From James.Grant at glasgow.ac.uk Wed Nov 1 06:21:01 2023 From: James.Grant at glasgow.ac.uk (James Grant) Date: Wed, 1 Nov 2023 10:21:01 +0000 Subject: [labnetwork] Infrared Inspection System of Chips Bonded to Wafers Message-ID: Hello, Was fairly certain this topic has been covered before on labnetwork but couldn't find anything relevant. Many of our plasma etch tool users have to bond piece parts samples to silicon carrier wafers (150 or 200 mm diameter). To improve thermal conduction we use a bonding medium between the piece part samples and the silicon carrier wafer. The challenge is ensuring there are no voids in this bonding layer but at the minute we have no way of imaging the stack to verify. My ever so brief search thus far has rendered one IR system: https://www.idonus.com/downloads/idonus_brochure_WBI_2021-01-06.pdf It looks decent but stated minimum viewable feature size (1 pixel!!) is 200 um for a 200 mm diameter field of view. Appreciate one could construct a home-made system but my preference is to go for the "easy" approach! There are also other techniques such as scanning acoustic microscopy and optical interferometry. I guess my questions to the community are: 1. What system(s) are you using to inspect bonded wafers/chips? 2. What sort of resolutions do you have? Cheers, James Dr. James Paul Grant Research Engineer in Plasma Processing Plasma Processing Group james.grant at glasgow.ac.uk [cid:image001.png at 01DA0CAB.7162C410] www.JWNC.gla.ac.uk [cid:image002.png at 01DA0CAB.7162C410] LinkedIn.com/company/JWNC [cid:image003.png at 01DA0CAB.7162C410] @UofG_JWNC -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 26666 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 658 bytes Desc: image002.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.png Type: image/png Size: 603 bytes Desc: image003.png URL: From Kenneth.Mitchell at uvm.edu Wed Nov 1 11:19:02 2023 From: Kenneth.Mitchell at uvm.edu (Kenneth Mitchell) Date: Wed, 1 Nov 2023 15:19:02 +0000 Subject: [labnetwork] Oxford 80 etcher Message-ID: Hi, Found out about this forum today from one of the professors. I am trying to resurrect an Oxford80 etcher. Probably 30 plus years old. Found a manual on the web, but it does not have quite enough information. Oxford UK has not been responsive. Anyone out there have any experience with this tool. I have facilities hooked up, usual issues. My issue is there are a few things that don't look right. Like a box just laying loose inside the cabinet with wires going into the RF area and a cable coming out into the system wiring. Missing screws in the box cover. I'm wondering what else may be missing. Would like to get this going for our semi program. Thanks in advance. Ken Mitchell -------------- next part -------------- An HTML attachment was scrubbed... URL: From rrivers at berkeley.edu Wed Nov 1 14:22:28 2023 From: rrivers at berkeley.edu (Ryan Rivers) Date: Wed, 1 Nov 2023 11:22:28 -0700 Subject: [labnetwork] Infrared Inspection System of Chips Bonded to Wafers In-Reply-To: References: Message-ID: Hi James, This isn't going to be what you're looking for, but I got the sense you're also polling the field for what works. We use two systems at UC Berkeley. One is a cheap, home built full wafer camera we use to look for macroscopic bubbles. That's just a raspberry pi and a samsung phone camera with the IR filters removed, mounted in a delrin tube we had machined in our shop. Wafer mounts on the top and acts as the filter for the lamp mounted behind the wafer. A true IR source will run you 10-20k for some defined wavelength, but there's no benefit and all drawback in this application. What you want is not true IR, it's wideband inspection - which means it works for wafers transparent in various parts of the IR band. Resolution is hundreds of microns/pixel - we've never measured it. Cost maybe $5k in 2015 to build. It basically would give similar information to the idonus above, it's just not as nice of an interface. It is physically smaller which is a big plus. For small scale inspection we use an IR rated microscope that we bought as salvage and rebuilt. Any microscope with IR transparent objectives and through substrate lighting will work. In the end the primary difficulty is that IR wafer imaging exists in an uncanny valley where there's not a good business case for benchtop models. Engineering time on them is too expensive and there's too much used equipment in the market that's easily repaired. Since no one can hit volume production IR systems sit in a space where they can't really support an engineering income. You can save several tens of thousands of dollars by splitting the job into two tools and specializing them - a two-tool setup can run you ~$10k with a little finesse and tolerance for repairing salvage equipment. Hope you find a good solution for your needs. I'd be interested to know if there's a reasonably priced combo tool on the market. -Ryan On Wed, Nov 1, 2023 at 5:37?AM James Grant wrote: > Hello, > > > > Was fairly certain this topic has been covered before on labnetwork but > couldn?t find anything relevant. > > > > Many of our plasma etch tool users have to bond piece parts samples to > silicon carrier wafers (150 or 200 mm diameter). To improve thermal > conduction we use a bonding medium between the piece part samples and the > silicon carrier wafer. The challenge is ensuring there are no voids in this > bonding layer but at the minute we have no way of imaging the stack to > verify. > > > > My ever so brief search thus far has rendered one IR system: > > > > https://www.idonus.com/downloads/idonus_brochure_WBI_2021-01-06.pdf > > > > It looks decent but stated minimum viewable feature size (1 pixel!!) is > 200 um for a 200 mm diameter field of view. > > > > Appreciate one could construct a home-made system but my preference is to > go for the ?easy? approach! There are also other techniques such as > scanning acoustic microscopy and optical interferometry. > > > > I guess my questions to the community are: > > > > 1. What system(s) are you using to inspect bonded wafers/chips? > 2. What sort of resolutions do you have? > > > > Cheers, > > James > > Dr. James Paul Grant > > Research Engineer in Plasma Processing > > *Plasma Processing Group* > > james.grant at glasgow.ac.uk > > > > www.JWNC.gla.ac.uk > LinkedIn.com/company/JWNC > @UofG_JWNC > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 26666 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 658 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.png Type: image/png Size: 603 bytes Desc: not available URL: From jimm at science.xyz Wed Nov 1 15:53:54 2023 From: jimm at science.xyz (Jim Mitchell) Date: Wed, 1 Nov 2023 15:53:54 -0400 Subject: [labnetwork] Oxford 80 etcher In-Reply-To: References: Message-ID: You could try contacting Classone. They refurb these. That box sounds like the RF signal box. Tells the system forward and reflected power but that's just a guess. Jim On Wed, Nov 1, 2023 at 3:47?PM Kenneth Mitchell wrote: > Hi, > > > > Found out about this forum today from one of the professors. I am trying > to resurrect an Oxford80 etcher. Probably 30 plus years old. Found a > manual on the web, but it does not have quite enough information. Oxford > UK has not been responsive. Anyone out there have any experience with this > tool. I have facilities hooked up, usual issues. My issue is there are a > few things that don?t look right. Like a box just laying loose inside the > cabinet with wires going into the RF area and a cable coming out into the > system wiring. Missing screws in the box cover. I?m wondering what else > may be missing. Would like to get this going for our