From rlc12 at cornell.edu Tue Jan 3 08:48:04 2023 From: rlc12 at cornell.edu (Rebecca Lee Vliet) Date: Tue, 3 Jan 2023 13:48:04 +0000 Subject: [labnetwork] REMINDER: Register TODAY for the January 2023 CNF TCN VIRTUAL Short Course In-Reply-To: References: Message-ID: Please share with colleagues and research communities. The registration deadline is quickly approaching. Register today for the CNF Technology & Characterization at the Nanoscale (CNF TCN) VIRTUAL Short Course The CNF TCN virtual short course will be held Wednesday, January 18, 2023 - Friday, January 20, 2023, daily from 11:00am to 4:00pm (EDT). Each day offers lectures and laboratory demonstrations designed to impart a broad understanding of the science and technology required to undertake research in nanoscience. TCN is an ideal way for faculty, students, post docs and staff members to rapidly come up to speed in many of the technologies that users of the CNF need to employ. Members of the high tech business community will also find it an effective way to learn best practices for success in a nanofab environment. Attendance is open to the general scientific community. Note: The short course does not replace the three part training required to become a user of our facility. To become a CNF user, please visit the "Getting Started" link (https:cnf.cornell.edu/howto) on the CNF website. For more information and to register visit: https://cnf.cornell.edu/education/tcn (Registration deadline, January 6, 2023) [Diagram, timeline Description automatically generated] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 205276 bytes Desc: image001.jpg URL: From price.798 at osu.edu Wed Jan 4 12:54:30 2023 From: price.798 at osu.edu (Price, Aimee) Date: Wed, 4 Jan 2023 17:54:30 +0000 Subject: [labnetwork] He, Ar, O2 prices? Message-ID: Hi All, Happy New Year to the network. At Ohio State, we are seeing major price increases for our "6.0" gases year over year (2021 to 2022) and it's gone up again since December. We typically purchase from Matheson but also do some business with Praxair (our bulk LN2 is from Praxair so we have some buying power as we buy it by the semi tanker load). The changes are as follows: Ar increased 2x O2 increased 2x He increased 4.5x Does anyone have a solution for these? We understand that everything is going up, but these are very big changes. I know that some labs have He reclaim systems but we don't have nearly enough use to justify that type of installation. Thanks, Aimee Manager, Nanofabrication The Ohio State University Nanotech West Lab Institute for Materials Research 1381 Kinnear Road Suite 100 Columbus, OH 43212 614-292-2753 Price.798 at osu.edu Nanotech.osu.edu Pronouns: she/her/hers -------------- next part -------------- An HTML attachment was scrubbed... URL: From mweiler at andrew.cmu.edu Wed Jan 4 13:30:22 2023 From: mweiler at andrew.cmu.edu (Mark Weiler) Date: Wed, 4 Jan 2023 13:30:22 -0500 Subject: [labnetwork] MAU Steam Coil Message-ID: Hello Everyone? I am writing to ask whether any of you have ever had to replace a steam coil of the Make-up Air Units (MAU?s) of your cleanrooms, and what you, your facilities team, or the product vendor did to solve the problem. Are there any cost-effective solutions with minimal downtime? We have completed three repairs of our coil since starting here in 2016?(replacing likely requires a Cleanroom shutdown and the construction of a bypass), and currently have another leak. I?m really interested to know if this has happened anywhere else? are we an outlier? Best regards, Mark Mark Weiler Manager, Equipment & Facilities Bertucci Nanotechnology Laboratory Eden Hall Nanofabrication Cleanroom Carnegie Mellon University P: 412-268-2471 F: 412-268-3497 http://www.nanofab.ece.cmu.edu From mweiler at andrew.cmu.edu Wed Jan 4 13:36:29 2023 From: mweiler at andrew.cmu.edu (Mark Weiler) Date: Wed, 4 Jan 2023 13:36:29 -0500 Subject: [labnetwork] Drytek Dry Pumps In-Reply-To: References: Message-ID: HI Dave, As a follow-up and because I have had to employ our PS-80 once again, I decided to find out who can repair it, as I am never going to ADVACO again with any of our pumps. I found that Trillium and FMG will service them. FMG actually builds the pumps with permission of Hanbell (who owns the design). They allow Drytek, FMG and Leybold (LV80) to use their design. So, essentially and FMG or Leybold pump is the same thing. They are made be Hanbell. Mark Weiler Manager, Equipment & Facilities Bertucci Nanotechnology Laboratory Eden Hall Nanofabrication Cleanroom Carnegie Mellon University P: 412-268-2471 F: 412-268-3497 http://www.nanofab.ece.cmu.edu > On Jul 29, 2022, at 10:40 AM, Hollingshead, Dave wrote: > > Hi all, > > Does anyone have experience (good, bad, or otherwise) with Drytek dry screw pumps (specifically as a turbo backing pump for an ICP etcher)? Most of the dry pumps in our lab are Edwards, but since lead times have recently become a major issue we are considering alternatives. > > Thanks, > -Dave > > Dave Hollingshead > Manager of Research Operations ? Nanotech West Lab > The Ohio State University > Suite 100, 1381 Kinnear Road, Columbus, OH 43212 > 614.292.1355 Office > hollingshead.19 at osu.edu osu.edu > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From olms0025 at umn.edu Wed Jan 4 15:53:40 2023 From: olms0025 at umn.edu (Brian K. Olmsted) Date: Wed, 4 Jan 2023 14:53:40 -0600 Subject: [labnetwork] MAU Steam Coil In-Reply-To: References: Message-ID: We've had to back-flush several of ours because of poor water quality causing blockage issues, but never had to do repairs because of leaks. However, we do have a periodic leak in a steam coil for our main AHU. Facilities management staff repair it by soldering or torch brazing to repair the leak. Thanks, Brian Brian K. Olmsted Associate Director of Laboratory Operations University of Minnesota | MNC cse.umn.edu/mnc 612.626.3287 olms0025 at umn.edu On Wed, Jan 4, 2023 at 2:50 PM Mark Weiler wrote: > Hello Everyone? > > I am writing to ask whether any of you have ever had to replace a steam > coil of the Make-up Air Units (MAU?s) of your cleanrooms, and what you, > your facilities team, or the product vendor did to solve the problem. Are > there any cost-effective solutions with minimal downtime? We have > completed three repairs of our coil since starting here in 2016?(replacing > likely requires a Cleanroom shutdown and the construction of a bypass), and > currently have another leak. > > I?m really interested to know if this has happened anywhere else? are we > an outlier? > > Best regards, > > Mark > > > > Mark Weiler > Manager, Equipment & Facilities > Bertucci Nanotechnology Laboratory > Eden Hall Nanofabrication Cleanroom > Carnegie Mellon University > P: 412-268-2471 > F: 412-268-3497 > http://www.nanofab.ece.cmu.edu > > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From tafuller at eng.ucsd.edu Wed Jan 4 15:56:34 2023 From: tafuller at eng.ucsd.edu (Timothy Fuller) Date: Wed, 4 Jan 2023 12:56:34 -0800 Subject: [labnetwork] He, Ar, O2 prices? In-Reply-To: References: Message-ID: "I can imagine that in 50 years' time our children will be saying: 'I can't believe they used such a precious material to fill balloons,'" -Peter Wothers, Cambridge On Wed, Jan 4, 2023 at 12:46 PM Price, Aimee wrote: > Hi All, > > Happy New Year to the network. > > > > At Ohio State, we are seeing major price increases for our ?6.0? gases > year over year (2021 to 2022) and it?s gone up again since December. We > typically purchase from Matheson but also do some business with Praxair > (our bulk LN2 is from Praxair so we have some buying power as we buy it by > the semi tanker load). > > > > The changes are as follows: > > Ar increased 2x > > O2 increased 2x > > He increased 4.5x > > > > Does anyone have a solution for these? We understand that everything is > going up, but these are very big changes. I know that some labs have He > reclaim systems but we don?t have nearly enough use to justify that type of > installation. > > > > Thanks, > > Aimee > > > > Manager, Nanofabrication > > The Ohio State University > > Nanotech West Lab > > Institute for Materials Research > > 1381 Kinnear Road > > Suite 100 > > Columbus, OH 43212 > > 614-292-2753 > > Price.798 at osu.edu > > Nanotech.osu.edu > > > > Pronouns: she/her/hers > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Wed Jan 4 15:59:43 2023 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Wed, 4 Jan 2023 20:59:43 +0000 Subject: [labnetwork] [EXTERNAL] MAU Steam Coil In-Reply-To: References: Message-ID: HI Everyone, We have replaced our coil 2 times in 12 years, the last one had the cleanroom down for 2 days, we did it over a weekend to minimize the work. We purchased the new coil ourselves and hired a mechanical contractor to install, our was on the roof so it need to be craned up and the old one craned out. The issue we have is with vibration so we used a flexible coupling to dampen the vibration this time, we also upgraded the steam generator and replace the humidifier in the duct work all at the same time. Since 2012 install the weather has become very cold and dry in the winter time in Cambridge and we could not keep the RH in spec, so we increased the steam generator output from 6" to 8" and used a larger dispersion coil in the duct work and now we meet spec on the coldest/driest day. Because the summers are hotter and more humid we just increased the chilled water by adding a pump. So over 12 years we had to upgrade the chilled water and stream generator to maintain RH during the winter and summer. Beware to those building new cleanrooms the old rules of thumb for RH control do not always work due to climate change. Rick Richard Morrison DMTS Draper Laboratory 555 Technology Square Cambridge Ma 02139 Office: 617-258-3420 Cell: 508-930-3461 -----Original Message----- From: labnetwork On Behalf Of Mark Weiler Sent: Wednesday, January 4, 2023 1:30 PM To: labnetwork at mtl.mit.edu Subject: [EXTERNAL] [labnetwork] MAU Steam Coil CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe. Hello Everyone? I am writing to ask whether any of you have ever had to replace a steam coil of the Make-up Air Units (MAU?s) of your cleanrooms, and what you, your facilities team, or the product vendor did to solve the problem. Are there any cost-effective solutions with minimal downtime? We have completed three repairs of our coil since starting here in 2016?(replacing likely requires a Cleanroom shutdown and the construction of a bypass), and currently have another leak. I?m really interested to know if this has happened anywhere else? are we an outlier? Best regards, Mark Mark Weiler Manager, Equipment & Facilities Bertucci Nanotechnology Laboratory Eden Hall Nanofabrication Cleanroom Carnegie Mellon University P: 412-268-2471 F: 412-268-3497 https://urldefense.com/v2/url?u=http-3A__www.nanofab.ece.cmu.edu&d=DwIGaQ&c=m5mye7XjY-PNBUdjUS9G7n0DDGwujM2TWPAftzw2VTE&r=2-QuDy5hiP3fahwOU6_94U59sZ8WR0Hpk4KUuW7EuGA&m=OjRlm0L-8C2lGSj3zjDN0ecsDZopPbmJXok0dn6NfE0&s=ZCgw1CbbYeATi54SkFOBffch-4w8XVpGyFGEs120Wh4&e= _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://urldefense.com/v2/url?u=https-3A__mtl.mit.edu_mailman_listinfo.cgi_labnetwork&d=DwIGaQ&c=m5mye7XjY-PNBUdjUS9G7n0DDGwujM2TWPAftzw2VTE&r=2-QuDy5hiP3fahwOU6_94U59sZ8WR0Hpk4KUuW7EuGA&m=OjRlm0L-8C2lGSj3zjDN0ecsDZopPbmJXok0dn6NfE0&s=Qxr4dVELzJf5vUzm3_amP-kwbduHlQDgnSoi1olQTvM&e= From spaolini at cns.fas.harvard.edu Wed Jan 4 16:00:23 2023 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Wed, 4 Jan 2023 21:00:23 +0000 Subject: [labnetwork] MAU Steam Coil In-Reply-To: References: Message-ID: Mark, You are not an outlier! Here at Hahvid, we had to replace all of our leaky steam coils in the first year that our facility opened. The root cause was dissimilar metals on the connections (brass to black iron, stainless to black iron etc.) The original pipefitters apparently were not familiar with galvanic coupling that is accelerated by steam. Since we have correctly piped them, we have had no issues for the past 14 issues. Equipment Dood Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu -----Original Message----- From: labnetwork On Behalf Of Mark Weiler Sent: Wednesday, January 04, 2023 1:30 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] MAU Steam Coil Hello Everyone? I am writing to ask whether any of you have ever had to replace a steam coil of the Make-up Air Units (MAU?s) of your cleanrooms, and what you, your facilities team, or the product vendor did to solve the problem. Are there any cost-effective solutions with minimal downtime? We have completed three repairs of our coil since starting here in 2016?(replacing likely requires a Cleanroom shutdown and the construction of a bypass), and currently have another leak. I?m really interested to know if this has happened anywhere else? are we an outlier? Best regards, Mark Mark Weiler Manager, Equipment & Facilities Bertucci Nanotechnology Laboratory Eden Hall Nanofabrication Cleanroom Carnegie Mellon University P: 412-268-2471 F: 412-268-3497 http://www.nanofab.ece.cmu.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork From spaolini at cns.fas.harvard.edu Wed Jan 4 16:04:56 2023 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Wed, 4 Jan 2023 21:04:56 +0000 Subject: [labnetwork] He, Ar, O2 prices? In-Reply-To: References: Message-ID: Aimee, We have experienced the same price increases, and probably more. Aside from the higher price, availability has reached a critically short level. High purity Helium is basically unavailable in the Northeast. We have had to change a PECVD process which used silane diluted with High purity Helium to 100% Silane. If you find a supplier that has decent pricing and good inventory, I'm sure the folks on this network will appreciate it. Equipment Dood Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu From: labnetwork On Behalf Of Price, Aimee Sent: Wednesday, January 04, 2023 12:55 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] He, Ar, O2 prices? Hi All, Happy New Year to the network. At Ohio State, we are seeing major price increases for our "6.0" gases year over year (2021 to 2022) and it's gone up again since December. We typically purchase from Matheson but also do some business with Praxair (our bulk LN2 is from Praxair so we have some buying power as we buy it by the semi tanker load). The changes are as follows: Ar increased 2x O2 increased 2x He increased 4.5x Does anyone have a solution for these? We understand that everything is going up, but these are very big changes. I know that some labs have He reclaim systems but we don't have nearly enough use to justify that type of installation. Thanks, Aimee Manager, Nanofabrication The Ohio State University Nanotech West Lab Institute for Materials Research 1381 Kinnear Road Suite 100 Columbus, OH 43212 614-292-2753 Price.798 at osu.edu Nanotech.osu.edu Pronouns: she/her/hers -------------- next part -------------- An HTML attachment was scrubbed... URL: From codreanu at udel.edu Wed Jan 4 16:49:51 2023 From: codreanu at udel.edu (Iulian Codreanu) Date: Wed, 4 Jan 2023 16:49:51 -0500 Subject: [labnetwork] He, Ar, O2 prices? In-Reply-To: References: Message-ID: <6deef3cd-4411-82f0-869b-2f91241f5b75@udel.edu> Hi Aimee, I can share that my cost went up 31% in December. Iulian iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 1/4/2023 12:54 PM, Price, Aimee wrote: > > Hi All, > > Happy New Year to the network. > > At Ohio State, we are seeing major price increases for our ?6.0? gases > year over year (2021 to 2022) and it?s gone up again since December.? > We typically purchase from Matheson but also do some business with > Praxair (our bulk LN2 is from Praxair so we have some buying power as > we buy it by the semi tanker load). > > The changes are as follows: > > Ar increased 2x > > O2 increased 2x > > He increased 4.5x > > Does anyone have a solution for these? ?We understand that everything > is going up, but these are very big changes.? I know that some labs > have He reclaim systems but we don?t have nearly enough use to justify > that type of installation. > > Thanks, > > Aimee > > Manager, Nanofabrication > > The Ohio State University > > Nanotech West Lab > > Institute for Materials Research > > 1381 Kinnear Road > > Suite 100 > > Columbus, OH 43212 > > 614-292-2753 > > Price.798 at osu.edu > > Nanotech.osu.edu > > Pronouns: she/her/hers > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From deonc69 at illinois.edu Thu Jan 5 11:38:17 2023 From: deonc69 at illinois.edu (Collins, Deon) Date: Thu, 5 Jan 2023 16:38:17 +0000 Subject: [labnetwork] MAU Steam Coil In-Reply-To: References: Message-ID: The conditions of the steam coils are directly affected by sequencing for cold weather and the condition of the steam. Carbonic Acid builds up In many steam systems and corrodes the steam coils from the inside out. While working for large industrial complexes, we saw this in boilers with little or no steam conditioning. If you have good steam quality coming in look at the sequencing of the AHU to ensure the unit properly protects itself when the free stats trip on cold days. We just happen to lose a coil last week with the cold snap. The unit tripped with the outside air dampers stuck open and froze, the steam coil failed to go to 100% heat and the coils froze. We have since looked at the sequencing for the unit. The outside dampers should close, the return air dampers should fully open, steam should go to 100% to protect the chiller coil(is so equipped) and dependent on design the chiller coil may or may not circulate a little water to help keep the unit from freezing up solid. I will say this, if you have repaired leaks on an individual steam coil multiple times its probably time to replace/recore it. From: labnetwork On Behalf Of Brian K. Olmsted Sent: Wednesday, January 4, 2023 2:54 PM To: Mark Weiler Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] MAU Steam Coil We've had to back-flush several of ours because of poor water quality causing blockage issues, but never had to do repairs because of leaks. However, we do have a periodic leak in a steam coil for our main AHU. Facilities management staff repair it by soldering or torch brazing to repair the leak. Thanks, Brian Brian K. Olmsted Associate Director of Laboratory Operations University of Minnesota | MNC cse.umn.edu/mnc 612.626.3287 olms0025 at umn.edu On Wed, Jan 4, 2023 at 2:50 PM Mark Weiler > wrote: Hello Everyone? I am writing to ask whether any of you have ever had to replace a steam coil of the Make-up Air Units (MAU?s) of your cleanrooms, and what you, your facilities team, or the product vendor did to solve the problem. Are there any cost-effective solutions with minimal downtime? We have completed three repairs of our coil since starting here in 2016?