From julia.aebersold at louisville.edu Fri Jun 2 18:17:32 2023 From: julia.aebersold at louisville.edu (Aebersold, Julia) Date: Fri, 2 Jun 2023 22:17:32 +0000 Subject: [labnetwork] (2) MRL Industries Cyclone LPCVD Systems soon to be for sale on govdeals.com Message-ID: Hello everyone. We will soon be posting two MRL Cyclone LPCVD systems for sale on govdeals.com. I have a ton of pics, so reach out to me if you have an inquiry. The system is not functional and is in pieces. System 1 MRL Industries Cyclone 430 Tube Furnace System Vintage: 1999 Wafer Size: 150 mm Tube 1 (top): Boron Diffusion Tube 2: Dry/Wet Oxidation Tube 3: POCL3 Tube 4: Annealing Condition: Used, Not functional, in pieces Cyclone Furnace System, Part #6500817330 R00, Serial #: 065008010000911 Load Station, Model #481, Part #: 6540943162 Serial #: 065408012000911 System 2: MRL Industries Cyclone LH Tube Furnace System Vintage: 1995 (refurbished in 2002) Wafer Size: 100 - 150 mm Tube 1 (top): Wet Oxidation Tube 2: Nitride Tube 3: Polysilicon Tube 4: Low Temp Oxide Condition: Used, Not functional, in pieces Cyclone Furnace System, Part #650-814214, Serial #: 065000112970903 Load Station, Model #HLFS 48-1, Part #:654-939836, Serial #:71524 Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ -------------- next part -------------- An HTML attachment was scrubbed... URL: From srash027 at uottawa.ca Sat Jun 3 19:59:27 2023 From: srash027 at uottawa.ca (Sabaa Rashid) Date: Sat, 3 Jun 2023 23:59:27 +0000 Subject: [labnetwork] Sharpie for charged particle beams Message-ID: Hi everyone, I am wondering if you ever worked with a Sharpie marker that is conductive and has the right viscosity to deliver a reasonable thickness as a protective layer for generating cross-sections for example using a focussed ion beam. I have heard mixed reviews on ink pigments, some recommend using specific colours and others recommend avoiding some colours. Can you please share any experiences you had working with Sharpie markers/colours/tip thickness/other marker brands for this purpose? Thanks, Sabaa Rashid | Research Engineer Canadian Centre for Electron Microscopy (CCEM) - McMaster University -------------- next part -------------- An HTML attachment was scrubbed... URL: From yakimom at sunypoly.edu Wed Jun 7 08:24:56 2023 From: yakimom at sunypoly.edu (Michael Yakimov) Date: Wed, 7 Jun 2023 12:24:56 +0000 Subject: [labnetwork] Sharpie for charged particle beams In-Reply-To: References: Message-ID: Since nobody else chimes in, my 2 cents: I was told black sharpie industrial is the one to use. Works great for me - granted, my samples are not very insulating. Probably makes sense to say "black" as that is likely to be carbon-filled hence conductive. Looks like high-temperature feature of "industrial" means carbon. I also tried Sakura Micron archive pen - for sharper tip. It worked, although I don't have very favorable memories of that. IIRC film was too thick inhibiting navigation. Mike _______________________________________________ Michael Yakimov Research scientist College of Nanoscale Science and Engineering SUNY Polytechnic Institute 253 Fuller rd. Albany NY 12203 Phone: 518-437-8609 lab e-mail: yakimom at sunypoly.edu ________________________________ From: labnetwork on behalf of Sabaa Rashid Sent: Saturday, June 3, 2023 7:59 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Sharpie for charged particle beams Hi everyone, I am wondering if you ever worked with a Sharpie marker that is conductive and has the right viscosity to deliver a reasonable thickness as a protective layer for generating cross-sections for example using a focussed ion beam. I have heard mixed reviews on ink pigments, some recommend using specific colours and others recommend avoiding some colours. Can you please share any experiences you had working with Sharpie markers/colours/tip thickness/other marker brands for this purpose? Thanks, Sabaa Rashid | Research Engineer Canadian Centre for Electron Microscopy (CCEM) - McMaster University -------------- next part -------------- An HTML attachment was scrubbed... URL: From massey21 at llnl.gov Wed Jun 7 14:07:04 2023 From: massey21 at llnl.gov (Massey, Travis) Date: Wed, 7 Jun 2023 18:07:04 +0000 Subject: [labnetwork] Alternative wastewater treatment systems In-Reply-To: References: Message-ID: Hi all, please see below. Inquiring on behalf of Terri DeLima. Thanks, Travis From: DeLima, Terri L. Sent: Wednesday, June 7, 2023 10:22 AM To: Massey, Travis Subject: FW: Alternative wastewater treatment systems I'm interested in an alternative to our current wastewater retention system. Has anyone looked into wastewater treatment systems such as treat & recycle or zero discharge systems? * What type of alternative wastewater treatment system do you use? * How effective is the system at removing contaminants from wastewater? * How cost-effective is the system? * What challenges have you faced in implementing this alternative wastewater solution? Thank you for your time and consideration. I look forward to hearing from you soon. Sincerely, Terri DeLima Operations Manager Center for Micro/Nano Technology & Bioengineering Phone: 925-423-4526 Mobile: 925-315-0731 Email: delima1 at llnl.gov 7000 East Ave L-222 Livermore , CA 94550 Lawrence Livermore National Laboratory (LLNL) -------------- next part -------------- An HTML attachment was scrubbed... URL: From bob.geil at unc.edu Mon Jun 12 10:01:03 2023 From: bob.geil at unc.edu (Geil, Bob) Date: Mon, 12 Jun 2023 14:01:03 +0000 Subject: [labnetwork] XRD goniometer replacement Message-ID: All, We have a Rigaku Smartlab XRD system that is 6 years old. We recently discovered that the "worm gear" on the goniometer is severely worn, which requires a complete replacement of the goniometer. This system is not on service contract, which is part of our problem, but I wonder how unusual it is for such a major failure to occur after only 6 years of usage. Has anyone else experienced such a failure in their XRD? Thanks, Bob Bob Geil, PhD Technical Director ? CHANL Dept. of Chemistry ? UNC-CH https://chanl.unc.edu/ 223 Chapman Hall, CB 3216 Chapel Hill, NC 27599 -------------- next part -------------- An HTML attachment was scrubbed... URL: From rpakh at gc.cuny.edu Tue Jun 13 11:05:19 2023 From: rpakh at gc.cuny.edu (Regina Pakh) Date: Tue, 13 Jun 2023 15:05:19 +0000 Subject: [labnetwork] Job Opening - Cleanroom Scientist/Engineer - Nanofabrication Facility - CUNY Advanced Science Research Center Message-ID: Good morning, The City University of New York - Advanced Science Research Center has a job opening for a Cleanroom Scientist/Engineer. Can you please share the attached job description with the list serv? Thank you, Regina Pakh HR Manager Graduate Center (CUNY) -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Cleanroom Scientist - Engineer (Research Associate) - Nanofabrication Facility ASRC - Job ID 26887.docx Type: application/vnd.openxmlformats-officedocument.wordprocessingml.document Size: 22933 bytes Desc: Cleanroom Scientist - Engineer (Research Associate) - Nanofabrication Facility ASRC - Job ID 26887.docx URL: From James.Grant at glasgow.ac.uk Wed Jun 14 14:55:04 2023 From: James.Grant at glasgow.ac.uk (James Grant) Date: Wed, 14 Jun 2023 18:55:04 +0000 Subject: [labnetwork] Control Board OIPT Plasmalab System 100 Message-ID: Hello, The AMU on our OIPT Plasmalab System has been playing up. OIPT reckon the solution is either to replace the AMU control card or the whole board but are quoting a lead time of 365 days (!). [cid:image001.png at 01D99D1D.06C4BF30] Does anyone have a spare? AMU card part number = PC00S26875 Board part number = MA00Z26876 Cheers, James Dr. James Paul Grant Research Engineer in Plasma Processing Plasma Processing Group james.grant at glasgow.ac.uk [cid:image002.png at 01D99D1D.06C4BF30] www.JWNC.gla.ac.uk [cid:image003.png at 01D99D1D.06C4BF30] LinkedIn.com/company/JWNC [cid:image004.png at 01D99D1D.06C4BF30] @UofG_JWNC -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 2023700 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 26666 bytes Desc: image002.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.png Type: image/png Size: 1538 bytes Desc: image003.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image004.png Type: image/png Size: 1717 bytes Desc: image004.png URL: From cveith at seas.upenn.edu Wed Jun 14 16:13:13 2023 From: cveith at seas.upenn.edu (Charles Veith) Date: Wed, 14 Jun 2023 16:13:13 -0400 Subject: [labnetwork] Control Board OIPT Plasmalab System 100 In-Reply-To: References: Message-ID: Hi James What is the cost they are quoting you for the board? If the price is significant, maybe think about buying a system at auction and cannibalizing it. Today I received an email about a large auction occurring soon and you might get lucky this way. Regards, Charlie On Wed, Jun 14, 2023 at 3:43?PM James Grant wrote: > Hello, > > > > The AMU on our OIPT Plasmalab System has been playing up. OIPT reckon the > solution is either to replace the AMU control card or the whole board but > are quoting a lead time of 365 days (!). > > > > > > Does anyone have a spare? > > AMU card part number = PC00S26875 > > Board part number = MA00Z26876 > > > > Cheers, > > > > James > > > > Dr. James Paul Grant > > Research Engineer in Plasma Processing > > > > *Plasma Processing Group* > > james.grant at glasgow.ac.uk > > > > > > www.JWNC.gla.ac.uk > > LinkedIn.com/company/JWNC > @UofG_JWNC > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!IBzWLUs!X6X4B8YXoiHuYJgQ-ObItB8DFbxRojsGyNbVYiX-9ZFMVcSb_f-ZesR76GIz3yUijjYI3uIvuHKnaXoatZ4_nz7XgWTIYg$ > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... 