semi program. > > > > Thanks in advance. > > > > Ken Mitchell > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From rlc12 at cornell.edu Mon Nov 6 12:44:52 2023 From: rlc12 at cornell.edu (Rebecca Lee Vliet) Date: Mon, 6 Nov 2023 17:44:52 +0000 Subject: [labnetwork] Registration is now OPEN! January 2024 CNF TCN -VIRTUAL- Short Course Message-ID: Registration is now OPEN! CNF Technology & Characterization at the Nanoscale (CNF TCN) VIRTUAL Short Course January 10, 2024 - January 12, 2024 The CNF TCN virtual short course will be held Wednesday, January 10th through Friday, January 12th, daily from 11:00am to 4:00pm (ET). Each day offers lectures and laboratory demonstrations designed to impart a broad understanding of the science and technology required to undertake research in nanoscience. TCN is an ideal way for faculty, students, post docs and staff members to rapidly come up to speed in many of the technologies that users of the CNF need to employ. Members of the high tech business community will also find it an effective way to learn best practices for success in a nanofab environment. Attendance is open to the general scientific community. Note: The short course does not replace the three part training required to become a user of our facility. To become a CNF user, please visit the "Getting Started" link (https:cnf.cornell.edu/howto) on the CNF website. For more information and to register visit: https://cnf.cornell.edu/education/tcn (Registration deadline, January 5, 2024) [A close-up of the TCN flyer] -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.jpg Type: image/jpeg Size: 205201 bytes Desc: image002.jpg URL: From jimm at science.xyz Wed Nov 8 06:41:04 2023 From: jimm at science.xyz (Jim Mitchell) Date: Wed, 8 Nov 2023 06:41:04 -0500 Subject: [labnetwork] Name that tool Message-ID: [image: 20231107_100705.jpg] -- *Jim Mitchell * Science Wafer Services Jimm at science.xyz *Jimm at corporationscience.com * (919) 717-7325 Science Corporation 3021 E Cornwallis Rd, Durham, NC 27709 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: 20231107_100705.jpg Type: image/jpeg Size: 6166205 bytes Desc: not available URL: From ccheney at infinityhps.com Wed Nov 8 11:22:54 2023 From: ccheney at infinityhps.com (Craig Cheney) Date: Wed, 8 Nov 2023 16:22:54 +0000 Subject: [labnetwork] Name that tool In-Reply-To: References: Message-ID: Lam Research 580/590 plasma etch tool. Spent many years working on them many many years ago. Thank you, Craig Cheney Owner, President [A picture containing text, clipart Description automatically generated] 2030 Pinehurst Drive Middleton, WI 53562 P: 608.834.4200 C: 608.438.8714 F: 608.834.4299 Aviation in itself is not inherently dangerous. But to an even greater degree than the sea, it is terribly unforgiving of any carelessness, incapacity, or neglect. - Captain A. G. Lamplugh This e-mail transmission and any attachments to it are intended solely for the use of the individual or entity to whom it is addressed and may contain confidential and privileged information. If you are not the intended recipient, your use, forwarding, printing, storing, disseminating, distribution, or copying of this communication is prohibited. If you received this communication in error, please notify the sender immediately by replying to this message and delete it from your computer. From: labnetwork On Behalf Of Jim Mitchell Sent: Wednesday, November 8, 2023 5:41 AM To: Lab Network (labnetwork at mtl.mit.edu) Subject: [labnetwork] Name that tool [cid:image002.jpg at 01DA122D.769AB690] -- Jim Mitchell Science Wafer Services Jimm at science.xyz Jimm at corporationscience.com (919) 717-7325 Science Corporation 3021 E Cornwallis Rd, Durham, NC 27709 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 23401 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.jpg Type: image/jpeg Size: 6166205 bytes Desc: image002.jpg URL: From jimm at science.xyz Wed Nov 8 12:03:04 2023 From: jimm at science.xyz (Jim Mitchell) Date: Wed, 8 Nov 2023 12:03:04 -0500 Subject: [labnetwork] Name that tool In-Reply-To: References: Message-ID: This one is 490 model. Jim On Wed, Nov 8, 2023, 11:23 AM Craig Cheney wrote: > Lam Research 580/590 plasma etch tool. Spent many years working on them > many many years ago. > > > > Thank you, > > > > Craig Cheney > > Owner, President > > [image: A picture containing text, clipart Description automatically > generated] > > 2030 Pinehurst Drive > > Middleton, WI 53562 > > P: 608.834.4200 > > C: 608.438.8714 > > F: 608.834.4299 > > > > Aviation in itself is not inherently dangerous. But to an even greater > degree than the sea, it is terribly unforgiving of any carelessness, > incapacity, or neglect. - Captain A. G. Lamplugh > > > > *This** e-mail transmission and any attachments to it are intended solely > for the use of the individual or entity to whom it is addressed and may > contain confidential and privileged information. If you are not the > intended recipient, your use, forwarding, printing, storing, disseminating, > distribution, or copying of this communication is prohibited. If you > received this communication in error, please notify the sender immediately > by replying to this message and delete it from your computer.* > > > > *From:* labnetwork * On Behalf Of *Jim > Mitchell > *Sent:* Wednesday, November 8, 2023 5:41 AM > *To:* Lab Network (labnetwork at mtl.mit.edu) > *Subject:* [labnetwork] Name that tool > > > > > > > > -- > > *Jim Mitchell * > > Science Wafer Services > > Jimm at science.xyz *Jimm at corporationscience.com > * > > (919) 717-7325 > > Science Corporation > > 3021 E Cornwallis Rd, Durham, NC 27709 > -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 23401 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.jpg Type: image/jpeg Size: 6166205 bytes Desc: not available URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.jpg Type: image/jpeg Size: 6166205 bytes Desc: not available URL: From bobbic at mit.edu Wed Nov 8 13:54:06 2023 From: bobbic at mit.edu (Robert J Bicchieri) Date: Wed, 8 Nov 2023 18:54:06 +0000 Subject: [labnetwork] Name that tool In-Reply-To: References: Message-ID: Hi, It?s a Lam Autoetch 490 plasma etch (because of Chlorine) Regards, Bob ----------------------------------------------------------------- Robert J. Bicchieri Research Specialist Massachusetts Institute of Technology MIT. Nano 60 Vassar St. Bldg. 12-5007 Cambridge, MA 02139 From: labnetwork On Behalf Of Craig Cheney Sent: Wednesday, November 8, 2023 11:23 AM To: Jim Mitchell ; Lab Network (labnetwork at mtl.mit.edu) Subject: Re: [labnetwork] Name that tool Lam Research 580/590 plasma etch tool. Spent many years working on them many many years ago. Thank you, Craig Cheney Owner, President [A picture containing text, clipart Description automatically generated] 2030 Pinehurst Drive Middleton, WI 53562 P: 608.834.4200 C: 608.438.8714 F: 608.834.4299 Aviation in itself is not inherently dangerous. But to an even greater degree than the sea, it is terribly unforgiving of any carelessness, incapacity, or neglect. - Captain A. G. Lamplugh This e-mail transmission and any attachments to it are intended solely for the use of the individual or entity to whom it is addressed and may contain confidential and privileged information. If you are not the intended recipient, your use, forwarding, printing, storing, disseminating, distribution, or copying of this communication is prohibited. If you received this communication in error, please notify the sender immediately by replying to this message and delete it from your computer. From: labnetwork > On Behalf Of Jim Mitchell Sent: Wednesday, November 8, 2023 5:41 AM To: Lab Network (labnetwork