(replacing likely requires a Cleanroom shutdown and the construction of a bypass), and currently have another leak. I?m really interested to know if this has happened anywhere else? are we an outlier? Best regards, Mark Mark Weiler Manager, Equipment & Facilities Bertucci Nanotechnology Laboratory Eden Hall Nanofabrication Cleanroom Carnegie Mellon University P: 412-268-2471 F: 412-268-3497 http://www.nanofab.ece.cmu.edu _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From beaudoin at physics.ubc.ca Thu Jan 5 17:01:14 2023 From: beaudoin at physics.ubc.ca (Beaudoin, Mario) Date: Thu, 5 Jan 2023 14:01:14 -0800 Subject: [labnetwork] Job posting: packaging process engineer at Dream Photonics - Vancouver, BC Message-ID: <17f9c333-9ba3-a9e8-9aca-777938931f5b@physics.ubc.ca> Please distribute the attached job posting within your networks. Regards, Mario -- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig 2.jpg Type: image/jpeg Size: 21446 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: DP PWB Engineer.pdf Type: application/pdf Size: 94443 bytes Desc: not available URL: From rlc12 at cornell.edu Sat Jan 7 08:33:39 2023 From: rlc12 at cornell.edu (Rebecca Lee Vliet) Date: Sat, 7 Jan 2023 13:33:39 +0000 Subject: [labnetwork] Deadline EXTENDED 1/9/23: Register NOW for the January 2023 CNF TCN VIRTUAL Short Course In-Reply-To: References: Message-ID: The deadline to register for the CNF TCN VIRTUAL Short Course has been extended to EOB 1/9/23. Please share with colleagues and research communities. DATES: Wednesday, January 18, 2023 - Friday, January 20, 2023 TIME: Daily 11:00am - 4:00pm COST: $60.00 The CNF TCN virtual short course will be held Wednesday, January 18, 2023 - Friday, January 20, 2023, daily from 11:00am to 4:00pm (EDT). Each day offers lectures and laboratory demonstrations designed to impart a broad understanding of the science and technology required to undertake research in nanoscience. TCN is an ideal way for faculty, students, post docs and staff members to rapidly come up to speed in many of the technologies that users of the CNF need to employ. Members of the high tech business community will also find it an effective way to learn best practices for success in a nanofab environment. Attendance is open to the general scientific community. Note: The short course does not replace the three part training required to become a user of our facility. To become a CNF user, please visit the "Getting Started" link (https:cnf.cornell.edu/howto) on the CNF website. For more information and to register visit: https://cnf.cornell.edu/education/tcn (Registration deadline EOB January 9, 2023) [Diagram, timeline Description automatically generated] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 205276 bytes Desc: image001.jpg URL: From gilheart at rice.edu Mon Jan 9 15:52:06 2023 From: gilheart at rice.edu (Timothy J Gilheart) Date: Mon, 9 Jan 2023 14:52:06 -0600 Subject: [labnetwork] Open position on Rice Nanofabrication Facility (RNF) team Message-ID: <78F690F6-BADF-4B82-890B-873014FC2B56@rice.edu> Greetings colleagues, We have an opening on our team for another research scientist on our nanofab cleanroom team. More job information and application submission link available here: https://emdz.fa.us2.oraclecloud.com/hcmUI/CandidateExperience/en/sites/CX_1001/job/1993/?utm_medium=jobshare Details about our facility can be found here: https://research.rice.edu/sea/rice-nanofabrication-facility At Rice, the cleanroom is part of the Shared Equipment Authority (SEA), the core labs administrative organization under the Office of Research responsible for most shared core labs (electron microscopy, nanofab cleanroom, NMR, mass spec, material characterization, optical microscopy, synthetic biology, etc) located throughout the university. In addition to filling out the current cleanroom team, this position is part of the SEA's larger collegial team of scientists that support research efforts from the schools of engineering and natural sciences. More information about the SEA can be found on our website: https://sea.rice.edu/ Additionally, now that I have taken on new and different responsibilities as director of operations for the entire SEA, I am the hiring manager for this position, so interested candidates are welcome to contact me directly with any questions. This is a particularly exciting time to be part of the Rice community: with a new president and a number of new VPs (including for Research), we are setting new strategic directions and expect to grow the SEA significantly in the next 5-10 years. If you know a good candidate, please share this information with them. Thanks! ? Tim Gilheart, PhD (he/him) Director of Operations Shared Equipment Authority (SEA) | Rice University https://research.rice.edu/sea/ Mobile: 832-341-5488 | gilheart at rice.edu Office: 713-348-3159 | SST 016 -------------- next part -------------- An HTML attachment was scrubbed... URL: From dwolff at nelhydrogen.com Tue Jan 10 14:15:32 2023 From: dwolff at nelhydrogen.com (David Wolff) Date: Tue, 10 Jan 2023 19:15:32 +0000 Subject: [labnetwork] No-cost Lab Hydrogen Safety online course being offered by AIChE Center for Hydrogen Safety In-Reply-To: References: Message-ID: * Free Lab Hydrogen Safety Course: https://www.aiche.org/academy/courses/ela210/hydrogen-laboratory-safety Dave Wolff Region Sales Manager [cid:image001.png at 01D924FD.CF1AB4A0] Nel Hydrogen 10 Technology Drive, Wallingford, CT 06492 USA Office: M +1 860-604-3282 Fax: +1 203-949-8016 dwolff at nelhydrogen.com www.nelhydrogen.com [cid:image003.png at 01D924FA.7D91A060] [cid:image005.png at 01D924FA.7D91A060] [cid:image007.png at 01D924FA.7D91A060] [cid:image009.png at 01D924FA.7D91A060] ________________________________ This email may contain confidential information and is intended solely for the intended recipient. If you have received this email by error, please notify the sender immediately and delete this e-mail from your system. E-mail transmission cannot be guaranteed to be secure or error-free. Information may be intercepted, corrupted, lost, destroyed, arrive late or incomplete, or contain viruses. Nel Hydrogen is not liable for any errors or omissions in the contents of this email, which are a result of transmission, or if contents should be intercepted and subsequently used by an unauthorized third party. ________________________________ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.png Type: image/png Size: 3809 bytes Desc: image003.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image005.png Type: image/png Size: 3605 bytes Desc: image005.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image007.png Type: image/png Size: 2271 bytes Desc: image007.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image009.png Type: image/png Size: 25004 bytes Desc: image009.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 36237 bytes Desc: image001.png URL: From greg.holloway at uwaterloo.ca Wed Jan 11 15:03:35 2023 From: greg.holloway at uwaterloo.ca (Greg Holloway) Date: Wed, 11 Jan 2023 15:03:35 -0500 Subject: [labnetwork] Heidelberg Instruments stage interferometer laser replacement Message-ID: Hello, We have an MLA150 from Heidelberg instruments which we've been running for ~5 years. At the last annual PM, we were told by Heidelberg that the stage interferometer laser was approaching its end of life, as the signal is getting weaker. Heidelberg quoted us the cost for a refurbished laser unit, and we were surprised by how expensive it was. I was wondering how owners of other Heidelberg Instruments tools have proceeded in this situation? Does everyone just get the unit directly from Heidelberg, or has anyone attempted any thriftier alternatives such as repairing or replacing themselves? The laser unit is a Renishaw RLU10-A3-A3. Best, -Greg Holloway QNFCF: University of Waterloo -------------- next part -------------- An HTML attachment was scrubbed... URL: From blewis at eng.ufl.edu Wed Jan 11 16:57:12 2023 From: blewis at eng.ufl.edu (Lewis,William) Date: Wed, 11 Jan 2023 21:57:12 +0000 Subject: [labnetwork] Heidelberg Instruments stage interferometer laser replacement In-Reply-To: References: Message-ID: Hi Greg, I have replaced ours 2 times (DWL66fs model) but purchased from (and with guidance by)Heidelberg. The procedure to install is fairly easy. Heidelberg has given us a price break for self installation i.e. no service visit. You would need to talk to them about that. Purchasing from Renishaw directly was only about 2K less when they quoted me and there is no installation guarantee. Yep, it?s not cheap. Bill Lewis Research Service Center University of Florida 1041 Center Dr Gainesville, FL 32611 walewis at ufl.edu 3five2-258-zero5zero7 https://rsc.aux.eng.ufl.edu/ From: labnetwork On Behalf Of Greg Holloway Sent: Wednesday, January 11, 2023 3:04 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Heidelberg Instruments stage interferometer laser replacement [External Email] Hello, We have an MLA150 from Heidelberg instruments which we've been running for ~5 years. At the last annual PM, we were told by Heidelberg that the stage interferometer laser was approaching its end of life, as the signal is getting weaker. Heidelberg quoted us the cost for a refurbished laser unit, and we were surprised by how expensive it was. I was wondering how owners of other Heidelberg Instruments tools have proceeded in this situation? Does everyone just get the unit directly from Heidelberg, or has anyone attempted any thriftier alternatives such as repairing or replacing themselves? The laser unit is a Renishaw RLU10-A3-A3. Best, -Greg Holloway QNFCF: University of Waterloo -------------- next part -------------- An HTML attachment was scrubbed... URL: From mark.chiappa at ntnu.no Thu Jan 12 08:15:57 2023 From: mark.chiappa at ntnu.no (Mark Chiappa) Date: Thu, 12 Jan 2023 13:15:57 +0000 Subject: [labnetwork] Heidelberg Instruments stage interferometer laser replacement In-Reply-To: References: Message-ID: Hi Greg, We also have an MLA150 and last year the laser power got very low and It had to be replaced. Yes they are expensive, I?d already bought one to have onsite as a spare and reduce downtime. When the time came HIMT would not send me a procedure or offer to do some of the job remotely we had to have a service visit. I guess there are some differences between the DWL and the MLA. The engineer did have to do a fair amount of work in the software. The difference may just be HIMT?s own experience with the replacement. I?m interested to hear if anyone had been allowed to do it themselves. Kind regards Mark. From: labnetwork on behalf of Lewis,William Date: Thursday, 12 January 2023 at 01:59 To: Greg Holloway , labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Heidelberg Instruments stage interferometer laser replacement Hi Greg, I have replaced ours 2 times (DWL66fs model) but purchased from (and with guidance by)Heidelberg. The procedure to install is fairly easy. Heidelberg has given us a price break for self installation i.e. no service visit. You would need to talk to them about that. Purchasing from Renishaw directly was only about 2K less when they quoted me and there is no installation guarantee. Yep, it?s not cheap. Bill Lewis Research Service Center University of Florida 1041 Center Dr Gainesville, FL 32611 walewis at ufl.edu 3five2-258-zero5zero7 https://rsc.aux.eng.ufl.edu/ From: labnetwork On Behalf Of Greg Holloway Sent: Wednesday, January 11, 2023 3:04 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Heidelberg Instruments stage interferometer laser replacement [External Email] Hello, We have an MLA150 from Heidelberg instruments which we've been running for ~5 years. At the last annual PM, we were told by Heidelberg that the stage interferometer laser was approaching its end of life, as the signal is getting weaker. Heidelberg quoted us the cost for a refurbished laser unit, and we were surprised by how expensive it was. I was wondering how owners of other Heidelberg Instruments tools have proceeded in this situation? Does everyone just get the unit directly from Heidelberg, or has anyone attempted any thriftier alternatives such as repairing or replacing themselves? The laser unit is a Renishaw RLU10-A3-A3. Best, -Greg Holloway QNFCF: University of Waterloo -------------- next part -------------- An HTML attachment was scrubbed... URL: From hadi_esmaeilsabzali at sfu.ca Thu Jan 12 14:35:22 2023 From: hadi_esmaeilsabzali at sfu.ca (Hadi Esmaeilsabzali) Date: Thu, 12 Jan 2023 19:35:22 +0000 Subject: [labnetwork] Treating silane exhaust from PECVD Message-ID: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> Dear Colleagues, For those who run PECVD at their facilities, I am wondering how you process the exhaust from your systems. We used to treat the PECVD exhaust along with that of the SiNx tube furnace through a TPU. We have recently decommissioned our furnace and TPU as they were too costly to run and are looking at alternative exhaust options for the PECVD only. We use our PECVD tool for oxide and nitride deposition, and it's worth noting that it only uses silane (no ammonia). Some colleagues had mentioned that they don't use a TPU/scrubber and send the process waste to the building exhaust (untreated). Given that our PECVD processes use a relatively small silane flow (~30 sccm for up to 30 mins per run each week - all max values) and it is significantly diluted, this sounded a practical option. I am trying to see if others have tried or can comment on this approach, particularly for a silane-based PECVD process. Aside from the flammability concerns, we are also aware of the potential oxide buildup in the exhaust system over time. I appreciate it if you share other (cost-effective) suggestions you might have for us! Thanks, Hadi Hadi Esmaeilsabzali, PhD Nanofabrication Group Manager, 4D LABS Simon Fraser University 8888 University Dr., Burnaby, B.C. V5A 1S6 T: 778.782.3790 | F: 778.782.3765 | www.4dlabs.ca Facebook | Twitter | LinkedIn [cid:part6.8FF00374.702EDDDC at 4dlabs.ca] -------------- next part -------------- An HTML attachment was scrubbed... URL: From yakimom at sunypoly.edu Thu Jan 12 16:24:57 2023 From: yakimom at sunypoly.edu (Michael Yakimov) Date: Thu, 12 Jan 2023 21:24:57 +0000 Subject: [labnetwork] Treating silane exhaust from PECVD In-Reply-To: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> References: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> Message-ID: You may look at the company "CS cleans". They are making room temperature beds for treatment of hydrides and metalorganics. Their main focus is MOCVD of 3-5, but they can do Silane and ammonia as well (that's what we have) The other aspect is you may have to deal with CF4 cleaning of PECVD, and they also have acid gas treatment possible in the same column. There is plenty of fine print there, though. https://www.cscleansolutions-usa.com/ Get Outlook for Android ________________________________ From: labnetwork on behalf of Hadi Esmaeilsabzali Sent: Thursday, January 12, 2023 2:35:22 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Treating silane exhaust from PECVD Dear Colleagues, For those who run PECVD at their facilities, I am wondering how you process the exhaust from your systems. We used to treat the PECVD exhaust along with that of the SiNx tube furnace through a TPU. We have recently decommissioned our furnace and TPU as they were too costly to run and are looking at alternative exhaust options for the PECVD only. We use our PECVD tool for oxide and nitride deposition, and it's worth noting that it only uses silane (no ammonia). Some colleagues had mentioned that they don't use a TPU/scrubber and send the process waste to the building exhaust (untreated). Given that our PECVD processes use a relatively small silane flow (~30 sccm for up to 30 mins per run each week - all max values) and it is significantly diluted, this sounded a practical option. I am trying to see if others have tried or can comment on this approach, particularly for a silane-based PECVD process. Aside from the flammability concerns, we are also aware of the potential oxide buildup in the exhaust system over time. I appreciate it if you share other (cost-effective) suggestions you might have for us! Thanks, Hadi Hadi Esmaeilsabzali, PhD Nanofabrication Group Manager, 4D LABS Simon Fraser University 8888 University Dr., Burnaby, B.C. V5A 1S6 T: 778.782.3790 | F: 778.782.3765 | www.4dlabs.ca Facebook | Twitter | LinkedIn [cid:part6.8FF00374.702EDDDC at 4dlabs.ca] -------------- next part -------------- An HTML attachment was scrubbed... URL: From kckeenan at seas.upenn.edu Thu Jan 12 16:27:28 2023 From: kckeenan at seas.upenn.edu (Kyle Keenan) Date: Thu, 12 Jan 2023 16:27:28 -0500 Subject: [labnetwork] Treating silane exhaust from PECVD In-Reply-To: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> References: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> Message-ID: Hi Hadi, We use a Mojave "point of use" dry scrubber. Since Mojave is out of business, we have replacement cans and parts supplied by Jupiter Scientific. We replace the can about every 3 years. https://www.jupiterscientificinc.com/ Kyle On Thu, Jan 12, 2023 at 4:17 PM Hadi Esmaeilsabzali < hadi_esmaeilsabzali at sfu.ca> wrote: > Dear Colleagues, > > For those who run PECVD at their facilities, I am wondering how you > process the exhaust from your systems. > > We used to treat the PECVD exhaust along with that of the SiNx tube > furnace through a TPU. We have recently decommissioned our furnace and TPU > as they were too costly to run and are looking at alternative > exhaust options for the PECVD only. We use our PECVD tool for oxide and > nitride deposition, and it's worth noting that it only uses silane (no > ammonia). > > Some colleagues had mentioned that they don't use a TPU/scrubber and send > the process waste to the building exhaust (untreated). Given that our PECVD > processes use a relatively small silane flow (~30 sccm for up to 30 mins > per run each week - all max values) and it is significantly diluted, this > sounded a practical option. I am trying to see if others have tried or > can comment on this approach, particularly for a silane-based PECVD process. > Aside from the flammability concerns, we are also aware of the > potential oxide buildup in the exhaust system over time. > > I appreciate it if you share other (cost-effective) suggestions you might > have for us! > > Thanks, > Hadi > > *Hadi Esmaeilsabzali, PhD* > > Nanofabrication Group Manager, 4D LABS > > Simon Fraser University > > 8888 University Dr., Burnaby, B.C. V5A 1S6 > T: 778.782.3790 | F: 778.782.3765 | www.4dlabs.ca > > Facebook > > | Twitter > > | LinkedIn > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!IBzWLUs!ShJNw-FRbyIWdKSJmU1lYnzoImOTLhEV7cgXoomCIGtJX6xYkYy3ewodOxPAYrJm3GYETgZkx6N3jLyIkpEyNa-wA4SBflA$ > -- Kyle Keenan Senior Manager - Laboratory Operations Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Thu Jan 12 16:29:23 2023 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Thu, 12 Jan 2023 21:29:23 +0000 Subject: [labnetwork] [EXTERNAL] Treating silane exhaust from PECVD In-Reply-To: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> References: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> Message-ID: Here at Draper PECVD exhaust goes right up the stack, the Dry pump is purged with N2 and the exhaust flow is sufficient that the SiH4 is diluted so that it is not an issue. We have a trap on our LPCVD furnace to collect the excess material. Rick Richard Morrison DMTS Draper Laboratory 555 Technology Square Cambridge Ma 02139 Office: 617-258-3420 Cell: 508-930-3461 From: labnetwork On Behalf Of Hadi Esmaeilsabzali Sent: Thursday, January 12, 2023 2:35 PM To: labnetwork at mtl.mit.edu Subject: [EXTERNAL] [labnetwork] Treating silane exhaust from PECVD CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe. Dear Colleagues, For those who run PECVD at their facilities, I am wondering how you process the exhaust from your systems. We used to treat the PECVD exhaust along with that of the SiNx tube furnace through a TPU. We have recently decommissioned our furnace and TPU as they were too costly to run and are looking at alternative exhaust options for the PECVD only. We use our PECVD tool for oxide and nitride deposition, and it's worth noting that it only uses silane (no ammonia). Some colleagues had mentioned that they don't use a TPU/scrubber and send the process waste to the building exhaust (untreated). Given that our PECVD processes use a relatively small silane flow (~30 sccm for up to 30 mins per run each week - all max values) and it is significantly diluted, this sounded a practical option. I am trying to see if others have tried or can comment on this approach, particularly for a silane-based PECVD process. Aside from the flammability concerns, we are also aware of the potential oxide buildup in the exhaust system over time. I appreciate it if you share other (cost-effective) suggestions you might have for us! Thanks, Hadi Hadi Esmaeilsabzali, PhD Nanofabrication Group Manager, 4D LABS Simon Fraser University 8888 University Dr., Burnaby, B.C. V5A 1S6 T: 778.782.3790 | F: 778.782.3765 | www.4dlabs.ca Facebook | Twitter | LinkedIn -------------- next part -------------- An HTML attachment was scrubbed... URL: From joseph.losby at ucalgary.ca Thu Jan 12 16:35:01 2023 From: joseph.losby at ucalgary.ca (Joseph Losby) Date: Thu, 12 Jan 2023 21:35:01 +0000 Subject: [labnetwork] Treating silane exhaust from PECVD In-Reply-To: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> References: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> Message-ID: Hi Hadi and everyone, I am interested in what abatement solutions others use as well. We are currently looking at Jupiter Callisto dry bed scrubber systems for our PECVD and ICP-RIE processes. Cheers, Joe ________________________________ From: labnetwork on behalf of Hadi Esmaeilsabzali Sent: January 12, 2023 12:35 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Treating silane exhaust from PECVD [?EXTERNAL] Dear Colleagues, For those who run PECVD at their facilities, I am wondering how you process the exhaust from your systems. We used to treat the PECVD exhaust along with that of the SiNx tube furnace through a TPU. We have recently decommissioned our furnace and TPU as they were too costly to run and are looking at alternative exhaust options for the PECVD only. We use our PECVD tool for oxide and nitride deposition, and it's worth noting that it only uses silane (no ammonia). Some colleagues had mentioned that they don't use a TPU/scrubber and send the process waste to the building exhaust (untreated). Given that our PECVD processes use a relatively small silane flow (~30 sccm for up to 30 mins per run each week - all max values) and it is significantly diluted, this sounded a practical option. I am trying to see if others have tried or can comment on this approach, particularly for a silane-based PECVD process. Aside from the