[labnetwork] Project Feasibility for RIE
Luciani, Vincent (Fed)
Vincent.Luciani at nist.gov
Mon Oct 17 10:59:52 EDT 2016
Hello,
I checked with our RIE chemist. He does not have direct experience with these chemicals but offered the following comments.
Based on the formula, the film is a solid polymer (CH2CHCO(C2H4O)nCOOCHCH2) blended with the ionic liquids (C8H15BF4N2+ AgBF4+ C10H12O2) inside. It is a Carbon based film, so normal Oxygen plasma should etch it. The concern is if the small molecular organic compounds (C8H15BF4N2 and C10H12O2) will vaporize inside the high vacuum plasma chamber which may change the electrolyte chemical composition and contaminate the plasma system.
Best,
Vince Luciani
Vincent K. Luciani
NanoFab Manager
Center for Nanoscale Science and Technology<http://www.cnst.nist.gov/>
National Institute of Standards and Technology
100 Bureau Drive, MS 6201
Gaithersburg, MD 20899-6200 USA
+1-301-975-2886
From: labnetwork-bounces at mtl.mit.edu [mailto:labnetwork-bounces at mtl.mit.edu] On Behalf Of Abelev, Esta
Sent: Thursday, October 13, 2016 12:53 PM
To: labnetwork at mtl.mit.edu
Subject: [labnetwork] Project Feasibility for RIE
Hi,
I would like to introduce myself, I am Esta Abelev a Technical Director of Nanoscale Fabrication facility at University of Pittsburgh.
Recently, I received request to etch following materials (see below table), that I have never worked with. I wanted to ask the community if somebody have an experience with those materials and how the best way to etch it.
Need to etch the polymer electrolyte (salt concentration is 2.5 mM based on the volume of Ionic liquid. And PEGDA/IL is 60/40 wt.%) on the silicon substrate except those areas protected by metal. The chemical formulas for these materials are as follows:
Name
Chemical Formula
Polyethylene glycol dicrylate
CH2CHCO(C2H4O)nCOOCHCH2
1-butyl-3-methylimiadazolium tetrafluoroborate
C8H15BF4N2
Silver tetrafluoroborate
AgBF4
2-Hydroxy-2-methylpropiophenone
C10H12O2
Thank you, Esta
.........................................................................................................................................................................................
Dr. Esta Abelev
Technical Director of PINSE/NFCF
Petersen Institute of NanoScience and Engineering (PINSE)
Nanoscale Fabrication and Characterization Facility (NFCF<http://www.nano.pitt.edu/facilities>)
University of Pittsburgh
636 Benedum Hall
3700 O'Hara Street
Pittsburgh, PA 15261
Phone: 412-383-4096
Email: eabelev at pitt.edu<mailto:eabelev at pitt.edu>
Office: M104 Benedum Hall
http://www.nano.pitt.edu
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