[labnetwork] Bosch ICP etcher

[Philippe Fluckiger]

Dear Mikhail,

Deep SiO2 etching and deep silicon etching are running very well together on
our Alcatel AMS 200 etcher.
More info at: http://cmi.epfl.ch/etch/AMS200.htm
Contact person: cyrille.hibert at epfl.ch

With my very best regards,
Philippe
________________________________________________________________________
Dr Philippe Flückiger
Director of Operations
EPFL Center of MicroNanoTechnology

Phone: +41 21 693 6695
Fax: +41 21 693 5770
Email: philippe.fluckiger at epfl.ch
Biography: http://people.epfl.ch/philippe.fluckiger

CMI:  http://cmi.epfl.ch/
Faculty: http://sti.epfl.ch/
Campus: http://www.epfl.ch/

Postal address:
BM 1.125 (BM Building)
Station 17
1015 Lausanne
Switzerland

GPS Coordinates:
N 46° 31' 16.32"
E 06° 33' 55.08"   /    Alt. 397m
Access Map: http://map.epfl.ch/?room=bm1125


-----Original Message-----
From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu]
On Behalf Of Mikhail Gaevski
Sent: vendredi, 11. janvier 2008 22:39
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Bosch ICP etcher

We are planning to buy Bosch ICP etcher for deep silicon etching.
It will be great to use the same etcher also for deep SiO2 etching. The 
rest of the vendors honestly told us that the machine has to be 
dedicated to the Bosch process only. But STS company claims that their 
relatively new STS LpX Pro HRM System can be switched between these two 
different processes relatively easy and without time consuming 
recalibration and cleaning.
 
Does anyone on LabNet have an experience with switching between the 
Bosch process and oxide etching on a similar etching system?
 
Thank you for your opinions,
 
Mikhail Gaevski

 

Mikhail Gaevski, PhD
Interim Director of
the Micro/Nanofabrication Laboratory
J301 E-Quad, PRISM,
Princeton University
Olden Street, Princeton, NJ  08544

Phone: (609) 258 8234
FAX:   (609) 258 1954
e-mail: gaevskim at princeton.edu <mailto:gaevskim at princeton.edu>


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