flammability concerns, we are also aware of the potential oxide buildup in the exhaust system over time. I appreciate it if you share other (cost-effective) suggestions you might have for us! Thanks, Hadi Hadi Esmaeilsabzali, PhD Nanofabrication Group Manager, 4D LABS Simon Fraser University 8888 University Dr., Burnaby, B.C. V5A 1S6 T: 778.782.3790 | F: 778.782.3765 | www.4dlabs.ca Facebook | Twitter | LinkedIn [cid:part6.8FF00374.702EDDDC at 4dlabs.ca] -------------- next part -------------- An HTML attachment was scrubbed... URL: From patricns at uw.edu Thu Jan 12 17:24:09 2023 From: patricns at uw.edu (N Shane Patrick) Date: Thu, 12 Jan 2023 14:24:09 -0800 Subject: [labnetwork] Treating silane exhaust from PECVD In-Reply-To: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> References: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> Message-ID: <9DE114AA-1D80-4001-8D22-8DA1824EECAC@uw.edu> Hello Hadi, Being in a similar position at the moment, I can say it?s extremely important to understand your emissions requirements. Environmental regulatory agencies are often empowered to issue significant fines and terminate operations, and simply being an educational institution doesn?t necessarily get you off the hook. YMMV of course by country, state/province, etc. You don?t want to get on the wrong side of inspectors. You likely have resources within your institution that can assist with understanding the legal requirements and, maybe, even help you evaluate what need to do. As an aside, we can say you likely want to do something about any silane effluent - even with heavy dilution and similar flows, the amount of sand in our exhaust lines says that you want to consider maintenance impacts beyond just legal ones. You will also want to understand the documentation and other expectations any maintenance or facilities teams may have if they need to work on your exhaust systems at any point. We?re currently looking at dry absorption media canisters, but we?ve honestly raised more questions than answers at the moment, so I can?t really point you in a particular direction with any confidence. N. Shane Patrick Manager, Lab Operations and Safety Electron Beam Lithography Washington Nanofabrication Facility (WNF) National Nanotechnology Coordinated Infrastructure (NNCI) University of Washington - NanoES Fluke Hall 129, Box 352143 (206) 221-1045 patricns at uw.edu http://www.wnf.washington.edu/ > On Jan 12, 2023, at 11:35 AM, Hadi Esmaeilsabzali wrote: > > Dear Colleagues, > > For those who run PECVD at their facilities, I am wondering how you process the exhaust from your systems. > > We used to treat the PECVD exhaust along with that of the SiNx tube furnace through a TPU. We have recently decommissioned our furnace and TPU as they were too costly to run and are looking at alternative exhaust options for the PECVD only. We use our PECVD tool for oxide and nitride deposition, and it's worth noting that it only uses silane (no ammonia). > > Some colleagues had mentioned that they don't use a TPU/scrubber and send the process waste to the building exhaust (untreated). Given that our PECVD processes use a relatively small silane flow (~30 sccm for up to 30 mins per run each week - all max values) and it is significantly diluted, this sounded a practical option. I am trying to see if others have tried or can comment on this approach, particularly for a silane-based PECVD process. Aside from the flammability concerns, we are also aware of the potential oxide buildup in the exhaust system over time. > > I appreciate it if you share other (cost-effective) suggestions you might have for us! > > Thanks, > Hadi > > Hadi Esmaeilsabzali, PhD > Nanofabrication Group Manager, 4D LABS > Simon Fraser University > 8888 University Dr., Burnaby, B.C. V5A 1S6 > T: 778.782.3790 | F: 778.782.3765 | www.4dlabs.ca > Facebook | Twitter | LinkedIn > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!K-Hz7m0Vt54!mGfxZI5Ek7lC3Y61IYW9fnwywqXwc4sNdyvP7VnXtzGr9fCM77TNqB-loulRd4uLvla_DMRduMuUpf3XTQ5xsctWhA$ -------------- next part -------------- An HTML attachment was scrubbed... URL: From codreanu at udel.edu Thu Jan 12 17:27:08 2023 From: codreanu at udel.edu (Iulian Codreanu) Date: Thu, 12 Jan 2023 17:27:08 -0500 Subject: [labnetwork] Treating silane exhaust from PECVD In-Reply-To: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> References: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> Message-ID: <6a7291cb-aec4-0b82-1138-01de2500545d@udel.edu> Hi Hadi, I've been using dry, resin-based scrubbers provided by Jupiter Scientific. They are relatively small, affordable, and easy to operate/maintain. Cheers, Iulian iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 1/12/2023 2:35 PM, Hadi Esmaeilsabzali wrote: > > Dear Colleagues, > > For those?who run PECVD at their facilities,?I am wondering how you > process?the exhaust from your systems. > > We used to treat the PECVD exhaust along with that of the SiNx tube > furnace?through a TPU. We have recently?decommissioned our furnace > and?TPU as they were too costly to run and?are looking at alternative > exhaust?options for the PECVD only. We use our PECVD?tool for oxide > and nitride deposition, and it's worth noting that it?only uses silane > (no ammonia). > > Some colleagues?had mentioned that they don't use a TPU/scrubber and > send the process waste to the building exhaust (untreated). Given that > our PECVD processes use a relatively small silane flow (~30 sccm for > up to 30 mins per run each week - all max values) and it?is > significantly diluted, this sounded a practical option.I am trying to > see if others have tried or can comment on this approach, > particularly?for a silane-based PECVD process. Aside from the > flammability?concerns, we are also aware of the potential?oxide > buildup in the exhaust system over time. > > I appreciate it if you share other (cost-effective) suggestions?you > might have for us! > > Thanks, > Hadi > > *Hadi Esmaeilsabzali, PhD* > > Nanofabrication Group?Manager, 4D LABS > > Simon Fraser University > > 8888 University Dr., Burnaby, B.C. V5A 1S6 > T: 778.782.3790 | F: 778.782.3765| www.4dlabs.ca > Facebook ?| Twitter > ?| LinkedIn > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From mroselius at criticalsystemsinc.com Fri Jan 13 09:19:14 2023 From: mroselius at criticalsystemsinc.com (Mitchell Roselius) Date: Fri, 13 Jan 2023 14:19:14 +0000 Subject: [labnetwork] Treating silane exhaust from PECVD In-Reply-To: References: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> Message-ID: Hi Hadi and Joe, I am the Eastern Sales Engineer for Critical Systems Inc, and we partner with Jupiter Scientific. For PECVD processes with lower flow rates, we recommend a dry bed scrubber since it has the highest abatement efficiency of any technology (Thermal, Wet, etc.) and typically the lowest cost of maintenance and utilities. We have worked with several universities, like Iulian at University of Delaware, and have extensive experiences with CVD and RIE applications. For a brief overview, I have attached the cutsheet for our Callisto Scrubber which is the most common system used by universities. I would be happy to go over our options and discuss if any make sense for your facility. I am always available by phone or email if you have any questions. Mitchell Roselius Eastern Regional Sales Engineer Critical Systems, Inc. Phone: 713.542.5436 Office: 877.572.5515 www.CriticalSystemsInc.com [cid:image001.png at 01D9272F.4C0B5EA0] Note: 7 days per week technical support Phone: 1-888-218-6308 Email: Fieldservices at criticalsystemsinc.com From: labnetwork On Behalf Of Joseph Losby Sent: Thursday, January 12, 2023 4:35 PM To: Hadi Esmaeilsabzali ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Treating silane exhaust from PECVD Hi Hadi and everyone, I am interested in what abatement solutions others use as well. We are currently looking at Jupiter Callisto dry bed scrubber systems for our PECVD and ICP-RIE processes. Cheers, Joe ________________________________ From: labnetwork > on behalf of Hadi Esmaeilsabzali > Sent: January 12, 2023 12:35 PM To: labnetwork at mtl.mit.edu > Subject: [labnetwork] Treating silane exhaust from PECVD [?EXTERNAL] Dear Colleagues, For those who run PECVD at their facilities, I am wondering how you process the exhaust from your systems. We used to treat the PECVD exhaust along with that of the SiNx tube furnace through a TPU. We have recently decommissioned our furnace and TPU as they were too costly to run and are looking at alternative exhaust options for the PECVD only. We use our PECVD tool for oxide and nitride deposition, and it's worth noting that it only uses silane (no ammonia). Some colleagues had mentioned that they don't use a TPU/scrubber and send the process waste to the building exhaust (untreated). Given that our PECVD processes use a relatively small silane flow (~30 sccm for up to 30 mins per run each week - all max values) and it is significantly diluted, this sounded a practical option. I am trying to see if others have tried or can comment on this approach, particularly for a silane-based PECVD process. Aside from the flammability concerns, we are also aware of the potential oxide buildup in the exhaust system over time. I appreciate it if you share other (cost-effective) suggestions you might have for us! Thanks, Hadi Hadi Esmaeilsabzali, PhD Nanofabrication Group Manager, 4D LABS Simon Fraser University 8888 University Dr., Burnaby, B.C. V5A 1S6 T: 778.782.3790 | F: 778.782.3765 | www.4dlabs.ca Facebook | Twitter | LinkedIn [cid:part6.8FF00374.702EDDDC at 4dlabs.ca] This email and any files transmitted with it are confidential and intended solely for the use of the individual or entity to whom they are addressed. If you have received this email in error please notify the system manager. This message contains confidential information and is intended only for the individual named. If you are not the named addressee you should not disseminate, distribute or copy this e-mail. Please notify the sender immediately by e-mail if you have received this e-mail by mistake and delete this e-mail from your system. If you are not the intended recipient you are notified that disclosing, copying, distributing or taking any action in reliance on the contents of this information is strictly prohibited.'. If the disclaimer can't be applied, attach the message to a new disclaimer message. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 8462 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Callisto Dry Bed Abatement System Literature Q222-1.pdf Type: application/pdf Size: 976433 bytes Desc: Callisto Dry Bed Abatement System Literature Q222-1.pdf URL: From sandra.malhotra at tamu.edu Fri Jan 13 09:44:57 2023 From: sandra.malhotra at tamu.edu (Malhotra, Sandra Guy) Date: Fri, 13 Jan 2023 14:44:57 +0000 Subject: [labnetwork] Treating silane exhaust from PECVD In-Reply-To: References: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> Message-ID: We use a Jupiter Callisto dry bed scrubber for our Oxford PECVD system and are quite happy with it. Hope this helps! Sandra G. Malhotra, Ph.D. | Technical Lab Manager AggieFab Nanofabrication Facility https://aggiefab.tamu.edu/ Department of Electrical & Computer Engineering, College of Engineering | Texas A&M University 3253 TAMU | College Station, TX 77843 ph: 979.845.3199 | sandra.malhotra at tamu.edu - - - - - - - - - - - - - - - - - - - - - - - - TEXAS A&M UNIVERSITY | FEARLESS on Every Front ________________________________ From: labnetwork on behalf of Joseph Losby Sent: Thursday, January 12, 2023 3:35 PM To: Hadi Esmaeilsabzali ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Treating silane exhaust from PECVD Hi Hadi and everyone, I am interested in what abatement solutions others use as well. We are currently looking at Jupiter Callisto dry bed scrubber systems for our PECVD and ICP-RIE processes. Cheers, Joe From: labnetwork ZjQcmQRYFpfptBannerStart This Message Is From an External Sender This message came from outside your organization. ZjQcmQRYFpfptBannerEnd Hi Hadi and everyone, I am interested in what abatement solutions others use as well. We are currently looking at Jupiter Callisto dry bed scrubber systems for our PECVD and ICP-RIE processes. Cheers, Joe ________________________________ From: labnetwork on behalf of Hadi Esmaeilsabzali Sent: January 12, 2023 12:35 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Treating silane exhaust from PECVD [?EXTERNAL] Dear Colleagues, For those who run PECVD at their facilities, I am wondering how you process the exhaust from your systems. We used to treat the PECVD exhaust along with that of the SiNx tube furnace through a TPU. We have recently decommissioned our furnace and TPU as they were too costly to run and are looking at alternative exhaust options for the PECVD only. We use our PECVD tool for oxide and nitride deposition, and it's worth noting that it only uses silane (no ammonia). Some colleagues had mentioned that they don't use a TPU/scrubber and send the process waste to the building exhaust (untreated). Given that our PECVD processes use a relatively small silane flow (~30 sccm for up to 30 mins per run each week - all max values) and it is significantly diluted, this sounded a practical option. I am trying to see if others have tried or can comment on this approach, particularly for a silane-based PECVD process. Aside from the flammability concerns, we are also aware of the potential oxide buildup in the exhaust system over time. I appreciate it if you share other (cost-effective) suggestions you might have for us! Thanks, Hadi Hadi Esmaeilsabzali, PhD Nanofabrication Group Manager, 4D LABS Simon Fraser University 8888 University Dr., Burnaby, B.C. V5A 1S6 T: 778.782.3790 | F: 778.782.3765 | www.4dlabs.ca Facebook | Twitter | LinkedIn [cid:part6.8FF00374.702EDDDC at 4dlabs.ca] -------------- next part -------------- An HTML attachment was scrubbed... URL: From julia.aebersold at louisville.edu Fri Jan 13 10:41:15 2023 From: julia.aebersold at louisville.edu (Aebersold, Julia Weyer) Date: Fri, 13 Jan 2023 15:41:15 +0000 Subject: [labnetwork] [EXTERNAL] Treating silane exhaust from PECVD In-Reply-To: References: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> Message-ID: At the University of Louisville we exhaust our PECVD in the same manner as Draper. We have a lot of exhaust flow, too. Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ From: labnetwork On Behalf Of Morrison, Richard H., Jr Sent: Thursday, January 12, 2023 4:29 PM To: hadi_esmaeilsabzali at sfu.ca; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] [EXTERNAL] Treating silane exhaust from PECVD CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Here at Draper PECVD exhaust goes right up the stack, the Dry pump is purged with N2 and the exhaust flow is sufficient that the SiH4 is diluted so that it is not an issue. We have a trap on our LPCVD furnace to collect the excess material. Rick Richard Morrison DMTS Draper Laboratory 555 Technology Square Cambridge Ma 02139 Office: 617-258-3420 Cell: 508-930-3461 From: labnetwork > On Behalf Of Hadi Esmaeilsabzali Sent: Thursday, January 12, 2023 2:35 PM To: labnetwork at mtl.mit.edu Subject: [EXTERNAL] [labnetwork] Treating silane exhaust from PECVD CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe. Dear Colleagues, For those who run PECVD at their facilities, I am wondering how you process the exhaust from your systems. We used to treat the PECVD exhaust along with that of the SiNx tube furnace through a TPU. We have recently decommissioned our furnace and TPU as they were too costly to run and are looking at alternative exhaust options for the PECVD only. We use our PECVD tool for oxide and nitride deposition, and it's worth noting that it only uses silane (no ammonia). Some colleagues had mentioned that they don't use a TPU/scrubber and send the process waste to the building exhaust (untreated). Given that our PECVD processes use a relatively small silane flow (~30 sccm for up to 30 mins per run each week - all max values) and it is significantly diluted, this sounded a practical option. I am trying to see if others have tried or can comment on this approach, particularly for a silane-based PECVD process. Aside from the flammability concerns, we are also aware of the potential oxide buildup in the exhaust system over time. I appreciate it if you share other (cost-effective) suggestions you might have for us! Thanks, Hadi Hadi Esmaeilsabzali, PhD Nanofabrication Group Manager, 4D LABS Simon Fraser University 8888 University Dr., Burnaby, B.C. V5A 1S6 T: 778.782.3790 | F: 778.782.3765 | www.4dlabs.ca Facebook | Twitter | LinkedIn [cid:part6.8FF00374.702EDDDC at 4dlabs.ca] -------------- next part -------------- An HTML attachment was scrubbed... URL: From greg.holloway at uwaterloo.ca Fri Jan 13 10:57:14 2023 From: greg.holloway at uwaterloo.ca (Greg Holloway) Date: Fri, 13 Jan 2023 10:57:14 -0500 Subject: [labnetwork] Heidelberg Instruments stage interferometer laser replacement In-Reply-To: References: Message-ID: Hello Everyone, Thanks to everyone who responded to my question. To quickly summarize the results, it looks like about half of the people who responded, either with DWLs or MLAs, have done the replacement themselves using units purchased directly from Renishaw for some cost savings. This has been very informative, and will guide us on how we proceed. Thanks again to everyone who provided input. Best, -Greg On Wed, Jan 11, 2023 at 3:03 PM Greg Holloway wrote: > Hello, > > We have an MLA150 from Heidelberg instruments which we've been running for > ~5 years. At the last annual PM, we were told by Heidelberg that the stage > interferometer laser was approaching its end of life, as the signal is > getting weaker. Heidelberg quoted us the cost for a refurbished laser unit, > and we were surprised by how expensive it was. I was wondering how owners > of other Heidelberg Instruments tools have proceeded in this situation? > Does everyone just get the unit directly from Heidelberg, or has anyone > attempted any thriftier alternatives such as repairing or replacing > themselves? > > The laser unit is a Renishaw RLU10-A3-A3. > > Best, > -Greg Holloway > QNFCF: University of Waterloo > -------------- next part -------------- An HTML attachment was scrubbed... URL: From Aju.Jugessur at Colorado.EDU Fri Jan 13 12:48:08 2023 From: Aju.Jugessur at Colorado.EDU (Aju Jugessur) Date: Fri, 13 Jan 2023 17:48:08 +0000 Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring Message-ID: Hi all, We have ICP etcher and PECVD that use toxic gases such as Cl2, BCl3 and Silane. The exhausts from the pumps are connected to a scrubber and ph neutralization/acid waste system. I am reaching out to get some advice on the specific locations of the Honeywell Midas sensors that we use, to detect any gas leak at the etchers and toxic gas monitoring system. We have sensors at the gas cabinets and ambient sensors at the tools. However, there seems to be a disagreement between our design team and our EHS unit. The design team recommends having the sensors in the gas pods, where the leaks are most likely to occur. EHS would like to have the ambient sensors at the tools, in the breathing zone areas. As per local code requirements, sensors in the gas pods satisfies the safety requirements. I would like to know what your set-up of the sensor locations for similar instruments is that you may have in your facility. Any insights based on experience will be super helpful. Thanks so much, Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Facility Member of Inclusive Culture Council (ICC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEC | Boulder, CO 80303| P: 303.735.5019 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur www.colorado.edu/facility/cosinc (MBA candidate, CU, Class of 2023) [signature_804197951] Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6301 bytes Desc: image001.png URL: From kckeenan at seas.upenn.edu Fri Jan 13 16:09:32 2023 From: kckeenan at seas.upenn.edu (Kyle Keenan) Date: Fri, 13 Jan 2023 16:09:32 -0500 Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring In-Reply-To: References: Message-ID: Hi Aju, We have them in the following areas: - ambient bay - ambient chase - gas cabinets - exhaust ducts for gas boxes/pods Best, Kyle On Fri, Jan 13, 2023 at 4:06 PM Aju Jugessur wrote: > Hi all, > > > > We have ICP etcher and PECVD that use toxic gases such as Cl2, BCl3 and > Silane. The exhausts from the pumps are connected to a scrubber and ph > neutralization/acid waste system. > > > > I am reaching out to get some advice on the specific locations of the > Honeywell Midas sensors that we use, to detect any gas leak at the etchers > and toxic gas monitoring system. We have sensors at the gas cabinets and > ambient sensors at the tools. > > However, there seems to be a disagreement between