabrication Facility
Houston, TX
lvchang at central.uh.edu<mailto:lvchang at central.uh.edu>



On Feb 10, 2023, at 12:20 PM, Lino Eugene <lino.eugene at uwaterloo.ca<mailto:lino.eugene at uwaterloo.ca>> wrote:

Hi Long,

Most of our computers are connected to a Synology NAS with RAID 1 configuration in a private network. The Synology software Active to Backup Business does back up the Windows 7 and 10 computers and Macrium Reflect is used for Windows XP. Backups are run weekly and several versions are kept for few months. We also have an offline backup of the NAS.

When a hard drive fails, a new one is installed and the computer can be booted from a recovery media and connects to the NAS to recover a backup. This has saved us from long downtimes few times.

Best,

Lino Eugene, P.Eng., Ph.D.,
Micro/nanofabrication process engineer
Quantum-Nano Fabrication and Characterization Facility
Office of Research
QNC 1611
University of Waterloo
200 University Avenue West
Waterloo, ON, Canada
N2L 3G1

Ph: +1 519-888-4567 #37788
Cell: +1 226-929-1685
Websites:
https://uwaterloo.ca/quantum-nano-fabrication-and-characterization-facility/<https://urldefense.com/v3/__https://uwaterloo.ca/quantum-nano-fabrication-and-characterization-facility/__;!!LkSTlj0I!Fz_0sPyy-2VKRKid4LHDshzS9AC5Aabh_6fiQDmHUAKjJgU2Y-rpxmdhefSJI-8spE207wplrHg-KRcmSZYanOkxbidSbQ$>
https://fab.qnc.uwaterloo.ca/<https://urldefense.com/v3/__https://fab.qnc.uwaterloo.ca/__;!!LkSTlj0I!Fz_0sPyy-2VKRKid4LHDshzS9AC5Aabh_6fiQDmHUAKjJgU2Y-rpxmdhefSJI-8spE207wplrHg-KRcmSZYanOlLZfAVMQ$>

-----Message d'origine-----
De : labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> De la part de Chang, Long
Envoy? : 9 f?vrier 2023 10:15
? : Fab Network <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Objet : [labnetwork] HDD Best Practice

Hi All,

Yesterday we experienced a HDD failure for our AFM. This event should have been prevented by the Raid Mirror with 2 HDD. Our setup where we just have a single working drive and a spare backup clone has been more successful. We are planning to move away from Raid Mirror. Anyone has expertise/experience here they can share?

Thanks,
Long Chang
Technical Director
UH Nanofabrication Facility
Houston, TX
lvchang at central.uh.edu<mailto:lvchang at central.uh.edu>




_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork<https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!LkSTlj0I!Fz_0sPyy-2VKRKid4LHDshzS9AC5Aabh_6fiQDmHUAKjJgU2Y-rpxmdhefSJI-8spE207wplrHg-KRcmSZYanOnOEbMGEw$>

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From tony.olsen at utah.edu  Wed Feb 15 19:12:49 2023
From: tony.olsen at utah.edu (Tony L Olsen)
Date: Thu, 16 Feb 2023 00:12:49 +0000
Subject: [labnetwork] HF storage
In-Reply-To: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
References: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
Message-ID: <BYAPR11MB3496B7A8698B6019C5CEA670F1A09@BYAPR11MB3496.namprd11.prod.outlook.com>

Savitha

Unfortunately, I learned a long time ago that no matter how foolproof your system is, there is always a bigger fool.  I have also found that complex systems or exceptions tend to make things worse.  The simpler the system, the easier to follow and manage.

With that said, we developed a system that has worked well for us.  We have created several chemical categories.  Each category has a two-letter code and description (e.g., GA - General Acid, PR - Photoresist, HF - Hydrofluoric Acid, OA - Oxidizing Acid, SA - Sulfuric Acid, etc.).  We apply a chemical code sticker to EVERY chemical container that enters our facility - both chemicals supplied by Staff and those purchased separately by lab members.  The sticker is usually placed near the neck of the bottle.  The stickers are 1.25 X 1.625" in size.  The two-letter code is a 60pt font, while the description is only 11pt.  We place a similar, but larger sticker at every location where that chemical can be stored or used.  Those stickers are 4 x 3.25", with the code at 200pt and the description at 30pt.  For storage and usage, lab members simply have to match the code on the bottle to the code on the wet bench, fume hood, storage cabinet, or storage drawer.  If I find a chemical that needs some special handling or segregation I don't create an exception, I create a new category.

We decided not to try any color coding for two primary reasons:  1) yellow lights distort colors and 2) color blindness.

Prior to this system, I was frequently finding chemicals where they shouldn't be.  Since this system was implemented, I have rarely seen a violation (refer to my first statement).  This approach may not necessarily address your real concern, but it has eased my worries considerably.  In my opinion, using a different color bottle would only be effective if it is the ONLY chemical in the facility of that or similar color bottle.  And, you may run in to supply chain issues for non-standard bottles once in a while.

We provide both 49% HF and 6:1 BOE in gallon bottles.


Tony Olsen
Nanofab Cleanroom Supervisor/Process Engineer
University of Utah
36 S Wasatch Drive, Suite 2500
Salt Lake City, UT  84112
801-587-0651
www.nanofab.utah.edu




From: Savitha P <savithap at iisc.ac.in>
Sent: Wednesday, February 15, 2023 05:19
To: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] HF storage

Hi!

We recently had a couple of occasions where users had mistakenly used Hydrofluoric acid in place of Hydrochloric acid during RCA cleaning. To avoid this, one of the suggestions we have received from our OLSEH is to store HF in a different coloured bottle (currently all acids are stored in white translucent polypropylene bottles which are properly labelled). Accordingly, we had considered storing HF in opaque, brown colour HDPE bottles. However, that was not deemed acceptable by a section of users saying bottles should be translucent so that acid level inside can be judged.

Could you please let me know how small quantities of HF are stored in your respective fabs. Is there any regulation governing storage of HF, so that we could implement the same.

Thanks and regards,
Savitha

Dr. Savitha P
Chief Operating Officer
National Nanofabrication Centre
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph. +91 80 2293 3319
www.cense.iisc.ac.in<http://www.cense.iisc.ac.in>
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From jeanne.guo at rice.edu  Thu Feb 16 11:11:52 2023
From: jeanne.guo at rice.edu (Jing Guo)
Date: Thu, 16 Feb 2023 10:11:52 -0600
Subject: [labnetwork] HF storage
In-Reply-To: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
References: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
Message-ID: <25713BEA-37FD-4DC2-A57E-37A08B3A338D@rice.edu>

Hi Savitha, 

This is Jing from Rice U Nanofab. Fortunately we have enough space to store HF or BOE in a separate cabinet. HCl is stored with the other acids in the ?General Acids? cabinet. Also all HF related processes will be performed in the separate HF wet bench which is a independent bench from other benches. For all of our chemicals, we are using the ?Two-letter? labelling system which I learned from Utah NanoFab a long time ago. All chemical bottles, storage cabinets and wet benches have a ?two letter? sticker on. All HF bottles have the ?HF? stickers. HCl or other Acids have the ?GA? stickers (general acid). The stickers have to match to the cabinets and benches when you need to store or use them. 

For very limited lab or storage space, the simple solution I can think about will be separate secondary containers with different colors, and put different color stickers on the bottle caps. Also put a big color chart beside the storage cabinets and benches to clarify which is which.

I totally agree with Tony, no matter how great foolproof your system is, there will still be someone making mistakes. Wish our system can provide some idea to help. 


Best,
Jing  
---------------------------------------
Jing Guo Ph.D.
Research Scientist
SEA Cleanroom (SST 017)
Rice University
Houston, TX 
jeanne.guo at rice.edu
713-348-8227







> On Feb 15, 2023, at 6:19 AM, Savitha P <savithap at iisc.ac.in> wrote:
> 
> Hi!
> 
> We recently had a couple of occasions where users had mistakenly used Hydrofluoric acid in place of Hydrochloric acid during RCA cleaning. To avoid this, one of the suggestions we have received from our OLSEH is to store HF in a different coloured bottle (currently all acids are stored in white translucent polypropylene bottles which are properly labelled). Accordingly, we had considered storing HF in opaque, brown colour HDPE bottles. However, that was not deemed acceptable by a section of users saying bottles should be translucent so that acid level inside can be judged.
> 
> Could you please let me know how small quantities of HF are stored in your respective fabs. Is there any regulation governing storage of HF, so that we could implement the same.
> 
> Thanks and regards,
> Savitha
> 
> Dr. Savitha P
> Chief Operating Officer
> National Nanofabrication Centre
> Centre for Nanoscience and Engineering
> Indian Institute of Science
> Bangalore - 560012
> India.
> Ph. +91 80 2293 3319
> www.cense.iisc.ac.in <https://urldefense.com/v3/__http://www.cense.iisc.ac.in__;!!BuQPrrmRaQ!jwbzV_ZvSyB1Q5acEoqn2bdk1V1F959zmmHlnmL0yfvnJJ7KjK-9pQMpfGdp8hSSHKhA-Mmu9UAZSVxRNrPjWiAe3he9vQ$>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
> https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!jwbzV_ZvSyB1Q5acEoqn2bdk1V1F959zmmHlnmL0yfvnJJ7KjK-9pQMpfGdp8hSSHKhA-Mmu9UAZSVxRNrPjWiD0FvT2dA$ <https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!jwbzV_ZvSyB1Q5acEoqn2bdk1V1F959zmmHlnmL0yfvnJJ7KjK-9pQMpfGdp8hSSHKhA-Mmu9UAZSVxRNrPjWiD0FvT2dA$>
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From venables at seas.upenn.edu  Thu Feb 16 14:47:38 2023
From: venables at seas.upenn.edu (Travis Venables)
Date: Thu, 16 Feb 2023 14:47:38 -0500
Subject: [labnetwork] Explorer 14 gate valve adjustment.
Message-ID: <CAPzRSB2USUPULuwP-QvZ004-dFSuD60QZvNgCCTrLnqCH83OvQ@mail.gmail.com>

Hello,

We are currently trying to adjust the cryogate valve intermediate
position on our Explorer 14 sputtering chamber. The gate valve in question
is a "VAT 64046-PE48-0008/0053 A-1142418" Photo attached.

Any information/guidance on how to do this would be greatly appreciated.
Tech service is giving us a hard time with getting someone to talk to.
Thanks!
-- 
Travis Venables

Lead Cleanroom Equipment Engineer
Quattrone Nanofabrication Facility
University of Pennsylvania
P: 215-898-1787
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From venables at seas.upenn.edu  Thu Feb 16 14:48:23 2023
From: venables at seas.upenn.edu (Travis Venables)
Date: Thu, 16 Feb 2023 14:48:23 -0500
Subject: [labnetwork] Explorer 14 gate valve adjustment.
In-Reply-To: <CAPzRSB2USUPULuwP-QvZ004-dFSuD60QZvNgCCTrLnqCH83OvQ@mail.gmail.com>
References: <CAPzRSB2USUPULuwP-QvZ004-dFSuD60QZvNgCCTrLnqCH83OvQ@mail.gmail.com>
Message-ID: <CAPzRSB2TYDBfA=-4vLAw44ify35z1zAMY-GOS5jFKVKP9QOFhA@mail.gmail.com>

A better image

On Thu, Feb 16, 2023 at 2:47 PM Travis Venables <venables at seas.upenn.edu>
wrote:

> Hello,
>
> We are currently trying to adjust the cryogate valve intermediate
> position on our Explorer 14 sputtering chamber. The gate valve in question
> is a "VAT 64046-PE48-0008/0053 A-1142418" Photo attached.
>
> Any information/guidance on how to do this would be greatly appreciated.
> Tech service is giving us a hard time with getting someone to talk to.
> Thanks!
> --
> Travis Venables
>
> Lead Cleanroom Equipment Engineer
> Quattrone Nanofabrication Facility
> University of Pennsylvania
> P: 215-898-1787
>


-- 
Travis Venables

Lead Cleanroom Equipment Engineer
Quattrone Nanofabrication Facility
University of Pennsylvania
P: 215-898-1787
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From Paul.Reynolds at glasgow.ac.uk  Fri Feb 17 07:46:27 2023
From: Paul.Reynolds at glasgow.ac.uk (Paul Reynolds)
Date: Fri, 17 Feb 2023 12:46:27 +0000
Subject: [labnetwork] HSQ Availability
In-Reply-To: <CAMH=VogPy3mo6D+eR-H40FceHkc20892SjZ1GGUTx4T_Vm2djA@mail.gmail.com>
References: <BF4FDD24-FA03-444E-8C40-A12259B210A6@hxcore.ol>
 <CAMH=VogPy3mo6D+eR-H40FceHkc20892SjZ1GGUTx4T_Vm2djA@mail.gmail.com>
Message-ID: <LO6P302MB03176FD296EA6AE8750A959AB2A09@LO6P302MB0317.GBRP302.PROD.OUTLOOK.COM>

Hi all,

I've just bought a final 1L bottle of Fox-16, price has doubled since my last bottle in 2020 (unsure how much of that is a Brexit surcharge...). As we all know, actually communicating with Dow / DuPont<https://www.dupont.com/electronic-materials/spin-on-dielectrics.html> is basically impossible. I've bought through Univar and Ellsworth in the past. This time, Ellsworth confirmed what we heard at MAEBL 22:


1 litre is the only available size and the product will be obsolete:

The effective date of the product discontinuation will be July 1, 2023, with final orders

being accepted through May 1, 2023.

So it seems like the end of the road for 16% HSQ solutions we can freeze with ease. It's been a happy 3 years since I followed Mike's instructions on storage in LN2[1<https://mtl.mit.edu/pipermail/labnetwork/2019-April/003616.html>][2<https://www.researchgate.net/publication/273140774_Storing_HSQ_in_liquid_nitrogen>]. A big dewar cost me ?2.5k<https://www.coleparmer.co.uk/i/worthington-35hcb-11m-cryogenic-storage-dewar-system-35-l-10-canisters/0377941> or so and it's paid for itself. We freeze in 8ml bottles and put a new one out every week/two in the 4C fridge. This bottle should last us another couple of years.


