[labnetwork] DC sputtering of ITO

[Chang, Long]

Hi All,

We have a DC magnetron sputtering system using 2” diameter targets.  We’ve been observing many shorts due to severe flaking.  The student is using a recipe developed by her predecessor which uses 100W of DC power and 5 mTorr of Ar.  Does anyone know what steps should be taken to avoid/reduce flaking when DC sputtering ITO?  I suspect that the student is using too much power.

Thanks,
Long Chang
Nanofab Manager
University of Houston
3605 Cullen Blvd, Entrance 14
Room E1007A, SERC Bldg 545
Houston, TX 77204-5062
[cid:3086A57B-3DB1-4B85-8710-71DBF15B4CB1 at uh.edu]



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