our design team and our > EHS unit. The design team recommends having the sensors in the gas pods, > where the leaks are most likely to occur. EHS would like to have the > ambient sensors at the tools, in the breathing zone areas. As per local > code requirements, sensors in the gas pods satisfies the safety > requirements. > > > > I would like to know what your set-up of the sensor locations for similar > instruments is that you may have in your facility. > > Any insights based on experience will be super helpful. > > > > Thanks so much, > > Aju > > > > > > Aju Jugessur Ph.D. IEEE Sr. Member > > Director, Colorado Shared Instrumentation > > in Nanofabrication and Characterization (COSINC) Facility > > Member of Inclusive Culture Council (ICC) > > *University of Colorado Boulder | **College of Engineering & Applied > Science* > > 4001 Discovery Drive, N360G SEEC *|* Boulder, CO 80303*|* *P:* > 303.735.5019 > > E-mail: aju.jugessur at colorado.edu > > Personal Zoom link: https://cuboulder.zoom.us/my/*ajugessur* > > > www.colorado.edu/facility/cosinc > > > (MBA candidate, CU, Class of 2023) > > > > [image: signature_804197951] > > > > > *Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever > (CliftonStrengths)* > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!IBzWLUs!Wr1EO5-PRuEefCfU7Hif4nj9KU4u0oH8jZYzz8W1tsAn8yob4Y7JmbfDX7D25Idw9NfvfQnWb_zCr3ZU5OA_jNg2DgaKAmM$ > -- Kyle Keenan Senior Manager - Laboratory Operations Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6301 bytes Desc: not available URL: From plenvik at ucsb.edu Fri Jan 13 16:19:30 2023 From: plenvik at ucsb.edu (Peder Lenvik) Date: Fri, 13 Jan 2023 13:19:30 -0800 Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring In-Reply-To: References: Message-ID: At our site we have sensors in the exhaust duct of the gas cabinets as well as ambient. Our gas cabinets are in remote gas cabinet rooms. At the tool we have sensors in the exhaust of the gas boxes (where the MFCs are located) and system enclosures, and ambient sensors around the tools. If your gas cabinets are in the service chase next to the tool it would just be one sensor in the ?general? exhaust duct (serving the gas cabinet, gas box of MFCs, and system enclosure) and one ambient/area sensor. *Peder Lenvik* Sr. Facilities Lead Electrical and Computer Engineering E.S.B. Bldg. #225, Room 1109F University California Santa Barbara, Santa Barbara, Ca. 93106 Cell: (805)698-7461 plenvik at ucsb.edu http://www.nanotech.ucsb.edu *From:* labnetwork *On Behalf Of *Aju Jugessur *Sent:* Friday, January 13, 2023 9:48 AM *To:* Fab Network *Subject:* [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring Hi all, We have ICP etcher and PECVD that use toxic gases such as Cl2, BCl3 and Silane. The exhausts from the pumps are connected to a scrubber and ph neutralization/acid waste system. I am reaching out to get some advice on the specific locations of the Honeywell Midas sensors that we use, to detect any gas leak at the etchers and toxic gas monitoring system. We have sensors at the gas cabinets and ambient sensors at the tools. However, there seems to be a disagreement between our design team and our EHS unit. The design team recommends having the sensors in the gas pods, where the leaks are most likely to occur. EHS would like to have the ambient sensors at the tools, in the breathing zone areas. As per local code requirements, sensors in the gas pods satisfies the safety requirements. I would like to know what your set-up of the sensor locations for similar instruments is that you may have in your facility. Any insights based on experience will be super helpful. Thanks so much, Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Facility Member of Inclusive Culture Council (ICC) *University of Colorado Boulder | **College of Engineering & Applied Science* 4001 Discovery Drive, N360G SEEC *|* Boulder, CO 80303*|* *P:* 303.735.5019 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/*ajugessur* www.colorado.edu/facility/cosinc (MBA candidate, CU, Class of 2023) [image: signature_804197951] *Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever(CliftonStrengths)* -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6301 bytes Desc: not available URL: From daniel.woodie at cornell.edu Fri Jan 13 16:32:23 2023 From: daniel.woodie at cornell.edu (Dan P. Woodie) Date: Fri, 13 Jan 2023 21:32:23 +0000 Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring In-Reply-To: References: Message-ID: Aju, The standard within Cornell Engineering is that anywhere hazardous gases (flammable or toxic) are used, we monitor both the exhausted enclosure (gas cabinet, tool cabinet, etc.) and the breathing zone (ambient) air with separate sensors. The exhausted sensors only shut off the gas while the ambient sensors will trigger an evacuation (local or floor) and notification to our Cornell emergency response team. If use locations (gas cabinet and tool using gas) are close enough, we will combine ambient detection or ducted detection (monitor both a gas cabinet and an adjacent gas distribution box with a single sensor where exhaust ducts combine). So, a gas cabinet piping a hazardous gas to an enclosed tool in another room will have four sensors (at a minimum): ambient by the tool, ambient by the gas cabinet, exhaust duct of tool enclosure, exhaust duct of gas cabinet. We got to this standard 20 years ago when we did peer surveys of other research institutions and their standards. If you only measure the ambient, you are oblivious to gas leaks from your cylinders into your ductwork until you notice it, or someone opens the gas cabinet and gets exposed. Ambient measurements are to prove you meet OSHA requirements for personnel exposure. Each serves a separate purpose and regulatory requirement. Your local Authority Having Jurisdiction (AHJ) may only require one in the cabinet, but OSHA, NFPA, and other guidance codes that are brought in under Best Known Practice requirements will push for ambient detection along these lines. Feel free to give me a reach out if you want to discuss more. Dan Daniel Woodie Safety Manager / Facilities Engineer College of Engineering Cornell University 202 Ward Center Ithaca, NY 14853 (607)254-4891 (607)227-2993 - cell From: labnetwork On Behalf Of Aju Jugessur Sent: Friday, January 13, 2023 12:48 PM To: Fab Network Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring Hi all, We have ICP etcher and PECVD that use toxic gases such as Cl2, BCl3 and Silane. The exhausts from the pumps are connected to a scrubber and ph neutralization/acid waste system. I am reaching out to get some advice on the specific locations of the Honeywell Midas sensors that we use, to detect any gas leak at the etchers and toxic gas monitoring system. We have sensors at the gas cabinets and ambient sensors at the tools. However, there seems to be a disagreement between our design team and our EHS unit. The design team recommends having the sensors in the gas pods, where the leaks are most likely to occur. EHS would like to have the ambient sensors at the tools, in the breathing zone areas. As per local code requirements, sensors in the gas pods satisfies the safety requirements. I would like to know what your set-up of the sensor locations for similar instruments is that you may have in your facility. Any insights based on experience will be super helpful. Thanks so much, Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Facility Member of Inclusive Culture Council (ICC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEC | Boulder, CO 80303| P: 303.735.5019 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur www.colorado.edu/facility/cosinc (MBA candidate, CU, Class of 2023) [signature_804197951] Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6301 bytes Desc: image001.png URL: From michael.martin at louisville.edu Fri Jan 13 16:32:16 2023 From: michael.martin at louisville.edu (Martin, Michael) Date: Fri, 13 Jan 2023 21:32:16 +0000 Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring In-Reply-To: References: Message-ID: Hi Aju, At Louisville for our ICP RIE we have BCl3 and Cl2 sensors in the cabinet, one ambient near the tool, and one in the gas pod exhaust. On our PECVD for SiH4 we have 2 ambients, one in the gas pod and of course one at the cabinet. -Michael ________________________________ From: labnetwork on behalf of Aju Jugessur Sent: Friday, January 13, 2023 12:48 PM To: Fab Network Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Hi all, We have ICP etcher and PECVD that use toxic gases such as Cl2, BCl3 and Silane. The exhausts from the pumps are connected to a scrubber and ph neutralization/acid waste system. I am reaching out to get some advice on the specific locations of the Honeywell Midas sensors that we use, to detect any gas leak at the etchers and toxic gas monitoring system. We have sensors at the gas cabinets and ambient sensors at the tools. However, there seems to be a disagreement between our design team and our EHS unit. The design team recommends having the sensors in the gas pods, where the leaks are most likely to occur. EHS would like to have the ambient sensors at the tools, in the breathing zone areas. As per local code requirements, sensors in the gas pods satisfies the safety requirements. I would like to know what your set-up of the sensor locations for similar instruments is that you may have in your facility. Any insights based on experience will be super helpful. Thanks so much, Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Facility Member of Inclusive Culture Council (ICC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEC | Boulder, CO 80303| P: 303.735.5019 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur www.colorado.edu/facility/cosinc (MBA candidate, CU, Class of 2023) [signature_804197951] Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6301 bytes Desc: image001.png URL: From schweig at umich.edu Fri Jan 13 18:41:19 2023 From: schweig at umich.edu (Dennis Schweiger) Date: Fri, 13 Jan 2023 18:41:19 -0500 Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring In-Reply-To: References: Message-ID: Aju, good evening. Here at the University of Michigan /LNF, the only breathing air sensors we have are in spaces outside of the clean room. All other detection for HPM's is in the exhausted enclosures. Our experience is that we move too much air in the clean room to make local "air" sensors effective to detect a leak, and to give us useful information. Since all of our process tools are loadlocked, we typically don't need to worry about process gas exposure when cycling a tool, and we have a couple of hand held detectors (SPMFlex) we can use to spot sample chambers when we open them. In full disclosure, we have about 165 points of gas detection on our system. Some of them are Oxygen deprivation in our bulk LN2 users labs. We use a variety of extractive tape (Honeywell Vertex) and electrochemical (Honeywell Midas) sensors to protect the fab, and building. Please let me know if you have any additional questions, Dennis Schweiger Facilities Manager University of Michigan/LNF 734.647.2055 Ofc On Fri, Jan 13, 2023 at 4:05 PM Aju Jugessur wrote: > Hi all, > > > > We have ICP etcher and PECVD that use toxic gases such as Cl2, BCl3 and > Silane. The exhausts from the pumps are connected to a scrubber and ph > neutralization/acid waste system. > > > > I am reaching out to get some advice on the specific locations of the > Honeywell Midas sensors that we use, to detect any gas leak at the etchers > and toxic gas monitoring system. We have sensors at the gas cabinets and > ambient sensors at the tools. > > However, there seems to be a disagreement between our design team and our > EHS unit. The design team recommends having the sensors in the gas pods, > where the leaks are most likely to occur. EHS would like to have the > ambient sensors at the tools, in the breathing zone areas. As per local > code requirements, sensors in the gas pods satisfies the safety > requirements. > > > > I would like to know what your set-up of the sensor locations for similar > instruments is that you may have in your facility. > > Any insights based on experience will be super helpful. > > > > Thanks so much, > > Aju > > > > > > Aju Jugessur Ph.D. IEEE Sr. Member > > Director, Colorado Shared Instrumentation > > in Nanofabrication and Characterization (COSINC) Facility > > Member of Inclusive Culture Council (ICC) > > *University of Colorado Boulder | **College of Engineering & Applied > Science* > > 4001 Discovery Drive, N360G SEEC *|* Boulder, CO 80303*|* *P:* > 303.735.5019 > > E-mail: aju.jugessur at colorado.edu > > Personal Zoom link: https://cuboulder.zoom.us/my/*ajugessur* > > > www.colorado.edu/facility/cosinc > > (MBA candidate, CU, Class of 2023) > > > > [image: signature_804197951] > > > > > *Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever > (CliftonStrengths)* > > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6301 bytes Desc: not available URL: From reinekeb at msopb.de Sat Jan 14 04:03:59 2023 From: reinekeb at msopb.de (Bernhard Johannes Reineke) Date: Sat, 14 Jan 2023 09:03:59 +0000 Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring In-Reply-To: References: Message-ID: Hello Aju, We have Cl2, the Cl2 sensors are installed in a similar way as Kyle said. I know that some Gasensors are installed close to floor depending on where the Gas ist accumulating. If you are interested i ask our safety engineer about the setup. Best, Bernhard ________________________________ Von: labnetwork im Auftrag von Martin, Michael Gesendet: Freitag, 13. Januar 2023 21:32 An: Aju Jugessur ; Fab Network Betreff: Re: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring Hi Aju, At Louisville for our ICP RIE we have BCl3 and Cl2 sensors in the cabinet, one ambient near the tool, and one in the gas pod exhaust. On our PECVD for SiH4 we have 2 ambients, one in the gas pod and of course one at the cabinet. -Michael ________________________________ From: labnetwork on behalf of Aju Jugessur Sent: Friday, January 13, 2023 12:48 PM To: Fab Network Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Hi all, We have ICP etcher and PECVD that use toxic gases such as Cl2, BCl3 and Silane. The exhausts from the pumps are connected to a scrubber and ph neutralization/acid waste system. I am reaching out to get some advice on the specific locations of the Honeywell Midas sensors that we use, to detect any gas leak at the etchers and toxic gas monitoring system. We have sensors at the gas cabinets and ambient sensors at the tools. However, there seems to be a disagreement between our design team and our EHS unit. The design team recommends having the sensors in the gas pods, where the leaks are most likely to occur. EHS would like to have the ambient sensors at the tools, in the breathing zone areas. As per local code requirements, sensors in the gas pods satisfies the safety requirements. I would like to know what your set-up of the sensor locations for similar instruments is that you may have in your facility. Any insights based on experience will be super helpful. Thanks so much, Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Facility Member of Inclusive Culture Council (ICC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEC | Boulder, CO 80303| P: 303.735.5019 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur www.colorado.edu/facility/cosinc (MBA candidate, CU, Class of 2023) [signature_804197951] Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6301 bytes Desc: image001.png URL: From rob.breisch at trilliumus.com Sat Jan 14 18:43:05 2023 From: rob.breisch at trilliumus.com (Rob Breisch) Date: Sat, 14 Jan 2023 23:43:05 +0000 Subject: [labnetwork] [EXTERNAL] Treating silane exhaust from PECVD In-Reply-To: References: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> Message-ID: <9973C6784F21124B9C9CD4FD39EA8D84033045A65F@MAIL02.trilliumsubfab.com> Hadi - If you only need to abate the SiH4, then you might consider using an Edwards Pyrophoric Conditioning system. Section 1.3 in the attached talks about application specifics, where it will work and where it won't. It's still listed on the Edwards website, so I think it's still being manufactured. https://shop.edwardsvacuum.com/products/pyrophoric%20conditioning%20system%20(pcs)/view.aspx#:~:text=The%20Pyrophoric%20Conditioning%20System%20(PCS,the%20simple%20%22burn%20box%22. Most folks who use TPUs on PECVD are less concerned with the SiH4 and more concerned with the clean gases as opposed to the deposition gases, especially those classified as greenhouse gases. Abating the SiH4 is just an added bonus. We recently sold our only PCS, but there may be others available from equipment brokers, etc. if you have interest. I know of a gov't contractor who has or had a few, but they had a tough time excessing any unused equipment for resale. They might be willing to donate to a University though, but perhaps it would need to be a US university. I'm sure this community knows more about that than I do. Hope this is helpful. I think the PCS is kind of like the middle ground between letting it go out the stack and using a more traditional abatement system. Rob Breisch Vice President, Sales and Marketing [email logo 3] Trillium US, Inc. My Mobile: 801-726-5035 Trillium Toll Free: 800-453-1340 Email: rob.breisch at trilliumus.com WebSite: www.trilliumus.com Follow Trillium on LinkedIn This transmission is intended for the named addressee(s) only and may contain confidential and privileged information. Reading, copying or disseminating this transmission by anyone other than the named addressee(s) is strictly prohibited. If you have received this message in error, please notify us immediately by reply e-mail or phone at (503) 682-3837. From: labnetwork On Behalf Of Aebersold, Julia Weyer Sent: Friday, January 13, 2023 8:41 AM To: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] [EXTERNAL] Treating silane exhaust from PECVD At the University of Louisville we exhaust our PECVD in the same manner as Draper. We have a lot of exhaust flow, too. Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ From: labnetwork > On Behalf Of Morrison, Richard H., Jr Sent: Thursday, January 12, 2023 4:29 PM To: hadi_esmaeilsabzali at sfu.ca; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] [EXTERNAL] Treating silane exhaust from PECVD CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Here at Draper PECVD exhaust goes right up the stack, the Dry pump is purged with N2 and the exhaust flow is sufficient that the SiH4 is diluted so that it is not an issue. We have a trap on our LPCVD furnace to collect the excess material. Rick Richard Morrison DMTS Draper Laboratory 555 Technology Square Cambridge Ma 02139 Office: 617-258-3420 Cell: 508-930-3461 From: labnetwork > On Behalf Of Hadi Esmaeilsabzali Sent: Thursday, January 12, 2023 2:35 PM To: labnetwork at mtl.mit.edu Subject: [EXTERNAL] [labnetwork] Treating silane exhaust from PECVD CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe. Dear Colleagues, For those who run PECVD at their facilities, I am wondering how you process the exhaust from your systems. We used to treat the PECVD exhaust along with that of the SiNx tube furnace through a TPU. We have recently decommissioned our furnace and TPU as they were too costly to run and are looking at alternative exhaust options for the PECVD only. We use our PECVD tool for oxide and nitride deposition, and it's worth noting that it only uses silane (no ammonia). Some colleagues had mentioned that they don't use a TPU/scrubber and send the process waste to the building exhaust (untreated). Given that our PECVD processes use a relatively small silane flow (~30 sccm for up to 30 mins per run each week - all max values) and it is significantly diluted, this sounded a practical option. I am trying to see if others have tried or can comment on this approach, particularly for a silane-based PECVD process. Aside from the flammability concerns, we are also aware of the potential oxide buildup in the exhaust system over time. I appreciate it if you share other (cost-effective) suggestions you might have for us! Thanks, Hadi Hadi Esmaeilsabzali, PhD Nanofabrication Group Manager, 4D LABS Simon Fraser University 8888 University Dr., Burnaby, B.C. V5A 1S6 T: 778.782.3790 | F: 778.782.3765 | www.4dlabs.ca Facebook | Twitter | LinkedIn [cid:part6.8FF00374.702EDDDC at 4dlabs.ca] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 7265 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: PCS Instruction Manual.pdf Type: application/pdf Size: 2284318 bytes Desc: PCS Instruction Manual.pdf URL: From Kalvin.Huoth at ll.mit.edu Sat Jan 14 18:43:43 2023 From: Kalvin.Huoth at ll.mit.edu (Huoth, Kalvin - 0835 - MITLL) Date: Sat, 14 Jan 2023 23:43:43 +0000 Subject: [labnetwork] Heidelberg Instruments stage interferometer laser replacement In-Reply-To: References: Message-ID: Hi Greg, We had our MLA150 Renishaw RLU10-A3 A3 replaced in Nov. Was your laser intensity measurement in spec? Have you checked the focus rails for 405 and 375 lens, overtime they will dry up and cause the laser to lose power during exposure. The RL10 swap unit was easy but you will need MLA Support to walk you through software side to establish communication. Below is HIMT Evan Cooper?s contact Email: evan.cooper at himt.us Phone: (781) 428-6684 Best regards, Kalvin Huoth MIT Lincoln Laboratory Lexington MA 02421 Office 781-980-0388 From: labnetwork On Behalf Of Greg Holloway Sent: Friday, January 13, 2023 10:57 AM To: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Heidelberg Instruments stage interferometer laser replacement Hello Everyone, Thanks to everyone who responded to my question. To quickly summarize the results, it looks like about half of the people who responded, either with DWLs or MLAs, have done the replacement themselves using units purchased directly from Renishaw for some cost savings. This has been very informative, and will guide us on how we proceed. Thanks again to everyone who provided input. Best, -Greg On Wed, Jan 11, 2023 at 3:03 PM Greg Holloway > wrote: Hello, We have an MLA150 from Heidelberg instruments which we've been running for ~5 years. At the last annual PM, we were told by Heidelberg that the stage interferometer laser was approaching its end of life, as the signal is getting weaker. Heidelberg quoted us the cost for a refurbished laser unit, and we were surprised by how expensive it was. I was wondering how owners of other Heidelberg Instruments tools have proceeded in this situation? Does everyone just get the unit directly from Heidelberg, or has anyone attempted any thriftier alternatives such as repairing or replacing themselves? The laser unit is a Renishaw RLU10-A3-A3. Best, -Greg Holloway QNFCF: University of Waterloo -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: smime.p7s Type: application/pkcs7-signature Size: 5645 bytes Desc: not available URL: From erica.alvarezconde at kaust.edu.sa Sun Jan 15 03:32:42 2023 From: erica.alvarezconde at kaust.edu.sa (Erica Alvarez Conde) Date: Sun, 15 Jan 2023 08:32:42 +0000 Subject: [labnetwork] Heidelberg Instruments stage interferometer laser replacement In-Reply-To: References: Message-ID: Hello Mark; In KAUST, we did the replacement and alignment of the laser source for the DWL2000 tool, during the COVID pandemic (2020), with Heidelberg's assistance on WhatsApp. At that time it was almost mandatory to do it this way as they couldn't come to Saudi. The fact is that Heidelberg is expensive, they charged us the same price per hour as if it was a real service, in person. In my opinion, this is not fare, as we used more time, I'm not a laser engineer, we were using Whatsapp, not even a video call, and it took me more time to adjust things. Based on my experience the customer service Heidelberg provide is far away from a good one. I feel they are not open to sharing maintenance procedures and sometimes the suggestions they give when we ask for solving a problem are very poor, like "Have you tried restarting the tool?". Depending on the service engineer assigned to your tool you will get better or worse assistance. All the best. Erica Alvarez Conde Senior Technical Specialist, Nanofabrication Core Lab KAUST King Abdullah University of Science and Technology Building 3, Level 0, Office 0250-WS05 Thuwal 23955-6900 Kingdom of Saudi Arabia Office: +966 12 808 0752 Mobile: +966 (0) 544700505 Email: erica.alvarezconde at kaust.edu.sa Website: www.kaust.edu.sa , https://corelabs.kaust.edu.sa/ NOTE: Remember that the weekends in Saudi Arabia are Fridays and Saturdays From: labnetwork On Behalf Of Mark Chiappa Sent: Thursday, January 12, 2023 4:16 PM To: Lewis,William ; Greg Holloway ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Heidelberg Instruments stage interferometer laser replacement Hi Greg, We also have an MLA150 and last year the laser power got very low and It had to be replaced. Yes they are expensive, I?d already bought one to have onsite as a spare and reduce downtime. When the time came HIMT would not send me a procedure or offer to do some of the job remotely we had to have a service visit. I guess there are some differences between the DWL and the MLA. The engineer did have to do a fair amount of work in the software. The difference may just be HIMT?s own experience with the replacement. I?m interested to hear if anyone had been allowed to do it themselves. Kind regards Mark. From: labnetwork > on behalf of Lewis,William > Date: Thursday, 12 January 2023 at 01:59 To: Greg Holloway >, labnetwork at mtl.mit.edu > Subject: Re: [labnetwork] Heidelberg Instruments stage interferometer laser replacement Hi Greg, I have replaced ours 2 times (DWL66fs model) but purchased from (and with guidance by)Heidelberg. The procedure to install is fairly easy. Heidelberg has given us a price break for self installation i.e. no service visit. You would need to talk to them about that. Purchasing from Renishaw directly was only about 2K less when they quoted me and there is no installation guarantee. Yep, it's not cheap. Bill Lewis Research Service Center University of Florida 1041 Center Dr Gainesville, FL 32611 walewis at ufl.edu 3five2-258-zero5zero7 https://rsc.aux.eng.ufl.edu/ From: labnetwork > On Behalf Of Greg Holloway Sent: Wednesday, January 11, 2023 3:04 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Heidelberg Instruments stage interferometer laser replacement [External Email] Hello, We have an MLA150 from Heidelberg instruments which we've been running for ~5 years. At the last annual PM, we were told by Heidelberg that the stage interferometer laser was approaching its end of life, as the signal is getting weaker. Heidelberg quoted us the cost for a refurbished laser unit, and we were surprised by how expensive it was. I was wondering how owners of other Heidelberg Instruments tools have proceeded in this situation? Does everyone just get the unit directly from Heidelberg, or has anyone attempted any thriftier alternatives such as repairing or replacing themselves? The laser unit is a Renishaw RLU10-A3-A3. Best, -Greg Holloway QNFCF: University of Waterloo -------------- next part -------------- An HTML attachment was scrubbed... URL: From jcn8004 at rit.edu Mon Jan 16 08:46:23 2023 From: jcn8004 at rit.edu (John Nash) Date: Mon, 16 Jan 2023 13:46:23 +0000 Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring In-Reply-To: References: Message-ID: All, According to SEMI S2 and S4, you should follow all Federal, State and Local requirements. Federal and state are typically the same requirements set by OSHA, NFPA and other applicable Federal entities. Local would be your county, town, village and EHS departments. Don't forget to consult with your insurance carrier as well. Here at RIT, our toxic lines are all double wall with an N2 push from the tool end before entering into the tool gas box and pushes N2 back to the gas cabinet. Our gas cabinets (bottle and regulator area), tool gas box (tool valves and distribution piping) and the operator area are all monitored. Except for the operator areas all sense lines are in the exhaust ducts of the appropriate areas. Our Silane and Ammonia systems are a bit different because they go to a VMB (valve manifold box). The N2 push is set up there and pushes to the gas cabinet as well as to each tool. This also aids in determining where leaks may be if a detection occurs. I understand this seems excessive and expensive but it is way cheaper than a law suit. I am not a lawyer nor up to date on all regulations or laws. This email is simply stating what I considered when deciding on what to do. Have a great day. Regards, John C Nash SMFL - Technician Rochester Institute of Technology Semiconductor & Microsystems Fabrication Laboratory 82 Lomb Memorial Dr. Bldg. 17-2627 Rochester, NY 14623 585-626-8930 john.nash at rit.edu www.smfl.rit.edu From: labnetwork On Behalf Of Aju Jugessur Sent: Friday, January 13, 2023 12:48 PM To: Fab Network Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring Hi all, We have ICP etcher and PECVD that use toxic gases such as Cl2, BCl3 and Silane. The exhausts from the pumps are connected to a scrubber and ph neutralization/acid waste system. I am reaching out to get some advice on the specific locations of the Honeywell Midas sensors that we use, to detect any gas leak at the etchers and toxic gas monitoring system. We have sensors at the gas cabinets and ambient sensors at the tools. However, there seems to be a disagreement between our design team and our EHS unit. The design team recommends having the sensors in the gas pods, where the leaks are most likely to occur. EHS would like to have the ambient sensors at the tools, in the breathing zone areas. As per local code requirements, sensors in the gas pods satisfies the safety requirements. I would like to know what your set-up of the sensor locations for similar instruments is that you may have in your facility. Any insights based on experience will be super helpful. Thanks so much, Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Facility Member of Inclusive Culture Council (ICC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEC | Boulder, CO 80303| P: 303.735.5019 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur www.colorado.edu/facility/cosinc (MBA candidate, CU, Class of 2023) [signature_804197951] Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6301 bytes Desc: image001.png URL: From codreanu at udel.edu Tue Jan 17 07:55:39 2023 From: codreanu at udel.edu (Iulian Codreanu) Date: Tue, 17 Jan 2023 07:55:39 -0500 Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring In-Reply-To: References: Message-ID: <80cdf54f-e285-33c4-ba1f-1caf51f538d6@udel.edu> Hi Aju, At UD I have gas sensors in the exhaust of gas cabinets, valve manifold boxes, and tool MFC boxes as well as ambient sensors in the areas where the operators are present (but no ambient sensors in the chases). Toxic and flammable gases are transported via double wall tubing. Cheers, Iulian iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 http://udnf.udel.edu On 1/13/2023 12:48 PM, Aju Jugessur wrote: > > Hi all, > > We have ICP etcher and PECVD that use toxic gases such as Cl2, BCl3 > and Silane. The exhausts from the pumps are connected to a scrubber > and ph neutralization/acid waste system. > > I am reaching out to get some advice on the specific locations of the > Honeywell Midas sensors that we use, to detect any gas leak at the > etchers and toxic gas monitoring system. We have sensors at the gas > cabinets and ambient sensors at the tools. > > However, there seems to be a disagreement between our design team and > our EHS unit. The design team recommends having the sensors in the gas > pods, where the leaks are most likely to occur. EHS would like to have > the ambient sensors at the tools, in the breathing zone areas. As per > local code requirements, sensors in the gas pods satisfies the safety > requirements. > > I would like to know what your set-up of the sensor locations for > similar instruments is that you may have in your facility. > > Any insights based on experience will be super helpful. > > Thanks so much, > > Aju > > Aju Jugessur Ph.D. IEEE Sr. Member > > Director, Colorado Shared**Instrumentation > > in Nanofabrication and Characterization (COSINC) Facility > > Member of Inclusive Culture Council (ICC) > > *University of Colorado Boulder | **College of Engineering & Applied > Science* > > 4001 Discovery Drive, N360G SEEC *|*?Boulder, CO 80303*|* > *P:*?303.735.5019 > > E-mail: aju.jugessur at colorado.edu > > Personal Zoom link: https://cuboulder.zoom.us/my/*ajugessur* > > > www.colorado.edu/facility/cosinc > > (MBA candidate, CU, Class of 2023) > > signature_804197951 > > *Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever > (CliftonStrengths)* > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6301 bytes Desc: not available URL: From na2661 at columbia.edu Tue Jan 17 08:48:36 2023 From: na2661 at columbia.edu (Nava Ariel-Sternberg) Date: Tue, 17 Jan 2023 08:48:36 -0500 Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring In-Reply-To: References: Message-ID: <00e901d92a7a$65c9c900$315d5b00$@columbia.edu> Hi Aju, all, Our configuration is similar to Cornell's. We have sensors at exhausted enclosures and we have ambient sensors, located by the tools, where the users are breathing. The ambient sensors are connected to the fire alarm and building evacuation is happening when these are triggered. Exhausted enclosure alarms evacuate the lab only. Hope this helps, Nava Dr. Nava Ariel-Sternberg Senior Director of CNI Labs Columbia University CEPSR/MC 8903 530 west 120th st. NY NY 10027 Office: 212-8549927 Cell: 201-5627600 From: labnetwork On Behalf Of Aju Jugessur Sent: Friday, January 13, 2023 12:48 PM To: Fab Network Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring Hi all, We have ICP etcher and PECVD that use toxic gases such as Cl2, BCl3 and Silane. The exhausts from the pumps are connected to a scrubber and ph neutralization/acid waste system. I am reaching out to get some advice on the specific locations of the Honeywell Midas sensors that we use, to detect any gas leak at the etchers and toxic gas monitoring system. We have sensors at the gas cabinets and ambient sensors at the tools. However, there seems to be a disagreement between our design team and our EHS unit. The design team recommends having the sensors in the gas pods, where the leaks are most likely to occur. EHS would like to have the ambient sensors at the tools, in the breathing zone areas. As per local code requirements, sensors in the gas pods satisfies the safety requirements. I would like to know what your set-up of the sensor locations for similar instruments is that you may have in your facility. Any insights based on experience will be super helpful. Thanks so much, Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Facility Member of Inclusive Culture Council (ICC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEC | Boulder, CO 80303| P: 303.735.5019 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ ajugessur www.colorado.edu/facility/cosinc (MBA candidate, CU, Class of 2023) Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6301 bytes Desc: not available URL: From lopezg at seas.upenn.edu Tue Jan 17 12:29:36 2023 From: lopezg at seas.upenn.edu (Gerald Lopez) Date: Tue, 17 Jan 2023 12:29:36 -0500 Subject: [labnetwork] NEMO Installation Discussion Message-ID: Dear Colleagues, We're interested in talking to organizations that have implemented or are implementing NEMO as part of their lab management system. If you have implemented NEMO or are working on implementing NEMO and are open to talking, please let us know. Best, Gerald Gerald G. Lopez, Ph.D. (he/him/his) Director of Operations and Business Development & Center Associate Director University of Pennsylvania | Singh Center for Nanotechnology NNCI Mid-Atlantic Nanotechnology Hub (MANTH) ? nnci.net 3205 Walnut Street, Philadelphia PA 19104 USA nano.upenn.edu ? lopezg at seas.upenn.edu ? +1-215-573-4041 ? linkedin.com/in/geraldglopez/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From deonc69 at illinois.edu Tue Jan 17 12:48:02 2023 From: deonc69 at illinois.edu (Collins, Deon) Date: Tue, 17 Jan 2023 17:48:02 +0000 Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring In-Reply-To: References: Message-ID: We are currently revamping our abatement systems at HMNTL. Al of our current equipment goes to CDO's. We are replacing the CDO's with a wet scrubber for our etch tools, a single dry scrubber for our PECVD and another Dual dry scrubber for our MOCVD in GaAr mode(to the wet scrubber in GaN mode). A prefilter on the PECVD is highly recommended due to the amount of solid waste material you will gather int the exhaust. While not dangerous the powder is a pian to clean up and can clog the dry scrubber if not addressed. From: labnetwork On Behalf Of Aju Jugessur Sent: Friday, January 13, 2023 11:48 AM To: Fab Network Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring Hi all, We have ICP etcher and PECVD that use toxic gases such as Cl2, BCl3 and Silane. The exhausts from the pumps are connected to a scrubber and ph neutralization/acid waste system. I am reaching out to get some advice on the specific locations of the Honeywell Midas sensors that we use, to detect any gas leak at the etchers and toxic gas monitoring system. We have sensors at the gas cabinets and ambient sensors at the tools. However, there seems to be a disagreement between our design team and our EHS unit. The design team recommends having the sensors in the gas pods, where the leaks are most likely to occur. EHS would like to have the ambient sensors at the tools, in the breathing zone areas. As per local code requirements, sensors in the gas pods satisfies the safety requirements. I would like to know what your set-up of the sensor locations for similar instruments is that you may have in your facility. Any insights based on experience will be super helpful. Thanks so much, Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Facility Member of Inclusive Culture Council (ICC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEC | Boulder, CO 80303| P: 303.735.5019 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur www.colorado.edu/facility/cosinc (MBA candidate, CU, Class of 2023) [signature_804197951] Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6301 bytes Desc: image001.png URL: From olms0025 at umn.edu Tue Jan 17 16:11:58 2023 From: olms0025 at umn.edu (Brian K. Olmsted) Date: Tue, 17 Jan 2023 15:11:58 -0600 Subject: [labnetwork] NEMO Installation Discussion In-Reply-To: References: Message-ID: I'm also curious and would like to tag-along in this conversation. Thanks, Brian K. Olmsted Associate Director of Laboratory Operations University of Minnesota | MNC cse.umn.edu/mnc 612.626.3287 olms0025 at umn.edu On Tue, Jan 17, 2023 at 3:11 PM Gerald Lopez wrote: > Dear Colleagues, > > We're interested in talking to organizations that have implemented or are > implementing NEMO as part of their lab management system. If you have > implemented NEMO or are working on implementing NEMO and are open > to talking, please let us know. > > Best, > Gerald > > Gerald G. Lopez, Ph.D. (he/him/his) > > Director of Operations and Business Development & Center Associate > Director > > University of Pennsylvania | Singh Center for Nanotechnology > > NNCI Mid-Atlantic Nanotechnology Hub (MANTH) ? nnci.net > > 3205 Walnut Street, Philadelphia PA 19104 USA > > nano.upenn.edu ? lopezg at seas.upenn.edu ? +1-215-573-4041 ? > linkedin.com/in/geraldglopez/ > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From kmcpeak at lsu.edu Tue Jan 17 17:18:22 2023 From: kmcpeak at lsu.edu (Kevin M McPeak) Date: Tue, 17 Jan 2023 22:18:22 +0000 Subject: [labnetwork] NEMO Installation Discussion In-Reply-To: References: Message-ID: Dear Gerald et al., We are very happy NEMO users here at LSU. Happy to answer any questions you may have about your installation. Regards, Kevin ________________________________ From: labnetwork on behalf of Gerald Lopez Sent: Tuesday, January 17, 2023 11:29:36 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] NEMO Installation Discussion Dear Colleagues, We're interested in talking to organizations that have implemented or are implementing NEMO as part of their lab management system. If you have implemented NEMO or are working on implementing NEMO and are open to talking, please let us know. Best, Gerald [https://lh5.googleusercontent.com/NUqjkaspQaBTb7N06qB3MRywBg5w4pDGo_OuUGZrMj3ewACFau26SJnRwTvMgc-YDXpSM3-qTmY_iqr-ttCJgr1M-OKuod2NDI9FwckJCRLEPfwAmDaX6bsMpi0ihlYL0fZqTvJc] Gerald G. Lopez, Ph.D. (he/him/his) Director of Operations and Business Development & Center Associate Director University of Pennsylvania | Singh Center for Nanotechnology NNCI Mid-Atlantic Nanotechnology Hub (MANTH) ? nnci.net 3205 Walnut Street, Philadelphia PA 19104 USA nano.upenn.edu ? lopezg at seas.upenn.edu ? +1-215-573-4041 ? linkedin.com/in/geraldglopez/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From J_Hagopian at comcast.net Tue Jan 17 18:06:08 2023 From: J_Hagopian at comcast.net (J_Hagopian) Date: Tue, 17 Jan 2023 18:06:08 -0500 Subject: [labnetwork] Treating silane exhaust from PECVD In-Reply-To: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> References: <33ecf08cd3994eb1b35e7a922c6b770a@sfu.ca> Message-ID: <9E6DAD1E-B677-492C-881E-3E0C457A20FA@comcast.net> Hadi, I purchased a pyrolyzer from CVD systems for use with our CVD system. It is a very capable system and was never activated. We are considering selling it a 15% discount to our cost of $20K. Let me know if you are interested and I will send you the spec. John > On Jan 12, 2023, at 2:35 PM, Hadi Esmaeilsabzali wrote: > > Dear Colleagues, > > For those who run PECVD at their facilities, I am wondering how you process the exhaust from your systems. > > We used to treat the PECVD exhaust along with that of the SiNx tube furnace through a TPU. We have recently decommissioned our furnace and TPU as they were too costly to run and are looking at alternative exhaust options for the PECVD only. We use our PECVD tool for oxide and nitride deposition, and it's worth noting that it only uses silane (no ammonia). > > Some colleagues had mentioned that they don't use a TPU/scrubber and send the process waste to the building exhaust (untreated). Given that our PECVD processes use a relatively small silane flow (~30 sccm for up to 30 mins per run each week - all max values) and it is significantly diluted, this sounded a practical option. I am trying to see if others have tried or can comment on this approach, particularly for a silane-based PECVD process. Aside from theflammability concerns, we are also aware of the potential oxide buildup in the exhaust system over time. > > I appreciate it if you share other (cost-effective) suggestions you might have for us! > > Thanks, > Hadi > > Hadi Esmaeilsabzali, PhD > Nanofabrication Group Manager, 4D LABS > Simon Fraser University > 8888 University Dr., Burnaby, B.C. V5A 1S6 > T: 778.782.3790 | F: 778.782.3765 | www.4dlabs.ca > Facebook | Twitter | LinkedIn > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From Assaf.Hazzan at weizmann.ac.il Wed Jan 18 04:49:07 2023 From: Assaf.Hazzan at weizmann.ac.il (Assaf Hazzan) Date: Wed, 18 Jan 2023 09:49:07 +0000 Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring In-Reply-To: References: Message-ID: <38f544a8ae7e4386bf3a068c82cc7ca8@weizmann.ac.il> Hi Aju We have sensors in the following locations: 1. Gas cabinets 2. In the machine's gas boxes. 