[labnetwork] TMAH controls or substitutes
Mac Hathaway
hathaway at cns.fas.harvard.edu
Tue Sep 4 10:09:10 EDT 2012
Hi Linda,
At Harvard CNS we only allow 25% TMAH usage in the dedicated "strong"
acid/base benches, with full PPE at all times (extra chemical gloves,
poly chemical apron with sleeves, faceshield, safety glasses). We are
trying to phase it out. For Si etching, we encourage the use of KOH
instead.
For 2.5-3.0% (i.e. MIF developer), we are not as rigorous, but we are
reviewing that PPE as well.
For those who are not familiar with TMAH, it has been recently
re-appraised by groups in Taiwan, IBM, and elsewhere, in light of the
discovery that, in a small sample of people who had exposures to either
25% and 3% TMAH, 3 out of the 4 exposed to 25% TMAH died, one of whom
reportedly got under a safety shower within 30 seconds (he still
died.). The minimum exposed area in the review was, I believe, 7.5%
body area exposed. Toxicity appears unrelated to, but exacerbated by
the extreme caustic nature of the material. The current bottom line is
25% TMAH appears to be a potent neurotoxin, and there is no known
antidote. The reason this is a problem is that TMAH is the active
ingredient in most "metal-ion-free" developers, although this is only in
the ~3% concentration, where neurotoxicity is much reduced, and
manifests itself in lessor symptoms like tingling, blurred vision, etc.
25% TMAH is used in Si etching, and for some E-beam resist purposes, as
a developer for HSQ.
Mac Hathaway
Safety Officer
Harvard CNS
On 9/4/2012 2:06 AM, Linda Macks wrote:
>
> Hi all,
>
> We are currently reviewing our processes using TMAH, and I would be
> grateful for any feedback re. safety controls or substitute chemicals,
> particularly for Si etching involving 25% concentration TMAH.
>
> Many thanks,
>
> Linda
>
> *Dr Linda Macks*
> Facility Manager, ANFF-NSW
> Australian National Fabrication Facility
> School of Electrical Engineering & Telecommunications
> University of New South Wales
> UNSW Sydney NSW 2052
> Australia
> Phone: +61 (2) 9385 7845
> Fax: +61(2) 9385 5114
> Email: linda.macks at unsw.edu.au <mailto:linda.macks at unsw.edu.au>
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