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Name: image004.png Type: image/png Size: 1717 bytes Desc: not available URL: From r.khanna at ucl.ac.uk Thu Jun 15 06:23:15 2023 From: r.khanna at ucl.ac.uk (Khanna, Rohit) Date: Thu, 15 Jun 2023 10:23:15 +0000 Subject: [labnetwork] Control Board OIPT Plasmalab System 100 In-Reply-To: References: Message-ID: HI James, Given the long lead time, why don't you try simply checking the voltage outputs from the linear regulator if that seems fine, try changing the socketed semiconductors chips without getting into the effort of testing each one (it saves time). Also replace any electrolytic capacitors if this unit is over 5-7 year old. Also look for any obvious sign of component damage or burn out/degradation. Warm Regards Rohit Khanna Electronic Test & Measurement Engineer London Centre for NANO Technology, UCL Ph:+44-020-76799984 Lab: +44 20 3108 1516 Int Ext: 39984 ________________________________ From: labnetwork on behalf of Charles Veith Sent: 14 June 2023 21:13 To: James Grant Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Control Board OIPT Plasmalab System 100 ? Caution: External sender Hi James What is the cost they are quoting you for the board? If the price is significant, maybe think about buying a system at auction and cannibalizing it. Today I received an email about a large auction occurring soon and you might get lucky this way. Regards, Charlie On Wed, Jun 14, 2023 at 3:43?PM James Grant > wrote: Hello, The AMU on our OIPT Plasmalab System has been playing up. OIPT reckon the solution is either to replace the AMU control card or the whole board but are quoting a lead time of 365 days (!). [cid:188bb87de024cff311] Does anyone have a spare? AMU card part number = PC00S26875 Board part number = MA00Z26876 Cheers, James Dr. James Paul Grant Research Engineer in Plasma Processing Plasma Processing Group james.grant at glasgow.ac.uk [cid:188bb87de025b16b22] www.JWNC.gla.ac.uk [cid:188bb87de02692e333] LinkedIn.com/company/JWNC [cid:188bb87de027745b44] @UofG_JWNC _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!IBzWLUs!X6X4B8YXoiHuYJgQ-ObItB8DFbxRojsGyNbVYiX-9ZFMVcSb_f-ZesR76GIz3yUijjYI3uIvuHKnaXoatZ4_nz7XgWTIYg$ -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 2023700 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 26666 bytes Desc: image002.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.png Type: image/png Size: 1538 bytes Desc: image003.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image004.png Type: image/png Size: 1717 bytes Desc: image004.png URL: From jtmitch5 at ncsu.edu Thu Jun 15 06:42:57 2023 From: jtmitch5 at ncsu.edu (Jim Mitchell) Date: Thu, 15 Jun 2023 06:42:57 -0400 Subject: [labnetwork] Control Board OIPT Plasmalab System 100 In-Reply-To: References: Message-ID: https://www.ebay.co.uk/itm/-Used-OXFORD-PLASMA-MA00A30535-MA00Z26876-RF-MATCH-AMU-CARD-547192/125166630318?pageci=9dccbfab-1b7a-43bc-b25e-f25495f0de28&redirect=mobile On Wed, Jun 14, 2023, 9:44 PM Charles Veith wrote: > Hi James > What is the cost they are quoting you for the board? If the price is > significant, maybe think about buying a system at auction > and cannibalizing it. Today I received an email about a large auction > occurring soon and you might get lucky this way. > > Regards, > > Charlie > > > On Wed, Jun 14, 2023 at 3:43?PM James Grant > wrote: > >> Hello, >> >> >> >> The AMU on our OIPT Plasmalab System has been playing up. OIPT reckon the >> solution is either to replace the AMU control card or the whole board but >> are quoting a lead time of 365 days (!). >> >> >> >> >> >> Does anyone have a spare? >> >> AMU card part number = PC00S26875 >> >> Board part number = MA00Z26876 >> >> >> >> Cheers, >> >> >> >> James >> >> >> >> Dr. James Paul Grant >> >> Research Engineer in Plasma Processing >> >> >> >> *Plasma Processing Group* >> >> james.grant at glasgow.ac.uk >> >> >> >> >> >> www.JWNC.gla.ac.uk >> >> LinkedIn.com/company/JWNC >> @UofG_JWNC >> >> >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> >> https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!IBzWLUs!X6X4B8YXoiHuYJgQ-ObItB8DFbxRojsGyNbVYiX-9ZFMVcSb_f-ZesR76GIz3yUijjYI3uIvuHKnaXoatZ4_nz7XgWTIYg$ >> > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 2023700 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 26666 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.png Type: image/png Size: 1538 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image004.png Type: image/png Size: 1717 bytes Desc: not available URL: From travisgabel at boisestate.edu Thu Jun 15 10:54:30 2023 From: travisgabel at boisestate.edu (Travis Gabel) Date: Thu, 15 Jun 2023 08:54:30 -0600 Subject: [labnetwork] Parker Aries drive experts Message-ID: Hi Lab Network, We had a parker aries drive go bad on us. We have source a refurb unit but we need to build the motor configuration for it. I have the motor data but in the Aries support tool there are a lot of settings that I need to set that are not included on the motor technical information. I have reached out to Parker multiple times and keep getting the standard response that they don;t support obsolete parts. I am looking for someone that might have some experience building motor configuration with the aries support tool that can give me some guidance. Any contact information would be greatly appreciated? Thanks Travis -------------- next part -------------- An HTML attachment was scrubbed... URL: From scholvin at mit.edu Thu Jun 15 13:20:54 2023 From: scholvin at mit.edu (Jorg Scholvin) Date: Thu, 15 Jun 2023 17:20:54 +0000 Subject: [labnetwork] Save the date - UGIM 2024 at MIT.nano: June 23-26 2024 Message-ID: Dear Labnetwork: We are excited to host the 2024 UGIM Symposium at MIT.nano next year: Sunday June 23, through noon Wednesday, June 26, 2024. We have posted a tentative schedule at http://ugim.mit.edu along with relevant timepoints & deadlines (things always happen the 15th of a month). You can also sign up for conference-related reminders. Looking forward to seeing everyone in Boston next summer! Jorg & Anna -------------- next part -------------- An HTML attachment was scrubbed... URL: From hathaway at cns.fas.harvard.edu Thu Jun 15 14:20:10 2023 From: hathaway at cns.fas.harvard.edu (Hathaway, Malcolm R) Date: Thu, 15 Jun 2023 18:20:10 +0000 Subject: [labnetwork] TMAH alternatives Message-ID: Hello Labnetworkers, Has anyone tried one of the TMAH substitutes that have become available? How do they work? Are your users satisfied with their results? For background, TMAH (tetramethylammonium hydroxide) is widely used in commercial resist developers (3%) and for HSQ developing (25%). In its 25% concentration, TMAH is a potent contact neurotoxin, which is fatal roughly 75% of the time, for exposures greater than 7.5% of body area. Nasty stuff. Several companies now have safer alternatives available, which we'd like to try out, such as: Envure 3330 (Sachem Chemical), E-Grade THEMAH SLM ((hydroxyethyl) methylammonium hydroxide, from Huntsman Chemical), and Novo-safe SE-33 (ethyl tri-methy ammonium hydroxide from Transene). We are particularly interested in using one of these as an HSQ developer, so we can do away with 25% TMAH. Any experiences, good or bad, will be most welcome. Thanks, Mac Hathaway Senior Process and Systems Engineer Harvard Center for Nanoscale Systems -------------- next part -------------- An HTML attachment was scrubbed... URL: From joseph.losby at ucalgary.ca Thu Jun 15 15:29:58 2023 From: joseph.losby at ucalgary.ca (Joseph Losby) Date: Thu, 15 Jun 2023 19:29:58 +0000 Subject: [labnetwork] Cleanroom consultant Message-ID: Hi everyone, I am wondering if you have ever sought the services of a cleanroom consultant when building a new facility? We are contemplating going this route. If so, do you have any recommendations? Any other words of advice is appreciated. Cheers, Joe Joseph Losby, PhD Manager, qLab Operations [cid:84c34756-8bb4-4f4f-aa62-5ac93ed2db40] Quantum City?s qConnect 2023: Connecting quantum creators and users | Join us November 15-17, 2023 in Calgary, Alberta at Telus Convention Centre. Click here for more information. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Outlook-vvlwsoqo.jpg Type: image/jpeg Size: 13901 bytes Desc: Outlook-vvlwsoqo.jpg URL: From julia.aebersold at louisville.edu Thu Jun 15 17:20:02 2023 From: julia.aebersold at louisville.edu (Aebersold, Julia) Date: Thu, 15 Jun 2023 21:20:02 +0000 Subject: [labnetwork] Cleanroom consultant In-Reply-To: References: Message-ID: We used Abbie Gregg for our facility, which is now AM Technical Solutions. https://amts.com/ Cheers! Julia Aebersold, Ph.D. Manager, Micro/Nano Technology Center University of Louisville Shumaker Research Building, Room 233 2210 South Brook Street Louisville, KY 40292 (502) 852-1572 http://louisville.edu/micronano/ From: labnetwork On Behalf Of Joseph Losby Sent: Thursday, June 15, 2023 3:30 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Cleanroom consultant CAUTION: This email originated from outside of our organization. Do not click links, open attachments, or respond unless you recognize the sender's email address and know the contents are safe. Hi everyone, I am wondering if you have ever sought the services of a cleanroom consultant when building a new facility? We are contemplating going this route. If so, do you have any recommendations? Any other words of advice is appreciated. Cheers, Joe Joseph Losby, PhD Manager, qLab Operations [cid:image001.jpg at 01D99FAD.9D98DDA0] Quantum City's qConnect 2023: Connecting quantum creators and users | Join us November 15-17, 2023 in Calgary, Alberta at Telus Convention Centre. Click here for more