3. By the connection of the pump exhaust to the exhaust pipeline. Best regards Assaf Hazzan Nanofabrication Center Manager Department of Chemical Research Support Weizmann Institute of Science. Email: assaf.hazzan at weizmann.ac.il Site: Weizmann Nano Fabrication Phone: +972-8-9345175 Cell: +972-52-8679129 Fax: +972-8-9346069 Office: Perlman Chemical Sciences Building, Room 20 (-1 floor) From: labnetwork On Behalf Of Aju Jugessur Sent: Friday, January 13, 2023 7:48 PM To: Fab Network Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring Hi all, We have ICP etcher and PECVD that use toxic gases such as Cl2, BCl3 and Silane. The exhausts from the pumps are connected to a scrubber and ph neutralization/acid waste system. I am reaching out to get some advice on the specific locations of the Honeywell Midas sensors that we use, to detect any gas leak at the etchers and toxic gas monitoring system. We have sensors at the gas cabinets and ambient sensors at the tools. However, there seems to be a disagreement between our design team and our EHS unit. The design team recommends having the sensors in the gas pods, where the leaks are most likely to occur. EHS would like to have the ambient sensors at the tools, in the breathing zone areas. As per local code requirements, sensors in the gas pods satisfies the safety requirements. I would like to know what your set-up of the sensor locations for similar instruments is that you may have in your facility. Any insights based on experience will be super helpful. Thanks so much, Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Facility Member of Inclusive Culture Council (ICC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEC | Boulder, CO 80303| P: 303.735.5019 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur www.colorado.edu/facility/cosinc (MBA candidate, CU, Class of 2023) [signature_804197951] Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6301 bytes Desc: image001.png URL: From robert.macdonald at ge.com Wed Jan 18 09:44:04 2023 From: robert.macdonald at ge.com (Macdonald, Robert (GE Research, US)) Date: Wed, 18 Jan 2023 14:44:04 +0000 Subject: [labnetwork] What is the state of the art for polysilicon deposition rates? Message-ID: <07af6609118941159635b9860b427e26@ge.com> Hi all, What is the current state of the art for polysilicon deposition rates? Our furnace, which I would call classic deposition method, puts down quality films at rates measured in hours per micron. If you have a tool in your lab which is substantially faster, or know of one, I would be interested. In particular, I'm wondering if there are processes for putting down say 10um thick polysilicon films in under an hour. Maybe someone has a tool developed for solar and it is still in use? We are interested in micromachining applications. Thanks, Rob MacDonald General Electric Research -------------- next part -------------- An HTML attachment was scrubbed... URL: From Aju.Jugessur at Colorado.EDU Wed Jan 18 14:47:24 2023 From: Aju.Jugessur at Colorado.EDU (Aju Jugessur) Date: Wed, 18 Jan 2023 19:47:24 +0000 Subject: [labnetwork] Cl2, BCl3 and Silane sensors for toxic gas monitoring In-Reply-To: References: Message-ID: Hi all, Thank you all for your responses on this matter. I have taken notes of your suggestions and will follow up with individuals. Thanks so much, Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Facility Member of Inclusive Culture Council (ICC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEC | Boulder, CO 80303| P: 303.735.5019 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur www.colorado.edu/facility/cosinc (MBA candidate, CU, Class of 2023) [signature_804197951] Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) From: Aju Jugessur Date: Friday, January 13, 2023 at 10:48 AM To: Fab Network Subject: Cl2, BCl3 and Silane sensors for toxic gas monitoring Hi all, We have ICP etcher and PECVD that use toxic gases such as Cl2, BCl3 and Silane. The exhausts from the pumps are connected to a scrubber and ph neutralization/acid waste system. I am reaching out to get some advice on the specific locations of the Honeywell Midas sensors that we use, to detect any gas leak at the etchers and toxic gas monitoring system. We have sensors at the gas cabinets and ambient sensors at the tools. However, there seems to be a disagreement between our design team and our EHS unit. The design team recommends having the sensors in the gas pods, where the leaks are most likely to occur. EHS would like to have the ambient sensors at the tools, in the breathing zone areas. As per local code requirements, sensors in the gas pods satisfies the safety requirements. I would like to know what your set-up of the sensor locations for similar instruments is that you may have in your facility. Any insights based on experience will be super helpful. Thanks so much, Aju Aju Jugessur Ph.D. IEEE Sr. Member Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC) Facility Member of Inclusive Culture Council (ICC) University of Colorado Boulder | College of Engineering & Applied Science 4001 Discovery Drive, N360G SEEC | Boulder, CO 80303| P: 303.735.5019 E-mail: aju.jugessur at colorado.edu Personal Zoom link: https://cuboulder.zoom.us/my/ajugessur www.colorado.edu/facility/cosinc (MBA candidate, CU, Class of 2023) [signature_804197951] Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever (CliftonStrengths) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 6301 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 6301 bytes Desc: image002.png URL: From nzxie at uw.edu Wed Jan 18 16:23:05 2023 From: nzxie at uw.edu (Ningzhi Xie) Date: Wed, 18 Jan 2023 13:23:05 -0800 Subject: [labnetwork] Deep anisotropic etching of SiO2 Message-ID: Dear college, We want to perform a highly anisotropic, very deep (~500um) etching of SiO2 with a vertical side wall. On top of the SiO2 is nanostructures protected by photoresist. The etch depth needs to be controlled with a precision of 20% (we are thinking of using another material as the substrate underneath the SiO2 layer, which acts as an etch-stopper). The structure and dimensions are shown in the attached image. It would be very helpful if anyone has any idea of this kind of etching (either dry and wet chemical etch is fine). Thank you very much. Best regards, Ningzhi Xie Department of Electrical and Computer Engineering University of Washington -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: SiO_etch.png Type: image/png Size: 26878 bytes Desc: not available URL: From Howard.Northfield at uottawa.ca Wed Jan 18 19:05:20 2023 From: Howard.Northfield at uottawa.ca (Howard Northfield) Date: Thu, 19 Jan 2023 00:05:20 +0000 Subject: [labnetwork] Deep anisotropic etching of SiO2 In-Reply-To: References: Message-ID: That's a very deep etch. Regarding dry etching: I have recently done etch tests on PEVCD SiO2 with a SAMCO 10NR RIE: - 50W, 80sccm CF4, 16sccm O2, 3.0Pa: ~21nm/min - 25W, 25sccm SF6, 10sccm O2, 3.0Pa: ~7nm/min - 50W, 25sccm SF6, 10sccm O2, 3.0Pa: ~19nm/min ... yes for 500um that would be around a 417 hour etch .... not feasible/realistic. So you can probably rule out these etch recipes. Regarding wet etching, generally I find it very hard to control and mask under-cut is significant. Howard Northfield Research Associate Advanced Research Complex (ARC) University of Ottawa ________________________________ From: labnetwork on behalf of Ningzhi Xie Sent: Wednesday, January 18, 2023 4:23 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Deep anisotropic etching of SiO2 Attention : courriel externe | external email Dear college, We want to perform a highly anisotropic, very deep (~500um) etching of SiO2 with a vertical side wall. On top of the SiO2 is nanostructures protected by photoresist. The etch depth needs to be controlled with a precision of 20% (we are thinking of using another material as the substrate underneath the SiO2 layer, which acts as an etch-stopper). The structure and dimensions are shown in the attached image. It would be very helpful if anyone has any idea of this kind of etching (either dry and wet chemical etch is fine). Thank you very much. Best regards, Ningzhi Xie Department of Electrical and Computer Engineering University of Washington -------------- next part -------------- An HTML attachment was scrubbed... URL: From james.beall at nist.gov Wed Jan 18 20:27:09 2023 From: james.beall at nist.gov (Beall, James A. (Fed)) Date: Thu, 19 Jan 2023 01:27:09 +0000 Subject: [labnetwork] Deep anisotropic etching of SiO2 In-Reply-To: References: Message-ID: Very deep indeed. You would need a thick metal mask (Al or Ni) to do that (my experience with a PlasmaTherm ICP etch tool). Perhaps laser cutting or ultrasonic? Or just a dicing saw. Jim Beall NIST Boulder Microfab On Jan 18, 2023, at 5:05 PM, Howard Northfield wrote: That's a very deep etch. Regarding dry etching: I have recently done etch tests on PEVCD SiO2 with a SAMCO 10NR RIE: - 50W, 80sccm CF4, 16sccm O2, 3.0Pa: ~21nm/min - 25W, 25sccm SF6, 10sccm O2, 3.0Pa: ~7nm/min - 50W, 25sccm SF6, 10sccm O2, 3.0Pa: ~19nm/min ... yes for 500um that would be around a 417 hour etch .... not feasible/realistic. So you can probably rule out these etch recipes. Regarding wet etching, generally I find it very hard to control and mask under-cut is significant. Howard Northfield Research Associate Advanced Research Complex (ARC) University of Ottawa ________________________________ From: labnetwork > on behalf of Ningzhi Xie > Sent: Wednesday, January 18, 2023 4:23 PM To: labnetwork at mtl.mit.edu > Subject: [labnetwork] Deep anisotropic etching of SiO2 Attention : courriel externe | external email Dear college, We want to perform a highly anisotropic, very deep (~500um) etching of SiO2 with a vertical side wall. On top of the SiO2 is nanostructures protected by photoresist. The etch depth needs to be controlled with a precision of 20% (we are thinking of using another material as the substrate underneath the SiO2 layer, which acts as an etch-stopper). The structure and dimensions are shown in the attached image. It would be very helpful if anyone has any idea of this kind of etching (either dry and wet chemical etch is fine). Thank you very much. Best regards, Ningzhi Xie Department of Electrical and Computer Engineering University of Washington _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From nidetz at umich.edu Wed Jan 18 20:33:41 2023 From: nidetz at umich.edu (Robert Nidetz) Date: Wed, 18 Jan 2023 20:33:41 -0500 Subject: [labnetwork] Deep anisotropic etching of SiO2 In-Reply-To: References: Message-ID: Could you mechanically remove most of the SiO2 using something like a dicing saw and then finish the removal using a wet etch? Maybe create a fin structure in the SiO2 you do not want and then let a wet etch remove the fins? Your undercut could be reduced in this manner. On Wed, Jan 18, 2023 at 8:08 PM Howard Northfield < Howard.Northfield at uottawa.ca> wrote: > > That's a very deep etch. > > Regarding dry etching: > I have recently done etch tests on PEVCD SiO2 with a SAMCO 10NR RIE: > > - 50W, 80sccm CF4, 16sccm O2, 3.0Pa: ~21nm/min > > - 25W, 25sccm SF6, 10sccm O2, 3.0Pa: ~7nm/min > - 50W, 25sccm SF6, 10sccm O2, 3.0Pa: ~19nm/min > > ... yes for 500um that would be around a 417 hour etch .... not > feasible/realistic. > So you can probably rule out these etch recipes. > > Regarding wet etching, generally I find it very hard to control and mask > under-cut is significant. > > Howard Northfield > Research Associate > Advanced Research Complex (ARC) > University of Ottawa > > ------------------------------ > *From:* labnetwork on behalf of Ningzhi > Xie > *Sent:* Wednesday, January 18, 2023 4:23 PM > *To:* labnetwork at mtl.mit.edu > *Subject:* [labnetwork] Deep anisotropic etching of SiO2 > > *Attention : courriel externe | external email* > Dear college, > > We want to perform a highly anisotropic, very deep (~500um) etching of > SiO2 with a vertical side wall. On top of the SiO2 is nanostructures > protected by photoresist. The etch depth needs to be controlled with a > precision of 20% (we are thinking of using another material as the > substrate underneath the SiO2 layer, which acts as an etch-stopper). The > structure and dimensions are shown in the attached image. It would be very > helpful if anyone has any idea of this kind of etching (either dry and wet > chemical etch is fine). > > Thank you very much. > > Best regards, > Ningzhi Xie > Department of Electrical and Computer Engineering > University of Washington > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Robert Nidetz, PhD (he/him/his) University of Michigan LNF User Liaison and Domain Expert 1241 EECS Building 1301 Beal Ave Ann Arbor, MI 48109 nidetz at umich.edu 734.496.8065 Book an appointment: https://calendly.com/nidetz -------------- next part -------------- An HTML attachment was scrubbed... URL: From rmorrison at draper.com Thu Jan 19 07:35:57 2023 From: rmorrison at draper.com (Morrison, Richard H., Jr) Date: Thu, 19 Jan 2023 12:35:57 +0000 Subject: [labnetwork] [EXTERNAL] Deep anisotropic etching of SiO2 In-Reply-To: References: Message-ID: Hi, The wet etch will not work due to undercut. Has for RIE you would need a high density ICP type etch tool, I think ULVAC sells such a tool. 500um of SiO2 is a tall order good luck. Rick Richard Morrison DMTS Draper Laboratory 555 Technology Square Cambridge Ma 02139 Office: 617-258-3420 Cell: 508-930-3461 From: labnetwork On Behalf Of Ningzhi Xie Sent: Wednesday, January 18, 2023 4:23 PM To: labnetwork at mtl.mit.edu Subject: [EXTERNAL] [labnetwork] Deep anisotropic etching of SiO2 CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe. Dear college, We want to perform a highly anisotropic, very deep (~500um) etching of SiO2 with a vertical side wall. On top of the SiO2 is nanostructures protected by photoresist. The etch depth needs to be controlled with a precision of 20% (we are thinking of using another material as the substrate underneath the SiO2 layer, which acts as an etch-stopper). The structure and dimensions are shown in the attached image. It would be very helpful if anyone has any idea of this kind of etching (either dry and wet chemical etch is fine). Thank you very much. Best regards, Ningzhi Xie Department of Electrical and Computer Engineering University of Washington -------------- next part -------------- An HTML attachment was scrubbed... URL: From Jeffrey.Salzmann at integer.net Thu Jan 19 08:20:18 2023 From: Jeffrey.Salzmann at integer.net (Salzmann, Jeffrey) Date: Thu, 19 Jan 2023 13:20:18 +0000 Subject: [labnetwork] Deep anisotropic etching of SiO2 In-Reply-To: References: Message-ID: If you can get access to it, I?ve had good success with vertical sidewalls on silica using a femtosecond laser. Trumpf laser?s Top Cleave system and a sonicated KOH etch can easily do 500?m ?drill?. The throughput is vastly faster than any traditional semiconductor approach. Note that you can?t do a partial depth so you might need to figure out a way to bond the silica onto a substrate. From: labnetwork On Behalf Of Robert Nidetz Sent: Wednesday, January 18, 2023 8:34 PM To: Howard Northfield Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Deep anisotropic etching of SiO2 CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe. Could you mechanically remove most of the SiO2 using something like a dicing saw and then finish the removal using a wet etch? Maybe create a fin structure in the SiO2 you do not want and then let a wet etch remove the fins? Your undercut could be reduced in this manner.On Wed, J ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? [https://alert-dg01.redatatech.com/onprem_security_warning_fetch?r=0&dep=RFAmgc97wIrL8YIa5vO%2BGw%3D%3Djv1pW%2BD0Nbl9zTUv8NbHhn%2BFQK%2BLrktWcWrMgo3mtFGXa4wPFUsAFnqZ11vkWaBI5Iwym0afm7OUNCJEK%2BQtVmtOrmJAo2fsIC0iIW8N61r9WdXPw9b0b%2BvZwEp6ezXSCxielZ4K9wQeLqx] Could you mechanically remove most of the SiO2 using something like a dicing saw and then finish the removal using a wet etch? Maybe create a fin structure in the SiO2 you do not want and then let a wet etch remove the fins? Your undercut could be reduced in this manner. On Wed, Jan 18, 2023 at 8:08 PM Howard Northfield > wrote: That's a very deep etch. Regarding dry etching: I have recently done etch tests on PEVCD SiO2 with a SAMCO 10NR RIE: - 50W, 80sccm CF4, 16sccm O2, 3.0Pa: ~21nm/min - 25W, 25sccm SF6, 10sccm O2, 3.0Pa: ~7nm/min - 50W, 25sccm SF6, 10sccm O2, 3.0Pa: ~19nm/min ... yes for 500um that would be around a 417 hour etch .... not feasible/realistic. So you can probably rule out these etch recipes. Regarding wet etching, generally I find it very hard to control and mask under-cut is significant. Howard Northfield Research Associate Advanced Research Complex (ARC) University of Ottawa ________________________________ From: labnetwork > on behalf of Ningzhi Xie > Sent: Wednesday, January 18, 2023 4:23 PM To: labnetwork at mtl.mit.edu > Subject: [labnetwork] Deep anisotropic etching of SiO2 Attention : courriel externe | external email Dear college, We want to perform a highly anisotropic, very deep (~500um) etching of SiO2 with a vertical side wall. On top of the SiO2 is nanostructures protected by photoresist. The etch depth needs to be controlled with a precision of 20% (we are thinking of using another material as the substrate underneath the SiO2 layer, which acts as an etch-stopper). The structure and dimensions are shown in the attached image. It would be very helpful if anyone has any idea of this kind of etching (either dry and wet chemical etch is fine). Thank you very much. Best regards, Ningzhi Xie Department of Electrical and Computer Engineering University of Washington _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Robert Nidetz, PhD (he/him/his) University of Michigan LNF User Liaison and Domain Expert 1241 EECS Building 1301 Beal Ave Ann Arbor, MI 48109 nidetz at umich.edu 734.496.8065 Book an appointment: https://calendly.com/nidetz ________________________________ Integer Confidentiality Notice: This electronic mail transmission is intended for the use of the individual or entity to which it is addressed and may contain confidential or proprietary information belonging to the sender. If you are not the intended recipient, you are hereby notified that any disclosure, copying, distribution, or the taking of any action in reliance on the contents of this information is strictly prohibited. If you have received this transmission in error, please notify the sender immediately by e-mail and delete the original message. Thank you for your cooperation. -------------- next part -------------- An HTML attachment was scrubbed... URL: From lino.eugene at uwaterloo.ca Thu Jan 19 11:00:59 2023 From: lino.eugene at uwaterloo.ca (Lino Eugene) Date: Thu, 19 Jan 2023 16:00:59 +0000 Subject: [labnetwork] Deep anisotropic etching of SiO2 In-Reply-To: References: Message-ID: Hi Ningzhi, Few years ago, I saw a presentation about laser induced deep etching (LIDE). You might want to have a look at this. https://www.youtube.com/watch?v=wJUU82osyDU