[labnetwork] Heidelberg MLA150 SU-8 Exposure Dose

[Hitesh Kamble]

Hello Dave,
I do not know on which material you are coating and expose but certainly it
behaves this way because of process conditions and energy absorption while
exposure (down the line you need to tune parameters and understand UV
penetration).

Again if it is pre-diluted or diluted with T-thinner, store conditions and
expiry matters.


Regards,
Hitesh



On Fri, 23 Jun 2023 at 1:57 AM Hollingshead, Dave <hollingshead.19 at osu.edu>
wrote:

> Dear Labnetwork,
>
>
>
> We have found that exposure of SU-8 on our MLA150 tool (using the 375nm
> laser) seems to require very high doses. Even thin ~500nm thick films
> (using SU-8 2000.5) have required doses on the order of 1200mJ/cm2 to
> fully expose. This is 15-20x the recommended dosage from both the datasheet
> and what we estimate is the exposure dose used on our filtered contact
> aligners. Thicker films follow the same trend, but not necessarily in a
> linear fashion (5µm films require ~2000mJ/cm2).
>
>
>
> I am sure the bump from 365nm to 375nm plays a role, but the magnitude of
> the change seems excessive. FWIW, our other negative resists (eg. nLOF2020)
> seem to expose properly at reasonable doses.
>
>
>
> Has anyone else experienced this? Does anyone have an explanation or any
> processing suggestions for using SU-8 with an MLA?
>
>
>
> Thanks,
>
> -Dave
>
> *Dave Hollingshead*
> Manager, Research Operations
>
> *The Ohio State University*
> Nanotech West Labs
> Suite 100, 1381 Kinnear Rd, Columbus, OH 43212
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> 614
> <https://www.google.com/maps/search/1381+Kinnear+Rd,+Columbus,+OH+43212+%0D%0A614?entry=gmail&source=g>.292.1355
> Office
> hollingshead.19 at osu.edu / nanotech.osu.edu
>
> Pronouns: he/him/his
>
>
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