information. -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 13901 bytes Desc: image001.jpg URL: From michael.rooks at yale.edu Thu Jun 15 18:23:53 2023 From: michael.rooks at yale.edu (Michael Rooks) Date: Thu, 15 Jun 2023 18:23:53 -0400 Subject: [labnetwork] TMAH alternatives In-Reply-To: References: Message-ID: An alternative for HSQ development is described in Yang and Berggren, J. Vac. Sci. Technol. B 25(6), Nov/Dec 2007 2025 1 liter water + 40 g NaCl + 10 g NaOH -------------------------------- Michael Rooks nano.yale.edu On Thu, Jun 15, 2023 at 5:21?PM Hathaway, Malcolm R < hathaway at cns.fas.harvard.edu> wrote: > Hello Labnetworkers, > > Has anyone tried one of the TMAH substitutes that have become available? > > How do they work? Are your users satisfied with their results? > > For background, TMAH (tetramethylammonium hydroxide) is widely used in > commercial resist developers (3%) and for HSQ developing (25%). In its 25% > concentration, TMAH is a potent contact neurotoxin, which is fatal roughly > 75% of the time, for exposures greater than 7.5% of body area. Nasty stuff. > > Several companies now have safer alternatives available, which we'd like > to try out, such as: > > Envure 3330 (Sachem Chemical), > > E-Grade THEMAH SLM ((hydroxyethyl) methylammonium hydroxide, from Huntsman > Chemical), and > > Novo-safe SE-33 (ethyl tri-methy ammonium hydroxide from Transene). > > We are particularly interested in using one of these as an HSQ developer, > so we can do away with 25% TMAH. > > Any experiences, good or bad, will be most welcome. > > Thanks, > > > Mac Hathaway > Senior Process and Systems Engineer > Harvard Center for Nanoscale Systems > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From yakimom at sunypoly.edu Thu Jun 15 18:30:32 2023 From: yakimom at sunypoly.edu (Michael Yakimov) Date: Thu, 15 Jun 2023 22:30:32 +0000 Subject: [labnetwork] TMAH alternatives In-Reply-To: References: Message-ID: Is there any real safety information on these substitutes, or it's just that they are not as common as TMAH hence not regulated? I cannot find as much as a proper SDS on any of these. Remember, TMAH was considered pretty benign until 2005-2010ish when 3 fatal accidents were brought up (hence quoted 75% mortality - 3 out of 4 for major exposure. Along with 20 minor chemical burns in the same dataset). Even then TMAH is a low priority for toxicological research with mostly anecdotal evidence... Mike _______________________________________________ Michael Yakimov Research scientist College of Nanoscale Science and Engineering SUNY Polytechnic Institute 253 Fuller rd. Albany NY 12203 Phone: 518-437-8609 lab e-mail: yakimom at sunypoly.edu ________________________________ From: labnetwork on behalf of Hathaway, Malcolm R Sent: Thursday, June 15, 2023 2:20 PM To: Labnetwork Mailing List Subject: [labnetwork] TMAH alternatives Hello Labnetworkers, Has anyone tried one of the TMAH substitutes that have become available? How do they work? Are your users satisfied with their results? For background, TMAH (tetramethylammonium hydroxide) is widely used in commercial resist developers (3%) and for HSQ developing (25%). In its 25% concentration, TMAH is a potent contact neurotoxin, which is fatal roughly 75% of the time, for exposures greater than 7.5% of body area. Nasty stuff. Several companies now have safer alternatives available, which we'd like to try out, such as: Envure 3330 (Sachem Chemical), E-Grade THEMAH SLM ((hydroxyethyl) methylammonium hydroxide, from Huntsman Chemical), and Novo-safe SE-33 (ethyl tri-methy ammonium hydroxide from Transene). We are particularly interested in using one of these as an HSQ developer, so we can do away with 25% TMAH. Any experiences, good or bad, will be most welcome. Thanks, Mac Hathaway Senior Process and Systems Engineer Harvard Center for Nanoscale Systems -------------- next part -------------- An HTML attachment was scrubbed... URL: From logshappill at gmail.com Thu Jun 15 20:08:40 2023 From: logshappill at gmail.com (Leslie George) Date: Thu, 15 Jun 2023 17:08:40 -0700 Subject: [labnetwork] Cleanroom consultant In-Reply-To: References: Message-ID: <9A07F38D-FD95-41C7-923D-FF92D6411E6F@gmail.com> An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image.png Type: image/png Size: 343750 bytes Desc: not available URL: From schweig at umich.edu Fri Jun 16 06:31:10 2023 From: schweig at umich.edu (Dennis Schweiger) Date: Fri, 16 Jun 2023 06:31:10 -0400 Subject: [labnetwork] Cleanroom consultant In-Reply-To: References: Message-ID: Joe, Good morning. We too used AGI (formerly Abbie Gregg), now with AM Technical Solutions, with great success. I would suggest you rally your group together and come up with a rough idea of what you'd like your fab to accomplish in the way of processing, then talk (lot's of talk) with peer institutions to see what worked for them, and what issues they had. We had almost 20 years of cleanroom operation under our belt before we did our expansion, and at the time of our expansion design we toured several larger production fabs to get an idea for what we could do with our facility. I will say that what we had originally laid out for as a tool set in our new fab, is not what we finally ended up with, however it was good enough to allow us to design the support infrastructure for our facility. As always, you're more than welcome to come out and take a look at our facility. I'd be happy to show you what we put together. Dennis Schweiger Facilities Manager Lurie nanofabrication Facility University of Michigan 734.647.2055 Ofc "People can be divided into 3 groups - those that make things happen, those that watch things happen, and those that wonder what happened." Within which group do you belong? On Thu, Jun 15, 2023 at 5:15?PM Joseph Losby wrote: > Hi everyone, > > I am wondering if you have ever sought the services of a cleanroom > consultant when building a new facility? We are contemplating going this > route. If so, do you have any recommendations? Any other words of advice > is appreciated. > > Cheers, > Joe > > *Joseph Losby, PhD* > Manager, qLab Operations > > > > > Quantum City?s qConnect 2023: Connecting quantum creators and users | Join > us November 15-17, 2023 in Calgary, Alberta at Telus Convention Centre. Click > here for more information. > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Outlook-vvlwsoqo.jpg Type: image/jpeg Size: 13901 bytes Desc: not available URL: From paul.sunal at gmail.com Fri Jun 16 09:33:29 2023 From: paul.sunal at gmail.com (Paul S) Date: Fri, 16 Jun 2023 09:33:29 -0400 Subject: [labnetwork] Open Positions - 1) Lithography Technician & 2) Process Technician Message-ID: Hello! The US Army Research Laboratory is currently seeking qualified candidates (limited to US citizens) for a staff position of Lithography Technician and research position of Process Technician. If interested or know someone interested, please use/forward the links below. Lithography Technician - This position supports internal and external user research, process development, and device fabrication in the Specialty Electronic Materials and Sensors Cleanroom (SEMASC) at the U.S. Army Research Laboratory. https://www.indeed.com/job/photolithography-technician-9586805d41a38a17 Process Technician - Seeking a Microelectronics and Semiconductor Fabrication Technician to support our work with the U.S. Army Research Laboratory in Adelphi, MD. The Fabrication Technician will work on-site in an integrated, results-oriented research and development Microelectromechanical Systems (MEMS) team environment within the state-of-the-art Specialty Electronics Materials and Sensors Cleanroom (SEMASC) Research Facility. https://jobs.hii-tsd.com/job/Microelectronics-and-Semiconductor-Fabrication-Technician-%28Technician-3%29-15178/1041097700/ Paul Sunal Ph.D. Chief, Mechanical Sensing Branch | Photonics, Electronics, and Quantum Sciences (PEQS) Division Army Research Directorate (FCDD-RLA-PA), DEVCOM Army Research Laboratory 2800 Powder Mill Road, Adelphi, MD, 20783-1473 Phone: 301-394-1374 : Mobile: 240-676-6209 : Fax: 301-394-1074 E-mail: paul.d.sunal.civ at army.mil -------------- next part -------------- An HTML attachment was scrubbed... URL: From jks7 at buffalo.edu Fri Jun 16 10:43:51 2023 From: jks7 at buffalo.edu (Jeffrey Salzmann) Date: Fri, 16 Jun 2023 14:43:51 +0000 Subject: [labnetwork] Cleanroom consultant In-Reply-To: References: Message-ID: Joe, I?ll second Dennis? comment about what the room needs to do before you start working on the design. I?ve seen the ?what to we want? question go unanswered well into the funding process, twice, in my career. Both were state schools and government cash was available. Generally speaking, I would not use a building contractor to provide room design services. It?s easy to get lost in the weeds on the technical aspects and my local contactors bluster their way through the quoting. If you can hire a designer that can specifically do cleanrooms, (and provide references!!) you?re in much better shape. I suggest cleanroomservices.com as a potential vendor, Ralph Kraft does excellent work. Never let a builder certify their own work. Don?t release the final payment on the room until a third-party has certified the performance. If they balk on that as part of the contact, get another vendor. Another warning- Be careful about corners getting cut by higher-ups without understanding the consequences. Build # 1: I once had a facility director block my roomside replaceable HEPAs, used a cheaper option?while that?s not an entirely bad idea, but the room was certed to ISO-13485 annually and since the particle challenge was part of the certification, the entire ceiling needed