***update???***
While writing this message I emailed Ellsworth again and they sent the following memo from DuPont:

UPDATE 11/11/22

To support and hearing our customers concerns DuPont APT intends to maintain FOx and XR-1541 series supply beyond July 1st, 2023, until 2025.However, potential supply risk still remains. Production hardware safety plus capability assessment to maintain high quality resin manufacturing and the final product is still in progress.


The cliff edge on Fox/XR-1541 has been pushed back for now, expect the prices to continue increasing though!

Best wishes
Paul



--
Dr Paul Reynolds
Electron Beam Lithography Engineer
James Watt Nanofabrication Centre
University of Glasgow

Working pattern: Mon,Wed,Thu,Fri 0800-1745


[cid:c657e835-5222-4c9e-b925-1a609a1ad6a9]
________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Michael Rooks <michael.rooks at yale.edu>
Sent: 15 February 2023 21:34
To: Matt Moneck <mmoneck at andrew.cmu.edu>
Cc: labnetwork <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] HSQ Availability

We are now buying HSQ from Dischem<https://discheminc.com/>, in Pennsylvania. Dischem and EMresist buy HSQ powder from AQM in Canada, and then mix it in MIBK.
The resolution and sensitivity are similar to that of HSQ from Dow, but we found that the Dischem HSQ sticks better if we bake it at 120C after spinning.
Prices for thin HSQ are high, but manageable. Prices for thick HSQ (like Dow's Fox-16) are prohibitively expensive. We will have to rework our processes when we run out. We store HSQ in liquid nitrogen, so shelf life is not an issue. You can also buy HSQ powder directly from AQM.

--------------------------------
Michael Rooks
nano.yale.edu<http://nano.yale.edu>


On Wed, Feb 15, 2023 at 3:59 PM Matt Moneck <mmoneck at andrew.cmu.edu<mailto:mmoneck at andrew.cmu.edu>> wrote:

Hi All,



I would like to solicit your feedback on HSQ options for ebeam litho.  Our group has traditionally worked with Dow Corning?s XR-1541-002 HSQ, and it has fit our needs for many years.  However, as our stock is now reaching a reorder point, we have reached out to vendors for quotes only to find that pricing has increased to a level we could have never imagined (not to mention lead times on the order of 80 business days).  With that in mind, we have been looking at alternative suppliers, including EM Resist (distributed through Integrated Micro Materials) and Allresist (Medusa 82).



If anyone has experience working with the EM Resist and Allresist products, we would appreciate any feedback you might you might have on how they compare to the XR-1541.  For example, do you see any major differences in resolution, adhesion, dosing, etch resistance, etc.?



If you have other alternatives, we would love to hear about them as well, although, we do prefer to buy pre-mixed solutions as opposed to mixing dry HSQ with MIBK ourselves.



Best Regards,

Matt



--
Matthew T. Moneck, Ph.D
Executive Director, Claire & John Bertucci Nanotechnology Laboratory
Electrical & Computer Engineering | Carnegie Mellon University
5000 Forbes Avenue, Pittsburgh, PA 15213-3890
Phone: 412-268-5430
ece.cmu.edu<http://ece.cmu.edu>
nanofab.ece.cmu.edu<http://nanofab.ece.cmu.edu>



_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From rosendo.bindoy at kaust.edu.sa  Fri Feb 17 06:54:23 2023
From: rosendo.bindoy at kaust.edu.sa (Rosendo Bindoy)
Date: Fri, 17 Feb 2023 11:54:23 +0000
Subject: [labnetwork] Explorer 14 gate valve adjustment.
In-Reply-To: <CAPzRSB2USUPULuwP-QvZ004-dFSuD60QZvNgCCTrLnqCH83OvQ@mail.gmail.com>
References: <CAPzRSB2USUPULuwP-QvZ004-dFSuD60QZvNgCCTrLnqCH83OvQ@mail.gmail.com>
Message-ID: <AM9PR02MB6772B368B48AF5DD89635E48B3A19@AM9PR02MB6772.eurprd02.prod.outlook.com>

Hello Travis,

Please see attached manual and refer to page 18-19. Hope this helps.

Regards,
Rosendo

Rosendo Bindoy
Equipment Specialist
KAUST Nanofabrication Core Lab
________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Travis Venables <venables at seas.upenn.edu>
Sent: Friday, February 17, 2023 12:08 AM
To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Explorer 14 gate valve adjustment.

Hello,

We are currently trying to adjust the cryogate valve intermediate position on our Explorer 14 sputtering chamber. The gate valve in question is a "VAT 64046-PE48-0008/0053 A-1142418" Photo attached.

Any information/guidance on how to do this would be greatly appreciated. Tech service is giving us a hard time with getting someone to talk to. Thanks!
--
Travis Venables

Lead Cleanroom Equipment Engineer
Quattrone Nanofabrication Facility
University of Pennsylvania
P: 215-898-1787
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From mondol at mit.edu  Fri Feb 17 09:16:47 2023
From: mondol at mit.edu (Mark K Mondol)
Date: Fri, 17 Feb 2023 14:16:47 +0000
Subject: [labnetwork] HSQ Availability
In-Reply-To: <LO6P302MB03176FD296EA6AE8750A959AB2A09@LO6P302MB0317.GBRP302.PROD.OUTLOOK.COM>
References: <BF4FDD24-FA03-444E-8C40-A12259B210A6@hxcore.ol>
 <CAMH=VogPy3mo6D+eR-H40FceHkc20892SjZ1GGUTx4T_Vm2djA@mail.gmail.com>
 <LO6P302MB03176FD296EA6AE8750A959AB2A09@LO6P302MB0317.GBRP302.PROD.OUTLOOK.COM>
Message-ID: <BN0PR01MB7119859593FEA1414084A25EDBA19@BN0PR01MB7119.prod.exchangelabs.com>

Thanks for the update on the Dow supply.  I have been very happy with both the DisChem and the EM Resist products and they appear to be virtually the same as the Dow product.

I would just add that I store my decanted vials in a -60C fridge. I have been using a Stirling UltraCold NEU25NEU.

Regards,
Mark K Mondol

----------------------------------------------------------------------------------
Mark K Mondol
Assistant Director NanoStructures Laboratory
And
Facility Manager Scanning Electron Beam Lithography Facility
Bldg 36 Room 229
 mondol at mit.edu
office - 617-253-9617
cell - 617-224-8756
________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Paul Reynolds <Paul.Reynolds at glasgow.ac.uk>
Sent: Friday, February 17, 2023 7:46 AM
To: Michael Rooks <michael.rooks at yale.edu>; Matt Moneck <mmoneck at andrew.cmu.edu>
Cc: labnetwork <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] HSQ Availability

Hi all,

I've just bought a final 1L bottle of Fox-16, price has doubled since my last bottle in 2020 (unsure how much of that is a Brexit surcharge...). As we all know, actually communicating with Dow / DuPont<https://www.dupont.com/electronic-materials/spin-on-dielectrics.html> is basically impossible. I've bought through Univar and Ellsworth in the past. This time, Ellsworth confirmed what we heard at MAEBL 22:


1 litre is the only available size and the product will be obsolete:

The effective date of the product discontinuation will be July 1, 2023, with final orders

being accepted through May 1, 2023.

So it seems like the end of the road for 16% HSQ solutions we can freeze with ease. It's been a happy 3 years since I followed Mike's instructions on storage in LN2[1<https://mtl.mit.edu/pipermail/labnetwork/2019-April/003616.html>][2<https://www.researchgate.net/publication/273140774_Storing_HSQ_in_liquid_nitrogen>]. A big dewar cost me ?2.5k<https://www.coleparmer.co.uk/i/worthington-35hcb-11m-cryogenic-storage-dewar-system-35-l-10-canisters/0377941> or so and it's paid for itself. We freeze in 8ml bottles and put a new one out every week/two in the 4C fridge. This bottle should last us another couple of years.


***update???***
While writing this message I emailed Ellsworth again and they sent the following memo from DuPont:

UPDATE 11/11/22

To support and hearing our customers concerns DuPont APT intends to maintain FOx and XR-1541 series supply beyond July 1st, 2023, until 2025.However, potential supply risk still remains. Production hardware safety plus capability assessment to maintain high quality resin manufacturing and the final product is still in progress.


The cliff edge on Fox/XR-1541 has been pushed back for now, expect the prices to continue increasing though!

Best wishes
Paul



--
Dr Paul Reynolds
Electron Beam Lithography Engineer
James Watt Nanofabrication Centre
University of Glasgow

Working pattern: Mon,Wed,Thu,Fri 0800-1745


[cid:c657e835-5222-4c9e-b925-1a609a1ad6a9]
________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Michael Rooks <michael.rooks at yale.edu>
Sent: 15 February 2023 21:34
To: Matt Moneck <mmoneck at andrew.cmu.edu>
Cc: labnetwork <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] HSQ Availability

We are now buying HSQ from Dischem<https://discheminc.com/>, in Pennsylvania. Dischem and EMresist buy HSQ powder from AQM in Canada, and then mix it in MIBK.
The resolution and sensitivity are similar to that of HSQ from Dow, but we found that the Dischem HSQ sticks better if we bake it at 120C after spinning.
Prices for thin HSQ are high, but manageable. Prices for thick HSQ (like Dow's Fox-16) are prohibitively expensive. We will have to rework our processes when we run out. We store HSQ in liquid nitrogen, so shelf life is not an issue. You can also buy HSQ powder directly from AQM.

--------------------------------
Michael Rooks
nano.yale.edu<http://nano.yale.edu>


On Wed, Feb 15, 2023 at 3:59 PM Matt Moneck <mmoneck at andrew.cmu.edu<mailto:mmoneck at andrew.cmu.edu>> wrote:

Hi All,



I would like to solicit your feedback on HSQ options for ebeam litho.  Our group has traditionally worked with Dow Corning?s XR-1541-002 HSQ, and it has fit our needs for many years.  However, as our stock is now reaching a reorder point, we have reached out to vendors for quotes only to find that pricing has increased to a level we could have never imagined (not to mention lead times on the order of 80 business days).  With that in mind, we have been looking at alternative suppliers, including EM Resist (distributed through Integrated Micro Materials) and Allresist (Medusa 82).



If anyone has experience working with the EM Resist and Allresist products, we would appreciate any feedback you might you might have on how they compare to the XR-1541.  For example, do you see any major differences in resolution, adhesion, dosing, etch resistance, etc.?



If you have other alternatives, we would love to hear about them as well, although, we do prefer to buy pre-mixed solutions as opposed to mixing dry HSQ with MIBK ourselves.



Best Regards,

Matt



--
Matthew T. Moneck, Ph.D
Executive Director, Claire & John Bertucci Nanotechnology Laboratory
Electrical & Computer Engineering | Carnegie Mellon University
5000 Forbes Avenue, Pittsburgh, PA 15213-3890
Phone: 412-268-5430
ece.cmu.edu<http://ece.cmu.edu>
nanofab.ece.cmu.edu<http://nanofab.ece.cmu.edu>



_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
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From ana.n.cohen.ctr at army.mil  Fri Feb 17 10:55:44 2023
From: ana.n.cohen.ctr at army.mil (Cohen, Ana N CTR USARMY DEVCOM ARL (USA))
Date: Fri, 17 Feb 2023 15:55:44 +0000
Subject: [labnetwork] Light filtering in photolithography bays
Message-ID: <BN8P111MB1447747DD0DB435851971A6B9FA19@BN8P111MB1447.NAMP111.PROD.OUTLOOK.COM>

Hi Travis,

A couple years ago we switched our lithography bay fluorescents (T8) to
amber tube LEDS from Super Bright LEDs. The light is more orange than yellow
so took a little adjusting (many users first thought it was darker than
usual), but visibility has actually been much better since we these bulbs
are more stable and we don't end up with dark patches from dead
fluorescents.
https://www.superbrightleds.com/t8-uv-blocking-led-tube-clean-room-18w-1800-
lumens-single-end-dual-end-ballast-bypass-type-b-32w-equivalent-1800k+packam
t-30-Pack 

Our fume hoods are still fluorescent bulbs with filters. I've definitely
noticed a degredation over time, but our facilities also have purchased
different filters over the years, so I can't provide much comparison to your
situation. However, it may be that your LEDS are emitting higher wavelengths
than the fluorescents. UV Process has UV filters along with the color tubes
which could be useful
https://www.uvprocess.com/c3/1790-gamtube-and-supertube-filters.html

We don't filter our computer screens because don't notice much light
pollution and we don't keep anything photosensitive nearby long-term, but
you can definitely turn down the brightness and blue saturation on the
monitors. We also have not needed to replace the darker pigment filters on
our doors' windows, but similar to the monitors they are placed sufficiently
distant from the photoresists/coated substrates.

Good luck!
Ana

--
Ana N. Cohen [she/her/hers]
Photolithography Cleanroom Technician
Contractor | General Technical Services, LLC
US Army Research Laboratory
2800 Powder Mill Road, Adelphi, MD 20783
Tel: 301-394-1527
Email: ana.n.cohen.ctr at army.mil

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From robert.ilic at nist.gov  Fri Feb 17 19:00:09 2023
From: robert.ilic at nist.gov (Ilic, Robert (Fed))
Date: Sat, 18 Feb 2023 00:00:09 +0000
Subject: [labnetwork] Process engineer job opening
Message-ID: <DM6PR09MB5928FD841F807A52E92EE14B97A19@DM6PR09MB5928.namprd09.prod.outlook.com>


The CNST NanoFab at NIST in Gaithersburg Maryland has a Nanofabrication Process Engineer job opening. Please see the job posting at:
https://www.usajobs.gov/job/707487400<https://gcc02.safelinks.protection.outlook.com/?url=https%3A%2F%2Fwww.usajobs.gov%2Fjob%2F707487400&data=05%7C01%7Crobert.ilic%40nist.gov%7C3744fce47416476276c108db11429cb2%7C2ab5d82fd8fa4797a93e054655c61dec%7C1%7C0%7C638122750027965167%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C3000%7C%7C%7C&sdata=BeRFu%2FdujAML4LJ8zp0n9n8rkrsyw377FtPlNbepJsg%3D&reserved=0>

Regards,
Rob

B. Robert Ilic, PhD
National Institute of Standards and Technology, Physical Measurement Laboratory
Physicist ? Microsystems and Nanotechnology Division
Group Leader and Manager ? Center for Nanoscale Science and Technology NanoFab
100 Bureau Drive, Mail Stop 6201, Building 216
Gaithersburg, MD 20899
(301) 975-3712<tel:+13019753712>
robert.ilic at nist.gov<mailto:robert.ilic at nist.gov>
https://www.nist.gov/cnst
http://scholar.google.com/citations?user=FxzEsBQAAAAJ&hl=en<https://gcc02.safelinks.protection.outlook.com/?url=http%3A%2F%2Fscholar.google.com%2Fcitations%3Fuser%3DFxzEsBQAAAAJ%26hl%3Den&data=05%7C01%7Crobert.ilic%40nist.gov%7C3744fce47416476276c108db11429cb2%7C2ab5d82fd8fa4797a93e054655c61dec%7C1%7C0%7C638122750027965167%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C3000%7C%7C%7C&sdata=J5gtoiLtLDf1gYS6tiMYzOrrb1JR%2FZQnUslJ6UET51Q%3D&reserved=0>

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From James.Grant at glasgow.ac.uk  Sun Feb 19 05:49:15 2023
From: James.Grant at glasgow.ac.uk (James Grant)
Date: Sun, 19 Feb 2023 10:49:15 +0000
Subject: [labnetwork] SPTS Rapier Module - Laser/White Light
 Interferometry
In-Reply-To: <LO2P302MB0043867A07D47A9DBB41821BB0DA9@LO2P302MB0043.GBRP302.PROD.OUTLOOK.COM>
References: <LO2P302MB0043867A07D47A9DBB41821BB0DA9@LO2P302MB0043.GBRP302.PROD.OUTLOOK.COM>
Message-ID: <LO2P302MB00436C6F8CB76006661B3048B0A79@LO2P302MB0043.GBRP302.PROD.OUTLOOK.COM>

Hello all,

Been almost two weeks since I posted this and believe we have come to some conclusions. Many thanks to all those who contributed. Tyndall and EPFL people were especially helpful.


  1.  We had a lot of back and forth with SPTS. They said that while they could see benefit of laser interferometry for our application, they currently did not offer the hardware to mount laser interferometry endpoint systems to the Rapier. We asked them to quote to so do, but they were unwilling. Fair enough.
  2.  I don't think the folks at Tyndall will mind me mentioning the challenges they have faced in getting laser interferometry on their SPTS Synapse module working. I understand the issue is spot stability and wobble, thought to be cased by heat from chamber walls - they Synapse walls are heated to 130oC. It's thought this won't be a problem on the Rapier as chamber walls are only heated to 55oC. Let's hope so.
  3.  We sent pictures and some dimensions of the pre-drilled holes at the top of our Rapier to Intellemetrics, our preferred laser endpoint system vendor. They believe it possible to mount a LEP 500 unit to the tool with not too much trouble.

Hope summary information is useful.

Cheers,

James

Dr. James Paul Grant
Research Engineer in Plasma Processing

Plasma Etch Group
james.grant at glasgow.ac.uk<mailto:james.grant at glasgow.ac.uk>

 [cid:image001.png at 01D9444F.CE818480]
      www.JWNC.gla.ac.uk<http://www.jwnc.gla.ac.uk/>
[cid:image002.png at 01D9444F.CE818480]  LinkedIn.com/company/JWNC
[cid:image003.png at 01D9444F.CE818480]  @UofG_JWNC<https://twitter.com/uofg_jwnc>

From: James Grant
Sent: 06 February 2023 14:38
To: labnetwork at mtl.mit.edu
Subject: SPTS Rapier Module - Laser/White Light Interferometry

Hello,

Hoping the community can feedback on their experiences.

In 2019 we purchased an SPTS Rapier DSiE tool. As well as doing Bosch processing we also require the tool to do mixed process etching. Quite a few of our users, on our other Si etch tools (OIPT Estrelas and STS Multiplex), use mixed process to etch SOI materials or a-Si on fused silica substrates. These systems have Intellemetrics LEP 410/500 red laser interferometer units for the purpose of end-point detection.

When we purchased the Rapier, SPTS did tell us that a laser end-point system could not be used. They encouraged us instead to use the Claritas OES system on the tool, however when we pointed out our typical use scenario (small substrate size, low % open area) they admitted that the Claritas would struggle to differentiate when to end-point. Our preferred laser interferometer vendor, Intellemetrics, say they have sold LEP 500 red laser interferometer units to SPTS but cannot say on what systems they have been used.

We have found that EPFL use white light interferometry<https://www.epfl.ch/research/facilities/cmi/equipment/etching/spts-rapier/> end-point detection on their Rapier module - have contacted Phillipe Fluckiger separately.

My question to the community is has anyone used a laser interferometry system on an SPTS Rapier? If so, could they feedback with their experiences. Apologies I'm asking such an open question!

Cheers,

James

Dr. James Paul Grant
Research Engineer in Plasma Processing

Plasma Processing Group
james.grant at glasgow.ac.uk<mailto:james.grant at glasgow.ac.uk>

 [cid:image001.png at 01D9444F.CE818480]
      www.JWNC.gla.ac.uk<http://www.jwnc.gla.ac.uk/>
[cid:image002.png at 01D9444F.CE818480]  LinkedIn.com/company/JWNC
[cid:image003.png at 01D9444F.CE818480]  @UofG_JWNC<https://twitter.com/uofg_jwnc>

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From mmoneck at andrew.cmu.edu  Mon Feb 20 18:06:16 2023
From: mmoneck at andrew.cmu.edu (Matt Moneck)
Date: Mon, 20 Feb 2023 18:06:16 -0500
Subject: [labnetwork] HSQ Availability
In-Reply-To: <CH0PR01MB713959EF4CAD0AFB5E9F9CBFBCA39@CH0PR01MB7139.prod.exchangelabs.com>
References: <BF4FDD24-FA03-444E-8C40-A12259B210A6@hxcore.ol>,
 <CH0PR01MB713959EF4CAD0AFB5E9F9CBFBCA39@CH0PR01MB7139.prod.exchangelabs.com>
Message-ID: <1F76742D-3596-4A7C-9100-5B826994C7C6@hxcore.ol>

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From gruis at cst.rwth-aachen.de  Wed Feb 22 03:43:37 2023
From: gruis at cst.rwth-aachen.de (Jan Gruis)
Date: Wed, 22 Feb 2023 09:43:37 +0100
Subject: [labnetwork] Repair of Lehighton 1510C Sheet Resistance Measurement
 System
Message-ID: <d00c8759-2935-e21b-72ea-683a4a7f56d1@cst.rwth-aachen.de>

Hello all!

Our Lehighton 1510C sheet resistance measurement system PC (from the 
1990's) broke, we lost the hard drive and we need to reinstall and 
reconfigure the software.

Semilab LEI (the former Lehighton Electronics team that manufactured our 
model) is not very helpful. Even after a few emails back and forth, it 
is not even clear (to us) if they still have the software for this tool.

Is there anyone else or maybe a company that can still repair this tool?


The main software Lei1500 for the device is stored on 5 diskettes, but 
the fifth is corrupt. Does anyone still have these installation disks? 
But even with these, it seems like additional setup steps are needed to 
set up the two ISA cards and other hardware.

I managed to recover data from the broken hard drive, but I couldn't get 
the software to control the hardware. Apparently, the PCs were delivered 
pre-configured, so simply copying the software is not enough.

Thank you and greetings from Germany
Jan


-- 
Jan Gruis
Reinraumingenieur

CST - Compound Semiconductor Technology
RWTH Aachen University
Sommerfeldstra?e 18
52074 Aachen
+49 241 80-27748
gruis at cst.rwth-aachen.de
www.cst.rwth-aachen.de
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From joseph.losby at ucalgary.ca  Wed Feb 22 13:04:14 2023
From: joseph.losby at ucalgary.ca (Joseph Losby)
Date: Wed, 22 Feb 2023 18:04:14 +0000
Subject: [labnetwork] Thoughts about sunlight entering cleanroom
Message-ID: <YT1PR01MB8715BE1F4D21DE06BE1C7D0F8EAA9@YT1PR01MB8715.CANPRD01.PROD.OUTLOOK.COM>

Hello, in the planning of our new facility the architects have placed windows along a side of the cleanroom (which is fine).  Outside of the windows is a hallway which is lined with large windows to the outside.  This would allow for sunlight to pass through two sets of windows and into the cleanroom.  Although standard windows are adequate for filtering a majority of shorter wavelength UV, some of the longer wavelength UV (UV-A, ~300-400 nm) will still transmit.  It is of my belief that it's standard practice not to have sunlight entering the cleanroom (especially a litho area).

Are any of your cleanrooms exposed to sunlight (I haven't seen any) and, if so, what type of window filtering do you use?

Cheers,

Joseph Losby, PhD.
Operations Manager, qLab
Quantum City, University of Calgary
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From alfred.renaldo at sjsu.edu  Wed Feb 22 16:46:21 2023
From: alfred.renaldo at sjsu.edu (alfred renaldo)
Date: Wed, 22 Feb 2023 13:46:21 -0800
Subject: [labnetwork] Thoughts about sunlight entering cleanroom
In-Reply-To: <YT1PR01MB8715BE1F4D21DE06BE1C7D0F8EAA9@YT1PR01MB8715.CANPRD01.PROD.OUTLOOK.COM>
References: <YT1PR01MB8715BE1F4D21DE06BE1C7D0F8EAA9@YT1PR01MB8715.CANPRD01.PROD.OUTLOOK.COM>
Message-ID: <7EED2E21-64E4-4EC3-99FB-14A35CC53BC7@hxcore.ol>

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From mpleil at unm.edu  Wed Feb 22 17:32:00 2023
From: mpleil at unm.edu (Matthias Pleil)
Date: Wed, 22 Feb 2023 22:32:00 +0000
Subject: [labnetwork] Thoughts about sunlight entering cleanroom
In-Reply-To: <YT1PR01MB8715BE1F4D21DE06BE1C7D0F8EAA9@YT1PR01MB8715.CANPRD01.PROD.OUTLOOK.COM>
References: <YT1PR01MB8715BE1F4D21DE06BE1C7D0F8EAA9@YT1PR01MB8715.CANPRD01.PROD.OUTLOOK.COM>
Message-ID: <DS0PR07MB99134A928E0511589E82FF58C7AA9@DS0PR07MB9913.namprd07.prod.outlook.com>

You can apply yellow film to the windows to filter the outside light.  Having windows does a lot for your folks.


Kind Regards,

Matthias Pleil, Ph.D.
Director Manufacturing Engineering Program
UNM MTTC Cleanroom Manager
Research Professor & Senior Lecturer III of Mech. Eng - UNM
PI - Support Center for Microsystems Education
Find great curriculum at: www.scme-support.org<http://www.scme-support.org/>
(505)272-7157

Join the MNTeSIG Team at www.mntesig.net<http://www.mntesig.net/>
[cid:4a36f1a5-3462-41d8-8310-2da0d1a30599]


________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Joseph Losby <joseph.losby at ucalgary.ca>
Sent: Wednesday, February 22, 2023 11:04 AM
To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Thoughts about sunlight entering cleanroom

You don't often get email from joseph.losby at ucalgary.ca. Learn why this is important<https://aka.ms/LearnAboutSenderIdentification>

  [EXTERNAL]

Hello, in the planning of our new facility the architects have placed windows along a side of the cleanroom (which is fine).  Outside of the windows is a hallway which is lined with large windows to the outside.  This would allow for sunlight to pass through two sets of windows and into the cleanroom.  Although standard windows are adequate for filtering a majority of shorter wavelength UV, some of the longer wavelength UV (UV-A, ~300-400 nm) will still transmit.  It is of my belief that it's standard practice not to have sunlight entering the cleanroom (especially a litho area).

Are any of your cleanrooms exposed to sunlight (I haven't seen any) and, if so, what type of window filtering do you use?

Cheers,

Joseph Losby, PhD.
Operations Manager, qLab
Quantum City, University of Calgary
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From rmorrison at draper.com  Wed Feb 22 17:51:12 2023
From: rmorrison at draper.com (Morrison, Richard H., Jr)
Date: Wed, 22 Feb 2023 22:51:12 +0000
Subject: [labnetwork] [EXTERNAL] Thoughts about sunlight entering
 cleanroom
In-Reply-To: <YT1PR01MB8715BE1F4D21DE06BE1C7D0F8EAA9@YT1PR01MB8715.CANPRD01.PROD.OUTLOOK.COM>
References: <YT1PR01MB8715BE1F4D21DE06BE1C7D0F8EAA9@YT1PR01MB8715.CANPRD01.PROD.OUTLOOK.COM>
Message-ID: <BN2P110MB13831F3DBA4F81AFEFF61733CEAA9@BN2P110MB1383.NAMP110.PROD.OUTLOOK.COM>

This is Rick Morrison from Draper, when we built our fab we have windows that let in sunlight to a clean corridor, on the Litho doors we used a yellow filter film attenuated the Sunlight.



Check this site out, good product



Rick



Richard Morrison

DMTS

Draper Laboratory

555 Technology Square

Cambridge Ma  02139

Office: 617-258-3420

Cell: 508-930-3461









From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Joseph Losby
Sent: Wednesday, February 22, 2023 1:04 PM
To: labnetwork at mtl.mit.edu
Subject: [EXTERNAL] [labnetwork] Thoughts about sunlight entering cleanroom



        CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe.



Hello, in the planning of our new facility the architects have placed windows along a side of the cleanroom (which is fine).  Outside of the windows is a hallway which is lined with large windows to the outside.  This would allow for sunlight to pass through two sets of windows and into the cleanroom.  Although standard windows are adequate for filtering a majority of shorter wavelength UV, some of the longer wavelength UV (UV-A, ~300-400 nm) will still transmit.  It is of my belief that it's standard practice not to have sunlight entering the cleanroom (especially a litho area).



Are any of your cleanrooms exposed to sunlight (I haven't seen any) and, if so, what type of window filtering do you use?



Cheers,



Joseph Losby, PhD.

Operations Manager, qLab

Quantum City, University of Calgary

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From savithap at iisc.ac.in  Thu Feb 23 03:32:01 2023
From: savithap at iisc.ac.in (Savitha P)
Date: Thu, 23 Feb 2023 08:32:01 +0000
Subject: [labnetwork] HF storage
In-Reply-To: <25713BEA-37FD-4DC2-A57E-37A08B3A338D@rice.edu>
References: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
 <25713BEA-37FD-4DC2-A57E-37A08B3A338D@rice.edu>
Message-ID: <MA1PR01MB3995D73C588D49AED5053995EFAB9@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>

Dear All:

Thank you very much for all the suggestions. We have currently incorporated the following as per our space availability.  HF has been segregated and kept in a secondary container so that users will not mistake the same with HCl. Size of Labels on the bottles have been increased for HF only, so that users have another mark for identification.  As per our protocol, all safety incidents at wet etch leads to an automatic removal of access to the cleanroom. The user will be allowed only after a retraining and retest and will be provided access only after a satisfactory drive in.

Regards,
Savitha
________________________________
From: Jing Guo <jeanne.guo at rice.edu>
Sent: 16 February 2023 21:41
To: Savitha P <savithap at iisc.ac.in>
Cc: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] HF storage

External Email

Hi Savitha,

This is Jing from Rice U Nanofab. Fortunately we have enough space to store HF or BOE in a separate cabinet. HCl is stored with the other acids in the ?General Acids? cabinet. Also all HF related processes will be performed in the separate HF wet bench which is a independent bench from other benches. For all of our chemicals, we are using the ?Two-letter? labelling system which I learned from Utah NanoFab a long time ago. All chemical bottles, storage cabinets and wet benches have a ?two letter? sticker on. All HF bottles have the ?HF? stickers. HCl or other Acids have the ?GA? stickers (general acid). The stickers have to match to the cabinets and benches when you need to store or use them.

For very limited lab or storage space, the simple solution I can think about will be separate secondary containers with different colors, and put different color stickers on the bottle caps. Also put a big color chart beside the storage cabinets and benches to clarify which is which.

I totally agree with Tony, no matter how great foolproof your system is, there will still be someone making mistakes. Wish our system can provide some idea to help.


Best,
Jing
---------------------------------------
Jing Guo Ph.D.
Research Scientist
SEA Cleanroom (SST 017)
Rice University
Houston, TX
jeanne.guo at rice.edu<mailto:jeanne.guo at rice.edu>
713-348-8227







On Feb 15, 2023, at 6:19 AM, Savitha P <savithap at iisc.ac.in<mailto:savithap at iisc.ac.in>> wrote:

Hi!

We recently had a couple of occasions where users had mistakenly used Hydrofluoric acid in place of Hydrochloric acid during RCA cleaning. To avoid this, one of the suggestions we have received from our OLSEH is to store HF in a different coloured bottle (currently all acids are stored in white translucent polypropylene bottles which are properly labelled). Accordingly, we had considered storing HF in opaque, brown colour HDPE bottles. However, that was not deemed acceptable by a section of users saying bottles should be translucent so that acid level inside can be judged.

Could you please let me know how small quantities of HF are stored in your respective fabs. Is there any regulation governing storage of HF, so that we could implement the same.

Thanks and regards,
Savitha


Dr. Savitha P
Chief Operating Officer
National Nanofabrication Centre
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph. +91 80 2293 3319
www.cense.iisc.ac.in<https://urldefense.com/v3/__http://www.cense.iisc.ac.in__;!!BuQPrrmRaQ!jwbzV_ZvSyB1Q5acEoqn2bdk1V1F959zmmHlnmL0yfvnJJ7KjK-9pQMpfGdp8hSSHKhA-Mmu9UAZSVxRNrPjWiAe3he9vQ$>

_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
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From yakimom at sunypoly.edu  Thu Feb 23 09:07:50 2023
From: yakimom at sunypoly.edu (Michael Yakimov)
Date: Thu, 23 Feb 2023 14:07:50 +0000
Subject: [labnetwork] HF storage
In-Reply-To: <MA1PR01MB3995D73C588D49AED5053995EFAB9@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
References: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
 <25713BEA-37FD-4DC2-A57E-37A08B3A338D@rice.edu>
 <MA1PR01MB3995D73C588D49AED5053995EFAB9@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
Message-ID: <BY3PR05MB8260AC4F40363CEF20A9CDC3CEAB9@BY3PR05MB8260.namprd05.prod.outlook.com>

One issue with "automatic removal of access":
punitive measures are not the best if safety is involved. Especially for minor things, where user may have a small event that didn't lead to serious consequences - but the user may share the problem, get some advice, and some things may improve after all. If user is discouraged from that by automatic punishment, then things work worse overall.

It's a big philosophic question in general but looks like safety actually benefits from a less punishing approach.  Of course, such dilemmas go well beyond cleanroom or chemical safety and experience comes from many industries. I heard a lot of such discussions in aviation safety - and I would call that even more safety-critical business than what we're doing...


Thanks

Mike



_______________________________________________

Michael Yakimov

Research scientist

College of Nanoscale Science and Engineering

SUNY Polytechnic Institute



253 Fuller rd.

Albany NY 12203



Phone: 518-437-8609 lab

e-mail: yakimom at sunypoly.edu







________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Savitha P <savithap at iisc.ac.in>
Sent: Thursday, February 23, 2023 3:32 AM
To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] HF storage

Dear All:

Thank you very much for all the suggestions. We have currently incorporated the following as per our space availability.  HF has been segregated and kept in a secondary container so that users will not mistake the same with HCl. Size of Labels on the bottles have been increased for HF only, so that users have another mark for identification.  As per our protocol, all safety incidents at wet etch leads to an automatic removal of access to the cleanroom. The user will be allowed only after a retraining and retest and will be provided access only after a satisfactory drive in.

Regards,
Savitha
________________________________
From: Jing Guo <jeanne.guo at rice.edu>
Sent: 16 February 2023 21:41
To: Savitha P <savithap at iisc.ac.in>
Cc: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: Re: [labnetwork] HF storage

External Email

Hi Savitha,

This is Jing from Rice U Nanofab. Fortunately we have enough space to store HF or BOE in a separate cabinet. HCl is stored with the other acids in the ?General Acids? cabinet. Also all HF related processes will be performed in the separate HF wet bench which is a independent bench from other benches. For all of our chemicals, we are using the ?Two-letter? labelling system which I learned from Utah NanoFab a long time ago. All chemical bottles, storage cabinets and wet benches have a ?two letter? sticker on. All HF bottles have the ?HF? stickers. HCl or other Acids have the ?GA? stickers (general acid). The stickers have to match to the cabinets and benches when you need to store or use them.

For very limited lab or storage space, the simple solution I can think about will be separate secondary containers with different colors, and put different color stickers on the bottle caps. Also put a big color chart beside the storage cabinets and benches to clarify which is which.

I totally agree with Tony, no matter how great foolproof your system is, there will still be someone making mistakes. Wish our system can provide some idea to help.


Best,
Jing
---------------------------------------
Jing Guo Ph.D.
Research Scientist
SEA Cleanroom (SST 017)
Rice University
Houston, TX
jeanne.guo at rice.edu<mailto:jeanne.guo at rice.edu>
713-348-8227







On Feb 15, 2023, at 6:19 AM, Savitha P <savithap at iisc.ac.in<mailto:savithap at iisc.ac.in>> wrote:

Hi!

We recently had a couple of occasions where users had mistakenly used Hydrofluoric acid in place of Hydrochloric acid during RCA cleaning. To avoid this, one of the suggestions we have received from our OLSEH is to store HF in a different coloured bottle (currently all acids are stored in white translucent polypropylene bottles which are properly labelled). Accordingly, we had considered storing HF in opaque, brown colour HDPE bottles. However, that was not deemed acceptable by a section of users saying bottles should be translucent so that acid level inside can be judged.

Could you please let me know how small quantities of HF are stored in your respective fabs. Is there any regulation governing storage of HF, so that we could implement the same.

Thanks and regards,
Savitha


Dr. Savitha P
Chief Operating Officer
National Nanofabrication Centre
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph. +91 80 2293 3319
www.cense.iisc.ac.in<https://urldefense.com/v3/__http://www.cense.iisc.ac.in__;!!BuQPrrmRaQ!jwbzV_ZvSyB1Q5acEoqn2bdk1V1F959zmmHlnmL0yfvnJJ7KjK-9pQMpfGdp8hSSHKhA-Mmu9UAZSVxRNrPjWiAe3he9vQ$>

_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!jwbzV_ZvSyB1Q5acEoqn2bdk1V1F959zmmHlnmL0yfvnJJ7KjK-9pQMpfGdp8hSSHKhA-Mmu9UAZSVxRNrPjWiD0FvT2dA$

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From hollingshead.19 at osu.edu  Thu Feb 23 09:09:01 2023
From: hollingshead.19 at osu.edu (Hollingshead, Dave)
Date: Thu, 23 Feb 2023 14:09:01 +0000
Subject: [labnetwork] Thoughts about sunlight entering cleanroom
In-Reply-To: <DS0PR07MB99134A928E0511589E82FF58C7AA9@DS0PR07MB9913.namprd07.prod.outlook.com>
References: <YT1PR01MB8715BE1F4D21DE06BE1C7D0F8EAA9@YT1PR01MB8715.CANPRD01.PROD.OUTLOOK.COM>
 <DS0PR07MB99134A928E0511589E82FF58C7AA9@DS0PR07MB9913.namprd07.prod.outlook.com>
Message-ID: <SA1PR01MB65443816E4373EE44094D881F3AB9@SA1PR01MB6544.prod.exchangelabs.com>

We have a full bank of windows on the outside wall of our hallway/user storage area. The litho bay segment is protected by yellow film.

-Dave
Dave Hollingshead
Manager, Research Operations

The Ohio State University
Nanotech West Labs
Suite 100, 1381 Kinnear Rd, Columbus, OH 43212
614.292.1355 Office
hollingshead.19 at osu.edu<mailto:hollingshead.19 at osu.edu> / nanotech.osu.edu<http://nanotech.osu.edu>

Pronouns: he/him/his



From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Matthias Pleil
Sent: Wednesday, February 22, 2023 17:32
To: Joseph Losby <joseph.losby at ucalgary.ca>; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Thoughts about sunlight entering cleanroom

You can apply yellow film to the windows to filter the outside light. Having windows does a lot for your folks. Kind Regards, Matthias Pleil, Ph.?D. Director Manufacturing Engineering Program UNM MTTC Cleanroom Manager Research Professor &

You can apply yellow film to the windows to filter the outside light.  Having windows does a lot for your folks.


Kind Regards,

Matthias Pleil, Ph.D.
Director Manufacturing Engineering Program
UNM MTTC Cleanroom Manager
Research Professor & Senior Lecturer III of Mech. Eng - UNM
PI - Support Center for Microsystems Education
Find great curriculum at: www.scme-support.org<https://urldefense.com/v3/__http:/www.scme-support.org/__;!!KGKeukY!0lotjQ3dtCCkNDOAURacf-vYWlaDAjwMGebE8vZAVJRht-MTz2939C_UVaFdZIEcvR0zpr5i4d_WIPtkLWK9PQ$>
(505)272-7157

Join the MNTeSIG Team at www.mntesig.net<https://urldefense.com/v3/__http:/www.mntesig.net/__;!!KGKeukY!0lotjQ3dtCCkNDOAURacf-vYWlaDAjwMGebE8vZAVJRht-MTz2939C_UVaFdZIEcvR0zpr5i4d_WIPvg-LPG4A$>
[cid:image001.png at 01D94766.779107D0]


________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> on behalf of Joseph Losby <joseph.losby at ucalgary.ca<mailto:joseph.losby at ucalgary.ca>>
Sent: Wednesday, February 22, 2023 11:04 AM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu> <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: [labnetwork] Thoughts about sunlight entering cleanroom

You don't often get email from joseph.losby at ucalgary.ca<mailto:joseph.losby at ucalgary.ca>. Learn why this is important<https://urldefense.com/v3/__https:/aka.ms/LearnAboutSenderIdentification__;!!KGKeukY!0lotjQ3dtCCkNDOAURacf-vYWlaDAjwMGebE8vZAVJRht-MTz2939C_UVaFdZIEcvR0zpr5i4d_WIPt1FLkV7w$>

  [EXTERNAL]
Hello, in the planning of our new facility the architects have placed windows along a side of the cleanroom (which is fine).  Outside of the windows is a hallway which is lined with large windows to the outside.  This would allow for sunlight to pass through two sets of windows and into the cleanroom.  Although standard windows are adequate for filtering a majority of shorter wavelength UV, some of the longer wavelength UV (UV-A, ~300-400 nm) will still transmit.  It is of my belief that it's standard practice not to have sunlight entering the cleanroom (especially a litho area).

Are any of your cleanrooms exposed to sunlight (I haven't seen any) and, if so, what type of window filtering do you use?

Cheers,

Joseph Losby, PhD.
Operations Manager, qLab
Quantum City, University of Calgary
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From kckeenan at seas.upenn.edu  Thu Feb 23 09:16:36 2023
From: kckeenan at seas.upenn.edu (Kyle Keenan)
Date: Thu, 23 Feb 2023 09:16:36 -0500
Subject: [labnetwork] Thoughts about sunlight entering cleanroom
In-Reply-To: <YT1PR01MB8715BE1F4D21DE06BE1C7D0F8EAA9@YT1PR01MB8715.CANPRD01.PROD.OUTLOOK.COM>
References: <YT1PR01MB8715BE1F4D21DE06BE1C7D0F8EAA9@YT1PR01MB8715.CANPRD01.PROD.OUTLOOK.COM>
Message-ID: <CAGTqYdFPnuTcmVz6Zqj1v0HRSdpcQJ=MAopnCEC4pV5Hz5bhUA@mail.gmail.com>

We have the same setup as Draper. Whatever filtering we have in place on
the sliding glass doors to the litho bays must be working, because we've
had no issues, and the afternoon sun shines very brightly on the front of
our building, which is primarily glass.

Kyle

On Wed, Feb 22, 2023 at 4:33 PM Joseph Losby <joseph.losby at ucalgary.ca>
wrote:

> Hello, in the planning of our new facility the architects have placed
> windows along a side of the cleanroom (which is fine).  Outside of the
> windows is a hallway which is lined with large windows to the outside.
> This would allow for sunlight to pass through two sets of windows and into
> the cleanroom.  Although standard windows are adequate for filtering a
> majority of shorter wavelength UV, some of the longer wavelength UV (UV-A,
> ~300-400 nm) will still transmit.  It is of my belief that it's standard
> practice not to have sunlight entering the cleanroom (especially a litho
> area).
>
> Are any of your cleanrooms exposed to sunlight (I haven't seen any) and,
> if so, what type of window filtering do you use?
>
> Cheers,
>
> Joseph Losby, PhD.
> Operations Manager, qLab
> Quantum City, University of Calgary
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
>
> https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!IBzWLUs!WYiY5TVXZ8JhMAXv0Lf5L1HuBBoUET6R62XM6HDnZnawMnAOBGjQSvMnKOIYHAFdrZJlh_bFWVnAM3RpYEo5OQ_dEvD_5Yk$
>


-- 
Kyle Keenan

Senior Manager - Laboratory Operations
Quattrone Nanofabrication Facility
University of Pennsylvania
P: 215-898-7560
F: 215-573-4925
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From sandra.malhotra at tamu.edu  Thu Feb 23 09:30:21 2023
From: sandra.malhotra at tamu.edu (Malhotra, Sandra Guy)
Date: Thu, 23 Feb 2023 14:30:21 +0000
Subject: [labnetwork] Thoughts about sunlight entering cleanroom
In-Reply-To: <YT1PR01MB8715BE1F4D21DE06BE1C7D0F8EAA9@YT1PR01MB8715.CANPRD01.PROD.OUTLOOK.COM>
References: <YT1PR01MB8715BE1F4D21DE06BE1C7D0F8EAA9@YT1PR01MB8715.CANPRD01.PROD.OUTLOOK.COM>
Message-ID: <SA2PR11MB48731B17C9AC105F5056967188AB9@SA2PR11MB4873.namprd11.prod.outlook.com>

At AggieFab at Texas A&M, we have windows along one side of the mobile cleanroom (MCR) units that face a hallway that has windows to the outside. The natural light is quite pleasant. We applied yellow film along the MCR windows for the bay where litho processing is done. We have not experienced any issues.

Sandra G. Malhotra, Ph.D.  |  Technical Lab Manager

AggieFab Nanofabrication Facility
https://aggiefab.tamu.edu/
Department of Electrical & Computer Engineering, College of Engineering | Texas A&M University
3253 TAMU | College Station, TX 77843
ph: 979.845.3199  |  sandra.malhotra at tamu.edu
- - - - - - - - - - - - - - - - - - - - - - - -
TEXAS A&M UNIVERSITY | FEARLESS on Every Front

________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Joseph Losby <joseph.losby at ucalgary.ca>
Sent: Wednesday, February 22, 2023 12:04 PM
To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Thoughts about sunlight entering cleanroom

Hello, in the planning of our new facility the architects have placed windows along a side of the cleanroom (which is fine). Outside of the windows is a hallway which is lined with large windows to the outside. This would allow for sunlight
ZjQcmQRYFpfptBannerStart
This Message Is From an External Sender
This message came from outside your organization.

ZjQcmQRYFpfptBannerEnd
Hello, in the planning of our new facility the architects have placed windows along a side of the cleanroom (which is fine).  Outside of the windows is a hallway which is lined with large windows to the outside.  This would allow for sunlight to pass through two sets of windows and into the cleanroom.  Although standard windows are adequate for filtering a majority of shorter wavelength UV, some of the longer wavelength UV (UV-A, ~300-400 nm) will still transmit.  It is of my belief that it's standard practice not to have sunlight entering the cleanroom (especially a litho area).

Are any of your cleanrooms exposed to sunlight (I haven't seen any) and, if so, what type of window filtering do you use?

Cheers,

Joseph Losby, PhD.
Operations Manager, qLab
Quantum City, University of Calgary
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From repemc at rit.edu  Thu Feb 23 09:56:50 2023
From: repemc at rit.edu (Robert Pearson)
Date: Thu, 23 Feb 2023 14:56:50 +0000
Subject: [labnetwork] HF storage
In-Reply-To: <BY3PR05MB8260AC4F40363CEF20A9CDC3CEAB9@BY3PR05MB8260.namprd05.prod.outlook.com>
References: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
 <25713BEA-37FD-4DC2-A57E-37A08B3A338D@rice.edu>
 <MA1PR01MB3995D73C588D49AED5053995EFAB9@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
 <BY3PR05MB8260AC4F40363CEF20A9CDC3CEAB9@BY3PR05MB8260.namprd05.prod.outlook.com>
Message-ID: <SJ0PR16MB4752325965BF5FEADD2C33DFC3AB9@SJ0PR16MB4752.namprd16.prod.outlook.com>

At Rochester Institute of Technology we have designated HF baths of various water to HF ratios (50:1, 10:1 etc.) that are on certain dedicated benches.
The baths are only changed on the normal schedule or when the etch rate monitors indicate a change, or there is some contamination suspected.
No students (or faculty) can access the 49% HF used to change the baths, it is only done by staff.

Rob Pearson,
RIT Microelectronic Engineering.

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Michael Yakimov
Sent: Thursday, February 23, 2023 9:08 AM
To: Savitha P <savithap at iisc.ac.in>; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] HF storage

One issue with "automatic removal of access":
punitive measures are not the best if safety is involved. Especially for minor things, where user may have a small event that didn't lead to serious consequences - but the user may share the problem, get some advice, and some things may improve after all. If user is discouraged from that by automatic punishment, then things work worse overall.

It's a big philosophic question in general but looks like safety actually benefits from a less punishing approach.  Of course, such dilemmas go well beyond cleanroom or chemical safety and experience comes from many industries. I heard a lot of such discussions in aviation safety - and I would call that even more safety-critical business than what we're doing...


Thanks

Mike



_______________________________________________

Michael Yakimov

Research scientist

College of Nanoscale Science and Engineering

SUNY Polytechnic Institute



253 Fuller rd.

Albany NY 12203



Phone: 518-437-8609 lab

e-mail: yakimom at sunypoly.edu<mailto:yakimom at sunypoly.edu>









________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> on behalf of Savitha P <savithap at iisc.ac.in<mailto:savithap at iisc.ac.in>>
Sent: Thursday, February 23, 2023 3:32 AM
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu> <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: Re: [labnetwork] HF storage

Dear All:

Thank you very much for all the suggestions. We have currently incorporated the following as per our space availability.  HF has been segregated and kept in a secondary container so that users will not mistake the same with HCl. Size of Labels on the bottles have been increased for HF only, so that users have another mark for identification.  As per our protocol, all safety incidents at wet etch leads to an automatic removal of access to the cleanroom. The user will be allowed only after a retraining and retest and will be provided access only after a satisfactory drive in.

Regards,
Savitha
________________________________
From: Jing Guo <jeanne.guo at rice.edu<mailto:jeanne.guo at rice.edu>>
Sent: 16 February 2023 21:41
To: Savitha P <savithap at iisc.ac.in<mailto:savithap at iisc.ac.in>>
Cc: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu> <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: Re: [labnetwork] HF storage

External Email

Hi Savitha,

This is Jing from Rice U Nanofab. Fortunately we have enough space to store HF or BOE in a separate cabinet. HCl is stored with the other acids in the 'General Acids' cabinet. Also all HF related processes will be performed in the separate HF wet bench which is a independent bench from other benches. For all of our chemicals, we are using the 'Two-letter' labelling system which I learned from Utah NanoFab a long time ago. All chemical bottles, storage cabinets and wet benches have a 'two letter' sticker on. All HF bottles have the 'HF' stickers. HCl or other Acids have the 'GA' stickers (general acid). The stickers have to match to the cabinets and benches when you need to store or use them.

For very limited lab or storage space, the simple solution I can think about will be separate secondary containers with different colors, and put different color stickers on the bottle caps. Also put a big color chart beside the storage cabinets and benches to clarify which is which.

I totally agree with Tony, no matter how great foolproof your system is, there will still be someone making mistakes. Wish our system can provide some idea to help.


Best,
Jing
---------------------------------------
Jing Guo Ph.D.
Research Scientist
SEA Cleanroom (SST 017)
Rice University
Houston, TX
jeanne.guo at rice.edu<mailto:jeanne.guo at rice.edu>
713-348-8227







On Feb 15, 2023, at 6:19 AM, Savitha P <savithap at iisc.ac.in<mailto:savithap at iisc.ac.in>> wrote:

Hi!

We recently had a couple of occasions where users had mistakenly used Hydrofluoric acid in place of Hydrochloric acid during RCA cleaning. To avoid this, one of the suggestions we have received from our OLSEH is to store HF in a different coloured bottle (currently all acids are stored in white translucent polypropylene bottles which are properly labelled). Accordingly, we had considered storing HF in opaque, brown colour HDPE bottles. However, that was not deemed acceptable by a section of users saying bottles should be translucent so that acid level inside can be judged.

Could you please let me know how small quantities of HF are stored in your respective fabs. Is there any regulation governing storage of HF, so that we could implement the same.

Thanks and regards,
Savitha

Dr. Savitha P
Chief Operating Officer
National Nanofabrication Centre
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph. +91 80 2293 3319
www.cense.iisc.ac.in<https://urldefense.com/v3/__http:/www.cense.iisc.ac.in__;!!BuQPrrmRaQ!jwbzV_ZvSyB1Q5acEoqn2bdk1V1F959zmmHlnmL0yfvnJJ7KjK-9pQMpfGdp8hSSHKhA-Mmu9UAZSVxRNrPjWiAe3he9vQ$>
_______________________________________________
labnetwork mailing list
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https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!jwbzV_ZvSyB1Q5acEoqn2bdk1V1F959zmmHlnmL0yfvnJJ7KjK-9pQMpfGdp8hSSHKhA-Mmu9UAZSVxRNrPjWiD0FvT2dA$<https://urldefense.com/v3/__https:/mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!jwbzV_ZvSyB1Q5acEoqn2bdk1V1F959zmmHlnmL0yfvnJJ7KjK-9pQMpfGdp8hSSHKhA-Mmu9UAZSVxRNrPjWiD0FvT2dA$>

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From jpalmer at Princeton.EDU  Thu Feb 23 11:10:51 2023
From: jpalmer at Princeton.EDU (Joseph E. Palmer)
Date: Thu, 23 Feb 2023 11:10:51 -0500
Subject: [labnetwork] Thoughts about sunlight entering cleanroom
In-Reply-To: <YT1PR01MB8715BE1F4D21DE06BE1C7D0F8EAA9@YT1PR01MB8715.CANPRD01.PROD.OUTLOOK.COM>
References: <YT1PR01MB8715BE1F4D21DE06BE1C7D0F8EAA9@YT1PR01MB8715.CANPRD01.PROD.OUTLOOK.COM>
Message-ID: <c150c121-83bb-efaa-e9ce-49080c5fe9e8@exchange.princeton.edu>

A cleanroom should never have windows to the outside.? While using 
yellow film to reduce UV from sunlight works, this must periodically be 
replaced.? Also, the window interferes with the temperature stability of 
the environment.

Your situation may be ok, as you will only need filters.

Regards,

Joe

On 2/22/2023 1:04 PM, Joseph Losby wrote:
> Hello, in the planning of our new facility the architects have placed 
> windows along a side of the cleanroom (which is fine). Outside of the 
> windows is a hallway which is lined with large windows to the 
> outside.? This would allow for sunlight to pass through two sets of 
> windows and into the cleanroom. Although standard windows are adequate 
> for filtering a majority of shorter wavelength UV, some of the longer 
> wavelength UV (UV-A, ~300-400 nm) will still transmit. It is of my 
> belief that it's standard practice not to have sunlight entering the 
> cleanroom (especially a litho area).
>
> Are any of your cleanrooms exposed to sunlight (I haven't seen any) 
> and, if so, what type of window filtering do you use?
>
> Cheers,
>
> Joseph Losby, PhD.
> Operations Manager, qLab
> Quantum City, University of Calgary
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork

-- 
Joseph E. Palmer
Chief of Operations for the MNFC
PIM, Princeton University
Contact:
Office: 609-258-4706
Cell: 609-731-8962
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From ianharvey at weber.edu  Thu Feb 23 11:35:34 2023
From: ianharvey at weber.edu (Ian Harvey)
Date: Thu, 23 Feb 2023 09:35:34 -0700
Subject: [labnetwork] on how to impose reasonable consequences for
 infractions / Fwd: HF storage
References: <BY3PR05MB8260AC4F40363CEF20A9CDC3CEAB9@BY3PR05MB8260.namprd05.prod.outlook.com>
Message-ID: <37A8F8E3-DD6F-4B58-A565-79F93575177B@weber.edu>

Dear friends,

long-time?.  But I do enjoy following the feeds.

Savitha, I agree with Michael and offer a suggestion that seemed to work well in past lives:

Revoke nightime access for the offender. (Contact the faculty member before you do this.  They will likely support you and appreciate the approach.)

?I?m sorry you demonstrated that you cannot work unsupervised. Nightime access is revoked so that we can provide additional training and oversight.  You may apply again for off-hours access again in <some period of time, weeks or months, depending on the situation and how much you trust the person otherwise?>

This approach has the following benefits:
? it focuses on a key purpose of the educational / research facility: impactful hands-on experiences, learning in a safe place (they may be fired in industry for this, but here we learn in a safe place)
? nonconfrontational.  Actions lead directly to reasonable consequences without scolding or bitter feelings involved.
? it avoids having the faculty member jump down your throat, because it allows the research to continue
? it only inconveniences the student, and this very much.  The pain of facing the faculty member is quite severe.

All the best to you,

?Ian

Ian R. Harvey, Ph.D.
Director, Miller Advanced Research Solutions
College of Engineering, Applied Science & Technology
Weber State University
Falcon Hill (HAFB West Gate)

https://weber.edu/mars
https://www.linkedin.com/in/ian-harvey-967422173/ 

633 N Falcon Hills Dr.
Clearfield , UT 84015
801/726-7648 (c)


?

Begin forwarded message:

From: Michael Yakimov <yakimom at sunypoly.edu>
Subject: Re: [labnetwork] HF storage
Date: February 23, 2023 at 7:07:50 AM MST
To: Savitha P <savithap at iisc.ac.in>, "labnetwork at mtl.mit.edu" <labnetwork at mtl.mit.edu>

One issue with "automatic removal of access": 
punitive measures are not the best if safety is involved. Especially for minor things, where user may have a small event that didn't lead to serious consequences - but the user may share the problem, get some advice, and some things may improve after all. If user is discouraged from that by automatic punishment, then things work worse overall.

It's a big philosophic question in general but looks like safety actually benefits from a less punishing approach.  Of course, such dilemmas go well beyond cleanroom or chemical safety and experience comes from many industries. I heard a lot of such discussions in aviation safety - and I would call that even more safety-critical business than what we're doing...


Thanks

Mike

 
_______________________________________________
Michael Yakimov
Research scientist
College of Nanoscale Science and Engineering
SUNY Polytechnic Institute
 
253 Fuller rd.
Albany NY 12203
 
Phone: 518-437-8609 lab
e-mail: yakimom at sunypoly.edu <mailto:yakimom at sunypoly.edu>







From: labnetwork <labnetwork-bounces at mtl.mit.edu <mailto:labnetwork-bounces at mtl.mit.edu>> on behalf of Savitha P <savithap at iisc.ac.in <mailto:savithap at iisc.ac.in>>
Sent: Thursday, February 23, 2023 3:32 AM
To: labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu> <labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>>
Subject: Re: [labnetwork] HF storage
 
Dear All:

Thank you very much for all the suggestions. We have currently incorporated the following as per our space availability.  HF has been segregated and kept in a secondary container so that users will not mistake the same with HCl. Size of Labels on the bottles have been increased for HF only, so that users have another mark for identification.  As per our protocol, all safety incidents at wet etch leads to an automatic removal of access to the cleanroom. The user will be allowed only after a retraining and retest and will be provided access only after a satisfactory drive in.

Regards,
Savitha
From: Jing Guo <jeanne.guo at rice.edu <mailto:jeanne.guo at rice.edu>>
Sent: 16 February 2023 21:41
To: Savitha P <savithap at iisc.ac.in <mailto:savithap at iisc.ac.in>>
Cc: labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu> <labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>>
Subject: Re: [labnetwork] HF storage
 
External Email

Hi Savitha, 

This is Jing from Rice U Nanofab. Fortunately we have enough space to store HF or BOE in a separate cabinet. HCl is stored with the other acids in the ?General Acids? cabinet. Also all HF related processes will be performed in the separate HF wet bench which is a independent bench from other benches. For all of our chemicals, we are using the ?Two-letter? labelling system which I learned from Utah NanoFab a long time ago. All chemical bottles, storage cabinets and wet benches have a ?two letter? sticker on. All HF bottles have the ?HF? stickers. HCl or other Acids have the ?GA? stickers (general acid). The stickers have to match to the cabinets and benches when you need to store or use them. 

For very limited lab or storage space, the simple solution I can think about will be separate secondary containers with different colors, and put different color stickers on the bottle caps. Also put a big color chart beside the storage cabinets and benches to clarify which is which.

I totally agree with Tony, no matter how great foolproof your system is, there will still be someone making mistakes. Wish our system can provide some idea to help. 


Best,
Jing  
---------------------------------------
Jing Guo Ph.D.
Research Scientist
SEA Cleanroom (SST 017)
Rice University
Houston, TX 
jeanne.guo at rice.edu <mailto:jeanne.guo at rice.edu>
713-348-8227







> On Feb 15, 2023, at 6:19 AM, Savitha P <savithap at iisc.ac.in <mailto:savithap at iisc.ac.in>> wrote:
> 
> Hi!
> 
> We recently had a couple of occasions where users had mistakenly used Hydrofluoric acid in place of Hydrochloric acid during RCA cleaning. To avoid this, one of the suggestions we have received from our OLSEH is to store HF in a different coloured bottle (currently all acids are stored in white translucent polypropylene bottles which are properly labelled). Accordingly, we had considered storing HF in opaque, brown colour HDPE bottles. However, that was not deemed acceptable by a section of users saying bottles should be translucent so that acid level inside can be judged.
> 
> Could you please let me know how small quantities of HF are stored in your respective fabs. Is there any regulation governing storage of HF, so that we could implement the same.
> 
> Thanks and regards,
> Savitha
> 
> Dr. Savitha P
> Chief Operating Officer
> National Nanofabrication Centre
> Centre for Nanoscience and Engineering
> Indian Institute of Science
> Bangalore - 560012
> India.
> Ph. +91 80 2293 3319
> www.cense.iisc.ac.in <https://www.google.com/url?q=https://urldefense.com/v3/__http://www.cense.iisc.ac.in__;!!BuQPrrmRaQ!jwbzV_ZvSyB1Q5acEoqn2bdk1V1F959zmmHlnmL0yfvnJJ7KjK-9pQMpfGdp8hSSHKhA-Mmu9UAZSVxRNrPjWiAe3he9vQ$&source=gmail-imap&ust=1677768487000000&usg=AOvVaw3NC4mqv91cXUAHBtrHA4UF>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
> https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!jwbzV_ZvSyB1Q5acEoqn2bdk1V1F959zmmHlnmL0yfvnJJ7KjK-9pQMpfGdp8hSSHKhA-Mmu9UAZSVxRNrPjWiD0FvT2dA$ <https://www.google.com/url?q=https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!jwbzV_ZvSyB1Q5acEoqn2bdk1V1F959zmmHlnmL0yfvnJJ7KjK-9pQMpfGdp8hSSHKhA-Mmu9UAZSVxRNrPjWiD0FvT2dA$&source=gmail-imap&ust=1677768487000000&usg=AOvVaw1zYBuoidJdEbD9MILBjWe8>
_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu <mailto:labnetwork at mtl.mit.edu>
https://www.google.com/url?q=https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork&source=gmail-imap&ust=1677768487000000&usg=AOvVaw3cxIZlEUR1BOaG6kJ3DLL4

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From delima1 at llnl.gov  Thu Feb 23 18:15:26 2023
From: delima1 at llnl.gov (DeLima, Terri L.)
Date: Thu, 23 Feb 2023 23:15:26 +0000
Subject: [labnetwork] HF storage
In-Reply-To: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
References: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
Message-ID: <BY5PR09MB5524B412B2538D576B7FAD8591AB9@BY5PR09MB5524.namprd09.prod.outlook.com>


,[cid:image001.png at 01D94799.A7941B10][cid:image002.png at 01D94799.A7941B10]

We have had this problem in the past due to a lot of the chemical bottles look so similar, and the labeling of the product can be very small.
As a "best practice" we label all manufacturer bottles of anything containing HF with a "Need A Buddy"  sticker as soon as it arrives to our facility.
We also have a "need a buddy"  rule when you pour HF, the label also acts as a reminder.
Hope this helps.


Terri DeLima
Operations Manager/Supervisor
Center for Micro/Nano & Bioengineering

Phone: 925-423-4526
Mobile: 925-315-0731
Email: delima1 at llnl.gov<mailto:delima1 at llnl.gov>

7000 East Ave L-222
Livermore , CA 94550
Lawrence Livermore National Laboratory (LLNL)<https://www.google.com/url?sa=t&rct=j&q=&esrc=s&source=web&cd=1&cad=rja&ved=0CCcQFjAA&url=https%3A%2F%2Fwww.llnl.gov%2F&ei=AWvxUv64C8XYyAGcyYGYBQ&usg=AFQjCNE2zEfMLOrvp3oztLKwd7XmYy_4og&bvm=bv.60444564,d.aWc>







From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Savitha P
Sent: Wednesday, February 15, 2023 4:19 AM
To: labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] HF storage

Hi!

We recently had a couple of occasions where users had mistakenly used Hydrofluoric acid in place of Hydrochloric acid during RCA cleaning. To avoid this, one of the suggestions we have received from our OLSEH is to store HF in a different coloured bottle (currently all acids are stored in white translucent polypropylene bottles which are properly labelled). Accordingly, we had considered storing HF in opaque, brown colour HDPE bottles. However, that was not deemed acceptable by a section of users saying bottles should be translucent so that acid level inside can be judged.

Could you please let me know how small quantities of HF are stored in your respective fabs. Is there any regulation governing storage of HF, so that we could implement the same.

Thanks and regards,
Savitha

Dr. Savitha P
Chief Operating Officer
National Nanofabrication Centre
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph. +91 80 2293 3319
www.cense.iisc.ac.in<https://urldefense.us/v3/__http:/www.cense.iisc.ac.in__;!!G2kpM7uM-TzIFchu!n68-Mr7YE9UwL_Gc4UmnXDVt-FzsxxxTx0-0uBgK11awCrEG23jS4SCjb6uxmdsS$>
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From hollingshead.19 at osu.edu  Fri Feb 24 17:06:06 2023
From: hollingshead.19 at osu.edu (Hollingshead, Dave)
Date: Fri, 24 Feb 2023 22:06:06 +0000
Subject: [labnetwork] third party companies for servicing PlasmaTherm
 DRIE systems
In-Reply-To: <CAOycKMbUJpM2rnqE5b3QXVC2tq1+Qa2b6ek6GvyRwg0nkEu=Fw@mail.gmail.com>
References: <CAOycKMbUJpM2rnqE5b3QXVC2tq1+Qa2b6ek6GvyRwg0nkEu=Fw@mail.gmail.com>
Message-ID: <SA1PR01MB6544719D84561CB239102632F3A89@SA1PR01MB6544.prod.exchangelabs.com>

Fubo et al,

We have also recently been having some issues with responsiveness and communication from PlasmaTherm. In this case we are dealing with tool upgrades/installation so we don?t necessarily have the option of going to a third party, but wanted to share our difficulties. I would also be interested in hearing if others have been having similar experiences or have any suggestions.

Thanks,
-Dave
Dave Hollingshead
Manager, Research Operations

The Ohio State University
Nanotech West Labs
Suite 100, 1381 Kinnear Rd, Columbus, OH 43212
614.292.1355 Office
hollingshead.19 at osu.edu<mailto:hollingshead.19 at osu.edu> / nanotech.osu.edu<http://nanotech.osu.edu>

Pronouns: he/him/his



From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Football
Sent: Thursday, January 26, 2023 16:45
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] third party companies for servicing PlasmaTherm DRIE systems

Dear all, We are having trouble getting PlasmaTherm to respond to our questions and service quote. Wanted to ask if you know of any third party companies that work on PlasmaTherm systems, specifically their DRIE tool? Thanks for any suggestions!Fubo


Dear all,



We are having trouble getting PlasmaTherm to respond to our questions and service quote. Wanted to ask if you know of any third party companies that work on PlasmaTherm systems, specifically their DRIE tool?



Thanks for any suggestions!


Fubo Rao, Ph.D.,
Nanofabrication Cleanroom Manager,
Center for Nanoscale Materials,
Argonne National Laboratory
9700 S. Cass Ave, Lemont, IL 60439
Phone: 630-252-5708
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From robert.macdonald at ge.com  Mon Feb 27 09:44:33 2023
From: robert.macdonald at ge.com (Macdonald, Robert (GE Research, US))
Date: Mon, 27 Feb 2023 14:44:33 +0000
Subject: [labnetwork] HF storage- chemical training
In-Reply-To: <MA1PR01MB3995D73C588D49AED5053995EFAB9@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
References: <MA1PR01MB399567893801A2B30E2EA9E0EFA39@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
 <25713BEA-37FD-4DC2-A57E-37A08B3A338D@rice.edu>
 <MA1PR01MB3995D73C588D49AED5053995EFAB9@MA1PR01MB3995.INDPRD01.PROD.OUTLOOK.COM>
Message-ID: <9e4e892dbcce4d488403797ad86135c7@ge.com>

HI Savitha,

I was trained to check the label when I pulled the chemical from storage and before pouring it. I have always trained others this way.

I would check your protocols for this small detail as it can help.

If we pour the wrong chemical it isn't just HF that can be dangerous.

Rob
GE Research



From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Savitha P
Sent: Thursday, February 23, 2023 3:32 AM
To: labnetwork at mtl.mit.edu
Subject: EXT: Re: [labnetwork] HF storage

WARNING: This email originated from outside of GE. Please validate the sender's email address before clicking on links or attachments as they may not be safe.

Dear All:

Thank you very much for all the suggestions. We have currently incorporated the following as per our space availability.  HF has been segregated and kept in a secondary container so that users will not mistake the same with HCl. Size of Labels on the bottles have been increased for HF only, so that users have another mark for identification.  As per our protocol, all safety incidents at wet etch leads to an automatic removal of access to the cleanroom. The user will be allowed only after a retraining and retest and will be provided access only after a satisfactory drive in.

Regards,
Savitha
________________________________
From: Jing Guo <jeanne.guo at rice.edu<mailto:jeanne.guo at rice.edu>>
Sent: 16 February 2023 21:41
To: Savitha P <savithap at iisc.ac.in<mailto:savithap at iisc.ac.in>>
Cc: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu> <labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>>
Subject: Re: [labnetwork] HF storage

External Email

Hi Savitha,

This is Jing from Rice U Nanofab. Fortunately we have enough space to store HF or BOE in a separate cabinet. HCl is stored with the other acids in the 'General Acids' cabinet. Also all HF related processes will be performed in the separate HF wet bench which is a independent bench from other benches. For all of our chemicals, we are using the 'Two-letter' labelling system which I learned from Utah NanoFab a long time ago. All chemical bottles, storage cabinets and wet benches have a 'two letter' sticker on. All HF bottles have the 'HF' stickers. HCl or other Acids have the 'GA' stickers (general acid). The stickers have to match to the cabinets and benches when you need to store or use them.

For very limited lab or storage space, the simple solution I can think about will be separate secondary containers with different colors, and put different color stickers on the bottle caps. Also put a big color chart beside the storage cabinets and benches to clarify which is which.

I totally agree with Tony, no matter how great foolproof your system is, there will still be someone making mistakes. Wish our system can provide some idea to help.


Best,
Jing
---------------------------------------
Jing Guo Ph.D.
Research Scientist
SEA Cleanroom (SST 017)
Rice University
Houston, TX
jeanne.guo at rice.edu<mailto:jeanne.guo at rice.edu>
713-348-8227







On Feb 15, 2023, at 6:19 AM, Savitha P <savithap at iisc.ac.in<mailto:savithap at iisc.ac.in>> wrote:

Hi!

We recently had a couple of occasions where users had mistakenly used Hydrofluoric acid in place of Hydrochloric acid during RCA cleaning. To avoid this, one of the suggestions we have received from our OLSEH is to store HF in a different coloured bottle (currently all acids are stored in white translucent polypropylene bottles which are properly labelled). Accordingly, we had considered storing HF in opaque, brown colour HDPE bottles. However, that was not deemed acceptable by a section of users saying bottles should be translucent so that acid level inside can be judged.

Could you please let me know how small quantities of HF are stored in your respective fabs. Is there any regulation governing storage of HF, so that we could implement the same.

Thanks and regards,
Savitha

Dr. Savitha P
Chief Operating Officer
National Nanofabrication Centre
Centre for Nanoscience and Engineering
Indian Institute of Science
Bangalore - 560012
India.
Ph. +91 80 2293 3319
www.cense.iisc.ac.in<https://urldefense.com/v3/__http:/www.cense.iisc.ac.in__;!!BuQPrrmRaQ!jwbzV_ZvSyB1Q5acEoqn2bdk1V1F959zmmHlnmL0yfvnJJ7KjK-9pQMpfGdp8hSSHKhA-Mmu9UAZSVxRNrPjWiAe3he9vQ$>
_______________________________________________
labnetwork mailing list
labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!jwbzV_ZvSyB1Q5acEoqn2bdk1V1F959zmmHlnmL0yfvnJJ7KjK-9pQMpfGdp8hSSHKhA-Mmu9UAZSVxRNrPjWiD0FvT2dA$<https://urldefense.com/v3/__https:/mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!jwbzV_ZvSyB1Q5acEoqn2bdk1V1F959zmmHlnmL0yfvnJJ7KjK-9pQMpfGdp8hSSHKhA-Mmu9UAZSVxRNrPjWiD0FvT2dA$>

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From jeanne.guo at rice.edu  Mon Feb 27 14:15:44 2023
From: jeanne.guo at rice.edu (Jing Guo)
Date: Mon, 27 Feb 2023 13:15:44 -0600
Subject: [labnetwork] third party companies for servicing PlasmaTherm
 DRIE systems
In-Reply-To: <CAOycKMbUJpM2rnqE5b3QXVC2tq1+Qa2b6ek6GvyRwg0nkEu=Fw@mail.gmail.com>
References: <CAOycKMbUJpM2rnqE5b3QXVC2tq1+Qa2b6ek6GvyRwg0nkEu=Fw@mail.gmail.com>
Message-ID: <F422449A-6767-4BAB-B194-8E6409C4DFE2@rice.edu>

Hi Fubo, 

I am not sure which email or contact you requested the quote. Usually the response time is longer from PlasmaTherm comparing to other vendors. We only have one PECVD system from them, so we don?t have a third party company for the service. 

David Harris is the business development manager for university and R&D. His email is David.harris at plasmatherm.com and his cell is #727-370-3947. It should be fine to directly call him. 
I have some other contacts from plasma-therm tech-support or hardware service. Depending on different requests, I usually will send message to all of them.
Please let me know whether you need other contacts information. 



Best,
Jing
---------------------------------------
Jing Guo Ph.D.
Research Scientist
SEA Cleanroom (SST 017)
Rice University
Houston, TX 
jeanne.guo at rice.edu
713-348-8227







> On Jan 26, 2023, at 3:45 PM, Football <yaofootball at gmail.com> wrote:
> 
> Dear all,
> 
> We are having trouble getting PlasmaTherm to respond to our questions and service quote. Wanted to ask if you know of any third party companies that work on PlasmaTherm systems, specifically their DRIE tool?
> 
> Thanks for any suggestions!
> 
> Fubo Rao, Ph.D.,
> Nanofabrication Cleanroom Manager,
> Center for Nanoscale Materials,
> Argonne National Laboratory
> 9700 S. Cass Ave, Lemont, IL 60439
> Phone: 630-252-5708
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!nr9gEfF_LOC45c28UD1lJn-F8Rf9xVboLB2Px_P67EiCS6CRWdO99D57RvLBZwBgawSPE0Z1O_p7npg5YM55D-EDfpqDu78$ 

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From yaofootball at gmail.com  Mon Feb 27 15:00:33 2023
From: yaofootball at gmail.com (Football)
Date: Mon, 27 Feb 2023 14:00:33 -0600
Subject: [labnetwork] third party companies for servicing PlasmaTherm
 DRIE systems
In-Reply-To: <F422449A-6767-4BAB-B194-8E6409C4DFE2@rice.edu>
References: <CAOycKMbUJpM2rnqE5b3QXVC2tq1+Qa2b6ek6GvyRwg0nkEu=Fw@mail.gmail.com>
 <F422449A-6767-4BAB-B194-8E6409C4DFE2@rice.edu>
Message-ID: <CAOycKMbn4s+oUH2qn9p4JRF3AJ=HQNrQZwUraZA1HGwwJotYxA@mail.gmail.com>

Thank you all very much for providing the very helpful information!!

Thanks,



*Fubo Rao, Ph.D.,*



*Nanofabrication Cleanroom Manager,*

*Center for Nanoscale Materials,*

*Argonne National Laboratory*

*9700 S. Cass Ave, Lemont, IL 60439*

*Email: **frao at anl.gov* <frao at anl.gov>

*Phone: 630-252-5708*

On Mon, Feb 27, 2023 at 1:15 PM Jing Guo <jeanne.guo at rice.edu> wrote:

> Hi Fubo,
>
> I am not sure which email or contact you requested the quote. Usually the
> response time is longer from PlasmaTherm comparing to other vendors. We
> only have one PECVD system from them, so we don?t have a third party
> company for the service.
>
> David Harris is the business development manager for university and R&D.
> His email is David.harris at plasmatherm.com and his cell is #727-370-3947.
> It should be fine to directly call him.
> I have some other contacts from plasma-therm tech-support or hardware
> service. Depending on different requests, I usually will send message to
> all of them.
> Please let me know whether you need other contacts information.
>
>
>
> Best,
> Jing
> ---------------------------------------
> Jing Guo Ph.D.
> Research Scientist
> SEA Cleanroom (SST 017)
> Rice University
> Houston, TX
> jeanne.guo at rice.edu
> 713-348-8227
>
>
>
>
>
>
>
> On Jan 26, 2023, at 3:45 PM, Football <yaofootball at gmail.com> wrote:
>
> Dear all,
>
> We are having trouble getting PlasmaTherm to respond to our questions and
> service quote. Wanted to ask if you know of any third party companies that
> work on PlasmaTherm systems, specifically their DRIE tool?
>
> Thanks for any suggestions!
>
> *Fubo Rao, Ph.D.,*
> *Nanofabrication Cleanroom Manager,*
> *Center for Nanoscale Materials,*
> *Argonne National Laboratory*
> *9700 S. Cass Ave, Lemont, IL 60439*
>
> *Phone: 630-252-5708*
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
>
> https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!nr9gEfF_LOC45c28UD1lJn-F8Rf9xVboLB2Px_P67EiCS6CRWdO99D57RvLBZwBgawSPE0Z1O_p7npg5YM55D-EDfpqDu78$
>
>
>
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From david.harris at plasmatherm.com  Mon Feb 27 15:24:20 2023
From: david.harris at plasmatherm.com (Harris, David (Plasma-Therm LLC))
Date: Mon, 27 Feb 2023 20:24:20 +0000
Subject: [labnetwork] Labnetwork and Plasma-Therm
In-Reply-To: <SA1PR01MB6544719D84561CB239102632F3A89@SA1PR01MB6544.prod.exchangelabs.com>
References: <CAOycKMbUJpM2rnqE5b3QXVC2tq1+Qa2b6ek6GvyRwg0nkEu=Fw@mail.gmail.com>
 <SA1PR01MB6544719D84561CB239102632F3A89@SA1PR01MB6544.prod.exchangelabs.com>
Message-ID: <DM8PR02MB8006118E30B8CB296D56E2F892AF9@DM8PR02MB8006.namprd02.prod.outlook.com>

Hello Labnetwork Community,

Below are a few points we would like to share with this community:

  *   The Semiconductor industry has been badly disrupted due to supply chain issues causing severe shortage of material.  This is further exaggerated by the tight labor market, also a result of the Pandemic.
  *   Multiple Plasma-Therm Resources have been shifted to support short term gaps in our field service scheduling and on-site support.
  *   By copying or sending emails directly to TechSupport at Plasmatherm.com<mailto:TechSupport at Plasmatherm.com> our internal tracking system is invoked, ensuring a formal response and Service Ticket is formally generated.
     *   We have multiple Engineering (Field Service and other) openings / requisitions for which we appreciate any help you can provide with recommended candidates http://plasmatherm.com/careers/index.html

Thank you!

David Harris
Business Development Manager ? Universities and R&D

[cid:image001.png at 01D94ABC.24C5CC30]

phone +1.215.321.1037
mobile +1.727.370.3947
David.Harris at plasmatherm.com<mailto:David.Harris at plasmatherm.com> | www.plasmatherm.com<http://plasmatherm.com/>

10050 16th St. North | St. Petersburg, FL 33716 USA
[Text  Description automatically generated]

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Hollingshead, Dave
Sent: Friday, February 24, 2023 5:06 PM
To: Football <yaofootball at gmail.com>; labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] third party companies for servicing PlasmaTherm DRIE systems

CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe.

Fubo et al,

We have also recently been having some issues with responsiveness and communication from PlasmaTherm. In this case we are dealing with tool upgrades/installation so we don?t necessarily have the option of going to a third party, but wanted to share our difficulties. I would also be interested in hearing if others have been having similar experiences or have any suggestions.

Thanks,
-Dave
Dave Hollingshead
Manager, Research Operations

The Ohio State University
Nanotech West Labs
Suite 100, 1381 Kinnear Rd, Columbus, OH 43212
614.292.1355 Office
hollingshead.19 at osu.edu<mailto:hollingshead.19 at osu.edu> / nanotech.osu.edu<http://nanotech.osu.edu>

Pronouns: he/him/his



From: labnetwork <labnetwork-bounces at mtl.mit.edu<mailto:labnetwork-bounces at mtl.mit.edu>> On Behalf Of Football
Sent: Thursday, January 26, 2023 16:45
To: labnetwork at mtl.mit.edu<mailto:labnetwork at mtl.mit.edu>
Subject: [labnetwork] third party companies for servicing PlasmaTherm DRIE systems

Dear all, We are having trouble getting PlasmaTherm to respond to our questions and service quote. Wanted to ask if you know of any third party companies that work on PlasmaTherm systems, specifically their DRIE tool? Thanks for any suggestions!Fubo


Dear all,



We are having trouble getting PlasmaTherm to respond to our questions and service quote. Wanted to ask if you know of any third party companies that work on PlasmaTherm systems, specifically their DRIE tool?



Thanks for any suggestions!


Fubo Rao, Ph.D.,
Nanofabrication Cleanroom Manager,
Center for Nanoscale Materials,
Argonne National Laboratory
9700 S. Cass Ave, Lemont, IL 60439
Phone: 630-252-5708
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From rmorrison at draper.com  Mon Feb 27 17:51:54 2023
From: rmorrison at draper.com (Morrison, Richard H., Jr)
Date: Mon, 27 Feb 2023 22:51:54 +0000
Subject: [labnetwork] cleanroom deep clean
Message-ID: <BN2P110MB1383E78C95A8E166D1ABEF5DCEAF9@BN2P110MB1383.NAMP110.PROD.OUTLOOK.COM>

Hi Folks,



We are bringing up a closed cleanroom in St. Petersburg Florida, any folks in that area recommend a good company for performing a deep clean of the cleanroom?



Thanks



Rick





Richard Morrison

DMTS

Draper Laboratory

555 Technology Square

Cambridge Ma  02139

Office: 617-258-3420

Cell: 508-930-3461



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From meredith.metzler at nist.gov  Tue Feb 28 15:08:07 2023
From: meredith.metzler at nist.gov (Metzler, Meredith G. (Fed))
Date: Tue, 28 Feb 2023 20:08:07 +0000
Subject: [labnetwork] Cryo-piping contractors for LN2 piping sought
Message-ID: <SA9PR09MB5247BCD61A24338624A10EADF7AC9@SA9PR09MB5247.namprd09.prod.outlook.com>

We are hoping the community can assist us in identifying a vendor who can inspect an existing LN2 delivery piping system in the cleanroom for our cryo-etch tools. We've recently started experiencing issues with a phase separator that keeps building up a large block of ice on the outside of it.

We have a 5 Gallon phase separator made by Chart Inc. with one outlet. It feeds liquid nitrogen to several tools in the etch bay of the cleanroom. The LN2 system is house regulated to 40 PSI at the inlet. The unit separates the gaseous N2 from the liquid. The liquid is stored in the 5 gallon volume surrounded by a vacuum jacket to prevent icing. The final LN2 inlet connection to the phase separator, the exhaust connection, and the over pressure relief connection seem to be the biggest points of failure. At these three points we have cold air and moisture condensation that forms an ice ball.

Although, we have made many at wrapping and insulating these connection points, we cannot quite get the coverage to eliminate this ice ball.

Does the community have any preferred cryo-piping contractors they can recommend to assist with solving this issue and any of our future cryo-piping needs?

Thanks!

Meredith Metzler
National Institute of Standards and Technology, Physical Measurement Laboratory
Process Engineer - Center for Nanoscale Science and Technology Facility, NanoFab
100 Bureau Drive, Mail Stop 6201, Building 216
Gaithersburg, MD 20899
301-975-8187
meredith.metzler at nist.gov<mailto:meredith.metzler at nist.gov>
https://www.nist.gov/cnst

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From yakimom at sunypoly.edu  Tue Feb 28 15:46:43 2023
From: yakimom at sunypoly.edu (Michael Yakimov)
Date: Tue, 28 Feb 2023 20:46:43 +0000
Subject: [labnetwork] Cryo-piping contractors for LN2 piping sought
In-Reply-To: <SA9PR09MB5247BCD61A24338624A10EADF7AC9@SA9PR09MB5247.namprd09.prod.outlook.com>
References: <SA9PR09MB5247BCD61A24338624A10EADF7AC9@SA9PR09MB5247.namprd09.prod.outlook.com>
Message-ID: <SA1PR05MB82621275FE6FB4314339DC4ECEAC9@SA1PR05MB8262.namprd05.prod.outlook.com>

you probably know about vacuum barrier corp., https://vacuumbarrier.com/
I adon't know  if they would do a retrofit, but wouldn't hurt asking

As for handling those ice balls... First - make sure there are no LN2 leaks, even small one can cause problems. And what kind of wrapping do you use? My experience is that packaging bubble wrap  with some layers of foil works best on such connections.

Mike




_______________________________________________

Michael Yakimov

Research scientist

College of Nanoscale Science and Engineering

SUNY Polytechnic Institute



253 Fuller rd.

Albany NY 12203



Phone: 518-437-8609 lab

e-mail: yakimom at sunypoly.edu



________________________________
From: labnetwork <labnetwork-bounces at mtl.mit.edu> on behalf of Metzler, Meredith G. (Fed) <meredith.metzler at nist.gov>
Sent: Tuesday, February 28, 2023 3:08 PM
To: labnetwork at mtl.mit.edu <labnetwork at mtl.mit.edu>
Subject: [labnetwork] Cryo-piping contractors for LN2 piping sought


We are hoping the community can assist us in identifying a vendor who can inspect an existing LN2 delivery piping system in the cleanroom for our cryo-etch tools. We've recently started experiencing issues with a phase separator that keeps building up a large block of ice on the outside of it.



We have a 5 Gallon phase separator made by Chart Inc. with one outlet. It feeds liquid nitrogen to several tools in the etch bay of the cleanroom. The LN2 system is house regulated to 40 PSI at the inlet. The unit separates the gaseous N2 from the liquid. The liquid is stored in the 5 gallon volume surrounded by a vacuum jacket to prevent icing. The final LN2 inlet connection to the phase separator, the exhaust connection, and the over pressure relief connection seem to be the biggest points of failure. At these three points we have cold air and moisture condensation that forms an ice ball.



Although, we have made many at wrapping and insulating these connection points, we cannot quite get the coverage to eliminate this ice ball.



Does the community have any preferred cryo-piping contractors they can recommend to assist with solving this issue and any of our future cryo-piping needs?



Thanks!



Meredith Metzler

National Institute of Standards and Technology, Physical Measurement Laboratory

Process Engineer ? Center for Nanoscale Science and Technology Facility, NanoFab

100 Bureau Drive, Mail Stop 6201, Building 216

Gaithersburg, MD 20899

301-975-8187

meredith.metzler at nist.gov<mailto:meredith.metzler at nist.gov>

https://www.nist.gov/cnst


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From schweig at umich.edu  Tue Feb 28 16:36:27 2023
From: schweig at umich.edu (Dennis Schweiger)
Date: Tue, 28 Feb 2023 16:36:27 -0500
Subject: [labnetwork] Cryo-piping contractors for LN2 piping sought
In-Reply-To: <SA9PR09MB5247BCD61A24338624A10EADF7AC9@SA9PR09MB5247.namprd09.prod.outlook.com>
References: <SA9PR09MB5247BCD61A24338624A10EADF7AC9@SA9PR09MB5247.namprd09.prod.outlook.com>
Message-ID: <CAKzi2_Mh7b0Pm=+8gFBKKn_EKZFcRGBjpf-kvb5O8Xw-mJ+dmw@mail.gmail.com>

Meredith,

We have five phase separators in our facility, all supplied by Vacuum
Barrier Corporation, and whenever we see the icing issue, it's
usually attributed to moisture in the vacuum jacket, and we typically will
warm the system up, and purge with dry Nitrogen for 24 hours.  that
corrects the issue, and then we refill the system with cryogenic material
after we've pumped the vacuum jacket down.  Also, all of our
phase separators have a heater on the "vent" port of the phase separator to
keep it from icing up at that discharge location.  These guys aren't that
far from you.

*VACUUM BARRIER CORPORATION*

4 Barten Lane

Woburn, MA 01801 USA

781.933.3570

www.vacuumbarrier.com

Have you tried doing a Helium leak test on your vacuum jacket to make sure
you don't have a leak?

Are you sure that your high vacuum pump is operating correctly?  We've had
issues with the heater in the diffusion pump failing, and we weren't
getting a low enough vacuum.

Facilities Supervisor
University of Michigan/LNF

Dennis

734.647.2055 Ofc


On Tue, Feb 28, 2023 at 3:53?PM Metzler, Meredith G. (Fed) <
meredith.metzler at nist.gov> wrote:

> We are hoping the community can assist us in identifying a vendor who can
> inspect an existing LN2 delivery piping system in the cleanroom for our
> cryo-etch tools. We've recently started experiencing issues with a phase
> separator that keeps building up a large block of ice on the outside of it.
>
>
>
> We have a 5 Gallon phase separator made by Chart Inc. with one outlet. It
> feeds liquid nitrogen to several tools in the etch bay of the cleanroom.
> The LN2 system is house regulated to 40 PSI at the inlet. The unit
> separates the gaseous N2 from the liquid. The liquid is stored in the 5
> gallon volume surrounded by a vacuum jacket to prevent icing. The final LN2
> inlet connection to the phase separator, the exhaust connection, and the
> over pressure relief connection seem to be the biggest points of failure.
> At these three points we have cold air and moisture condensation that forms
> an ice ball.
>
>
>
> Although, we have made many at wrapping and insulating these connection
> points, we cannot quite get the coverage to eliminate this ice ball.
>
>
>
> Does the community have any preferred cryo-piping contractors they can
> recommend to assist with solving this issue and any of our future
> cryo-piping needs?
>
>
>
> Thanks!
>
>
>
> Meredith Metzler
>
> National Institute of Standards and Technology, Physical Measurement
> Laboratory
>
> Process Engineer ? Center for Nanoscale Science and Technology Facility,
> NanoFab
>
> 100 Bureau Drive, Mail Stop 6201, Building 216
>
> Gaithersburg, MD 20899
>
> 301-975-8187
>
> meredith.metzler at nist.gov
>
> https://www.nist.gov/cnst
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>
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From deonc69 at illinois.edu  Tue Feb 28 16:37:17 2023
From: deonc69 at illinois.edu (Collins, Deon)
Date: Tue, 28 Feb 2023 21:37:17 +0000
Subject: [labnetwork] Cryo-piping contractors for LN2 piping sought
In-Reply-To: <SA9PR09MB5247BCD61A24338624A10EADF7AC9@SA9PR09MB5247.namprd09.prod.outlook.com>
References: <SA9PR09MB5247BCD61A24338624A10EADF7AC9@SA9PR09MB5247.namprd09.prod.outlook.com>
Message-ID: <DM6PR11MB316257914858687CD6BC5570D7AC9@DM6PR11MB3162.namprd11.prod.outlook.com>

Your vacuum jacket has failed. We are going through the same situation with our static LN2 delivery lines.

Is your phase separator a Static or Dynamic system?

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Metzler, Meredith G. (Fed)
Sent: Tuesday, February 28, 2023 2:08 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Cryo-piping contractors for LN2 piping sought

We are hoping the community can assist us in identifying a vendor who can inspect an existing LN2 delivery piping system in the cleanroom for our cryo-etch tools. We've recently started experiencing issues with a phase separator that keeps building up a large block of ice on the outside of it.

We have a 5 Gallon phase separator made by Chart Inc. with one outlet. It feeds liquid nitrogen to several tools in the etch bay of the cleanroom. The LN2 system is house regulated to 40 PSI at the inlet. The unit separates the gaseous N2 from the liquid. The liquid is stored in the 5 gallon volume surrounded by a vacuum jacket to prevent icing. The final LN2 inlet connection to the phase separator, the exhaust connection, and the over pressure relief connection seem to be the biggest points of failure. At these three points we have cold air and moisture condensation that forms an ice ball.

Although, we have made many at wrapping and insulating these connection points, we cannot quite get the coverage to eliminate this ice ball.

Does the community have any preferred cryo-piping contractors they can recommend to assist with solving this issue and any of our future cryo-piping needs?

Thanks!

Meredith Metzler
National Institute of Standards and Technology, Physical Measurement Laboratory
Process Engineer - Center for Nanoscale Science and Technology Facility, NanoFab
100 Bureau Drive, Mail Stop 6201, Building 216
Gaithersburg, MD 20899
301-975-8187
meredith.metzler at nist.gov<mailto:meredith.metzler at nist.gov>
https://www.nist.gov/cnst<https://urldefense.com/v3/__https:/www.nist.gov/cnst__;!!DZ3fjg!-6Lfwk5cCgFK0WcjbkRqEZm2A8T7loqa2OV_9x-WW72ajmC1A4euSzW2VyRMpj0J8yR1_DdWvG0axt3nRQj-R1EmQJ2lypVZ$>

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From jeffhawks at verizon.net  Tue Feb 28 20:14:17 2023
From: jeffhawks at verizon.net (Jeff Hawks)
Date: Tue, 28 Feb 2023 20:14:17 -0500
Subject: [labnetwork] Cryo-piping contractors for LN2 piping sought
In-Reply-To: <DM6PR11MB316257914858687CD6BC5570D7AC9@DM6PR11MB3162.namprd11.prod.outlook.com>
References: <SA9PR09MB5247BCD61A24338624A10EADF7AC9@SA9PR09MB5247.namprd09.prod.outlook.com>
 <DM6PR11MB316257914858687CD6BC5570D7AC9@DM6PR11MB3162.namprd11.prod.outlook.com>
Message-ID: <002701d94bdb$2578b910$706a2b30$@net>

https://www.appliedenergysystems.com/

 

From: labnetwork [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of
Collins, Deon
Sent: Tuesday, February 28, 2023 4:37 PM
To: Metzler, Meredith G. (Fed); labnetwork at mtl.mit.edu
Subject: Re: [labnetwork] Cryo-piping contractors for LN2 piping sought

 

Your vacuum jacket has failed. We are going through the same situation with
our static LN2 delivery lines. 

 

Is your phase separator a Static or Dynamic system?

 

From: labnetwork <labnetwork-bounces at mtl.mit.edu> On Behalf Of Metzler,
Meredith G. (Fed)
Sent: Tuesday, February 28, 2023 2:08 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Cryo-piping contractors for LN2 piping sought

 

We are hoping the community can assist us in identifying a vendor who can
inspect an existing LN2 delivery piping system in the cleanroom for our
cryo-etch tools. We've recently started experiencing issues with a phase
separator that keeps building up a large block of ice on the outside of it.

 

We have a 5 Gallon phase separator made by Chart Inc with one outlet. It
feeds liquid nitrogen to several tools in the etch bay of the cleanroom. The
LN2 system is house regulated to 40 PSI at the inlet. The unit separates the
gaseous N2 from the liquid. The liquid is stored in the 5 gallon volume
surrounded by a vacuum jacket to prevent icing. The final LN2 inlet
connection to the phase separator, the exhaust connection, and the over
pressure relief connection seem to be the biggest points of failure. At
these three points we have cold air and moisture condensation that forms an
ice ball.

 

Although, we have made many at wrapping and insulating these connection
points, we cannot quite get the coverage to eliminate this ice ball.

 

Does the community have any preferred cryo-piping contractors they can
recommend to assist with solving this issue and any of our future
cryo-piping needs?

 

Thanks!

 

Meredith Metzler

National Institute of Standards and Technology, Physical Measurement
Laboratory

Process Engineer - Center for Nanoscale Science and Technology Facility,
NanoFab

100 Bureau Drive, Mail Stop 6201, Building 216

Gaithersburg, MD 20899

301-975-8187

meredith.metzler at nist.gov

https://www.nist.gov/cnst
<https://urldefense.com/v3/__https:/www.nist.gov/cnst__;!!DZ3fjg!-6Lfwk5cCgF
K0WcjbkRqEZm2A8T7loqa2OV_9x-WW72ajmC1A4euSzW2VyRMpj0J8yR1_DdWvG0axt3nRQj-R1E
mQJ2lypVZ$> 

 

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From johnboyle at fast.net  Tue Feb 28 21:20:30 2023
From: johnboyle at fast.net (johnboyle)
Date: Tue, 28 Feb 2023 21:20:30 -0500
Subject: [labnetwork] Cryo-piping contractors for LN2 piping sought
In-Reply-To: <DM6PR11MB316257914858687CD6BC5570D7AC9@DM6PR11MB3162.namprd11.prod.outlook.com>
Message-ID: <AC.4F.08004.C66BEF36@smtp02.aqua.bos.sync.lan>

Check Acme Cryogenics, Allentown, PA. They make VIP, phase separators, do installation and repairs. Ask for Field ServicesJohn BoyleSent from my Verizon, Samsung Galaxy smartphone
-------- Original message --------From: "Collins, Deon" <deonc69 at illinois.edu> Date: 2/28/23  7:46 PM  (GMT-05:00) To: "Metzler, Meredith G. (Fed)" <meredith.metzler at nist.gov>, labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Cryo-piping contractors for LN2 piping sought 

Your vacuum jacket has failed. We are going through the same situation with our static LN2 delivery lines.

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Is your phase separator a Static or Dynamic system?
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From: labnetwork <labnetwork-bounces at mtl.mit.edu> 
On Behalf Of Metzler, Meredith G. (Fed)
Sent: Tuesday, February 28, 2023 2:08 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Cryo-piping contractors for LN2 piping sought


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We are hoping the community can assist us in identifying a vendor who can inspect an existing LN2 delivery piping system in the cleanroom for our cryo-etch tools. We've recently started experiencing issues with a phase separator that keeps
 building up a large block of ice on the outside of it.
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We have a 5 Gallon phase separator made by Chart Inc. with one outlet. It feeds liquid nitrogen to several tools in the etch bay of the cleanroom. The LN2 system is house regulated to 40 PSI at the inlet. The unit separates the gaseous
 N2 from the liquid. The liquid is stored in the 5 gallon volume surrounded by a vacuum jacket to prevent icing. The final LN2 inlet connection to the phase separator, the exhaust connection, and the over pressure relief connection seem to be the biggest points
 of failure. At these three points we have cold air and moisture condensation that forms an ice ball.
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Although, we have made many at wrapping and insulating these connection points, we cannot quite get the coverage to eliminate this ice ball.
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Does the community have any preferred cryo-piping contractors they can recommend to assist with solving this issue and any of our future cryo-piping needs?
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Thanks!
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Meredith Metzler
National Institute of Standards and Technology, Physical Measurement Laboratory
Process Engineer ? Center for Nanoscale Science and Technology Facility, NanoFab
100 Bureau Drive, Mail Stop 6201, Building 216
Gaithersburg, MD 20899
301-975-8187
meredith.metzler at nist.gov
https://www.nist.gov/cnst
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