[labnetwork] Sputter problem

[Mac Hathaway]

Apologies, I meant no other responses of any kind!

:  )

Mac Hathaway wrote:
> Hi Keith,
>
> Since I see no other better responses yet, I'll give you my two cents 
> (not being a sputtering guru, myself):
>
> Sounds like something is getting hot.  Things to check:
>
> Loose RF connections in the chamber, and back to the tuning network.  
> Also, check inside your tuning network for loose connections.
>
> Does your forward/reflected power change over the day? 
>
> Another place to look is your RF power supply.
>
>
> Mac Hathaway
> Harvard CNS
>
>
>
> Keith Bradshaw wrote:
>   
>> We are sputtering TiO2 .
>>
>> We begin the day with a 250 angstrom rate....each subsequent run is 
>> reduced by 10-15% in rate until we are at a 125 angstrom rate.  We are 
>> not changing anything.
>>
>> Next day we begin again at 250.
>>
>> Tried argon clean between runs, tried 3 hour wait between runs, we are 
>> using a load lock and vacuum looks stable , still rate drops on each run.
>>
>> Any ideas?
>>
>> cordially,
>>
>> Keith Bradshaw
>> Dallas
>>     
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
>   
-------------- next part --------------
An HTML attachment was scrubbed...
URL: <https://mtl.mit.edu/pipermail/labnetwork/attachments/20110624/8a456959/attachment.html>