Best, Lino Eugene, P.Eng., Ph.D., Micro/nanofabrication process engineer Quantum-Nano Fabrication and Characterization Facility Office of Research QNC 1611 University of Waterloo 200 University Avenue West Waterloo, ON, Canada N2L 3G1 Ph: +1 519-888-4567 #37788 Cell: +1 226-929-1685 Websites: https://uwaterloo.ca/quantum-nano-fabrication-and-characterization-facility/ https://fab.qnc.uwaterloo.ca/ From: labnetwork On Behalf Of Beall, James A. (Fed) Sent: January 18, 2023 8:27 PM To: Ningzhi Xie ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Deep anisotropic etching of SiO2 Very deep indeed. You would need a thick metal mask (Al or Ni) to do that (my experience with a PlasmaTherm ICP etch tool). Perhaps laser cutting or ultrasonic? Or just a dicing saw. Jim Beall NIST Boulder Microfab On Jan 18, 2023, at 5:05 PM, Howard Northfield > wrote: That's a very deep etch. Regarding dry etching: I have recently done etch tests on PEVCD SiO2 with a SAMCO 10NR RIE: - 50W, 80sccm CF4, 16sccm O2, 3.0Pa: ~21nm/min - 25W, 25sccm SF6, 10sccm O2, 3.0Pa: ~7nm/min - 50W, 25sccm SF6, 10sccm O2, 3.0Pa: ~19nm/min ... yes for 500um that would be around a 417 hour etch .... not feasible/realistic. So you can probably rule out these etch recipes. Regarding wet etching, generally I find it very hard to control and mask under-cut is significant. Howard Northfield Research Associate Advanced Research Complex (ARC) University of Ottawa ________________________________ From: labnetwork > on behalf of Ningzhi Xie > Sent: Wednesday, January 18, 2023 4:23 PM To: labnetwork at mtl.mit.edu > Subject: [labnetwork] Deep anisotropic etching of SiO2 Attention : courriel externe | external email Dear college, We want to perform a highly anisotropic, very deep (~500um) etching of SiO2 with a vertical side wall. On top of the SiO2 is nanostructures protected by photoresist. The etch depth needs to be controlled with a precision of 20% (we are thinking of using another material as the substrate underneath the SiO2 layer, which acts as an etch-stopper). The structure and dimensions are shown in the attached image. It would be very helpful if anyone has any idea of this kind of etching (either dry and wet chemical etch is fine). Thank you very much. Best regards, Ningzhi Xie Department of Electrical and Computer Engineering University of Washington _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From aandreib at gmail.com Thu Jan 19 11:27:51 2023 From: aandreib at gmail.com (Andrei Alamariu) Date: Thu, 19 Jan 2023 11:27:51 -0500 Subject: [labnetwork] Deep anisotropic etching of SiO2 In-Reply-To: References: Message-ID: Hello, I am thinking if it would be possible to try to cast the thick SiO2 layer, using the Spin On Glass (SOG) material and a metal mold. It would require a lot of auxiliary processing steps. First choosing the metal - substrate assembly. The low doped Si wafers (> 10 Ohm-cm) are transparent to NIR; but will alloy/ sinter with Aluminum, complicating the process. So you could use Si & Ti or Quartz & Al, etc. What is the layout shape of the device and and of the substrate? Then machine the molds with very smooth and clean interior surfaces, and allow some process tolerances. Then prepare the stable siting setting of the molds on the substrate surface using the first photo- etch procedure. Then pour the SOG on the whole wafer surface, very slowly at the beginning. Then gently reflow the SOG and anneal it, the higher the temperature the better, but for industrial machined Al no more than 525C. Then CMP the top surface! The unknown, the hardest and critical step. Using Ti molds would be easier. Then use the second mask to cover the device area and a little over the metal mold too, and BOE etch the surrounding SiO2. (it will stop at the Si substrate surface, but not at Quartz surface!), then continue and etch the metal molds. Then cut the Si substrate to the desired size and shape using the dice saw or photo and STS machine. Thanks, Andrei Sent from my iPad > On Jan 18, 2023, at 4:52 PM, Ningzhi Xie wrote: > > ? > Dear college, > > We want to perform a highly anisotropic, very deep (~500um) etching of SiO2 with a vertical side wall. On top of the SiO2 is nanostructures protected by photoresist. The etch depth needs to be controlled with a precision of 20% (we are thinking of using another material as the substrate underneath the SiO2 layer, which acts as an etch-stopper). The structure and dimensions are shown in the attached image. It would be very helpful if anyone has any idea of this kind of etching (either dry and wet chemical etch is fine). > > Thank you very much. > > Best regards, > Ningzhi Xie > Department of Electrical and Computer Engineering > University of Washington -------------- next part -------------- A non-text attachment was scrubbed... Name: SiO_etch.png Type: image/png Size: 26878 bytes Desc: not available URL: -------------- next part -------------- > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork From grallion at ncsu.edu Thu Jan 19 11:54:10 2023 From: grallion at ncsu.edu (Greg Allion) Date: Thu, 19 Jan 2023 11:54:10 -0500 Subject: [labnetwork] Deep anisotropic etching of SiO2 In-Reply-To: References: Message-ID: That is a very tall order even for a facility with a deep glass etcher. Depending on the application, you may want to consider using SU-8. It's obnoxious to work with at that thickness, but it would work. I'd be happy to provide more information if you think this may be an option. Best, Greg On Wed, Jan 18, 2023 at 4:52 PM Ningzhi Xie wrote: > Dear college, > > We want to perform a highly anisotropic, very deep (~500um) etching of > SiO2 with a vertical side wall. On top of the SiO2 is nanostructures > protected by photoresist. The etch depth needs to be controlled with a > precision of 20% (we are thinking of using another material as the > substrate underneath the SiO2 layer, which acts as an etch-stopper). The > structure and dimensions are shown in the attached image. It would be very > helpful if anyone has any idea of this kind of etching (either dry and wet > chemical etch is fine). > > Thank you very much. > > Best regards, > Ningzhi Xie > Department of Electrical and Computer Engineering > University of Washington > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -- Greg Allion NC State University Nanofabrication Facility (NNF) Process Integration Engineering Manager Monteith Research Center 2410 Campus Shore Drive rm.243E Raleigh, NC 27606 -------------- next part -------------- An HTML attachment was scrubbed... URL: From yglian at illinois.edu Thu Jan 19 12:07:11 2023 From: yglian at illinois.edu (Lian, Yaguang) Date: Thu, 19 Jan 2023 17:07:11 +0000 Subject: [labnetwork] Deep anisotropic etching of SiO2 In-Reply-To: References: Message-ID: Hello Ningzhi, It is extremely hard to finish this process by using the etch machines. I have some descriptions of SiO2 etching. They can be found in my book. Please see the link below: Semiconductor Microchips and Fabrication: A Practical Guide to Theory and Manufacturing: Lian, Yaguang: 9781119867784: Amazon.com: Books Good luck, Yaguang Lian From: labnetwork On Behalf Of Ningzhi Xie Sent: Wednesday, January 18, 2023 3:23 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Deep anisotropic etching of SiO2 Dear college, We want to perform a highly anisotropic, very deep (~500um) etching of SiO2 with a vertical side wall. On top of the SiO2 is nanostructures protected by photoresist. The etch depth needs to be controlled with a precision of 20% (we are thinking of using another material as the substrate underneath the SiO2 layer, which acts as an etch-stopper). The structure and dimensions are shown in the attached image. It would be very helpful if anyone has any idea of this kind of etching (either dry and wet chemical etch is fine). Thank you very much. Best regards, Ningzhi Xie Department of Electrical and Computer Engineering University of Washington -------------- next part -------------- An HTML attachment was scrubbed... URL: From mhuff at cnri.reston.va.us Thu Jan 19 14:46:23 2023 From: mhuff at cnri.reston.va.us (Michael Huff) Date: Thu, 19 Jan 2023 14:46:23 -0500 Subject: [labnetwork] Deep anisotropic etching of SiO2 In-Reply-To: References: Message-ID: <902ffba6f58d98340005640134.0383cb6de5.F01F9751-10B7-4AB8-96CF-54E94B9E52E4@cnri.reston.va.us> It can be done, but it is an expensive process and requires a thick nickel hard mask. See attached paper: -------------- next part -------------- A non-text attachment was scrubbed... Name: JMEMS-Fused Silica-Paper-Final Grayscale 1 29 2017.pdf Type: application/pdf Size: 3118153 bytes Desc: not available URL: -------------- next part -------------- > On Jan 18, 2023, at 4:23 PM, Ningzhi Xie wrote: > > Dear college, > > We want to perform a highly anisotropic, very deep (~500um) etching of SiO2 with a vertical side wall. On top of the SiO2 is nanostructures protected by photoresist. The etch depth needs to be controlled with a precision of 20% (we are thinking of using another material as the substrate underneath the SiO2 layer, which acts as an etch-stopper). The structure and dimensions are shown in the attached image. It would be very helpful if anyone has any idea of this kind of etching (either dry and wet chemical etch is fine). > > Thank you very much. > > Best regards, > Ningzhi Xie > Department of Electrical and Computer Engineering > University of Washington > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork From schweig at umich.edu Fri Jan 20 07:33:55 2023 From: schweig at umich.edu (Dennis Schweiger) Date: Fri, 20 Jan 2023 07:33:55 -0500 Subject: [labnetwork] Extractive tape gas detection Message-ID: Good morning all, I was wondering if there are any users on this forum that are using the DOD extractive tapes in a Honeywell Vertex or CM-4 system, and if you're having good success with that pairing? I'd also be interested to know what day length tapes you're using as well? Currently we're using the 90 day tapes from Honeywell in our Vertex units, but I'm looking at the DOD 90's, and even the 120's, as a way to reduce some of our running costs. Thank you, Dennis Schweiger University of Michigan/LNF 734.647.2055 Ofc -------------- next part -------------- An HTML attachment was scrubbed... URL: From kckeenan at seas.upenn.edu Fri Jan 20 15:21:20 2023 From: kckeenan at seas.upenn.edu (Kyle Keenan) Date: Fri, 20 Jan 2023 15:21:20 -0500 Subject: [labnetwork] old SensArray Corp wafers & wiring/connectors Message-ID: Hello All, I'm wondering if any of you have any experience with SensArray products from the early 2000's. I have a couple of wire & connector sets (p/n 1410-0-5103Z) complete with 3.5" floppy disk software, no less, plus a handful of 6" temp mapping wafers (2210's), as well as one 8" wafer. Some of this stuff looks like it's never been used, but I don't know much about it and whether or not it's worth keeping, particularly since I have no temp reader. Please let me know your thoughts. Thank you, -- Kyle Keenan Senior Manager - Laboratory Operations Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 -------------- next part -------------- An HTML attachment was scrubbed... URL: From Jeffrey.Salzmann at integer.net Fri Jan 20 16:12:36 2023 From: Jeffrey.Salzmann at integer.net (Salzmann, Jeffrey) Date: Fri, 20 Jan 2023 21:12:36 +0000 Subject: [labnetwork] old SensArray Corp wafers & wiring/connectors In-Reply-To: References: Message-ID: Kyle, These are particularly helpful with RTP measured temperature v. pyrometer settings. I?ve also used these for heated chucks and susceptors. The wafers I?ve used in the past are simply thermocouples. Might want to contact KLA and see if they can tell you which sort they are. Jeff From: labnetwork On Behalf Of Kyle Keenan Sent: Friday, January 20, 2023 3:21 PM To: Lab Network (labnetwork at mtl.mit.edu) Subject: [labnetwork] old SensArray Corp wafers & wiring/connectors CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe. Hello All,I'm wondering if any of you have any experience with SensArray products from the early 2000's. I have a couple of wire & connector sets (p/n 1410-0-5103Z) complete with 3.5" floppy disk software, no less, plus a handful of 6" temp mapping wafers (2 ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? ? Hello All, I'm wondering if any of you have any experience with SensArray products from the early 2000's. I have a couple of wire & connector sets (p/n 1410-0-5103Z) complete with 3.5" floppy disk software, no less, plus a handful of 6" temp mapping wafers (2210's), as well as one 8" wafer. Some of this stuff looks like it's never been used, but I don't know much about it and whether or not it's worth keeping, particularly since I have no temp reader. Please let me know your thoughts. Thank you, -- Kyle Keenan Senior Manager - Laboratory Operations Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 ________________________________ Integer Confidentiality Notice: This electronic mail transmission is intended for the use of the individual or entity to which it is addressed and may contain confidential or proprietary information belonging to the sender. If you are not the intended recipient, you are hereby notified that any disclosure, copying, distribution, or the taking of any action in reliance on the contents of this information is strictly prohibited. If you have received this transmission in error, please notify the sender immediately by e-mail and delete the original message. Thank you for your cooperation. -------------- next part -------------- An HTML attachment was scrubbed... URL: From beaudoin at physics.ubc.ca Fri Jan 20 16:19:17 2023 From: beaudoin at physics.ubc.ca (Beaudoin, Mario) Date: Fri, 20 Jan 2023 13:19:17 -0800 Subject: [labnetwork] Sensors for DES (diethylsilane) Message-ID: Hello All, We use DES (diethylsilane) as our silicon precursor in our Trion PECVD system.?? The company we deal with for sensors is asking 10K$ for a sensor that will need to recalibrated yearly and replaced after 2 years.? Quite steep in our opinion.? As our DES cylinder spends roughly 95% of the time closed, I'd like to find a less expensive option.? For example, even a handheld unit that I would only use when DES is in use. Thanks all, Mario -- -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig 2.jpg Type: image/jpeg Size: 21446 bytes Desc: not available URL: From spaolini at cns.fas.harvard.edu Fri Jan 20 17:12:42 2023 From: spaolini at cns.fas.harvard.edu (Paolini, Steven) Date: Fri, 20 Jan 2023 22:12:42 +0000 Subject: [labnetwork] old SensArray Corp wafers & wiring/connectors In-Reply-To: References: Message-ID: Kyle, Those SensArray wafers are valuable tools. You don?t need a fancy dedicated temp reader for them, a simple digital thermometer or DVOM with a T/C input will do unless you need to map across the wafer simultaneously. As long as the reading instrument has the same T/C type as the junctions on the wafer, it should work just fine. These are critical tools for checking wafer temps in a vacuum system (the flat leads are designed to cross an Oring) or an RTP. If you have no use for them, I would be interested in purchasing them from you. As always, best regards, Equipment Dood Steve Paolini Principal Equipment Engineer Harvard University Center for Nanoscale Systems 11 Oxford St. Cambridge, MA 02138 617- 496- 9816 spaolini at cns.fas.harvard.edu www.cns.fas.harvard.edu From: labnetwork On Behalf Of Kyle Keenan Sent: Friday, January 20, 2023 3:21 PM To: Lab Network (labnetwork at mtl.mit.edu) Subject: [labnetwork] old SensArray Corp wafers & wiring/connectors Hello All, I'm wondering if any of you have any experience with SensArray products from the early 2000's. I have a couple of wire & connector sets (p/n 1410-0-5103Z) complete with 3.5" floppy disk software, no less, plus a handful of 6" temp mapping wafers (2210's), as well as one 8" wafer. Some of this stuff looks like it's never been used, but I don't know much about it and whether or not it's worth keeping, particularly since I have no temp reader. Please let me know your thoughts. Thank you, -- Kyle Keenan Senior Manager - Laboratory Operations Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 -------------- next part -------------- An HTML attachment was scrubbed... URL: From bill_flounders at berkeley.edu Fri Jan 20 21:22:03 2023 From: bill_flounders at berkeley.edu (Albert William (Bill) Flounders) Date: Fri, 20 Jan 2023 18:22:03 -0800 Subject: [labnetwork] Sensors for DES (diethylsilane) In-Reply-To: References: Message-ID: Mario Beaudoin, I'm surprised there is even a monitoring requirement for diethylsilane (DES) and wonder how it is being defined. MSD sheets don't list a LFL and most don't even have vapor pressure data. Gelest at least has BP I understand DES is flammable but I think few of us are monitoring all our flammable gases. I know I'm not monitoring my methane at home - but I recognize that's why we add mercaptan. All that aside, monitoring is good - so back to your sensor I expect the company is just offering you a general hydride sensor. I would ask them to confirm that they even have it calibrated to DES - and how they do it. Then you can ask them for the cross reactivity to silane - and just use anyone else's reasonably priced silane sensor. For a flammable gas, I would not consider carefully calibrated detection to ppm necessary. I think you and your authority having jurisdiction (AHJ) just want to know if you have a leak or not. Bill Flounders UC Berkeley On Fri, Jan 20, 2023 at 4:45 PM Beaudoin, Mario wrote: > Hello All, > > We use DES (diethylsilane) as our silicon precursor in our Trion PECVD > system. The company we deal with for sensors is asking 10K$ for a sensor > that will need to recalibrated yearly and replaced after 2 years. Quite > steep in our opinion. As our DES cylinder spends roughly 95% of the time > closed, I'd like to find a less expensive option. For example, even a > handheld unit that I would only use when DES is in use. > > Thanks all, > > Mario > -- > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Mario Beaudoin SBQMI sig 2.jpg Type: image/jpeg Size: 21446 bytes Desc: not available URL: From kckeenan at seas.upenn.edu Mon Jan 23 08:55:04 2023 From: kckeenan at seas.upenn.edu (Kyle Keenan) Date: Mon, 23 Jan 2023 08:55:04 -0500 Subject: [labnetwork] old SensArray Corp wafers & wiring/connectors In-Reply-To: References: Message-ID: Hi Steve, Thanks for your input. They have multipoint capability, and the connectors are big and clunky with a lot of wires. I'll let you know if we end up not using them. Best, Kyle On Fri, Jan 20, 2023 at 5:12 PM Paolini, Steven < spaolini at cns.fas.harvard.edu> wrote: > Kyle, > > Those SensArray wafers are valuable tools. You don?t need a fancy > dedicated temp reader for them, a simple digital thermometer or DVOM with a > T/C input will do unless you need to map across the wafer simultaneously. > As long as the reading instrument has the same T/C type as the junctions on > the wafer, it should work just fine. These are critical tools for checking > wafer temps in a vacuum system (the flat leads are designed to cross an > Oring) or an RTP. If you have no use for them, I would be interested in > purchasing them from you. > > As always, best regards, > > Equipment Dood > > > > Steve Paolini > > Principal Equipment Engineer > > Harvard University Center for Nanoscale Systems > > 11 Oxford St. > > Cambridge, MA 02138 > > 617- 496- 9816 > > spaolini at cns.fas.harvard.edu > > www.cns.fas.harvard.edu > > > > *From:* labnetwork * On Behalf Of *Kyle > Keenan > *Sent:* Friday, January 20, 2023 3:21 PM > *To:* Lab Network (labnetwork at mtl.mit.edu) > *Subject:* [labnetwork] old SensArray Corp wafers & wiring/connectors > > > > Hello All, > > > > I'm wondering if any of you have any experience with SensArray products > from the early 2000's. I have a couple of wire & connector sets (p/n > 1410-0-5103Z) complete with 3.5" floppy disk software, no less, plus a > handful of 6" temp mapping wafers (2210's), as well as one 8" wafer. Some > of this stuff looks like it's never been used, but I don't know much about > it and whether or not it's worth keeping, particularly since I have no temp > reader. > > > > Please let me know your thoughts. > > > > Thank you, > > -- > > Kyle Keenan > > > > Senior Manager - Laboratory Operations > > Quattrone Nanofabrication Facility > > University of Pennsylvania > > P: 215-898-7560 > > F: 215-573-4925 > -- Kyle Keenan Senior Manager - Laboratory Operations Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 -------------- next part -------------- An HTML attachment was scrubbed... URL: From aamer.mahmood at mail.wvu.edu Mon Jan 23 10:01:42 2023 From: aamer.mahmood at mail.wvu.edu (Aamer Mahmood) Date: Mon, 23 Jan 2023 15:01:42 +0000 Subject: [labnetwork] Hiring: Manager of WVU cleanroom Message-ID: Dear colleagues, There's an immediate opening for a Manager of the WVU microfabrication cleanrooms. The job requirements have been revised after the initial posting in October, 2023. Please help spread the word to fill this position. Job details can be found at the link below. https://wvu.taleo.net/careersection/wvu_research/jobdetail.ftl?job=21506&tz=GMT-05%3A00&tzname=America%2FNew_York Feel free to reach out to me for further details. Best regards, -- Aamer Mahmood Director Shared Research Facilities West Virginia University Morgantown, WV (304) 293 9418 (work) https://sharedresearchfacilities.wvu.