[labnetwork] Heidelberg MLA150 SU-8 Exposure Dose

[Beaudoin, Mario]

We experience the same thing with our instrument.

Mario

On 2023-06-22 10:28 a.m., Hollingshead, Dave wrote:
> [*CAUTION:* Non-UBC Email]
>
> Dear Labnetwork,
>
> We have found that exposure of SU-8 on our MLA150 tool (using the 
> 375nm laser) seems to require very high doses. Even thin ~500nm thick 
> films (using SU-8 2000.5) have required doses on the order of 
> 1200mJ/cm^2 to fully expose. This is 15-20x the recommended dosage 
> from both the datasheet and what we estimate is the exposure dose used 
> on our filtered contact aligners. Thicker films follow the same trend, 
> but not necessarily in a linear fashion (5µm films require ~2000mJ/cm^2 ).
>
> I am sure the bump from 365nm to 375nm plays a role, but the magnitude 
> of the change seems excessive. FWIW, our other negative resists (eg. 
> nLOF2020) seem to expose properly at reasonable doses.
>
> Has anyone else experienced this? Does anyone have an explanation or 
> any processing suggestions for using SU-8 with an MLA?
>
> Thanks,
>
> -Dave
>
> *Dave Hollingshead*
> Manager, Research Operations
>
> *The Ohio State University*
> Nanotech West Labs
> Suite 100, 1381 Kinnear Rd, Columbus, OH 43212
> 614.292.1355 Office
> hollingshead.19 at osu.edu <mailto:hollingshead.19 at osu.edu> / 
> nanotech.osu.edu <http://nanotech.osu.edu>
>
> Pronouns: he/him/his
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork
-- 
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20230704/0d30a65e/attachment.html>
-------------- next part --------------
A non-text attachment was scrubbed...
Name: Mario Beaudoin SBQMI sig 2.jpg
Type: image/jpeg
Size: 21446 bytes
Desc: not available
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20230704/0d30a65e/attachment.jpg>