to be opened up to get access to challenge the filters?every year?so after the certification testing, the room needed a deep clean and validation. This took the room down over two weeks, since it also needed biological testing. I would hope the filter designs now allow for such things (this was over a decade ago) but keep this sort of thing in mind. The needs and use of the room dictate the build. Build #2: Makeup air was designed to be taken off the rooftop and conditioned, but this proved problematic to hit required RH levels in summertime. As a stopgap, the facility manager decided to draw makeup air from the building interstitial (a building over 30 years old). This did horrific things to the prefilters since the entire interstitial was loaded with 3 decades of dust, and occasionally the unclipped ceiling tiles (another facility manger decision) would make the cleanroom ceiling tiles raise and drop continually. Same sort of logic applies to the DI water systems. Email me directly if you need to discuss that. Regards, Jeff Jeff Salzmann Assistant Professor of Research Cleanroom Manager, Shared Instrumentation Laboratories School of Engineering and Applied Sciences University at Buffalo 114A Davis Hall Buffalo, NY 14260 Tel: 716.645.2584 Email: jks7 at buffalo.edu Shared Facilities: http://buffalo.edu/shared-facilities-equip From: labnetwork On Behalf Of Dennis Schweiger Sent: Friday, June 16, 2023 6:31 AM To: Joseph Losby Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Cleanroom consultant Joe, Good morning. We too used AGI (formerly Abbie Gregg), now with AM Technical Solutions, with great success. I would suggest you rally your group together and come up with a rough idea of what you'd like your fab to accomplish in the way of processing, then talk (lot's of talk) with peer institutions to see what worked for them, and what issues they had. We had almost 20 years of cleanroom operation under our belt before we did our expansion, and at the time of our expansion design we toured several larger production fabs to get an idea for what we could do with our facility. I will say that what we had originally laid out for as a tool set in our new fab, is not what we finally ended up with, however it was good enough to allow us to design the support infrastructure for our facility. As always, you're more than welcome to come out and take a look at our facility. I'd be happy to show you what we put together. Dennis Schweiger Facilities Manager Lurie nanofabrication Facility University of Michigan 734.647.2055 Ofc "People can be divided into 3 groups - those that make things happen, those that watch things happen, and those that wonder what happened." Within which group do you belong? On Thu, Jun 15, 2023 at 5:15?PM Joseph Losby > wrote: Hi everyone, I am wondering if you have ever sought the services of a cleanroom consultant when building a new facility? We are contemplating going this route. If so, do you have any recommendations? Any other words of advice is appreciated. Cheers, Joe Joseph Losby, PhD Manager, qLab Operations [cid:image001.jpg at 01D9A03C.CE1820F0] Quantum City?s qConnect 2023: Connecting quantum creators and users | Join us November 15-17, 2023 in Calgary, Alberta at Telus Convention Centre. Click here for more information. _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 13901 bytes Desc: image001.jpg URL: From Etienne.Grondin at USherbrooke.ca Fri Jun 16 16:58:40 2023 From: Etienne.Grondin at USherbrooke.ca (=?iso-8859-1?Q?=C9tienne_Grondin?=) Date: Fri, 16 Jun 2023 20:58:40 +0000 Subject: [labnetwork] open position - lab manager Message-ID: Dear All, I'm leaving my position as lab manager of 3iT's nanofabrication infrastructure in Sherbrooke, Canada. We will therefore be looking for someone to take my place in this very exciting and highly challenge-filled position. If you are interested, or if you know of a great candidate, the link to apply is as follows: https://www.usherbrooke.ca/emplois/offre/no/06383 With best regards, ?tienne Grondin Administrative Director e.grondin at usherbrooke.ca (819) 821-8000 x61941 https://www.usherbrooke.ca/3it/ [cid:image001.png at 01D9A072.D7B1CD10] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 96435 bytes Desc: image001.png URL: From gibsong at queensu.ca Sat Jun 17 14:42:53 2023 From: gibsong at queensu.ca (Graham Gibson) Date: Sat, 17 Jun 2023 18:42:53 +0000 Subject: [labnetwork] TMAH alternatives In-Reply-To: References: Message-ID: Hi Mac, I have tried Huntsman's E-Grade THEMAH as well as another of their products, E-Grade CHOLINE OH, as a developer for standard Novolac photoresists, though not for HSQ (yet). I was pretty happy with their performance in general, though THEMAH was a bit slow compared to standard TMAH developer. Cheers, Graham Gibson Operations Manager, NanoFabrication Kingston Queen's University 945 Princess Street Kingston, Ontario, Canada K7L 0E9 gibsong at queensu.ca www.nanofabkingston.ca From: labnetwork On Behalf Of Hathaway, Malcolm R Sent: Thursday, June 15, 2023 2:20 PM To: Labnetwork Mailing List Subject: [labnetwork] TMAH alternatives Hello Labnetworkers, Has anyone tried one of the TMAH substitutes that have become available? How do they work? Are your users satisfied with their results? For background, TMAH (tetramethylammonium hydroxide) is widely used in commercial resist developers (3%) and for HSQ developing (25%). In its 25% concentration, TMAH is a potent contact neurotoxin, which is fatal roughly 75% of the time, for exposures greater than 7.5% of body area. Nasty stuff. Several companies now have safer alternatives available, which we'd like to try out, such as: Envure 3330 (Sachem Chemical), E-Grade THEMAH SLM ((hydroxyethyl) methylammonium hydroxide, from Huntsman Chemical), and Novo-safe SE-33 (ethyl tri-methy ammonium hydroxide from Transene). We are particularly interested in using one of these as an HSQ developer, so we can do away with 25% TMAH. Any experiences, good or bad, will be most welcome. Thanks, Mac Hathaway Senior Process and Systems Engineer Harvard Center for Nanoscale Systems -------------- next part -------------- An HTML attachment was scrubbed... URL: From James.Grant at glasgow.ac.uk Tue Jun 20 06:58:55 2023 From: James.Grant at glasgow.ac.uk (James Grant) Date: Tue, 20 Jun 2023 10:58:55 +0000 Subject: [labnetwork] Control Board OIPT Plasmalab System 100 In-Reply-To: References: Message-ID: Many thanks to everyone who responded. Was quite overwhelmed. Apologies for not replying individually to some. Interim conclusion is that the AMU and board have been sent to out local RF specialists (RF Global) for inspection. Think I am right in saying the belief is this will be cheaper/faster than buying AMU & board from ebay or third party vendor (e.g. Moov). Also fair to say that the University is never keen on purchasing from ebay or third party vendors! Thanks again, Cheers, James Dr. James Paul Grant Research Engineer in Plasma Processing Plasma Processing Group james.grant at glasgow.ac.uk [cid:image002.png at 01D9A36C.4C4B0280] www.JWNC.gla.ac.uk [cid:image003.png at 01D9A36C.4C4B0280] LinkedIn.com/company/JWNC [cid:image004.png at 01D9A36C.4C4B0280] @UofG_JWNC From: James Grant Sent: Wednesday, June 14, 2023 7:55 PM To: labnetwork at mtl.mit.edu Subject: Control Board OIPT Plasmalab System 100 Hello, The AMU on our OIPT Plasmalab System has been playing up. OIPT reckon the solution is either to replace the AMU control card or the whole board but are quoting a lead time of 365 days (!). [cid:image005.png at 01D9A36C.4C4B0280] Does anyone have a spare? AMU card part number = PC00S26875 Board part number = MA00Z26876 Cheers, James Dr. James Paul Grant Research Engineer in Plasma Processing Plasma Processing Group james.grant at glasgow.ac.uk [cid:image002.png at 01D9A36C.4C4B0280] www.JWNC.gla.ac.uk [cid:image003.png at 01D9A36C.4C4B0280] LinkedIn.com/company/JWNC [cid:image004.png at 01D9A36C.4C4B0280] @UofG_JWNC -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 26666 bytes Desc: image002.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.png Type: image/png Size: 1538 bytes Desc: image003.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image004.png Type: image/png Size: 1717 bytes Desc: image004.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image005.png Type: image/png Size: 2023700 bytes Desc: image005.png URL: From price.798 at osu.edu Tue Jun 20 21:50:30 2023 From: price.798 at osu.edu (Price, Aimee) Date: Wed, 21 Jun 2023 01:50:30 +0000 Subject: [labnetwork] Alternative distributor for SPR 955? Message-ID: Dear Labnetwork, Does anyone purchase SPR 955 (or any other Shipley/Dupont products) from a distributor other than Kayaku? We have had numerous issues with different materials. In this case, we need to either find a different distributor or begin qualifying another resist, probably both. The current issue is that we purchased a gallon of SPR955 which was "in stock." It arrived last week with an expiration date of 7/8/23. Kayaku's response was that they were required to ship what they had on hand first and would ask for an extension to the expiration date from the manufacturer. I am still hoping for a better response and solution than that but need to find an alternative in the meantime. If anyone works with a different distributor for Shipley resists, I'd love to hear your experience. I'll share the final solution from Kayaku and summarize any responses for alternatives. Thank you, Aimee Bross Price Manager, Nanofabrication The Ohio State University Nanotech West Lab Institute for Materials Research 1381 Kinnear Road Suite 100 Columbus, OH 43212 614-292-2753 Price.798 at osu.edu Nanotech.osu.edu Pronouns: she/her/hers Commercial Chair, 66th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication (EIPBN) May 30-June 2, 2023, San Francisco, CA Conference Chair, 67th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication (EIPBN) | https://eipbn.org | -------------- next part -------------- An HTML attachment was scrubbed... URL: From na2661 at columbia.edu Wed Jun 21 08:56:14 2023 From: na2661 at columbia.edu (Nava Ariel-Sternberg) Date: Wed, 21 Jun 2023 08:56:14 -0400 Subject: [labnetwork] Solaris RTA support Message-ID: <030d01d9a43f$c2f0b4b0$48d21e10$@columbia.edu> Hi all, Does anyone have a recommendation on a vendor who supports Solaris RTA? Thanks, Nava Dr. Nava Ariel-Sternberg Senior Director of CNI Labs Columbia University CEPSR/MC 8903 530 west 120th st. NY NY 10027 Office: 212-8549927 Cell: 201-5627600 -------------- next part -------------- An HTML attachment was scrubbed... URL: From Howard.Northfield at uottawa.ca Wed Jun 21 14:12:06 2023 From: Howard.Northfield at uottawa.ca (Howard Northfield) Date: Wed, 21 Jun 2023 18:12:06 +0000 Subject: [labnetwork] Alternative distributor for SPR 955? In-Reply-To: References: Message-ID: I am pretty much now used to getting materials only months from expiry from all sources. Howard Northfield Research Associate Advanced Research Complex (ARC) University of Ottawa ________________________________ From: labnetwork on behalf of Price, Aimee Sent: Tuesday, June 20, 2023 9:50 PM To: labnetwork at mtl.mit.edu Cc: Ramsey, Keith Subject: [labnetwork] Alternative distributor for SPR 955? Attention : courriel externe | external email Dear Labnetwork, Does anyone purchase SPR 955 (or any other Shipley/Dupont products) from a distributor other than Kayaku? We have had numerous issues with different materials. In this case, we need to either find a different distributor or begin qualifying another resist, probably both. The current issue is that we purchased a gallon of SPR955 which was ?in stock.? It arrived last week with an expiration date of 7/8/23. Kayaku?s response was that they were required to ship what they had on hand first and would ask for an extension to the expiration date from the manufacturer. I am still hoping for a better response and solution than that but need to find an alternative in the meantime. If anyone works with a different distributor for Shipley resists, I?d love to hear your experience. I?ll share the final solution from Kayaku and summarize any responses for alternatives. Thank you, Aimee Bross Price Manager, Nanofabrication The Ohio State University Nanotech West Lab Institute for Materials Research 1381 Kinnear Road Suite 100 Columbus, OH 43212 614-292-2753 Price.798 at osu.edu Nanotech.osu.edu Pronouns: she/her/hers Commercial Chair, 66th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication (EIPBN) May 30-June 2, 2023, San Francisco, CA Conference Chair, 67th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication (EIPBN) | https://eipbn.org | -------------- next part -------------- An HTML attachment was scrubbed... URL: From nnelsonfitzpatrick at uwaterloo.ca Wed Jun 21 16:14:50 2023 From: nnelsonfitzpatrick at uwaterloo.ca (Nathan Nelson - Fitzpatrick) Date: Wed, 21 Jun 2023 20:14:50 +0000 Subject: [labnetwork] Job Opportunity - Senior Facility Microscopist - University of Waterloo Message-ID: Hello labnetwork, My group is looking to recruit a microscopist to help us manage and operate a new TEM. A description of our lab and the position are below, it would be great if you could circulate this appropriately to help us recruit a great microscopist! Best, -Nathan The Quantum-Nano Core Fabrication and Characterization Facility (QNFCF) at the University of Waterloo is seeking to recruit a Senior Facility Microscopist. The successful candidate will be responsible for operation and training on our newly installed JEM-F200 S/TEM system equipped with EDS and EELS spectrometers. They will also play a key role in the operations of complimentary equipment for sample preparation including a ZEISS Auriga FIB-SEM system. The Quantum-Nano Core Fabrication and Characterization Facility (QNFCF) is series of core facility research labs serving the University of Waterloo community as well as external academic and industrial clients. QNFCF labs are professionally staffed and boast over 100 pieces of installed equipment serving approximately 250 individual users per year under 80 groups. The centrepiece of the QNFCF operation is our 8000 sq.ft cleanroom boasting ISO 4/5/6 certified process bays. Electron microscopy resources under the responsibility of the Senior Facility Microscopist (including our new JEM-F200 S/TEM) represent an important new capability for the QNFCF lab and the University of Waterloo community. These resources are installed in the Quantum Nano Centre building?s metrology suite on the concourse level of the building. The metrology suite labs are purpose built for electron microscopy and other metrology resources and have exceptionally low levels of electrical and acoustic noise (meets VC-G criteria). The Senior Facility Microscopist is a full time staff position with immediate access to all staff benefits including a defined benefit pension plan. For more information and to apply please refer to the job description in the link below: https://careers-uwaterloo.icims.com/jobs/10418/senior-facility-microscopist/job -- Nathan Nelson-Fitzpatrick PhD, PEng Director, Quantum-Nano Fabrication and Characterization Facility (QNFCF) Office of Research University of Waterloo 200 University Avenue West, Waterloo, ON N2L 3G1 P: 519-888-4567 ext. 31796 C: 226-218-3206 https://uwaterloo.ca/quantum-nano-fabrication-and-characterization-facility/ [signature_3104509281] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001[87].png Type: image/png Size: 11998 bytes Desc: image001[87].png URL: From demis at ucsb.edu Wed Jun 21 18:42:25 2023 From: demis at ucsb.edu (Demis D. John) Date: Wed, 21 Jun 2023 18:42:25 -0400 Subject: [labnetwork] Alternative distributor for SPR 955? In-Reply-To: References: Message-ID: An HTML attachment was scrubbed... URL: From hollingshead.19 at osu.edu Thu Jun 22 13:28:43 2023 From: hollingshead.19 at osu.edu (Hollingshead, Dave) Date: Thu, 22 Jun 2023 17:28:43 +0000 Subject: [labnetwork] Heidelberg MLA150 SU-8 Exposure Dose Message-ID: Dear Labnetwork, We have found that exposure of SU-8 on our MLA150 tool (using the 375nm laser) seems to require very high doses. Even thin ~500nm thick films (using SU-8 2000.5) have required doses on the order of 1200mJ/cm2 to fully expose. This is 15-20x the recommended dosage from both the datasheet and what we estimate is the exposure dose used on our filtered contact aligners. Thicker films follow the same trend, but not necessarily in a linear fashion (5?m films require ~2000mJ/cm2). I am sure the bump from 365nm to 375nm plays a role, but the magnitude of the change seems excessive. FWIW, our other negative resists (eg. nLOF2020) seem to expose properly at reasonable doses. Has anyone else experienced this? Does anyone have an explanation or any processing suggestions for using SU-8 with an MLA? Thanks, -Dave Dave Hollingshead Manager, Research Operations The Ohio State University Nanotech West Labs Suite 100, 1381 Kinnear Rd, Columbus, OH 43212 614.292.1355 Office hollingshead.19 at osu.edu / nanotech.osu.edu Pronouns: he/him/his -------------- next part -------------- An HTML attachment was scrubbed... URL: From Howard.Northfield at uottawa.ca Thu Jun 22 13:48:49 2023 From: Howard.Northfield at uottawa.ca (Howard Northfield) Date: Thu, 22 Jun 2023 17:48:49 +0000 Subject: [labnetwork] Alternative distributor for SPR 955? In-Reply-To: References: Message-ID: Yes, I have a jug of SPR955 that is a couple of years past expiry. It has been kept refrigerated and decanted in 300ml amounts (after warming to room temp) for decanting to users ... and is working fine. Howard ________________________________ From: Demis D. John Sent: Wednesday, June 21, 2023 6:42 PM To: Howard Northfield Cc: Price, Aimee ; labnetwork at mtl.mit.edu ; Ramsey, Keith Subject: Re: [labnetwork] Alternative distributor for SPR 955? Attention : courriel externe | external email We have got the ?extension of expiration? notices from manufacturer, and have done internal tests showing these PR?s work well beyond the expiration dates (when bulk is stored in refrigerator) - they appear to be good at least 1 year beyond expiration. We tested UV6, UVN30, and one of the SPR?s if I remember correctly. -- Demis On Jun 21, 2023, at 16:07, Howard Northfield wrote: ? I am pretty much now used to getting materials only months from expiry from all sources. Howard Northfield Research Associate Advanced Research Complex (ARC) University of Ottawa ________________________________ From: labnetwork on behalf of Price, Aimee Sent: Tuesday, June 20, 2023 9:50 PM To: labnetwork at mtl.mit.edu Cc: Ramsey, Keith Subject: [labnetwork] Alternative distributor for SPR 955? Attention : courriel externe | external email Dear Labnetwork, Does anyone purchase SPR 955 (or any other Shipley/Dupont products) from a distributor other than Kayaku? We have had numerous issues with different materials. In this case, we need to either find a different distributor or begin qualifying another resist, probably both. The current issue is that we purchased a gallon of SPR955 which was ?in stock.? It arrived last week with an expiration date of 7/8/23. Kayaku?s response was that they were required to ship what they had on hand first and would ask for an extension to the expiration date from the manufacturer. I am still hoping for a better response and solution than that but need to find an alternative in the meantime. If anyone works with a different distributor for Shipley resists, I?d love to hear your experience. I?ll share the final solution from Kayaku and summarize any responses for alternatives. Thank you, Aimee Bross Price Manager, Nanofabrication The Ohio State University Nanotech West Lab Institute for Materials Research 1381 Kinnear Road Suite 100 Columbus, OH 43212 614-292-2753 Price.798 at osu.edu Nanotech.osu.edu Pronouns: she/her/hers Commercial Chair, 66th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication (EIPBN) May 30-June 2, 2023, San Francisco, CA Conference Chair, 67th International Conference on Electron, Ion, Photon Beam Technology and Nanofabrication (EIPBN) | https://eipbn.org | _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From hit.kamble at gmail.com Thu Jun 22 21:19:33 2023 From: hit.kamble at gmail.com (Hitesh Kamble) Date: Fri, 23 Jun 2023 06:49:33 +0530 Subject: [labnetwork] Heidelberg MLA150 SU-8 Exposure Dose In-Reply-To: References: Message-ID: Hello Dave, I do not know on which material you are coating and expose but certainly it behaves this way because of process conditions and energy absorption while exposure (down the line you need to tune parameters and understand UV penetration). Again if it is pre-diluted or diluted with T-thinner, store conditions and expiry matters. Regards, Hitesh On Fri, 23 Jun 2023 at 1:57 AM Hollingshead, Dave wrote: > Dear Labnetwork, > > > > We have found that exposure of SU-8 on our MLA150 tool (using the 375nm > laser) seems to require very high doses. Even thin ~500nm thick films > (using SU-8 2000.5) have required doses on the order of 1200mJ/cm2 to > fully expose. This is 15-20x the recommended dosage from both the datasheet > and what we estimate is the exposure dose used on our filtered contact > aligners. Thicker films follow the same trend, but not necessarily in a > linear fashion (5?m films require ~2000mJ/cm2). > > > > I am sure the bump from 365nm to 375nm plays a role, but the magnitude of > the change seems excessive. FWIW, our other negative resists (eg. nLOF2020) > seem to expose properly at reasonable doses. > > > > Has anyone else experienced this? Does anyone have an explanation or any > processing suggestions for using SU-8 with an MLA? > > > > Thanks, > > -Dave > > *Dave Hollingshead* > Manager, Research Operations > > *The Ohio State University* > Nanotech West Labs > Suite 100, 1381 Kinnear Rd, Columbus, OH 43212 > > 614 > .292.1355 > Office > hollingshead.19 at osu.edu / nanotech.osu.edu > > Pronouns: he/him/his > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From d.c.bikash at iitb.ac.in Fri Jun 23 05:26:48 2023 From: d.c.bikash at iitb.ac.in (Bikash Dev Choudhury) Date: Fri, 23 Jun 2023 14:56:48 +0530 Subject: [labnetwork] Antireflective coating for Litho process Message-ID: <63deb77fc7c95265920ddf770ff65c60@iitb.ac.in> Dear Labnetwork, I am looking for antireflective coating for both top and bottom layer in photolitho process. Looking forward for any lead/info. Thanks in advance! -- Best Regards Dr. Bikash Dev Choudhury Sr. Process Technologist CEN, IITBNF Electrical Engineering Department IIT Bombay, Mumbai-400076 Mobile No. 7400319871 -------------- next part -------------- An HTML attachment was scrubbed... URL: From nsk0248 at umd.edu Fri Jun 23 08:41:21 2023 From: nsk0248 at umd.edu (Nam Soo Kim) Date: Fri, 23 Jun 2023 08:41:21 -0400 Subject: [labnetwork] Heidelberg MLA150 SU-8 Exposure Dose In-Reply-To: References: Message-ID: Hi Dave. We also have similar behavior with SU-8 on the MLA150, using 1200mJ/cm2. Using the high aspect ratio mode also increases the required dosage. Hope this helps. Nam On Fri, Jun 23, 2023 at 7:53?AM Hitesh Kamble wrote: > Hello Dave, > I do not know on which material you are coating and expose but certainly > it behaves this way because of process conditions and energy absorption > while exposure (down the line you need to tune parameters and understand UV > penetration). > > Again if it is pre-diluted or diluted with T-thinner, store conditions and > expiry matters. > > > Regards, > Hitesh > > > > On Fri, 23 Jun 2023 at 1:57 AM Hollingshead, Dave > wrote: > >> Dear Labnetwork, >> >> >> >> We have found that exposure of SU-8 on our MLA150 tool (using the 375nm >> laser) seems to require very high doses. Even thin ~500nm thick films >> (using SU-8 2000.5) have required doses on the order of 1200mJ/cm2 to >> fully expose. This is 15-20x the recommended dosage from both the datasheet >> and what we estimate is the exposure dose used on our filtered contact >> aligners. Thicker films follow the same trend, but not necessarily in a >> linear fashion (5?m films require ~2000mJ/cm2). >> >> >> >> I am sure the bump from 365nm to 375nm plays a role, but the magnitude of >> the change seems excessive. FWIW, our other negative resists (eg. nLOF2020) >> seem to expose properly at reasonable doses. >> >> >> >> Has anyone else experienced this? Does anyone have an explanation or any >> processing suggestions for using SU-8 with an MLA? >> >> >> >> Thanks, >> >> -Dave >> >> *Dave Hollingshead* >> Manager, Research Operations >> >> *The Ohio State University* >> Nanotech West Labs >> Suite 100, 1381 Kinnear Rd, Columbus, OH 43212 >> >> 614 >> .292.1355 >> Office >> hollingshead.19 at osu.edu / nanotech.osu.edu >> >> Pronouns: he/him/his >> >> >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork >> > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From Howard.Northfield at uottawa.ca Fri Jun 23 10:28:49 2023 From: Howard.Northfield at uottawa.ca (Howard Northfield) Date: Fri, 23 Jun 2023 14:28:49 +0000 Subject: [labnetwork] Antireflective coating for Litho process In-Reply-To: <63deb77fc7c95265920ddf770ff65c60@iitb.ac.in> References: <63deb77fc7c95265920ddf770ff65c60@iitb.ac.in> Message-ID: I use Brewer Science, XHRiC I-line Anti Reflective Coating. See: https://wiki.nanotech.ucsb.edu/wiki/images/3/33/XHRiC-Anti-Reflective-Coating.pdf See also: H. Northfield, O. Krupin, R. N. Tait, and P. Berini, ?Tri-layer contact photolithography process for high-resolution lift-off,? Microelectron. Eng. 241 (2021). Howard Northfield Research Associate Advanced Research Complex (ARC) University of Ottawa ________________________________ From: labnetwork on behalf of Bikash Dev Choudhury Sent: Friday, June 23, 2023 5:26 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Antireflective coating for Litho process Attention : courriel externe | external email Dear Labnetwork, I am looking for antireflective coating for both top and bottom layer in photolitho process. Looking forward for any lead/info. Thanks in advance! -- Best Regards Dr. Bikash Dev Choudhury Sr. Process Technologist CEN, IITBNF Electrical Engineering Department IIT Bombay, Mumbai-400076 Mobile No. 7400319871 -------------- next part -------------- An HTML attachment was scrubbed... URL: From yakimom at sunypoly.edu Fri Jun 23 11:15:06 2023 From: yakimom at sunypoly.edu (Michael Yakimov) Date: Fri, 23 Jun 2023 15:15:06 +0000 Subject: [labnetwork] Heidelberg MLA150 SU-8 Exposure Dose In-Reply-To: References: Message-ID: 375 looks to be in the region where both native absorbtion and exposure bleaching are significant, and absorbtion curve sliope is high. . An interesting experiment I see is a measurements of transmitted light intensity during exposure. If you can do that, I suspect that may give a lot of food for though. THanks mike _______________________________________________ Michael Yakimov Research scientist College of Nanoscale Science and Engineering SUNY Polytechnic Institute 253 Fuller rd. Albany NY 12203 Phone: 518-437-8609 lab e-mail: yakimom at sunypoly.edu ________________________________ From: labnetwork on behalf of Hollingshead, Dave Sent: Thursday, June 22, 2023 1:28:43 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Heidelberg MLA150 SU-8 Exposure Dose Dear Labnetwork, We have found that exposure of SU-8 on our MLA150 tool (using the 375nm laser) seems to require very high doses. Even thin ~500nm thick films (using SU-8 2000.5) have required doses on the order of 1200mJ/cm2 to fully expose. This is 15-20x the recommended dosage from both the datasheet and what we estimate is the exposure dose used on our filtered contact aligners. Thicker films follow the same trend, but not necessarily in a linear fashion (5?m films require ~2000mJ/cm2). I am sure the bump from 365nm to 375nm plays a role, but the magnitude of the change seems excessive. FWIW, our other negative resists (eg. nLOF2020) seem to expose properly at reasonable doses. Has anyone else experienced this? Does anyone have an explanation or any processing suggestions for using SU-8 with an MLA? Thanks, -Dave Dave Hollingshead Manager, Research Operations The Ohio State University Nanotech West Labs Suite 100, 1381 Kinnear Rd, Columbus, OH 43212 614.292.1355 Office hollingshead.19 at osu.edu / nanotech.osu.edu Pronouns: he/him/his -------------- next part -------------- An HTML attachment was scrubbed... URL: From hathaway at cns.fas.harvard.edu Fri Jun 23 11:48:34 2023 From: hathaway at cns.fas.harvard.edu (Hathaway, Malcolm R) Date: Fri, 23 Jun 2023 15:48:34 +0000 Subject: [labnetwork] TMAH alternatives In-Reply-To: References: Message-ID: Hello All, Thanks for all your responses regarding potential replacements for TMAH. It appears that some folks have been making their own investigations along these lines, and others are interested in doing so. Since some of this work is on-going, the idea was suggested that we create an email list where we can coordinate these efforts. This will be called the TMAH Working Group, so that it can encompass a wide membership, including NNCI member institutions as well as others, including perhaps some industry folks as well. As we find out more, we'll keep the main Labnetwork apprised of our progress. So, if you have an interest in furthering this work, or would like to share your findings or recommendations, email me at hathaway at cns.fas.harvard.edu, and I'll put you on the mailing list. The first notable finding is that Sachem Envure 3330 and Transene SE-33 appear to be the same stuff, i.e. Envure is repackaged in smaller lots for smaller companies and labs by Transene. As Graham at Queens pointed out, Huntsman seems to develop novolac photoresists reasonably well, with some variation in develop time. As mentioned previously, the active ingredient in Envure/Transene is TEMAH (triethyl methyl ammonium hydroxide), while Huntsman uses (hydroxyethyl) methyl ammonium hydroxide. With regard to safety, we only have, as yet, whatever the manufacturers say. The marketing info suggests one of the Transene products (SE-33) is around 8x less toxic, while the others may be 15x less toxic. Huntsman just says their stuff is "safer". Clearly, a bit more digging in is called for! The initial email for the TMAH Group will go out shortly, Thanks, Mac Hathaway Harvard CNS ________________________________ From: Graham Gibson Sent: Saturday, June 17, 2023 2:42 PM To: Hathaway, Malcolm R ; Labnetwork Mailing List Subject: RE: TMAH alternatives Hi Mac, I have tried Huntsman?s E-Grade THEMAH as well as another of their products, E-Grade CHOLINE OH, as a developer for standard Novolac photoresists, though not for HSQ (yet). I was pretty happy with their performance in general, though THEMAH was a bit slow compared to standard TMAH developer. Cheers, Graham Gibson Operations Manager, NanoFabrication Kingston Queen?s University 945 Princess Street Kingston, Ontario, Canada K7L 0E9 gibsong at queensu.ca www.nanofabkingston.ca From: labnetwork On Behalf Of Hathaway, Malcolm R Sent: Thursday, June 15, 2023 2:20 PM To: Labnetwork Mailing List Subject: [labnetwork] TMAH alternatives Hello Labnetworkers, Has anyone tried one of the TMAH substitutes that have become available? How do they work? Are your users satisfied with their results? For background, TMAH (tetramethylammonium hydroxide) is widely used in commercial resist developers (3%) and for HSQ developing (25%). In its 25% concentration, TMAH is a potent contact neurotoxin, which is fatal roughly 75% of the time, for exposures greater than 7.5% of body area. Nasty stuff. Several companies now have safer alternatives available, which we'd like to try out, such as: Envure 3330 (Sachem Chemical), E-Grade THEMAH SLM ((hydroxyethyl) methylammonium hydroxide, from Huntsman Chemical), and Novo-safe SE-33 (ethyl tri-methy ammonium hydroxide from Transene). We are particularly interested in using one of these as an HSQ developer, so we can do away with 25% TMAH. Any experiences, good or bad, will be most welcome. Thanks, Mac Hathaway Senior Process and Systems Engineer Harvard Center for Nanoscale Systems -------------- next part -------------- An HTML attachment was scrubbed... URL: From paul.sunal at gmail.com Fri Jun 23 12:05:00 2023 From: paul.sunal at gmail.com (Paul S) Date: Fri, 23 Jun 2023 12:05:00 -0400 Subject: [labnetwork] Open Positions - 1) Lithography Technician & 2) Process Technician Message-ID: Hello! The US Army Research Laboratory is currently seeking qualified candidates (limited to US citizens) for a staff position of Lithography Technician and research position of Process Technician. If interested or know someone interested, please use/forward the links below. Lithography Technician - This position supports internal and external user research, process development, and device fabrication in the Specialty Electronic Materials and Sensors Cleanroom (SEMASC) at the U.S. Army Research Laboratory. For details, search General Technical Services, LLC for Photolithography Technician. Process Technician - Seeking a Microelectronics and Semiconductor Fabrication Technician to support our work with the U.S. Army Research Laboratory in Adelphi, MD. The Fabrication Technician will work on-site in an integrated, results-oriented research and development Microelectromechanical Systems (MEMS) team environment within the state-of-the-art Specialty Electronics Materials and Sensors Cleanroom (SEMASC) Research Facility. For details, search HII for Microelectronics and Semiconductor Fabrication Technician. -- Paul Sunal, Ph.D. -------------- next part -------------- An HTML attachment was scrubbed... URL: From zh25 at uw.edu Fri Jun 23 14:57:32 2023 From: zh25 at uw.edu (Zheyi Han) Date: Fri, 23 Jun 2023 18:57:32 +0000 Subject: [labnetwork] Grayscale Photoresist with Non-aqueous Development Message-ID: Dear Labnetwork, Has anyone used any grayscale photoresists compatible with non-aqueous developers? Any suggestions are highly appreciated! Thank you, Zheyi Zheyi Han Department of Electrical and Computer Engineering University of Washington Zh25 at uw.edu | Mobile 607-379-8193 -------------- next part -------------- An HTML attachment was scrubbed... URL: From d.c.bikash at iitb.ac.in Sat Jun 24 02:19:52 2023 From: d.c.bikash at iitb.ac.in (Bikash Dev Choudhury) Date: Sat, 24 Jun 2023 11:49:52 +0530 Subject: [labnetwork] Antireflective coating for Litho process In-Reply-To: References: <63deb77fc7c95265920ddf770ff65c60@iitb.ac.in> Message-ID: <5dc03c31bbc81b3048457652de6e5045@iitb.ac.in> Thanks Howard! Will check it. Does it work only for i- line or for h- line as well? On 2023-06-23 19:58, Howard Northfield wrote: > I use Brewer Science, XHRiC I-line Anti Reflective Coating. > > See: > https://wiki.nanotech.ucsb.edu/wiki/images/3/33/XHRiC-Anti-Reflective-Coating.pdf > > See also: > H. Northfield, O. Krupin, R. N. Tait, and P. Berini, "Tri-layer contact > photolithography process for high-resolution lift-off," Microelectron. > Eng. 241 (2021). > > Howard Northfield > Research Associate > Advanced Research Complex (ARC) University of Ottawa > > ------------------------- > > From: labnetwork on behalf of Bikash > Dev Choudhury > Sent: Friday, June 23, 2023 5:26 AM > To: labnetwork at mtl.mit.edu > Subject: [labnetwork] Antireflective coating for Litho process > > Attention : courriel externe | external email > > Dear Labnetwork, > > I am looking for antireflective coating for both top and bottom layer > in photolitho process. > > Looking forward for any lead/info. > > Thanks in advance! > > -- > Best Regards > Dr. Bikash Dev Choudhury > Sr. Process Technologist > CEN, IITBNF > Electrical Engineering Department > IIT Bombay, Mumbai-400076 > Mobile No. 7400319871 -- -------------- next part -------------- An HTML attachment was scrubbed... URL: From Howard.Northfield at uottawa.ca Sat Jun 24 13:50:43 2023 From: Howard.Northfield at uottawa.ca (Howard Northfield) Date: Sat, 24 Jun 2023 17:50:43 +0000 Subject: [labnetwork] Antireflective coating for Litho process In-Reply-To: <5dc03c31bbc81b3048457652de6e5045@iitb.ac.in> References: <63deb77fc7c95265920ddf770ff65c60@iitb.ac.in> <5dc03c31bbc81b3048457652de6e5045@iitb.ac.in> Message-ID: I use for i-line with SPR955 i-line optimized photoresist (pretty much only). I use i-line band pass filter plates during exposure. Shorter wavelength better for smaller dimensions. Howard ________________________________ From: Bikash Dev Choudhury Sent: Saturday, June 24, 2023 2:19 AM To: Howard Northfield Cc: labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Antireflective coating for Litho process Attention : courriel externe | external email Thanks Howard! Will check it. Does it work only for i- line or for h- line as well? On 2023-06-23 19:58, Howard Northfield wrote: I use Brewer Science, XHRiC I-line Anti Reflective Coating. See: https://wiki.nanotech.ucsb.edu/wiki/images/3/33/XHRiC-Anti-Reflective-Coating.pdf See also: H. Northfield, O. Krupin, R. N. Tait, and P. Berini, "Tri-layer contact photolithography process for high-resolution lift-off," Microelectron. Eng. 241 (2021). Howard Northfield Research Associate Advanced Research Complex (ARC) University of Ottawa ________________________________ From: labnetwork on behalf of Bikash Dev Choudhury Sent: Friday, June 23, 2023 5:26 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Antireflective coating for Litho process Attention : courriel externe | external email Dear Labnetwork, I am looking for antireflective coating for both top and bottom layer in photolitho process. Looking forward for any lead/info. Thanks in advance! -- Best Regards Dr. Bikash Dev Choudhury Sr. Process Technologist CEN, IITBNF Electrical Engineering Department IIT Bombay, Mumbai-400076 Mobile No. 7400319871 -- -------------- next part -------------- An HTML attachment was scrubbed... URL: From agah at vt.edu Mon Jun 26 23:05:26 2023 From: agah at vt.edu (Masoud Agah) Date: Mon, 26 Jun 2023 23:05:26 -0400 Subject: [labnetwork] Job Opportunity Message-ID: Job Announcement: Virginia Alliance for Semiconductor Technology (VAST), Associate Director of Operations Reporting to the VAST Director, the Associate Director of Operations will lead the Alliance?s programs related to access to cleanrooms and facilities. These programs seek to increase the use and impact of shared nanotech facilities across the Commonwealth by providing transparent platforms for finding and accessing unique equipment; ensuring consistent and high-quality training and safety protocols; and tracking impact through high-quality data. In addition, the VAST Associate Director of Operations will chair the VAST Operations Committee (OPC) composed of the facility managers of VAST nodes. The OPC will establish policies related to the VAST operation, advise on the development of the VAST work plan, and execute the work plan. OPC will establish standards and policies for the efficient, safe, and accessible use of facilities. They will establish VAST safety and training policies; standards for the creation and delivery of virtual training modules to VAST standards for tools in their facility; and standards for access to and reporting of data necessary for reporting, operation, and evaluation of VAST metrics to VAST headquarter and other sponsors. Interested candidates, please refer to: https://lnkd.in/gvj8P9DH Regards Masoud Agah VAST Founding Director -- Sent from Gmail Mobile -------------- next part -------------- An HTML attachment was scrubbed... URL: From sergilendi at lsu.edu Tue Jun 27 11:08:36 2023 From: sergilendi at lsu.edu (Sergi Lendinez) Date: Tue, 27 Jun 2023 15:08:36 +0000 Subject: [labnetwork] Branson plasma asher upgrade Message-ID: Dear community, We have an old Branson plasma asher that we have been repairing for many years, but the power supply and/or controller keep eventually failing. I was wondering if anyone has upgraded their old Branson plasma asher with Allwin21 and, if so, if they would recommend going this way or any other suggestions would be welcome. Thanks, Sergi --- Sergi Lendinez, Ph. D. Assistant Director NFF | Louisiana State University Center for Advanced Microstructures and Devices (CAMD) 6980 Jefferson Highway, Baton Rouge, LA 70806 (225) 578-9378 sergilendi at lsu.edu | lsu.edu/nanofabrication -------------- next part -------------- An HTML attachment was scrubbed... URL: From zhichaow at udel.edu Tue Jun 27 13:01:16 2023 From: zhichaow at udel.edu (Zhichao Wang) Date: Tue, 27 Jun 2023 13:01:16 -0400 Subject: [labnetwork] Spin Coater Chucks Vendors? Message-ID: Dear Labnetworkers, We are planning to order some new spin coater chucks (1/2" ID with a notch for CEE 200cbx) that fit 3-4" wafers. Previously we tried CEE and Laurell Technologies. I was wondering if you guys have other recommended vendors? Just wanted to explore all the options we have. Many thanks, Chao -- *Zhichao (Chao) Wang, Ph.D.* *Lithography Engineer* *UDNF* *University of Delaware* *Pronouns: He/Him/His* *------------------------* *Office Number?(302) 831-4839* *221 Academy St.?RM170* *Newark, DE 19711* -------------- next part -------------- An HTML attachment was scrubbed... URL: From yakimom at sunypoly.edu Wed Jun 28 14:11:40 2023 From: yakimom at sunypoly.edu (Michael Yakimov) Date: Wed, 28 Jun 2023 18:11:40 +0000 Subject: [labnetwork] TMAH alternatives In-Reply-To: References: Message-ID: With some sick time I had to endure, I went down the rabbit hole of TMAH and similar compounds toxicity. Scientific archeology is fun! First, TMAH isn't a good thing to study - corrosive effect of being a base doesn't allow good study of TMA ion, so salts like TMA chloride are better test materials. With that, even those papers are not very abundant. Some of latest TMAH work is purely TMA, no comparisons. I actually happened to briefly talk to Ernst Timlin from IBM about things they did - that was a while ago though. I assume their briefs are a big part of current motivation: https://sesha.org/abstract/tetramethylammonium-hydroxide-tmah-toxicity-and-methods-to-reduce-risk-in-the-workplace/ Second, TMAH oral LD50 by weight is something like a cup of CD26 developer for my weight. So I am not surprised when they say rats given half of that dose look strange - if you know the taste of TMAH, you would certainly understand those poor animals! Most relevant papers - and looks like any relative safety claims are based on that - are Hunt, Reid. "Some effects of quaternary ammonium compounds on the autonomic nervous system." Journal of Pharmacology and Experimental Therapeutics 28.3 (1926): 367-388. https://jpet.aspetjournals.org/content/28/3/367.short Burn, J. H., and Henry Hallett Dale. "The action of certain quarternary ammonium bases." Journal of Pharmacology and Experimental Therapeutics 6.4 (1915): 417-438. https://jpet.aspetjournals.org/content/6/4/417 If anyone has an access, it would be great to look at full texts. Other relevant papers: Gebber, Gerard L., and Robert L. Volle. "Mechanisms involved in ganglionic blockade induced by tetramethylammonium." Journal of Pharmacology and Experimental Therapeutics 152.1 (1966): 18-28. https://jpet.aspetjournals.org/content/152/1/18.short Another interesting one is Wien, R., et al. "The ganglion blocking properties of homologous compounds in the methonium series." British Journal of Pharmacology and Chemotherapy 7.4 (1952): 534. https://www.ncbi.nlm.nih.gov/pmc/articles/PMC1509303/?page=2 While not a TMA, but a more complex molecule - they see increased neural effect with gradual methyl to ethyl replacement. Sorry for the long one! Mike _______________________________________________ Michael Yakimov Research scientist College of Nanoscale Science and Engineering SUNY Polytechnic Institute 253 Fuller rd. Albany NY 12203 Phone: 518-437-8609 lab e-mail: yakimom at sunypoly.edu ________________________________ From: labnetwork on behalf of Hathaway, Malcolm R Sent: Friday, June 23, 2023 11:48 AM To: Labnetwork Mailing List Subject: Re: [labnetwork] TMAH alternatives Hello All, Thanks for all your responses regarding potential replacements for TMAH. It appears that some folks have been making their own investigations along these lines, and others are interested in doing so. Since some of this work is on-going, the idea was suggested that we create an email list where we can coordinate these efforts. This will be called the TMAH Working Group, so that it can encompass a wide membership, including NNCI member institutions as well as others, including perhaps some industry folks as well. As we find out more, we'll keep the main Labnetwork apprised of our progress. So, if you have an interest in furthering this work, or would like to share your findings or recommendations, email me at hathaway at cns.fas.harvard.edu, and I'll put you on the mailing list. The first notable finding is that Sachem Envure 3330 and Transene SE-33 appear to be the same stuff, i.e. Envure is repackaged in smaller lots for smaller companies and labs by Transene. As Graham at Queens pointed out, Huntsman seems to develop novolac photoresists reasonably well, with some variation in develop time. As mentioned previously, the active ingredient in Envure/Transene is TEMAH (triethyl methyl ammonium hydroxide), while Huntsman uses (hydroxyethyl) methyl ammonium hydroxide. With regard to safety, we only have, as yet, whatever the manufacturers say. The marketing info suggests one of the Transene products (SE-33) is around 8x less toxic, while the others may be 15x less toxic. Huntsman just says their stuff is "safer". Clearly, a bit more digging in is called for! The initial email for the TMAH Group will go out shortly, Thanks, Mac Hathaway Harvard CNS ________________________________ From: Graham Gibson Sent: Saturday, June 17, 2023 2:42 PM To: Hathaway, Malcolm R ; Labnetwork Mailing List Subject: RE: TMAH alternatives Hi Mac, I have tried Huntsman?s E-Grade THEMAH as well as another of their products, E-Grade CHOLINE OH, as a developer for standard Novolac photoresists, though not for HSQ (yet). I was pretty happy with their performance in general, though THEMAH was a bit slow compared to standard TMAH developer. Cheers, Graham Gibson Operations Manager, NanoFabrication Kingston Queen?s University 945 Princess Street Kingston, Ontario, Canada K7L 0E9 gibsong at queensu.ca www.nanofabkingston.ca From: labnetwork On Behalf Of Hathaway, Malcolm R Sent: Thursday, June 15, 2023 2:20 PM To: Labnetwork Mailing List Subject: [labnetwork] TMAH alternatives Hello Labnetworkers, Has anyone tried one of the TMAH substitutes that have become available? How do they work? Are your users satisfied with their results? For background, TMAH (tetramethylammonium hydroxide) is widely used in commercial resist developers (3%) and for HSQ developing (25%). In its 25% concentration, TMAH is a potent contact neurotoxin, which is fatal roughly 75% of the time, for exposures greater than 7.5% of body area. Nasty stuff. Several companies now have safer alternatives available, which we'd like to try out, such as: Envure 3330 (Sachem Chemical), E-Grade THEMAH SLM ((hydroxyethyl) methylammonium hydroxide, from Huntsman Chemical), and Novo-safe SE-33 (ethyl tri-methy ammonium hydroxide from Transene). We are particularly interested in using one of these as an HSQ developer, so we can do away with 25% TMAH. Any experiences, good or bad, will be most welcome. Thanks, Mac Hathaway Senior Process and Systems Engineer Harvard Center for Nanoscale Systems -------------- next part -------------- An HTML attachment was scrubbed... URL: From kckeenan at seas.upenn.edu Thu Jun 29 10:01:08 2023 From: kckeenan at seas.upenn.edu (Kyle Keenan) Date: Thu, 29 Jun 2023 10:01:08 -0400 Subject: [labnetwork] distributor for cleanroom raised floor systems Message-ID: Hello, I am in need of some additional/replacement components for the raised floor system in our cleanroom, which was manufactured by Hae Kwango Co. Ltd. in South Korea. Aside from the odd reseller that may have a some of what I need, I am not having any luck finding a distributor in the US for this company, and I'm hoping some of you may have suggestions. I'd also be willing to use parts from another manufacturer, so long as they can be integrated into our current system. I look forward to your responses. Thank you, -- Kyle Keenan Senior Manager - Laboratory Operations Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 -------------- next part -------------- An HTML attachment was scrubbed... URL: