[labnetwork] Contamination control in PVD systems

[Fouad Karouta]

Dear Carsen,

Here at the Australian National University, Canberra, we do have an open access e-beam evaporator reserved for metals and we started with: Au, Pt, Ni, Ti, Ge, Al, Cr and later we added Pd, Mo, Hf and Nb.
So far we haven't heard from our users any negative feedback about deterioration/contamination of contacts.
We do not allow oxides nor metals like Zn, Cu, Te, Sn etc. where we believe these metals have a more serious contamination risk. In our facility we do have a sputter system w/o materials restriction and it is used for metals to oxides, nitrides offering more than 50 materials/targets. We do know from users that some contamination is found at level clearly below 1%.

Hope this helps a bit and I am curious to learn from others their experience.

Cheers,
Fouad Karouta

*********************************
Manager ANFF ACT Node
Australian National Fabrication Facility
Research School of Physics and Engineering
Australian National University
ACT 0200, Canberra, Australia
Tel: + 61 2 6125 7174
Mob: + 61 451 046 412
Email: fouad.karouta at anu.edu.au
http://anff-act.anu.edu.au/

-----Original Message-----
From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Carsen Kline
Sent: Sunday, 1 February 2015 5:02 AM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Contamination control in PVD systems

Hello all,

We're looking to expand our PVD capabilities and we're curious to know how other labs control contamination as it relates to safety, process, and equipment condition. Can anyone share your general philosophy or policies on approaching contamination control in PVD systems? (For example, categorizing systems based on allowed contaminants, or having multiple levels of controlled access to specific tools, etc.)

Thanks for your input, I'm looking forward to your responses.

Carsen




Carsen Kline
Stanford Nanofabrication Facility
http://snf.stanford.edu
carsen at stanford.edu


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