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From betemc at rit.edu Tue Jan 24 08:27:33 2023 From: betemc at rit.edu (Bruce Tolleson) Date: Tue, 24 Jan 2023 13:27:33 +0000 Subject: [labnetwork] AG Associates 610 RTP Message-ID: Dear Labnetwork, We have an AG Associates 610 RTP that has good cooling water, good gas and air pressures and no gas flow during processing. Has anyone experienced this before that might be able to help short of recommending a newer machine? Thank you, Bruce Tolleson -------------- next part -------------- An HTML attachment was scrubbed... URL: From bill_flounders at berkeley.edu Tue Jan 24 12:28:22 2023 From: bill_flounders at berkeley.edu (Albert William (Bill) Flounders) Date: Tue, 24 Jan 2023 09:28:22 -0800 Subject: [labnetwork] AG Associates 610 RTP In-Reply-To: References: Message-ID: Allwin21 know AG tools inside/out. They are helpful and may provide troubleshooting over the phone. https://allwin21.com/ Upgrade from the old Rockwell controller to their windows program was well worth it. We have several systems and Allwin provides excellent support. Bill Flounders UC Berkeley On Tue, Jan 24, 2023 at 8:52 AM Bruce Tolleson wrote: > Dear Labnetwork, > > We have an AG Associates 610 RTP that has good cooling water, good gas > and air pressures and no gas flow during processing. > > Has anyone experienced this before that might be able to help short of > recommending a newer machine? > > Thank you, > > Bruce Tolleson > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From michael.martin at louisville.edu Wed Jan 25 14:32:38 2023 From: michael.martin at louisville.edu (Martin, Michael) Date: Wed, 25 Jan 2023 19:32:38 +0000 Subject: [labnetwork] STS Chamber Lid Temp Display Message-ID: This may be a stretch but, is there any chance someone out there has a surplused STS DRIE that you could pull this off of? We really need just the CN76133-485 Omega controller. Wiling to wheel and deal as necessary. I see some on ebay and secondary markets but sooo expensive. Regards, Michael Senior Process Engineer Micro/Nano Technology Center University of Louisville (502) 552-1945 Web page: https://louisville.edu/micronano Instagram: https://www.instagram.com/micronanolouisville/ Facebook https://www.facebook.com/MNTCUOFL/ YouTube: https://www.youtube.com/channel/UCGiczmq6wVIBJlM7UEGVW9Q -------------- next part -------------- An HTML attachment was scrubbed... URL: From mtkhbeis at gmail.com Wed Jan 25 13:12:46 2023 From: mtkhbeis at gmail.com (mtkhbeis at gmail.com) Date: Wed, 25 Jan 2023 10:12:46 -0800 Subject: [labnetwork] Lab Manager Opening - Redmond, WA Message-ID: An HTML attachment was scrubbed... URL: From r.khanna at ucl.ac.uk Thu Jan 26 06:00:07 2023 From: r.khanna at ucl.ac.uk (Khanna, Rohit) Date: Thu, 26 Jan 2023 11:00:07 +0000 Subject: [labnetwork] STS Chamber Lid Temp Display In-Reply-To: References: Message-ID: Hi Michael, It might be a good idea to look for alternatives, I had replaced some PID temperature controllers on our STS tools with generic PID controllers from RS/Farnell. Kindly check the output and communication link before ordering one for example one can easily buy some a PID controller from RS: https://uk.rs-online.com/web/p/temperature-controllers/1879350 Warm Regards Rohit Khanna Electronic Test & Measurement Engineer London Centre for NANO Technology, UCL Ph:+44-020-76799984 Lab: +44 20 3108 1516 Int Ext: 39984 ________________________________ From: labnetwork on behalf of Martin, Michael Sent: 25 January 2023 19:32 To: labnetwork at mtl.mit.edu Subject: [labnetwork] STS Chamber Lid Temp Display ? Caution: External sender This may be a stretch but, is there any chance someone out there has a surplused STS DRIE that you could pull this off of? We really need just the CN76133-485 Omega controller. Wiling to wheel and deal as necessary. I see some on ebay and secondary markets but sooo expensive. Regards, Michael Senior Process Engineer Micro/Nano Technology Center University of Louisville (502) 552-1945 Web page: https://louisville.edu/micronano Instagram: https://www.instagram.com/micronanolouisville/ Facebook https://www.facebook.com/MNTCUOFL/ YouTube: https://www.youtube.com/channel/UCGiczmq6wVIBJlM7UEGVW9Q -------------- next part -------------- An HTML attachment was scrubbed... URL: From Peter.Lomax at ed.ac.uk Thu Jan 26 07:30:02 2023 From: Peter.Lomax at ed.ac.uk (Peter Lomax) Date: Thu, 26 Jan 2023 12:30:02 +0000 Subject: [labnetwork] STS Chamber Lid Temp Display In-Reply-To: References: Message-ID: Hi, You might want to try Gareth Morgan at http://ctpcompanyservices.co.uk/ Believe Gareth in an ex STS engineer who set up ctp to support older STS equipment. Regards Peter From: labnetwork On Behalf Of Martin, Michael Sent: 25 January 2023 19:33 To: labnetwork at mtl.mit.edu Subject: [labnetwork] STS Chamber Lid Temp Display This email was sent to you by someone outside the University. You should only click on links or attachments if you are certain that the email is genuine and the content is safe. This may be a stretch but, is there any chance someone out there has a surplused STS DRIE that you could pull this off of? We really need just the CN76133-485 Omega controller. Wiling to wheel and deal as necessary. I see some on ebay and secondary markets but sooo expensive. Regards, Michael Senior Process Engineer Micro/Nano Technology Center University of Louisville (502) 552-1945 Web page: https://louisville.edu/micronano Instagram: https://www.instagram.com/micronanolouisville/ Facebook https://www.facebook.com/MNTCUOFL/ YouTube: https://www.youtube.com/channel/UCGiczmq6wVIBJlM7UEGVW9Q The University of Edinburgh is a charitable body, registered in Scotland, with registration number SC005336. Is e buidheann carthannais a th' ann an Oilthigh Dh?n ?ideann, cl?raichte an Alba, ?ireamh cl?raidh SC005336. -------------- next part -------------- An HTML attachment was scrubbed... URL: From VLuciani at thorlabs.com Thu Jan 26 11:54:40 2023 From: VLuciani at thorlabs.com (Vincent Luciani) Date: Thu, 26 Jan 2023 16:54:40 +0000 Subject: [labnetwork] Cleanroom Phones for TEAMS Message-ID: Hello All, It's been a couple years since I've posted but I still hold the nanofab community close in my heart. Here at Thorlabs Quantum Electronics we've gone completely phone-less, switching over to TEAMs for "phone calls". Not sure its progress but that's a larger conversation. The phones installed in the cleanroom are terrible, lacking ringer and speaker volume controls and other things. Thus begins the search for TEAMS compatible phones that function well inside a noisy cleanroom. I thought I would start with a query to the group to see if anyone else has already dealt with this problem. Thanks, Vince Vincent K. Luciani Wafer Fab Engineering Manager Thorlabs Quantum Electronics 10335 Guilford Road Jessup, MD 20794 vluciani at thorlabs.com 240.456.7221 [cid:image001.jpg at 01D9317C.F8ABE1A0] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 1588 bytes Desc: image001.jpg URL: From michael.martin at louisville.edu Thu Jan 26 14:51:05 2023 From: michael.martin at louisville.edu (Martin, Michael) Date: Thu, 26 Jan 2023 19:51:05 +0000 Subject: [labnetwork] Surplus STS DRIE parts Message-ID: Hi everyone, Thanks for all the good input regarding the H.C.L 1 temperature controller. I did not realize so many labs continue to keep these going. We happen to have a spare control rack for a somewhat newer version of the tool than we are currently running and some of the components are probably wired a little differently. We might be willing to sell or trade some of these parts if you have a need though we will probably want to keep the VAT controller. Drop me a line if you're interested. See photo. Regards, Michael Senior Process Engineer Micro/Nano Technology Center University of Louisville (502) 552-1945 Web page: https://louisville.edu/micronano Instagram: https://www.instagram.com/micronanolouisville/ Facebook https://www.facebook.com/MNTCUOFL/ YouTube: https://www.youtube.com/channel/UCGiczmq6wVIBJlM7UEGVW9Q -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Spare DRIE Controller.jpg Type: image/jpeg Size: 78300 bytes Desc: Spare DRIE Controller.jpg URL: From codreanu at udel.edu Thu Jan 26 16:07:34 2023 From: codreanu at udel.edu (Iulian Codreanu) Date: Thu, 26 Jan 2023 16:07:34 -0500 Subject: [labnetwork] Calcium gluconate Message-ID: <8f7a46a5-0240-39c8-a432-7e1b1455e3a3@udel.edu> Dear Colleagues, We suspended use of HF because our calcium gluconate expired in December and EHS is unable to source it due to supply chain issues (when will those end?!). If you have an extra unexpired tube you are willing to part with, I would like to buy it from you. Thank you, Iulian -- iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 https://udnf.udel.edu From yaofootball at gmail.com Thu Jan 26 16:45:13 2023 From: yaofootball at gmail.com (Football) Date: Thu, 26 Jan 2023 15:45:13 -0600 Subject: [labnetwork] third party companies for servicing PlasmaTherm DRIE systems Message-ID: Dear all, We are having trouble getting PlasmaTherm to respond to our questions and service quote. Wanted to ask if you know of any third party companies that work on PlasmaTherm systems, specifically their DRIE tool? Thanks for any suggestions! *Fubo Rao, Ph.D.,* *Nanofabrication Cleanroom Manager,* *Center for Nanoscale Materials,* *Argonne National Laboratory* *9700 S. Cass Ave, Lemont, IL 60439* *Phone: 630-252-5708* -------------- next part -------------- An HTML attachment was scrubbed... URL: From Howard.Northfield at uottawa.ca Thu Jan 26 19:02:03 2023 From: Howard.Northfield at uottawa.ca (Howard Northfield) Date: Fri, 27 Jan 2023 00:02:03 +0000 Subject: [labnetwork] Surplus STS DRIE parts In-Reply-To: References: Message-ID: That VAT controller (looks like a PM5) works in a SAMCO 10NR RIE. .... If you ever want to dispose of that give me a call. Howard Northfield Research Associate Advanced Research Complex (ARC) University of Ottawa ________________________________ From: labnetwork on behalf of Martin, Michael Sent: Thursday, January 26, 2023 2:51 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Surplus STS DRIE parts Attention : courriel externe | external email Hi everyone, Thanks for all the good input regarding the H.C.L 1 temperature controller. I did not realize so many labs continue to keep these going. We happen to have a spare control rack for a somewhat newer version of the tool than we are currently running and some of the components are probably wired a little differently. We might be willing to sell or trade some of these parts if you have a need though we will probably want to keep the VAT controller. Drop me a line if you're interested. See photo. Regards, Michael Senior Process Engineer Micro/Nano Technology Center University of Louisville (502) 552-1945 Web page: https://louisville.edu/micronano Instagram: https://www.instagram.com/micronanolouisville/ Facebook https://www.facebook.com/MNTCUOFL/ YouTube: https://www.youtube.com/channel/UCGiczmq6wVIBJlM7UEGVW9Q -------------- next part -------------- An HTML attachment was scrubbed... URL: From roco at dtu.dk Fri Jan 27 03:07:51 2023 From: roco at dtu.dk (Roy Cork) Date: Fri, 27 Jan 2023 08:07:51 +0000 Subject: [labnetwork] Surplus STS DRIE parts In-Reply-To: References: Message-ID: <203a21bd4407440cb8fd5b2af216e344@dtu.dk> Hi Michael, Are you still looking for one? I have found 3 of unknown status hidden away in the depths of the DTU's basement. If you still need it then I can test it for you on our tool and then send it. Would you be interested in trading one for one of the modules in the picture you posted? Best regards Roy Cork Chief Equipment Engineer DTU Nanaolab Denmark From: labnetwork On Behalf Of Martin, Michael Sent: 26. januar 2023 20:51 To: labnetwork at mtl.mit.edu Subject: [labnetwork] Surplus STS DRIE parts Hi everyone, Thanks for all the good input regarding the H.C.L 1 temperature controller. I did not realize so many labs continue to keep these going. We happen to have a spare control rack for a somewhat newer version of the tool than we are currently running and some of the components are probably wired a little differently. We might be willing to sell or trade some of these parts if you have a need though we will probably want to keep the VAT controller. Drop me a line if you're interested. See photo. Regards, Michael Senior Process Engineer Micro/Nano Technology Center University of Louisville (502) 552-1945 Web page: https://louisville.edu/micronano Instagram: https://www.instagram.com/micronanolouisville/ Facebook https://www.facebook.com/MNTCUOFL/ YouTube: https://www.youtube.com/channel/UCGiczmq6wVIBJlM7UEGVW9Q -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: IMG_6953.jpg Type: image/jpeg Size: 3190504 bytes Desc: IMG_6953.jpg URL: From blewis at eng.ufl.edu Fri Jan 27 15:48:35 2023 From: blewis at eng.ufl.edu (Lewis,William) Date: Fri, 27 Jan 2023 20:48:35 +0000 Subject: [labnetwork] STS Chamber Lid Temp Display In-Reply-To: References: Message-ID: Hi Michael, I would talk with someone at Omega. They are sure to have a newer better version of this controller that will be a direct plug and play replacement?.cheap. From: labnetwork On Behalf Of Khanna, Rohit Sent: Thursday, January 26, 2023 6:00 AM To: Martin, Michael ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] STS Chamber Lid Temp Display [External Email] Hi Michael, It might be a good idea to look for alternatives, I had replaced some PID temperature controllers on our STS tools with generic PID controllers from RS/Farnell. Kindly check the output and communication link before ordering one for example one can easily buy some a PID controller from RS: https://uk.rs-online.com/web/p/temperature-controllers/1879350 Warm Regards Rohit Khanna Electronic Test & Measurement Engineer London Centre for NANO Technology, UCL Ph:+44-020-76799984 Lab: +44 20 3108 1516 Int Ext: 39984 ________________________________ From: labnetwork > on behalf of Martin, Michael > Sent: 25 January 2023 19:32 To: labnetwork at mtl.mit.edu > Subject: [labnetwork] STS Chamber Lid Temp Display ? Caution: External sender This may be a stretch but, is there any chance someone out there has a surplused STS DRIE that you could pull this off of? We really need just the CN76133-485 Omega controller. Wiling to wheel and deal as necessary. I see some on ebay and secondary markets but sooo expensive. Regards, Michael Senior Process Engineer Micro/Nano Technology Center University of Louisville (502) 552-1945 Web page: https://louisville.edu/micronano Instagram: https://www.instagram.com/micronanolouisville/ Facebook https://www.facebook.com/MNTCUOFL/ YouTube: https://www.youtube.com/channel/UCGiczmq6wVIBJlM7UEGVW9Q -------------- next part -------------- An HTML attachment was scrubbed... URL: From christophe.clement at polymtl.ca Fri Jan 27 16:48:49 2023 From: christophe.clement at polymtl.ca (=?iso-8859-1?Q?Christophe_Cl=E9ment?=) Date: Fri, 27 Jan 2023 16:48:49 -0500 (EST) Subject: [labnetwork] PLC Upgrade on RIE Oxford Instrument Message-ID: <007101d93299$23876080$6a962180$@polymtl.ca> Hello Lab network. We have an old Oxford RIE 100 on which we would like to upgrade the PLC (X20 PLC Upgrade) and other components (turbo pump). The amount requires us to go to tender and my financial department asks me why I only consult Oxford Instrument for this kind of service. I already told them that the tool is manufactured by Oxford, and only Oxford can do the job, but it does not seem to be enough. Do you know of any other players who could offer this type of service, on Oxford Instrument equipment? Thank you! Best Christophe Christophe Cl?ment Technicien laboratoire Laboratoire de microfabrication (LMF) Groupe des Couches Minces (GCM) www.gcmlab.ca Ecole Polytechnique de Montr?al www.polymtl.ca D?partement de g?nie physique * 2900 Boulevard Edouard Monpetit Pavillon JAB Campus de l'Universit? de Montr?al Montr?al (Qu?bec) H3T 1J4 * christophe.clement at polymtl.ca * 514 340 4711 #2417 Fax : 514 340 5195 -------------- next part -------------- An HTML attachment was scrubbed... URL: From venables at seas.upenn.edu Mon Jan 30 13:06:13 2023 From: venables at seas.upenn.edu (Travis Venables) Date: Mon, 30 Jan 2023 13:06:13 -0500 Subject: [labnetwork] Suss MA06 Mask Aligner Message-ID: Hello, I am reaching out from UPENN's Quattrone Nanofabrication Facility. We have recently ordered some spare bulbs for our MA06 mask aligner that seem to have quite a long lead time. I was wondering if anyone had some spare units that we could borrow and replace upon the receipt of our newly ordered bulbs. Attached is a link to the specific bulb we are interested in. Thanks! https://rstvisions.com/products/osram-69200-hbo-1000w-d?_pos=1&_sid=c03e23b82&_ss=r -- Travis Venables Lead Cleanroom Equipment Engineer Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-1787 -------------- next part -------------- An HTML attachment was scrubbed... URL: From sandra.malhotra at tamu.edu Mon Jan 30 16:40:27 2023 From: sandra.malhotra at tamu.edu (Malhotra, Sandra Guy) Date: Mon, 30 Jan 2023 21:40:27 +0000 Subject: [labnetwork] Question about DC sputtering of zinc Message-ID: Howdy All from AggieFab, We have a user who requested permission to sputter zinc in our shared Lesker PVD75 DC sputtering tool. On the Lesker website, there is the following note: "This material has a relatively high vapor pressure at low temperatures which can cause ppm level contamination in the chamber and subsequent films. Careful consideration should be taken before this material is used in any deposition system. For this reason, some users prefer to use only dedicated vacuum chambers for deposition." I'd like to ask the group if they allow zinc depositions in their shared tools if they follow it by a thorough paste with another material, like Ti? Or if this material is prohibited because it is problematic. Thanks in advance for any inputs you may have. Best, Sandra G. Malhotra, Ph.D. | Technical Lab Manager AggieFab Nanofabrication Facility https://aggiefab.tamu.edu/ Department of Electrical & Computer Engineering, College of Engineering | Texas A&M University 3253 TAMU | College Station, TX 77843 ph: 979.845.3199 | sandra.malhotra at tamu.edu - - - - - - - - - - - - - - - - - - - - - - - - TEXAS A&M UNIVERSITY | FEARLESS on Every Front -------------- next part -------------- An HTML attachment was scrubbed... URL: From demis at ucsb.edu Tue Jan 31 18:05:52 2023 From: demis at ucsb.edu (Demis D. John) Date: Tue, 31 Jan 2023 15:05:52 -0800 Subject: [labnetwork] 3rd party ASML support Message-ID: Can anyone provide contact info for a 3rd party servicer for ASML tools that are end-of-life? (Asking for a colleague, not our own tool.) Thanks, -- Demis ---------------------------------------- * Process Group Manager* *UCSB Nanofabrication Facility* Demis' Contact Info ---------------------------------------- *Reminder*: The NanoFab has a publications policy -------------- next part -------------- An HTML attachment was scrubbed... URL: From mmoneck at andrew.cmu.edu Tue Jan 31 19:50:00 2023 From: mmoneck at andrew.cmu.edu (Matthew Moneck) Date: Tue, 31 Jan 2023 19:50:00 -0500 Subject: [labnetwork] 3rd party ASML support In-Reply-To: References: Message-ID: <28d58f552ae1a184f2095ddf56bf5635@mail.gmail.com> Hi Demis, EO Technical Solutions has been servicing our ASML 5500/80 for a number of years. They have been fantastic to work with. https://eotechnical.com/service-and-training/ Best Regards, Matt -- *Matthew T. Moneck, Ph.D* Executive Director, Claire & John Bertucci Nanotechnology Laboratory Electrical & Computer Engineering | Carnegie Mellon University 5000 Forbes Avenue, Pittsburgh, PA 15213-3890 Phone: 412-268-5430 ece.cmu.edu nanofab.ece.cmu.edu *From:* labnetwork *On Behalf Of *Demis D. John *Sent:* Tuesday, January 31, 2023 6:06 PM *To:* labnetwork *Subject:* [labnetwork] 3rd party ASML support Can anyone provide contact info for a 3rd party servicer for ASML tools that are end-of-life? (Asking for a colleague, not our own tool.) Thanks, -- Demis ---------------------------------------- * Process Group Manager* *UCSB Nanofabrication Facility* Demis' Contact Info ---------------------------------------- *Reminder*: The NanoFab has a publications policy -------------- next part -------------- An HTML attachment was scrubbed... URL: