[labnetwork] Quintel 7000 mask aligner and SVG 8800 Coater/Dev for sale

Mon Sep 13 17:37:49 EDT 2010

Dear Steve,

Myself and other list members I am sure thank you for letting us know
about this equipment.
I am always on the lookout for used equipment.
If any other list members need to sell used equipment, please do not
hesitate to contact me or one of my collegues, who read this mail in CC.

Please send me more details about this equipment you have available,
including the price if possible.

Yours sincerely,

Stephen Howe 
Company Owner
SDI Fabsurplus Group

Via F Russo, 19
Napoli 80123 Italy

+39 081 240 3115 (Office)
+39 335 710 7756 (Mobile)
Skype: Stephencshowe

PS: By the way, I am also looking for the following equipment:

APPLIED MATERIALS VERITY 4i
Applied Materials Centura Epi or HTF CVD. (8" 2ch, RP in case of Epi)
Anelva C7100 sputter tools:12"/300mm Qty: 2 Each
ASM A400 or SVG 8000 AVP oxidation Vert furn. DIFF_V 
ASM A400 or SVG 8000 AVP LPCVD Vert furn. NITRIDE 
ASM A400 or SVG 8000 AVP LPCVD Vert furn. POLY UNDOPED 
ASM A400 or SVG 8000 AVP LPCVD Vert furn. PHOSPHOR LPCVD,, 2 reactor,
dual boat, PHOSPOR
ASM A400 or SVG 8000 AVP LPCVD Vert furn. DOPED 
ASM A400 or SVG 8000 AVP LPCVD Vert furn. TEOS 
ASM A400 or SVG 8000 AVP oxidation/ anneal Vert furn. ALLOY 
ASML /100D or /200 with fast TTL
ASML /1400
Axcelis GSD 200E2 High Energy Implanter
Biorad / Accent Opto QS2200M FTIR
BRUCE BDF 41 oxidation/ anneal High temperature,   SiC-ware 4 tubes, SiC
ware,  1250°C,  external torch, 4 gaslines(N2,O2 hi Flow),  Boatloader,
Robot Loading QTY 2
CANON ES3 / ES2+ / ES4 - Should be able to demonstrate running wafers
DNS 820L or STEAG/MATTSON STEAG/MATTSON AWP200 anorganic clean + resist
removal GATE clean
(LAB+clean) SPM+ DHF+ SC1+ SC2+ 4xQDR + 2xdry
DNS 820L or STEAG/MATTSON AWP200 anorganic clean + resist removal GATE
clean
(LAB+clean) SPM+ DHF+ SC1+ SC2+ 4xQDR + 2xdry
DNS 820L or STEAG/MATTSON AWP200 nitride etch nitride etch DHF+ H3PO4
with Nisson + BOE + rinse + dry
ESE 2013 or SEZ RST203 wetetch Si, Film etch, thin wafer handling 3
chemical cabinets, bernoulli handling,
ESE 2013 or SEZ RST203 wetetch Si, Film etch,  2 chemical cabinets (1
with mixoption),  Film removal
ESEC   2008
FSI   Polaris
K and S   Maxum Plus
MIRAE   MR7500
Nikon   i12 or i11D, 5 inch reticle
Novellus C3 Altus W 300 mm
Mattson   Aspen 3
Omron   VT-Win II
PHILIPS   CM 12
Semitool SST organic clean EKC,  polymere removal 2 chambers,
stainless steel
TERADYNE   J750
THERMA-WAVE INC.   THERMA-PROBE 500 XP
NID-Dryer wetetch IPA dryer, thin wafer handling IPA dryer
VARIAN VIISION 200 or AXCELIS GSD 200E2 implanter high current >160
keV;3xSDS +1xHigh pressure gaslines, plasma flood gun QTY 2
VARIAN EHP500 or AXCELIS NV8202 implanter Medium Current QTY 3

Complete front end line - 8 inch

Let us know right away if your purchasing department is looking to buy
any hard to find equipment right now !

Stephen Howe 

On Mon, 2010-09-13 at 12:32 -0500, steve scoggin wrote:
> Steve W. Scoggin
> Master Scientific Research Technologist
> University of Arkansas
> College of Engineering
> Office of the Dean
> 3189 Bell Engineering Center
> Fayetteville, Ar 72701
> Office 479-575-6049
> cell   479-236-6049
> Fax    479-575-5500
> www.hidec.uark.edu/?section=people&content=person&person=scoggin
> 
> 
> 
> Greetings,
> 
> Available for sale is the attached and below described Quintel 7000  
> mask aligner. The system is currently tooled for 100mm and 75mm round  
> wafers, can be tooled up to 200mm wafers. The system is complete and  
> in working condition. Also available is a SVG 8800 dual track  
> coater/developer also complete working condition. Tools are located  
> here in Fayetteville, Arkansas and available for inspection with notice.
> 
> Regards,
> 
> 
> Steve W. Scoggin
> Phone-479-236-6049
> 
> 
> 
> 
> 
> 
> 
> 
> 
> 
> 
>   QUINTEL 7000 AL Autoloader Mask Aligner, complete, operational>  
> Wafer sizes from pieces 8" diameter or substrates up to 6'x6'>  
> Currently tooled for 4' with 5x5 Mask Holder (Optional 3' with 4x4  
> Mask> Plate)> Fully motorized X-Y-Theta alignment stage> Manual Tray  
> load for substrateloading/unloading> CCTV Splitfield microscope with  
> zoom> Has Optional Magna View (optical) splitfield / singlefield  
> microscope with> Magna View CCTV for Microscope> Simple Topside Mask  
> loading> UltraSense constant intensity UV power Supply> System set @  
> 200Watt can be set to 350 Watt> UV Collimation lens for  
> improvedprinting resolution> Shock Isolation Table included as  
> Standard> > Options:> Robotic auto load handling> Pulsed exposure  
> timer sequencing> > Performance:> Print Modes: Soft, Pressure, Vacuum  
> contact> Print Resolution: =<1.0microns> Alignment Stage:> Alignment  
> Travel X-Y: Motorized with automatic re-centering> Alignment Travel  
> Theta: Motorized with automatic re-centering> StageScan: +/- 19mm> X-Y  
> Movement: +/-4mm> Theta RotationRange: +/-7 degrees> Mask / Wafer  
> Separation: 0 - 300 microns> MaskSize: 2.5X2.5'up to 9x9 (optional  
> mask plates required)> Topside Alignment Overlay: <0.5 microns>  
> Bottomside Alignment Overlay: >2microns> Operator/process dependant> >  
> UV LampHouse / UV Optics:> Lamphouse: 200/350 W (setup for 200)>  
> ExposureOptics: UV (350-450 nm) standard> UV Uniformity: +/- 4% 150mm  
> dia. / +/- 5% 200 mm dia.> > System Requirements:> Voltage: 240VAC  
> 50Hz> Compressed Air: 6.2-7.6 bar (90-110PSI)> Vacuum: -0.7 bar (21'  
> Hg)> Nitrogen or CDA: 4.2 bar (60 PSI)> > System WxDxH:  
> 1194x838x1194mm (47'x33'x47')> Weight: 340kg (750lb)> Operational when  
> de-installed> 1999 vintage.
> 
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