[labnetwork] Pre-oxidation furnace clean

[Kurt Kupcho]

Hi everyone -

For a traditional thermal oxidation furnace, for things like building gate oxides, the general practice is to do a pre-furnace clean using piranha, RCA 1, RCA 2, and HF in successive cleanings beforehand.  I was wondering for other academic cleanrooms following this practice what rules do you have in place for once the students clean their samples and how long they can store these samples before putting into the oxidation furnace.  Let's assume that the students redo the HF dip to remove the native oxide layer that has reformed, and they stored the samples in a clean container in a N2 dry box inside the cleanroom.  Do you require them to put the sample in the oxidation furnace immediately after pre-furnace clean? 1 day? 1 week?  Also, if you do have a specific rule for this do you have any cleanliness data to back it up?  Thank you ahead of time for your insightful responses!

Best,

Kurt


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Kurt Kupcho
Microelectronics Engineer

WCAM
1550 Engineering Drive
ECB Room 3110
Madison, WI  53706

E:  kurt.kupcho at wisc.edu<mailto:kurt.kupcho at wisc.edu>
T:  608-262-2982
F:  608-265-2614

[http://wcam.engr.wisc.edu/logos/pics/wcam420x80.png]

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