at mtl.mit.edu) > Subject: [labnetwork] Name that tool [cid:image002.jpg at 01DA124B.085B0180] -- Jim Mitchell Science Wafer Services Jimm at science.xyz Jimm at corporationscience.com (919) 717-7325 Science Corporation 3021 E Cornwallis Rd, Durham, NC 27709 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.jpg Type: image/jpeg Size: 23401 bytes Desc: image001.jpg URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.jpg Type: image/jpeg Size: 6166205 bytes Desc: image002.jpg URL: From phillip.chapman83 at gmail.com Thu Nov 9 13:21:58 2023 From: phillip.chapman83 at gmail.com (Phillip Chapman) Date: Thu, 9 Nov 2023 13:21:58 -0500 Subject: [labnetwork] PECVD with SiH4 concentration of 4% or less? Message-ID: PECVD with SiH4 concentration of 4% or less? Is anybody using conventional PECVD (not ICP-CVD or HDP-CVD) to deposit silicon oxide and silicon nitride films using gas cylinders with a silane concentration of 4% or less? If so, I?m hoping you can provide me: Contact or facility name: PECVD Make/Model: Gas cylinder SiH4 concentration (e.g. 2% SiH4, in a balance of N2): Background: There used to be a few universities using 2% silane with some older PECVD systems. I?ve been chatting with the typical tool vendors that most universities are familiar with about new PECVD systems, and based on their reactions you?d think I was asking them about unicorns (smile!). They all appear to be claiming their systems are being used with 5% to 100% silane and they don?t know much about their films or process window if used at lower concentrations. I?m hoping I might come across a few folks that are using lower silane concentrations with somewhat newer model PECVD systems. Thanks, Phil Chapman ? Microengineering Lab Mgr - Dartmouth College phillip.f.chapman at dartmouth.edu or phillip.chapman83 at gmail.com -------------- next part -------------- An HTML attachment was scrubbed... URL: From dcakiroglu at alumni.sabanciuniv.edu Sun Nov 12 10:57:59 2023 From: dcakiroglu at alumni.sabanciuniv.edu (Dilek Cakiroglu (Alumni)) Date: Sun, 12 Nov 2023 17:57:59 +0200 Subject: [labnetwork] Resist developer etching time for ALD films Message-ID: Hi , Does anyone have experience with resist developer etching time for ALD films? My primary interest is Al2O3, SiO2, HfO2 and SiN ALD films. Regards, Dilek -------------- next part -------------- An HTML attachment was scrubbed... URL: From lvchang at Central.UH.EDU Tue Nov 14 10:13:52 2023 From: lvchang at Central.UH.EDU (Chang, Long) Date: Tue, 14 Nov 2023 15:13:52 +0000 Subject: [labnetwork] Sputtering TaP Message-ID: Hello, Is anyone aware of any problems sputtering Tantalum Phosphide (TaP)? I couldn?t find much information about it on the internet. Thanks, Long Chang UH Nanofabrication Facility Houston, TX lvchang at central.uh.edu -------------- next part -------------- An HTML attachment was scrubbed... URL: From daron.westly at nist.gov Wed Nov 15 09:36:26 2023 From: daron.westly at nist.gov (Westly, Daron A. (Fed)) Date: Wed, 15 Nov 2023 14:36:26 +0000 Subject: [labnetwork] Process Integration Engineer Position at NIST Message-ID: Hello Lab Network, We are looking for an experienced process integration engineer to work on a variety of nanofabrication projects using the CNST nanofab at NIST in Gaithersburg, MD. This role will involve extensive use of the CNST cleanroom and requires in depth knowledge of ebeam and photolithography, mask making, plasma etching, deposition, furnace processing, metrology, and other cleanroom processes. Please forward this to anyone who might be interested and reach out to me with any questions. The jobs is posted here: https://www.usajobs.gov/job/757802700 Information about the nanofab can be found here: https://www.nist.gov/cnst Cheers Daron Westly -------------- next part -------------- An HTML attachment was scrubbed... URL: From hit.kamble at gmail.com Sun Nov 19 01:08:47 2023 From: hit.kamble at gmail.com (Hitesh Kamble) Date: Sun, 19 Nov 2023 09:08:47 +0300 Subject: [labnetwork] Inquiry for Mask Writer Training Opportunities Message-ID: Dear All, I trust this message finds you well. Greetings of the day! We are a cleanroom facility based in Saudi Arabia, dedicated to providing high-quality services to our esteemed clients. Currently, we are seeking Mask Writer training opportunities, with a specific focus on mask fabrication/process. Our quest for knowledge is not limited by geographical constraints, and we are open to training programs conducted in America, the UK, or the EU. We are prepared to participate in paid training programs that align with our requirements. If your institution or organization offers training sessions related to mask fabrication, we would greatly appreciate receiving more information and any leads! Thank you for considering our request, and we eagerly await your response. Regards, Hitesh Kamble. Orbit & Skyline Semiconductors. Riyadh, Saudi Arabia. From jim.pierce at utah.edu Mon Nov 20 11:45:13 2023 From: jim.pierce at utah.edu (Jim Pierce) Date: Mon, 20 Nov 2023 16:45:13 +0000 Subject: [labnetwork] Unaxis/Plasma Therm Shuttlelock SLR 700 Metal Etcher Message-ID: Dear All, I hope you are all doing well. We are searching for a maintenance manual or exploded view of mechanical drawings for the chuck and lift pin assembly. If this is something you could share, we'd be extremely grateful. We have a facilities and user manual and some electrical schematics. Best regards, Jim [cid:f427d158-7b9b-4fe4-9446-cfffc7d07ed8] Jim Pierce NanoFab Staff Process Engineer University of Utah 36 S. Wasatch Drive, Rm 2528 Salt Lake City, Utah 84112 Office - 801-587-1219 Cell - 385-227-3294 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: Outlook-pku5urba.png Type: image/png Size: 5528 bytes Desc: Outlook-pku5urba.png URL: From deonc69 at illinois.edu Tue Nov 21 12:04:20 2023 From: deonc69 at illinois.edu (Collins, Deon) Date: Tue, 21 Nov 2023 17:04:20 +0000 Subject: [labnetwork] Unaxis/Plasma Therm Shuttlelock SLR 700 Metal Etcher In-Reply-To: References: Message-ID: The chuck and lift pin assembly for what piece of equipment? Deon D. Collins FACILITY MANAGER The Grainger College Of Engineering UIUC Holonyak Micro & Nanotechnology Lab 208 N Wright St Rm. 1114 | MC-249 Urbana, IL 61801 217-300-7531 | deonc69 at illinois.edu [cid:image001.png at 01DA1C6A.777701D0] Under the Illinois Freedom of Information Act any written communication to or from university employees regarding university business is a public record and may be subject to public disclosure. Life is not about watching other people live it. It's about you living your own! From: labnetwork On Behalf Of Jim Pierce Sent: Monday, November 20, 2023 10:45 AM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Unaxis/Plasma Therm Shuttlelock SLR 700 Metal Etcher Dear All, I hope you are all doing well. We are searching for a maintenance manual or exploded view of mechanical drawings for the chuck and lift pin assembly. If this is something you could share, we'd be extremely grateful. We have a facilities and user manual and some electrical schematics. Best regards, Jim [cid:image002.png at 01DA1C6A.777701D0] Jim Pierce NanoFab Staff Process Engineer University of Utah 36 S. Wasatch Drive, Rm 2528 Salt Lake City, Utah 84112 Office - 801-587-1219 Cell - 385-227-3294 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 2602 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 5528 bytes Desc: image002.png URL: From christophe.clement at polymtl.ca Tue Nov 21 14:25:48 2023 From: christophe.clement at polymtl.ca (=?iso-8859-1?Q?Christophe_Cl=E9ment?=) Date: Tue, 21 Nov 2023 14:25:48 -0500 (EST) Subject: [labnetwork] ICP-RIE Purchase Message-ID: <036501da1cb0$885aba00$99102e00$@polymtl.ca> Hello community, I need your input regarding the purchase of a new ICP-RIE. We currently have two Oxford systems, Plasmalab System100. We're quite happy with them (the service could be better though), so we've asked Oxford to quote us for an ICP-RIE, the Cobra model. This system will be dedicated for Silicon Bosch process only. However, we wouldn't want to miss out on other tools that might satisfy us. Apart from Plasma Therm, whom I intend to contact shortly, do you know of any other suppliers of this type of equipment? As our cleanroom space is limited, equipment the size of a Plasmalab would be ideal. Also, regarding wafer cooling, we currently use liquid nitrogen only, although we haven't been doing cryo processes for a long time, but we don't want to eliminate this option at this time for the new tool. I've been proposed to use a chiller and LN2 combo, to save LN2 when not using cryo processes. I'd be interested to hear what you think of this choice (cooling time, maintenance ) Thank you Best Christophe Christophe Cl?ment Technicien laboratoire Laboratoire de microfabrication (LMF) Groupe des Couches Minces (GCM) www.gcmlab.ca Ecole Polytechnique de Montr?al www.polymtl.ca D?partement de g?nie physique * 2900 Boulevard Edouard Monpetit Pavillon JAB Campus de l'Universit? de Montr?al Montr?al (Qu?bec) H3T 1J4 8 christophe.clement at polymtl.ca ( 514 340 4711 #2417 Fax : 514 340 5195 -------------- next part -------------- An HTML attachment was scrubbed... URL: From peter.lowell at nist.gov Tue Nov 21 17:30:38 2023 From: peter.lowell at nist.gov (Lowell, Peter J. (Fed)) Date: Tue, 21 Nov 2023 22:30:38 +0000 Subject: [labnetwork] Questions about MgO and MgF2 Processing Message-ID: Hi Labnetwork, We have a user that is interested in processing MgO and MgF2 substrates and we have no experience processing these materials. The user is specifically interested in performing fluorine and oxygen plasma etches, e-beam evaporating, and sputter depositing on these substrates. We are concerned if these processes will contaminate a chamber that is used for general processing. Is there anyone out there that has any experience that would be willing to discuss with me? Thanks a bunch! Peter -------------------------------------------------------------- Peter Lowell, Ph.D. Senior Process Engineer Boulder Micro-Fabrication Facility National Institute of Standards and Technology 325 Broadway MS 680.09 Boulder, CO 80305 Phone: (303) 497-6934 -------------- next part -------------- An HTML attachment was scrubbed... URL: From kmcpeak at lsu.edu Tue Nov 21 17:54:05 2023 From: kmcpeak at lsu.edu (Kevin M McPeak) Date: Tue, 21 Nov 2023 22:54:05 +0000 Subject: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane Message-ID: Dear Colleagues, The LSU Nanofab will install an Oxford PECVD system for SiO2, SiNx, and a-Si deposition next year. We are getting quotes for ammonia and silane gas cabinets in preparation for the PECVD. So far, we have received quotes for Ammonia and Silane gas cabinets from SDC, SilPac, Matherson, AirGas, and Critical Systems. Are we missing anyone? We have discussed the details of the installation with our local safety folk but input from the list of recommended gas cabinet manufacturers would be most appreciated. We are especially interested in reconditioned systems if they exist. Thanks! Regards, Kevin -- Kevin M. McPeak Associate Professor | LSU Dept. of Chemical Engineering 225-578-0058 | mcpeaklab.com | lsu.edu/nanofabrication From jks7 at buffalo.edu Wed Nov 22 07:10:27 2023 From: jks7 at buffalo.edu (Jeffrey Salzmann) Date: Wed, 22 Nov 2023 12:10:27 +0000 Subject: [labnetwork] ICP-RIE Purchase In-Reply-To: <036501da1cb0$885aba00$99102e00$@polymtl.ca> References: <036501da1cb0$885aba00$99102e00$@polymtl.ca> Message-ID: Christophe, I have had nothing but issues with Trion for RIEs, and these issues are not limited to my facility. I would avoid them. Regards, Jeff Jeff Salzmann Assistant Professor of Research Cleanroom Manager, Shared Instrumentation Laboratories School of Engineering and Applied Sciences University at Buffalo 114A Davis Hall Buffalo, NY 14260 From: labnetwork On Behalf Of Christophe Cl?ment Sent: Tuesday, November 21, 2023 2:26 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] ICP-RIE Purchase Hello community, I need your input regarding the purchase of a new ICP-RIE. We currently have two Oxford systems, Plasmalab System100. We're quite happy with them (the service could be better though), so we've asked Oxford to quote us for an ICP-RIE, the Cobra model. This system will be dedicated for Silicon Bosch process only. However, we wouldn't want to miss out on other tools that might satisfy us. Apart from Plasma Therm, whom I intend to contact shortly, do you know of any other suppliers of this type of equipment? As our cleanroom space is limited, equipment the size of a Plasmalab would be ideal. Also, regarding wafer cooling, we currently use liquid nitrogen only, although we haven't been doing cryo processes for a long time, but we don't want to eliminate this option at this time for the new tool. I've been proposed to use a chiller and LN2 combo, to save LN2 when not using cryo processes. I'd be interested to hear what you think of this choice (cooling time, maintenance...) Thank you Best Christophe Christophe Cl?ment Technicien laboratoire Laboratoire de microfabrication (LMF) Groupe des Couches Minces (GCM) www.gcmlab.ca Ecole Polytechnique de Montr?al www.polymtl.ca D?partement de g?nie physique * 2900 Boulevard Edouard Monpetit Pavillon JAB Campus de l'Universit? de Montr?al Montr?al (Qu?bec) H3T 1J4 * christophe.clement at polymtl.ca * 514 340 4711 #2417 Fax : 514 340 5195 -------------- next part -------------- An HTML attachment was scrubbed... URL: From kckeenan at seas.upenn.edu Wed Nov 22 08:23:46 2023 From: kckeenan at seas.upenn.edu (Kyle Keenan) Date: Wed, 22 Nov 2023 08:23:46 -0500 Subject: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane In-Reply-To: References: Message-ID: Applied Energy Systems: https://www.appliedenergysystems.com/ On Wed, Nov 22, 2023 at 8:19?AM Kevin M McPeak wrote: > Dear Colleagues, > > The LSU Nanofab will install an Oxford PECVD system for SiO2, SiNx, and > a-Si deposition next year. We are getting quotes for ammonia and silane gas > cabinets in preparation for the PECVD. > > So far, we have received quotes for Ammonia and Silane gas cabinets from > SDC, SilPac, Matherson, AirGas, and Critical Systems. > > Are we missing anyone? We have discussed the details of the installation > with our local safety folk but input from the list of recommended gas > cabinet manufacturers would be most appreciated. We are especially > interested in reconditioned systems if they exist. Thanks! > > Regards, > Kevin > > -- > Kevin M. McPeak > Associate Professor | LSU Dept. of Chemical Engineering > 225-578-0058 | mcpeaklab.com | lsu.edu/nanofabrication > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!IBzWLUs!Xixou7chE7fxDXeKFARCUE7CdT2w2KgOeNWHQz9NGcYGaSSAx26DufMcEO-diptGQ4ssmnofqCriqxWUajsB$ > -- Kyle Keenan Senior Manager - Laboratory Operations Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 -------------- next part -------------- An HTML attachment was scrubbed... URL: From dwolff at nelhydrogen.com Wed Nov 22 08:24:23 2023 From: dwolff at nelhydrogen.com (David Wolff) Date: Wed, 22 Nov 2023 13:24:23 +0000 Subject: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane In-Reply-To: References: Message-ID: See if http://www.appliedenergysystems.com/ has what you need David Wolff Industrial Sales Director - North America Nel Hydrogen 10 Technology Drive, Wallingford, CT 06492 United States Office: M +1 860-604-3282 Fax: +1 203-949-8016 dwolff at nelhydrogen.com -----Original Message----- From: labnetwork On Behalf Of Kevin M McPeak Sent: Tuesday, November 21, 2023 17:54 To: labnetwork at mtl.mit.edu Subject: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane CAUTION: Our automatic validation of the sender of this mail failed. Pay extra attention to attachments as well as links!! Dear Colleagues, The LSU Nanofab will install an Oxford PECVD system for SiO2, SiNx, and a-Si deposition next year. We are getting quotes for ammonia and silane gas cabinets in preparation for the PECVD. So far, we have received quotes for Ammonia and Silane gas cabinets from SDC, SilPac, Matherson, AirGas, and Critical Systems. Are we missing anyone? We have discussed the details of the installation with our local safety folk but input from the list of recommended gas cabinet manufacturers would be most appreciated. We are especially interested in reconditioned systems if they exist. Thanks! Regards, Kevin -- Kevin M. McPeak Associate Professor | LSU Dept. of Chemical Engineering 225-578-0058 | mcpeaklab.com | lsu.edu/nanofabrication _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork From dlafleur at cns.fas.harvard.edu Wed Nov 22 09:08:10 2023 From: dlafleur at cns.fas.harvard.edu (LaFleur, David W) Date: Wed, 22 Nov 2023 14:08:10 +0000 Subject: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane Message-ID: <4B443360-FC2C-4117-B87C-AE22B1AC3AEE@cns.fas.harvard.edu> Hi Kevin, Here at Harvard we have Applied Energy for all our toxic gasses. We are happy with their performance and support. Regards, David LaFleur Equipment Engineer CNS, Harvard University 11 Oxford St. Cambridge, Ma. 02138 ?On 11/22/23, 8:15 AM, "labnetwork on behalf of Kevin M McPeak" wrote: Dear Colleagues, The LSU Nanofab will install an Oxford PECVD system for SiO2, SiNx, and a-Si deposition next year. We are getting quotes for ammonia and silane gas cabinets in preparation for the PECVD. So far, we have received quotes for Ammonia and Silane gas cabinets from SDC, SilPac, Matherson, AirGas, and Critical Systems. Are we missing anyone? We have discussed the details of the installation with our local safety folk but input from the list of recommended gas cabinet manufacturers would be most appreciated. We are especially interested in reconditioned systems if they exist. Thanks! Regards, Kevin -- Kevin M. McPeak Associate Professor | LSU Dept. of Chemical Engineering 225-578-0058 | mcpeaklab.com | lsu.edu/nanofabrication _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork From nnelsonfitzpatrick at uwaterloo.ca Wed Nov 22 09:22:50 2023 From: nnelsonfitzpatrick at uwaterloo.ca (Nathan Nelson - Fitzpatrick) Date: Wed, 22 Nov 2023 14:22:50 +0000 Subject: [labnetwork] ICP-RIE Purchase In-Reply-To: <036501da1cb0$885aba00$99102e00$@polymtl.ca> References: <036501da1cb0$885aba00$99102e00$@polymtl.ca> Message-ID: Hi Christophe, Regarding your second question. Our lab has the LN2-chiller switchover capabilities on both of our 10+ year old Oxford Plasmalab 100 DRIE systems. In practice we have used the chillers 99+% of the time and only switched over to LN2 on rare occasions. We have not observed any reliability issues with the changeover hardware or process, but it is seldom exercised. If I recall correctly, the changeover takes about 45 minutes and it?s a process that might require service level permissions. In any case we have it locked out of the user accounts on our tools. Some of these observations may be different from how this is handled on a modern Oxford ICP-RIE though since the PLCs and software have undergone many changes since our systems were commissioned. Hope this helps, -Nathan -- Nathan Nelson-Fitzpatrick PhD, PEng (He/Him) Director, Quantum-Nano Fabrication and Characterization Facility (QNFCF) Office of Research University of Waterloo 200 University Avenue West, Waterloo, ON N2L 3G1 P: 519-888-4567 ext. 31796 C: 226-218-3206 https://uwaterloo.ca/quantum-nano-fabrication-and-characterization-facility/ [signature_3157769220] From: labnetwork on behalf of Christophe Cl?ment Date: Tuesday, November 21, 2023 at 4:13?PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] ICP-RIE Purchase Hello community, I need your input regarding the purchase of a new ICP-RIE. We currently have two Oxford systems, Plasmalab System100. We're quite happy with them (the service could be better though), so we've asked Oxford to quote us for an ICP-RIE, the Cobra model. This system will be dedicated for Silicon Bosch process only. However, we wouldn't want to miss out on other tools that might satisfy us. Apart from Plasma Therm, whom I intend to contact shortly, do you know of any other suppliers of this type of equipment? As our cleanroom space is limited, equipment the size of a Plasmalab would be ideal. Also, regarding wafer cooling, we currently use liquid nitrogen only, although we haven't been doing cryo processes for a long time, but we don't want to eliminate this option at this time for the new tool. I've been proposed to use a chiller and LN2 combo, to save LN2 when not using cryo processes. I'd be interested to hear what you think of this choice (cooling time, maintenance?) Thank you Best Christophe Christophe Cl?ment Technicien laboratoire Laboratoire de microfabrication (LMF) Groupe des Couches Minces (GCM) www.gcmlab.ca Ecole Polytechnique de Montr?al www.polymtl.ca D?partement de g?nie physique ? 2900 Boulevard Edouard Monpetit Pavillon JAB Campus de l'Universit? de Montr?al Montr?al (Qu?bec) H3T 1J4 ? christophe.clement at polymtl.ca ? 514 340 4711 #2417 Fax : 514 340 5195 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 13046 bytes Desc: image001.png URL: From codreanu at udel.edu Wed Nov 22 10:20:54 2023 From: codreanu at udel.edu (Iulian Codreanu) Date: Wed, 22 Nov 2023 10:20:54 -0500 Subject: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane In-Reply-To: References: Message-ID: <07524b6c-3cdb-4ce6-aeac-017a924067b6@udel.edu> Hi Kevin, I've purchased gas cabinets from Applied Energy system for the past 16 years. They have both SEMI grade cabinets and more affordable ones but I am not sure they supply refurbished units. Some contact emails are listed below: Greg Havrilla Todd Bell Steve Buerkel iulian Codreanu, Ph.D. Director, Nanofabrication Facility University of Delaware Harker ISE Lab, Room 163 221 Academy Street Newark, DE 19716 302-831-2784 https://udnf.udel.edu On 11/21/2023 5:54 PM, Kevin M McPeak wrote: > Dear Colleagues, > > The LSU Nanofab will install an Oxford PECVD system for SiO2, SiNx, and a-Si deposition next year. We are getting quotes for ammonia and silane gas cabinets in preparation for the PECVD. > > So far, we have received quotes for Ammonia and Silane gas cabinets from SDC, SilPac, Matherson, AirGas, and Critical Systems. > > Are we missing anyone? We have discussed the details of the installation with our local safety folk but input from the list of recommended gas cabinet manufacturers would be most appreciated. We are especially interested in reconditioned systems if they exist. Thanks! > > Regards, > Kevin > > -- > Kevin M. McPeak > Associate Professor | LSU Dept. of Chemical Engineering > 225-578-0058 | mcpeaklab.com | lsu.edu/nanofabrication > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -------------- next part -------------- An HTML attachment was scrubbed... URL: From deonc69 at illinois.edu Wed Nov 22 10:21:37 2023 From: deonc69 at illinois.edu (Collins, Deon) Date: Wed, 22 Nov 2023 15:21:37 +0000 Subject: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane In-Reply-To: References: Message-ID: Holonyak Lab just completed a purchase from Critical Systems Inc. We had several older CSI cabinets refurbished as well as bought a couple new cabinets from CSI. Their customer serve has always been great, and I have most of the techs on speed dial. We have 9 pieces of their equipment. DEON D. COLLINS FACILITY MANAGER The Grainger College Of Engineering UIUC Holonyak Micro & Nanotechnology Lab 208 N Wright St Rm. 1114 | MC-249 Urbana, IL 61801 217-300-7531 | deonc69 at illinois.edu ? Under the Illinois Freedom of Information Act any written communication to or from university employees regarding university business is a public record and may be subject to public disclosure. Life is not about watching other people live it. It's about you living your own! -----Original Message----- From: labnetwork On Behalf Of Kevin M McPeak Sent: Tuesday, November 21, 2023 4:54 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane Dear Colleagues, The LSU Nanofab will install an Oxford PECVD system for SiO2, SiNx, and a-Si deposition next year. We are getting quotes for ammonia and silane gas cabinets in preparation for the PECVD. So far, we have received quotes for Ammonia and Silane gas cabinets from SDC, SilPac, Matherson, AirGas, and Critical Systems. Are we missing anyone? We have discussed the details of the installation with our local safety folk but input from the list of recommended gas cabinet manufacturers would be most appreciated. We are especially interested in reconditioned systems if they exist. Thanks! Regards, Kevin -- Kevin M. McPeak Associate Professor | LSU Dept. of Chemical Engineering 225-578-0058 | mcpeaklab.com | lsu.edu/nanofabrication _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!DZ3fjg!_1b8lYTQbJj39WMaFaJmWzklanANvd7gh2cv3IBUQJBaYUN1M4xrnLP56ijwmX2xRaBb7rC0aAdemoKtqLSm$ From James.Grant at glasgow.ac.uk Wed Nov 22 10:25:49 2023 From: James.Grant at glasgow.ac.uk (James Grant) Date: Wed, 22 Nov 2023 15:25:49 +0000 Subject: [labnetwork] ICP-RIE Purchase In-Reply-To: <036501da1cb0$885aba00$99102e00$@polymtl.ca> References: <036501da1cb0$885aba00$99102e00$@polymtl.ca> Message-ID: Hi Christophe, At the James Watt Nanofabrication Centre we have 9 OIPT systems (x 3 PECVD, x 1 ICPCVD, x 1 RIE, x 2 ICP-RIE, x 1 DSiE and x 1 ALD). We also have x 3 systems from SPTS (DSiE, PECVD, ICP-RIE). Surprised you are considering OIPTs Cobra offering instead of their bespoke tool for DSiE, the Estrelas. However I'm likely out of touch on ability of Cobra to also be configured for Bosch Si etching. You will have seen that we have x 2 DSiE etch tools, one from OIPT (Estrelas) and one from SPTS (Rapier). On the Estrelas we have a cryogenic lower electrode that we could cool using either liquid nitrogen (for cryogenic processes) or a standard chiller (Julabo FP51+SL). However when Estrelas was installed (2014) a dewar was positioned about 5 metres from tool but this dewar still had to be filled with liquid nitrogen from the source which was around 20-30 m away. Long story short it was basically impractical for us/we did not have enough staff resource to switch between cryogenic and room temperature processing. Ended up in 2019, to make away for new SPTS Rapier tool we had to remove the liquid nitrogen dewar meaning we can no longer do cryogenic processes on the Estrelas. For most of our applications this has not been a hindrance. Hope this works; here's what our SPTS Rapier looks like (process chamber backing pump, loadlock pump and lower electrode are behind the wall but still housed in the cleanroom(!).....eek!) and here's what our OIPT Estrelas looks like (process chamber backing pump, loadlock pump and component cooling chiller is above tool in our mezzanine). Wary of being too critical of OIPT as I know at least one employee (Matthi!) who subscribes to this mailing list. Overall I think they suffer from having not enough bodies to deliver decent service. They have lots of excellent people (Matthi being one of them) but I'm realistic; you get what you pay for. We have had less faults with our SPTS Rapier but then again it's ~6 years newer and a lot of the install oversights that we have learnt from the Estrelas we have implemented on the Rapier. SPTS field service engineer costs (for us anyway, a few hundred miles from their base) about double that of OIPT. Parts slightly more expensive. SPTS Rapier, if we paid full price (we didn't), around 20-30% more than OIPT Estrelas. In terms of Bosch processes I'd actually say both tools are excellent. Repeatability is very good however a lot of that is down to the excellent groundwork/skill/expertise/procedures put in place by our plasma expert (aware I'm supposed to be that!) Dr. Corrie Farmer who is a true master of silicon etching. SPTS process experts are always happy to have a call with him! Our Rapier also has an electrostatic chuck (ESC) while our Estrelas has a mechanical clamp. Believe the Estrelas can have an ESC but we didn't get it. In terms of wafer cooling, an ESC is way better than a mechanical clamp. If pushed I would favour the SPTS Rapier over the OIPT Estrelas but I caveat that with I have more experience of the tool and, being more expensive than the OIPT Estrelas, it should be better! Cheers, James Dr. James Paul Grant Research Engineer in Plasma Processing Plasma Processing Group james.grant at glasgow.ac.uk [cid:image001.png at 01DA1D54.493B1C80] www.JWNC.gla.ac.uk [cid:image002.png at 01DA1D54.493B1C80] LinkedIn.com/company/JWNC [cid:image003.png at 01DA1D54.493B1C80] @UofG_JWNC From: labnetwork On Behalf Of Christophe Cl?ment Sent: Tuesday, November 21, 2023 7:26 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] ICP-RIE Purchase Hello community, I need your input regarding the purchase of a new ICP-RIE. We currently have two Oxford systems, Plasmalab System100. We're quite happy with them (the service could be better though), so we've asked Oxford to quote us for an ICP-RIE, the Cobra model. This system will be dedicated for Silicon Bosch process only. However, we wouldn't want to miss out on other tools that might satisfy us. Apart from Plasma Therm, whom I intend to contact shortly, do you know of any other suppliers of this type of equipment? As our cleanroom space is limited, equipment the size of a Plasmalab would be ideal. Also, regarding wafer cooling, we currently use liquid nitrogen only, although we haven't been doing cryo processes for a long time, but we don't want to eliminate this option at this time for the new tool. I've been proposed to use a chiller and LN2 combo, to save LN2 when not using cryo processes. I'd be interested to hear what you think of this choice (cooling time, maintenance...) Thank you Best Christophe Christophe Cl?ment Technicien laboratoire Laboratoire de microfabrication (LMF) Groupe des Couches Minces (GCM) www.gcmlab.ca Ecole Polytechnique de Montr?al www.polymtl.ca D?partement de g?nie physique * 2900 Boulevard Edouard Monpetit Pavillon JAB Campus de l'Universit? de Montr?al Montr?al (Qu?bec) H3T 1J4 * christophe.clement at polymtl.ca * 514 340 4711 #2417 Fax : 514 340 5195 -------------- next part -------------- An HTML attachment was scrubbed... URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image001.png Type: image/png Size: 26666 bytes Desc: image001.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image002.png Type: image/png Size: 658 bytes Desc: image002.png URL: -------------- next part -------------- A non-text attachment was scrubbed... Name: image003.png Type: image/png Size: 603 bytes Desc: image003.png URL: From jeanne.guo at rice.edu Wed Nov 22 11:11:35 2023 From: jeanne.guo at rice.edu (Jing Guo) Date: Wed, 22 Nov 2023 10:11:35 -0600 Subject: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane In-Reply-To: References: Message-ID: <10142298-B996-4AB9-951A-CBD434452C5F@rice.edu> Hi Kevin, Have you tried AES (https://www.appliedenergysystems.com/). We have all gas cabinets and VMBs, gas control panels from them. If you need the contact from AES, I could share later. Best, Jing --------------------------------------- Jing Guo Ph.D. Research Scientist SEA Cleanroom (SST 017) Rice University Houston, TX jeanne.guo at rice.edu 713-348-8227 > On Nov 21, 2023, at 4:54 PM, Kevin M McPeak wrote: > > Dear Colleagues, > > The LSU Nanofab will install an Oxford PECVD system for SiO2, SiNx, and a-Si deposition next year. We are getting quotes for ammonia and silane gas cabinets in preparation for the PECVD. > > So far, we have received quotes for Ammonia and Silane gas cabinets from SDC, SilPac, Matherson, AirGas, and Critical Systems. > > Are we missing anyone? We have discussed the details of the installation with our local safety folk but input from the list of recommended gas cabinet manufacturers would be most appreciated. We are especially interested in reconditioned systems if they exist. Thanks! > > Regards, > Kevin > > -- > Kevin M. McPeak > Associate Professor | LSU Dept. of Chemical Engineering > 225-578-0058 | mcpeaklab.com | lsu.edu/nanofabrication > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!BuQPrrmRaQ!jKD35yzuRrLXqYX04s2O8uGv0JzpgnuNIo2JuLbEygN3nbqM5xr-QELMm2p3kNYpJu2oLMjLXqRG328PjGAIa37jYUY$ -------------- next part -------------- An HTML attachment was scrubbed... URL: From schweig at umich.edu Wed Nov 22 12:20:55 2023 From: schweig at umich.edu (Dennis Schweiger) Date: Wed, 22 Nov 2023 12:20:55 -0500 Subject: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane In-Reply-To: References: Message-ID: Kevin, We have an assortment of both Air Products (AP), and Applied Energy Systems (AES) gas cabinets, mini gas cabinets, and valve manifold boxes. Orur AP cabinets are nearing their end of life for the automatic controls, and our intent when they expire is to replace them with controls and panels from AES. Make sure that whatever you purchase, you can "talk" to it with external equipment. I've personally worked with AES for over 25 years, both at the University, and on the outside. You won't find a better company to work with. If you want to take a look at a variety of different hardware, and installations, you're more than welcome to come up for a visit. Dennis Schweiger University of Michigan/LNF Facilities Manager 734.647.2055 Ofc On Wed, Nov 22, 2023 at 8:12?AM Kevin M McPeak wrote: > Dear Colleagues, > > The LSU Nanofab will install an Oxford PECVD system for SiO2, SiNx, and > a-Si deposition next year. We are getting quotes for ammonia and silane gas > cabinets in preparation for the PECVD. > > So far, we have received quotes for Ammonia and Silane gas cabinets from > SDC, SilPac, Matherson, AirGas, and Critical Systems. > > Are we missing anyone? We have discussed the details of the installation > with our local safety folk but input from the list of recommended gas > cabinet manufacturers would be most appreciated. We are especially > interested in reconditioned systems if they exist. Thanks! > > Regards, > Kevin > > -- > Kevin M. McPeak > Associate Professor | LSU Dept. of Chemical Engineering > 225-578-0058 | mcpeaklab.com | lsu.edu/nanofabrication > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > -------------- next part -------------- An HTML attachment was scrubbed... URL: From mapril at draper.com Wed Nov 22 12:45:13 2023 From: mapril at draper.com (April, Mark R.) Date: Wed, 22 Nov 2023 17:45:13 +0000 Subject: [labnetwork] [EXTERNAL] Re: Gas cabinets for Ammonia and 2-5% Silane In-Reply-To: References: Message-ID: Hi, I have several sdc systems online for years at Draper they work great and the software is very user friendly. Great support also Thanks Mark April Sent from my Verizon, Samsung Galaxy smartphone Get Outlook for Android ________________________________ From: labnetwork on behalf of Kyle Keenan Sent: Wednesday, November 22, 2023 8:23:46 AM To: Kevin M McPeak Cc: labnetwork at mtl.mit.edu Subject: [EXTERNAL] Re: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane CAUTION: This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe. Applied Energy Systems: https://www.appliedenergysystems.com/ On Wed, Nov 22, 2023 at 8:19?AM Kevin M McPeak > wrote: Dear Colleagues, The LSU Nanofab will install an Oxford PECVD system for SiO2, SiNx, and a-Si deposition next year. We are getting quotes for ammonia and silane gas cabinets in preparation for the PECVD. So far, we have received quotes for Ammonia and Silane gas cabinets from SDC, SilPac, Matherson, AirGas, and Critical Systems. Are we missing anyone? We have discussed the details of the installation with our local safety folk but input from the list of recommended gas cabinet manufacturers would be most appreciated. We are especially interested in reconditioned systems if they exist. Thanks! Regards, Kevin -- Kevin M. McPeak Associate Professor | LSU Dept. of Chemical Engineering 225-578-0058 | mcpeaklab.com | lsu.edu/nanofabrication _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!IBzWLUs!Xixou7chE7fxDXeKFARCUE7CdT2w2KgOeNWHQz9NGcYGaSSAx26DufMcEO-diptGQ4ssmnofqCriqxWUajsB$ -- Kyle Keenan Senior Manager - Laboratory Operations Quattrone Nanofabrication Facility University of Pennsylvania P: 215-898-7560 F: 215-573-4925 -------------- next part -------------- An HTML attachment was scrubbed... URL: From Justin_Moreau at uml.edu Wed Nov 22 12:46:45 2023 From: Justin_Moreau at uml.edu (Moreau, Justin) Date: Wed, 22 Nov 2023 17:46:45 +0000 Subject: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane In-Reply-To: References: Message-ID: Hi Kevin We have Ciphercon 1500 by SDC. Support we get has been great. Justin Moreau Director, Nanofabrication Core CORE RESEARCH FACILITIES UML ETIC E: Justin_Moreau at uml.edu T: 978-934-3615 M: 978-337-8148 -----Original Message----- From: labnetwork On Behalf Of Kevin M McPeak Sent: Tuesday, November 21, 2023 5:54 PM To: labnetwork at mtl.mit.edu Subject: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane CAUTION: This email was sent from outside the UMass Lowell network. Dear Colleagues, The LSU Nanofab will install an Oxford PECVD system for SiO2, SiNx, and a-Si deposition next year. We are getting quotes for ammonia and silane gas cabinets in preparation for the PECVD. So far, we have received quotes for Ammonia and Silane gas cabinets from SDC, SilPac, Matherson, AirGas, and Critical Systems. Are we missing anyone? We have discussed the details of the installation with our local safety folk but input from the list of recommended gas cabinet manufacturers would be most appreciated. We are especially interested in reconditioned systems if they exist. Thanks! Regards, Kevin -- Kevin M. McPeak Associate Professor | LSU Dept. of Chemical Engineering 225-578-0058 | mcpeaklab.com | lsu.edu/nanofabrication _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork From sturm at princeton.edu Wed Nov 22 13:30:49 2023 From: sturm at princeton.edu (James C. Sturm) Date: Wed, 22 Nov 2023 18:30:49 +0000 Subject: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane In-Reply-To: <4B443360-FC2C-4117-B87C-AE22B1AC3AEE@cns.fas.harvard.edu> References: <4B443360-FC2C-4117-B87C-AE22B1AC3AEE@cns.fas.harvard.edu> Message-ID: I can vouch for Applied Energy Systems (Steve Buerkel's company). I've been working with Steve on and off for 25 years, both as lab director an in my own CVD lab. All first rate. Jim Sturm ******************************************** Prof. James C. Sturm Chair, Department of Electrical and Computer Engineering Stephen R. Forrest Professor in Electrical Engineering Princeton University B210 E-Quad, Olden St. Princeton, NJ 08540 609-258-5610, fax: 609-258-1177 sturm at princeton.edu -----Original Message----- From: labnetwork On Behalf Of LaFleur, David W Sent: Wednesday, November 22, 2023 9:08 AM To: Kevin M McPeak ; labnetwork at mtl.mit.edu Subject: Re: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane Hi Kevin, Here at Harvard we have Applied Energy for all our toxic gasses. We are happy with their performance and support. Regards, David LaFleur Equipment Engineer CNS, Harvard University 11 Oxford St. Cambridge, Ma. 02138 ?On 11/22/23, 8:15 AM, "labnetwork on behalf of Kevin M McPeak" wrote: Dear Colleagues, The LSU Nanofab will install an Oxford PECVD system for SiO2, SiNx, and a-Si deposition next year. We are getting quotes for ammonia and silane gas cabinets in preparation for the PECVD. So far, we have received quotes for Ammonia and Silane gas cabinets from SDC, SilPac, Matherson, AirGas, and Critical Systems. Are we missing anyone? We have discussed the details of the installation with our local safety folk but input from the list of recommended gas cabinet manufacturers would be most appreciated. We are especially interested in reconditioned systems if they exist. Thanks! Regards, Kevin -- Kevin M. McPeak Associate Professor | LSU Dept. of Chemical Engineering 225-578-0058 | mcpeaklab.com | lsu.edu/nanofabrication _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork _______________________________________________ labnetwork mailing list labnetwork at mtl.mit.edu https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork From axel.soulet at airliquide.com Thu Nov 23 03:20:37 2023 From: axel.soulet at airliquide.com (SOULET, Axel) Date: Thu, 23 Nov 2023 09:20:37 +0100 Subject: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane In-Reply-To: References: Message-ID: Error of typo in the email address : ronald.inman at airliquide.com Expert in dispense systems : sublimation systems, organometallic dispense systems, with reference at Intel, Applied Materials, ... On Thu, Nov 23, 2023 at 9:18?AM SOULET, Axel wrote: > Air Liquide Electronics Systems > Ask to ron.inman at airliquide.com > > On Wed, Nov 22, 2023 at 6:29?PM Kyle Keenan > wrote: > >> Applied Energy Systems: >> >> https://www.appliedenergysystems.com/ >> >> On Wed, Nov 22, 2023 at 8:19?AM Kevin M McPeak wrote: >> >>> Dear Colleagues, >>> >>> The LSU Nanofab will install an Oxford PECVD system for SiO2, SiNx, and >>> a-Si deposition next year. We are getting quotes for ammonia and silane gas >>> cabinets in preparation for the PECVD. >>> >>> So far, we have received quotes for Ammonia and Silane gas cabinets from >>> SDC, SilPac, Matherson, AirGas, and Critical Systems. >>> >>> Are we missing anyone? We have discussed the details of the installation >>> with our local safety folk but input from the list of recommended gas >>> cabinet manufacturers would be most appreciated. We are especially >>> interested in reconditioned systems if they exist. Thanks! >>> >>> Regards, >>> Kevin >>> >>> -- >>> Kevin M. McPeak >>> Associate Professor | LSU Dept. of Chemical Engineering >>> 225-578-0058 | mcpeaklab.com | lsu.edu/nanofabrication >>> _______________________________________________ >>> labnetwork mailing list >>> labnetwork at mtl.mit.edu >>> >>> https://urldefense.com/v3/__https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork__;!!IBzWLUs!Xixou7chE7fxDXeKFARCUE7CdT2w2KgOeNWHQz9NGcYGaSSAx26DufMcEO-diptGQ4ssmnofqCriqxWUajsB$ >>> >> >> >> -- >> Kyle Keenan >> >> Senior Manager - Laboratory Operations >> Quattrone Nanofabrication Facility >> University of Pennsylvania >> P: 215-898-7560 >> F: 215-573-4925 >> _______________________________________________ >> labnetwork mailing list >> labnetwork at mtl.mit.edu >> https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork >> > > > -- > > *Axel Soulet, PhD / *+33 (0)6 08 85 83 86 / Air Liquide / *France* > > -- *Axel Soulet, PhD / *+33 (0)6 08 85 83 86 / Air Liquide / *France* -------------- next part -------------- An HTML attachment was scrubbed... URL: From jpalmer at Princeton.EDU Mon Nov 27 13:30:16 2023 From: jpalmer at Princeton.EDU (Joseph E. Palmer) Date: Mon, 27 Nov 2023 13:30:16 -0500 Subject: [labnetwork] Gas cabinets for Ammonia and 2-5% Silane In-Reply-To: References: Message-ID: <4996b817-67da-45f5-b35a-8a72c389d02e@exchange.princeton.edu> Another vote for AES.? 30 years, and no regrets. Joe On 11/22/2023 12:20 PM, Dennis Schweiger wrote: > Kevin, > > We have an assortment of both Air Products (AP), and Applied Energy > Systems (AES) gas cabinets, mini gas cabinets, and valve manifold > boxes.? Orur AP cabinets are nearing their end of life for the > automatic controls, and our intent when they expire is to replace them > with controls and panels from AES. > > Make sure that whatever you purchase, you can "talk" to it with > external equipment. > > I've personally worked with AES for over 25 years, both at the > University, and on the outside.? You won't find a better company to > work with. > > If you want to take a look at a variety of different hardware, and > installations, you're more than welcome to come up for a visit. > > DennisSchweiger > University of Michigan/LNF > Facilities Manager > 734.647.2055 Ofc > > > On Wed, Nov 22, 2023 at 8:12?AM Kevin M McPeak wrote: > > Dear Colleagues, > > The LSU Nanofab will install an Oxford PECVD system for SiO2, > SiNx, and a-Si deposition next year. We are getting quotes for > ammonia and silane gas cabinets in preparation for the PECVD. > > So far, we have received quotes for Ammonia and Silane gas > cabinets from SDC, SilPac, Matherson, AirGas, and Critical Systems. > > Are we missing anyone? We have discussed the details of the > installation with our local safety folk but input from the list of > recommended gas cabinet manufacturers would be most appreciated. > We are especially interested in reconditioned systems if they > exist. Thanks! > > Regards, > Kevin > > -- > Kevin M. McPeak > Associate Professor | LSU Dept. of Chemical Engineering > 225-578-0058 | mcpeaklab.com > > | lsu.edu/nanofabrication > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork > > > > _______________________________________________ > labnetwork mailing list > labnetwork at mtl.mit.edu > https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork -- Joseph E. Palmer Chief of Operations for the MNFC PIM, Princeton University Contact: Office: 609-258-4706 Cell: 609-731-8962 -------------- next part -------------- An HTML attachment was scrubbed... URL: From rrand at ucdavis.edu Tue Nov 28 16:00:34 2023 From: rrand at ucdavis.edu (Ryan R Anderson) Date: Tue, 28 Nov 2023 21:00:34 +0000 Subject: [labnetwork] UC Davis Center for Nano-Micro Manufacturing job opening Message-ID: Dear Lab Network community, The Center for Nano-Micro Manufacturing at UC Davis has an open position for a Process/Equipment Engineer. This position primarily oversees equipment and takes care of users in our photolithography and wafer/die bonding process areas with responsibilities extending into other areas of the facility as well. The full job description including responsibilities, required knowledge, skills and experience can be found here. Looking forward to hearing from anyone that might be interested! Thank you Ryan Anderson Manager, Center for Nano-Micro Manufacturing 1209 Kemper Hall University of California Davis One Shields Avenue Davis, CA 95616 Phone: 530-601-3943 Email: rrand at ucdavis.edu https://cnm2.ucdavis.edu/ -------------- next part -------------- An HTML attachment was scrubbed... URL: