[labnetwork] TMAH vs KOH
Robert M. Hamilton
bob at eecs.berkeley.edu
Wed May 18 16:43:09 EDT 2011
Matthieu Nannini,
At the Berkeley NanoLab we support both KOH and TMAH use at
a dedicated work process station. We have not had issues
with these processes. Having said this, we have added the
following caution statement about TMAH exposure to our lab
and safety manuals after our Office of Environmental Health
& Safety shared data about fatal TMAH exposures in Taiwan:
"TMAH (Tetramethylammonium hydroxide) is widely used as a
photoresist developer (2-3%) and for the anisotropic etching
of silicon (10-15%). TMAH is a strong base and hazardous by
ingestion, inhalation, skin (dermal) exposure and eye
contact. In addition to alkalinity-related chemical burn,
dermal exposure to TMAH may also result in respiratory
failure and/or cardiac arrest. A 2010 study of case reports
of Taiwan semiconductor factory injuries linked exposure of
25% TMAH to three cases of heart failure. It is important to
treat TMAH skin exposure by flooding the effected area with
water for at least 15 minutes and to report all exposures."
More generally, caustic burns (KOH or TMAH) can be worse
than acid burns. It is difficult to cleanse the orbit of an
eye when exposure occurs and caustic quickly penetrate
tissue. While 15 minutes may seem an inordinate amount of
time for a topical exposure to a chemical, trauma
specialists who we've consulted tell us such long rinses
have definite value.
Sincerely,
Bob Hamilton
Robert M. Hamilton
Marvel NanoLab
University of CA at Berkeley
Rm 520 Sutardja Dai Hall
Berkeley, CA 94720-1754
bob at eecs.berkeley.edu
(e-mail preferred)
510-809-8600
510-325-7557 (Emergencies)
On 5/18/2011 9:20 AM, Matthieu Nannini, Dr. wrote:
> Dear all,
>
> Having only one base dedicated bench running TMAH @ 85C I have now to make a choice between TMAH and KOH since new researcher are asking for KOH. Maintaining the 2 chemicals requires resources that I don't have.
> Process wise, TMAH is better with oxide masks but KOH is better with SiN masks. KOH also etches faster and nicer.
> My questions are in terms of safety: could you share your experiences with KOH vs TMAH in terms of ease of use, safety, etc...
>
> Thanks
>
> -----------------------------------
> Matthieu Nannini
> McGill Nanotools Microfab
> Manager
> t: 514 398 3310
> c: 514 758 3311
> f: 514 398 8434
> http://miam2.physics.mcgill.ca/
> ------------------------------------
>
>
> _______________________________________________
> labnetwork mailing list
> labnetwork at mtl.mit.edu
> https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork
More information about the labnetwork
mailing list