[labnetwork] Chamber Cleaning With Gold Contamination

[Mike Young]

Hi Kamal. At risk of being misunderstood, experience in this field motivates me to respond with a blatant, old Americanism:

	-->    If it ain't broke, don't fix it!   <--

Having said that, you probably already know that most groups/labs segregate CMOS and compound semiconductor processing equipment for this very reason.

Best of luck,

--Mike


> On Jun 5, 2015, at 5:33 AM, Kamal Yadav <kamal.yadav at gmail.com> wrote:
> 
> Dear All,
> 
> Though may not make much sense, but would wanted to know if there are any successful cleaning procedures for chamber to remove affect of gold usage/contamination in that chamber.
> 
> We want to use the chamber with gold pads exposed to the plasma, but at the same time, need to allow those whose devices may get affected from gold [in CMOS]. Any intermediate cleaning/deposition that could significantly (?) reduce the affect. 
> 
> Our chamber [ICPCVD] has been used [5+ years] with gold pads [exposed to plasma] and so far other groups have not reported any issues with their devices, so its working out fine till now.
> 
> But we want to take precautionary measures if any.
> 
> Thanks a lot!
> 
> -- 
> Thanks,
> Kamal Yadav
> Sr. Process Technologist
> Electrical Engineering
> IIT Bombay
> Mobile: 7506144798
> 

-- 
Michael P. Young                                (574) 631-3268 (office)
Nanofabrication Specialist                      (574) 631-4393 (fax)
Department of Electrical Engineering            (765) 637-6302 (cell)
University of Notre Dame                         mike.young at nd.edu
B-38 Stinson-Remick Hall
Notre Dame, IN 46556-5637

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